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TWI576188B - Light irradiation apparatus and drawing apparatus - Google Patents

Light irradiation apparatus and drawing apparatus Download PDF

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Publication number
TWI576188B
TWI576188B TW103139889A TW103139889A TWI576188B TW I576188 B TWI576188 B TW I576188B TW 103139889 A TW103139889 A TW 103139889A TW 103139889 A TW103139889 A TW 103139889A TW I576188 B TWI576188 B TW I576188B
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Taiwan
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light
lens
light source
transmitting portions
irradiation
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TW103139889A
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Chinese (zh)
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TW201536459A (en
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古谷祥雄
小久保正彥
北村藤和
笹田正樹
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斯克林集團公司
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0905Dividing and/or superposing multiple light beams
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26Bombardment with radiation
    • H01L21/263Bombardment with radiation with high-energy radiation
    • H01L21/268Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Electromagnetism (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Laser Beam Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Recrystallisation Techniques (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)

Description

光照射裝置及描繪裝置 Light irradiation device and drawing device

本發明係關於一種光照射裝置及描繪裝置。 The present invention relates to a light irradiation device and a drawing device.

自先前起,提出有將自半導體雷射等光源出射之雷射光均勻地照射至既定之面上的技術。例如,於利用柱面透鏡陣列中之複數個透鏡將自光源部入射之雷射光分割、並藉由其他透鏡使來自複數個透鏡之光之照射區域於照射面上重疊的光照射裝置中,在光源部與柱面透鏡陣列之間設置有光程長度差產生部。於光程長度差產生部設置有複數個透光部,且穿過複數個透光部之光分別入射至複數個透鏡,該等複數個透光部相互產生較該雷射光之相干長度(可干涉距離)更長之光程長度差。藉此,能防止干涉條紋之產生,從而實現照射至照射面上之光之強度分佈之均勻化(作為此種裝置,例如參照日本專利特開昭61-169815號公報、日本專利特開2004-12757號公報、日本專利特開2006-49656號公報)。 Since the prior art, there has been proposed a technique of uniformly irradiating laser light emitted from a light source such as a semiconductor laser to a predetermined surface. For example, in a light irradiation device in which a laser beam incident from a light source portion is divided by a plurality of lenses in a cylindrical lens array, and an irradiation region of light from a plurality of lenses is superposed on an irradiation surface by another lens, An optical path length difference generating portion is provided between the light source portion and the cylindrical lens array. a plurality of light transmitting portions are disposed in the optical path length difference generating portion, and light passing through the plurality of light transmitting portions is respectively incident on the plurality of lenses, and the plurality of light transmitting portions mutually generate a coherence length relative to the laser light ( Interference distance) A longer optical path length difference. By this, it is possible to prevent the occurrence of the interference fringes, and to achieve the uniformity of the intensity distribution of the light that is irradiated onto the irradiation surface (for example, see Japanese Patent Laid-Open No. Sho 61-169815, Japanese Patent Laid-Open No. 2004-- Japanese Patent Publication No. 12757, Japanese Patent Laid-Open No. Hei. No. 2006-49656.

然而,就於上述光照射裝置中之照射面配置空間光調變器(spatial light modulator)、且將經空間調變之光照射至對象物而描繪圖案之描繪裝置而言,為了實現圖案描繪之高速化,需要一種可將具有均勻之強度分佈之高強度之光照射至照射面的光照射裝置。 However, in order to realize the pattern drawing, a drawing device in which a spatial light modulator is disposed on the irradiation surface of the light irradiation device and the spatially modulated light is irradiated onto the object to draw a pattern is used. In order to increase the speed, a light irradiation device that can irradiate light having a uniform intensity distribution with high intensity to the irradiation surface is required.

本發明適於光照射裝置,其目的在於提供一種可將具有 均勻之強度分佈之高強度之光照射至加以照射面的光照射裝置。 The present invention is suitable for a light irradiation device, and its object is to provide a A high-intensity light having a uniform intensity distribution is irradiated to the light irradiation device to be irradiated.

本發明之光照射裝置係具備有:光源單元,其具有排列 在一個面上之複數個光源部,且上述複數個光源部係沿著上述面而自不同之方向朝向既定位置使雷射光進行出射;及照射光學系統,其配置在上述既定位置,且將來自上述光源單元之雷射光沿著光軸加以導引至照射面;上述照射光學系統係具備有:分割透鏡部,其具有複數個透鏡,且藉由上述複數個透鏡將自上述複數個光源部所入射之光加以分割,該等複數個透鏡係排列在垂直於上述光軸且沿著上述面之方向;光程長度差產生部,其具有複數個透光部,且穿過上述複數個透鏡之光則分別入射至上述複數個透光部,該等複數個透光部係排列在垂直於上述光軸之方向並且具有相互不同之光程長度;及聚光透鏡部,其於上述雷射光之路徑中配置在較上述光程長度差產生部為更靠上述照射面側,且使來自上述複數個透光部之光之照射區域在上述照射面上產生重疊。 The light irradiation device of the present invention is provided with: a light source unit having an arrangement a plurality of light source sections on one surface, wherein the plurality of light source sections emit laser light from different directions toward a predetermined position along the surface; and the illumination optical system is disposed at the predetermined position and is to be from the predetermined position The laser light of the light source unit is guided to the irradiation surface along the optical axis, and the illumination optical system includes a split lens unit having a plurality of lenses, and the plurality of light source units are used by the plurality of light sources The incident light is divided, the plurality of lens systems are arranged in a direction perpendicular to the optical axis and along the surface; the optical path length difference generating portion has a plurality of light transmitting portions and passes through the plurality of lenses The light is incident on the plurality of light transmitting portions, respectively, the plurality of light transmitting portions are arranged in a direction perpendicular to the optical axis and have mutually different optical path lengths; and the collecting lens portion is in the path of the laser light The light path length difference generating portion is disposed on the irradiation surface side, and the light irradiation region from the plurality of light transmitting portions is disposed on the irradiation surface Overlap.

根據本發明,可將具有均勻之強度分佈之高強度之光加 以照射至照射面。 According to the present invention, high intensity light having a uniform intensity distribution can be added To illuminate the illuminated surface.

於本發明之一較佳之形態中,光照射裝置係更進一步具 備有中間變倍部,該中間變倍部係配置在上述分割透鏡部與上述光程長度差產生部之間,並且構成擴大光學系統。於此情形時,較佳為,上述中間變倍部係構成兩側遠心光學系統。更佳為上述中間變倍部係在上述複數個透光部之內部或附近,將上述複數個透鏡之出射面之像加以形成。 In a preferred form of the invention, the light illumination device further has The intermediate magnification changing unit is disposed between the divided lens unit and the optical path length difference generating unit, and constitutes an enlarged optical system. In this case, it is preferable that the intermediate magnification portion constitutes a bilateral telecentric optical system. More preferably, the intermediate magnification portion is formed by forming an image of the exit surface of the plurality of lenses in or near the plurality of light transmitting portions.

於本發明之另一較佳之形態中,上述照射光學系統係更 進一步具備有反射部,該反射部係使透過上述光程長度差產生部而自 上述複數個透光部之複數個出射面所出射之光產生折回,並且分別入射至上述複數個出射面。於此情形時,較佳為,上述反射部係使自上述複數個出射面所出射之光以平行於上述光之出射方向之方式分別入射至上述複數個出射面。 In another preferred form of the invention, the illumination optical system is further Further, the reflector further includes a reflection portion that transmits the optical path length difference generating portion The light emitted from the plurality of exit surfaces of the plurality of light transmitting portions is folded back and incident on the plurality of exit surfaces. In this case, it is preferable that the reflection portion causes the light emitted from the plurality of emission surfaces to enter the plurality of emission surfaces so as to be parallel to the emission direction of the light.

於本發明之又一較佳之形態中,使上述分割透鏡部與上 述光程長度差產生部以相互接近之方式加以配置,且於上述複數個透光部之排列方向上,自上述複數個透光部之各者之出射面所出射之光的寬度係小於上述複數個透光部之間距。 In still another preferred embodiment of the present invention, the split lens portion and the upper portion are The optical path length difference generating portions are arranged to be close to each other, and the width of the light emitted from the exit surface of each of the plurality of light transmitting portions is smaller than the above in the direction in which the plurality of light transmitting portions are arranged The distance between the plurality of light transmitting portions.

本發明亦適用於描繪裝置。本發明之描繪裝置係具備 有:上述光照射裝置;空間光調變器,其配置在上述光照射裝置中之上述照射面;投影光學系統,其將藉由上述空間光調變器而經空間調變之光加以導引至對象物上;移動機構,其針對上述經空間調變之光之在上述對象物上之照射位置進行移動;及控制部,其以同步於藉由上述移動機構而進行之上述照射位置之移動的方式控制上述空間光調變器。 The invention is also applicable to a rendering device. The drawing device of the present invention is provided The light irradiation device; the spatial light modulator disposed on the illumination surface of the light illumination device; and the projection optical system for guiding the spatially modulated light by the spatial light modulator a moving mechanism that moves the irradiation position of the spatially modulated light on the object; and a control unit that synchronizes with the movement of the irradiation position by the moving mechanism The way to control the above spatial light modulator.

上述目的及其他目的、特徵、態樣以及優點可參照隨附之圖式,且藉由以下進行之本發明之詳細說明而瞭解。 The above and other objects, features, aspects and advantages of the present invention will become apparent from the accompanying drawings.

1‧‧‧描繪裝置 1‧‧‧Drawing device

4‧‧‧光源部 4‧‧‧Light source department

5、5a‧‧‧照射光學系統 5, 5a‧‧‧ illumination optical system

9‧‧‧基板 9‧‧‧Substrate

11‧‧‧控制部 11‧‧‧Control Department

21‧‧‧平台 21‧‧‧ platform

22‧‧‧移動機構 22‧‧‧Mobile agencies

31、31a‧‧‧光照射裝置 31, 31a‧‧‧Lighting device

32‧‧‧空間光調變器 32‧‧‧Space light modulator

33‧‧‧投影光學系統 33‧‧‧Projection optical system

39‧‧‧反射鏡 39‧‧‧Mirror

40‧‧‧光源單元 40‧‧‧Light source unit

41‧‧‧光源 41‧‧‧Light source

42‧‧‧準直透鏡 42‧‧‧ Collimating lens

43‧‧‧稜鏡 43‧‧‧稜鏡

44、45、632a、632b‧‧‧柱面透鏡 44, 45, 632a, 632b‧‧ ‧ cylindrical lens

44a‧‧‧球面透鏡 44a‧‧‧Spherical lens

46‧‧‧空間濾波器 46‧‧‧ Spatial Filter

50‧‧‧照射區域 50‧‧‧ illuminated area

53、54、332、333、643、644、657‧‧‧透鏡 53, 54, 332, 333, 643, 644, 657‧ ‧ lenses

55‧‧‧偏光分光器 55‧‧‧Polarized beam splitter

56‧‧‧1/4波長板 56‧‧‧1/4 wavelength plate

61‧‧‧光程長度差產生部 61‧‧‧ Optical path length difference generation unit

62‧‧‧分割透鏡部 62‧‧‧ split lens section

63‧‧‧聚光透鏡部 63‧‧‧Concentrating lens unit

64a‧‧‧中間變倍部 64a‧‧‧Intermediate zoom

65‧‧‧反射部 65‧‧‧Reflection Department

320‧‧‧照射面 320‧‧‧ illuminated surface

331‧‧‧遮光板 331‧‧ ‧ visor

334‧‧‧光圈板 334‧‧‧ aperture plate

335‧‧‧聚焦透鏡 335‧‧‧focus lens

461‧‧‧狹縫 461‧‧‧slit

610‧‧‧透光部 610‧‧‧Transmission Department

611、612‧‧‧(透光部之)出射面 611, 612‧‧‧ (transmission section) exit surface

613‧‧‧反射鏡(反射面) 613‧‧‧Mirror (reflecting surface)

620、620a‧‧‧元件透鏡 620, 620a‧‧‧ component lens

621‧‧‧第1透鏡面 621‧‧‧1st lens surface

622‧‧‧第2透鏡面 622‧‧‧2nd lens surface

631‧‧‧聚光透鏡 631‧‧‧ Concentrating lens

651a‧‧‧反射膜 651a‧‧·Reflective film

658‧‧‧直角稜鏡 658‧‧‧right angle

658a、658b‧‧‧直角稜鏡之面 658a, 658b‧‧‧ 直角稜鏡

ds‧‧‧分割透鏡部之第2透鏡面與光程長度差產生部之入射面之間的間隙之Z方向上之寬度 d s ‧ ‧ Width of the gap in the Z direction between the second lens surface of the split lens portion and the incident surface of the optical path length difference generating portion

fc、fL‧‧‧柱面透鏡之焦距 f c , f L ‧‧‧ focal length of cylindrical lens

J0、J1‧‧‧光軸 J0, J1‧‧‧ optical axis

Lh‧‧‧元件透鏡之Z方向之長度 L h ‧‧‧The length of the Z-direction of the component lens

p‧‧‧元件透鏡(及透光部)之排列間距 P‧‧‧ arrangement spacing of component lenses (and light-transmitting parts)

po‧‧‧非有效區域之X方向之寬度 p o ‧‧‧width of the non-effective area in the X direction

p'‧‧‧有效區域之X方向之寬度 P'‧‧‧ width of the effective area in the X direction

ts‧‧‧透光部之最大長度 t s ‧‧‧Maximum length of the light transmission section

tso‧‧‧於X方向上相互鄰接之2個透光部之Z方向之長度之差 t so ‧‧‧ the difference between the lengths of the two light-transmitting portions adjacent to each other in the X direction

wh‧‧‧所有自光源部入射至各元件透鏡之光的第2透鏡面上之X方向之寬度 w h ‧‧‧the width of the X-direction on the second lens surface of the light incident on the lens of each element from the light source portion

ws‧‧‧Z方向之長度最大之透光部之出射面上的光束之X方向之寬度 w s ‧‧‧ The width of the beam in the X direction on the exit surface of the light-transmitting portion with the largest length in the Z direction

θi‧‧‧入射角(最大入射角) θ i ‧‧‧incident angle (maximum incident angle)

θd‧‧‧穿過聚光點之光之發散角(半角) θ d ‧‧‧ divergence angle (half angle) of light passing through the concentrating point

θ'd‧‧‧光程長度差產生部之內部之光之發散角(半角) θ' d ‧‧‧ divergence angle (half angle) of the light inside the optical path length difference generating portion

圖1係表示第1實施形態之描繪裝置之構成的圖。 Fig. 1 is a view showing the configuration of a drawing device according to the first embodiment.

圖2係表示光照射裝置之構成之圖。 Fig. 2 is a view showing the configuration of a light irradiation device.

圖3係表示光照射裝置之構成之圖。 Fig. 3 is a view showing the configuration of a light irradiation device.

圖4係表示分割透鏡部及光程長度差產生部之一部分之圖。 4 is a view showing a part of a split lens unit and an optical path length difference generating unit.

圖5係表示照射面上之光之強度分佈的圖。 Fig. 5 is a view showing the intensity distribution of light on the irradiation surface.

圖6係表示光照射裝置之另一例之圖。 Fig. 6 is a view showing another example of the light irradiation device.

圖7係表示光照射裝置之另一例之圖。 Fig. 7 is a view showing another example of the light irradiation device.

圖8A係表示照射面上之光之強度分佈的圖。 Fig. 8A is a view showing the intensity distribution of light on the irradiation surface.

圖8B係表示光照射裝置之另一例之圖。 Fig. 8B is a view showing another example of the light irradiation device.

圖9係表示第2實施形態之光照射裝置之構成的圖。 Fig. 9 is a view showing the configuration of a light irradiation device according to a second embodiment.

圖10係表示第2實施形態之光照射裝置之構成的圖。 Fig. 10 is a view showing the configuration of a light irradiation device according to a second embodiment.

圖11係表示分割透鏡部之附近之圖。 Fig. 11 is a view showing the vicinity of a split lens unit.

圖12係表示光照射裝置之另一例之圖。 Fig. 12 is a view showing another example of the light irradiation device.

圖13係表示光照射裝置之另一例之圖。 Fig. 13 is a view showing another example of the light irradiation device.

圖14係表示光照射裝置之另一例之圖。 Fig. 14 is a view showing another example of the light irradiation device.

圖15係表示光照射裝置之另一例之圖。 Fig. 15 is a view showing another example of the light irradiation device.

圖16係表示光程長度差產生部之另一例之圖。 Fig. 16 is a view showing another example of the optical path length difference generating portion.

圖17係表示光照射裝置之另一例之圖。 Fig. 17 is a view showing another example of the light irradiation device.

圖18係表示光照射裝置之另一例之圖。 Fig. 18 is a view showing another example of the light irradiation device.

圖1係表示本發明之第1實施形態之描繪裝置1之構成的圖。描繪裝置1係對表面被賦予有感光材料之半導體基板或玻璃基板等基板9之表面照射光束而描繪圖案的直接描繪裝置。描繪裝置1具備平台21、移動機構22、光照射裝置31、空間光調變器32、投影光學系統33、及控制部11。平台21將基板9保持,移動機構22使平台21沿著基板9之主面移動。移動機構22亦可使基板9以垂直於主面之軸為中心轉動。 Fig. 1 is a view showing the configuration of the drawing device 1 according to the first embodiment of the present invention. The drawing device 1 is a direct drawing device that draws a light beam on a surface of a substrate 9 such as a semiconductor substrate or a glass substrate to which a photosensitive material is applied, and draws a light beam. The drawing device 1 includes a stage 21, a moving mechanism 22, a light irradiation device 31, a spatial light modulator 32, a projection optical system 33, and a control unit 11. The platform 21 holds the substrate 9 and the moving mechanism 22 moves the platform 21 along the main surface of the substrate 9. The moving mechanism 22 can also rotate the substrate 9 around the axis perpendicular to the main surface.

光照射裝置31經由反射鏡39對空間光調變器32照射線狀之光。下文中將對光照射裝置31之詳細情況進行敍述。空間光調 變器32係例如繞射光柵型且為反射型,且係可變更光柵之深度的繞射光柵。空間光調變器32係利用半導體裝置製造技術而製造。本實施形態所使用之繞射光柵型之光調變器係例如GLV(grating light value柵狀光閥)(Silicon Light Machines(Sunnyvale,California)之註冊商標)。空間光調變器32具有排列成一行之複數個光柵元件,且各光柵元件係於出射1次繞射光之狀態、與出射0次繞射光(0次光)之狀態之間轉換。以此方式,自空間光調變器32出射經空間調變之光。 The light irradiation device 31 illuminates the spatial light modulator 32 with linear light via the mirror 39. The details of the light irradiation device 31 will be described below. Space light The transformer 32 is, for example, a diffraction grating type and is of a reflective type, and is a diffraction grating that can change the depth of the grating. The spatial light modulator 32 is fabricated using semiconductor device fabrication techniques. The diffraction grating type optical modulator used in the present embodiment is, for example, a GLV (grating light value grating light valve) (registered trademark of Silicon Light Machines (Sunnyvale, California)). The spatial light modulator 32 has a plurality of grating elements arranged in a line, and each of the grating elements is switched between a state in which the diffracted light is emitted once and a state in which the diffracted light is emitted 0 times (0 times of light). In this manner, spatially modulated light is emitted from spatial light modulator 32.

投影光學系統33具備遮光板331、透鏡332、透鏡333、 光圈板(diagram plate)334、及聚焦透鏡335。遮光板331將重影光及高次繞射光之一部分遮蔽,且使來自空間光調變器32之光穿過。透鏡332、333構成變焦部。光圈板334將(±1)次繞射光(及高次繞射光)遮蔽,且使0次繞射光穿過。穿過光圈板334之光藉由聚焦透鏡335而導引至基板9之主面上。以此方式,藉由空間光調變器32空間調變之光係藉由投影光學系統33而導引至基板9上。 The projection optical system 33 includes a light shielding plate 331, a lens 332, and a lens 333. A diagram plate 334 and a focus lens 335. The visor 331 partially shields the ghost light and the high-order diffracted light, and passes the light from the spatial light modulator 32. The lenses 332 and 333 constitute a varifocal portion. The aperture plate 334 shields (±1) times of diffracted light (and high-order diffracted light) and passes 0 times of diffracted light. Light passing through the aperture plate 334 is guided to the main surface of the substrate 9 by the focus lens 335. In this manner, the light that is spatially modulated by the spatial light modulator 32 is directed onto the substrate 9 by the projection optical system 33.

控制部11係連接於光照射裝置31、空間光調變器32及 移動機構22,且控制其等之構成。於描繪裝置1中,藉由移動機構22使平台21移動,而使來自空間光調變器32之光在基板9上之照射位置移動。又,控制部11與藉由移動機構22實現之該照射位置之移動同步地控制空間光調變器32。藉此,對基板9上之感光材料描繪所需圖案。 The control unit 11 is connected to the light irradiation device 31, the spatial light modulator 32, and The mechanism 22 is moved and its configuration is controlled. In the drawing device 1, the stage 21 is moved by the moving mechanism 22, and the light from the spatial light modulator 32 is moved at the irradiation position on the substrate 9. Further, the control unit 11 controls the spatial light modulator 32 in synchronization with the movement of the irradiation position by the moving mechanism 22. Thereby, the desired pattern is drawn on the photosensitive material on the substrate 9.

圖2及圖3係表示光照射裝置31之構成之圖。於圖2 及圖3中,將平行於下述照射光學系統5之光軸J1之方向作為Z方向而進行表示,將垂直於Z方向且相互正交之方向作為X方向及Y方向而進行表示(以下同樣)。圖2表示沿著Y方向觀察所得之光照射裝置 31之構成,圖3表示沿著X方向觀察所得之光照射裝置31之構成。 2 and 3 are views showing the configuration of the light irradiation device 31. Figure 2 In FIG. 3, the direction parallel to the optical axis J1 of the illumination optical system 5 is shown as the Z direction, and the direction perpendicular to the Z direction and orthogonal to each other is shown as the X direction and the Y direction (the same applies hereinafter). ). Figure 2 shows the light irradiation device observed along the Y direction The configuration of 31 shows the configuration of the light irradiation device 31 observed in the X direction.

圖2及圖3所示之光照射裝置31具備光源單元40、及 照射光學系統5。光源單元40具有複數個光源部4,各光源部4具有1個光源41、及1個準直透鏡42。複數個光源部4之光源41係於平行於ZX平面之面(以下稱為「光源排列面」)上,大致沿X方向排列。自各光源41出射之雷射光藉由準直透鏡42進行準直而入射至照射光學系統5。於光源單元40中,設置對自光源部4出射之雷射光之出射方向進行調整之機構(省略圖示)。藉由調整該機構,可使出射方向與照射來自複數個光源部4之雷射光之照射光學系統5上之分割透鏡部62的X方向與照射面320之Y方向之位置一致。如此般,於光源單元40中,藉由排列於光源排列面上之複數個光源部4,自沿著光源排列面之相互不同之方向朝向照射光學系統5上之相同位置(下述分割透鏡部62)出射雷射光。再者,於光源單元40中,複數個光源部4安裝於省略圖示之支持構件,故而可高效率地進行複數個光源41之冷卻等。 The light irradiation device 31 shown in FIGS. 2 and 3 includes a light source unit 40, and The optical system 5 is illuminated. The light source unit 40 has a plurality of light source units 4, and each of the light source units 4 has one light source 41 and one collimator lens 42. The light source 41 of the plurality of light source units 4 is arranged on a plane parallel to the ZX plane (hereinafter referred to as a "light source array surface") and is arranged substantially in the X direction. The laser light emitted from each of the light sources 41 is collimated by the collimator lens 42 and incident on the illumination optical system 5. The light source unit 40 is provided with a mechanism (not shown) for adjusting the direction in which the laser light emitted from the light source unit 4 is emitted. By adjusting this mechanism, the X direction of the split lens unit 62 on the illumination optical system 5 that irradiates the laser light from the plurality of light source units 4 and the position of the irradiation surface 320 in the Y direction can be made coincident. In the light source unit 40, the plurality of light source units 4 arranged on the light source array surface face the same position on the illumination optical system 5 from the mutually different directions along the light source array surface (the divided lens portion described below) 62) Exit the laser light. Further, in the light source unit 40, a plurality of light source units 4 are attached to a support member (not shown), so that cooling of a plurality of light sources 41 and the like can be efficiently performed.

照射光學系統5係配置於複數個光源部4之雷射光之照 射位置。照射光學系統5將該雷射光沿著光軸J1導引至作為照射面(於圖2及圖3中以標註符號320之虛線表示)之空間光調變器32之表面、即複數個光柵元件之表面。如上所述,來自光照射裝置31之光經由反射鏡39而照射至空間光調變器32,故而,實際上,光照射裝置31包含反射鏡39作為構成元件,但為圖示之方便起見,於圖2及圖3中,省略反射鏡39(以下同樣)。 The illumination optical system 5 is a photo of the laser light disposed in the plurality of light source units 4 Shoot position. The illumination optical system 5 guides the laser light along the optical axis J1 to the surface of the spatial light modulator 32, which is an illumination surface (indicated by a broken line denoted by reference numeral 320 in FIGS. 2 and 3), that is, a plurality of grating elements. The surface. As described above, the light from the light irradiation device 31 is irradiated to the spatial light modulator 32 via the mirror 39. Therefore, the light irradiation device 31 actually includes the mirror 39 as a constituent element, but it is convenient for illustration. In Fig. 2 and Fig. 3, the mirror 39 (the same applies hereinafter) is omitted.

照射光學系統5具備光程長度差產生部61、分割透鏡部 62、及聚光透鏡部63。於照射光學系統5中,自光源單元40朝向照射面320,以分割透鏡部62、光程長度差產生部61、聚光透鏡部63之順 序,沿著光軸J1配置該等構成。來自複數個光源部4之經準直之雷射光入射至分割透鏡部62。 The illumination optical system 5 includes an optical path length difference generation unit 61 and a split lens unit. 62. The condensing lens unit 63. In the illumination optical system 5, the light source unit 40 is directed toward the irradiation surface 320, and the lens portion 62, the optical path length difference generation portion 61, and the condensing lens portion 63 are compliant. In this order, the configurations are arranged along the optical axis J1. The collimated laser light from the plurality of light source sections 4 is incident on the split lens section 62.

圖4係將分割透鏡部62及光程長度差產生部61之一部 分放大而表示之圖。分割透鏡部62具備複數個透鏡620(以下稱為「元件透鏡620」),該等複數個透鏡620係以固定之間距緊密地排列於垂直於照射光學系統5之光軸J1且沿著光源排列面之方向(此處為X方向)。各元件透鏡620係於Y方向上較長之塊狀,且包含:第1透鏡面621,其係位於(-Z)側(光源單元40側)之側面;及第2透鏡面622,其係位於(+Z)側(光程長度差產生部61側)之側面。於沿著Y方向觀察之情形時,第1透鏡面621係向(-Z)側突出之凸狀,第2透鏡面622係向(+Z)側突出之凸狀。於沿著X方向觀察之情形時,各元件透鏡620之形狀為矩形(參照圖3)。如此般,元件透鏡620係僅於X方向上具有倍率之柱面透鏡,分割透鏡部62係所謂柱面透鏡陣列(或柱面蠅眼透鏡)。 4 is a part of the split lens unit 62 and the optical path length difference generating unit 61. A diagram that is enlarged and represented. The split lens unit 62 includes a plurality of lenses 620 (hereinafter referred to as "element lenses 620") which are closely arranged at a fixed interval between the optical axis J1 perpendicular to the illumination optical system 5 and arranged along the light source. The direction of the face (here in the X direction). Each of the element lenses 620 is formed in a block shape that is long in the Y direction, and includes a first lens surface 621 that is located on the side of the (-Z) side (on the side of the light source unit 40), and a second lens surface 622 that is It is located on the side of the (+Z) side (the optical path length difference generating portion 61 side). When viewed in the Y direction, the first lens surface 621 is convex toward the (-Z) side, and the second lens surface 622 is convex toward the (+Z) side. When viewed in the X direction, the shape of each element lens 620 is rectangular (refer to FIG. 3). In this manner, the element lens 620 is a cylindrical lens having a magnification only in the X direction, and the divided lens portion 62 is a so-called cylindrical lens array (or a cylindrical fly-eye lens).

第1透鏡面621及第2透鏡面622係相對於垂直於光軸 J1之面呈對稱的形狀。第1透鏡面621係配置於第2透鏡面622之焦點,第2透鏡面622係配置於第1透鏡面621之焦點。即,第1透鏡面621及第2透鏡面622之焦距相同。將第1透鏡面621及第2透鏡面622之焦距表示為fh,將元件透鏡620之折射率表示為nh,將元件透鏡620之Z方向之長度Lh表示為(fh‧nh)。入射至元件透鏡620之平行光於第2透鏡面622上聚光。再者,於必須避免由聚光導致之第2透鏡面622之損傷或劣化之情形時,元件透鏡620之Z方向之長度Lh亦可為略微自(fh‧nh)偏離之值。沿X方向積層之複數個元件透鏡620既可形成為連接為一體之構件,亦可使單獨形成之複數個元件透鏡620相互接合。 The first lens surface 621 and the second lens surface 622 are symmetrical with respect to a plane perpendicular to the optical axis J1. The first lens surface 621 is disposed at a focus of the second lens surface 622 , and the second lens surface 622 is disposed at a focus of the first lens surface 621 . In other words, the focal lengths of the first lens surface 621 and the second lens surface 622 are the same. The focal lengths of the first lens surface 621 and the second lens surface 622 are denoted by f h , the refractive index of the element lens 620 is denoted by n h , and the length L h of the element lens 620 in the Z direction is expressed as (f h ‧n h ). The parallel light incident on the element lens 620 is condensed on the second lens surface 622. Further, when it is necessary to avoid damage or deterioration of the second lens surface 622 due to condensing, the length L h of the element lens 620 in the Z direction may be a value slightly deviated from (f h ‧ n h ). The plurality of element lenses 620 laminated in the X direction may be formed as a unitary member, or a plurality of element lenses 620 formed separately may be joined to each other.

於沿著Y方向觀察之情形時,入射至分割透鏡部62之 光被複數個元件透鏡620於X方向上分割。此時,於各元件透鏡620之第1透鏡面621入射有來自各光源部4之平行光,而於第2透鏡面622之附近形成複數個光源41之像。該等像沿元件透鏡620之排列方向排列。再者,於圖4中,僅圖示出入射至1個元件透鏡620之光線。 自各光源部4出射且被複數個元件透鏡620分割之光(複數個光束)係以主光線平行於光軸J1(Z方向)之方式自第2透鏡面622出射。自各元件透鏡620出射之光束一方面擴展,一方面入射至光程長度差產生部61。 When viewed in the Y direction, it is incident on the split lens portion 62. The light is divided by the plurality of element lenses 620 in the X direction. At this time, parallel light from each light source unit 4 is incident on the first lens surface 621 of each element lens 620, and an image of a plurality of light sources 41 is formed in the vicinity of the second lens surface 622. The images are arranged in the direction in which the element lenses 620 are arranged. Furthermore, in FIG. 4, only the light rays incident on one element lens 620 are illustrated. The light (plurality of light beams) emitted from each of the light source units 4 and divided by the plurality of element lenses 620 is emitted from the second lens surface 622 such that the chief ray is parallel to the optical axis J1 (Z direction). The light beam emitted from each of the element lenses 620 is expanded on the one hand, and is incident on the optical path length difference generating portion 61 on the other hand.

光程長度差產生部61垂直於光軸J1、且具備複數個透 光部610,該等透光部610於沿著光源排列面之方向(此處為X方向)以固定之間距緊密地排列。於圖2之例中,光程長度差產生部61中之透光部610之個數僅比分割透鏡部62中之元件透鏡620之個數少1個。又,透光部610之排列間距與元件透鏡620之排列間距相等。各透光部610係(理想而言)具有垂直於X方向、Y方向及Z方向之面的塊狀。於沿X方向排成一行之複數個透光部610中,X方向及Y方向之長度相同,Z方向即沿著光軸J1之方向之長度相互不同。如此般,複數個透光部610具有相互不同之光程長度。於圖2之光程長度差產生部61中,複數個透光部610中越位於(+X)側之透光部610之Z方向之長度越小。複數個透光部610之光軸J1方向之長度未必需要沿著X方向依序變長(或變短),可為任意之凹凸形狀。於本實施形態中,光程長度差產生部61中之複數個透光部610係以相同材料形成為連接為一體之構件。於光程長度差產生部61中,亦可將單獨形成之複數個透光部610相互接合。 The optical path length difference generating portion 61 is perpendicular to the optical axis J1 and has a plurality of transparent In the light portion 610, the light transmitting portions 610 are closely arranged at a fixed distance in a direction along the light source array surface (here, the X direction). In the example of FIG. 2, the number of the light transmitting portions 610 in the optical path length difference generating portion 61 is only one less than the number of the element lenses 620 in the split lens portion 62. Further, the arrangement pitch of the light transmitting portions 610 is equal to the arrangement pitch of the element lenses 620. Each of the light transmitting portions 610 (ideally) has a block shape perpendicular to the faces of the X direction, the Y direction, and the Z direction. In the plurality of light transmitting portions 610 which are lined up in the X direction, the lengths in the X direction and the Y direction are the same, and the Z direction is different from each other in the direction along the optical axis J1. In this manner, the plurality of light transmitting portions 610 have mutually different optical path lengths. In the optical path length difference generating portion 61 of FIG. 2, the length of the light transmitting portion 610 located on the (+X) side of the plurality of light transmitting portions 610 is smaller in the Z direction. The length of the plurality of light transmitting portions 610 in the optical axis J1 direction does not necessarily need to be lengthwise (or shortened) in the X direction, and may be any irregular shape. In the present embodiment, the plurality of light transmitting portions 610 in the optical path length difference generating portion 61 are formed of the same material to be integrally connected. In the optical path length difference generating portion 61, a plurality of individually formed light transmitting portions 610 may be bonded to each other.

分割透鏡部62與光程長度差產生部61於Z方向相互接 近地配置,於X方向上,除最靠(+X)側之元件透鏡620以外之複數個元件透鏡620與複數個透光部610分別配置於相同位置。因此,穿過該等元件透鏡620之複數個光束分別入射至複數個透光部610。詳細而言,如圖4所示,自該等元件透鏡620之各者之第2透鏡面622出射之光束入射至入射面611,該入射面611係指於X方向上配置於相同位置之透光部610的(-Z)側之面。該光束透過該透光部610後自作為(+Z)側之面之出射面612出射。再者,穿過最靠(+X)側之元件透鏡620之光束不穿過任何透光部610。 The split lens portion 62 and the optical path length difference generating portion 61 are connected to each other in the Z direction. In the near-field arrangement, in the X direction, a plurality of element lenses 620 other than the element lens 620 closest to the (+X) side are disposed at the same position as the plurality of light transmitting portions 610, respectively. Therefore, a plurality of light beams that have passed through the element lenses 620 are incident on the plurality of light transmitting portions 610, respectively. Specifically, as shown in FIG. 4, the light beam emitted from the second lens surface 622 of each of the element lenses 620 is incident on the incident surface 611, and the incident surface 611 is disposed at the same position in the X direction. The surface of the light portion 610 on the (-Z) side. The light beam passes through the light transmitting portion 610 and is emitted from the exit surface 612 which is the surface on the (+Z) side. Furthermore, the light beam that passes through the element lens 620 on the most (+X) side does not pass through any of the light transmitting portions 610.

實際上,藉由使分割透鏡部62及光程長度差產生部61 滿足下述條件,從而,於X方向上,自各透光部610之出射面612出射之光束之寬度變得小於該透光部610之寬度、即透光部610之排列間距。因此,能防止或抑制該光束射到該透光部610之邊緣(即X方向之端部、主要為入射面611及出射面612之邊緣)。再者,於光程長度差產生部61中,亦可設置個數與分割透鏡部62中之元件透鏡620之個數相同的透光部610。於此情形時,穿過複數個(所有)元件透鏡620之光分別入射至複數個透光部610。 Actually, by dividing the lens portion 62 and the optical path length difference generating portion 61 The width of the light beam emitted from the exit surface 612 of each of the light transmitting portions 610 in the X direction is smaller than the width of the light transmitting portion 610, that is, the arrangement pitch of the light transmitting portions 610. Therefore, it is possible to prevent or suppress the light beam from entering the edge of the light transmitting portion 610 (i.e., the end portion in the X direction, mainly the edge of the incident surface 611 and the exit surface 612). Further, in the optical path length difference generating portion 61, the number of the light transmitting portions 610 which are the same as the number of the element lenses 620 in the split lens portion 62 may be provided. In this case, light passing through the plurality of (all) element lenses 620 is incident on the plurality of light transmitting portions 610, respectively.

如圖2及圖3所示,穿過各透光部610之光束朝向聚光 透鏡部63。聚光透鏡部63具有2個柱面透鏡632a、632b。柱面透鏡632a僅於X方向上具有倍率,且配置於自複數個元件透鏡620之第2透鏡面622向(+Z)側以其焦距fc之程度分隔的位置。換言之,各元件透鏡620之第2透鏡面622係配置於柱面透鏡632a之前側焦點位置。 又,配置於光軸J1上之照射面320係配置於自柱面透鏡632a向(+Z)側以柱面透鏡632a之焦距fc之程度而分隔的位置。即,照射面320係配置於柱面透鏡632a之後側焦點位置。柱面透鏡632b係配置於柱面 透鏡632a與照射面320之間,且僅於Y方向上具有倍率。柱面透鏡632b係配置於自照射面320向(-Z)側分隔其焦距fL之位置。 As shown in FIGS. 2 and 3, the light beam that has passed through each of the light transmitting portions 610 faces the condensing lens portion 63. The condensing lens unit 63 has two cylindrical lenses 632a and 632b. The cylindrical lens 632a having a magnification of only the X-direction, and disposed from the plurality of second lens surface of the lens element 620 of the partition 622 in its degree of the focal length f c of the (+ Z) side of the. In other words, the second lens surface 622 of each element lens 620 is disposed at the front focus position of the cylindrical lens 632a. Further, the irradiation surface 320 disposed on the axis line J1 from the cylindrical lens 632a is disposed on the (+ Z) side of the focal length of the cylindrical lenses 632a of the degree of f c and the separated position. That is, the irradiation surface 320 is disposed at the rear focus position of the cylindrical lens 632a. The cylindrical lens 632b is disposed between the cylindrical lens 632a and the irradiation surface 320, and has a magnification only in the Y direction. The cylindrical lens 632b is disposed at a position separated from the irradiation surface 320 by the focal length f L toward the (-Z) side.

如圖2所示,於沿著Y方向觀察之情形時,自複數個元 件透鏡620出射之複數個光束藉由柱面透鏡632a成為平行光,且於照射面320重疊。即,來自複數個元件透鏡620之光(即穿過複數個透光部610之複數個光束)之照射區域50全部重疊。於圖2及圖3中,以較粗之實線表示照射區域50,照射區域50於X方向上具有固定之寬度。如上所述,自複數個元件透鏡620出射之複數個光束穿過相互不同之透光部610,故而於分割透鏡部62與照射面320之間,複數個光束產生光程長度差。因此,能抑制(或防止)因被複數個元件透鏡620分割之光之干涉而於照射面320產生干涉條紋的現象。即,如圖5之上段所示,於照射面320上,X方向上之光之強度分佈變均勻。於複數個透光部610中之2個透光部610之各組合中,較佳為穿過該2個透光部610之光束之光程長度之差為自光源部4出射之雷射光之可干涉距離以上。 As shown in Figure 2, when viewing in the Y direction, the number of elements The plurality of light beams emitted from the lens 620 are parallel light by the cylindrical lens 632a, and overlap on the irradiation surface 320. That is, the illumination regions 50 from the plurality of element lenses 620 (i.e., the plurality of beams passing through the plurality of light transmitting portions 610) all overlap. In FIGS. 2 and 3, the irradiation region 50 is indicated by a thick solid line, and the irradiation region 50 has a fixed width in the X direction. As described above, since the plurality of light beams emitted from the plurality of element lenses 620 pass through the mutually different light transmitting portions 610, a plurality of light beams generate an optical path length difference between the divided lens portion 62 and the irradiation surface 320. Therefore, it is possible to suppress (or prevent) the occurrence of interference fringes on the irradiation surface 320 due to the interference of the light split by the plurality of element lenses 620. That is, as shown in the upper part of Fig. 5, the intensity distribution of the light in the X direction becomes uniform on the irradiation surface 320. In each combination of the two light transmitting portions 610 of the plurality of light transmitting portions 610, it is preferable that the difference in the optical path lengths of the light beams passing through the two light transmitting portions 610 is the laser light emitted from the light source portion 4. Can be above the interference distance.

如圖3所示,於沿著X方向觀察之情形時,自光源單元 40入射至分割透鏡部62之光係保持平行光之狀態而穿過分割透鏡部62、光程長度差產生部61及柱面透鏡632a,並被導引至柱面透鏡632b。繼而,自柱面透鏡632b出射之光於照射面320上聚光。因此,於照射面320中,來自各元件透鏡620之光之照射區域50成為沿X方向延伸之線狀。藉此,可獲得穿過複數個元件透鏡620之光之集合,即為照射面320上之剖面(即垂直於光軸J1之光束剖面,以下同樣)成為沿X方向延伸的線狀之線照明光。於圖5之下段,表示Y方向上之線照明光之強度分佈。於光照射裝置31中,2個柱面透鏡632a、632b 之功能亦可藉由1個球面透鏡實現,又,亦可將球面透鏡與柱面透鏡組合。 As shown in Figure 3, when viewed in the X direction, from the light source unit The light incident on the split lens unit 62 is maintained in parallel light and passes through the split lens unit 62, the optical path length difference generating unit 61, and the cylindrical lens 632a, and is guided to the cylindrical lens 632b. Then, the light emitted from the cylindrical lens 632b is condensed on the irradiation surface 320. Therefore, in the irradiation surface 320, the irradiation region 50 of the light from each element lens 620 has a linear shape extending in the X direction. Thereby, a set of light passing through the plurality of element lenses 620 can be obtained, that is, a cross section on the irradiation surface 320 (that is, a beam profile perpendicular to the optical axis J1, the same applies hereinafter) to become a linear line illumination extending in the X direction. Light. In the lower part of Fig. 5, the intensity distribution of the line illumination light in the Y direction is shown. In the light irradiation device 31, two cylindrical lenses 632a, 632b The function can also be realized by a spherical lens, or a spherical lens can be combined with a cylindrical lens.

如以上所說明般,於圖2之光照射裝置31中,自複數個光源部4朝向分割透鏡部62出射雷射光。藉此,相較於僅使用1個光源部4之光照射裝置,可獲得更高強度之線照明光。又,由於來自複數個光源部4之雷射光之相位相互不同,故而與藉由複數個透光部610對穿過複數個元件透鏡620之複數個光束賦予光程長度差相輔相成地,可進一步提高照射面320中之線照明光之強度分佈之均勻性。再者,根據光照射裝置31之設計,亦可藉由使照射面320略微自柱面透鏡632a之後側焦點位置偏移(散焦),而使照射面320中之干涉條紋之明部之寬度擴展,從而使線照明光中之對比度降低。 As described above, in the light irradiation device 31 of FIG. 2, the laser light is emitted from the plurality of light source units 4 toward the split lens unit 62. Thereby, higher-intensity line illumination light can be obtained as compared with the light irradiation device using only one light source unit 4. Further, since the phases of the laser light from the plurality of light source units 4 are different from each other, it is possible to further improve the optical path length difference by the plurality of light beams passing through the plurality of element lenses 620 by the plurality of light transmitting portions 610. The uniformity of the intensity distribution of the line illumination light in the illumination surface 320. Further, according to the design of the light irradiation device 31, the width of the bright portion of the interference fringe in the irradiation surface 320 may be made by slightly shifting (defocusing) the irradiation surface 320 from the rear focus position of the cylindrical lens 632a. Expanded to reduce the contrast in the line illumination.

此處,參照圖4,對更確實地防止於照射面320產生干涉條紋之條件進行說明。若將光程長度差產生部61之折射率設為ns,將於X方向上相互鄰接之2個透光部610之Z方向之長度之差設為tso,則該2個透光部610中之光程長度差Δzs以式1表示。其中,於式1中,將空氣中之折射率設為1。 Here, a condition for more reliably preventing generation of interference fringes on the irradiation surface 320 will be described with reference to FIG. 4 . When the refractive index of the optical path length difference generating portion 61 is n s and the difference between the lengths of the two light transmitting portions 610 adjacent to each other in the X direction in the Z direction is t so , the two light transmitting portions The optical path length difference Δz s in 610 is expressed by Equation 1. In the formula 1, the refractive index in the air is set to 1.

(式1)Δzs=(ns-1)‧tso (Formula 1) Δz s = (n s -1) ‧ t so

於光照射裝置31中,藉由使光程長度差Δzs為自光源部4出射之雷射光之可干涉距離Lc以上,即藉由滿足式2,從而可更確實地防止因被複數個元件透鏡620分割之光之干涉而於照射面320產生干涉條紋。 In the light irradiation device 31, by making the optical path length difference Δz s equal to or greater than the interference distance L c of the laser light emitted from the light source unit 4, that is, by satisfying Expression 2, it is possible to more reliably prevent the plurality of The interference of the light split by the element lens 620 causes interference fringes on the irradiation surface 320.

(式2)Lc≦(ns-1)‧tso (Formula 2) L c ≦(n s -1)‧t so

再者,由於穿過2個透光部610之各組合之光之光程長度之差越大則可干涉性越降低,故而即便該光程長度之差未達自光源部4出射之雷射光之可干涉距離,只要為相對較長之距離(例如可干涉距離之1/2以上),便可在某種程度上減少干涉條紋之影響。因此,可根據線照明光之強度分佈所要求之均勻性(對比度值),適當設定2個透光部610之各組合中之光程長度差。 Further, since the interference between the optical path lengths of the light passing through the respective combinations of the two light transmitting portions 610 is larger, the interference can be reduced. Therefore, even if the difference in optical path length does not reach the laser light emitted from the light source portion 4 The interference distance can be reduced to some extent by a relatively long distance (for example, 1/2 or more of the interference distance). Therefore, the optical path length difference in each combination of the two light transmitting portions 610 can be appropriately set in accordance with the uniformity (contrast value) required for the intensity distribution of the line illumination light.

且說,若穿過分割透鏡部62之各元件透鏡620之光射到光程長度差產生部61中之透光部610之邊緣(透光部610間之交界等),則該光發生散射而照射面320上之光之強度分佈之均勻性降低。因此,參照圖4,對防止自各元件透鏡620出射之光束射到透光部610之邊緣之條件進行說明。 In addition, when the light passing through each of the element lenses 620 of the split lens portion 62 is incident on the edge of the light transmitting portion 610 (the boundary between the light transmitting portions 610, etc.) in the optical path length difference generating portion 61, the light is scattered. The uniformity of the intensity distribution of the light on the illuminated surface 320 is reduced. Therefore, a condition for preventing the light beam emitted from each element lens 620 from being incident on the edge of the light transmitting portion 610 will be described with reference to FIG.

如上所述,於光照射裝置31中,光程長度差產生部61中之透光部610之個數僅比分割透鏡部62中之元件透鏡620之個數少1個(參照圖2)。因此,將光程長度差產生部61中之透光部610之個數設為Ns,又,將分割透鏡部62中之元件透鏡620之個數設為Nh,從而複數個透光部610中Z方向之長度最大之透光部610之該長度ts係以式3表示。 As described above, in the light irradiation device 31, the number of the light transmitting portions 610 in the optical path length difference generating portion 61 is only one less than the number of the element lenses 620 in the divided lens portion 62 (see FIG. 2). Therefore, the number of the light transmitting portions 610 in the optical path length difference generating portion 61 is N s , and the number of the element lenses 620 in the divided lens portion 62 is N h , and the plurality of light transmitting portions are formed. The length t s of the light transmitting portion 610 having the largest length in the Z direction in 610 is expressed by Formula 3.

(式3)ts=Ns‧tso=(Nh-1)‧tso (Equation 3) t s =N s ‧t so =(N h -1)‧t so

另一方面,自複數個光源部4中雷射光入射至分割透鏡部62之入射角(於沿著Y方向觀察情形時為相對於Z方向所成之角度) 最大的光源部4入射至各元件透鏡620之光係於作為該元件透鏡620之出射面之第2透鏡面622上,聚光於在X方向自該元件透鏡620之光軸J0(圖4中以一點鏈線表示)偏移之位置。具體而言,將該光之入射角(最大入射角)設為θi,將第1透鏡面621及第2透鏡面622之焦距設為fh,從而第2透鏡面622上之該光之聚光點與光軸J0之間的X方向之距離成為(fh‧tanθi)。於圖2之光照射裝置31中,由於以相對於垂直於X方向且包含照射光學系統5之光軸J1之面對稱之方式配置有複數個光源部4,故而於元件透鏡620之光軸J0之(+X)側及(-X)側之兩者形成自光軸J0分隔相同距離之聚光點。因此,所有自光源部4入射至各元件透鏡620之光的第2透鏡面622上之X方向之寬度wh係以式4表示。 On the other hand, the incident angle of the laser beam incident on the split lens unit 62 from the plurality of light source units 4 (the angle formed with respect to the Z direction when viewed in the Y direction) is incident on each element. The light of the lens 620 is attached to the second lens surface 622 which is the exit surface of the element lens 620, and is concentrated in the X direction from the optical axis J0 of the element lens 620 (indicated by a dotted line in FIG. 4). position. Specifically, the incident angle (maximum incident angle) of the light is θ i , and the focal lengths of the first lens surface 621 and the second lens surface 622 are f h , so that the light on the second lens surface 622 is The distance between the condensed spot and the optical axis J0 in the X direction is (f h ‧ tan θ i ). In the light irradiation device 31 of FIG. 2, since a plurality of light source portions 4 are arranged symmetrically with respect to a plane perpendicular to the X direction and including the optical axis J1 of the illumination optical system 5, the optical axis J0 of the element lens 620 is formed. Both the (+X) side and the (-X) side form a condensed spot separated by the same distance from the optical axis J0. Accordingly, since all the X-direction width of the light source unit 4 to the light incident on the lens elements 620 of the second lens surface 622 w h line represented by the formula 4.

(式4)wh=2fh‧tanθi (Formula 4) w h = 2f h ‧ tan θ i

又,穿過上述聚光點之光之發散角(divergent angle)(半角)θd並不依存於來自光源部4之光之入射角,將元件透鏡620(及透光部610)之排列間距設為p,而以式5表示。 Further, the divergent angle (half angle) θ d of the light passing through the condensing point does not depend on the incident angle of the light from the light source unit 4, and the arrangement pitch of the element lens 620 (and the light transmitting portion 610) is arranged. Set to p, and express it to Formula 5.

(式5)θd=tan-1(p/2fh) (Equation 5) θ d =tan -1 (p/2f h )

光程長度差產生部61之內部之上述光之發散角(半角)θ'd以式6表示。 The divergence angle (half angle) θ' d of the light inside the optical path length difference generating portion 61 is expressed by Formula 6.

(式6) θ'd=sin-1(sinθd/ns) (Equation 6) θ' d = sin -1 (sin θ d /n s )

因此,將分割透鏡部62之第2透鏡面622與光程長度差產生部61之入射面611之間的間隙之Z方向上之寬度設為ds,從而Z方向之長度最大之透光部610之出射面612上的光束之X方向之寬度ws係以式7表示。 Therefore, the width in the Z direction of the gap between the second lens surface 622 of the split lens portion 62 and the incident surface 611 of the optical path length difference generating portion 61 is d s , and the light transmitting portion having the largest length in the Z direction is obtained. The width w s of the light beam in the X-direction on the exit surface 612 of 610 is expressed by Equation 7.

(式7)ws=wh+2(ds‧tanθd+ts‧tanθ'd) (Expression 7) w s =w h +2(d s ‧tanθ d +t s ‧tanθ' d )

實際上,存在對透光部610削除角部、實施所謂倒角加工之情形,於此種情形時,於透光部610之出射面612中,在邊緣及其附近存在非有效區域。非有效區域之X方向之寬度例如大於0且為100μm以下。將該非有效區域之X方向之既定之寬度設為po,從而透光部610之出射面612上之有效區域之X方向的寬度p'係以式8表示。 Actually, there is a case where the corner portion is removed from the light transmitting portion 610 and so-called chamfering is performed. In this case, in the exit surface 612 of the light transmitting portion 610, an ineffective region exists at the edge and its vicinity. The width of the non-effective area in the X direction is, for example, greater than 0 and 100 μm or less. The predetermined width of the non-effective area in the X direction is set to p o , and the width p′ of the effective area on the exit surface 612 of the light transmitting portion 610 in the X direction is expressed by Formula 8.

(式8)p'=p-2po (Equation 8) p'=p-2p o

因此,用以使穿過分割透鏡部62之各元件透鏡620的光束僅穿過透光部610之出射面612之有效區域、而防止光束於邊緣附近散射的條件係以式9表示。 Therefore, the condition for preventing the light beam passing through each of the element lenses 620 of the split lens portion 62 from passing through the effective area of the exit surface 612 of the light transmitting portion 610 and preventing the light beam from scattering near the edge is expressed by Formula 9.

(式9)ws≦p' (Formula 9) w s ≦p'

於滿足式9之光照射裝置31中,能防止入射至透光部610之光射到該透光部610之邊緣,從而可更確實地確保藉由光照射裝 置31照射至照射面320上之光之強度分佈之均勻性。又,亦能防止由透光部610之邊緣之光之散射導致的光量之損失。如上所述,由於非有效區域之X方向之寬度po大於0,故而可以說於滿足式9之光照射裝置31中,於複數個透光部610之排列方向上,自複數個透光部610之各者之出射面612出射之光的寬度小於複數個透光部610之間距。 In the light irradiation device 31 of the formula 9, the light incident on the light transmitting portion 610 can be prevented from being incident on the edge of the light transmitting portion 610, so that the light irradiation device 31 can be more surely irradiated onto the irradiation surface 320. The uniformity of the intensity distribution of light. Moreover, the loss of the amount of light caused by the scattering of light at the edge of the light transmitting portion 610 can also be prevented. As described above, since the width p o of the non-effective area in the X direction is larger than 0, it can be said that in the light irradiation device 31 satisfying the formula 9, the plurality of light transmitting portions are plural from the arrangement direction of the plurality of light transmitting portions 610. The width of the light emitted by the exit surface 612 of each of the 610 is less than the distance between the plurality of light transmitting portions 610.

再者,由式7及式9可知,透光部610之最大長度ts越 小,則越容易滿足式9所示之條件。如上所述,於光程長度差產生部61中,亦可設置個數與分割透鏡部62中之元件透鏡620之個數相同的透光部610。然而,由於透光部610之最大長度ts依存於透光部610之個數,故而就容易滿足式9所示之條件之觀點而言,透光部610之個數較佳為比元件透鏡620之個數少1個。 Further, as is clear from Expressions 7 and 9, the smaller the maximum length t s of the light transmitting portion 610, the easier it is to satisfy the condition shown in Formula 9. As described above, in the optical path length difference generating portion 61, the number of the light transmitting portions 610 which are the same as the number of the element lenses 620 in the split lens portion 62 may be provided. However, since the maximum length t s of the light transmitting portion 610 depends on the number of the light transmitting portions 610, the number of the light transmitting portions 610 is preferably larger than that of the element lens from the viewpoint of easily satisfying the condition shown in the formula 9. The number of 620 is one less.

圖6及圖7係表示光照射裝置31之另一例之圖。圖6 表示沿著Y方向觀察所得之光照射裝置31之構成,圖7表示沿著X方向觀察所得之光照射裝置31之構成。 6 and 7 are views showing another example of the light irradiation device 31. Figure 6 The configuration of the light irradiation device 31 obtained as viewed in the Y direction is shown, and FIG. 7 shows the configuration of the light irradiation device 31 observed in the X direction.

於圖6之光照射裝置31中,光源單元40之各光源部4 除了包含光源41及準直透鏡42以外,還包含稜鏡43、柱面透鏡44、及柱面透鏡45。複數個光源部4之光源41係於平行於ZX平面之光源排列面上沿X方向排列。自各光源41出射之雷射光藉由準直透鏡42而進行準直,並且藉由稜鏡43而偏轉,且朝向照射光學系統5之分割透鏡部62。於光源單元40中,根據複數個光源41之X方向之位置變更稜鏡43之頂角之角度,以便藉由複數個光源部4自沿著光源排列面之相互不同之方向朝向照射光學系統5之相同位置(分割透鏡部62)出射雷射光。再者,於X方向之中央之光源部4中,省略稜鏡43。 In the light irradiation device 31 of FIG. 6, each light source unit 4 of the light source unit 40 In addition to the light source 41 and the collimator lens 42, the crucible 43, the cylindrical lens 44, and the cylindrical lens 45 are included. The light sources 41 of the plurality of light source units 4 are arranged in the X direction on the light source array surface parallel to the ZX plane. The laser light emitted from each of the light sources 41 is collimated by the collimator lens 42 and deflected by the crucible 43, and directed toward the split lens portion 62 of the illumination optical system 5. In the light source unit 40, the angle of the apex angle of the 稜鏡43 is changed according to the position of the plurality of light sources 41 in the X direction so as to be directed toward the illuminating optical system 5 from the mutually different directions along the light source arranging surface by the plurality of light source portions 4. The same position (divided lens portion 62) emits laser light. Further, in the light source unit 4 at the center in the X direction, the crucible 43 is omitted.

如圖6及圖7所示,柱面透鏡44、45僅於Y方向具有 倍率。柱面透鏡44、45設置於稜鏡43與分割透鏡部62之間。柱面透鏡44係針對各光源部4而設置,柱面透鏡45係於複數個光源部4中共有。於柱面透鏡44與柱面透鏡45之間,設置有空間濾波器46。空間濾波器46係狹縫板,且沿X方向形成較長之狹縫461。如圖7所示,於沿著X方向觀察之情形時,穿過柱面透鏡44之雷射光於空間濾波器46之狹縫461之附近聚光,而穿過狹縫461之光入射至柱面透鏡45。 穿過柱面透鏡45之光入射至分割透鏡部62之(-Z)側之面。 As shown in FIGS. 6 and 7, the cylindrical lenses 44, 45 have only the Y direction. Magnification. The cylindrical lenses 44, 45 are disposed between the crucible 43 and the split lens portion 62. The cylindrical lens 44 is provided for each light source unit 4, and the cylindrical lens 45 is shared by a plurality of light source units 4. A spatial filter 46 is provided between the cylindrical lens 44 and the cylindrical lens 45. The spatial filter 46 is a slit plate and forms a long slit 461 in the X direction. As shown in FIG. 7, when viewed in the X direction, the laser light passing through the cylindrical lens 44 is concentrated near the slit 461 of the spatial filter 46, and the light passing through the slit 461 is incident on the column. Face lens 45. The light that has passed through the cylindrical lens 45 is incident on the (-Z) side of the split lens portion 62.

圖6及圖7所示之分割透鏡部62與圖2及圖3所示之 分割透鏡部62的不同之點在於:各元件透鏡620a之第1透鏡面621及第2透鏡面622均為球面之一部分。於分割透鏡部62中,亦為元件透鏡620a之第1透鏡面621配置於第2透鏡面622之焦點,且第2透鏡面622配置於第1透鏡面621之焦點。即,第1透鏡面621及第2透鏡面622之焦距相同。光程長度差產生部61之構造及配置與圖2之光程長度差產生部61相同。 The split lens unit 62 shown in FIGS. 6 and 7 is as shown in FIGS. 2 and 3 The division lens portion 62 is different in that the first lens surface 621 and the second lens surface 622 of each element lens 620a are each one of a spherical surface. In the split lens unit 62, the first lens surface 621 of the element lens 620a is disposed at the focus of the second lens surface 622, and the second lens surface 622 is disposed at the focus of the first lens surface 621. In other words, the focal lengths of the first lens surface 621 and the second lens surface 622 are the same. The structure and arrangement of the optical path length difference generating portion 61 are the same as those of the optical path length difference generating portion 61 of Fig. 2 .

如圖6所示,於沿著Y方向觀察之情形時,由複數個元件透鏡620a,對於入射至分割透鏡部62之光於X方向上進行分割。穿過除最靠(+X)側之元件透鏡620a以外之複數個元件透鏡620a的複數個光束分別入射至光程長度差產生部61之複數個透光部610。透過複數個透光部610之光、及穿過最靠(+X)側之元件透鏡620a之光入射至聚光透鏡部63。聚光透鏡部63具有聚光透鏡631。聚光透鏡631配置於自複數個元件透鏡620a之第2透鏡面622(參照圖7)沿著光軸J1分隔其焦距fc之位置。換言之,各元件透鏡620a之第2透鏡面622係配置於聚光透鏡631之前側焦點面上。又,配置於光軸J1上之照射面320係配置於自聚光透鏡631沿著光軸J1分隔聚光透鏡631之焦距fc 之位置。即,照射面320與聚光透鏡631之後側焦點面一致。自複數個元件透鏡620a出射之複數個光束藉由聚光透鏡631而成為平行光,且於聚光透鏡631之後側焦點面重疊。即,來自複數個元件透鏡620a之光(複數個光束)之照射區域50全部重疊。 As shown in FIG. 6, when viewed in the Y direction, the plurality of element lenses 620a divide the light incident on the split lens unit 62 in the X direction. The plurality of light beams that have passed through the plurality of element lenses 620a other than the element lens 620a closest to the (+X) side are incident on the plurality of light transmitting portions 610 of the optical path length difference generating portion 61, respectively. Light passing through the plurality of light transmitting portions 610 and light passing through the element lens 620a on the (+X) side are incident on the collecting lens portion 63. The condensing lens portion 63 has a condensing lens 631. The condensing lens 631 is disposed at a position separating the focal length f c along the optical axis J1 from the second lens surface 622 (see FIG. 7) of the plurality of element lenses 620a. In other words, the second lens surface 622 of each element lens 620a is disposed on the front focal plane of the condensing lens 631. Further, the irradiation surface 320 disposed on the optical axis J1 is disposed at a position separating the focal length f c of the condensing lens 631 from the condensing lens 631 along the optical axis J1. That is, the irradiation surface 320 coincides with the rear focal plane of the collecting lens 631. The plurality of light beams emitted from the plurality of element lenses 620a are parallel light by the condensing lens 631, and the side focal planes overlap behind the condensing lens 631. That is, the irradiation regions 50 of the light (plurality of light beams) from the plurality of element lenses 620a are all overlapped.

如圖7所示,於沿著X方向觀察之情形時,自光源單元 40之柱面透鏡45出射之光於複數個元件透鏡620a之第1透鏡面621上聚光,且自第2透鏡面622作為平行於光軸J1之平行光出射。來自複數個元件透鏡620a之光藉由聚光透鏡631而於聚光透鏡631之後側焦點面(照射面320)上聚光。藉此,獲得照射面320上之剖面成為沿X方向延伸的線狀之線照明光。 As shown in Figure 7, when viewed in the X direction, from the light source unit The light emitted from the cylindrical lens 45 of 40 is condensed on the first lens surface 621 of the plurality of element lenses 620a, and is emitted from the second lens surface 622 as parallel light parallel to the optical axis J1. The light from the plurality of element lenses 620a is condensed on the rear focal plane (irradiation surface 320) of the condensing lens 631 by the condensing lens 631. Thereby, the cross section on the irradiation surface 320 is obtained as linear line illumination light extending in the X direction.

如以上所說明般,於圖6之光照射裝置31中,亦可藉 由自複數個光源部4朝向分割透鏡部62出射雷射光,而獲得高強度之線照明光。又,藉由使用複數個光源部4,與利用複數個透光部610對穿過複數個元件透鏡620a之複數個光束賦予光程長度差相輔相成地,可提高照射面320中之線照明光之強度分佈之均勻性。進而,於圖6之光照射裝置31中,亦可藉由滿足式9之條件,使於複數個透光部610之排列方向上、自複數個透光部610之各者之出射面612出射之光的寬度小於複數個透光部610之間距。藉此,能防止入射至透光部610之光射到該透光部610之邊緣,從而可更確實地確保藉由光照射裝置31照射至照射面320上之光之強度分佈之均勻性。 As described above, in the light irradiation device 31 of FIG. 6, it is also possible to borrow The laser beam is emitted from the plurality of light source sections 4 toward the split lens section 62 to obtain high-intensity line illumination light. Further, by using the plurality of light source units 4, the optical path length difference is applied to the plurality of light beams passing through the plurality of element lenses 620a by the plurality of light transmitting portions 610, and the line illumination light in the irradiation surface 320 can be improved. Uniformity of intensity distribution. Further, in the light irradiation device 31 of FIG. 6, the emission surface 612 of each of the plurality of light transmission portions 610 may be emitted from the plurality of light transmission portions 610 in the arrangement direction of the plurality of light transmission portions 610 by satisfying the condition of Equation 9. The width of the light is less than the distance between the plurality of light transmitting portions 610. Thereby, it is possible to prevent the light incident on the light transmitting portion 610 from being incident on the edge of the light transmitting portion 610, and it is possible to more reliably ensure the uniformity of the intensity distribution of the light irradiated onto the irradiation surface 320 by the light irradiation device 31.

圖8A係表示照射面320上之Y方向之光之強度分佈的 圖。於假定省略了空間濾波器46之比較例之光源單元之情形時,存在根據光源之種類或狀態,於照射面上之Y方向之光之強度分佈中,鄰接於作為線照明光之必要之光之強度波峰,而產生旁瓣(side lobe)等不 需要之光之強度波峰之情況。於圖8A中,以虛線示出了不需要之光之強度波峰。相對於此,於圖3之光源單元40中,藉由設置空間濾波器46,可除去不需要之光之強度波峰(即,成形為照射至照射面320之光),而實現獲得較佳之線照明光。 Figure 8A shows the intensity distribution of light in the Y direction on the illumination surface 320. Figure. In the case where it is assumed that the light source unit of the comparative example of the spatial filter 46 is omitted, there is a light that is necessary for the line illumination light in the intensity distribution of the Y direction light on the illumination surface depending on the type or state of the light source. The intensity peak, but the side lobe, etc. The intensity peak of the light that is needed. In Fig. 8A, intensity peaks of unwanted light are shown in dashed lines. On the other hand, in the light source unit 40 of FIG. 3, by providing the spatial filter 46, the intensity peak of the unnecessary light (that is, the light formed to be irradiated to the irradiation surface 320) can be removed, thereby achieving a better line. Lighting light.

於圖6之光源單元40中,由於複數個光源部4安裝於省略圖示之支持構件,故而可高效率地進行複數個光源41之冷卻等。又,藉由使用稜鏡43,從而,於所有光源部4中,能夠以光源41及準直透鏡42之光軸平行於Z方向之方式,配置光源41及準直透鏡42。其結果,相較於在複數個光源部4中、以光源41及準直透鏡42之光軸相對於Z方向以各種角度傾斜之方式配置光源41及準直透鏡42的圖2之光源單元40,可更容易地製作支持構件。再者,光之準直於X方向上並非必須,來自光源部4之光亦可一方面於X方向上略微發散或會聚一方面入射至分割透鏡部62。於圖8B中,示出了將圖6之柱面透鏡44變更為球面透鏡44a之光照射裝置31。沿著X方向觀察圖8B所示之光照射裝置31所得之情況與圖7相同。 In the light source unit 40 of FIG. 6, since a plurality of light source units 4 are attached to a support member (not shown), cooling of a plurality of light sources 41 and the like can be efficiently performed. Further, by using the crucible 43, the light source 41 and the collimator lens 42 can be disposed in all of the light source units 4 such that the optical axes of the light source 41 and the collimator lens 42 are parallel to the Z direction. As a result, the light source unit 40 of FIG. 2 in which the light source 41 and the collimator lens 42 are disposed at various angles with respect to the Z direction in the optical axes of the light source 41 and the collimator lens 42 in the plurality of light source units 4 is obtained. It is easier to make support components. Further, it is not necessary that the light is collimated in the X direction, and the light from the light source portion 4 may be slightly diverged or concentrated on the one hand and incident on the split lens portion 62 on the one hand. In Fig. 8B, a light irradiation device 31 that changes the cylindrical lens 44 of Fig. 6 into a spherical lens 44a is shown. The situation obtained by observing the light irradiation device 31 shown in Fig. 8B along the X direction is the same as that of Fig. 7.

另外,於使用作為柱面透鏡之元件透鏡620的圖3之分割透鏡部62中,存在如下情況,即,根據分割透鏡部62之製作時之精度,沿著X方向觀察之情形時之第1透鏡面621與第2透鏡面622之平行度(楔形成分)的偏差於複數個元件透鏡620中變大。於此情形時,存在如下情況,即,穿過複數個元件透鏡620之複數個光束相對於光軸J1向相互不同之方向傾斜而入射至聚光透鏡部63,從而,照射面320上之形成有照射區域50之位置於Y方向偏移。相對於此,於圖7之分割透鏡部62中,藉由使用容易高精度地成形之球面透鏡作為元件透鏡620a,可使藉由穿過複數個元件透鏡620a之光束而於照射面 320上形成照射區域50之位置於Y方向上大致一致。使用空間濾波器46、稜鏡43、及元件透鏡620a之各者之上述方法可單獨於其他光照射裝置31(及下述光照射裝置31a)中採用。 Further, in the split lens unit 62 of FIG. 3 using the element lens 620 as the cylindrical lens, there is a case where the first lens is viewed in the X direction according to the accuracy of the production of the split lens unit 62. The deviation of the parallelism (wedge formation) of the lens surface 621 and the second lens surface 622 becomes larger in the plurality of element lenses 620. In this case, a plurality of light beams that have passed through the plurality of element lenses 620 are inclined toward mutually different directions with respect to the optical axis J1 to be incident on the condensing lens portion 63, thereby forming the irradiation surface 320. The position of the illuminated area 50 is offset in the Y direction. On the other hand, in the split lens unit 62 of FIG. 7, by using a spherical lens which is easily formed with high precision as the element lens 620a, the light beam passing through the plurality of element lenses 620a can be irradiated on the irradiation surface. The position at which the irradiation region 50 is formed on 320 is substantially uniform in the Y direction. The above method using each of the spatial filter 46, the crucible 43, and the element lens 620a can be employed alone in the other light irradiation device 31 (and the light irradiation device 31a described below).

圖9及圖10係表示本發明之第2實施形態之光照射裝 置31a之構成的圖。圖9表示沿著Y方向觀察所得之光照射裝置31a之構成,圖10表示沿著X方向觀察所得之光照射裝置31a之構成。 9 and 10 are views showing a light irradiation device according to a second embodiment of the present invention. A diagram showing the structure of 31a. Fig. 9 shows the configuration of the light irradiation device 31a observed in the Y direction, and Fig. 10 shows the configuration of the light irradiation device 31a observed in the X direction.

圖9及圖10所示之光照射裝置31a包含光源單元40、 及照射光學系統5a。光源單元40具有與圖2之光源單元40同樣之構造。因此,於光源單元40中,藉由複數個光源部4,自沿著光源排列面之相互不同之方向朝向照射光學系統5a上之相同位置(下述分割透鏡部62)出射雷射光。 The light irradiation device 31a shown in FIGS. 9 and 10 includes a light source unit 40, And the illumination optical system 5a. The light source unit 40 has the same configuration as the light source unit 40 of Fig. 2 . Therefore, in the light source unit 40, the plurality of light source units 4 emit laser light from the same position (the split lens unit 62 described below) on the illumination optical system 5a in a direction different from each other along the light source array surface.

照射光學系統5a具備光程長度差產生部61、分割透鏡 部62、聚光透鏡部63、及中間變倍部64a。於照射光學系統5a中,自光源單元40朝向照射面320,以分割透鏡部62、中間變倍部64a、光程長度差產生部61、聚光透鏡部63之順序,使其等構成沿著光軸J1而配置。來自複數個光源部4之經準直之雷射光入射至分割透鏡部62。如圖11所示,於分割透鏡部62中,複數個元件透鏡620係排列於垂直於照射光學系統5a之光軸J1且沿著光源排列面之X方向。 The illumination optical system 5a includes an optical path length difference generation unit 61 and a split lens The portion 62, the condensing lens portion 63, and the intermediate magnification portion 64a. In the illumination optical system 5a, the light source unit 40 is directed toward the irradiation surface 320 in the order of the divided lens portion 62, the intermediate magnification changing portion 64a, the optical path length difference generating portion 61, and the collecting lens portion 63, and the like. The optical axis J1 is arranged. The collimated laser light from the plurality of light source sections 4 is incident on the split lens section 62. As shown in FIG. 11, in the split lens unit 62, a plurality of element lenses 620 are arranged in the X direction perpendicular to the optical axis J1 of the illumination optical system 5a and along the light source arrangement surface.

於沿著Y方向觀察之情形時,入射至分割透鏡部62之 光被複數個元件透鏡620於X方向上被分割。此時,對各元件透鏡620之第1透鏡面621入射來自各光源部4之平行光,且於第2透鏡面622之附近形成複數個光源41之像。該等像係排列於元件透鏡620之排列方向。再者,於圖11中,僅圖示有入射至1個元件透鏡620之光線。 When viewed in the Y direction, it is incident on the split lens portion 62. The light is divided by the plurality of element lenses 620 in the X direction. At this time, parallel light from each light source unit 4 is incident on the first lens surface 621 of each element lens 620, and an image of a plurality of light sources 41 is formed in the vicinity of the second lens surface 622. The image lines are arranged in the direction in which the element lenses 620 are arranged. In addition, in FIG. 11, only the light rays incident on one element lens 620 are shown.

被複數個元件透鏡620分割之光(複數個光束)係以主光 線平行於光軸J1之方式自第2透鏡面622出射。自各元件透鏡620出射之光束一方面擴展,一方面入射至圖9所示之中間變倍部64a之透鏡643,並經由透鏡643、644而入射至光程長度差產生部61。於光程長度差產生部61中,複數個透光部610排列於垂直於照射光學系統5a之光軸J1且沿著光源排列面之X方向。透光部610之排列間距大於元件透鏡620之排列間距。 The light (multiple beams) split by the plurality of element lenses 620 is mainly light The line is emitted from the second lens surface 622 in a manner parallel to the optical axis J1. The light beam emitted from each of the element lenses 620 expands on the one hand, and enters the lens 643 of the intermediate magnification portion 64a shown in FIG. 9 on the one hand, and enters the optical path length difference generation portion 61 via the lenses 643 and 644. In the optical path length difference generating portion 61, a plurality of light transmitting portions 610 are arranged in the X direction perpendicular to the optical axis J1 of the illumination optical system 5a and along the light source array surface. The arrangement pitch of the light transmitting portions 610 is larger than the arrangement pitch of the element lenses 620.

中間變倍部64a構成無焦光學系統、具體而言為兩側遠 心光學系統,且使以主光線平行於光軸J1之狀態入射之光以主光線平行於光軸J1之狀態入射至光程長度差產生部61。此時,中間變倍部64a使作為複數個元件透鏡620之出射面之第2透鏡面622的像(詳細而言,第2透鏡面622中之複數個光源41之像)於光程長度差產生部61之內部或附近擴大而形成。 The intermediate magnification portion 64a constitutes an afocal optical system, specifically, both sides The optical system of the heart is incident on the optical path length difference generating portion 61 in a state where the principal ray is incident parallel to the optical axis J1 in a state where the principal ray is parallel to the optical axis J1. At this time, the intermediate magnification changing unit 64a causes the image of the second lens surface 622 which is the exit surface of the plurality of element lenses 620 (in detail, the image of the plurality of light sources 41 in the second lens surface 622) to have an optical path length difference. The inside or the vicinity of the generating portion 61 is enlarged to be formed.

詳細而言,藉由中間變倍部64a之擴大倍率係與光程長 度差產生部61中之透光部610之排列間距除以分割透鏡部62中之元件透鏡620之排列間距所得之值相等。因此,穿過複數個元件透鏡620之光(複數個光束)經由構成擴大光學系統之中間變倍部64a而分別入射至複數個透光部610。此時,複數個元件透鏡620之第2透鏡面622之像分別形成於複數個透光部610之內部或附近。又,自各元件透鏡620出射之光束之、於透光部610的擴展角度(spread angle)按照擴大倍率而小於該元件透鏡620之第2透鏡面622附近之擴展角度。其結果,光束難以射到該透光部610之邊緣(例如與鄰接之透光部610之交界)。 穿過各透光部610之光束朝向聚光透鏡部63。自複數個透光部610出射之複數個光束藉由聚光透鏡部63之聚光透鏡631而成為平行光,且於照射面320重疊。即,來自複數個透光部610之光(複數個光束)之照 射區域50全部重疊。 In detail, the magnification ratio and the optical path length are long by the intermediate magnification changing unit 64a. The arrangement pitch of the light transmitting portions 610 in the degree difference generating portion 61 is divided by the value obtained by dividing the arrangement pitch of the element lenses 620 in the divided lens portion 62. Therefore, the light (plurality of light beams) passing through the plurality of element lenses 620 is incident on the plurality of light transmitting portions 610 via the intermediate magnification changing portion 64a constituting the expanding optical system. At this time, the images of the second lens faces 622 of the plurality of element lenses 620 are formed inside or in the vicinity of the plurality of light transmitting portions 610, respectively. Further, the spread angle of the light beam emitted from each element lens 620 in the light transmitting portion 610 is smaller than the spread angle of the vicinity of the second lens surface 622 of the element lens 620 in accordance with the magnification factor. As a result, it is difficult for the light beam to strike the edge of the light transmitting portion 610 (for example, at the boundary with the adjacent light transmitting portion 610). The light beam that has passed through each of the light transmitting portions 610 faces the condensing lens portion 63. The plurality of light beams emitted from the plurality of light transmitting portions 610 are parallel light by the collecting lens 631 of the collecting lens portion 63, and are superposed on the irradiation surface 320. That is, the light from the plurality of light transmitting portions 610 (plurality of light beams) The shot areas 50 all overlap.

如圖10所示,於沿著X方向觀察之情形時,自光源單元40經由分割透鏡部62及中間變倍部64a而入射至光程長度差產生部61的光係保持平行光之狀態而穿過複數個透光部610,並被導引至聚光透鏡631。繼而,自聚光透鏡631出射之光於照射面320上聚光。因此,於照射面320中,來自各元件透鏡620(透光部610)之光之照射區域50成為沿排列方向延伸之線狀。即,藉由光照射裝置31a照射至照射面320上之光之剖面成為沿X方向延伸之線狀,獲得線照明光。 As shown in FIG. 10, when viewed in the X direction, the light system incident on the optical path length difference generating portion 61 from the light source unit 40 via the split lens portion 62 and the intermediate magnification portion 64a maintains the state of the parallel light. It passes through a plurality of light transmitting portions 610 and is guided to the collecting lens 631. Then, the light emitted from the condensing lens 631 is condensed on the irradiation surface 320. Therefore, in the irradiation surface 320, the light irradiation region 50 from each of the element lenses 620 (light transmitting portion 610) has a linear shape extending in the arrangement direction. In other words, the cross section of the light irradiated onto the irradiation surface 320 by the light irradiation device 31a becomes a line extending in the X direction, and line illumination light is obtained.

於光照射裝置31a中,聚光透鏡631係球面透鏡,但亦可藉由例如將僅於Y方向上具有倍率之柱面透鏡添加於聚光透鏡部63,而於照射面320中獲得在Y方向上成為所需寬度之線照明光。再者,於光源41為高倍率之半導體雷射之情形時,較佳為在自光源41出射之雷射光於一個方向上成為多模態(multi mode)時,使成為單模態(single mode)之方向與垂直於分割透鏡部62中之元件透鏡620之排列方向的方向(Y方向)重合。藉此,能防止於照射面320中線照明光之Y方向之寬度擴大。 In the light irradiation device 31a, the condensing lens 631 is a spherical lens, but may be obtained in the irradiation surface 320 by, for example, adding a cylindrical lens having a magnification in the Y direction only to the condensing lens portion 63. Line illumination that becomes the desired width in the direction. Further, in the case where the light source 41 is a semiconductor laser of high magnification, it is preferable that when the laser light emitted from the light source 41 becomes multi mode in one direction, it becomes a single mode (single mode). The direction coincides with the direction (Y direction) perpendicular to the arrangement direction of the element lenses 620 in the split lens portion 62. Thereby, it is possible to prevent the width of the line illumination light in the Y direction from being enlarged on the irradiation surface 320.

另外,於圖2及圖6所示之光照射裝置31中,必須使光程長度差產生部61中之透光部610之排列間距與分割透鏡部62中之元件透鏡620之排列間距相等。雖小型之分割透鏡部可利用光微影而容易以高精度地製作,但對於光軸方向上之複數個透光部之長度相互不同之光程長度差產生部而言,難以利用光微影。因此,必須藉由機械加工等繁雜之作業製作光程長度差產生部。 Further, in the light irradiation device 31 shown in FIGS. 2 and 6, it is necessary to make the arrangement pitch of the light transmitting portions 610 in the optical path length difference generating portion 61 equal to the arrangement pitch of the element lenses 620 in the split lens portion 62. Although the small-sized split lens unit can be easily produced with high precision by using light lithography, it is difficult to use the light lithography for the optical path length difference generating portion in which the lengths of the plurality of light-transmitting portions in the optical axis direction are different from each other. . Therefore, it is necessary to produce an optical path length difference generating portion by a complicated operation such as machining.

相對於此,於圖9之光照射裝置31a中,在分割透鏡部62與光程長度差產生部61之間,配置有構成擴大光學系統之中間變倍 部64a。藉此,於透光部610之排列方向(圖9中為X方向)上,可使光程長度差產生部61大於分割透鏡部62,從而可容易地製作光程長度差產生部61。再者,於圖2及圖6所示之光照射裝置31中,由於省略中間變倍部64a而可使構成簡單化,故而可容易地實現光照射裝置31之小型化等。 On the other hand, in the light irradiation device 31a of FIG. 9, the intermediate magnification constituting the enlarged optical system is disposed between the split lens unit 62 and the optical path length difference generation unit 61. Part 64a. Thereby, in the arrangement direction of the light transmitting portion 610 (the X direction in FIG. 9), the optical path length difference generating portion 61 can be made larger than the split lens portion 62, and the optical path length difference generating portion 61 can be easily produced. In addition, in the light irradiation device 31 shown in FIG. 2 and FIG. 6, the intermediate magnification changing unit 64a is omitted, and the configuration can be simplified. Therefore, the size of the light irradiation device 31 can be easily reduced.

於光照射裝置31a中,自複數個光源部4朝向分割透鏡 部62出射雷射光。藉此,相較於僅使用1個光源部4之光照射裝置,可獲得更高強度之線照明光。又,由於來自複數個光源部4之雷射光之相位相互不同,故而與藉由複數個透光部610對穿過複數個元件透鏡620之複數個光束賦予光程長度差相輔相成地,可進一步提高照射面320中之線照明光之強度分佈之均勻性。 In the light irradiation device 31a, the plurality of light source units 4 are directed toward the split lens The portion 62 emits laser light. Thereby, higher-intensity line illumination light can be obtained as compared with the light irradiation device using only one light source unit 4. Further, since the phases of the laser light from the plurality of light source units 4 are different from each other, it is possible to further improve the optical path length difference by the plurality of light beams passing through the plurality of element lenses 620 by the plurality of light transmitting portions 610. The uniformity of the intensity distribution of the line illumination light in the illumination surface 320.

又,於光照射裝置31a中,藉由中間變倍部64a,而於 複數個透光部610之內部或附近形成複數個元件透鏡620之出射面之像,並且伴隨著該像之擴大,自各元件透鏡620出射之光束之透光部610中之擴展角度變得小於該元件透鏡620中之擴展角度。其結果,可容易地抑制該光束射到透光部610之邊緣,從而可更確實地確保藉由光照射裝置31a照射至照射面320上之光之強度分佈之均勻性。 Further, in the light irradiation device 31a, the intermediate magnification changing unit 64a is used. An image of an exit surface of the plurality of element lenses 620 is formed inside or in the vicinity of the plurality of light transmitting portions 610, and as the image is enlarged, an expansion angle in the light transmitting portion 610 of the light beam emitted from each of the element lenses 620 becomes smaller than the image The angle of expansion in the element lens 620. As a result, it is possible to easily suppress the light beam from entering the edge of the light transmitting portion 610, and it is possible to more reliably ensure the uniformity of the intensity distribution of the light irradiated onto the irradiation surface 320 by the light irradiation device 31a.

圖12及圖13係表示光照射裝置31a之另一例之圖。圖 12表示沿著Y方向觀察所得之光照射裝置31a之構成,圖13表示沿著X方向觀察所得之光照射裝置31a之構成。圖12及圖13所示之光照射裝置31a與圖9及圖10之光照射裝置31a相比,於在光程長度差產生部61與聚光透鏡部63之間添加透鏡53、54之方面不同。其他構成均與圖9及圖10之光照射裝置31a同樣,且對相同構成標註相同符號。 12 and 13 are views showing another example of the light irradiation device 31a. Figure Reference numeral 12 denotes a configuration of the light irradiation device 31a observed in the Y direction, and Fig. 13 shows a configuration of the light irradiation device 31a observed in the X direction. The light irradiation device 31a shown in FIGS. 12 and 13 is different from the light irradiation device 31a of FIGS. 9 and 10 in that lenses 53 and 54 are added between the optical path length difference generating portion 61 and the collecting lens portion 63. different. The other configurations are the same as those of the light irradiation device 31a of FIGS. 9 and 10, and the same components are denoted by the same reference numerals.

透鏡53、54構成縮小光學系統(例如兩側遠心光學系 統),且對光程長度差產生部61之內部或附近的複數個元件透鏡620(參照圖11)之第2透鏡面622之像(詳細而言,第2透鏡面622中之複數個光源41之像)進行縮小中繼。自透鏡54出射之光入射至聚光透鏡部63之聚光透鏡631,而於照射面320上形成線狀之照射區域50。 The lenses 53, 54 constitute a reducing optical system (for example, a telecentric optical system on both sides) And an image of the second lens surface 622 of the plurality of element lenses 620 (see FIG. 11) inside or near the optical path length difference generating portion 61 (in detail, the plurality of light sources in the second lens surface 622) The image of 41) is used to reduce the relay. The light emitted from the lens 54 is incident on the condensing lens 631 of the condensing lens unit 63, and a linear irradiation region 50 is formed on the irradiation surface 320.

如上所述,自各元件透鏡620出射之光束之透光部610 中之擴展角度相對較小,藉此,可容易地抑制於光照射裝置31a中光束射到透光部610之邊緣。於此情形時,為了在照射面320上獲得於X方向上成為某種程度之長度之線照明光,必須於圖9之光照射裝置31a中,設置焦距較長之聚光透鏡631,從而Z方向上之照射光學系統5a之全長變長。相對於此,於圖12之光照射裝置31a中,在光程長度差產生部61與聚光透鏡部63之間,設置有構成縮小光學系統之透鏡53、54,藉此,能使照射光學系統5a之全長相對較短,從而能實現光照射裝置31a之小型化。 As described above, the light transmitting portion 610 of the light beam emitted from each of the element lenses 620 is as described above. The expansion angle is relatively small, whereby the light beam in the light irradiation device 31a can be easily suppressed from hitting the edge of the light transmitting portion 610. In this case, in order to obtain the line illumination light having a certain length in the X direction on the irradiation surface 320, it is necessary to provide the condensing lens 631 having a long focal length in the light irradiation device 31a of FIG. The entire length of the illumination optical system 5a in the direction becomes long. On the other hand, in the light irradiation device 31a of FIG. 12, the lenses 53 and 54 constituting the reduction optical system are provided between the optical path length difference generation portion 61 and the condensing lens portion 63, whereby the illumination optical can be realized. The overall length of the system 5a is relatively short, so that the miniaturization of the light irradiation device 31a can be achieved.

圖14及圖15係表示光照射裝置31a之另一例之圖。圖 14表示沿著Y方向觀察所得之光照射裝置31a之構成,圖15表示沿著X方向觀察所得之光照射裝置31a之構成。與圖9及圖10之光照射裝置31a相比,圖14及圖15所示之光照射裝置31a中,於添加偏光分光器(polarizafion beam splitter)55、1/4波長板56及反射部65之點不同。其他構成均與圖9及圖10之光照射裝置31a同樣,且對相同構成標註相同符號。 14 and 15 are views showing another example of the light irradiation device 31a. Figure Reference numeral 14 denotes a configuration of the light irradiation device 31a observed in the Y direction, and Fig. 15 shows a configuration of the light irradiation device 31a observed in the X direction. In addition to the light irradiation device 31a of FIGS. 9 and 10, a polarizing beam splitter 55, a quarter-wavelength plate 56, and a reflecting portion 65 are added to the light irradiation device 31a shown in FIGS. 14 and 15. The point is different. The other configurations are the same as those of the light irradiation device 31a of FIGS. 9 and 10, and the same components are denoted by the same reference numerals.

於圖14之光照射裝置31a中,自(-Z)側朝向(+Z)方向, 以反射部65、光程長度差產生部61、1/4波長板56、中間變倍部64a之透鏡644、643、偏光分光器55、聚光透鏡部63之順序,排列該等 構成。又,光源單元40係配置於偏光分光器55之(+X)側,且於光源單元40與偏光分光器55之間配置有分割透鏡部62。於光源單元40中,自大致沿Z方向排列之複數個光源部4沿著平行於光源排列面且相互不同之方向朝向分割透鏡部62出射雷射光。 In the light irradiation device 31a of Fig. 14, from the (-Z) side toward the (+Z) direction, The reflection unit 65, the optical path length difference generation unit 61, the quarter-wavelength plate 56, the lenses 644 and 643 of the intermediate magnification change unit 64a, the polarization beam splitter 55, and the condensing lens unit 63 are arranged in this order. Composition. Further, the light source unit 40 is disposed on the (+X) side of the polarization beam splitter 55, and the split lens unit 62 is disposed between the light source unit 40 and the polarization beam splitter 55. In the light source unit 40, a plurality of light source units 4 arranged substantially in the Z direction emit laser light toward the split lens unit 62 in a direction parallel to the light source array surface and different from each other.

於分割透鏡部62中,複數個元件透鏡620排列於垂直 於光源單元40與偏光分光器55之間之光軸且沿著光源排列面之Z方向(參照圖11),且入射至分割透鏡部62之光於Z方向上被分割。穿過分割透鏡部62之光以其主光線平行於X方向之狀態入射至偏光分光器55。偏光分光器55係將p偏光成分與s偏光成分分離者。自光源單元40經由分割透鏡部62而入射至偏光分光器55之光幾乎為s偏光成分,該光被偏光分光器55反射而朝向中間變倍部64a之透鏡643。此時,自複數個元件透鏡620出射之複數個光束之排列方向轉換為X方向。 換言之,自偏光分光器55朝向中間變倍部64a之光之主光線平行於Z方向。 In the split lens portion 62, a plurality of element lenses 620 are arranged in a vertical direction The optical axis between the light source unit 40 and the polarization beam splitter 55 is along the Z direction of the light source array surface (see FIG. 11), and the light incident on the split lens unit 62 is divided in the Z direction. The light passing through the split lens portion 62 is incident on the polarization beam splitter 55 in a state where its chief ray is parallel to the X direction. The polarization beam splitter 55 separates the p-polarized component from the s-polarized component. The light that has entered the polarization beam splitter 55 from the light source unit 40 via the split lens unit 62 is almost an s-polarized component, and the light is reflected by the polarization beam splitter 55 toward the lens 643 of the intermediate magnification portion 64a. At this time, the arrangement direction of the plurality of light beams emitted from the plurality of element lenses 620 is converted into the X direction. In other words, the chief ray of the light from the polarizing beam splitter 55 toward the intermediate magnification portion 64a is parallel to the Z direction.

於中間變倍部64a中,構成有兩側遠心光學系統,且使 以主光線平行於光軸J1(Z方向)之狀態入射之光以主光線平行於光軸J1之狀態入射至光程長度差產生部61。實際上,穿過複數個元件透鏡620之光(複數個光束)經由偏光分光器55、中間變倍部64a及1/4波長板56,分別入射至沿X方向排列之複數個透光部610,從而,複數個元件透鏡620之第2透鏡面622之像(光源41之像)分別擴大而形成於光程長度差產生部61中之複數個透光部610之內部或附近。以此方式,分割透鏡部62之元件透鏡620之排列方向與光程長度差產生部61之透光部610之排列方向係經由偏光分光器55而對應。 In the intermediate magnification portion 64a, a telecentric optical system on both sides is formed, and Light incident in a state where the principal ray is parallel to the optical axis J1 (Z direction) is incident on the optical path length difference generating portion 61 in a state where the principal ray is parallel to the optical axis J1. Actually, the light (plurality of light beams) passing through the plurality of element lenses 620 is incident on the plurality of light transmitting portions 610 arranged in the X direction via the polarization beam splitter 55, the intermediate magnification portion 64a, and the quarter wave plate 56, respectively. Thus, the image of the second lens surface 622 of the plurality of element lenses 620 (the image of the light source 41) is enlarged and formed inside or in the vicinity of the plurality of light transmitting portions 610 in the optical path length difference generating portion 61. In this manner, the arrangement direction of the element lenses 620 of the split lens portion 62 and the arrangement direction of the light transmission portions 610 of the optical path length difference generation portion 61 correspond to each other via the polarization beam splitter 55.

反射部65於光程長度差產生部61之(-Z)側之面具有藉 由塗佈形成之反射膜651a。入射至作為各透光部610之(+Z)側之面之入射面611(參照圖4)的光束藉由作為(-Z)側之面之出射面612上之反射膜651a反射,而自該入射面611出射。即,入射至各透光部610之入射面611之光束於透光部610之內部沿Z方向往返並自該入射面611向(+Z)方向出射。出射面612上之反射膜651a實質上係使自複數個透光部610之複數個出射面612出射之光折回(即,使行進方向旋轉180度)而分別入射至該複數個出射面612者。再者,元件透鏡620之第2透鏡面622之像較佳為形成於透光部610之出射面612附近(反射膜651a附近)。 The reflecting portion 65 has a borrowing on the (-Z) side of the optical path length difference generating portion 61. A reflective film 651a formed by coating. The light beam incident on the incident surface 611 (see FIG. 4) which is the surface on the (+Z) side of each of the light transmitting portions 610 is reflected by the reflective film 651a on the exit surface 612 which is the surface on the (-Z) side, and The incident surface 611 is emitted. In other words, the light beam incident on the incident surface 611 of each of the light transmitting portions 610 reciprocates in the Z direction inside the light transmitting portion 610 and is emitted from the incident surface 611 in the (+Z) direction. The reflective film 651a on the exit surface 612 is substantially such that the light emitted from the plurality of exit surfaces 612 of the plurality of light transmitting portions 610 is folded back (that is, the traveling direction is rotated by 180 degrees) and is incident on the plurality of exit surfaces 612, respectively. . Further, the image of the second lens surface 622 of the element lens 620 is preferably formed in the vicinity of the emission surface 612 of the light transmitting portion 610 (near the reflection film 651a).

自光程長度差產生部61向(+Z)方向出射之光經由1/4波 長板56入射至中間變倍部64a。於中間變倍部64a中,光程長度差產生部61之內部或附近的複數個元件透鏡620之出射面之像被縮小中繼。自透鏡643出射之光入射至偏光分光器55。自中間變倍部64a入射至偏光分光器55之光係藉由在偏光分光器55與反射部65之間之往返而2次穿過1/4波長板56,從而成為p偏光成分,且該光透過偏光分光器55入射至聚光透鏡631。繼而,藉由聚光透鏡631,使來自複數個元件透鏡620之光之照射區域50於照射面320上重疊。 The light emitted from the optical path length difference generating portion 61 in the (+Z) direction passes through the 1/4 wave. The long plate 56 is incident on the intermediate magnification portion 64a. In the intermediate magnification changing portion 64a, the image of the exit surface of the plurality of element lenses 620 inside or near the optical path length difference generating portion 61 is reduced and relayed. Light emitted from the lens 643 is incident on the polarization beam splitter 55. The light incident from the intermediate magnification changing unit 64a to the polarization beam splitter 55 passes through the 1⁄4 wavelength plate 56 twice by the round trip between the polarization beam splitter 55 and the reflection unit 65, thereby becoming a p-polarized component, and Light is incident on the condensing lens 631 through the polarization beam splitter 55. Then, by the condensing lens 631, the irradiation region 50 of the light from the plurality of element lenses 620 is superposed on the irradiation surface 320.

如以上所說明般,於圖14之光照射裝置31a中,在偏 光分光器55與反射部65之間之光之往返中的去程中,將複數個元件透鏡620之出射面擴大所得之像係藉由中間變倍部64a而形成於複數個透光部610之內部或附近。藉此,於透光部610之排列方向上,可使光程長度差產生部61大於分割透鏡部62,從而可容易地製作光程長度差產生部61。又,由於圖12中之透鏡53、54之功能於上述光之往返中之返程中藉由中間變倍部64a而實現,藉此可省略上述透鏡53、 54,從而可縮短光照射裝置31a之Z方向之全長。進而,穿過各透光部610之光束於該透光部610往返,藉此,可縮短光程長度差產生部61之光軸J1方向之長度(例如設為圖9或圖12之光程長度差產生部61之長度的一半)。 As explained above, in the light irradiation device 31a of Fig. 14, in the partial In the course of the round trip of the light between the optical splitter 55 and the reflecting portion 65, the image obtained by expanding the exit surface of the plurality of element lenses 620 is formed in the plurality of light transmitting portions 610 by the intermediate magnification changing portion 64a. Internal or nearby. Thereby, in the arrangement direction of the light transmitting portions 610, the optical path length difference generating portion 61 can be made larger than the split lens portion 62, and the optical path length difference generating portion 61 can be easily produced. Moreover, since the functions of the lenses 53, 54 in FIG. 12 are realized by the intermediate magnification changing unit 64a in the return trip of the light round trip, the lens 53 can be omitted. Thus, the entire length of the light irradiation device 31a in the Z direction can be shortened. Further, the light beam that has passed through each of the light transmitting portions 610 reciprocates in the light transmitting portion 610, whereby the length of the optical path length difference generating portion 61 in the optical axis J1 direction can be shortened (for example, the optical path of FIG. 9 or FIG. 12 is set). Half of the length of the length difference generating portion 61).

再者,於圖14之光照射裝置31a中,藉由使用偏光分 光器55及1/4波長板56,可使光量之損失相對較少,但根據光照射裝置31之設計,亦可使用半反射鏡等其他分光器。又,1/4波長板56可配置於偏光分光器55與反射部65之間之任意位置。於使用偏光分光器55及1/4波長板56之其他光照射裝置中同樣如此。進而,於圖14之光照射裝置31a中,可設置反射鏡來代替反射膜651a。進而,亦可並非如上所述之透光型之元件,而使用具有如圖16所示般階梯狀地配置之反射鏡(反射面)613之光程長度差產生部。 Furthermore, in the light irradiation device 31a of Fig. 14, by using a polarized light The optical device 55 and the 1⁄4 wavelength plate 56 can reduce the amount of light relatively small. However, depending on the design of the light irradiation device 31, other beamsplitters such as a half mirror may be used. Further, the 1⁄4 wavelength plate 56 can be disposed at any position between the polarization beam splitter 55 and the reflection portion 65. The same is true for other light irradiation devices using the polarizing beam splitter 55 and the 1⁄4 wavelength plate 56. Further, in the light irradiation device 31a of Fig. 14, a mirror may be provided instead of the reflection film 651a. Further, the optical path length difference generating portion having the mirror (reflecting surface) 613 arranged in a stepped manner as shown in FIG. 16 may be used instead of the light transmitting type element as described above.

圖17及圖18係表示光照射裝置31a之另一例之圖。圖 17表示沿著Y方向觀察所得之光照射裝置31a之構成,圖18表示沿著X方向觀察所得之光照射裝置31a之構成。於圖17及圖18所示之光照射裝置31a中,設置有透鏡657及直角稜鏡658來代替圖14及圖15之光照射裝置31a中之反射膜651a。其他構成均與圖14及圖15之光照射裝置31a同樣,且對相同構成標註相同符號。 17 and 18 are views showing another example of the light irradiation device 31a. Figure 17 shows the configuration of the light irradiation device 31a observed in the Y direction, and FIG. 18 shows the configuration of the light irradiation device 31a observed in the X direction. In the light irradiation device 31a shown in Figs. 17 and 18, a lens 657 and a right angle 稜鏡 658 are provided instead of the reflection film 651a in the light irradiation device 31a of Figs. 14 and 15 . The other configurations are the same as those of the light irradiation device 31a of Figs. 14 and 15, and the same components are denoted by the same reference numerals.

反射部65之透鏡657係配置於自光程長度差產生部61 中形成元件透鏡620(參照圖11)之出射面之像之位置向(-Z)側以透鏡657之焦距之程度分隔的位置。因此,自作為各透光部610之(-Z)側之面的出射面612朝向透鏡657出射的光束係藉由透鏡657而作為平行光向(-Z)側出射。直角稜鏡658配置於自透鏡657向(-Z)側以透鏡657之焦距之程度分隔的位置。如圖17所示般,於沿著Y方向觀察之情形 時,入射至直角稜鏡658之各光線藉由成90度之2個面658a、658b中之一面反射從而朝向另一面,並藉由該另一面進一步反射,從而與入射至直角稜鏡658時之路徑平行地朝向透鏡657。自(-Z)側入射至透鏡657之光一方面會聚一方面入射至光程長度差產生部61。實際上,自各透光部610之(-Z)側之出射面612出射之光束藉由反射部65而折回,且按相同路徑返回而入射至該出射面612。又,於該透光部610之內部或附近形成有該光束之聚光點。 The lens 657 of the reflecting portion 65 is disposed in the self-optical path length difference generating portion 61. The position where the image of the exit surface of the element lens 620 (see FIG. 11) is formed is separated by the focal length of the lens 657 toward the (-Z) side. Therefore, the light beam emitted from the exit surface 612 which is the surface on the (-Z) side of each of the light transmitting portions 610 toward the lens 657 is emitted as the parallel light toward the (-Z) side by the lens 657. The right angle 稜鏡 658 is disposed at a position separated from the lens 657 by the focal length of the lens 657 toward the (-Z) side. As shown in Figure 17, the situation observed in the Y direction At this time, each of the rays incident on the right angle 稜鏡 658 is reflected by one of the two faces 658a, 658b of 90 degrees toward the other face, and is further reflected by the other face, thereby being incident on the right angle 稜鏡 658. The path is directed parallel to the lens 657. The light incident on the lens 657 from the (-Z) side is concentrated on the one hand and incident on the optical path length difference generating portion 61. Actually, the light beam emitted from the exit surface 612 on the (-Z) side of each of the light transmitting portions 610 is folded back by the reflecting portion 65, and returns to the same surface to enter the emitting surface 612. Further, a light collecting point of the light beam is formed inside or near the light transmitting portion 610.

自光程長度差產生部61向(+Z)方向出射之光經由1/4波 長板56及中間變倍部64a而入射至偏光分光器55。該光透過偏光分光器55,入射至聚光透鏡631。繼而,藉由聚光透鏡631,使來自複數個元件透鏡620之光之照射區域50於照射面320上重疊。 The light emitted from the optical path length difference generating portion 61 in the (+Z) direction passes through the 1/4 wave. The long plate 56 and the intermediate magnification portion 64a are incident on the polarization beam splitter 55. This light passes through the polarization beam splitter 55 and enters the collecting lens 631. Then, by the condensing lens 631, the irradiation region 50 of the light from the plurality of element lenses 620 is superposed on the irradiation surface 320.

此處,使得如圖18所示般沿著X方向觀察之情形時之 透光部610之入射面611及出射面612的平行度於每一透光部610產生偏差。於此情形時,作為平行於光軸J1之平行光入射至各透光部610之(+Z)側之入射面611的光束係自該透光部610之出射面612向相對於光軸J1傾斜之出射方向作為平行光出射。該光束藉由透鏡657之作用而在直角稜鏡658上之自光軸J1偏移之位置聚光。藉由直角稜鏡658反射之光束藉由透鏡657而成為平行於上述出射方向之平行光且入射至該透光部610之出射面612。因此,透過透光部610之光束並不依存於透光部610之平行度,而是平行於自(+Z)側入射至該透光部610時之路徑地自入射面611向(+Z)方向出射。而且,來自複數個透光部610之光之照射區域50於照射面320上形成於Y方向之(大致)相同的位置。 Here, when it is observed in the X direction as shown in FIG. 18 The parallelism of the incident surface 611 and the exit surface 612 of the light transmitting portion 610 varies in each of the light transmitting portions 610. In this case, the light beam incident on the incident surface 611 on the (+Z) side of each of the light transmitting portions 610 as parallel light parallel to the optical axis J1 is from the exit surface 612 of the light transmitting portion 610 toward the optical axis J1. The oblique exit direction is emitted as parallel light. The light beam is concentrated by the action of the lens 657 at a position on the right angle 稜鏡 658 offset from the optical axis J1. The light beam reflected by the right angle 稜鏡 658 is parallel to the parallel direction of the outgoing direction by the lens 657 and is incident on the exit surface 612 of the light transmitting portion 610. Therefore, the light beam transmitted through the light transmitting portion 610 does not depend on the parallelism of the light transmitting portion 610, but is parallel to the path from the (+Z) side to the light transmitting portion 610 from the incident surface 611 (+Z) ) Directions. Further, the light irradiation region 50 from the plurality of light transmitting portions 610 is formed on the irradiation surface 320 at substantially the same position in the Y direction.

如以上般,於圖17及圖18所示之光照射裝置31a中, 反射部65使自各透光部610之出射面612出射之光平行於該光之出射 方向地入射至該出射面612。藉此,即便於複數個透光部610中之平行度(楔形成分)產生偏差之情形時,亦可使自複數個透光部610向(+Z)方向出射之複數個光束相對於光軸J1之傾斜度(沿著X方向觀察之情形之傾斜度)與自(+Z)側入射至光程長度差產生部61時之傾斜度(理想而言,為平行於光軸J1)一致。其結果,能抑制或減少穿過複數個透光部610之複數個光束於照射面320上之聚光位置(沿著X方向觀察之情形時之聚光位置)的Y方向之偏移,從而能抑制照射面320上之線照明光之Y方向之寬度的增加。再者,於反射部65中,可使用相互所成之角度為90度之2塊平面反射鏡等來代替直角稜鏡658。 As described above, in the light irradiation device 31a shown in FIGS. 17 and 18, The reflecting portion 65 causes the light emitted from the exit surface 612 of each of the light transmitting portions 610 to be emitted parallel to the light. The direction is incident on the exit surface 612. Thereby, even when the parallelism (wedge formation) of the plurality of light transmitting portions 610 is deviated, the plurality of light beams emitted from the plurality of light transmitting portions 610 in the (+Z) direction can be made relative to the optical axis. The inclination of J1 (the inclination of the case as viewed in the X direction) coincides with the inclination (preferably parallel to the optical axis J1) when the (+Z) side is incident on the optical path length difference generating portion 61. As a result, it is possible to suppress or reduce the shift in the Y direction of the light collecting position (the condensing position when viewed in the X direction) of the plurality of light beams passing through the plurality of light transmitting portions 610 on the irradiation surface 320, thereby The increase in the width of the line illumination light on the irradiation surface 320 in the Y direction can be suppressed. Further, in the reflection portion 65, two rectangular mirrors or the like having an angle of 90 degrees with each other may be used instead of the right angle 稜鏡 658.

對上述描繪裝置1及光照射裝置31、31a可進行各種變形。 Various modifications can be made to the drawing device 1 and the light irradiation devices 31 and 31a described above.

於分割透鏡部62中,未必必須使複數個元件透鏡620、620a於排列方向上以固定之間距排列,例如亦可使複數個元件透鏡620、620a之排列方向之寬度相互不同。於此情形時,複數個透光部610之排列方向之寬度亦以如下方式變更,即,於排列方向上、光程長度差產生部61中之各透光部610之寬度與對應於該透光部610之分割透鏡部62之元件透鏡620、620a之寬度的比於所有透光部610中固定。 In the split lens unit 62, it is not always necessary to arrange the plurality of element lenses 620 and 620a at a fixed interval in the arrangement direction. For example, the widths of the plurality of element lenses 620 and 620a in the arrangement direction may be different from each other. In this case, the width of the arrangement direction of the plurality of light transmitting portions 610 is also changed in such a manner that the width of each of the light transmitting portions 610 in the arrangement direction and the optical path length difference generating portion 61 corresponds to the transparency. The ratio of the widths of the element lenses 620 and 620a of the split lens portion 62 of the light portion 610 is fixed to all of the light transmitting portions 610.

中間變倍部64a未必必須為兩側遠心光學系統,只要構成使穿過複數個元件透鏡620、620a之光分別入射至複數個透光部610之擴大光學系統即可。 The intermediate magnification portion 64a does not necessarily have to be a bilateral telecentric optical system, and may constitute an enlarged optical system in which light passing through the plurality of element lenses 620 and 620a is incident on the plurality of light transmitting portions 610, respectively.

於上述光照射裝置31、31a中之雷射光之路徑中,配置於較光程長度差產生部61更靠照射面320側之聚光透鏡部63只要可使來自複數個透光部610之光之照射區域50於照射面320上重疊,便可由各種構成實現。 In the path of the laser light in the light irradiation devices 31 and 31a, the condensing lens unit 63 disposed on the side of the irradiation surface 320 of the optical path length difference generating unit 61 is configured to allow light from the plurality of light transmitting portions 610. The irradiation region 50 is superposed on the irradiation surface 320, and can be realized by various configurations.

於描繪裝置1中,配置於光照射裝置31、31a之照射面 320之空間光調變器32可為繞射光柵型之光調變器以外之光調變器,例如可使用利用微小之反射鏡之集合的空間光調變器。於此情形時,亦可藉由光照射裝置31、31a而使Y方向之寬度相對較寬之照射區域形成於照射面320上。 In the drawing device 1, the irradiation surfaces of the light irradiation devices 31 and 31a are disposed. The spatial light modulator 32 of 320 can be a light modulator other than a diffraction grating type optical modulator, for example, a spatial light modulator utilizing a collection of tiny mirrors can be used. In this case, an irradiation region in which the width in the Y direction is relatively wide may be formed on the irradiation surface 320 by the light irradiation devices 31 and 31a.

使基板9上之光之照射位置移動的移動機構亦可為使平 台21移動之移動機構22以外的移動機構,例如可為使包含光照射裝置31、31a、空間光調變器32及投影光學系統33之頭相對於基板9移動的移動機構。 The moving mechanism for moving the irradiation position of the light on the substrate 9 may also be flat The moving mechanism other than the moving mechanism 22 that moves the table 21 may be, for example, a moving mechanism that moves the heads including the light irradiation devices 31 and 31a, the spatial light modulator 32, and the projection optical system 33 with respect to the substrate 9.

藉由描繪裝置1進行描繪之對象物可為半導體基板或玻 璃基板以外之基板,又,亦可為基板以外之對象物。光照射裝置31、31a亦可用於描繪裝置1以外之裝置。 The object to be drawn by the drawing device 1 may be a semiconductor substrate or a glass substrate The substrate other than the glass substrate may be an object other than the substrate. The light irradiation devices 31, 31a can also be used to draw devices other than the device 1.

上述實施形態及各變形例中之構成只要不相互矛盾便可適當組合。 The configurations in the above-described embodiments and modifications are appropriately combined as long as they do not contradict each other.

已對本發明詳細地進行了描述並說明,但上述說明為例示而並非限定性說明。因此,可以說,只要不脫離本發明之範圍,便可採用多個變形或態樣。 The present invention has been described and illustrated in detail, but the foregoing description is illustrative and not restrictive. Therefore, it can be said that a plurality of variations or aspects can be employed without departing from the scope of the invention.

4‧‧‧光源部 4‧‧‧Light source department

5‧‧‧照射光學系統 5‧‧‧Optical optical system

31‧‧‧光照射裝置 31‧‧‧Lighting device

40‧‧‧光源單元 40‧‧‧Light source unit

41‧‧‧光源 41‧‧‧Light source

42‧‧‧準直透鏡 42‧‧‧ Collimating lens

50‧‧‧照射區域 50‧‧‧ illuminated area

61‧‧‧光程長度差產生部 61‧‧‧ Optical path length difference generation unit

62‧‧‧分割透鏡部 62‧‧‧ split lens section

63‧‧‧聚光透鏡部 63‧‧‧Concentrating lens unit

320‧‧‧照射面 320‧‧‧ illuminated surface

610‧‧‧透光部 610‧‧‧Transmission Department

620‧‧‧元件透鏡 620‧‧‧Component lens

632a‧‧‧柱面透鏡 632a‧‧‧ cylindrical lens

632b‧‧‧柱面透鏡 632b‧‧‧ cylindrical lens

fc‧‧‧柱面透鏡之焦距 f c ‧‧‧ focal length of cylindrical lens

J1‧‧‧光軸 J1‧‧‧ optical axis

θi‧‧‧入射角(最大入射角) θ i ‧‧‧incident angle (maximum incident angle)

Claims (7)

一種光照射裝置,其具備有:光源單元,其具有被排列在一個面上之複數個光源部,且上述複數個光源部係沿著上述面而自不同之方向朝向既定位置使雷射光進行出射;及照射光學系統,其係配置在上述既定位置,將來自上述光源單元之雷射光沿著光軸導引至照射面;上述照射光學系統具備有:分割透鏡部,其具有複數個透鏡,且藉由上述複數個透鏡將自上述複數個光源部所入射之光加以分割,該等複數個透鏡係排列在垂直於上述光軸且沿著上述面之方向;光程長度差產生部,其具有複數個透光部,且穿過上述複數個透鏡之光分別入射至上述複數個透光部,該等複數個透光部係排列在垂直於上述光軸之方向並且具有相互不同之光程長度;聚光透鏡部,其係配置於上述雷射光之路徑中較上述光程長度差產生部更上述照射面側,將來自上述複數個透光部之光之照射區域在上述照射面上加以重疊;及中間變倍部,其係配置在上述分割透鏡部與上述光程長度差產生部之間,並且構成擴大光學系統。 A light irradiation device comprising: a light source unit having a plurality of light source units arranged on one surface; and the plurality of light source units emitting laser light from different directions toward a predetermined position along the surface And an illumination optical system disposed at the predetermined position, and directing laser light from the light source unit to the illumination surface along an optical axis; the illumination optical system includes: a split lens portion having a plurality of lenses, and The light incident from the plurality of light source sections is divided by the plurality of lenses, the plurality of lens systems are arranged in a direction perpendicular to the optical axis and along the surface; and the optical path length difference generating portion has a plurality of light transmitting portions, and light passing through the plurality of lenses is incident on the plurality of light transmitting portions, respectively, and the plurality of light transmitting portions are arranged in a direction perpendicular to the optical axis and have mutually different optical path lengths a condensing lens unit disposed on the irradiation light surface in the path of the laser light, and the plurality of light transmissions from the plurality of light transmission lengths The irradiation area of light to be superimposed on the irradiation surface; and the intermediate magnification unit, which system is arranged between the split lens portion and the optical path length difference generating unit, and an optical system configured to expand. 如申請專利範圍第1項之光照射裝置,其中,上述中間變倍部係構成兩側遠心光學系統。 The light irradiation device of claim 1, wherein the intermediate magnification unit constitutes a telecentric optical system on both sides. 如申請專利範圍第2項之光照射裝置,其中,上述中間變倍部係在上述複數個透光部之內部或者附近,形成上述複數個透鏡之出射面之像。 The light irradiation device according to claim 2, wherein the intermediate magnification unit forms an image of an exit surface of the plurality of lenses in or near the plurality of light transmission portions. 一種光照射裝置,其具備有:光源單元,其具有被排列在一個面上之複數個光源部,且上述複數個光源部係沿著上述面而自不同之方向朝向既定位置使雷射光進行出射;及照射光學系統,其係配置在上述既定位置,將來自上述光源單元之雷射光沿著光軸導引至照射面;上述照射光學系統具備有:分割透鏡部,其具有複數個透鏡,且藉由上述複數個透鏡將自上述複數個光源部所入射之光加以分割,該等複數個透鏡係排列在垂直於上述光軸且沿著上述面之方向;光程長度差產生部,其具有複數個透光部,且穿過上述複數個透鏡之光分別入射至上述複數個透光部,該等複數個透光部係排列在垂直於上述光軸之方向並且具有相互不同之光程長度;聚光透鏡部,其係配置於上述雷射光之路徑中較上述光程長度差產生部更上述照射面側,將來自上述複數個透光部之光之照射區域在上述照射面上加以重疊;及反射部,其使透過上述光程長度差產生部而自上述複數個透光部之複數個出射面所出射之光折回,並且分別入射至上述複數個出射面。 A light irradiation device comprising: a light source unit having a plurality of light source units arranged on one surface; and the plurality of light source units emitting laser light from different directions toward a predetermined position along the surface And an illumination optical system disposed at the predetermined position, and directing laser light from the light source unit to the illumination surface along an optical axis; the illumination optical system includes: a split lens portion having a plurality of lenses, and The light incident from the plurality of light source sections is divided by the plurality of lenses, the plurality of lens systems are arranged in a direction perpendicular to the optical axis and along the surface; and the optical path length difference generating portion has a plurality of light transmitting portions, and light passing through the plurality of lenses is incident on the plurality of light transmitting portions, respectively, and the plurality of light transmitting portions are arranged in a direction perpendicular to the optical axis and have mutually different optical path lengths a condensing lens unit disposed on the irradiation light surface in the path of the laser light, and the plurality of light transmissions from the plurality of light transmission lengths The irradiation area of the light is superimposed on the irradiation surface; and the reflection portion is configured to fold back the light emitted from the plurality of emission surfaces of the plurality of light transmission portions through the optical path length difference generation portion, and respectively enter the light The above plurality of exit faces. 如申請專利範圍第4項之光照射裝置,其中,上述反射部係使自上述複數個出射面所出射之光以平行於上述光之出射方向之方式分別入射至上述複數個出射面。 The light irradiation device of claim 4, wherein the reflection portion causes the light emitted from the plurality of emission surfaces to enter the plurality of emission surfaces so as to be parallel to the emission direction of the light. 一種光照射裝置,其具備有:光源單元,其具有被排列在一個面上之複數個光源部,且上述複 數個光源部係沿著上述面而自不同之方向朝向既定位置使雷射光進行出射;及照射光學系統,其係配置在上述既定位置,將來自上述光源單元之雷射光沿著光軸導引至照射面;上述照射光學系統具備有:分割透鏡部,其具有複數個透鏡,且藉由上述複數個透鏡將自上述複數個光源部所入射之光加以分割,該等複數個透鏡係排列在垂直於上述光軸且沿著上述面之方向;光程長度差產生部,其具有複數個透光部,且穿過上述複數個透鏡之光分別入射至上述複數個透光部,該等複數個透光部係排列在垂直於上述光軸之方向並且具有相互不同之光程長度;及聚光透鏡部,其係配置於上述雷射光之路徑中較上述光程長度差產生部更上述照射面側,將來自上述複數個透光部之光之照射區域在上述照射面上加以重疊;上述分割透鏡部與上述光程長度差產生部係相互接近地被配置,且於上述複數個透光部之排列方向上,自上述複數個透光部各出射面所出射之光的寬度係小於上述複數個透光部之間距。 A light irradiation device comprising: a light source unit having a plurality of light source sections arranged on one surface, and the above a plurality of light source sections emit laser light from different directions toward a predetermined position along the surface; and an illumination optical system disposed at the predetermined position to guide the laser light from the light source unit along the optical axis The illumination optical system includes: a split lens unit having a plurality of lenses, and the light incident from the plurality of light source sections is divided by the plurality of lenses, wherein the plurality of lens systems are arranged a direction perpendicular to the optical axis and along the surface; an optical path length difference generating portion having a plurality of light transmitting portions, and light passing through the plurality of lenses is incident on the plurality of light transmitting portions, respectively The light transmitting portions are arranged in a direction perpendicular to the optical axis and have mutually different optical path lengths; and the collecting lens portion is disposed in the path of the laser light and is further irradiated than the optical path length difference generating portion On the surface side, the irradiation region of the light from the plurality of light transmitting portions is superposed on the irradiation surface; and the divided lens portion and the optical path length difference generating portion are It is arranged close to, and in the arrangement direction of the plurality of light transmitting portions, from said plurality of light transmitting portions of each of the light exit surface of the exit-width coefficient is smaller than the pitch of the plurality of light-transmitting portion. 一種描繪裝置,其具備有:申請專利範圍第1至6項中任一項所記載之光照射裝置;空間光調變器,其係配置在上述光照射裝置中之上述照射面;投影光學系統,其將藉由上述空間光調變器而經空間調變之光導引至對象物上;移動機構,其使上述經空間調變之光在上述對象物上之照射位置進行移動;及 控制部,其與藉由上述移動機構所進行之上述照射位置之移動同步地對上述空間光調變器進行控制。 A light-emitting device according to any one of claims 1 to 6, wherein the spatial light modulator is disposed on the irradiation surface of the light irradiation device; the projection optical system Transmitting the spatially modulated light to the object by the spatial light modulator; and moving the mechanism to move the spatially modulated light on the object at the illumination position; and The control unit controls the spatial light modulator in synchronization with the movement of the irradiation position by the moving mechanism.
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