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TWI346361B - Method for fabricating high compressive stress film and strained-silicon transistors - Google Patents

Method for fabricating high compressive stress film and strained-silicon transistors

Info

Publication number
TWI346361B
TWI346361B TW095136828A TW95136828A TWI346361B TW I346361 B TWI346361 B TW I346361B TW 095136828 A TW095136828 A TW 095136828A TW 95136828 A TW95136828 A TW 95136828A TW I346361 B TWI346361 B TW I346361B
Authority
TW
Taiwan
Prior art keywords
strained
compressive stress
high compressive
stress film
silicon transistors
Prior art date
Application number
TW095136828A
Other languages
Chinese (zh)
Other versions
TW200818332A (en
Inventor
Neng Kuo Chen
Teng Chun Tsai
Chien Chung Huang
Original Assignee
United Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by United Microelectronics Corp filed Critical United Microelectronics Corp
Priority to TW095136828A priority Critical patent/TWI346361B/en
Publication of TW200818332A publication Critical patent/TW200818332A/en
Application granted granted Critical
Publication of TWI346361B publication Critical patent/TWI346361B/en

Links

TW095136828A 2006-10-04 2006-10-04 Method for fabricating high compressive stress film and strained-silicon transistors TWI346361B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW095136828A TWI346361B (en) 2006-10-04 2006-10-04 Method for fabricating high compressive stress film and strained-silicon transistors

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW095136828A TWI346361B (en) 2006-10-04 2006-10-04 Method for fabricating high compressive stress film and strained-silicon transistors

Publications (2)

Publication Number Publication Date
TW200818332A TW200818332A (en) 2008-04-16
TWI346361B true TWI346361B (en) 2011-08-01

Family

ID=44769527

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095136828A TWI346361B (en) 2006-10-04 2006-10-04 Method for fabricating high compressive stress film and strained-silicon transistors

Country Status (1)

Country Link
TW (1) TWI346361B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5569173B2 (en) * 2010-06-18 2014-08-13 ソニー株式会社 Semiconductor device manufacturing method and semiconductor device

Also Published As

Publication number Publication date
TW200818332A (en) 2008-04-16

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees