TWI427632B - Method of making of cover layer of optical recording media and irradiating device is used therein - Google Patents
Method of making of cover layer of optical recording media and irradiating device is used therein Download PDFInfo
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- TWI427632B TWI427632B TW99147201A TW99147201A TWI427632B TW I427632 B TWI427632 B TW I427632B TW 99147201 A TW99147201 A TW 99147201A TW 99147201 A TW99147201 A TW 99147201A TW I427632 B TWI427632 B TW I427632B
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- transparent substrate
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- resin glue
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- 230000003287 optical effect Effects 0.000 title claims description 17
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 230000001678 irradiating effect Effects 0.000 title 1
- 239000000758 substrate Substances 0.000 claims description 46
- 239000007788 liquid Substances 0.000 claims description 34
- 239000011347 resin Substances 0.000 claims description 34
- 229920005989 resin Polymers 0.000 claims description 34
- 239000003292 glue Substances 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 22
- 230000007246 mechanism Effects 0.000 claims description 18
- 238000004528 spin coating Methods 0.000 claims description 11
- 238000000576 coating method Methods 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 6
- 230000008859 change Effects 0.000 claims description 5
- 239000000853 adhesive Substances 0.000 claims description 4
- 230000001070 adhesive effect Effects 0.000 claims description 4
- 238000009792 diffusion process Methods 0.000 claims description 4
- 230000000694 effects Effects 0.000 claims description 4
- 238000005286 illumination Methods 0.000 claims description 4
- 238000002360 preparation method Methods 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 2
- 239000004519 grease Substances 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
- 230000008569 process Effects 0.000 description 15
- 238000010586 diagram Methods 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
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Description
本發明是有關於光記錄媒體覆蓋層之製造方法及該方法所使用之照射裝置,特別是指一種加工簡便,可使液態樹脂膠均勻分佈於光記錄媒體透明基板第二表面之光記錄媒體覆蓋層製造方法及該方法所使用之照射裝置。The invention relates to a method for manufacturing an optical recording medium covering layer and an irradiation device used in the method, in particular to a simple processing, which can uniformly distribute the liquid resin glue on the second surface of the transparent substrate of the optical recording medium. A layer manufacturing method and an irradiation apparatus used in the method.
如第1~4圖所示,習知之藍光光記錄媒體之結構,主要包含有一具透明基板1、一膜層堆疊結構2及一覆蓋層3;其中,該透明基板1具有一中心孔11;該膜層堆疊結構2係沉積於透明基板1的一側表面介於中心孔11外側到透明基板1外側邊緣之間的區域;而習知的覆蓋層製程係將製作覆蓋層3之液態樹脂膠31塗佈於透明基板1沉積有膜層堆疊結構2側上接近中心孔11的位置,然後高速旋轉透明基板1,藉由旋轉產生之離心力使液態樹脂膠31向外周緣擴散並覆蓋於透明基板1與膜層堆疊結構2之表面。最後以UV光照射裝置4照射(如第3圖所示),令液態樹脂膠31固化後,即可於膜層堆疊結構2表面形成一可供光穿透之覆蓋層3(如第4圖所示)。As shown in Figures 1 to 4, the structure of a conventional blue light optical recording medium mainly comprises a transparent substrate 1, a film layer stacking structure 2 and a cover layer 3; wherein the transparent substrate 1 has a central hole 11; The film layer stack structure 2 is deposited on a surface of one side of the transparent substrate 1 between the outer side of the center hole 11 and the outer edge of the transparent substrate 1; and the conventional cover layer process system is to form the liquid resin glue of the cover layer 3. 31 is applied to the transparent substrate 1 at a position on the side of the film layer stack structure 2 close to the center hole 11, and then the transparent substrate 1 is rotated at a high speed, and the liquid resin glue 31 is diffused to the outer periphery by the centrifugal force generated by the rotation and covers the transparent substrate. 1 and the surface of the film stack structure 2. Finally, the UV light irradiation device 4 is irradiated (as shown in FIG. 3), and after the liquid resin glue 31 is cured, a light-permeable cover layer 3 can be formed on the surface of the film layer stack structure 2 (as shown in FIG. 4). Shown).
然而因離心力作用不易控制的因素,致使上述習知製程易生液態樹脂膠31呈現外厚內薄且邊緣突起32之膠厚分佈狀態(如第2圖所示),進而影響固化後所生成之覆蓋層3的光學特性。為避免習知製程的缺失,又有一改良製程出現,如第3圖所示,其多係先以一帽蓋(cap)4置 於該膜層堆疊結構2中央上方,再將液態樹脂膠31滴於帽蓋(cap)4周緣上,形成一環狀膠圈,然後高速旋轉該透明基板1,使液態樹脂膠31向外擴散。旋塗完畢後取下帽蓋(cap)4,接著利用UV光照射裝置照射,令液態樹脂膠2固化,則可於透明基板1與膜層堆疊結構2表面形成一厚度均勻且可供光穿透之覆蓋層3,藉以有效改善習知製程膠層分佈厚度不均之缺失。However, due to factors that are difficult to control due to the centrifugal force, the above-mentioned conventional process liquid resin adhesive 31 exhibits a thin outer thickness and a thickness distribution of the edge protrusions 32 (as shown in FIG. 2), thereby affecting the formation after curing. The optical properties of the cover layer 3. In order to avoid the lack of conventional processes, there is an improved process. As shown in Figure 3, the multiple systems are first placed with a cap. Above the center of the film stack structure 2, the liquid resin glue 31 is dropped on the periphery of the cap 4 to form an annular apron, and then the transparent substrate 1 is rotated at a high speed to spread the liquid resin glue 31 outward. . After the spin coating is completed, the cap 4 is removed, and then irradiated with a UV light irradiation device to cure the liquid resin adhesive 2, so that a uniform thickness and a light can be formed on the surface of the transparent substrate 1 and the film stack structure 2. The cover layer 3 is penetrated to effectively improve the lack of thickness unevenness of the conventional process layer distribution.
惟,經實地驗證,上述之改良製程未臻完善,仍具有以下缺失:However, after field verification, the above improved process has not been perfected, and still has the following shortcomings:
1.如第3圖所示,使用帽蓋(cap)4的塗佈製程,在製程中不斷重複放上取下,會造成帽蓋(cap)4壽命縮減,因此需要時常更新而增加生產成本。1. As shown in Fig. 3, the coating process using the cap 4 is repeatedly repeated during the process, which causes the life of the cap 4 to be reduced, so that it needs to be updated frequently to increase the production cost. .
2.使用帽蓋(cap)4之塗佈製程因為製程步驟較為複雜,故生產良率不易控制。2. The coating process using the cap 4 is difficult to control because the process steps are complicated.
有鑑於習知光記錄媒體覆蓋層製程有上開諸多缺失,本案發明人乃焚膏繼晷研究改進之道,而終有本發明之產生。In view of the fact that there are many defects in the process of coating the optical recording medium, the inventor of this case is the research and improvement of the burning paste, and the invention is finally produced.
本發明之主要目的在於提供一種光記錄媒體覆蓋層之製造方法,其加工簡易,除可改善習知製程中液態樹脂膠分佈不均之情形,同時亦避免了改良製程的成本增加問題。SUMMARY OF THE INVENTION A primary object of the present invention is to provide a method for fabricating an optical recording medium cover layer which is easy to process, in addition to improving the uneven distribution of liquid resin glue in the conventional process, and also avoids the problem of increased cost of the improved process.
本發明之另一目的在於提供一種光記錄媒體覆蓋層之製造方法所使用之照射裝置,藉由控制光圈機構之變化來改變UV光源照射範圍, 以改善覆蓋層之光學瑕疵。Another object of the present invention is to provide an illumination apparatus used in a method of manufacturing an optical recording medium cover layer, which can change the illumination range of the UV light source by controlling the change of the aperture mechanism. To improve the optical flaw of the cover layer.
為達成上述目的及功效,本發明採用之透明基板於中心孔外緣的外側表面設有一環狀溝槽,且於環狀溝槽同側表面沉積有膜層堆疊結構;該膜層堆疊結構所沉積覆蓋的透明基板表面係自環狀溝槽外緣起,但略小於透明基板外側邊緣;以及,具有自動控制光圈機構的UV光照射裝置,以便控制UV光照射範圍。In order to achieve the above object and effect, the transparent substrate used in the present invention is provided with an annular groove on the outer surface of the outer edge of the center hole, and a film layer stack structure is deposited on the same side surface of the annular groove; The surface of the transparent substrate deposited by the deposition is from the outer edge of the annular groove, but slightly smaller than the outer edge of the transparent substrate; and a UV light irradiation device having an automatic control aperture mechanism to control the range of the UV light irradiation.
本發明採行的製程步驟包括:「基板預備」步驟,係將透明基板沉積有膜層堆疊結構之一側朝上置於液態樹脂膠塗佈裝置內,等待進行後續步驟;「旋塗上膠」步驟,以中心孔為軸心緩慢旋轉透明基板,同時將液態樹脂膠沿著該環狀溝槽外緣滴落於該環狀溝槽內,以使該液態樹脂膠流動形成一環狀膠圈;「旋轉塗佈及固化」步驟,令該透明基板以中心孔為軸心高速旋轉,利用離心力使液態樹脂膠向透明基板外緣擴散,同時配合具自動控制光圈機構之UV照射裝置,藉以控制UV光源照射範圍隨液態樹脂膠的擴散速率而逐漸增加,達到使該液態樹脂膠保持厚度均勻地覆蓋於透明基板及沉積於其上之膜層堆疊結構表面的目的。The process steps adopted by the present invention include: a "substrate preparation" step of placing a transparent substrate deposited with a layer stack structure side up in a liquid resin glue coating device, waiting for a subsequent step; "spin coating" In the step of slowly rotating the transparent substrate with the center hole as the axis, the liquid resin glue is dropped into the annular groove along the outer edge of the annular groove, so that the liquid resin glue flows to form an annular glue. The "rotating coating and solidifying" step is such that the transparent substrate is rotated at a high speed with the center hole as an axis, and the liquid resin glue is diffused toward the outer edge of the transparent substrate by centrifugal force, and a UV irradiation device with an automatic control aperture mechanism is used. The irradiation range of the control UV light source is gradually increased with the diffusion rate of the liquid resin glue, so as to maintain the thickness of the liquid resin glue uniformly covering the transparent substrate and the surface of the film layer stack deposited thereon.
為使能進一步瞭解本發明之詳細原理、作用與功效,以及所採用的裝置之結構,茲舉本發明較具體之實施例,並配合附圖詳細說明如以下所述。For a fuller understanding of the principles, functions and <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt;
如第5a圖及第5b圖所示,本發明之透明基板1於中央設有一中心 孔11,且於該中心孔11外緣設有一環狀溝槽12,而該透明基板1於具有環狀溝槽12側沉積有一膜層堆疊結構2;該膜層堆疊結構2所沉積覆蓋的透明基板1表面係自環狀溝槽12外緣起,但略小於透明基板1外側邊緣。As shown in FIGS. 5a and 5b, the transparent substrate 1 of the present invention has a center in the center. The hole 11 is provided with an annular groove 12 on the outer edge of the central hole 11, and the transparent substrate 1 has a film layer stack structure 2 deposited on the side of the annular groove 12; the film layer stack structure 2 is deposited and covered. The surface of the transparent substrate 1 is from the outer edge of the annular groove 12, but is slightly smaller than the outer edge of the transparent substrate 1.
進一步如第6圖所示之UV光照射裝置5,該UV光照射裝置5包含一UV光源導管51、一UV光源及電源供應裝置52和一光圈機構53;該UV光照射裝置5係以UV光源導管51將UV光源及電源供應裝置52產生之UV光傳導至光圈機構53處,並利用其作為遮罩,以便控制UV光的照射範圍;如第8圖所示,該光圈機構53之孔隙可為圓形或其他形狀,尚可依需求佐以透鏡等光學元件,且進一步與自動控制系統連結,令光圈機構53可隨液態樹脂膠31的擴散速率而改變孔徑;又,該光圈機構53可以於固定位置運作,或於運作的同時進行一個維度之位移,以達到最佳之光強度控制效果。Further, as shown in FIG. 6, the UV light irradiation device 5 includes a UV light source conduit 51, a UV light source and power supply device 52, and an aperture mechanism 53; the UV light irradiation device 5 is UV The light source conduit 51 conducts the UV light source and the UV light generated by the power supply device 52 to the aperture mechanism 53, and uses it as a mask to control the irradiation range of the UV light; as shown in Fig. 8, the aperture of the aperture mechanism 53 It may be a circular shape or other shape, and may be accompanied by an optical element such as a lens, and further connected to the automatic control system, so that the aperture mechanism 53 can change the aperture with the diffusion rate of the liquid resin glue 31; in addition, the aperture mechanism 53 It can be operated at a fixed position or moved in one dimension while operating to achieve optimal light intensity control.
本發明之製程包括以下步驟:「基板預備」步驟,如第7a圖所示,係將透明基板1沉積有膜層堆疊結構2之透明基板1,於濺鍍堆疊資料結構制之中心孔11周緣設有環狀溝槽12之一面朝上置於液態樹脂膠31塗佈裝置內,等待進行後續步驟;「旋塗上膠」步驟,如第7b圖所示,以中心孔11為軸心緩慢旋轉透明基板1,同時將液態樹脂膠31沿著該環狀溝槽12外緣滴落於於該環狀溝槽12外旁側,並使該液態樹脂膠31流動接觸於該環狀溝槽12外側邊緣,形成一環狀附著膠圈;「旋轉塗佈及固化」步驟,如第7c~7f圖所示,係使該透明基板1以中心孔11為中心高速旋轉,利用離心力使該液態樹脂膠31向外擴散,同時 配合具自動控制連動之光圈機構53之UV光照射裝置5(如第6圖所示),進行光源強度之變化,藉以控制UV光源照射範圍隨液態樹脂膠31的擴散速率而逐漸增加,可使該液態樹脂膠31於流動擴散的同時,由透明基板1之中心孔11位置朝外緩慢地固化,以使液態樹脂膠31保持厚度均勻地分佈於透明基板1之膜層堆疊結構2表面,而不致於因離心力的過度拋甩,發生內薄外厚的膠厚分佈狀況;待液態樹脂膠31完全乾固後,即可於透明基板1之膜層堆疊結構2表面形成一均勻分佈且可供光穿透之覆蓋層3(如第7f圖所示)。The process of the present invention comprises the following steps: a "substrate preparation" step, as shown in Fig. 7a, a transparent substrate 1 in which a transparent substrate 1 is deposited with a transparent substrate 1 of a film layer stack structure 2, which is formed on the periphery of a central hole 11 of a sputter-stacked data structure. One of the annular grooves 12 is disposed face up in the liquid resin glue 31 coating device, waiting for the subsequent step; the "spin coating" step, as shown in Fig. 7b, with the center hole 11 as the axis The transparent resin substrate 31 is slowly rotated, and the liquid resin glue 31 is dropped on the outer side of the annular groove 12 along the outer edge of the annular groove 12, and the liquid resin glue 31 is brought into contact with the annular groove. The outer edge of the groove 12 forms an annular adhesive apron; the "spin coating and solidification" step, as shown in Figures 7c to 7f, causes the transparent substrate 1 to rotate at a high speed centering on the center hole 11, and the centrifugal force is used to make the transparent substrate 1 The liquid resin glue 31 spreads outward while The UV light irradiation device 5 (shown in FIG. 6) with the aperture mechanism 53 that automatically controls the interlocking is used to change the intensity of the light source, thereby controlling the irradiation range of the UV light source to gradually increase with the diffusion rate of the liquid resin glue 31. The liquid resin glue 31 is slowly solidified outwardly from the center hole 11 of the transparent substrate 1 while flowing, so that the liquid resin glue 31 is uniformly distributed in thickness on the surface of the film layer stack 2 of the transparent substrate 1, and It is not caused by the excessive throwing of the centrifugal force, and the thickness distribution of the inner and outer thickness is generated; after the liquid resin glue 31 is completely dried, a uniform distribution can be formed on the surface of the film stack structure 2 of the transparent substrate 1. The light penetrates the cover layer 3 (as shown in Figure 7f).
由上所述可知,本發明之覆蓋層製造方法確實具有使用壽命長、產品外觀佳且覆蓋層厚度均勻控制性佳之成效,確已具有產業上之量產使用性。As can be seen from the above, the method for producing a cover layer of the present invention has the advantages of long service life, good product appearance, and uniform control of the thickness of the cover layer, and indeed has industrial mass production usability.
上述之實施例僅係用以詳細說明本發明之技術特徵及功效,並非用以限制本發明之專利權範圍,凡熟悉此類技藝之人仕根據上述說明,及依以下申請專利範圍所載之特徵及在功效上所作等效性之變換或修改,本質上未脫離本發明技藝精神之範疇者,均應包含在本發明之專利權範圍。The above-mentioned embodiments are only intended to illustrate the technical features and effects of the present invention, and are not intended to limit the scope of the patents of the present invention, and those skilled in the art are entitled to the above description and the scope of the following claims. Variations or modifications of the features and equivalents in terms of their efficiencies are intended to be included within the scope of the present invention.
1‧‧‧透明基板1‧‧‧Transparent substrate
11‧‧‧中心孔11‧‧‧ center hole
12‧‧‧環狀溝槽12‧‧‧Round groove
2‧‧‧膜層堆疊結構2‧‧‧ film stack structure
3‧‧‧覆蓋層3‧‧‧ Coverage
31‧‧‧液態樹脂膠31‧‧‧Liquid resin glue
32‧‧‧邊緣突起32‧‧‧Edge protrusion
4‧‧‧帽蓋(cap)4‧‧‧caps
5‧‧‧UV光照射裝置5‧‧‧UV light irradiation device
51‧‧‧UV光源導管51‧‧‧UV light source conduit
52‧‧‧UV光源及電源供應器52‧‧‧UV light source and power supply
53‧‧‧光圈機構53‧‧‧ aperture mechanism
第1圖:習知光記錄媒體之剖面結構示意圖。Figure 1: Schematic diagram of the cross-sectional structure of a conventional optical recording medium.
第2圖:習知離心力製程塗佈液態樹脂膠於光記錄媒體基板之狀態示意圖。Fig. 2 is a schematic view showing a state in which a liquid resin paste is applied to an optical recording medium substrate by a conventional centrifugal force process.
第3圖:習知光記錄媒體覆蓋層製程所使用裝置之結構示意圖。Figure 3: Schematic diagram of the structure of the device used in the process of the optical recording medium overlay.
第4圖:習知光記錄媒體覆蓋層製程所產出之光記錄媒體覆蓋層外觀示意圖。Figure 4: Schematic diagram of the optical recording medium overlay produced by the conventional optical recording medium overlay process.
第5a圖:為本發明之透明基板構造剖面圖。Fig. 5a is a cross-sectional view showing the structure of a transparent substrate of the present invention.
第5b圖:為本發明之透明基板構造局部剖面放大圖。Figure 5b is an enlarged partial cross-sectional view showing the structure of the transparent substrate of the present invention.
第6圖:為本發明所使用之照射裝置結構示意圖。Figure 6 is a schematic view showing the structure of an irradiation apparatus used in the present invention.
第7a圖:為本發明製造方法之基板待命預備示意圖。Figure 7a is a schematic view of the substrate standby preparation of the manufacturing method of the present invention.
第7b圖:為本發明製造方法之旋塗上膠步驟示意圖。Figure 7b is a schematic view of the spin coating step of the manufacturing method of the present invention.
第7c圖:為本發明製造方法之旋轉塗佈及固化步驟示意圖之一。Figure 7c: One of the schematic diagrams of the spin coating and curing steps of the manufacturing method of the present invention.
第7d圖:為本發明製造方法之旋轉塗佈及固化步驟示意圖之二。Figure 7d is a schematic view of the spin coating and curing steps of the manufacturing method of the present invention.
第7e圖:為本發明製造方法之旋轉塗佈及固化步驟示意圖之三。Figure 7e is a third schematic view of the spin coating and curing steps of the manufacturing method of the present invention.
第7f圖:為本發明製造方法之旋轉塗佈及固化步驟示意圖之四。Figure 7f is a fourth schematic view of the spin coating and curing steps of the manufacturing method of the present invention.
第8圖:為本發明之光圈機構示意圖。Figure 8 is a schematic view of the aperture mechanism of the present invention.
1‧‧‧透明基板1‧‧‧Transparent substrate
11‧‧‧中心孔11‧‧‧ center hole
12‧‧‧環狀溝槽12‧‧‧Round groove
2‧‧‧膜層堆疊結構2‧‧‧ film stack structure
3‧‧‧覆蓋層3‧‧‧ Coverage
31‧‧‧液態樹脂膠31‧‧‧Liquid resin glue
5‧‧‧UV光照射裝置5‧‧‧UV light irradiation device
51‧‧‧UV光源導管51‧‧‧UV light source conduit
53‧‧‧光圈機構53‧‧‧ aperture mechanism
Claims (5)
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TW99147201A TWI427632B (en) | 2010-12-31 | 2010-12-31 | Method of making of cover layer of optical recording media and irradiating device is used therein |
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TW99147201A TWI427632B (en) | 2010-12-31 | 2010-12-31 | Method of making of cover layer of optical recording media and irradiating device is used therein |
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TW201227731A TW201227731A (en) | 2012-07-01 |
TWI427632B true TWI427632B (en) | 2014-02-21 |
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Citations (4)
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WO2005118159A1 (en) * | 2004-06-03 | 2005-12-15 | Shibaura Mechatronics Corporation | Resin layer forming method, resin layer forming apparatus, disc and disc manufacturing method |
TW200634812A (en) * | 2004-11-29 | 2006-10-01 | Pioneer Tohoku Corp | Method and apparatus for manufacturing optical disk |
TW200930463A (en) * | 2008-01-08 | 2009-07-16 | Guann Way Technologies Co Ltd | Spin coating method and device for substrate |
US7695791B2 (en) * | 2004-08-24 | 2010-04-13 | Tdk Corporation | Optical recording medium |
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2010
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2005118159A1 (en) * | 2004-06-03 | 2005-12-15 | Shibaura Mechatronics Corporation | Resin layer forming method, resin layer forming apparatus, disc and disc manufacturing method |
US7695791B2 (en) * | 2004-08-24 | 2010-04-13 | Tdk Corporation | Optical recording medium |
TW200634812A (en) * | 2004-11-29 | 2006-10-01 | Pioneer Tohoku Corp | Method and apparatus for manufacturing optical disk |
TW200930463A (en) * | 2008-01-08 | 2009-07-16 | Guann Way Technologies Co Ltd | Spin coating method and device for substrate |
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