TWI358126B - Contiguous microlens array, method of fabricating - Google Patents

Description

1358126 UMCD-2007-0159 24477twf.doc/p IX. Description of the invention: • Technical field to which the invention belongs: The present invention relates to an image recording apparatus, and more particularly to continuity (four) lenses (four), methods of making money, and the like; The CA cover can be applied to various image recording devices that need to be collected to the photosensitive member. ^ [Prior Art] In the conventional semiconductor image recording, such as the electric storage component (ccD) • In the complementary CMOS device (CM〇s) image recording device, in order to improve the sensitivity of the photosensitive element, usually A microlens array is placed over the array of photosensitive elements, with either microlens focusing the light onto a photosensitive element. • _® is a partial contour plot of a conventional microlens array, and Figure 1B shows the height variation of the tilted lens at different angles. Since it is conventionally known that each of the microlenses 110 is formed by heating and remelting a resist pattern formed on the base layer 1 大致, the contour of the lower half is square, As shown in Fig. 1A, the microlenses are made to have different curvatures in the cross section. See 1UB, 45. The curvature of the section (B-B,) is significantly greater than zero. Section (A-A'). Since the focal length is related to the radius of curvature, the microlens 11 of Baizhi has a problem of poor focusing characteristics. In addition, since the microlenses 110 are not connected to each other, there is a flat portion in between which there is no possibility of collecting light, and it is impossible to collect all the light rays for effective condensing. _The conventional microlens array also has problems with other components in the image recording device. The Tf is a photodiode (phGt〇di〇de) = CMOS image recording device. . 2 is a partial schematic view of a conventional image recording apparatus in which a microlens array 1 is fabricated on a base layer 10 of 5 1358126 UMCD-2007-0159 24477twf.doc/p • light, and the base layer 10 is coated with a color filter. The light film array 12 and other layers are disposed on the multilayer interconnect structure 2A. The multilayer interconnect, the bee structure 20 includes a first interconnect 22 and a second interconnect 24, and is located above the photodiode array 30. The eyepiece 4 of the CMOS image recording apparatus is disposed at a distance above the microlens array 100. Since the incident angle of the incident light 50 of the microlens 11〇 at the peripheral portion of the microlens array 100 is deviated by 90° (here and below, 9G, the direction is the normal direction of the image sensing wafer), the focus is not positive. Below, therefore, there must be a lateral displacement relative to the corresponding photodiode 30 so that the focus falls on the photo-pole body 30' as shown in FIG. However, the outgoing light 50a of the microlens ιι is thus blocked by the second layer inner wiring 24, and the recording accuracy of the peripheral portion of the f image is lowered. Although this problem can be solved by the displacement of the corresponding layer of the first layer 24, it will increase the power of the circuit. SUMMARY OF THE INVENTION An object of the present invention is to provide a continuous microlens array which can solve the problem of poor focus of conventional microlenses, or can further record the peripheral portion of the image without changing the position of the interconnect line. Sex. It is still another object of the present invention to provide a method of manufacturing a continuous microlens array which can be used to form the microlens array of the present invention. A further object of the present month is to provide a reticle that can be used in the present invention, a continuous micro (four) manufacturing method to define a continuous 镰 lens array. y must first specify that the so-called "Yi 幵 幵 y" refers to the number of sides greater than 4 below, as in the scope of the patent application, as in general cognition. 1358126 UMCD-2007-0159 24477twf.doc/p The continuous microlens array of the present invention comprises a plurality of microlenses in a continuous shape, wherein each of the microlenses is at a position above its connection with an adjacent microlens The contour contours are generally circular in shape, and contour contours of respective heights at abutment with adjacent microlenses are generally partially circular. In one embodiment, there is no gap between the microlenses in the continuous microlens array described above, and all of the light is collected. In another embodiment, the thickness of the junction of any two adjacent microlenses is close to 〇. In one embodiment, the continuous microlens array is positioned above a photodiode array with at least one interconnect layer between the latter. There may be an array of color filters between the at least one interconnect layer and the microlens array. In one embodiment, the microlens array is positioned above an array of photosensitive elements, wherein each microlens corresponds to a photosensitive element and has a substantially vertical cross section in each direction. The microlens array is divided into an intermediate split and a middle_external_at least-peripheral portion, the distinction being made according to different incident angles of light, wherein any microlens positioned in the middle portion is aligned with the corresponding The photosensitive element, any one of the microlenses located in the at least one peripheral portion has a lateral position 相对 relative to the corresponding photosensitive element. In this case, the surface of any one of the microlenses may be substantially a curved surface, such as a partial spherical surface. Further, the above-mentioned photosensitive element array may be an optical array or a charge coupled device (CCD) array. _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ The lens has an asymmetrical vertical cross-sectional shape. In this case, bit

• J _ I 7 1358126 24477twf.doc/p UMCD-2007-0159 The surface of each microlens between the sections can also be roughly a spherical surface. j. The method of manufacturing the microlens array of the present invention comprises the following steps. An array of photoresist patterns, wherein the upper view wheel of each of the photoresist patterns is circular or polygonal, and adjacent photoresist patterns are connected to each other or close to each other: a remelting step comprising heating the array of photoresist patterns The surface of the pattern is rounded and the adjacent photoresists are connected close to each other. Then, a shaping step is performed to fix the shape of each photoresist pattern. ^ Instance = Example = / The step of structuring uses ultraviolet light to illuminate the light with the array. In another embodiment, the shaping step includes a photoresist pattern P, which is set to a temperature higher than the second step of the reflow step: in one embodiment, before the reflow step, the surface of f There may be a non-uniform height distribution, the height of which is from the inward direction tt. The array of photoresist patterns can be defined by a single mask, and the mask can make the light-resistance distribution of the photoresist. In order to make the surface of the corresponding photoresist® (4) unevenly distributed. In the light-transfer wealth-(four) with uneven surface height distribution, 'each photoresist pattern may include a substantially circular or polygonal=section, and its periphery is substantially circular or polygonal: the = minute (four) - a circular segment, and when each resist pattern is wrapped or more than a % segment, the height of each segment is not -,

= decrement outward. The array of photoresist patterns can be formed by a single-mask, a two-transparent substrate, and a mask pattern array. In this mask pattern, the mother-to-smoke pattern corresponds to a photoresist pattern in the array of photoresist patterns. UMCD-2007-0159 24477twf.doc/p, the adjacent mask patterns are separated from each other. They are spaced apart such that adjacent photoresist patterns can be connected to or close to each other. Each of the reticle patterns has at least one annular dividing passage exposing a portion of the light transmissive substrate, which is substantially circular or polygonal. In one embodiment in which the parent photoresist pattern includes the aforementioned columnar portion and at least one of the peripheral annular segments, the center of the columnar portion of each photoresist pattern and the at least one annular segment are viewed from above. The centers of the photoresist patterns are substantially coincident, and the array of photoresist patterns is divided into an intermediate portion and at least one peripheral portion of the periphery thereof, the distinction being made depending on the angle of incidence of the light. Each of the photoresist patterns positioned in the intermediate portion is aligned with the corresponding photosensitive member, and each of the photoresist patterns positioned in the at least one peripheral portion has a lateral displacement relative to the corresponding photosensitive member body. Further, the above-mentioned photosensitive element may be a photodiode or a charge coupled device (CCD). In another embodiment in which each of the photoresist patterns includes a columnar portion and at least one annular segment thereof, each of the photoresist patterns in the array of photoresist patterns is aligned with its corresponding photosensitive element. When viewed from above, the center of the columnar portion of each of the photoresist patterns located at the intermediate portion and the center of the at least one annular segment substantially coincide with the center of the region where the photoresist pattern is located, and are in position In each of the photoresist patterns of the at least one peripheral portion, a center of the columnar portion and a center of the at least one annular segment are displaced relative to a center of a region where the photoresist pattern is located. It should be particularly noted here that the "ring segment" referred to in the present specification includes a complete circular segment and an incomplete circular segment. For details, please refer to the description of the following examples. The reticle of the present invention is used to define a continuous microlens array, including 1358126 UMCD-2007-0159 24477twf.doc/p ΐί Γ 图案 pattern _. In this reticle transfer, each reticle pattern defines _ microlenses in the microlens array: a photoresist pattern' The top view profile of the photoresist pattern is substantially circular. The adjacent reticle maps remain closed, and the separated linings can be connected to or close to each other. Each of the reticle patterns has a light-rate distribution such that the surface of the corresponding light pattern has a non-uniform hook distribution' whose face decreases from the inside to the outside.

In some embodiments, each of the reticle patterns has at least one annular dividing channel exposing a portion of the light transmissive substrate, the lands being substantially K-shaped or orthogonally polygonal. In the embodiment, the center of each of the annular lanes in each of the mask patterns coincides with the center of the mask II to define a mask of any one of the microlenses in the middle portion of the microlens array. The reticle pattern of any one of the microlenses used to define the at least one peripheral portion of the microlens array is aligned with respect to its corresponding photosensitive element. In another embodiment, the area where each reticle pattern is located is aligned with its corresponding photosensitive element to define the center of the annular dividing track in the reticle pattern of any one of the microlenses in the middle portion and the reticle pattern. The centers of the regions are substantially coincident, and in the reticle pattern for defining any of the microlenses in the peripheral portion, the center of each of the annular segments is displaced relative to the center of the region in which the reticle pattern is located. Further, the above-mentioned photosensitive element may be a photodiode or a charge coupled device (CCD). In the present invention, a contour contour of each height at which each microlens has a substantially circular contour contour at each height above its connection with an adjacent microlens and is abutted adjacent to the adjacent microlens. The general portion 1^58126 24477twf.doc/p ^00-2007.0159 is circular, so when the symmetry cross-sectional shape of the microlens in all directions, its cross-sectional shape at each angle = rate; = less than the conventional Square bottom _ microlens, and can achieve better focusing effect: ^In the embodiment without gap between microlenses, 'because the microlens array has a flat part, it can collect all the light to increase the light. Collect benefits. In the present invention - the embodiment, since the position is incident on the peripheral portion, the angle is first shifted by 9 〇. Too many of the microlenses have an asymmetrical shape, and the (10) (four) light limbs are corrected back to 9G. Left and right, so each microlens in the middle and the peripheral part can be aligned with the corresponding light one without having to be displaced. Therefore, the interconnecting lines located in the periphery of the microlens array do not have to be displaced, and the trouble of modifying the circuit design can be omitted. The above and other objects, features and advantages of the present invention will become more apparent from the following description of the preferred embodiments of the invention. 'The vertical section of each microlens in each direction has a large number of miscellaneous. The position of the microlens _ micro-transparent (four) is aligned with the corresponding light, and at least each of the micro-lenses is displaced by its lying H-pole to make its focus fall on the latter. Since the arrangement of Fig. 2 is such that the arrangement of the first embodiment does not result in the positional relationship of the respective microlenses and their respective photodiodes. In addition, since each microlens positioned in the middle portion of the microlens array is aligned with its corresponding photodiode, any microlens 11 1358126 UMCD-2007-0159 24477twf.d〇c/p is used as the inter-t portion. The slim sister _ and the heart define this photoresist diagram _ the reticle pattern is aligned with the photodiode of the microlens. Since each of the peripheral portions is slightly transparent, there is a lateral displacement relative to the corresponding photodiode, so that the photoresist pattern of the predecessor of the microlens as the peripheral portion and (4) the photomask Bf defining the photoresist pattern are inconsistent The photodiode corresponding to the microlens has a lateral displacement. Such a relationship should be widely known to those skilled in the art, so that the micro-lens array of the microlens array of the first embodiment of the present invention is not included in the pattern. The microlens array includes a continuous arrangement on the base layer 10. Each of the heights above the junction of each of the microlenses 31 〇 a ^ H ^ microlens 31 〇 a has a substantially circular = gate line profile, and each of the high yields at the point of contact with the adjacent microlenses The outline of the contour is roughly circular. As can be seen from Fig. 3A, each of the micro-transmissions has a substantially symmetrical cross-sectional shape in a vertical section in each direction: The curvature of the cross-sectional shape at each angle is substantially the same, as shown in Fig. 3β, and the radius of curvature of the section (Β-Β') is approximately equal to 〇. The radius of the section (Α_Α,) is half a heart'. In this case, the adjacent microlenses 310a are not completely in close contact with a small gap therebetween to expose a small portion of the base layer 10. 3C and 3D are partial feed lines ffi of the other two types of microlens arrays of the first embodiment of the present invention, respectively. Referring to Fig. 3C, the structure of the microlens array of this example is substantially the same as that of Fig. 3a of the previous example except that the adjacent microlenses 310c are completely connected without exposing the voids of the base layer 1〇. Since the adjacent microlenses in this example are continuous in all directions, all the light can be collected. ί 12 1358126 UMCD-2007-0159 24477twf. doc/p Please refer to FIG. 3D, the location of the microlens array of this example. The viewer is roughly married, except for the _ lens 3 & eye = ^ degree = 0, that is, the edge of the adjacent microlens 310d just touches the spoon. Because there must be some error in the continuous process, it is impossible to delete the edge of the mirror. All are in good contact, so consider the actual thickness of the adjacent microlens 310d in this example.

The efficiency of collecting light by the microlens can reach about 78%, which is still far from the figure, which is about 65% of the conventional dome microlens. 4A to 4C - The method of manufacturing the microlens array of the present invention is performed. / (b) An example in which the sub-riding is slightly formed to form a complete phase gap/edge is just connected.

Referring to Fig. 4A, first, a plurality of photoresist patterns 3G2/312 are formed on the respective microlens predetermined formation regions 60 of the base layer 1 to constitute a photo-resistance array. The top view profile of each of the photoresist patterns 302/312 is substantially circular, and adjacent photoresist patterns are connected (302) or close to each other (312) such that adjacent photoresist patterns can be connected after the post-dissolving step. Each of the photoresist patterns 3〇2/312 includes a substantially circular cylindrical portion 3〇2a/312a, and a plurality of rings having a substantially circular outer periphery and a lower height than the columnar portion 3〇2a/312a. The segments 302b(c)/312b' each of the annular segments 3〇2b(c)/312b have different heights and are decremented from the inside to the outside. It should be particularly noted here that the annular segment of the photoresist pattern 302 of the example of FIG. 4A(a) includes the complete annular segment 3〇2b and the peripherally incomplete annular segment 302c, both of which are described in the present specification and claimed. The range is generally referred to as a "ring segment" in which the incomplete ring segment 3〇2c is connected to the incomplete ring segment 302c of the adjacent photoresist 1358126 UMCD-2007-0159 24477twf.doc/p pattern 302; In the case of an incomplete circular segment 302c, the center refers to the center of an imaginary ring including itself. 4A(8)/(b), the center of the columnar portion 302a/312a of each of the photoresist patterns 3〇2/312 substantially coincides with the center of each of the annular segments 3〇2b(c)/312b' and corresponds to The centers of the lens predetermined formation regions 6〇 coincide. Referring again to Fig. 4A(a), the outermost annular segment 302c of the adjacent four photoresist patterns 302 encloses a small gap which exposes a small portion of the substrate 1〇.

Further, the shape of each of the t-column portion 302a and the annular segment 3 (four) (8) can be changed to a polygonal shape as shown by reference numerals 3〇2, 302a, 302b, and 302c' in Fig. 4D(a). Since the corners of the polygonal photoresist pattern are rounded at the subsequent remelting, the result is not far from the case of the circular photoresist pattern. The annular segment of the photoresist pattern 312 of the example of FIG. 4A(b) includes only the complete annular segment mb, wherein the complete annular segment 312b of the outermost ring and the complete ring of the outermost ring of the adjacent photoresist pattern 312 The segments 31 are close enough that the two photoresist patterns 312 can be joined after reflow. Column in this case

The shape of each of the portion 312a and the annular segment 312b may also be changed to a polygon, as shown by reference numerals 312, 312a, and (10) in Fig. 4D(b). Since the corners of the polygon = resist pattern are rounded in the return material, the result of the frontal photoresist pattern is not far behind. Referring to _ 4B, a return step 3 () 4 is performed, which includes heating the array of photoresist patterns to form a pattern of m2 per photoresist pattern. The surface of the photoresist pattern is 3〇6/316, and the heating temperature is, for example, m ^ to 140 C, and the time is, for example, about 1 〇 to 15 minutes. When the surface of the photoresist pattern 302/ has a height distribution of (4), the surface of the pattern 316 of 1358126 UMCD-2007-0159 24477twf.doc/p may approach a portion of the spherical surface 307/317. In addition, for the photoresist pattern array of FIG. 4A(a), the photoresist of the outermost annular segment 3〇2c of the four adjacent photoresist patterns 302 flows to a small gap therebetween during reflow. The towel is such that each micro-Wei has a curved surface that is completely filled with its predetermined formation area 60. For each of the photoresist patterns of Fig. 4A(b), the photoresist of the outermost annular segment 312b flows outward during reflow, and the adjacent adjacent photoresist patterns 312 are connected. Referring to FIG. 4C, the shaping step 3〇8 is subsequently performed to remove the solvent remaining in the surface rounded photoresist pattern 306/316, and the shape of each surface rounded photoresist pattern 306/316 is fixed to form a microlens. 3i〇c/ 310d. In the example, the cleaving step is to irradiate the array of photoresist patterns with ultraviolet light using a wavelength of ultraviolet light of, for example, about 365 persons, an intensity of, for example, about 3 (8) mJ/cm 2 , and a treatment time of, for example, about 1 to 15 minutes. In another example, the shaping step 308 includes further heating the array of photoresist patterns at a temperature that is higher than the reflow step 304, e.g., about 180 to 200 〇c, and the processing time is, for example, about 10 to 15 minutes. A top view of an example of a mask pattern in which the photoresist pattern illustrated in Fig. 4A(a)/(b) can be defined is shown in Fig. 5(a)/(b). The reticle comprises a transparent substrate 500/530 and a respective 502/532 corresponding to each of the microlens forming regions 〇 ❹ 光 51 51G/54(), which conforms to the reticle pattern of the microlens array Array. In the example of FIG. 5 (8), each of the mask patterns 51 is substantially a square unit pattern spaced apart from each other, and wherein each of the mask patterns 51 includes exposing a portion of the transparent substrate 500 to define a photoresist pattern. The ring segment of the ring segment 15 1358126 UMCD-2007-0159 24477twf.doc / p is the interval 520 'any two adjacent annular channels 52 〇 for the inner and outer ring relationship = shape stalk 520 includes a complete ring separation The channel 5 and its peripherally incomplete annular channel 520b 'the two ring channels are generally referred to as "ring ring" in the scope of the patent application described in this specification.

In addition, the adjacent mask patterns 510 are spaced apart from each other by a sufficiently small distance that the adjacent photoresist patterns are not broken. The width of each of the annular partitions 52 is sufficiently small, so that the ring-shaped channel pattern is not defined in the photoresist layer, but the effect of increasing the amount of illumination in the vicinity of the portion of the photoresist layer is increased. A portion of the photoresist layer corresponding to the nearby region is removed to form a plurality of annular segments which are stepped down from the inside to the outside, as shown in Fig. 4(a). In addition, since two partitions intersect at the center of the adjacent four mask patterns 510, the photoresist corresponding to the central portion is completely removed', leaving a small gap between the defined four photoresist patterns. As shown in Figure 4A(a).

In the example of FIG. 5(b), each of the reticle patterns 540 is a circular pattern spaced apart from each other, wherein each of the reticle patterns 540 includes an annular partition 550' exposing a portion of the transparent substrate 530. A complete annular dividing passage, and any two adjacent annular dividing passages 550 are in an inner and outer ring relationship. The adjacent reticle patterns 540 are spaced apart from each other by a moderate distance such that the adjacent photoresist patterns defined must be re-dissolved before they are connected. The annular partition 550 has the same effect as before, and the defined photoresist pattern has a plurality of annular segments which are stepped down from the inside to the outside, as shown in Fig. 4A(b). On the other hand, a top view of an example of a mask pattern in which the photoresist patterns shown in FIGS. 4D(a) and 4D(b) can be defined is shown in FIGS. 5(c) and 5(d), which is equal to I358126 UMCD. -2007-0159 24477twf.doc/p The circular circular dividing passage 52〇(a/b), the circular reticle pattern and the circular annular dividing channel 550 are changed into a polygonal ring shape, ( Contains 5 Shi, and 5 Shi,), a polygonal mask pattern _, and = shaped lane 550, and the winner. Further, the reference numeral 5 〇 0, / 530, which is a through-bottom, and the label 532, is the ς region on the reticle corresponding to the predetermined formation region of the micromirror, and the reference numeral 51 〇 is a square unit pattern corresponding to one microlens. Furthermore, according to the display and / or experimental results, the light layer

The absorbance, the number/width of the annular partitions, etc., can make the envelope surface of each disc-shaped portion of the photoresist pattern I approach a partial spherical surface having a predetermined radius of curvature, so that the photoresist pattern is formed by the rejuvenation step. The surface of the microlens approaches and has the partial spherical surface of the predetermined radius of curvature. I, /, have the above-mentioned f-things, because each bristle lens has its height at the abutment connection of the microlens adjacent to the height of the adjacent circular micro-joint The contour line porch is roughly symmetrical, so it can achieve a better focusing effect in the singularity of the singularity (four) rate difference = the known square bottom dome microlens. In addition, * When there is no gap between the microlenses, since there is no flat portion, all the light can be collected to increase the light collection efficiency. Second Embodiment 1 In the first embodiment of the invention, each microlens is aligned with its corresponding two diodes, and each microlens located in the middle portion of the microlens array has a vertical cross section at each direction. The shape has a substantially symmetrical shape, and the parent microlens located at the peripheral portion has an asymmetrical vertical cross-sectional shape. Cut 8126 UMCD-2007-0159 24477twf.doc/p # Taking a CMOS image recording apparatus as an example, Fig. 6 is a partial view of an example of a CM〇S image recording county containing the microlens array of the second example of the present invention. The structure of the CM 〇 S image recording apparatus of this example is substantially the same as that of Fig. 2 except for the position and position of each of the microlenses 61 〇 _ in the microlens array _. That is, the 'microlens array _ is also fabricated on the light-transmitting base layer. The base layer 1G includes a color light-emitting sheet array 12 and other functional layers; The multilayer interconnect structure 2〇 includes a first layer, a line 22, and a first layer interconnect 24, and is located above the array of photodiodes%=4G of the record position is placed above the microlens array_m At the office. The microlens (4) in the middle portion of the microlens array 600 has a substantially symmetrical shape in each direction, and the microlens 61 in the peripheral portion has a straight cross-sectional shape and a symmetric shape of the microlens 6i〇a. The reticle pattern has been described in detail above, and the apex offset direction of the 50-symmetric microlens 61 〇b/C depends on the incident light exit angle to shift the incident angle by 90. The excess incident light 50 has a correction of the bank* ΐΐ exit angle back to 90. The left and right's focus on the person directly below the left unscrewed microlens 610b is tilted to the right, so its vertex is to the left; the right point is to the right. The incident light of the mirror 610c is tilted to the left with respect to the normal line, so the top view and the partial contour line of the connected asymmetric microlens 6iGb (such as the surface of the #1 of 1), the asymmetric microlens 610c and the periphery are read. The structure of the asymmetric microlens on the other positions——, and the direction of the surface—can be deduced by analogy. 18 1358126 UMCD-2007-0159 The C610b of 24477twf.d〇c/p also has a substantially circular contour wheel in the case of its curvature with the adjacent microlens, two adjacent microlenses 610b It is also possible to connect close to 0. Cardiac recurrence Figure 8 shows several rims that can be used as microlenses. Each of the photoresist diagrams is located in the base layer of the second microlens pre-formation zone 6〇t, which contains a substantially circular-column section. Shape and height low purity (four) points 602a 'Eve clothing piece 602b/c, each ring segment 602b/c high yield, = complete 4 segments around the middle, Mingshu and (four) patent Fan ^: white „ The % fragment "" and the enemy of an incomplete ring segment refer to the center of an imaginary ring containing itself. When viewed, the center of the columnar portion 6〇2a and the annular sheet Γf are both private with respect to the region 60 where the photoresist pattern 602 is located. Further, it is also possible to form a polygonal columnar portion and a polygonal ring-shaped photoresist pattern, which should not be illustrated by the drawings. Fig. 9 is a view showing a cover pattern usable in the second embodiment of the present invention. The mask pattern is formed in the respective regions 902 of the transparent substrate _:= position in the predetermined formation region (10) of the corresponding microlens 6 and the mask pattern (not shown) for defining other micro-transmissions 1 A plurality of reticle patterns 91 〇. Each reticle pattern 910 is substantially a square unit pattern including a portion of the permeable plate _, which defines a ring segment of the photoresist. 19 UMCD-2007^0159 24477twf.doc/p includes a complete ring The divider 9 is applied to the crane with its outer periphery not separated. In addition, the size of the mesh is small enough that the defined masks U are open to each other. It should be specifically noted here that the completion of the loop 9 is in the center of this hypothetical ring of the incomplete ring-shaped compartment _, /, center 疋 & itself. : 92, the width is fine enough to make the photoresist pattern have a height • _ money _ ' as described in the related description of Figure 5 above. this

Li wants = light containing a polygonal columnar portion and a polygonal annular segment, and the shape of each ring_channel 92_ needs to be changed to a polygon, and this point should not be illustrated by the figure. In the second embodiment described above, since each of the microlenses of the intermediate portion has a substantially symmetrical shape in a vertical section in each direction, and an average human light in the peripheral portion is 90. There is an incorrect vertical cross-sectional shape in the passbook to correct the average exit twist to 9 (). Left and right, each microlens can be aligned with its corresponding photodiode without displacement. Therefore, the internal wiring located under the peripheral portion of the microlens array does not have to be displaced, and the design trouble can be omitted. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1A is a partial contour diagram of a conventional microlens array. Fig. m shows the surface height distribution of a microlens in different angular sections. 20 1358126 UMCD-2007-0159 24477twf.doc/p FIG. 2 is a partial schematic diagram of a conventional CMOS image recording apparatus. Fig. 3A is a partial contour diagram of a microlens array according to an example of the first embodiment of the present invention, and Fig. 3B shows a surface height distribution of one of the microlenses at different angular sections. 3C and 3D are partial contour diagrams of the microlens array of the other two examples of the first embodiment of the present invention. 4A to 4C illustrate a method of fabricating a microlens array according to a first embodiment of the present invention, wherein (a)/(b) shows an example in which the microlenses to be formed are completely connected without gaps/edges being connected; A polygonal photoresist pattern that can also be used to form similar microlenses is shown. Fig. 5 (a) / (b) shows an example of a mask pattern which can be used to define the photoresist pattern of Fig. 4A (a) / (b) in the first embodiment of the present invention. Fig. 5 (_) shows an example of a mask pattern which can be used to define a photoresist pattern of 4D(a)/(b) in the first embodiment of the present invention. Fig. 6 is a partial schematic view showing an example of a sinker image δ recording apparatus including the microlens array of the second embodiment of the present invention. Fig. 7 is a cross-sectional view showing a microlens of a micro-transparent lens according to a second embodiment of the present invention. The algebraic non-pairs of the microlens array manufacturing method of the second embodiment include a top view and a cross-sectional view of the front body of the number-symmetric microlens. I, I, Fig. 9, Η 7F, the second embodiment of the present invention, the pattern of the reticle pattern.心心圆 S芡九阻 [Main component symbol description] 21 1358126 UMCD-2007^0159 24477twf.doc/p 10 : Base layer 20: Multi-layer interconnect structure 30: Light diode 50: Incident light 60: Micro-mirror is scheduled Forming area 12 · Color enamel arrays 22, 24: first and second layer interconnects 40: eyepieces 50a, 51: outgoing light 100, 600: microlens arrays 110, 310a/c/d, 610a/b/c : microlens 302, 302', 312, 312', 602: photoresist pattern

302a, 302a', 312a, 312a', 602a: cylindrical portion 302b, 302b', 312b, 312b', 602b: complete annular segment 302c, 302c', 602c: incomplete annular segment 304: reflow step 306, 316: surface rounded photoresist pattern 307 '317: spherical surface 308: shaping step

500, 500', 530, 530', 900: transparent substrate 502, 502, 532, 532', 902: upper mask region 510, 510', 540, 540', 910: reticle pattern 520, 520' , 550, 550', 920: annular dividing lanes 520a, 520a', 920a: complete annular dividing lanes 520b, 520b', 920b: incomplete annular dividing lanes 22

Claims (1)

1358126 UMCD-2007-0159 24477twf.doc/p X. Patent Application Scope 1. A continuous microlens array comprising a plurality of microlenses in a continuous shape, wherein each of the microlenses is adjacent to the microlens The contour contours of the respective heights above the joint are substantially circular, and the contour contours of the respective heights at the point of abutment with the adjacent microlenses are substantially circular. 2. The continuous microlens array of claim 1, wherein the thickness of each joint is close to 〇. 3. The continuous microlens array of claim 1, wherein the continuous microlens array is disposed above a photodiode array and has at least one interconnect layer between the photodiode array. 4. The continuous microlens array of claim 3, wherein there is a color filter array between the at least and interconnect layers. 5. The continuous microlens array of claim 3, wherein the microlens array is located above the photosensitive element _, and wherein each of the microlenses corresponds to a photosensitive element in the array of photosensitive elements, wherein The dipole-mirror mirror is substantially symmetrical in all directions; the microlens array is divided into an intermediate portion and a peripheral portion located outside the intermediate portion, which is determined according to the angle of the light incident. Bit = Μ part of the — tilt lens pair; and corresponding two::: any one of the microlenses relative to it: mirror array ' 23 1358126 UMCD-2007-0159 24477twf.d〇c / p 7. The continuous microlens array of clause 6, wherein the surface of any one of the microlenses is substantially a portion of a spherical surface. 8. The continuous microlens array of claim 5, wherein the photosensitive element array is a photodiode array or a charge coupled array. 9. The continuous microlens array of claim i, wherein the microlens array is positioned above the array of photosensitive elements, and wherein each of the microlenses corresponds to a photosensitive element in the array of photosensitive elements, wherein: The area where the microlens is located is aligned with the corresponding photosensitive element, and the microlens array is divided into a middle portion and at least a peripheral portion located around the inter portion (the difference is determined according to the angle of the light incident; Any one of the microlenses located in the inter-portion portion is substantially symmetrical in all directions; and the facet = the vertical cross-sectional shape of the at least one side portion of the tilting lens. Ah H The continuous micro-transparence described in item 9 of the patent scope, /, the surface of any one of the microlenses is substantially a curved surface. ^ The continuity micro-transparence described in item 1G of the patent scope is a substantially spherical surface of the surface of any of the microlenses in the intermediate portion. @ Patent fen item 9 of the continuous micro-transparent ' /, the photosensitive element county - light diode _ element array.屯灯祸13. A method for manufacturing a continuous microlens array, comprising: 24 1358126 24477twf.doc/p UMCD-2007-0159 r __ case array' wherein each of the photoresist patterns has a top view outline = circular or polygonal, and adjacent photoresist patterns are connected or close to each other; ^ a remelting step comprising heating the array of photoresist patterns to turn off the parent-resist pattern and make each other Connected to the case; and perform a shaped step to fix the shape of each photoresist pattern. Continuous microlens array as described in claim 13 of the patent scope The method of forming the mask of the towel uses ultraviolet light to illuminate the array of photoresist patterns. The 'is method of the continuous microlens array of claim 13, wherein the step of forming comprises further heating the array of photoresist patterns and the setting step is higher than the temperature Step set by 0 The method of manufacturing a continuous microlens array according to claim 13, wherein before the re-dissolving step, the surface of each photoresist pattern has a uniform southness distribution, the height of which is Diminishing inside and outside. 17. The method for manufacturing a continuous microlens array according to claim 16 of the patent application, wherein the towelage resistance is defined by a single array of photomasks, and the photomask is corresponding to any light_ The light attack has a light transmittance distribution such that the surface of the photoresist pattern has the height distribution of the unevenness. The method of manufacturing a continuous microlens array according to claim 16, wherein each of the photoresist patterns comprises a substantially circular or polygonal columnar portion, and a periphery thereof is substantially circular or polygonal. And at least lower than at least one annular segment of the columnar portion, and when each of the photoresist patterns 25 1358126 UMCD-2007-0159 24477twf.doc/p includes two or more annular segments, each The height of the loop segments is different and decreases from the inside to the outside. The array of 18 micro-lens array patterns is defined by a single-mask, which is an array of masks and mask patterns, and in the mask pattern; each mask pattern corresponds to a photoresist One photoresist pattern resist pattern in the pattern array is spaced apart from each other by a distance such that adjacent first resistance patterns are connected to or close to each other; and at least one exposed portion of the circular light ί pattern The cleavage knife is shaped like a circular or polygonal shape. Above the red (10) lens array, and the heart = array is formed in the photosensitive element array photoreceptor i, = a photoresist pattern corresponding to a top view of the photosensitive element array, each of the photoresists and the At least one ring-shaped financial center is roughly the same as the central portion of the middle portion and is located in the middle portion _ = aligning with it; aligning its _'_light element; the mother--a resist pattern of money Each of the plurality of photoresist patterns of the photoresist side (four) has a lateral displacement of the corresponding photosensitive element. </ RTI> </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; ^ 2 = The continuous microlens array method of claim 18, wherein the light_form is formed on the photosensitive element array and wherein each of the photoresist patterns corresponds to one photosensitive element in the photosensitive element array , wherein the area of each photoresist _ of the photoresist pattern is aligned with the corresponding photosensitive element; the light_case _ is divided into - the middle part and the inter-part part are at least - The peripheral portion 'this distinction depends on the angle of incidence of light; when viewed on k, the center of the resistance of each photoresist pattern located in the inter-shield portion and the center of the at least one annular segment are substantially the same as the pattern The center of the region is coincident; and the radiant R gentleman's side is viewed as 'each light at the at least one peripheral portion, the center of the column portion and the center of the at least one annular segment being white relative to the photoresist There is a displacement in the center of the area where the pattern is located. The method of claim 2, wherein the array of photosensitive elements is an array of photodiodes or an array of electrically coupled elements. A reticle for defining a continuous microlens array, comprising a light transmissive plate and an array of reticle patterns, wherein in the reticle pattern array, each reticle pattern defines the microlens a photoresist pattern of a microlens in the array, the top view of the photoresist pattern is substantially circular 27 1358126 UMCD-2007-0159 24477twf.doc/p or polygon; adjacent reticle patterns are separated from each other The opening distance is such that the corresponding photoresist patterns can be connected to or close to each other; and each of the mask patterns has a light transmittance distribution, and the surface of the corresponding photoresist pattern can have an uneven height distribution 'its height Declining from the inside out. The reticle of claim 24, wherein each of the reticle patterns has at least one annular partition </ RTI> having an exposed portion of the permeable substrate that is substantially circular or polygonal in shape. 26. The reticle of claim 25, wherein the microlens array is formed over an array of photosensitive elements, and one of the microlenses in the array of lenticular lenses corresponds to an array of reticle patterns. a mask pattern and a photosensitive element in the array of photosensitive elements; in a mother mask pattern, a center of each of the annular partitions coincides with a center of the mask pattern; the microlens array is divided into an intermediate portion and At least one peripheral portion located at a periphery of the intermediate portion, the distinction being made according to a different angle of incidence of light; a reticle pattern defining any one of the microlenses of the intermediate portion being aligned with the corresponding photosensitive element; and The reticle pattern of any of the microlenses of the peripheral portion has a lateral displacement relative to its corresponding photosensitive element. 27. The reticle of claim 26, wherein the array of photosensitive elements is an array of photodiodes or an array of charge coupled elements. 28. The reticle of claim 25, wherein the microlens array is formed over an array of photosensitive elements, and wherein the 28 1358126 UMCD-2007-0159 24477 twf.doc/p microlens array a microlens corresponding to the reticle pattern reticle pattern and the photosensitive member in the sensitization _; oblique; = the area of each reticle pattern in the pattern is aligned with the corresponding photosensitive element; p Aj 千八 The microlens array is divided into at least one peripheral portion of a middle circumference. The 丨 is located outside the middle to define the intermediate portion according to different angles of incidence; wherein each of the annular partitions ^ H 任 微 微 微 微 大致 大致 大致 大致 大致 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微 微The center of the area where the light is located has a 2-way center relative to the reticle pattern 29. As in the patent application, the Array of elements is a photodiode barrier or "= hood Du. σ 凡 Array. 29