TWI358658B - Touch-sensitive electro-wetting display device, to - Google Patents

Description

1358658 j: UKi year. March Q9, according to the positive ^, invention description: [Technology of the invention] [0001] The present invention relates to a touch-type circuit substrate, touch circuit substrate and A touch-type electrowetting display device (Electro-wetting Display Device) using the touch circuit substrate. [Prior Art] [0002] At present, many optoelectronic technologies are rapidly developing and applied to next-generation flat panel displays such as Projection Display, Flexible Display, and the like. In this environment, an electrowetting display device based on the electrowetting principle has a fast response speed and a wide viewing angle. The power consumption is small, and the light and thin portable ^ advantages are like ^^ extensive attention / ! J', 'ί [0003] Please refer to FIG. 1, which is a schematic cross-sectional view of a prior art electrowetting display device in a dark state. The electrowetting display device 1 includes a first substrate 11 and a second substrate 18 disposed opposite to each other, and a first flow between the first substrate 11 and the second substrate is; , a hydrophobic: H / VIII, > - ' ) / insulating layer 15, a plurality of insulation walls | ali) i6 and a matrix electricity %; - road layer 17. The matrix circuit layer 17 is disposed on the surface of the second substrate 18, and includes a plurality of electrodes 14 and a plurality of thin film transistors (not shown). The plurality of electrodes 14 are arranged in a matrix on the surface of the second substrate 18, and are electrically connected to the thin film transistor. The hydrophobic insulating layer 15 covers the matrix circuit layer 17. The plurality of insulating walls 16 are disposed in a lattice shape on the surface of the hydrophobic insulating layer 15. A minimum area defined by the adjacent insulating walls 16 is defined as a pixel region R, and the plurality of pixel regions R are disposed corresponding to the plurality of electrodes 14. The first fluid 13 is filled between adjacent insulating walls 16 and its material is usually not 096134505. Form No. A0101 Page 4 / Total 40 pages 1003078302-0 1358658 Modified on March 09 Or a similar cetane alkane. The second fluid 12 is filled between the first fluid 13 and the first substrate 11 and is a transparent conductive liquid that is incompatible with the first fluid 13 and may be water or a salt solution, such as a mixture of water and ethanol. A gasified potassium (KC1) solution.

Applying a voltage to the second fluid 12 and the pixel electrode 14 respectively, when the voltage difference between the second fluid 12 and the pixel electrode 14 is less than a threshold voltage, the second fluid 12 and the first fluid 13 is disposed in a stacked manner, and the first fluid 13 is flatly disposed on the hydrophobic insulating layer 15. At this time, the incident light is absorbed by the first fluid 13, thereby making the pixel region R of the electrowetting display device 10 dark. state. One 厂 factory -, '

[0005] Please refer to FIG. 2 together, the electrowetting display, the device 10 lacks a pixel area R. 1 ν /丨

Schematic diagram of the cross section when it is in a bright state. When the voltage difference between the pixel electrodes 14 is greater than the threshold voltage, the surface tension of the second fluid 12 changes, and the first fluid 13 in the pixel region R is squeezed to make the first fluid 13 Moving to the adjacent %, the A-light can be emitted from the second fluid 12, thereby causing the corresponding pixel region R of the device 10 to be in a bright state. 0006 ❹ [0006] However, with the popularity of touch technology, more and more consumers are demanding electronic information devices such as mobile phones, personal digital assistants and automatic terminal processors to have touch functions. To enhance the interactive function between the human-machine interface. Therefore, the demand for electrowetting display devices with touch functions has also emerged. SUMMARY OF THE INVENTION [0007] In view of the above, it is necessary to provide a touch-type electrowetting display device having a touch function. Form No. A0101 096134505 Page 5 of 40 1003078302-0 1358658 100. March 09 Correction Replacement Page [0008] In addition, it is also necessary to provide a touch-sensitive circuit substrate having a touch function. [0009] Furthermore, it is also necessary to provide a touch-sensitive circuit substrate having a touch function.

[0010] A touch-sensitive circuit substrate includes a transparent substrate, a plurality of thin film transistors, and a capacitive touch structure. The transparent substrate includes opposing first and second surfaces. The plurality of thin film transistors are disposed on the second surface of the transparent substrate. The capacitive touch structure includes a plurality of first conductive electrodes and a plurality of second conductive electrodes. The plurality of first conductive electrodes are disposed in parallel with each other on a first surface of the transparent substrate, and the plurality of second conductive electrodes are disposed in parallel with each other. The transparent substrate is on the surface of the recessed surface, and is insulated from the first conductive electrode. The plurality of first/conductive electrodes, the plurality of second conductive electrodes and the transparent substrate sandwiched therebetween form a plurality of sensing capacitors. .

[0011] A touch type electrowetting display device X箕 includes a urine carrying substrate, a touch ...

The control circuit substrate, a hydrophobic first fluid, and a conductive second fluid. The touch-sensitive circuit substrate is disposed opposite to the carrier substrate, and includes a transparent substrate, a plurality of thin film transistors, and a capacitive touch structure. The transparent substrate includes opposing first and second surfaces. The plurality of thin film transistors are disposed on the second surface of the transparent substrate. The capacitive touch structure includes a plurality of first conductive electrodes and a plurality of second conductive electrodes. The plurality of first conductive electrodes are disposed in parallel with each other on a first surface of the transparent substrate, and the plurality of second conductive electrodes are disposed parallel to each other in the transparent The second surface of the substrate is insulated from the first conductive electrode, the plurality of first conductive electrodes, the plurality of second conductive electrodes 096134505, form number A0101, page 6 of 40 pages 1003078302-0 1358658 .100 years. March The 09th revision_page and the transparent substrate sandwiched therebetween form a complex number of sensing capacitors. The hydrophobic insulating layer covers the touch sensitive circuit substrate. The non-conductive first fluid is disposed between the hydrophobic insulating layer and the carrier substrate. The electrically conductive second fluid is incompatible with the first fluid and is disposed between the first fluid and the carrier substrate.

[0012] A touch sensitive circuit substrate comprising a transparent substrate, a plurality of parallel first conductive electrodes, and a plurality of pixel regions. The transparent substrate includes a first surface and a second surface disposed opposite each other. The first conductive electrode is disposed on the first surface of the transparent substrate. The plurality of pixel regions are distributed in a matrix on the second surface of the transparent substrate, and each of the pixel regions includes a common line, at least one first insulating layer, and a common line and the first conductive electrode are perpendicular to each other, and Through the image f area / /. The at least one first insulating layer covers the common line. The storage capacitor includes a second metal electrode, at least a second insulating layer, and a pixel electrode. The second metal electrode is disposed on the first surface of the first climbing layer corresponding to the common line. The at least one first ||[ni^! yp.ipir'p ' two insulating layers cover the second metal c cui gong + missing electrode, which is set to ❹ 『!

Positioned in the pixel region, and covering sk "the first layer, the common line also uirrace as the second conductive electrode, the second conductive electrode, the first common electrode and the transparent substrate sandwiched therebetween constitute a sensing capacitor [0013] A process for a touch-sensitive circuit substrate, comprising the steps of: providing a transparent substrate, the transparent substrate comprising a first surface and a second surface disposed opposite to each other, and defining a plurality of pixel regions distributed in a matrix; The first surface forms a plurality of first conductive electrodes arranged in parallel; each of the pixel regions is formed on the second surface in sequence: a gate and a common line, so that the two are respectively disposed on both sides of the pixel region, and the common Line Vertical The First 096134505 Form No. A0101 Page 7 / Total 40 Page 1003078302-0 1358658 100. March 09 The positive replacement page conductive electrode arrangement also serves as a second conductive electrode; at least a first 'insulation a layer to cover the gate, the common line and the inner surface; a first semiconductor layer, the corresponding gate is disposed on the first insulating layer; a source, a drain and a first The second metal layer is disposed on the semiconductor layer opposite to the drain, and the second metal layer is disposed on the first insulating layer corresponding to a portion of the common line.

[0014] A process for a touch-sensitive circuit substrate, comprising the steps of: providing a transparent substrate, the transparent substrate comprising a first surface and a second surface disposed opposite to each other, and defining a plurality of pixel regions distributed in a matrix; Forming, by the first surface, a plurality of first conductive electrodes arranged in parallel; forming a thin film transistor on the second surface corresponding to each pixel region;

' I a common line of conductive electrodes, the common line also # is the second # electric electrode, and then the common line, the first conductive electrode and the transparent substrate sandwiched therebetween constitute a sensing capacitor, and on the public line Forming a storage capacitor 〇' ' ::: : , ν ^ ^ /; ί, v: '''.Ίι [0015] The above-mentioned touch-type electrowetting display device 彡, ν touch, electricity, road substrate and The process...,:: 夕'々'ν-,., integrates the thin film transistor structure originally switched between the bright and dark states of the region on the carrier substrate and a capacitive touch structure. On the transparent substrate as the display surface, the touch-type electrowetting display device with capacitive touch function can be realized without lifting the display substrate, and at the same time, another active matrix circuit can be applied. A touch-sensitive circuit substrate on a display. [Embodiment] FIG. 3 is a schematic structural view showing a pixel region in a dark state according to a preferred embodiment of the touch-type electrowetting display device of the present invention. The touch type 096134505 Form number A0101 Page 8 of 40 1003078302-0 1358658

The invention relates to a transparent carrier substrate 21, a touch-type circuit substrate 22, a hydrophobic insulating layer 23, a plurality of insulating walls 24, and a first fluid that is opaque. 25 and a second fluid 26 that transmits light. The transparent circuit board 21 is disposed opposite to the touch circuit board 22, and the touch circuit board 22 is a touch element (not shown) constituting a capacitive touch structure and is used for controlling the electrowetting display. The device is in a transparent substrate of a control element (not shown) in a bright state and a dark state. The hydrophobic insulating layer 23 covers the surface of the touch-control circuit substrate 22 adjacent to the transparent carrier substrate 21, and is made of a transparent amorphous fluoropolymer, such as AF1 600, which is water-repellent. The plurality of insulating walls 24 are disposed on the hydrophobic insulating layer 23 in a lattice shape, and the minimum area defined by the adjacent insulating walls 24 is defined as an image of the “supplementing field p”, and the first fluid 25 is evenly distributed in the pixel area P. The water in the d, the absolute $^2 ^ on the material can be color oil or similar to hexadecane -. - the 6 -y of the -diode body is filled between the first fluid 25 and the transparent carrier substrate 21, and the transparent conductive liquid which is incompatible with the first fluid 25 may be water or a salt solution. For example, the potassium chloride solution OCfy in the mixture of water and ethanol ◎: • _ please-and the reference 4, FIG. 5 and the plane of one pixel region p of the touch-sensitive circuit substrate 22 of the electrowetting display device 20 FIG. 5 is a cross-sectional enlarged view of FIG. 4 along the VV direction, and FIG. 6 is a cross-sectional enlarged view of the core along the VI-VI direction. The touch-control circuit substrate 22 includes a transparent substrate 220, a plurality of scanning lines 231 disposed on the second surface of the transparent substrate 22 and horizontally arranged, a plurality of data lines 232 vertically intersecting the scanning lines 231, and a plurality of common lines 233. And a plurality of driving lines 234 disposed on the first surface of the transparent substrate 220 corresponding to the plurality of data lines (10). The driving line 234 serves as the touch-type electrowetting display device 2 第 096134505 in the direction of the ¥ form No. A0101 page 9 / total 40 pages 1003078302-0 1358658 100 years Q March 09 隹 _ _ a conductive electrode The plurality of common lines 233 are parallel to each other and are respectively disposed between the adjacent two scan lines 231, and also serve as the second conductive electrodes of the touch-type electrowetting display device 20 along the X direction. The driving line 234 and the transparent substrate 22 sandwiched therebetween form a sensing capacitor Csense for implementing a touch function. The sensing capacitor Csense, the common line 233 and the driving line 234 form a capacitive touch structure. [0018] A minimum area formed by the data line 232 intersecting the scan line 231 is disposed corresponding to the pixel area P. Each of the pixel regions p correspondingly includes a thin film transistor 240, a pixel electrode 250, a second insulating layer 246, and a diode. 260 « . '' [0019] The thin film transistor 240 is disposed away from the common line 2 3 3, \ 丨 之 资料 资料 2 3 与 与 与 与 与 与 与 与 相 相 相 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲 蹲243' - a source 244 and a drain 245. The gate 241 is disposed on the second surface of the transparent substrate 220, and is connected to the scan line 3]; the first insulating layer 242 covers the gate 241 The common line 233 and the second surface of the human transparent layer 220 1 H, / human. The first semiconductor layer is smoked to the gate 241 corresponding to the surface of the first insulating layer 242. The source 244 is connected to the data. a line 232 is disposed on opposite sides of the first semiconductor layer 2 4 3 opposite to the drain electrode 245. [0020] The diode 260 is disposed corresponding to the common line 233, and includes a first metal electrode 26 a second insulating layer 262, a second semiconductor layer 263, a second metal electrode 264, and a first connection hole 265. The first metal electrode 261 The portion of the common line 233 is also covered by the first insulating layer 242. The first connecting hole 265 is disposed adjacent to the edge of the pixel region P through the first insulating layer 242. The second metal electrode 264 corresponds to the first A gold watch · single number A0101 096134505 page 10 / a total of 40 pages 1003078302-0 1358658

[0021]

The nucleus of the first metal layer 261 is electrically connected to the first metal electrode 261 by the first connection hole 265, and The source 244 of the thin film transistor 240 is formed in the same process as the gate 245. The second metal electrode 264 has an opening 268. The second semiconductor layer 263 is disposed on the first insulating layer 242 at the opening 268, and the second metal electrode 264 on the two sides of the opening 268 partially overlaps the second semiconductor 263, and the second semiconductor is further The layer 263 is electrically connected, and a portion of the second metal electrode 264 connected to the first connection hole 265 serves as an anode of the diode 260, and the other portion serves as a cathode of the diode 26 . The second insulating layer 246 covers the thin film transistor 24 〇 and extends over the first insulating layer 242 and the diode $6 to protect the film and the crystal 24 〇 and the diode The body 26〇丨4 is not [[there is a L·________^ ^ ', and a second connection hole 247 penetrating the second insulating layer 246. The pixel electrode 250 covers the second insulating layer 246 corresponding to the drain 245. And extending over the cathode surface of the diode 26, and the sound producing electrode 25 is depleted by the second connection hole 247 and the electrode 245. The second metal electrode 264 The second insulating layer yinoa 262 of the second-party backup device constitutes a storage capacitor Cst. [0022] Please refer to FIG. 7 , which is an equivalent circuit diagram of the touch-type electrowetting display device 2 . Continuously load a common voltage to the first The two fluids 26, the scan voltage transmitted through the scan line 231 controls the on and off of the thin film transistor 240. When the thin film transistor 240 is turned on, the data voltage sequentially passes through the data line 232 and the source of the thin film transistor 240. 244, a drain 245 is applied to the pixel electrode 250' when the pixel electrode 250 and the Second fluid 26 is less than the voltage difference of a threshold voltage, the first fluid layer 25 and the second fluid 26 096 134 505 Page 11 Form Number A0101 / 40 pages 1003078302-0 1,358,658

The day-by-side is placed in a stack, whereby the incident light is absorbed by the first fluid 25, and the touch-type electrowetting display device 20 is in a dark state. On the other hand, when the voltage difference between the pixel electrode 25A and the second fluid 26 is greater than the threshold voltage, the second fluid 26 squeezes the first fluid 25 to be concentrated to the location of the thin germanium transistor. The corresponding pixel region p of the contact-type electrowetting display device 20 operates on the bright bear by passing the incident light through the second fluid 26. [0023] At the same time, the common line 233 as the second conductive electrode of the capacitive touch structure along the γ direction and the drive line 234 as the first conductive electrode of the X direction are alternately scanned by the external control circuit, when there is no When the touch operation is performed, the capacitance value of the sensing capacitor Csense of each pixel region ρ of the touch-type circuit substrate 22 is constant; and when the finger or the touch stylus is touched by the touch-type circuit substrate 22, the hand ▲ Or his shy element and the capacitive touch structure generate a touch capacitance (the contact capacitance does not change the capacitance of the sensing capacitor Csense in the touch area, thereby determining the position of the touch pressure region. Finally, as the fourth electric f-pole of the capacitive touch structure, the dithering number causes the diode 260 to be connected to the storage electrode "the electrode end of the capacitor Cst, that is, the second metal electrode of the two-pole body" 264 is further provided with a common voltage level for the storage capacitor Cst; when the common line 233 pauses scanning, the diode 26 is turned off, thereby maintaining the contact capacitance Cst to maintain the common voltage level without being affected. [0024] [ FIG. 8 is a flow chart showing the steps of the process of the touch-sensitive circuit substrate 22. The process of the touch-sensitive circuit substrate 22 includes the following steps: Step 81, providing a transparent substrate 22, on the transparent substrate 220 A plurality of parallel-arranged drive lines 234 are formed thereon. 1003078302-0 Form Dock No. A0101 Page 12 of 40 1358658 100 March 09 Nuclear Replacement Page [0026] The transparent substrate 220 includes two opposing first surfaces and a second surface is formed by a coating method or a sputtering method to form a transparent electrode layer on the first surface of the transparent substrate 220, and the transparent electrode layer is processed by a yellow light and an etching process to form a plurality of parallel arrays. The driving line 234, the material of the transparent electrode layer may be indium tin oxide or indium zinc oxide. [0027] Step S2, flipping the transparent substrate 220, forming a gate 241 and a second surface on the second surface of the transparent substrate 220 A metal electrode 261. [0029] As shown in FIG. 9, a metal layer is plated on the second surface of the transparent substrate 220, and the metal layer is patterned through a yellow light and an etching process to form an island shape. Gate 241 and strip The first metal electrode 261. The metal layer of the metal layer can be turned (Mo), chin (Ti) metal or temple ii; alloy ... gold ^ step S3, forming a cover of the gate 2 1. The first insulating layer 242 of the second metal electrode 261, wherein the material of the first insulating layer 242 may be yttrium oxide (SiO). [0031] Step S4, forming a first connection boundary ^ o!|pd, as shown in FIG. 1 , a first connection hole 2 65 penetrating the first insulating layer 242 is formed adjacent to the side of the first metal electrode 261 by a yellow pass, thereby being the first A portion of the first metal electrode 261 is exposed at the connection hole 265. [0032] Step S5, forming a first semiconductor layer 243 and a second semiconductor layer 263 at predetermined positions of the first insulating layer 242. [0033] As shown in FIG. 11, an amorphous germanium film and an n-type amorphous germanium film are sequentially formed on the surface of the first insulating layer 242 by chemical vapor deposition, and then numbered by a yellow 1003078302-0 096134505 form. Α0101 Page 13 of 40 1358658 100. On March 09, the amorphous ruthenium film and the n-type amorphous ruthenium film are patterned according to the replacement page light and etching process, and are formed at corresponding positions of the gate 241. The first semiconductor layer 243 forms the second semiconductor layer 263 on the first insulating layer 242 adjacent to the first connection hole 265. [0034] Step S6, a source 244, a drain 245 and a second metal electrode 264 are formed at predetermined positions to form a thin film transistor 240 and a diode 260.

[0035] As shown in FIG. 12, a second metal layer is formed by sputtering to cover the transparent substrate 220 on which the first semiconductor layer 243, the second semiconductor layer 263, and the first connection hole 265 are formed, and then reused. A yellow light etch process diagram r'\ scribes the second metal layer, and further forms a second surface at the first semiconductor layer 243, and a relative source 244 and a drain 245 are formed. The source 244 and the drain 245 - - - partially overlap the first semiconductor layer 243 to form a thin film transistor 240. At the same time, a second metal electrode 264 is formed on both sides of the second semiconductor layer 263. The second metal electrode 264 is on the table, and the second conductive layer is on the 263 part: 厶夕:::ί ,, νϋ ί ... Stacking and filling the first connection bar 2 6 5 to form a diode 2 6 0 -.. Ό \ long h, and the second metal electrode 264 acts as the diode with the first connection hole 265 The anode of 260 and the other portion of the second metal electrode 264 serve as the cathode of the diode 260. [0036] Step S7, a second insulating layer 246 is formed to cover the transparent substrate 220 having the thin film transistor 240 and the diode 260. [0037] As shown in FIG. 13, an insulating material layer covering the foregoing structure is formed by chemical vapor deposition, and the insulating material layer is patterned by a yellow etching process to form the thin film transistor 240. First insulating layer 242 096134505 Form No. A0101 Page 14 / Total 40 pages 1003078302-0 1358658 100 years · 〇 March ύ 9. Day correction _ page and the second insulating layer 246 of the diode 260 ' Nitride Xi (XNx). [0038] Step S8, a second connection hole 247 and a pixel electrode 250 are formed, thereby forming a touch-type circuit substrate 22 having a capacitive touch function. [0040] The second insulating layer 246 is patterned by a yellow etching process, and a second connection hole 247 penetrating the second insulating layer 246 is formed at the corresponding portion of the drain 245, and finally by A thin film module is sputtered with a transparent electrode material, and the transparent electrode material is patterned by a yellow light and an etching process, and further, the second insulating layer 246 corresponding to the drain 245, the first insulating layer 242 and

"I, the cathode of the diode 260 forms the pixel electrode 250, and the touch-sensitive circuit substrate 22 as shown in FIG. 6 is formed. The touch-type electrowetting display device 2 and the touch-control device are provided. 2 The thin film transistor array and the T capacitor which are originally disposed on the transparent carrier substrate 21 for controlling the switching between the clear and dark states of the pixel region p, the touch structure is integrated on the transparent substrate 220 as the observation surface, and the buffer substrate is lifted before The touch-type circuit substrate 22 having the capacitive electrowetting display device 2G' can also be provided with the --line touch function. [0041] The touch-sensitive circuit substrate 22 can also be used for other films. Active display device of a transistor array, such as a thin film

Research on the electric liquid crystal display (TFT LCD). [0042] In summary, the present invention has indeed met the requirements of the invention patent, and the law has proposed a special shot. However, the above description is only a preferred embodiment of the present invention, and the scope of the present invention is not limited to the above embodiment, and is familiar with this 1003078302-0 096134505 Form No. A0101 Page 15 / Total 40 Page 1358658 100 years The equivalent modifications or changes made by the person who is replacing the page on the 9th of the month of the month of the present invention shall be included in the scope of the following patent application. [0046] [0046] [0049] [0049] [0054] [0055] [0055] [0055] [FIG. 1 is a prior view] Schematic diagram of the cross-sectional structure of the technical electrowetting display device in a dark state. Fig. 2 is a schematic cross-sectional view showing a pixel region of one of the electrowetting display devices shown in Fig. 1 in a bright state. FIG. 3 is a schematic structural view showing a pixel region in a dark state according to a preferred embodiment of the touch-type electrowetting display device of the present invention. FIG. 4 is a schematic diagram of a planar structure of a touch-type electrowetting display device, a pedestal holder, and a circuit substrate of FIG. 3. FIG. 5 is a schematic diagram of a planar structure of a pixel region. A cross-sectional enlarged view of the VV direction. Figure 6 is an enlarged cross-sectional view taken along line VI - VI of Figure 4. FIG. 7 is a circuit diagram of the touch-type electrowetting and display #^^ boxing effect shown in FIG.

FIG. 8 is a flow chart of the touch circuit substrate shown in FIG. 4. 9 to 13 are schematic views showing the steps of the process of the touch-sensitive circuit substrate shown in FIG. [Main component symbol description] Touch-type electrowetting display device: 20 Touch-type circuit substrate: 22 Transparent carrier substrate: 21 Hydrophobic insulating layer: 23

096134505 Form No. A0101 Page 16 of 40 1003078302-0 1358658

[0056] Isolated wall: 24 [0057] First fluid: 25 [0058] Second fluid · 26 [0059] Pixel area: P [0060] Transparent substrate: 220 [0061] Scan line: 231 [0062] Data line :232 [0063] Common line: 2 3 3 [0064] Drive line: 234 [0065] Inductive capacitance: Csense [0066] Cushion capacitance: Cst [0067] Thin film transistor: 240 [0068] Pixel electrode: 250 [0069] Diode: 260 [0070] Gate: 2 41 [0071] Source: 244 [0072] First semiconductor layer: 243 [0073] Second insulating layer: 246 [0074] Bungee: 245

.100 years. March 09th shuttle replacement page

096134505 Form No. A0101 Page 17 of 40 1003078302-0 1358658 1〇〇年.03月〇9日修正Replacement page [0075] First metal electrode: 261 [0076] Second connection hole: 247 [0077] Two semiconductor layers: 263 [0078] Second insulating layer: 262 [0079] First connection hole: 265 [0080] Second metal electrode: 264 [0081] Opening: 268

096134505 Form No. A0101 Page 18 of 40 1003078302-0

Claims (1)

1358658 VII. Patent application scope: 100 years. March 09. Risuo Dynasty &amp; page A touch-sensitive circuit substrate comprising: a transparent substrate including opposite first and second surfaces; a plurality of thin film transistor structures disposed on the second surface; and a capacitive touch structure, The method includes: a plurality of first conductive electrodes disposed on the first surface of the transparent substrate in parallel with each other; and a plurality of second conductive electrodes disposed on the second surface of the transparent substrate in parallel with the first conductive electrode The insulating intersects, and the plurality of first conductive electrodes, the plurality of second conductive electrodes, and the transparent substrate sandwiched therebetween form a plurality of sensing capacitors. · n - factory, as in the patent application scope 1 of the _ control &lt; formula, electro-mechanical basis board / its further 1 ! \ y including a plurality of horizontal drainage arranged on the second surface a scan line of ~τ, a plurality of data lines perpendicularly insulated from the scan line, the plurality of thin film transistors being disposed at a position where the data line is compatible with the scan line. . For example, in the board of claim 2, wherein the second conductive child of the capacitive touch structure is extinguished between the adjacent two scan lines, Olit^ce, and away from the The side of the thin film transistor. The touch-sensitive circuit substrate of claim 2, wherein the plurality of first conductive electrodes are disposed corresponding to the plurality of data lines. The touch-sensitive circuit substrate of claim 1, further comprising a diode, the diode being disposed corresponding to the second conductive electrode. The touch-sensitive circuit substrate of claim 5, wherein the diode includes a second semiconductor layer and a second metal electrode, the second metal electrode and the second conductive electrode, and the second The two metal electrodes include an opening 096134505. Form No. A0101 Page 19/Total 40 pages 1003078302-0 1358658 The correction replacement page is issued on October 10, 2009. The second metal electrodes on both sides of the opening are connected by the second semiconductor layer. The touch-sensitive circuit substrate of claim 6, wherein the second metal electrode and the second conductive electrode further comprise a first insulating layer. 8. The touch-sensitive circuit substrate of claim 7, wherein the first insulating layer has a connection hole connecting the second metal electrode and the second conductive electrode. The touch-sensitive circuit substrate of claim 6, wherein the thin film transistor structure comprises a gate, a source, a drain and a first semiconductor layer, wherein the gate is disposed on the a transparent substrate. The first-second surface 丨 the first insulation. ,::':,' Λ layer extends over the gate, the first semiconductor layer is disposed on a surface of the first insulating layer corresponding to the gate, the source The pole is disposed with/and overlaps with the first semiconductor layer. The touch-sensitive circuit substrate of claim 9, further comprising a pixel electrode, wherein the pixel electrode is connected to the second conductive electrode The electrical connection is known as the floc 2 on the electrode. If, ' : ' 11 . The touch % circuit substrate is missing from claim 10, wherein a second insulating layer is further included between the second metal electrode and the pixel electrode. The touch-sensitive circuit substrate of claim 11, wherein the second metal electrode, the pixel electrode and the second insulating layer sandwiched therebetween form a storage capacitor. The touch-control circuit substrate of claim 12, wherein the second conductive electrode provides a common voltage level to the storage capacitor via the diode. 14 A touch-type electrowetting display device comprising: 096134505 Form No. A0101 Page 20/Total 40 Page 1003078302-0 1358658-100. March 09 Nuclear replacement page a carrier substrate; a circuit substrate disposed opposite to the carrier substrate, comprising: a transparent substrate including opposite first and second surfaces; a plurality of thin film transistor structures disposed on the second surface; and a capacitive touch The control structure includes: a plurality of first conductive electrodes disposed in parallel on the first surface of the transparent substrate; a plurality of second conductive electrodes disposed on the second surface of the transparent substrate in parallel with each other, and the first The conductive electrodes are insulated and intersect, and the plurality of first conductive electrodes, the plurality of second conductive electrodes, and the transparent substrate sandwiched therebetween form a plurality a non-conductive first fluid disposed between the hydrophobic edge/layer and the carrier substrate; and a conductive second fluid that is incompatible with the first fluid and disposed in the first fluid Between the carrier substrate And a plurality of data lines perpendicularly insulated from the scan line, the plurality of thin film transistors being disposed at an intersection of the data lines and the scan lines. The touch-type electrowetting display device of claim 15, wherein the plurality of first conductive electrodes of the capacitive touch substrate are disposed corresponding to the plurality of data lines. The touch-type electrowetting display device of claim 15, wherein the second conductive electrode of the capacitive touch structure is disposed between the adjacent two scan lines. </ RTI> </ RTI> </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; The touch-type electrowetting display device according to claim 18, wherein the diode includes a second semiconductor layer and a second electrode. a second metal electrode is disposed above the second conductive electrode, and the second metal electrode includes an opening, and the second metal electrodes on both sides of the opening are connected by the second semiconductor layer. The touch-type electrowetting display device of claim 19, wherein the second metal electrode and the second conductive electrode further comprise a first insulating layer. The touch electrowetting display device of claim 20, wherein the first insulating layer has a connection to the second &quot;metal/electrode and the a connection hole of the second conductive electrode. The touch-type electrowetting display device according to claim 21, wherein the thin film transistor structure comprises a gate, a drain and a first semiconductor layer, and the gate is provided with a second a surface of the first insulating layer extending over the gate, the first semiconductor layer being disposed on a surface of the first insulating layer corresponding to the gate, the source being disposed opposite the drain, and the first semiconductor layer Overlap. The touch-type electrowetting display device of claim 22, wherein the touch-sensitive circuit substrate further comprises a pixel electrode, the pixel electrode is connected to the drain, and is disposed The second conductive electrode is electrically connected to a portion of the second metal electrode. The touch-type electrowetting display device of claim 23, wherein the second metal electrode and the pixel electrode further comprise a second 096134505 form number A0101 page 22/total 40 Page 1003078302-0 1358658 25 26 27 28 100' year. March 09. The day shuttle is _ hundred edge layer. The touch-type electrowetting display device according to claim 24, wherein the second metal electrode, the pixel electrode and the second insulating layer sandwiched therebetween constitute a storage capacitor. The touch-type electrowetting display device of claim 25, wherein the second conductive electrode provides a common voltage level to the storage capacitor via the diode. The touch-type electrowetting display device of claim 14, further comprising a plurality of insulating walls, wherein the plurality of insulating walls are arranged in a lattice shape on the hydrophobic insulating layer. A touch-type circuit substrate comprising: a first conductive electrode arranged in parallel with a second surface of a transparent substrate, which comprises a first transparent surface; a first surface of the transparent substrate; a plurality of pixel regions, which are in a matrix d on the bottom of the tomb, each image The prime region includes: ΓίΓ©ρ@Γ^7 a common line that is perpendicular to the first lead and disposed on the second surface through the pixel region; at least one first insulating layer covering the common line; And a storage capacitor, comprising: a second metal electrode corresponding to a surface of the first insulating layer corresponding to the common line; at least a second insulating layer covering the surface of the second metal electrode; and a pixel electrode, It is disposed in the pixel area and covers the second insulating layer; 096134505 Form No. A0101 Page 23 / Total 40 Page 1003078302-0 1358658 100. March 09 Press the positive replacement page, wherein the public line is also The second conductive electrode, the second conductive electrode, the common line and the transparent substrate sandwiched therebetween form an inductive capacitor. The touch-sensitive circuit substrate of claim 28, further comprising a diode. The diode is disposed corresponding to the second conductive electrode. The touch-sensitive circuit substrate of claim 29, wherein the diode comprises a second semiconductor layer, the second metal electrode is disposed above the second conductive electrode, and the second metal The electrode includes an opening, and the second metal electrodes on both sides of the opening are connected by the second semiconductor layer. The touch-sensitive circuit substrate of claim 30, wherein the first insulating layer is disposed between the second metal electrode and the second conductive electrode. The touch-sensitive circuit substrate of claim 31, wherein the ' / first insulating layer has a connection hole connecting the second metal electrode and the second conductive electrode . 33. A process for a touch-sensitive circuit substrate, comprising the steps of: Providing a transparent substrate, the transparent substrate: comprising: a first surface and a second surface opposite to each other, and defining a matrix element region; forming a plurality of conductive electrodes on the first surface a second surface corresponding to each pixel region is sequentially formed: a gate and a common line, so that the two are respectively disposed on two sides of the pixel region, and the common line is perpendicular to the first conductive electrode, which also serves as a a second conductive electrode; at least one first insulating layer to cover the gate, the common line and the second surface; a first semiconductor layer, the corresponding gate is disposed on the first insulating layer; a source , a drain and a second metal layer, the source is opposite to the drain 096134505. Form No. A0101 Page 24 / Total 40 Page 1003078302-0 1358658 100 March 09 Revision _ page on the first semiconductor layer The second metal layer is disposed on the first insulating layer corresponding to a portion of the common line. The process of the touch-sensitive circuit substrate of claim 33, further comprising the step of forming a diode in each pixel region, the process of the diode comprising: forming the first The semiconductor layer simultaneously forms a second semiconductor layer on the surface of the first insulating layer corresponding to the part of the common line; Forming the second metal layer, simultaneously patterning the second metal layer to form an opening corresponding to the second semiconductor layer, and the second metal layer on both sides of the opening and the second semiconductor layer partially intersect Stack. 35. The method of claim 34, wherein the step of forming the first insulating layer further comprises forming a through-the first insulating layer. One of the first inspection holes, step 4, is set to -1. 37 . 38 . 096134505 The second metal layer is connected to the common line by the first connection hole. The process of the touch-sensitive circuit substrate according to claim 35, wherein in the vj Γ] p ], the second metal layer is formed [[Just up to the source, the drain, the first semiconductor] And a step of forming a second insulating layer on the surface of the insulating layer. The process of the touch-sensitive circuit substrate of claim 36, wherein after forming the second insulating layer, further comprising forming a second connection extending through the second insulating layer at the drain corresponding portion The steps of the hole. The process of the touch-sensitive circuit substrate of claim 37, wherein after forming the second connection hole, further comprising forming a pixel electrode, and forming the pixel electrode on the drain and the portion The second metal layer corresponds to the surface of the second insulating layer, and is electrically connected to the drain by the second connection hole. A process for a touch-sensitive circuit substrate, comprising the following steps: Form No. A0101 Page 25 / Total 40 pages 1003078302-0 39 . 1358658 100 years. March 09 provides a transparent substrate according to the replacement page, the transparent substrate includes a first surface and a second surface disposed opposite to each other, and defining a plurality of pixel regions distributed in a matrix; forming a plurality of first conductive electrodes arranged in parallel on the first surface; forming a second surface corresponding to each pixel region: The thin film transistor and a common line perpendicular to the first conductive electrode, the common line also serves as a second conductive electrode, and the common line, the first conductive electrode and the transparent substrate sandwiched therebetween form an induction capacitor. And forming a storage capacitor on the common line. 40. The process of the touch-sensitive circuit substrate of claim 39, wherein forming the thin film transistor structure further comprises the steps of: forming a gate that is combined with the common line a second insulating layer is formed to cover the gate, the/common wire J, and the second surface; a surface of the second semiconductor layer; The gate corresponds to the first insulating layer; and a source and a drain are formed, and the two are oppositely disposed on the first semiconductor, the . · total cnjo, The process of the substrate according to claim 40, wherein the process step t of the storage capacitor comprises forming a second metal layer on the first insulating layer corresponding to the portion of the common line; forming a second insulating layer On the second metal layer; and forming a pixel electrode on the second insulating layer corresponding to the portion of the drain and the portion of the second insulating layer, thereby causing the second metal layer, the pixel electrode and the second portion sandwiched therebetween The insulating layer constitutes the storage capacitor. The process of the touch-sensitive circuit substrate according to claim 41, wherein the second metal layer and the source and the drain of the thin film transistor are formed in the same process. 096134505 Form No. A0101 Page 26 of 40 1003078302-0 1358658 100. 03.09. Amendment. Page 43. The process of the touch-sensitive circuit substrate as described in claim 41, wherein After the step of forming the first insulating layer, further comprising the step of forming a first connection hole penetrating the first insulating layer. The process of the touch-sensitive circuit substrate of claim 43, wherein forming the storage capacitor and the thin-film transistor structure further comprises the step of forming a diode, the diode and the The storage capacitors are connected, and the process steps include: forming a second semiconductor layer on the surface of the first insulating layer corresponding to the common line to form an opening on the second metal layer corresponding to the second semiconductor layer, and forming an opening on both sides of the opening The second metal iridium overlaps the second/half, half, and the humiliating body 1 , and the second metal layer fills the first connection 4: is in contact with the collinear. 45. The process of the touch-sensitive subgrade according to claim 2, wherein the second semiconductor layer and the first semiconductor layer are formed in the same process, ;, Π &quot; 46 . The process of the fourth section of the patent scope The step of forming a second insulating layer and forming a hole penetrating through the second insulating layer at the gate corresponding to the second insulating layer. 096134505 Form No. A0101 Page 27 of 40 1003078302-0