TWI386143B - Muti-layer printed circuit board and method for making same - Google Patents
Muti-layer printed circuit board and method for making same Download PDFInfo
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- TWI386143B TWI386143B TW99109491A TW99109491A TWI386143B TW I386143 B TWI386143 B TW I386143B TW 99109491 A TW99109491 A TW 99109491A TW 99109491 A TW99109491 A TW 99109491A TW I386143 B TWI386143 B TW I386143B
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- 238000000034 method Methods 0.000 title claims description 12
- 238000013461 design Methods 0.000 claims description 29
- 238000004519 manufacturing process Methods 0.000 claims description 19
- 238000005096 rolling process Methods 0.000 claims description 17
- 238000003825 pressing Methods 0.000 claims description 9
- 239000003292 glue Substances 0.000 claims description 6
- 239000010410 layer Substances 0.000 description 135
- 238000007906 compression Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 230000006835 compression Effects 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000032798 delamination Effects 0.000 description 3
- 238000007731 hot pressing Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
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Description
本發明涉及電路板技術,特別涉及一種具有特定膠層結構之多層電路板及其製作方法。The present invention relates to circuit board technology, and in particular to a multilayer circuit board having a specific adhesive layer structure and a method of fabricating the same.
隨著電子產業之飛速發展,作為電子產品基本構件之電路板之製作技術顯得愈來愈重要。電路板一般由覆銅基板經裁切、鑽孔、蝕刻、曝光、顯影、壓合、成型等一系列製程製作而成。具體可參閱C.H. Steer等人在Proceedings of the IEEE, Vol.39, No.2 (2002年8月)中發表之“Dielectric characterization of printed circuit board substrates”一文。With the rapid development of the electronics industry, the production technology of circuit boards, which are the basic components of electronic products, is becoming more and more important. The circuit board is generally fabricated by a series of processes such as cutting, drilling, etching, exposing, developing, pressing, and molding a copper-clad substrate. For details, see "Dielectric characterization of printed circuit board substrates" by C. H. Steer et al., Proceedings of the IEEE, Vol. 39, No. 2 (August 2002).
一般地,多層電路板可由內層板與外層板熱壓合形成。內層板與外層板之間設置膠片,熱壓合後內層板與外層板之間藉由膠片緊密黏著固定,從而形成多層電路板。通常,膠片上預先開設有開口區域,該開口區域主要用於使得多層電路板在特定區域具有合適之撓折性,從而使得該多層電路板可彎折並應用到具體之電子裝置中。然而,在外層板與內層板熱壓合過程中,膠片由於受熱會軟化呈熔融狀態,在熱壓合至開口區域時,由於膠片在該開口區域相對兩邊緣處之落差較大(例如該膠片之厚度為25μm時,該開口區域邊緣處之落差為25μm),從而該膠片與外層板或內層板之間夾雜之氣體停留在該開口區域相對兩邊緣處而無法及時散逸出去,該氣體在熱壓合後形成氣泡。多層電路板在後續加工中,該氣泡受熱膨脹而形成隆起區域,其不僅影響多層電路板之外觀品質,而且使得多層電路板在後續加工或使用過程中容易造成脫層而使電路板失效。並且,在該多層電路板後續壓合乾膜之過程中,外層板之銅層可能會在膠片開口區域處由於高度差而斷開,造成線路斷裂,影響多層電路板之導通品質。Generally, a multilayer circuit board can be formed by thermal compression bonding of an inner layer board and an outer layer board. A film is disposed between the inner layer and the outer layer, and after the thermocompression, the inner layer and the outer layer are closely adhered by the film to form a multilayer circuit board. Generally, an open area is preliminarily formed on the film, and the open area is mainly used to make the multilayer circuit board have appropriate flexibility in a specific area, so that the multilayer circuit board can be bent and applied to a specific electronic device. However, during the thermal compression bonding of the outer layer and the inner layer, the film is softened and melted due to heat, and when the film is thermally pressed to the open area, the film has a large difference at the opposite edges of the opening region (for example, When the thickness of the film is 25 μm, the difference at the edge of the opening region is 25 μm), so that the gas interposed between the film and the outer layer or the inner layer plate stays at the opposite edges of the opening region and cannot be dissipated in time. Air bubbles are formed after hot pressing. In the subsequent processing of the multilayer circuit board, the air bubbles are thermally expanded to form a raised region, which not only affects the appearance quality of the multilayer circuit board, but also causes the multilayer circuit board to easily cause delamination during subsequent processing or use to cause the circuit board to fail. Moreover, in the process of subsequently pressing the dry film on the multilayer circuit board, the copper layer of the outer layer may be broken at the opening area of the film due to the height difference, causing the line to break and affecting the conduction quality of the multilayer circuit board.
有鑑於此,針對上述問題,提供一種具有可較有效地避免多層電路板內形成氣泡,並防止線路斷裂之多層電路板及其製作方法實屬必要。In view of the above, in view of the above problems, it is necessary to provide a multilayer circuit board which can more effectively prevent bubble formation in a multilayer circuit board and prevent breakage of a line, and a manufacturing method thereof.
下面將以具體實施例說明一種多層電路板及其製作方法。A multilayer circuit board and a method of fabricating the same will be described below with reference to specific embodiments.
一種多層電路板製作方法,其包括以下步驟:提供內層板與外層板,該內層板包括第一絕緣層以及設置在該第一絕緣層至少一個表面之第一導電層,該外層板包括第二絕緣層以及設置在該第二絕緣層至少一個表面之第二導電層;提供膠片,該膠片上預先開設有開口區域,該開口區域定義有平行相對之兩條設計基準線,該膠片上與每一設計基準線鄰接之開口邊緣區域形成有向該開口區域內凸起之多個均勻且連續排佈之鋸齒形結構或多個均勻且連續排佈之波浪形結構;將該膠片放置在該內層板與該外層板之間,並利用第一滾壓裝置沿垂直於設計基準線之方向滾動熱壓合該內層板與該外層板;及提供乾膜,將乾膜放置在該外層板之外側,利用第二滾壓裝置熱壓合該乾膜至該外層板。A method of fabricating a multilayer circuit board, comprising the steps of: providing an inner layer board and an outer layer board, the inner layer board comprising a first insulating layer and a first conductive layer disposed on at least one surface of the first insulating layer, the outer layer board comprising a second insulating layer and a second conductive layer disposed on at least one surface of the second insulating layer; a film is provided, the film is pre-opened with an opening area defined by two opposite design reference lines on the film An opening edge region adjacent to each of the design reference lines is formed with a plurality of uniform and continuously arranged zigzag structures or a plurality of evenly and continuously arranged wave-shaped structures projecting into the opening region; placing the film in the film Between the inner layer board and the outer layer board, and rolling and thermally pressing the inner layer board and the outer layer board in a direction perpendicular to the design reference line by using a first rolling device; and providing a dry film, the dry film is placed thereon On the outer side of the outer layer, the dry film is thermocompression bonded to the outer layer by a second rolling device.
一種多層電路板,包括內層板、外層板、膠片與乾膜,該膠片貼合在該內層板與該外層板之間,該膠片開設有開口區域,該開口區域與該膠片鄰接之開口邊緣區域具有由該膠片形成之緩衝部,該乾膜貼合在該外層板。A multi-layer circuit board comprising an inner layer board, an outer layer board, a film and a dry film, the film being bonded between the inner layer board and the outer layer board, the film opening an opening area, the opening area adjacent to the opening of the film The edge region has a buffer portion formed of the film, and the dry film is attached to the outer layer.
相較於先前技術,本技術方案之多層電路板及其製作方法,在膠片上開設開口區域,並在該開口區域與該膠片鄰接之開口邊緣區域在熱壓合方向上設置鋸齒形結構或波浪形結構,使得內層板與外層板熱壓合後該膠片之鋸齒形結構或波浪形結構在該開口區域形成緩衝部,從而可有效驅趕停留在該開口邊緣區域內之氣體,避免該開口邊緣區域處形成氣泡隆起區域,改善多層電路板之外觀品質,並有效防止多層電路板在後續加工或使用過程中脫層而失效。並且,由於外層板與內層板在該開口邊緣區域處之高度差被緩衝部有效減小,從而在該多層電路板後續壓合乾膜之過程中,外層板之銅層不會在膠片開口區域處由於高度差而斷開,造成線路斷裂,進而提高多層電路板之導通品質。Compared with the prior art, the multi-layer circuit board of the present technical solution and the manufacturing method thereof have an open area on the film, and a zigzag structure or a wave is arranged in the hot pressing direction in the opening edge area adjacent to the film in the opening area. The zigzag structure or the wavy structure of the film forms a buffer portion in the open area, so that the gas staying in the edge region of the opening can be effectively driven to avoid the edge of the opening. The bubble ridge area is formed at the area to improve the appearance quality of the multilayer circuit board, and effectively prevent the delamination of the multilayer circuit board from being lost during subsequent processing or use. Moreover, since the difference in height between the outer layer and the inner layer at the edge region of the opening is effectively reduced by the buffer portion, the copper layer of the outer layer is not in the film opening during the subsequent pressing of the multilayer circuit board into the dry film. The area is disconnected due to the height difference, causing the line to break, thereby improving the conduction quality of the multilayer circuit board.
下面將結合附圖與實施例對本技術方案之多層電路板及其製作方法作進一步詳細說明。The multi-layer circuit board of the present technical solution and the manufacturing method thereof will be further described in detail below with reference to the accompanying drawings and embodiments.
請參閱圖1,本技術方案實施例提供一種多層電路板製作方法,其包括以下步驟:Referring to FIG. 1 , an embodiment of the present technical solution provides a method for fabricating a multi-layer circuit board, which includes the following steps:
步驟110,提供內層板與外層板,該內層板包括第一絕緣層以及設置在該第一絕緣層至少一個表面之第一導電層,該外層板包括第二絕緣層以及設置在該第二絕緣層至少一個表面之第二導電層。Step 110, providing an inner layer and an outer layer, the inner layer comprising a first insulating layer and a first conductive layer disposed on at least one surface of the first insulating layer, the outer layer including a second insulating layer and disposed on the first a second conductive layer of at least one surface of the second insulating layer.
請參閱圖2,本實施例提供之內層板10包括第一絕緣層11與第一導電層12。該第一絕緣層11具有相對之第一表面111與第二表面112。該第一表面111與第二表面112平行。該第一表面111與第二表面112上各設置一第一導電層12,即該內層板10為一雙面電路板。當然,該內層板10亦可為僅具有一層第一導電層12之單面板。另外,還可在第一導電層12之外側設置覆蓋層(圖未示),該覆蓋層可用於保護第一導電層12。然而,該覆蓋層亦可根據不同電路板之實際要求省去。Referring to FIG. 2 , the inner layer 10 provided in this embodiment includes a first insulating layer 11 and a first conductive layer 12 . The first insulating layer 11 has a first surface 111 and a second surface 112 opposite to each other. The first surface 111 is parallel to the second surface 112. A first conductive layer 12 is disposed on each of the first surface 111 and the second surface 112, that is, the inner layer 10 is a double-sided circuit board. Of course, the inner layer 10 can also be a single panel having only one layer of the first conductive layer 12. In addition, a cover layer (not shown) may be disposed on the outer side of the first conductive layer 12, and the cover layer may be used to protect the first conductive layer 12. However, the overlay can also be omitted according to the actual requirements of different boards.
該外層板20包括第二絕緣層21與第二導電層22。該第二絕緣層21具有相對之第三表面211與第四表面212。該第三表面211與第四表面212平行。本實施例中,該第二導電層22設置在該第四表面212。當然,該外層板20亦可在第三表面211上設置第二導電層22,從而構成一雙面電路板。The outer layer 20 includes a second insulating layer 21 and a second conductive layer 22. The second insulating layer 21 has opposite third and second surfaces 211, 212. The third surface 211 is parallel to the fourth surface 212. In this embodiment, the second conductive layer 22 is disposed on the fourth surface 212. Of course, the outer layer 20 can also be provided with a second conductive layer 22 on the third surface 211 to form a double-sided circuit board.
步驟120,提供膠片,該膠片上預先開設有開口區域,該開口區域定義有平行相對之兩條設計基準線,該膠片上與每一設計基準線鄰接之開口邊緣區域形成有向該開口區域內凸起之多個均勻且連續排佈之鋸齒形結構或多個均勻且連續排佈之波浪形結構。Step 120, providing a film, the film is pre-opened with an opening area defined by two opposite design reference lines, and an opening edge area adjacent to each design reference line on the film is formed in the opening area A plurality of uniformly and continuously arranged zigzag structures or a plurality of evenly and continuously arranged wave structures.
請參閱圖3,該膠片30上預先開設有開口區域32。該開口區域32定義有平行相對之兩條設計基準線L0 ,該兩條設計基準線L0 為根據客戶設計要求預先設定之開口區域32之原始邊界。該兩條設計基準線L0 均垂直於該膠片之熱壓合方向P。Referring to FIG. 3, the film 30 is pre-opened with an opening area 32. The open area 32 defines two design reference lines L 0 that are parallel to each other, the two design reference lines L 0 being the original boundaries of the open areas 32 that are predetermined according to customer design requirements. The two design reference lines L 0 are both perpendicular to the thermal pressing direction P of the film.
該膠片30上與每一設計基準線L0 鄰接之開口邊緣區域305形成有多個鋸齒形結構34。每一鋸齒形結構34具有相對之第一端341與第二端342。該第一端341與膠片30之主體302相連。該第二端342延伸至該開口區域32。定義該多個鋸齒形結構34之第一端341之連線為第一基準線L1 ,定義該多個鋸齒形結構34之第二端342之連線為第二基準線L2 。該第一基準線L1 到該設計基準線L0 之距離D1 等於該第二基準線L2 到該設計基準線L0 之距離D2 。優選地,該第一基準線L1 到該設計基準線L0 之距離D1 、以及該第二基準線L2 到該設計基準線L0 之距離D2 之取值範圍均在0.5mm至2mm之間。該多個鋸齒形結構34所在區域共同形成有膠區343,每相鄰兩個鋸齒形結構34之間之所有區域共同形成無膠區344。該有膠區343與無膠區344共同形成開口邊緣區域305。本實施例中,該有膠區343與無膠區344之面積相等。每一鋸齒形結構34具有相連接之第一邊345與第二邊346。該第一邊345與第二邊346之長度相等。優選地,該第一邊345與第二邊346之夾角為60°。本實施例中僅示出膠片30具有一個開口區域32之情形,此外,在其他實施方式中膠片30可具有多個開口區域32,該多個開口區域32可在膠片30上排成一列或者呈矩陣排佈。The film 30 and the design of each reference line L 0 adjacent to the edge region of the opening 305 is formed with a plurality of zigzag structures 34. Each zigzag structure 34 has a first end 341 and a second end 342 opposite thereto. The first end 341 is coupled to the body 302 of the film 30. The second end 342 extends to the open area 32. A line defining a first end 341 of the plurality of zigzag structures 34 is a first reference line L 1 , and a line defining a second end 342 of the plurality of zigzag structures 34 is a second reference line L 2 . The first reference line L 1 L 0 of the distance to the reference line designed D 1 equal to the second reference line L 0 L 2 of a distance to the reference line designed D 2. Preferably, the first reference line L 1 to L 0 distance D of the baseline design 1, and the second reference line L 0 L 2 of a distance to the reference line D design values are in the range of 2 to 0.5mm Between 2mm. The regions of the plurality of zigzag structures 34 are collectively formed with a glue region 343, and all regions between each adjacent two zigzag structures 34 together form a glueless region 344. The glued zone 343 and the glueless zone 344 together form an open edge region 305. In this embodiment, the rubberized area 343 is equal to the area of the glueless area 344. Each zigzag structure 34 has a first side 345 and a second side 346 that are joined. The first side 345 is equal in length to the second side 346. Preferably, the angle between the first side 345 and the second side 346 is 60°. In the present embodiment, only the film 30 has an open area 32. Further, in other embodiments, the film 30 may have a plurality of open areas 32 which may be arranged in a line on the film 30 or Matrix arrangement.
請參閱圖4,本技術方案之另一種膠片40上預先設置有開口區域42。該開口區域42定義有平行相對之兩條設計基準線L10 ,該兩條設計基準線L10 為根據客戶設計要求預先設定之開口區域42之原始邊界。該兩條設計基準線L10 均垂直於該膠片之熱壓合方向P。該膠片40上與每一設計基準線L10 鄰接之開口邊緣區域405形成有多個波浪形結構44。每一波浪形結構44具有相對之第一端441與第二端442。該第一端441與膠片40之主體402相連。該第二端442延伸至該開口區域42。定義該多個波浪形結構44之第一端441之連線為第一基準線L11 ,定義該多個波浪形結構44之第二端442之連線為第二基準線L12 。該第一基準線L11 到該設計基準線L10 之距離D11 等於該第二基準線L12 到該設計基準線L10 之距離D12 。優選地,該第一基準線L11 到該設計基準線L10 之距離D11 、以及該第二基準線L12 到該設計基準線L10 之距離D12 之取值範圍均在0.5mm至2mm之間。該多個波浪形結構44所在區域共同形成有膠區443,每相鄰兩個波浪形結構44之間之所有區域共同形成無膠區444。該有膠區443與無膠區444共同形成開口邊緣區域405。本實施例中,該有膠區443與無膠區444之面積相等。本實施例中僅示出膠片40具有一個開口區域42之情形,此外,在其他實施方式中膠片40可具有多個開口區域42,該多個開口區域42可在膠片40上排成一列或者呈矩陣排佈。Referring to FIG. 4, another film 40 of the present technical solution is provided with an opening area 42 in advance. The open area 42 defines two design reference lines L 10 that are parallel to each other, the two design reference lines L 10 being the original boundaries of the open area 42 that is predetermined according to customer design requirements. The two design reference lines L 10 are both perpendicular to the thermal pressing direction P of the film. Design of the reference line to each edge region of the opening with a plurality of wave-shaped structure 44 405 40 10 on the film adjacent to the L. Each undulating structure 44 has a first end 441 and a second end 442 opposite. The first end 441 is coupled to the body 402 of the film 40. The second end 442 extends to the open area 42. A line defining a first end 441 of the plurality of undulating structures 44 is a first reference line L 11 , and a line defining a second end 442 of the plurality of undulating structures 44 is a second reference line L 12 . The first reference line L 11 designed to distance from the reference line L 10 D 11 is equal to the reference line L 12 is the second design to the reference line L a distance of 10 D 12. Preferably, the first reference line L 11 from the design to the reference line L 10. 11 D, L and the second reference line 12 to reference line L from the design of the D 10 values are in the range of 12 to 0.5mm Between 2mm. The regions of the plurality of undulating structures 44 are collectively formed with a glue zone 443, and all regions between each adjacent two undulating structures 44 together form a glueless zone 444. The glued zone 443 and the glueless zone 444 together form an open edge region 405. In this embodiment, the glued area 443 is equal to the area of the glueless area 444. In the present embodiment, only the film 40 has an open area 42. Further, in other embodiments, the film 40 may have a plurality of open areas 42, which may be arranged in a line or on the film 40. Matrix arrangement.
本實施例中,該膠片30或40為半固化片,其受熱後軟化呈熔融狀態。In this embodiment, the film 30 or 40 is a prepreg which is softened and melted after being heated.
步驟130,將該膠片放置在該內層板與該外層板之間,並利用第一滾壓裝置沿垂直於設計基準線之方向滾動熱壓合該內層板與該外層板。Step 130, placing the film between the inner layer and the outer layer, and rolling and thermally pressing the inner layer and the outer layer in a direction perpendicular to the design reference line by using a first rolling device.
請參閱圖5,將膠片30或40放置在該內層板10與該外層板20之間,並利用第一滾壓裝置200熱壓合該內層板10與該外層板20。本實施例中以使用膠片30為例進行具體說明。膠片30在熱壓合時受熱軟化呈熔融狀態,黏合內層板10之第一導電層12與外層板20之第二絕緣層21。當第一滾壓裝置200滾壓至該膠片30之開口區域32時,該多個鋸齒形結構34中之膠受熱融化並填充在與對應之設計基準線L0 鄰接之開口邊緣區域305。Referring to FIG. 5, a film 30 or 40 is placed between the inner layer 10 and the outer layer 20, and the inner layer 10 and the outer layer 20 are thermally pressed by the first rolling device 200. In the present embodiment, the film 30 is taken as an example for specific description. The film 30 is softened and softened by thermal compression, and the first conductive layer 12 of the inner layer 10 and the second insulating layer 21 of the outer layer 20 are bonded. When the first roll 200 rolling means to the film when opening the region 3230, the plurality of zigzag structure 34 is heated to melt and glue filled in the openings corresponding to the design 0 reference line L of the edge adjacent to area 305.
熱壓合後,該膠片30之鋸齒形結構34在該開口邊緣區域305上形成緩衝部36。該緩衝部36為斜坡狀,該緩衝部36具有一個連接該內層板10與外層板20之楔形部362。本實施例中,該楔形部362連接該第一導電層12與第二絕緣層21。After the thermocompression bonding, the zigzag structure 34 of the film 30 forms a buffer portion 36 on the opening edge region 305. The buffer portion 36 has a slope shape, and the buffer portion 36 has a wedge portion 362 that connects the inner layer plate 10 and the outer layer plate 20. In this embodiment, the wedge portion 362 connects the first conductive layer 12 and the second insulating layer 21.
請參閱圖6,本實施例中,該緩衝部36具有與該內層板10相貼合之緩衝邊界364,該緩衝邊界364呈微波浪形。Referring to FIG. 6 , in the embodiment, the buffer portion 36 has a buffer boundary 364 that is in contact with the inner layer plate 10 , and the buffer boundary 364 has a micro wave shape.
此外,膠片40之波浪形結構44亦可在對應之開口邊緣區域405上形成相應之緩衝部。其緩衝部與內層板10相貼合之緩衝邊界亦呈微波浪形。In addition, the wavy structure 44 of the film 40 can also form a corresponding buffer on the corresponding open edge region 405. The buffer boundary of the buffer portion and the inner layer plate 10 is also slightly wave-shaped.
步驟140,提供乾膜,將乾膜放置在該外層板之外側,利用第二滾壓裝置熱壓合該乾膜至該外層板。In step 140, a dry film is provided, and a dry film is placed on the outer side of the outer layer, and the dry film is thermally pressed to the outer layer by a second rolling device.
請參閱圖7,將乾膜50放置在該外層板20之外側,利用第二滾壓裝置300熱壓合該乾膜50至該外層板20。由於該膠片30之緩衝部36可在熱壓合過程中緩衝外層板20在開口邊緣區域305對應位置之彎曲程度,從而可避免外層板20彎曲過度而造成第二導電層22由於高度差過大而斷開,造成線路斷裂。Referring to FIG. 7, the dry film 50 is placed on the outer side of the outer layer 20, and the dry film 50 is thermally pressed to the outer layer 20 by a second rolling device 300. Since the buffer portion 36 of the film 30 can buffer the degree of bending of the outer layer plate 20 at the corresponding position of the opening edge region 305 during the thermal compression process, the outer layer plate 20 can be prevented from being excessively bent to cause the second conductive layer 22 to be excessively large due to the height difference. Disconnected, causing the line to break.
請參閱圖8-9,本技術方案還提供一種利用上述製作方法製作形成之多層電路板100。該多層電路板100包括內層板10、外層板20、膠片30與乾膜50。該膠片30貼合在該內層板10與該外層板20之間。該膠片30開設有開口區域32,該開口區域32與該膠片30鄰接之開口邊緣區域305具有由該膠片30形成之緩衝部36。該乾膜50貼合在該外層板20。Referring to FIG. 8-9, the technical solution further provides a multilayer circuit board 100 formed by the above manufacturing method. The multilayer circuit board 100 includes an inner layer 10, an outer layer 20, a film 30, and a dry film 50. The film 30 is bonded between the inner layer 10 and the outer layer 20. The film 30 is provided with an open area 32 having an opening portion 305 adjacent to the film 30 having a buffer portion 36 formed by the film 30. The dry film 50 is attached to the outer layer 20.
具體地,該內層板10包括第一絕緣層11以及設置在該第一絕緣層11相對兩表面之第一導電層12。該外層板20包括第二絕緣層21以及設置在該第二絕緣層21至少一個表面之第二導電層22。該緩衝部36為斜坡狀。該緩衝部36具有一個連接該內層板10與外層板20之楔形部362。該緩衝部36與內層板10相貼合之緩衝邊界364呈微波浪形。本實施例中,該楔形部362連接該第一導電層12與第二絕緣層21。Specifically, the inner layer 10 includes a first insulating layer 11 and a first conductive layer 12 disposed on opposite surfaces of the first insulating layer 11. The outer layer 20 includes a second insulating layer 21 and a second conductive layer 22 disposed on at least one surface of the second insulating layer 21. The buffer portion 36 has a slope shape. The buffer portion 36 has a wedge portion 362 that connects the inner layer plate 10 and the outer layer plate 20. The buffer boundary 364 of the buffer portion 36 that is in contact with the inner layer plate 10 has a micro wave shape. In this embodiment, the wedge portion 362 connects the first conductive layer 12 and the second insulating layer 21.
此外,該內層板10還可以包括設置在第一導電層12之外側之覆蓋層(圖未示)。此時,該緩衝部36之楔形部362連接該覆蓋層與第二絕緣層21。In addition, the inner layer panel 10 may further include a cover layer (not shown) disposed on the outer side of the first conductive layer 12. At this time, the wedge portion 362 of the buffer portion 36 connects the cover layer and the second insulating layer 21.
當多層電路板100具有多個內層板10時,其可利用本實施例提供之多層板製作方法先將該多個內層板10用膠片30或40熱壓合,然後再利用膠片30或40將外層板20熱壓合到該多個內層板10之相對兩側,從而獲得具有更多層導電層結構之多層電路板100。When the multi-layer circuit board 100 has a plurality of inner-layer boards 10, the multi-layer board manufacturing method provided by the embodiment can be used to first heat-press the plurality of inner layer boards 10 with film 30 or 40, and then use the film 30 or The outer layer 20 is thermocompression bonded to the opposite sides of the plurality of inner layer sheets 10 to obtain a multilayer circuit board 100 having a more conductive layer structure.
相較於先前技術,本技術方案之多層電路板及其製作方法,在膠片上開設開口區域,並在該開口區域與該膠片鄰接之開口邊緣區域在熱壓合方向上設置鋸齒形結構或波浪形結構,使得內層板與外層板熱壓合後該膠片之鋸齒形結構或波浪形結構在該開口區域形成緩衝部,從而可有效驅趕停留在該開口邊緣區域內之氣體,避免該開口邊緣區域處形成氣泡隆起區域,改善多層電路板之外觀品質,並有效防止多層電路板在後續加工或使用過程中脫層而失效。並且,由於外層板與內層板在該開口邊緣區域處之高度差被緩衝部有效減小,從而在該多層電路板後續壓合乾膜之過程中,外層板之銅層不會在膠片開口區域處由於高度差而斷開,造成線路斷裂,進而提高多層電路板之導通品質。Compared with the prior art, the multi-layer circuit board of the present technical solution and the manufacturing method thereof have an open area on the film, and a zigzag structure or a wave is arranged in the hot pressing direction in the opening edge area adjacent to the film in the opening area. The zigzag structure or the wavy structure of the film forms a buffer portion in the open area, so that the gas staying in the edge region of the opening can be effectively driven to avoid the edge of the opening. The bubble ridge area is formed at the area to improve the appearance quality of the multilayer circuit board, and effectively prevent the delamination of the multilayer circuit board from being lost during subsequent processing or use. Moreover, since the difference in height between the outer layer and the inner layer at the edge region of the opening is effectively reduced by the buffer portion, the copper layer of the outer layer is not in the film opening during the subsequent pressing of the multilayer circuit board into the dry film. The area is disconnected due to the height difference, causing the line to break, thereby improving the conduction quality of the multilayer circuit board.
綜上所述,本發明確已符合發明專利之要件,遂依法提出專利申請。先前技術,以上所述者僅為本發明之較佳實施方式,自不能以此限制本案之申請專利範圍。舉凡熟悉本案技藝之人士援依本發明之精神所作之等效修飾或變化,皆應涵蓋於以下申請專利範圍內。In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. In the prior art, the above description is only a preferred embodiment of the present invention, and the scope of the patent application of the present invention cannot be limited thereby. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.
100‧‧‧多層電路板100‧‧‧Multilayer circuit board
10‧‧‧內層板10‧‧‧ Inner board
11‧‧‧第一絕緣層11‧‧‧First insulation
12‧‧‧第一導電層12‧‧‧First conductive layer
111‧‧‧第一表面111‧‧‧ first surface
112‧‧‧第二表面112‧‧‧ second surface
20‧‧‧外層板20‧‧‧ outer board
21‧‧‧第二絕緣層21‧‧‧Second insulation
22‧‧‧第二導電層22‧‧‧Second conductive layer
211‧‧‧第三表面211‧‧‧ third surface
212‧‧‧第四表面212‧‧‧ fourth surface
30、40‧‧‧膠片30, 40‧‧‧ film
302、402‧‧‧主體302, 402‧‧‧ subjects
32、42‧‧‧開口區域32, 42‧‧‧Open area
34‧‧‧鋸齒形結構34‧‧‧Sawtooth structure
341、441‧‧‧第一端341, 441‧‧‧ first end
342、442‧‧‧第二端342, 442‧‧‧ second end
343、443‧‧‧有膠區343, 443‧‧‧ with glue zone
344、444‧‧‧無膠區344, 444‧‧‧No glue zone
345‧‧‧第一邊345‧‧‧ first side
346‧‧‧第二邊346‧‧‧ second side
305、405‧‧‧開口邊緣區域305, 405 ‧ ‧ open edge area
36‧‧‧緩衝部36‧‧‧ buffer
362‧‧‧楔形部362‧‧‧Wedge
364‧‧‧緩衝邊界364‧‧‧buffer boundary
44‧‧‧波浪形結構44‧‧‧Wave structure
200‧‧‧第一滾壓裝置200‧‧‧First rolling device
300‧‧‧第二滾壓裝置300‧‧‧Second rolling device
圖1係本技術方案實施例提供之多層電路板製作方法流程圖。FIG. 1 is a flow chart of a method for fabricating a multilayer circuit board according to an embodiment of the present technical solution.
圖2係圖1之方法採用之內層板與外層板之結構示意圖。Figure 2 is a schematic view showing the structure of the inner layer and the outer layer used in the method of Figure 1.
圖3係圖1之方法採用之膠片之第一種結構示意圖。Figure 3 is a schematic view showing the first structure of the film used in the method of Figure 1.
圖4係圖1之方法採用之膠片之第二種結構示意圖。Figure 4 is a schematic view showing the second structure of the film used in the method of Figure 1.
圖5係圖1之方法利用第一滾壓裝置將內層板與外層板通過膠片進行熱壓合之示意圖。Figure 5 is a schematic view showing the method of Figure 1 using a first rolling device to thermally press the inner and outer sheets through a film.
圖6係圖5沿I-I方向之俯視圖。Figure 6 is a plan view of Figure 5 taken along the I-I direction.
圖7係圖1之方法利用第二滾壓裝置將乾膜熱壓合至外層板之示意圖。Figure 7 is a schematic view of the method of Figure 1 using a second rolling device to thermocompress a dry film to an outer sheet.
圖8係採用圖1之多層電路板製作方法製作形成之多層電路板之結構示意圖。FIG. 8 is a schematic structural view of a multilayer circuit board formed by using the multilayer circuit board manufacturing method of FIG. 1.
圖9係圖8沿II-II方向之俯視圖。Figure 9 is a plan view of Figure 8 taken along the line II-II.
Claims (13)
提供內層板與外層板,該內層板包括第一絕緣層以及設置在該第一絕緣層至少一個表面之第一導電層,該外層板包括第二絕緣層以及設置在該第二絕緣層至少一個表面之第二導電層;
提供膠片,該膠片上預先開設有開口區域,該開口區域定義有平行相對之兩條設計基準線,該膠片上與每一設計基準線鄰接之開口邊緣區域形成有向該開口區域內凸起之多個均勻且連續排佈之鋸齒形結構或多個均勻且連續排佈之波浪形結構;
將該膠片放置在該內層板與該外層板之間,並利用第一滾壓裝置沿垂直於設計基準線之方向滾動熱壓合該內層板與該外層板;及
提供乾膜,將乾膜放置在該外層板之外側,利用第二滾壓裝置熱壓合該乾膜至該外層板。A method for fabricating a multilayer circuit board, comprising the steps of:
Providing an inner layer board and an outer layer board, the inner layer board including a first insulating layer and a first conductive layer disposed on at least one surface of the first insulating layer, the outer layer board including a second insulating layer and disposed on the second insulating layer a second conductive layer on at least one surface;
Providing a film, the film is pre-opened with an opening area defined by two opposite design reference lines, and an opening edge area adjacent to each design reference line on the film is formed with a convex surface toward the opening area a plurality of evenly and continuously arranged zigzag structures or a plurality of uniformly and continuously arranged wave-shaped structures;
Placing the film between the inner layer board and the outer layer board, and rolling and thermally pressing the inner layer board and the outer layer board in a direction perpendicular to the design reference line by using a first rolling device; and providing a dry film, A dry film is placed on the outer side of the outer layer, and the dry film is heat-compressed to the outer layer by a second rolling device.
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