TWI367240B - Durable hard coating containing silicon nitride - Google Patents
Durable hard coating containing silicon nitrideInfo
- Publication number
- TWI367240B TWI367240B TW095135107A TW95135107A TWI367240B TW I367240 B TWI367240 B TW I367240B TW 095135107 A TW095135107 A TW 095135107A TW 95135107 A TW95135107 A TW 95135107A TW I367240 B TWI367240 B TW I367240B
- Authority
- TW
- Taiwan
- Prior art keywords
- silicon nitride
- hard coating
- containing silicon
- coating containing
- durable hard
- Prior art date
Links
- 229910052581 Si3N4 Inorganic materials 0.000 title 1
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/002—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/002—Crucibles or containers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Crystallography & Structural Chemistry (AREA)
- Wood Science & Technology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Nanotechnology (AREA)
- Manufacturing & Machinery (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Paints Or Removers (AREA)
- Ceramic Products (AREA)
- Laminated Bodies (AREA)
- Photovoltaic Devices (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemically Coating (AREA)
- Crucibles And Fluidized-Bed Furnaces (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102005050593A DE102005050593A1 (de) | 2005-10-21 | 2005-10-21 | Dauerhafte siliciumnitridhaltige Hartbeschichtung |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200716717A TW200716717A (en) | 2007-05-01 |
TWI367240B true TWI367240B (en) | 2012-07-01 |
Family
ID=37460213
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095135107A TWI367240B (en) | 2005-10-21 | 2006-09-22 | Durable hard coating containing silicon nitride |
Country Status (8)
Country | Link |
---|---|
US (1) | US8012252B2 (zh) |
EP (1) | EP1780307B1 (zh) |
JP (1) | JP5209195B2 (zh) |
KR (1) | KR100800053B1 (zh) |
CN (1) | CN1955228A (zh) |
DE (1) | DE102005050593A1 (zh) |
NO (1) | NO20064799L (zh) |
TW (1) | TWI367240B (zh) |
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US20080233403A1 (en) * | 2007-02-07 | 2008-09-25 | Timothy Dyer | Method of Making Ceramic Reactor Components and Ceramic Reactor Component Made Therefrom |
ATE528267T1 (de) * | 2007-04-25 | 2011-10-15 | Esk Ceramics Gmbh & Co Kg | Formkörper mit einer dauerhaften siliciumnitridhaltigen hartbeschichtung, verfahren zu dessen herstellung und dessen verwendung |
DE102007029668A1 (de) | 2007-06-27 | 2009-01-08 | Epg (Engineered Nanoproducts Germany) Ag | Ultraharte Kompositschichten auf Metalloberflächen und Verfahren zu ihrer Herstellung |
WO2009012455A1 (en) | 2007-07-18 | 2009-01-22 | Oxane Materials, Inc. | Proppants with carbide and/or nitride phases |
DE102007053284A1 (de) * | 2007-11-08 | 2009-05-20 | Esk Ceramics Gmbh & Co. Kg | Fest haftende siliciumnitridhaltige Trennschicht |
DE102008031766A1 (de) | 2008-07-04 | 2009-10-15 | Schott Ag | Verfahren zur Herstellung eines beschichteten Tiegels aus einem Tiegelgrünkörper oder aus einem zwischengebrannten Tiegelkörper sowie die Verwendung solch eines beschichteten Tiegels |
US8859034B2 (en) * | 2009-01-28 | 2014-10-14 | Kyocera Corporation | Ingot mold for silicon ingot and method for making the same |
DE102009023402A1 (de) * | 2009-05-29 | 2010-12-02 | Esk Ceramics Gmbh & Co. Kg | Suspension zur Herstellung einer reibwerterhöhenden Schicht, Formkörper mit einer solchen reibwerterhöhenden Schicht, Verfahren zu dessen Herstellung und dessen Verwendung |
KR20120090030A (ko) | 2009-07-16 | 2012-08-16 | 엠이엠씨 싱가포르 피티이. 엘티디. | 코팅된 도가니 및 그의 제조 방법 및 용도 |
US8445066B2 (en) | 2009-12-18 | 2013-05-21 | 3M Innovative Properties Company | Systems and methods for making monolithic gel bodies |
CN101844935A (zh) * | 2010-05-31 | 2010-09-29 | 江西赛维Ldk太阳能高科技有限公司 | 一种多晶硅或单晶硅用坩埚涂层及其制备方法 |
CN103052480B (zh) * | 2011-02-28 | 2015-09-16 | 株式会社棚泽八光社 | 成形用模具及其制造方法以及使光泽度一致的方法 |
DE102011078066A1 (de) | 2011-06-24 | 2012-12-27 | Oskar Frech Gmbh + Co. Kg | Gießtechnisches Bauteil und Verfahren zum Aufbringen einer Korrosionsschutzschicht |
CN103827351B (zh) * | 2011-08-31 | 2017-03-08 | 3M创新有限公司 | 高硬度的含氮化硅剥离层 |
US8747538B2 (en) * | 2011-09-20 | 2014-06-10 | Chung-Hou Tony Hsiao | Photovoltaic ingot mold release |
CN102367572B (zh) * | 2011-09-21 | 2014-01-01 | 安阳市凤凰光伏科技有限公司 | 多晶硅铸锭坩埚喷涂免烧结方法 |
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CN103506263B (zh) * | 2011-12-30 | 2015-07-29 | 英利能源(中国)有限公司 | 多晶硅坩埚喷涂免烘干的方法及氮化硅涂层 |
CN103774215B (zh) * | 2012-10-26 | 2016-11-02 | 阿特斯(中国)投资有限公司 | 硅铸锭用坩埚及其涂层制备方法 |
US20140158457A1 (en) * | 2012-12-12 | 2014-06-12 | GM Global Technology Operations LLC | Coulomb frictional damping coated product |
DE102013206993B4 (de) | 2013-04-18 | 2014-12-04 | Morgan Advanced Materials Haldenwanger GmbH | Verfahren zur Beschichtung von Formkörpern aus Quarzgut |
CN103320854B (zh) * | 2013-06-07 | 2016-03-02 | 英利集团有限公司 | 坩埚用涂层结构、其制备方法及包括其的坩埚 |
JP6119565B2 (ja) * | 2013-11-11 | 2017-04-26 | 信越半導体株式会社 | 単結晶製造方法 |
US9957431B2 (en) * | 2013-11-11 | 2018-05-01 | Heraeus Quarzglas Gmbh & Co. Kg | Composite material, heat-absorbing component, and method for producing the composite material |
TWI663126B (zh) | 2014-07-09 | 2019-06-21 | 法商維蘇威法國公司 | 包含可磨塗層之輥、其製造方法及其用途 |
CN104058771A (zh) * | 2014-07-18 | 2014-09-24 | 徐梅子 | 一种预热器用耐火浇注料 |
FR3026414B1 (fr) * | 2014-09-26 | 2019-04-12 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Creuset pour la cristallisation de silicium multi-cristallin ou quasi-monocristallin par reprise sur germe |
US10280770B2 (en) | 2014-10-09 | 2019-05-07 | Rolls-Royce Corporation | Coating system including oxide nanoparticles in oxide matrix |
US10047614B2 (en) | 2014-10-09 | 2018-08-14 | Rolls-Royce Corporation | Coating system including alternating layers of amorphous silica and amorphous silicon nitride |
CN104801662A (zh) * | 2015-05-12 | 2015-07-29 | 芜湖市容川机电科技有限公司 | 一种石墨粉铸造涂料 |
WO2017025388A1 (en) | 2015-08-07 | 2017-02-16 | Vesuvius France Sa | Refractory article resistant to non-ferrous metal and production process thereof |
CN105983649A (zh) * | 2016-01-11 | 2016-10-05 | 明光市留香泵业有限公司 | 一种含陶瓷微粉增强的低残炭高透气消失模铸造用水基涂料及其制备方法 |
CN106116700A (zh) * | 2016-06-30 | 2016-11-16 | 山东工业陶瓷研究设计院有限公司 | 氮化物陶瓷高温耐磨涂层及其制备方法 |
CN106348788B (zh) * | 2016-08-19 | 2019-11-26 | 西安华晶电子技术股份有限公司 | 多晶硅铸锭坩埚底部氮化硼涂层材料及其涂覆方法 |
CN108275987B (zh) * | 2018-02-27 | 2020-05-19 | 重庆长江造型材料(集团)股份有限公司 | 一种表面改性石英砂及其制备方法 |
CN110803943B (zh) * | 2019-11-30 | 2022-03-08 | 中材江苏太阳能新材料有限公司 | 一种低杂质的铸造多晶和铸锭单晶用免喷坩埚及其制备方法 |
CN112979294B (zh) * | 2021-03-17 | 2022-05-06 | 中南大学 | 一种废旧匣钵修复涂料及其使用方法 |
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DE10304849A1 (de) * | 2003-02-06 | 2004-08-19 | Institut für Neue Materialien gemeinnützige Gesellschaft mit beschränkter Haftung | Chemomechanische Herstellung von Funktionskolloiden |
US20040211496A1 (en) * | 2003-04-25 | 2004-10-28 | Crystal Systems, Inc. | Reusable crucible for silicon ingot growth |
DE10326815A1 (de) * | 2003-06-13 | 2004-12-30 | Institut für Neue Materialien Gemeinnützige GmbH | Antiadhäsive Hochtemperaturschichten |
DE10326769B3 (de) * | 2003-06-13 | 2004-11-11 | Esk Ceramics Gmbh & Co. Kg | Dauerhafte BN-Formtrennschichten für das Druckgießen von Nichteisenmetallen |
JP4497943B2 (ja) * | 2004-01-29 | 2010-07-07 | 京セラ株式会社 | シリコン鋳造用鋳型とそれを用いたシリコン鋳造装置 |
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TWI400369B (zh) * | 2005-10-06 | 2013-07-01 | Vesuvius Crucible Co | 用於矽結晶的坩堝及其製造方法 |
DE102006013746A1 (de) | 2006-03-24 | 2007-09-27 | Esk Ceramics Gmbh & Co. Kg | Gesinterter verschleißbeständiger Werkstoff, sinterfähige Pulvermischung, Verfahren zur Herstellung des Werkstoffs und dessen Verwendung |
DE102006013729A1 (de) | 2006-03-24 | 2007-10-04 | Esk Ceramics Gmbh & Co. Kg | Gesinterter Werkstoff, sinterfähige Pulvermischung, Verfahren zur Herstellung des Werkstoffs und dessen Verwendung |
DE102006041047A1 (de) | 2006-09-01 | 2008-03-20 | Esk Ceramics Gmbh & Co. Kg | Schlichte zur Herstellung einer BN-haltigen Beschichtung, Verfahren zu deren Herstellung, beschichteter Körper, dessen Herstellung und dessen Verwendung |
DE102007053284A1 (de) | 2007-11-08 | 2009-05-20 | Esk Ceramics Gmbh & Co. Kg | Fest haftende siliciumnitridhaltige Trennschicht |
-
2005
- 2005-10-21 DE DE102005050593A patent/DE102005050593A1/de not_active Ceased
-
2006
- 2006-09-20 EP EP06019707.6A patent/EP1780307B1/de not_active Not-in-force
- 2006-09-22 TW TW095135107A patent/TWI367240B/zh not_active IP Right Cessation
- 2006-10-18 US US11/582,449 patent/US8012252B2/en not_active Expired - Fee Related
- 2006-10-20 JP JP2006286150A patent/JP5209195B2/ja not_active Expired - Fee Related
- 2006-10-20 KR KR1020060102508A patent/KR100800053B1/ko not_active Expired - Fee Related
- 2006-10-20 CN CNA2006101371019A patent/CN1955228A/zh active Pending
- 2006-10-23 NO NO20064799A patent/NO20064799L/no not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
EP1780307B1 (de) | 2015-01-14 |
KR20070043681A (ko) | 2007-04-25 |
CN1955228A (zh) | 2007-05-02 |
US8012252B2 (en) | 2011-09-06 |
US20070089642A1 (en) | 2007-04-26 |
NO20064799L (no) | 2007-04-23 |
JP2007146132A (ja) | 2007-06-14 |
EP1780307A3 (de) | 2008-12-03 |
KR100800053B1 (ko) | 2008-01-31 |
EP1780307A2 (de) | 2007-05-02 |
DE102005050593A1 (de) | 2007-04-26 |
JP5209195B2 (ja) | 2013-06-12 |
TW200716717A (en) | 2007-05-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |