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TWI534937B - Assembly and method for algining wafers - Google Patents

Assembly and method for algining wafers Download PDF

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Publication number
TWI534937B
TWI534937B TW103112420A TW103112420A TWI534937B TW I534937 B TWI534937 B TW I534937B TW 103112420 A TW103112420 A TW 103112420A TW 103112420 A TW103112420 A TW 103112420A TW I534937 B TWI534937 B TW I534937B
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TW
Taiwan
Prior art keywords
wafer
image capturing
platform
item
alignment
Prior art date
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TW103112420A
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Chinese (zh)
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TW201511170A (en
Inventor
蔡政道
Original Assignee
政美應用股份有限公司
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Publication of TW201511170A publication Critical patent/TW201511170A/en
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Publication of TWI534937B publication Critical patent/TWI534937B/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G43/00Control devices, e.g. for safety, warning or fault-correcting
    • B65G43/08Control devices operated by article or material being fed, conveyed or discharged
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G47/00Article or material-handling devices associated with conveyors; Methods employing such devices
    • B65G47/74Feeding, transfer, or discharging devices of particular kinds or types
    • B65G47/90Devices for picking-up and depositing articles or materials
    • B65G47/901Devices for picking-up and depositing articles or materials provided with drive systems with rectilinear movements only

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Description

對位晶圓的總成及方法Alignment wafer assembly and method 【0001】【0001】

本發明係關於一種對位晶圓的總成及方法,特別指一種可以快速計算一輸送裝置上之一定位點與一晶圓之一中心間的誤差,以將晶圓對位於一承載平台上之一標準位置之總成及方法。The invention relates to an assembly and method for a aligning wafer, in particular to a method for quickly calculating an error between a positioning point on a conveying device and a center of a wafer to position the wafer on a carrying platform. One of the standard position assemblies and methods.

【0002】【0002】

於現有技術中,當要將晶圓輸送至一承載平台以進行晶圓的檢測及分類前,需先利用一對位裝置,將該晶圓進行一對位、定位之程序後,才得以將該晶圓輸送至該承載平台,以進行後續的檢測分類作業。In the prior art, before the wafer is to be transported to a carrier platform for wafer inspection and classification, it is necessary to use a pair of bit devices to perform a one-bit, positioning process on the wafer. The wafer is transported to the carrier platform for subsequent inspection and classification operations.

【0003】[0003]

然而,此種對位裝置多僅能針對單一特定尺寸的晶圓(如:2吋晶圓)完成對位、定位作業,若欲使用於其他尺寸晶圓的對位、定位作業(如4吋晶圓),則需予以更換其他相對應尺寸的對位裝置。However, such a aligning device can only perform alignment and positioning operations for a single specific size wafer (eg, 2 吋 wafer), and is used for alignment and positioning operations of other size wafers (eg, 4 吋). Wafer), it is necessary to replace the other corresponding size of the alignment device.

【0004】[0004]

另一方面,如本領域技術人員所熟知,現有技術的對位裝置乃是獨立於具有該承載平台的檢測分類機台,故將對位裝置與檢測分類機台配合時,於安裝精細度上將有所要求。因此,當在完成定位裝置的更換後,通常需要花費許多的時間在後續校準上,才得以重新進行晶圓的對位、定位程序,造成使用上的不便。尤其,當所進行的晶圓檢測及分類涉及多種尺寸時,更需要頻繁地更換前述的定位裝置,導致許多作業時間會耗費於效準,增加許多時間成本。On the other hand, as is well known to those skilled in the art, the prior art alignment device is independent of the detection classification machine having the loading platform, so when the alignment device is matched with the detection classification machine, the installation fineness is Will be required. Therefore, after the replacement of the positioning device is completed, it usually takes a lot of time for the subsequent calibration to re-align the wafer and locate the program, which causes inconvenience in use. In particular, when the wafer inspection and classification performed involves various sizes, it is more necessary to frequently replace the aforementioned positioning device, resulting in a lot of work time being costly and increasing the time cost.

【0005】[0005]

有鑑於此,如何提高並改善上述缺失,以提供一種可以快速對位晶圓的總成及方法,乃為此業界亟待解決的問題。In view of this, how to improve and improve the above-mentioned defects to provide an assembly and method for quickly aligning wafers is an urgent problem to be solved in the industry.

【0006】[0006]

本發明之一目的在於提供一種可以快速計算一輸送裝置上之一定位點與一晶圓之一中心間的誤差,以將晶圓對位於一承載平台上之一標準位置之總成及方法。It is an object of the present invention to provide an assembly and method for quickly calculating an error between a positioning point on a conveyor and a center of a wafer to position the wafer on a standard position on a carrier platform.

【0007】【0007】

為達上述目的,本發明之一種對位總成包含一輸送裝置、一承載平台及一取像裝置。輸送裝置適可抓取及置放晶圓,承載平台其上定義有一標準位置,使承載平台可移動地藉由標準位置承載晶圓。取像裝置設置於輸送裝置與承載平台之間,並對晶圓進行一取像程序。其中,輸送裝置於抓取晶圓後,係將晶圓置於取像裝置下方進行取像程序,承載平台接著依據取像程序計算一偏移量,使承載平台進行一軸向微調,供輸送裝置將晶圓置放於承載平台之標準位置。To achieve the above object, a aligning assembly of the present invention comprises a conveying device, a carrying platform and an image capturing device. The transport device is adapted to grasp and place the wafer, and the load bearing platform defines a standard position thereon, so that the load bearing platform can move the wafer by the standard position. The image taking device is disposed between the conveying device and the carrying platform, and performs an image capturing process on the wafer. After the transport device picks up the wafer, the wafer is placed under the image capturing device to perform an image capturing process, and the loading platform then calculates an offset according to the image capturing program to perform an axial fine adjustment of the carrying platform for transport. The device places the wafer in a standard position on the carrying platform.

【0008】[0008]

為達上述目的,本發明之對位總成的輸送裝置上具有一定位點,且前述之偏移量係為定位點與晶圓之一中心之誤差。To achieve the above object, the delivery device of the alignment assembly of the present invention has an anchor point, and the offset is the error between the anchor point and one of the centers of the wafer.

【0009】【0009】

為達上述目的,本發明之對位總成的取像裝置係為一光學相機。To achieve the above object, the image pickup device of the alignment assembly of the present invention is an optical camera.

【0010】[0010]

為達上述目的,本發明之對位總成的軸向微調係為一X-Y軸向之微調。To achieve the above object, the axial fine adjustment of the alignment assembly of the present invention is a fine adjustment of an X-Y axis.

【0011】[0011]

為達上述目的,本發明之對位總成的輸送裝置係為一取料桿。To achieve the above object, the delivery device of the alignment assembly of the present invention is a take-up bar.

【0012】[0012]

為達上述目的,本發明之對位方法包含下列步驟:(a)將晶圓設置於一待測區;(b)將晶圓自待測區移動至一對位區;(c)利用一取像裝置對晶圓進行一取像程序;(d)依據取像程序之結果,計算一偏移量;(e)依據該偏移量,使一承載平台進行一軸向微調;以及(f)將晶圓置放於承載平台所定義之一標準位置。To achieve the above object, the alignment method of the present invention comprises the steps of: (a) placing a wafer in a region to be tested; (b) moving the wafer from the region to be tested to a pair of bit regions; (c) utilizing a The image capturing device performs an image capturing process on the wafer; (d) calculating an offset according to the result of the image capturing program; (e) performing an axial fine tuning of the carrier platform according to the offset; and (f) Place the wafer in one of the standard locations defined by the carrier platform.

【0013】[0013]

為讓上述目的、技術特徵、和優點能更明顯易懂,下文係以較佳實施例配合所附圖式進行詳細說明。The above objects, technical features, and advantages will be more apparent from the following description.

100‧‧‧對位總成
110‧‧‧輸送裝置
112‧‧‧定位點
120‧‧‧承載平台
122‧‧‧標準位置
130‧‧‧取像裝置
200‧‧‧晶圓
100‧‧‧ alignment assembly
110‧‧‧Conveyor
112‧‧‧Location points
120‧‧‧Loading platform
122‧‧‧ standard position
130‧‧‧Image capture device
200‧‧‧ wafer

【0014】[0014]

第1圖為本發明對位總成之立體示意圖;
第2圖為本發明對位總成之輸送裝置抓取晶圓之示意圖;
第3圖為本發明對位總成之取像裝置進行取像程序之示意圖;
第4圖為本發明對位總成之承載平台往取像裝置移動之示意圖;
第5圖為本發明對位總成之輸送裝置將晶圓置放於承載平台之示意圖;及
第6圖為本發明對位總成對晶圓進行對位、定位之方法步驟圖。
Figure 1 is a perspective view of the alignment assembly of the present invention;
2 is a schematic view of the wafer of the alignment assembly of the present invention;
FIG. 3 is a schematic diagram of an image capturing program of the image capturing device of the alignment assembly of the present invention; FIG.
Figure 4 is a schematic view showing the movement of the carrying platform of the alignment assembly of the present invention to the image taking device;
FIG. 5 is a schematic view showing a method for placing a wafer on a carrying platform according to the conveying device of the alignment assembly of the present invention; and FIG. 6 is a schematic diagram showing a method for aligning and positioning the wafer by the alignment assembly of the present invention.

【0015】[0015]

如第1圖所示,本發明係關於一種用以對位晶圓的總成及方法。As shown in FIG. 1, the present invention is directed to an assembly and method for aligning wafers.

【0016】[0016]

如圖所示,本發明之一對位總成100包含一輸送裝置110、一承載平台120及一取像裝置130。其中,輸送裝置110適可抓取及置放一晶圓200,而承載平台120上定義有一標準位置122,使承載平台120可移動地藉由標準位置122承載晶圓200。此外,較佳地,取像裝置130係設置於輸送裝置110與承載平台120之間,並用以對晶圓200進行一取像程序。As shown, one of the alignment assemblies 100 of the present invention includes a transport device 110, a carrier platform 120, and an image capture device 130. The transport device 110 is adapted to capture and place a wafer 200. The load bearing platform 120 defines a standard position 122 for the carrier platform 120 to movably carry the wafer 200 by the standard position 122. In addition, the image capturing device 130 is disposed between the conveying device 110 and the carrying platform 120 and is used to perform an image capturing process on the wafer 200.

【0017】[0017]

因此,藉由輸送裝置110抓取晶圓200、利用取像裝置130對被抓取的晶圓200進行取像程序、最後再利用輸送裝置110將晶圓200置放於承載平台120上的標準位置122,便得以完成對晶圓200的對位及定位,使晶圓200可進行後續的檢測良率程序。Therefore, the wafer 200 is captured by the transport device 110, the image capturing device is used to perform the image capturing process by the image capturing device 130, and finally the wafer 200 is placed on the carrying platform 120 by the transport device 110. At position 122, the alignment and positioning of the wafer 200 is completed, enabling the wafer 200 to perform subsequent inspection yield programs.

【0018】[0018]

以下將藉由第2-5圖之內容,針對輸送裝置110、承載平台120及取像裝置130等元件間之作動與配合方式進行說明。The operation and cooperation between the components such as the transport device 110, the load bearing platform 120, and the image capturing device 130 will be described below with reference to the contents of FIGS. 2-5.

【0019】[0019]

首先,如第2圖所示,當欲進行晶圓200的對位、定位程序時,輸送裝置110係先自一待測區或一卡匣上抓取晶圓200。緊接著,如第3圖所示,輸送裝置110會將被抓取的晶圓200置於取像裝置130下方,以進行一取像程序,使設置於待測區之相對側的承載平台120可依據該取像程序之結果計算一偏移量。如第4圖所示,根據前述偏移量的計算結果,承載平台120將得以在前往一預定位置以承載晶圓200的過程中,進行一軸向微調,以抵銷該偏移量。最後,如第5圖所示,經過該軸向微調而抵銷該偏移量後,輸送裝置110將能夠把晶圓200精確地置放於承載平台120上之標準位置122,使晶圓200得以進行後續的檢測良率及分類作業。First, as shown in FIG. 2, when the alignment and positioning process of the wafer 200 is to be performed, the transport device 110 first grabs the wafer 200 from a test area or a cassette. Next, as shown in FIG. 3, the transport device 110 places the captured wafer 200 under the image capturing device 130 to perform an image capturing process to enable the loading platform 120 disposed on the opposite side of the area to be tested. An offset can be calculated based on the result of the imaging process. As shown in FIG. 4, based on the calculation of the aforementioned offset, the carrier platform 120 will be able to perform an axial fine adjustment to offset the offset during travel to a predetermined location to carry the wafer 200. Finally, as shown in FIG. 5, after the axial trimming is used to offset the offset, the transport device 110 will be able to accurately place the wafer 200 on the standard position 122 on the carrier platform 120, so that the wafer 200 It is possible to carry out subsequent detection yield and classification operations.

【0020】[0020]

於本實施例中,輸送裝置110較佳係為一取料桿,並且是透過由下而上的方式承載晶圓200,並繼而移動晶圓200。此外,需特別說明的是,於本發明中,對位總成100具有之輸送裝置110所用以承載晶圓200之一表面係具有一定位點,該定位點較佳係設置於該表面之一中心位置,而前述利用取像裝置130所進行之取像程序,即是在計算該定位點與晶圓200之一中心(即圓心)之誤差。In the present embodiment, the transport device 110 is preferably a take-up bar and carries the wafer 200 in a bottom-up manner and then moves the wafer 200. In addition, in the present invention, the surface of the wafer 200 used by the transport device 110 of the alignment assembly 100 has an anchor point, and the anchor point is preferably disposed on one of the surfaces. The central position, and the image capturing process performed by the image capturing device 130 described above is to calculate the error between the positioning point and one of the centers (ie, the center of the wafer) of the wafer 200.

【0021】[0021]

當然,於其他實施態樣中,輸送裝置110上亦可設置有複數定位點,而晶圓200上則可相應設置有複數基準點,使取像裝置130在進行取像程序時,可計算複數定位點與複數基準點間的誤差值,以增加計算偏移量的精確度。Of course, in other implementations, the transport device 110 may be provided with a plurality of positioning points, and the plurality of reference points may be correspondingly disposed on the wafer 200, so that the image capturing device 130 can calculate the complex number when performing the image capturing program. The error value between the anchor point and the complex reference point to increase the accuracy of calculating the offset.

【0022】[0022]

於本實施例中,取像裝置130較佳係為一光學相機,其可用以進行取像程序,並從而計算輸送裝置110之定位點與晶圓200之中心間的誤差,使承載平台120得以依據該偏移量,在前往承載晶圓200的過程中,進行軸向微調。In the embodiment, the image capturing device 130 is preferably an optical camera, which can be used to perform an image capturing process, and thereby calculate an error between the positioning point of the conveying device 110 and the center of the wafer 200, so that the carrying platform 120 can be obtained. Depending on the offset, axial fine tuning is performed during the journey to the carrier wafer 200.

【0023】[0023]

因此,於本領域具通常知識者可輕易推知,由於在本實施例中,承載平台120前往該預定位置的過程,僅會存在X-Y軸向的位移,故承載平台120的軸向微調可僅為單一X軸向、單一Y軸向或同時兼具X-Y軸向之微調作動。Therefore, those skilled in the art can easily infer that, in the present embodiment, the process of the loading platform 120 going to the predetermined position only has the XY axial displacement, so the axial fine adjustment of the carrying platform 120 can be only A single X-axis, a single Y-axis or a simultaneous fine-tuning of the XY axis.

【0024】[0024]

另一方面,前述之晶圓200可為LED晶圓或雙拋片晶圓,但並不以此作為限制。On the other hand, the aforementioned wafer 200 may be an LED wafer or a double-dip wafer, but is not limited thereto.

【0025】[0025]

如第6圖所示,本發明之對位方法包含下列步驟:As shown in Fig. 6, the alignment method of the present invention comprises the following steps:

【0026】[0026]

首先,如步驟601所示,將晶圓200設置於一待測區;如步驟602所示,將晶圓200自該待測區移動至一對位區,其中,該對位區係由取像裝置130所定義;如步驟603所示,利用取像裝置130對晶圓200進行一取像程序;如步驟604所示,依據該取像程序之結果,計算一偏移量;如步驟605所示,依據該偏移量,使承載平台120進行一軸向微調;最後,如步驟606所示,將晶圓200置放於承載平台120所定義之一標準位置,以完成晶圓200的對位。First, as shown in step 601, the wafer 200 is disposed in a region to be tested; as shown in step 602, the wafer 200 is moved from the region to be tested to a pair of regions, wherein the alignment region is taken As shown in step 603, the image capturing device 130 performs an image capturing process on the wafer 200; as shown in step 604, an offset is calculated according to the result of the image capturing program; As shown, the carrier platform 120 is subjected to an axial fine adjustment according to the offset. Finally, as shown in step 606, the wafer 200 is placed in a standard position defined by the carrier platform 120 to complete the wafer 200. Counterpoint.

【0027】[0027]

需提醒的是,於前述步驟605中,可先將承載平台120作動至該預定位置後,再進行軸向微調;或是,可以在將承載平台120作動至預定位置的過程中,同時進行軸向微調;又或者,也可先進行軸向微調後,再將承載平台120作動至預定位置。It should be noted that, in the foregoing step 605, the load bearing platform 120 may be first moved to the predetermined position, and then the axial fine adjustment may be performed; or, the axis may be simultaneously performed during the operation of the load bearing platform 120 to the predetermined position. Fine adjustment; or alternatively, the axial adjustment can be performed before the carrier platform 120 is actuated to a predetermined position.

【0028】[0028]

然而,無論是前述步驟605的何種態樣,都一定要在承載平台120作動至預定位置後,才會允許輸送裝置110將晶圓200置放於承載平台120所定義之標準位置122,以避免輸送裝置110與承載平台120間發生撞機的情況。However, regardless of the aspect of the foregoing step 605, it is necessary to allow the transport device 110 to place the wafer 200 on the standard position 122 defined by the carrier platform 120 after the carrier platform 120 is actuated to a predetermined position. A collision between the conveying device 110 and the carrying platform 120 is avoided.

【0029】[0029]

綜上所示,藉由本發明之對位總成100的設置,將可協助晶圓200進行良率檢測前,迅速地完成對位及定位程序,以提高檢測效率與降低作業成本。In summary, with the setting of the alignment assembly 100 of the present invention, the alignment and positioning procedures can be quickly completed before the wafer 200 can be assisted in yield detection, thereby improving detection efficiency and reducing operating costs.

【0030】[0030]

上述之實施例僅用來例舉本發明之實施態樣,以及闡釋本發明之技術特徵,並非用來限制本發明之保護範疇。任何熟悉此技術者可輕易完成之改變或均等性之安排均屬於本發明所主張之範圍,本發明之權利保護範圍應以申請專利範圍為準。The embodiments described above are only intended to illustrate the embodiments of the present invention, and to explain the technical features of the present invention, and are not intended to limit the scope of protection of the present invention. Any changes or equivalents that can be easily made by those skilled in the art are within the scope of the invention. The scope of the invention should be determined by the scope of the claims.

100‧‧‧對位總成 100‧‧‧ alignment assembly

110‧‧‧輸送裝置 110‧‧‧Conveyor

112‧‧‧定位點 112‧‧‧Location points

120‧‧‧承載平台 120‧‧‧Loading platform

122‧‧‧標準位置 122‧‧‧ standard position

130‧‧‧取像裝置 130‧‧‧Image capture device

Claims (6)

【第1項】[Item 1] 一種對位總成,用以進行一晶圓的對位作業,包含:
  一輸送裝置,適可抓取及置放該晶圓;
  一承載平台,其上定義有一標準位置,使該承載平台可移動地藉由該標準位置承載該晶圓;以及
  一取像裝置,係設置於該輸送裝置與該移承載平台之間,並對該晶圓進行一取像程序;
  其中,該輸送裝置於抓取該晶圓後,係將該晶圓置於該取像裝置下方進行該取像程序,該承載平台接著依據該取像程序計算一偏移量,使該承載平台進行一軸向微調,供該輸送裝置將該晶圓置放於該承載平台之該標準位置。
A aligning assembly for performing a wafer alignment operation, comprising:
a conveying device adapted to grasp and place the wafer;
a load bearing platform having a standard position defined thereon, such that the load bearing platform movably carries the wafer by the standard position; and an image capturing device disposed between the transport device and the transfer bearing platform, and The wafer performs an image capturing process;
After the device picks up the wafer, the wafer is placed under the image capturing device to perform the image capturing process, and the carrier platform then calculates an offset according to the image capturing program to make the carrier platform An axial fine adjustment is performed for the transport device to place the wafer in the standard position of the carrying platform.
【第2項】[Item 2] 如請求項1所述之對位總成,其中該輸送裝置上具有一定位點,該偏移量係為該定位點與該晶圓之一中心之誤差。The alignment assembly of claim 1, wherein the transport device has an anchor point, the offset being an error between the anchor point and a center of the wafer. 【第3項】[Item 3] 如請求項1所述之對位總成,其中該取像裝置係為一光學相機。The alignment assembly of claim 1, wherein the imaging device is an optical camera. 【第4項】[Item 4] 如請求項1所述之對位總成,其中該軸向微調係為一X-Y軸向之微調。The alignment assembly of claim 1, wherein the axial fine tuning is a fine adjustment of an X-Y axis. 【第5項】[Item 5] 如請求項1所述之對位總成,其中該輸送裝置係為一取料桿。The alignment assembly of claim 1 wherein the delivery device is a take-up bar. 【第6項】[Item 6] 一種對位晶圓之方法,包含下列步驟:
  (a)將該晶圓設置於一待測區;
  (b)將該晶圓自該待測區移動至一對位區;
  (c)利用一取像裝置對該晶圓進行一取像程序;
  (d)依據該取像程序之結果,計算一偏移量;
  (e)依據該偏移量,使一承載平台進行一軸向微調;以及
  (f)將該晶圓置放於該承載平台所定義之一標準位置。
A method of aligning a wafer includes the following steps:
(a) placing the wafer in a region to be tested;
(b) moving the wafer from the area to be tested to a pair of bit areas;
(c) performing an image capturing process on the wafer using an image capturing device;
(d) calculating an offset according to the result of the image capturing program;
(e) subjecting a carrier platform to an axial fine adjustment based on the offset; and (f) placing the wafer in a standard location defined by the carrier platform.
TW103112420A 2013-09-09 2014-04-03 Assembly and method for algining wafers TWI534937B (en)

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