TWI352260B - Device for generating haze on a photomask - Google Patents

Abstract

Provided is a device for generating haze on a photomask having an improved structure capable of irradiating a laser beam of predetermined energy intensity onto a photomask until haze is generated, accurately obtaining the amount of laser beam energy accumulated on the photomask, and controlling an environment in a process chamber. The haze generating device includes: a laser emission unit for emitting a laser beam; an attenuator for controlling energy intensity of the laser beam; an optical system for processing the laser beam so that the laser beam has a predetermined shape and energy distribution; a process chamber having a window installed at an upper portion thereof and formed of a transparent material, through which the laser beam passes, and a space formed therein to dispose the photomask and fill a process gas, the space being separated from the outside; and an attenuator control unit for controlling the attenuator so that the laser beam of predetermined reference energy intensity is irradiated onto the photomask based on incident energy intensity of a laser beam incident to the window.

Description

1352260 26442pjf.doc IX. Description of the Invention: [Technical Field of the Invention] The present invention relates to a device for generating blur on a reticle, and more particularly to such a device for generating blur on a reticle, and It is a growth defect artificially generated on the surface of the reticle to find out the cause of the ambiguity. [Prior Art] At present, with the high integration of semiconductor elements, a light source that emits a laser beam having a wavelength of 2 〇〇 μ or shorter is used for the lithography process. For example, an ArF excimer ((4) Cong) laser that emits a laser beam having a wavelength of 193 nm is widely used. However, when a laser beam having a wavelength of 2 〇〇 nm or shorter is projected onto the reticle, a growth lag is generated on the surface of the reticle. As a result, the performance of the reticle deteriorates and the life of the reticle is also examined. Therefore, in order to study the fuzzy generation and provide protection, it is necessary to artificially generate the model money. The method of j 1 is a schematic diagram showing a conventional device for generating blur on a reticle. Referring to Fig. 1, the 'blurring generating device includes a laser emitting unit 1G that emits a quasi-molecular laser beam having a wavelength of i9^11; processing the laser beam to make/by the beam, having a shape and energy distribution (such as playing The optical system of ❽distribution), and the processing chamber 40 in which the reticle 1 is disposed. The optical system includes a plurality of mirrors m, and 33·, a telephoto of processing the shape of the laser beam = 34, a homogenizer that uniformly processes the energy of the laser beam, and a focusing lens 36 that adjusts the focus and size of the f beam. '. The windows 4 and 42 are mounted to the upper and lower portions of the 40, and the laser beam passes through the windows 4 and 42. Beam splitting 1352260 26442pif.doc (beam splitter) 501' and 51Γ and energy meter 5〇2, and 512

Placed above and below the processing chamber 40', the energy meters 502' and 512' measure the energy of the laser beam reflected from the beam splitter. A charge-coupled device camera 49' is disposed above the process chamber 4〇 and monitors whether blurring occurs on the surface of the reticle. The processing chamber 4 is also connected to a gas supply 45' for supplying gas and a moisture supply unit 6' for controlling humidity. Similarly the net energy of the laser beam irradiated on the reticle (four) coffee (four) by

The laser beam energy measured by the 502' and the transmittance of the beam splitter 5〇r =, and the cumulative energy of the laser beam irradiated onto the reticle before the blur generation is generated The blur produces each of the net energy of the previously irradiated laser beam. Excessive μ/Γ (4) The number of instances has the amount of energy generated by the blur and the environmental conditions, system, and humidity. Therefore, these variables deer should be rided by the Institute (4). Research nine

However, in the above-described blur generating device, the desired thunder of the energy can be blurred before the lifetime, when the laser beam reacts with oxygen, the laser beam; ^ = on the mask. Also, the chrysanthemum is lost by the accumulation of the lid in the processing chamber. This energy loss has errors such as picking up' thus the net energy and cumulative energy of the laser phase. In addition, the beam is irradiated to the mask before the blur is generated. The laser beam emitted from the laser emission unit 1252260 26442pif.doc w is irradiated into the processing chamber 4〇| by the optical processing chamber 401 without being adjusted by the optical processing chamber 401. Material (4) Beam / 1 = ^ level. As a result, even if the degree and humidity are: gas, the processing room is not considered in the processing room. "At this time, because the net energy and the accumulated energy in the study cannot be refined, the beam method is before the blur generation. If the household 彳 f research nine is not good. The king of the control room 40, the environment due to: and split _. Material, learning] J, window ^ energy reduction. Therefore, the net energy and tired of the laser beam The beam and the energy intensity of the laser beam cannot be "improved == === the mask is molded onto the reticle, accurately measuring the tiredness: the size of the beam and the environmental factors in the control chamber. Scouring device, energy intensity; optical system 'processing laser beam to make 1352260 26442pif.doc shape and energy distribution; processing chamber, having a window formed by a transparent material installed in the processing chamber and a beam formed in the processing chamber through this Window 'This space can be set to fill the mask and fill the process: = green and attenuator control unit · based on the intensity of the incident energy into the '2 bundles' (4) attenuator, so that a predetermined degree of laser beam is irradiated onto the reticle. According to the invention, the laser beam impinging on the reticle == the squeezing of the laser beam that was previously irradiated onto the reticle. Similarly, the laser beam of predetermined energy intensity is continuously illuminated. The humidity in the processing chamber can be controlled as desired. [Embodiment] An embodiment of the present invention will be described in detail with reference to. The structure of the production device on the reticle according to the embodiment of the present invention (4)-*. 3 is a block diagram showing the control of the over-subtractor. The D-square block is not intended to 'show the alarm single-frame diagram 2 when the squeegee on the reticle is generated as shown in FIG. The illustrated processing chamber _ (four) degrees, according to FIG. 2 to FIG. 5 'The device according to the embodiment of the present invention includes the laser emitting unit 1Q and the attenuator 2 ^

= 5 ^The chamber 4 G, the monitoring unit 49, the energy measuring units 50 and 5 are 1 and the rolling supply unit 6〇. ? M 1352260 26442pif.doc The laser emitting unit 10 generates and emits a laser beam. _ m emission wavelength is · nm or shorter wavelength; for example, excimer laser beam with a wavelength of 193 nm. The attenuator 20 attenuates and controls the energy of the life beam emitted from the laser emitting unit 1 . The intensity of the beam is controlled by adjusting the angle of the attenuator 20. J Xueyu 30 processes the laser beam so that the laser beam has a predetermined shape and a monthly b罝 distribution. The optical system 30 includes a first lens 31, second and third lenses 33, each of which reflects a f-beam; a telescope 34 disposed between the first lens 31 and the second lens 32 to process the shape of the laser beam, a homogenizer between the second lens 32 and the third lens 33 to uniformly process the energy of the #beam; a fleld lens 36 disposed between the homogenizer 35 and the third lens 33; and disposed on the objective lens (4) A mask 37 between the third lenses 33 prevents a beam formed by diffraction of the laser beam; and a projection lens (4) 438 that adjusts the focus of the laser beam. In the present embodiment, the laser beam whose energy intensity is adjusted by the attenuator 20 is incident on the optically pure 3G for processing and is emitted toward the processing chamber 4Q. A space isolated from the outside is formed in the processing chamber 40. The gantry (not shown) is mounted in the 4S chamber 40, and the hood is mosquitoes on the gantry. The windows 41 and 42 are respectively installed at the upper and lower portions of the processing chamber 4Q. Each of the windows 41 and c is formed of a transparent material (e.g., Boma) through which the laser beam can pass. Therefore, the laser beam processed by the optical system 3Q passes through the upper window 41 and is irradiated onto the reticle. The same processing chamber gas is used to fill the processing gas, for example, ammonia (NH3), oxygen (〇2), and nitrogen. ), a mixture of sulfur dioxide (SQ2), and the like. The measuring unit 12 1352260 26442pif.doc The gas sensor 43 of the processing gas component ratio in the chamber and the processing sensor room 44 in the processing chamber 4G are installed in the processing chamber 4G and are installed above the processing chamber 40. The monitoring unit 49 produces blurring on the surface of the reticle 1. In the present embodiment, the = camera is used as the monitoring unit 49. The electric moon measuring units 5A and 51 are respectively installed below the processing chamber 4''. Here, the selling unit 5 includes a beam splitter 5 〇 and an energy meter 5 〇 2 measuring the energy of the laser beam reflected from the 5 〇 1 , and the energy measurement list = 511 = Measure and measurement The beam splitter 511 reflects 能量 512 ° disposed in the processing chamber 4 的 above the energy meter 502 under the energy meter 4; the east energy 'and is set in the processing chamber den 25 to measure the laser emitted from the lower window 42 East can set. Air supply = into the space of the processing chamber 4 。. When the power is applied by the wet, 61 and the heating element 62 are applied, and at the 5, the heat is generated to heat the water pipe 61. The water pipe 61 26 is connected to the process chamber 4G. The water pipe 61 is supplied by a gas supply 6=2 P to a gas supply for supplying an inert gas (for example, nitrogen). When the body is supplied to the water pipe 61 via the θ gas supply pipe 64, the second heat is formed by the chamber To. The moisture is supplied through the moisture supply pipe 63, and the amount of the inert gas in the amount of water supplied to the process chamber 40 is further changed. That is, the supply to the same i, when the second, the more, the more gas is supplied to the processing chamber 4G. The field 67 heat-generating heater 67 is mounted on the outer surface of the moisture supply (S) 13 26442pif.doc tube 63. The heat generated in the inner portion of the moisture supply pipe 63 prevents the dew (four) air pipe 66, and the first soil; the wet milk supply pipe 63 is connected to the exhaust gas supply pipe 63 and the exhaust pipe 6 ° The second valve (f) is installed in the flow controller of the wet controller 041 and the second 'interval door to control the flow rate of the inert gas, respectively. The unit 40 is connected to the flow rate controller 641. The internal supply of the room, the gas supply 45, the gas supply pipe: another == to the gas room 40, by the & The gas inside. The fourth valve 4 2 2 official 47 'exhaust pipe 47 discharge processing room dynamic force controller 48 amps on the body supply pipe 46, and self-controlled exhaust, coffee controller 48 sound, or crying The pressure within the processing chamber 40 is maintained. Within the body 39, the shell % light ^ ^ 3 〇 and the upper splitting should be placed in the shell gas (for example, nitrogen and flow material 392. When inactive in the inert wrap guard # Han upper knife bundle state 5 〇 ι Storm optical system material (10) ride reducer 2 〇, will not reduce m; l bundle is 501 of the dye. Therefore, the energy of the laser beam splitting under the cry 5] = intraoperative is impossible to expect. Similarly, due to inflow 埤5U 3 is in a separate housing 513. The casing 513 is formed and contaminated by the inflow of inert gas through the inflow bee 514. The gas '(4) is made up of a laser beam to the lower beam splitter 5n, X-ray II In the vicinity of the upper and lower windows 41 and 42 14 (S > 26442pif.d〇c and respectively toward the window 41 and the beam, it is possible to prevent the inert gas from being emitted due to i*42, so that when the illuminating thunder is further 'according to this; f contamination of windows 41 and 42. Storage unit 7r, -. calculus. _ Λ 的 的 的 模糊 模糊 8 8 8 8 8 8 8 8 8 8 8 8 8 早 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 、 Store the energy loss rate of the beam of the hired beam. At this time, the ratio of the laser beam to the ratio of the weight of the component of the gas Shows the value of the degree of reduction of the lightning. The energy of the laser beam is reduced when the energy is reduced, but except for oxygen; most of the loss is caused by the energy loss rate of the oxygen beam, which can be changed by the composition ratio of the body. The calculation unit 7 = obtained empirically. Energy loss; two; the incident energy intensity and the degree of the laser beam, wherein the incident energy intensity is read from the storage unit 71 by the net energy loss rate of energy = two and the seed beam is The energy loss rate table _ laser weight = the energy of the read laser beam of the loss of the component of the gas, this component is more specific than the processing of the wire processing room, in the actual _ towel calculation, pass the strict 11 43 measurement 'And the rate of loss. In addition, the calculation unit 70 2 takes the energy loss intensity of the laser beam. (3) The formula 1 calculates the net energy of the laser beam

丄JJZZOU 26442pif.doc Formula 1

, (1M -110β^ι μΊΓ Ε) Table 2 can Ρ the net energy intensity of the laser beam on the cover 1, showing the transmittance of the beam splitter 5〇1, the incident energy intensity of the f beam, Calculating the transmittance of the energy loss 41 of the laser beam of the laser beam and α as described above, the laser caused by the processing gas is used to reduce the amount of carbon in the processing chamber 4 Reduce the lasers that are considered to be more accurate in the calculation of the laser; the attenuation energy of the attenuator control unit can be used, and the unit 73 of the laser beam of the 5th is based on the calculation ^. In the present embodiment, The attenuator controls 2〇. That is, the attenuator controls the field single-shot energy intensity to control the attenuator's predetermined reference energy (6). The weight of the shot is the angle between the intensity of the laser beam and the net energy intensity of the laser beam. t raw = before will have a strong reference energy (four) thunder = two 亢 卓 1 on the 冋 冋 , 冋 冋 冋 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , Time === The intensity of the transmitted energy of the beam is generated in the blur_the intensity of the emitted energy of the if beam (4) 4 reported 4 readings including memory (4), determine the illusion 1 6 1352260 26442pif.doc Police 83. Time: === reference value of the processing condition. This degree and the ratio of the two components irradiated to the mask j and the wetness and the reference value are determined in various treatments 2 = energy intensity, and The intensity of the emitted energy of the laser beam at the time of paste. The model is generated on ^ and the reference value is _ rational condition == value by the actual humidity at the Si beam H ^ _ processing her split ratio and processing chamber processing The reference value of the condition, and indeed corresponds to the time when the = value is the same as the fuzzy production blur generated on the surface of the reticle ^ when the two are 疋, when

The f__ can be emitted (4) = the lower window U The warning is given to the researcher. In the second example, the police 83. The determiner 82 is raised by 4° when the blur is generated. The (four) signal is output so that the sound is returned to the sound. The element 90 further includes a humidity control unit according to the present invention, and the humidity control unit 90 maintains the phase of the thief based on the humidity in the processing chamber 4 (humidity). The humidity control solution includes .=631, the second door 661, and the third door, 92〇, and the flow controller control unit that controls the flow controller 641. The humidity measured by the humidity sensor 44 is equal to or less than a predetermined parameter.

17 1352260 26442pif.doc When the humidity is measured, the valve control unit 91 controls the first and second tips 63 and 661 to open and close, respectively, so that moisture is supplied to the space of the processing chamber 4, in addition, when the humidity sensor 44 measures The humidity exceeds the predetermined reference wet and the door control unit 91 controls the first and second doors 631 and .661 to be closed and (4), respectively, so that the water pipe 61_moist gas is discharged by minus f% to prevent the heart from being supplied into the processing chamber 4 Space. Further, when the blur generating device 100 is operated, the valve control unit 91 controls the third door (4) to open the door so that the inert gas supplies the water pipe 61 of the gas supply unit. Before π ΐ = = raw device 1 GG operation, the third valve 642 is opened, and the t body is discharged through the exhaust pipe 66 to thereby remove water formed in the moisture supply. Thus, a fixed amount of moisture is supplied throughout to maintain the desired humidity. From the section to 40, = flow control (four) control element 92 can increase or decrease the moisture supply to =. The flow controller control unit 92 controls the flow controller 641 based on , by value = two quantities _ humidity, so that the '2 humidity can be the same as the reference humidity in a short period of time. In this implementation, it is not possible to predict the cumulative energy of the laser beam that is irradiated onto the reticle prior to the generation of the net beam of the laser beam by the energy loss of the beam of the processing gas. Μ 疋 疋 352 352 1352260 26442pif.doc In addition to the conventional technology, the reference energy _ angle can be masked before the extravagant ambiguity is generated. The beam is irradiated to the luminosity: the degree is desirably controlled. Similarly, the addition of the outside of the moisture supply pipe can be introduced into the treatment chamber by the dew on the inside of the gas supply pipe to the humidity formed in the space of the wetroom. j 至 至 , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , H by mouth and distribution list = sub-example: it single: and humidity control net energy intensity, and control sound reading. . The energy intensity of the laser beam from the r to the first cover is the same, but also the other two or two degrees of the processing gas involved in the processing chamber; the loss is determined by the calculation unit 72a to determine the net energy intensity f. In general, the environmental conditions of the laser beam, such as ^^ factors, including the temperature and humidity caused by long-term use, are only considered by the processing gas. Changed. Thus, when the net energy of the laser beam on the cover is lost, the light is irradiated to the light. Thus, in the present embodiment 19 Ι 3!) 2 Ζ〇υ 26442 pif. doc, the correction unit 75 is further included so that the processing chamber 4 can be corrected. The environmental conditions within the field cause the second emission energy of the field to control the attenuation and the temperature and humidity of the H, and the composition ratio of the processing gas in the processing chamber of the beam is

:= The intensity of the emitted energy of the beam is equal to or less than the default value of the output signal 72a. The receiving binary is corrected for the energy of the laser beam read from the storage unit 71. The τ column such as 'based on the difference between the emitted energy and the standard value, sets a proportional constant corresponding to each difference, and multiplies the proportional beam constant by the read field beam loss rate to correct the read laser The energy loss and rate of the beam. At this time, the difference between the amount of laser energy of the laser beam and the amount of laser beam energy is set, and the decrease of the energy of the f beam is caused by the processing gas in the processing chamber. Generally set within a range less than this difference.

As described above, when the emission energy intensity of the equivalent measured laser beam is equal to or smaller than the standard value, the correction signal is output to the calculation unit 72a, and > the different unit 72a compensates the energy loss rate of the read laser beam. The net energy intensity of the laser beam irradiated onto the reticle 1 is calculated based on the compensated energy loss rate and the incident energy intensity of the laser beam. Meanwhile, when the emission energy intensity of the equivalent measured laser beam exceeds the standard value, the correction signal is not output, and the calculation unit 72a calculates the illumination based on the energy loss rate of the read laser beam and the incident energy intensity of the laser beam. The net energy of the laser beam on the mask 1 is 20 (3) 2260 26442pif.doc Again, in the calculation process of 'several different early 72a, formula 1 is used. In Equation 1, when the transmitted energy intensity is equal to or less than the standard value, the energy enthalpy of the corrected laser beam is indicated, and the chirp is estimated to indicate the energy loss rate of the read laser beam. &~ The net energy intensity input attenuator control of the derivation beam is controlled by the sub-attenuator control unit 73a to control the attenuator 2〇 so that the net energy of the first pupil is the same as the reference energy intensity. One; 4a £ ^ Reduced to calculate the laser's brook 2 耵 耵 的 的 的 妓 妓 耵 耵 耵 耵 耵 耵 耵 耵 耵 耵 耵 耵 耵 耵 耵 耵 耵 耵 耵 耵 耵 妓 妓 妓 妓 妓 妓 妓 妓 妓 妓 妓 妓 妓 妓 妓 妓 妓The tiredness = energy and the fuzzy generation before the photo has been referred to the specific embodiment 2 == item technique, the understanding of the specific = details of the it day (four) material and the form of the form and the simple description of the figure Ξ! A structure for drawing a conventional device that does not blur on a reticle. Fig. 2 is a view showing the configuration of a device for blurring according to the present invention. Figure 3 is a block diagram showing the control process for the attenuator in the apparatus for generating blur on the reticle 1352260 26442pif.doc shown in Figure 2. Fig. 4 is a block diagram showing an alarm unit that issues an alarm when blurring occurs in a device that produces a blur in the reticle shown in Fig. 2. Fig. 5 is a block diagram showing the humidity control unit for controlling the humidity in the processing chamber shown in Fig. 2. Figure 6 is a block diagram showing the control process of the attenuator control unit in accordance with another embodiment of the present invention. [Main component symbol description] • 1 : Photomask 10': Laser emitting unit 10 (V: Device for blurring on the mask 3: Lens 32': Lens 33': Lens 34': Telescope 35': Uniform 36': Focusing lens ^ 40': Processing chamber 4Γ: Window 42丨: Window 451: Gas supply 49': Charge coupled component camera 50Γ: Beam splitter 502, Beam splitter 51Γ: Energy meter 22 1352260 26442pif.doc 512': Energy meter 60': moisture supply unit, 10: laser emission unit....100: device for generating blur on the reticle 11: gas emitter 20: attenuator 3 0: optical 糸31: first lens φ 32 : second lens 33 : third lens 34 : telescope 35 : homogenizer 36 : objective lens 37 : mask 38 : projection lens 39 : housing 391 : inflow 埠 392 : outflow 埠 40 : Processing chamber 41: window 42: window. 43: gas sensor 44: humidity sensor 45: gas supply 46: gas supply tube 23 1352260 26442pif.doc 461: fourth valve 47: exhaust pipe - 48: automatic pressure controller _ 49 : monitoring unit. 50 : energy measuring unit 501 : beam splitter 502 : energy meter 51 : energy measuring unit • 511 : splitting 512: Energy meter 513: Housing 514: Inflow 埠 515: Outflow 埠 60: Moisture supply unit 61: Water pipe 62: Heating element 63: Moisture supply pipe • 631: First valve 64: Gas supply pipe 641: Flow rate Controller 642: third valve. 65: gas supply 66: exhaust pipe 661: second valve 67: heater 1352260 26442pif.doc 71: storage unit 72: calculation unit - 72a: calculation unit '73: attenuator Control unit. '73a: attenuator control unit 75: correction unit 80: alarm unit 81: memory • 82: determiner 83: alarm 90: humidity control unit 91: valve control unit 92: flow controller control unit 25

Claims (1)

1352260 26442pif.doc Ding, Ashuo scope of investigation · 1. A device that produces blur on the reticle, including · · laser emission unit, launching a laser beam; attenuation benefits 'control the energy intensity of the laser beam An optical system that processes the laser beam such that the laser beam has a predetermined shape and energy distribution; and has a window sill mounted on an upper portion of the processing chamber and formed of a transparent material and formed in the process a space in the chamber, the lightning passing through the window σ, the space is provided with a reticle and filled with a processing gas, the: is isolated from the outside; and the attenuation control unit is based on the ray incident on the window The beam emits energy intensity to control the attenuator such that the laser beam having a predetermined reference set intensity is illuminated onto the reticle. 2. The mold-generating device on the pull-up as described in the scope of the patent application section further includes: a net retention of the ratio of the components of the hybrid - 7L early, based on the incident energy of the laser beam The component ratio of the processing gas corresponds to the beam loss rate to calculate the read, intensity, and the amount of money loss rate from the storage unit laser beam 11 New succession reduction [so that the 'extra' residual intensity becomes the same as the reference energy intensity. 26 (S) I352260 26442pif.doc 3. The device for generating blur on the reticle as described in claim 5 (5)®, the 'including the energy unit' is disposed above the processing chamber to measure the incidence to The processing to the window: the incident energy intensity of the laser beam, and including a beam splitter and an energy meter, the energy metering the thunder reflected from the beam splitter The energy intensity of the beam, 〃 the cold different unit by the formula! Calculating the net energy intensity of the laser beam: (1ίίΟ·α) 'm}m ]〇〇At曰 where Ep represents the net intensity of the laser beam impinging on the reticle 'E4 shows the incident intensity of the laser beam measured by the energy meter, Τι denotes the beam splitter $transmittance of the energy measuring unit, and τ2 denotes the transmission of the window Rate, and a represents the read energy loss rate of the laser beam. • # (as described in the application _1), which creates a blur on the reticle, the lower portion of the window formed by the transparent material f through which the laser beam can pass, and the The device for generating blur on the reticle further includes an alarm unit that compares the intensity of the emitted energy of the laser beam emitted from the lower window with a predetermined reference value: the intensity of the emitted energy is determined by f The reference value _time_ is used as the blur generation time and an alarm is issued. N 5 · The device for generating blur on the reticle as described in the fourth aspect of the patent range, wherein the alarm unit includes: 27 26442 pif.doc 352260 a reference value of each processing condition; an 傩疋 state, 记忆 the memory reading value, the processing condition being the reference ratio and humidity processed in the processing condition, and a component intensity of the processing gas irradiated to the aperture Forming and determining the laser, the reference time of the net energy of the laser beam is the same as the blur generation: energy: the read number; and ^ between the output of the vow letter, receiving The newspaper a warning signal to create a window formed by a transparent material through which the illuminating device 1 such as tr is generated when the ambiguity is generated. The lower portion of the processing chamber and the portion emitted from the lower window (4) the intensity of the incident energy is equal to or less than a predetermined standard value day i, the unit is based on the intensity of the incident energy and the intensity of the emitted energy; the household is said to be an attenuator, and when the emission energy of the laser beam is strong The second attenuator control unit controls the attenuator based on the incident month f 篁 intensity. 7. The apparatus for generating blur on the reticle as described in claim 6 of the patent application. 'further comprising: a storage unit storing an energy loss rate of the laser beam corresponding to a ratio of components of the processing gas; and a sub-division unit, when the emission energy intensity exceeds the standard value, based on The intensity of the incident energy of the laser beam and the 28 丄 2260 26442 pif.doc energy loss rate of the laser beam corresponding to the composition ratio of the processing gas within the processing chamber, the performance Means for calculating the irradiated on said reticle Describe the net energy intensity of the laser beam, wherein the energy loss rate is read from the storage, and the calculation unit corrects the laser beam when the emission energy intensity is equal to or lower than the standard value Reading the energy loss _ loss rate, and calculating the laser beam irradiated onto the reticle based on the corrected energy loss rate and the incident energy 罝 intensity of the laser beam The net energy intensity, Wherein the attenuator control unit controls the attenuator such that the calculated net energy intensity of the laser beam is the same as the reference energy intensity. The mask is as described in claim 1 Producing a blurring device, further comprising: a moisture supply unit, said (4) supplying a moisture moisture supply pipe to the material, connecting the process chamber to the moisture supply unit; and a heater, a heating station Describe the moisture supply pipe. 9. According to Ganshen, the patent scope of item 8 produces blur on the reticle * X /, the moisture supply unit is connected to the gas pipeline, inert gas | supply to the body, body #道, The gas supply pipe is connected to the service pipe, and the moisture generated by the j supply unit is introduced into the space of the processing chamber by the inertia. The device according to item 9 generates a mold on the reticle, an inert gas is mounted on the gas pipe and controls the center of the station, and the first valve and the second valve are respectively mounted on the 29 1352260 26442pif.doc describes the moisture supply pipe and the exhaust pipe. 11. The apparatus for generating blur on a reticle as described in claim 1G further includes a humidity control unit that controls the flow control based on the processing chamber riding humidity. The second and the second coffee are used to cause the humidity in the processing (4) to be maintained at a reference level of 0", and the device is produced on a reticle as described in the above paragraph, wherein the humidity control The unit includes: a paste valve control unit that controls the first and second valves to be closed when the humidity of the processing chamber exceeds a predetermined reference humidity, and when the humidity of the processing chamber is low Controlling the first and second valves to be closed and opened respectively when the predetermined watch sing f; and a 'degree flow controller control unit controlling the flow controller to reduce the wetness discharged from the moisture supply unit Or a device for producing a blur on the reticle of any of the items 1 to 12 of the patent application, wherein the attenuator, the light and the window are respectively exposed to an inert gas atmosphere. /, system 30