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TWI402286B - A hardened composition, an anisotropic conductive material, and a connecting structure - Google Patents

A hardened composition, an anisotropic conductive material, and a connecting structure Download PDF

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Publication number
TWI402286B
TWI402286B TW98109226A TW98109226A TWI402286B TW I402286 B TWI402286 B TW I402286B TW 98109226 A TW98109226 A TW 98109226A TW 98109226 A TW98109226 A TW 98109226A TW I402286 B TWI402286 B TW I402286B
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epoxy
above formula
curable composition
component
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TW98109226A
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TW200946555A (en
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Takashi Kubota
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Sekisui Chemical Co Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22Di-epoxy compounds
    • C08G59/30Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen
    • C08G59/302Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen containing sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/321Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
    • H05K3/323Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives by applying an anisotropic conductive adhesive layer over an array of pads

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Dispersion Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Epoxy Resins (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Conductive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Description

硬化性組合物、向異性導電材料及連接構造體Curable composition, anisotropic conductive material and joint structure

本發明係關於一種硬化性組合物,更詳細而言,係關於一種可獲得線膨脹係數較低、且即便受到加熱亦不易自電路基板或電子零件等剝離之硬化物的硬化性組合物,以及使用該硬化性組合物之向異性導電材料及連接構造體。The present invention relates to a curable composition, and more particularly to a curable composition which can obtain a cured product having a low coefficient of linear expansion and which is not easily peeled off from a circuit board or an electronic component or the like even when heated, and The anisotropic conductive material and the bonded structure of the curable composition are used.

向異性導電糊、向異性導電油墨、向異性導電黏接著劑、向異性導電膜、或向異性導電片材等向異性導電材料已廣為人知。Anisotropic conductive pastes, anisotropic conductive pastes, anisotropic conductive adhesives, anisotropic conductive films, or anisotropic conductive sheets, etc., have been widely known.

向異性導電材料被用於IC(Integrated Circuit,積體電路)晶片與可撓性印刷電路基板之連接、以及IC晶片與具有ITO(Indium Tin Oxide,氧化銦錫)電極之電路基板之連接等。例如,於IC晶片之電極與電路基板之電極間配置向異性導電材料後,進行加熱及加壓,藉此可將該等電極彼此連接。The anisotropic conductive material is used for connection between an IC (Integrated Circuit) wafer and a flexible printed circuit board, and connection of an IC chip to a circuit board having an ITO (Indium Tin Oxide) electrode. For example, after the conductive conductive material is placed between the electrode of the IC chip and the electrode of the circuit board, heating and pressurization are performed, whereby the electrodes can be connected to each other.

作為上述向異性導電材料之一例,於下述專利文獻1中揭示有含有熱硬化性絕緣性接著劑、導電性粒子、咪唑潛伏性硬化劑及胺潛伏性硬化劑之向異性導電接著膜。專利文獻1中記載,即便於以相對較低之溫度使該向異性導電接著膜硬化之情形時,連接可靠性亦優異。As an example of the above-mentioned anisotropic conductive material, Patent Document 1 listed below discloses an anisotropic conductive adhesive film containing a thermosetting insulating adhesive, conductive particles, an imidazole latent curing agent, and an amine latent curing agent. Patent Document 1 discloses that the connection reliability is excellent even when the anisotropic conductive adhesive film is cured at a relatively low temperature.

[專利文獻1]日本專利特開平9-115335號公報[Patent Document 1] Japanese Patent Laid-Open No. Hei 9-115335

近年來,為了藉由回流焊將IC晶片封裝於可撓性印刷電路基板上,而使用將焊錫製成球狀之焊錫球。由於回流焊,封裝於IC晶片之電極上之焊錫球發生熔融、固化,由此將IC晶片封裝於可撓性印刷電路基板上。再者,所謂回流焊,係指「於基板之電極上以設有焊錫之電子零件晶片接觸之方式配置電子零件晶片,藉由加熱使該焊錫熔融、固化而進行焊接之方法」。In recent years, in order to package an IC chip on a flexible printed circuit board by reflow soldering, a solder ball in which solder is formed into a spherical shape is used. The solder balls encapsulated on the electrodes of the IC wafer are melted and solidified by reflow soldering, thereby encapsulating the IC chips on the flexible printed circuit board. In addition, the term "reflow soldering" refers to a method in which an electronic component wafer is placed on an electrode of a substrate so as to be in contact with a solder-equipped electronic component wafer, and the solder is melted and solidified by heating to perform soldering.

回流焊時,不僅IC晶片或可撓性印刷電路基板受到加熱,用於連接電極間之向異性導電材料亦受到加熱。特別是若向異性導電材料之硬化物受到加熱,則有時向異性導電材料之硬化物會自IC晶片或可撓性印刷電路基板剝離。因此,強烈要求一種即便在受到加熱時亦不易自IC晶片或可撓性印刷電路基板剝離之向異性導電材料。At the time of reflow soldering, not only the IC chip or the flexible printed circuit board is heated, but also the anisotropic conductive material for connecting the electrodes is heated. In particular, when the cured product of the electrically conductive material is heated, the cured product of the oppositely conductive material may be peeled off from the IC wafer or the flexible printed circuit board. Therefore, there is a strong demand for an anisotropic conductive material which is not easily peeled off from an IC wafer or a flexible printed circuit board even when heated.

對於專利文獻1所記載之向異性導電接著膜而言,使硬化開始所必需之加熱溫度相對較低。然而,存在該向異性導電接著膜之硬化物之線膨脹係數較高的問題。因此,若對使用上述向異性導電接著膜而連接之電路基板進行加熱,則有時向異性導電接著膜會自電路基板剝離。因此有時電極間之連接可靠性會下降。In the anisotropic conductive adhesive film described in Patent Document 1, the heating temperature necessary for the start of curing is relatively low. However, there is a problem that the linear expansion coefficient of the cured product of the anisotropic conductive adhesive film is high. Therefore, when the circuit board connected by using the above-described anisotropic conductive adhesive film is heated, the conductive conductive adhesive film may be peeled off from the circuit substrate. Therefore, the connection reliability between the electrodes may be lowered.

又,近年來,為將電路基板或電子零件之電極間有效率地連接,而要求降低連接所需之加熱溫度、且縮短加壓時間。進而,因電路基板或電子零件容易由於加熱而發生劣化,故強烈要求降低加熱溫度。Moreover, in recent years, in order to efficiently connect the electrodes of a circuit board or an electronic component, it is required to reduce the heating temperature required for connection and to shorten the pressurization time. Further, since the circuit board or the electronic component is easily deteriorated by heating, it is strongly required to lower the heating temperature.

對於專利文獻1所記載之向異性導電接著膜而言,使硬化開始所必需之加熱溫度相對較低。然而,該向異性導電接著膜有時於低溫下未充分進行硬化反應。為使用向異性導電接著膜將電路基板或電子零件之電極間可靠地連接,有時必須提高加熱溫度、或長時間進行加熱。因此,有時無法將電極間有效率地連接。In the anisotropic conductive adhesive film described in Patent Document 1, the heating temperature necessary for the start of curing is relatively low. However, the anisotropic conductive adhesive film sometimes does not sufficiently perform a hardening reaction at a low temperature. In order to reliably connect the electrodes of the circuit board or the electronic component using the anisotropic conductive adhesive film, it is necessary to increase the heating temperature or heat for a long time. Therefore, it is sometimes impossible to efficiently connect the electrodes.

本發明之目的在於提供一種可獲得線膨脹係數較低、且即便受到加熱亦不易自電路基板或電子零件等剝離之硬化物的硬化性組合物,以及使用該硬化性組合物之向異性導電材料及連接構造體。An object of the present invention is to provide a curable composition which can obtain a cured product which has a low coefficient of linear expansion and which is not easily peeled off from a circuit board or an electronic component even when heated, and an anisotropic conductive material using the curable composition. And the connection structure.

又,本發明之限定性目的在於提供一種不僅可獲得線膨脹係數較低之硬化物、而且可於低溫下迅速硬化、且用於連接對象構件之連接時可將連接對象構件有效率地連接之硬化性組合物,以及使用該硬化性組合物之向異性導電材料及連接構造體。Further, a limited object of the present invention is to provide a cured object which can obtain not only a hardened material having a low coefficient of linear expansion but also can be rapidly hardened at a low temperature, and can be connected to a connecting member to be efficiently connected. A curable composition, and an anisotropic conductive material and a bonded structure using the curable composition.

根據本發明之較廣態樣,提供一種如下之硬化性組合物,其含有具有環氧基及噻喃基中之至少一種之成分、以及硬化劑,上述具有環氧基及噻喃基中之至少一種之成分包含具有下述式(1)所表示之結構的化合物之單體、由至少2個該化合物鍵結而成之多聚物、或該單體與該多聚物之混合物:According to a broader aspect of the present invention, there is provided a curable composition comprising a component having at least one of an epoxy group and a thiopyranyl group, and a hardener, wherein the above has an epoxy group and a thiopyranyl group The at least one component comprises a monomer having a compound represented by the following formula (1), a polymer bonded by at least two of the compounds, or a mixture of the monomer and the polymer:

[化1][Chemical 1]

上述式(1)中,R1表示氫原子、碳數為1~5之烷基或下述式(2)所表示之結構,R2表示碳數為1~5之伸烷基,R3表示碳數為1~5之伸烷基,X1表示氧原子或硫原子,X2表示氧原子或硫原子:In the above formula (1), R1 represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or a structure represented by the following formula (2), R2 represents an alkylene group having a carbon number of 1 to 5, and R3 represents a carbon number. It is an alkylene group of 1 to 5, X1 represents an oxygen atom or a sulfur atom, and X2 represents an oxygen atom or a sulfur atom:

[化2][Chemical 2]

上述式(2)中,R4表示碳數為1~5之伸烷基,X3表示氧原子或硫原子。In the above formula (2), R4 represents an alkylene group having a carbon number of 1 to 5, and X3 represents an oxygen atom or a sulfur atom.

於本發明之硬化性組合物之某特定態樣中,上述具有環氧基及噻喃基中之至少一種之成分100重量%中,具有上述式(1)所表示之結構的化合物之單體、由至少2個該化合物鍵結而成之多聚物、或該單體與該多聚物之混合物之含量為5~100重量%之範圍內。In a specific aspect of the curable composition of the present invention, the monomer having a compound represented by the above formula (1) in 100% by weight of the component having at least one of an epoxy group and a thiopyranyl group The polymer obtained by bonding at least two of the compounds or the mixture of the monomer and the polymer is in a range of from 5 to 100% by weight.

於本發明之硬化性組合物中,較好的是上述具有環氧基及噻喃基中之至少一種之成分進而包含具有下述式(11)所表示之結構的環氧化合物之單體、由至少2個該環氧化合物鍵結而成之多聚物、或該單體與該多聚物之混合物。此時,可使硬化性組合物於低溫下迅速硬化。又,若將硬化性組合物用於電路基板之電極與電子零件之電極間的連接,則可將該電極間有效率地連接:In the curable composition of the present invention, it is preferred that the component having at least one of an epoxy group and a thiopyranyl group further contains a monomer having an epoxy compound having a structure represented by the following formula (11), a polymer obtained by bonding at least two of the epoxy compounds or a mixture of the monomers and the polymer. At this time, the curable composition can be rapidly cured at a low temperature. Further, when the curable composition is used for the connection between the electrode of the circuit board and the electrode of the electronic component, the electrodes can be efficiently connected:

[化3][Chemical 3]

上述式(11)中,R11表示碳數為1~10之伸烷基,R12表示碳數為1~10之伸烷基,R13表示氫原子、碳數為1~10之烷基或下述式(12)所表示之結構,R14表示氫原子、碳數為1~10之烷基或下述式(13)所表示之結構:In the above formula (11), R11 represents an alkylene group having a carbon number of 1 to 10, R12 represents an alkylene group having a carbon number of 1 to 10, and R13 represents a hydrogen atom, an alkyl group having a carbon number of 1 to 10 or the following In the structure represented by the formula (12), R14 represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms or a structure represented by the following formula (13):

[化4][Chemical 4]

上述式(12)中,R15表示碳數為1~10之伸烷基;In the above formula (12), R15 represents an alkylene group having a carbon number of 1 to 10;

[化5][Chemical 5]

上述式(13)中,R16表示碳數為1~10之伸烷基。In the above formula (13), R16 represents an alkylene group having a carbon number of 1 to 10.

於本發明之硬化性組合物之其他特定態樣中,上述式(11)中,R13及R14為氫原子。In another specific aspect of the curable composition of the present invention, in the above formula (11), R13 and R14 are a hydrogen atom.

於本發明之硬化性組合物之進而其他特定態樣中,上述具有環氧基及噻喃基中之至少一種之成分100重量%中,具有上述式(11)所表示之結構的環氧化合物之單體、由至少2個該環氧化合物鍵結而成之多聚物、或該單體與該多聚物之混合物之含量為1~50重量%之範圍內。Further, in another specific aspect of the curable composition of the present invention, the epoxy compound having the structure represented by the above formula (11) in 100% by weight of the component having at least one of an epoxy group and a thiopyranyl group The monomer, the polymer obtained by bonding at least two of the epoxy compounds, or the mixture of the monomer and the polymer is in a range of from 1 to 50% by weight.

於本發明之硬化性組合物之另外特定態樣中,上述具有環氧基及噻喃基中之至少一種之成分進而包含具有含氮原子的雜環之環氧化合物。In another specific aspect of the curable composition of the present invention, the component having at least one of an epoxy group and a thiopyranyl group further contains an epoxy compound having a hetero ring containing a nitrogen atom.

於本發明之硬化性組合物之進而另外特定態樣中,上述具有含氮原子的雜環之環氧化合物為下述式(16)所表示之環氧化合物、或下述式(17)所表示之環氧化合物:Further, in another specific aspect of the curable composition of the present invention, the epoxy compound having a hetero ring containing a nitrogen atom is an epoxy compound represented by the following formula (16) or a compound of the following formula (17) Indicated epoxy compound:

[化6][Chemical 6]

上述式(16)中,R21~R23分別表示碳數為1~5之伸烷基,Z表示環氧基或羥甲基;In the above formula (16), R21 to R23 each represent an alkylene group having a carbon number of 1 to 5, and Z represents an epoxy group or a hydroxymethyl group;

[化7][Chemistry 7]

上述式(17)中,R24~R26分別表示碳數為1~5之伸烷基;p、q及r分別表示1~5之整數;R27~R29分別表示碳數為1~5之伸烷基。In the above formula (17), R24 to R26 each represent an alkylene group having a carbon number of 1 to 5; p, q and r each represent an integer of 1 to 5; and R27 to R29 represent an alkylene having a carbon number of 1 to 5, respectively. base.

於本發明之硬化性組合物之另外特定態樣中,上述具有含氮原子的雜環之環氧化合物為異氰尿酸三縮水甘油酯、或異氰尿酸三羥乙酯三縮水甘油醚。In another specific aspect of the curable composition of the present invention, the epoxy compound having a hetero ring containing a nitrogen atom is triglycidyl isocyanurate or trishydroxyethyl triglycidyl triglycidyl ether.

於本發明之硬化性組合物之進而另外特定態樣中,上述具有環氧基及噻喃基中之至少一種之成分100重量%中,上述具有含氮原子的雜環之環氧化合物之含量為0.1~10重量%之範圍內。In still another specific aspect of the curable composition of the present invention, the content of the epoxy compound having a nitrogen atom-containing heterocyclic ring in 100% by weight of the component having at least one of an epoxy group and a thiopyranyl group It is in the range of 0.1 to 10% by weight.

於本發明之硬化性組合物之其他特定態樣中,上述具有環氧基及噻喃基中之至少一種之成分進而包含具有芳香環之環氧化合物。In another specific aspect of the curable composition of the present invention, the component having at least one of an epoxy group and a thiopyranyl group further comprises an epoxy compound having an aromatic ring.

於本發明之硬化性組合物之進而其他特定態樣中,上述芳香環為苯環、萘環或蒽環。In still another specific aspect of the curable composition of the present invention, the aromatic ring is a benzene ring, a naphthalene ring or an anthracene ring.

本發明之向異性導電材料含有依據本發明而構成之硬化性組合物、及導電性粒子。The anisotropic conductive material of the present invention contains a curable composition composed of the present invention and conductive particles.

本發明之連接構造體具備第1電性連接對象構件、第2電性連接對象構件、以及將第1與第2電性連接對象構件加以電性連接之連接部,上述連接部係由依據本發明而構成之向異性導電材料所形成。The connection structure of the present invention includes a first electrical connection target member, a second electrical connection target member, and a connection portion that electrically connects the first and second electrical connection target members, and the connection portion is based on the present invention. The invention is formed by an anisotropic conductive material.

又,本發明之連接構造體具備第1連接對象構件、第2連接對象構件、以及將第1與第2連接對象構件加以連接之連接部,上述連接部係由依據本發明而構成之硬化性組合物所形成。Further, the connection structure according to the present invention includes the first connection target member, the second connection target member, and a connection portion that connects the first and second connection target members, and the connection portion is formed by the curability according to the present invention. The composition is formed.

(發明之效果)(Effect of the invention)

本發明之硬化性組合物含有具有上述式(1)所表示之結構的化合物之單體、由至少2個該化合物鍵結而成之多聚物、或該單體與該多聚物之混合物以及硬化劑,故可獲得線膨脹係數較低之硬化物。The curable composition of the present invention contains a monomer having a compound represented by the above formula (1), a polymer obtained by bonding at least two of the compounds, or a mixture of the monomer and the polymer. As well as a hardener, a hardened material having a low coefficient of linear expansion can be obtained.

又,由於本發明之向異性導電材料之硬化物的線膨脹係數較低,故若將本發明之向異性導電材料用於電路基板之電極與電子零件之電極間的連接,則可提高電性連接之可靠性。Moreover, since the linear expansion coefficient of the cured product of the anisotropic conductive material of the present invention is low, if the anisotropic conductive material of the present invention is used for the connection between the electrode of the circuit substrate and the electrode of the electronic component, the electrical property can be improved. The reliability of the connection.

以下對本發明加以詳述。The invention is described in detail below.

(硬化性組合物)(sclerosing composition)

本發明之硬化性組合物含有具有環氧基及噻喃基中之至少一種之成分、以及硬化劑。該具有環氧基及噻喃基中之至少一種之成分包含如下成分(以下有時簡稱為成分A):具有下述式(1)所表示之結構的化合物之單體、由至少2個該化合物鍵結而成之多聚物、或該單體與該多聚物之混合物。The curable composition of the present invention contains a component having at least one of an epoxy group and a thiopyranyl group, and a curing agent. The component having at least one of an epoxy group and a thiopyranyl group contains a component (hereinafter sometimes abbreviated as component A): a monomer having a compound represented by the following formula (1), and at least two of A polymer formed by bonding a compound or a mixture of the monomer and the polymer.

上述成分A為具有下述式(1)所表示之結構的化合物之單體、由至少2個該化合物鍵結而成之多聚物、及該單體與該多聚物之混合物中的任一種:The component A is a monomer having a compound represented by the following formula (1), a polymer obtained by bonding at least two of the compounds, and a mixture of the monomer and the polymer. One:

[化8][化8]

上述式(1)中,R1表示氫原子或碳數為1~5之烷基或者下述式(2)所表示之結構,R2表示碳數為1~5之伸烷基,R3表示碳數為1~5之伸烷基,X1表示氧原子或硫原子,X2表示氧原子或硫原子:In the above formula (1), R1 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms or a structure represented by the following formula (2), R2 represents an alkylene group having a carbon number of 1 to 5, and R3 represents a carbon number. It is an alkylene group of 1 to 5, X1 represents an oxygen atom or a sulfur atom, and X2 represents an oxygen atom or a sulfur atom:

[化9][Chemistry 9]

上述式(2)中,R4表示碳數為1~5之伸烷基,X3表示氧原子或硫原子。In the above formula (2), R4 represents an alkylene group having a carbon number of 1 to 5, and X3 represents an oxygen atom or a sulfur atom.

若上述烷基之碳數超過5,則有時硬化性組合物之硬化速度會下降,或硬化物之線膨脹係數會變高。又,若上述伸烷基之碳數超過5,則有時硬化性組合物之硬化速度會下降。若上述烷基及上述伸烷基之碳數較小,則硬化性組合物之硬化速度變高。When the carbon number of the alkyl group exceeds 5, the curing rate of the curable composition may decrease, or the linear expansion coefficient of the cured product may become high. Further, when the carbon number of the alkylene group exceeds 5, the curing rate of the curable composition may decrease. When the carbon number of the alkyl group and the above alkyl group is small, the curing rate of the curable composition becomes high.

上述式(1)中之R1較好的是碳數為1~3之烷基或上述式(2)所表示之結構,更好的是上述式(2)所表示之結構。再者,上述烷基既可為具有直鏈結構之烷基,亦可為具有支鏈結構之烷基。R1 in the above formula (1) is preferably an alkyl group having 1 to 3 carbon atoms or a structure represented by the above formula (2), more preferably a structure represented by the above formula (2). Further, the alkyl group may be an alkyl group having a linear structure or an alkyl group having a branched structure.

上述式(1)中之R2較好的是碳數為1~3之伸烷基,更好的是亞甲基。上述式(1)中之R3較好的是碳數為1~3之伸烷基,更好的是亞甲基。再者,上述伸烷基既可為具有直鏈結構之伸烷基,亦可為具有支鏈結構之伸烷基。又,上述R2與上述R3既可相同,亦可不同。R2 in the above formula (1) is preferably an alkylene group having 1 to 3 carbon atoms, more preferably a methylene group. R3 in the above formula (1) is preferably an alkylene group having 1 to 3 carbon atoms, more preferably a methylene group. Further, the above alkylene group may be an alkylene group having a linear structure or an alkylene group having a branched structure. Further, the above R2 and the above R3 may be the same or different.

上述式(1)所表示之結構中,R2及R3可鍵結於茀結構之苯環之任意部位。具有上述式(1)所表示之結構的化合物較好的是具有下述式(1A)所表示之結構的化合物:In the structure represented by the above formula (1), R2 and R3 may be bonded to any portion of the benzene ring of the fluorene structure. The compound having the structure represented by the above formula (1) is preferably a compound having a structure represented by the following formula (1A):

[化10][化10]

上述式(1A)中,R1表示氫原子、碳數為1~5之烷基或下述式(2)所表示之結構,R2表示碳數為1~5之伸烷基,R3表示碳數為1~5之伸烷基,X1表示氧原子或硫原子,X2表示氧原子或硫原子。In the above formula (1A), R1 represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or a structure represented by the following formula (2), R2 represents an alkylene group having a carbon number of 1 to 5, and R3 represents a carbon number. It is an alkyl group of 1 to 5, X1 represents an oxygen atom or a sulfur atom, and X2 represents an oxygen atom or a sulfur atom.

上述式(1)中之X1為氧原子或硫原子。上述式(1)中之X2為氧原子或硫原子。若上述式(1)中之X1及X2為氧原子,則可降低具有上述式(1)所表示之結構的化合物之熔點,從而可提高硬化性組合物之儲存穩定性。若上述式(1)中之X1及X2為硫原子,則可加快硬化性組合物之硬化速度,且可降低硬化物之線膨脹係數。上述X1與上述X2既可相同,亦可不同。X1 in the above formula (1) is an oxygen atom or a sulfur atom. X2 in the above formula (1) is an oxygen atom or a sulfur atom. When X1 and X2 in the above formula (1) are oxygen atoms, the melting point of the compound having the structure represented by the above formula (1) can be lowered, and the storage stability of the curable composition can be improved. When X1 and X2 in the above formula (1) are a sulfur atom, the curing rate of the curable composition can be accelerated, and the linear expansion coefficient of the cured product can be lowered. The above X1 and the above X2 may be the same or different.

上述式(2)中之R4較好的是碳數為1~3之伸烷基,更好的是亞甲基。再者,上述伸烷基既可為具有直鏈結構之伸烷基,亦可為具有支鏈結構之伸烷基。若上述伸烷基之碳數較小,則硬化性組合物之硬化速度變高。R4 in the above formula (2) is preferably an alkylene group having 1 to 3 carbon atoms, more preferably a methylene group. Further, the above alkylene group may be an alkylene group having a linear structure or an alkylene group having a branched structure. When the carbon number of the alkylene group is small, the curing rate of the curable composition becomes high.

上述式(2)所表示之結構中,R4可鍵結於苯環之任意部位。上述式(2)所表示之結構較好的是下述式(2A)所表示之結構:In the structure represented by the above formula (2), R4 may be bonded to any portion of the benzene ring. The structure represented by the above formula (2) is preferably a structure represented by the following formula (2A):

[化11][11]

上述式(2A)中,R4表示碳數為1~5之伸烷基,X3表示氧原子或硫原子。In the above formula (2A), R4 represents an alkylene group having a carbon number of 1 to 5, and X3 represents an oxygen atom or a sulfur atom.

上述式(2)中之X3為氧原子或硫原子。若上述式(2)中之X3為氧原子,則可降低具有上述式(1)所表示之結構的化合物之熔點,從而可提高硬化性組合物之儲存穩定性。若上述式(2)中之X3為硫原子,則可加快硬化性組合物之硬化速度,且可降低硬化物之線膨脹係數。上述X3與上述X1及上述X2既可相同,亦可不同。X3 in the above formula (2) is an oxygen atom or a sulfur atom. When X3 in the above formula (2) is an oxygen atom, the melting point of the compound having the structure represented by the above formula (1) can be lowered, and the storage stability of the curable composition can be improved. When X3 in the above formula (2) is a sulfur atom, the curing rate of the curable composition can be accelerated, and the linear expansion coefficient of the cured product can be lowered. The above X3 may be the same as or different from the above X1 and the above X2.

具有上述式(1)所表示之結構的化合物只要具有茀結構、且環氧基與噻喃基之總量為2個以上即可,較好的是具有茀結構、以及至少2個環氧基及至少2個噻喃基中之至少一種。本發明之硬化性組合物含有上述成分A,故可獲得線膨脹係數較低之硬化物。The compound having the structure represented by the above formula (1) may have a fluorene structure and the total amount of the epoxy group and the thiopyranyl group may be two or more, preferably having a fluorene structure and at least two epoxy groups. And at least one of at least two thiopyran groups. Since the curable composition of the present invention contains the above component A, a cured product having a low coefficient of linear expansion can be obtained.

進而,若於本發明之硬化性組合物中添加導電性粒子,並將含有該導電性粒子之組合物用於電路基板之電極與電子零件之電極之間的電極間連接,則可提高該電極間之連接可靠性。Further, when conductive particles are added to the curable composition of the present invention, and the composition containing the conductive particles is used for inter-electrode connection between the electrode of the circuit board and the electrode of the electronic component, the electrode can be improved. The reliability of the connection between the two.

作為具有上述式(1)所表示之結構的化合物,更具體可列舉下述式(1B)所表示之化合物。下述式(1B)所表示之化合物係上述式(1A)中之R2為亞甲基、R3為亞甲基、X1為氧原子、X2為氧原子、且R1具有上述式(2A)所表示之結構、上述式(2A)中之R4為亞甲基、X3為氧原子之化合物。由於上述式(1)及(2)中之X1、X2及X3為氧原子,故下述式(1B)所表示之化合物為環氧化合物:More specifically, the compound represented by the above formula (1) is a compound represented by the following formula (1B). The compound represented by the following formula (1B) is that R2 in the above formula (1A) is a methylene group, R3 is a methylene group, X1 is an oxygen atom, X2 is an oxygen atom, and R1 is represented by the above formula (2A). The structure is such that R4 in the above formula (2A) is a methylene group and X3 is an oxygen atom. Since X1, X2 and X3 in the above formulas (1) and (2) are oxygen atoms, the compound represented by the following formula (1B) is an epoxy compound:

[化12][化12]

又,作為具有上述式(1)所表示之結構的化合物,更具體可列舉下述式(1C)所表示之化合物。下述式(1C)所表示之化合物係上述式(1A)中之R2為亞甲基、R3為亞甲基、X1為硫原子、X2為硫原子、且R1具有上述式(2A)所表示之結構、上述式(2A)中之R4為亞甲基、X3為硫原子之化合物。由於上述式(1)及(2)中之X1、X2及X3為硫原子,故下述式(1C)所表示之化合物為含有具有三員環結構之噻喃基的化合物:In addition, as a compound which has a structure represented by the above formula (1), a compound represented by the following formula (1C) is more specifically mentioned. The compound represented by the following formula (1C) is that R2 in the above formula (1A) is a methylene group, R3 is a methylene group, X1 is a sulfur atom, X2 is a sulfur atom, and R1 is represented by the above formula (2A). The structure is such that R4 in the above formula (2A) is a methylene group and X3 is a sulfur atom. Since X1, X2 and X3 in the above formulas (1) and (2) are sulfur atoms, the compound represented by the following formula (1C) is a compound containing a thiopyranyl group having a three-membered ring structure:

[化13][Chemistry 13]

具有上述式(1)所表示之結構的化合物為單體。於本發明中,亦可代替具有上述式(1)所表示之結構的化合物之單體、或者與該化合物之單體一併而使用由至少2個具有上述式(1)所表示之結構的化合物鍵結而成之多聚物。其中,上述成分A較好的是具有上述式(1)所表示之結構的化合物之單體、由2~10個該化合物鍵結而成之多聚物或該單體與該多聚物之混合物,更好的是上述化合物之單體、由2~3個該化合物鍵結而成之多聚物、或該單體與該多聚物之混合物,尤其好的是該單體與該多聚物之混合物。若使用由超過10個的具有上述式(1)所表示之結構的化合物鍵結而成之多聚物,則有時硬化性組合物之黏度會變得過高。再者,合成具有上述式(1)所表示之結構的化合物之單體時,有時會含有作為副產物的由2個或3個上述單體鍵結而成之多聚物,或者2個以上之上述單體受保管條件影響而發生鍵結。The compound having the structure represented by the above formula (1) is a monomer. In the present invention, a monomer having a compound represented by the above formula (1) or a monomer having the structure represented by the above formula (1) may be used instead of the monomer represented by the above formula (1). A polymer in which a compound is bonded. Among them, the component A is preferably a monomer having a compound represented by the above formula (1), a polymer obtained by bonding 2 to 10 of the compounds, or a monomer and a polymer thereof. The mixture is more preferably a monomer of the above compound, a polymer obtained by bonding 2 to 3 of the compound, or a mixture of the monomer and the polymer, and particularly preferably the monomer and the monomer. a mixture of polymers. When a polymer composed of more than 10 compounds having a structure represented by the above formula (1) is used, the viscosity of the curable composition may become too high. Further, when a monomer having a compound having the structure represented by the above formula (1) is synthesized, a polymer obtained by bonding two or three of the above monomers as a by-product, or two may be contained. The above monomers are bonded by the storage conditions.

與具有上述式(1)所表示之結構的化合物相當之環氧化合物例如可按如下方式合成。The epoxy compound corresponding to the compound having the structure represented by the above formula (1) can be synthesized, for example, as follows.

將作為原料化合物的具有羥基之茀化合物、表氯醇、氫氧化鈉及甲醇混合,進行冷卻並使其反應。其後,滴加氫氧化鈉水溶液。滴加之後進一步進行反應,而獲得反應液。接著,於反應液中添加水及甲苯,並取出甲苯層。以水清洗甲苯層之後進行乾燥,而除去水及溶劑。以此種方式,可容易地獲得與具有上述式(1)所表示之結構的化合物相當之環氧化合物。再者,作為原料化合物的具有羥基之茀化合物例如可自JFE Chemical公司等購買。The hydrazine compound having a hydroxyl group as a raw material compound, epichlorohydrin, sodium hydroxide, and methanol are mixed, cooled, and reacted. Thereafter, an aqueous sodium hydroxide solution was added dropwise. Further, the reaction was carried out after the dropwise addition to obtain a reaction liquid. Next, water and toluene were added to the reaction liquid, and the toluene layer was taken out. The toluene layer was washed with water and then dried to remove water and solvent. In this manner, an epoxy compound equivalent to the compound having the structure represented by the above formula (1) can be easily obtained. Further, a hydrazine compound having a hydroxyl group as a raw material compound can be purchased, for example, from JFE Chemical Co., Ltd. or the like.

又,與具有上述式(1)所表示之結構的化合物相當之含噻喃基之化合物,可藉由將與具有上述式(1)所表示之結構的化合物相當之環氧化合物的環氧基轉變成噻喃基而合成。例如,於含有硫氰酸鹽之溶液中添加作為原料化合物的環氧化合物或含有該環氧化合物之溶液後,進一步添加含有硫氰酸鹽之溶液,藉此可將環氧基容易地轉變成噻喃基。Further, the thiopyranyl group-containing compound corresponding to the compound having the structure represented by the above formula (1) can be an epoxy group of an epoxy compound corresponding to the compound having the structure represented by the above formula (1). It is converted into a thiopyranyl group to synthesize. For example, after adding an epoxy compound as a raw material compound or a solution containing the epoxy compound to a solution containing a thiocyanate, a solution containing a thiocyanate is further added, whereby the epoxy group can be easily converted into Thiantyl.

於本發明之硬化性組合物100重量%中,上述成分A之含量較好的是5~60重量%之範圍內,更好的是10~50重量%之範圍內。若上述成分A之含量過少,則有時無法獲得線膨脹係數足夠低之硬化物。若上述成分A之含量過多,則硬化劑之含量相對變少,有時無法使上述成分A等充分硬化。In 100% by weight of the curable composition of the present invention, the content of the component A is preferably in the range of 5 to 60% by weight, more preferably 10 to 50% by weight. When the content of the above component A is too small, a cured product having a sufficiently low linear expansion coefficient may not be obtained. When the content of the component A is too large, the content of the curing agent is relatively small, and the component A or the like may not be sufficiently cured.

上述具有環氧基及噻喃基中之至少一種之成分100重量%中的上述成分A之含量,較好的是5~100重量%之範圍內。又,當將上述成分A與該成分A以外之其他環氧成分併用時,上述具有環氧基及噻喃基中之至少一種之成分100重量%中的上述成分A之含量,較好的是處於5~90重量%之範圍內。當上述成分A之含量處於上述較好範圍內時,可獲得線膨脹係數更低之硬化物。上述具有環氧基及噻喃基中之至少一種之成分100重量%中的上述成分A之含量之更好的下限為10重量%,尤其好的下限為15重量%,且更好的上限為80重量%,尤其好的上限為60重量%,進而好的上限為30重量%,特別好的上限為20重量%。The content of the component A in 100% by weight of the component having at least one of the epoxy group and the thiopyranyl group is preferably in the range of 5 to 100% by weight. Further, when the component A and the epoxy component other than the component A are used in combination, the content of the component A in 100% by weight of the component having at least one of the epoxy group and the thiopyranyl group is preferably It is in the range of 5 to 90% by weight. When the content of the above component A is within the above preferred range, a cured product having a lower coefficient of linear expansion can be obtained. A more preferred lower limit of the content of the component A in 100% by weight of the component having at least one of the epoxy group and the thiopyranyl group is 10% by weight, particularly preferably a lower limit of 15% by weight, and a higher upper limit is 80% by weight, particularly preferably, the upper limit is 60% by weight, and further preferably the upper limit is 30% by weight, and the particularly preferred upper limit is 20% by weight.

上述具有環氧基及噻喃基中之至少一種之成分較好的是進而包含如下環氧成分(以下有時簡稱為環氧成分B)作為上述成分A以外之其他環氧成分:具有下述式(11)所表示之結構的環氧化合物之單體、由至少2個該環氧化合物鍵結而成之多聚物、或該單體與該多聚物之混合物。上述環氧成分B為具有下述式(11)所表示之結構的環氧化合物之單體、由至少2個該環氧化合物鍵結而成之多聚物、及該單體與該多聚物之混合物中之任一種:The component having at least one of an epoxy group and a thiopyranyl group preferably further contains an epoxy component (hereinafter sometimes referred to simply as an epoxy component B) as an epoxy component other than the component A: A monomer of an epoxy compound having a structure represented by the formula (11), a polymer obtained by bonding at least two of the epoxy compounds, or a mixture of the monomer and the polymer. The epoxy component B is a monomer having an epoxy compound having a structure represented by the following formula (11), a polymer obtained by bonding at least two epoxy compounds, and the monomer and the polymerization. Any of a mixture of things:

[化14][Chemistry 14]

上述式(11)中,R11表示碳數為1~10之伸烷基,R12表示碳數為1~10之伸烷基,R13表示氫原子、碳數為1~10之烷基或下述式(12)所表示之結構,R14表示氫原子、碳數為1~10之烷基或下述式(13)所表示之結構:In the above formula (11), R11 represents an alkylene group having a carbon number of 1 to 10, R12 represents an alkylene group having a carbon number of 1 to 10, and R13 represents a hydrogen atom, an alkyl group having a carbon number of 1 to 10 or the following In the structure represented by the formula (12), R14 represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms or a structure represented by the following formula (13):

[化15][化15]

上述式(12)中,R15表示碳數為1~10之伸烷基;In the above formula (12), R15 represents an alkylene group having a carbon number of 1 to 10;

[化16][Chemistry 16]

上述式(13)中,R16表示碳數為1~10之伸烷基。In the above formula (13), R16 represents an alkylene group having a carbon number of 1 to 10.

若上述式(11)~(13)中之上述伸烷基之碳數超過10,則有時硬化性組合物之硬化速度會下降。又,若上述式(11)中之上述烷基之碳數超過10,則有時硬化性組合物之硬化速度會下降。若上述式(11)~(13)中之伸烷基及上述烷基之碳數較小,則硬化性組合物之硬化速度變高。When the carbon number of the above alkylene group in the above formulas (11) to (13) exceeds 10, the curing rate of the curable composition may decrease. In addition, when the carbon number of the alkyl group in the above formula (11) exceeds 10, the curing rate of the curable composition may decrease. When the alkylene group in the above formulas (11) to (13) and the carbon number of the above alkyl group are small, the curing rate of the curable composition becomes high.

上述式(11)中之R11較好的是碳數為1~6之伸烷基,更好的是碳數為1~5之伸烷基,尤其好的是碳數為1~3之伸烷基,進而好的是亞甲基或伸乙基,特別好的是亞甲基。上述式(11)中之R12較好的是碳數為1~6之伸烷基,更好的是碳數為1~5之伸烷基,尤其好的是碳數為1~3之伸烷基,進而好的是亞甲基或伸乙基,特別好的是亞甲基。再者,上述伸烷基既可為具有直鏈結構之伸烷基,亦可為具有支鏈結構之伸烷基。又,上述R11與上述R12既可相同,亦可不同。R11 in the above formula (11) is preferably an alkylene group having a carbon number of 1 to 6, more preferably an alkylene group having a carbon number of 1 to 5, particularly preferably a carbon number of 1 to 3. The alkyl group, and more preferably the methylene group or the ethyl group, is particularly preferably a methylene group. R12 in the above formula (11) is preferably an alkylene group having a carbon number of 1 to 6, more preferably an alkylene group having a carbon number of 1 to 5, particularly preferably a carbon number of 1 to 3. The alkyl group, and more preferably the methylene group or the ethyl group, is particularly preferably a methylene group. Further, the above alkylene group may be an alkylene group having a linear structure or an alkylene group having a branched structure. Further, the above R11 and the above R12 may be the same or different.

上述式(11)中之R13較好的是氫原子、碳數為1~6之烷基或上述式(12)所表示之結構,更好的是氫原子、碳數為1~5之烷基或上述式(12)所表示之結構,尤其好的是氫原子、碳數為1~3之烷基或上述式(12)所表示之結構,進而好的是氫原子、甲基、乙基或上述式(12)所表示之結構,特別好的是氫原子、甲基或上述式(12)所表示之結構。上述式(11)中之R14較好的是氫原子、碳數為1~6之烷基或上述式(13)所表示之結構,更好的是氫原子、碳數為1~5之烷基或上述式(13)所表示之結構,尤其好的是氫原子、碳數為1~3之烷基或上述式(13)所表示之結構,進而好的是氫原子、甲基、乙基或上述式(13)所表示之結構,特別好的是氫原子、甲基或上述式(13)所表示之結構。再者,上述烷基既可為具有直鏈結構之烷基,亦可為具有支鏈結構之烷基。又,上述R13與上述R14既可相同,亦可不同。R13 in the above formula (11) is preferably a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or a structure represented by the above formula (12), more preferably a hydrogen atom and an alkyl group having 1 to 5 carbon atoms. The structure represented by the above formula (12) is particularly preferably a hydrogen atom, an alkyl group having 1 to 3 carbon atoms or a structure represented by the above formula (12), and further preferably a hydrogen atom, a methyl group or a The structure represented by the above formula (12) is particularly preferably a hydrogen atom, a methyl group or a structure represented by the above formula (12). R14 in the above formula (11) is preferably a hydrogen atom, an alkyl group having 1 to 6 carbon atoms or a structure represented by the above formula (13), more preferably a hydrogen atom and an alkyl group having 1 to 5 carbon atoms. The structure represented by the above formula (13) is particularly preferably a hydrogen atom, an alkyl group having 1 to 3 carbon atoms or a structure represented by the above formula (13), and further preferably a hydrogen atom, a methyl group or a The structure represented by the above formula (13) is particularly preferably a hydrogen atom, a methyl group or a structure represented by the above formula (13). Further, the alkyl group may be an alkyl group having a linear structure or an alkyl group having a branched structure. Further, the above R13 and the above R14 may be the same or different.

上述式(12)中之R15較好的是碳數為1~6之伸烷基,更好的是碳數為1~5之伸烷基,尤其好的是碳數為1~3之伸烷基,進而好的是亞甲基或伸乙基,特別好的是亞甲基。上述式(13)中之R16較好的是碳數為1~6之伸烷基,更好的是碳數為1~5之伸烷基,尤其好的是碳數為1~3之伸烷基,進而好的是亞甲基或伸乙基,特別好的是亞甲基。再者,上述伸烷基既可為具有直鏈結構之伸烷基,亦可為具有支鏈結構之伸烷基。R15 in the above formula (12) is preferably an alkylene group having a carbon number of 1 to 6, more preferably an alkylene group having a carbon number of 1 to 5, particularly preferably a carbon number of 1 to 3. The alkyl group, and more preferably the methylene group or the ethyl group, is particularly preferably a methylene group. R16 in the above formula (13) is preferably an alkylene group having a carbon number of 1 to 6, more preferably an alkylene group having a carbon number of 1 to 5, particularly preferably a carbon number of 1 to 3. The alkyl group, and more preferably the methylene group or the ethyl group, is particularly preferably a methylene group. Further, the above alkylene group may be an alkylene group having a linear structure or an alkylene group having a branched structure.

具有上述式(11)所表示之結構的環氧化合物之特徵在於具有不飽和雙鍵、及至少2個環氧基。藉由使用上述環氧成分B,可使硬化性組合物於低溫下迅速硬化。進而,若於硬化性組合物中添加上述環氧成分B及導電性粒子,並將含有該環氧成分B及導電性粒子之組合物用於電路基板或電子零件等之電極間之連接,則可將該電極間有效率地連接。The epoxy compound having the structure represented by the above formula (11) is characterized by having an unsaturated double bond and at least two epoxy groups. By using the above epoxy component B, the curable composition can be rapidly cured at a low temperature. Further, when the epoxy component B and the conductive particles are added to the curable composition, and the composition containing the epoxy component B and the conductive particles is used for connection between electrodes of a circuit board or an electronic component, The electrodes can be connected efficiently.

作為具有上述式(11)所表示之結構的環氧化合物,例如可列舉:上述式(11)中,R11為亞甲基、R12為亞甲基、R13為氫原子、且R14為氫原子之環氧化合物;上述式(11)中,R11為亞甲基、R12為亞甲基、R13為下述式(14)所表示之結構、且R14為氫原子之環氧化合物;以及上述式(11)中,R11為亞甲基、R12為亞甲基、且R13及R14分別為下述式(14)所表示之結構之環氧化合物等:Examples of the epoxy compound having the structure represented by the above formula (11) include, in the above formula (11), R11 is a methylene group, R12 is a methylene group, R13 is a hydrogen atom, and R14 is a hydrogen atom. In the above formula (11), R11 is a methylene group, R12 is a methylene group, R13 is a structure represented by the following formula (14), and R14 is a hydrogen atom; and the above formula ( In the above), an epoxy compound in which R11 is a methylene group, R12 is a methylene group, and R13 and R14 are each a structure represented by the following formula (14):

[化17][化17]

因可使硬化性組合物於低溫下更迅速地硬化,故上述式(11)中之R13及R14較好的是氫原子。即,具有上述式(11)所表示之結構的環氧化合物較好的是具有下述式(11A)所表示之結構的環氧化合物:Since the curable composition can be hardened more rapidly at a low temperature, R13 and R14 in the above formula (11) are preferably a hydrogen atom. That is, the epoxy compound having the structure represented by the above formula (11) is preferably an epoxy compound having a structure represented by the following formula (11A):

[化18][化18]

上述式(11A)中,R11表示碳數為1~10之伸烷基,R12表示碳數為1~10之伸烷基。In the above formula (11A), R11 represents an alkylene group having a carbon number of 1 to 10, and R12 represents an alkylene group having a carbon number of 1 to 10.

又,因可使硬化性組合物於低溫下更迅速地硬化,故更好的是上述式(11)中R11為亞甲基、R12為亞甲基、R13為氫原子、及R14為氫原子之下述式(11B)所表示之環氧化合物:Further, since the curable composition can be hardened more rapidly at a low temperature, it is more preferable that R11 in the above formula (11) is a methylene group, R12 is a methylene group, R13 is a hydrogen atom, and R14 is a hydrogen atom. An epoxy compound represented by the following formula (11B):

[化19][Chemistry 19]

具有上述式(11)所表示之結構的環氧化合物為單體。於本發明中,亦可代替具有上述式(11)所表示之結構的環氧化合物之單體、或者與該環氧化合物之單體一併而使用由至少2個具有上述式(11)所表示之結構的環氧化合物鍵結而成之多聚物。其中,上述環氧成分B較好的是具有上述式(11)所表示之結構的環氧化合物之單體、由2~10個該環氧化合物鍵結而成之多聚物、或該單體與該多聚物之混合物,更好的是上述環氧化合物之單體、由2個或3個該環氧化合物鍵結而成之多聚物、或該單體與該多聚物之混合物,尤其好的是該單體與該多聚物之混合物。若使用由超過10個的具有上述式(11)所表示之結構的環氧化合物鍵結而成之多聚物,則有時硬化性組合物之黏度會變得過高。再者,使用具有上述式(11)所表示之結構的環氧化合物之單體時,有時會含有作為副產物的由2個或3個上述單體鍵結而成之多聚物,或2個以上之上述單體受保管條件影響而發生鍵結。The epoxy compound having the structure represented by the above formula (11) is a monomer. In the present invention, a monomer having an epoxy compound having a structure represented by the above formula (11) or a monomer having the epoxy compound may be used in combination with at least two of the above formula (11). A polymer formed by bonding an epoxy compound having a structure. In particular, the epoxy component B is preferably a monomer having an epoxy compound having a structure represented by the above formula (11), a polymer obtained by bonding 2 to 10 epoxy compounds, or the single More preferably, the mixture of the body and the polymer is a monomer of the above epoxy compound, a polymer obtained by bonding two or three of the epoxy compounds, or a monomer and the polymer. A mixture, especially preferably a mixture of the monomer and the polymer. When a polymer composed of more than 10 epoxy compounds having a structure represented by the above formula (11) is used, the viscosity of the curable composition may become too high. In addition, when a monomer having an epoxy compound having a structure represented by the above formula (11) is used, a polymer obtained by bonding two or three of the above monomers as a by-product may be contained, or Two or more of the above monomers are bonded by the storage conditions.

於本發明之硬化性組合物100重量%中,上述環氧成分B之含量較好的是10~50重量%之範圍內。若上述環氧成分B之含量過少,則有時無法充分提高低溫下之硬化速度。若上述環氧成分B之含量過多,則硬化劑之含量相對變少,有時無法使成分A及環氧成分B等充分硬化。In 100% by weight of the curable composition of the present invention, the content of the epoxy component B is preferably in the range of 10 to 50% by weight. When the content of the epoxy component B is too small, the curing rate at a low temperature may not be sufficiently increased. When the content of the epoxy component B is too large, the content of the curing agent is relatively small, and the component A, the epoxy component B, and the like may not be sufficiently cured.

上述具有環氧基及噻喃基中之至少一種之成分100重量%中的上述環氧成分B之含量,較好的是1~50重量%之範圍內。當上述環氧成分B之含量處於該較好範圍內時,可使硬化性組合物於低溫下更迅速地硬化。上述具有環氧基及噻喃基中之至少一種之成分100重量%中的上述環氧成分B之含量之更好的下限為3重量%,尤其好的下限為5重量%,且更好的上限為40重量%,尤其好的上限為30重量%。The content of the epoxy component B in 100% by weight of the component having at least one of the epoxy group and the thiopyranyl group is preferably in the range of 1 to 50% by weight. When the content of the above epoxy component B is in this preferred range, the curable composition can be hardened more rapidly at a low temperature. A more preferred lower limit of the content of the epoxy component B in 100% by weight of the component having at least one of the epoxy group and the thiopyranyl group is 3% by weight, particularly preferably a lower limit of 5% by weight, and more preferably The upper limit is 40% by weight, and particularly preferably the upper limit is 30% by weight.

本發明之硬化性組合物亦可包含上述成分A及上述環氧成分B以外之其他環氧成分(以下亦稱為環氧成分C)。The curable composition of the present invention may further contain the above-mentioned component A and other epoxy components other than the epoxy component B (hereinafter also referred to as epoxy component C).

上述具有環氧基及噻喃基中之至少一種之成分較好的是包含具有含氮原子的雜環之環氧化合物C3作為上述環氧成分C。藉由使用環氧化合物C3,可進一步提高硬化性組合物之硬化物之耐熱性。又,因可進一步提高硬化物之耐熱性,故含氮原子的雜環較好的是三骨架。The component having at least one of an epoxy group and a thiopyranyl group is preferably an epoxy compound C3 containing a hetero ring having a nitrogen atom as the epoxy component C. By using the epoxy compound C3, the heat resistance of the cured product of the curable composition can be further improved. Moreover, since the heat resistance of the cured product can be further improved, the nitrogen atom-containing heterocyclic ring is preferably three skeleton.

又,上述具有環氧基及噻喃基中之至少一種之成分亦可包含上述環氧化合物C3以外之環氧樹脂C1作為上述環氧成分C。又,上述具有環氧基及噻喃基中之至少一種之成分亦可包含上述環氧化合物C3及環氧樹脂C1以外之環氧化合物C2。Further, the component having at least one of an epoxy group and a thiopyran group may include the epoxy resin C1 other than the epoxy compound C3 as the epoxy component C. Further, the component having at least one of an epoxy group and a thiopyranyl group may further include the epoxy compound C3 other than the epoxy compound C3 and the epoxy resin C1.

本發明之硬化性組合物較好的是包含上述環氧化合物C2或上述環氧化合物C3,更好的是包含上述環氧化合物C2,尤其好的是包含上述環氧化合物C2及上述環氧化合物C3。The curable composition of the present invention preferably contains the above epoxy compound C2 or the above epoxy compound C3, more preferably contains the above epoxy compound C2, and particularly preferably contains the above epoxy compound C2 and the above epoxy compound. C3.

含有上述環氧成分B之組合物之黏度相對較低。藉由併用上述環氧成分B與上述環氧化合物C2,可提高硬化性組合物之黏度。又,藉由併用上述環氧成分B與上述環氧化合物C3,可進一步加快硬化性組合物之硬化速度,或提高硬化性組合物之硬化物之耐熱性。特別是藉由併用上述環氧成分B、上述環氧化合物C2及上述環氧化合物C3,可加快硬化性組合物之硬化速度,提高硬化性組合物之硬化物之耐熱性,進而可容易地塗布硬化性組合物。The composition containing the above epoxy component B has a relatively low viscosity. By using the epoxy component B and the epoxy compound C2 in combination, the viscosity of the curable composition can be improved. Moreover, by using the epoxy component B and the epoxy compound C3 in combination, the curing rate of the curable composition can be further increased, or the heat resistance of the cured product of the curable composition can be improved. In particular, by using the epoxy component B, the epoxy compound C2, and the epoxy compound C3 in combination, the curing rate of the curable composition can be increased, and the heat resistance of the cured product of the curable composition can be improved, and the coating can be easily applied. A curable composition.

再者,所謂「環氧樹脂」,通常係指1分子中具有2個以上之環氧基、且分子量為10,000以下之低分子量之聚合物或預聚物,或者藉由該聚合物或預聚物之環氧基之開環反應而生成的硬化性樹脂。硬化性樹脂既可為熱硬化性樹脂,亦可為光硬化性樹脂。In addition, the term "epoxy resin" generally means a polymer or prepolymer having a low molecular weight of two or more epoxy groups and having a molecular weight of 10,000 or less, or by the polymer or prepolymerization. A curable resin produced by ring-opening reaction of an epoxy group of a substance. The curable resin may be a thermosetting resin or a photocurable resin.

作為上述環氧樹脂C1之具體例,可列舉雙酚型環氧樹脂、酚醛環氧樹脂、或具有萘結構之環氧樹脂等。Specific examples of the epoxy resin C1 include a bisphenol epoxy resin, a novolac epoxy resin, and an epoxy resin having a naphthalene structure.

作為上述環氧化合物C2之市售品,例如可列舉ADEKA RESIN EP-3300S及ADEKA RESIN EP-3300E(以上均為ADEKA公司製造)。硬化性組合物較好的是含有ADEKA RESIN EP-3300S及ADEKA RESIN EP-3300E中之至少一種,更好的是含有ADEKA RESIN EP-3300S。藉由使用該等較好之市售品,可有效地提高硬化性組合物之黏度。For example, ADEKA RESIN EP-3300S and ADEKA RESIN EP-3300E (all of which are manufactured by ADEKA Co., Ltd.) are mentioned as a commercial item of the said epoxy compound C2. The curable composition preferably contains at least one of ADEKA RESIN EP-3300S and ADEKA RESIN EP-3300E, more preferably ADEKA RESIN EP-3300S. By using these preferred commercial products, the viscosity of the curable composition can be effectively improved.

又,上述環氧化合物C2較好的是具有芳香環之環氧化合物。上述具有環氧基及噻喃基中之至少一種之成分較好的是包含具有芳香環之環氧化合物。藉由使用具有芳香環之環氧化合物,可加快硬化性組合物之硬化速度,並可容易地塗布硬化性組合物。Further, the epoxy compound C2 is preferably an epoxy compound having an aromatic ring. The above component having at least one of an epoxy group and a thiopyranyl group preferably contains an epoxy compound having an aromatic ring. By using an epoxy compound having an aromatic ring, the curing speed of the curable composition can be accelerated, and the curable composition can be easily applied.

上述芳香環較好的是苯環、萘環或蒽環,更好的是苯環或萘環。此時,可更容易地塗布硬化性組合物。The above aromatic ring is preferably a benzene ring, a naphthalene ring or an anthracene ring, more preferably a benzene ring or a naphthalene ring. At this time, the curable composition can be applied more easily.

作為上述具有芳香環之環氧化合物,可列舉間苯二酚二縮水甘油醚或1,6-萘二縮水甘油醚,特別好的是間苯二酚二縮水甘油醚。藉由使用間苯二酚二縮水甘油醚,可加快硬化性組合物之硬化速度,並可容易地塗布硬化性組合物。The epoxy compound having an aromatic ring may, for example, be resorcinol diglycidyl ether or 1,6-naphthalene diglycidyl ether, and particularly preferably resorcinol diglycidyl ether. By using resorcinol diglycidyl ether, the hardening rate of the curable composition can be accelerated, and the curable composition can be easily applied.

因可進一步加快硬化性組合物之硬化速度,故上述具有三骨架之環氧化合物C3較好的是具有至少2個環氧基,更好的是具有3個環氧基。Since the hardening speed of the curable composition can be further accelerated, the above has three The skeleton epoxy compound C3 preferably has at least two epoxy groups, more preferably three epoxy groups.

上述環氧化合物C3較好的是下述式(16)或下述式(17)所表示之環氧化合物。藉由使用該等較好之環氧化合物,可加快硬化性組合物之硬化速度,並可進一步提高硬化性組合物之硬化物之耐熱性:The epoxy compound C3 is preferably an epoxy compound represented by the following formula (16) or the following formula (17). By using these preferred epoxy compounds, the curing rate of the curable composition can be accelerated, and the heat resistance of the cured product of the curable composition can be further improved:

[化20][Chemistry 20]

上述式(16)中,R21~R23分別表示碳數為1~5之伸烷基,Z表示環氧基或羥甲基;R21~R23既可相同,亦可不同;In the above formula (16), R21 to R23 each represent an alkylene group having a carbon number of 1 to 5, Z represents an epoxy group or a hydroxymethyl group; and R21 to R23 may be the same or different;

[化21][Chem. 21]

上述式(17)中,R24~R26分別表示碳數為1~5之伸烷基,p、q及r分別表示1~5之整數,R27~R29分別表示碳數為1~~5之伸烷基。R24~R26既可相同,亦可不同。p、q及r既可相同,亦可不同。R27~R29既可相同,亦可不同。In the above formula (17), R24 to R26 represent an alkylene group having a carbon number of 1 to 5, respectively, p, q and r represent an integer of 1 to 5, respectively, and R27 to R29 represent a stretching of 1 to 5, respectively. alkyl. R24~R26 can be the same or different. p, q, and r may be the same or different. R27~R29 can be the same or different.

若上述式(16)中之R21~R23之碳數超過5,則有時硬化性組合物之硬化速度變慢。若R21~R23之碳數較小,則硬化性組合物之硬化速度變快。上述式(16)中之R21~R23分別較好的是碳數為1~3之伸烷基,更好的是亞甲基或伸乙基,尤其好的是亞甲基。When the carbon number of R21 to R23 in the above formula (16) exceeds 5, the curing rate of the curable composition may be slow. When the carbon number of R21 to R23 is small, the curing rate of the curable composition becomes fast. R21 to R23 in the above formula (16) are each preferably an alkylene group having 1 to 3 carbon atoms, more preferably a methylene group or an ethylidene group, and particularly preferably a methylene group.

上述式(16)中之Z較好的是環氧基。此時,可加快硬化性組合物之硬化速度,並可進一步提高硬化性組合物之硬化物之耐熱性。Z in the above formula (16) is preferably an epoxy group. At this time, the curing speed of the curable composition can be accelerated, and the heat resistance of the cured product of the curable composition can be further improved.

若上述式(17)中之R24~R26之碳數超過5,則有時硬化性組合物之硬化速度變慢。若R24~R26之碳數較小,則硬化性組合物之硬化速度變快。上述式(17)中之R24~R26分別較好的是碳數為2~4之伸烷基,更好的是碳數為2或3之伸烷基,尤其好的是伸乙基。When the carbon number of R24 to R26 in the above formula (17) exceeds 5, the curing rate of the curable composition may be slow. When the carbon number of R24 to R26 is small, the curing rate of the curable composition becomes faster. R24 to R26 in the above formula (17) are each preferably an alkylene group having 2 to 4 carbon atoms, more preferably an alkylene group having 2 or 3 carbon atoms, and particularly preferably an ethyl group.

又,若上述式(17)中之p、q及r超過5,則有時硬化性組合物之硬化速度變慢。若p、q及r較小,則硬化性組合物之硬化速度變快。上述式(17)中之p、q及r分別較好的是1~3之整數,更好的是1或2,尤其好的是1。Further, when p, q and r in the above formula (17) exceed 5, the curing rate of the curable composition may be slow. When p, q and r are small, the curing rate of the curable composition becomes fast. The p, q and r in the above formula (17) are preferably an integer of 1 to 3, more preferably 1 or 2, particularly preferably 1.

若上述式(17)中之R27~R29之碳數超過5,則有時硬化性組合物之硬化速度變慢。若R27~R29之碳數較小,則硬化性組合物之硬化速度變快。上述式(17)中之R27~R29分別較好的是碳數為1~3之伸烷基,更好的是亞甲基或伸乙基,尤其好的是亞甲基。When the carbon number of R27 to R29 in the above formula (17) exceeds 5, the curing rate of the curable composition may be slow. When the carbon number of R27 to R29 is small, the curing rate of the curable composition becomes faster. R27 to R29 in the above formula (17) are each preferably an alkylene group having 1 to 3 carbon atoms, more preferably a methylene group or an ethylidene group, and particularly preferably a methylene group.

上述環氧化合物C3更好的是上述式(16)所表示之環氧化合物。藉由使用上述式(16)所表示之環氧化合物,可加快硬化性組合物之硬化速度,並可進一步提高硬化性組合物之硬化物之耐熱性。The epoxy compound C3 is more preferably an epoxy compound represented by the above formula (16). By using the epoxy compound represented by the above formula (16), the curing rate of the curable composition can be accelerated, and the heat resistance of the cured product of the curable composition can be further improved.

上述環氧化合物C3較好的是異氰尿酸三羥乙酯三縮水甘油醚或異氰尿酸三縮水甘油酯,更好的是異氰尿酸三縮水甘油酯。即,上述環氧化合物C3較好的是下述式(16A)或下述式(17A)所表示之環氧化合物,更好的是下述式(16A)所表示之環氧化合物。藉由使用該等較好之環氧化合物,可進一步提高硬化性組合物之硬化速度:The above epoxy compound C3 is preferably trihydroxyethyl isocyanurate triglycidyl ether or triglycidyl isocyanurate, more preferably triglycidyl isocyanurate. In other words, the epoxy compound C3 is preferably an epoxy compound represented by the following formula (16A) or the following formula (17A), more preferably an epoxy compound represented by the following formula (16A). By using these preferred epoxy compounds, the hardening rate of the curable composition can be further increased:

[化22][化22]

[化23][化23]

於硬化性組合物100重量%中,上述環氧成分C之含量較好的是0.1~45重量%之範圍內。The content of the epoxy component C in the 100% by weight of the curable composition is preferably in the range of 0.1 to 45% by weight.

於硬化性組合物100重量%中,上述環氧化合物C2之含量較好的是20~40重量%之範圍內。藉由使上述環氧化合物C2之含量處於該較好範圍內,可更有效地提高硬化性組合物之黏度。The content of the epoxy compound C2 in the 100% by weight of the curable composition is preferably in the range of 20 to 40% by weight. By setting the content of the above epoxy compound C2 within this preferred range, the viscosity of the curable composition can be more effectively improved.

上述具有環氧基及噻喃基中之至少一種之成分100重量%中的上述環氧化合物C2之含量較好的是5~95重量%之範圍內。又,較好的是上述環氧化合物C2為具有芳香環之環氧化合物,且上述具有環氧基及噻喃基中之至少一種之成分100重量%中的具有芳香環之化合物之含量為5~95重量%之範圍內。藉由使上述環氧化合物C2或具有芳香環之環氧化合物之含量處於該較好範圍內,可更有效地提高硬化性組合物之黏度。上述具有環氧基及噻喃基中之至少一種之成分100重量%中的上述環氧化合物C2或具有芳香環之環氧化合物之含量的更好下限為15重量%,尤其好的下限為35重量%,且更好的上限為75重量%,尤其好的上限為60重量%。The content of the epoxy compound C2 in 100% by weight of the component having at least one of the epoxy group and the thiopyranyl group is preferably in the range of 5 to 95% by weight. Further, it is preferred that the epoxy compound C2 is an epoxy compound having an aromatic ring, and the content of the compound having an aromatic ring in 100% by weight of the component having at least one of the epoxy group and the thiopyranyl group is 5 Within the range of ~95% by weight. By setting the content of the epoxy compound C2 or the epoxy compound having an aromatic ring in the preferred range, the viscosity of the curable composition can be more effectively improved. A lower limit of the content of the epoxy compound C2 or the epoxy compound having an aromatic ring in 100% by weight of the component having at least one of the epoxy group and the thiopyranyl group is 15% by weight, and particularly preferably, the lower limit is 35. The weight %, and more preferably, the upper limit is 75% by weight, and particularly preferably the upper limit is 60% by weight.

於硬化性組合物100重量%中,上述環氧化合物C3之含量較好的是0.1~5重量%之範圍內,藉由使上述環氧化合物C3之含量處於該較好範圍內,可進一步加快硬化性組合物之硬化速度。In 100% by weight of the curable composition, the content of the epoxy compound C3 is preferably in the range of 0.1 to 5% by weight, and the content of the epoxy compound C3 is further increased by the content of the epoxy compound C3. The hardening rate of the curable composition.

又,上述具有環氧基及噻喃基中之至少一種之成分100重量%中的上述環氧化合物C3之含量較好的是0.1~10重量%之範圍內。又,較好的是上述環氧化合物C3為具有含氮原子的雜環之環氧化合物,且上述具有環氧基及噻喃基中之至少一種之成分100重量%中的具有含氮原子的雜環之環氧化合物之含量為0.1~10重量%之範圍內。藉由使上述環氧化合物C3或具有含氮原子的雜環之環氧化合物之含量處於該較好範圍內,可加快硬化性組合物之硬化速度,並可進一步提高硬化性組合物之硬化物之耐熱性。Further, the content of the epoxy compound C3 in 100% by weight of the component having at least one of the epoxy group and the thiopyranyl group is preferably in the range of 0.1 to 10% by weight. Further, it is preferred that the epoxy compound C3 is an epoxy compound having a hetero ring containing a nitrogen atom, and the above-mentioned one having at least one of an epoxy group and a thiopyranyl group having a nitrogen atom is contained in 100% by weight. The content of the heterocyclic epoxy compound is in the range of 0.1 to 10% by weight. By setting the content of the epoxy compound C3 or the epoxy compound having a hetero ring containing a nitrogen atom in the preferred range, the curing rate of the curable composition can be accelerated, and the cured product of the curable composition can be further improved. Heat resistance.

硬化性組合物之黏度(25℃)較好的是處於20,000~100,000mPa‧s之範圍內。The viscosity (25 ° C) of the curable composition is preferably in the range of 20,000 to 100,000 mPa ‧ s.

又,硬化性組合物之氯離子濃度較好的是500ppm以下。若上述氯離子濃度過高,則有時硬化性組合物之硬化速度變慢。再者,上述氯離子濃度例如可利用ICP(Inductively Coupled Plasma,交感耦合電漿)發光分析進行測定。Further, the chloride ion concentration of the curable composition is preferably 500 ppm or less. When the chlorine ion concentration is too high, the curing rate of the curable composition may be slow. Further, the chloride ion concentration can be measured, for example, by ICP (Inductively Coupled Plasma) luminescence analysis.

上述硬化劑並無特別限定。作為上述硬化劑,可列舉咪唑硬化劑、胺硬化劑、酚硬化劑、多硫醇硬化劑或酸酐等。其中,因可使硬化性組合物於低溫下更迅速地硬化,故較好的是咪唑硬化劑、多硫醇硬化劑或胺硬化劑。又,因可於將上述具有環氧基及噻喃基中之至少一種之成分與上述硬化劑混合時提高保存穩定性,故較好的是潛伏性硬化劑。潛伏性硬化劑較好的是潛伏性咪唑硬化劑、潛伏性多硫醇硬化劑或潛伏性胺硬化劑。該等硬化劑可僅使用1種,亦可併用2種以上。再者,上述硬化劑亦可由聚胺基甲酸酯樹脂或聚酯樹脂等高分子物質所包覆。The above curing agent is not particularly limited. Examples of the curing agent include an imidazole curing agent, an amine curing agent, a phenol curing agent, a polythiol curing agent, and an acid anhydride. Among them, an imidazole curing agent, a polythiol curing agent or an amine curing agent is preferred because the curable composition can be cured more rapidly at a low temperature. Further, since the storage stability can be improved when the component having at least one of the epoxy group and the thiopyranyl group is mixed with the above-mentioned curing agent, a latent curing agent is preferred. The latent hardener is preferably a latent imidazole hardener, a latent polythiol hardener or a latent amine hardener. These hardeners may be used alone or in combination of two or more. Further, the curing agent may be coated with a polymer material such as a polyurethane resin or a polyester resin.

作為上述咪唑硬化劑,並無特別限定,可列舉:2-甲基咪唑、2-乙基-4-甲基咪唑、1-氰基乙基-2-苯基咪唑、1-氰基乙基-2-苯基咪唑鎓偏苯三酸鹽、2,4-二胺基-6-[2'-甲基咪唑基-(1')]-乙基-均三或2,4-二胺基-6-[2'-甲基咪唑基-(1')]-乙基-均三異氰尿酸加成物等。The imidazole curing agent is not particularly limited, and examples thereof include 2-methylimidazole, 2-ethyl-4-methylimidazole, 1-cyanoethyl-2-phenylimidazole, and 1-cyanoethyl group. -2-phenylimidazolium trimellitate, 2,4-diamino-6-[2'-methylimidazolyl-(1')]-ethyl-all three Or 2,4-diamino-6-[2'-methylimidazolyl-(1')]-ethyl-all three Isocyanuric acid adducts, etc.

作為上述多硫醇硬化劑,並無特別限定,可列舉:三羥甲基丙烷三-3-巰基丙酸酯、季戊四醇四-3-巰基丙酸酯或二季戊四醇六-3-巰基丙酸酯等。The polythiol curing agent is not particularly limited, and examples thereof include trimethylolpropane tri-3-mercaptopropionate, pentaerythritol tetrakis-3-mercaptopropionate or dipentaerythritol hexa-3-mercaptopropionate. Wait.

作為上述胺硬化劑,並無特別限定,可列舉:己二胺、辛二胺、癸二胺、3,9-雙(3-胺基丙基)2,4,8,10-四螺[5.5]十一烷、雙(4-胺基環己基)甲烷、間苯二胺或二胺基二苯基碸等。The amine curing agent is not particularly limited, and examples thereof include hexamethylenediamine, octanediamine, decanediamine, and 3,9-bis(3-aminopropyl)2,4,8,10-tetraspiro[ 5.5] undecane, bis(4-aminocyclohexyl)methane, m-phenylenediamine or diaminodiphenylphosphonium.

上述硬化劑之含量並無特別限定。較好的是,相對於上述具有環氧基及噻喃基中之至少一種之成分的總量100重量份,上述硬化劑之含量為1~40重量份之範圍內。若上述硬化劑之含量未達1重量份,則有時硬化性組合物不會充分地硬化。若上述硬化劑之含量超過40重量份,則有時硬化性組合物之硬化物之耐熱性會下降。再者,所謂「具有環氧基及噻喃基中之至少一種之成分的總量100重量份」,於不含上述成分A以外之其他環氧成分時係指上述成分A 100重量份,於包含上述成分A以外之其他環氧成分時係指上述成分A與其他環氧成分之總量100重量份。The content of the above curing agent is not particularly limited. It is preferred that the content of the curing agent is in the range of 1 to 40 parts by weight based on 100 parts by weight of the total of the components having at least one of the epoxy group and the thiopyranyl group. When the content of the above curing agent is less than 1 part by weight, the curable composition may not be sufficiently cured. When the content of the curing agent exceeds 40 parts by weight, the heat resistance of the cured product of the curable composition may be lowered. In addition, the "100 parts by weight of the total amount of the component having at least one of the epoxy group and the thiopyranyl group" means 100 parts by weight of the above component A when the epoxy component other than the component A is not contained. When the epoxy component other than the above component A is contained, it means 100 weight part of the total of the said component A and other epoxy components.

再者,於上述硬化劑為咪唑硬化劑或酚硬化劑時,較好的是,相對於上述具有環氧基及噻喃基中之至少一種之成分的總量100重量份,咪唑硬化劑或酚硬化劑之含量為1~15重量份之範圍內。又,於上述硬化劑為胺硬化劑、多硫醇硬化劑或酸酐時,較好的是,相對於上述具有環氧基及噻喃基中之至少一種之成分的總量100重量份,胺硬化劑、多硫醇硬化劑或酸酐之含量為15~40重量份之範圍內。Further, when the curing agent is an imidazole curing agent or a phenol curing agent, it is preferably an imidazole hardener or 100 parts by weight based on 100 parts by weight of the total of the components having at least one of an epoxy group and a thiopyranyl group. The content of the phenol hardener is in the range of 1 to 15 parts by weight. Further, when the curing agent is an amine curing agent, a polythiol curing agent or an acid anhydride, it is preferably an amine with respect to 100 parts by weight of the total of the components having at least one of an epoxy group and a thiopyranyl group. The content of the hardener, the polythiol hardener or the acid anhydride is in the range of 15 to 40 parts by weight.

本發明之硬化性組合物亦可進而含有溶劑。例如,當上述成分A為固態時,若將固態之上述成分A添加至溶劑中,則上述成分A會溶解於溶劑中,故可提高上述成分A於硬化性組合物中之分散性。作為上述溶劑,例如可列舉:乙酸乙酯、甲基纖維素、甲苯、丙酮、甲基乙基酮、環己烷、正己烷、四氫呋喃或二乙醚等。The curable composition of the present invention may further contain a solvent. For example, when the component A is in a solid state, when the component A in the solid state is added to the solvent, the component A is dissolved in the solvent, so that the dispersibility of the component A in the curable composition can be improved. Examples of the solvent include ethyl acetate, methyl cellulose, toluene, acetone, methyl ethyl ketone, cyclohexane, n-hexane, tetrahydrofuran or diethyl ether.

為調節組合物之黏度、或為使已塗布之組合物不發生濕潤擴散,本發明之硬化性組合物亦可進而含有聚合性化合物。上述聚合性化合物並無特別限定。作為上述聚合性化合物,例如可列舉交聯性化合物或非交聯性化合物。上述聚合性化合物可僅使用1種,亦可併用2種以上。The curable composition of the present invention may further contain a polymerizable compound in order to adjust the viscosity of the composition or to prevent wet diffusion of the applied composition. The polymerizable compound is not particularly limited. The polymerizable compound may, for example, be a crosslinkable compound or a non-crosslinkable compound. The polymerizable compound may be used alone or in combination of two or more.

上述交聯性化合物並無特別限定。作為上述交聯性化合物之具體例,例如可列舉:1,4-丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、1,9-壬二醇二(甲基)丙烯酸酯、(聚)乙二醇二(甲基)丙烯酸酯、(聚)丙二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、丙三醇甲基丙烯酸酯丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、三羥甲基丙烷三甲基丙烯酸酯、(甲基)丙烯酸烯丙酯、(甲基)丙烯酸乙烯酯、二乙烯苯、聚酯(甲基)丙烯酸酯、或(甲基)丙烯酸胺基甲酸酯等。The crosslinkable compound is not particularly limited. Specific examples of the crosslinkable compound include 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, and 1,9-fluorene. Alcohol di(meth)acrylate, (poly)ethylene glycol di(meth)acrylate, (poly)propylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, pentaerythritol di Methyl) acrylate, glycerol methacrylate acrylate, pentaerythritol tri(meth) acrylate, trimethylolpropane trimethacrylate, allyl (meth) acrylate, (meth) acrylate Vinyl ester, divinylbenzene, polyester (meth) acrylate, or (meth) acrylate urethane or the like.

上述非交聯性化合物並無特別限定。作為上述非交聯性化合物之具體例,可列舉:(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸-2-乙基己酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸十一烷酯、(甲基)丙烯酸十二烷酯、(甲基)丙烯酸十三烷酯、或(甲基)丙烯酸十四烷酯等。The above non-crosslinkable compound is not particularly limited. Specific examples of the non-crosslinkable compound include ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, and n-butyl (meth)acrylate. Isobutyl methacrylate, tert-butyl (meth)acrylate, amyl (meth)acrylate, hexyl (meth)acrylate, heptyl (meth)acrylate, (meth)acrylic acid-2- Ethylhexyl ester, n-octyl (meth)acrylate, isooctyl (meth)acrylate, decyl (meth)acrylate, decyl (meth)acrylate, undecyl (meth)acrylate, ( Dodecyl (meth)acrylate, tridecyl (meth)acrylate, or tetradecyl (meth)acrylate, and the like.

上述聚合性化合物之含量並無特別限定。較好的是,相對於上述具有環氧基及噻喃基中之至少一種之成分的總量100重量份,上述聚合性化合物之含量為10~60重量份之範圍內。若上述聚合性化合物之含量未達10重量份,則有時硬化性組合物之硬化物之耐熱性會下降。若上述聚合性化合物之含量超過60重量份,則有時硬化性組合物之黏度會變得過高。The content of the above polymerizable compound is not particularly limited. It is preferred that the content of the polymerizable compound is in the range of 10 to 60 parts by weight based on 100 parts by weight of the total of the components having at least one of the epoxy group and the thiopyranyl group. When the content of the above polymerizable compound is less than 10 parts by weight, the heat resistance of the cured product of the curable composition may be lowered. When the content of the above polymerizable compound exceeds 60 parts by weight, the viscosity of the curable composition may become too high.

因可提高硬化性組合物之硬化物對被黏附體之接著力,故本發明之硬化性組合物較好的是含有接著力調節劑。上述接著力調節劑較好的是矽烷偶合劑。Since the adhesion of the cured product of the curable composition to the adherend can be enhanced, the curable composition of the present invention preferably contains an adhesion regulator. The above-mentioned adhesion regulator is preferably a decane coupling agent.

上述矽烷偶合劑並無特別限定。作為上述矽烷偶合劑,例如可列舉:N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷、N-(2-胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷、N-(2-胺基乙基)-3-胺基丙基三乙氧基矽烷、3-胺基丙基二甲基乙氧基矽烷、3-胺基丙基甲基二乙氧基矽烷、3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙醯氧基矽烷、乙烯基三氯矽烷、3-巰基丙基三甲氧基矽烷、3-巰基丙基甲基二甲氧基矽烷、3-氯丙基三甲氧基矽烷、3-氯丙基三乙氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷、乙基三甲氧基矽烷、丙基三甲氧基矽烷、丙基三乙氧基矽烷、十二烷基三乙氧基矽烷、己基三甲氧基矽烷、第三丁基異丁基二乙氧基矽烷、甲基苯基二乙氧基矽烷、3-縮水甘油氧基丙基三乙氧基矽烷或甲基苯基二甲氧基矽烷等。上述矽烷偶合劑可僅使用1種,亦可併用2種以上。The above decane coupling agent is not particularly limited. As the above decane coupling agent, for example, N-(2-aminoethyl)-3-aminopropyltrimethoxydecane, N-(2-aminoethyl)-3-aminopropyl A Dimethoxyoxane, N-(2-aminoethyl)-3-aminopropyltrimethoxydecane, N-(2-aminoethyl)-3-aminopropyltriethoxy Decane, 3-aminopropyldimethylethoxydecane, 3-aminopropylmethyldiethoxydecane, 3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxylate Base decane, vinyl triethoxy decane, vinyl trimethoxy decane, vinyl triethoxy decane, vinyl trichloro decane, 3-mercaptopropyl trimethoxy decane, 3-mercaptopropyl methyl Dimethoxydecane, 3-chloropropyltrimethoxydecane, 3-chloropropyltriethoxydecane, 3-methylpropenyloxypropyltrimethoxydecane, 3-methylpropenyloxy Propyltriethoxydecane, ethyltrimethoxydecane, propyltrimethoxydecane, propyltriethoxydecane,dodecyltriethoxydecane,hexyltrimethoxydecane, tert-butyl Isobutyl diethoxy decane, methyl phenyl diethoxy decane, 3-condensation Glycidoxypropyltriethoxydecane or methylphenyldimethoxydecane. The decane coupling agent may be used alone or in combination of two or more.

上述矽烷偶合劑之含量並無特別限定。較好的是,相對於上述具有環氧基及噻喃基中之至少一種之成分的總量100重量份,上述矽烷偶合劑之含量為4~20重量份之範圍內。若上述矽烷偶合劑之含量未達4重量份,則有時硬化性組合物之硬化物對被黏附體之接著力會下降。若上述矽烷偶合劑之含量超過20重量份,則有時硬化性組合物難以發生硬化。The content of the above decane coupling agent is not particularly limited. It is preferred that the content of the above decane coupling agent is in the range of 4 to 20 parts by weight based on 100 parts by weight of the total of the components having at least one of the epoxy group and the thiopyranyl group. When the content of the above decane coupling agent is less than 4 parts by weight, the adhesion of the cured product of the curable composition to the adherend may decrease. When the content of the above decane coupling agent exceeds 20 parts by weight, the curable composition may hardly be cured.

本發明之硬化性組合物較好的是含有無機粒子。藉由使用上述無機粒子,可抑制硬化性組合物之硬化物之潛熱膨脹。上述無機粒子並無特別限定。作為上述無機粒子,可列舉二氧化矽、氮化鋁、或氧化鋁等。上述無機粒子可僅使用1種,亦可併用2種以上。The curable composition of the present invention preferably contains inorganic particles. By using the above inorganic particles, the latent heat expansion of the cured product of the curable composition can be suppressed. The inorganic particles are not particularly limited. Examples of the inorganic particles include cerium oxide, aluminum nitride, and aluminum oxide. The inorganic particles may be used alone or in combination of two or more.

上述無機粒子之含量並無特別限定。較好的是,相對於上述具有環氧基及噻喃基中之至少一種之成分的總量100重量份,上述無機粒子之含量為3~900重量份之範圍內。若上述無機粒子之含量未達3重量份,則有時無法抑制硬化性組合物之硬化物之潛熱膨脹。若上述無機粒子之含量超過900重量份,則有時無機粒子並未充分地分散於硬化性組合物中。The content of the above inorganic particles is not particularly limited. It is preferred that the content of the inorganic particles is in the range of 3 to 900 parts by weight based on 100 parts by weight of the total of the components having at least one of the epoxy group and the thiopyranyl group. When the content of the inorganic particles is less than 3 parts by weight, the latent heat expansion of the cured product of the curable composition may not be inhibited. When the content of the inorganic particles exceeds 900 parts by weight, the inorganic particles may not be sufficiently dispersed in the curable composition.

本發明之硬化性組合物亦可含有藉由光照射或加熱而生成反應活性種之聚合起始劑。藉由使用上述聚合起始劑,可進一步提高硬化性組合物之硬化速度。The curable composition of the present invention may also contain a polymerization initiator which generates a reactive species by light irradiation or heating. The curing rate of the curable composition can be further increased by using the above polymerization initiator.

上述聚合起始劑並無特別限定。作為上述聚合起始劑,例如可列舉:苯乙酮聚合起始劑、縮酮聚合起始劑、鹵化酮、醯基氧化膦、或醯基膦酸酯等。上述苯乙酮聚合起始劑並無特別限定。作為上述苯乙酮聚合起始劑之具體例,可列舉:4-(2-羥基乙氧基)苯基(2-羥基-2-丙基)酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、甲氧基苯乙酮、2,2-二甲氧基-1,2-二苯基乙烷-1-酮、2-羥基-2-環己基苯乙酮等。又,上述縮酮聚合起始劑並無特別限定。作為上述縮酮聚合起始劑之具體例,可列舉苯偶醯二甲基縮酮等。上述聚合起始劑可僅使用1種,亦可併用2種以上。The polymerization initiator is not particularly limited. Examples of the polymerization initiator include an acetophenone polymerization initiator, a ketal polymerization initiator, a halogenated ketone, a decylphosphine oxide, or a mercaptophosphonate. The acetophenone polymerization initiator is not particularly limited. Specific examples of the acetophenone polymerization initiator include 4-(2-hydroxyethoxy)phenyl (2-hydroxy-2-propyl) ketone and 2-hydroxy-2-methyl-1. -Phenylpropan-1-one, methoxyacetophenone, 2,2-dimethoxy-1,2-diphenylethane-1-one, 2-hydroxy-2-cyclohexylacetophenone Wait. Further, the ketal polymerization initiator is not particularly limited. Specific examples of the ketal polymerization initiator include benzoin dimethyl ketal and the like. The polymerization initiator may be used alone or in combination of two or more.

上述聚合起始劑之含量並無特別限定。較好的是,相對於上述具有環氧基及噻喃基中之至少一種之成分的總量100重量份,上述聚合起始劑之含量為2~10重量份之範圍內。若上述聚合起始劑之含量未達2重量份,則有時無法充分獲得添加聚合起始劑之效果。若上述聚合起始劑之含量超過10重量份,則有時硬化性組合物之硬化物對被黏附體之接著力會下降。The content of the above polymerization initiator is not particularly limited. It is preferred that the content of the polymerization initiator is in the range of 2 to 10 parts by weight based on 100 parts by weight of the total of the components having at least one of the epoxy group and the thiopyranyl group. When the content of the polymerization initiator is less than 2 parts by weight, the effect of adding a polymerization initiator may not be sufficiently obtained. When the content of the polymerization initiator is more than 10 parts by weight, the adhesion of the cured product of the curable composition to the adherend may be lowered.

本發明之硬化性組合物之製造方法並無特別限定。作為硬化性組合物之製造方法之具體例,可列舉如下製造方法:將上述具有環氧基及噻喃基中之至少一種之成分、上述硬化劑、以及視需要添加之其他成分加以調配,並使用行星式攪拌機等充分混合。The method for producing the curable composition of the present invention is not particularly limited. Specific examples of the method for producing the curable composition include a method of preparing at least one of the epoxy group and the thiopyranyl group, the curing agent, and other components added as needed, and Mix thoroughly using a planetary mixer or the like.

本發明之硬化性組合物可製成單成分接著劑而用於液晶面板或半導體晶片等之接著。本發明之硬化性組合物既可為糊狀接著劑,亦可為膜狀接著劑。The curable composition of the present invention can be used as a one-component adhesive for subsequent bonding of a liquid crystal panel or a semiconductor wafer or the like. The curable composition of the present invention may be a paste-like adhesive or a film-like adhesive.

將本發明之硬化性組合物加工成膜狀接著劑之方法並無特別限定。例如可列舉:將本發明之硬化性組合物塗布於脫模紙等基材上,而加工成膜狀接著劑之方法;或者於本發明之硬化性組合物中添加溶劑並塗布於脫模紙等基材上,然後在低於上述硬化劑之活性溫度的溫度下使溶劑揮發,而加工成膜狀接著劑之方法等。The method of processing the curable composition of the present invention into a film-like adhesive is not particularly limited. For example, a method of applying the curable composition of the present invention to a substrate such as release paper to form a film-like adhesive agent; or adding a solvent to the curable composition of the present invention and applying it to a release paper The method of processing the film into a film-like adhesive or the like by volatilizing the solvent at a temperature lower than the activation temperature of the curing agent, and the like.

作為使本發明之硬化性組合物硬化之方法,可列舉:對硬化性組合物進行加熱之方法;對硬化性組合物照射光,然後對硬化性組合物進行加熱之方法;對硬化性組合物照射光,與此同時對硬化性組合物進行加熱之方法等。Examples of the method for curing the curable composition of the present invention include a method of heating a curable composition, a method of irradiating light to a curable composition, and then heating the curable composition; and a curable composition; A method of irradiating light and heating the curable composition at the same time.

使本發明之硬化性組合物硬化時之加熱溫度較好的是處於160~250℃之範圍內,更好的是處於160~200℃之範圍內。因本發明之硬化性組合物可於低溫下硬化,故可減少加熱所需之能量。The heating temperature at which the curable composition of the present invention is cured is preferably in the range of 160 to 250 ° C, more preferably in the range of 160 to 200 ° C. Since the curable composition of the present invention can be hardened at a low temperature, the energy required for heating can be reduced.

對於先前之硬化性組合物而言,若上述加熱溫度為200℃以下,則硬化時間變長,例如若加熱溫度為200℃,則會導致硬化時間超過10秒。相對於此,對於本發明之硬化性組合物而言,即便上述加熱溫度為200℃以下,亦可於短時間內硬化,例如若加熱溫度為200℃,則硬化時間最長亦可未達10秒。再者,本說明書中,所謂低溫係指200℃以下之溫度。In the case of the prior curable composition, if the heating temperature is 200 ° C or lower, the curing time becomes long. For example, if the heating temperature is 200 ° C, the curing time is longer than 10 seconds. On the other hand, in the curable composition of the present invention, even if the heating temperature is 200 ° C or lower, the curing can be performed in a short time. For example, if the heating temperature is 200 ° C, the curing time may be as long as 10 seconds. . In the present specification, the term "low temperature" means a temperature of 200 ° C or lower.

再者,作為使本發明之硬化性組合物硬化之方法,若使用對硬化性組合物照射光然後對硬化性組合物進行加熱之方法,則與僅進行加熱之方法相比可於較短時間內使硬化性組合物硬化。Further, as a method of curing the curable composition of the present invention, when a method of irradiating light to the curable composition and then heating the curable composition is used, it can be used in a shorter period of time than the method of heating only The hardenable composition is hardened internally.

對本發明之硬化性組合物照射光時所用之光源並無特別限定。作為該光源,例如可列舉於波長420nm以下具有充分之發光分布的光源等。又,作為光源之具體例,例如可列舉:低壓水銀燈、中壓水銀燈、高壓水銀燈、超高壓水銀燈、化學燈、黑光燈、微波激發水銀燈、或金屬鹵化物燈等。其中較好的是化學燈。化學燈可高效率地發出聚合起始劑之活性波長區域之光,並且組合物中聚合起始劑以外之其他成分的光吸收波長區域之發光量較少。進而,藉由使用化學燈,可使光高效率地到達存在於組合物內部之聚合起始劑。The light source used when the curable composition of the present invention is irradiated with light is not particularly limited. Examples of the light source include a light source having a sufficient light emission distribution at a wavelength of 420 nm or less. Further, specific examples of the light source include a low pressure mercury lamp, a medium pressure mercury lamp, a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a chemical lamp, a black light lamp, a microwave excited mercury lamp, or a metal halide lamp. Among them, a chemical lamp is preferred. The chemical lamp can efficiently emit light in the active wavelength region of the polymerization initiator, and the amount of luminescence in the light absorption wavelength region of the components other than the polymerization initiator in the composition is small. Further, by using a chemical lamp, light can be efficiently obtained to reach the polymerization initiator present inside the composition.

例如,當含有具有苯乙酮基之裂解型聚合起始劑時,365nm~420nm之波長區域之光照射強度較好的是0.1~100mW/cm2For example, when a cleavage type polymerization initiator having an acetophenone group is contained, the light irradiation intensity in a wavelength region of 365 nm to 420 nm is preferably 0.1 to 100 mW/cm 2 .

(向異性導電材料)(transverse conductive material)

藉由使本發明之硬化性組合物含有導電性粒子,可獲得向異性導電材料。The anisotropic conductive material can be obtained by including the conductive particles in the curable composition of the present invention.

上述導電性粒子將相對向之電性連接部分間、例如電路基板之電極與電子零件之電極間等加以電性連接。上述導電性粒子只要係至少外表面具有導電性之粒子則並無特別限定。作為上述導電性粒子,例如可列舉:以金屬層將有機粒子、無機粒子、有機無機混合粒子、或金屬粒子等之表面加以包覆之導電性粒子,或實質上僅由金屬構成之金屬粒子等。上述金屬層並無特別限定。作為上述金屬層,可列舉:金層、銀層、銅層、鎳層、鈀層、或含有錫之金屬層等。The conductive particles are electrically connected to each other between the electrically connected portions, for example, between the electrodes of the circuit board and the electrodes of the electronic component. The conductive particles are not particularly limited as long as they are at least conductive particles on the outer surface. Examples of the conductive particles include conductive particles in which a surface of an organic particle, an inorganic particle, an organic-inorganic hybrid particle, or a metal particle is coated with a metal layer, or a metal particle substantially composed only of a metal. . The metal layer is not particularly limited. Examples of the metal layer include a gold layer, a silver layer, a copper layer, a nickel layer, a palladium layer, and a metal layer containing tin.

上述導電性粒子之含量並無特別限定。較好的是,相對於上述具有環氧基及噻喃基中之至少一種之成分的總量100重量份,上述導電性粒子之含量為0.5~5重量份之範圍內。若上述導電性粒子之含量未達0.5重量份,則有時無法使電極彼此可靠地導通。若導電性粒子之含量超過5重量份,則有時不應導通之相鄰接之電極間會發生短路。The content of the above conductive particles is not particularly limited. It is preferred that the content of the conductive particles is in the range of 0.5 to 5 parts by weight based on 100 parts by weight of the total of the components having at least one of the epoxy group and the thiopyranyl group. When the content of the conductive particles is less than 0.5 parts by weight, the electrodes may not be reliably electrically connected to each other. When the content of the conductive particles exceeds 5 parts by weight, a short circuit may occur between adjacent electrodes which should not be turned on.

於向異性導電材料為液狀或糊狀時,向異性導電材料之黏度(25℃)較好的是處於20,000~100,000mPa‧s之範圍內。若上述黏度過低,則有時導電性粒子於向異性導電材料中發生沈降。若上述黏度過高,則有時導電性粒子未充分地分散於向異性導電材料中。When the anisotropic conductive material is in a liquid or paste form, the viscosity (25 ° C) of the anisotropic conductive material is preferably in the range of 20,000 to 100,000 mPa ‧ s. When the viscosity is too low, the conductive particles may settle in the anisotropic conductive material. When the viscosity is too high, the conductive particles may not be sufficiently dispersed in the anisotropic conductive material.

又,向異性導電材料之氯離子濃度較好的是500ppm以下。若上述氯離子濃度過高,則有時向異性導電材料所含之硬化性組合物之硬化速度變慢。Further, the chloride ion concentration of the anisotropic conductive material is preferably 500 ppm or less. When the chlorine ion concentration is too high, the curing rate of the curable composition contained in the anisotropic conductive material may be slow.

本發明之向異性導電材料可製成向異性導電糊、向異性導電油墨、向異性導電黏接著劑、向異性導電膜、或向異性導電片材等而使用。於將本發明之含有導電性粒子之向異性導電材料製成向異性導電膜或向異性導電片材等膜狀接著劑而使用時,亦可於該含有導電性粒子之膜狀接著劑上積層不含導電性粒子之膜狀接著劑。The anisotropic conductive material of the present invention can be used as an anisotropic conductive paste, an anisotropic conductive ink, an anisotropic conductive adhesive, an anisotropic conductive film, or an anisotropic conductive sheet. When the anisotropic conductive material containing the conductive particles of the present invention is used as a film-like adhesive such as an anisotropic conductive film or an anisotropic conductive sheet, it may be laminated on the film-like adhesive containing the conductive particles. A film-like adhesive that does not contain conductive particles.

(連接構造體)(connection structure)

使用本發明之硬化性組合物或本發明之向異性導電材料將連接對象構件加以連接,藉此可獲得連接構造體。連接對象構件較好的是電子零件及電路基板中之至少一種。The connection structure member can be joined by using the curable composition of the present invention or the anisotropic conductive material of the present invention, whereby a connection structure can be obtained. The connection target member is preferably at least one of an electronic component and a circuit board.

較好的是,上述連接構造體具備第1連接對象構件、第2連接對象構件、以及將第1與第2連接對象構件加以連接之連接部,該連接部係由本發明之向異性導電材料或本發明之硬化性組合物所形成。連接部係藉由使本發明之向異性導電材料或本發明之硬化性組合物硬化而形成之硬化物層。Preferably, the connection structure includes a first connection target member, a second connection target member, and a connection portion that connects the first and second connection target members, and the connection portion is made of the anisotropic conductive material of the present invention or The curable composition of the present invention is formed. The connecting portion is a cured layer formed by curing the anisotropic conductive material of the present invention or the curable composition of the present invention.

上述連接構造體較好的是具備第1連接對象構件、第2連接對象構件、以及將第1與第2連接對象構件加以電性連接之連接部。該連接部係由本發明之向異性導電材料所形成。又,該連接部係硬化物層,係藉由使本發明之向異性導電材料硬化而形成的。It is preferable that the connection structure includes a first connection target member, a second connection target member, and a connection portion that electrically connects the first and second connection target members. The connecting portion is formed of the anisotropic conductive material of the present invention. Further, the joint portion is a cured layer formed by curing the anisotropic conductive material of the present invention.

上述第1、第2連接對象構件亦可為電性連接之第1、第2電性連接對象構件。作為上述第1、第2電性連接對象構件,可列舉彼此應電性連接之各種電性連接對象構件。例如,可使第1、第2電性連接對象構件中之一方為電路基板之電極,另一方為IC晶片等電子零件晶片之電極。又,第1、第2電性連接對象構件未必是兩方均須為電極。The first and second connection target members may be the first and second electrical connection target members that are electrically connected. Examples of the first and second electrical connection target members include various electrical connection target members that are electrically connected to each other. For example, one of the first and second electrical connection target members may be an electrode of a circuit board, and the other may be an electrode of an electronic component wafer such as an IC wafer. Further, the first and second electrical connection target members are not necessarily both electrodes.

圖1係示意性地表示使用含有本發明之一實施形態之硬化性組合物、及導電性粒子的向異性導電材料之連接構造體的前視剖面圖。Fig. 1 is a front cross-sectional view schematically showing a connection structure using an anisotropic conductive material containing a curable composition according to an embodiment of the present invention and conductive particles.

圖1所示之連接構造體1具備第1連接對象構件2、第2連接對象構件3、以及將第1、第2連接對象構件2、3加以電性連接之連接部4。連接部4係硬化物層,係使用含有複數個導電性粒子5之作為向異性導電材料的向異性導電糊而形成的。The connection structure 1 shown in FIG. 1 includes a first connection target member 2, a second connection target member 3, and a connection portion 4 that electrically connects the first and second connection object members 2 and 3. The connecting portion 4 is a cured layer, and is formed by using an anisotropic conductive paste containing a plurality of conductive particles 5 as an anisotropic conductive material.

於第1連接對象構件2之上表面2a上設有複數個電極2b。於第2連接對象構件3之下表面3a上設有複數個電極3b。於第1連接對象構件2之上表面2a上,介隔由含有導電性粒子1之向異性導電糊所形成之硬化物層4,而積層有第2連接對象構件3。電極2b與電極3b係藉由導電性粒子5而電性連接。A plurality of electrodes 2b are provided on the upper surface 2a of the first connection member 2. A plurality of electrodes 3b are provided on the lower surface 3a of the second connection member 3. The second connection member 3 is laminated on the upper surface 2a of the first connection member 2 by interposing the cured layer 4 formed of the anisotropic conductive paste containing the conductive particles 1. The electrode 2b and the electrode 3b are electrically connected by the conductive particles 5.

作為上述連接構造體,具體可列舉:於電路基板上搭載有半導體晶片、電容器晶片、二極體晶片等電子零件晶片,且與電路基板上之電極電性連接之連接構造體。作為電路基板,可列舉:可撓性印刷基板等各種印刷基板、以及玻璃基板或積層有金屬箔之基板等各種電路基板。Specific examples of the connection structure include a connection structure in which an electronic component wafer such as a semiconductor wafer, a capacitor wafer, or a diode wafer is mounted on a circuit board and electrically connected to electrodes on the circuit board. Examples of the circuit board include various printed circuit boards such as a flexible printed circuit board, and various circuit boards such as a glass substrate or a substrate on which a metal foil is laminated.

本發明之連接構造體之製造方法並無特別限定。作為連接構造體之製造方法,例如可列舉:於電子零件或電路基板等之第1連接對象構件與電子零件或電路基板等之第2連接對象構件間配置上述向異性導電材料,而獲得積層體,然後對該積層體進行加熱、加壓之製造方法等。The method for producing the joined structure of the present invention is not particularly limited. For example, the above-described anisotropic conductive material is disposed between the first connection target member such as an electronic component or a circuit board, and the second connection member such as an electronic component or a circuit board, and the laminated body is obtained. Then, the laminated body is heated and pressurized, and the like.

以下,列舉實施例及比較例對本發明加以具體說明。本發明並非僅限定於以下實施例。Hereinafter, the present invention will be specifically described by way of examples and comparative examples. The invention is not limited to the following examples.

為獲得向異性導電糊,而準備下述材料。In order to obtain an anisotropic conductive paste, the following materials were prepared.

(1)成分A(1) Ingredient A

作為上述成分A,準備R1、R2、R3、X1及X2為下述表1~15所示之基的各種化合物。再者,表1~15中,當R1具有式(2A)所表示之結構時,於R1欄中記作「式(2A)」,並進一步表示式(2A)中之R4及X3。再者,於調配時,上述成分A為上述化合物之單體與多聚物之混合物。As the component A, various compounds in which R1, R2, R3, X1 and X2 are groups shown in the following Tables 1 to 15 are prepared. Further, in Tables 1 to 15, when R1 has the structure represented by the formula (2A), it is referred to as "formula (2A)" in the column of R1, and further represents R4 and X3 in the formula (2A). Further, in the preparation, the component A is a mixture of a monomer and a polymer of the above compound.

(2)環氧成分B(2) Epoxy component B

作為上述環氧成分B,準備R11、R12、R13及R14為下述表1~15所示之基的各種化合物。再者,於調配時,上述環氧成分B為上述化合物之單體與多聚物之混合物。As the epoxy component B, various compounds in which R11, R12, R13 and R14 are groups shown in the following Tables 1 to 15 are prepared. Further, in the preparation, the epoxy component B is a mixture of a monomer and a polymer of the above compound.

(3)環氧成分C(3) Epoxy component C

環氧樹脂C1:雙酚A型環氧樹脂Epoxy resin C1: bisphenol A epoxy resin

環氧化合物C2-1:ADEKA RESIN EP-3300S(ADEKA公司製造)Epoxy compound C2-1: ADEKA RESIN EP-3300S (made by ADEKA)

環氧化含物C2-2:間苯二酚二縮水甘油醚Epoxidized content C2-2: resorcinol diglycidyl ether

環氧化合物C3-1:異氰尿酸三縮水甘油酯(上述式(16A)所表示之環氧化合物)Epoxy compound C3-1: triglycidyl isocyanurate (epoxy compound represented by the above formula (16A))

環氧化合物C3-2:異氰尿酸三羥乙酯三縮水甘油醚(上述式(17A)所表示之環氧化合物)Epoxy compound C3-2: trihydroxyethyl isocyanurate triglycidyl ether (epoxy compound represented by the above formula (17A))

(4)溶劑(4) Solvent

乙酸乙酯Ethyl acetate

(5)硬化劑(5) Hardener

1,2-二甲基咪唑1,2-dimethylimidazole

咪唑硬化劑(胺加合物型硬化劑,Ajinomoto Fine-Techno公司製造「Ajicure PN-23J」)Imidazole hardener (amine adduct type hardener, "Ajicure PN-23J" manufactured by Ajinomoto Fine-Techno Co., Ltd.)

胺硬化劑(乙二胺)Amine hardener (ethylenediamine)

多硫醇硬化劑(SC有機化學公司製造「TMMP:三羥甲基丙烷三-3-巰基丙酸酯」)Polythiol hardener ("TMMP: Trimethylolpropane tri-3-mercaptopropionate" manufactured by SC Organic Chemical Co., Ltd.)

酚硬化劑(Sumitomo Bakelite公司製造「Sumilite-PR-HF-3」)Phenol curing agent (Sumilite-PR-HF-3 manufactured by Sumitomo Bakelite)

酸酐(日本環氧樹脂公司製造「YH-307」)Anhydride ("YH-307" manufactured by Nippon Epoxy Co., Ltd.)

(實施例1)(Example 1)

作為上述成分A,準備上述式(1B)所表示之環氧化合物。上述式(1B)所表示之化合物係上述式(1A)中之R2為亞甲基、R3為亞甲基、X1為氧原子、X2為氧原子、且R1具有上述式(2A)所表示之結構、上述式(2A)中之R4為亞甲基、X3為氧原子之化合物。As the component A, an epoxy compound represented by the above formula (1B) is prepared. In the compound represented by the above formula (1B), R2 in the above formula (1A) is a methylene group, R3 is a methylene group, X1 is an oxygen atom, X2 is an oxygen atom, and R1 is represented by the above formula (2A). The compound of the above formula (2A) wherein R4 is a methylene group and X3 is an oxygen atom.

將含有作為上述成分A的上述式(1B)所表示之環氧化合物100重量份及乙酸乙酯20重量份之混合物120重量份、平均粒徑為0.02μm之二氧化矽粒子7重量份、作為硬化劑之咪唑硬化劑(胺加合物型硬化劑,Ajinomoto Fine-Techno公司製造「Ajicure PN-23J」)40重量份、作為矽烷偶合劑的3-縮水甘油氧基丙基三乙氧基矽烷4.5重量份、以及平均粒徑為3μm之導電性粒子2重量份加以調配,而獲得組合物。再者,所使用之上述導電性粒子係於二乙烯苯樹脂粒子之表面上形成有鍍鎳層、且於該鍍鎳層之表面上形成有鍍金層的具有金屬層之導電性粒子。100 parts by weight of a mixture of 100 parts by weight of an epoxy compound represented by the above formula (1B) and 20 parts by weight of ethyl acetate, and 7 parts by weight of cerium oxide particles having an average particle diameter of 0.02 μm, as the component A, 40% by weight of an imidazole hardener (amine adduct type hardener, "Ajicure PN-23J" manufactured by Ajinomoto Fine-Techno Co., Ltd.), 3-glycidoxypropyltriethoxydecane as a decane coupling agent 4.5 parts by weight and 2 parts by weight of the conductive particles having an average particle diameter of 3 μm were blended to obtain a composition. Further, the conductive particles to be used are conductive particles having a metal layer formed on the surface of the divinylbenzene resin particles and having a nickel plating layer and having a gold plating layer formed on the surface of the nickel plating layer.

使用行星式攪拌機以2000rpm將所得組合物攪拌8分鐘,使用尼龍製濾紙(孔徑10μm)進行過濾,而製作出作為向異性導電材料的向異性導電糊。The obtained composition was stirred at 2000 rpm for 8 minutes using a planetary mixer, and filtered using a nylon filter paper (pore size: 10 μm) to prepare an anisotropic conductive paste as an anisotropic conductive material.

(實施例2)(Example 2)

代替含有上述式(1B)所表示之環氧化合物100重量份及乙酸乙酯20重量份之混合物120重量份,而使用作為上述成分A的上述式(1B)所表示之環氧化合物50重量份、及作為上述環氧成分B的上述式(11B)所表示之環氧化合物50重量份,除此以外,以與實施例1相同之方式獲得向異性導電糊。In place of 120 parts by weight of a mixture containing 100 parts by weight of the epoxy compound represented by the above formula (1B) and 20 parts by weight of ethyl acetate, 50 parts by weight of the epoxy compound represented by the above formula (1B) as the above component A is used. An anisotropic conductive paste was obtained in the same manner as in Example 1 except that 50 parts by weight of the epoxy compound represented by the above formula (11B) was used as the epoxy component B.

(實施例3)(Example 3)

代替含有上述式(1B)所表示之環氧化合物100重量份及乙酸乙酯20重量份之混合物120重量份,而使用作為上述成分A的上述式(1B)所表示之環氧化合物30重量份、作為上述環氧成分B的上述式(11B)所表示之環氧化合物40重量份、及作為上述環氧化合物C2-1的ADEKA RESIN EP-3300S(ADEKA公司製造)30重量份,除此以外,以與實施例1相同之方式獲得向異性導電糊。In place of 120 parts by weight of a mixture containing 100 parts by weight of the epoxy compound represented by the above formula (1B) and 20 parts by weight of ethyl acetate, 30 parts by weight of the epoxy compound represented by the above formula (1B) as the above component A is used. 40 parts by weight of the epoxy compound represented by the above formula (11B) and 30 parts by weight of ADEKA RESIN EP-3300S (manufactured by Adeka Co., Ltd.) as the epoxy compound C2-1. An anisotropic conductive paste was obtained in the same manner as in Example 1.

(實施例4)(Example 4)

代替含有上述式(1B)所表示之環氧化合物100重量份及乙酸乙酯20重量份之混合物120重量份,而使用作為上述成分A的上述式(1B)所表示之環氧化合物30重量份、作為上述環氧成分B的上述式(11B)所表示之環氧化合物40重量份、作為上述環氧化合物C2-1的ADEKA RESIN EP-3300S(ADEKA公司製造)25重量份、及作為上述環氧化合物C3-1的上述式(16A)所表示之環氧化合物5重量份,除此以外,以與實施例1相同之方式獲得向異性導電糊。In place of 120 parts by weight of a mixture containing 100 parts by weight of the epoxy compound represented by the above formula (1B) and 20 parts by weight of ethyl acetate, 30 parts by weight of the epoxy compound represented by the above formula (1B) as the above component A is used. 40 parts by weight of the epoxy compound represented by the above formula (11B), 25 parts by weight of ADEKA RESIN EP-3300S (made by Adeka Co., Ltd.) as the epoxy compound C2-1, and the above-mentioned ring An anisotropic conductive paste was obtained in the same manner as in Example 1 except that 5 parts by weight of the epoxy compound represented by the above formula (16A) of the oxygen compound C3-1 was used.

(比較例1)(Comparative Example 1)

將作為上述環氧樹脂C1的雙酚A型環氧樹脂100重量份、作為硬化劑的1,2-二甲基咪唑5重量份加以調配,使用行星式攪拌機以2000rpm攪拌5分鐘,而獲得混合物。100 parts by weight of the bisphenol A type epoxy resin as the epoxy resin C1 and 5 parts by weight of 1,2-dimethylimidazole as a curing agent were blended, and stirred at 2000 rpm for 5 minutes using a planetary mixer to obtain a mixture. .

於所得混合物中添加平均粒徑為0.02μm之二氧化矽粒子7重量份及平均粒徑為3μm之導電性粒子2重量份,而獲得組合物。再者,所使用之上述導電性粒子係於二乙烯苯樹脂粒子之表面形成有鍍鎳層、且於該鍍鎳層之表面形成有鍍金層的具有金屬層之導電性粒子。To the resulting mixture, 7 parts by weight of cerium oxide particles having an average particle diameter of 0.02 μm and 2 parts by weight of conductive particles having an average particle diameter of 3 μm were added to obtain a composition. Further, the conductive particles to be used are conductive particles having a metal layer formed on the surface of the divinylbenzene resin particles and having a nickel plating layer and a gold plating layer formed on the surface of the nickel plating layer.

使用行星式攪拌機以2000rpm將所得硬化性組合物攪拌8分鐘,以尼龍製濾紙(孔徑10μm)進行過濾,而製作出向異性導電糊。The obtained curable composition was stirred at 2000 rpm for 8 minutes using a planetary mixer, and filtered through a nylon filter paper (pore size: 10 μm) to prepare an anisotropic conductive paste.

(實施例5~84及比較例2~6)(Examples 5 to 84 and Comparative Examples 2 to 6)

如下述表2~15所示般變更調配成分之種類及調配量(調配單位為重量份),除此以外,以與實施例1相同之方式獲得向異性導電糊。再者,使用乙酸乙酯之情形時,於添加上述成分A時使用乙酸乙酯以使成分A溶解。An anisotropic conductive paste was obtained in the same manner as in Example 1 except that the type and amount of the compounding component were changed as shown in the following Tables 2 to 15 (the compounding unit was a part by weight). Further, in the case of using ethyl acetate, ethyl acetate was used to dissolve the component A when the above component A was added.

(評價)(Evaluation)

準備形成有寬度0.3cm×長度1cm×深度7cm之大小的長方體狀凹部之金屬模具。將所得向異性導電糊填充至上述金屬模具之凹部中。將填充至金屬模具之凹部中之向異性導電糊於100℃下加熱10分鐘,接著於150℃下加熱30分鐘,而製作出向異性導電糊之硬化物。A metal mold having a rectangular parallelepiped recess having a width of 0.3 cm, a length of 1 cm, and a depth of 7 cm was prepared. The resulting anisotropic conductive paste was filled into the concave portion of the above metal mold. The anisotropic conductive paste filled in the concave portion of the metal mold was heated at 100 ° C for 10 minutes, and then heated at 150 ° C for 30 minutes to prepare a cured product of the anisotropic conductive paste.

使用熱機械分析裝置(TA Instruments公司製造,型號「TMA2940」)測定所得硬化物之線膨脹係數。再者,以5℃/分鐘之升溫速度加熱至210℃,並測定線膨脹係數。於上述評價中,將線膨脹係數為65ppm/℃以下之向異性導電糊評價為合格。The coefficient of linear expansion of the obtained cured product was measured using a thermomechanical analyzer (manufactured by TA Instruments, model "TMA2940"). Further, the temperature was raised to 210 ° C at a temperature elevation rate of 5 ° C /min, and the coefficient of linear expansion was measured. In the above evaluation, the anisotropic conductive paste having a linear expansion coefficient of 65 ppm/° C. or less was evaluated as acceptable.

又,使用示差掃描熱析儀(TA Instruments公司製造,型號「DSC2920」),於升溫速度為10℃/分鐘之條件下,對實施例及比較例中所得之向異性導電糊之峰值溫度及放熱量進行測定。再者,表示實施例5~84及比較例2~6之評價結果之表2~15中,峰值溫度為125℃以下時評價為「◎」,峰值溫度超過125℃且為135℃以下時評價為「○」,峰值溫度超過135℃時評價為「△」,而表示結果。Further, using a differential scanning calorimeter (manufactured by TA Instruments, model "DSC2920"), the peak temperature of the anisotropic conductive paste obtained in the examples and the comparative examples was placed at a temperature rising rate of 10 ° C /min. The heat is measured. Further, in Tables 2 to 15 showing the evaluation results of Examples 5 to 84 and Comparative Examples 2 to 6, the evaluation was "◎" when the peak temperature was 125 ° C or lower, and the evaluation was performed when the peak temperature exceeded 125 ° C and was 135 ° C or lower. When it is "○", when the peak temperature exceeds 135 °C, it is evaluated as "△", and the result is shown.

將實施例1~4及比較例1之評價結果示於下述表1。The evaluation results of Examples 1 to 4 and Comparative Example 1 are shown in Table 1 below.

可知,實施例1~4之向異性導電糊與比較例1之向異性導電糊相比,硬化物之線膨脹係數較低,故即便受到加熱亦不易自電路基板或電子零件剝離。進而,實施例2~4之向異性導電糊與實施例1及比較例1之向異性導電糊相比,峰值溫度較低且放熱量較高,故可較迅速地硬化。It is understood that the anisotropic conductive pastes of Examples 1 to 4 have a lower coefficient of linear expansion than the anisotropic conductive paste of Comparative Example 1, and therefore are not easily peeled off from the circuit board or the electronic component even if heated. Further, in the anisotropic conductive pastes of Examples 2 to 4, the peak temperature was lower and the amount of heat generation was higher than that of the anisotropic conductive pastes of Example 1 and Comparative Example 1, so that it was hardened relatively quickly.

將實施例5~84及比較例2~6之評價結果示於下述表2~15。The evaluation results of Examples 5 to 84 and Comparative Examples 2 to 6 are shown in Tables 2 to 15 below.

可知,實施例5~84之向異性導電糊之硬化物之線膨脹係數較低,故即便受到加熱亦不易自電路基板或電子零件剝離。It is understood that the cured products of the anisotropic conductive pastes of Examples 5 to 84 have a low coefficient of linear expansion, and therefore are not easily peeled off from the circuit board or the electronic parts even when heated.

1...連接構造體1. . . Connection structure

2...第1連接對象構件2. . . First connection object member

2a...上表面2a. . . Upper surface

2b...電極2b. . . electrode

3...第2連接對象構件3. . . Second connection object member

3a...下表面3a. . . lower surface

3b...電極3b. . . electrode

4...連接部4. . . Connection

5...導電性粒子5. . . Conductive particles

圖1係示意性地表示使用含有本發明之一實施形態之硬化性組合物、及導電性粒子的向異性導電材料之連接構造體的前視剖面圖。Fig. 1 is a front cross-sectional view schematically showing a connection structure using an anisotropic conductive material containing a curable composition according to an embodiment of the present invention and conductive particles.

1...連接構造體1. . . Connection structure

2...第1連接對象構件2. . . First connection object member

2a...上表面2a. . . Upper surface

2b...電極2b. . . electrode

3...第2連接對象構件3. . . Second connection object member

3a...下表面3a. . . lower surface

3b...電極3b. . . electrode

4...連接部4. . . Connection

5...導電性粒子5. . . Conductive particles

Claims (14)

一種硬化性組合物,其含有具有環氧基及噻喃基中之至少一種之成分、以及硬化劑,且上述具有環氧基及噻喃基中之至少一種之成分包含具有下述式(1)所表示之結構的化合物之單體、由至少2個該化合物鍵結而成之多聚物、或該單體與該多聚物之混合物:[化1] 上述式(1)中,R1表示氫原子、碳數為1~5之烷基或下述式(2)所表示之結構,R2表示碳數為1~5之伸烷基,R3表示碳數為1~5之伸烷基,X1表示氧原子或硫原子,X2表示氧原子或硫原子:[化2] 上述式(2)中,R4表示碳數為1~5之伸烷基,X3表示氧原子或硫原子。A curable composition containing a component having at least one of an epoxy group and a thiopyranyl group, and a curing agent, and the component having at least one of an epoxy group and a thiopyranyl group has the following formula (1) a monomer of a compound represented by the structure, a polymer obtained by bonding at least two of the compounds, or a mixture of the monomer and the polymer: [Chemical Formula 1] In the above formula (1), R1 represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or a structure represented by the following formula (2), R2 represents an alkylene group having a carbon number of 1 to 5, and R3 represents a carbon number. It is an alkylene group of 1 to 5, X1 represents an oxygen atom or a sulfur atom, and X2 represents an oxygen atom or a sulfur atom: [Chemical 2] In the above formula (2), R4 represents an alkylene group having a carbon number of 1 to 5, and X3 represents an oxygen atom or a sulfur atom. 如請求項1之硬化性組合物,其中上述具有環氧基及噻喃基中之至少一種之成分100重量%中,具有上述式(1)所表示之結構的化合物之單體、由至少2個該化合物鍵結而成之多聚物、或該單體與該多聚物之混合物之含量為5~100重量%之範圍內。The curable composition according to claim 1, wherein the monomer having a compound represented by the above formula (1) is at least 2 in 100% by weight of the component having at least one of an epoxy group and a thiopyranyl group. The polymer obtained by bonding the compound or the mixture of the monomer and the polymer is in the range of 5 to 100% by weight. 如請求項1之硬化性組合物,其中上述具有環氧基及噻喃基中之至少一種之成分進而包含具有下述式(11)所表示之結構的環氧化合物之單體、由至少2個該環氧化合物鍵結而成之多聚物、或該單體與該多聚物之混合物:[化3] 上述式(11)中,R11表示碳數為1~10之伸烷基,R12表示碳數為1~10之伸烷基,R13表示氫原子、碳數為1~10之烷基或下述式(12)所表示之結構,R14表示氫原子、碳數為1~10之烷基或下述式(13)所表示之結構:[化4] 上述式(12)中,R15表示碳數為1~10之伸烷基;[化5] 上述式(13)中,R16表示碳數為1~10之伸烷基。The hardening composition of claim 1, wherein the component having at least one of an epoxy group and a thiopyranyl group further comprises a monomer having an epoxy compound having a structure represented by the following formula (11), and is at least 2 a polymer obtained by bonding the epoxy compound or a mixture of the monomer and the polymer: [Chemical 3] In the above formula (11), R11 represents an alkylene group having a carbon number of 1 to 10, R12 represents an alkylene group having a carbon number of 1 to 10, and R13 represents a hydrogen atom, an alkyl group having a carbon number of 1 to 10 or the following In the structure represented by the formula (12), R14 represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms or a structure represented by the following formula (13): [Chemical 4] In the above formula (12), R15 represents an alkylene group having a carbon number of 1 to 10; [Chemical 5] In the above formula (13), R16 represents an alkylene group having a carbon number of 1 to 10. 如請求項3之硬化性組合物,其中上述式(11)中,R13及R14為氫原子。The sclerosing composition of claim 3, wherein, in the above formula (11), R13 and R14 are a hydrogen atom. 如請求項3之硬化性組合物,其中上述具有環氧基及噻喃基中之至少一種之成分100重量%中,具有上述式(11)所表示之結構的環氧化合物之單體、由至少2個該環氧化合物鍵結而成之多聚物、或該單體與該多聚物之混合物之含量為1~50重量%之範圍內。The sclerosing composition of claim 3, wherein the monomer having the structure represented by the above formula (11) is 100% by weight of the component having at least one of an epoxy group and a thiopyranyl group, The polymer obtained by bonding at least two of the epoxy compounds or the mixture of the monomer and the polymer is in a range of from 1 to 50% by weight. 如請求項1之硬化性組合物,其中上述具有環氧基及噻喃基中之至少一種之成分進而包含具有含氮原子的雜環之環氧化合物。The curable composition of claim 1, wherein the component having at least one of an epoxy group and a thiopyranyl group further comprises an epoxy compound having a hetero ring containing a nitrogen atom. 如請求項6之硬化性組合物,其中上述具有含氮原子的雜環之環氧化合物為下述式(16)所表示之環氧化合物、或下述式(17)所表示之環氧化合物:[化6] 上述式(16)中,R21~R23分別表示碳數為1~5之伸烷基,Z表示環氧基或羥甲基;[化7] 上述式(17)中,R24~R26分別表示碳數為1~5之伸烷基;p、q及r分別表示1~5之整數;R27~R29分別表示碳數為1~5之伸烷基。The sclerosing composition according to claim 6, wherein the epoxy compound having a hetero ring containing a nitrogen atom is an epoxy compound represented by the following formula (16) or an epoxy compound represented by the following formula (17) :[化6] In the above formula (16), R21 to R23 each represent an alkylene group having a carbon number of 1 to 5, and Z represents an epoxy group or a hydroxymethyl group; In the above formula (17), R24 to R26 each represent an alkylene group having a carbon number of 1 to 5; p, q and r each represent an integer of 1 to 5; and R27 to R29 represent an alkylene having a carbon number of 1 to 5, respectively. base. 如請求項7之硬化性組合物,其中上述具有含氮原子的雜環之環氧化合物為異氰尿酸三縮水甘油酯、或異氰尿酸三羥乙酯三縮水甘油醚。The sclerosing composition according to claim 7, wherein the epoxy compound having a hetero ring containing a nitrogen atom is triglycidyl isocyanurate or trishydroxyethyl triglycidyl triglycidyl ether. 如請求項6之硬化性組合物,其中上述具有環氧基及噻喃基中之至少一種之成分100重量%中,上述具有含氮原子的雜環之環氧化合物之含量為0.1~10重量%之範圍內。The hardening composition according to claim 6, wherein the epoxy compound having a nitrogen atom-containing heterocyclic ring is contained in an amount of 0.1 to 10% by weight based on 100% by weight of the component having at least one of an epoxy group and a thiopyranyl group. Within the range of %. 如請求項1之硬化性組合物,其中上述具有環氧基及噻喃基中之至少一種之成分進而包含具有芳香環之環氧化合物。The curable composition of claim 1, wherein the component having at least one of an epoxy group and a thiopyranyl group further comprises an epoxy compound having an aromatic ring. 如請求項10之硬化性組合物,其中上述芳香環為苯環、萘環或蒽環。The sclerosing composition of claim 10, wherein the aromatic ring is a benzene ring, a naphthalene ring or an anthracene ring. 一種向異性導電材料,其含有如請求項1之硬化性組合物、以及導電性粒子。An anisotropic conductive material comprising the curable composition of claim 1 and conductive particles. 一種連接構造體,其具備第1電性連接對象構件、第2電性連接對象構件、以及將第1與第2電性連接對象構件加以電性連接之連接部,上述連接部係由如請求項12之向異性導電材料所形成。A connection structure including a first electrical connection target member, a second electrical connection target member, and a connection portion electrically connecting the first and second electrical connection target members, wherein the connection portion is requested by Item 12 is formed by an anisotropic conductive material. 一種連接構造體,其具備第1連接對象構件、第2連接對象構件、以及將第1與第2連接對象構件加以連接之連接部,上述連接部係由如請求項1之硬化性組合物所形成。A connection structure including a first connection target member, a second connection target member, and a connection portion that connects the first and second connection target members, wherein the connection portion is made of the curable composition of claim 1 form.
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