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TWI350428B - - Google Patents

Info

Publication number
TWI350428B
TWI350428B TW096111120A TW96111120A TWI350428B TW I350428 B TWI350428 B TW I350428B TW 096111120 A TW096111120 A TW 096111120A TW 96111120 A TW96111120 A TW 96111120A TW I350428 B TWI350428 B TW I350428B
Authority
TW
Taiwan
Application number
TW096111120A
Other languages
Chinese (zh)
Other versions
TW200801798A (en
Inventor
Kenji Maruyama
Masaru Shida
Hiroyuki Ohnishi
Kiyoshi Uchikawa
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200801798A publication Critical patent/TW200801798A/en
Application granted granted Critical
Publication of TWI350428B publication Critical patent/TWI350428B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
TW096111120A 2006-04-19 2007-03-29 Photosensitive composition and color filter formed from the same TW200801798A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006115554A JP4745110B2 (en) 2006-04-19 2006-04-19 Photosensitive composition and color filter formed with the photosensitive composition

Publications (2)

Publication Number Publication Date
TW200801798A TW200801798A (en) 2008-01-01
TWI350428B true TWI350428B (en) 2011-10-11

Family

ID=38758277

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096111120A TW200801798A (en) 2006-04-19 2007-03-29 Photosensitive composition and color filter formed from the same

Country Status (4)

Country Link
JP (1) JP4745110B2 (en)
KR (2) KR100910085B1 (en)
CN (1) CN101059655B (en)
TW (1) TW200801798A (en)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4745110B2 (en) * 2006-04-19 2011-08-10 東京応化工業株式会社 Photosensitive composition and color filter formed with the photosensitive composition
KR100938444B1 (en) 2007-09-03 2010-01-25 제일모직주식회사 Ink composition for color filter, method of manufacturing pixel for color filter using same, and color filter manufactured using same
JP5249588B2 (en) * 2008-01-11 2013-07-31 東京応化工業株式会社 Colored photosensitive resin composition
JP5147499B2 (en) * 2008-02-13 2013-02-20 富士フイルム株式会社 Photosensitive coloring composition, color filter and method for producing the same
CN101591423B (en) * 2008-05-29 2012-09-05 新日铁化学株式会社 Alkaline water-soluble resin and manufacture method, as well as photosensitive resin composition, cured resin and color filter
KR101148548B1 (en) * 2008-09-30 2012-05-21 코오롱인더스트리 주식회사 Photopolymerizable resin composition
WO2010038978A2 (en) * 2008-09-30 2010-04-08 Kolon Industries, Inc. Photopolymer resin composition
KR101225955B1 (en) 2008-12-22 2013-01-24 제일모직주식회사 Ink jet resin composition
KR101368539B1 (en) * 2009-06-26 2014-02-27 코오롱인더스트리 주식회사 Photopolymerizable resin composition
JP5744528B2 (en) * 2011-01-11 2015-07-08 東京応化工業株式会社 Colored photosensitive resin composition for touch panel, touch panel, and display device
JP5981159B2 (en) * 2011-02-22 2016-08-31 東京応化工業株式会社 Photosensitive resin composition, and color filter and display device using the same
JP5819693B2 (en) * 2011-09-26 2015-11-24 東京応化工業株式会社 Colored photosensitive resin composition, color filter and display device
JP2013134263A (en) * 2011-12-22 2013-07-08 Tokyo Ohka Kogyo Co Ltd Photosensitive resin composition for black column spacer, black column spacer, display device, and method for forming black column spacer
TWI483071B (en) * 2013-03-01 2015-05-01 Chi Mei Corp Photosensitive resin composition for color filters and uses thereof
CN103376657B (en) 2013-07-15 2016-12-28 京东方科技集团股份有限公司 Light resistance composition and preparation method thereof, color membrane substrates and display device
JP6123620B2 (en) * 2013-09-30 2017-05-10 Jsr株式会社 Radiation-sensitive resin composition, display element insulating film, method for forming the same, and display element
JP5916939B2 (en) * 2015-12-24 2016-05-11 東京応化工業株式会社 Method for forming black column spacer
CN109153915B (en) * 2016-05-17 2022-09-23 默克专利股份有限公司 Polymerizable liquid crystal material and polymerized liquid crystal film
KR101832097B1 (en) 2016-10-31 2018-02-23 롬엔드하스전자재료코리아유한회사 Colored photosensitive resin composition and light shielding spacer prepared therefrom
KR20180135375A (en) 2017-06-12 2018-12-20 롬엔드하스전자재료코리아유한회사 Colored photosensitive resin composition and light shielding spacer prepared therefrom
JP7437872B2 (en) 2018-10-29 2024-02-26 日鉄ケミカル＆マテリアル株式会社 Photosensitive resin composition for partition walls, cured product thereof, and manufacturing method thereof

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3599866B2 (en) * 1995-01-05 2004-12-08 ダイセル化学工業株式会社 Photosensitive coloring composition for color filter, color filter and method for producing the same
JP3638660B2 (en) * 1995-05-01 2005-04-13 松下電器産業株式会社 Photosensitive resin composition, photosensitive dry film for sandblasting using the same, and etching method using the same
JP3849950B2 (en) * 1997-02-06 2006-11-22 東京応化工業株式会社 Photosensitive composition for color filter
JP4245740B2 (en) * 1999-07-29 2009-04-02 新日鐵化学株式会社 Photopolymerizable resin composition and color filter
JP2002241440A (en) 2001-02-19 2002-08-28 Toppan Printing Co Ltd Alkaline soluble polymer and photosensitive resin composition
JP2003043685A (en) * 2001-08-03 2003-02-13 Showa Denko Kk Color composition, and photosensitive color composition for color filter
JP2003295433A (en) * 2002-03-28 2003-10-15 Tamura Kaken Co Ltd Photosensitive resin composition
JP4290483B2 (en) * 2003-06-05 2009-07-08 新日鐵化学株式会社 Photosensitive resin composition for black resist and light-shielding film formed using the same
JP2005316388A (en) * 2004-03-30 2005-11-10 Jsr Corp Radiation sensitive composition for color filter, color filter and color liquid crystal display
JP4604559B2 (en) * 2004-06-02 2011-01-05 凸版印刷株式会社 Color filter and manufacturing method thereof
JP2007279668A (en) * 2006-03-14 2007-10-25 Asahi Kasei Electronics Co Ltd Black matrix and method for producing the same
JP4745110B2 (en) * 2006-04-19 2011-08-10 東京応化工業株式会社 Photosensitive composition and color filter formed with the photosensitive composition

Also Published As

Publication number Publication date
CN101059655A (en) 2007-10-24
KR101291480B1 (en) 2013-07-30
JP4745110B2 (en) 2011-08-10
TW200801798A (en) 2008-01-01
KR20090060236A (en) 2009-06-11
CN101059655B (en) 2013-05-01
KR100910085B1 (en) 2009-07-30
KR20070103683A (en) 2007-10-24
JP2007286478A (en) 2007-11-01

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