TWI467092B - Vacuum pumping device - Google Patents
Vacuum pumping device Download PDFInfo
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- TWI467092B TWI467092B TW98130464A TW98130464A TWI467092B TW I467092 B TWI467092 B TW I467092B TW 98130464 A TW98130464 A TW 98130464A TW 98130464 A TW98130464 A TW 98130464A TW I467092 B TWI467092 B TW I467092B
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
- F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
- F04B37/16—Means for nullifying unswept space
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
- F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B39/00—Component parts, details, or accessories, of pumps or pumping systems specially adapted for elastic fluids, not otherwise provided for in, or of interest apart from, groups F04B25/00 - F04B37/00
- F04B39/10—Adaptations or arrangements of distribution members
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B41/00—Pumping installations or systems specially adapted for elastic fluids
- F04B41/06—Combinations of two or more pumps
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Applications Or Details Of Rotary Compressors (AREA)
- Compressor (AREA)
Description
本發明係關於將輔助泵串聯連接至主泵之真空排氣裝置,特別是關於可謀求排氣速度提高之真空排氣裝置。The present invention relates to a vacuum exhaust apparatus in which an auxiliary pump is connected in series to a main pump, and more particularly to a vacuum exhaust apparatus which can improve an exhaust speed.
本申請案係基於2008年9月10日在日本申請之特願2008-232324號主張優先權並在此處引用其內容。The present application claims priority on Japanese Patent Application No. 2008-232324, filed on Sep.
作為排氣至中真空之先前之真空排氣裝置的一種,已有將作為主泵發揮功能之機械增壓泵(以下稱為MBP)及作為輔助泵發揮功能之乾式真空泵串聯連接者(例如參照專利文獻1)。As one of the prior vacuum evacuation devices for exhausting to medium vacuum, a mechanical booster pump (hereinafter referred to as MBP) functioning as a main pump and a dry vacuum pump connected as an auxiliary pump have been connected in series (for example, Patent Document 1).
在此種真空排氣裝置中,由於到達目標真空度是其主要目標,故使初段之MBP之排氣量設為大於第2段之DRP之排氣量。具體而言,主泵之排氣量係設定為輔助泵之排氣量的5倍~10倍。藉此,在中真空區域中,藉由DRP之輔助排氣,可充分發揮MBP之排氣性能。In such a vacuum exhaust device, since the target vacuum degree is the main target, the exhaust amount of the MBP in the first stage is set to be larger than the DRP amount in the second stage. Specifically, the displacement of the main pump is set to be 5 to 10 times the displacement of the auxiliary pump. Thereby, in the medium vacuum region, the exhaust performance of the MBP can be fully utilized by the auxiliary exhaust of the DRP.
再者,在該種真空排氣裝置中,在開始進行大氣壓之真空室之真空排氣時,雖開放設置於真空室與MBP之吸氣配管之中途之閘閥,但在其瞬間源自真空室之壓力會成為衝擊波而傳播,並對MBP造成衝擊。因此,對於MBP乃要求其具有可耐受該衝擊之機械之強度。In addition, in the vacuum evacuation device, when the vacuum chamber of the atmospheric pressure vacuum chamber is started, the gate valve provided in the middle of the vacuum chamber and the suction pipe of the MBP is opened, but the vacuum chamber is instantaneously generated. The pressure will spread as a shock wave and cause an impact on the MBP. Therefore, it is required for MBP to have the strength of a machine that can withstand the impact.
作為緩和真空室開放時之過渡性衝擊為目的之先前技術之一例,已有在MBP與DRP之間之配管之中途,配置如緩衝槽般之槽,用於釋放衝擊壓力,而緩和過渡性壓力變化之構成者(例如參照專利文獻1)。As an example of the prior art for mitigating the transient impact when the vacuum chamber is opened, a groove such as a buffer tank is disposed in the middle of the piping between the MBP and the DRP for releasing the impact pressure and mitigating the transient pressure. The component of the change (for example, refer to Patent Document 1).
又,作為以緩和上述過渡性衝擊為目的之其他之先前技術之一例,有:設置有用於從主泵之排氣側回到主泵之吸氣側之旁通管者,或設置有用於將特定氣壓以上之氣體從主泵排氣側輸送至輔助泵之排氣側之旁通管者(例如參照專利文獻1)。Further, as another example of the prior art for mitigating the transitional impact, there is provided a bypass pipe for returning from the exhaust side of the main pump to the intake side of the main pump, or provided for A gas having a pressure higher than a specific pressure is supplied from the exhaust side of the main pump to the bypass side of the exhaust side of the auxiliary pump (see, for example, Patent Document 1).
[專利文獻1]日本特開2007-127048號公報[Patent Document 1] Japanese Patent Laid-Open Publication No. 2007-127048
如液晶製造裝置之加載室(以下稱為LC),在使用真空排氣裝置以使從大氣壓至中真空區域反覆排氣之情況下,為提高生產性,以到達目標真空度之到達時間為其性能之指標之一。因此,在該真空排氣裝置中,中真空區域自不待言,在低真空區域及大氣附近之減壓區域亦被要求具有高排氣特性。For example, in the loading chamber of the liquid crystal manufacturing apparatus (hereinafter referred to as LC), when the vacuum exhausting device is used to repeatedly exhaust the air from the atmospheric pressure to the medium vacuum region, in order to improve the productivity, the arrival time of the target vacuum degree is One of the indicators of performance. Therefore, in the vacuum evacuation device, the medium vacuum region is self-evident, and the decompression region in the low vacuum region and the vicinity of the atmosphere is also required to have high exhaust gas characteristics.
然而,MBP與DRP係串聯配置,在初段之MBP之排氣能力大於第2段之DRP之排氣能力之上述先前之真空排氣裝置中,從MBP所排出之氣體必須通過DRP。因此,在大氣壓附近之減壓區域及低真空區域中,MBP之排氣性能乃受到DRP之排氣性能所制約,而使MBP之排氣壓比進氣壓更高。因此造成MBP進行不必要之壓縮工作而使其轉數明顯下降。其結果為,MBP作為鼓風機之效果無法充分發揮。However, MBP and DRP are arranged in series, and in the above-mentioned prior vacuum exhaust apparatus in which the exhaust capacity of the initial stage MBP is greater than the exhaust capacity of the DRP of the second stage, the gas discharged from the MBP must pass through the DRP. Therefore, in the decompression zone and the low vacuum zone near atmospheric pressure, the exhaust performance of the MBP is restricted by the exhaust performance of the DRP, and the exhaust pressure of the MBP is higher than the intake pressure. As a result, MBP performs unnecessary compression work and its number of revolutions decreases significantly. As a result, the effect of MBP as a blower cannot be fully exerted.
本發明係為解決上述之先前之問題而開發完成者,其目的係提供一種可在無需將主泵及輔助泵之結構大幅度地變更下,將到達目標真空度之排氣時間縮短之真空排氣裝置。The present invention has been developed to solve the above-mentioned problems, and an object thereof is to provide a vacuum discharge which can shorten the exhaust time to reach a target degree of vacuum without greatly changing the structure of the main pump and the auxiliary pump. Gas device.
本發明採用以下之手段以達成上述之目的。即,本發明之一態樣之真空排氣裝置具備:主泵;與上述主泵以串聯而連接之輔助泵;及連接上述主泵之排氣口與上述輔助泵之進氣口之間之泵間配管;且上述主泵包含機械增壓泵;上述主泵之馬達之最大動力對上述主泵之最大排氣速度之比率為5W/(m3 /h)以上;在上述泵間配管中設有從其中途分歧之分歧配管;在上述分歧配管之中途,設有使上述泵間配管內之氣體逸出而防止其逆流之止回閥。The present invention employs the following means to achieve the above objects. That is, a vacuum exhaust apparatus according to an aspect of the present invention includes: a main pump; an auxiliary pump connected in series with the main pump; and an exhaust port connecting the main pump and an intake port of the auxiliary pump The pump is connected between the pumps; and the main pump includes a mechanical booster pump; the ratio of the maximum power of the motor of the main pump to the maximum exhaust velocity of the main pump is 5 W/(m 3 /h) or more; There is a branch pipe that is different from the middle of the pipe, and a check valve that allows the gas in the pipe between the pumps to escape and prevent it from flowing back is provided in the middle of the above-mentioned branch pipe.
上述主泵亦可包含並聯配置之複數之上述機械增壓泵。The main pump may also include a plurality of the above-described mechanical booster pumps arranged in parallel.
又,上述分歧配管亦可終端連接於上述輔助泵之排氣配管。Further, the branch pipe may be connected to the exhaust pipe of the auxiliary pump at the end.
再者,在大氣壓下運轉上述主泵時,上述止回閥之氣體流量之壓力損失為10000Pa以下為佳。Further, when the main pump is operated at atmospheric pressure, the pressure loss of the gas flow rate of the check valve is preferably 10000 Pa or less.
根據上述本發明之一態樣,藉由將主泵之馬達設為大輸出功率並設置止回閥及分歧配管,則即使在大氣壓附近,主泵之排氣速度也不會被輔助泵之排氣速度制約,從而可使大氣壓附近及低真空區域之排氣速度提高。其結果為,無需大幅度變更主泵及輔助泵之結構,即可縮短到達目標真空度之排氣時間。According to the above aspect of the present invention, by setting the motor of the main pump to a large output power and providing a check valve and a branch pipe, the exhaust speed of the main pump is not blocked by the auxiliary pump even near atmospheric pressure. The gas velocity is restricted so that the exhaust velocity in the vicinity of the atmospheric pressure and in the low vacuum region can be increased. As a result, the exhaust time to reach the target degree of vacuum can be shortened without significantly changing the structure of the main pump and the auxiliary pump.
以下,參照圖式詳細說明本發明之實施形態。再者,本發明不限定於此,在不脫離本發明之主旨之範圍中可進行各種之變更。Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. It is to be understood that the invention is not limited thereto, and various modifications may be made without departing from the spirit and scope of the invention.
圖1係說明本發明之實施形態1之真空排氣裝置之結構的模式圖。該實施形態1之真空排氣裝置100具備主泵1;輔助泵2;及止回閥3。Fig. 1 is a schematic view showing the configuration of a vacuum exhausting apparatus according to a first embodiment of the present invention. The vacuum exhaust apparatus 100 of the first embodiment includes a main pump 1, an auxiliary pump 2, and a check valve 3.
真空室20係例如構成半導體製造裝置等之處理室或搬送室,藉由真空排氣裝置100予以真空排氣。此處,真空室20為液晶製造裝置之載入真空室(以下稱為LC)The vacuum chamber 20 is, for example, a processing chamber or a transfer chamber that constitutes a semiconductor manufacturing device, and is evacuated by the vacuum exhaust device 100. Here, the vacuum chamber 20 is a loading vacuum chamber of a liquid crystal manufacturing apparatus (hereinafter referred to as LC).
閘閥30係設置於連接LC20之排氣口與MBP1之進氣口之配管(吸入配管)40之中途。該閘閥30係在藉由真空排氣裝置開始將開放於大氣壓之LC20進行排氣時打開,在將已真空排氣之LC20開放於大氣壓時關閉。The gate valve 30 is provided in the middle of a pipe (suction pipe) 40 that connects the exhaust port of the LC 20 and the intake port of the MBP 1. The gate valve 30 is opened when the LC 20 that is open to atmospheric pressure is started to be exhausted by the vacuum exhaust device, and is closed when the vacuum exhausted LC 20 is opened to atmospheric pressure.
在真空排氣裝置100中,主泵1及輔助泵2係藉由連接主泵1之排氣口與輔助泵2之進氣口之配管(泵間配管)50予以串聯連接。輔助泵2之排氣口係藉由配管(排氣配管)60而予以連接。In the vacuum exhaust apparatus 100, the main pump 1 and the auxiliary pump 2 are connected in series by a piping (pump piping) 50 that connects the exhaust port of the main pump 1 and the intake port of the auxiliary pump 2. The exhaust port of the auxiliary pump 2 is connected by a pipe (exhaust pipe) 60.
如此,在真空排氣裝置100中,主泵1及輔助泵2以串聯而連接。又,在LC20之排氣口經由閘閥30而直接連接之初段之泵為主泵,配置於該主泵之排氣口側之第2段之泵為輔助泵。此處,主泵1為機械增壓泵(以下稱為MBP)。又,輔助泵2為乾式真空泵(以下稱為DRP)。再者,主泵1不只限於藉由1個(1段)之MBP而構成,亦可藉由稱為多功能增壓泵之2段之MBP而構成,或藉由複數段之MBP而構成等。As described above, in the vacuum exhaust apparatus 100, the main pump 1 and the auxiliary pump 2 are connected in series. Further, the pump of the first stage directly connected to the exhaust port of the LC 20 via the gate valve 30 is the main pump, and the pump of the second stage disposed on the exhaust port side of the main pump is the auxiliary pump. Here, the main pump 1 is a mechanical booster pump (hereinafter referred to as MBP). Further, the auxiliary pump 2 is a dry vacuum pump (hereinafter referred to as DRP). Furthermore, the main pump 1 is not limited to being constituted by one (1 segment) MBP, and may be constituted by two stages of MBP called a multi-function booster pump, or by a plurality of MBPs. .
MBP1係一種在構成先前之真空排氣裝置之MBP中,無需變更泵部即可將其馬達之輸出功率增大之泵。先前裝置之MBP之上述馬達之最大動力(單位:W)對最大排氣速度(單位:m3 /h)之比率為不足5W/(m3 /h)(例如,10000(W)/3600(m3 /h)=2.77),但在本實施形態之MBP1中,上述之比率為5W/(m3 /h)以上,(例如30000(W)/3600(m3 /h)=8.33)。再者,MBP之排氣速度係在中真空區域中(例如進氣壓力為13Pa時)為最大。MBP1 is a pump that increases the output power of its motor without changing the pump unit in the MBP that constitutes the previous vacuum exhaust unit. The ratio of the maximum power (unit: W) of the above-mentioned motor of the MBP of the previous device to the maximum exhaust velocity (unit: m 3 /h) is less than 5 W/(m 3 /h) (for example, 10000 (W) / 3600 ( m 3 /h)=2.77), but in the MBP1 of the present embodiment, the above ratio is 5 W/(m 3 /h) or more (for example, 30,000 (W) / 3600 (m 3 /h) = 8.33). Furthermore, the exhaust velocity of the MBP is maximized in the medium vacuum region (for example, when the intake pressure is 13 Pa).
又,在該真空排氣裝置100設有從泵間配管50分歧,且終端連接於DRP2之排氣配管60之配管(分歧配管)70。在該配管70之中途設有止回閥3。In addition, the vacuum exhaust apparatus 100 is provided with a pipe (dividing pipe) 70 that is branched from the pump pipe 50 and is connected to the exhaust pipe 60 of the DRP 2. A check valve 3 is provided in the middle of the pipe 70.
當止回閥3在泵間配管50內之壓力變成高於排氣配管60內之壓力時,可使泵間配管50內之氣體逸出至排氣配管60,防止排氣配管60內之氣體逆流至泵間配管50。該止回閥3宜具有即使在大氣壓下運轉MBP1亦不會產生壓力損失之充分的容量。例如,在大氣壓下運轉MBP1時,在大氣壓下的止回閥3之氣體流量的壓力損失為10000Pa以下為佳。When the pressure in the pump pipe 50 becomes higher than the pressure in the exhaust pipe 60, the gas in the pump pipe 50 can escape to the exhaust pipe 60, and the gas in the exhaust pipe 60 can be prevented. Countercurrent to the pump piping 50. The check valve 3 preferably has a sufficient capacity that does not cause a pressure loss even when the MBP1 is operated at atmospheric pressure. For example, when the MBP1 is operated at atmospheric pressure, the pressure loss of the gas flow rate of the check valve 3 at atmospheric pressure is preferably 10000 Pa or less.
根據本實施形態之真空排氣裝置,藉由採用具大輸出功率之馬達之MBP1,可重點改善在低真空區域之排氣性能。由於在大氣壓附近沒有必要利用MBP進行壓縮,故MBP單體之排氣速度大於DRP單體之排氣速度。但,由於在將MBP與DRP串聯連接之結構中,在大氣壓附近及低真空區域,MBP之排氣壓會高於進氣壓,故MBP之排氣速度受到DRP之排氣速度制約,而使MBP之轉數下降。藉由將MBP1之馬達設為大輸出功率馬達,可重點抑制低真空區域之轉數之下降,且可改善排氣速度。According to the vacuum exhaust apparatus of the present embodiment, the exhaust performance in the low vacuum region can be improved by using the MBP1 of the motor having a large output. Since it is not necessary to use MBP for compression near atmospheric pressure, the exhaust velocity of the MBP monomer is greater than the exhaust velocity of the DRP monomer. However, in the structure in which the MBP and the DRP are connected in series, the exhaust pressure of the MBP is higher than the intake pressure in the vicinity of the atmospheric pressure and the low vacuum region, so the exhaust velocity of the MBP is restricted by the exhaust velocity of the DRP, and the MBP is made. The number of revolutions has dropped. By setting the motor of the MBP1 as a large output power motor, it is possible to suppress the decrease in the number of revolutions in the low vacuum region and to improve the exhaust speed.
再者,由於在本實施形態之真空排氣裝置中,設置有止回閥3及分歧配管70,故可改善在大氣壓附近之排氣特性。藉由配置壓力損失少的止回閥3,在低真空區域及大氣壓附近,當MBP1之排氣壓力(泵間配管50內之壓力)上升時,使泵間配管50內之氣體逸出至排氣配管60,可抑制MBP1之排氣壓力。藉此,可將MBP1作為鼓風機有效地利用,其結果,便不受DRP2之排氣性能制約。在止回閥3之壓力損失越小其效果就越明顯。Further, in the vacuum evacuation device of the present embodiment, the check valve 3 and the branch pipe 70 are provided, so that the exhaust gas characteristics in the vicinity of the atmospheric pressure can be improved. By arranging the check valve 3 having a small pressure loss, when the exhaust pressure of the MBP1 (the pressure in the pump piping 50) rises in the low vacuum region and the atmospheric pressure, the gas in the pump pipe 50 escapes to the discharge. The gas piping 60 can suppress the exhaust pressure of MBP1. Thereby, MBP1 can be effectively utilized as a blower, and as a result, it is not restricted by the exhaust performance of DRP2. The smaller the pressure loss of the check valve 3, the more pronounced the effect.
如此,在本實施形態之真空排氣裝置中,藉由採用具大輸出功率之馬達之MBP1,並設置止回閥3及分歧配管7,可改善在低真空區域及大氣壓附近之排氣速度,其結果,可縮短LC20之排氣時間。As described above, in the vacuum exhaust apparatus of the present embodiment, by using the MBP1 of the motor having a large output power and providing the check valve 3 and the branch pipe 7, the exhaust speed in the low vacuum region and the atmospheric pressure can be improved. As a result, the exhaust time of the LC 20 can be shortened.
再者,藉由設置止回閥3及分歧配管70,當為了開始進行大氣壓之LC20之真空排氣而開放閘閥30時,源自LC20之壓力衝擊波會經由止回閥3逸出,故可緩和MBP1所受到之衝擊。藉此,MBP1不易受強度設計之制約,可進一步提高MBP1之耐久性。Further, by providing the check valve 3 and the branch pipe 70, when the gate valve 30 is opened to evacuate the vacuum of the LC20 at atmospheric pressure, the pressure shock wave originating from the LC 20 escapes through the check valve 3, so that the pressure can be alleviated. The impact of MBP1. Therefore, MBP1 is not easily restricted by the strength design, and the durability of MBP1 can be further improved.
圖2係說明比較例1之真空排氣裝置之結構之模式圖,對與圖1同樣之構件附有相同之符號。在該比較例1之真空排氣裝置101中,串聯配置有MBP11與DRP2。MBP11具有與實施形態1之MBP1同樣之泵部,及相較於MBP1為低輸出功率之馬達。即,MBP11之馬達的最大動力(單位:W)對最大排氣速度之比率不足5W/(m3/h)。Fig. 2 is a schematic view showing the structure of a vacuum exhausting apparatus of Comparative Example 1, and the same members as those in Fig. 1 are denoted by the same reference numerals. In the vacuum exhaust apparatus 101 of Comparative Example 1, MBP11 and DRP2 are arranged in series. The MBP 11 has the same pump unit as the MBP1 of the first embodiment, and a motor having a lower output power than the MBP1. That is, the ratio of the maximum power (unit: W) of the motor of the MBP 11 to the maximum exhaust speed is less than 5 W/(m3/h).
圖3係說明比較例2之真空排氣裝置之結構之模式圖,對與圖1同樣之構件附有相同之符號。在該比較例2之真空排氣裝置102中,串聯配置有MBP1與DRP2。即,比較例2之真空排氣裝置102係在實施形態1之真空排氣裝置100(參照圖1)中未設置止回閥3及分歧管70之結構,且在比較例1之真空排氣裝置101(參照圖2)中,將MBP11變更成MBP1者。Fig. 3 is a schematic view showing the structure of a vacuum exhausting apparatus of Comparative Example 2, and the same members as those in Fig. 1 are denoted by the same reference numerals. In the vacuum exhaust apparatus 102 of Comparative Example 2, MBP1 and DRP2 are arranged in series. In other words, the vacuum exhaust device 102 of the second embodiment is configured such that the check valve 3 and the branch pipe 70 are not provided in the vacuum exhaust device 100 (see FIG. 1) of the first embodiment, and the vacuum exhaust gas of the comparative example 1 is used. In the device 101 (see FIG. 2), the MBP 11 is changed to MBP1.
圖4A及4B係說明本發明之實施形態1及比較例1、2之真空排氣裝置之排氣特性。具體而言,圖4A係DRP2單體以及實施形態1及比較例1、2之真空排氣裝置之排氣速度特性(排氣性能),圖4B係實施形態1及比較例1、2之LC20之壓力特性(LC20之壓力推移)。在該等圖4A及4B中,A係大氣壓A1及大氣壓附近之減壓區域(大氣壓附近區域)、B係低真空區域,C係中真空區域。又,a1係表示DRP2單體之特性,b1及b2係表示比較例1之真空排氣裝置101之特性,c1及c2係表示比較例2之真空排氣裝置102之特性,且d1及d2係表示實施形態1之真空排氣裝置100之特性。4A and 4B are views showing the exhaust characteristics of the vacuum exhaust apparatus according to the first embodiment and the comparative examples 1 and 2 of the present invention. Specifically, FIG. 4A is an exhaust gas velocity characteristic (exhaust performance) of the DRP2 monomer and the vacuum exhaust apparatus of the first embodiment and the first and second comparative examples, and FIG. 4B is an LC20 of the first embodiment and the comparative examples 1 and 2. Pressure characteristics (pressure transition of LC20). In FIGS. 4A and 4B, A is an atmospheric pressure A1, a pressure reduction region near the atmospheric pressure (a region near atmospheric pressure), a B-system low vacuum region, and a C-system vacuum region. Further, a1 indicates the characteristics of the DRP2 monomer, b1 and b2 indicate the characteristics of the vacuum exhaust device 101 of Comparative Example 1, and c1 and c2 indicate the characteristics of the vacuum exhaust device 102 of Comparative Example 2, and d1 and d2 are The characteristics of the vacuum exhaust apparatus 100 of the first embodiment are shown.
例如,區域A係從101300Pa(大氣壓A1)至30000Pa之範圍,低真空區域B係從30000Pa至1330Pa之範圍,中真空區域C係1330Pa以下之範圍。For example, the region A is in the range of 101,300 Pa (atmospheric pressure A1) to 30,000 Pa, the low vacuum region B is in the range of 30,000 Pa to 1,330 Pa, and the medium vacuum region C is in the range of 1,330 Pa or less.
如圖4A之特性曲線a1所示,DRP2單體之排氣速度在大氣壓附近區域A及低真空區域B中係大致固定,即使進一步進入中真空區域C亦保持固定,但隨著接近目標到達真空度則逐漸下降。As shown in the characteristic curve a1 of FIG. 4A, the exhaust velocity of the DRP2 unit is substantially fixed in the region A and the low vacuum region B in the vicinity of the atmospheric pressure, and remains fixed even if it further enters the medium vacuum region C, but reaches the vacuum as the target is approached. The degree is gradually decreasing.
又,如圖4A之特性曲線b1所示,比較例1之真空排氣裝置101之排氣速度係隨著從大氣壓附近區域A經過低真空區域B、再進入中真空區域C而逐漸上升。其後,真空排氣裝置101之排氣速度在中真空區域C中,在與低真空區域B之邊界及目標到達真空度之中間附近為最大,且隨著接近目標到達真空度而下降。Further, as shown by the characteristic curve b1 of FIG. 4A, the exhaust velocity of the vacuum exhaust apparatus 101 of Comparative Example 1 gradually increases as it passes from the region A near the atmospheric pressure to the intermediate vacuum region C through the low vacuum region B. Thereafter, the exhaust velocity of the vacuum exhaust device 101 is maximized in the middle vacuum region C near the boundary between the low vacuum region B and the target reaching the degree of vacuum, and decreases as the approaching target reaches the degree of vacuum.
如圖4A之特性曲線c1所示,在低真空區域B之比較例2,由於採用相較於比較例1之MBP11為更高輸出功率之MBP1,故其排氣速度相較於比較例1之情況(特性曲線b1)有所提高。但,由於在大氣壓附近區域A中,MBP1之排氣性能會被DRP2之排氣性能制約,故比較例2之排氣速度雖相較於比較例1有所提高,然而亦無法充分發揮MBP1之排氣能力。再者,在中真空區域C中之比較例2由於泵部是相同的,故其排氣速度特性與比較例1之情況相同。As shown in the characteristic curve c1 of FIG. 4A, in Comparative Example 2 of the low vacuum region B, since MBP1 having a higher output power than that of MBP11 of Comparative Example 1 was used, the exhaust velocity was compared with that of Comparative Example 1. The situation (characteristic curve b1) has been improved. However, since the exhaust performance of MBP1 is restricted by the exhaust performance of DRP2 in the region A near atmospheric pressure, the exhaust velocity of Comparative Example 2 is improved as compared with Comparative Example 1, but the MBP1 cannot be fully utilized. Exhaust capacity. Further, in Comparative Example 2 in the medium vacuum region C, since the pump portion was the same, the exhaust velocity characteristics were the same as those in Comparative Example 1.
與此相對,如圖4A之特性曲線d1所示,在實施形態1之真空排氣裝置100中,藉由採用相較於比較例1之MBP11更高輸出功率之MBP1,在低真空區域B之排氣速度相較於上述比較例1(特性曲線b1)有所提高,而與比較例2(特性曲線c1)之情況為同等。再者,由於在實施形態1之真空排氣裝置100中,設置有止回閥3及分歧配管70,故MBP1之排氣性能不受DRP2之排氣性能制約。因此,在本實施形態之大氣壓附近區域A之排氣性能,相較於比較例2之情況(特性曲線c1)有所提高。On the other hand, as shown in the characteristic curve d1 of FIG. 4A, in the vacuum exhaust apparatus 100 of the first embodiment, the MBP1 having a higher output power than the MBP11 of the comparative example 1 is used in the low vacuum region B. The exhaust gas velocity was improved as compared with the above Comparative Example 1 (characteristic curve b1), and was equivalent to the case of Comparative Example 2 (characteristic curve c1). Further, since the vacuum exhaust device 100 of the first embodiment is provided with the check valve 3 and the branch pipe 70, the exhaust performance of the MBP 1 is not restricted by the exhaust performance of the DRP 2. Therefore, the exhaust performance in the region A near the atmospheric pressure in the present embodiment is improved as compared with the case of the comparative example 2 (characteristic curve c1).
再者,在低真空區域B及中真空區域C中之實施形態1之真空排氣裝置100由於MBP是相同的,故其排氣速度特性與比較例2之情況相同。Further, in the vacuum evacuation device 100 of the first embodiment in the low vacuum region B and the intermediate vacuum region C, since the MBP is the same, the exhaust velocity characteristics are the same as those in the comparative example 2.
如圖4B所示,LC20之壓力推移係與真空排氣裝置之排氣性能相對應。因此,在低真空區域B及中真空區域C中,比較例2之特性曲線c2,係與實施形態1之真空排氣裝置100之特性曲線d2平行。再者,在中真空區域C中,比較例1之特性曲線b2,與比較例2之特性曲線c2,係與實施形態1之真空排氣裝置100之特性曲線d2平行。As shown in FIG. 4B, the pressure transition of the LC 20 corresponds to the exhaust performance of the vacuum exhaust. Therefore, in the low vacuum region B and the medium vacuum region C, the characteristic curve c2 of Comparative Example 2 is parallel to the characteristic curve d2 of the vacuum exhaust device 100 of the first embodiment. Further, in the medium vacuum region C, the characteristic curve b2 of Comparative Example 1 and the characteristic curve c2 of Comparative Example 2 are parallel to the characteristic curve d2 of the vacuum exhaust apparatus 100 of the first embodiment.
由於比較例2之真空排氣裝置102相較於比較例1之真空排氣裝置101,在大氣壓及大氣壓附近區域A以及低真空區域B的排氣性能均更優良,故到達至低真空區域A為止之時間及到達至中真空區域C為止之時間分別都較短。又,由於實施形態1之真空排氣裝置100相較於比較例2之真空排氣裝置102,在大氣壓附近區域A之排氣性能更優良,故到達至低真空區域B為止之時間較短。Since the vacuum exhaust device 102 of Comparative Example 2 is superior to the vacuum exhaust device 101 of Comparative Example 1, the exhaust performance in the region A and the low vacuum region B in the vicinity of the atmospheric pressure and the atmospheric pressure is superior, so that the low vacuum region A is reached. The time until the arrival and the time to reach the medium vacuum area C are respectively short. Further, in the vacuum evacuation device 100 of the first embodiment, the evacuation performance in the region A near the atmospheric pressure is superior to that of the vacuum evacuation device 102 of the second embodiment, so that the time until reaching the low vacuum region B is short.
因此,實施形態1之真空排氣裝置100、比較例之真空排氣裝置101、比較例2之真空排氣裝置102之三者中,以實施形態1之真空排氣裝置100可以最短的時間到達設定於中真空區域C之目標真空度。再者,若是比較例2之真空排氣裝置102,能以相較於比較例1之真空排氣裝置101較短之時間到達上述目標真空度。Therefore, among the vacuum exhaust device 100 of the first embodiment, the vacuum exhaust device 101 of the comparative example, and the vacuum exhaust device 102 of the comparative example, the vacuum exhaust device 100 of the first embodiment can be reached in the shortest time. The target vacuum is set in the medium vacuum region C. Further, in the vacuum evacuation device 102 of Comparative Example 2, the target vacuum degree can be reached in a shorter time than the vacuum evacuation device 101 of Comparative Example 1.
如此,由於在實施形態1之真空排氣裝置100中,採用相比比較例1之MBP11更高輸出功率MBP1,故在低真空區域B及大氣壓附近區域A中,可實現相較於比較例1之情況更高之排氣速度。再者,藉由設置有止回閥3及分歧配管70,在大氣壓附近區域A中,可實現相較於比較例2之真空排氣裝置102更高的排氣速度。As described above, in the vacuum evacuation apparatus 100 of the first embodiment, the MBP11 of the comparative example 1 is used, and the output power MBP1 is higher. Therefore, in the low vacuum region B and the vicinity of the atmospheric pressure region A, comparison with the comparative example 1 can be realized. The higher the exhaust speed. Further, by providing the check valve 3 and the branch pipe 70, the exhaust gas velocity higher than that of the vacuum exhaust device 102 of Comparative Example 2 can be achieved in the region A near the atmospheric pressure.
因此,實施形態1之真空排氣裝置100在低真空區域B及大氣壓附近區域A中,可充分發揮MBP1之排氣能力。Therefore, in the vacuum evacuation device 100 according to the first embodiment, the exhaust capability of the MBP 1 can be sufficiently exhibited in the low vacuum region B and the region A near the atmospheric pressure.
根據如上所述之實施形態1之真空排氣裝置100,藉由將MBP1之馬達設為大輸出功率並設置有止回閥3及分歧配管70,故即使在大氣壓附近,主泵之排氣速度亦不受輔助泵之排氣速度制約,從而可使大氣壓附近及低真空區域之排氣速度提高。因此,可一方面將MBP1及DRP2之結構之變更抑制在最小限度,一方面使在大氣壓附近區域A及低真空區域B之排氣性能提高,其結果,可在短時間內使LC20到達目標真空度。According to the vacuum exhaust apparatus 100 of the first embodiment described above, by setting the motor of the MBP1 to a large output and providing the check valve 3 and the branch pipe 70, the exhaust speed of the main pump is even in the vicinity of the atmospheric pressure. It is also unaffected by the exhaust velocity of the auxiliary pump, so that the exhaust velocity in the vicinity of the atmospheric pressure and in the low vacuum region can be increased. Therefore, on the one hand, the change in the structure of MBP1 and DRP2 can be minimized, and on the other hand, the exhaust performance in the region A near the atmospheric pressure and the low vacuum region B can be improved, and as a result, the LC 20 can be reached to the target vacuum in a short time. degree.
再者,在上述實施形態1中,可不將分歧配管70終端連接於DRP2之排氣配管60,亦可以將該分歧配管70作為個別之排氣配管。Further, in the first embodiment, the branch pipe 70 may not be connected to the exhaust pipe 60 of the DRP 2, and the branch pipe 70 may be used as an individual exhaust pipe.
圖5係說明本發明之實施形態2之真空排氣裝置之結構的模式圖,對與圖1同樣之構件附有相同之符號。該實施形態2之真空排氣裝置200具備並聯配置2個泵(MBP)21a、21b之主泵21,輔助泵2,及止回閥3。即,實施形態2之真空排氣裝置200係藉由在上述實施形態1之真空排氣裝置100(參照圖1)中,將由1個MBP構成之主泵1改為並聯配置之2個MBP21a、21b所構成者。Fig. 5 is a schematic view showing the structure of a vacuum exhausting apparatus according to a second embodiment of the present invention, and the same members as those in Fig. 1 are denoted by the same reference numerals. The vacuum exhaust apparatus 200 of the second embodiment includes a main pump 21 in which two pumps (MBP) 21a and 21b are arranged in parallel, an auxiliary pump 2, and a check valve 3. In the vacuum exhaust apparatus 200 of the second embodiment, the main pump 1 including one MBP is changed to two MBPs 21a arranged in parallel, and the vacuum exhaust apparatus 100 (see FIG. 1) of the first embodiment. 21b constitutes the person.
在該真空排氣裝置200中,由於並聯配置複數之泵而構成主泵,故構成該主泵之各個泵之馬達即使不設為高輸出功率,亦可增大主泵整體之容量。In the vacuum exhaust apparatus 200, since a plurality of pumps are arranged in parallel to constitute a main pump, the motor of each pump constituting the main pump can increase the capacity of the entire main pump even if it is not set to a high output.
即,在該實施形態2中,雖馬達之最大動力(單位:W)對最大排氣速度之比率為不足5W/(m3 /h),但由於並聯配置有總共為5W/(m3 /h)以上之2個MBP,故實現高輸出功率之主泵21。That is, in the second embodiment, the ratio of the maximum power (unit: W) of the motor to the maximum exhaust velocity is less than 5 W/(m 3 /h), but a total of 5 W/(m 3 / is arranged in parallel. h) The above two MBPs realize the main pump 21 with high output power.
根據以上之實施形態2之真空排氣裝置200,藉由採用將複數之MBP並聯配置之高輸出功率之主泵21,而與上述實施形態1同樣,能使在大氣壓附近區域A及低真空區域B之排氣性能提高,其結果,可在短時間內使LC20到達目標之真空度。According to the vacuum exhaust apparatus 200 of the second embodiment, the main pump 21 having a high output power in which a plurality of MBPs are arranged in parallel is used, and in the same manner as in the first embodiment, the region A and the low vacuum region in the vicinity of the atmospheric pressure can be obtained. The exhaust performance of B is improved, and as a result, the LC20 can reach the target vacuum in a short time.
再者,亦可並聯配置3個以上之泵而構成主泵,或將輔助泵並聯配置複數台,或可將主泵與輔助泵各自並聯配置複數台。又,亦可於每個構成主泵之泵皆設置與LC20之間之配管及閘閥。再者,亦可於每個構成主泵之泵皆設置止回閥及分歧配管。Further, three or more pumps may be arranged in parallel to constitute a main pump, or a plurality of auxiliary pumps may be arranged in parallel, or a plurality of main pumps and auxiliary pumps may be arranged in parallel. Further, piping and gate valves may be provided between the pump and each of the pumps constituting the main pump. Further, a check valve and a branch pipe may be provided for each of the pumps constituting the main pump.
根據本發明,可提供一種將主泵及輔助泵之結構變更抑制在最小限度,且可將到達目標真空度之排氣時間縮短之真空排氣裝置。According to the present invention, it is possible to provide a vacuum exhausting apparatus which can minimize the structural change of the main pump and the auxiliary pump and can shorten the exhaust time to reach the target degree of vacuum.
1...主泵(MBP)1. . . Main pump (MBP)
2...輔助泵(DRP)2. . . Auxiliary pump (DRP)
3...止回閥3. . . Check valve
20...真空室(LC)20. . . Vacuum chamber (LC)
21...主泵twenty one. . . Main pump
21a,21b...MBP21a, 21b. . . MBP
30...閘閥30. . . gate
40,50,60,70...配管40, 50, 60, 70. . . Piping
100,200...真空排氣裝置100,200. . . Vacuum exhaust
圖1係說明本發明之實施形態1之真空排氣裝置之結構的模式圖;Fig. 1 is a schematic view showing the structure of a vacuum exhausting apparatus according to Embodiment 1 of the present invention;
圖2係說明比較例1之真空排氣裝置之結構之模式圖;Figure 2 is a schematic view showing the structure of a vacuum exhausting device of Comparative Example 1;
圖3係說明比較例2之真空排氣裝置之結構之模式圖;Figure 3 is a schematic view showing the structure of a vacuum exhausting device of Comparative Example 2;
圖4A係說明本發明之實施形態1及比較例1、2之真空排氣裝置之排氣特性(排氣性能);4A is a view showing exhaust characteristics (exhaust performance) of a vacuum exhaust apparatus according to Embodiment 1 of the present invention and Comparative Examples 1 and 2;
圖4B係說明本發明之實施形態1及比較例1、2之LC20之壓力特性;及4B is a view showing the pressure characteristics of the LC 20 of the first embodiment and the comparative examples 1 and 2 of the present invention;
圖5係說明本發明之實施形態2之真空排氣裝置之結構的模式圖。Fig. 5 is a schematic view showing the configuration of a vacuum exhausting apparatus according to a second embodiment of the present invention.
1...主泵(MBP)1. . . Main pump (MBP)
2...輔助泵(DRP)2. . . Auxiliary pump (DRP)
3...止回閥3. . . Check valve
20...真空室(LC)20. . . Vacuum chamber (LC)
30...閘閥30. . . gate
40,50,60,70...配管40, 50, 60, 70. . . Piping
100...真空排氣裝置100. . . Vacuum exhaust
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- 2009-09-09 TW TW98130464A patent/TWI467092B/en active
- 2009-09-10 CN CN2009801321755A patent/CN102124225A/en active Pending
- 2009-09-10 EP EP09812899.4A patent/EP2330299A4/en not_active Withdrawn
- 2009-09-10 WO PCT/JP2009/004496 patent/WO2010029750A1/en active Application Filing
- 2009-09-10 US US13/063,040 patent/US20110164992A1/en not_active Abandoned
- 2009-09-10 KR KR1020117005262A patent/KR101193479B1/en active IP Right Grant
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Also Published As
Publication number | Publication date |
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US20110164992A1 (en) | 2011-07-07 |
KR101193479B1 (en) | 2012-10-22 |
KR20110040980A (en) | 2011-04-20 |
EP2330299A1 (en) | 2011-06-08 |
CN102124225A (en) | 2011-07-13 |
JPWO2010029750A1 (en) | 2012-02-02 |
TW201018790A (en) | 2010-05-16 |
EP2330299A4 (en) | 2016-06-15 |
WO2010029750A1 (en) | 2010-03-18 |
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