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TWI510434B - A chain-like silica-based hollow fine particles and a method for producing the same, a coating liquid for forming a transparent film containing the fine particles, and a substrate coated with a transparent film - Google Patents

A chain-like silica-based hollow fine particles and a method for producing the same, a coating liquid for forming a transparent film containing the fine particles, and a substrate coated with a transparent film Download PDF

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TWI510434B
TWI510434B TW098142722A TW98142722A TWI510434B TW I510434 B TWI510434 B TW I510434B TW 098142722 A TW098142722 A TW 098142722A TW 98142722 A TW98142722 A TW 98142722A TW I510434 B TWI510434 B TW I510434B
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cerium oxide
oxide
hollow fine
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Wataru Futagami
Ryo Muraguchi
Masayuki Matsuda
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Jgc Catalysts & Chemicals Ltd
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Description

鏈狀氧化矽系中空微粒子及其製造方法、含該微粒子之透明被膜形成用塗佈液與附透明被膜之基材Chain-shaped cerium oxide-based hollow fine particles, a method for producing the same, a coating liquid for forming a transparent film containing the fine particles, and a substrate with a transparent film

本發明關於具有貫通內部之空洞的鏈狀氧化矽系中空微粒子,該鏈狀氧化矽系中空微粒子之製造方法,及含有該鏈狀氧化矽系中空微粒子之透明被膜形成用塗佈液,以及於基材表面上形成有含有鏈狀氧化矽系中空微粒子之透明被膜的附透明被膜之基材。The present invention relates to a chain-shaped cerium oxide-based hollow fine particle having a cavity that penetrates the inside, a method for producing the chain-shaped cerium oxide-based hollow fine particle, and a coating liquid for forming a transparent film containing the chain-shaped cerium oxide-based hollow fine particle, and A substrate with a transparent film containing a transparent film of chain-like cerium oxide-based hollow fine particles is formed on the surface of the substrate.

向來,粒徑為0.1~300μm左右的中空氧化矽粒子係眾所周知(參照專利文獻1、專利文獻2等)。又,藉由使來自矽酸鹼金屬水溶液的活性氧化矽沈澱在由氧化矽以外的材料所成的芯上,不破壞氧化矽殼而去除該材料,以製造由稠密的氧化矽殼所成的中空粒子之方法係眾所周知(參照專利文獻3等)。In the past, hollow cerium oxide particles having a particle diameter of about 0.1 to 300 μm are known (see Patent Document 1, Patent Document 2, and the like). Further, by precipitating active cerium oxide from an aqueous solution of an alkali metal citrate on a core made of a material other than cerium oxide, the material is removed without destroying the cerium oxide shell to produce a dense cerium oxide shell. The method of hollow particles is well known (refer to Patent Document 3, etc.).

再者,具有外周部為殼,中心部為中空,殼為外側稠密且愈內側愈粗的濃度傾斜構造之芯-殼構造的微米大小之球狀氧化矽粒子係眾所周知(參照專利文獻4等)。In addition, a micron-sized spherical cerium oxide particle having a core-shell structure having a sloping structure in which the outer peripheral portion is a shell and the center portion is hollow, and the shell is dense and has a thicker inner side is known (refer to Patent Document 4, etc.). .

又,本案申請人先前提案藉由氧化矽等來完全被覆多孔性的無機氧化物微粒子之表面,而得到低折射率的奈米大小之複合氧化物微粒子(專利文獻5參照),而且更提案在由氧化矽與氧化矽以外的無機氧化物所成的複合氧化物之核粒子上形成氧化矽被覆層,接著去除氧化矽以外的無機氧化物,按照需要被覆氧化矽,則可得到在內部具有空洞的低折射率之奈米大小的氧化矽系微粒子(參照專利文獻6)。In addition, the applicant of the present invention has previously proposed to completely cover the surface of the porous inorganic oxide fine particles by ruthenium oxide or the like to obtain nano-sized composite oxide fine particles having a low refractive index (refer to Patent Document 5), and A cerium oxide coating layer is formed on the core particles of the composite oxide made of an inorganic oxide other than cerium oxide and cerium oxide, and then an inorganic oxide other than cerium oxide is removed, and if cerium oxide is coated as needed, a void is formed inside. A low-refractive-index nanometer-sized cerium oxide-based fine particle (see Patent Document 6).

另一方面,關於鏈狀的氧化矽粒子,本申請人先前亦提案藉由在弱酸性條件下對氧化矽粒子進行水熱處理,而形成鏈狀化的氧化矽粒子(參照專利文獻7)。於非中空的粒子中,由於粒子折射率不為1.45以下,為了得到低折射率的粒子,本申請人更提案藉由在中空氧化矽粒子形成階段,添加電解質物質,而形成鏈狀化的中空氧化矽粒子(參照專利文獻8、9)。On the other hand, the present applicant has previously proposed to form chain-shaped cerium oxide particles by hydrothermal treatment of cerium oxide particles under weakly acidic conditions (see Patent Document 7). In the non-hollow particles, since the refractive index of the particles is not 1.45 or less, in order to obtain particles having a low refractive index, the applicant further proposes to form a chain-like hollow by adding an electrolyte substance in the formation stage of the hollow cerium oxide particles. Cerium oxide particles (see Patent Documents 8 and 9).

然而,於與上述本案申請人的提案有關的氧化矽系中空粒子中,取決於粒子的使用目的及用途,有得不到充分的低折射率效果之情況。即,即使將各個粒子的內部空洞化,由粒子強度的點來看,空洞容積也有限度,即使低折射率化,也有極限,故要求具有與以往不同粒子構造的氧化矽系中空微粒子。However, in the cerium oxide-based hollow particles related to the proposal of the applicant of the present invention, depending on the purpose and use of the particles, a sufficient low refractive index effect may not be obtained. In other words, even if the inside of each particle is hollowed out, the void volume is limited from the viewpoint of particle strength, and there is a limit even if the refractive index is lowered. Therefore, cerium oxide-based hollow fine particles having a different particle structure from the conventional one are required.

先前技術文獻Prior technical literature 專利文獻Patent literature

專利文獻1:特開平6-330606號公報Patent Document 1: Japanese Laid-Open Patent Publication No. Hei 6-330606

專利文獻2:特開平7-013137號公報Patent Document 2: Japanese Patent Publication No. 7-013137

專利文獻3:特表2000-500113號公報Patent Document 3: Special Table 2000-500113

專利文獻4:特開平11-029318號公報Patent Document 4: Japanese Patent Publication No. 11-029318

專利文獻5:特開平07-133105號公報Patent Document 5: Japanese Patent Publication No. 07-133105

專利文獻6:特開2001-233611號公報Patent Document 6: JP-A-2001-233611

專利文獻7:特開2004-055298號公報Patent Document 7: JP-A-2004-055298

專利文獻8:特表2004-099074號公報Patent Document 8: Special Table 2004-099074

專利文獻9:特開2005-186435號公報Patent Document 9: JP-A-2005-186435

本發明係以前述專利文獻6記載的發明為基礎所發展者,目為為得到低折射率的氧化矽系微粒子,藉由使由氧化矽與氧化矽以外的無機氧化物所成的多孔質之複合氧化物粒子(一次粒子)成鏈狀化,以氧化矽被覆此鏈狀化粒子之表面,接著去除氧化矽以外的無機氧化物,而製造具有貫通外殼內部之空洞的鏈狀氧化矽系中空微粒子之方法。The present invention has been developed based on the invention described in the above-mentioned Patent Document 6, and it is intended to obtain a porous oxidized cerium-based fine particle having a low refractive index and a porous material made of an inorganic oxide other than cerium oxide and cerium oxide. The composite oxide particles (primary particles) are chain-like, and the surface of the chain-like particles is coated with cerium oxide, and then the inorganic oxide other than cerium oxide is removed to produce a chain-shaped yttrium oxide hollow having a cavity penetrating the inside of the outer shell. The method of microparticles.

又,本發明之目的為提供含有前述鏈狀氧化矽系中空微粒子與被膜形成用基質形成成分,而安定性、膜形成性等優異的被膜形成用塗料。In addition, it is an object of the present invention to provide a coating material for film formation which is excellent in stability, film formability, and the like, and contains the matrix-forming hollow granules and the matrix-forming substrate.

再者,本發明之目的為提供將含有前述鏈狀氧化矽系中空微粒子的被膜形成於基材的表面上,而低折射率且與基材的密接性、強度、耐擦傷性、防反射能力及防眩性能等優異的附被膜之基材。Further, an object of the present invention is to provide a film comprising the above-mentioned chain-like cerium oxide-based hollow fine particles on a surface of a substrate, and having a low refractive index and adhesion to a substrate, strength, scratch resistance, and anti-reflection ability. And an excellent film-attached substrate such as anti-glare property.

本發明的鏈狀氧化矽系中空微粒子之特徵為在外部具有外殼、在內部具有空洞的氧化矽系中空微粒子(一次粒子)以鏈狀連結,具有空洞互相貫通的貫通孔,平均長度(L)在20~1500nm之範圍,平均寬幅(W)在10~300nm之範圍,折射率在1.10~1.35之範圍。The chain-shaped yttria-based hollow fine particles of the present invention are characterized in that the yttrium oxide-based hollow fine particles (primary particles) having a shell on the outside and having voids therein are connected in a chain shape, and have through-holes through which voids are interpenetrated, and the average length (L) In the range of 20 to 1500 nm, the average width (W) is in the range of 10 to 300 nm, and the refractive index is in the range of 1.10 to 1.35.

較佳為前述外殼的厚度(Ts )係在2~100nm之範圍,與前述平均寬幅(W)之比(Ts)/(W)係在0.05~0.30之範圍。Preferably, the thickness (T s ) of the outer casing is in the range of 2 to 100 nm, and the ratio (Ts) / (W) to the average width (W) is in the range of 0.05 to 0.30.

前述貫通孔的平均直徑(Ds )與前述平均寬幅(W)之比的(Ds )/(W)較佳在0.1~0.9之範圍。The ratio (D s )/(W) of the ratio of the average diameter (D s ) of the through holes to the average width (W) is preferably in the range of 0.1 to 0.9.

較佳為由氧化矽與氧化矽以外的無機氧化物所構成,以MOx 表示氧化矽以外的無機氧化物時之莫耳比MOx /SiO2 在0.0001~0.2之範圍。Preferably, it is composed of an inorganic oxide other than cerium oxide and cerium oxide, and when MO x represents an inorganic oxide other than cerium oxide, the molar ratio MO x /SiO 2 is in the range of 0.0001 to 0.2.

本發明的鏈狀氧化矽系中空微粒子之製造方法的特徵為由下述步驟(a)~(f)所構成。The method for producing a chain yttria-based hollow fine particle of the present invention is characterized by the following steps (a) to (f).

(a)將矽酸鹽的水溶液及/或酸性矽酸液與鹼可溶的無機化合物水溶液同時加到鹼水溶液中,或同時加到固體成分濃度在0.01~2重量%之範圍的種粒子所分散的鹼水溶液中,以調製當以SiO2 表示氧化矽,以MOx 表示氧化矽以外的無機氧化物時的莫耳比MOx /SiO2 (A)在0.1~2之範圍的複合氧化物一次粒子分散液之步驟;(a) simultaneously adding an aqueous solution of a citrate and/or an acidic citric acid solution and an aqueous solution of an alkali-soluble inorganic compound to an aqueous alkali solution, or simultaneously adding a seed particle having a solid concentration of 0.01 to 2% by weight. In the dispersed aqueous alkali solution, a composite oxide having a molar ratio MO x /SiO 2 (A) in the range of 0.1 to 2 when cerium oxide is represented by SiO 2 and inorganic oxide other than cerium oxide is represented by MO x a step of primary particle dispersion;

(b)洗淨前述一次粒子分散液之步驟;(b) a step of washing the aforementioned primary particle dispersion;

(c)將洗淨後的一次粒子分散液,在電解質的存在下,於50~300℃進行水熱處理,以調製鏈狀複合氧化物粒子分散液之步驟;(c) a step of preparing a chain-like composite oxide particle dispersion by subjecting the washed primary particle dispersion to hydrothermal treatment at 50 to 300 ° C in the presence of an electrolyte;

(d)形成氧化矽或氧化矽‧氧化鋁被覆層,調製氧化矽或氧化矽‧氧化鋁被覆鏈狀複合氧化物粒子分散液之步驟;(d) forming a cerium oxide or cerium oxide ‧ alumina coating layer, and preparing a cerium oxide or cerium oxide ‧ alumina coating chain-like composite oxide particle dispersion;

(e)於氧化矽或氧化矽‧氧化鋁被覆鏈狀複合氧化物粒子分散液中添加酸,去除構成該複合氧化物粒子之矽以外的元素之至少一部分,而成為鏈狀氧化矽系中空微粒子分散液之步驟;(e) adding an acid to the dispersion of cerium oxide or cerium oxide ‧ alumina-coated chain-like composite oxide particles, and removing at least a part of elements other than ruthenium constituting the composite oxide particles to form chain cerium oxide-based hollow fine particles The step of dispersing the liquid;

(f)洗淨所得的分散液之步驟。(f) a step of washing the resulting dispersion.

前述步驟(c)中的電解質較佳為鹼土類金屬鹽。The electrolyte in the aforementioned step (c) is preferably an alkaline earth metal salt.

於前述步驟(f)之後,較佳為接著實施下述步驟(g)。After the aforementioned step (f), it is preferred to carry out the following step (g).

(g)將鏈狀氧化矽系中空微粒子分散液,在50~300℃之範圍進行水熱處理之步驟。(g) A step of hydrothermal treatment of a chain-shaped cerium oxide-based hollow fine particle dispersion liquid in the range of 50 to 300 °C.

前述步驟(d)較佳為下述步驟(d-1)、下述步驟(d-2)、下述步驟(d-3)中任一者。The above step (d) is preferably any one of the following steps (d-1), the following step (d-2), and the following step (d-3).

(d-1)於前述步驟(c)所得之鏈狀複合氧化物粒子分散液中,添加鹼水溶液與下述化學式(1)所示的有機矽化合物及/或其部分水解物,在鏈狀複合氧化物粒子上形成氧化矽被覆層之步驟(d-1) In the chain-like composite oxide particle dispersion obtained in the above step (c), an aqueous alkali solution and an organic hydrazine compound represented by the following chemical formula (1) and/or a partially hydrolyzed product thereof are added in a chain form. Step of forming a cerium oxide coating layer on the composite oxide particles

Rn SiX(4-n)  ‧‧‧(1)R n SiX (4-n) ‧‧‧(1)

[惟,R:碳數1~10之非取代或取代烴基、丙烯醯基、環氧基、甲基丙烯醯基、胺基、CF2 基;X:碳數1~4之烷氧基、矽烷醇基、鹵素或氫;n:0~3的整數];[R, R: an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, an alkylene group, an epoxy group, a methacryl group, an amine group, a CF 2 group; X: an alkoxy group having 1 to 4 carbon atoms; a stanol group, a halogen or a hydrogen; n: an integer of 0 to 3];

(d-2)於前述步驟(c)所得之鏈狀複合氧化物粒子分散液中,添加鹼水溶液與酸性矽酸液,在鏈狀複合氧化物粒子上形成氧化矽被覆層之步驟;(d-2) a step of adding an alkali aqueous solution and an acidic citric acid solution to form a cerium oxide coating layer on the chain-like composite oxide particles in the chain-like composite oxide particle dispersion obtained in the above step (c);

(d-3)於前述步驟(c)所得之鏈狀複合氧化物粒子分散液中,添加矽酸鹼水溶液與鋁酸水溶液,在鏈狀複合氧化物粒子上形成氧化矽被覆層之步驟。(d-3) A step of forming a cerium oxide coating layer on the chain-like composite oxide particles by adding an aqueous citric acid solution and an aqueous solution of alumina in the chain-like composite oxide particle dispersion obtained in the above step (c).

本發明的透明被膜形成用塗佈液之特徵為含有前述鏈狀氧化矽系中空微粒子與基質形成成分所成。The coating liquid for forming a transparent film of the present invention is characterized in that it contains the chain-like cerium oxide-based hollow fine particles and a matrix-forming component.

本發明的附透明被膜之基材之特徵為用前述透明被膜形成用塗佈液所形成的透明被膜係單獨或與其它被膜一起形成於基材表面上。The transparent film-attached substrate of the present invention is characterized in that the transparent film formed by the coating liquid for forming a transparent film is formed on the surface of the substrate alone or together with another film.

若依照本發明,可提供具有貫通外殼內部的空洞之新穎鏈狀氧化矽系中空微粒子。此新穎鏈狀氧化矽系中空微粒子係比中空微粒子以鏈狀連結的氧化矽系中空微粒子還低的折射率。According to the present invention, novel chain yttria-based hollow fine particles having voids penetrating the inside of the outer casing can be provided. The novel chain-like yttrium oxide-based hollow microparticles have a lower refractive index than the cerium oxide-based hollow microparticles in which the hollow microparticles are linked in a chain.

若依照本發明的製造方法,可提供低折射率的鏈狀氧化矽系中空微粒子。According to the production method of the present invention, chain-like yttria-based hollow fine particles having a low refractive index can be provided.

又,可提供含有前述鏈狀氧化矽系中空微粒子一被膜形成用基質形成成分,而安定性、膜形成性等優異的被膜形成用塗料。In addition, it is possible to provide a coating material for film formation which is excellent in stability, film formability, and the like, and the matrix-forming component for forming a matrix of the oxidized cerium oxide-based hollow fine particles.

再者,可提供將含有前述鏈狀氧化矽系中空微粒子的被膜形成於基材的表面上,而低折射率且與基材的密接性、強度、耐擦傷性及防反射能力等優異的附被膜之基材。In addition, it is possible to provide a film having the above-mentioned chain-like cerium oxide-based hollow fine particles on the surface of the substrate, and having excellent refractive index, adhesion to the substrate, strength, scratch resistance, and antireflection ability. The substrate of the film.

實施發明的形態Form of implementing the invention [鏈狀氧化矽系中空微粒子][chain oxidized cerium hollow microparticles]

首先,說明本發明的鏈狀氧化矽系中空微粒子。First, the chain cerium oxide-based hollow fine particles of the present invention will be described.

本發明的鏈狀氧化矽系中空微粒子之特徵為在外部具有外殼、在內部具有空洞的氧化矽系中空微粒子(一次粒子)以鏈狀連結,具有空洞互相貫通的貫通孔,平均長度(L)在20~1500nm之範圍,平均寬幅(W)在10~300nm之範圍,折射率在1.10~1.35之範圍。The chain-shaped yttria-based hollow fine particles of the present invention are characterized in that the yttrium oxide-based hollow fine particles (primary particles) having a shell on the outside and having voids therein are connected in a chain shape, and have through-holes through which voids are interpenetrated, and the average length (L) In the range of 20 to 1500 nm, the average width (W) is in the range of 10 to 300 nm, and the refractive index is in the range of 1.10 to 1.35.

氧化矽系中空微粒子(一次粒子)Cerium oxide hollow microparticles (primary particles)

鏈狀氧化矽系中空微粒子係在外部具有外殼、在內部具有空洞氧化矽系中空微粒子(一次粒子)以鏈狀連結。The chain-shaped cerium oxide-based hollow fine particle system has a shell on the outside and a hollow cerium-based hollow fine particle (primary particle) inside, which is connected in a chain shape.

圖1中顯示本發明的鏈狀氧化矽系中空微粒子之截面的模型圖。Fig. 1 is a model diagram showing a cross section of the chain-like cerium oxide-based hollow fine particles of the present invention.

本發明中的氧化矽系中空微粒子(一次粒子)的大小係大約10~300nm,更以在15~200nm之範圍為佳。The size of the cerium oxide-based hollow fine particles (primary particles) in the present invention is preferably about 10 to 300 nm, more preferably in the range of 15 to 200 nm.

當一次粒子的大小未達10nm時,有難以鏈狀化而凝聚的傾向,有難以得到所欲低折射率的鏈狀氧化矽系中空微粒子之情況。When the size of the primary particles is less than 10 nm, it tends to be difficult to form a chain and to agglomerate, and it is difficult to obtain a chain-like yttrium oxide-based hollow fine particle having a desired low refractive index.

若一次粒子的大小超過300nm,則由於粒子過大,鏈狀化係困難,還是有難以得到所欲鏈狀氧化矽系中空微粒子之情況。When the size of the primary particles exceeds 300 nm, the particles are too large, and the chain formation is difficult, and it is difficult to obtain the desired chain-like cerium oxide-based hollow fine particles.

鏈狀氧化矽系中空微粒子的平均寬幅(W)係如圖1所示地,取與一次粒徑相同程度或比其大之值,為10~300nmm,更以在15~200nm之範圍為佳。The average width (W) of the chain-shaped cerium oxide-based hollow fine particles is as large as or equal to the primary particle diameter as shown in Fig. 1, and is in the range of 10 to 300 nm, and more preferably in the range of 15 to 200 nm. good.

鏈狀氧化矽系中空微粒子係一次粒子以鏈狀連結,但是平均長度(L)為20~1500nm,更以在40~1000nm之範圍為佳。The linear cerium oxide-based hollow fine particle-based primary particles are connected in a chain shape, but the average length (L) is preferably from 20 to 1,500 nm, more preferably from 40 to 1,000 nm.

當平均長度(L)未達20nm時,意味最小粒徑10nm的一次粒子未達2個,無法成為所欲低折射率的鏈狀氧化矽系中空微粒子,而平均長度(L)若超過1500nm,則進行凝聚,或互相交絡,有難以得到所欲鏈狀氧化矽系中空微粒子之情況。When the average length (L) is less than 20 nm, it means that the number of primary particles having a minimum particle diameter of 10 nm is less than two, and it is impossible to form a chain-like yttrium oxide-based hollow fine particle having a desired low refractive index, and if the average length (L) exceeds 1500 nm, Then, it is agglomerated or entangled with each other, and it is difficult to obtain the desired chain-like cerium oxide-based hollow fine particles.

外殼的厚度(Ts )雖然亦隨著一次粒徑或平均寬幅(W)而不同,但是為2~100nm,更以在3~50nm之範圍為佳。Although the thickness (T s ) of the outer casing differs depending on the primary particle diameter or the average width (W), it is preferably from 2 to 100 nm, more preferably from 3 to 50 nm.

外殼的厚度(Ts )未達2nm者,係在去除後述矽以外的元素之至少一部分時,有無法保持中空構造之情況,有難以得到所欲鏈狀氧化矽系中空微粒子之情況。When the thickness (T s ) of the outer casing is less than 2 nm, when at least a part of the elements other than the latter are removed, the hollow structure may not be maintained, and it may be difficult to obtain the desired chain-shaped cerium oxide-based hollow fine particles.

外殼的厚度(Ts )若超過100nm,則內部的空隙小,有難以得到所欲低折射率的鏈狀氧化矽系中空微粒子之情況。When the thickness (T s ) of the outer shell exceeds 100 nm, the internal voids are small, and it is difficult to obtain the chain-like yttrium oxide-based hollow fine particles having a desired low refractive index.

又,外殼的厚度(Ts )與前述平均寬幅(W)之比(Ts )/(W)為0.05~0.30,更以在0.05~0.2之範圍為佳。Further, the ratio (T s )/(W) of the thickness (T s ) of the outer casing to the average width (W) is preferably 0.05 to 0.30, more preferably 0.05 to 0.2.

當(Ts )/(W)未達0.05時,於去除矽以外的元素之至少一部分時,有無法保持中空構造之情況,有難以得到鏈狀氧化矽系中空微粒子之情況。When (T s )/(W) is less than 0.05, when at least a part of elements other than ruthenium is removed, the hollow structure may not be maintained, and it may be difficult to obtain chain yttrium oxide-based hollow fine particles.

(Ts )/(W)若超過0.30,則內部的空隙小,有難以得到所欲低折射率的鏈狀氧化矽系中空微粒子之情況。When (T s )/(W) exceeds 0.30, the internal voids are small, and it is difficult to obtain the chain-like yttrium oxide-based hollow fine particles having a desired low refractive index.

前述貫通孔的平均直徑(Ds )與前述平均寬幅(W)之比的(Ds )/(W)較佳為0.1~0.9,更佳在0.3~0.8之範圍。The ratio (D s )/(W) of the ratio of the average diameter (D s ) of the through holes to the average width (W) is preferably 0.1 to 0.9, more preferably 0.3 to 0.8.

當(Ds )/(W)未達0.1時,貫通孔的空隙小,對低折射率化的貢獻度小,有難以得到所欲低折射率的鏈狀氧化矽系中空微粒子之情況。When (D s )/(W) is less than 0.1, the voids in the through-holes are small, and the contribution to the low refractive index is small, and it is difficult to obtain the chain-like yttrium oxide-based hollow fine particles having a desired low refractive index.

得到(Ds )/(W)超過0.9的鏈狀氧化矽系中空微粒子係困難。It is difficult to obtain a chain-like cerium oxide-based hollow fine particle system in which (D s )/(W) exceeds 0.9.

如此的鏈狀氧化矽系中空微粒子係折射率為1.10~1.35,更以在1.10~1.30之範圍為佳。Such a chain-like cerium oxide-based hollow fine particle system has a refractive index of 1.10 to 1.35, more preferably in the range of 1.10 to 1.30.

得到鏈狀氧化矽系中空微粒子之折射率未達1.10者係困難,折射率超過1.35者雖然與基材的密接性、強度、耐擦傷性優異,但是防反射能力會變不足。It is difficult to obtain a chain yttria-based hollow fine particle having a refractive index of less than 1.10, and a refractive index of more than 1.35 is excellent in adhesion to a substrate, strength, and scratch resistance, but the antireflection ability is insufficient.

本發明的鏈狀氧化矽系中空微粒子係由氧化矽與氧化矽以外的無機氧化物所構成,以MOx 表示氧化矽以外的無機氧化物時的莫耳比MOx /SiO2 較佳在0.0001~0.2之範圍。Linear silicon oxide-based hollow fine lines of the invention is composed of an inorganic oxide other than silicon oxide and silicon oxide, at molar ratio of MO MO when X represents an inorganic oxide other than silicon oxide x / SiO 2 is preferably from 0.0001 ~0.2 range.

得到莫耳比MOx /SiO2 未達0.0001的鏈狀氧化矽系中空微粒子係困難,莫耳比MOx /SiO2 超過0.2者係製造方法如後述,但是由於氧化矽以外的無機氧化物之去除少,有得不到低折射率的鏈狀氧化矽系中空微粒子之情況。It is difficult to obtain a chain cerium oxide-based hollow fine particle system having a molar ratio of MO x /SiO 2 of less than 0.0001, and a molar ratio of MO x /SiO 2 exceeding 0.2 is described later, but inorganic oxide other than cerium oxide is used. There are few removals, and there are cases where chain-like yttrium oxide-based hollow fine particles having a low refractive index are not obtained.

於本發明的鏈狀氧化矽系中空微粒子中,作為氧化矽以外的無機氧化物,可舉出Al2 O3 、B2 O3 、TiO2 、ZrO2 、SnO2 、Ce2 O3 、P2 O5 、Sb2 O3 、MoO3 、ZnO2 、WO3 等的1種或2種以上。作為2種以上的無機氧化物,可例示TiO2 -Al2 O3 、TiO2 -ZrO2 等。其中較佳為Al2 O3In the chain cerium oxide-based hollow fine particles of the present invention, examples of the inorganic oxide other than cerium oxide include Al 2 O 3 , B 2 O 3 , TiO 2 , ZrO 2 , SnO 2 , Ce 2 O 3 , and P. 1 or 2 or more of 2 O 5 , Sb 2 O 3 , MoO 3 , ZnO 2 , and WO 3 . Examples of the two or more kinds of inorganic oxides include TiO 2 -Al 2 O 3 and TiO 2 -ZrO 2 . Among them, Al 2 O 3 is preferred.

再者,本發明的鏈狀氧化矽系中空微粒子之平均長度(L)、平均寬幅(W)係拍攝鏈狀氧化矽系中空微粒子的透射型電子顯微鏡照片(TEM),藉由游標卡尺來測定100個粒子的長度及寬幅,其其平均值。Further, the average length (L) and the average width (W) of the chain yttria-based hollow fine particles of the present invention are transmission electron micrographs (TEM) of the chain-shaped yttria-based hollow fine particles, which are measured by a vernier caliper. The length and width of 100 particles, the average of which.

又,外殼的平均厚度(Ts )、貫通孔的平均直徑(Ds )係可藉由觀察粒子截面的透射型電子顯微鏡照片(TEM)而測定。Further, the average thickness (T s ) of the outer casing and the average diameter (D s ) of the through holes can be measured by observing a transmission electron micrograph (TEM) of the cross section of the particles.

再者,折射率係藉由以下的程序來求得。Furthermore, the refractive index is obtained by the following procedure.

(1)於蒸發器中採集鏈狀氧化矽系中空微粒子分散液,使分散介質蒸發。(1) A chain-shaped cerium oxide-based hollow fine particle dispersion liquid is collected in an evaporator to evaporate the dispersion medium.

(2)將此在120℃乾燥以成為粉末。(2) This was dried at 120 ° C to become a powder.

(3)將折射率已知的標準折射率液滴2、3滴到玻璃板上,於其中混合上述粉末。(3) The standard refractive index droplets 2, 3 having a known refractive index are dropped onto a glass plate, and the above powder is mixed therein.

(4)以各種標準折射率液進行上述(3)的操作,將混合液變成透明時的標準折射率液之折射率當作鏈狀氧化矽系中空微粒子的折射率。(4) The operation of the above (3) is carried out using various standard refractive index liquids, and the refractive index of the standard refractive index liquid when the mixed liquid is made transparent is regarded as the refractive index of the chain-shaped cerium oxide-based hollow fine particles.

[氧化矽系微粒子的製造方法][Method for Producing Cerium Oxide Microparticles]

接著,說明本發明的鏈狀氧化矽系中空微粒子之製造方法。Next, a method for producing the chain-like cerium oxide-based hollow fine particles of the present invention will be described.

本發明之鏈狀氧化矽系中空微粒子的製造方法之特徵為由下述步驟(a)~(f)所構成。The method for producing a chain-like cerium oxide-based hollow fine particle of the present invention is characterized by the following steps (a) to (f).

(a)將矽酸鹽的水溶液及/或酸性矽酸液與鹼可溶的無機化合物水溶液同時加到鹼水溶液中,或同時加到固體成分濃度在0.01~2重量%之範圍的種粒子所分散的鹼水溶液中,以調製當以SiO2 表示氧化矽,以MOx 表示氧化矽以外的無機氧化物時的莫耳比MOx /SiO2 (A)在0.1~2之範圍的複合氧化物一次粒子分散液之步驟;(a) simultaneously adding an aqueous solution of a citrate and/or an acidic citric acid solution and an aqueous solution of an alkali-soluble inorganic compound to an aqueous alkali solution, or simultaneously adding a seed particle having a solid concentration of 0.01 to 2% by weight. In the dispersed aqueous alkali solution, a composite oxide having a molar ratio MO x /SiO 2 (A) in the range of 0.1 to 2 when cerium oxide is represented by SiO 2 and inorganic oxide other than cerium oxide is represented by MO x a step of primary particle dispersion;

(b)洗淨前述一次粒子分散液之步驟;(b) a step of washing the aforementioned primary particle dispersion;

(c)將洗淨後的一次粒子分散液,在電解質的存在下,於50~300℃進行水熱處理,以調製鏈狀複合氧化物粒子分散液之步驟;(c) a step of preparing a chain-like composite oxide particle dispersion by subjecting the washed primary particle dispersion to hydrothermal treatment at 50 to 300 ° C in the presence of an electrolyte;

(d)形成氧化矽或氧化矽‧氧化鋁被覆層,調製氧化矽或氧化矽‧氧化鋁被覆鏈狀複合氧化物粒子分散液之步驟;(d) forming a cerium oxide or cerium oxide ‧ alumina coating layer, and preparing a cerium oxide or cerium oxide ‧ alumina coating chain-like composite oxide particle dispersion;

(e)於氧化矽或氧化矽‧氧化鋁被覆鏈狀複合氧化物粒子分散液中添加酸,去除構成該複合氧化物粒子之矽以外的元素之至少一部分,而成為鏈狀氧化矽系中空微粒子分散液之步驟;(e) adding an acid to the dispersion of cerium oxide or cerium oxide ‧ alumina-coated chain-like composite oxide particles, and removing at least a part of elements other than ruthenium constituting the composite oxide particles to form chain cerium oxide-based hollow fine particles The step of dispersing the liquid;

(f)洗淨所得的分散液之步驟。(f) a step of washing the resulting dispersion.

步驟(a)Step (a)

作為矽酸鹽,較宜使用由鹼金屬矽酸鹽、銨矽酸鹽及有機鹼的矽酸鹽所選出的1種或2種以上之矽酸鹽。作為鹼金屬矽酸鹽,可舉出矽酸鈉(水玻璃)或矽酸鉀,作為有機鹼,可舉出四乙基銨鹽等的4級銨鹽、單乙醇胺、二乙醇胺、三乙醇胺等的胺類,於銨的矽酸鹽或有機鹼的矽酸鹽中,亦包含於矽酸液中加有4級銨氫氧化物、胺化合物等的鹼性溶液。As the citrate, one or two or more kinds of citrates selected from alkali metal silicates, ammonium citrates and organic acid silicates are preferably used. The alkali metal citrate may, for example, be sodium citrate (water glass) or potassium citrate. Examples of the organic base include a quaternary ammonium salt such as a tetraethylammonium salt, monoethanolamine, diethanolamine or triethanolamine. The amine is also contained in an ammonium citrate or an organic base citrate, and also contains an alkaline solution in which a quaternary ammonium hydroxide, an amine compound or the like is added to the citric acid solution.

作為酸性矽酸液,可使用藉由以陽離子交換樹脂處理、矽酸鹼水溶液等,去除鹼而得之矽酸液,特佳為pH2~pH4、SiO2 濃度約7重量%以下的酸性矽酸液。As the acidic citric acid solution, a citric acid solution obtained by removing a base by a cation exchange resin treatment or an aqueous citric acid solution can be used, and particularly preferably an acidic citric acid having a concentration of about 2 wt% or less and a concentration of SiO 2 of about 7% by weight or less. liquid.

作為無機氧化物,可舉出Al2 O3 、B2 O3 、TiO2 、ZrO2 、SnO2 、Ce2 O3 、P2 O5 、Sb2 O3 、MoO3 、ZnO2 、WO3 等的1種或2種以上。作為2種以上的無機氧化物,可例示TiO2 -Al2 O3 、TiO2 -ZrO2 等。Examples of the inorganic oxide include Al 2 O 3 , B 2 O 3 , TiO 2 , ZrO 2 , SnO 2 , Ce 2 O 3 , P 2 O 5 , Sb 2 O 3 , MoO 3 , ZnO 2 , and WO 3 . One or two or more types. Examples of the two or more kinds of inorganic oxides include TiO 2 -Al 2 O 3 and TiO 2 -ZrO 2 .

其中,較佳為Al2 O3 ,因為容易得到球狀的一次粒子,容易去除。Among them, Al 2 O 3 is preferred because spherical primary particles are easily obtained and are easily removed.

作為如此的無機氧化物之原料,較佳為使用鹼可溶的無機化合物,可舉出前述構成無機氧化物的金屬或非金屬之含氧酸的鹼金屬鹽或鹼土類金屬鹽、銨鹽、4級銨鹽,更具體地,鋁酸鈉、四硼酸鈉、碳酸氧鋯銨、銻酸鉀、錫酸鉀、鋁矽酸鈉、鉬酸鈉、硝酸鈰銨、磷酸鈉等係合適。As a raw material of such an inorganic oxide, an alkali-soluble inorganic compound is preferably used, and examples thereof include an alkali metal salt or an alkaline earth metal salt or an ammonium salt of a metal or a non-metal oxyacid which constitutes an inorganic oxide. A grade 4 ammonium salt, more specifically, sodium aluminate, sodium tetraborate, ammonium zirconium carbonate, potassium citrate, potassium stannate, sodium aluminosilicate, sodium molybdate, cerium ammonium nitrate, sodium phosphate or the like is suitable.

為了調製複合氧化物一次粒子分散液,可預先個別地調製前述無機化合物的鹼水溶液,或調製混合水溶液,將此水溶液按照目的之氧化矽與氧化矽以外的無機氧化物之複合比例,在鹼水溶液中,較佳為在pH10以上的鹼水溶液中邊攪拌邊徐徐添加。In order to prepare a composite oxide primary particle dispersion, an aqueous alkali solution of the inorganic compound may be prepared in advance, or a mixed aqueous solution may be prepared, and the aqueous solution may be used in an aqueous solution according to a composite ratio of a target cerium oxide to an inorganic oxide other than cerium oxide. Among them, it is preferably added in an aqueous alkali solution having a pH of 10 or more while stirring.

添加於鹼水溶液中的氧化矽原料與無機化合物原料之添加比例,以SiO2 表示氧化矽成分,以MOx 表示氧化矽以外的無機化合物時之莫耳比MOx /SiO2 為0.01~2,尤其以在0.1~1之範圍為佳。MOx /SiO2 若未達0.01,則最終所得之鏈狀氧化矽系中空微粒子的空洞容積係不充分大,另一方面,MOx /SiO2 若超過2,則得到球狀的複合氧化物一次粒子係困難,即使可以也會在去除矽以外的元素之際破壞球狀的複合氧化物微粒子,結果會得不到在內部具有空洞的鏈狀氧化矽系中空微粒。The ratio of addition of the cerium oxide raw material to the inorganic compound raw material added to the aqueous alkali solution is represented by SiO 2 as a cerium oxide component, and when MO x represents an inorganic compound other than cerium oxide, the molar ratio MO x /SiO 2 is 0.01 to 2, In particular, it is preferably in the range of 0.1 to 1. When MO x /SiO 2 is less than 0.01, the void volume of the chain cerium oxide-based hollow fine particles finally obtained is not sufficiently large. On the other hand, when MO x /SiO 2 exceeds 2, a spherical composite oxide is obtained. When the primary particle system is difficult, even if the spherical composite oxide fine particles are destroyed when the elements other than the crucible are removed, the chain-like cerium oxide-based hollow fine particles having voids inside can not be obtained.

莫耳比MOx /SiO2 若在0.01~2之範圍,則複合氧化物一次粒子的構造主要係成為矽與矽以外的元素經由氧而交互鍵結的構造。即,多生成在矽原子的4個結合手鍵結有氧原子,在此氧原子鍵結有氧化矽以外的元素之構造,於後述的步驟(e)中在去除矽以外的元素之際,不會破壞以鏈狀連結的複合氧化物一次粒子之形狀,而可去除元素M。When the molar ratio MO x /SiO 2 is in the range of 0.01 to 2, the structure of the composite oxide primary particles is mainly a structure in which elements other than cerium and lanthanum are alternately bonded via oxygen. In other words, a structure in which an oxygen atom is bonded to four bonding hands of a ruthenium atom, and an element other than ruthenium oxide is bonded to the oxygen atom is formed in the step (e) to be described later. The shape of the composite oxide primary particles linked in a chain shape is not destroyed, and the element M can be removed.

複合氧化物一次粒子的平均粒徑為5~280nm,更以在10~200nm之範圍為佳。The composite oxide primary particles have an average particle diameter of 5 to 280 nm, more preferably 10 to 200 nm.

複合氧化物一次粒子的平均粒徑未達5nm時,最終所得之鏈狀氧化矽系中空微粒子的外殼之比例變多,空洞容積的比例變不充分大,而若複合氧化物一次粒子的平均粒徑超過280nm,則在步驟(b)的鏈狀化係困難,在步驟(d)的矽以外之元素的去除變不充分,鏈狀氧化矽系中空微粒子的空洞容積不充分大,得到低折射率的粒子會變困難。When the average particle diameter of the primary particles of the composite oxide is less than 5 nm, the ratio of the outer shell of the chain-shaped cerium oxide-based hollow fine particles is increased, and the ratio of the void volume is not sufficiently large, and the average particle size of the composite oxide primary particles is large. When the diameter exceeds 280 nm, the chain formation in the step (b) is difficult, and the removal of elements other than the ruthenium in the step (d) is insufficient, and the void volume of the chain yttria-based hollow fine particles is not sufficiently large, resulting in low refraction. The rate of particles can become difficult.

於本發明的製造方法中,在調製複合氧化物一次粒子分散液之際,較佳為以種粒子的分散液當作起始原料。In the production method of the present invention, when the composite oxide primary particle dispersion is prepared, it is preferred to use a dispersion of seed particles as a starting material.

作為種粒子,使用SiO2 、Al2 O3 、TiO2 、ZrO2 、SnO2 及CeO2 等的無機氧化物或此等的複合氧化物,例如SiO2 -Al2 O3 、TiO2 -Al2 O3 、TiO2 -ZrO2 、SiO2 -TiO2 、SiO2 -TiO2 -Al2 O3 等的微粒子,通常較佳為使用此等的溶膠。如此的種粒子之分散液係可藉由習知的方法來調製。例如,可藉由在對應於上述無機氧化物之金屬鹽、金屬鹽的混合物或金屬烷氧化物等中添加酸或鹼而進行水解,視需要熟成而獲得。As the seed particles, an inorganic oxide such as SiO 2 , Al 2 O 3 , TiO 2 , ZrO 2 , SnO 2 or CeO 2 or a composite oxide such as SiO 2 -Al 2 O 3 or TiO 2 -Al is used. As the fine particles of 2 O 3 , TiO 2 -ZrO 2 , SiO 2 -TiO 2 , SiO 2 -TiO 2 -Al 2 O 3 or the like, it is usually preferred to use such a sol. Such a dispersion of seed particles can be prepared by a conventional method. For example, hydrolysis can be carried out by adding an acid or a base to a metal salt or a mixture of metal salts corresponding to the above inorganic oxide or a metal alkoxide, and if necessary, it can be obtained by aging.

於種粒子分散鹼水溶液中,較佳為在經調整亞pH10以上的種粒子分散鹼水溶液中,與在上述鹼水溶液中添加的方法同樣地,邊攪拌邊添加前述化合物的水溶液。如此地,若以種粒子當作種子而使複合氧化物微粒子成長,則成長粒子的粒徑控制係容易,可得到粒度一致者。添加於種粒子分散液中的氧化矽原料及無機氧化物之添加比例,係與在前述鹼水溶液中添加時相同的範圍。In the seed particle-dispersed aqueous alkali solution, it is preferred to add an aqueous solution of the above compound to the aqueous solution of the seed particles in which the adjusted sub-pH 10 or more is added, in the same manner as in the method of adding the aqueous alkali solution. As described above, when the composite oxide fine particles are grown by using the seed particles as seeds, the particle size control of the grown particles is easy, and the particle size can be obtained. The addition ratio of the cerium oxide raw material and the inorganic oxide added to the seed particle dispersion is the same as that in the case of adding the aqueous alkali solution.

上述氧化矽原料及無機氧化物原料係在鹼側具有高的溶解度。然而,若在此溶解度高的pH範圍中混合兩者,則矽酸離子及鋁酸離子等的含氧酸離子之溶解度降低,此等複合物析出而成長成膠體粒子,或析出在種粒子上而引起粒子成長。The above cerium oxide raw material and inorganic oxide raw material have high solubility on the alkali side. However, when the two are mixed in the pH range in which the solubility is high, the solubility of the oxo acid ions such as citric acid ions and aluminate ions is lowered, and the composites are precipitated to grow into colloidal particles or precipitated on the seed particles. And cause the particles to grow.

於本發明中,添加矽酸鹽的水溶液及/或酸性矽酸液與鹼可溶的無機化合物水溶液,直到複合氧化物一次粒子的平均粒徑(Dp1 )變成5~280nm為止,添加可為連續或斷續的,較佳為同時添加兩者。In the present invention, an aqueous solution of citrate and/or an aqueous solution of an acidic citric acid and an alkali-soluble inorganic compound are added until the average particle diameter (D p1 ) of the composite oxide primary particles is 5 to 280 nm, and the addition may be Continuous or intermittent, it is preferred to add both at the same time.

再者,此時的莫耳比MOx /SiO2 (A)雖然在0.01~2之範圍,但是亦可以此莫耳比變小的方式邊變更邊添加。In addition, although the molar ratio MO x /SiO 2 (A) at this time is in the range of 0.01 to 2, it may be added while changing the molar ratio.

於本發明的步驟(a)中,按照需要亦可在電解質鹽的存在下調製複合氧化物一次粒子。In the step (a) of the present invention, the composite oxide primary particles may be prepared in the presence of an electrolyte salt as needed.

此時,電解質鹽的莫耳數(MEa )與SiO2 的莫耳數(MSa )之比(MEa )/(MSa )可以0.1~10範圍添加,較佳以0.2~8之範圍的添加。At this time, the ratio (M Ea ) / (M Sa ) of the molar number (M Ea ) of the electrolyte salt to the molar number (M Sa ) of SiO 2 may be added in the range of 0.1 to 10, preferably in the range of 0.2 to 8. Added.

作為電解質鹽,可舉出氯化鈉、氯化鉀、硝酸鈉、硝酸鉀、硫酸鈉、硫酸鉀、硝酸銨、硫酸銨、氯化鎂、硝酸鎂等的水溶性電解質鹽。The electrolyte salt may, for example, be a water-soluble electrolyte salt such as sodium chloride, potassium chloride, sodium nitrate, potassium nitrate, sodium sulfate, potassium sulfate, ammonium nitrate, ammonium sulfate, magnesium chloride or magnesium nitrate.

使用電解質鹽時,較佳為在所得之複合氧化物一次粒子之平均粒徑的大約1/5~4/5的時間點進行添加,添加係可在此時間點全量添加,也可添加鹼金屬矽酸鹽或氧化矽以外的無機化合物,邊進行複合氧化物微粒子的粒子成長邊連續或斷續地添加。When an electrolyte salt is used, it is preferably added at a time point of about 1/5 to 4/5 of the average particle diameter of the obtained composite oxide primary particles, and the addition system may be added at this time point in total, or an alkali metal may be added. An inorganic compound other than ceric acid or cerium oxide is continuously or intermittently added while growing particles of the composite oxide fine particles.

電解質鹽的添加量,雖然取決於複合氧化物一次粒子分散液的濃度,但是當前述莫耳比(MEa )/(MSa )未達0.1時,添加電解質鹽的效果係變不充分,在步驟(e)中添加酸以去除構成複合氧化物一次粒子的矽以外之元素的至少一部分之際,無法維持複合氧化物微粒子而破壞,得到在內部具有空洞的鏈狀氧化矽系中空微粒子係變困難。關於添加如此電解質鹽的效果,其理由雖然未明確,但是認為於經粒子成長的複合氧化物一次粒子之表面上氧化矽變多,酸不溶性的氧化矽係具有複合氧化物一次粒子的保護膜之作用。Although the addition amount of the electrolyte salt depends on the concentration of the composite oxide primary particle dispersion, when the aforementioned molar ratio (M Ea ) / (M Sa ) is less than 0.1, the effect of adding the electrolyte salt is insufficient. When the acid is added to the step (e) to remove at least a part of the elements other than the ruthenium constituting the primary particles of the composite oxide, the composite oxide fine particles cannot be maintained and destroyed, and the chain oxidized yttrium-based hollow fine particles having voids therein are obtained. difficult. Although the reason for the addition of such an electrolyte salt is not clear, it is considered that the cerium oxide on the surface of the composite oxide primary particles grown by the particles is increased, and the acid-insoluble cerium oxide-based protective film of the composite oxide primary particles is used. effect.

因此,雖然於後述的步驟(d)中形成氧化矽或氧化矽‧氧化鋁被覆層,但是亦可減薄所形成的氧化矽或氧化矽‧氧化鋁被覆層。Therefore, although a ruthenium oxide or ruthenium oxide ‧ alumina coating layer is formed in the step (d) described later, the formed ruthenium oxide or ruthenium oxide ‧ alumina coating layer may be thinned.

即使前述莫耳比(MEa )/(MSa )超過10,添加前述電解質的效果也不會升高,而生成新的微粒子,或經濟性降低。Even if the aforementioned molar ratio (M Ea )/(M Sa ) exceeds 10, the effect of adding the aforementioned electrolyte does not increase, and new fine particles are generated, or the economy is lowered.

步驟(b)Step (b)

步驟(a)所調製的複合氧化物一次粒子分散液,係接著進行洗淨而去除陽離子、陰離子、電解質。The composite oxide primary particle dispersion prepared in the step (a) is subsequently washed to remove cations, anions, and electrolytes.

作為洗淨方法,只要可去除陽離子、陰離子、電解質,則沒有特別的限制,可採用習知的方法。於本發明中,由於粒子為微粒,故合適地採用超濾膜法、離子交換樹脂法。也可併用兩者。The washing method is not particularly limited as long as the cation, the anion, and the electrolyte can be removed, and a conventional method can be employed. In the present invention, since the particles are fine particles, an ultrafiltration membrane method or an ion exchange resin method is suitably employed. You can also use both.

若洗淨不充分,則在下一步驟(c)中難以得到鏈狀複合氧化物一次粒子。If the washing is insufficient, it is difficult to obtain the chain-like composite oxide primary particles in the next step (c).

步驟(c)Step (c)

於複合氧化物一次粒子分散液中添加電解質,在電解質存在下,於50~300℃、更於80~250℃進行水熱處理,以調製鏈狀複合氧化物粒子分散液。An electrolyte is added to the composite oxide primary particle dispersion, and hydrothermal treatment is carried out at 50 to 300 ° C and more at 80 to 250 ° C in the presence of an electrolyte to prepare a chain-like composite oxide particle dispersion.

作為電解質,只要可將複合氧化物一次粒子鏈狀化,則沒有特別的限制,但於本發明中,較佳為鹼土類金屬鹽。The electrolyte is not particularly limited as long as the composite oxide primary particles are chained, but in the present invention, an alkaline earth metal salt is preferred.

作為鹼土類金屬鹽,可舉出鎂、鈣等的鹽酸鹽、硝酸鹽、硫酸鹽、有機酸鹽等。The alkaline earth metal salt may, for example, be a hydrochloride, a nitrate, a sulfate or an organic acid salt such as magnesium or calcium.

於添加電解質之際的複合氧化物一次粒子分散液之濃度,以固體成分計,為0.1~20重量%,更以在0.5~10重量%之範圍為佳。The concentration of the composite oxide primary particle dispersion at the time of adding the electrolyte is preferably 0.1 to 20% by weight, more preferably 0.5 to 10% by weight, based on the solid content.

當複合氧化物一次粒子分散液的濃度以固體成分計未達0.1重量%時,雖然能進行鏈狀化,但是生產性低,而若複合氧化物一次粒子分散液的濃度以固體成分計超過20重量%,則粒子會成為凝聚體。When the concentration of the composite oxide primary particle dispersion is less than 0.1% by weight in terms of solid content, although chaining can be performed, productivity is low, and if the concentration of the composite oxide primary particle dispersion exceeds 20 in terms of solid content At % by weight, the particles become aggregates.

又,電解質的添加量,係以分散液中的複合氧化物一次粒子的重量(WP1 )與電解質的重量(WEL )之比(WEL )/(WP1 )為0.001~0.8,更以在0.01~0.2之範圍為佳。Further, the addition amount of the electrolyte, to the dispersion-based composite oxide particles by weight of a (W P1) and the weight of the electrolyte (W EL) The ratio of (W EL) / (W P1 ) is 0.001 to 0.8, more in It is preferably in the range of 0.01 to 0.2.

當(WEL )/(WP1 )未達0.001時,複合氧化物一次粒子會不進行鏈狀化,而(WEL )/(WP1 )若超過0.8,則複合氧化物的一次粒子會成為凝聚體。When (W EL )/(W P1 ) is less than 0.001, the composite oxide primary particles are not chained, and if (W EL )/(W P1 ) exceeds 0.8, the primary particles of the composite oxide become Condensed body.

於本發明中,除了電解質,亦可添加酸性矽酸液。酸性矽酸液係與後述步驟(d-2)所用的酸性矽酸液同樣的酸性矽酸液,酸性矽酸液的添加量係以分散液中的複合氧化物一次粒子之重量(WP1 )與酸性矽酸液的SiO2 之重量(WS )的比(WS )/(WP1 )在0.01~1,更以在0.02~0.5之範圍為佳。In the present invention, an acidic citric acid solution may be added in addition to the electrolyte. The acidic citric acid liquid is the same acidic citric acid liquid as the acidic citric acid liquid used in the step (d-2) described later, and the acidic citric acid liquid is added in the weight of the composite oxide primary particles in the dispersion (W P1 ) The ratio (W S )/(W P1 ) to the weight (W S ) of the SiO 2 of the acidic citric acid solution is preferably 0.01 to 1, more preferably 0.02 to 0.5.

當(WS )/(WP1 )未達0.01時,雖然取決於複合氧化物一次粒子的粒徑而亦不同,但是會促進鏈狀化,或無法維持已鏈狀化的複合氧化物一次粒子之鏈狀,而若(WS )/(WP1 )超過1,則在後述步驟(e)中矽以外的元素之去除會變困難,即使可去除也會無法形成鏈狀粒子內部的空洞互相貫通的貫通孔。When (W S )/(W P1 ) is less than 0.01, although it depends on the particle diameter of the composite oxide primary particles, it promotes chaining or fails to maintain the chained composite oxide primary particles. In the chain shape, if (W S )/(W P1 ) exceeds 1, the removal of elements other than ruthenium in step (e) described later becomes difficult, and even if it is removable, voids inside the chain-like particles cannot be formed. Through-holes that pass through.

當水熱處理溫度未達50℃時,鏈狀化係不進行,單分散的複合氧化物一次粒子大量殘存,而若水熱處理溫度超過300℃,則凝聚粒子有增大的傾向。When the hydrothermal treatment temperature is less than 50 ° C, the chain-forming system does not proceed, and the monodisperse composite oxide primary particles remain in a large amount, and when the hydrothermal treatment temperature exceeds 300 ° C, the aggregated particles tend to increase.

再者,水熱處理時間雖然取決於溫度而亦不同,但是大約1~24小時。Further, although the hydrothermal treatment time varies depending on the temperature, it is about 1 to 24 hours.

步驟(d)Step (d)

接著,形成氧化矽或氧化矽‧氧化鋁被覆層。Next, a ruthenium oxide or ruthenium oxide ‧ alumina coating layer is formed.

為了形成氧化矽或氧化矽‧氧化鋁被覆層,有3個方法。第1方法係步驟(d-1),為在前述步驟(c)所得之鏈狀複合氧化物粒子分散液中,添加鹼水溶液與以下述化學式(1)所示的有機矽化合物及/或其部分水解物之方法。In order to form a ruthenium oxide or ruthenium oxide ‧ alumina coating layer, there are three methods. The first method is the step (d-1), in which the alkali aqueous solution and the organic hydrazine compound represented by the following chemical formula (1) are added to the chain-like composite oxide particle dispersion obtained in the above step (c) and/or Partially hydrolyzed method.

Rn SiX(4-n)  ‧‧‧(1)R n SiX (4-n) ‧‧‧(1)

[惟,R:碳數1~10之非取代或取代烴基、丙烯醯基、環氧基、甲基丙烯醯基、胺基、CF2 基;X:碳數1~4之烷氧基、矽烷醇基、鹵素或氫;n:0~3的整數]。[R, R: an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, an alkylene group, an epoxy group, a methacryl group, an amine group, a CF 2 group; X: an alkoxy group having 1 to 4 carbon atoms; a stanol group, a halogen or a hydrogen; n: an integer of 0 to 3].

作為該有機矽化合物,具體地可舉出四甲氧基矽烷、四乙氧基矽烷、四異丙氧基矽烷、甲基三甲氧基矽烷、二甲基二甲氧基矽烷、苯基三甲氧基矽烷、二苯基二甲氧基矽烷、甲基三乙氧基矽烷、二甲基二乙氧基矽烷、苯基三乙氧基矽烷、二苯基二乙氧基矽烷、異丁基三甲氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三(β-甲氧基乙氧基)矽烷、3,3,3-三氟丙基三甲氧基矽烷、甲基-3,3,3-三氟丙基二甲氧基矽烷、β-(3,4-環氧基環己基)乙基三甲氧基矽烷、γ-環氧丙氧基三丙基三甲氧基矽烷、γ-環氧丙氧基丙基甲基二乙氧基矽烷、γ-環氧丙氧基丙基三乙氧基矽烷、γ-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、γ-甲基丙烯醯氧基丙基三甲氧基矽烷、γ-甲基丙烯醯氧基丙基甲基二乙氧基矽烷、γ-甲基丙烯醯氧基丙基三乙氧基矽烷、N-β(胺乙基)γ-胺丙基甲基二甲氧基矽烷、N-β(胺乙基)γ-胺丙基三甲氧基矽烷、N-β(胺乙基)γ-胺丙基三乙氧基矽烷、γ-胺丙基三甲氧基矽烷、γ-胺丙基三乙氧基矽烷、N-苯基-γ-胺丙基三甲氧基矽烷、γ-巰基丙基三甲氧基矽烷、三甲基矽烷醇、甲基三氯矽烷、甲基二氯矽烷、二甲基二氯矽烷、三甲基氯矽烷、苯基三氯矽烷、二苯基二氯矽烷、乙烯基三氯矽烷、三甲基溴矽烷、二乙基矽烷等。Specific examples of the organic ruthenium compound include tetramethoxy decane, tetraethoxy decane, tetraisopropoxy decane, methyl trimethoxy decane, dimethyl dimethoxy decane, and phenyl trimethoxy. Base decane, diphenyl dimethoxy decane, methyl triethoxy decane, dimethyl diethoxy decane, phenyl triethoxy decane, diphenyl diethoxy decane, isobutyl trimethyl Oxydecane, vinyltrimethoxydecane, vinyltriethoxydecane, vinyltris(β-methoxyethoxy)decane, 3,3,3-trifluoropropyltrimethoxydecane, A 3-,3,3-trifluoropropyldimethoxydecane, β-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, γ-glycidoxytripropyltrimethoxy Baseline, γ-glycidoxypropylmethyldiethoxydecane, γ-glycidoxypropyltriethoxydecane, γ-methylpropenyloxypropylmethyldimethoxy Baseline, γ-methacryloxypropyltrimethoxydecane, γ-methylpropenyloxypropylmethyldiethoxydecane, γ-methylpropenyloxypropyltriethoxy Decane, N-β (aminoethyl) γ-amine C Methyldimethoxydecane, N-β (aminoethyl) γ-aminopropyltrimethoxydecane, N-β (aminoethyl) γ-aminopropyltriethoxydecane, γ-aminopropyl Trimethoxydecane, γ-aminopropyltriethoxydecane, N-phenyl-γ-aminopropyltrimethoxydecane, γ-mercaptopropyltrimethoxydecane, trimethylstanol, methyl three Chlorodecane, methyldichlorodecane, dimethyldichlorodecane, trimethylchlorodecane, phenyltrichlorodecane, diphenyldichlorodecane, vinyltrichlorodecane, trimethylbromodecane, diethyl Decane and so on.

第2方法係步驟(d-2),為於前述步驟(c)所得之鏈狀複合氧化物粒子分散液中添加鹼水溶液與酸性矽酸液之方法。The second method is the step (d-2), which is a method of adding an aqueous alkali solution and an acidic citric acid solution to the chain-like composite oxide particle dispersion obtained in the above step (c).

作為酸性矽酸液,使用矽酸鹼水溶液,例如以離子交換樹脂將水玻璃脫鹼後的酸性矽酸液。如此的酸性矽酸液係濃度以SiO2 計為0.1~7重量%,pH在0.1~4之範圍。As the acidic citric acid solution, an aqueous citric acid solution is used, for example, an acidic citric acid solution obtained by dehydrating water glass with an ion exchange resin. The concentration of the acidic citric acid solution is 0.1 to 7% by weight in terms of SiO 2 and the pH is in the range of 0.1 to 4.

第3方法係步驟(d-3),為於前述步驟(c)所得之鏈狀複合氧化物粒子分散液中添加矽酸鹼水溶液與鋁酸水溶液之方法。The third method is the step (d-3), which is a method of adding an aqueous citric acid solution and an aqueous solution of an aluminate to the chain-like composite oxide particle dispersion obtained in the above step (c).

於上述中,氧化矽被覆層之形成時所用的有機矽化合物或酸性矽酸液之添加量,以固體成分計係鏈狀複合氧化物粒子的10~2000重量%,尤其在20~1000重量%之範圍。In the above, the amount of the organic cerium compound or the acidic citric acid liquid used for forming the cerium oxide coating layer is 10 to 2000% by weight, particularly 20 to 1000% by weight, based on the solid content. The scope.

有機矽化合物或酸性矽酸液之添加量,以固體成分計未達鏈狀複合氧化物粒子的10重量%時,由於被覆層薄,在步驟(e)中,於去除矽以外的元素之際,鏈狀化的粒子會崩壞,而成為在外部具有開放的空洞之鏈狀氧化矽系中空微粒子。When the amount of the organic cerium compound or the acidic citric acid solution is less than 10% by weight of the chain-like composite oxide particles, the coating layer is thin, and in step (e), when elements other than cerium are removed The chain-like particles collapse and become chain-shaped yttria-based hollow fine particles having open pores on the outside.

有機矽化合物或酸性矽酸液之添加量以固體成分計若超過鏈狀複合氧化物粒子的2000重量%,則矽以外的元素之去除變困難,或由於外殼過厚,而得不到所欲低折射率的鏈狀氧化矽系中空微粒子。When the amount of the organic cerium compound or the acidic citric acid solution exceeds 2000% by weight of the chain-like composite oxide particles, the removal of elements other than cerium is difficult, or the outer shell is too thick, and the desired amount is not obtained. Low refractive index chain yttrium oxide hollow fine particles.

又,鹼水溶液的添加較佳為使鏈狀複合氧化物粒子分散液的pH維持在7~13.5,尤其以維持在10~13為佳。當鏈狀複合氧化物粒子分散液的pH未達7時,鏈狀複合氧化物粒子會凝聚,均一的被覆層之形成、粒子成長係不能。Further, the addition of the aqueous alkali solution is preferably such that the pH of the chain-like composite oxide particle dispersion is maintained at 7 to 13.5, particularly preferably at 10 to 13. When the pH of the chain-like composite oxide particle dispersion is less than 7, the chain-like composite oxide particles are aggregated, and the formation of a uniform coating layer and particle growth are not possible.

鏈狀複合氧化物粒子分散液的pH若超過13.5,由於氧化矽、氧化鋁的溶解性高,故氧化矽層、氧化矽‧氧化鋁層的形成、粒子成長變困難,而得不到所欲的鏈狀氧化矽系中空微粒子。When the pH of the chain-like composite oxide particle dispersion exceeds 13.5, since the solubility of cerium oxide and aluminum oxide is high, formation of a cerium oxide layer, a cerium oxide layer, an alumina layer, and particle growth become difficult, and it is difficult to obtain The chain of cerium oxide is hollow microparticles.

又,於步驟(d-3)中,在氧化矽‧氧化鋁被覆層的形成中添加矽酸鹼水溶液與鋁酸水溶液時,莫耳比Al2 O3 /SiO2 為0.01~0.5,更以在0.05~0.3之範圍為佳。Further, in the step (d-3), when an aqueous citric acid solution and an aqueous solution of aluminate are added to the formation of the yttrium oxide-alumina coating layer, the molar ratio of Al 2 O 3 /SiO 2 is 0.01 to 0.5, more It is preferably in the range of 0.05 to 0.3.

當莫耳比Al2 O3 /SiO2 未達0.01時,與前述形成氧化矽層者沒有不同,由於氧化矽‧氧化鋁被覆層的形成而使得矽以外的元素之去除容易性降低。When the molar ratio of Al 2 O 3 /SiO 2 is less than 0.01, there is no difference from the formation of the ruthenium oxide layer as described above, and the ease of removal of elements other than ruthenium is lowered due to the formation of the ruthenium oxide ‧ alumina coating layer.

莫耳比Al2 O3 /SiO2 若超過0.5,則由於被覆層中的氧化鋁過多,在步驟(e)中去除矽以外的元素之際,無法維持被覆層,而會成為在外部具有開放的空洞之鏈狀氧化矽系中空微粒子。When the molar ratio of Al 2 O 3 /SiO 2 exceeds 0.5, the amount of alumina in the coating layer is too large, and when the element other than cerium is removed in the step (e), the coating layer cannot be maintained, and the coating layer is opened. The hollow chain of yttrium oxide hollow fine particles.

於氧化矽‧氧化鋁被覆層的形成中添加矽酸鹼水溶液與鋁酸水溶液時的添加量,以氧化矽‧氧化鋁固體成分計為鏈狀複合氧化物粒子的10~2000重量%,更以在20~1000重量%之範圍為佳。The amount of addition of the aqueous ceric acid solution and the aqueous aluminate solution to the formation of the cerium oxide/alumina coating layer is 10 to 2000% by weight based on the solid content of the cerium oxide and the alumina, and more preferably It is preferably in the range of 20 to 1000% by weight.

矽酸鹼水溶液與鋁酸水溶液的添加量以固體成分計未達鏈狀複合氧化物粒子的10重量%時,由於被覆層薄,在步驟(e)中,於去除矽以外的元素之際,鏈狀化的粒子會崩壞,而成為在外部具有開放的空洞之鏈狀氧化矽系中空微粒子。When the amount of the aqueous solution of the citric acid and the aqueous solution of the aluminate is less than 10% by weight of the chain-like composite oxide particles, the coating layer is thin, and in the step (e), when the element other than ruthenium is removed, The chain-like particles collapse and become chain-shaped yttria-based hollow fine particles having open pores on the outside.

矽酸鹼水溶液與鋁酸水溶液的添加量以固體成分計若超過鏈狀複合氧化物粒子的2000重量%,則矽以外的元素之去除變困難,或由於外殼過厚,而得不到所欲低折射率的鏈狀氧化矽系中空微粒子。When the amount of the aqueous solution of the citric acid and the aqueous solution of the aluminate exceeds 2000% by weight of the chain-like composite oxide particles, the removal of elements other than ruthenium is difficult, or the outer shell is too thick to be obtained. Low refractive index chain yttrium oxide hollow fine particles.

於形成氧化矽層、氧化矽‧氧化鋁層之際,鏈狀複合氧化物粒子分散液的濃度以固體成分計為0.5~20重量%,更以在1~10重量%之範圍為佳。When the cerium oxide layer or the cerium oxide layer is formed, the concentration of the chain-like composite oxide particle dispersion is preferably from 0.5 to 20% by weight, more preferably from 1 to 10% by weight, based on the solid content.

鏈狀複合氧化物粒子分散液的濃度以固體成分計未達0.5重量%時,則生產性降,而若超過20重量%,則粒子會成為凝聚體。When the concentration of the chain-like composite oxide particle dispersion is less than 0.5% by weight in terms of solid content, the productivity is lowered, and when it exceeds 20% by weight, the particles become aggregates.

於形成氧化矽或氧化矽‧氧化鋁被覆層之際,溫度通常為30~150℃,更以在50~100℃之範圍為佳。When the cerium oxide or cerium oxide ‧ alumina coating layer is formed, the temperature is usually from 30 to 150 ° C, more preferably from 50 to 100 ° C.

於形成氧化矽或氧化矽‧氧化鋁被覆層之際,當溫度未達30℃時,為了形成氧化矽‧氧化鋁被覆層,需要長時間,或會無法形成所欲厚度的被覆層。When a ruthenium oxide or ruthenium oxide/alumina coating layer is formed, when the temperature is less than 30 ° C, it takes a long time to form a coating layer having a desired thickness in order to form a ruthenium oxide/alumina coating layer.

於形成氧化矽或氧化矽‧氧化鋁被覆層之際,溫度若超過150℃,雖然隨著濃度而不同,但是鏈狀複合氧化物粒子會凝聚。When the cerium oxide or the cerium oxide/alumina coating layer is formed, if the temperature exceeds 150 ° C, the chain-like composite oxide particles aggregate due to the difference in concentration.

步驟(e)Step (e)

於氧化矽或氧化矽‧氧化鋁被覆複合氧化物粒子分散液中添加酸,以去除構成氧化矽或氧化矽‧氧化鋁被覆複合氧化物粒子之矽以外的元素之至少一部分,而成為鏈狀氧化矽系中空微粒子分散液。An acid is added to the cerium oxide or cerium oxide ‧ alumina-coated composite oxide particle dispersion to remove at least a part of elements other than cerium oxide constituting cerium oxide or cerium oxide ‧ alumina-coated composite oxide particles, thereby forming chain oxidation Tantalum hollow microparticle dispersion.

於去除矽以外的元素之際,例如藉由添加礦酸或有機酸來溶解去除,或使與陽離子交換樹脂接觸而離子交換去除,或藉由組合此等方法來去除。When removing elements other than cerium, for example, by adding a mineral acid or an organic acid to dissolve and remove, or contacting the cation exchange resin to remove ion exchange, or by combining these methods.

於去除矽以外的元素之際,氧化矽或氧化矽‧氧化鋁被覆複合氧化物粒子分散液中的氧化矽或氧化矽‧氧化鋁被覆複合氧化物粒子之濃度雖然隨著處理溫度而亦不同,但是換算成氧化物較佳在0.1~50重量%,尤其在0.5~25重量%之範圍。當氧化矽被覆複合氧化物粒子的濃度未達0.1重量%時,生產效率低,若超過50重量%,則在矽以外的元素之含量多的複合氧化物粒子中,會無法均一地或有效率地以少的次數來去除。When the element other than cerium is removed, the concentration of cerium oxide or cerium oxide/alumina-coated composite oxide particles in the cerium oxide or cerium oxide-alumina-coated composite oxide particle dispersion is different depending on the treatment temperature. However, it is preferably converted into an oxide in an amount of from 0.1 to 50% by weight, particularly preferably from 0.5 to 25% by weight. When the concentration of the cerium oxide-coated composite oxide particles is less than 0.1% by weight, the production efficiency is low, and if it exceeds 50% by weight, the composite oxide particles having a large content of elements other than cerium may not be uniform or efficient. The ground is removed in a small number of times.

上述元素的去除,基於前述理由較佳為進行直到所得之鏈狀氧化矽系中空微粒子的MOx /SiO2 成為0.0001~0.2為止,尤其成為0.0001~0.1為止。The removal of the above-mentioned elements is preferably carried out until the MO x /SiO 2 of the obtained chain yttria-based hollow fine particles is from 0.0001 to 0.2, particularly from 0.0001 to 0.1.

步驟(f)Step (f)

步驟(e)所得之鏈狀氧化矽系中空微粒子分散液,主要由於酸、矽以外的元素之陽離子及已溶解的氧化矽存在,故將此等洗淨而去除。The chain-like cerium oxide-based hollow fine particle dispersion obtained in the step (e) is mainly removed by the cation of an element other than an acid or hydrazine and the dissolved cerium oxide.

作為洗淨方法,係與步驟(b)同樣。洗淨程度較佳為進行直到酸、矽以外的元素之陽離子及已溶解的氧化矽係實質上變成沒有為止。The washing method is the same as in the step (b). The degree of washing is preferably such that the cation of the element other than the acid or hydrazine and the dissolved cerium oxide are substantially not formed.

步驟(g)Step (g)

對鏈狀氧化矽系中空微粒子分散液,以50~300℃,更佳為以80~250℃,進行水熱處理。The chain cerium oxide-based hollow fine particle dispersion is hydrothermally treated at 50 to 300 ° C, more preferably at 80 to 250 ° C.

於本發明中,可照原樣地使用步驟(f)所得之鏈狀氧化矽系中空微粒子,較佳為對於前述步驟(f)進行水熱處理。In the present invention, the chain cerium oxide-based hollow fine particles obtained in the step (f) can be used as it is, and it is preferred to carry out the hydrothermal treatment on the above step (f).

當水熱處理溫度未達50℃時,所得之鏈狀氧化矽系中空微粒子的外殼之緻密化變不充分,取決於鏈狀氧化矽系中空微粒子的用法,溶劑或透明被膜形成用的基質形成成分會進入空洞內,而得不到低折射率的效果。又,無法有效地減低所得之鏈狀氧化矽系中空微粒子中的鹼金屬或氨等的雜質含量,被膜形成用塗佈液的安定性變不充分,因此所得之被膜的強度會變不充分。When the hydrothermal treatment temperature is less than 50 ° C, the densification of the outer shell of the obtained chain-like cerium oxide-based hollow fine particles becomes insufficient, and depending on the usage of the chain-like cerium oxide-based hollow fine particles, the solvent or the substrate for forming a transparent film is formed. Will enter the cavity, and the effect of low refractive index is not obtained. In addition, the content of impurities such as an alkali metal or ammonia in the chain-like cerium oxide-based hollow fine particles obtained is not effectively reduced, and the stability of the coating liquid for forming a film is insufficient, so that the strength of the obtained film is insufficient.

若水熱處理溫度超過300℃,則會成為鏈狀氧化矽系中空微粒子的凝聚體。When the hydrothermal treatment temperature exceeds 300 ° C, it becomes an aggregate of chain cerium oxide-based hollow fine particles.

水熱處理後,視需要可與前述步驟(b)同樣地進行洗淨。After the hydrothermal treatment, if necessary, it can be washed in the same manner as in the above step (b).

藉由洗淨,可進一步減低由於水熱處理所溶出的鹼及/或氨。By washing, the alkali and/or ammonia dissolved by the hydrothermal treatment can be further reduced.

再者,於本發明的鏈狀氧化矽系中空微粒子之製造方法中,藉由對所得之鏈狀氧化矽系中空微粒子分散液,使用超濾膜、旋轉式蒸發器等,以有機溶劑進行置換,而可得到有機溶劑分散溶膠。Furthermore, in the method for producing a chain-shaped cerium oxide-based hollow fine particle of the present invention, the obtained chain-like cerium oxide-based hollow fine particle dispersion is replaced with an organic solvent using an ultrafiltration membrane, a rotary evaporator or the like. An organic solvent dispersion sol is obtained.

又,所得之鏈狀氧化矽系中空微粒子,亦可藉由習知的方法,以矽烷偶合劑等來處理而使用。Further, the obtained chain cerium oxide-based hollow fine particles can be used by treatment with a decane coupling agent or the like by a conventional method.

再者,於本發明的鏈狀氧化矽系中空微粒子之製造方法中,在洗淨後,進行乾燥,視需要可進行煅燒。Further, in the method for producing a chain cerium oxide-based hollow fine particle of the present invention, after washing, drying is carried out, and if necessary, calcination is possible.

[透明被膜形成用塗佈液][Coating liquid for forming a transparent film]

接著,說明透明被膜形成用塗佈液。Next, the coating liquid for forming a transparent film will be described.

本發明的透明被膜形成用塗佈液係含有前述鏈狀氧化矽系中空微粒子與基質形成成分。The coating liquid for forming a transparent film of the present invention contains the chain-like cerium oxide-based hollow fine particles and a matrix-forming component.

分散介質Dispersing medium

作為塗佈液的分散介質,可以使用習知的分散介質,具體地可舉出水、各種有機溶劑。As the dispersion medium of the coating liquid, a conventional dispersion medium can be used, and specific examples thereof include water and various organic solvents.

作為用於本發明的有機溶劑,只要可溶解或分散後述的基質形成成分、視需要使用的聚合引發劑,同時可均勻分散前述鏈狀氧化矽系中空微粒子,則沒有特別的限制,可使用習知的分散介質。The organic solvent to be used in the present invention is not particularly limited as long as it can dissolve or disperse a matrix-forming component to be described later, a polymerization initiator to be used as needed, and uniformly disperse the chain-like cerium oxide-based hollow fine particles. Known dispersion medium.

具體地,可舉出甲醇、乙醇、丙醇、2-丙醇(IPA)、丁醇、二丙酮醇、糠醇、四氫糠醇、乙二醇、己二醇、異丙二醇等醇類;醋酸甲酯、醋酸乙酯、醋酸丁酯等的酯類;二乙醚、乙二醇單甲基醚、乙二醇單乙基醚、乙二醇單丁基醚、乙二醇異丙基醚、二乙二醇單甲基醚、二乙二醇單乙基醚、丙二醇單甲基醚、丙二醇單乙基醚等的醚類;丙酮、甲基乙基酮、甲基異丁基酮、丁基甲基酮、環己酮、甲基環己酮、二丙基酮、甲基戊基酮、二異丁基酮、異佛爾酮、乙醯丙酮、乙醯乙酸酯等酮類、甲苯、二甲苯等。此等可單獨使用,也可混合2種以上來使用。Specific examples thereof include alcohols such as methanol, ethanol, propanol, 2-propanol (IPA), butanol, diacetone alcohol, decyl alcohol, tetrahydrofurfuryl alcohol, ethylene glycol, hexanediol, and isopropyl glycol; Esters of esters, ethyl acetate, butyl acetate, etc.; diethyl ether, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, ethylene glycol isopropyl ether, two Ethers such as ethylene glycol monomethyl ether, diethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether; acetone, methyl ethyl ketone, methyl isobutyl ketone, butyl methyl Ketones such as ketone, cyclohexanone, methylcyclohexanone, dipropyl ketone, methyl amyl ketone, diisobutyl ketone, isophorone, acetoacetone, acetamidine acetate, toluene, Toluene, etc. These may be used alone or in combination of two or more.

聚合引發劑Polymerization initiator

於本發明的塗佈液中,連同鏈狀氧化矽系中空微粒子、基質形成成分,亦可含有聚合引發劑。作為聚合引發劑,沒有特別的限制而可使用眾所周知者,例如可舉出雙(2,4,6-三甲基苯甲醯基)苯基膦氧化物、雙(2,6-二甲氧基苯甲醯基)2,4,4-三甲基-戊基膦氧化物、2-羥基-甲基-2-甲基-苯基-丙烷-1-酮、2,2-二甲氧基-1,2-二苯基乙烷-1-酮、1-羥基-環己基-苯基-酮、2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基丙烷-1-酮等。In the coating liquid of the present invention, a chain-forming cerium oxide-based hollow fine particle or a matrix-forming component may further contain a polymerization initiator. The polymerization initiator is not particularly limited and may be used. For example, bis(2,4,6-trimethylbenzylidene)phenylphosphine oxide and bis(2,6-dimethoxy) may be mentioned. Benzomethane) 2,4,4-trimethyl-pentylphosphine oxide, 2-hydroxy-methyl-2-methyl-phenyl-propan-1-one, 2,2-dimethoxy Base-1,2-diphenylethane-1-one, 1-hydroxy-cyclohexyl-phenyl-one, 2-methyl-1-[4-(methylthio)phenyl]-2-? Orolinylpropan-1-one and the like.

鏈狀氧化矽系中空微粒子Chain oxidized cerium hollow microparticles

作為鏈狀氧化矽系中空微粒子,使用前述鏈狀氧化矽系中空微粒子。As the chain-shaped cerium oxide-based hollow fine particles, the above-mentioned chain-shaped cerium oxide-based hollow fine particles are used.

於本發明的塗佈液中,視需要亦可含有鏈狀氧化矽系中空微粒子以外的無機氧化物微粒子。In the coating liquid of the present invention, inorganic oxide fine particles other than the chain-shaped cerium oxide-based hollow fine particles may be contained as needed.

作為無機氧化物微粒子,可舉出習知的低折射率無機氧化物微粒子、高折射率無機氧化物微粒子、導電性無機氧化物微粒子等。Examples of the inorganic oxide fine particles include conventional low refractive index inorganic oxide fine particles, high refractive index inorganic oxide fine particles, and conductive inorganic oxide fine particles.

基質形成成分係前述微粒子的分散體,指可在基材的表面上形成被膜的成分,可由與基材的密接性或硬度、塗佈性等之條件中合適的樹脂等中選擇使用,例如可舉出以往所用的聚酯樹脂、丙烯酸樹脂、胺甲酸乙酯樹脂、氯乙烯樹脂、環氧樹脂、蜜胺樹脂、氟樹脂、矽樹脂、縮丁醛樹脂、酚樹脂、醋酸乙烯酯樹脂、紫外線硬化樹脂、電子線硬化樹脂、乳化樹脂、水溶性樹脂、親水性樹脂、此等樹脂的混合物、以及此等樹脂的共聚物或改性體等的塗料用樹脂、或前述烷氧基矽烷等的水解性有機矽化合物及此等的部分水解物等。The matrix-forming component is a dispersion of the fine particles, and means a component which can form a film on the surface of the substrate, and can be selected from resins suitable for the adhesion to the substrate, hardness, and coatability, and the like, for example, The polyester resin, acrylic resin, urethane resin, vinyl chloride resin, epoxy resin, melamine resin, fluororesin, enamel resin, butyral resin, phenol resin, vinyl acetate resin, ultraviolet light used in the past are mentioned. a curing resin, an electron ray-curing resin, an emulsified resin, a water-soluble resin, a hydrophilic resin, a mixture of such resins, a coating resin such as a copolymer or a modified body of the resin, or a alkoxy decane or the like Hydrolyzable organic hydrazine compound, such partial hydrolyzate, and the like.

透明被膜形成用塗佈液的基質形成成分與鏈狀氧化矽系中空微粒子之合計濃度以固體成分計為1~60重量%,更佳在2~50重量%之範圍。The total concentration of the matrix-forming component and the chain-like cerium oxide-based hollow fine particles of the coating liquid for forming a transparent film is 1 to 60% by weight, and more preferably 2 to 50% by weight, based on the solid content.

當透明被膜形成用塗佈液的固體成分濃度未達1重量%時,一次塗佈會得不到所必要的膜厚,因此若重複塗佈、乾燥,則密接性等變不充分,或經濟性不利。When the solid content concentration of the coating liquid for forming a transparent film is less than 1% by weight, the film thickness required for the primary coating is not obtained. Therefore, if the coating or drying is repeated, the adhesion and the like are insufficient or economical. Sexual disadvantage.

固體成分濃度若超過60重量%,則所得之透明被膜的膜厚變不均勻,或會發生裂紋。When the solid content concentration exceeds 60% by weight, the film thickness of the obtained transparent film becomes uneven or cracks may occur.

透明被膜形成用塗佈液中的鏈狀氧化矽系中空微粒子之濃度,係以所得之透明被膜中的鏈狀氧化矽系中空微粒子之含量以固體成分計成為5~80重量%、尤其成為10~50重量%之範圍來使用。The concentration of the chain cerium oxide-based hollow fine particles in the coating liquid for forming a transparent film is 5 to 80% by weight, particularly 10, based on the solid content of the chain cerium oxide-based hollow fine particles in the obtained transparent film. Use in a range of ~50% by weight.

當透明被膜中的鏈狀氧化矽系中空微粒子之含量以固體成分計未達5重量%時會得不到所欲低折射率的透明被膜,又,可不論本發明的鏈狀氧化矽系中空微粒子為何而使用其它習知的低折射率粒子。When the content of the chain cerium oxide-based hollow fine particles in the transparent film is less than 5% by weight based on the solid content, a transparent film having a desired low refractive index is not obtained, and the chain-like yttrium oxide hollow of the present invention can be obtained. Other conventional low refractive index particles are used for the microparticles.

透明被膜中的鏈狀氧化矽系中空微粒子之含量以固體成分計若超過80重量%,則膜的透明性、強度等會變不充分。When the content of the chain cerium oxide-based hollow fine particles in the transparent film is more than 80% by weight in terms of the solid content, the transparency, strength, and the like of the film may be insufficient.

再者,於視需要使用鏈狀氧化矽系中空微粒子以外的無機氧化物微粒子時,粒子的合計濃度較佳為亦與前述相司的範圍。In addition, when inorganic oxide fine particles other than the chain-shaped cerium oxide-based hollow fine particles are used as needed, the total concentration of the particles is preferably in the range of the above-mentioned phase.

又,透明被膜形成用塗佈液中的基質形成成分之濃度,係以所得之透明被膜中的基質成分之含量以固體成分計成為20~95重量%、尤其成為50~90重量%之範圍來使用。In addition, the concentration of the matrix-forming component in the coating liquid for forming a transparent film is such that the content of the matrix component in the obtained transparent film is 20 to 95% by weight, particularly 50 to 90% by weight, based on the solid content. use.

更具體地,透明被膜形成用塗佈液中的鏈狀氧化矽系中空微粒子之濃度,係以固體成分計為0.05~48重量%,更以在0.1~30重量%之範圍為佳。More specifically, the concentration of the chain cerium oxide-based hollow fine particles in the coating liquid for forming a transparent film is preferably from 0.05 to 48% by weight, more preferably from 0.1 to 30% by weight, based on the solid content.

透明被膜形成用塗佈液中的基質形成成分之濃度,係以固體成分計為0.2~57重量%,尤其以在0.5~54重量%之範圍為佳。The concentration of the matrix-forming component in the coating liquid for forming a transparent film is preferably from 0.2 to 57% by weight, particularly preferably from 0.5 to 54% by weight, based on the solid content.

藉由浸漬法、噴霧法、旋塗法、輥塗法、桿塗法、凹版印刷法、微凹版印刷法等周知的方法,將上述透明被膜形成用塗佈液塗佈於基材上及進行乾燥,藉由紫外線照射、加熱處理等常用方法使硬化,可形成透明被膜。The coating liquid for forming a transparent film is applied onto a substrate and subjected to a known method such as a dipping method, a spray method, a spin coating method, a roll coating method, a bar coating method, a gravure printing method, or a micro gravure printing method. Drying is hardened by a usual method such as ultraviolet irradiation or heat treatment to form a transparent film.

所得之透明被膜的膜厚較佳在200nm~20μm之範圍。The film thickness of the obtained transparent film is preferably in the range of 200 nm to 20 μm.

[附透明被膜之基材][Substrate with transparent film]

接著,說明附透明被膜之基材。Next, a substrate with a transparent film will be described.

本發明的附透明被膜之基材係將用前述透明被膜形成用塗佈液所形成的透明被膜單獨或與其它被膜一起形成於基材表面上。In the substrate with a transparent film of the present invention, the transparent film formed by the coating liquid for forming a transparent film is formed on the surface of the substrate alone or together with another film.

基材Substrate

作為基材,係於玻璃、聚碳酸酯、丙烯酸樹脂、PET、TAC等的塑膠薄片、塑膠薄膜、塑膠透鏡、塑膠面板等的基材、陰極線管、螢光顯示管、液晶表示板等的基材之表面上形成被膜者,雖然依用途而不同,但是被膜係單獨或於基材上與保護膜、硬塗膜、平坦化膜、高折射率膜、絕緣膜、導電性樹脂膜、導電性金屬微粒子膜、導電性金屬氧化物微粒子膜、其它視需要所使用的基底膜等組合形成。再者,組合使用時,本發明的被膜較佳為形成在最外表面上。The base material is a base material such as a plastic sheet such as glass, polycarbonate, acrylic resin, PET, or TAC, a plastic film, a plastic lens, a plastic panel, a cathode wire tube, a fluorescent display tube, or a liquid crystal display panel. The film is formed on the surface of the material, and the film is used alone or on the substrate, and the protective film, the hard coat film, the flattening film, the high refractive index film, the insulating film, the conductive resin film, and the conductivity. The metal fine particle film, the conductive metal oxide fine particle film, and other base film used as needed are formed in combination. Further, when used in combination, the film of the present invention is preferably formed on the outermost surface.

如此的透明被膜係可將前述透明被膜形成用塗佈液以浸漬法、噴霧法、旋塗法、輥塗法等周知的方法於基材上塗佈、乾燥,且再視需要,以加熱或紫外線照射等予以硬化而得。In the transparent coating film, the coating liquid for forming a transparent film can be applied to a substrate by a known method such as a dipping method, a spray method, a spin coating method, or a roll coating method, and further heated or Obtained by ultraviolet irradiation or the like.

上述基材之表面上所形成的透明被膜之折射率,雖然隨著鏈狀氧化矽系中空微粒子與基質成分等的混合比率及所使用的基質之折射率而亦不同,但是為1.15~1.42的低折射率。再者,本發明的鏈狀氧化矽系中空微粒子本身之折射率為1.10~1.35。此係因為本發明的鏈狀氧化矽系中空微粒子在內部具有空洞,樹脂等的基質形成成分係止於粒子外部,保持鏈狀氧化矽系中空微粒子內部的空洞。The refractive index of the transparent film formed on the surface of the substrate differs depending on the mixing ratio of the chain cerium oxide-based hollow fine particles to the matrix component and the refractive index of the substrate to be used, but is 1.15 to 1.42. Low refractive index. Further, the chain-like cerium oxide-based hollow fine particles of the present invention have a refractive index of 1.10 to 1.35. In this case, the chain-shaped cerium oxide-based hollow fine particles of the present invention have voids inside, and the matrix-forming component such as resin is stopped outside the particles, and the voids inside the chain-shaped cerium oxide-based hollow fine particles are retained.

再者,於上述附透明被膜之基材中,當基材的折射率為1.60以下時,推薦在基材表面上形成折射率為1.60以上的被膜(以下亦稱為中間被膜)後,形成前述本發明之含有鏈狀氧化矽系中空微粒子的透明被膜。中間被膜的折射率若為1.60以上,則與前述本發明之含有鏈狀氧化矽系中空微粒子的透明被膜之折射率的差大,而得到防反射性能更優異的附透明被膜之基材。中間被膜的折射率可藉由為了提高中間被膜的折射率所用之金屬氧化物微粒子的折射率、金屬氧化物微粒子與樹脂等的混合比率及所使用的樹脂之折射率來調整。In the substrate having the transparent film, when the refractive index of the substrate is 1.60 or less, it is recommended to form a film having a refractive index of 1.60 or more (hereinafter also referred to as an intermediate film) on the surface of the substrate. A transparent film containing chain cerium oxide-based hollow fine particles of the present invention. When the refractive index of the intermediate film is 1.60 or more, the difference in refractive index from the transparent film containing the chain yttria-based hollow fine particles of the present invention is large, and a substrate having a transparent film which is more excellent in antireflection performance is obtained. The refractive index of the intermediate film can be adjusted by increasing the refractive index of the metal oxide fine particles used for increasing the refractive index of the intermediate film, the mixing ratio of the metal oxide fine particles and the resin, and the refractive index of the resin to be used.

中間被膜的被膜形成用塗佈液係金屬氧化物粒子與被膜形成用基質的混合液,視需要混合有機溶劑。作為被膜形成用基質,可使用與前述本發明之含有氧化矽系微粒子的被膜同樣者,藉由使用相同的被膜形成用基質,可得到兩被膜間之密接性優異的附被膜之基材。A mixed liquid of the coating liquid metal oxide particles for forming a film for the intermediate film and the film forming substrate, and an organic solvent is optionally mixed. In the same manner as the film containing the cerium oxide-based fine particles of the present invention, the substrate for forming a film can be obtained by using the same film forming substrate, whereby a substrate having an adhesive film having excellent adhesion between the two films can be obtained.

藉由以下所示的實施例來更具體說明本發明。The invention will be more specifically illustrated by the following examples.

實施例1Example 1 鏈狀氧化矽系中空微粒子(P-1)之調製Modulation of chain cerium oxide hollow microparticles (P-1)

於100克氧化矽.氧化鋁溶膠(日揮觸媒化成(股)製:USBB-120,平均粒徑25nm,SiO2 ‧Al2 O3 濃度20重量%,固體成分中Al2 O3 含量27重量%)中添加3900克純水,加溫到98℃,一邊保持在此溫度,一邊以6小時添加1750克當作SiO2 的濃度1.5重量%之矽酸鈉水溶液與1750克當作Al2 O3 的濃度0.5重量%之鋁酸鈉水溶液,而得到SiO2 ‧Al2 O3 一次粒子(P-1)分散液。此時的莫耳比為MOx /SiO2 =0.2。又,此時的反應液之pH為12.0。此分散液的一次粒子平均粒徑為35nm。(步驟(a))100 g of cerium oxide. Alumina sol (daily flucene-forming system: USBB-120, average particle size 25 nm, SiO 2 ‧ Al 2 O 3 concentration 20% by weight, solid content Al 2 O 3 content 27 weight 3900 g of pure water was added to the solution, and the temperature was maintained at 98 ° C. While maintaining this temperature, 1750 g of an aqueous solution of sodium citrate having a concentration of 1.5% by weight of SiO 2 and 1750 g of Al 2 O were added thereto over 6 hours. a concentration of 0.5% by weight of the 3 aqueous sodium aluminate solution, thereby obtaining SiO 2 ‧Al 2 O 3 primary particles (P-1) dispersion liquid. The molar ratio at this time is MO x /SiO 2 =0.2. Further, the pH of the reaction liquid at this time was 12.0. The primary particle average particle diameter of this dispersion was 35 nm. (Step (a))

接著,以超濾膜法洗淨SiO2 ‧Al2 O3 一次粒子(P-1)分散液,進行濃縮而成為固體成分濃度5重量%的SiO2 ‧Al2 O3 一次粒子(P-1)分散液。(步驟(b))Next, an ultrafiltration membrane method to wash SiO 2 ‧Al 2 O 3 primary particles (P-1) dispersion liquid, and was concentrated to a solid content concentration of 5 wt% of SiO 2 ‧Al 2 O 3 primary particles (P-1 )Dispersions. (Step (b))

另途,調製混合有136克當作SiO2 的濃度2重量%之酸性矽酸液與5.4克當作用於鏈狀化的電解質之濃度10重量%的Ca(NO3 )2 水溶液之水溶液,與300克固體成分濃度5重量%的SiO2 ‧Al2 O3 一次粒子(P-1)分散液混合,在其中添加9克濃度2重量%的NaOH水溶液後,於150℃進行3小時水熱處理,以調製固體成分濃度5重量%的鏈狀複合氧化物粒子(P-1)分散液。接著冷卻到常溫。此時的分散液之pH為10.9。(步驟(c))On the other hand, 136 g of an acidic citric acid solution having a concentration of 2 wt% of SiO 2 and 5.4 g of an aqueous solution of a Ca(NO 3 ) 2 aqueous solution having a concentration of 10% by weight as an electrolyte for chain formation were prepared and mixed with 300 g of a SiO 2 ‧Al 2 O 3 primary particle (P-1) dispersion having a solid concentration of 5 wt% was mixed, and 9 g of a 2% by weight aqueous NaOH solution was added thereto, followed by hydrothermal treatment at 150 ° C for 3 hours. A dispersion of chain-like composite oxide particles (P-1) having a solid concentration of 5 wt% was prepared. It is then cooled to normal temperature. The pH of the dispersion at this time was 10.9. (Step (c))

接著,於300克固體成分濃度5重量%的鏈狀複合氧化物粒子(P-1)分散液中添加3900克純水,加溫到98℃,一邊保持此溫度,一邊以17小時添加1530克當作SiO2 的濃度1.5重量%之矽酸鈉水溶液與500克當作Al2 O3 的濃度0.5重量%之鋁酸鈉水溶液,而得到氧化矽‧氧化鋁被覆鏈狀複合氧化物粒子(P-1)分散液。(步驟(d))Next, 3,900 g of pure water was added to 300 g of a chain-like composite oxide particle (P-1) dispersion having a solid concentration of 5 wt%, and the mixture was heated to 98 ° C, and while maintaining this temperature, 1530 g was added in 17 hours. An aqueous solution of sodium citrate having a concentration of SiO 2 of 1.5% by weight and 500 g of an aqueous solution of sodium aluminate having a concentration of 0.5% by weight of Al 2 O 3 were obtained to obtain cerium oxide-alumina-coated chain-like composite oxide particles (P). -1) Dispersion. (Step (d))

隨後,以超濾膜法洗淨,進行濃縮,於500克固體成分濃度為13重量%的氧化矽‧氧化鋁被覆鏈狀複合氧化物粒子(P-1)分散液中添加1,125克純水,接著滴下濃鹽酸(濃度35.5重量%)而成為pH1.0,進行脫鋁處理。其次,一邊添加10L的pH3之鹽酸水溶液與5L的純水,一邊以超濾膜來分離‧洗淨所溶解的鋁鹽,而得到固體成分濃度20重量%的鏈狀氧化矽系中空微粒子(P-1)之水分散液。(步驟(e))(步驟(f))Subsequently, it was washed with an ultrafiltration membrane method and concentrated, and 1,125 g of pure water was added to 500 g of a cerium oxide-alumina-coated chain-like composite oxide particle (P-1) dispersion having a solid concentration of 13% by weight. Then, concentrated hydrochloric acid (concentration: 35.5 wt%) was added dropwise to pH 1.0, and dealumination treatment was carried out. Next, 10 L of a hydrochloric acid aqueous solution of pH 3 and 5 L of pure water were added, and the dissolved aluminum salt was separated by an ultrafiltration membrane to obtain a chain-like cerium oxide-based hollow fine particle having a solid concentration of 20% by weight (P). -1) Aqueous dispersion. (Step (e)) (Step (f))

對於所得之鏈狀氧化矽系中空微粒子(P-1),測定平均寬幅、平均長度、外殼厚度、貫通孔的平均直徑、MOx /SiO2 (莫耳比)及折射率,表1中顯示結果。於以下所示的實施例與比較例中亦同樣地測定,表1中顯示結果。For the obtained chain yttrium oxide hollow fine particles (P-1), the average width, the average length, the thickness of the outer shell, the average diameter of the through holes, the MO x /SiO 2 (mole ratio), and the refractive index were measured, in Table 1. Show results. The results are also measured in the same manner as in the examples and comparative examples shown below, and the results are shown in Table 1.

此處,平均粒徑係藉由動態光散射法來測定,折射率係使用CARGILL製的SeriesA、AA當作標準折射液,以前述方法來測定。MOx 係以ICP發光分光分析裝置(島津製作所:ICPS-8100)來測定,SiO2 係使用由在1000℃煅燒之際的殘存固體成分之重量去除MOx 、Na2 O的重量後之值。Here, the average particle diameter was measured by a dynamic light scattering method, and the refractive index was measured by the above method using Series A and AA manufactured by CARGILL as standard refractive liquids. The MO x was measured by an ICP emission spectroscopic analyzer (Shimadzu Corporation: ICPS-8100), and the SiO 2 was a value obtained by removing the weight of MO x and Na 2 O from the weight of the residual solid component when calcined at 1000 °C.

附透明被膜之基材(A-1)的製造Manufacture of substrate (A-1) with transparent film

對上述所得之固體成分濃度20重量%的鏈狀氧化矽系中空微粒子(P-1)之水分散液,使用超濾膜,以乙醇置換溶劑,而調製固體成分濃度20重量%的鏈狀氧化矽系中空微粒子(P-1)之醇分散液。The aqueous dispersion of the chain cerium oxide-based hollow fine particles (P-1) having a solid content concentration of 20% by weight obtained as described above was subjected to a chain oxidation of a solid concentration of 20% by weight using an ultrafiltration membrane and replacing the solvent with ethanol. An alcohol dispersion of lanthanide hollow microparticles (P-1).

充分混合50克鏈狀氧化矽系中空微粒子(P-1)之醇分散液經乙醇稀釋成固體成分濃度5重量%的分散液、3克丙烯酸樹脂(Hitaroid 1007,日立化成(股)製)及47克異丙醇與正丁醇的1/1(重量比)混合溶劑,以調製塗佈液。An alcohol dispersion in which 50 g of chain cerium oxide-based hollow fine particles (P-1) was sufficiently mixed was diluted with ethanol to a dispersion having a solid concentration of 5 wt%, and 3 g of an acrylic resin (Hitaroid 1007, manufactured by Hitachi Chemical Co., Ltd.) and A mixed solvent of 47 g of isopropyl alcohol and n-butanol in a ratio of 1/1 (by weight) was prepared to prepare a coating liquid.

以桿塗法將此塗佈液塗佈在PET薄膜上,於80℃使乾燥1分鐘,而得到透明被膜之膜厚為100nm的附透明被膜之基材(A-1)。表2中顯示此附透明被膜之基材(A-1)的全光線透過率、霧度、波長550nm的光線之反射率、被膜的折射率、密接性、耐擦傷性及鉛筆硬度。於以下所示的實施例與比較例中亦同樣地測定,表2中顯示結果。This coating liquid was applied onto a PET film by a bar coating method, and dried at 80 ° C for 1 minute to obtain a transparent film-attached substrate (A-1) having a transparent film thickness of 100 nm. Table 2 shows the total light transmittance, the haze, the reflectance of light having a wavelength of 550 nm, the refractive index of the film, the adhesion, the scratch resistance, and the pencil hardness of the substrate (A-1) having the transparent film. The results are also measured in the same manner as in the examples and comparative examples shown below, and the results are shown in Table 2.

全光線透過率及霧度係藉由霧度計(SUGA試驗機(股)製)來測定,反射率係藉由分光光度計(日本分光公司,Ubest-55)來測定。又,被膜的折射率係藉由橢圓偏光計(ULVAC公司製,EMS-1)來測定。再者,未塗佈之PET薄膜係全光線透過率為90.7%、霧度為2.0%、波長550nm之光線的反射率為7.0%。The total light transmittance and the haze were measured by a haze meter (manufactured by SUGA Tester Co., Ltd.), and the reflectance was measured by a spectrophotometer (Ubest-55, JASCO Corporation). Further, the refractive index of the film was measured by an ellipsometer (EMS-1, manufactured by ULVAC Co., Ltd.). Further, the uncoated PET film had a total light transmittance of 90.7%, a haze of 2.0%, and a reflectance of 7.0% of light having a wavelength of 550 nm.

鉛筆硬度係根據JIS K 5400,以鉛筆硬度試驗器來測定。即,對於被膜表面以45度的角度安裝鉛筆,負載指定的荷重,以一定速度拉引,觀察有無傷痕。The pencil hardness was measured by a pencil hardness tester in accordance with JIS K 5400. That is, the pencil was attached to the surface of the film at an angle of 45 degrees, and the specified load was loaded, and pulled at a constant speed to observe the presence or absence of a flaw.

又,於附透明被膜之基材(A-1)的表面用刀片以縱橫1mm的間隔弄出11條平行的傷痕以製作100個方格,接著在其上黏著賽珞玢膠帶,其次以下列3個等級來分類將賽珞玢膠帶剝離時被膜未剝離而殘存的方格數,評價密接性。Further, on the surface of the base material (A-1) with the transparent film, 11 parallel flaws were formed at intervals of 1 mm in the longitudinal and lateral directions to make 100 squares, and then the cellophane tape was adhered thereto, followed by the following The number of squares in which the film was not peeled off when the celluloid tape was peeled off was classified into three grades, and the adhesion was evaluated.

殘存方格數90個以上:◎More than 90 remaining squares: ◎

殘存方格數85~89個:○Residual squares 85 to 89: ○

殘存方格數84個以下:△The number of remaining squares is 84 or less: △

耐擦傷性係使用#0000鋼絲棉,以荷重500g/cm2 滑動50次,目視觀察膜的表面,藉由以下的基準來評價。The scratch resistance was measured by using #0000 steel wool and sliding 50 times at a load of 500 g/cm 2 , and the surface of the film was visually observed and evaluated by the following criteria.

沒有看到筋條傷痕:◎Did not see the rib scars: ◎

稍微看到筋條傷痕:○Slightly see the rib scars: ○

看到多數的筋條傷痕:△See most of the rib scars: △

面係全體地被削掉:×The whole face was cut off: ×

實施例2Example 2 鏈狀氧化矽系中空微粒子(P-2)之調製Modulation of chain cerium oxide hollow microparticles (P-2)

於實施例1中,除了混合2.7克當作電解質的濃度10重量%之Ca(NO3 )2 水溶液以外,同樣地得到固體成分濃度20重量%的鏈狀氧化矽系中空微粒子(P-2)之水分散液。In the same manner as in Example 1, except that 2.7 g of a Ca(NO 3 ) 2 aqueous solution having a concentration of 10% by weight as an electrolyte was mixed, a chain cerium oxide-based hollow fine particle (P-2) having a solid concentration of 20% by weight was obtained in the same manner. Water dispersion.

附透明被膜之基材(A-2)的製造Manufacture of substrate (A-2) with transparent film

於實施例1中,除了使用固體成分濃度20重量%的鏈狀氧化矽系中空微粒子(P-2)之水分散液以外,同樣地得到塗佈液及透明被膜的膜厚為100nm之附透明被膜之基材(A-2)。In the same manner as in Example 1, except that an aqueous dispersion of chain cerium oxide-based hollow fine particles (P-2) having a solid concentration of 20% by weight was used, a coating liquid and a transparent film having a thickness of 100 nm were obtained in the same manner. The substrate (A-2) of the film.

實施例3Example 3 鏈狀氧化矽系中空微粒子(P-3)之調製Modulation of chain cerium oxide hollow microparticles (P-3)

於實施例1中,除了混合54克當作電解質的濃度10重量%之Ca(NO3 )2 水溶液以外,同樣地得到固體成分濃度20重量%的鏈狀氧化矽系中空微粒子(P-3)之水分散液。In the same manner as in Example 1, except that 54 g of a Ca(NO 3 ) 2 aqueous solution having a concentration of 10% by weight as an electrolyte was mixed, a chain cerium oxide-based hollow fine particle (P-3) having a solid concentration of 20% by weight was obtained in the same manner. Water dispersion.

附透明被膜之基材(A-3)的製造Manufacture of substrate (A-3) with transparent film

於實施例1中,除了使用固體成分濃度20重量%的鏈狀氧化矽系中空微粒子(P-3)之水分散液以外,同樣地得到塗佈液及透明被膜之膜厚為100nm的附透明被膜之基材(P-3)。In the same manner as in Example 1, except that an aqueous dispersion of chain cerium oxide-based hollow fine particles (P-3) having a solid concentration of 20% by weight was used, a coating liquid and a transparent film having a thickness of 100 nm were obtained in the same manner. The substrate (P-3) of the film.

實施例4Example 4 鏈狀氧化矽系中空微粒子(P-4)之調製Modulation of chain cerium oxide hollow microparticles (P-4)

於實施例1中,除了混合4.9克當作電解質的濃度10重量%之Mg(NO3 )2 水溶液以外,同樣地得到固體成分濃度20重量%的鏈狀氧化矽系中空微粒子(P-4)之水分散液。In the same manner as in Example 1, except that 4.9 g of a Mg(NO 3 ) 2 aqueous solution having a concentration of 10% by weight as an electrolyte was mixed, a chain cerium oxide-based hollow fine particle (P-4) having a solid concentration of 20% by weight was obtained in the same manner. Water dispersion.

附透明被膜之基材(A-4)的製造Manufacture of substrate (A-4) with transparent film

於實施例1中,除了使用固體成分濃度20重量%的鏈狀氧化矽系中空微粒子(P-4)之水分散液以外,同樣地得到塗佈液及透明被膜之膜厚為100nm的附透明被膜之基材(A-4)。In the first embodiment, a coating liquid and a transparent film having a film thickness of 100 nm were obtained in the same manner except that an aqueous dispersion of chain cerium oxide-based hollow fine particles (P-4) having a solid concentration of 20% by weight was used. The substrate (A-4) of the film.

實施例5Example 5 鏈狀氧化矽系中空微粒子(P-5)之調製Modulation of chain cerium oxide hollow microparticles (P-5)

於100克氧化矽‧氧化鋁溶膠(日揮觸媒化成(股)製:USBB-120,平均粒徑25nm,SiO2 ‧Al2 O3 濃度20重量%,固體成分中Al2 O3 含量27重量%)中添加3900克純水,加溫到98℃,一邊保持在此溫度,一邊以6小時添加405克當作SiO2 的濃度1.5重量%之矽酸鈉水溶液與405克當作Al2 O3 的濃度0.5重量%之鋁酸鈉水溶液,而得到SiO2 ‧Al2 O3 一次粒子(P-5)分散液。此時的莫耳比為MOx /SiO2 =0.2。又,此時的反應液之pH為12.0。此分散液的一次粒子平均粒徑為28nm。(步驟(a))100 g of cerium oxide ‧ alumina sol (made by Nissan Catalyst): USBB-120, average particle size 25 nm, SiO 2 ‧ Al 2 O 3 concentration 20% by weight, solid content Al 2 O 3 content 27 weight 3900 g of pure water was added to the solution, and the temperature was maintained at 98 ° C. While maintaining this temperature, 405 g of an aqueous solution of sodium citrate having a concentration of 1.5% by weight of SiO 2 and 405 g of TiO 2 were added as an Al 2 O in 6 hours. a concentration of 0.5% by weight of the 3 aqueous sodium aluminate solution, thereby obtaining SiO 2 ‧Al 2 O 3 primary particles (P-5) dispersion liquid. The molar ratio at this time is MO x /SiO 2 =0.2. Further, the pH of the reaction liquid at this time was 12.0. The primary particle average particle diameter of this dispersion was 28 nm. (Step (a))

接著,以超濾膜法洗淨SiO2 ‧Al2 O3 一次粒子(P-5)分散液,進行濃縮而成為固體成分濃度5重量%的SiO2 ‧Al2 O3 一次粒子(P-5)分散液。(步驟(b))Next, an ultrafiltration membrane method to wash SiO 2 ‧Al 2 O 3 primary particles (P-5) dispersion liquid was concentrated to a solid content of 5% by weight of SiO 2 ‧Al 2 O 3 primary particles (P-5 )Dispersions. (Step (b))

另途,調製混合有136克當作SiO2 的濃度2重量%之酸性矽酸液與5.4克當作用於鏈狀化的電解質之濃度10重量%的Ca(NO3 )2 水溶液之水溶液,與300克固體成分濃度5重量%的SiO2 ‧Al2 O3 一次粒子(P-5)分散液混合,在其中添加9克濃度2重量%的NaOH水溶液後,於150℃進行3小時水熱處理,以調製固體成分濃度5重量%的鏈狀複合氧化物粒子(P-5)分散液。接著冷卻到常溫。此時的分散液之pH為10.9。(步驟(c))On the other hand, 136 g of an acidic citric acid solution having a concentration of 2 wt% of SiO 2 and 5.4 g of an aqueous solution of a Ca(NO 3 ) 2 aqueous solution having a concentration of 10% by weight as an electrolyte for chain formation were prepared and mixed with 300 g of a SiO 2 ‧ Al 2 O 3 primary particle (P-5) dispersion having a solid concentration of 5 wt% was mixed, and 9 g of a 2% by weight aqueous NaOH solution was added thereto, followed by hydrothermal treatment at 150 ° C for 3 hours. A dispersion of chain-like composite oxide particles (P-5) having a solid concentration of 5 wt% was prepared. It is then cooled to normal temperature. The pH of the dispersion at this time was 10.9. (Step (c))

接著,於300克固體成分濃度5重量%的鏈狀複合氧化物粒子(P-5)分散液中添加3900克純水,加溫到98℃,一邊保持此溫度,一邊以17小時添加1530克當作SiO2 的濃度1.5重量%之矽酸鈉水溶液與500克當作Al2 O3 的濃度0.5重量%之鋁酸鈉水溶液,而得到氧化矽‧氧化鋁被覆鏈狀複合氧化物粒子(P-5)分散液。(步驟(d))Next, 3,900 g of pure water was added to 300 g of a chain-like composite oxide particle (P-5) dispersion having a solid concentration of 5 wt%, and the mixture was heated to 98 ° C, and while maintaining this temperature, 1530 g was added in 17 hours. An aqueous solution of sodium citrate having a concentration of SiO 2 of 1.5% by weight and 500 g of an aqueous solution of sodium aluminate having a concentration of 0.5% by weight of Al 2 O 3 were obtained to obtain cerium oxide-alumina-coated chain-like composite oxide particles (P). -5) Dispersion. (Step (d))

隨後,以超濾膜法洗淨,進行濃縮,於500克固體成分濃度為13重量%的氧化矽‧氧化鋁被覆鏈狀複合氧化物粒子(P-5)分散液中添加1,125克純水,接著滴下濃鹽酸(濃度35.5重量%)而成為pH1.0,進行脫鋁處理。其次,一邊添加10L的pH3之鹽酸水溶液與5L的純水,一邊以超濾膜來分離‧洗淨所溶解的鋁鹽,而得到固體成分濃度20重量%的鏈狀氧化矽系中空微粒子(P-5)之水分散液。(步驟(e))(步驟(f))Subsequently, it was washed with an ultrafiltration membrane method and concentrated, and 1,125 g of pure water was added to 500 g of a cerium oxide-alumina-coated chain-like composite oxide particle (P-5) dispersion having a solid concentration of 13% by weight. Then, concentrated hydrochloric acid (concentration: 35.5 wt%) was added dropwise to pH 1.0, and dealumination treatment was carried out. Next, 10 L of a hydrochloric acid aqueous solution of pH 3 and 5 L of pure water were added, and the dissolved aluminum salt was separated by an ultrafiltration membrane to obtain a chain-like cerium oxide-based hollow fine particle having a solid concentration of 20% by weight (P). -5) Aqueous dispersion. (Step (e)) (Step (f))

附透明被膜之基材(A-5)的製造Manufacture of substrate (A-5) with transparent film

於實施例1中,除了使用固體成分濃度20重量%的鏈狀氧化矽系中空微粒子(P-5)之水分散液以外,同樣地得到塗佈液及透明被膜之膜厚為100nm的附透明被膜之基材(A-5)。In the same manner as in Example 1, except that an aqueous dispersion of chain cerium oxide-based hollow fine particles (P-5) having a solid concentration of 20% by weight was used, a coating liquid and a transparent film having a thickness of 100 nm were obtained in the same manner. The substrate (A-5) of the film.

實施例6Example 6 鏈狀氧化矽系中空微粒子(P-6)之調製Modulation of chain cerium oxide hollow microparticles (P-6)

於100克氧化矽‧氧化鋁溶膠(日揮觸媒化成(股)製:USBB-120,平均粒徑25nm,SiO2 ‧Al2 O3 濃度20重量%,固體成分中Al2 O3 含量27重量%)中添加3900克純水,加溫到98℃,一邊保持在此溫度,一邊以6小時添加20,900克當作SiO2 的濃度1.5重量%之矽酸鈉水溶液與20,900克當作Al2 O3 的濃度0.5重量%之鋁酸鈉水溶液,而得到SiO2 ‧Al2 O3 一次粒子(P-6)分散液。此時的莫耳比為MOx/SiO2 =0.2。又,此時的反應液之pH為12.0。此分散液的一次粒子平均粒徑為70nm。(步驟(a))100 g of cerium oxide ‧ alumina sol (made by Nissan Catalyst): USBB-120, average particle size 25 nm, SiO 2 ‧ Al 2 O 3 concentration 20% by weight, solid content Al 2 O 3 content 27 weight 3900 g of pure water was added to the solution, and the temperature was maintained at 98 ° C. While maintaining this temperature, 20,900 g of an aqueous solution of sodium citrate having a concentration of 1.5 wt% of SiO 2 and 20,900 g of Al 2 O were added as 6 hours. a concentration of 0.5% by weight of the 3 aqueous sodium aluminate solution, thereby obtaining SiO 2 ‧Al 2 O 3 primary particles (P-6) dispersion liquid. The molar ratio at this time was MOx/SiO 2 = 0.2. Further, the pH of the reaction liquid at this time was 12.0. The primary particle average particle diameter of this dispersion was 70 nm. (Step (a))

接著,以超濾膜法洗淨SiO2 ‧Al2 O3 一次粒子(P-6)分散液,進行濃縮而成為固體成分濃度5重量%的SiO2 ‧Al2 O3 一次粒子(P-6)分散液。(步驟(b))Next, an ultrafiltration membrane method to wash SiO 2 O 3 primary particles 2 ‧Al (P-6) dispersion liquid was concentrated to a solid content of 5% by weight of SiO 2 ‧Al 2 O 3 primary particles (P-6 )Dispersions. (Step (b))

另途,調製混合有136克當作SiO2 的濃度2重量%之酸性矽酸液與5.4克當作用於鏈狀化的電解質之濃度10重量%的Ca(NO3 )2 水溶液之水溶液,與300克固體成分濃度5重量%的SiO2 ‧Al2 O3 一次粒子(P-6)分散液混合,在其中添加9克濃度2重量%的NaOH水溶液後,於150℃進行3小時水熱處理,以調製固體成分濃度5重量%的鏈狀複合氧化物粒子(P-6)分散液。接著冷卻到常溫。此時的分散液之pH為10.9。(步驟(c))On the other hand, 136 g of an acidic citric acid solution having a concentration of 2 wt% of SiO 2 and 5.4 g of an aqueous solution of a Ca(NO 3 ) 2 aqueous solution having a concentration of 10% by weight as an electrolyte for chain formation were prepared and mixed with 300 g of a SiO 2 ‧Al 2 O 3 primary particle (P-6) dispersion having a solid concentration of 5 wt% was mixed, and 9 g of a 2% by weight aqueous NaOH solution was added thereto, followed by hydrothermal treatment at 150 ° C for 3 hours. A dispersion of chain-like composite oxide particles (P-6) having a solid concentration of 5 wt% was prepared. It is then cooled to normal temperature. The pH of the dispersion at this time was 10.9. (Step (c))

接著,於300克固體成分濃度5重量%的鏈狀複合氧化物粒子(P-6)分散液中添加3900克純水,加溫到98℃,一邊保持此溫度,一邊以17小時添加2,000克當作SiO2 的濃度1.5重量%之矽酸鈉水溶液與700克當作Al2 O3 的濃度0.5重量%之鋁酸鈉水溶液,而得到氧化矽‧氧化鋁被覆鏈狀複合氧化物粒子(P-6)分散液。(步驟(d))Next, 3,900 g of pure water was added to 300 g of a chain-like composite oxide particle (P-6) dispersion having a solid concentration of 5 wt%, and the mixture was heated to 98 ° C, and while maintaining the temperature, 2,000 g was added for 17 hours. An aqueous solution of sodium citrate having a concentration of SiO 2 of 1.5% by weight and 700 g of an aqueous solution of sodium aluminate having a concentration of 0.5% by weight of Al 2 O 3 were obtained to obtain cerium oxide-alumina-coated chain-like composite oxide particles (P). -6) Dispersion. (Step (d))

隨後,以超濾膜法洗淨,進行濃縮,於500克固體成分濃度為13重量%的氧化矽‧氧化鋁被覆鏈狀複合氧化物粒子(P-6)分散液中添加1,125克純水,接著滴下濃鹽酸(濃度35.5重量%)而成為pH1.0,進行脫鋁處理。其次,一邊添加10L的pH3之鹽酸水溶液與5L的純水,一邊以超濾膜來分離.洗淨所溶解的鋁鹽,而得到固體成分濃度20重量%的鏈狀氧化矽系中空微粒子(P-6)之水分散液。(步驟(e))(步驟(f))Subsequently, it was washed with an ultrafiltration membrane method and concentrated, and 1,125 g of pure water was added to 500 g of a cerium oxide-alumina-coated chain-like composite oxide particle (P-6) dispersion having a solid concentration of 13% by weight. Then, concentrated hydrochloric acid (concentration: 35.5 wt%) was added dropwise to pH 1.0, and dealumination treatment was carried out. Next, 10 L of a hydrochloric acid aqueous solution of pH 3 and 5 L of pure water were added, and the dissolved aluminum salt was separated by an ultrafiltration membrane to obtain a chain cerium oxide-based hollow fine particle having a solid concentration of 20% by weight (P). -6) Aqueous dispersion. (Step (e)) (Step (f))

附透明被膜之基材(A-6)的製造Manufacture of substrate (A-6) with transparent film

於實施例1中,除了使用固體成分濃度20重量%的鏈狀氧化矽系中空微粒子(P-6)之水分散液以外,同樣地得到塗佈液及透明被膜之膜厚為100nm的附透明被膜之基材(A-6)。In the same manner as in Example 1, except that an aqueous dispersion of chain cerium oxide-based hollow fine particles (P-6) having a solid concentration of 20% by weight was used, a coating liquid and a transparent film having a thickness of 100 nm were obtained in the same manner. The substrate (A-6) of the film.

實施例7Example 7 附透明被膜之基材(A-7)的製造Manufacture of substrate (A-7) with transparent film

於實施例1中,除了使用36.6克鏈狀氧化矽系中空微粒子(P-1)之醇分散液經乙醇稀釋成固體成分濃度5重量%的分散液、3.7克丙烯酸樹脂(Hitaroid 1007,日立化成(股)製)及58克異丙醇與正丁醇的1/1(重量比)混合溶劑以外,同樣地得到塗佈液及透明被膜之膜厚為100nm的附透明被膜之基材(A-7)。In Example 1, except that 36.6 g of an alcohol dispersion of chain-like cerium oxide-based hollow fine particles (P-1) was diluted with ethanol to a dispersion having a solid concentration of 5% by weight, and 3.7 g of an acrylic resin (Hitaroid 1007, Hitachi Chemical Co., Ltd.) In the same manner as the mixed solvent of a 1/1 (by weight) mixture of isopropyl alcohol and n-butanol, a substrate having a transparent coating film having a thickness of 100 nm of a coating liquid and a transparent film was obtained in the same manner (A). -7).

實施例8Example 8 附透明被膜之基材(A-8)的製造Manufacture of substrate (A-8) with transparent film

於實施例1中,除了使用55克鏈狀氧化矽系中空微粒子(P-1)之醇分散液經乙醇稀釋成固體成分濃度5重量%的分散液、2.75克丙烯酸樹脂(Hitaroid 1007,日立化成(股)製)及43.1克異丙醇與正丁醇的1/1(重量比)混合溶劑以外,同樣地得到塗佈液及透明被膜之膜厚為100nm的附透明被膜之基材(A-8)。In Example 1, except that 55 g of an alcohol dispersion of chain-like cerium oxide-based hollow fine particles (P-1) was diluted with ethanol to a dispersion having a solid concentration of 5 wt%, and 2.75 g of an acrylic resin (Hitaroid 1007, Hitachi Chemical Co., Ltd.) In the same manner as the mixed solvent of 43.1 g of isopropyl alcohol and n-butanol in a ratio of 1/1 (by weight), a substrate having a transparent coating film having a thickness of 100 nm of the coating liquid and the transparent film was obtained in the same manner (A) -8).

實施例9Example 9 鏈狀氧化矽系中空微粒子(P-7)之調製Modulation of chain cerium oxide hollow microparticles (P-7)

以超濾膜法洗淨,進行濃縮,於500克固體成分濃度為13重量%的氧化矽‧氧化鋁被覆鏈狀複合氧化物粒子(P-1)分散液中添加1,125克純水,接著滴下濃鹽酸(濃度35.5重量%)而成為pH0.5,進行脫鋁處理。其次,一邊添加25L的pH3.0之鹽酸水溶液與10L的純水,一邊以超濾膜來分離‧洗淨所溶解的鋁鹽,而得到固體成分濃度20重量%的鏈狀氧化矽系中空微粒子(P-7)之水分散液。(步驟(e))(步驟(f))After washing with an ultrafiltration membrane method and concentrating, 1,125 g of pure water was added to 500 g of a cerium oxide-alumina-coated chain-like composite oxide particle (P-1) dispersion having a solid concentration of 13% by weight, followed by dropping. Concentrated hydrochloric acid (concentration: 35.5 wt%) was brought to pH 0.5 and subjected to dealumination treatment. Next, 25 L of a hydrochloric acid aqueous solution of pH 3.0 and 10 L of pure water were added, and the dissolved aluminum salt was separated by an ultrafiltration membrane to obtain a chain-like cerium oxide-based hollow fine particle having a solid concentration of 20% by weight. (P-7) aqueous dispersion. (Step (e)) (Step (f))

附透明被膜之基材(A-9)的製造Manufacture of substrate (A-9) with transparent film

於實施例1中,除了使用固體成分濃度20重量%的鏈狀氧化矽系中空微粒子(P-7)之水分散液以外,同樣地得到塗佈液及透明被膜之膜厚為100nm的附透明被膜之基材(A-9)。In the same manner as in Example 1, except that an aqueous dispersion of chain cerium oxide-based hollow fine particles (P-7) having a solid concentration of 20% by weight was used, a coating liquid and a transparent film having a thickness of 100 nm were obtained in the same manner. The substrate of the film (A-9).

比較例1Comparative example 1 氧化矽系中空微粒子(RP-1)的調製Modulation of yttrium oxide hollow microparticles (RP-1)

於100克氧化矽‧氧化鋁溶膠(日揮觸媒化成(股)製:USBB-120,平均粒徑25nm、SiO2 ‧Al2 O3 濃度20重量%,固體成分中Al2 O3 含量27重量%)添加3900克純水,加溫到98℃,一邊保持在此溫度,一邊以6小時添加1750克當作SiO2 的濃度1.5重量%之矽酸鈉水溶液與1750克當作Al2 O3 的濃度0.5重量%之鋁酸鈉水溶液,而得到SiO2 ‧Al2 O3 一次粒子(P-1)分散液。此時的莫耳比為MOx /SiO2 =0.2。又,此時的反應液之pH為12.0。此分散液的一次粒子平均粒徑為35nm。(步驟(a))100 g of cerium oxide ‧ alumina sol (made by Nikko Catalyst: USBB-120, average particle size 25 nm, SiO 2 ‧ Al 2 O 3 concentration 20% by weight, solid content Al 2 O 3 content 27 weight %) 3900 g of pure water was added, heated to 98 ° C, while maintaining this temperature, 1750 g of an aqueous solution of sodium citrate having a concentration of 1.5 wt% of SiO 2 and 1750 g of Al 2 O 3 were added over 6 hours. A 0.5% by weight aqueous sodium aluminate solution was obtained to obtain a SiO 2 ‧ Al 2 O 3 primary particle (P-1) dispersion. The molar ratio at this time is MO x /SiO 2 =0.2. Further, the pH of the reaction liquid at this time was 12.0. The primary particle average particle diameter of this dispersion was 35 nm. (Step (a))

接著,以超濾膜法洗淨SiO2 ‧Al2 O3 一次粒子(P-1)分散液,進行濃縮而成為固體成分濃度5重量%的SiO2 ‧Al2 O3 一次粒子(P-1)分散液。(步驟(b))Next, an ultrafiltration membrane method to wash SiO 2 ‧Al 2 O 3 primary particles (P-1) dispersion liquid, and was concentrated to a solid content concentration of 5 wt% of SiO 2 ‧Al 2 O 3 primary particles (P-1 )Dispersions. (Step (b))

隨後,於300克固體成分濃度5重量%的SiO2 ‧Al2 O3 一次粒子(P-1)分散液中添加3900克純水,加溫到98℃,一邊保持此溫度,一邊以17小時添加1530克當作SiO2 的濃度1.5重量%之矽酸鈉水溶液與500克當作Al2 O3 的濃度0.5重量%之鋁酸鈉水溶液,而得到氧化矽‧氧化鋁被覆複合氧化物粒子(RP-1)分散液。Subsequently, 3900 g of pure water was added to 300 g of a SiO 2 ‧Al 2 O 3 primary particle (P-1) dispersion having a solid concentration of 5 wt%, and the mixture was heated to 98 ° C while maintaining the temperature for 17 hours. 1530 g of an aqueous solution of sodium citrate as a concentration of SiO 2 of 1.5% by weight and 500 g of an aqueous solution of sodium aluminate having a concentration of 0.5% by weight of Al 2 O 3 were added to obtain cerium oxide-alumina-coated composite oxide particles ( RP-1) dispersion.

其次,以超濾膜法洗淨,進行濃縮,於500克固體成分濃度為13重量%的氧化矽‧氧化鋁被覆複合氧化物粒子(RP-1)分散液中添加1,125克純水,接著滴下濃鹽酸(濃度35.5重量%)而成為pH1.0,進行脫鋁處理。其次,一邊添加10L的pH3之鹽酸水溶液與5L的純水,一邊以超濾膜來分離‧洗淨所溶解的鋁鹽,而得到固體成分濃度20重量%的單分散氧化矽系中空微粒子(RP-1)之水分散液。水分散液中的氧化矽系中空微粒子(RP-1)既不鏈狀化也不凝聚。Next, it was washed by an ultrafiltration membrane method and concentrated, and 1,125 g of pure water was added to 500 g of a cerium oxide-alumina-coated composite oxide particle (RP-1) dispersion having a solid concentration of 13% by weight, followed by dropping. Concentrated hydrochloric acid (concentration: 35.5 wt%) was brought to pH 1.0 and subjected to dealumination treatment. Next, 10 L of a hydrochloric acid aqueous solution of pH 3 and 5 L of pure water were added, and the dissolved aluminum salt was separated by an ultrafiltration membrane to obtain monodisperse cerium oxide-based hollow fine particles (RP) having a solid concentration of 20% by weight. -1) Aqueous dispersion. The cerium oxide-based hollow fine particles (RP-1) in the aqueous dispersion are neither chained nor aggregated.

附透明被膜之基材(RA-1)的製造Manufacture of substrate (RA-1) with transparent film

於實施例1中,除了使用固體成分濃度20重量%的氧化矽系中空微粒子(RP-1)之水分散液以外,同樣地得到塗佈液及透明被膜之膜厚為100nm的附透明被膜之基材(RA-1)。In the same manner as in Example 1, except that an aqueous dispersion of cerium oxide-based hollow fine particles (RP-1) having a solid concentration of 20% by weight was used, a transparent coating film having a thickness of 100 nm of the coating liquid and the transparent coating was obtained in the same manner. Substrate (RA-1).

比較例2Comparative example 2 鏈狀氧化矽系中空微粒子(RP-2)之調製Modulation of chain cerium oxide hollow microparticles (RP-2)

於實施例1中,除了混合140克當作電解質的濃度10重量%之Ca(NO3 )2 水溶液以外,同樣地實施步驟(c)。此時,由於得到凝聚粒子,故以後的步驟不實施。In the first embodiment, the step (c) was carried out in the same manner except that 140 g of a Ca(NO 3 ) 2 aqueous solution having a concentration of 10% by weight as an electrolyte was mixed. At this time, since the aggregated particles are obtained, the subsequent steps are not carried out.

比較例3Comparative example 3 鏈狀氧化矽系中空微粒子(RP-3)之調製Modulation of chain cerium oxide hollow microparticles (RP-3)

於實施例1中,除了混合0.1克當作電解質的濃度10重量%之Ca(NO3 )2 水溶液以外,同樣地得到固體成分濃度20重量%的鏈狀氧化矽系中空微粒子(RP-3)之水分散液。然而,多為與比較例1同樣的單分散之氧化矽系中空微粒子。對於一部分的鏈狀氧化矽系中空微粒子(RP-3),與實施例1同樣地測定物性,表1中顯示結果。In the same manner as in Example 1, except that 0.1 g of a Ca(NO 3 ) 2 aqueous solution having a concentration of 10% by weight as an electrolyte was mixed, a chain cerium oxide-based hollow fine particle (RP-3) having a solid concentration of 20% by weight was obtained in the same manner. Water dispersion. However, most of them are monodisperse cerium oxide-based hollow fine particles similar to those of Comparative Example 1. The physical properties of the chain cerium oxide-based hollow fine particles (RP-3) were measured in the same manner as in Example 1, and the results are shown in Table 1.

附透明被膜之基材(RA-3)的製造Manufacture of substrate (RA-3) with transparent film

於實施例1中,除了使用固體成分濃度20重量%的鏈狀氧化矽系中空微粒子(RP-3)之水分散液以外,同樣地得到塗佈液及透明被膜之膜厚為100nm的附透明被膜之基材(RA-3)。In the same manner as in Example 1, except that an aqueous dispersion of chain cerium oxide-based hollow fine particles (RP-3) having a solid concentration of 20% by weight was used, a coating liquid and a transparent film having a thickness of 100 nm were obtained in the same manner. The substrate of the film (RA-3).

比較例4Comparative example 4 附透明被膜之基材(RA-4)的製造Manufacture of substrate with transparent film (RA-4)

對氧化矽溶膠(日揮觸媒化成(股)製:Cataloid-SI-45P,平均粒徑45nm,SiO2 濃度40重量%),使用超濾膜,以乙醇置換溶劑,而調製固體成分濃度5重量%的氧化矽有機溶膠。For cerium oxide sol (made by Catalyst-Chemical Co., Ltd.: Cataloid-SI-45P, average particle size: 45 nm, SiO 2 concentration: 40% by weight), an ultrafiltration membrane was used, and the solvent was replaced with ethanol to prepare a solid concentration of 5 parts by weight. % of cerium oxide organosol.

充分混合50克固體成分濃度5重量%的氧化矽有機溶膠、3克丙烯酸樹脂(Hitaroid 1007,日立化成(股)製)及47克異丙醇與正丁醇的1/1(重量比)混合溶劑,以調製塗佈液。50 g of a cerium oxide organosol having a solid concentration of 5 wt%, 3 g of an acrylic resin (Hitaroid 1007, manufactured by Hitachi Chemical Co., Ltd.), and 47 g of isopropanol mixed with 1/1 (by weight) of n-butanol were thoroughly mixed. Solvent to prepare a coating solution.

以桿塗法將此塗佈液塗佈在PET薄膜上,於80℃使乾燥1分鐘,而得到透明被膜之膜厚為100nm的附透明被膜之基材(RA-4)。This coating liquid was applied onto a PET film by a bar coating method, and dried at 80 ° C for 1 minute to obtain a transparent film-attached substrate (RA-4) having a transparent film thickness of 100 nm.

圖1係本發明的鏈狀氧化矽系中空微粒子之截面的模型圖。Fig. 1 is a model diagram showing a cross section of a chain-like cerium oxide-based hollow fine particle of the present invention.

Claims (12)

一種鏈狀氧化矽系中空微粒子,其係在外部具有外殼、在內部具有空洞的氧化矽系中空微粒子(一次粒子)以鏈狀連結之形狀的鏈狀氧化矽系中空微粒子,其特徵為具有連結之氧化矽系中空微粒子的空洞互相貫通的貫通孔,平均長度(L)在20~1500nm之範圍,平均寬幅(W)在10~300nm之範圍,折射率在1.10~1.35之範圍,前述貫通孔的平均直徑(Ds )與前述平均寬幅(W)之比(Ds )/(W)在0.1~0.9之範圍。A chain-shaped yttria-based hollow fine particle which is a chain-shaped yttria-based hollow fine particle having a shell and a ruthenium-based hollow fine particle (primary particle) having a cavity inside and having a chain shape, and is characterized by a link The through-holes of the yttrium oxide-based hollow microparticles have a mean length (L) in the range of 20 to 1500 nm, an average width (W) in the range of 10 to 300 nm, and a refractive index in the range of 1.10 to 1.35. The ratio of the average diameter (D s ) of the pores to the aforementioned average width (W) (D s )/(W) is in the range of 0.1 to 0.9. 如申請專利範圍第1項之鏈狀氧化矽系中空微粒子,其中前述外殼的厚度(Ts )在2~100nm之範圍,與前述平均寬幅(W)之比(Ts )/(W)在0.05~0.30之範圍。The chain cerium oxide hollow fine particles according to claim 1, wherein the thickness (T s ) of the outer shell is in the range of 2 to 100 nm, and the ratio of the average width (W) (T s ) / (W) In the range of 0.05~0.30. 如申請專利範圍第1或2項之鏈狀氧化矽系中空微粒子,前述鏈狀氧化矽系中空微粒子係由氧化矽與氧化矽以外的無機氧化物所構成,當以MOx 表示氧化矽以外的無機氧化物時,其莫耳比(MOx /SiO2 )在0.0001~0.2之範圍,此處,MOx 中M表示與氧原子產生無機氧化物之元素、x 表示氧之原子數,且於鏈狀氧化矽系中空微粒子中,氧化矽以外的無機氧化物,可舉出Al2 O3 、B2 O3 、TiO2 、ZrO2 、SnO2 、Ce2 O3 、P2 O5 、Sb2 O3 、MoO3 、ZnO2 、WO3 等的1種或2種以上。The chain-shaped yttria-based hollow fine particles according to the first or second aspect of the patent application, wherein the chain-shaped yttria-based hollow fine particles are composed of an inorganic oxide other than cerium oxide and cerium oxide, and other than cerium oxide represented by MO x In the case of an inorganic oxide, the molar ratio (MO x /SiO 2 ) is in the range of 0.0001 to 0.2, where M in the MO x represents an element which produces an inorganic oxide with an oxygen atom, and x represents the atomic number of oxygen, and Among the chain cerium oxide-based hollow fine particles, examples of the inorganic oxide other than cerium oxide include Al 2 O 3 , B 2 O 3 , TiO 2 , ZrO 2 , SnO 2 , Ce 2 O 3 , P 2 O 5 , and Sb. 1 or 2 or more of 2 O 3 , MoO 3 , ZnO 2 , and WO 3 . 一種鏈狀氧化矽系中空微粒子之製造方法,其特 徵係包含下述步驟(a)~(f),(a)鹼水溶液中,或固體成分濃度在於0.01~2重量%之範圍的種粒子分散的鹼水溶液中,將矽酸鹽的水溶液及酸性矽酸液的至少一種與鹼可溶的無機化合物水溶液同時添加,而調製莫耳比A(=MOx /SiO2 ,當以SiO2 表示氧化矽,以MOx 表示氧化矽以外的無機氧化物時)在0.1~2的範圍之複合氧化物的一次粒子分散液之步驟,(此處,MOx 中M表示與氧原子產生無機氧化物之元素、x 表示氧之原子數),與(b)洗淨前述一次粒子分散液之步驟,與(c)將洗淨後的一次粒子分散液,在電解質的存在下,於50~300℃進行水熱處理,而調製前述複合氧化物的一次粒子鏈狀連結之鏈狀複合氧化物粒子分散液之步驟,與(d)於前述鏈狀複合氧化物粒子表面設置氧化矽被覆層或氧化矽.氧化鋁被覆層,而調製附被覆層的鏈狀複合氧化物粒子分散液之步驟,與(e)於前述附被覆層的鏈狀複合氧化物粒子分散液中添加酸,去除構成該前述複合氧化物的一次粒子之矽以外的元素之至少一部分,而製作鏈狀氧化矽系中空微粒子分散液之步驟,與(f)洗淨前述鏈狀氧化矽系中空微粒子分散液之步驟。A method for producing a chain-like cerium oxide-based hollow fine particle, comprising the following steps (a) to (f), (a) dispersing a seed particle in an aqueous alkali solution or a solid concentration in a range of 0.01 to 2% by weight; In the aqueous alkali solution, at least one of an aqueous solution of a citrate and an acidic citric acid solution is simultaneously added with an aqueous solution of an alkali-soluble inorganic compound to prepare a molar ratio A (=MO x /SiO 2 , when oxidized by SiO 2矽, when MO x represents an inorganic oxide other than cerium oxide) a step of a primary particle dispersion of a composite oxide in the range of 0.1 to 2 (wherein M in the MO x represents an inorganic oxide with an oxygen atom) The element, x represents the atomic number of oxygen, and (b) the step of washing the primary particle dispersion, and (c) the washed primary particle dispersion in the presence of an electrolyte at 50 to 300 ° C. And hydrothermal treatment to prepare a step of the primary particle chain-connected chain-like composite oxide particle dispersion of the composite oxide, and (d) providing a cerium oxide coating layer or cerium oxide on the surface of the chain-like composite oxide particle. a step of preparing a coating layer of the chain-like composite oxide particles with a coating layer on the alumina coating layer, and adding an acid to the dispersion liquid of the chain-like composite oxide particles having the coating layer, and removing the composite oxidation The step of producing a chain-shaped cerium oxide-based hollow fine particle dispersion liquid and at least (f) washing the chain-shaped cerium oxide-based hollow fine particle dispersion liquid, at least a part of the elements other than the primary particles of the material. 如申請專利範圍第4項之鏈狀氧化矽系中空微粒 子之製造方法,其中前述步驟(c)中作為前述電解質添加鹼土類金屬鹽。 Chain oxidized cerium hollow particles as claimed in item 4 of the patent application A method for producing a sub-organic metal salt as the electrolyte in the step (c). 如申請專利範圍第4項之鏈狀氧化矽系中空微粒子之製造方法,其中具備在前述步驟(f)之後,接著實施下述步驟(g):(g)將前述鏈狀氧化矽系中空微粒子分散液,在50~300℃之範圍進行水熱處理之步驟。 The method for producing a chain cerium oxide-based hollow fine particle according to the fourth aspect of the invention, wherein the step (f) is followed by the following step (g): (g) the chain-shaped cerium oxide-based hollow fine particles The dispersion is subjected to a hydrothermal treatment step in the range of 50 to 300 °C. 如申請專利範圍第4項之鏈狀氧化矽系中空微粒子之製造方法,其中前述步驟(e)中前述矽以外的元素被去除至莫耳比A(=MOx/SiO2 )成為在於0.0001~0.2的範圍為止。The method for producing a chain yttria-based hollow fine particle according to the fourth aspect of the invention, wherein the element other than the foregoing lanthanum in the step (e) is removed to a molar ratio A (=MOx/SiO 2 ) to be 0.0001 to 0.2. The scope is up to now. 如申請專利範圍第4~7項中任一項之鏈狀氧化矽系中空微粒子之製造方法,其中前述步驟(d)中於前述步驟(c)所得之鏈狀複合氧化物粒子分散液中,添加鹼水溶液與下述以化學式(1)所示的有機矽化合物及/或其部分水解物,在前述鏈狀複合氧化物粒子上形成氧化矽被覆層之步驟,Rn SiX(4-n) ‧‧‧(1)〔惟,R:碳數1~10之非取代或取代烴基、丙烯醯基、環氧基、甲基丙烯醯基、胺基或CF3 基;X:碳數1~4之烷氧基、矽烷醇基、鹵素或氫;n:0~3的整數〕。The method for producing a chain-like cerium oxide-based hollow fine particle according to any one of the items (4), wherein in the step (d), the chain-like composite oxide particle dispersion obtained in the step (c), a step of forming an cerium oxide coating layer on the chain-like composite oxide particles by adding an aqueous alkali solution and an organic hydrazine compound represented by the following chemical formula (1) and/or a partial hydrolyzate thereof, R n SiX (4-n) ‧‧‧(1) [R, R: an unsubstituted or substituted hydrocarbon group having 1 to 10 carbon atoms, an alkylene group, an epoxy group, a methacryl group, an amine group or a CF 3 group; X: a carbon number of 1~ Alkoxy, stanol, halogen or hydrogen; n: an integer from 0 to 3. 如申請專利範圍第4~7項中任一項之鏈狀氧化矽系中空微粒子之製造方法,其中前述步驟(d)中於前述步驟(c)所得之鏈狀複合氧化物粒子分散液中,添加鹼 水溶液與酸性矽酸液,在前述鏈狀複合氧化物粒子上形成氧化矽被覆層之步驟。 The method for producing a chain-like cerium oxide-based hollow fine particle according to any one of the items (4), wherein in the step (d), the chain-like composite oxide particle dispersion obtained in the step (c), Adding alkali The aqueous solution and the acidic citric acid solution form a ruthenium oxide coating layer on the chain-like composite oxide particles. 如申請專利範圍第4~7項中任一項之鏈狀氧化矽系中空微粒子之製造方法,其中前述步驟(d)中於前述步驟(c)所得之鏈狀複合氧化物粒子分散液中,添加矽酸鹼水溶液與鋁酸水溶液,在前述鏈狀複合氧化物粒子上形成氧化矽.氧化鋁被覆層之步驟。 The method for producing a chain-like cerium oxide-based hollow fine particle according to any one of the items (4), wherein in the step (d), the chain-like composite oxide particle dispersion obtained in the step (c), Adding an aqueous solution of citric acid and an aqueous solution of aluminate to form cerium oxide on the aforementioned chain-like composite oxide particles. The step of coating the alumina. 一種透明被膜形成用塗佈液,其特徵為含有如申請專利範圍第1項之鏈狀氧化矽系中空微粒子與基質形成成分所成。 A coating liquid for forming a transparent film, which comprises the chain-like cerium oxide-based hollow fine particles of the first aspect of the patent application and a matrix-forming component. 一種附透明被膜之基材,其特徵為用申請專利範圍第11項之透明被膜形成用塗佈液所形成的透明被膜,係單獨或與其它被膜一起形成於基材表面上。 A substrate comprising a transparent film, which is characterized in that the transparent film formed by the coating liquid for forming a transparent film of claim 11 is formed on the surface of the substrate alone or together with another film.
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