TWI581069B - Movable body apparatus, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method - Google Patents

Description

Mobile device, exposure device, method of manufacturing flat panel display, and device manufacturing method

The present invention relates to a mobile body device, an exposure device, a method of manufacturing a flat panel display, and a device manufacturing method, and more particularly to a moving body device for driving an object holding member that holds an object along a horizontal plane, including the aforementioned moving body device. An exposure apparatus for forming a predetermined pattern on the object, a method of manufacturing a flat panel display using the exposure apparatus, and a device manufacturing method using the exposure apparatus.

In the lithography process for manufacturing electronic components (micro components) such as a liquid crystal display device or a semiconductor device (integrated circuit), a photomask or a reticle (hereinafter collectively referred to as a "mask") and a glass are used. A step-and-scan type exposure apparatus in which a plate or a wafer (hereinafter collectively referred to as "substrate") is synchronously moved in a predetermined scanning direction (SCAN direction) and an image of a reticle is transferred onto a substrate by using an energy beam.

As such an exposure apparatus, since the position in the horizontal plane of the substrate (the scanning direction, the cross-scanning direction, and the position around the axis orthogonal to the horizontal plane) is controlled at high speed and high precision, it is known to have a so-called bracket ( A substrate stage device composed of a coarse and a micro-motion combined with a two-axis coarse motion stage and a fine movement stage of a gantry type (see, for example, Patent Document 1).

With the increase in the size of the substrate in recent years, the substrate stage device has also increased in size. Therefore, a substrate stage device which is simple in configuration and capable of performing position control in the horizontal plane of a large substrate with high precision and high speed is desired.

[Patent Literature]

[Patent Document 1] U.S. Patent Application Publication No. 2010/0018950

The present invention has been made in view of the above circumstances, and is a moving body device comprising: a first moving body movable at a position in a first direction in a two-dimensional plane parallel to a horizontal plane; The second movable body is provided in the first movable body, and is movable in a position along the first direction together with the first movable body, and is movable in the two-dimensional plane and the first one with respect to the first movable body. Moving in a position in the second direction orthogonal to the direction; the object holding member is a holding object, and is moved along the two-dimensional plane by the second moving body; and the first guiding member is disposed in the first direction in the first direction The object holding member is supported in the first direction while being movable in the second direction from the lower side, and is movable in the first direction together with the object holding member; The second guiding member is disposed on the other side of the first moving body in the first direction, and supports the object holding member on the other side of the first direction when the object holding member moves in the second direction from below. The region is movable in the first direction together with the object holding member.

Thereby, the object holding member is induced by the first and second moving bodies in a two-dimensional plane parallel to the horizontal plane. The first and second guiding members that support the object holding member from the lower side and the other side in the first direction are moved in the first direction together with the object holding member, so that the device is configured simple.

According to a second aspect of the invention, there is provided an exposure apparatus comprising: a moving body device according to the first aspect of the present invention; and a pattern forming device that forms a predetermined pattern by using the energy beam on the object held by the object holding member.

The present invention is directed to a method of manufacturing a flat panel display, comprising: an operation of exposing the object using an exposure apparatus according to a second aspect of the present invention; and an operation of developing the object after exposure.

According to a fourth aspect of the present invention, there is provided a device manufacturing method comprising: an operation of exposing the object using an exposure apparatus of an exposure apparatus according to a second aspect of the present invention; and an operation of developing the object after exposure.

Hereinafter, an embodiment will be described using Figs. 1 to 3 .

Fig. 1 is a view schematically showing the configuration of a liquid crystal exposure apparatus 10 of an embodiment. The liquid crystal exposure apparatus 10 is a step-and-scan type projection exposure apparatus using a rectangular (angular) glass substrate P (hereinafter simply referred to as a substrate P) such as a liquid crystal display device (flat panel display) as an exposure target, that is, a so-called projection exposure apparatus Scanner.

The liquid crystal exposure apparatus 10 includes an illumination system 12, a mask stage 14 holding the mask M, a projection optical system 16, and a substrate stage 18, and is coated on the surface (the surface facing the +Z side in Fig. 1). A substrate stage device 20 of a substrate P of an etchant (inductive agent), and the like, and the like. In the following description, the direction in which the mask M and the substrate P are scanned relative to the projection optical system 16 at the time of exposure is set to the X-axis direction and the direction orthogonal to the X-axis in the horizontal plane. The Y-axis direction is set to be the Z-axis direction orthogonal to the X-axis and the Y-axis, and the rotation directions around the X-axis, the Y-axis, and the Z-axis are θ x , θ y , and θ z , respectively. direction.

The illumination system 12 has the same configuration as that disclosed in, for example, the specification of the U.S. Patent No. 5,729,331. That is, the illumination system 12 irradiates the illumination light IL for exposure to the mask M. For the illumination light IL, for example, i-line (wavelength: 365 nm), g-line (wavelength: 436 nm), h-line (wavelength: 405 nm), or the like (or the combined light of the i-line, the g-line, and the h-line) is used.

The mask stage 14 holds the mask M in which a predetermined circuit pattern is formed, for example, by vacuum suction. The mask stage 14 is driven in the scanning direction (X-axis direction) by a mask stage driving system (not shown) including, for example, a linear motor, and is appropriately driven by the micro-axis in the Y-axis direction and θ z direction. The position information (including the rotation information in the θ z direction) of the mask stage 14 in the XY plane is obtained by a mask interferometer system including a laser interferometer (not shown).

The projection optical system 16 is disposed below the mask stage 14 . The projection optical system 16 has the same configuration as the projection optical system disclosed in the specification of U.S. Patent No. 6,552,775. In other words, the projection optical system 16 includes, for example, a so-called multi-lens projection optical system that includes a plurality of optical systems that form an erect positive image on both sides of the telecentric system, and has a rectangular shape having a longitudinal direction in the Y-axis direction. The projection optics of a single image field are equally functional.

Therefore, after illuminating the illumination area on the reticle M with the illumination light IL from the illumination system 12, the projection image of the circuit pattern of the reticle M in the illumination area is projected through the illumination light IL passing through the reticle M. Optical system 16 formation An illumination area of the illumination light IL conjugated to the illumination area on the substrate P. Next, by moving the mask M relative to the illumination area (illumination light IL) in the scanning direction, and moving the substrate P relative to the exposure area (illumination light IL) in the scanning direction, thereby transferring one irradiation area on the substrate P A pattern formed on the mask M.

The substrate stage stand 18 is composed of members extending in the Y-axis direction, and as shown in FIG. 2, for example, two are provided at predetermined intervals in the X-axis direction. For example, the Y linear guides 27a extending in the Y-axis direction are fixed at a predetermined interval in the X-axis direction on the upper surface of each of the two substrate stages 18, and are, for example, three in the present embodiment. In the vicinity of the end portion of the substrate stage 18 in the longitudinal direction, as shown in Fig. 1, the vibration isolating device 19 provided on the floor 11 of the clean room is supported from below. The substrate stage stage 18 constitutes a part of the apparatus body (body) of the liquid crystal exposure apparatus 10. The mask stage 14 and the projection optical system 16 are supported by the apparatus body, and are separated from the ground 11 by vibration. Further, the substrate stage device 20 shown in Fig. 1 corresponds to a cross-sectional view taken along line A-A of Fig. 2 .

As shown in FIG. 2, the substrate stage device 20 has a pair of bottom frames 22, an X-pillar 24 (an exemplary embodiment of the first moving body) that is placed on the pair of bottom frames 22, and a coarse motion mounted on the X-pillars 24. The stage 26 (an example of the second moving body) and the fine movement stage 28 (an example of the object holding member) that is induced in the X-axis direction and/or the Y-axis direction by the coarse movement stage 26 with a predetermined stroke And guiding one of the movements of the fine movement stage 21 along the XY plane to the step guide 30 (exemplary aspects of the first guiding member and the second guiding member).

One of the pair of bottom frames 22 is provided on the +X side of the +X side substrate stage 18, and the other side is disposed on the -X side of the -X side substrate stage 18, and is spaced apart from the substrate stage 18 by a predetermined distance ( In the state of separation on vibration) Placed on the ground 11 of the clean room. The pair of bottom frames 22 support the vicinity of both end portions in the longitudinal direction of the X-pillars 24, which will be described later, from below, and function as a guide member when the X-pillars 24 are moved in the Y-axis direction by a predetermined length. As shown in FIG. 3, a magnet unit 21a (Y stator) including a plurality of permanent magnets arranged at predetermined intervals in the Y-axis direction is fixed to both side faces of the bottom frame 22. Further, a Y linear guide 23a which is an element of the Y linear guide 23 is fixed to the upper end surface (+Z side end portion) of the bottom frame 22.

The X-pillar 24 is composed of a member extending in a YZ cross-sectional rectangle (see FIG. 1) in the X-axis direction. On the lower surface in the vicinity of both end portions in the longitudinal direction of the X-pillar 24, a member having an inverted U-shape in the XZ cross section called the Y bracket 25 is fixed corresponding to the pair of bottom frames 22. The bottom frame 22 is inserted between one of the opposing faces of the Y bracket 25. On the top surface of the Y bracket 25, a Y sliding member 23b which constitutes the Y linear guide 23 together with the Y linear guide 23a is fixed. The Y sliding member 23b is slidably engaged with the corresponding Y linear guide 23a with low friction, and the X-pillar 24 is movable on the pair of bottom frames 22 with a predetermined stroke with low friction in the Y-axis direction.

Further, a coil unit 21b (X mover) constituting the Y linear motor 21 together with the magnet unit 21a is fixed to one of the opposite faces of the Y bracket 25. The X column 24 is driven in the Y-axis direction by the Y linear motor 21 on the pair of bottom frames 22. Further, the type of the Y actuator that drives the X-pillar 24 is not limited thereto, and for example, a feed screw device, a belt drive device, a wire drive device, or the like can be used.

The Z position below the X-pillar 24 is set to be on the +Z side of the upper end of the Y linear guide 27a, and the X-pillar 24 and the substrate stage 18 are as shown in FIG. The device body is separated on vibration. Further, an auxiliary bottom frame that supports the central portion in the longitudinal direction of the X-pillar 24 from below may be disposed between the pair of substrate stages 18.

Further, on the X-pillar 24, as shown in Fig. 2, the X linear guide 29a, which is an element of the X linear guide 29, is fixed at, for example, two at a predetermined interval in the X-axis direction. Further, a magnet unit 31a (X stator) including a plurality of permanent magnets arranged at predetermined intervals in the X-axis direction is fixed to both side faces of the X-pillar 24.

The coarse movement stage 26 is composed of a rectangular parallelepiped member, and a plurality of X sliding members 29b constituting the X linear guide 29 together with the X linear guide 29a are fixed to the lower surface thereof. As shown in FIG. 3, the X sliding member 29b is provided with, for example, two at a predetermined interval in the X-axis direction of one X linear guide 29a. The X sliding member 29b is slidably engaged with the corresponding X linear guide 29a with low friction, and the coarse movement stage 26 is movable on the X-pillar 24 with a predetermined stroke with low friction in the X-axis direction.

Further, on both side faces of the coarse movement stage 26, a coil unit 31b which constitutes the X linear motor 31 for driving the coarse movement stage 26 in the X-axis direction with the magnet stage 31a is fixed via the mounting plate 32 ( X can move).

The coarse movement stage 26 is restricted from moving relative to the X-axis 24 in the Y-axis direction by the Y linear guide device 29, and moves integrally with the X-pillar 24 in the Y-axis direction. That is, the coarse movement stage 26 and the X-pillar 24 constitute a gantry type double-axis stage apparatus. The Y position information of the X-column 24 and the X position information of the coarse movement stage 26 are respectively obtained by, for example, a linear encoder system (or an optical interferometer system) not shown.

Each of the pair of step guides 30 is mounted on a pair of substrate stages gantry 18 as shown in FIG. Each of the pair of step guides 30 is formed of a member having a rectangular cross section (see FIG. 1) extending in the YZ direction in the X-axis direction, and is disposed in parallel with each other at a predetermined interval in the Y-axis direction. The X-pillars 24 are inserted between the pair of step guides 30 through a predetermined gap. The length direction (X-axis direction) of the step guide 30 is set to be slightly shorter than the X-pillar 24, and the width direction (Y-axis direction) is set to be slightly wider than the X-pillar 24. The flatness of the upper surface of the step guide 30 is made very high.

Below the step guide 30, as shown in Fig. 1, a plurality of Y sliding members 27b constituting the Y linear guide 27 together with the Y linear guide 27a are fixed. The Y sliding member 27b is provided with, for example, two at a predetermined interval in the Y-axis direction of one Y linear guide 27a. The Y sliding member 27b is slidably engaged with the corresponding Y linear guide 27a with low friction, and the step guide 30 can be moved on the pair of substrate stages 18 with a predetermined stroke with low friction in the Y-axis direction.

Each of the pair of step guides 30 is mechanically coupled to the X-pillar 24 through the coupling device 34 in the vicinity of both end portions in the longitudinal direction as shown in FIG. 2 . The connecting device 34 includes a rod-shaped member extending in the Y-axis direction and a sliding device (for example, a ball joint) attached to both end portions of the rod-shaped member, and is mounted on the X-pillar 24 and the step guide 30 through the sliding device. between. The rigidity of the rod-shaped member in the Y-axis direction is set to be high.

In the substrate stage device 20, the X column 24 is driven in one of the Y-axis directions (for example, +Y) by a plurality of Y linear motors 21 (not shown in Fig. 2, see Fig. 3). The step guide 30 on the other side of the axial direction (for example, the -Y side) is pulled by the X-pillar 24 through the coupling device 34, and is in the Y-axis direction. The step guide 30 on one side (for example, the +Y side) is pressed against the X-pillar 24 through the coupling device 34. Thereby, the pair of step guides 30 and the X-pillars 24 move integrally in the Y-axis direction.

Returning to Fig. 1, the fine movement stage 28 is constituted by a box-shaped member having a rectangular shape in plan view, and a substrate holder 36 is fixed thereon. On the Y-side side of the fine movement stage 28, a Y-bar mirror 40y having a reflection surface orthogonal to the Y-axis is fixed through the mirror base 38, on the side of the -X side of the fine movement stage 28, as shown in FIG. An X-bar mirror 40x having a reflecting surface orthogonal to the X-axis is fixed through the mirror base 38. In addition, in FIG. 2, in order to avoid that the illustration is too complicated, illustration of the substrate holder 36, the mirror base 38, the Y-bar mirror 40y, and the X-bar mirror 40x (refer FIG. 1 and FIG.

In the vicinity of the four corners below the fine movement stage 28, reinforcing blocks 42 are respectively attached as shown in FIG. Further, below the reinforcing block 42, an air bearing 44 is attached as shown in FIG. Returning to Fig. 2, for example, the gas ejection faces (bearing faces) of the two air bearings 44 on the +Y side face the step guides 30 on the +Y side, and the gas ejection faces of the two air bearings 44 on the -Y side, for example. Opposite the step guide 30 on the -Y side. For example, four air bearings 44 each spray a pressurized gas (e.g., air) onto the corresponding step guide 30. The fine movement stage 28 is suspended on the pair of step guides 30 by a small gap by the gas static pressure supplied between the air bearing 44 and the step guide 30. Further, the arrangement and the number of the air bearings 44 are not particularly limited as long as the fine movement stage 28 can be suspended in a stable state on the pair of step guides 30.

The fine movement stage 28 is driven by the coarse movement stage 26 by the fine movement stage drive system including a plurality of voice coil motors, and is driven in the X-axis direction and/or the Y-axis direction. move. For a plurality of voice coil motors, as shown in FIG. 2, for example, two X-coil motors 46x which generate a stacking force in the X-axis direction and, for example, two Y-coil motors 46y are included. For example, two X-coil motors 46x are disposed on the +Y side of the fine movement stage 28, and the other side is disposed on the -Y side of the fine movement stage 28, for example, two Y-coil motors 46y, and one of them is disposed on the micro-motion load. The +X side of the stage 28 and the other side are disposed on the -X side of the fine movement stage 28.

The configuration of the plurality of voice coil motors described above is the same except for the arrangement. Therefore, the X-coil motor 46x disposed on the +Y side of the fine movement stage 28 will be described below. As shown in FIG. 1, the X voice coil motor 46x includes an X stator 46a fixed to the +Y side surface of the coarse movement stage 26 and an X movable member 46b fixed to the lower side of the fine movement stage 28. The X stator 46a has a coil unit (not shown). The X movable member 46b is formed in a U-shaped U-shaped cross section, and a permanent magnet is fixed to a pair of opposing faces. The coil unit of the X stator 46a is inserted between the pair of permanent magnets through a predetermined gap. Further, although the X voice coil motor 46x of the present embodiment is of a magnetic type, it may be a moving coil type.

When the substrate stage device 20, for example, the coarse movement stage 26 moves in the X-axis direction along the X-pillar 24 with a long stroke, it controls the thrust in the X-axis direction generated by, for example, two X-coil motors 46x (Lorentz force) ) so that the fine movement stage 28 moves in the same direction and at the same speed as the coarse movement stage 26. Further, when the X-pillar 24 is moved in the Y-axis direction with a long stroke, for example, the thrust in the Y-axis direction generated by the two Y-coil motors 46y is controlled so that the fine movement stage 28 and the X-pillar 24 (that is, the coarse motion) The stage 26) moves in the same direction and at the same speed. Thereby, the coarse movement stage 26 and the fine movement stage 28 integrally move along the XY plane with a long stroke.

Also, the fine movement stage 28 is made by, for example, two X voice coil motors 46x (or For example, the thrust directions of the two Y-coil motors 46y) are opposite to each other, and are relatively slightly driven in the θ z direction with respect to the coarse movement stage 26. When the fine movement stage 28 is induced by the coarse movement stage 26 and driven in the X-axis direction by a long stroke, it is appropriately driven by the micro-axis in the Y-axis direction and/or the θ z direction.

In the liquid crystal exposure apparatus 10 (see FIG. 1) configured as described above, the mask M is mounted on the mask stage 14 by a mask loader (not shown) under the management of a main control unit (not shown). The substrate P is placed on the substrate holder 36 by a substrate loader (not shown). Thereafter, the main control device performs alignment measurement using an alignment detecting system (not shown), and after the alignment measurement is completed, the stepwise scanning mode exposure operation is sequentially performed on the plurality of irradiation regions set on the substrate P. . Further, since this exposure operation is the same as the exposure operation of the conventional step-and-scan method, detailed description thereof will be omitted.

For example, during the scanning exposure operation during the exposure operation of the step-and-scan method, in the substrate stage device 20, the fine movement stage 28 holding the substrate P through the substrate holder 36 is driven in a long stroke in the X-axis direction. The length direction (X-axis direction) of the step guide 30 is set to be slightly longer than the movable distance of the micro-motion stage 28 in the X-axis direction, and the fine movement stage 28 moves integrally with the coarse movement stage 26 in the X-axis direction. It moves on a pair of step guides 30. Further, when the fine movement stage 28 performs the stepping operation in the Y-axis direction, it moves integrally with the coarse movement stage 26, the X-pillar 24, and the pair of step guides 30 in the Y-axis direction. Therefore, the fine movement stage 28 does not fall off from the pair of step guides 30.

According to the substrate stage device 20 of the present embodiment described above, since the fine movement stage 28 is mounted on the pair of step guides 30 in a non-contact state, the fine movement stage 28 can be driven (induced) with a small thrust. X-axis and / or Y-axis to. Further, since the position control of the fine movement stage 28 is improved, high-precision exposure can be performed. Further, since the vibration and the reaction force from the outside of the fine movement stage 28 are suppressed, the position of the fine movement stage 28 can be controlled with high precision.

Further, since the pair of step guides 30 covers the movable range of the fine movement stage 28 in the X-axis direction and moves integrally with the fine movement stage 28 in the Y-axis direction, the substrate stage device 20 does not need to be sufficiently covered. A wide area of the guide member (e.g., the fixed plate) of the fine movement stage 28 in the full range of movement in the XY plane. Therefore, the cost is low and transportation and assembly are easy.

Further, since the magnet unit 21a (Y stator), which is an element of the Y linear motor 21 for driving the X column 24, is separated from the substrate stage 18 by vibration, the driving reaction force and vibration when the X column 24 is driven can be suppressed. It is transmitted to the projection optical system 16 or the like supported by the apparatus body.

Further, the configuration of the embodiment described above can be changed as appropriate. For example, a Z-tilt actuator may be disposed between the fine movement stage 28 and the substrate holder 36 or between the reinforcement block 42 and the fine movement stage 28 to control the Z-axis direction of the substrate P, the θ x direction, and θ y . The position of the direction. Further, the X-pillars 24 may be disposed in plural between the pair of step guides 30.

Further, in the above-described embodiment, the step guide 30 is pulled by the X-pillar 24 and moved in the Y-axis direction. However, the present invention is not limited thereto. For example, a pair of step guides 30 may be used by an actuator such as a linear motor. The X-pillars 24 are driven independently. In this case, as the stator for driving the linear motor of the pair of step guides 30, the Y stator 21a (refer to FIG. 3) fixed to the bottom frame 22 may be used.

Further, in the above embodiment, the plurality of Y lines are formed by the X column 24 The motor 21 is driven in the Y-axis direction and the pair of step guides 30 and the X-pillar 24 are integrally moved in the Y-axis direction. However, the present invention is not limited thereto, and the pair of step guides 30 are actuated by an actuator (for example, a linear motor). It is driven in the Y-axis direction, and the X-pillar 24 is moved in the Y-axis direction (even if the actuator for driving the X-pillar 24 is not provided).

Further, in the above embodiment, the fine movement stage 28 is non-contactly supported by the pair of step guides 30 from the lower side through the plurality of air bearings 44, but the fine movement may be transmitted through the rolling elements (for example, the balls) in a contact state. The stage 28 is mounted on the step guide 30.

Further, the pair of step guides 30 may be physically (mechanically) coupled (although not in opposition to the X-pillars 24). In this case, after one of the step guides 30 is pulled by the X-pillars 24, since the other stepping guides 30 are also integrally moved, for example, as long as the X-pillars 24 only pull (or press) one of the stepping guides 30 can be.

Further, the illumination light may be ultraviolet light such as ArF excimer laser light (wavelength: 193 nm), KrF excimer laser light (wavelength: 248 nm), or vacuum ultraviolet light such as F ₂ laser light (wavelength: 157 nm). Further, as the illumination light, for example, a single-wavelength laser light of an infrared band or a visible light band emitted from a DFB semiconductor laser or a fiber laser may be used, for example, an optical fiber amplifier doped with germanium (or both germanium and germanium). The amplitude is converted to the harmonics of ultraviolet light using nonlinear optical crystallization. Further, a solid laser (wavelength: 355 nm, 266 nm) or the like can also be used.

Further, in the above embodiment, the case of the multi-lens projection optical system 16 including a plurality of projection optical units has been described. However, the number of projection optical units is not limited thereto, and may be one or more. In addition, It is not limited to the multi-lens type projection optical system, and may be, for example, a projection optical system using an OFNER type large-sized mirror. Further, in the above-described embodiment, the case where the projection magnification is equal to the magnification is described as the projection optical system 16. However, the present invention is not limited thereto, and the projection optical system may be either a reduction system or an amplification system.

Further, although a light-transmitting type mask in which a predetermined light-shielding pattern (or a phase pattern or a light-reducing pattern) is formed on a light-transmitting mask substrate is used, it is also possible to use, for example, US Pat. No. 6,778,257. An electronic reticle (variable shaping reticle) for forming a transmissive pattern or a reflective pattern or an illuminating pattern according to an electronic material of a pattern to be exposed, for example, using a non-emissive type image display element (also referred to as spatial light modulation) A variable-mold mask of a DMD (Digital Micro-mirror Device) of one type.

Further, as an exposure apparatus, a substrate having a size (including at least one of an outer diameter, a diagonal length, and one side) of 500 mm or more, and a large substrate for a flat panel display (FPD) such as a liquid crystal display element is exposed as an exposure target. The device is especially effective.

Further, the exposure apparatus can also be applied to an exposure apparatus of a step & repeat method and an exposure apparatus of a step & stitch type. Further, the object held by the moving body device is not limited to the substrate or the like of the object to be exposed, and may be a pattern holder such as a mask (original plate).

Further, the use of the exposure apparatus is not limited to a liquid crystal exposure apparatus for transferring a liquid crystal display element pattern to a square glass plate, and can be widely applied to, for example, an exposure apparatus for semiconductor manufacturing, for manufacturing a thin film magnetic head, a micromachine, and DNA. An exposure device such as a wafer. In addition, not only the semiconductor components, etc. The present invention can also be applied to transfer a circuit pattern to a glass substrate or twin crystal for manufacturing a photomask or a reticle for a light exposure device, an EUV exposure device, an X-ray exposure device, and an electron beam exposure device. Exposure device such as a circle. Further, the object to be exposed is not limited to a glass plate, and may be another object such as a wafer, a ceramic substrate, a film member, or a mask blank. In the case where the object to be exposed is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and for example, a film-like member having a flexible sheet member is also included.

An electronic component such as a liquid crystal display element (or a semiconductor element) is manufactured by the following steps, that is, a step of performing a function of a device, a performance design, a step of fabricating a photomask (or a reticle) according to the design procedure, and manufacturing. a step of transferring a pattern of a photomask (reticle) to a lithography step of a glass substrate according to the exposure apparatus and the exposure method of the above embodiments, and developing the exposed glass substrate The developing step, an etching step of removing the exposed portion of the portion other than the portion where the resist remains by etching, a resist removing step for removing the resist which is not required for the etching end, a component assembling step, an inspection step, and the like. In this case, in the lithography step, since the exposure method is performed by using the exposure apparatus of the above-described embodiment, the element pattern is formed on the glass substrate, so that a high-complexity element can be manufactured with good productivity.

Industrial availability

As explained above, the moving body device of the present invention is adapted to drive the object holding member holding the object in a two-dimensional plane parallel to the horizontal plane. Further, the exposure apparatus of the present invention exposes an object. Further, the method of manufacturing a flat panel display of the present invention is suitable for the manufacture of a flat panel display. Moreover, the component manufacturing of the present invention The method is suitable for the manufacture of microcomponents.

10‧‧‧Liquid exposure device

11‧‧‧

12‧‧‧Lighting

14‧‧‧Photomask stage

16‧‧‧Projection Optics

18‧‧‧Substrate carrier

19‧‧‧Anti-vibration device

20‧‧‧Substrate stage device

21‧‧‧Micro-motion stage

21a‧‧‧Magnetic unit

21b‧‧‧ coil unit

22‧‧‧ bottom frame

23‧‧‧Y linear guide

23a‧‧‧Y linear guide

23b‧‧‧Y sliding member

24‧‧‧X column

25‧‧‧Y bracket

26‧‧‧ coarse moving stage

27‧‧‧Y linear guide

27a‧‧‧Y linear guide

27b‧‧‧Y sliding member

28‧‧‧Micro-motion stage

29‧‧‧Y linear guide

29a‧‧‧X linear guide

29b‧‧‧X sliding member

30‧‧‧Step guides

31‧‧‧X linear motor

31a‧‧‧Magnetic unit

31b‧‧‧ coil unit

32‧‧‧Installation board

34‧‧‧Linking device

36‧‧‧Substrate holder

38‧‧‧Mirror base

40x‧‧‧X rod mirror

40y‧‧‧Y rod mirror

42‧‧‧ reinforcement block

44‧‧‧Air bearing

46a‧‧X fixer

46b‧‧‧X movable

46x‧‧‧X voice coil motor

46y‧‧‧Y voice coil motor

IL‧‧‧Lights

M‧‧‧Photo Mask

P‧‧‧Substrate

Fig. 1 is a view schematically showing the configuration of a liquid crystal exposure apparatus of an embodiment.

Fig. 2 is a plan view showing a substrate stage device included in the liquid crystal exposure apparatus of Fig. 1.

Figure 3 is a cross-sectional view taken along line -B of Figure 2.

10‧‧‧Liquid exposure device

11‧‧‧

12‧‧‧Lighting

14‧‧‧Photomask stage

16‧‧‧Projection Optics

18‧‧‧Substrate carrier

19‧‧‧Anti-vibration device

20‧‧‧Substrate stage device

24‧‧‧X column

26‧‧‧ coarse moving stage

27‧‧‧Y linear guide

27a‧‧‧Y linear guide

27b‧‧‧Y sliding member

28‧‧‧Micro-motion stage

29‧‧‧Y linear guide

29a‧‧‧X linear guide

29b‧‧‧X sliding member

30‧‧‧Step guides

31‧‧‧X linear motor

31a‧‧‧Magnetic unit

31b‧‧‧ coil unit

32‧‧‧Installation board

34‧‧‧Linking device

36‧‧‧Substrate holder

38‧‧‧Mirror base

42‧‧‧ reinforcement block

44‧‧‧Air bearing

46a‧‧X fixer

46b‧‧‧X movable

46x‧‧‧X voice coil motor

IL‧‧‧Lights

M‧‧‧Photo Mask

P‧‧‧Substrate

Claims (12)

A moving body device comprising: a first moving body movable in a first direction in a two-dimensional plane parallel to a horizontal plane; and a second moving body provided in the first moving body and capable of being the first The moving body moves together at a position along the first direction, and is movable relative to the first moving body at a position in a second direction orthogonal to the first direction in the two-dimensional plane; the object holding member holds the object The second guiding member is moved along the two-dimensional plane by the second moving body; the first guiding member is disposed on the first moving body side in the first direction, and is supported by the object holding member in the second direction from below. The object holding member is movable in the first direction together with the object holding member in the one side region in the first direction, and the second guiding member is disposed in the first moving body in the first direction. On the other side, when the object holding member is moved from the lower side in the second direction, the object holding member is in the other side region of the first direction, and can be along the first direction together with the object holding member. mobile. The mobile device according to claim 1, wherein the object holding member is supported by the first and second guiding members in a non-contact manner. The mobile body device of claim 2, wherein the object holding member is supplied between the object holding member and the first guiding member, and between the object holding member and the second guiding member The static pressure of the gas is suspended in the first and second guiding members in a non-contact manner. The mobile device according to any one of claims 1 to 3, further comprising: the object holding member in the first and second directions with respect to the second moving body, and an axis orthogonal to the horizontal plane Micro-actuated actuator. The mobile device according to claim 4, wherein the object holding member is induced by the second movable body along the horizontal plane by a thrust generated by the actuator. The mobile device according to any one of claims 1 to 5, further comprising a connecting member that physically connects the first movable body to the first and second guiding members. An exposure apparatus comprising: the mobile body device according to any one of claims 1 to 6; and a pattern forming device that forms a predetermined pattern by using the energy beam on the object held by the object holding member. The exposure apparatus of claim 7, wherein the moving body device moves the object in the second direction with respect to the energy beam when the pattern is formed on the object. The exposure apparatus of claim 7 or 8, wherein the foregoing system is used for a substrate of a flat panel display device. The exposure apparatus of claim 9, wherein the length of the at least one side of the substrate or the diagonal length is 500 mm or more. A method of manufacturing a flat panel display, comprising: using the exposure device of claim 9 or 10 to make the object The action of exposure; and the action of developing the aforementioned object after exposure. A method of manufacturing a component, comprising: an action of exposing the object by using an exposure device of claim 7 or 8; and an action of developing the object after exposure.