TWI462106B - Method and apparatus for reducing erase disturb of memory circuit by using recovery bias - Google Patents
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Description
本發明係關於非揮發記憶體,特別是關於非揮發記憶體中減少抹除干擾的方法與裝置。This invention relates to non-volatile memory, and more particularly to methods and apparatus for reducing erase interference in non-volatile memory.
非揮發記憶胞的抹除演算法為預程式化抹除記憶胞至一程式化狀態,之後再抹除,並且然後跟隨著對過度抹除記憶胞的一軟程式化。此預程式化及軟程式化是抹除操作之外的額外步驟,且會更正記憶陣列中被選取抹除記憶胞部分的臨界電壓分佈。然而,此抹除演算法並不會更正未被選取抹除記憶胞的抹除干擾。抹除干擾係指雖然未被選取抹除記憶胞中也受到某種程度抹除的效應。The erasure algorithm of the non-volatile memory cell pre-programs the erased memory cell to a stylized state, then erases it, and then follows a soft stylization of over-erasing the memory cell. This pre-stylization and soft stylization is an extra step in addition to the erase operation and corrects the critical voltage distribution of the selected memory cell portion of the memory array. However, this erase algorithm does not correct the erase interference that is not selected to erase the memory cells. Erasing interference refers to the effect of being erased to some extent although it is not selected to erase the memory cells.
此處所描述之技術係提供一種積體電路具有一非揮發記憶陣列及控制電路。此非揮發記憶陣列分割成複數個記憶群組。此控制電路響應一抹除命令,以抹除一第一組的一個或多個記憶群組且不會抹除一第二組的一個或多個記憶群組,以及施加一回復調整偏壓來調整在該第二組的一個或多個記憶群組中的至少一個記憶群組中的記憶胞之臨界電壓;此回復調整偏壓可以施加至該第二組的一個或多個記憶群組中的至少一個記憶群組中以自抹除一第一組的一個或多個記憶群組所導致的臨界電壓改變回復。此抹除調整偏壓係在該回復調整偏壓之前施加。The techniques described herein provide an integrated circuit having a non-volatile memory array and control circuitry. The non-volatile memory array is segmented into a plurality of memory groups. The control circuit is responsive to an erase command to erase one or more memory groups of the first group and does not erase one or more memory groups of the second group, and applies a return adjustment bias to adjust a threshold voltage of a memory cell in at least one memory group of the one or more memory groups of the second group; the return adjustment bias voltage may be applied to one or more memory groups of the second group The threshold voltage change response caused by erasing one or more memory groups of the first group in at least one memory group. This erase adjustment bias is applied prior to the return adjustment bias.
藉由施加回復調整偏壓至該第二組的一個或多個記憶群組中的至少一個記憶群組中,可以於回復調整偏壓施加時更正抹除干擾(至少一部分)。抹除干擾會因為一相同井區由(i)該第一 組的一個或多個記憶群組以及(ii)該第二組的一個或多個記憶群組中的該至少一個記憶群組所分享,而在抹除調整偏壓施加時發生。By applying a reset adjustment bias to at least one of the one or more memory groups of the second group, the erase interference (at least a portion) can be corrected upon application of the reset adjustment bias. Wiping out the interference will be due to a same well area by (i) the first The one or more memory groups of the group and (ii) the at least one memory group of the one or more memory groups of the second group are shared, and occur when the erase adjustment bias is applied.
在此處所描述的實施例中,此積體電路還具有維持一用來指示該第二組的一個或多個記憶群組中的一定數目記憶胞是在一程式化狀態的回復設定之邏輯。舉例而言,該回復設定可以指示在記憶群組中分享一井區的記憶胞之位址範圍。當施加該回復調整偏壓(例如至該非揮發記憶陣列或是至特定記憶群組)時該記憶胞的數目會增加若干次。In the embodiment described herein, the integrated circuit also has logic to maintain a reply setting for indicating that a certain number of memory cells in the one or more memory groups of the second group are in a stylized state. For example, the reply setting may indicate that the address range of the memory cells of a well area is shared in the memory group. The number of memory cells is increased several times when the return adjustment bias is applied (e.g., to the non-volatile memory array or to a particular memory group).
在此處所描述的實施例中,在施加該回復調整偏壓之前先施加一抹除驗證調整偏壓。響應該抹除驗證調整偏壓已指示該第二組的一個或多個記憶群組中的至少個記憶胞正在經歷抹除干擾,此控制電路則施加該回復調整偏壓。此處所揭露的技術亦包括一方法。此方法包含至少以下步驟:響應一抹除命令以抹除一非揮發記憶陣列中之一第一組的一個或多個記憶群組且不會抹除該非揮發記憶陣列中之一第二組的一個或多個記憶群組,以及施加一回復調整偏壓來調整在該第二組的一個或多個記憶群組中的至少一個記憶群組中的記憶胞之臨界電壓。In the embodiment described herein, a wipe verification bias is applied prior to applying the return adjustment bias. In response to the erase verify that the bias voltage has indicated that at least one of the one or more memory banks of the second group is experiencing erase interference, the control circuit applies the reset adjustment bias. The techniques disclosed herein also include a method. The method includes at least the steps of: erasing one or more memory groups of one of the first group of non-volatile memory arrays in response to an erase command and not erasing one of the second groups of the non-volatile memory array Or a plurality of memory groups, and applying a reply adjustment bias to adjust a threshold voltage of the memory cells in at least one of the one or more memory groups of the second group.
此處描述許多不同的實施例。Many different embodiments are described herein.
第1圖為顯示在記憶群組中未被選取被抹除記憶胞之具有回復程式化之抹除演算法的一範例流程圖。在步驟10,此具有記憶陣列的積體電路接收一抹除命令。此抹除命令指定一個或多個記憶群組要被抹除。一個記憶群組可以是將要被一起抹除的例如是區段、區塊或是段落的記憶胞群組。此記憶胞群組也可以是整個記憶陣列。此抹除演算法對一個或多個選取要被抹除的記憶群組執行多 個步驟,並且隨後對一個或多個沒有選取要被抹除的記憶群組執行多個步驟。首先,對一個或多個選取要被抹除的記憶群組執行多個步驟。Figure 1 is a flow chart showing an example of a replied erase algorithm with no reply erased memory cells in the memory group. In step 10, the integrated circuit with the memory array receives an erase command. This erase command specifies that one or more memory groups are to be erased. A memory group can be a group of memory cells, such as segments, blocks, or paragraphs, to be erased together. This memory cell group can also be the entire memory array. This erase algorithm performs more on one or more memory groups selected to be erased Steps, and then perform multiple steps on one or more memory groups that are not selected for erasure. First, multiple steps are performed on one or more memory groups that are selected to be erased.
在步驟12,對此選取要被抹除的記憶群組中已經在抹除狀態之所有記憶胞或是一個子集執行預程式化。如此的預程式化將此記憶群組中的記憶胞帶至一分享的程式化狀態,而且防止在抹除狀態中的記憶胞被再次抹除。在步驟14,對此選取要被抹除的記憶群組中之所有記憶胞自此記憶群組中的記憶胞之分享的程式化狀態進行抹除至此記憶群組中的記憶胞之分享的抹除狀態。在步驟16,執行抹除驗證以檢查先前的抹除操作是否足以將選取要被抹除的記憶群組中之所有記憶胞抹除了。在步驟18,假如沒有通過抹除驗證,則此抹除演算法回到步驟14。在步驟18,假如通過抹除驗證,則此抹除演算法向下進行。在步驟20,對選取要被抹除的記憶群組中之過度抹除的記憶胞進行軟程式化。In step 12, the memory group to be erased is selected to perform pre-stylization on all memory cells or a subset of the erased state. Such pre-stylization brings the memory cells in this memory group to a shared stylized state and prevents the memory cells in the erased state from being erased again. In step 14, the stylized state of all the memory cells in the memory group to be erased from the memory cells in the memory group is erased to the shared memory of the memory cells in the memory group. In addition to the status. At step 16, an erase verify is performed to check if the previous erase operation is sufficient to erase all of the memory cells in the memory group selected to be erased. At step 18, if the verification is not passed, the erase algorithm returns to step 14. At step 18, if the verification is done by erasing, the erase algorithm proceeds downward. In step 20, the memory cells that are over-erased in the memory group to be erased are selected for soft programming.
這些先前的步驟係對一個或多個選取要被抹除的記憶群組進行。之後的步驟則是對一個或多個選取不要被抹除的記憶群組進行。於步驟14的抹除操作時,除了將選取要被抹除的一個或多個記憶群組抹除之外,也會如第2圖中所討論的,在一個或多個選取不要被抹除的記憶群組中發生抹除干擾的現象。抹除干擾就是選取不要被抹除的記憶群組中也發生的不預期的抹除。在步驟22,進行回復程式化以修復選取不要被抹除的記憶群組中的抹除干擾記憶胞。在步驟24,結束此抹除命令。These previous steps are performed on one or more memory groups selected to be erased. The next step is to perform one or more memory groups that are not to be erased. In the erase operation of step 14, in addition to erasing one or more memory groups to be erased, as described in FIG. 2, one or more selections are not erased. The phenomenon of erasing interference occurs in the memory group. Erasing the interference is to select an unexpected erase that also occurs in the memory group that is not to be erased. At step 22, a reply stylization is performed to repair the erased interference memory cells in the memory group selected for not being erased. At step 24, the erase command is ended.
第1圖中顯示一個藉由高臨界電壓分佈代表的程式化狀態,但是其他的實施例中包含多個程式化狀態,例如具有兩個位元及三個程式化準位於每一個記憶位置之多階記憶胞,及具有三個位元或是七個程式化準位於每一個記憶位置之多階記憶胞。Figure 1 shows a stylized state represented by a high threshold voltage distribution, but other embodiments include multiple stylized states, such as having two bits and three stylized quasi-locations at each memory location. A meta-memory, and a multi-level memory cell with three bits or seven stylized quasi-locations at each memory location.
第2圖顯示一個由包括選取被抹除的記憶群組以及選取不要被抹除的記憶群組兩者之多個記憶群組所分享的摻雜井區。不幸的是,無論是否僅有一個群組被選取抹除,分享井區26的多個記憶群組在抹除是均被暴露於相同的高抹除電位。此為p型井(在其他實施例中可為n型井)的井區26與其他如此的井區互相隔離。如此在井區間的隔離解決了在不同井區的記憶群組間的抹除干擾問題,但是並未解決分享相同井區之記憶群組間的抹除干擾問題。此隔離結構及每一井區中較少數目的抹除記憶群組,不可避免地增加了此陣列的大小。Figure 2 shows a doped well region shared by multiple memory groups including both selected erased memory groups and selected memory groups that are not to be erased. Unfortunately, regardless of whether only one group is selected for erasure, multiple memory groups sharing the well region 26 are exposed to the same high erase potential during erasing. This well 26, which is a p-type well (which may be an n-type well in other embodiments), is isolated from other such wells. Thus, the isolation in the well interval solves the problem of erasing interference between memory groups in different well areas, but does not solve the problem of erasing interference between memory groups sharing the same well area. This isolation structure and the smaller number of erase memory groups in each well region inevitably increase the size of this array.
抹除干擾的一個範例機制為在此非揮發記憶胞的井區與電荷儲存元件(例如浮動閘極與介電電荷捕捉元件)間的富勒-諾德漢(FN)電子或電洞穿隧。即使在選取被抹除的記憶群組以及選取不要被抹除的記憶群組兩者之間的字元線或閘極的不同偏壓條件下,如此的抹除干擾現象仍會發生。One exemplary mechanism for erasing interference is Fowler-Nordheim (FN) electron or hole tunneling between a well region of a non-volatile memory cell and a charge storage element (eg, a floating gate and a dielectric charge trapping element). Such erase interference can occur even under different bias conditions of the word line or gate between the selected erased memory group and the selected memory group that is not to be erased.
第3圖是汲極電流ID 與閘極電壓VG 的圖示32,顯示在低臨界電壓抹除狀態、在高臨界電壓程式化狀態以及因為高臨界電壓程式化狀態影響正在經歷抹除干擾的記憶胞。第4圖是汲極電流與閘極電壓的圖示34,顯示在低臨界電壓抹除狀態、在高臨界電壓程式化狀態以及因為正在經歷回復程式化以更正抹除干擾而回到高臨界電壓程式化狀態的記憶胞。Figure 3 is a graph 32 of the drain current I D and the gate voltage V G , showing the erased state in the low threshold voltage erase state, the high threshold voltage stylized state, and the high threshold voltage stylized state. Memory cell. Figure 4 is a diagram 34 of the drain current and gate voltage, shown in the low threshold voltage erase state, in the high threshold voltage stylized state, and back to the high threshold voltage as the recovery is programmed to correct the erase interference. Stylized state of memory cells.
在第3及第4圖中,高臨界電壓記憶胞是在程式化狀態且保持一個邏輯"0"資料,而低臨界電壓記憶胞是在抹除狀態且保持一個邏輯"1"資料。於選取要被抹除的一個記憶群組進行抹除時,其他的記憶胞群組會被抹除干擾,使得即使是選取不要被抹除的記憶群組仍會發生某種程度的抹除。在第3圖中,一個屬於選取不要被抹除記憶群組中的記憶胞具有被程式化的高臨界電壓狀態的邏輯"0"資料。如同第2圖中所討論的,因為由選取被抹除的記憶群組以及選取不要被抹除的記憶群組兩者分享相同的井區,會發生抹除干擾現象。In Figures 3 and 4, the high threshold voltage memory cell is in a stylized state and maintains a logic "0" data, while the low threshold voltage memory cell is in the erase state and maintains a logic "1" data. When erasing a memory group to be erased, other memory cells will be erased, so that even a memory group that is not to be erased will still be erased to some extent. In Fig. 3, a logical "0" data belonging to a memory cell in which the memory group is not erased has a stylized high threshold voltage state. As discussed in Figure 2, the erase interference occurs because both the selected erased memory group and the selected memory group that is not erased share the same well region.
因此,在第3圖中,顯示一個屬於選取不要被抹除記憶群組中的記憶胞具有被程式化的高臨界電壓狀態的邏輯"0"資料導致的抹除干擾所造成之臨界電壓偏移。此抹除干擾記憶胞因為在此抹除干擾記憶胞的電荷儲存元件中所儲存電荷的淨正電荷偏移而顯示出一個負的臨界電壓偏移。舉例而言,電子可以自此抹除干擾記憶胞的電荷儲存元件移動至分享的井區中(或是電洞自分享的井區中移動至此抹除干擾記憶胞的電荷儲存元件)。在此範例中,分享的井區具有相對高的正電壓而可以吸引電子自此抹除干擾記憶胞的電荷儲存元件移動至分享的井區中。Therefore, in Fig. 3, a threshold voltage shift caused by the erase interference caused by the logic "0" data of the memory cell in the memory group having the programmed high threshold voltage state is selected. . This erase interference memory cell exhibits a negative threshold voltage shift due to the net positive charge offset of the charge stored in the charge storage element that interferes with the memory cell. For example, the electrons can be erased from the charge storage element that interferes with the memory cell to the shared well region (or the hole moves from the shared well region to the charge storage element that erases the interfering memory cell). In this example, the shared well region has a relatively high positive voltage that can attract electrons from which the charge storage elements that erase the interfering memory cells move into the shared well region.
在第4圖中,顯示一個在第3圖中的抹除干擾記憶胞自回復程式化後所造成之臨界電壓偏移。此回復程式化記憶胞因為在此回復程式化記憶胞的電荷儲存元件中所儲存電荷的淨負電荷偏移而顯示出一個正的臨界電壓偏移。舉例而言,電子可以自分享的井區中移動至此回復程式化記憶胞的電荷儲存元件(或是電洞自此回復程式化記憶胞的電荷儲存元件移動至分享的井區中)。在此範例中,分享的井區具有相對高的負電壓而可以排斥電子自此回復程式化記憶胞的電荷儲存元件進入到分享的井區中。In Fig. 4, a threshold voltage shift caused by the self-response stylization of the erase interference memory cell in Fig. 3 is shown. This replies to the stylized memory cell exhibits a positive threshold voltage shift due to the net negative charge offset of the charge stored in the charge storage element of the stylized memory cell. For example, the electrons can move from the shared well region to the charge storage element of the regenerated stylized memory cell (or the hole from which the charge storage element of the stylized memory cell is moved to the shared well region). In this example, the shared well region has a relatively high negative voltage that can repel electrons from the charge storage element of the reprogrammed memory cell into the shared well region.
第5和6圖為顯示在此抹除演算法中的例如是第1圖中的回復程式化步驟22之替代實施例進一步細節。第5圖是根據靜態設定來決定回復程式化斜率之具有回復程式化的一範例流程圖之一部分。而第6圖則是根據動態設定來決定回復程式化斜率之具有回復程式化的一範例流程圖之一部分。Figures 5 and 6 are further details showing an alternative embodiment of the reply stylization step 22 in the erase algorithm, e.g., in FIG. Figure 5 is a portion of an example flow diagram of a reply stylization that determines the response to a stylized slope based on static settings. The sixth picture is part of an example flow chart with a reply stylization that determines the response to the stylized slope based on the dynamic settings.
在第5圖中,步驟36執行抹除。虛線部份表示於選取要被抹除的記憶群組進行其他步驟,例如第1圖中所討論的預程式化、抹除驗證及軟程式化等。In Fig. 5, step 36 performs erasing. The dotted line indicates that the memory group to be erased is selected for other steps, such as pre-stylization, erase verification, and soft stylization discussed in FIG.
之後的步驟係於選取不要被抹除的記憶群組上進行。在步驟38,執行回復驗證。假如通過回復驗證,則不需要進行回復程式化,且在步驟40結束此回復程式化操作(以及此抹除演算法)。通過回復驗證代表於程式化記憶胞中的抹除干擾是很小的,使得此抹除干擾所造成之臨界電壓偏移沒有嚴重要需要進行回復程式化操作。假如沒有通過回復驗證,則繼續進行回復程式化操作。在步驟42,讀取此回復程式化操作的靜態設定。此靜態設定是指示需要進行回復程式化的記憶胞數目,例如在分享一井區之記憶群組的記憶胞位址範圍。此靜態設定可以根據此非揮發記憶陣列的半導體製程或是其應用來決定。此靜態設定可以儲存在例如是非揮發記憶體或是熔絲的記憶體之中。在步驟44,根據靜態設定於抹除干擾記憶胞上執行此回復程式化操作。The subsequent steps are performed on a memory group that is not to be erased. At step 38, a reply verification is performed. If the reply is verified, no reply stylization is required and the reply stylization operation (and the erase algorithm) is ended in step 40. It is very small to verify that the erase interference in the stylized memory cell is small, so that the threshold voltage shift caused by the erase interference is not severe and needs to be reprogrammed. If the verification is not verified, continue to reply to the stylization. At step 42, the static settings of this reply stylized operation are read. This static setting indicates the number of memory cells that need to be reprogrammed, such as the memory cell address range of the memory group sharing the well zone. This static setting can be determined based on the semiconductor process of the non-volatile memory array or its application. This static setting can be stored in a memory such as a non-volatile memory or a fuse. In step 44, the reply stylization operation is performed on the erase interference memory cell according to the static setting.
在第6圖中,步驟46執行抹除。虛線部份表示於選取要被抹除的記憶群組進行其他步驟,例如第1圖中所討論的預程式化、抹除驗證及軟程式化等。在步驟48,將此回復程式化操作的動態設定更新於例如是非揮發記憶體、控制器中的計數器或是暫存器之記憶體。此動態設定反映了已經執行的抹除操作數目(例如在一記憶陣列中)。記憶陣列會因為一定次數的程式化-抹除循環而劣化。隨著所執行的抹除操作數目的增加,此動態設定也會因為在選取不要被抹除的記憶群組中回復程式化操作執行的記憶胞數目增加,或是一個較大的位址範圍,而增加。In Fig. 6, step 46 performs erasing. The dotted line indicates that the memory group to be erased is selected for other steps, such as pre-stylization, erase verification, and soft stylization discussed in FIG. At step 48, the dynamic setting of the resume stylized operation is updated to, for example, a non-volatile memory, a counter in the controller, or a memory of the scratchpad. This dynamic setting reflects the number of erase operations that have been performed (eg, in a memory array). The memory array will degrade due to a certain number of stylized-erase cycles. As the number of erase operations performed increases, this dynamic setting also increases the number of memory cells that are executed by the stylized operation in a memory group that is not to be erased, or a larger address range. And increase.
之後的步驟係於選取不要被抹除的記憶群組上進行。在步驟50,以一個記憶胞接著一個記憶胞的方式執行回復驗證。假如通過回復驗證,則不需要進行回復程式化,且在步驟52結束此回復程式化操作(以及此抹除演算法)。通過回復驗證代表於程式化記憶胞中的抹除干擾是很小的,使得此抹除干擾所造成之臨界電壓偏移沒有嚴重要需要進行回復程式化操作。假如沒有通過回復驗證,則繼續以一個記憶胞接著一個記憶胞的方式進行回復程式化操作。在步驟54,讀取此回復程式化操作的動態設定。此動態設定反映了需要被進行回復程式化的記憶胞數目,例如在分享一井區之記憶群組的記憶胞位址範圍。此動態設定可以根據此非揮發記憶陣列的半導體製程或是其應用來決定。此動態設定可以儲存在例如是非揮發記憶體或是熔絲的記憶體之中。在步驟56,根據動態設定於抹除干擾記憶胞上執行此回復程式化操作。The subsequent steps are performed on a memory group that is not to be erased. At step 50, reply verification is performed in the form of a memory cell followed by a memory cell. If the verification is verified by reply, no reply stylization is required, and the reply stylization operation (and the erase algorithm) is ended in step 52. It is very small to verify that the erase interference in the stylized memory cell is small, so that the threshold voltage shift caused by the erase interference is not severe and needs to be reprogrammed. If it is not verified by the reply, it will continue to reply to the stylization operation by means of a memory cell followed by a memory cell. At step 54, the dynamic settings of this reply stylized operation are read. This dynamic setting reflects the number of memory cells that need to be reprogrammed, such as the memory cell address range of the memory group sharing the well zone. This dynamic setting can be determined based on the semiconductor process of the non-volatile memory array or its application. This dynamic setting can be stored in a memory such as a non-volatile memory or a fuse. In step 56, the reply stylization operation is performed on the erase interference memory cell according to the dynamic setting.
在第7圖中,步驟58執行抹除。虛線部份表示於選取要被抹除的記憶群組進行其他步驟,例如第1圖中所討論的預程式化、抹除驗證及軟程式化等。或是於選取不要被抹除的記憶群組上所進行的步驟。In Figure 7, step 58 performs the erase. The dotted line indicates that the memory group to be erased is selected for other steps, such as pre-stylization, erase verification, and soft stylization discussed in FIG. Or the steps taken on the memory group that is not to be erased.
以下是此動態設定更新的一個範例。在某些實施例中,此動態設定反映了此回復程式化操作的起始位置或是起始記憶位址。The following is an example of this dynamic setting update. In some embodiments, this dynamic setting reflects the starting position or starting memory address of the reply stylized operation.
步驟60決定此抹除程序是否為於開機之後的第一個抹除程序。在不同的實施例中,此抹除程序是整個陣列或是在由抹除命令中被指定將要進行抹除的特定記憶群組中第一個執行的。假如此抹除程序為於開機之後的第一個抹除程序,則在步驟62此動態設定自分享此井區的記憶群組中選擇出一啟始記憶位址,例如第2圖中所示。假如此抹除程序為於開機之後的第二個或之後的抹除程序,則在步驟64此自分享此井區的一系列記憶群組中選擇出下一個啟始記憶位址,例如第2圖中所示。Step 60 determines if the eraser is the first eraser after booting. In various embodiments, the eraser program is executed first by the entire array or by a particular memory group that is designated to be erased by the erase command. If the erasing procedure is the first erasing procedure after the booting, in step 62, the dynamic setting is selected from the memory group sharing the well area, for example, a starting memory address is selected, for example, as shown in FIG. . If the erase process is the second or subsequent erase process after booting, then in step 64, the next start memory address is selected from a series of memory groups sharing the well zone, for example, the second Shown in the figure.
第8圖顯示根據本發明一實施例之記憶積體電路的簡化方塊示意圖,其具有一記憶陣列及此處所描述之改良。其中積體電路150包括記憶陣列100。一字元線(列)解碼器與區塊選擇解碼器101與沿著記憶陣列100列方向安排之複數條字元線102耦接及電性溝通。一位元線(行)解碼器與驅動器103與沿著記憶陣列100行方向安排之複數條位元線104耦接及電性溝通,以自該記憶陣列100的記憶胞讀取資料及寫入資料。位址係由匯流排105提供給字元線解碼器101及位元線解碼器103。方塊106中的感測放大器與資料輸入結構,經由匯流排107與位元線解碼器103耦接。資料由積體電路150上的輸入/輸出埠提供給資料輸入線111輸入至方塊106中的資料輸入結構。資料由方塊106中的感測放大器,經由資料輸出線115,提供至積體電路上的輸入/輸出埠,或者至積體電路150其他內部/外部的資料源。程式化、抹除及讀取調整偏壓狀態機構109控制偏壓調整供應電壓108的應用,及於抹除時施加一回復調整偏壓。狀態機構電路109也包括儲存回復設定及決定在抹除時之回復偏壓範圍(例如記憶胞的範圍)的邏輯140。Figure 8 shows a simplified block diagram of a memory integrated circuit having a memory array and the improvements described herein in accordance with an embodiment of the present invention. The integrated circuit 150 includes a memory array 100. A word line (column) decoder and block selection decoder 101 is coupled and electrically coupled to a plurality of word lines 102 arranged along the column direction of the memory array 100. A bit line (row) decoder and driver 103 are coupled and electrically communicated with a plurality of bit lines 104 arranged along the row direction of the memory array 100 to read data and write from the memory cells of the memory array 100. data. The address is supplied from the bus bar 105 to the word line decoder 101 and the bit line decoder 103. The sense amplifier and data input structure in block 106 is coupled to bit line decoder 103 via bus bar 107. The data is supplied to the data input line 111 from the input/output port on the integrated circuit 150 to the data input structure in block 106. The data is provided by the sense amplifier in block 106, via the data output line 115, to the input/output ports on the integrated circuit, or to other internal/external data sources of the integrated circuit 150. The stylizing, erasing, and reading adjustment bias state mechanism 109 controls the application of the bias adjustment supply voltage 108 and applies a return adjustment bias during erasing. State mechanism circuit 109 also includes logic 140 that stores the reply settings and determines the range of return biases (e.g., the range of memory cells) at the time of erasing.
本發明之較佳實施例所揭露的技術可以應用於例如是反或(NOR)閘陣列的非揮發記憶陣列。非揮發記憶元件的範例可以是浮動閘極元件或是介電電荷捕捉記憶元件。The techniques disclosed in the preferred embodiments of the present invention can be applied to non-volatile memory arrays such as reverse OR (NOR) gate arrays. An example of a non-volatile memory element can be a floating gate element or a dielectric charge trapping memory element.
本發明之較佳實施例所揭露的技術施加一回復調整偏壓,其根據實施例的不同而調整臨界電壓變大或變小。The technique disclosed in the preferred embodiment of the present invention applies a return adjustment bias which adjusts the threshold voltage to become larger or smaller depending on the embodiment.
本發明之較佳實施例與範例詳細揭露如上,惟應瞭解為上述範例僅作為範例,非用以限制專利之範圍。就熟知此技藝之人而言,自可輕易依據下列申請專利範圍對相關技術進行修改與組合。The preferred embodiments and examples of the present invention are disclosed in detail above, but it should be understood that the above examples are merely exemplary and are not intended to limit the scope of the patent. For those skilled in the art, the related art can be modified and combined easily according to the scope of the following patent application.
150...積體電路150. . . Integrated circuit
100...非揮發記憶胞陣列100. . . Non-volatile memory cell array
101...列解碼器101. . . Column decoder
102...字元線102. . . Word line
103...行解碼器103. . . Row decoder
104...位元線104. . . Bit line
105...匯流排105. . . Busbar
107...資料匯流排107. . . Data bus
106...感測放大器/資料輸入結構106. . . Sense amplifier / data input structure
109...程式化、抹除(具有回復)及讀取調整偏壓狀態機構儲存回復設定的邏輯109. . . Stylize, erase (with reply) and read the logic of the adjustment bias state mechanism to store the reply settings
108...偏壓調整供應電壓108. . . Bias adjustment supply voltage
111...資料輸入線111. . . Data input line
115...資料輸出線115. . . Data output line
第1圖為顯示在記憶群組中未被選取被抹除記憶胞之具有回復程式化之抹除演算法的一範例流程圖。Figure 1 is a flow chart showing an example of a replied erase algorithm with no reply erased memory cells in the memory group.
第2圖顯示一個由包括選取被抹除的記憶群組以及選取不要被抹除的記憶群組兩者之多個記憶群組所分享的摻雜井區。Figure 2 shows a doped well region shared by multiple memory groups including both selected erased memory groups and selected memory groups that are not to be erased.
第3圖是汲極電流與閘極電壓的圖示,顯示在低臨界電壓抹除狀態、在高臨界電壓程式化狀態以及因為高臨界電壓程式化狀態影響正在經歷抹除干擾的記憶胞。Figure 3 is a graphical representation of the drain current and gate voltage, showing the memory cells that are experiencing erase interference in the low threshold voltage erase state, in the high threshold voltage stylized state, and because of the high threshold voltage stylized state.
第4圖是汲極電流與閘極電壓的圖示,顯示在低臨界電壓抹除狀態、在高臨界電壓程式化狀態以及因為正在經歷回復程式化以更正抹除干擾而回到高臨界電壓程式化狀態的記憶胞。Figure 4 is a diagram of the drain current and gate voltage, showing the low threshold voltage erase state, the high threshold voltage stylized state, and the return to the high threshold voltage program because it is undergoing a reprogramming to correct the erase interference. The memory cell of the state.
第5圖是根據靜態設定來決定回復程式化斜率之具有回復程式化的一範例流程圖之一部分。Figure 5 is a portion of an example flow diagram of a reply stylization that determines the response to a stylized slope based on static settings.
第6圖則是根據動態設定來決定回復程式化斜率之具有回復程式化的一範例流程圖之一部分。Figure 6 is a portion of an example flow diagram that is responsive to the dynamic setting to determine the response to the stylized slope.
第7圖則是根據動態設定來決定回復程式化斜率之具有回復程式化的一範例流程圖之一部分。Figure 7 is a portion of an example flow diagram that is responsive to dynamic settings to determine the response to a stylized slope.
第8圖顯示根據本發明一實施例之記憶積體電路的簡化方塊示意圖,其具有一記憶陣列及此處所描述之改良。Figure 8 shows a simplified block diagram of a memory integrated circuit having a memory array and the improvements described herein in accordance with an embodiment of the present invention.
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