TWI409287B - Curable resin composition, curable film and their cured products - Google Patents
Curable resin composition, curable film and their cured products Download PDFInfo
- Publication number
- TWI409287B TWI409287B TW97119495A TW97119495A TWI409287B TW I409287 B TWI409287 B TW I409287B TW 97119495 A TW97119495 A TW 97119495A TW 97119495 A TW97119495 A TW 97119495A TW I409287 B TWI409287 B TW I409287B
- Authority
- TW
- Taiwan
- Prior art keywords
- resin composition
- curable resin
- carbon atoms
- formula
- less carbon
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- C08F290/062—Polyethers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/06—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polyethers, polyoxymethylenes or polyacetals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
Description
本發明涉及一種可在氧存在時或在低溫下硬化且可生產具有優良的低介電特性、耐熱性、機械性能和耐化學性的硬化物的硬化性樹脂組成物、及經由硬化上述樹脂組成物所獲得各使用該樹脂組成物之一種硬化物以及一種硬化性薄膜或薄膜。本發明的硬化性樹脂組成物、硬化性薄膜、硬化物和薄膜係適用於電子材料領域,例如用於印刷線路板的樹脂、用於半導體的密封樹脂、用於半導體的中間層絕緣材料和用於電子部件的絕緣材料。The present invention relates to a curable resin composition which can be cured in the presence of oxygen or at a low temperature and which can produce a cured product having excellent low dielectric properties, heat resistance, mechanical properties and chemical resistance, and is composed by hardening the above resin Each of the hardened materials using the resin composition and a curable film or film were obtained. The curable resin composition, curable film, cured product, and film of the present invention are suitable for use in the field of electronic materials, such as resins for printed wiring boards, sealing resins for semiconductors, interlayer insulating materials for semiconductors, and the like. Insulation material for electronic components.
習知硬化性樹脂係廣泛應用於黏合、澆鑄、塗料、浸漬、層壓、模塑化合物等等。然而,硬化性樹脂應用於如此多的領域,以至於在某些使用環境或某些使用條件下,習知的硬化性樹脂是不令人滿意的。Conventional curable resins are widely used in bonding, casting, coating, dipping, laminating, molding compounds, and the like. However, curable resins are used in so many fields that conventional hardening resins are unsatisfactory under certain use environments or under certain use conditions.
在資訊通信和計算機領域中,例如,以PHS或行動電話為例的資訊通信裝置的信號頻帶和電腦的CPU時鐘時間係達到GHz頻帶。為了控制歸因於絕緣體電信號之阻尼的目的,絕緣體需要具有低介電常數和低介電損耗角正切的材料。該等材料係建議為含氟樹脂、聚烯烴樹脂、聚苯乙烯樹脂、聚亞苯基醚樹脂和乙烯基苄基醚樹脂(例如,參見JP-A-7-188362,JP-A-2004-83680,日本專利第3414556號和JP-A-2003-306591)。In the field of information communication and computers, for example, the signal band of an information communication device such as a PHS or a mobile phone and the CPU clock time of a computer reach the GHz band. In order to control the damping due to the electrical signals of the insulator, the insulator requires a material having a low dielectric constant and a low dielectric loss tangent. These materials are recommended to be a fluorine-containing resin, a polyolefin resin, a polystyrene resin, a polyphenylene ether resin, and a vinyl benzyl ether resin (for example, see JP-A-7-188362, JP-A-2004- 83680, Japanese Patent No. 3414556 and JP-A-2003-306591).
然而,雖然這些材料的介電特性優良,但其並不必然地 滿足作為電子部件所需除介電特性外的物理性質,例如耐熱性、耐化學性和機械性能的所有要求。However, although these materials have excellent dielectric properties, they are not necessarily It satisfies all the physical properties required for electronic components other than dielectric properties, such as heat resistance, chemical resistance, and mechanical properties.
在印刷線路板和半導體封裝領域中,例如,由於近來採用的無鉛焊料,使在焊接時的溫度升高。為確保更高的安裝可靠性,需要印刷線路板、半導體封裝和電子部件的組成材料具有高耐熱性、低吸水性、低熱膨脹性等等。對使用於這些材料的硬化性樹脂的硬化步驟,生產能力的提升,例如在氧存在時於烘箱中固化和在低溫下硬化是強烈需要的。此外,從製品安全的角度來看,對電子部件來說阻燃性通常是必需的。In the field of printed wiring boards and semiconductor packages, for example, due to the recently adopted lead-free solder, the temperature at the time of soldering is increased. In order to ensure higher mounting reliability, constituent materials of printed wiring boards, semiconductor packages, and electronic components are required to have high heat resistance, low water absorption, low thermal expansion, and the like. For the hardening step of the curable resin used for these materials, an increase in productivity, such as curing in an oven in the presence of oxygen and hardening at a low temperature, is strongly required. In addition, flame retardancy is often necessary for electronic components from the standpoint of product safety.
本發明人係研發出雙官能亞苯基醚低聚物的乙烯基化合物衍生物及用於滿足上述低介電特性、耐熱性、耐化學性、低吸水性等要求目的之包含這些衍生物的硬化性樹脂組成物(例如,參見JP-A-2004-59644和JP-A-2006-83364)。上述衍生物和上述硬化性樹脂組成物在硬化時並未經常與氧接觸的固化條件下,例如其中樹脂組成物置於模具內的壓模,或在惰性烘箱中用氮置換一氣相的硬化,係具有優異之硬化性質。在這些條件下,硬化物可獲得優良的低介電特性、耐熱性和機械性能。然而,例如,當衍生物和上述硬化性樹脂組成物以塗料薄膜或薄膜的形式在它們經常與氧接觸的條件下,使用具有空氣氣體烘箱硬化時,其係未被充分硬化,因此,需要進行改進。甚至在用於未經常與氧接觸的狀態進行硬化時,例如在氮下、在減壓下或在壓力下,以提升生產能力的觀點來看, 係期望一種可在低溫下硬化的材料。The present inventors have developed a vinyl compound derivative of a bifunctional phenylene ether oligomer and a derivative containing the same for the purpose of satisfying the above requirements of low dielectric properties, heat resistance, chemical resistance, and low water absorption. A curable resin composition (for example, see JP-A-2004-59644 and JP-A-2006-83364). The above-mentioned derivative and the above-mentioned curable resin composition are hardened under conditions of curing, which are not often in contact with oxygen, for example, a stamper in which a resin composition is placed in a mold, or a hardening of a gas phase in a inert oven. Has excellent hardening properties. Under these conditions, the cured product can obtain excellent low dielectric properties, heat resistance, and mechanical properties. However, for example, when the derivative and the above-mentioned curable resin composition are in the form of a coating film or film in the case where they are often in contact with oxygen, when they are hardened by using an air gas oven, they are not sufficiently hardened, and therefore, it is necessary to carry out Improve. Even when it is used for hardening in a state in which it is not often in contact with oxygen, for example, under nitrogen, under reduced pressure, or under pressure, in order to increase productivity, A material that can be hardened at a low temperature is desired.
本發明目的是提供一種硬化性樹脂組成物,其係產生一具有低介電常數、低介電損耗角正切、優良的耐熱性、優良的機械性能、優良的耐化學性、優良的阻燃性,和甚至在氧存在時優良的硬化性,並且能夠在低壓下硬化的硬化物、包含上述組成物的硬化性薄膜、經由硬化上述組成物獲得的硬化物和經由將上述組成物硬化成薄膜形式所獲得的薄膜。An object of the present invention is to provide a curable resin composition which produces a low dielectric constant, a low dielectric loss tangent, excellent heat resistance, excellent mechanical properties, excellent chemical resistance, and excellent flame retardancy. And a cured product which is excellent in hardenability in the presence of oxygen, and which can be cured at a low pressure, a hardenable film containing the above composition, a cured product obtained by hardening the above composition, and a hardened film form by curing the above composition The film obtained.
本發明人為達到上述的目的進行了勤奮的研究,結果列於後文。當分子中具有聚亞苯基醚結構的雙官能亞苯基醚低聚物的乙烯基封端化合物與具有特定結構的雙馬來醯亞胺化合物結合時,甚至在氧存在時,所得組成物是可硬化的,其可降低硬化溫度,並且由其獲得的硬化物具有低介電常數、低介電損耗角正切、高玻璃轉移溫度(Tg)、高強度和優良的耐化學性。在上述發現的基礎上,本發明人完成了本發明。The present inventors conducted diligent research to achieve the above object, and the results are listed later. When a vinyl-terminated compound having a polyfunctional phenylene ether oligomer having a polyphenylene ether structure in the molecule is combined with a bismaleimide compound having a specific structure, even in the presence of oxygen, the resulting composition It is hardenable, which lowers the hardening temperature, and the cured product obtained therefrom has a low dielectric constant, a low dielectric loss tangent, a high glass transition temperature (Tg), high strength, and excellent chemical resistance. Based on the above findings, the inventors completed the present invention.
即,本發明涉及硬化性樹脂組成物,其包含作為主要組分的由通式(1)代表的乙烯基化合物(a)和選自通式(5)至(8)所代表的馬來醯亞胺化合物(b)的一種馬來醯亞胺化合物(b)或至少兩種馬來醯亞胺化合物(b),條件是硬化性樹脂組成物可包含至少兩種彼此結構相異的通式(1)的化合物(a)的混合物。本發明涉及經由進一步將至少一種選自苯乙烯熱塑性彈性體(c)、阻燃劑(d) 或填料(e)的成分摻入上述硬化性樹脂組成物獲得的硬化性樹脂組成物。That is, the present invention relates to a curable resin composition comprising, as a main component, a vinyl compound (a) represented by the general formula (1) and a male quinone represented by the general formulae (5) to (8). a maleimide compound (b) of the imine compound (b) or at least two maleimide compounds (b), provided that the curable resin composition may comprise at least two formulas different in structure from each other ( 1) A mixture of compounds (a). The present invention relates to further comprising at least one selected from the group consisting of styrene thermoplastic elastomer (c), flame retardant (d) Or a component of the filler (e) is incorporated into the curable resin composition obtained by the above curable resin composition.
其中-(O-X-O)-代表通式(2)或通式(3)的部分,-(Y-O)-代表通式(4)的部分的排列或至少兩種通式(4)的部分的隨機排列,且各a和b為0至100的整數,但至少a和b之一者不為0。Wherein -(OXO)- represents a moiety of the formula (2) or the formula (3), -(YO)- represents an arrangement of a moiety of the formula (4) or a random arrangement of at least two moieties of the formula (4) And each of a and b is an integer from 0 to 100, but at least one of a and b is not zero.
其中R1 、R2 、R3 、R7 和R8 為相同或不同,並代表鹵素原子、具有6個或更少碳原子的烷基或苯基,R4 、R5 和R6 為相同或不同,並代表氫原子、鹵素原子、具有6個或更少碳原子的烷基或苯基。Wherein R 1 , R 2 , R 3 , R 7 and R 8 are the same or different and represent a halogen atom, an alkyl group having 6 or less carbon atoms or a phenyl group, and R 4 , R 5 and R 6 are the same Or different, and represents a hydrogen atom, a halogen atom, an alkyl group having 6 or less carbon atoms or a phenyl group.
其中R9 、R10 、R11 、R12 、R13 、R14 、R15 和R16 為相同或不同,並代表氫原子、鹵素原子、具有6個或更少碳原子的烷基或苯基,-A-代表具有20個或更少碳原子的線性、分枝或環狀二價烴基。Wherein R 9 , R 10 , R 11 , R 12 , R 13 , R 14 , R 15 and R 16 are the same or different and represent a hydrogen atom, a halogen atom, an alkyl group having 6 or less carbon atoms or benzene The group -A- represents a linear, branched or cyclic divalent hydrocarbon group having 20 or fewer carbon atoms.
其中R17 和R18 為相同或不同,並代表鹵素原子、具有6 個或更少碳原子的烷基或苯基,R19 和R20 為相同或不同,並代表氫原子、鹵素原子、具有6個或更少碳原子的烷基或苯基。Wherein R 17 and R 18 are the same or different and represent a halogen atom, an alkyl group having 6 or less carbon atoms or a phenyl group, and R 19 and R 20 are the same or different and represent a hydrogen atom, a halogen atom, or An alkyl group or a phenyl group of 6 or less carbon atoms.
其中R21 至R28 為相同或不同,並代表氫原子或具有6個或更少碳原子的烷基,B代表單鍵、具有20個或更少碳原子的二價烴基或氧原子。Wherein R 21 to R 28 are the same or different and represent a hydrogen atom or an alkyl group having 6 or less carbon atoms, and B represents a single bond, a divalent hydrocarbon group having 20 or less carbon atoms or an oxygen atom.
其中R29 至R36 為相同或不同,並代表氫原子或具有6個或更少碳原子的烷基,D代表具有20個或更少碳原子的二價烴基。Wherein R 29 to R 36 are the same or different and represent a hydrogen atom or an alkyl group having 6 or less carbon atoms, and D represents a divalent hydrocarbon group having 20 or less carbon atoms.
其中R37 至R47 為相同或不同,並代表氫原子或具有6個或更少碳原子的烷基,c為1至20的整數。Wherein R 37 to R 47 are the same or different and represent a hydrogen atom or an alkyl group having 6 or less carbon atoms, and c is an integer of 1 to 20.
其中E代表具有20個或更少碳原子的二價脂肪族烴基。Wherein E represents a divalent aliphatic hydrocarbon group having 20 or less carbon atoms.
此外,本發明係關於藉由硬化上述樹脂組成物獲得的硬化物、經由將上述樹脂組成物加工成薄膜形式獲得的硬化性薄膜和經由將上述樹脂組成物硬化成薄膜形式獲得的 薄膜。Further, the present invention relates to a cured product obtained by curing the above resin composition, a curable film obtained by processing the above resin composition into a film form, and a hardened film obtained by hardening the above resin composition into a film form. film.
由於使用本發明的硬化性樹脂組成物,可在氧存在時進行硬化。因此,特別地,可容易地獲得塗料薄膜或薄膜形式的硬化物。此外,因為可降低硬化溫度,所以生產能力得到提升。由本發明樹脂組成物獲得的硬化物有優良的低介電特性、高耐熱性、耐化學性和機械性能,因此預期本發明的樹脂組成物可用於高頻電子部件的絕緣材料、半導體的絕緣材料、線路板增件的材料、覆銅箔層壓板的材料、塗料材料、塗料、黏合劑、電容器(condenser)的膜、管芯連接膜、覆蓋層膜、導電糊、阻焊膜、柔性線路板的材料、纖維增強塑膠,等等。因此,其工業上的意義是非常高的。Since the curable resin composition of the present invention is used, it can be hardened in the presence of oxygen. Therefore, in particular, a cured product in the form of a coating film or a film can be easily obtained. In addition, since the hardening temperature can be lowered, the productivity is improved. The cured product obtained from the resin composition of the present invention has excellent low dielectric properties, high heat resistance, chemical resistance and mechanical properties, and therefore it is expected that the resin composition of the present invention can be used for insulating materials of high frequency electronic components and insulating materials for semiconductors. Material of circuit board add-on, material of copper clad laminate, coating material, coating, adhesive, film of capacitor, die connection film, cover film, conductive paste, solder mask, flexible circuit board Materials, fiber reinforced plastics, and more. Therefore, its industrial significance is very high.
由通式(1)代表的用於本發明的硬化性樹脂組成物的乙烯基化合物(a)並未特別限定,只要其是由通式(1)代表的乙烯基化合物,其中-(O-X-O)-代表通式(2)的部份,且其中R1 、R2 、R3 、R7 和R8 為相同或不同,並代表鹵素原子、具有6個或更少碳原子的烷基或苯基、R4 、R5 和R6 為相同或不同,並代表氫原子、鹵素原子、具有6個或更少碳原子的烷基或苯基;或者通式(3)的部分,且其中R9 、R10 、R11 、R12 、R13 、R14 、R15 和R16 為相同或不同,並代表氫原子、鹵素原子、具有6個或更少碳原子的烷基或苯基、-A-代表具有20個或更少碳原子的線性、分枝或環 狀二價烴基的部分;-(Y-O)-代表通式(4)的部分之排列或至少兩種通式(4)的部分之隨機排列,且其中R17 和R18 為相同或不同,並代表鹵素原子、具有6個或更少碳原子的烷基或苯基、R19 和R20 為相同或不同,並代表氫原子、鹵素原子、具有6個或更少碳原子的烷基或苯基;且各a和b為0至100的整數,但至少a和b之一者不為0。此外硬化性樹脂組成物中可包含至少兩種具有不同結構的乙烯基化合物(a)。The vinyl compound (a) used in the curable resin composition of the present invention represented by the general formula (1) is not particularly limited as long as it is a vinyl compound represented by the general formula (1), wherein -(OXO) a portion representing the formula (2), and wherein R 1 , R 2 , R 3 , R 7 and R 8 are the same or different and represent a halogen atom, an alkyl group having 6 or less carbon atoms or a benzene The group, R 4 , R 5 and R 6 are the same or different and represent a hydrogen atom, a halogen atom, an alkyl group having 6 or less carbon atoms or a phenyl group; or a moiety of the formula (3), and wherein R 9 , R 10 , R 11 , R 12 , R 13 , R 14 , R 15 and R 16 are the same or different and represent a hydrogen atom, a halogen atom, an alkyl group having 6 or less carbon atoms or a phenyl group, -A- represents a moiety having a linear, branched or cyclic divalent hydrocarbon group of 20 or less carbon atoms; -(YO)- represents an arrangement of moieties of the formula (4) or at least two formulas (4) The portions are randomly arranged, and wherein R 17 and R 18 are the same or different and represent a halogen atom, an alkyl group having 6 or fewer carbon atoms or a phenyl group, and R 19 and R 20 are the same or different and represent A hydrogen atom a halogen atom, an alkyl group having 6 or less carbon atoms or a phenyl group; and each of a and b is an integer of 0 to 100, but at least one of a and b is not 0. Further, at least two vinyl compounds (a) having different structures may be contained in the curable resin composition.
通式(3)中-A-的例示包括二價烴基,例如亞甲基、亞乙基、1-甲基亞乙基、1, 1-亞丙基、1, 4-亞苯基雙(1-甲基亞乙基)、1, 3-亞苯基雙(1-甲基亞乙基)、亞環己基、苯基亞甲基、萘基亞甲基、和1-苯基亞乙基。通式(3)中的-A-不限於這些例示。Examples of -A- in the general formula (3) include divalent hydrocarbon groups such as methylene, ethylene, 1-methylethylene, 1, 1-propylene, and 1,4-phenylene bis ( 1-methylethylidene), 1, 3-phenylenebis(1-methylethylidene), cyclohexylene, phenylmethylene, naphthylmethylene, and 1-phenylethylidene base. -A- in the general formula (3) is not limited to these examples.
本發明中乙烯基化合物(a)較佳的乙烯基化合物(a)其中R1 、R2 、R3 、R7 、R8 、R17 和R18 為具有3個或更少的碳原子的烷基,且R4 、R5 、R6 、R9 、R10 、R11 、R12 、R13 、R14 、R15 、R16 、R19 和R20 為氫原子或具有3個或更少碳原子的烷基,特別更佳的乙烯基化合物(a)其中由通式(2)或通式(3)代表的-(O-X-O)-是通式(9)、通式(10)或通式(11)的部分,且由通式(4)代表的-(Y-O)-是通式(12)的部分的排列、通式(13)的部分的排列或通式(12)和通式(13)的部分的隨機排列。The vinyl compound (a) in the present invention is preferably a vinyl compound (a) wherein R 1 , R 2 , R 3 , R 7 , R 8 , R 17 and R 18 have 3 or less carbon atoms. An alkyl group, and R 4 , R 5 , R 6 , R 9 , R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , R 16 , R 19 and R 20 are a hydrogen atom or have 3 or An alkyl group having fewer carbon atoms, particularly preferably a vinyl compound (a) wherein -(OXO)- represented by the general formula (2) or the general formula (3) is a general formula (9) or a general formula (10) Or a moiety of the formula (11), and -(YO)- represented by the formula (4) is an arrangement of a moiety of the formula (12), an arrangement of a moiety of the formula (13) or a formula (12) and A random arrangement of the parts of the formula (13).
其中為R11 、R12 、R13 和R14 為相同或不同,並代表氫原子或甲基,-A-代表具有20個或更少碳原子的線性、分枝或環狀二價烴基。Wherein R 11 , R 12 , R 13 and R 14 are the same or different and represent a hydrogen atom or a methyl group, and -A- represents a linear, branched or cyclic divalent hydrocarbon group having 20 or less carbon atoms.
其中-A-代表具有20個或更少碳原子的線性、分枝或環狀二價烴基。Wherein -A- represents a linear, branched or cyclic divalent hydrocarbon group having 20 or fewer carbon atoms.
關於乙烯基化合物(a)的分子量,其數均分子量較佳為500至3,000,分子量分佈(重均分子量/數均分子量)較佳在1至3的範圍內。當數均分子量小於500時,硬化性樹脂組成物的塗料膜易於發黏。當數均分子量超過3,000時,樹脂組成物在溶劑中的溶解度下降。當分子量分佈超過3時,在某些情況下,硬化性樹脂組成物在溶劑中的溶解度不佳且硬化性樹脂組成物的硬化物的玻璃化 轉移溫度降低。生產乙烯基化合物(a)的方法並未特別限定。例如,由雙官能酚化合物和單官能酚化合物的氧化偶合獲得的雙官能亞苯基醚低聚物的末端酚羥基經乙烯基苄基醚化而生產乙烯基化合物(a)。The molecular weight of the vinyl compound (a) preferably has a number average molecular weight of 500 to 3,000, and the molecular weight distribution (weight average molecular weight / number average molecular weight) is preferably in the range of 1 to 3. When the number average molecular weight is less than 500, the coating film of the curable resin composition is liable to be sticky. When the number average molecular weight exceeds 3,000, the solubility of the resin composition in the solvent is lowered. When the molecular weight distribution exceeds 3, in some cases, the solubility of the curable resin composition in a solvent is poor and the hardening of the curable resin composition is vitrified. The transfer temperature is lowered. The method for producing the vinyl compound (a) is not particularly limited. For example, a terminal phenolic hydroxyl group of a difunctional phenylene ether oligomer obtained by oxidative coupling of a bifunctional phenol compound and a monofunctional phenol compound is etherified with a vinyl benzyl group to produce a vinyl compound (a).
可例如將雙官能酚化合物、單官能酚化合物和催化劑溶解於溶劑中並隨後在加熱攪拌下將氧加入所得溶液,獲得雙官能亞苯基醚低聚物。For example, a bifunctional phenol compound, a monofunctional phenol compound, and a catalyst are dissolved in a solvent and then oxygen is added to the resulting solution under heating and stirring to obtain a difunctional phenylene ether oligomer.
雙官能酚化合物的例示包括2, 2',3, 3',5, 5'-六甲基-(1, 1'-二苯基)-4, 4'-二醇、4, 4'-亞甲基雙(2, 6-二甲基酚)、4, 4'-二羥基苯基甲烷和2, 2-雙(4-羥基苯基)丙烷。雙官能酚化合物不限於這些例示。Examples of the bifunctional phenol compound include 2, 2', 3, 3', 5, 5'-hexamethyl-(1, 1'-diphenyl)-4, 4'-diol, 4, 4'- Methylene bis(2,6-dimethylphenol), 4,4'-dihydroxyphenylmethane and 2,2-bis(4-hydroxyphenyl)propane. The bifunctional phenol compound is not limited to these examples.
單官能酚化合物通常為2, 6-二甲基酚或2, 3, 6-三甲基酚。單官能酚化合物不限於這些例示。The monofunctional phenol compound is usually 2,6-dimethylphenol or 2,3,6-trimethylphenol. The monofunctional phenol compound is not limited to these examples.
催化劑為例如銅鹽和胺的結合。銅鹽的例示包括CuCl、CuBr、CuI、CuCl2 和CuBr2 。胺的例示包括二正丁胺、正丁基二甲胺、N, N'-二第三丁基乙二胺,N, N, N',N'-四甲基乙二胺、吡啶、哌啶和咪唑。催化劑不限於這些例示。The catalyst is, for example, a combination of a copper salt and an amine. Examples of copper salts include CuCl, CuBr, CuI, CuCl 2 and CuBr 2 . Examples of amines include di-n-butylamine, n-butyldimethylamine, N,N'-di-t-butylethylenediamine, N,N,N',N'-tetramethylethylenediamine, pyridine, and piperazine. Pyridine and imidazole. The catalyst is not limited to these examples.
溶劑的例示包括甲苯、甲醇、甲乙酮和二甲苯。溶劑不限於這些例示。Examples of the solvent include toluene, methanol, methyl ethyl ketone, and xylene. The solvent is not limited to these examples.
雙官能亞苯基醚低聚物的末端酚羥基的乙烯基苄基醚化的方法,例如,可將雙官能亞苯基醚低聚物和乙烯基苄基氯化物溶解於溶劑中以獲得溶液,在加熱攪拌下將鹼加入溶液中以使該等成分反應並隨後固化樹脂,而進行其生 產。A method of vinylbenzyl etherification of a terminal phenolic hydroxyl group of a difunctional phenylene ether oligomer, for example, a difunctional phenylene ether oligomer and a vinylbenzyl chloride can be dissolved in a solvent to obtain a solution Adding a base to the solution under heating and stirring to react the components and then curing the resin to carry out the growth Production.
乙烯基苄基氯化物包括鄰乙烯基苄基氯化物、間乙烯基苄基氯化物、對乙烯基苄基氯化物及其混合物。Vinylbenzyl chloride includes o-vinylbenzyl chloride, m-vinylbenzyl chloride, p-vinylbenzyl chloride, and mixtures thereof.
鹼的例示包括氫氧化鈉、氫氧化鉀、甲醇鈉和乙醇鈉。Examples of the base include sodium hydroxide, potassium hydroxide, sodium methoxide, and sodium ethoxide.
鹼不限於這些例示。The base is not limited to these examples.
可用酸中和反應後殘留的鹼。酸的例示包括鹽酸、硫酸、磷酸、硼酸和硝酸。酸不限於這些例示。The base remaining after the reaction can be neutralized with an acid. Examples of the acid include hydrochloric acid, sulfuric acid, phosphoric acid, boric acid, and nitric acid. The acid is not limited to these examples.
用於反應的溶劑的例示包括甲苯、二甲苯、丙酮、甲乙酮、甲基異丁基酮,二甲基甲醯胺、二甲基乙醯胺、二氯甲烷和氯仿。用於反應的溶劑不限於這些例示。Examples of the solvent used for the reaction include toluene, xylene, acetone, methyl ethyl ketone, methyl isobutyl ketone, dimethylformamide, dimethylacetamide, dichloromethane, and chloroform. The solvent used for the reaction is not limited to these examples.
作為固化的方法,有其中由蒸發溶劑進行的乾燥的固化的方法和其中將反應液體與不良溶劑混合以沉澱固體的方法。其不限於這些方法。As a method of curing, there are a method of curing in which drying by evaporation of a solvent and a method in which a reaction liquid is mixed with a poor solvent to precipitate a solid. It is not limited to these methods.
用於本發明的硬化性樹脂組成物的馬來醯亞胺化合物(b)不是特別限定的,只要其選自通式(5)至(8)所代表的馬來醯亞胺化合物,其中R21 至R47 為相同或不同,並代表氫原子或具有6個或更少碳原子的烷基,B代表單鍵、具有20個或更少碳原子的二價烴基或氧原子,D代表具有20個或更少碳原子的二價烴基,E代表具有20個或更少碳原子的二價脂肪族烴基,c為1至20的整數。較佳地,通式(5)至(8)中,R21 至R36 為相同或不同,並代表氫原子、乙基或甲基,R37 至R47 代表氫原子並且E代表具有10個或更少碳原子的脂肪族烴基。The maleic imine compound (b) used in the curable resin composition of the present invention is not particularly limited as long as it is selected from the maleimide compounds represented by the general formulae (5) to (8), wherein R 21 to R 47 are the same or different and represent a hydrogen atom or an alkyl group having 6 or less carbon atoms, B represents a single bond, a divalent hydrocarbon group having 20 or less carbon atoms or an oxygen atom, and D represents A divalent hydrocarbon group of 20 or less carbon atoms, E represents a divalent aliphatic hydrocarbon group having 20 or less carbon atoms, and c is an integer of 1 to 20. Preferably, in the general formulae (5) to (8), R 21 to R 36 are the same or different and represent a hydrogen atom, an ethyl group or a methyl group, R 37 to R 47 represent a hydrogen atom and E represents 10 Or an aliphatic hydrocarbon group having fewer carbon atoms.
如通式(5)的-B-的二價烴基的例示包括亞甲基、亞乙 基、1-甲基亞乙基、1, 1-亞丙基、1, 4-亞苯基雙(1-甲基亞乙基)、1, 3-亞苯基雙(1-甲基亞乙基)、亞環己基、苯基亞甲基、萘基亞甲基、1-苯基亞乙基、1, 3-亞苯基和1, 4-亞苯基。其不限於這些例示。Examples of the divalent hydrocarbon group of -B- as in the formula (5) include methylene and ethylene 1, 1-methylethylene, 1, 1-propylene, 1, 4-phenylene bis(1-methylethylidene), 1, 3-phenylene bis(1-methyl Ethyl), cyclohexylene, phenylmethylene, naphthylmethylene, 1-phenylethylene, 1,3-phenylene and 1,4-phenylene. It is not limited to these examples.
通式(6)中-D-的例示包括1-甲基亞乙基二(-4, 1-亞苯基)、亞甲基二(-4, 1-亞苯基),1, 3-亞苯基和1, 4-亞苯基。其不限於這些例示。Examples of -D- in the formula (6) include 1-methylethylenedi(-4,1-phenylene), methylenebis(-4,1-phenylene), 1, 3- Phenylene and 1,4-phenylene. It is not limited to these examples.
通式(8)中-E-的例示包括乙烯、1, 4-丁烯、1, 6-己烯和2, 2, 4-三甲基-1, 6-己烯。其不限於這些例示。Examples of -E- in the formula (8) include ethylene, 1,4-butene, 1,6-hexene, and 2,2,4-trimethyl-1,6-hexene. It is not limited to these examples.
馬來醯亞胺化合物(b)可單獨使用。此外,兩種或兩種以上馬來醯亞胺化合物(b)可結合使用。The maleic imine compound (b) can be used alone. Further, two or more of the maleimide compounds (b) may be used in combination.
用於本發明的硬化性樹脂組成物的苯乙烯熱塑性彈性體(c)的例示包括苯乙烯丁二烯苯乙烯共聚物(SBS)、氫化苯乙烯丁二烯苯乙烯共聚物(SEBS)、苯乙烯異戊二烯苯乙烯共聚物(SIS)、氫化苯乙烯異戊二烯苯乙烯共聚物、苯乙烯(丁二烯/異戊二烯)苯乙烯共聚物和氫化苯乙烯(丁二烯/異戊二烯)苯乙烯共聚物。其中,較佳使用氫化苯乙烯丁二烯苯乙烯共聚物(SEBS)、氫化苯乙烯異戊二烯苯乙烯共聚物或氫化苯乙烯(丁二烯/異戊二烯)苯乙烯共聚物,因為可獲得具有高玻璃化轉移溫度的硬化物且耐熱性得到提升。Examples of the styrene thermoplastic elastomer (c) used in the curable resin composition of the present invention include styrene butadiene styrene copolymer (SBS), hydrogenated styrene butadiene styrene copolymer (SEBS), and benzene. Ethylene isoprene styrene copolymer (SIS), hydrogenated styrene isoprene styrene copolymer, styrene (butadiene / isoprene) styrene copolymer and hydrogenated styrene (butadiene / Isoprene) styrene copolymer. Among them, hydrogenated styrene butadiene styrene copolymer (SEBS), hydrogenated styrene isoprene styrene copolymer or hydrogenated styrene (butadiene/isoprene) styrene copolymer is preferably used because A cured product having a high glass transition temperature can be obtained and heat resistance is improved.
苯乙烯熱塑性彈性體(c)中苯乙烯的含量並未特別限定。為獲得具有更高耐熱性的硬化物,苯乙烯含量較佳為10至70重量%,更佳為20至50重量%。此外,苯乙烯熱 塑性彈性體(c)的重均分子量較佳為10,000至300,000。當其太小時,在某些情況中硬化物的塗料膜有裂縫。當其太大時,將苯乙烯熱塑性彈性體(c)與乙烯基化合物(a)或馬來醯亞胺化合物(b)混合變得困難。The content of styrene in the styrene thermoplastic elastomer (c) is not particularly limited. In order to obtain a cured product having higher heat resistance, the styrene content is preferably from 10 to 70% by weight, more preferably from 20 to 50% by weight. In addition, styrene heat The weight average molecular weight of the plastic elastomer (c) is preferably from 10,000 to 300,000. When it is too small, the coating film of the cured product may be cracked in some cases. When it is too large, it becomes difficult to mix the styrene thermoplastic elastomer (c) with the vinyl compound (a) or the maleimide compound (b).
本發明的硬化性樹脂組成物中乙烯基化合物(a)與馬來醯亞胺化合物(b)的混合比並未特別限定。當乙烯基化合物(a)或者馬來醯亞胺化合物(b)的數量太大時,難以獲得所需硬化性。因此,乙烯基化合物(a)的乙烯基和馬來醯亞胺化合物(b)的馬來醯亞胺基的莫耳比較佳為1:0.1至1:5(乙烯基:馬來醯亞胺基),更佳為1:0.5至1:2。The mixing ratio of the vinyl compound (a) and the maleimide compound (b) in the curable resin composition of the present invention is not particularly limited. When the amount of the vinyl compound (a) or the maleimide compound (b) is too large, it is difficult to obtain desired hardenability. Therefore, the vinyl group of the vinyl compound (a) and the maleimide group of the maleimide compound (b) are preferably from 1:0.1 to 1:5 (vinyl: maleimide) Base), more preferably 1:0.5 to 1:2.
本發明的硬化性樹脂組成物中含有的苯乙烯熱塑性彈性體(c)的量並未特別限定。當其量太大時,不能獲得所需硬化性。因此,(乙烯基化合物(a)+馬來醯亞胺化合物(b)):彈性體(c)的重量比較佳為100:0至30:70,更佳為100:0至50:50。The amount of the styrene thermoplastic elastomer (c) contained in the curable resin composition of the present invention is not particularly limited. When the amount is too large, the desired hardenability cannot be obtained. Therefore, (vinyl compound (a) + maleimide compound (b)): the weight of the elastomer (c) is preferably from 100:0 to 30:70, more preferably from 100:0 to 50:50.
用於本發明中的阻燃劑(d)選自已知的阻燃劑。阻燃劑(d)的例示包括:鹵素阻燃劑,例如溴化環氧樹脂、溴化聚碳酸酯、溴化聚苯乙烯、溴化苯乙烯、溴化鄰苯二甲醯亞胺、四溴雙酚A、五溴苄基(甲基)丙烯酸酯、五溴甲苯、三溴酚、六溴苯,十溴二苯基醚、雙-1, 2-五溴苯基乙烷,氯化聚苯乙烯和氯化石蠟;磷阻燃劑,例如紅磷、磷酸三(甲苯酯)、磷酸三苯酯、磷酸甲苯‧聯苯酯、磷酸三二甲苯酯、磷酸三烷基酯、磷酸二烷基酯、磷酸三(氯 乙基)酯、磷腈、1, 3-亞苯基雙(2, 6-二二甲苯磷酸)酯和10-(2, 5-二羥基苯基)-10H-9-氧雜-10-磷酸菲-10-氧化物;無機阻燃劑,例如氫氧化鋁、氫氧化鎂、通過熱處理氫氧化鋁並減少部分結晶水獲得的熱處理氫氧化鋁、水鋁土、硼酸鋅和三氧化二銻;和有機矽阻燃劑,例如矽橡膠和有機矽樹脂。這些阻燃劑可單獨或結合使用。其中,較佳1, 3-亞苯基雙(2, 6-二二甲苯磷酸)酯,因為其未損害低介電特性。樹脂組成物中磷的含量較佳為0.1至5重量%。The flame retardant (d) used in the present invention is selected from known flame retardants. Examples of the flame retardant (d) include: a halogen flame retardant such as a brominated epoxy resin, a brominated polycarbonate, a brominated polystyrene, a brominated styrene, a phthalimide bromide, and four Bromobisphenol A, pentabromobenzyl (meth) acrylate, pentabromotoluene, tribromophenol, hexabromobenzene, decabromodiphenyl ether, bis-1,2-pentabromophenylethane, chlorination Polystyrene and chlorinated paraffin; phosphorus flame retardant, such as red phosphorus, tris (toluene phosphate), triphenyl phosphate, toluene phthalate, biphenyl phosphate, trialkyl phosphate, phosphoric acid Alkyl ester, tris(phosphoric acid) Ethyl)ester, phosphazene, 1,3-phenylenebis(2,6-dixylphosphonic acid) ester and 10-(2,5-dihydroxyphenyl)-10H-9-oxa-10- Phosphenephenanthrene phosphate-10; inorganic flame retardant, such as aluminum hydroxide, magnesium hydroxide, heat-treated aluminum hydroxide obtained by heat-treating aluminum hydroxide and reducing partially crystal water, bauxite, zinc borate and antimony trioxide And organic antimony flame retardants, such as silicone rubber and organic resin. These flame retardants can be used singly or in combination. Among them, 1,3-phenylenebis(2,6-dixylphosphonic acid) ester is preferred because it does not impair low dielectric properties. The content of phosphorus in the resin composition is preferably from 0.1 to 5% by weight.
用於本發明中的填料(e)選自已知的填料。填料(e)的例示包括纖維填料,例如玻璃纖維、碳纖維、芳論纖維、碳化矽纖維、氧化鋁纖維、硼纖維和液態結晶聚酯纖維;無機針狀單晶,例如碳化矽、氮化矽、氧化鎂、鈦酸鉀和硼鋁酸鹽;無機針狀纖維,例如矽灰石、斜錳矽石、磷酸鹽纖維和海泡石;無機填料,例如矽石粉、熔凝矽石、滑石、氧化鋁、鈦酸鋇、雲母、玻璃微珠、硫酸鋇和玻璃粉;有機填料,例如(甲基)丙烯酸酯的交聯獲得的顆粒聚合物、苯乙烯,等等;和炭黑。這些填料可單獨或結合使用。填料(e)可降低硬化性樹脂組成物的熱膨脹係數。特別,較佳為矽石,因為其可在降低熱膨脹係數的同時不大幅損害低介電特性。樹脂組成物中填料(e)的量較佳為0.1至80重量%,更佳為10至70重量%,因為當其太大時塗料膜的強度下降。The filler (e) used in the present invention is selected from known fillers. Examples of the filler (e) include fibrous fillers such as glass fibers, carbon fibers, aramid fibers, tantalum carbide fibers, alumina fibers, boron fibers, and liquid crystalline polyester fibers; inorganic needle-shaped single crystals such as tantalum carbide, tantalum nitride , magnesium oxide, potassium titanate and boroalumino acid; inorganic acicular fibers, such as asbestos, sillimanite, phosphate fiber and sepiolite; inorganic fillers, such as vermiculite powder, fused vermiculite, talc, Alumina, barium titanate, mica, glass microbeads, barium sulfate and glass frit; organic fillers such as particulate polymers obtained by crosslinking of (meth) acrylate, styrene, etc.; and carbon black. These fillers can be used singly or in combination. The filler (e) can lower the coefficient of thermal expansion of the curable resin composition. In particular, vermiculite is preferred because it can reduce the coefficient of thermal expansion without greatly impairing low dielectric properties. The amount of the filler (e) in the resin composition is preferably from 0.1 to 80% by weight, more preferably from 10 to 70% by weight, because the strength of the coating film is lowered when it is too large.
混合本發明的硬化性樹脂組成物的方法並未特別限 定。例如,有其中將乙烯基化合物(a)、馬來醯亞胺化合物(b)、苯乙烯熱塑性彈性體(c)、阻燃劑(d)和填料(e)溶解並分散於溶劑中以獲得混合物,並隨後經乾燥將溶劑從混合物中去除的方法和其中使用例如Labplast磨機的捏和機將乙烯基化合物(a)、馬來醯亞胺化合物(b)、苯乙烯熱塑性彈性體(c)、阻燃劑(d)和填料(e)混合的方法。The method of mixing the curable resin composition of the present invention is not particularly limited set. For example, there are a vinyl compound (a), a maleimide compound (b), a styrene thermoplastic elastomer (c), a flame retardant (d), and a filler (e) dissolved and dispersed in a solvent to obtain a mixture, and then a method of removing the solvent from the mixture by drying, and a vinyl compound (a), a maleimide compound (b), a styrene thermoplastic elastomer (c) using a kneader such as a Labplast mill ), a method in which the flame retardant (d) and the filler (e) are mixed.
本發明的硬化性樹脂組成物本身甚至在氧存在時經由加熱進行硬化。為了進一步加速硬化速度並因此提升可加工性和經濟效率的目的,可加入熱硬化催化劑。作為熱硬化催化劑,其係可藉由使用加熱或光引發乙烯基聚合的產生陽離子或自由基活性物種的物質而使用。陽離子聚合引發劑的例示包括各自使用BF4 、PF6 、AsF6 或SbF6 作為配對陰離子的二烯丙基碘鎓鹽、三烯丙基鋶鹽和脂肪族鋶鹽。可使用可購得的產品。其例示包括ADEKA K. K.提供的SP70、SP172和CP66,Nippon Soda Co., Ltd.提供的CI2855和CI2823,以及Sanshin Chemical Industry Co., Ltd.提供的SI100L和SI150L。自由基聚合引發劑包括:苯偶姻化合物,例如苯偶姻和苯偶姻甲基;苯乙酮化合物,例如苯乙酮和2, 2-二甲氧基-2-苯基苯乙酮;噻噸酮(thioxanthone)化合物,例如噻噸酮和2, 4-二乙基噻噸酮;雙疊氮基化合物,例如4-4'-雙疊氮基查耳酮、2, 6-雙(4'-疊氮基亞苄基)環己酮和4-4'-雙疊氮基二苯酮;偶氮化合物,例如偶氮雙異丁腈,2, 2-偶氮雙丙烷和 腙;和有機過氧化物,例如2, 5-二甲基-2, 5-二(第三丁基過氧)己烷、2, 5-二甲基-2, 5-二(第三丁基過氧)己烷-3和過氧化二異丙苯。這些硬化催化劑可單獨或結合使用。The curable resin composition of the present invention itself is hardened by heating even in the presence of oxygen. In order to further accelerate the hardening speed and thus improve workability and economic efficiency, a thermosetting catalyst may be added. As the thermosetting catalyst, it can be used by using a substance which generates a cationic or radical active species by heating or photoinitiating vinyl polymerization. Examples of the cationic polymerization initiator include a diallyl iodonium salt, a triallyl sulfonium salt, and an aliphatic sulfonium salt each using BF 4 , PF 6 , AsF 6 or SbF 6 as a counter anion. A commercially available product can be used. Examples thereof include SP70, SP172, and CP66 supplied by ADEKA KK, CI2855 and CI2823 supplied by Nippon Soda Co., Ltd., and SI100L and SI150L supplied by Sanshin Chemical Industry Co., Ltd. The radical polymerization initiator includes: a benzoin compound such as benzoin and benzoin methyl; an acetophenone compound such as acetophenone and 2,2-dimethoxy-2-phenylacetophenone; Thioxanthone compounds such as thioxanthone and 2,4-diethylthioxanthone; bi-azido compounds such as 4-4'-diazide-chalcone, 2,6-double ( 4'-azidobenzylidene)cyclohexanone and 4-4'-bisazidobenzophenone; azo compounds such as azobisisobutyronitrile, 2,2-azobispropane and hydrazine; And organic peroxides such as 2,5-dimethyl-2,5-di(t-butylperoxy)hexane, 2,5-dimethyl-2,5-di(t-butyl) Oxygen)hexane-3 and dicumyl peroxide. These hardening catalysts can be used singly or in combination.
也可將聚合抑制劑加入本發明的硬化性樹脂組成物以提升保存穩定性。聚合抑制劑可選自已知的聚合抑制劑。其例示包括醌,例如氫醌、甲基氫醌、對苯醌、氯醌和三甲基醌,和芳香族二醇。這些聚合抑制劑可單獨或結合使用。A polymerization inhibitor may also be added to the curable resin composition of the present invention to improve storage stability. The polymerization inhibitor can be selected from known polymerization inhibitors. Examples thereof include anthracene such as hydroquinone, methylhydroquinone, p-benzoquinone, chloranil and trimethylhydrazine, and aromatic diol. These polymerization inhibitors can be used singly or in combination.
本發明的硬化性樹脂組成物可包含用於調整物理性質所需的已知偶聯劑、熱固性樹脂、熱塑性樹脂、光硬化樹脂、染料、顏料、增稠劑、潤滑劑、消泡劑、紫外線吸收劑,等等。The curable resin composition of the present invention may contain known coupling agents, thermosetting resins, thermoplastic resins, photohardening resins, dyes, pigments, thickeners, lubricants, defoamers, ultraviolet rays required for adjusting physical properties. Absorbent, and so on.
偶聯劑的例示包括矽烷偶聯劑,例如乙烯基三氯矽烷、乙烯基三乙氧基矽烷、乙烯基三甲氧基矽烷、γ-甲基丙烯醯氧基丙基三甲氧基矽烷、β(3, 4-環氧環己基)乙基三甲氧基矽烷、γ-環氧丙氧基丙基甲基二乙氧基矽烷、N-β(氨基乙基)γ-氨基丙基甲基甲氧基矽烷、γ-氨基丙基三乙氧基矽烷、N-苯基-γ-氨基丙基三甲氧基矽烷、γ-巰基丙基三甲氧基矽烷和γ-氯丙基三甲氧基矽烷,鈦酸酯偶聯劑,鋁偶聯劑,鋯鋁酸酯偶聯劑,有機矽偶聯劑和氟偶聯劑。這些偶聯劑可單獨或結合使用。Examples of coupling agents include decane coupling agents such as vinyl trichloromethane, vinyl triethoxy decane, vinyl trimethoxy decane, γ-methyl propylene methoxy propyl trimethoxy decane, β ( 3, 4-epoxycyclohexyl)ethyltrimethoxydecane, γ-glycidoxypropylmethyldiethoxydecane, N-β(aminoethyl)γ-aminopropylmethylmethoxy Basear, γ-aminopropyltriethoxydecane, N-phenyl-γ-aminopropyltrimethoxydecane, γ-mercaptopropyltrimethoxydecane, and γ-chloropropyltrimethoxydecane, titanium An acid ester coupling agent, an aluminum coupling agent, a zirconium aluminate coupling agent, an organic rhodium coupling agent, and a fluorine coupling agent. These coupling agents can be used singly or in combination.
熱固性樹脂的例示包括:環氧樹脂,例如雙酚A型環氧、雙酚F型環氧、苯酚酚醛清漆型(phenol novolak type)環氧、甲酚酚醛清漆型環氧和二環戊二烯酚醛清漆 型環氧;(甲基)丙烯酸酯,例如雙酚A型環氧(甲基)丙烯酸酯、苯酚酚醛清漆型環氧(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯和雙五赤蘚醇六(甲基)丙烯酸酯;乙烯基化合物,例如二乙烯基苯、二乙烯基萘、二乙烯基苯聚合物、二乙烯基萘聚合物和六甲基雙酚的乙烯基苄基醚;烯丙基化合物,例如三烯丙基氰脲酸酯、三烯丙基異氰脲酸酯、烯丙基改性雙酚A和烯丙基改性聚亞苯基醚;氰酸酯樹脂,例如雙酚A二氰酸酯、四甲基雙酚F二氰酸酯、雙酚M二氰酸酯和苯酚酚醛清漆氰酸酯;氧雜環丁烷樹脂;苯並環丁烯樹脂和苯並 樹脂。這些熱固性樹脂可單獨或結合使用。Examples of thermosetting resins include: epoxy resins such as bisphenol A type epoxy, bisphenol F type epoxy, phenol novolak type epoxy, cresol novolac type epoxy, and dicyclopentadiene. Novolak type epoxy; (meth) acrylate, such as bisphenol A type epoxy (meth) acrylate, phenol novolac type epoxy (meth) acrylate, trimethylolpropane tri (methyl) Acrylate and bis-erythritol hexa(meth) acrylate; vinyl compounds such as divinyl benzene, divinyl naphthalene, divinyl benzene polymer, divinyl naphthalene polymer and hexamethyl bisphenol Vinyl benzyl ether; allyl compound, such as triallyl cyanurate, triallyl isocyanurate, allyl modified bisphenol A, and allyl modified polyphenylene Ether; cyanate resin, such as bisphenol A dicyanate, tetramethyl bisphenol F dicyanate, bisphenol M dicyanate and phenol novolac cyanate; oxetane resin; benzene And cyclobutene resin and benzo Resin. These thermosetting resins can be used singly or in combination.
熱塑性樹脂的例示包括聚醯胺醯亞胺、聚醯亞胺、聚丁二烯、聚乙烯、聚苯乙烯、聚碳酸酯、苯氧基樹脂、聚異戊二烯、聚酯、聚乙烯基縮丁醛和聚丁二烯。Examples of the thermoplastic resin include polyamidimide, polyimine, polybutadiene, polyethylene, polystyrene, polycarbonate, phenoxy resin, polyisoprene, polyester, polyvinyl Butyral and polybutadiene.
下面將說明通過本發明可獲得的硬化性樹脂組成物溶液。本發明的硬化性樹脂組成物溶液可經由將本發明的硬化性樹脂組成物溶解並分散於溶劑中獲得。The curable resin composition solution obtainable by the present invention will be explained below. The curable resin composition solution of the present invention can be obtained by dissolving and dispersing the curable resin composition of the present invention in a solvent.
溶劑的例示包括丙酮、甲乙酮、甲基異丁基酮、環己酮、環戊酮、乙二醇一甲醚乙酸酯、丙二醇二甲醚、環己烷、苯、甲苯、二甲苯、四氫呋喃、二烷、環戊基甲醚、N, N-二甲基甲醯胺、N, N-二甲基乙醯胺、N-甲基吡咯烷酮、二甲基亞碸、二氯甲烷、氯仿、1, 2-二氯乙烷、乙酸乙酯、乙酸丁酯和γ-丁內酯。溶劑不限於這些例示。這些溶劑可單獨或結合使用。Examples of the solvent include acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, cyclopentanone, ethylene glycol monomethyl ether acetate, propylene glycol dimethyl ether, cyclohexane, benzene, toluene, xylene, tetrahydrofuran. ,two Alkane, cyclopentyl methyl ether, N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, dimethyl hydrazine, dichloromethane, chloroform, 1, 2-Dichloroethane, ethyl acetate, butyl acetate and γ-butyrolactone. The solvent is not limited to these examples. These solvents may be used singly or in combination.
溶解的方法為,例如,其中在含攪拌器的容器內加熱攪拌硬化性樹脂組成物和溶劑的方法。溶解方法不限於上述方法。加熱的溫度較佳為30℃至100℃。The method of dissolving is, for example, a method in which a curable resin composition and a solvent are heated and stirred in a vessel containing a stirrer. The dissolution method is not limited to the above method. The heating temperature is preferably from 30 ° C to 100 ° C.
本發明的硬化性樹脂組成物溶液用於由乾燥去除溶劑獲得硬化性樹脂組成物。此外,本發明的硬化性樹脂組成物溶液是實用的,因為其可用於抗蝕劑、預浸料或類似的物質。The curable resin composition solution of the present invention is used to obtain a curable resin composition by drying the solvent. Further, the curable resin composition solution of the present invention is practical because it can be used for a resist, a prepreg or the like.
例如,通過將本發明的硬化性樹脂組成物在溶劑中的溶液浸透玻璃布、醯胺(aramid)非織織物、液態結晶聚酯非織織物或類似的織物並經乾燥去除溶劑獲得預浸料。上述預浸料可用作覆銅箔層壓板的材料。此外,當將本發明的硬化性樹脂組成物在溶劑中的溶液塗布於其中已產生了電路的襯底上時,其可用作線路板增件的阻焊膜或中間層絕緣層。For example, a prepreg is obtained by impregnating a glass cloth, an aramid nonwoven fabric, a liquid crystalline polyester nonwoven fabric or the like with a solution of the curable resin composition of the present invention in a solvent and drying the solvent to remove the solvent. . The above prepreg can be used as a material for a copper clad laminate. Further, when a solution of the curable resin composition of the present invention in a solvent is applied onto a substrate in which a circuit has been produced, it can be used as a solder resist film or an interlayer insulating layer of a wiring board member.
本發明硬化物可經由硬化本發明的硬化性樹脂組成物獲得。作為硬化的方法,例如,其中樹脂組成物在模具內加熱的方法、其中將樹脂組成物的溶液塗布於例如玻璃板、SUS(矽單向開關)板或FRP(纖維增強塑膠)的基層材料上、經由乾燥去除溶劑並隨後使用烘箱進行加熱的方法,和其中在不使用溶劑的情況下將固態樹脂組成物熔化、將熔化後樹脂組成物在模具內鑄塑並對其進行加熱的方法。雖然本發明的硬化性樹脂組成物可在氧存在時進行固化,但如果需要的話也可施加壓力或使用例如氮或氬的惰性氣體作為硬化氣體。The cured product of the present invention can be obtained by hardening the curable resin composition of the present invention. As a method of hardening, for example, a method in which a resin composition is heated in a mold, in which a solution of a resin composition is applied to a base material such as a glass plate, a SUS (矽 unidirectional switch) plate, or an FRP (fiber reinforced plastic) A method of removing a solvent by drying and then heating using an oven, and a method in which the solid resin composition is melted without using a solvent, the molten resin composition is cast in a mold, and heated. Although the curable resin composition of the present invention can be cured in the presence of oxygen, it is also possible to apply pressure or use an inert gas such as nitrogen or argon as the hardening gas if necessary.
硬化的溫度較佳為100至250℃,硬化的時段較佳為0.1至5小時。The hardening temperature is preferably from 100 to 250 ° C, and the hardening period is preferably from 0.1 to 5 hours.
此外,可將光聚合引發劑摻入本發明的樹脂組成物,並按需要經由紫外線輻射硬化所得樹脂組成物。光聚合引發劑的例示包括:α-二酮,例如苄基和雙乙醯;偶姻醚,例如苯甲醯基乙醚和苯甲醯基異丙醚;噻噸酮,例如噻噸酮、2, 4-二乙基噻噸酮和2-異丙基噻噸酮;二苯酮,例如二苯酮和4, 4'-雙(二甲基氨基)二苯酮;苯乙酮,例如苯乙酮、2, 2'-二甲氧基-2-苯基苯乙酮和β-甲氧基苯乙酮;和氨基苯乙酮,例如2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基丙烷-1-酮和2-苄基-2-二甲基氨基-1-(-4-嗎啉基苯基)-丁酮-1。Further, a photopolymerization initiator may be incorporated into the resin composition of the present invention, and the resulting resin composition is cured by ultraviolet irradiation as needed. Examples of the photopolymerization initiator include: α-diketones such as benzyl and diacetamidine; acetoin ethers such as benzhydryl ether and benzhydryl isopropyl ether; thioxanthone such as thioxanthone, 2 , 4-diethylthioxanthone and 2-isopropylthioxanthone; benzophenones such as benzophenone and 4,4'-bis(dimethylamino)benzophenone; acetophenone, such as benzene Ethyl ketone, 2, 2'-dimethoxy-2-phenylacetophenone and β-methoxyacetophenone; and aminoacetophenone, such as 2-methyl-1-[4-(methyl sulfide) Phenyl]-2-morpholinylpropan-1-one and 2-benzyl-2-dimethylamino-1-(-4-morpholinylphenyl)-butanone-1.
接下來將說明根據本發明可獲得的附加基層材料的硬化性樹脂組成物。本發明附加基層材料的硬化性樹脂組成物藉由將本發明的硬化性樹脂組成物塗布於基層材料上獲得。基層材料的例示包括有機膜基層材料,例如聚乙烯膜、聚丙烯膜、聚碳酸酯膜、聚對苯二甲酸乙二酯膜、乙烯四氟乙烯共聚物膜、將釋放劑塗布於上述膜表面獲得的釋放膜和聚醯亞胺膜;導電箔,例如銅箔和鋁箔;板狀基層材料,例如玻璃板、SUS板和FRP。作為塗布的方法,例如有其中將本發明的硬化性樹脂組成物溶於溶劑中,使用繞線棒刮塗器、模具刮塗器(die coater)、刮刀、baker 塗布器或類似的工具將所得溶液塗布於基層材料上並以乾燥去除溶劑的方法。Next, the curable resin composition of the additional base material obtainable according to the present invention will be explained. The curable resin composition of the additional base material of the present invention is obtained by applying the curable resin composition of the present invention to a base material. Examples of the base material include an organic film base material such as a polyethylene film, a polypropylene film, a polycarbonate film, a polyethylene terephthalate film, an ethylene tetrafluoroethylene copolymer film, and a release agent applied to the film surface Release film and polyimide film obtained; conductive foil such as copper foil and aluminum foil; plate-like base material such as glass plate, SUS plate and FRP. As a coating method, for example, in which the curable resin composition of the present invention is dissolved in a solvent, a wire bar coater, a die coater, a doctor blade, a baker coater or the like is used. The solution is applied to the base material and dried to remove the solvent.
藉由乾燥以去除溶劑的乾燥條件並未特別限定。當採用低溫時,溶劑易於殘留在附加基層材料的硬化性樹脂組成物中。當採用高溫時,樹脂組成物的硬化提前(advance)。因此,乾燥較佳在20℃至150℃的溫度下進行1至90分鐘。樹脂層的厚度可藉由樹脂組成物溶液的濃度和樹脂組成物的塗布厚度調整。當塗布的厚度太厚時,溶劑易於在乾燥的時段內殘存下來。因此,厚度較佳為0.1至500 μm。The drying conditions by drying to remove the solvent are not particularly limited. When a low temperature is employed, the solvent is liable to remain in the curable resin composition of the additional base material. When high temperature is employed, the hardening of the resin composition advances. Therefore, the drying is preferably carried out at a temperature of from 20 ° C to 150 ° C for from 1 to 90 minutes. The thickness of the resin layer can be adjusted by the concentration of the resin composition solution and the coating thickness of the resin composition. When the thickness of the coating is too thick, the solvent is liable to remain in the dry period. Therefore, the thickness is preferably from 0.1 to 500 μm.
本發明附加基層材料的硬化性樹脂組成物可用作印刷線路板的絕緣層或半導體封裝的材料。例如,將本發明的硬化性樹脂組成物在溶劑中的溶液塗布於用作基層材料的銅箔,並隨後乾燥該塗布溶液以獲得附加樹脂的銅箔。將本發明硬化性樹脂組成物在溶劑中的溶液塗布於用作基層材料的可分離塑膠膜,並隨後乾燥該塗布溶液以獲得用於增強的膜、乾燥膜阻焊膜或晶粒黏著膜(die attach film)。可在20℃至150℃的溫度下加熱1至90分鐘乾燥並去除溶劑。此外,僅在去除溶劑後,硬化性樹脂組成物可以非硬化狀態使用。此外,視需要可半硬化硬化性樹脂組成物並使用半硬化性樹脂組成物。The curable resin composition of the additional base material of the present invention can be used as an insulating layer of a printed wiring board or a material of a semiconductor package. For example, a solution of the curable resin composition of the present invention in a solvent is applied to a copper foil used as a base material, and then the coating solution is dried to obtain a copper foil of an additional resin. A solution of the curable resin composition of the present invention in a solvent is applied to a separable plastic film used as a base material, and then the coating solution is dried to obtain a film for reinforcement, a dry film solder mask or a die attach film ( Die attach film). It can be dried by heating at a temperature of 20 ° C to 150 ° C for 1 to 90 minutes and the solvent is removed. Further, the curable resin composition can be used in a non-hardened state only after the solvent is removed. Further, a semi-curable resin composition may be used as needed, and a semi-curable resin composition may be used.
本發明的硬化性薄膜係由本發明的附加基層材料的硬化性樹脂組成物中去除基層材料獲得。去除基層材料的方法通常為蝕刻或剝離。The curable film of the present invention is obtained by removing the base material from the curable resin composition of the additional base material of the present invention. The method of removing the base material is usually etching or stripping.
上述硬化性薄膜可用作例如黏膜。The above curable film can be used, for example, as a mucosa.
根據本發明係獲得附加基層材料的硬化物。藉由硬化附 加基層材料的硬化性樹脂組成物獲得本發明的附加基層材料的硬化物。本發明附加基層材料的硬化性樹脂組成物甚至在氧存在時充分硬化。硬化條件根據存在或不存在聚合引發劑的使用和存在或不存在其他熱固性樹脂的聯合使用而變化。用於硬化的溫度較佳為100至250℃。硬化的時段較佳為0.1至5小時。此外,如果需要的話可施加壓力或使用例如氮或氬的惰性氣體作為硬化氣體。加熱的方法選自例如烘箱或壓縮的已知方法。According to the invention, a cured product of an additional base material is obtained. By hardening The hardenable resin composition of the base material is obtained to obtain a cured product of the additional base material of the present invention. The curable resin composition of the additional base material of the present invention is sufficiently hardened even in the presence of oxygen. The hardening conditions vary depending on the presence or absence of the use of the polymerization initiator and the combined use of the presence or absence of other thermosetting resins. The temperature for hardening is preferably from 100 to 250 °C. The hardening period is preferably from 0.1 to 5 hours. Further, if necessary, pressure may be applied or an inert gas such as nitrogen or argon may be used as the hardening gas. The method of heating is selected from known methods such as oven or compression.
當銅箔用作基層材料時,本發明附加基層材料的硬化物可用做例如柔性印刷線路板材料。When a copper foil is used as the base material, the cured product of the additional base material of the present invention can be used, for example, as a flexible printed wiring board material.
將基層材料從由硬化本發明附加基層材料的硬化性樹脂組成物獲得的附加基層材料的硬化物中去除的方法、將本發明的硬化性薄膜在加熱下硬化或其他方法獲得本發明的薄膜。作為去除基層材料的方法,例如使用蝕刻或剝離。本發明的硬化性薄膜甚至在氧存在時充分硬化。硬化條件根據存在或不存在聚合引發劑的使用和存在或不存在其他熱固性樹脂的聯合使用而變化。硬化的溫度較佳為100至250℃。硬化的時段較佳為0.1至5小時。此外,如果需要的話可施加壓力或使用例如氮或氬的惰性氣體作為硬化氣體。加熱的方法選自例如烘箱或壓縮的已知方法。The film of the present invention is obtained by a method of removing the base material from the cured product of the additional base material obtained by hardening the curable resin composition of the additional base material of the present invention, curing the curable film of the present invention under heating or other methods. As a method of removing the base material, for example, etching or peeling is used. The curable film of the present invention is sufficiently hardened even in the presence of oxygen. The hardening conditions vary depending on the presence or absence of the use of the polymerization initiator and the combined use of the presence or absence of other thermosetting resins. The hardening temperature is preferably from 100 to 250 °C. The hardening period is preferably from 0.1 to 5 hours. Further, if necessary, pressure may be applied or an inert gas such as nitrogen or argon may be used as the hardening gas. The method of heating is selected from known methods such as oven or compression.
本發明的薄膜可用作例如用於電容器的薄膜。The film of the present invention can be used as, for example, a film for a capacitor.
參考下文中的實施例和比較例具體說明本發明,然而本 發明不應限定於這些實施例。測量方法為如下:1)由凝膠滲透色譜法(GPC)獲得數均分子量和重均分子量。根據樣品的GPC曲線和分子量校準曲線進行資料處理。對標準聚苯乙烯分子量和溶析時間的關係進行近似以獲得具有下面公式的分子量校準曲線,The present invention will be specifically described with reference to the following examples and comparative examples, however, The invention should not be limited to these embodiments. The measurement method is as follows: 1) The number average molecular weight and the weight average molecular weight are obtained by gel permeation chromatography (GPC). Data processing was performed based on the GPC curve and molecular weight calibration curve of the sample. The relationship between the molecular weight of the standard polystyrene and the elution time is approximated to obtain a molecular weight calibration curve having the following formula.
LogM=A0 X3 +A1 X2 +A2 X+A3 +A4 /X2 LogM=A 0 X 3 +A 1 X 2 +A 2 X+A 3 +A 4 /X 2
其中,M:分子量,X:溶析時間-19(分鐘),和A:係數。Wherein M: molecular weight, X: elution time -19 (minutes), and A: coefficient.
2)由IR(紅外光譜法)分析中在3,600 cm-1 的吸收強度測定羥基當量(溶液池法;池厚=1mm),其中2, 6-二甲基酚用作標準參考物質,乾燥二氯甲烷用作溶劑。2) Determination of hydroxyl equivalent by solution absorption at 3,600 cm -1 by IR (infrared spectroscopy) analysis (solution cell method; cell thickness = 1 mm), wherein 2,6-dimethylphenol was used as a standard reference material, drying two Methyl chloride is used as a solvent.
3)由IR分析中在910 cm-1 的吸收強度測定乙烯基當量(溶液池法;池厚=1mm),其中1-辛烯用作標準參考物質,二硫化碳用作溶劑。3) The vinyl equivalent (solution pool method; cell thickness = 1 mm) was determined from the absorption intensity at 910 cm -1 in the IR analysis, in which 1-octene was used as a standard reference material and carbon disulfide was used as a solvent.
4)根據TMA(熱機械分析法)拉伸法在2.5 g的載荷、10 mm的卡盤間距和10℃/分鐘的升溫速率下,測量玻璃化轉移溫度(Tg)。樣品寬度為3 mm。4) The glass transition temperature (Tg) was measured according to the TMA (thermo-mechanical analysis) stretching method under a load of 2.5 g, a chuck pitch of 10 mm, and a heating rate of 10 ° C / minute. The sample width is 3 mm.
5)關於介電常數和介電損耗角正切,將膜以圓筒狀卷起並隨後在10 GHz由空腔諧振微擾法測量介電常數和介電損耗角正切的值。5) Regarding the dielectric constant and the dielectric loss tangent, the film was rolled up in a cylindrical shape and then the values of the dielectric constant and the dielectric loss tangent were measured by a cavity resonance perturbation method at 10 GHz.
6)根據JIS K-7127測量斷裂強度。試樣類型為1B。6) The breaking strength was measured in accordance with JIS K-7127. The sample type is 1B.
測試速度為100 mm/分鐘。計算斷裂時段的應力。The test speed is 100 mm/min. Calculate the stress during the break period.
7)關於耐化學性,在25℃將硬化膜浸入四氫呋喃(THF)中1小時並隨後觀測是否出現溶解。(〇:不溶解,×:溶 解)。7) Regarding chemical resistance, the hardened film was immersed in tetrahydrofuran (THF) at 25 ° C for 1 hour and then it was observed whether or not dissolution occurred. (〇: not dissolved, ×: dissolved solution).
8)關於阻燃性,將膜以圓筒狀卷起並隨後依照UL-94標準薄材料垂直著火點測定進行測試。8) Regarding the flame retardancy, the film was rolled up in a cylindrical shape and then tested in accordance with the UL-94 standard thin material vertical ignition point measurement.
9)關於熱膨脹係數,根據TMA拉伸法在2.5 g的載荷、10 mm的卡盤間距和10℃/分鐘的升溫速率下進行測量。9) Regarding the coefficient of thermal expansion, the measurement was carried out according to the TMA stretching method at a load of 2.5 g, a chuck pitch of 10 mm, and a heating rate of 10 ° C / minute.
計算50至100℃的平均熱膨脹係數。樣品寬度為3 mm。The average coefficient of thermal expansion from 50 to 100 ° C was calculated. The sample width is 3 mm.
將3.88 g (17.4 mmol)CuBr2 、0.75 g (4.4 mmol)N, N'-二第三丁基乙二胺、28.04 g (277.6 mmol)正丁基二甲胺和2,600 g甲苯加入具有12升體積並裝配有攪拌器、溫度計、空氣進樣管和擋板的縱向長反應器。在40℃的反應溫度下攪拌混合物。將129.32 g (0.48 mol)2, 2',3, 3',5, 5'-六甲基-(1, 1'-二苯基)-4, 4'-二醇、292.19 g (2.40 mol)2, 6-二甲基酚、0.51 g (2.9 mmol)N, N'-二第三丁基乙二胺和10.90 g (108.0 mmol)正丁基二甲胺分開地溶於2,300 g甲醇中以獲得混合溶液。當使用在5.2 L/min流速的具有8%氧濃度的氮氣-空氣混合氣進行通氣並進行攪拌時,將混合溶液在230分鐘內逐滴加入反應器中的混合物。添加完畢後,將其中溶解有19.89 g (52.3 mmol)乙二胺四乙酸四鈉的1,500 g水加入攪拌混合物以終止反應。分離水層和有機層。隨後,將有機層用1N鹽酸水溶液洗滌並接著用純水洗滌。使用蒸發器將如此獲得的溶液濃縮至50重量%,以獲得833.40 g雙官 能亞苯基醚低聚物(樹脂「A」)的甲苯溶液。樹脂「A」具有930的數均分子量、1,460的重均分子量和465的羥基當量。3.88 g (17.4 mmol) of CuBr 2 , 0.75 g (4.4 mmol) of N,N'-di-t-butylethylenediamine, 28.04 g (277.6 mmol) of n-butyldimethylamine and 2,600 g of toluene were added to have 12 liters A longitudinally long reactor of volume and equipped with a stirrer, thermometer, air sample tube and baffle. The mixture was stirred at a reaction temperature of 40 °C. 129.32 g (0.48 mol) 2, 2',3,3',5,5'-hexamethyl-(1,1'-diphenyl)-4,4'-diol, 292.19 g (2.40 mol) 2,6-Dimethylphenol, 0.51 g (2.9 mmol) of N,N'-di-t-butylethylenediamine and 10.90 g (108.0 mmol) of n-butyldimethylamine are separately dissolved in 2,300 g of methanol To obtain a mixed solution. When aeration and stirring were carried out using a nitrogen-air mixture having an 8% oxygen concentration at a flow rate of 5.2 L/min, the mixed solution was dropwise added to the mixture in the reactor over 230 minutes. After the addition was completed, 1,500 g of water in which 19.89 g (52.3 mmol) of tetrasodium ethylenediaminetetraacetate was dissolved was added to the stirring mixture to terminate the reaction. The aqueous layer and the organic layer are separated. Subsequently, the organic layer was washed with a 1N aqueous solution of hydrochloric acid and then washed with purified water. The solution thus obtained was concentrated to 50% by weight using an evaporator to obtain a toluene solution of 833.40 g of a difunctional phenylene ether oligomer (resin "A"). The resin "A" had a number average molecular weight of 930, a weight average molecular weight of 1,460, and a hydroxyl equivalent of 465.
將833.40 g樹脂「A」的甲苯溶液、160.80 g乙烯基苄基氯化物(商標名稱為CMS-P;由Seimi Chemical Co., Ltd.提供)、1,600 g二氯甲烷、12.95 g苄基二甲胺、420 g純水和175.9 g 30.5重量%的NaOH水溶液加入裝配有攪拌器、溫度計和回流管的反應器。在40℃的反應溫度下攪拌混合物。攪拌進行24小時,並隨後將有機層用1N鹽酸水溶液洗滌並接著用純水洗滌。使用蒸發器將如此獲得的溶液濃縮。將濃縮溶液滴入甲醇以獲得固體。經過濾回收固體,並在真空中乾燥回收固體以獲得501.43 g乙烯基化合物「B」。乙烯基化合物「B」具有1,165的數均分子量、1,630的重均分子量和595g/乙烯基的乙烯基當量。833.40 g of a toluene solution of the resin "A", 160.80 g of vinylbenzyl chloride (trade name: CMS-P; supplied by Seimi Chemical Co., Ltd.), 1,600 g of dichloromethane, 12.95 g of benzyl dimethyl Amine, 420 g of pure water and 175.9 g of a 30.5 wt% aqueous NaOH solution were added to the reactor equipped with a stirrer, a thermometer and a reflux tube. The mixture was stirred at a reaction temperature of 40 °C. The mixture was stirred for 24 hours, and then the organic layer was washed with 1N aqueous hydrochloric acid and then washed with purified water. The solution thus obtained was concentrated using an evaporator. The concentrated solution was dropped into methanol to obtain a solid. The solid was recovered by filtration and dried in vacuo to yield 501.43 g of the compound "B". The vinyl compound "B" had a number average molecular weight of 1,165, a weight average molecular weight of 1,630, and a vinyl equivalent of 595 g/vinyl group.
將9.36 g (42.1 mmol)CuBr2 、1.81 g (10.5 mmol)N, N'-二第三丁基乙二胺、67.77 g (671.0 mmol)正丁基二甲胺和2,600 g甲苯加入具有12升體積並裝配有攪拌器、溫度計、空氣進樣管和擋板的縱向長反應器。在40℃的反應溫度下攪拌混合物。將129.32 g (0.48 mol)2, 2',3, 3',5, 5'-六甲基-(1, 1'-二苯基)-4, 4'-二 醇、878.4 g (7.2 mol)2, 6-二甲基酚、1.22 g (7.2 mmol)N, N'-二第三丁基乙二胺和26.35 g (260.9 mmol)正丁基二甲胺分開地溶於2,300 g甲醇中以獲得混合溶液。當使用在5.2 L/min流速的具有8%氧濃度的氮氣-空氣混合氣進行通氣並進行攪拌時,將混合溶液在230分鐘內逐滴加入反應器中的混合物。添加完畢後,將其中溶解有48.06 g (126.4 mmol)乙二胺四乙酸四鈉的1,500 g水加入攪拌混合物以終止反應。分離水層和有機層。隨後,將有機層用1N鹽酸水溶液洗滌並接著用純水洗滌。使用蒸發器將如此獲得的溶液濃縮至50重量%,以獲得1,981 g雙官能亞苯基醚低聚物(樹脂「C」)的甲苯溶液。樹脂「C」具有1,975的數均分子量、3,514的重均分子量和990的羥基當量。Add 9.36 g (42.1 mmol) of CuBr 2 , 1.81 g (10.5 mmol) of N,N'-di-t-butylethylenediamine, 67.77 g (671.0 mmol) of n-butyldimethylamine and 2,600 g of toluene with 12 liters A longitudinally long reactor of volume and equipped with a stirrer, thermometer, air sample tube and baffle. The mixture was stirred at a reaction temperature of 40 °C. 129.32 g (0.48 mol) 2, 2',3,3',5,5'-hexamethyl-(1,1'-diphenyl)-4,4'-diol, 878.4 g (7.2 mol 2,6-Dimethylphenol, 1.22 g (7.2 mmol) of N,N'-di-t-butylethylenediamine and 26.35 g (260.9 mmol) of n-butyldimethylamine are separately dissolved in 2,300 g of methanol To obtain a mixed solution. When aeration and stirring were carried out using a nitrogen-air mixture having an 8% oxygen concentration at a flow rate of 5.2 L/min, the mixed solution was dropwise added to the mixture in the reactor over 230 minutes. After the addition was completed, 1,500 g of water in which 48.06 g (126.4 mmol) of tetrasodium ethylenediaminetetraacetate was dissolved was added to the stirring mixture to terminate the reaction. The aqueous layer and the organic layer are separated. Subsequently, the organic layer was washed with a 1N aqueous solution of hydrochloric acid and then washed with purified water. The solution thus obtained was concentrated to 50% by weight using an evaporator to obtain a toluene solution of 1,981 g of a difunctional phenylene ether oligomer (resin "C"). The resin "C" had a number average molecular weight of 1,975, a weight average molecular weight of 3,514, and a hydroxyl equivalent of 990.
將833.40 g樹脂「C」的甲苯溶液、76.7 g乙烯基苄基氯化物(CMS-P)、1,600 g二氯甲烷、6.2 g苄基二甲胺、199.5 g純水和83.6 g 30.5重量%的NaOH水溶液加入裝配有攪拌器、溫度計和回流管的反應器。在40℃的反應溫度下攪拌混合物。攪拌進行24小時,並隨後將有機層用1N鹽酸水溶液洗滌並接著用純水洗滌。使用蒸發器將如此獲得的溶液濃縮。將濃縮溶液滴入甲醇以獲得固體。經過濾回收固體,並在真空中乾燥回收固體以獲得450.1 g乙烯基化合物「D」。乙烯基化合物「D」具有2,250的數均分子量、3,920的重均分子量和1,189 g/乙烯基的 乙烯基當量。833.40 g of a resin "C" in toluene solution, 76.7 g of vinylbenzyl chloride (CMS-P), 1,600 g of dichloromethane, 6.2 g of benzyldimethylamine, 199.5 g of pure water, and 83.6 g of 30.5 wt% Aqueous NaOH solution was added to the reactor equipped with a stirrer, a thermometer and a reflux tube. The mixture was stirred at a reaction temperature of 40 °C. The mixture was stirred for 24 hours, and then the organic layer was washed with 1N aqueous hydrochloric acid and then washed with purified water. The solution thus obtained was concentrated using an evaporator. The concentrated solution was dropped into methanol to obtain a solid. The solid was recovered by filtration, and the solid was recovered by drying in vacuo to yield 450.1 g of the compound "D". The vinyl compound "D" has a number average molecular weight of 2,250, a weight average molecular weight of 3,920, and 1,189 g/vinyl. Vinyl equivalent.
將13.1 g (0.12 mol)CuCl、707.0 g (5.5 mol)二正丁胺和4,000 g甲乙酮加入具有12升體積並裝配有攪拌器、溫度計、空氣進樣管和擋板的縱向長反應器。在40℃的反應溫度下攪拌混合物。當使用2 L/min的空氣進行通氣並進行攪拌時,將410.2 g (1.6 mol)4, 4'-亞甲基雙(2, 6-二甲基酚)和586.5 g (4.8 mol)2, 6-二甲基酚於8,000 g甲乙酮中的溶液在120分鐘內逐滴加入反應器中的混合物。將乙二胺四乙酸二鈉二氫水溶液加入攪拌混合物以終止反應。隨後,使用1N鹽酸水溶液進行三次洗滌並接著使用離子交換水進行洗滌。使用蒸發器將如此獲得的溶液濃縮並隨後在減壓下乾燥,以獲得946.6 g雙官能亞苯基醚低聚物(樹脂「E」)。樹脂「E」具有801的數均分子量、1,081的重均分子量和455的羥基當量。13.1 g (0.12 mol) of CuCl, 707.0 g (5.5 mol) of di-n-butylamine and 4,000 g of methyl ethyl ketone were added to a longitudinally long reactor having a volume of 12 liters equipped with a stirrer, a thermometer, an air sample tube and a baffle. The mixture was stirred at a reaction temperature of 40 °C. When using 2 L/min of air for aeration and agitation, 410.2 g (1.6 mol) of 4,4'-methylenebis(2,6-dimethylphenol) and 586.5 g (4.8 mol) 2 were used. A solution of 6-dimethylphenol in 8,000 g of methyl ethyl ketone was added dropwise to the mixture in the reactor over 120 minutes. An aqueous solution of disodium edetate dihydrogen dihydrogen was added to the stirred mixture to terminate the reaction. Subsequently, washing was performed three times with a 1 N aqueous hydrochloric acid solution and then with ion-exchanged water. The solution thus obtained was concentrated using an evaporator and then dried under reduced pressure to obtain 946.6 g of a bifunctional phenylene ether oligomer (resin "E"). The resin "E" had a number average molecular weight of 801, a weight average molecular weight of 1,081, and a hydroxyl equivalent of 455.
將480.0 g樹脂「E」、260.2 g乙烯基苄基氯化物(CMS-P)、2,000 g四氫呋喃、240.1 g碳酸鉀和60.0 g18-冠-6-醚加入裝配有攪拌器、溫度計和回流管的反應器。在30℃的反應溫度下攪拌混合物。攪拌進行6小時。隨後,將混合物用蒸發器濃縮、用2,000 g甲苯稀釋並接著用水洗滌。濃縮有機層並隨後將其滴入甲醇以獲得固體。經過濾回收固體,並在真空中乾燥回收固體以獲得 392.2 g乙烯基化合物「F」。乙烯基化合物「F」具有988的數均分子量、1,420的重均分子量和558g/乙烯基的乙烯基當量。480.0 g of resin "E", 260.2 g of vinylbenzyl chloride (CMS-P), 2,000 g of tetrahydrofuran, 240.1 g of potassium carbonate and 60.0 g of 18-crown-6-ether were added to a mixer equipped with a stirrer, a thermometer and a reflux tube. reactor. The mixture was stirred at a reaction temperature of 30 °C. Stirring was carried out for 6 hours. Subsequently, the mixture was concentrated with an evaporator, diluted with 2,000 g of toluene and then washed with water. The organic layer was concentrated and then dropped into methanol to obtain a solid. The solid was recovered by filtration and dried in vacuo to recover a solid. 392.2 g of vinyl compound "F". The vinyl compound "F" had a number average molecular weight of 988, a weight average molecular weight of 1,420, and a vinyl equivalent of 558 g/vinyl group.
將13.1 g (0.12 mol)CuCl、707.0 g (5.5 mol)二正丁胺和4,000g甲乙酮加入具有12升體積並裝配有攪拌器、溫度計、空氣進樣管和擋板的縱向長反應器。在40℃的反應溫度下攪拌混合物。當使用2 L/min的空氣進行通氣並進行攪拌時,將82.1 g (0.32 mol)4, 4'-亞甲基雙(2, 6-二甲基酚)和586.5 g (4.8 mol)2, 6-二甲基酚於8,000 g甲乙酮中的溶液在120分鐘內逐滴加入反應器中的混合物。將乙二胺四乙酸二鈉二氫水溶液加入攪拌混合物以終止反應。隨後,使用1N鹽酸水溶液進行三次洗滌並接著使用離子交換水進行洗滌。使用蒸發器將如此獲得的溶液濃縮並隨後在減壓下乾燥,以獲得632.5 g雙官能亞苯基醚低聚物(樹脂「G」)。樹脂「G」具有1,884的數均分子量、3,763的重均分子量和840的羥基當量。13.1 g (0.12 mol) of CuCl, 707.0 g (5.5 mol) of di-n-butylamine and 4,000 g of methyl ethyl ketone were placed in a longitudinally long reactor having a volume of 12 liters equipped with a stirrer, a thermometer, an air sample tube and a baffle. The mixture was stirred at a reaction temperature of 40 °C. When using 2 L/min of air for aeration and agitation, 82.1 g (0.32 mol) of 4,4'-methylenebis(2,6-dimethylphenol) and 586.5 g (4.8 mol) 2, A solution of 6-dimethylphenol in 8,000 g of methyl ethyl ketone was added dropwise to the mixture in the reactor over 120 minutes. An aqueous solution of disodium edetate dihydrogen dihydrogen was added to the stirred mixture to terminate the reaction. Subsequently, washing was performed three times with a 1 N aqueous hydrochloric acid solution and then with ion-exchanged water. The solution thus obtained was concentrated using an evaporator and then dried under reduced pressure to obtain 632.5 g of a bifunctional phenylene ether oligomer (resin "G"). The resin "G" had a number average molecular weight of 1,884, a weight average molecular weight of 3,763, and a hydroxyl equivalent of 840.
將480.0 g樹脂「G」、140.5 g乙烯基苄基氯化物(CMS-P)、2,000 g四氫呋喃、129.6 g碳酸鉀和32.4 g18-冠-6-醚加入裝配有攪拌器、溫度計和回流管的反應器。在30℃的反應溫度下攪拌混合物。攪拌進行6小時。隨後,將混合物用蒸發器濃縮、用2,000 g甲苯稀釋並接 著用水洗滌。濃縮有機層並隨後將其滴入甲醇以獲得固體。經過濾回收固體,並在真空中乾燥回收固體以獲得415.3 g乙烯基化合物「H」。乙烯基化合物「H」具有2,128的數均分子量、4,021的重均分子量和1,205 g/乙烯基的乙烯基當量。480.0 g of resin "G", 140.5 g of vinylbenzyl chloride (CMS-P), 2,000 g of tetrahydrofuran, 129.6 g of potassium carbonate and 32.4 g of 18-crown-6-ether were added to a mixer equipped with a stirrer, a thermometer and a reflux tube. reactor. The mixture was stirred at a reaction temperature of 30 °C. Stirring was carried out for 6 hours. Subsequently, the mixture was concentrated with an evaporator, diluted with 2,000 g of toluene and connected. Wash with water. The organic layer was concentrated and then dropped into methanol to obtain a solid. The solid was recovered by filtration and dried in vacuo to yield 415.3 g of vinyl compound "H". The vinyl compound "H" had a number average molecular weight of 2,128, a weight average molecular weight of 4,021, and a vinyl equivalent of 1,205 g/vinyl group.
將18.0 g (78.8 mmol)2, 2-雙(4-羥基苯基)丙烷(雙酚A)、0.172 g (0.77 mmol)CuBr2 、0.199 g (1.15 mmol)N, N'-二第三丁基乙二胺、2.10 g (2.07 mmol)正丁基二甲胺、139 g甲醇和279 g甲苯加入具有2升體積並裝配有攪拌器、溫度計、空氣進樣管和擋板的縱向長反應器。將48.17 g (0.394 mol)2, 6-二甲基酚、0.245 g (1.44 mmol)N, N'-二第三丁基乙二胺和2.628 g (25.9 mmol)正丁基二甲胺分開地溶於133 g甲醇和266 g甲苯中以獲得混合溶液。當使用在0.5 L/min的空氣流速的空氣進行通氣時,將混合溶液在132分鐘內逐滴加入反應器,其中混合物在40℃的液體溫度下攪拌。在添加混合溶液完畢後,將所得混合物進一步攪拌120分鐘。隨後,將其中溶解有2.40 g乙二胺四乙酸四鈉的400 g水加入攪拌混合物以終止反應。分離水層和有機層。隨後,使用純水進行洗滌。使用蒸發器將如此獲得的溶液濃縮。在120℃將濃縮溶液在真空中乾燥3小時,以獲得54.8 g雙官能亞苯基醚低聚物(樹脂「I」)。樹脂「I」具有1,348的數均分 子量、3,267的重均分子量和503的羥基當量。18.0 g (78.8 mmol) 2,2-bis(4-hydroxyphenyl)propane (bisphenol A), 0.172 g (0.77 mmol) CuBr 2 , 0.199 g (1.15 mmol) N, N'-di third Ethylenediamine, 2.10 g (2.07 mmol) n-butyldimethylamine, 139 g methanol and 279 g toluene were added to a longitudinally long reactor with a volume of 2 liters equipped with a stirrer, thermometer, air sample tube and baffle . Separately, 48.17 g (0.394 mol) of 2,6-dimethylphenol, 0.245 g (1.44 mmol) of N,N'-di-t-butylethylenediamine and 2.628 g (25.9 mmol) of n-butyldimethylamine It was dissolved in 133 g of methanol and 266 g of toluene to obtain a mixed solution. When aeration was carried out using air at an air flow rate of 0.5 L/min, the mixed solution was dropwise added to the reactor over 132 minutes, wherein the mixture was stirred at a liquid temperature of 40 °C. After the completion of the addition of the mixed solution, the resulting mixture was further stirred for 120 minutes. Subsequently, 400 g of water in which 2.40 g of tetrasodium ethylenediaminetetraacetate was dissolved was added to the stirring mixture to terminate the reaction. The aqueous layer and the organic layer are separated. Subsequently, washing was carried out using pure water. The solution thus obtained was concentrated using an evaporator. The concentrated solution was dried in vacuum at 120 ° C for 3 hours to obtain 54.8 g of a bifunctional phenylene ether oligomer (resin "I"). The resin "I" had a number average molecular weight of 1,348, a weight average molecular weight of 3,267, and a hydroxyl equivalent of 503.
將25.0 g樹脂「I」、8.69 g乙烯基苄基氯化物(商標名稱為CMS-P;由Seimi Chemical Co., Ltd.提供)和100.0 g二甲基甲醯胺加入裝配有攪拌器、溫度計、回流管和滴液漏斗的1L可分燒瓶。當在50℃加熱下攪拌混合物時,將10.91 g 28重量%甲醇鈉(甲醇溶液)在20分鐘內從滴液漏斗逐滴加入混合物。滴加完畢後,將所得混合物在50℃進一步攪拌1小時。將1.99 g 28重量%甲醇鈉(甲醇溶液)加入反應器,將所得混合物加熱至60℃並攪拌3小時。另外,將1.11 g 85重量%磷酸加入反應器。將所得混合物攪拌10分鐘並隨後冷卻至40℃。將反應混合物滴入150 g純水以獲得固體。經吸濾回收固體。隨後將固體用200 g純水洗滌兩次並用200 g甲醇洗滌三次。在60℃下將洗滌固體在真空中乾燥30小時,以獲得28.25 g乙烯基化合物「J」。乙烯基化合物「J」具有1,435的數均分子量、3,158的重均分子量和612g/乙烯基的乙烯基當量。25.0 g of resin "I", 8.69 g of vinylbenzyl chloride (trade name: CMS-P; supplied by Seimi Chemical Co., Ltd.) and 100.0 g of dimethylformamide were added to the mixer equipped with a stirrer. A 1 L separable flask with a reflux tube and a dropping funnel. When the mixture was stirred under heating at 50 ° C, 10.91 g of 28% by weight sodium methoxide (methanol solution) was added dropwise from the dropping funnel over 20 minutes. After the dropwise addition was completed, the resulting mixture was further stirred at 50 ° C for 1 hour. 1.99 g of 28% by weight sodium methoxide (methanol solution) was charged to the reactor, and the resulting mixture was heated to 60 ° C and stirred for 3 hours. Separately, 1.11 g of 85 wt% phosphoric acid was added to the reactor. The resulting mixture was stirred for 10 minutes and then cooled to 40 °C. The reaction mixture was dropped into 150 g of pure water to obtain a solid. The solid was recovered by suction filtration. The solid was then washed twice with 200 g of purified water and three times with 200 g of methanol. The washed solid was dried in vacuum at 60 ° C for 30 hours to obtain 28.25 g of a vinyl compound "J". The vinyl compound "J" had a number average molecular weight of 1,435, a weight average molecular weight of 3,158, and a vinyl equivalent of 612 g/vinyl group.
將3.88 g (17.4 mmol)CuBr2 、0.75 g (4.4 mmol)N, N'-二第三丁基乙二胺、28.04 g (277.6 mmol)正丁基二甲胺和2,600 g甲苯加入具有12升體積並裝配有攪拌器、溫度計、空氣進樣管和擋板的縱向長反應器。在40℃的 反應溫度下攪拌混合物。將129.3 g (0.48 mol)2, 2',3, 3',5, 5'-六甲基-(1, 1'-二苯基)-4, 4'-二醇、233.7 g (1.92 mol)2, 6-二甲基酚、64.9 g (0.48 mol)2, 3, 6-三甲基酚、0.51 g (2.9 mmol)N, N'-二第三丁基乙二胺和10.90g (108.0 mmol)正丁基二甲胺分開地溶於2,300 g甲醇中以獲得混合溶液。當使用在5.2 L/min流速的具有3%氧濃度的氮氣-空氣混合氣進行通氣並進行攪拌時,將混合溶液在230分鐘內逐滴加入反應器中的混合物。添加完畢後,將其中溶解有19.89 g (52.3 mmol)乙二胺四乙酸四鈉的1,500 g水加入攪拌混合物以終止反應。分離水層和有機層。隨後,將有機層用1N鹽酸水溶液洗滌並接著用純水洗滌。使用蒸發器將如此獲得的溶液濃縮至50重量%,以獲得836.5 g雙官能亞苯基醚低聚物(樹脂「K」)的甲苯溶液。樹脂「K」具有986的數均分子量、1,530的重均分子量和471的羥基當量。3.88 g (17.4 mmol) of CuBr 2 , 0.75 g (4.4 mmol) of N,N'-di-t-butylethylenediamine, 28.04 g (277.6 mmol) of n-butyldimethylamine and 2,600 g of toluene were added to have 12 liters A longitudinally long reactor of volume and equipped with a stirrer, thermometer, air sample tube and baffle. The mixture was stirred at a reaction temperature of 40 °C. 129.3 g (0.48 mol) of 2, 2',3,3',5,5'-hexamethyl-(1,1'-diphenyl)-4,4'-diol, 233.7 g (1.92 mol) 2,6-Dimethylphenol, 64.9 g (0.48 mol) of 2,3,6-trimethylphenol, 0.51 g (2.9 mmol) of N,N'-di-t-butylethylenediamine and 10.90 g ( 108.0 mmol) n-butyldimethylamine was separately dissolved in 2,300 g of methanol to obtain a mixed solution. When aeration and stirring were carried out using a nitrogen-air mixture having a 3% oxygen concentration at a flow rate of 5.2 L/min, the mixed solution was dropwise added to the mixture in the reactor over 230 minutes. After the addition was completed, 1,500 g of water in which 19.89 g (52.3 mmol) of tetrasodium ethylenediaminetetraacetate was dissolved was added to the stirring mixture to terminate the reaction. The aqueous layer and the organic layer are separated. Subsequently, the organic layer was washed with a 1N aqueous solution of hydrochloric acid and then washed with purified water. The solution thus obtained was concentrated to 50% by weight using an evaporator to obtain a toluene solution of 836.5 g of a bifunctional phenylene ether oligomer (resin "K"). The resin "K" had a number average molecular weight of 986, a weight average molecular weight of 1,530, and a hydroxyl equivalent of 471.
將836.5 g樹脂「K」的甲苯溶液、162.6 g乙烯基苄基氯化物(商標名稱為CMS-P;由Seimi Chemical Co., Ltd.提供)、1,600 g二氯甲烷、12.95 g苄基二甲胺、420 g純水和178.0 g 30.5重量%的NaOH水溶液加入裝配有攪拌器、溫度計和回流管的反應器。在40℃的反應溫度下攪拌混合物。攪拌進行24小時。隨後將有機層用1N鹽酸水溶液洗滌並接著用純水洗滌。使用蒸發器將如此獲得的溶液濃縮,並將濃縮溶液滴入甲醇以獲得固體。經過濾回 收固體,並在真空中乾燥回收固體以獲得503.5 g乙烯基化合物「L」。乙烯基化合物「L」具有1,187的數均分子量、1,675的重均分子量和590 g/乙烯基的乙烯基當量。836.5 g of a resin "K" in toluene solution, 162.6 g of vinylbenzyl chloride (trade name: CMS-P; supplied by Seimi Chemical Co., Ltd.), 1,600 g of dichloromethane, 12.95 g of benzyl dimethyl Amine, 420 g of pure water and 178.0 g of a 30.5 wt% aqueous NaOH solution were charged to a reactor equipped with a stirrer, a thermometer and a reflux tube. The mixture was stirred at a reaction temperature of 40 °C. Stirring was carried out for 24 hours. The organic layer was then washed with a 1N aqueous solution of hydrochloric acid and then washed with purified water. The solution thus obtained was concentrated using an evaporator, and the concentrated solution was dropped into methanol to obtain a solid. Filtered back The solid was taken up and dried to recover the solid in vacuo to give 503.5 g of the vinyl compound "L". The vinyl compound "L" had a number average molecular weight of 1,187, a weight average molecular weight of 1,675, and a vinyl equivalent of 590 g/vinyl group.
將40 g(羥基為0.194 mol)萘酚芳烷基樹脂(SN475,由Nippon Steel Chemical Co., Ltd.提供)、37.0 g(0.233 mol)乙烯基苄基氯化物(商標名稱為CMS-P;由Seimi Chemical Co., Ltd.提供)和200 g二甲基甲醯胺加入裝配有磁力攪拌器、戴氏冷凝管、溫度計和滴液漏斗的1 L圓型反應器。用氮置換反應器中的氣體。隨後,在50℃的反應溫度攪拌混合物。將46.2 g(甲醇鈉為0.233 mol)28.4重量%甲醇鈉甲醇溶液放入滴液漏斗中。在30分鐘內將甲醇鈉甲醇溶液加入反應器。在50℃攪拌所得混合物1小時。將另外的3.9 g(甲醇鈉為0.021 mol)28.4重量%甲醇鈉甲醇溶液逐滴加入反應器。滴加完畢後,在60℃攪拌混合物4.5小時以使混合物反應。將2.3 g(0.021 mol)85重量%磷酸水溶液逐滴加入,並攪拌混合物10分鐘。經確認其pH為7。經吸濾去除產生的鹽。隨後,將反應混合物在5分鐘內滴入2,500 g甲醇,以獲得固體。通過吸濾回收固體。隨後,在50℃使用真空乾燥器乾燥固體10小時,以獲得38.4 g乙烯基化合物「M」。將固體進行IR分析和NMR(核磁共振)分析。由IR分析中酚羥基的吸收峰(3600 cm-1 )的消失和NMR分析中由乙烯基苄 基醚產生的峰(4.6-5.8 ppm)的出現確認官能團的轉化。以凝膠滲透色譜法(GPC)測量聚乙烯基化合物「M」,其結果為聚乙烯基化合物「M」具有658的數均分子量、4,534的重均分子量和325 g/乙烯基的乙烯基當量。40 g (hydroxyl 0.194 mol) naphthol aralkyl resin (SN475, supplied by Nippon Steel Chemical Co., Ltd.), 37.0 g (0.233 mol) vinyl benzyl chloride (trade name CMS-P; A 1 L round reactor equipped with a magnetic stirrer, a Dairy condenser, a thermometer and a dropping funnel was placed in a solution of 200 g of dimethylformamide supplied by Seimi Chemical Co., Ltd. The gas in the reactor was replaced with nitrogen. Subsequently, the mixture was stirred at a reaction temperature of 50 °C. 46.2 g (0.23 mol of sodium methoxide) and 28.4% by weight of sodium methoxide in methanol were placed in a dropping funnel. A solution of sodium methoxide in methanol was added to the reactor over 30 minutes. The resulting mixture was stirred at 50 ° C for 1 hour. An additional 3.9 g (0.01 mol of sodium methoxide) of 28.4 wt% sodium methoxide in methanol was added dropwise to the reactor. After the dropwise addition was completed, the mixture was stirred at 60 ° C for 4.5 hours to allow the mixture to react. 2.3 g (0.021 mol) of an 85% by weight aqueous phosphoric acid solution was added dropwise, and the mixture was stirred for 10 minutes. It was confirmed that the pH was 7. The resulting salt was removed by suction filtration. Subsequently, the reaction mixture was dropped into 2,500 g of methanol over 5 minutes to obtain a solid. The solid was recovered by suction filtration. Subsequently, the solid was dried using a vacuum dryer at 50 ° C for 10 hours to obtain 38.4 g of a vinyl compound "M". The solid was subjected to IR analysis and NMR (nuclear magnetic resonance) analysis. The disappearance of the absorption peak of the phenolic hydroxyl group (3600 cm -1 ) in the IR analysis and the appearance of a peak derived from vinylbenzyl ether (4.6-5.8 ppm) in the NMR analysis confirmed the conversion of the functional group. The polyvinyl compound "M" was measured by gel permeation chromatography (GPC), and as a result, the polyvinyl compound "M" had a number average molecular weight of 658, a weight average molecular weight of 4,534, and a vinyl equivalent of 325 g/vinyl group. .
將與表1或表2中所示重量比一致的在合成實施例1、2、3、4、5、6和合成比較例1中獲得的乙烯基化合物「B」、「D」、「F」、「H」、「J」、「L」和「M」中之一者和馬來醯亞胺化合物放於具有攪拌器的可分燒瓶中。將N, N-二甲基乙醯胺加入混合物以使混合物具有20重量%的固體含量濃度。將混合物加熱至60℃並攪拌1小時,以製備硬化性樹脂組成物的溶液。用刮刀(間隙為200 μm)將溶液塗布於18-μm電解銅箔(3EC-III,由Mitsui Mining and Smelting Co., Ltd.提供)的光亮表面上。將塗布溶液在室溫下空氣乾燥10分鐘並隨後在50℃下使用空氣鼓風乾燥器乾燥20分鐘,以獲得附加基層材料的硬化性樹脂組成物,其具有大約15 μm的樹脂層厚度。隨後,在200℃使用空氣鼓風乾燥器在空氣中加熱附加基層材料的硬化性樹脂組成物30分鐘,以獲得附加基層材料的硬化物。隨後,通過蝕刻去除作為基層材料的銅箔,以獲得薄膜。薄膜具有大約15 μm的厚度。測量並評估薄膜的玻璃化轉移溫度、介電常數、介電損耗角正切、機械性能和耐化學性。表1和2顯示其結果。The vinyl compounds "B", "D", "F" obtained in Synthesis Examples 1, 2, 3, 4, 5, 6 and Synthesis Comparative Example 1 in accordance with the weight ratios shown in Table 1 or Table 2 were obtained. One of "H", "J", "L" and "M" and the maleidin compound are placed in a separable flask with a stirrer. N,N-dimethylacetamide was added to the mixture to give the mixture a solid content concentration of 20% by weight. The mixture was heated to 60 ° C and stirred for 1 hour to prepare a solution of the curable resin composition. The solution was coated on a shiny surface of a 18-μm electrolytic copper foil (3EC-III, supplied by Mitsui Mining and Smelting Co., Ltd.) with a doctor blade (with a gap of 200 μm). The coating solution was air-dried at room temperature for 10 minutes and then dried at 50 ° C for 20 minutes using an air blow dryer to obtain a curable resin composition of an additional base material having a resin layer thickness of about 15 μm. Subsequently, the curable resin composition of the additional base material was heated in air at 200 ° C for 30 minutes using an air blow dryer to obtain a cured product of the additional base material. Subsequently, a copper foil as a base material is removed by etching to obtain a film. The film has a thickness of about 15 μm. The glass transition temperature, dielectric constant, dielectric loss tangent, mechanical properties and chemical resistance of the film were measured and evaluated. Tables 1 and 2 show the results.
BMI-80:2, 2'-雙[4-(4-馬來醯亞氨基苯氧基)苯基]丙烷(由K I KASEI KK提供,馬來醯亞胺基當量:285 g/馬來醯亞胺基)。BMI-80: 2, 2'-bis[4-(4-maleimidophenoxy)phenyl]propane (supplied by KI KASEI KK, maleic imine equivalent: 285 g/malay) Imino group).
BMI-2300:苯胺、甲醛和馬來酐的縮聚物(由Daiwakasei Industry Co., Ltd.提供,馬來醯亞胺基當量:179 g/馬來醯亞胺基)。BMI-2300: a polycondensate of aniline, formaldehyde and maleic anhydride (supplied by Daiwakasei Industry Co., Ltd., maleimide equivalent: 179 g/maleimido).
BMI-7000:4-甲基-1, 3-亞苯基雙馬來醯亞胺(由Daiwakasei Industry Co., Ltd.提供,馬來醯亞胺基當量:141 g/馬來醯亞胺基)。BMI-7000: 4-methyl-1, 3-phenylene bismaleimide (supplied by Daiwakasei Industry Co., Ltd., maleimine equivalent: 141 g/maleimide group ).
表2中「無法測量」代表不可製備用於測量的樣品,因為硬化物係易脆的。The "unmeasurable" in Table 2 means that the sample for measurement cannot be prepared because the hardened material is brittle.
從實施例1至7和比較例1至8發現,由於將具有亞苯基醚結構的乙烯基化合物和具有特定結構的馬來醯亞胺化合物相結合,所得樹脂組成物可在氧存在時硬化,並也可生產具有高耐熱性、低介電特性、優良機械性能和優良耐化學性的硬化物。From Examples 1 to 7 and Comparative Examples 1 to 8, it was found that the resulting resin composition can be hardened in the presence of oxygen due to the combination of a vinyl compound having a phenylene ether structure and a maleic imine compound having a specific structure. And it can also produce hardened materials with high heat resistance, low dielectric properties, excellent mechanical properties and excellent chemical resistance.
將表3中所示重量比的合成實施例1中獲得的乙烯基化合物「B」、馬來醯亞胺化合物和苯乙烯類熱塑性彈性體置於裝配有攪拌器的可分燒瓶中。將甲苯加入混合物以使混合物具有20重量%的固體含量濃度。將所得混合物加熱至60℃並攪拌1小時,以製備硬化性樹脂組成物的溶液。用刮刀(間隙為200 μm)將溶液塗布於具有50 μm厚度的乙烯四氟乙烯共聚物(ETFE)膜上。在室溫下將塗布溶液空氣乾燥10分鐘,並隨後在50℃下使用空氣鼓風乾燥器乾燥20分鐘,以獲得附加基層材料的硬化性樹脂組成物,其具有大約15 μm的樹脂層厚度。隨後,在200℃使用空氣鼓風乾燥器在空氣中加熱附加基層材料的硬化性樹脂組成物30分鐘,以獲得附加基層材料的硬化物。隨後,用手剝離作為基層材料的ETFE膜,以獲得薄膜。測量並評估薄膜的玻璃化轉移溫度、介電常數、介電損耗角正切、機械性能和耐化學性。表3顯示其結果。The vinyl compound "B", the maleimide compound, and the styrene-based thermoplastic elastomer obtained in Synthesis Example 1 in the weight ratio shown in Table 3 were placed in a separable flask equipped with a stirrer. Toluene was added to the mixture to give the mixture a solid content concentration of 20% by weight. The resulting mixture was heated to 60 ° C and stirred for 1 hour to prepare a solution of the curable resin composition. The solution was coated on a film of ethylene tetrafluoroethylene copolymer (ETFE) having a thickness of 50 μm with a doctor blade (with a gap of 200 μm). The coating solution was air-dried at room temperature for 10 minutes, and then dried at 50 ° C for 20 minutes using an air blow dryer to obtain a curable resin composition of an additional base material having a resin layer thickness of about 15 μm. Subsequently, the curable resin composition of the additional base material was heated in air at 200 ° C for 30 minutes using an air blow dryer to obtain a cured product of the additional base material. Subsequently, the ETFE film as a base material was peeled off by hand to obtain a film. The glass transition temperature, dielectric constant, dielectric loss tangent, mechanical properties and chemical resistance of the film were measured and evaluated. Table 3 shows the results.
BMI-70:3, 3'-二甲基-5, 5'-二乙基-4, 4'-二苯基甲烷雙馬來醯亞胺(由K I KASEI KK提供,馬來醯亞胺基當量:221 g/馬來醯亞胺基)。BMI-70: 3,3'-Dimethyl-5,5'-diethyl-4,4'-diphenylmethane bismaleimide (supplied by KI KASEI KK, maleimine Equivalent: 221 g/maleimide).
BMI-TMH:1, 6-雙馬來醯亞胺-(2, 2, 4-三甲基)己烷(由Daiwakasei Industry Co., Ltd.提供,馬來醯亞胺基當量:159 g/馬來醯亞胺基)。BMI-TMH: 1,6-Bismaleimide-(2, 2, 4-trimethyl)hexane (available from Daiwakasei Industry Co., Ltd., maleimine equivalent: 159 g/ Maleidinium).
S8007L:氫化苯乙烯丁二烯苯乙烯共聚物(SEBS)(由KURARAY Co., Ltd.提供,重均分子量為大約100,000,苯乙烯含量為30重量%)。S8007L: hydrogenated styrene butadiene styrene copolymer (SEBS) (available from KURARAY Co., Ltd., having a weight average molecular weight of about 100,000 and a styrene content of 30% by weight).
從實施例10至13和比較例9發現,由於將具有亞苯基醚結構的乙烯基化合物與具有特定結構的馬來醯亞胺化 合物進一步和苯乙烯類熱塑性彈性體相結合,所得樹脂組成物可在氧存在時硬化,並也可生產具有低介電特性、高耐熱性、優良機械性能和優良耐化學性的硬化物。From Examples 10 to 13 and Comparative Example 9, it was found that a vinyl compound having a phenylene ether structure and a maleate having a specific structure were imidized. Further, in combination with a styrenic thermoplastic elastomer, the resulting resin composition can be hardened in the presence of oxygen, and can also produce a cured product having low dielectric properties, high heat resistance, excellent mechanical properties, and excellent chemical resistance.
將表4中所示重量比的合成實施例2中獲得的乙烯基化合物「D」、馬來醯亞胺化合物和苯乙烯類熱塑性彈性體置於裝配有攪拌器的可分燒瓶中。將甲苯加入混合物以使混合物具有20重量%的固體含量濃度。將所得混合物加熱至60℃並攪拌1小時,以製備硬化性樹脂組成物的溶液。用刮刀(間隙為200 μm)將溶液塗布於具有50 μm厚度的乙烯四氟乙烯共聚物(ETFE)膜上。在室溫下將塗布溶液空氣乾燥10分鐘,並隨後在50℃下使用空氣鼓風乾燥器乾燥20分鐘,以獲得附加基層材料的硬化性樹脂組成物,其具有大約15 μm的樹脂層厚度。隨後,使用惰性烘箱在氮氣中將附加基層材料的硬化性樹脂組成物在150℃加熱2小時或在200℃加熱30分鐘,以獲得附加基層材料的硬化物。隨後,用手剝離ETFE膜,以獲得薄膜。測量並評估薄膜的玻璃化轉移溫度、介電常數、介電損耗角正切、機械性能和耐化學性。表4顯示其結果。The vinyl compound "D", the maleinimide compound and the styrene-based thermoplastic elastomer obtained in Synthesis Example 2 in the weight ratio shown in Table 4 were placed in a separable flask equipped with a stirrer. Toluene was added to the mixture to give the mixture a solid content concentration of 20% by weight. The resulting mixture was heated to 60 ° C and stirred for 1 hour to prepare a solution of the curable resin composition. The solution was coated on a film of ethylene tetrafluoroethylene copolymer (ETFE) having a thickness of 50 μm with a doctor blade (with a gap of 200 μm). The coating solution was air-dried at room temperature for 10 minutes, and then dried at 50 ° C for 20 minutes using an air blow dryer to obtain a curable resin composition of an additional base material having a resin layer thickness of about 15 μm. Subsequently, the curable resin composition of the additional base material was heated in an inert oven at 150 ° C for 2 hours or at 200 ° C for 30 minutes to obtain a cured product of the additional base material. Subsequently, the ETFE film was peeled off by hand to obtain a film. The glass transition temperature, dielectric constant, dielectric loss tangent, mechanical properties and chemical resistance of the film were measured and evaluated. Table 4 shows the results.
從表4發現,由於摻入馬來醯亞胺化合物,所得樹脂組成物可在低溫下硬化,並也可生產具有低介電特性、高耐熱性、優良機械性能和優良耐化學性的硬化物。It is found from Table 4 that the resulting resin composition can be hardened at a low temperature due to the incorporation of a maleic imine compound, and can also produce a cured product having low dielectric properties, high heat resistance, excellent mechanical properties, and excellent chemical resistance. .
將表5中所示重量比的合成實施例1中獲得的乙烯基化合物「B」和/或合成實施例3中獲得的乙烯基化合物「F」、馬來醯亞胺化合物和苯乙烯類熱塑性彈性體置於裝配有攪拌器的可分燒瓶中。將四氫呋喃加入混合物以使混合物具有20重量%的固體含量濃度。將所得混合物加熱至60℃並攪拌1小時,以製備硬化性樹脂組成物的溶液。用刮刀(間隙為200 μm)將溶液塗布於18-μm電解銅箔(3EC-III,由Mitsui Mining and Smelting Co., Ltd. 提供)的光亮表面上。在室溫下將塗布溶液空氣乾燥10分鐘,並隨後在50℃下使用空氣鼓風乾燥器乾燥20分鐘,以獲得附加基層材料的硬化性樹脂組成物,其具有大約15 μm的樹脂層厚度。隨後,在150℃使用空氣鼓風乾燥器在空氣中加熱附加基層材料的硬化性樹脂組成物2小時,以獲得附加基層材料的硬化物。隨後,經蝕刻去除作為基層材料的銅箔,以獲得薄膜。測量並評估薄膜的玻璃化轉移溫度、介電常數、介電損耗角正切、機械性能和耐化學性。表5顯示其結果。The vinyl compound "B" obtained in Synthesis Example 1 shown in Table 5 and/or the vinyl compound "F" obtained in Synthesis Example 3, the maleimide compound, and the styrene thermoplastic The elastomer was placed in a separable flask equipped with a stirrer. Tetrahydrofuran was added to the mixture to give the mixture a solid content concentration of 20% by weight. The resulting mixture was heated to 60 ° C and stirred for 1 hour to prepare a solution of the curable resin composition. The solution was applied to a 18-μm electrolytic copper foil (3EC-III by a scraper (with a gap of 200 μm) by Mitsui Mining and Smelting Co., Ltd. Provided on the shiny surface. The coating solution was air-dried at room temperature for 10 minutes, and then dried at 50 ° C for 20 minutes using an air blow dryer to obtain a curable resin composition of an additional base material having a resin layer thickness of about 15 μm. Subsequently, the curable resin composition of the additional base material was heated in air at 150 ° C for 2 hours using an air blow dryer to obtain a cured product of the additional base material. Subsequently, the copper foil as a base material is removed by etching to obtain a film. The glass transition temperature, dielectric constant, dielectric loss tangent, mechanical properties and chemical resistance of the film were measured and evaluated. Table 5 shows the results.
從實施例16至19和比較例12發現,由於將具有亞苯基醚結構的乙烯基化合物、具有特定結構的馬來醯亞胺化合物和苯乙烯類熱塑性彈性體相結合,所得樹脂組成物可 在氧存在時在低溫下硬化,並也可生產具有低介電特性、高耐熱性、優良機械性能和優良耐化學性的硬化物。From Examples 16 to 19 and Comparative Example 12, it was found that the resulting resin composition can be obtained by combining a vinyl compound having a phenylene ether structure, a maleimide compound having a specific structure, and a styrenic thermoplastic elastomer. It hardens at a low temperature in the presence of oxygen, and can also produce a cured product having low dielectric properties, high heat resistance, excellent mechanical properties, and excellent chemical resistance.
用刮刀(間隙為400 μm)將與實施例10中製備的硬化性樹脂組成物的甲苯溶液同樣的硬化性樹脂組成物甲苯溶液(樹脂固體含量為20重量%)塗布於18-μm電解銅箔(3EC-III)的粗糙表面上。在室溫下將塗布溶液空氣乾燥10分鐘,並隨後在80℃下使用空氣鼓風乾燥器乾燥20分鐘,以獲得各具有大約40 μm的樹脂層厚度的附加基層材料的硬化性樹脂組成物。附加基層材料的硬化性樹脂組成物係放置於兩個表面上都具有線路/間隔(line/space)=100 μm/100 μm圖案的核心材料(core material)(EL190,銅箔厚度為18 μm,由Mitsubishi Gas Chemical Co., Inc.提供)的兩個表面上,一種樹脂組成物於各個表面上。在170℃的加熱和2 MPa的壓力下硬化該樹脂組成物2小時,以獲得四層的板。最外層銅箔的銅箔剝離強度為0.8 kN/m。接著,以蝕刻去除銅箔。隨後發現,內層圖案被覆蓋且沒有空隙。A toluene solution (resin solid content: 20% by weight) of the same curable resin composition as the toluene solution of the curable resin composition prepared in Example 10 was applied to an 18-μm electrolytic copper foil by a doctor blade (with a gap of 400 μm). (3EC-III) on the rough surface. The coating solution was air-dried at room temperature for 10 minutes, and then dried at 80 ° C for 20 minutes using an air blow dryer to obtain a curable resin composition of an additional base material each having a resin layer thickness of about 40 μm. The curable resin composition of the additional base material is placed on a core material having a line/space=100 μm/100 μm pattern on both surfaces (EL190, copper foil thickness is 18 μm, On both surfaces of Mitsubishi Gas Chemical Co., Inc., a resin composition is applied to each surface. The resin composition was hardened under heating at 170 ° C and a pressure of 2 MPa for 2 hours to obtain a four-layered plate. The copper foil peeling strength of the outermost copper foil was 0.8 kN/m. Next, the copper foil is removed by etching. It was subsequently found that the inner layer pattern was covered and there were no voids.
用刮刀(間隙為400 μm)將與實施例11中製備的硬化性樹脂組成物的甲苯溶液同樣的硬化性樹脂組成物甲苯溶液(樹脂固體含量為20重量%)塗布於具有50 μm厚度的乙烯四氟乙烯共聚物(ETFE)膜上。在室溫下將塗布溶液空氣乾燥10分鐘,並隨後在50℃下使用空氣鼓風 乾燥器乾燥20分鐘,以獲得具有大約50 μm的樹脂層厚度的附加基層材料的硬化性樹脂組成物。隨後,用手將ETFE膜從附加基層材料的硬化性樹脂組成物上剝離,以獲得硬化性薄膜。硬化性薄膜夾於兩塊各自的一個表面上具有線路/間隔=100μm/100μm圖案的核心材料之間(HL832,銅箔厚度為12 μm,由Mitsubishi Gas Chemical Co., Inc.提供),以將核心材料的圖案表面與硬化性薄膜接觸。在170℃的加熱和2 MPa的壓力下硬化硬化性薄膜2小時,以將核心材料互相黏合。通過顯微鏡觀察橫截面。隨後發現,內層圖案被覆蓋且沒有空隙。A toluene solution (resin solid content: 20% by weight) of the same curable resin composition as the toluene solution of the curable resin composition prepared in Example 11 was applied to a vinyl having a thickness of 50 μm by a doctor blade (with a gap of 400 μm). On a tetrafluoroethylene copolymer (ETFE) film. The coating solution was air dried at room temperature for 10 minutes, and then air blast at 50 ° C The dryer was dried for 20 minutes to obtain a curable resin composition of an additional base material having a resin layer thickness of about 50 μm. Subsequently, the ETFE film was peeled off from the curable resin composition of the additional base material by hand to obtain a hardenable film. The curable film is sandwiched between core materials having a line/space = 100 μm/100 μm pattern on one of the two surfaces (HL832, copper foil thickness 12 μm, supplied by Mitsubishi Gas Chemical Co., Inc.) to The patterned surface of the core material is in contact with the curable film. The hardened film was cured by heating at 170 ° C and a pressure of 2 MPa for 2 hours to bond the core materials to each other. The cross section was observed through a microscope. It was subsequently found that the inner layer pattern was covered and there were no voids.
將表6中所示重量比的合成實施例1中獲得的乙烯基化合物「B」、馬來醯亞胺化合物、苯乙烯類熱塑性彈性體和阻燃劑置於裝配有攪拌器的可分燒瓶中。將四氫呋喃加入混合物以使混合物具有20重量%的固體含量濃度。將所得混合物加熱至60℃並攪拌1小時,以製備實施例22的阻燃硬化性樹脂組成物的溶液。將矽石加入實施例22的樹脂組成物溶液並攪拌混合這些成分,以製備實施例23含無機填料的硬化性樹脂組成物溶液。用刮刀(間隙為200 μm)將實施例22的樹脂組成物溶液塗布於18-μm電解銅箔(3EC-III,由Mitsui Mining and Smelting Co., Ltd.提供)的光亮表面上。用刮刀(間隙為200 μm)將實施例23的樹脂組成物溶液塗布於18-μm電解銅箔(3EC-III)的光亮表面上。在室溫下將實施例22的塗布 溶液和實施例23的塗布溶液獨立地空氣乾燥10分鐘並隨後在80℃下使用空氣鼓風乾燥器乾燥5分鐘,以分別獲得附加基層材料的硬化性樹脂組成物。各附加基層材料的硬化性樹脂組成物具有大約20 μm的樹脂層厚度。隨後,在150℃使用空氣鼓風乾燥器在空氣中加熱這些附加基層材料的硬化性樹脂組成物2小時,從而分別獲得附加基層材料的硬化物。經蝕刻去除作為基層材料的銅箔,以分別獲得薄膜。測量並評估薄膜的玻璃化轉移溫度、介電常數、介電損耗角正切、機械性能、耐化學性和阻燃性。表6顯示其結果。The vinyl compound "B" obtained in Synthesis Example 1 shown in Table 6 was placed in a separable flask equipped with a stirrer, a maleimide compound, a styrenic thermoplastic elastomer, and a flame retardant. in. Tetrahydrofuran was added to the mixture to give the mixture a solid content concentration of 20% by weight. The resulting mixture was heated to 60 ° C and stirred for 1 hour to prepare a solution of the flame-retardant curable resin composition of Example 22. The vermiculite was added to the resin composition solution of Example 22, and these components were stirred and mixed to prepare a solution of the curable resin composition containing the inorganic filler of Example 23. The resin composition solution of Example 22 was coated on a shiny surface of 18-μm electrolytic copper foil (3EC-III, supplied by Mitsui Mining and Smelting Co., Ltd.) with a doctor blade (with a gap of 200 μm). The resin composition solution of Example 23 was coated on a shiny surface of an 18-μm electrolytic copper foil (3EC-III) with a doctor blade (with a gap of 200 μm). Coating of Example 22 at room temperature The solution and the coating solution of Example 23 were air-dried independently for 10 minutes and then dried at 80 ° C for 5 minutes using an air blow dryer to obtain a curable resin composition of an additional base material, respectively. The curable resin composition of each additional base material has a resin layer thickness of about 20 μm. Subsequently, the curable resin composition of these additional base materials was heated in air at 150 ° C for 2 hours using an air blow dryer to obtain a cured product of the additional base material, respectively. The copper foil as a base material is removed by etching to obtain a film, respectively. The glass transition temperature, dielectric constant, dielectric loss tangent, mechanical properties, chemical resistance, and flame retardancy of the film were measured and evaluated. Table 6 shows the results.
PX200:1, 3-亞苯基雙(2, 6-二-二甲苯磷酸)酯(由Daihachi Chemical Industry Co., Ltd.提供)。PX200: 1, 3-phenylenebis(2,6-di-xylenephosphonate) (supplied by Daihachi Chemical Industry Co., Ltd.).
SC2050:熔凝矽石(ADMAFINE SC-2050:由Admatechs 提供)。SC2050: Fused vermiculite (ADMAFINE SC-2050: by Admatechs provide).
從實施例22發現,由於將具有亞苯基醚結構的乙烯基化合物、具有特定結構的馬來醯亞胺化合物、苯乙烯類熱塑性彈性體進一步和阻燃劑相結合,所得樹脂組成物可在氧存在時在低溫下固化,並也可生產具有低介電特性、高耐熱性、優良機械性能、優良耐化學性和阻燃性的硬化物。此外發現,由於進一步摻入填料,所得樹脂組成物可在氧存在時在低溫下硬化,並也可生產具有低介電特性、高耐熱性、優良機械性能、優良耐化學性、優良阻燃性和低熱膨脹性的硬化物。It was found from Example 22 that, since a vinyl compound having a phenylene ether structure, a maleic imide compound having a specific structure, a styrene-based thermoplastic elastomer, and a flame retardant are further combined, the obtained resin composition can be It cures at a low temperature in the presence of oxygen, and can also produce a cured product having low dielectric properties, high heat resistance, excellent mechanical properties, excellent chemical resistance, and flame retardancy. Further, it has been found that the resin composition obtained can be hardened at a low temperature in the presence of oxygen due to further incorporation of a filler, and can also have low dielectric properties, high heat resistance, excellent mechanical properties, excellent chemical resistance, and excellent flame retardancy. And a low thermal expansion hardened material.
Claims (16)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007144462 | 2007-05-31 | ||
JP2007319601 | 2007-12-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200906905A TW200906905A (en) | 2009-02-16 |
TWI409287B true TWI409287B (en) | 2013-09-21 |
Family
ID=39711980
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW97119495A TWI409287B (en) | 2007-05-31 | 2008-05-27 | Curable resin composition, curable film and their cured products |
Country Status (8)
Country | Link |
---|---|
US (1) | US9062145B2 (en) |
EP (1) | EP1997840B1 (en) |
JP (1) | JP5649773B2 (en) |
KR (2) | KR101559363B1 (en) |
CN (1) | CN101314630B (en) |
DE (1) | DE602008006486D1 (en) |
HK (1) | HK1123816A1 (en) |
TW (1) | TWI409287B (en) |
Families Citing this family (60)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5463110B2 (en) * | 2009-09-24 | 2014-04-09 | ナミックス株式会社 | Coverlay film |
JP5473650B2 (en) * | 2010-02-08 | 2014-04-16 | 三菱レイヨン株式会社 | Resin composition, prepreg using the same, and fiber-reinforced composite material |
EP2599806B1 (en) * | 2010-07-26 | 2017-07-19 | Mitsubishi Chemical Corporation | Resin composition, prepreg using same, and fiber-reinforced composite material |
EP2615054B1 (en) * | 2010-09-09 | 2018-06-06 | Mitsubishi Electric Corporation | Rope for elevator |
JP5883394B2 (en) | 2010-12-14 | 2016-03-15 | 株式会社カネカ | Novel photosensitive resin composition and use thereof |
WO2012128313A1 (en) * | 2011-03-24 | 2012-09-27 | 三菱瓦斯化学株式会社 | Resin composition, prepreg and resin sheet, and metal foil-clad laminate |
WO2012147745A1 (en) * | 2011-04-25 | 2012-11-01 | 株式会社カネカ | Novel photosensitive resin composition and use thereof |
US8598281B2 (en) | 2011-09-01 | 2013-12-03 | Sabic Innovative Plastics Ip B.V. | Epoxybenzyl-terminated poly(arylene ether)s, method for preparation thereof, and curable compositions comprising same |
KR101561106B1 (en) | 2012-01-25 | 2015-10-19 | 가부시키가이샤 가네카 | Novel resin composition for insulating film, and use thereof |
US9957390B2 (en) | 2012-01-25 | 2018-05-01 | Kaneka Corporation | Resin composition for pigment-containing insulating film, and use thereof |
JP5690759B2 (en) * | 2012-02-15 | 2015-03-25 | 株式会社日立製作所 | Thermosetting resin composition, cured product, conductive wire, coil for electrical equipment, and electrical equipment |
CN102807658B (en) | 2012-08-09 | 2014-06-11 | 广东生益科技股份有限公司 | Polyphenyl ether resin composite and prepreg and copper clad laminate made of polyphenyl ether resin composite |
JP6022893B2 (en) * | 2012-10-24 | 2016-11-09 | ナミックス株式会社 | Coverlay film, flexible printed wiring board using the same, and method for producing the same |
CN103965606A (en) * | 2013-02-04 | 2014-08-06 | 联茂电子股份有限公司 | Low dielectric material |
JP6106464B2 (en) * | 2013-02-28 | 2017-03-29 | ナミックス株式会社 | Multilayer electronic component and manufacturing method thereof |
US9245667B2 (en) | 2013-03-18 | 2016-01-26 | Iteq Corporation | Circuit board |
US9455067B2 (en) | 2013-03-18 | 2016-09-27 | Iteq Corporation | Low dielectric materials |
JP6188788B2 (en) | 2013-03-22 | 2017-08-30 | ナミックス株式会社 | Resin composition, and adhesive film, coverlay film, and interlayer adhesive formed thereby |
TWI491671B (en) * | 2013-05-21 | 2015-07-11 | Elite Material Co Ltd | Low dielectric halogen-free resin compositions and circuit boards for which they are used |
JP6301173B2 (en) * | 2014-03-28 | 2018-03-28 | 新日鉄住金化学株式会社 | Curable resin composition, cured product thereof, composite material |
KR102455920B1 (en) * | 2015-01-13 | 2022-10-17 | 쇼와덴코머티리얼즈가부시끼가이샤 | Resin composition, support with resin layer, prepreg, laminated board, multilayer printed wiring board, and printed wiring board for millimeter wave radar |
TWI570200B (en) * | 2015-01-19 | 2017-02-11 | 巴川製紙所股份有限公司 | Thermosetting adhesive composition, thermosetting adhesive film, and composite film |
CN104725828B (en) * | 2015-03-04 | 2017-11-21 | 广东生益科技股份有限公司 | A kind of resin combination and use its prepreg and laminate |
SG11201708802VA (en) * | 2015-04-30 | 2017-11-29 | Hitachi Chemical Co Ltd | Resin composition, prepreg, laminate and multilayer printed wiring board |
JP6675183B2 (en) | 2015-11-30 | 2020-04-01 | ナミックス株式会社 | Thermosetting resin composition, thermosetting resin film, printed wiring board, and semiconductor device |
CN105300432A (en) * | 2015-12-04 | 2016-02-03 | 常熟市裕华计量检测咨询服务有限公司 | Pressure withstanding tester |
US10442115B2 (en) | 2016-05-25 | 2019-10-15 | Johns Manville | Manufacturing thermoplastic composites and articles |
EP3467028B1 (en) * | 2016-05-31 | 2024-04-24 | Mitsubishi Gas Chemical Company, Inc. | Resin composition, laminate, semiconductor wafer with resin composition layer, substrate for mounting semiconductor with resin composition layer, and semiconductor device |
WO2018030112A1 (en) * | 2016-08-10 | 2018-02-15 | パナソニックIpマネジメント株式会社 | Acrylic composition for encapsulation, sheet material, laminated sheet, cured object, semiconductor device, and process for producing semiconductor device |
CN108148196B (en) * | 2016-12-02 | 2020-01-24 | 广东生益科技股份有限公司 | A kind of styryl siloxy polyphenylene ether resin and its preparation method and application |
US20180179424A1 (en) * | 2016-12-23 | 2018-06-28 | Industrial Technology Research Institute | Adhesive composition and composite substrate employing the same |
CN110402269B (en) * | 2017-03-13 | 2022-05-03 | 琳得科株式会社 | Resin composition and resin sheet |
KR102056303B1 (en) * | 2017-05-15 | 2019-12-16 | 주식회사 엘지화학 | Resin composition for semiconductor package, prepreg and metal clad laminate using the same |
TWI765028B (en) * | 2017-06-30 | 2022-05-21 | 日商琳得科股份有限公司 | Resin sheet, laminate, and method for producing resin sheet |
CN111630076B (en) | 2017-12-28 | 2023-10-27 | 松下知识产权经营株式会社 | Resin composition, prepreg, resin-coated film, resin-coated metal foil, metal foil-clad laminate, and wiring board |
KR102165971B1 (en) * | 2018-01-09 | 2020-10-15 | 미츠비시 가스 가가쿠 가부시키가이샤 | Resin composition, prepreg, metal foil coated laminate, resin composite sheet, and printed wiring board |
CN111886267B (en) | 2018-03-28 | 2023-08-25 | 松下知识产权经营株式会社 | Resin composition, and prepreg, resin-equipped film, resin-equipped metal foil, metal-clad laminate and wiring board using the same |
US10995182B2 (en) | 2018-04-30 | 2021-05-04 | Shpp Global Technologies B.V. | Phenylene ether oligomer, curable composition comprising the phenylene ether oligomer, and thermoset composition derived therefrom |
WO2019230531A1 (en) * | 2018-05-29 | 2019-12-05 | ナミックス株式会社 | Thermosetting resin composition, film containing same, and multilayer wiring board using same |
CN112204105B (en) | 2018-06-01 | 2023-04-14 | 三菱瓦斯化学株式会社 | Resin composition, prepreg, metal foil-clad laminate, resin sheet, and printed wiring board |
TW202012481A (en) * | 2018-07-20 | 2020-04-01 | 日商三菱瓦斯化學股份有限公司 | Resin composition, prepreg, metal foil-clad laminated plate, resin sheet, and printed-wiring board |
KR102400111B1 (en) | 2019-02-08 | 2022-05-19 | 주식회사 엘지화학 | Resin composition for semiconductor package, prepreg and metal clad laminate using the same |
JP7219654B2 (en) * | 2019-03-28 | 2023-02-08 | 東京応化工業株式会社 | Composition and method for forming insulation |
JP7507382B2 (en) * | 2019-03-29 | 2024-06-28 | パナソニックIpマネジメント株式会社 | Resin composition, and prepreg, resin-coated film, resin-coated metal foil, metal-clad laminate, and wiring board using the same |
KR102577053B1 (en) * | 2019-04-26 | 2023-09-12 | 디아이씨 가부시끼가이샤 | Curable Resin Composition |
WO2020217675A1 (en) * | 2019-04-26 | 2020-10-29 | Dic株式会社 | Curable resin composition |
WO2020222973A1 (en) | 2019-04-30 | 2020-11-05 | Sabic Global Technologies B.V. | Curable poly(polyphenylene ether) oligomer compositions for coatings |
CN113950509A (en) | 2019-06-27 | 2022-01-18 | 松下知识产权经营株式会社 | Resin composition, prepreg, film with resin, metal foil with resin, metal-clad laminate, and wiring board |
US20220282043A1 (en) * | 2019-08-20 | 2022-09-08 | Tokyo Ohka Kogyo Co., Ltd. | Curable composition for insulating film formation, insulating film formation method, and terminally maleimide-modified polyphenylene ether resin |
US20230098357A1 (en) * | 2020-01-24 | 2023-03-30 | Mitsubishi Gas Chemical Company, Inc. | Resin composition, resin sheet, prepreg and printed wiring board |
JPWO2021172316A1 (en) * | 2020-02-25 | 2021-09-02 | ||
JP7537146B2 (en) | 2020-07-03 | 2024-08-21 | 味の素株式会社 | Resin composition |
WO2022054861A1 (en) * | 2020-09-11 | 2022-03-17 | パナソニックIpマネジメント株式会社 | Resin composition, prepreg, resin-coated film, resin-coated metal foil, metal-clad laminate, and wiring board |
CN112375241B (en) * | 2020-11-03 | 2021-05-11 | 深圳瑞华泰薄膜科技股份有限公司 | Colorless transparent polyimide film and preparation method thereof |
EP4316814A1 (en) | 2021-04-02 | 2024-02-07 | JSR Corporation | Polymer, composition, cured product, multilayer body, and electronic component |
JP7621708B2 (en) | 2021-04-09 | 2025-01-27 | エルジー・ケム・リミテッド | Thermosetting resin composition, cured product thereof and prepreg, laminate plate comprising the cured product or the cured product of the prepreg, metal foil-clad laminate plate, and printed wiring board |
EP4079784A1 (en) * | 2021-04-20 | 2022-10-26 | SHPP Global Technologies B.V. | Phenylene ether oligomer and curable thermosetting composition comprising the phenylene ether oligomer |
JPWO2022255141A1 (en) * | 2021-06-02 | 2022-12-08 | ||
KR102613586B1 (en) * | 2022-12-06 | 2023-12-14 | 주식회사 신아티앤씨 | Low Tan-delta resin composite |
CN117447696A (en) * | 2023-10-25 | 2024-01-26 | 东莞联茂电子科技有限公司 | Curable polyphenylene ether resin, resin composition and application thereof |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4298720A (en) * | 1979-07-23 | 1981-11-03 | Mitsui Toatsu Chemicals Incorporated | Thermosetting resin composition from maleimide compound and alkenyl phenol |
CN1737050A (en) * | 2004-08-19 | 2006-02-22 | 三菱瓦斯化学株式会社 | Curable resin composition, curable film and cured film |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56133355A (en) * | 1980-03-24 | 1981-10-19 | Mitsubishi Gas Chem Co Inc | Curable polyphenylene ether resin composition |
JPS6253319A (en) * | 1985-08-30 | 1987-03-09 | Sumitomo Chem Co Ltd | Thermosetting resin composition |
JPH0370716A (en) | 1989-08-11 | 1991-03-26 | Mitsubishi Petrochem Co Ltd | Bismaleimide resin composition that provides cured products with excellent heat resistance and low water absorption. |
CA2082606A1 (en) | 1991-11-11 | 1993-05-12 | Takanari Yamaguchi | Liquid crystalline polyester resin composition |
JPH05310891A (en) | 1992-05-14 | 1993-11-22 | Mitsubishi Petrochem Co Ltd | Epoxy resin composition and method for curing the same |
JP3617725B2 (en) * | 1995-06-06 | 2005-02-09 | 株式会社東芝 | Resin composition and resin-encapsulated semiconductor device |
FR2781653B1 (en) * | 1998-08-03 | 2000-10-06 | Oreal | DEVICE FOR APPLYING A MAKE-UP PRODUCT COMPRISING A BRUSH, MANUFACTURING METHOD AND APPLICATOR |
CN1522387A (en) * | 2001-05-30 | 2004-08-18 | 钟渊化学工业株式会社 | Photosensitive resin composition and photosensitive dry film resist and photosensitive cover ray film using the same |
US6835785B2 (en) * | 2002-01-28 | 2004-12-28 | Mitsubishi Gas Chemical Company, Inc. | Polyphenylene ether oligomer compound, derivatives thereof and use thereof |
JP4038667B2 (en) * | 2002-07-25 | 2008-01-30 | 三菱瓦斯化学株式会社 | Vinyl compounds and cured products thereof |
DE60313402T2 (en) | 2002-07-25 | 2008-01-17 | Mitsubishi Gas Chemical Co., Inc. | Vinyl compound and cured product thereof |
JP2004067727A (en) * | 2002-08-01 | 2004-03-04 | Mitsubishi Gas Chem Co Inc | Vinyl compound and its cured product |
JP2005120173A (en) * | 2003-10-15 | 2005-05-12 | Mitsubishi Gas Chem Co Inc | Curable resin composition |
JP4314465B2 (en) * | 2003-10-22 | 2009-08-19 | 三菱瓦斯化学株式会社 | Production method of vinyl compounds |
JP2006089683A (en) | 2004-09-27 | 2006-04-06 | Nippon Steel Chem Co Ltd | Flame retardant resin composition |
US7595362B2 (en) * | 2004-01-30 | 2009-09-29 | Nippon Steel Chemical Co., Ltd. | Curable resin composition |
JP4661196B2 (en) * | 2004-07-27 | 2011-03-30 | 日立化成工業株式会社 | Low dielectric constant insulating resin composition |
US7358287B2 (en) * | 2005-05-31 | 2008-04-15 | Ovation Polymer Technology And Engineered Materials, Inc. | Flame retardant polycarbonate composition |
JP4876778B2 (en) * | 2005-12-22 | 2012-02-15 | 三菱瓦斯化学株式会社 | Curable resin composition, curable film and film excellent in storage stability |
JP2007262191A (en) * | 2006-03-28 | 2007-10-11 | Nippon Steel Chem Co Ltd | Flame-retardant curable resin composition |
-
2008
- 2008-05-14 JP JP2008127211A patent/JP5649773B2/en active Active
- 2008-05-22 US US12/153,677 patent/US9062145B2/en active Active
- 2008-05-27 TW TW97119495A patent/TWI409287B/en active
- 2008-05-29 CN CN 200810108861 patent/CN101314630B/en active Active
- 2008-05-30 DE DE200860006486 patent/DE602008006486D1/en active Active
- 2008-05-30 KR KR1020080051131A patent/KR101559363B1/en active IP Right Grant
- 2008-05-30 EP EP20080251904 patent/EP1997840B1/en not_active Ceased
-
2009
- 2009-04-22 HK HK09103680.0A patent/HK1123816A1/en not_active IP Right Cessation
-
2015
- 2015-01-19 KR KR20150008846A patent/KR20150028270A/en not_active Application Discontinuation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4298720A (en) * | 1979-07-23 | 1981-11-03 | Mitsui Toatsu Chemicals Incorporated | Thermosetting resin composition from maleimide compound and alkenyl phenol |
CN1737050A (en) * | 2004-08-19 | 2006-02-22 | 三菱瓦斯化学株式会社 | Curable resin composition, curable film and cured film |
Also Published As
Publication number | Publication date |
---|---|
KR20150028270A (en) | 2015-03-13 |
TW200906905A (en) | 2009-02-16 |
CN101314630A (en) | 2008-12-03 |
US20080300350A1 (en) | 2008-12-04 |
KR101559363B1 (en) | 2015-10-12 |
JP2009161725A (en) | 2009-07-23 |
EP1997840A1 (en) | 2008-12-03 |
CN101314630B (en) | 2011-08-10 |
US9062145B2 (en) | 2015-06-23 |
JP5649773B2 (en) | 2015-01-07 |
HK1123816A1 (en) | 2009-06-26 |
EP1997840B1 (en) | 2011-04-27 |
DE602008006486D1 (en) | 2011-06-09 |
KR20080106118A (en) | 2008-12-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI409287B (en) | Curable resin composition, curable film and their cured products | |
JP5233710B2 (en) | Resin composition, prepreg and metal foil-clad laminate | |
JP5540573B2 (en) | Bismaleamic acid, bismaleimide and cured products thereof | |
TWI781918B (en) | Resin composition, prepreg, metal foil-clad laminate, resin sheet, printed wiring board, and semiconductor device | |
JP4867217B2 (en) | Curable resin composition and curable film and film | |
JP7365574B2 (en) | Maleimide compounds and their production methods, amic acid compounds and their production methods, resin compositions, cured products, resin sheets, prepregs, metal foil clad laminates, printed wiring boards, sealing materials, fiber reinforced composite materials, adhesives, and semiconductor devices | |
WO2020004211A1 (en) | Resin composition and applications thereof | |
CN112004886A (en) | Thermosetting composition, prepreg, metal foil-clad laminate, resin sheet, and printed wiring board | |
TW202248328A (en) | Low dielectric resin composition and an article of manufacture prepared therefrom | |
CN118843649A (en) | Resin composition, cured product, prepreg, metal foil-clad laminate, resin composite sheet, printed wiring board, and semiconductor device | |
CN118891298A (en) | Resin composition, cured product, prepreg, metal foil-clad laminate, resin composite sheet, printed wiring board, and semiconductor device | |
JP5292783B2 (en) | Curable resin composition and cured product thereof | |
JP2009179730A (en) | Curable resin composition, prepreg and copper-clad laminate | |
JP5115135B2 (en) | Curable resin composition and cured product | |
KR20220049920A (en) | Low dielectric resin composite | |
WO2024101237A1 (en) | Resin, resin composition, and use thereof | |
WO2024237106A1 (en) | Resin composition, resin film, prepreg, laminate, printed wiring board, and semiconductor package | |
TW202400696A (en) | Resin composition, cured product, prepreg, metal foil clad laminate, resin composite sheet, printed wiring board, semiconductor device, and method of manufacturing printed wiring board | |
WO2024111380A1 (en) | Resin composition, resin film, prepreg, laminate, printed wiring board, and semiconductor package | |
CN117836342A (en) | Resin composition, and curable film and laminate comprising same |