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TWI372671B - Laser processing device - Google Patents

Laser processing device

Info

Publication number
TWI372671B
TWI372671B TW098105170A TW98105170A TWI372671B TW I372671 B TWI372671 B TW I372671B TW 098105170 A TW098105170 A TW 098105170A TW 98105170 A TW98105170 A TW 98105170A TW I372671 B TWI372671 B TW I372671B
Authority
TW
Taiwan
Prior art keywords
processing device
laser processing
laser
processing
Prior art date
Application number
TW098105170A
Other languages
Chinese (zh)
Other versions
TW200940229A (en
Inventor
Seung-Hwan Eom
Hyun-Jung Kim
Woon-Ki Cho
Kwang-Jae Lee
Original Assignee
Kornic Systems Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kornic Systems Corp filed Critical Kornic Systems Corp
Publication of TW200940229A publication Critical patent/TW200940229A/en
Application granted granted Critical
Publication of TWI372671B publication Critical patent/TWI372671B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/14Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
    • B23K26/1462Nozzles; Features related to nozzles
    • B23K26/1464Supply to, or discharge from, nozzles of media, e.g. gas, powder, wire
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0042Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by laser
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/40Removing material taking account of the properties of the material involved
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3065Plasma etching; Reactive-ion etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00Materials to be soldered, welded or cut
    • B23K2103/16Composite materials, e.g. fibre reinforced
    • B23K2103/166Multilayered materials
    • B23K2103/172Multilayered materials wherein at least one of the layers is non-metallic

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Lasers (AREA)
TW098105170A 2008-02-18 2009-02-18 Laser processing device TWI372671B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020080014564A KR100953686B1 (en) 2008-02-18 2008-02-18 Laser processing equipment

Publications (2)

Publication Number Publication Date
TW200940229A TW200940229A (en) 2009-10-01
TWI372671B true TWI372671B (en) 2012-09-21

Family

ID=40986034

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098105170A TWI372671B (en) 2008-02-18 2009-02-18 Laser processing device

Country Status (5)

Country Link
JP (1) JP5220133B2 (en)
KR (1) KR100953686B1 (en)
CN (1) CN102007568B (en)
TW (1) TWI372671B (en)
WO (1) WO2009104886A2 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012178534A (en) * 2011-02-02 2012-09-13 Gigaphoton Inc Optical system and extreme ultraviolet light generation system using the same
JP5788716B2 (en) * 2011-06-02 2015-10-07 株式会社ディスコ Dust discharge device
WO2014062034A1 (en) * 2012-10-18 2014-04-24 디앤에이 주식회사 Laser lift-off apparatus
JP6004933B2 (en) * 2012-12-21 2016-10-12 株式会社ディスコ Laser processing equipment
JP6008210B2 (en) * 2014-04-08 2016-10-19 ウシオ電機株式会社 Laser lift-off device
US11311967B2 (en) 2014-08-19 2022-04-26 Lumileds Llc Sapphire collector for reducing mechanical damage during die level laser lift-off
KR102572643B1 (en) * 2015-05-13 2023-08-31 루미리즈 홀딩 비.브이. Sapphire collector to reduce mechanical damage during die-level laser lift-off
JP6999264B2 (en) 2016-08-04 2022-01-18 株式会社日本製鋼所 Laser peeling device, laser peeling method, and manufacturing method of organic EL display
KR102092712B1 (en) 2017-02-24 2020-03-24 에이피시스템 주식회사 Laser processing apparatus and method
ES2636715B2 (en) * 2017-06-07 2018-02-12 Sitexco Girona, S.L. Anilox laser roller cleaning machine and procedure for self-adjusting the laser focal point to the diameter of the anilox roller.
KR102550390B1 (en) * 2017-09-12 2023-07-03 에베 그룹 에. 탈너 게엠베하 Device and method for separating a temporarily bonded substrate stack
KR102379215B1 (en) 2017-10-31 2022-03-28 삼성디스플레이 주식회사 Laser apparatus
JP7069441B1 (en) * 2021-08-31 2022-05-17 信越エンジニアリング株式会社 Work separation device and work separation method

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3268052B2 (en) * 1993-03-24 2002-03-25 株式会社東芝 Underwater laser processing equipment
JPH09174262A (en) * 1995-12-27 1997-07-08 Hitachi Ltd Laser marker
JPH1099978A (en) * 1996-09-27 1998-04-21 Hitachi Ltd Laser processing equipment
JP2001150176A (en) * 1999-11-22 2001-06-05 Matsushita Electronics Industry Corp Dust collector for laser beam marking
KR20050078411A (en) * 2004-01-29 2005-08-05 삼성에스디아이 주식회사 Laser monitoring system in laser pattering system
JP4555743B2 (en) * 2005-07-21 2010-10-06 本田技研工業株式会社 Laser processing head

Also Published As

Publication number Publication date
KR100953686B1 (en) 2010-04-19
WO2009104886A3 (en) 2009-10-22
KR20090089161A (en) 2009-08-21
WO2009104886A2 (en) 2009-08-27
TW200940229A (en) 2009-10-01
CN102007568A (en) 2011-04-06
CN102007568B (en) 2013-07-10
JP5220133B2 (en) 2013-06-26
JP2011512256A (en) 2011-04-21

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees