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TWI549910B - Method of preparing trialkoxysilane - Google Patents

Method of preparing trialkoxysilane Download PDF

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TWI549910B
TWI549910B TW101124750A TW101124750A TWI549910B TW I549910 B TWI549910 B TW I549910B TW 101124750 A TW101124750 A TW 101124750A TW 101124750 A TW101124750 A TW 101124750A TW I549910 B TWI549910 B TW I549910B
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solvent
reaction
trialkoxysilane
reactor
producing
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TW201339094A (en
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楊世仁
金容逸
金敬烈
金德允
亞須洛夫 科哈坦
阿布杜拉瑪諾夫 波里斯
羅始泰恩 弗拉迪米亞
沙里克霍夫 夏夫凱特
亞須洛瓦 肯卡亞特
沙里姆鮑夫 亞克馬爾
亞茲索夫 蘇坦
沙多夫 沙畢爾
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Oci有限公司
等離子及雷射科技研究院
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製備三烷氧矽烷之方法 Method for preparing trialkoxysilane 發明領域 Field of invention

本發明有關一種製備三烷氧矽烷之方法。更明確地,其有關一種製備以SiH(OR)3表示之三烷氧矽烷之方法,其中R係C1-C3甲基、乙基或丙基基團。 The present invention relates to a process for preparing a trialkoxysilane. More specifically, it relates to a process for preparing a trialkoxysilane represented by SiH(OR) 3 wherein R is a C 1 -C 3 methyl, ethyl or propyl group.

發明背景 Background of the invention

括弧[ ]內之數字指的是在此併入本案作為參考之文件的編號。 The number in brackets [ ] refers to the number of the document incorporated herein by reference.

三烷氧矽烷在各種領域中已有廣泛的應用,例如,應用於太陽能或半導體之矽酸寡聚物、甲矽烷、矽之生產等等。 Trialkyloxane has been widely used in various fields, for example, in the production of tannic acid oligomers of solar energy or semiconductors, the production of decane, hydrazine, and the like.

合成三烷氧矽烷之方法分成二種基本的方法。一種係在蒸氣-氣體環境下,在固定床或流化床上進行之合成法。該在蒸氣-氣體環境下之合成法的進行,係使汽化醇通過置於固定床或流化床中包括催化劑之矽粉。然而,固定床反應器並不被廣泛的使用,因為其很難維持整個反應器處於均勻恆定的溫度下。假如該合成法係直接在流化床上進行,則可排除以上之缺點。 The method of synthesizing trialkoxydioxane is divided into two basic methods. A method of synthesis in a fixed bed or fluidized bed in a vapor-gas environment. The synthesis in a vapor-gas environment is carried out by passing the vaporized alcohol through a crucible comprising a catalyst in a fixed bed or a fluidized bed. However, fixed bed reactors are not widely used because it is difficult to maintain the entire reactor at a uniform and constant temperature. If the synthesis is carried out directly on a fluidized bed, the above disadvantages can be eliminated.

根據參考文獻[1],用氣體稀釋汽化醇可抑制或使流化床之溫度增加最小。稀釋氣體可為氬氣、氮氣、氦氣、氖氣、氫氣以及其它氣體。然而,假如施予補充材料,製造成本會增加,且由於惰性氣體之帶出,會增加三烷氧矽烷 與醇之流失。在減壓下進行合成,可改善目標材料三甲氧矽烷之產率。在這點上,在正常壓力下,矽轉換率為90%,選擇性分別為84.2%以及65%以及48.8%。然而,當壓力降低時,反應速率會減低,因而降低了產率。 According to reference [1], diluting the vaporized alcohol with a gas suppresses or minimizes the temperature increase of the fluidized bed. The diluent gas may be argon, nitrogen, helium, neon, hydrogen, and other gases. However, if supplemental materials are applied, the manufacturing cost will increase, and the addition of the inert gas will increase the trialkoxide. With the loss of alcohol. The synthesis under reduced pressure can improve the yield of the target material trimethoxy decane. At this point, under normal pressure, the enthalpy conversion rate is 90%, and the selectivity is 84.2% and 65% and 48.8%, respectively. However, when the pressure is lowered, the reaction rate is lowered, thereby lowering the yield.

參考文獻[2]建議一種使氫氣與汽化醇通過接觸物質之技術。假如在三烷氧矽烷之製造中施用氫氣,則需要用於製備以及純化氫氣之設備,因而增加了製造成本。當該接觸物質係用氮氣活化,且在反應溫度280℃或更低下加入鋅作為加速劑時,在反應混合物中所含之三乙氧矽烷之含量為87%,具非常低的矽轉換率23%。 Reference [2] suggests a technique for passing hydrogen and vaporized alcohol through a contact substance. If hydrogen is applied in the manufacture of a trialkoxide, equipment for preparing and purifying hydrogen is required, thus increasing the manufacturing cost. When the contact substance is activated by nitrogen and zinc is added as an accelerator at a reaction temperature of 280 ° C or lower, the content of triethoxy decane contained in the reaction mixture is 87%, and has a very low enthalpy conversion rate of 23 %.

包括矽與催化劑之接觸物質的活化,在[1]中係在450℃或更低之溫度下逐步進行,而在參考文獻[2]以及[5]中係在300至350℃範圍內之溫度下,氮氣或其它惰性氣體氛圍中進行。 The activation of the contact species including ruthenium and the catalyst is carried out stepwise at 450 ° C or lower in [1] and in the range of 300 to 350 ° C in references [2] and [5]. Under nitrogen, or other inert gas atmosphere.

參考文獻[6]至[9]揭示為了活化矽以及催化劑,施用氫氣之方法。使用氫氣活化係在固定床或流化床中,於約400℃下進行。矽與催化劑之混合物包括1.5%或更多的銅。然而,沒有提供其選擇性、反應性以及反應安定性。 References [6] to [9] disclose a method of applying hydrogen gas for activating ruthenium and a catalyst. The hydrogen activation system is carried out in a fixed bed or a fluidized bed at about 400 °C. The mixture of rhodium and catalyst comprises 1.5% or more copper. However, its selectivity, reactivity, and reaction stability were not provided.

參照參考文獻[1]至[9],在流化床中進行合成反應以獲得三乙氧矽烷之結果是,假如反應係在大氣壓力下進行的,則三乙氧矽烷之產率以及矽轉換速率並不高。假如反應係在減壓下進行,則主要的合成指數增加,但取決於其技術特徵抵銷了優點。此外,假如液化材料進一步與醇一起注射,則其在流化床中合成三烷氧矽烷時,雖然一些合 成指數增加了,但會產生問題,由於矽與催化劑之帶出,另外需要一過濾程序。 Referring to references [1] to [9], the synthesis reaction in a fluidized bed to obtain triethoxyoxane results in the yield of triethoxyoxane and the conversion of ruthenium if the reaction is carried out under atmospheric pressure. The rate is not high. If the reaction is carried out under reduced pressure, the main synthetic index increases, but the advantages are offset by the technical characteristics. In addition, if the liquefied material is further injected together with the alcohol, it is synthesized in the fluidized bed, although some are combined. The index has increased, but it will cause problems. Because of the cockroaches and catalysts, a filtration process is needed.

另一合成方法係矽與醇在裝設有攪拌設備之反應器之液體溶劑中,呈懸浮液之狀態下直接反應。近來,此方法已被廣泛地使用,因為藉由使用溶劑,溫度在反應混合物中維持均勻,大幅地降低過度加熱反應環境之情況,且抑制了副反應,如此三烷氧矽烷之選擇性以及矽轉換率均增加。 Another synthesis method is a direct reaction with an alcohol in a liquid solvent in a reactor equipped with a stirring apparatus in the form of a suspension. Recently, this method has been widely used because by using a solvent, the temperature is maintained uniform in the reaction mixture, the overheating reaction environment is greatly reduced, and the side reaction is suppressed, and the selectivity of the trialkoxide and the ruthenium The conversion rate has increased.

因為三烷氧矽烷之合成反應係在約300℃之高溫下進行,所以在此合成反應中使用之溶劑不可在此高溫下分解。該溶劑在反應系統中應能夠維持均勻之溫度。此外,矽粉需均勻地分散於溶劑中,且在從100至300℃之反應溫度範圍內,該溶劑不可以引起氧化作用。 Since the synthesis reaction of the trialkoxysilane is carried out at a high temperature of about 300 ° C, the solvent used in the synthesis reaction cannot be decomposed at this high temperature. The solvent should be capable of maintaining a uniform temperature in the reaction system. Further, the niobium powder needs to be uniformly dispersed in the solvent, and the solvent does not cause oxidation in a reaction temperature range from 100 to 300 °C.

參考文獻[10]以及[11]建議烷化苯,而參考文獻[12]建議烷化萘-"THERMINOL"oil。THERMINOL® 59、60、66;DOWTHERM® HT、MARLOTHERM® S、MARLOTHERM®以及其它產品在參考文獻13以及25中有詳細的揭示。 References [10] and [11] suggest alkylating benzene, while reference [12] suggests alkylating naphthalene - "THERMINOL" oil. THERMINOL ® 59, 60, 66; DOWTHERM ® HT, MARLOTHERM ® S, MARLOTHERM ® and others are disclosed in detail in references 13 and 25.

在參考文獻[13]、[14]以及[15]中,決定用於合成反應之溶劑的數量,係使溶劑:矽之比率可在1:2至4:1,較佳地1:1至2:1之數量。 In references [13], [14] and [15], the amount of solvent used in the synthesis reaction is determined such that the ratio of solvent: hydrazine can be from 1:2 to 4:1, preferably from 1:1 to The number of 2:1.

依照參考文獻[16]至[20],添加矽與醇之反應材料後,反應之活化作用需要一段長的誘導期間,例如,1至12個小時。已知,需要此誘導期間主要是因為在矽之表面上形成氧化物薄膜。為了縮短誘導期間,需於三烷氧矽烷之合成 反應中加入活化步驟。 According to references [16] to [20], after the reaction material of hydrazine and alcohol is added, the activation of the reaction requires a long induction period, for example, 1 to 12 hours. It is known that this induction period is mainly required because an oxide film is formed on the surface of the crucible. In order to shorten the induction period, it is necessary to synthesize a trialkoxide. An activation step is added to the reaction.

參考文獻[13]詳細的說明一種活化方法。該活化方法可在一反應器或在分開的設備中進行。在分開的設備中活化的矽,可轉移至乾燥惰性環境下之反應器中。該活化反應在20至400℃,較佳地150至300℃下進行。氫氣以及氮氣用作為活化氣體,而用甲醇活化矽供矽與乙醇間之反應,因為甲醇對矽之活性大於乙醇或更高級醇。例如,假如於乙醇中加入5%甲醇,則反應速率大幅地增加。就此方面,使用氫氣以及氮氣,在150至250℃下,活化包括1kg之矽、14.1g之氫氧化銅以及2.1kg作為溶劑之MARLOTHERM®S之反應懸浮液,歷時65分鐘。在250℃下,於其中以4.3g/min之速率加入甲醇,歷時5個小時。之後,將溫度降至230℃,然後停止甲醇之提供,然而以恆定速率維持乙醇之提供,其中停止氫氣之提供,然而維持氮氣之提供。以化學計量方式計算活性材料之總數量,且調整至足以將二價或單價銅催化劑轉換成游離銅之數量。事實上,活化過程需要一段長的時間,且其等一定要,這是因為矽-銅物質之大的表面,其中矽微粒之直徑在50至300μm之範圍內。其間,催化劑之粒子尺寸大小係有限制的。微粒子尺寸大小需在1至100μm之範圍內,較佳地0.1至50μm,更佳地0.1至30μm之範圍內。同時,原料中催化劑之比表面積可在0.1至2m2/g,較佳地10至50m2/g之範圍內。使用醇之矽的直接合成法可能在周期模式以及連續模式二者下進行。在周期模式方面,雖然所有的矽在早期階段添加至反應中,但醇係連續 提供直到矽之反應終止。根據產率,預定數量的矽可間歇地提供,然而醇係連續提供。在連續模式方面,矽或含催化劑之矽可在操作開始之後加入反應器中。就此方面,可使催化劑之數量最小或調整成不會引起分解醇之副反應。反應溫度可為150℃或更高,不超過醇以及溶劑會被分解之溫度。該反應可在200至260℃之範圍內操作。適合甲醇之反應之溫度可為220至250℃,適合乙醇之反應之溫度可為200至240℃。三烷氧矽烷之直接合成法可在不管壓力之情況下進行,較佳地在大氣壓力下進行。 A method of activation is described in detail in reference [13]. The activation process can be carried out in a reactor or in separate equipment. The hydrazine activated in a separate apparatus can be transferred to a reactor in a dry inert environment. The activation reaction is carried out at 20 to 400 ° C, preferably 150 to 300 ° C. Hydrogen and nitrogen are used as the activating gas, and methanol is used to activate the reaction between hydrazine and ethanol because methanol is more active than hydrazine or higher alcohol. For example, if 5% methanol is added to ethanol, the reaction rate is greatly increased. In this regard, the use of hydrogen and nitrogen at 150 to 250 deg.] C, 1kg of activating comprises silicon, copper hydroxide and 14.1g of 2.1kg as a reaction solvent MARLOTHERM ® S of the suspension over a period of 65 minutes. Methanol was added at a rate of 4.3 g/min at 250 ° C for 5 hours. Thereafter, the temperature was lowered to 230 ° C, and then the supply of methanol was stopped, however, the supply of ethanol was maintained at a constant rate, in which the supply of hydrogen was stopped, while the supply of nitrogen was maintained. The total amount of active material is calculated stoichiometrically and adjusted to an amount sufficient to convert the divalent or monovalent copper catalyst to free copper. In fact, the activation process takes a long time, and it must be equal, because of the large surface of the bismuth-copper material, in which the diameter of the ruthenium particles is in the range of 50 to 300 μm. In the meantime, the particle size of the catalyst is limited. The size of the microparticles needs to be in the range of 1 to 100 μm, preferably 0.1 to 50 μm, more preferably 0.1 to 30 μm. Meanwhile, the specific surface area of the catalyst in the raw material may be in the range of 0.1 to 2 m 2 /g, preferably 10 to 50 m 2 /g. The direct synthesis using hydrazine can be carried out in both periodic mode as well as continuous mode. In terms of the periodic mode, although all of the hydrazine is added to the reaction at an early stage, the alcohol is continuously supplied until the reaction of hydrazine is terminated. Depending on the yield, a predetermined amount of hydrazine may be provided intermittently, however the alcohol system is continuously supplied. In the continuous mode, rhodium or a catalyst-containing rhodium can be added to the reactor after the start of the operation. In this regard, the amount of catalyst can be minimized or adjusted so as not to cause side reactions that decompose alcohol. The reaction temperature may be 150 ° C or higher, not exceeding the temperature at which the alcohol and the solvent are decomposed. The reaction can be operated in the range of 200 to 260 °C. The temperature suitable for the reaction of methanol may be 220 to 250 ° C, and the temperature suitable for the reaction of ethanol may be 200 to 240 ° C. The direct synthesis of the trialkoxysilane can be carried out regardless of the pressure, preferably at atmospheric pressure.

參考文獻[21]以及[22]建議用氟化氫處理矽,為了在反應開始之前從矽之表面移去氧化物薄膜,以減少誘導期間。 References [21] and [22] suggest treating ruthenium with hydrogen fluoride in order to reduce the induction period by removing the oxide film from the surface of the ruthenium before the start of the reaction.

參考文獻[10]以及[22]建議藉由在氮氣、氬氣或任何其它惰性氣體氛圍中維持高溫,活化反應物質,而參考文獻[23]建議在惰性氣體氛圍中之研磨器中,預混合矽與催化劑8個小時。 References [10] and [22] suggest that the reaction mass is activated by maintaining a high temperature in a nitrogen, argon or any other inert gas atmosphere, while reference [23] suggests premixing in a grinder in an inert gas atmosphere.矽 with catalyst for 8 hours.

參考文獻[21]揭示在合成之前注射烷基氯、氯化氫或氯化銨,用於活化矽,而參考文獻[24]揭示注射諸如NH4HF2之鹵化物。然而,假如在合成反應之前於反應器中加入鹵化物、烷基鹵化物、甲醇等等,則另外需要蒸餾步驟以移除雜質,因而使得三烷氧矽烷之製造過程變複雜。 Reference [21] discloses an injection alkyl chloride, hydrogen chloride or ammonium chloride prior to the synthesis, the activated silicon is used, but Reference [24] discloses an injection such as NH 4 HF 2 of halide. However, if a halide, an alkyl halide, methanol or the like is added to the reactor prior to the synthesis reaction, a distillation step is additionally required to remove the impurities, thus complicating the manufacturing process of the trialkoxysilane.

因此,在三烷氧矽烷之直接合成方面,誘導期間不是可以簡單地了解的,且還沒發現減少誘導期間之有效的方法。假如在該合成方法中添加另外的試劑,則需進一步移除該試劑之步驟,如此使得三烷氧矽烷之製造過程變複雜 且增加製造成本。 Therefore, in the direct synthesis of trialkoxydecane, the induction period is not simply understood, and no effective method for reducing the induction period has been found. If additional reagents are added to the synthesis, the step of further removing the reagents is required, which complicates the manufacturing process of the trialkoxide. And increase manufacturing costs.

參照參考文獻[11]、[13]、[14]、[17]以及[21],三烷氧矽烷之主要合成反應會因副反應而一起產生寡烷氧矽氧烷、濕氣以及其它副反應產物,而此等副反應產物之累積會減低反應速率。參照參考文獻[14],因為催化劑中所含之金屬是矽合成反應中之雜物,所以由於催化劑分解產生之金屬銅會累積在溶劑中。殘留的矽、含雜質之矽以及三烷氧矽烷之累積會減低反應速率。既然這樣,為了重新使用三烷氧矽烷合成中之溶劑,則應復原該溶劑。 Referring to references [11], [13], [14], [17], and [21], the main synthesis reaction of trialkoxane produces oligoalkane, moisture, and other vices due to side reactions. The reaction product, and the accumulation of such side reaction products, reduces the reaction rate. Referring to the reference [14], since the metal contained in the catalyst is a foreign matter in the hydrazine synthesis reaction, metallic copper due to decomposition of the catalyst is accumulated in the solvent. The accumulation of residual ruthenium, impurity-containing ruthenium, and trialkoxide reduces the reaction rate. In this case, in order to reuse the solvent in the synthesis of the trialkoxide, the solvent should be reconstituted.

為改善三烷氧矽烷之主要合成指數之效率,使用鋁(數量為0.01至10%,較佳地0.1至2%,參考文獻[16])、鋅(參考文獻[2])以及具有氧化磷以及單鍵或多鍵之有機或非有機化合物(參考文獻[25])作為三烷氧矽烷之反應加速劑。然而,沒有揭示有關其效果之資訊。 In order to improve the efficiency of the main synthesis index of the trialkoxysilane, aluminum (amount of 0.01 to 10%, preferably 0.1 to 2%, reference [16]), zinc (reference [2]), and phosphorus oxide are used. And single or multiple bonds of organic or non-organic compounds (Ref. [25]) as reaction accelerators for trialkoxides. However, no information about its effects has been revealed.

參考文獻[1]揭示一種製備三烷氧矽烷之方法,該方法包括矽之粉碎步驟,以及在催化劑之存在下使該粉碎的矽與醇反應。 Reference [1] discloses a process for preparing a trialkoxysilane which comprises a pulverization step of ruthenium and reacting the pulverized ruthenium with an alcohol in the presence of a catalyst.

使用於空氣中粉碎成微粒尺寸至500μm之工業矽作為反應物。乙醇以及甲醇作為醇試劑,而諸如氯化銅(CuCl)之含銅化合物作為催化劑。其等與粉碎矽混合,然後在300℃或更低溫度下預熱該混合物數個小時,以活化催化劑,藉此活化醇與矽之間之交互反應。此技術亦可用於與參考文獻[1]之方法相似之其它方法。為了促進矽與醇之間之交互反應,於額外的催化劑中加入鹵化物,包括鹵素元素之 有機以及非有機材料之例子為氯化物、氟化物、溴化甲烷、溴化乙烷、三氯乙烯、氟化氫(HF)、氯化氫(HCl)、HBr以及HI。此方法儘管有優點,但具有各種的缺點。在該等缺點當中,在300℃或更低之溫度下預熱催化劑一段長的時間,會導致另外的能量流失,據此,總製程時間增加,且能量消耗增加。此外,施用氣態鹵化物來活化製程,在環境方面並不安全。 Industrial ruthenium pulverized into a particle size of 500 μm in air was used as a reactant. Ethanol and methanol are used as the alcohol reagent, and a copper-containing compound such as copper chloride (CuCl) is used as the catalyst. They are mixed with the pulverized ruthenium, and then the mixture is preheated at 300 ° C or lower for several hours to activate the catalyst, thereby activating the interaction between the alcohol and the hydrazine. This technique can also be applied to other methods similar to those of the reference [1]. In order to promote the interaction between the hydrazine and the alcohol, a halide is added to the additional catalyst, including a halogen element. Examples of organic and non-organic materials are chlorides, fluorides, methyl bromide, ethyl bromide, trichloroethylene, hydrogen fluoride (HF), hydrogen chloride (HCl), HBr, and HI. This method has various disadvantages despite its advantages. Among these disadvantages, preheating the catalyst at a temperature of 300 ° C or lower for a long period of time causes additional energy loss, whereby the total process time is increased and the energy consumption is increased. In addition, the application of gaseous halides to activate the process is not environmentally safe.

參考文獻[26]揭示一種方法,包括矽之粉碎步驟以及粉碎的矽與醇間在加熱的溶劑環境中利用催化劑之交互反應步驟(其中試劑已經活化)。矽之粉碎係使用球磨,於空氣中粉碎成微粒尺寸至500μm。乙醇以及甲醇作為醇試劑,獲得之三乙氧矽烷或三甲氧矽烷為最終產物。含銅化合物,諸如氯化銅(CuCl),作為催化劑。聚芳族油作為溶劑,而粉碎的矽與醇之間之交互作用之主要技術製程,在200℃熱環境下進行。在此,活化試劑技術之施用係基於下列理由。在三烷氧矽烷之製備方面,原料中所含之雜質會累積在反應物質中,如此反應物質無法均勻地消耗掉,且一部分的溶劑在副反應中會與雜質一起消耗掉,如此留下未反應的矽。因此,於其中施用活化該試劑之技術。此技術包括抽出以及沈澱包括未反應的矽之反應混合物之懸浮液,添加適當量的溶劑以及催化劑恢復濃縮的懸浮液。此操作在製程期間當未反應的矽累積在反應器中呈沈積物時進行數次。如其它相似的方法,雖然副反應減少了、產物的產率增加了、原料之流失減少了以及產率增加了,但製程非常 的複雜,因為要將未反應的矽分開來,以便補充流失的溶劑以及催化劑,以及要週期地添加溶劑與催化劑之濃縮混合物至反應物質中。此外,因為當以饋入方式添加試劑以補充消耗時,反應可能會快速地慢下來,因此沒考慮排除或降低誘導期間。 Reference [26] discloses a method comprising a pulverization step of ruthenium and an interactive reaction step of pulverizing ruthenium with an alcohol in a heated solvent environment (wherein the reagent has been activated). The pulverization of the crucible was pulverized in the air to a particle size of 500 μm using a ball mill. Ethyl alcohol and methanol are used as the alcohol reagent, and triethoxy decane or trimethoxy decane is obtained as the final product. A copper-containing compound such as copper chloride (CuCl) is used as a catalyst. The polyaromatic oil is used as a solvent, and the main technical process of the interaction between the pulverized hydrazine and the alcohol is carried out in a hot environment of 200 °C. Here, the application of the activating reagent technique is based on the following reasons. In the preparation of the trialkoxide, impurities contained in the raw material are accumulated in the reaction material, so that the reaction material cannot be uniformly consumed, and a part of the solvent is consumed together with the impurities in the side reaction, thus leaving no The reaction 矽. Therefore, the technique of activating the reagent is applied thereto. This technique involves withdrawing and precipitating a suspension of the reaction mixture comprising unreacted hydrazine, adding an appropriate amount of solvent, and recovering the concentrated suspension from the catalyst. This operation is carried out several times during the process when unreacted ruthenium accumulates in the reactor as a deposit. As with other similar methods, although the side reactions are reduced, the yield of the product is increased, the loss of raw materials is reduced, and the yield is increased, the process is very The complexity is because the unreacted helium is separated to replenish the lost solvent and catalyst, and the concentrated mixture of solvent and catalyst is periodically added to the reaction mass. In addition, since the reaction may be slowly slowed down when the reagent is added in a feed-in manner to supplement the consumption, it is not considered to exclude or reduce the induction period.

引述的參考文獻 Quoted references 專利 patent

[1] US Patent No. 5,260,471: Process for producing trialkoxysilane / Yashinori Yamada 1993。 [1] US Patent No. 5,260,471: Process for producing trialkoxysilane / Yashinori Yamada 1993.

[2] US Patent No. 3,072,700: Process for producing silanes / Nicolas P.V. de wit 1963。 [2] US Patent No. 3,072,700: Process for producing silanes / Nicolas P.V. de wit 1963.

[3] Japanese Patent No. 06065258: Preparation of trialkoxysilanes / Harada, Masayoshi, Yamada, Yoshinori, 1994。 [3] Japanese Patent No. 06065258: Preparation of trialkoxysilanes / Harada, Masayoshi, Yamada, Yoshinori, 1994.

[4] GB Patent No. 2263113: Process for producing trialkoxysilanes / Yamada, Yoshinori, Harada, Katsuyoshi, 1993。 [4] GB Patent No. 2263113: Process for producing trialkoxysilanes / Yamada, Yoshinori, Harada, Katsuyoshi, 1993.

[5] Japanese Patent No. 05178864: Preparation of trialkoxysilanes / Yamada, Yoshinori, Harada, Masayoshi, 1993。 [5] Japanese Patent No. 05178864: Preparation of trialkoxysilanes / Yamada, Yoshinori, Harada, Masayoshi, 1993.

[6] US Patent No. 3,641,077: Method for preparing alkoxy derivatives of silicon germanium tin thallium and arsenic / Rochov E.G. 1972。 [6] US Patent No. 3,641,077: Method for preparing alkoxy derivatives of silicon germanium tin thallium and arsenic / Rochov E.G. 1972.

[7] US Patent No. 2,380,997: Contact masses / Patnode Winton, 1945。 [7] US Patent No. 2,380,997: Contact masses / Patnode Winton, 1945.

[8] US Patent No. 2,473,260: Preparation of tetramethyl silicate / Rochov E.G. 1946。 [8] US Patent No. 2,473,260: Preparation of tetramethyl silicate / Rochov E.G. 1946.

[9] US Patent No. 4,314,908: Preparation of reaction mass for the production of methylchlorosilane / Downing James; Wells James, 1982。 [9] US Patent No. 4,314,908: Preparation of reaction mass for the production of methylchlorosilane / Downing James; Wells James, 1982.

[10] US Patent No. 4,727,173: Process for producing trialkoxysilanes / Mendicino F.D. 1988。 [10] US Patent No. 4,727,173: Process for producing trialkoxysilanes / Mendicino F.D. 1988.

[11] US Patent No. 3,775,457: Method of manufacturing alkoxysilanes/ Hisashi Muraoka, Yokohama, Kanagawa-ken, 27.11.73。 [11] US Patent No. 3,775,457: Method of manufacturing alkoxysilanes/ Hisashi Muraoka, Yokohama, Kanagawa-ken, 27.11.73.

[12] US Patent No. 762,939: Process for trialkoxysilane/ tetraalkoxysilane mixtures from silicon metal and alcohol, 1988。 [12] US Patent No. 762,939: Process for trialkoxysilane/tetraalkoxysilane mixtures from silicon metal and alcohol, 1988.

[13] US Patent No. 5,783,720: Surface-active additives in the direct synthesis of trialkoxysilanes / Mendicino, Frank, Childress, 1998。 [13] US Patent No. 5,783,720: Surface-active advantages in the direct synthesis of trialkoxysilanes / Mendicino, Frank, Childress, 1998.

[14] US Patent No. 6,090,965: Removal of dissolvent silicates from alcohol-silicon direct synthesis solvents / K.M.Lewis, Hua Yu, 2000。 [14] US Patent No. 6,090,965: Removal of dissolvent silicates from alcohol-silicon direct synthesis solvents / K.M.Lewis, Hua Yu, 2000.

[15] US Patent No. 5,166,384: Method for the removal of siloxane dissolved in the solvent employed in the preparation of trimethoxysilane via methanol-silicon metal reaction / Donald L. Bailey, Thomas E. Childress, Newport, both of Ohio, 1992。 [15] US Patent No. 5,166,384: Method for the removal of siloxane dissolved in the solvent employed in the preparation of trimethoxysilane via methanol-silicon metal reaction / Donald L. Bailey, Thomas E. Childress, Newport, Both of Ohio, 1992.

[16] US Patent No. 5,362,897: Process for producing trialkoxysilane / Katsuyoshi Harada, Yashinori Yamada, 1994。 [16] US Patent No. 5,362,897: Process for producing trialkoxysilane / Katsuyoshi Harada, Yashinori Yamada, 1994.

[17] US Patent No. 4,931,578: Process for the preparation of alkoxysilane / Yoshiro Ohta, Kamiida-chou, Izumi-ku, 1990。 [17] US Patent No. 4,931, 578: Process for the preparation of alkoxysilane / Yoshiro Ohta, Kamiida-chou, Izumi-ku, 1990.

[18] Japanese Patent No. 06312994: Preparation of alkoxysilanes/ Harada, Masayoshi, Yamada, Yoshinori, 1994。 [18] Japanese Patent No. 06312994: Preparation of alkoxysilanes/ Harada, Masayoshi, Yamada, Yoshinori, 1994.

[19] Japanese Patent No. 06312992: Preparation of alkoxysilanes/ Harada, Masayoshi, Yamada Yoshinori, 1994。 [19] Japanese Patent No. 06312992: Preparation of alkoxysilanes/ Harada, Masayoshi, Yamada Yoshinori, 1994.

[20] Japanese Patent Application Publication No. sho50-34540: Alkoxysilanes /Masafumi Asano, Kawasaki, Taizo Ohashi, 1984。 [20] Japanese Patent Application Publication No. sho50-34540: Alkoxysilanes /Masafumi Asano, Kawasaki, Taizo Ohashi, 1984.

[21] Japanese Patent Application Publication No. sho51-1692: Process for producing trialkoxysilanes / Hisashi Muraoka, Yokohama, Masafumi Asano, 1976。 [21] Japanese Patent Application Publication No. sho51-1692: Process for producing trialkoxysilanes / Hisashi Muraoka, Yokohama, Masafumi Asano, 1976.

[22] US Patent No. 5,177,234: Preparation of alkoxysilanes by contacting a solution of hydrogen fluoride in an alcohol with silicon / Binh T. Nguyen, 1993。 [22] US Patent No. 5,177,234: Preparation of alkoxysilanes by contacting a solution of hydrogen fluoride in an alcohol with silicon / Binh T. Nguyen, 1993.

[23] US Patent No. 4,487,949: Process for preparation of alkyl silicates/ Charles B. Mallon, Belle Mead, N.J., 1984。 [23] US Patent No. 4,487,949: Process for preparation of alkyl silicates/ Charles B. Mallon, Belle Mead, N.J., 1984.

[24] EP Patent No. 517398: Preparation of alkoxysilanes using HF (salt), silicon, and alcohol/ Bank, Speier, John Leopold, 1992。 [24] EP Patent No. 517398: Preparation of Alkoxysilanes using HF (salt), silicon, and alcohol/ Bank, Speier, John Leopold, 1992.

[25] WO 2007/032865: Process for the direct synthesis of trialkoxysilane。 [25] WO 2007/032865: Process for the direct synthesis of trialkoxysilane.

[26] Russian Patent No. 2235726 C1: Method of preparation alkoxysilanes/ Gorshkov A.S., Markacheva A.A., Storozhenko P.A., 2003。 [26] Russian Patent No. 2235726 C1: Method of preparation alkoxysilanes/ Gorshkov A.S., Markacheva A.A., Storozhenko P.A., 2003.

在此背景資料部分揭示之以上資訊僅供提升對本發明之背景的了解,因此其可能包含無法形成在此國家中熟悉此技藝之人士已知之前述技術之資訊。 The above information is disclosed in this Background section only to enhance the understanding of the background of the invention, and thus may contain information that does not form the aforementioned techniques known to those skilled in the art.

發明概要 Summary of invention

本發明致力於解決以上所述有關先前技術之問題,如下。 The present invention has been made in an effort to solve the above-mentioned problems related to the prior art as follows.

(i)除去或大幅地減少合成反應中之誘導期間。 (i) removing or substantially reducing the induction period in the synthesis reaction.

(ii)持續地移除會污染反應環境中之溶劑且作為副反應之催化劑之雜質,以及副反應之產物。 (ii) continuously removing impurities which may contaminate the solvent in the reaction environment and act as a side reaction catalyst, as well as products of side reactions.

(iii)以連續的模式合成三烷氧矽烷。 (iii) Synthesis of trialkoxysilane in a continuous mode.

在一態樣中,本發明提供一種製備三烷氧矽烷之方法,該方法包含:(a)於溶劑環境中將矽(Si)粉碎至具有粒徑範圍從30至100μm之微粒,其中該溶劑直接作為三烷氧矽烷之合成反應中的溶劑;(b)連續地於反應器中供給與在該合成期間消耗的數 量相等之矽與絕對酒精之懸浮液,連續地合成三烷氧矽烷,使用以下方程式1,依照合成的三烷氧矽烷之數量,計算該懸浮液之消耗,如此供給至該反應器中作為該懸浮液之元素之矽的數量,等於該反應後矽的數量,以便進行連續且安定的反應:方程式1 mSi=k1˙mTES+k2˙mTEOS In one aspect, the invention provides a method of preparing a trialkoxydecane, the method comprising: (a) pulverizing cerium (Si) in a solvent environment to particles having a particle size ranging from 30 to 100 μm, wherein the solvent Directly used as a solvent in the synthesis reaction of trialkoxysilane; (b) continuously supplied to the reactor and consumed during the synthesis An equal amount of hydrazine and an absolute alcohol suspension are continuously synthesized for the trialkoxy decane, and the consumption of the suspension is calculated according to the amount of the synthesized trialkoxysilane, using the following Equation 1, and thus supplied to the reactor as the The amount of lanthanum in the element of the suspension is equal to the number of lanthanum after the reaction in order to carry out a continuous and stable reaction: Equation 1 mSi=k1 ̇mTES+k2 ̇mTEOS

其中mTES係三乙氧矽烷之質量,mTEOS係每單位小時從直接反應中收集到之四乙氧矽烷的質量,而k1以及k2分別是表示在三乙氧矽烷以及四乙氧矽烷之合成反應中所消耗之矽的莫耳比率之係數;以及(c)使用陶瓷濾膜連續地從該反應器抽出溶劑,移除累積在該反應器中之雜質,同時連續地供給與該抽出相等量作為懸浮液之元素之溶劑。 Wherein mTES is the mass of triethoxy decane, mTEOS is the mass of tetraethoxy decane collected from the direct reaction per unit hour, and k1 and k2 are respectively represented in the synthesis reaction of triethoxy decane and tetraethoxy decane. a coefficient of the molar ratio of the consumed enthalpy; and (c) continuously extracting the solvent from the reactor using a ceramic filter to remove impurities accumulated in the reactor while continuously supplying the same amount as the suspension as a suspension The solvent of the element of the liquid.

在範例具體例中,本發明之標的可依照下列方法達成。 In the exemplary embodiment, the subject matter of the present invention can be achieved in the following manner.

在一範例具體例中,粉碎之前,線性尺寸在20mm至20cm之範圍內。 In an exemplary embodiment, the linear dimension is in the range of 20 mm to 20 cm prior to comminution.

於另一較佳具體例中,將在溶劑環境下矽的粉碎中所需之催化劑直接加至矽物質中。 In another preferred embodiment, the catalyst required for the pulverization of ruthenium in a solvent environment is added directly to the ruthenium material.

於又另一較佳具體例中,該催化劑之數量,以矽之數量為基礎,可在1.0至10.0重量%之範圍內。 In still another preferred embodiment, the amount of the catalyst, based on the amount of rhodium, may range from 1.0 to 10.0% by weight.

於又另一較佳具體例中,在三烷氧矽烷之合成反應中之溶劑可加熱至160至300℃。 In still another preferred embodiment, the solvent in the synthesis reaction of the trialkoxide can be heated to 160 to 300 °C.

在另外的範例具體例中,為了維持連續模式下,矽、 溶劑以及催化劑之安定的比率,在提供給該反應器之前,連續地攪拌該懸浮液。 In another example specific example, in order to maintain the continuous mode, The ratio of the solvent and the stability of the catalyst is continuously stirred before being supplied to the reactor.

於另一進一步較佳具體例中,在三烷氧矽烷之整個合成反應中,恆定地維持該反應環境中之矽、該溶劑以及該催化劑之數量。 In another further preferred embodiment, the amount of rhodium, the solvent, and the amount of the catalyst in the reaction environment are constantly maintained throughout the synthesis reaction of the trialkoxide.

於又另一進一步較佳具體例中,使用裝設在該反應器之主體上之陶瓷濾膜,進行含反應進行中產生之雜質之溶劑之抽出。 In still another further preferred embodiment, the extraction of the solvent containing the impurities generated during the reaction is carried out using a ceramic filter disposed on the main body of the reactor.

於又另一進一步之範例具體例中,該陶瓷膜之孔尺寸可在1至10μm之範圍內。 In still another exemplary embodiment, the ceramic film may have a pore size in the range of 1 to 10 μm.

於又再另一進一步之範例具體例中,該抽出中使用之溶劑,可經純化重新於製程中使用。 In yet another further exemplary embodiment, the solvent used in the extraction can be used in the process by purification.

本發明之其它態樣以及較佳具體例將於下文中討論。 Other aspects and preferred embodiments of the invention are discussed below.

本發明之以上以及其它特徵將於下文中討論。 The above and other features of the present invention are discussed below.

如上所述,依照本發明,在原料之製備中,將作為原料之矽,在沒有接觸空氣之溶劑環境中粉碎,以抑制矽表面上氧化物層之形成,以及活化該反應。因此,該方法在經濟效益上可與先前技術相比,因為總製程時間大幅地減少,且產率因在矽與醇之反應的早期階段減少誘導期間而最大化。 As described above, according to the present invention, in the preparation of the raw material, the crucible as a raw material is pulverized in a solvent atmosphere which is not exposed to the air to suppress the formation of the oxide layer on the surface of the crucible, and to activate the reaction. Therefore, the method is economically comparable to the prior art because the total process time is greatly reduced and the yield is maximized by reducing the induction period in the early stages of the reaction of the hydrazine with the alcohol.

此外,該方法可因為在矽的粉碎作用中使用之溶劑,亦用於之後欲進行之合成反應而簡化,以及該方法可藉由連續地提供合成反應中所消耗之懸浮液而連續地進行。 Further, the method can be simplified by the solvent used in the pulverization of ruthenium, and also for the synthesis reaction to be carried out later, and the method can be continuously carried out by continuously providing the suspension consumed in the synthesis reaction.

此外,該方法可保證矽粒子之安定性,因為使用濕式 方法粉碎矽,抑制了矽細粉塵之產生時與空氣中之氧接觸時之爆炸,以及該方法具有經濟效益,因為藉由使用陶瓷濾膜,透過抽出該溶劑連續地從該反應環境中移除雜質,使得在不需使用另外的製程之情況下,維持連續模式下矽之轉換率在一高的位準。 In addition, this method ensures the stability of the ruthenium particles because of the wet type The method of pulverizing ruthenium suppresses the explosion when the fine dust is generated in contact with oxygen in the air, and the method is economical because the solvent is continuously removed from the reaction environment by extracting the solvent by using a ceramic filter. Impurities, such that the conversion rate of the helium in continuous mode is maintained at a high level without the need for additional processes.

因此,依照本發明製備三烷氧矽烷之方法,三烷氧矽烷之產率以及合成三烷氧矽烷之經濟效益可最大化,因為總製程時間可因減少該合成反應之誘導期間而大幅地減少,以及三烷氧矽烷可因連續地移除雜質而連續地產生。 Therefore, according to the process for preparing a trialkoxysilane of the present invention, the yield of the trialkoxysilane and the economic benefit of the synthesis of the trialkoxysilane can be maximized because the total process time can be greatly reduced by reducing the induction period of the synthesis reaction. And the dialoxane can be continuously produced by continuously removing impurities.

圖式簡單說明 Simple illustration

本發明之以上以及其它特徵,現在將參照其某些示範性具體例以及所附的圖式作詳細的說明,其等僅作為例示用,因此本發明並不受其限制,其中:第1圖係例示說明範例1至3以及比較例中製得之產物(三乙氧矽烷(TES))之產率相對於時間之曲線圖。 The above and other features of the present invention will now be described in detail with reference to certain exemplary embodiments thereof and the accompanying drawings, which are by way of illustration only. The graphs illustrating the yields of the products (triethoxyoxane (TES)) prepared in Examples 1 to 3 and Comparative Examples versus time are exemplified.

應了解,所附之圖式沒有一定按照比例,而是以稍微簡化之方式呈現本發明基本原理之各種較佳特徵之說明。在此所揭示之本發明之特別的設計特徵,包括例如,規定尺寸、方向、位置以及形狀,部分將由特別的想要的應用以及使用環境決定。 It is understood that the appended drawings are not necessarily to scale, The particular design features of the invention disclosed herein, including, for example, the specified dimensions, orientation, location, and shape, will be determined in part by the particular intended application and the environment in which it is used.

詳細說明 Detailed description

在此之後,將針對本發明之各種具體例詳細地說明以作為參考,其之例子例示於所附之圖式以及將於下文中說 明。雖然將結合示範性具體例來說明本發明,但應了解本說明書沒有意圖限制本發明至該等示範性具體例。相反地,本發明不僅意圖涵蓋該示範性具體例,且亦涵蓋涵括在所附之申請專利範圍所界定之本發明技術思想範疇內之各種替代物、改質物、相等物以及其它具體例。 Hereinafter, various specific examples of the invention will be described in detail for reference, examples of which are illustrated in the accompanying drawings and Bright. The invention will be described in conjunction with the exemplary embodiments, and it is understood that this description is not intended to limit the invention to the exemplary embodiments. Rather, the invention is not intended to be limited to the details of the invention, and the various alternatives, modifications, equivalents, and other specific examples within the scope of the inventive concept as defined by the appended claims.

本發明提供一種製備三烷氧矽烷之方法,其包括使矽於特別地在沒有接觸空氣之溶劑環境中粉碎,使該粉碎的矽與絕對酒精交互反應,移除雜質,以及藉由補充相等於所消耗之數量之原料活化反應物質。可透過下列連續的步驟合成三烷氧矽烷。 The present invention provides a method of preparing a trialkoxy decane comprising pulverizing a ruthenium in a solvent environment which is not exposed to air, causing the pulverized ruthenium to interact with absolute alcohol, removing impurities, and supplementing by equalizing The amount of raw material consumed activates the reaction mass. The trialkoxysilane can be synthesized by the following sequential steps.

(a)在液態環境中,較佳地溶劑環境中,將矽粉碎成具粒徑範圍從30至100μm之微粒,以及該液體(或溶劑)可直接用於合成三烷氧矽烷,其之後將作為反應溶劑。很重要地,考慮到反應溶劑可在之後使用,所以該矽之粉碎作用係在液態環境中,較佳地在溶劑環境中進行。 (a) in a liquid environment, preferably in a solvent environment, pulverizing cerium into particles having a particle size ranging from 30 to 100 μm, and the liquid (or solvent) can be directly used for the synthesis of a trialkoxide, which will thereafter As a reaction solvent. Very importantly, in view of the fact that the reaction solvent can be used later, the pulverization of the crucible is carried out in a liquid environment, preferably in a solvent environment.

(b)連續地於反應器中供給與在該合成期間消耗的數量相等之矽與溶劑之懸浮液,合成三烷氧矽烷。在此方面,供給至該反應器中作為該懸浮液之元素之矽的數量,相等於該反應所消耗之矽的數量,以便進行持續且安定的反應。在此方面,使用方程式1,從合成的三烷氧矽烷之數量,計算該懸浮液之消耗以及供給。 (b) The suspension of the hydrazine and the solvent, which is equal to the amount consumed during the synthesis, is continuously supplied to the reactor to synthesize the trialkoxide. In this respect, the amount of rhenium supplied to the reactor as an element of the suspension is equal to the amount of rhodium consumed by the reaction in order to carry out a sustained and stable reaction. In this regard, the consumption and supply of the suspension was calculated from the amount of the synthesized trialkoxysilane using Equation 1.

(c)使用陶瓷濾膜連續地從該反應器中抽出溶劑,移除累積在該反應器中之雜質,同時連續地供給與該抽出所使用相同數量的溶劑,作為該懸浮液之元素。 (c) The solvent is continuously withdrawn from the reactor using a ceramic filter to remove impurities accumulated in the reactor while continuously supplying the same amount of solvent as the extract as an element of the suspension.

依照本發明之一具體例,可製備下式I表示之三烷氧矽烷。 According to a specific example of the present invention, a trialkoxysilane represented by the following formula I can be produced.

式1 SiH(OR)3 Formula 1 SiH(OR) 3

在式1中,R係C1-C3甲基、乙基、丙基或異丙基基團。 In Formula 1, R is a C 1 -C 3 methyl, ethyl, propyl or isopropyl group.

依照目前之具體例之技術的物理基礎,活化試劑之第一階段中,作為原料之矽係在溶劑環境中粉碎,不是像先前技術一樣在空氣中,如此可預防在該粉碎矽微粒之表面上形成天然氧化物。氧化物層不可避免地會在所有與空氣中之氧接觸之金屬矽之表面上形成。此氧化反應會在所有的溫度下發生,包括室溫,與矽之純度無關,即在所有先前技術中所揭示之粉碎的矽之情況下均會發生。 According to the physical basis of the prior art example, in the first stage of activating the reagent, the lanthanum as a raw material is pulverized in a solvent environment, not in the air as in the prior art, so that it can be prevented on the surface of the pulverized ruthenium particles. Form a natural oxide. The oxide layer is inevitably formed on the surface of all metal ruthenium which is in contact with oxygen in the air. This oxidation reaction will occur at all temperatures, including room temperature, regardless of the purity of the ruthenium, i.e., in the case of all of the ruthenium ruthenium disclosed in the prior art.

同時,在該粉碎矽粒子表面上之天然氧化物層,會產生防礙矽與醇之間的交互作用之技術問題,即引起反應‘誘導期間’;參考文獻[1]中揭示需要加熱該粉碎的矽以及催化劑之混合物;由於不完全反應產生未反應的矽;以及參考文獻[1]中揭示需要使用之額外的鹵化物催化劑,或參考文獻[26]揭示將濃縮的混合物回復成反應物質。結果,技術以及設備變得複雜。 At the same time, the natural oxide layer on the surface of the pulverized cerium particles has a technical problem of preventing the interaction between hydrazine and alcohol, that is, causing the reaction 'induction period'; the reference [1] discloses that the pulverization needs to be heated. A mixture of ruthenium and a catalyst; unreacted ruthenium due to incomplete reaction; and an additional halide catalyst to be used as disclosed in reference [1], or reference [26] discloses the return of the concentrated mixture to a reaction mass. As a result, technology and equipment have become complicated.

根據目前的具體例之方法可排除此等缺點,因為矽係在液體中,即溶劑環境中粉碎,沒接觸到空氣,如此在該粉碎的矽粒子表面上不會形成氧化物層。就是,矽粒子具有活性表面。此係因為表面沒有與空氣接觸,而與溶劑接觸不會被氧化。該溶劑可連續地用於之後主要技術製程之 化學反應。如此,根據目前之具體例,因為在該反應之早期階段即抑制了在矽粒子表面上氧化物層之形成,所以主要技術製程中使用之試劑已被活化,以便立即進行三烷氧矽烷之合成。 These disadvantages can be ruled out according to the methods of the present specific examples, since the lanthanide is pulverized in a liquid, i.e., in a solvent environment, without being exposed to air, so that an oxide layer is not formed on the surface of the pulverized cerium particles. That is, the ruthenium particles have an active surface. This is because the surface is not in contact with air, and it is not oxidized by contact with the solvent. The solvent can be used continuously after the main technical process chemical reaction. Thus, according to the present specific example, since the formation of an oxide layer on the surface of the cerium particles is suppressed at an early stage of the reaction, the reagents used in the main technical processes have been activated to immediately synthesize the trialkoxysilane. .

此外,使用依照目前具體例之方法粉碎的微粒子之粒徑可在30至100μm之範圍內,其小於參考文獻[1]以及[26]中所揭示之粒子的尺寸大小約10倍,如此與主要試劑之接觸面積增加而快速地減少誘導期間。另一方面,假如矽係使用與參考文獻[1]或[26]中所揭示之方法,於空氣中粉碎成此一尺寸,則誘導期間會增加,因為粉碎後矽之粒子尺寸減小,矽之總表面積增加,而氧化物層會自然地在矽之表面形成;以及其它更糟的缺點。 Further, the particle diameter of the fine particles pulverized by the method according to the present specific example may be in the range of 30 to 100 μm, which is smaller than the size of the particles disclosed in References [1] and [26] by about 10 times, and thus The contact area of the reagent is increased to rapidly reduce the induction period. On the other hand, if the lanthanide is pulverized into this size in air using the method disclosed in the reference [1] or [26], the induction period will increase because the particle size of the ruthenium after pulverization is reduced, 矽The total surface area increases, and the oxide layer naturally forms on the surface of the crucible; and other worse disadvantages.

參考文獻[26]中揭示之方法之主要缺點包括因新加入試劑於未反應矽中,而需濃縮反應混合物數次、需定期抽出沈積物進入此之懸浮液中,以及沈澱歷時一段長的時間。根據目前的具體例,因進行連續模式下之操作而排除該等缺點。在此方面,根據目前之具體例,為了預防從反應器中移除大的反應性矽微粒,使用透過陶瓷濾膜抽出懸浮液之方法。供給至反應器之作為懸浮液之元素之矽之數量,維持與參與該反應之矽的數量相同,以及參與該反應之數量係由合成的三烷氧矽烷之數量以及因反應產生之氫氣的數量決定。透過反應器之出口連續地抽出溶劑,移除反應物中之雜質,以及於反應器中補充相同數量之溶劑,作為懸浮液之元素。 The main disadvantages of the method disclosed in reference [26] include the need to concentrate the reaction mixture several times due to the newly added reagent in the unreacted hydrazine, the need to periodically withdraw the sediment into the suspension, and the precipitation for a long period of time. . According to the present specific example, these disadvantages are eliminated by performing the operation in the continuous mode. In this regard, according to the present specific example, in order to prevent removal of large reactive cerium particles from the reactor, a method of withdrawing the suspension through a ceramic filter is used. The amount of rhodium supplied as an element of the suspension to the reactor is maintained to be the same as the amount of rhodium involved in the reaction, and the amount participating in the reaction is the amount of the synthesized trialxane and the amount of hydrogen produced by the reaction. Decide. The solvent is continuously withdrawn through the outlet of the reactor, the impurities in the reactants are removed, and the same amount of solvent is added to the reactor as an element of the suspension.

粉碎前矽之線性尺寸等於或大於20mm,較佳地在20mm至20cm之範圍內,如此可防止具有大量氧化物在其之表面上之微粒被加入反應混合物中。 The linear size of the crucible before pulverization is equal to or greater than 20 mm, preferably in the range of 20 mm to 20 cm, so that particles having a large amount of oxide on the surface thereof are prevented from being added to the reaction mixture.

根據目前之具體例,在矽粉碎之前添加催化劑至矽物質中,可獲得之特徵如下。第一,二種材料被粉碎成相同的尺寸。第二,粉碎完成時,於溶劑環境之懸浮液中,材料係均勻混合地。陶瓷濾膜之孔徑可在1至10μm之範圍內。假如陶瓷濾膜之孔徑小於1μm,則過濾過程沒有辦法適當地完成。另一方面,假如陶瓷濾膜之孔徑大於10μm,則反應性矽微粒會經由濾器被移除,因此矽之流失增加。假如矽微粒最初的粒子尺寸在30至100μm之範圍內,則陶瓷濾膜之適合的孔徑為5μm。在此情況下,總流失低於0.5%。 According to the present specific example, the catalyst is added to the ruthenium material before the ruthenium pulverization, and the characteristics obtained are as follows. First, the two materials are comminuted to the same size. Second, when the pulverization is completed, the materials are uniformly mixed in the suspension in the solvent environment. The pore size of the ceramic filter can be in the range of 1 to 10 μm. If the pore size of the ceramic filter is less than 1 μm, the filtration process cannot be properly performed. On the other hand, if the pore size of the ceramic filter is larger than 10 μm, the reactive ruthenium particles are removed via the filter, so the loss of ruthenium is increased. If the initial particle size of the ruthenium particles is in the range of 30 to 100 μm, the suitable pore diameter of the ceramic filter is 5 μm. In this case, the total loss is less than 0.5%.

目前具體例之方法以下列方式進行。例如,使用錘式粉碎機(從微粒尺寸至1mm)以及一般的行星式球磨,將最初的矽(其係純度在98至99%內之金屬矽)粉碎成所欲的粒徑,其中進一步在反應器充填溶劑。溶劑之功能為熱轉移油,該溶劑之例子係烷化苯、烷化萘以及聚芳族油,較佳地參考文獻[26]中揭示之THERMINOL®66或其它聚芳族油等等。根據目前之具體例,矽在溶劑環境中粉碎成具粒徑範圍從30至100μm之微粒,矽與醇之交互反應因使用數位定量泵連續地供給懸浮液於該反應器中而連續地進行。在此,矽微粒沒有與該溶劑分開。之後,在該反應器中形成具所欲能力以及組成比率之接觸物質。 The method of the present specific example is carried out in the following manner. For example, using a hammer mill (from particle size to 1 mm) and a general planetary ball mill, the original crucible, which is a metal crucible having a purity of 98 to 99%, is pulverized into a desired particle size, wherein The reactor is filled with solvent. The solvent functions as a heat transfer oil, the examples of the solvent-based alkyl benzenes, alkyl naphthalenes and polyaromatic oils, preferably Reference [26] In the disclosed THERMINOL ® 66 or other polyaromatic oil and the like. According to the present specific example, ruthenium is pulverized in a solvent environment into fine particles having a particle diameter ranging from 30 to 100 μm, and the interaction between hydrazine and alcohol is continuously carried out by continuously supplying a suspension to the reactor by using a digital metering pump. Here, the ruthenium particles are not separated from the solvent. Thereafter, a contact substance having a desired ability and a composition ratio is formed in the reactor.

根據目前的具體例,用於維持連續的反應所供給的懸浮液之組成比率(等於合成期間消耗之數量),由矽之數量安排,該矽之數量係使用方程式1,從合成的三烷氧矽烷之數量計算得。之後,將由矽、該溶劑以及該催化劑構成之懸浮液連續且穩定地加至該反應中。 According to the present specific example, the composition ratio of the suspension supplied for maintaining the continuous reaction (equal to the amount consumed during the synthesis) is arranged by the amount of hydrazine, and the amount of the hydrazine is determined by using Equation 1, from the synthesized trialkoxy The amount of decane is calculated. Thereafter, a suspension composed of hydrazine, the solvent and the catalyst is continuously and stably added to the reaction.

在此使用之絕對酒精之例子包括業界已知之絕對乙醇或絕對甲醇。此外,該催化劑之例子包括含銅催化劑,諸如氯化銅(CuCl)。 Examples of absolute alcohols used herein include absolute or absolute methanol known in the art. Further, examples of the catalyst include a copper-containing catalyst such as copper chloride (CuCl).

主要製程在具高沸點之溶劑環境下進行,諸如THERMINOL®59、THERMINOL®60、THERMINOL®66、DOWTHERM®HT、MARLOTHERM®S、MARLOTHERM®或其它以上所述之聚芳族油,從180至260℃,與參考文獻[26]中所述溫度範圍相同。換句話說,該主要技術製程之核心包括用懸浮液(包括添加矽之催化劑,如包括粉碎於如溶劑THERMINOL®66環境中之矽,以及氯化銅(CuCl)粉末)充填該反應器,然後在加熱該混合物至180至260℃後於該反應器中加入諸如乙醇或甲醇之醇,同時激烈攪拌該混合物。如此形成之蒸氣-氣體混合物以及液體連續地從該反應器中移除,且使用包括該等參考文獻[1]以及[26]等中揭示之業界熟知之方法分開產物。使用習知之方法,分開標的材料三乙氧矽烷或三甲氧矽烷。 The main process is carried out in a high boiling solvent environment such as THERMINOL ® 59, THERMINOL ® 60, THERMINOL ® 66, DOWTHERM ® HT, MARLOTHERM ® S, MARLOTHERM ® or other polyaromatic oils as described above, from 180 to 260 °C, the same temperature range as described in reference [26]. In other words, the core of the main technical process involves filling the reactor with a suspension (including a catalyst that adds ruthenium, such as ruthenium in a solvent such as the solvent THERMINOL ® 66, and copper chloride (CuCl) powder), and then After heating the mixture to 180 to 260 ° C, an alcohol such as ethanol or methanol is added to the reactor while vigorously stirring the mixture. The vapor-gas mixture and liquid thus formed are continuously removed from the reactor, and the product is separated using methods well known in the art including those disclosed in references [1] and [26] and the like. The standard material triethoxy decane or trimethoxy decane is separated by a conventional method.

根據目前之具體例,溶劑係使用陶瓷濾膜連續地抽出,且特別地由於矽之粉碎方法不同,所以誘導期間大幅地減少。 According to the present specific example, the solvent is continuously extracted using a ceramic filter, and particularly because the pulverization method of ruthenium is different, the induction period is greatly reduced.

如此,因為矽在先前技術中係在空氣中粉碎,所以氧化物層自然地會在矽之表面上形成。因此,自然地存在三烷氧矽烷之合成反應中之一重要因子,即誘導期間,如此當之後於連續的方法中藉由抽出懸浮液供給額外的原料時,需要該誘導期間。根據目前之具體例,可除去以及減少在三烷氧矽烷之合成的早期階段之誘導期間,且雜質可藉由在連續製程中使用陶瓷濾膜而連續地移除。 Thus, since tantalum is pulverized in the air in the prior art, the oxide layer is naturally formed on the surface of the crucible. Therefore, one of the important factors in the synthesis reaction of trialkoxysilane is naturally occurring, that is, during the induction period, when the additional raw material is supplied by withdrawing the suspension in a continuous process, the induction period is required. According to the present specific example, the induction during the early stages of the synthesis of the trialkoxide can be removed and reduced, and the impurities can be continuously removed by using a ceramic filter in a continuous process.

同時,根據目前之具體例,當僅使用以上所述之操作(a)以及先前技術中揭示之其它操作,沒有使用操作(b)以及(c)時,該製程之效率大幅地改善。當使用操作(a)與(b),而沒有使用操作(c)時,該製程之效率亦獲得改善。因此,亦可了解,不包括操作(b)或操作(b)與(c)之製程可為具有改善效率之另一個本發明。 Meanwhile, according to the present specific example, when only the operations (a) described above and other operations disclosed in the prior art are used, the efficiency of the process is greatly improved without the operations (b) and (c). When operations (a) and (b) are used without operation (c), the efficiency of the process is also improved. Therefore, it is also understood that the process of not including operation (b) or operations (b) and (c) may be another invention having improved efficiency.

範例example

下列範例例示說明本發明,但不用於限制本發明。 The following examples are illustrative of the invention but are not intended to limit the invention.

本發明之方法之範例,以使用特別製造用於合成三烷氧矽烷之設備獲得之實驗結果為基礎。 An example of the method of the present invention is based on experimental results obtained using equipment specially developed for the synthesis of trialkoxysilane.

範例1 Example 1

於9L反應器中製備三乙氧矽烷,該反應器包括具有相同容量之電熱控制裝置,以及具4個翅膀且旋轉速度可控制在300至1500rpm範圍內之葉輪攪拌器。使用行星式研磨機,於6.6kg之溶劑(THERMINOL®66)環境下,將3.3kg之金屬矽粉碎成具粒徑範圍從30至100μm之微粒。在粉碎過程中,於該懸浮液中加入0.2kg作為催化劑之氯化銅(CuCl)。 當攪拌器在850rpm下連續地操作時,將接觸物質加熱至242+2℃,然後使用數位定量泵(GRUNDFOS® DME 60-10 AR),以600ml/小時之速度於該反應器中供給乾燥的乙醇。在液體產物產生時之時間點開始以及之後每30分鐘,從該反應器中收集樣本。根據使用Agilent® GC7890A之氣相色層分析法分析樣本的結果,合成反應在醇加入該反應器之後開始,反應速率在開始的60分鐘增加。三乙氧矽烷之合成的反應速率從反應開始後180分鐘減少,且因為醇之供給開始從260分鐘慢下來。因此,獲得1635g之三乙氧矽烷以及105g之四乙氧矽烷。三乙氧矽烷之選擇性為94%。 Triethoxyoxane was prepared in a 9 L reactor comprising electrothermal control devices of the same capacity and an impeller agitator with 4 wings and a rotational speed controlled in the range of 300 to 1500 rpm. Using a planetary grinder, 3.3 kg of metal ruthenium was pulverized into particles having a particle diameter ranging from 30 to 100 μm in a 6.6 kg solvent (THERMINOL ® 66). In the pulverization process, 0.2 kg of copper chloride (CuCl) as a catalyst was added to the suspension. When the stirrer was continuously operated at 850 rpm, the contact material was heated to 242 + 2 ° C, and then dried in the reactor at a rate of 600 ml / hour using a digital metering pump (GRUNDFOS ® DME 60-10 AR). Ethanol. Samples were collected from the reactor at the point in time when the liquid product was produced and every 30 minutes thereafter. The analysis results of the samples using Agilent ® GC7890A of gas chromatography analysis, the synthesis reaction started after alcohol was added to the reactor, the reaction rate begins to increase after 60 minutes. The reaction rate of the synthesis of triethoxyoxane decreased from 180 minutes after the start of the reaction, and since the supply of alcohol began to slow down from 260 minutes. Thus, 1635 g of triethoxy decane and 105 g of tetraethoxy decane were obtained. The selectivity to triethoxy decane was 94%.

比較例 Comparative example

實驗以與範例1之相同方法進行,但製備反應試劑之方法不同。使用行星式研磨機,將金屬矽於空氣中粉碎成具粒徑範圍從30至100μm之微粒。將3.3kg經研磨的矽、6.6kg作為溶劑之THERMINOL®66以及0.2kg作為催化劑之氯化銅(CuCl)加至該反應器中,使反應開始。參照樣本之分析,金屬矽與醇之間的反應從供給醇後150分鐘開始,之後反應速率大幅地增加。三乙氧矽烷之合成在從供給醇之後500分鐘慢下來。這500分鐘,獲得1435g之三乙氧矽烷以及614g之四乙氧矽烷。三乙氧矽烷之選擇性為70%。 The experiment was carried out in the same manner as in Example 1, except that the method of preparing the reagent was different. Using a planetary grinder, the crucible is pulverized in air to particles having a particle size ranging from 30 to 100 μm. The milled silicon 3.3kg, 6.6kg as the solvent 0.2kg THERMINOL ® 66 and a copper (of CuCl) chloride was added to the catalyst in the reactor to initiate the reaction. Referring to the analysis of the sample, the reaction between the metal ruthenium and the alcohol started 150 minutes after the supply of the alcohol, after which the reaction rate was greatly increased. The synthesis of triethoxydecane slowed down 500 minutes after the alcohol was supplied. At this 500 minutes, 1435 g of triethoxy decane and 614 g of tetraethoxy decane were obtained. The selectivity to triethoxy decane is 70%.

範例2 Example 2

實驗以與範例1之相同方法進行,但連續地於反應器中供給與矽之消耗相同之矽,如此在與絕對乙醇之反應中,懸浮液中之溶劑對矽之質量比例為2:1。在三烷氧矽烷之 合成方面,作為懸浮液之元素之矽,以與矽消耗相同之速率供給於該反應器中。每單位小時消耗的矽之數目,使用以下方程式,根據反應質量平衡計算。 The experiment was carried out in the same manner as in Example 1, except that the same enthalpy of consumption as hydrazine was continuously supplied to the reactor, so that in the reaction with absolute ethanol, the mass ratio of the solvent to hydrazine in the suspension was 2:1. In the trialkyloxane In terms of synthesis, the element as a suspension is supplied to the reactor at the same rate as the hydrazine consumption. The number of enthalpy consumed per unit hour is calculated according to the reaction mass balance using the following equation.

方程式1 mSi=k1˙mTES+k2˙mTEOS Equation 1 mSi=k1 ̇mTES+k2 ̇mTEOS

在此,mTES係三乙氧矽烷之質量,mTEOS係四乙氧矽烷之質量(每單位小時從直接反應中收集),以及k1以及k2係分別意指在三乙氧矽烷以及四乙氧矽烷之合成中消耗的矽之莫耳比率之係數。在範例2中,鑑定出的k1=0.171,而k2=0.135。如此,使用以上方程式1計算得之數量,連續地於該反應器中添加作為懸浮液之元素之矽。同時地,透過該反應器主體中裝設之陶瓷濾膜,連續地從該反應器抽出溶劑。將包括雜質之溶劑收集至回收容器中。藉由施與10毫巴,在陶瓷濾膜之背後形成真空,濾出未反應的矽以及催化劑,排出溶劑。在此方面,透過陶瓷濾膜,連續地從反應器中排出溶劑,且排出的溶劑之數量係方程式1提供之mSi的二倍,且等於添加至反應器作為懸浮液元素之數量。據此,接觸物質之組成可維持恆定,且反應器中組成之位準亦維可維持恆定。每3個小時,抽出反應器中之樣本,以便控制該接觸物質之組成。透過反應器之窗,目視決定該反應器中接觸物質的位準。三乙氧矽烷之合成作用在供給醇於反應器後10分鐘開始,而反應速度在開始的60分鐘快速地增加,從此至120分鐘之間大幅地增加,當三烷氧矽烷之生產速度在420至450g/h時達到穩定。在500分鐘內,懸 浮液中含有600g之矽,且連續地供給1200g作為溶劑之THERMINOL®66。在500分鐘內,獲得3380g之三乙氧矽烷以及141g之四乙氧矽烷。三乙氧矽烷之選擇性為96%。 Here, the mass of mTES is triethoxy decane, the mass of mTEOS is tetraethoxy decane (collected from the direct reaction per unit hour), and the k1 and k2 systems respectively mean triethoxy decane and tetraethoxy decane. The coefficient of the molar ratio of enthalpy consumed in the synthesis. In Example 2, k1 = 0.171 was identified and k2 = 0.135. Thus, using the amount calculated by the above Equation 1, the enthalpy as an element of the suspension was continuously added to the reactor. Simultaneously, the solvent was continuously withdrawn from the reactor through a ceramic filter installed in the reactor body. A solvent including impurities is collected into a recovery container. A vacuum was formed behind the ceramic filter by applying 10 mbar, and unreacted ruthenium and a catalyst were filtered off to discharge the solvent. In this regard, the solvent is continuously withdrawn from the reactor through the ceramic filter, and the amount of solvent discharged is twice the mSi provided by Equation 1, and is equal to the amount added to the reactor as a suspension element. Accordingly, the composition of the contact material can be maintained constant, and the level of composition in the reactor can be maintained constant. Every 3 hours, the sample in the reactor is withdrawn to control the composition of the contact material. The level of the contact material in the reactor is visually determined through the window of the reactor. The synthesis of triethoxyoxane started 10 minutes after the supply of the alcohol to the reactor, and the reaction rate increased rapidly at the beginning of 60 minutes, and greatly increased from this to 120 minutes, when the production rate of the trialkoxide was 420. Stable at 450 g/h. In 500 minutes, the suspension containing 600g of silica, and the solvent is continuously supplied as 1200g of THERMINOL ® 66. Within 500 minutes, 3380 g of triethoxy decane and 141 g of tetraethoxy decane were obtained. The selectivity to triethoxysilane is 96%.

範例3 Example 3

實驗以與範例2之相同方法進行,其中使用方程式1計算在矽與絕對酒精之反應中消耗的矽之數量,且連續地供給矽給該反應器,如此懸浮液中溶劑對矽之質量比例為2:1,但沒有安裝陶瓷濾膜,且沒有抽出溶劑。三乙氧矽烷之合成作用在供給醇於反應器後9分鐘後開始,反應速率在第一個90分鐘時快速的增加,然後在三烷氧矽烷產率在400g/h時穩定。在供給醇250分鐘後,反應因大量的泡泡產生而終止。在此時間期間,於該反應器中連續添加290g之矽懸浮液以及580g作為催化劑THERMINOL®66。由於新添加的溶劑,所以該反應器中接觸物質之數量增加,如此產生泡泡。在250分鐘期間,獲得1600g之三乙氧矽烷以及120g之四乙氧矽烷。三乙氧矽烷之選擇性為93%。 The experiment was carried out in the same manner as in Example 2, in which Equation 1 was used to calculate the amount of hydrazine consumed in the reaction of hydrazine with absolute alcohol, and the hydrazine was continuously supplied to the reactor, so that the mass ratio of the solvent to hydrazine in the suspension was 2:1, but no ceramic filter was installed and no solvent was withdrawn. The synthesis of triethoxyoxane started 9 minutes after the supply of the alcohol to the reactor, and the reaction rate increased rapidly at the first 90 minutes and then stabilized at a yield of 400 g/h of the trialkoxide. After 250 minutes of alcohol supply, the reaction was terminated by a large amount of bubble generation. During this time, in the reactor was continuously added 290g and 580g of the silica suspension as a catalyst THERMINOL ® 66. Due to the newly added solvent, the amount of contact material in the reactor increases, thus generating bubbles. During 250 minutes, 1600 g of triethoxyoxane and 120 g of tetraethoxyoxane were obtained. The selectivity to triethoxy decane was 93%.

以下表1顯示範例1至3以及比較例之結果。 Table 1 below shows the results of Examples 1 to 3 and Comparative Examples.

如上所述,根據目前具體例之方法,矽在液態環境中粉碎,以避免氧化物層在矽之表面形成,且反應活性在製程中係穩定的(範例1、2以及3),如此誘導期間在矽與醇之間的反應早期階段大幅地減少。因此,可減少製程時間以及增加產率,因此該製程符合經濟效益。 As described above, according to the method of the present specific example, the crucible is pulverized in a liquid environment to prevent the formation of an oxide layer on the surface of the crucible, and the reactivity is stable in the process (Examples 1, 2, and 3), so that the induction period The early stages of the reaction between hydrazine and alcohol are greatly reduced. Therefore, the process time can be reduced and the yield can be increased, so the process is economical.

此外,當加入懸浮液時(範例2以及3),與比較例比較,TES產率增加、TES選擇性增加以及反應之早期階段之誘導期間減少。當進一步進行該抽出製程時(範例2),與相同反應期間之比較例相比,TES產率增加超過二倍。 In addition, when the suspension was added (Examples 2 and 3), the increase in TES yield, the increase in TES selectivity, and the induction period during the early stages of the reaction were reduced as compared with the comparative examples. When the extraction process was further carried out (Example 2), the TES yield was increased more than twice as compared with the comparative example during the same reaction period.

根據本發明之方法可簡單地藉由使用一般可施用的設備進行。因為原料之製備(矽之粉碎),係在作為該方法之反應溶劑之溶劑環境下進行,所以簡化了製程。 The method according to the invention can be carried out simply by using equipment which is generally applicable. Since the preparation of the raw material (pulverization of ruthenium) is carried out in a solvent environment as a reaction solvent of the method, the process is simplified.

因為合成方法係藉由連續地供給在合成時消耗之懸浮液以及使用陶瓷濾膜連續地移除雜質而連續地進行,所以總製程時間大幅地減少,且三烷氧矽烷係連續地產生,如此產率及經濟效益均可最大化。 Since the synthesis method is continuously carried out by continuously supplying the suspension consumed during the synthesis and continuously removing the impurities using the ceramic filter, the total process time is greatly reduced, and the trialkoxysilane is continuously produced, Both yield and economic benefits can be maximized.

根據本發明之方法提供下列效果:- 合成之誘導時間減少;- 連續合成三烷氧矽烷;以及- 使用陶瓷濾膜抽出溶劑,從反應環境中連續地移除雜質。 The method according to the present invention provides the following effects: - reduction in induction time of synthesis; - continuous synthesis of trialkoxysilane; and - extraction of solvent using a ceramic filter to continuously remove impurities from the reaction environment.

根據本發明提供之方法,所有的問題均可得到解決。 According to the method provided by the present invention, all problems can be solved.

本發明已參照其較佳具體而詳細地說明。然而熟悉此技藝之人士當可領會到,在不逸離本發明之理論以及思想 之情況下,可在此等具體中製造改變,其之範疇由所附之申請專利範例以及均等物界定。 The invention has been described in detail with reference to preferred embodiments. However, those skilled in the art can appreciate that the theory and thoughts of the present invention are not lost. In the event that the changes are made in the specifics, the scope of which is defined by the accompanying patent application and the equivalents.

第1圖係例示說明範例1至3以及比較例中製得之產物(三乙氧矽烷(TES))之產率相對於時間之曲線圖。 Fig. 1 is a graph showing the yield versus time of the products (triethoxyoxane (TES)) obtained in Examples 1 to 3 and Comparative Examples.

Claims (12)

一種製備三烷氧矽烷之方法,其包含:(a)於不與空氣接觸之溶劑環境中將矽(Si)粉碎至具有粒徑範圍從30至100μm之微粒,其中該溶劑直接作為三烷氧矽烷之合成反應中的溶劑;(b)連續地於反應器中供給與在該合成期間消耗的數量相等之矽與絕對酒精之懸浮液,連續地合成三烷氧矽烷,使用以下方程式1,依照合成的三烷氧矽烷之數量,計算該該懸浮液之消耗,如此供給至該反應器中作為該懸浮液之元素之矽的數量,等於該反應後矽的數量,以便進行連續且安定的反應:方程式1 mSi=k1˙mTAS+k2˙mTAOS其中mSi係每單位時間消耗之矽量,mTAS係三烷氧矽烷之質量,mTAOS係每單位小時直接反應所得到之四烷氧矽烷的質量,而k1以及k2分別是在三烷氧矽烷以及四烷氧矽烷之合成程序中所消耗之矽的莫耳比率;以及(c)使用陶瓷濾膜連續地從該反應器抽出溶劑,移除累積在該反應器中之雜質,同時連續地供給與該抽出相等量作為懸浮液之元素之溶劑。 A method for preparing a trialkoxy decane, comprising: (a) pulverizing cerium (Si) to a particle having a particle diameter ranging from 30 to 100 μm in a solvent environment not in contact with air, wherein the solvent is directly used as a trialkoxy group a solvent in the synthesis reaction of decane; (b) continuously supplying a suspension of hydrazine and absolute alcohol in an amount equal to the amount consumed during the synthesis in the reactor, continuously synthesizing the trialkoxide, using Equation 1 below, in accordance with The amount of the synthesized trialkoxysilane, the consumption of the suspension is calculated, and the amount of rhodium which is supplied to the reactor as an element of the suspension is equal to the amount of rhodium after the reaction for continuous and stable reaction. : Equation 1 mSi=k1 ̇mTAS+k2 ̇mTAOS where mSi is consumed per unit time, mTAS is the mass of the trialkoxide, and mTAOS is the mass of the tetraalkyloxane obtained by direct reaction per unit hour. K1 and k2 are the molar ratios of rhodium consumed in the synthesis procedure of the trialkoxide and the tetraalkane, respectively; and (c) continuously extracting the solvent from the reactor using a ceramic filter, and removing the accumulated The impurities in the reactor, while continuously feeding the same amount as the extraction solvent of the elements of the suspension. 如申請專利範圍第1項之製備三烷氧矽烷之方法,其中在粉碎之前,矽之線性尺寸在20mm至20cm之範圍內。 A method of producing a trialkoxysilane according to the first aspect of the invention, wherein the linear size of the crucible is in the range of 20 mm to 20 cm before the pulverization. 如申請專利範圍第1項之製備三烷氧矽烷之方法,其中該溶劑對矽之質量比在1:2至2:1之範圍內。 A method for producing a trialkoxysilane according to the first aspect of the invention, wherein the solvent to rhodium mass ratio is in the range of 1:2 to 2:1. 如申請專利範圍第1項之製備三烷氧矽烷之方法,其中1.0至10.0重量%之催化劑係直接添加至在溶劑環境中進行粉碎程序之矽塊中。 A method for producing a trialkoxysilane according to the first aspect of the invention, wherein 1.0 to 10.0% by weight of the catalyst is directly added to the crucible in which the pulverization procedure is carried out in a solvent environment. 如申請專利範圍第1項之製備三烷氧矽烷之方法,其中該催化劑係含銅催化劑。 A method of producing a trialkoxysilane according to the first aspect of the invention, wherein the catalyst is a copper-containing catalyst. 如申請專利範圍第1項之製備三烷氧矽烷之方法,其中在三烷氧矽烷之合成反應中,將溶劑加熱至160至300℃。 A process for producing a trialkoxysilane according to the first aspect of the invention, wherein in the synthesis reaction of the trialkoxide, the solvent is heated to 160 to 300 °C. 如申請專利範圍第1項之製備三烷氧矽烷之方法,其中相繼地進行操作(a)、(b)以及(c),同時在矽之粉碎中使用含銅催化劑,以及絕對甲醇或絕對乙醇用作為該絕對酒精,以及在三烷氧矽烷之連續地合成反應中,將該溶劑加熱至160至300℃。 A process for the preparation of a trialkoxysilane according to the first aspect of the invention, wherein the operations (a), (b) and (c) are carried out successively, while the copper-containing catalyst, and absolute or absolute ethanol are used in the pulverization of the crucible The solvent is heated to 160 to 300 ° C for use as the absolute alcohol and in a continuous synthesis reaction of a trialkoxide. 如申請專利範圍第1項之製備三烷氧矽烷之方法,其中為了維持矽、該溶劑以及該催化劑之安定比率,在供給至該反應器之前,連續地攪拌該懸浮液。 A method of producing a trialkoxysilane according to the first aspect of the invention, wherein the suspension is continuously stirred before being supplied to the reactor in order to maintain the stability ratio of the hydrazine, the solvent and the catalyst. 如申請專利範圍第1項之製備三烷氧矽烷之方法,其中使用裝設在該反應器之主體中之陶瓷濾膜,進行該溶劑之抽出,用於移除溶於該溶劑中之雜質。 A method for producing a trialkoxysilane according to the first aspect of the invention, wherein the extraction of the solvent for removing impurities dissolved in the solvent is carried out using a ceramic filter installed in a main body of the reactor. 如申請專利範圍第1項之製備三烷氧矽烷之方法,其中該陶瓷膜之孔徑在1至10μm範圍內。 A method of producing a trialkoxysilane according to the first aspect of the invention, wherein the ceramic membrane has a pore diameter in the range of 1 to 10 μm. 如申請專利範圍第1項之製備三烷氧矽烷之方法,其中在三烷氧矽烷之整個合成反應中,恆定地維持該反應環境中之矽、該溶劑以及該催化劑之數量。 The method for producing a trialkoxysilane according to the first aspect of the invention, wherein in the entire synthesis reaction of the trialkoxide, the amount of the rhodium, the solvent and the catalyst in the reaction environment are constantly maintained. 如申請專利範圍第1項之製備三烷氧矽烷之方法,其中三烷氧矽烷以下列式1表示:式1 SiH(OR)3其中R係C1-C3甲基、乙基、丙基或異丙基基團。 A method for producing a trialkoxysilane according to the first aspect of the invention, wherein the trialkoxysilane is represented by the following formula 1: wherein: SiH(OR) 3 wherein R is a C 1 -C 3 methyl group, an ethyl group, a propyl group Or an isopropyl group.
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US5084590A (en) * 1991-06-24 1992-01-28 Union Carbide Chemicals & Plastics Technology Corporation Trimethoxysilane preparation via the methanol-silicon reaction using a continuous process and multiple reactors

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