1323247 玖、發明說明: 【發明所屬之技術領域】 本發明係關於陶瓷板之燒成方法以及製造方法者,尤其 係關於用於壓電致動裝置或壓電傳感器等之積層型壓電基. 板等之壓電陶瓷板的燒成方法及製造方法者。 【先前技術】 先月ίι,作爲含錯之陶瓷,以鈦酸錯、鈦酸錄酸錯爲主要 成刀之壓電陶瓷多爲人知。而且,此壓電陶瓷應用於陶瓷 振盈子、陶曼渡波器、壓電蜂鳴器、壓電傳感器、以及壓# 電致動裝置等各種産品。用於此等産品之壓電陶竟中,存 在有由壓電材料構成之基板(壓電陶瓷板)或近年大量研究 之由此基板與内部電極層交互積層的積層體等。 於此,就製作壓電陶瓷之一般步驟作簡單說明。首先, 作爲初始原料,精製由氧化物、碳酸鹽等化合物合成之壓 私陶曼粉體。繼而’於此塵電陶£粉體中添加黏合劑等進 仃成=以形成陶瓷板。所形成之陶瓷板實施脫脂(脫膠)處理 π再错由使所脫脂之陶瓷板燒成而獲得燒結體。藉由將所· 得之燒結體研磨並截斷成特定尺寸,獲得上述壓電陶究板* 另立壓電陶究之積層體係藉由與於表面塗敷有燒成後成, ^内部電極層之電極糊膠的複數片陶曼板重疊並燒成而獲 得0 发=电陶究如上所述含有錯,因此燒成時此鉛會蒸發。尤 因此、900 c以上之高溫進行燒成時,鉛之蒸發十分顯著。 爲抑制鉛之瘵散,通常係將脫脂後之陶瓷板裝載於 91939.doc5 :益,將此疋位器設置於㈣之妹盆内進行燒成之 又’作爲抑制錯之蒸散的其他方法,亦眾所 啊'乳化紐粉體盥定位哭_ /、 益同放入缽盆内進行燒成之方法。 近年’伴隨使用壓電陶究之產品的小型化,要求壓電陶 體之J型化以及㈣化。M電陶£之小型化可藉由將燒結 以特定尺㈣塊㈣行截斷,其實現可㈣簡單。另— 面壓電陶究之薄型化存在有以下問題點。#,藉 磨燒結體確可達到某一程声 ^ ’、私度之溥度,然而研磨厚燒結體時 :費日寸費力’研磨薄燒結體時只要於研磨時施加一點壓力 就會發生破裂。 一因此,考慮到使用薄陶瓷板,希望獲得無需研磨之燒結 體,然而於燒成薄陶瓷板時,因燒結收縮引起之扭曲而産 生彎曲。此彎曲於方形之陶究板的周緣科分明顯。因此 ,於無需研磨直接使用壓電陶瓷時,必須除去彎曲之大周 緣4此舉招致產出率低下以及成本增加。因此,如曰本 特許公開昭62-128973號公報(以下稱特許文獻丨)、日本特許 公開平1-282157號公報(以下稱特許文獻2)、曰本特許公開 平8-91944號公報(以下稱特許文獻3)、曰本特許公開平 10-324574號公報(以下稱特許文獻4)中揭示有抑制燒結體 彎曲之技術者。 特許文獻1中揭示之技術係伴隨支柱部件之燒結收縮,藉 由燒成過程中成形體上之定位器壓迫陶瓷板以抑制燒成時 産生彎曲的方法。 特許文獻2、3及4中揭示有以抑制不均勻加熱之方法控制 91939.doc5 1323247 燒結體彎曲的燒成方法。 即,特許文獻2中揭示之方法係於陶竟材料中添加有機黏 2劑等進行未加工陶兗板之成形後,將未加工陶兗板置於 定位器之上,使未加工陶瓷板整體包圍於包含與定位器相 同材貝即氧化銘系、莫來石系等的陶究框架中,將其於此 下放入適且加熱爐中,藉由進行未加工陶瓷板之脫膠 及燒成,以此減低陶瓷板之彎曲。 特許文獻3中揭示有藉由以緻密氧化鎂或緻密氧化銘之 陶瓷間Pffij片’縮小陶瓷板與其上面之定位器之間的間隙, 以控制由於燒成而產生之陶究板尺寸的不均及彎曲量之技 術0 特許文獻4揭示之燒成方法中,係於方向相對之定位器的 下側之定位器上載置陶究板,藉由與陶究板具有相同收縮 特性之支柱,於下側定位器上支樓上側定位器,以於陶竞 板與上側定位器之間形成特定間隔之間隙。若於此狀態下 進行燒成時1由於支柱亦與陶究板共同收縮,故而可保 持陶瓷板與上側定位器之間的特定間隔。 發明所欲解決之問題 但是前述之先前的陶究板燒成方法中存在有如下問題。 即,特許文獻1中揭示之技術中,由於定位器堡迫陶究板 ’因此由於陶究板負重會發生破裂之情形,又當支柱部件 之燒結速度不均時會製造出形狀不良之燒結體。 特許文獻2中揭示之先前技術之方法中,由於因㈣板之 材貝會產生如下問題,故而有時無法消除基板之彎曲或變 91939.doc5 1323247 形。 即’進行未加工陶瓷板之脫膠處理後,雖希望未加工陶 瓷板中之黏合劑或溶劑等全部清除,然而實際上黏合劑之. 一部分作爲碳成分殘留於未加工陶瓷板中。此殘留碳於隨 . 後的步驟即未加工陶瓷板燒成中會發生氣化,屆時將使未 加工陶瓷板中之氧化物還原。此時,依據不同之元素,由 於還原時產生蒸發,因此從未加工陶瓷板脫離,其結果爲 基板組成之一部分與所期望者不同。此種問題於例如未加 工陶瓷板中含ZnO時尤其顯著,此即爲基板產生彎曲等之隹 原因。 又於脫勝時産生之氣體中,產生於未加工陶瓷板之背 面(定位器側之面)之氣體逃逸性變差,因此當未加工陶瓷板 薄且小之盼,未加工陶瓷板會比定位器更鼓起,發生偏移 ,因此會産生未加工陶瓷板自定位器脫落,或未加工陶瓷 板之背面産生傷痕或變形者。 再者特許文獻2及3中揭示之燒成方法中,由於無法保 持陶曼板内部以及陶曼板周圍之錯環境均一,因此燒結體φ 上會産生彎曲。 》 又特δ午文獻4中揭示之燒成方法中,由於方向相對之定 -位器間的陶瓷板周圍部爲開放狀態,故而於燒成過程中無 去保持陶瓷板與上側定位器之間的氣體濃度均勻,陶瓷板 之收縮因不同位置而不均勻,燒成後之陶究板可能產生彎 曲或變形。陶瓷板之厚度愈薄型化,此問題則愈顯著。 伴蚧陶瓷板之燒成的進行’支撐定位器之複數個支 91939.doc5 柱部件産生燒結收縮,然而均勾且正確控制此支柱部件之 縮很困難纟其係介由支柱部件將定位器多段裝載之時 如於下方之支撐疋位器之支柱部件由於其支撐複數個定 位器其收之控制更加困難。 藉此’會產生由複數個支柱部件所支撑之定位器產生傾 斜,而使此定位器與陶曼板接觸之情形。當如此定位器盘 2!板以接觸狀態進行燒成時,會産生由陶曼板之燒成而 獲仔之燒結體會附著於定位 +达#触ώ 裔的問喊,此燒結體自定位器 剝離時會產生破損、形狀 不良專問嘁’因此不適合用作壓 電陶瓷産品中使用之燒結體。 【發明内容】 因此’蓉於如此之情形, 發月之目的係在於提供⑦可 方止燒成後之陶瓷板上產生蠻 、生考曲或變形之陶瓷板燒成方法 ,②控制彎曲等之同時,防 方止垸成時疋位器與陶瓷板相接 觸之事態發生的陶瓷板之摔占 板之彎曲算… 以及③確實減輕陶兗 產,彳防止處理過程中陶瓷板相對於定位器 產生偏移的陶瓷板之製造方法。 爲達成上述目的⑦,本發明 ^ 4i „ 之陶瓷板的燒成方法係於第1 保持部件與第2保持部件之間 柘^配置陶瓷板進行燒成的陶瓷 板之燒成方法,其特徵爲藉由盥 ^ , . . / /、间是板之組成大致相同的 陶瓷材料形成之包圍部件, „ 匕圍第1保持部件與第2保持部 件之間的陶究板之周圍部,燒成陶兗板。 於此陶瓷板之燒成方法中,第 第保持部件與第2保持部件 之間的陶瓷板周圍部藉由與陶 文扳之組成大致相同的陶瓷 91939.doc5 1323247 材料形成之包圍部件所包圍,因此可保持配置有陶瓷板之 環境濃度於燒成過程中保持均勻。故而,可使因燒成而産 生之陶瓷板的收縮均勻化,防止燒成後的陶瓷板産生彎曲 或變形。 另,陶竟板當然可爲未加工陶究板之單板,亦意味包含 將複數個未加工陶瓷板積層而形成之板狀積層體,亦包含 將未加工陶瓷板作爲基板形成電極等者。 龜而,本發明之陶瓷板的燒成方法於形成陶瓷板之陶瓷 材料_含有含錯化合物時尤其有效。鈦酸鉛或鈦酸錯酸錯 寺含錯化合物中之錯因燒成而容易蒸發,但包圍部件藉由 與陶兗板之組成大致相同之陶竟材料而形成,因此配置有 陶竞板之環境中,含錯化合物中之錯自包圍部件放出。藉 ==含錯化合物中之船自陶兗板蒸發,並且可保持配 t竞板之環境中的錯濃度於燒成過程中保持均句。因 此,可使燒成而產生之陥咨杧从 陶瓷板产^ ^板的i㈣定,防止燒成後之 闹免板産生彎曲或變形。 又,陶瓷板载置於第丨伴彳 部件之間較好設有為上’於”板與第2保持 陶竞板與第2保持部件之二厚度以下的間隙。如此 進行燒成時,可促^ 陶竞板厚度以下的間隙而 此可進-步抑刚度均勻化,因 又,包圍部件較好為具;二4 :或㈣。 度。以如此之壯1 ^ ^瓷板之厚度大致相同的高 有陶莞板之環境濃声仃^成時’與上述相@,可促進配置 …辰又的均勻化’更進-步抑制陶瓷板上産 9i939.doc5 a,言曲或變形。並且使第2保持部件靠近陶究板時,包圍 顿不會成爲妨礙原因’因此將陶究板與第2保持部 之間隙設定為陶瓷板厚度以下之時尤其有效。 3 又’包圍部件較好置為距離陶£板有 ^板與包圍部件之—距離,可調節配置有= 板以依據陶竞板之厚度或組成等抑制該陶竞 上之考曲或變形的產生。 2你1’陶竞板之周圍部較好為配置有保持第1保持部件盘第 保圍持部件之間隙的複數個間隔片,相鄰之間隔片間配置 實::如此可藉由於相鄰之間隔片間配置包圍部件 保持°卩件之小型化並節省空間。 為ί由Γ是板較好為自m材料中取出,包圍部件較好 出陶究板後之陶究原材料的剩餘部分所形成。例 陶竟原材=陶竟板之單板或未加工陶竟板之積層體等之 料之剩:績孔等方法取出陶£板時,若以陶究原材 板組:則可高效地形成含有與㈣ 常成爲廢材之陶究: 部件。並且由於利用通 免板之所需成本材料的剩餘部分,故而可降低燒成陶 方法以具目的②,本發明之其他陶、板的燒成 複數個支徵:於第1心器上載置陶究板、 低於該燒成過程二於燒成陶究板之燒成過程前的高度 高度高於經過件的高度且經過燒成過程後之 °疋過耘之陶曼板的高度之間隔片的步驟; 91939.doc5 1323247 於複數個支柱部件上裝載覆蓋陶瓷板以及間隔片之第2定 位器的步驟;使介於第1及第2定位器之間的陶瓷板燒成之 步驟。 於此陶瓷板燒成方法中’係以陶瓷板於間隔片介在於第i 器〃、第2疋位器之間的狀態進行燒成。另,經過此燒成 過程後之此間隔片的高度高於經過燒成過程之陶瓷板的高 j。因此,例如,如燒成過程中複數個支柱部件產生收縮 τ I7便此等支柱部件不均句收縮而第2定位器傾斜時,,由 於—間隔。片支樓第位器之至少—部分,故而可有效抑制第 疋:盗與陶瓷板之間的接觸。另’陶瓷板中不僅包含陶瓷 板單板,亦包含將複數個陶竟板積層之板 面形成有電極等之陶究板等。 或表 實定位器上較好载置複數個間隔片。此時可更加確 實抑制弟2定位器與陶瓷板之接觸。 又,較好為經過燒成過程之複數個 此時’於燒結過程中,即便支柱部件之所:=度㈣。 之古谇、—去λ / 千之所有回度低於陶瓷板 :=可有效抑制第2定位器 二:間隔片較好配置於夹住陶兗板之位置,當陶 之方气排固I方向延料’兩個間隔片較好為以夾住陶瓷板 之方式排列於陶莞板之縱向方向央住陶是板 者。 陶完板較好為含錯 之 91939.doc5 喊板的高度。此時可使燒:=:燒成過程 則之第2定位器的高 -13- 位置盡可能接近不盘陶咨 器與陶…間的間隙極:位置,可使第2定位 , 因此了實現燒成過程中陶瓷 板之周圍溫度以及環境的均勾化。 圍:狀究板時,較好為於以包圍部件將其周圍包 圍之“下燒成該陶究板。此時,可實現燒成過程中陶究 板之周圍的溫度及環境之均勻化。 =好進一步包含在位於陶究板上之第2定位器 =:支柱部件以及間隔片,於該支柱部件上再裝 陶究/心之步驟’重複此步驟複數次後,燒成複數個 如此,由於將複數個陶竟板於一次燒成,故而重 豐=段定位器時’位於下方之支柱部件上負有較大負荷 因因此於如此之支柱部件上容易產生多於敎量之收縮。 定位器之間介有上述之狀況,但由於兩個 定位器之間的_片,故而可有效抑制陶究板與 之L支柱部件較好由在燒成過程中之收縮特性與陶究板 2大致相同的材料所構成。此時,支柱部件之收縮行 第21私度上追隨m之收縮行爲,因此可使陶究板與 疋位盗之間的距離保持在某一程度,於此狀態下進行陶 :位::成:因此,藉由於燒成過程前,使陶瓷板與第2 圍、矛王度接近’可有效使燒成過程中之陶竞板的周 圍/皿度及環境均勻化。 支枉p件車乂好由與陶竟板之材料相同之材料所構成 % ’支柱部件之收縮行爲與陶£板之L爲大約一 91939.doc5 •14· 13232471323247 发明Invention Description: [Technical Field] The present invention relates to a method and a method for firing a ceramic plate, and more particularly to a laminated piezoelectric substrate for a piezoelectric actuator or a piezoelectric sensor. A method and a method for firing a piezoelectric ceramic plate such as a plate. [Prior Art] The first month ίι, as a ceramic with errors, is known as a piezoelectric ceramic with a titanic acid error and a titanic acid recording error. Moreover, the piezoelectric ceramic is applied to various products such as a ceramic vibrator, a Tauman wave, a piezoelectric buzzer, a piezoelectric sensor, and a piezoelectric actuator. In the piezoelectric ceramics used for such products, there are a substrate made of a piezoelectric material (piezoelectric ceramic plate) or a laminate in which a large amount of the substrate and the internal electrode layer are alternately laminated in recent years. Here, the general procedure for fabricating a piezoelectric ceramic will be briefly described. First, as a starting material, a pressed terracottine powder synthesized from a compound such as an oxide or a carbonate is purified. Then, a binder or the like is added to the dust powder to form a ceramic plate. The formed ceramic plate is subjected to a degreasing (degumming) treatment. π is further caused by firing the degreased ceramic plate to obtain a sintered body. By grinding and cutting the obtained sintered body into a specific size, the piezoelectric ceramic board is obtained. The laminated system of the piezoelectric ceramics is formed by firing on the surface, and the internal electrode layer is formed. The plurality of Tauman sheets of the electrode paste are overlapped and fired to obtain 0 rounds. The electric ceramics contain errors as described above, so that the lead evaporates when fired. Especially when firing at a high temperature of 900 c or more, the evaporation of lead is remarkable. In order to suppress the dispersal of lead, the degreased ceramic plate is usually loaded on 91939.doc5: benefit, and the clamp is placed in the sister basin of (4) for firing, and as another method for suppressing evapotranspiration of the wrong, Also the public ah 'emulsified new powder body 盥 positioning cry _ /, Yitong into the pot to burn. In recent years, the miniaturization of products using piezoelectric ceramics requires J-type and (four) chemical ceramics. The miniaturization of M electric ceramics can be achieved by (4) simple by cutting the sintering in a specific (four) block (four) row. In addition, the thinning of the surface piezoelectric ceramics has the following problems. #, By grinding the sintered body can achieve a certain degree of sound ^ ', the degree of privateness, but when grinding a thick sintered body: it takes a lot of effort to grind a thin sintered body, as long as a little pressure is applied during grinding, cracking occurs. . Therefore, in view of the use of a thin ceramic plate, it is desirable to obtain a sintered body which does not require grinding, but when it is fired into a thin ceramic plate, it is twisted due to sintering shrinkage to cause bending. This curved section of the square of the ceramic board is obvious. Therefore, when the piezoelectric ceramic is directly used without grinding, it is necessary to remove the large curved periphery 4, which results in a low yield and an increase in cost. For example, Japanese Patent Publication No. Sho 62-128973 (hereinafter referred to as "Triving Document"), Japanese Patent Laid-Open No. 1-282157 (hereinafter referred to as "Patent Document 2"), and Japanese Patent Laid-Open No. Hei 8-91944 (hereinafter referred to as A technique for suppressing bending of a sintered body is disclosed in Japanese Laid-Open Patent Publication No. Hei 10-324574 (hereinafter referred to as "Patent Document 4"). The technique disclosed in Patent Document 1 is a method in which the ceramic plate is pressed by a retainer on the molded body during sintering to suppress bending during firing. Patent Documents 2, 3 and 4 disclose a method of controlling the bending of a sintered body by a method of suppressing uneven heating, 91939.doc5 1323247. That is, the method disclosed in Patent Document 2 is to form an unprocessed ceramic plate by adding an organic binder or the like to the ceramic material, and then place the unprocessed ceramic plate on the positioner to make the unprocessed ceramic plate as a whole. It is surrounded by a ceramic frame containing the same material as the locator, namely, oxidized crystal system, mullite system, etc., and placed in a suitable heating furnace to perform degumming and firing of the unprocessed ceramic plate. In order to reduce the bending of the ceramic plate. Patent Document 3 discloses that the gap between the ceramic plate and the positioner on the ceramic plate is reduced by dense magnesium oxide or densely oxidized ceramic Pffij sheet to control unevenness of the size of the ceramic plate due to firing. And the technique of bending amount 0. In the firing method disclosed in Patent Document 4, the locator is placed on the lower side of the locator in a direction opposite to the locator, and the struts having the same contraction characteristics as the slab The upper positioner on the side locator on the side locator forms a gap between the Tao slab and the upper locator at a certain interval. When the firing is performed in this state, the pillars are also shrunk together with the ceramic plate, so that a specific space between the ceramic plate and the upper positioner can be maintained. Problems to be Solved by the Invention However, the aforementioned prior art ceramic board firing method has the following problems. That is, in the technique disclosed in Patent Document 1, since the locator is forced to slap the board, the rupture of the slab is caused by the weight of the slab, and when the sintering speed of the struts is uneven, a sintered body having a poor shape is produced. . In the prior art method disclosed in Patent Document 2, since the following problems occur due to the material of the (four) plate, it is sometimes impossible to eliminate the bending or deformation of the substrate 91939.doc5 1323247. That is, after the degumming treatment of the unprocessed ceramic plate, it is desired that all of the binder or solvent in the unprocessed ceramic plate is removed. However, a part of the binder is actually left as a carbon component in the unprocessed ceramic plate. This residual carbon gasification occurs in the subsequent step, i.e., firing of the unprocessed ceramic plate, at which time the oxide in the unprocessed ceramic plate is reduced. At this time, depending on the element, evaporation occurs during the reduction, so that the unprocessed ceramic plate is detached, and as a result, a part of the substrate composition is different from the desired one. Such a problem is particularly remarkable when, for example, ZnO is contained in an unprocessed ceramic plate, which is a cause of bending or the like of the substrate. Also, in the gas generated at the time of the win, the gas escaping property generated on the back surface of the unprocessed ceramic plate (the surface on the locator side) is deteriorated, so when the unprocessed ceramic plate is thin and small, the unprocessed ceramic plate is more than The positioner is more bulged and deflected, so that the unprocessed ceramic plate is detached from the locator or the back of the unprocessed ceramic plate is scratched or deformed. Further, in the firing method disclosed in Patent Documents 2 and 3, since the wrong environment around the inside of the Tauman plate and the surrounding of the Tauman plate cannot be maintained, the sintered body φ is bent. In the firing method disclosed in Japanese Patent Publication No. 4, since the peripheral portion of the ceramic plate between the orientation and the positioner is open, the ceramic plate and the upper positioner are not maintained during the firing process. The gas concentration is uniform, the shrinkage of the ceramic plate is uneven due to different positions, and the ceramic plate after firing may be bent or deformed. The thinner the thickness of the ceramic plate, the more significant this problem is. With the firing of the ceramic plate, a plurality of support members of the support positioner 91939.doc5 column components produce sintering shrinkage. However, it is difficult to properly control the shrinkage of the column members. When the loading is as follows, the support member of the support clamp is more difficult to control due to its support of a plurality of positioners. In this way, a positioner supported by a plurality of strut members is caused to cause tilting, and the positioner is brought into contact with the Tauman plate. When the locator disk 2! plate is fired in the contact state, the sintered body obtained by firing the terracotta plate will be attached to the positioning + 达#, and the sintered body self-locating device When peeling, it will cause damage and poor shape. Therefore, it is not suitable for use as a sintered body for use in piezoelectric ceramic products. [Summary of the Invention] Therefore, in such a situation, the purpose of the moon is to provide a ceramic plate firing method that produces a sturdy, raw test or deformation on a ceramic plate after the firing, 2 control bending, etc. At the same time, when the anti-party is in contact with the ceramic plate, the position of the ceramic plate is in contact with the ceramic plate, and the bending of the ceramic plate is reduced... and 3 does reduce the production of ceramics, and prevents the ceramic plate from being generated relative to the positioner during processing. A method of manufacturing an offset ceramic plate. In order to achieve the above object 7, the method for firing a ceramic plate according to the present invention is a method for firing a ceramic plate in which a ceramic plate is placed between a first holding member and a second holding member, and is characterized in that By 盥^, . . / /, the surrounding member formed of a ceramic material having substantially the same composition, „ surrounding the surrounding portion of the ceramic plate between the first holding member and the second holding member, firing the pottery Seesaw. In the method for firing a ceramic plate, the peripheral portion of the ceramic plate between the first holding member and the second holding member is surrounded by a surrounding member formed of a material of ceramic material 39093.doc5 1323247 which is substantially the same as the composition of the ceramic plate. The ambient concentration of the ceramic plate can be kept uniform during the firing process. Therefore, the shrinkage of the ceramic plate produced by the firing can be made uniform, and the ceramic plate after firing can be prevented from being bent or deformed. Further, the ceramic board may of course be a single board of an unprocessed ceramic board, and also means a sheet-like laminated body formed by laminating a plurality of unprocessed ceramic sheets, and also including an unprocessed ceramic board as a substrate to form an electrode. In the case of a turtle, the method of firing a ceramic plate of the present invention is particularly effective when a ceramic material for forming a ceramic plate contains a compound containing a wrong compound. The lead in the lead metal titanate or the titanate wrong compound is easy to evaporate due to firing, but the surrounding member is formed by the ceramic material which is substantially the same as the composition of the ceramic board, so that it is equipped with Tao Jingban. In the environment, the error in the wrong compound is released from the surrounding member. Borrow == The ship with the wrong compound evaporates from the pottery plate, and can maintain the wrong concentration in the environment of the match, and keep the sentence during the firing process. Therefore, it is possible to determine from the i(4) of the ceramic plate produced by the firing, and to prevent the plate from being bent or deformed after the firing. Further, it is preferable that the ceramic plate is placed between the second member and the second holding member to have a gap equal to or less than the thickness of the second holding member and the second holding member. Promote the gap below the thickness of the pottery board, and this can be step-in-step to suppress the stiffness evenly, because the surrounding part is better to have the two; 4: or (4). Degree. So strong 1 ^ ^ thickness of the porcelain plate The same high-environment of the pottery board is thicker than the above-mentioned phase @, which can promote the configuration...the uniformity of the Chen's further step-by-step inhibition of the ceramic board 9i939.doc5 a, speech or deformation. Further, when the second holding member is brought close to the ceramic plate, the surrounding is not hindered. Therefore, it is particularly effective when the gap between the ceramic plate and the second holding portion is set to be less than or equal to the thickness of the ceramic plate. Set to the distance between the board and the surrounding parts of the Taobao board, the adjustable plate can be adjusted to suppress the occurrence of the test or deformation of the pottery according to the thickness or composition of the pottery board. 2You 1' pottery Preferably, the surrounding portion of the competition plate is provided with a gap for holding the first holding member disk retaining member A plurality of spacers are arranged between the adjacent spacers: the size of the components can be kept small and space is saved by the arrangement of the surrounding members between adjacent spacers. The material is taken out, and the surrounding part is better formed by the remaining part of the ceramic material after the ceramic board. The original material of the pottery material = the board of the ceramic board or the layer of the unprocessed pottery board, etc. When the method of measuring holes and other methods is taken out, if the original plate group is used, it is possible to efficiently form the ceramics that contain the materials that are often used as waste materials: and the remaining cost of the material due to the use of the waiving plate. In part, the method of firing the ceramics can be reduced to have the purpose 2, and the plurality of ceramics and plates of the present invention are fired in a plurality of branches: the ceramic plate is placed on the first heart, and the firing process is lower than the firing process. The height height before the firing process of the ceramic board is higher than the height of the piece and after the firing process, the step of the spacer of the height of the Tauman plate; 91939.doc5 1323247 on the plurality of pillar members Step of loading the second positioner covering the ceramic plate and the spacer a step of firing a ceramic plate between the first and second positioners. In the ceramic plate firing method, a ceramic plate is placed on the spacer in the i-th device and the second clamp. The state between the two is fired. Further, the height of the spacer after the firing process is higher than the height of the ceramic plate subjected to the firing process. Therefore, for example, a plurality of pillar members are shrunk during the firing process. τ I7, when the pillar members are contracted and the second positioner is tilted, because of the interval - at least part of the tablet holder, it is possible to effectively suppress the contact between the third and the ceramic plates. In addition, the ceramic plate includes not only a ceramic plate, but also a ceramic plate in which a plurality of ceramic plates are laminated with electrodes, etc. A plurality of spacers are preferably placed on the surface locator. At this time, the contact between the 2 positioner and the ceramic plate can be more reliably suppressed. Further, it is preferably a plurality of times of the firing process. In the sintering process, even if the pillar members are: = degree (four). The ancient 谇, - λ / thousand all the return is lower than the ceramic plate: = can effectively inhibit the second locator 2: the spacer is better placed in the position of the ceramic slab, when the Tao is deflated Directional extension 'The two spacers are preferably arranged in the longitudinal direction of the pottery board in the manner of sandwiching the ceramic plates. Tao finished board is better for the height of the wrong 91939.doc5. At this time, it can be burned: =: The high-13-position of the second positioner in the firing process is as close as possible to the gap between the pottery and the pottery: the position can make the second positioning, thus achieving The ambient temperature of the ceramic plate and the environment are both in the process of firing. Circumference: When the board is examined, it is preferable to "burn the ceramic board" by surrounding it with the surrounding member. At this time, the temperature and the environment around the potting board during the firing process can be uniformized. = It is further included in the second positioner on the ceramic board =: the pillar member and the spacer, and the step of refilling the stone on the pillar member is repeated. After repeating this step, the plurality of firings are performed. Since a plurality of ceramic plates are fired once, the heavy-duty = segment positioner has a large load on the pillar members located below, so that it is easy to produce more shrinkage than the amount of the wire on such pillar members. The above conditions are mentioned between the two devices, but due to the _ piece between the two positioners, it is possible to effectively suppress the shrinkage characteristics of the ceramic plate and the L-pillar member from the firing process and the ceramic plate 2 The same material is formed. At this time, the contraction of the strut member follows the contraction behavior of m in the 21st degree of privacy, so that the distance between the pottery board and the stolen thief can be kept to a certain extent, and the state is performed in this state. Tao: bit::cheng: therefore, by virtue Before the firing process, the ceramic plate is close to the second circumference and the spear king degree, which can effectively make the surrounding area/dishness and environment of the pottery board in the firing process uniform. The material of the same material of the board constitutes % 'the contraction behavior of the pillar part and the L of the board is about a 91939.doc5 •14· 1323247
至夂 〇 ra lL 匕’可有效實現燒成過程中之陶瓷板的周圍溫度及 環境之均句化。 進而’爲達成上述目的@,本發明之陶瓷板的製造方法 係燒成未加工陶瓷板以製造陶瓷板之方法,以具備如下步 驟爲特徵.準備具有形成有物質逃逸用之凹凸部的載置面 之步驟,s亥物質逃逸用之凹凸部用以於載置有未加工陶瓷 板之狀·癌下將未加工陶瓷板加熱時産生的物質自未加工陶 瓷板逸出;使含有黏合劑之未加工陶瓷板成形的步驟;將未 ^工陶瓷板置於定位器之載置面上,進行未加工陶瓷板之脫 膠的步驟;未加工陶瓷板脫膠後將未加工陶瓷板置於定位器 之載置面上,原樣進行未加工陶瓷板之燒成的步驟。 如此,藉由使用載置面上形成有物質逃逸用之凹凸部的 定位器’進行未加卫陶£板之脫膠以及燒&,於未加工陶 究板置於疋位@之載置面上之狀態下,定位器與未加工陶 究板之間的接觸面積變小。因此於未加卫陶£板之脫朦步 驟中,黏合劑之燃燒灰燼容易自未加工陶竟板之背面(定位 器該側之面)逸出,即脫膠性良好。因此,脫膝後未加工陶 瓷板中殘留之碳成分減少。從而可於未加工陶瓷板之燒成 步驟中,抑制殘留碳氣化時由於未加卫陶竟板中之氧化物 還原而產生的元素蒸發。藉此由燒成所得之料板的組成 均-性得到改善,因此可確實減輕㈣板之彎曲等情形。 又’於未加工陶瓷板之脫膠步驟中,因物質逃逸用之凹 凸部而於未加工陶究板之背面產生的氣體之逃逸性得以改 善’因此可抑制未加工陶变板自定位器鼓起之情形。進而 91939.doc5 ’將裝載有未加工陶£板之^位器收人密閉爐内進行未加 工陶究板之燒成時’因物質逃逸用之凹凸部使定位器與未 :工陶究板之加溫速度差異減小,故而可防止爐内存在之 氣體被捲入未加工陶瓷板之背面使未加工陶瓷板自定位器 鼓起之情形4而可防止於未加卫m脫膠時及燒成時 ,未加工陶瓷板相對於定位器發生偏移。 作爲定位器,較好為使用形成有使载置面之中心線平均 粗度Ra爲1〜2G辦之使物f逃逸用之凹凸部者。藉由於定 位器之載置面形成如此之物質逃逸用之凹凸部,可使產生 於未加工陶瓷板之黏合劑的燃燒灰燼或氣體自定位器側有 效逸出。X ’可防止於未加工陶兗板之燒成時,物質逃逸 用之凹凸部之形狀轉印於未加工陶究板之背面。因此,將 藉由燒成所得之陶究板産品化時,無需對陶£板實施研磨 專之機械性加工。 此時’亦可進-步包含對於由未加工陶曼板之燒成所得 的陶瓷板不實施機械性加工’於陶瓷板上形成外部電極之 v驟如itb於陶曼板上形成外冑電極時,&需對陶究板進 行研磨加工等,因此可實現陶究板之製造處理簡單化。 又’作爲定位器’較好為使用藉由具有用以形成物質逃 逸用之凹凸部之凹凸狀的模具製作之定位器。藉此,與藉 由例如鼓風加工或使料磨粉研約吏定位器之冑置面粗輪 化:情形相比較,〗更容易且價格低廉地製作具有凹凸部 之定位器。又’無需如鼓風加工般對定位器實施機械性加 工因此可使定位益保持向強度,且於定位器之載置面上 91939.doc5 -16- 1323247 未殘留加工屑等。 進而,未加工陶瓷板較好為以含鉛材料形成,將載有未 加工陶瓷板之定位器配置於密閉爐内之狀態下,進行未加 工陶I板之燒成。藉此,可容易獲得含錯之壓電陶竟板。 又’藉由密閉爐内燒成未加工陶瓷板,可抑制鉛之蒸發。 【實施方式】 發明效果 如上述說明,根據本發明之陶瓷板的燒成方法,可防止 燒成後之陶瓷板上産生彎曲或變形,又可防止燒成時定位 器與陶瓷板相接觸之情事。 進而,依據本發明之陶瓷板的製造方法,使用具有形成 有物質逃逸用之凹凸部的載置面之定位器進行未加工陶瓷 板之脫膠及燒成,該物質逃逸用之凹凸部用以於載置有未 加工陶瓷板之狀態下進行未加工陶瓷板加熱時産生之物質 自未加m逃逸,因此可4實減輕陶曼板之彎曲或變 形,並且可防止處理過程中陶竟板(未加工陶曼板)相對於定 位器產生偏移。 以下佐以圖式詳細說明本發明之陶究板的燒成方法及释 曼板的製造方法之合適的實施方式。 第1實施方式 首先,參照圖1〜圖3就本發明> # j | ^ 令赞明之第1貫施方式進行說明 如圖1及圖2所示,於形成a ] 爲〇〇 mmx 1〇〇 min之正方形出 的緻密質(氣孔率3 %以下,更妊 > 更好為氣孔率1%以下)之氣化伞 定位器(第1保持部件}1上載 、' 置陶瓷板2。氧化錘定位器丨較女 91939.doc5 -17- 1323247 爲8 mol%〜12 mol%之氧化紀(Υ2〇3)且完全穩定化者,因其 於燒成過程中與陶瓷板2之反應性低且耐久性良好。又,陶 究板2係以含有鈦酸錄酸勤之壓電陶曼(更詳細爲巧丁丨〇3 _ PbZr〇3-Pb(Mg丨η NbWO3-Pb(Zn"3 Nb2/3)〇3之4成分系壓 電陶瓷)形成的單板,以下述方式製作者。 即,將氧化物或碳酸鹽形態之材料藉由球磨機進行濕式 混合,混合後以95(TC進行假燒成。將此假燒成後之材料使 用球磨機進行濕式粉碎’準備壓電陶瓷粉體。繼而,於此 壓電陶瓷粉體中添加黏合劑或溶劑等使其漿料化,藉由擠 壓成形法成形爲厚度0.15 mm之未加卫陶£板(陶竟原材料) 。將此未加工陶瓷板擠壓切斷,獲得「8〇 mmx8〇爪爪,厚 度0.15 mm」之正方形薄板狀的陶瓷板2。 將如此製作之陶竟板2配置於氧化鉛定位器〗之中央,於 藉此形成之氧化錯定位器1JL的空白部分之四角載置高度 爲〇.3〇mm之間隔片3。進而,於氧化錯定位器!上相鄰之間 隔片3、3之間載置棒狀的包圍部件4。此時,*根包圍部件4 分別與陶竟板2之4個側面2a相隔固定距離。如此,藉由將 包:部件4配置於相鄰之間隔片3、3之間,可實現氧:錯定 位盗1之小型化。另,間隔片3較好為以與氧化錯定位器1 相同材質而構成’但亦可以氧化銘或氧化鎖等材質構成。 二外’間隔片3之形狀並非限於角柱狀,亦可爲例如圓柱狀 又各包圍部件4於上述陶究板2之製作中 陶制未加工陶究板之剩餘部分所形成者。,、由刀出 接者,將與氧化錯定位器1相同形狀之氧化錯定位器(第2 91939,doc5 -18- 1323247 ^持部件)5載置於氧化料位器!之對面的間隔片3上。夢 此’於陶竟板2之上面2b與氧化錯定位^之下面&之間J 成間隔爲0.1 5 mm之間隙S。 少 二上:成之燒成單元_圖3所示收納於密閉砵盆7 另:產生陶⑽結反應,獲得_ 燒成體。另,燒成溫度爲1戰,穩定時間爲2小時。又 窗:此陶竟板2之燒成前,將陶竞板1及各包圍部件4載置於 力氧:⑽器1上之上述特定位置之狀態下,以二: 〇…,進仃陶瓷板1及各包圍部件4之脫膠。 於本第1實施方式之陶究板的燒成方法中,氧化錯定位器 卜5之間的陶莞板2之周圍部(周圍空間)係藉由包含愈陶究 板2組成Α致相同之陶⑽料的包圍部件4進行包圍,、因此 自各包圍部件4向陶莞板2與氧化錯定位器5之間隙S令釋放 出錯欽酸財之錯。藉此,可抑制料板2之錯欽酸錯中之 錯蒸發,並且於燒成過程中使間㈣之敍濃度保持均_。 因此’可使因燒成而産生之陶瓷板2的收縮均勻化,可防止 燒成後之陶瓷板2上產生彎曲或變形。 繼而,將間隙S之間隔設定爲陶竞板2的厚度以下時,可 由下一實驗結果發現,燒成後之陶甍板2的彎曲度極小。其 主要理由可列舉爲,將間隙s之間隔設定爲陶瓷板2之厚度 以下,進行燒成時,可促進間隙s中錯濃度均句化。 f先’如上所述將間隙s之間隔設定爲〇15_卜陶瓷板 ^之厚度)日7,f曲1爲15.7 _,進而,將間隙$之間隔設 定爲〇·10麵(< 陶竟板2之厚度)時,彎曲量爲15.5㈣。與此 91939.doc5 1323247 相對’將間隙S之間隔設定爲0.30 mm(>陶瓷板2之厚度)時 ’彎曲量爲95.5 μιη。如此,將間隙S之間隔設定爲陶瓷板2 之厚度以下’可將彎曲量控制至大約六分之一左右。於此 所明考曲量係使用雷射式之非接觸3次元形狀測定裝置所 測定的陶瓷板2之最大高低差,爲100片陶瓷板2之平均值。 另’將間隙S之間隔設定為於0.1 〇 mm以下時,發現正方 形狀之陶究板2會偏斜爲梯形或者平行四邊形等,或陶究板 2有發生破裂或缺損之傾向。因此較好為將間隙s之間隔設 疋爲大於〇.1〇 mm。又,當更換緻密質之氧化锆定位器 ,而使用多孔質(氣孔率約15%)之氧化锆定位器時,發現彎 曲量有增加之傾向。 又,於本第1實施方式之陶瓷板的燒成方法中,包圍部件 4之高度與陶瓷板2之厚度大致相同,因此調節間隔片3之高 度使氧化鍅定位器5靠近陶瓷板2時,包圍部件4不會成為妨 礙。 由於各包圍部件4與陶瓷板2之側面2a相隔一定距離 此可實現陶瓷板2上之間隙S中之鉛濃度均勻化。並且 可藉由調卽陶瓷板2之側面2a與包圍部件4之間的距離, 可依據陶究板2之厚度或組成等抑制該陶变板2中的彎曲或 良形産生’以此調節間隙S中鉛的濃度。 進而,包圍部件4由於係將陶究板2切出後之未加工陶究 板的剩餘部分’因此可高效地形成含有與陶瓷板2組成大致 材㈣㈣部件4°並且’由於使料常成爲廢 σ工陶£板的剩餘部分,故而可實現陶竟板2之燒成 91939-doc5 -20- 1323247 所需的成本低廉化,以及減少廢材之産生量。 第2實施方式 其次’參照圖2〜圖5 ’說明本發明之第2實施方式。 ;第實知方式之陶兗板的燒成方法中,作爲陶竞板2係 ❹形成電極之陶竟板的積層體。此陶竟板以系以模取 弋自衝壓處理後之未加工陶瓷板的積層體(陶瓷原材料) 取出〇片者’形成爲「33 mmxl2,厚度爲〇仍麵」 之長方形薄板狀。另’陶£板2以如下方式燒成後,實施分 極處理等後成爲積層型壓電元件。 如圖4及圊5所示’將自未加工陶瓷板之積層體所切出之 10片陶瓷板2载置於氧化鍅定位器丨上,於氧化鍅定位器i 之令央配置爲2列5行之矩陣狀。而且,將4根棒狀包圍部件 4載置於氧化錯定位器ljL,使其將陶究板2之集合的周圍部 包圍。進而,於氧化鍅定位器丨上空白部之四角上,載置高 度〇.75mmi間隔片3。另,各包圍部件4係由切取出陶竟= 2之未加工陶瓷板的積層體之剩餘部分所形成者。 繼而,將與氧化鍅定位器1相同形狀之氧化鍅定位器5載 置於間隔片3上,使其與氧化鍅定位器丨方向相對。藉此於 各陶瓷板2之上面2b與氧化鍅定位器5之下面5a之間形成間 隔爲0.3 75 mm的間隙S。 將如上構成之燒成單元100以35〇t之溫度進行脫脂後, 與上述第1實施方式同樣地收納於密閉砵盆7内進 藉此陶瓷板2産生燒結反應,獲得陶瓷板2之燒成體。另, 燒成溫度爲11〇〇。〇,穩定時間爲2小時。 91939.doc5 1323247 本第2實施方式之陶瓷板的燒成方法中,與上述第1實施 方式相同,由於氧化鍅定位器1、5之間的各陶瓷板2之周圍 部由包含與陶瓷板2之組成大致相同的陶瓷材料之包圍部 件4所包圍,因此可使因燒成産生之各陶瓷板2的收縮均勻 化’防止燒成後之各陶瓷板2上産生彎曲或變形。 繼而,與第1實施方式相同之實驗的實驗結果如下。首先 ,如上所述將間隙S之間隔設定爲〇·375 mm(=陶瓷板2之厚 度)時,彎曲量爲13.5㈣,再將間隙8之間隔設定爲〇1〇 mm(<陶瓷板2之厚度)時,彎曲量爲。與此相對,將 間隙S之間隔設定爲〇.825 mm(>陶究板2之厚度)時,彎曲量 爲92.6㈣。如此,將間㈣之間隔設定為㈣究板2之厚产 以下時,可將彎曲量控制至大約七分之一以下 又 本=⑽上述^及第2實施方式。例如,於第i π…丄 要是以與陶兗板組成大致相 同之材料所形成者即可, 的剩餘邛八。另 ㈣瓷板後之陶瓷原材料 陶竞板::然可達=組成之陶究材料形成包圍部件與 成之情形同等或更好=相同組成之陶究材料而形 ,係以複數個包圍部件板:Γ第 可:環狀之包圍部件包圍陶究板的周圍:部:㈣’但亦 之南度與陶瓷板之厚戶 °又,包圍部件 件之高度小於陶兗板之 致相同之情形下(如,包圍部 生彎曲或變形。 可防止燒成後之陶瓷板上產 進而,如圖6所示,亦可 .第1實施方式或第2實施方式之 9l939.doc5 22 Ϊ5252ΑΊ 燒成單70層疊複數段(例如1〇段)收納於密閉缽盆内,同時進 行複數片陶瓷板之燒成。 又’作爲定位器(第i、第2之保持部件)之材肖,並非僅 =於第1實施方式及第2實施方式中使用的材料,只要其緻 狁質良好、於燒成過程中與陶瓷板之反應性低並且耐久性 良好者即可。 第3實施方式 其次’參照圖7〜圖U,說明本發明之第3實施方式。 百先,如圖7⑷所示,於正方形平板狀之定位器的大致 中央位置載置鳴12。定位器1〇係以添加有— Η 1%之氧化釔(γ2〇3)的完全穩定化之氧化錘所構成。此定 位器緻密質’其氣孔率爲大約3%以下,但氣孔率更好 爲1 %以下。陶瓷板12係以含有鈦酸銼酸鉛之壓電 ^PbTl°3 ' PbZr〇3 ' Pb(M^-Nb2/3)03a^Pb(Zni/3Nb2;;)〇3 之4成分系壓電陶幻所形成的長方形薄板狀之單板,以與 第1實細方式中揭示之方法相同的方法製作。 繼而,如圖7(b)所示,於定位器10之4角载置支柱部件14 。此支柱部件係由與上述m12相同之材料所構成 係由與陶£板12相同製作的未加工㈣板中切取者。此支 =件14均係剖面具有正方形之角柱形狀,向定位器之 :又方向延伸。如此,當支柱部件14係以與陶竞板^之材 斤目同之材料所構成時,於如後所述之陶:是㈣的燒成過 。主,支柱部件14之收縮行爲與_板12之收縮行爲一致 另’支柱部件14之材料未必與陶究板12之材料相同,亦 91939.doc5 •23· U23247 可例如自具有與H板12之收縮特性相同或同等收縮特性 的其他材料中選擇。 繼而,如圖7(c)所示,於定位器1〇上之陶究板_周圍載 置4個間隔片16。更具體言之’於與陶瓷板12之各側面相近 之位置、及與各側面之中央部相對應的位置分別載置一個 間隔片16。此4個間隔片16之高度相同,其高度低於支柱部 尚度又間隔片16之高度高於如後所述之經過燒 成過㈣陶竟板12之高度。又’間隔片16以與上述定位器 10相同之材料所構成,均爲剖面具有正方形之角柱形狀。 繼而,將陶瓷板12、支柱部件14以及間隔片16載置於定 位器10上之後,加熱至翁c前後,進行陶竞板12及支柱部 件14之脫月曰。另’以上係表示於定位器上以陶瓷板、支柱 部件、間隔片之順序載置的步驟,而此等載置之順序亦可 適當變更。 脫脂處理之後’如圖7(d)所示,將以與上述相同之步驟 準備的配置有陶究板12、支柱部件14以及間隔片Μ之定位 器10裝載於支柱部件14上。配置於下方之定位器1〇上的陶 竟板12及間隔片16由所輯之此定位器1G覆蓋。進而,配 置有陶竟板12、支柱部件14以及間隔片16之定位器1〇介由 支柱部件14進行裝載的作f重複複數次,獲得如圖7⑷所示 之多段積層定位器20。 而且將此多段積層定位器2〇設置於如圖8所示之缽盆Μ 内實施燒成處理。此處圖8係表示燒成多段積層定位器2〇 之狀態圖。缽盆22由上面開口之筐體部22a與蓋部22b所構 91939.doc5 •24· 1323247 成。繼而,將多段積層定位器20設置於M體部仏後, 部⑽蓋上並密閉’自钵盆外部進行加熱燒成多段積層定位 器2〇。此時之燒成條件可由燒成喊板之眾所周知之 條件中適當選擇。 〜氣 以下參照圖9說明燒成過程中之定位器1〇、陶竞板12支 柱部件Μ以及間隔片16之狀態。此處圖9係表示燒成過程中 各元件之狀態的圖。另,如圖3所示,爲使說明簡單,未表 示多段積層定位器20之整體,而僅表示2片定位_、ι〇 及介在於此等定位器1()、1G之間^件q,爲方便說明 ,於2片定位器10、10之間’將上側之定位器稱爲上定位器 10A,下側定位器10稱爲下定位器1〇B。 首先,於燒成過程前之狀態(參照圖9(a))下,支撐上定位 器10A之4根支柱部件14的高度最高。又,間隔片16之高度 低於陶瓷板12的高度,陶瓷板12接近於上定位器l〇A。如此 當陶瓷板12接近於上定位器10A,陶瓷板12與上定位器i〇a 之間的距離d設定為較小時,可使燒成過程中之陶瓷板i2 的周圍溫度以及自陶瓷板12蒸發之鉛的環境有效地均勻化 ’因此可抑制於燒成過程中容易産生之陶瓷板丨2的彎曲。 繼而,開始陶瓷板12之燒成時’陶瓷板12及支柱部件14 伴隨燒結開始收縮。另由於間隔片1 6如上所述係與定位器 10原材料相同’故而未發生實質性收縮。因此,當支柱部 件14之收縮進行到某一程度時,支柱部件丨4與間隔片16之 高度變爲相同,又高於陶瓷板12之高度(參照圖9(b))。另, 如上所述支柱部件14與陶瓷板12係自相同未加工陶莞板切 91939.doc5 -25- 1323247 出,因此支柱部件14之收縮行爲與陶瓷板12之收縮行爲一 致。故而於陶€板12與上定位器1〇A之間可保持微小距離d ,陶瓷板12之周圍溫度及自陶瓷板12蒸發之鉛的環境可有 效均勻化。 進而支柱部件14進行收縮時,間隔片16將取代支柱部件 14支標上^位器叫參照圖9⑷)。之後,陶£板12及支柱 部件丨4之燒結收縮依舊進行,然而上定位器i〇a之高度直至 燒結過程結束亦不會變化。 如上述詳細說明,於本實施方式之㈣板12的燒成方法 中’於定位器H)上載置有上述間隔片16。此間隔片Μ於陶 是板12之燒成過程中’取代收縮之支柱部件I4支樓定位器 10。因此,即使4個支柱部件14之收縮行爲不均—時,_ 於間隔片16取代支柱部件14支撐定位器10之時’確實保持 上定位器10A與下定位器1〇B相 、 .々丘十仃因此,於燒成過程 ,可有效抑制上定位器1〇A朝下定位器_傾斜 位器似與陶究板12相接觸之情事。藉此 广 與:位器1〇因燒成而產生之附著,故而可提高由陶= 之垸成而獲得之壓電陶瓷的產出率。 尤其將多段積層定位考2 “上負重較大。因此容易=T方…部件 産生支柱部件14之收縮比預相 大之情事,此時上述間W之作用更有^ 心更 ”另二上述貫施方式中’係將4個間隔片16配置於陶 12之周圍之觫μ,& „ 、闹瓷板 仁即使適當增減間隔片數量時 燒成過程中間隔片可 里了由於於 撐上疋位盗之至少一部分,因此當 91939.doc5 -26- 然可有效抑制上定位器與陶变板相接觸之情事。又,於上 返實施方式中,係複數個間隔片16均爲相同高度之態樣, 但即使複數個間隔片古 片之阿度不同時,因其於燒成過程中間 !片可支撐上方定位器之至少-部分,因此可有效抑制上 疋位器與陶瓷板相接觸。 進而,經過燒成過程之間隔片的高度未必一定高於燒成 後之支柱部件14的高度,可與燒成後之支柱部件14相同或 比其低。此時,直至陶究板12燒成結束,間隔片雖亦未支 撐上定位器,然而由於將如此之間隔片配置於下定位器上 即使萬-產生引起上定位器與陶兗板接觸之情事的原因 時’亦可防患於未然。 又如上所述之實施方式中,係❹未産生實質性收縮之 間隔片之態樣,但亦可使用於燒成過程中産生收縮之間隔 片,其在燒成過程前之高度低於燒成過程前之支柱部件的 南度’且若經過燒成過程後之高度高於經過燒成過程之陶 瓷板的高度》 :而,如圖10所示’亦可為將複數個陶瓷板12载置於i 片疋位态10上’可於-次燒成多片陶瓷板12之態樣。圖10 系表不與上述實施方式不同之態樣的定位器之圖。於圖1〇 所示之態樣中1位器1()上,叫陶竞板12每2片等間隔排 列成5行。並且每行配置有3個間隔片_以夾持2片陶竞板 即’ 3個間隔片16沿陶曼板12之縱向方向(圖中之X方向 Η歹]且配置成2片陶究板12之中間位置配置一個、於此 間片16與介由各陶竟板12而相對的位置各配置—個。而 91939.doc5 -27- 且’此3個間隔片16沿陶瓷板12之並列方向(圖中之γ方向) 配置有5組.。 如圖所示,即使複數個陶竟板12配置於定位器1〇上時 ’亦可藉由將間隔片16配置於複數片m 12的周圍,有 效抑制支柱部件14上裝載之定位器與陶兗板12的接觸。 又如圖11所示,於圖1〇所示之定位器1〇上,自與陶瓷板 η相同之未加工陶究板切出之包圍部件22亦可配置為包圍 陶瓷板12。此處’圖u係表示與上述實施方式不同態樣之 疋位器的圖。即,於此態樣中,相鄰之2根支柱部件14之間 載置有4根角柱狀包圍部件24, 1〇片陶瓷板12均被由相同未 加工陶瓷板所切出之支柱部件丨4以及包圍部件24所包圍。 於如上所述之陶瓷板12的燒成過程中,自此支柱部件14及 包圍部件24釋放出鈦酸鍅酸鉛中之鉛。藉此可抑制由支柱 部件14及包圍部件24所包圍之陶瓷板12的鉛之蒸發,並且 將陶瓷板12周圍之溫度及鉛環境保持均勻,因此可使因燒 成產生之陶瓷板12之收縮在各區域均勻化,其結果爲可有 效抑制燒成後之陶瓷板12上産生彎曲或變形之情事。 進而’包圍部件24由於係切出陶究板12後之未加工陶究 板的剩餘部分,因此可高效地形成包含與陶瓷板丨2組成大 致相同之陶瓷材料的包圍部件4。並且,由於係使用通常成 爲廢材之未加工陶瓷板的剩餘部分,因此可使陶瓷板12之 燒成所需成本降低以及減少廢材發生量。 以下說明本發明之第3實施方式的實施例。 實施例1 91939.doc5 -28- 1323247 於與上述定位器10相同之氧化錯定位器(100 mmx 100 mm)上,以圖10所示之配置,配置陶瓷板、支柱部件及間 隔片。繼而,準備10組與此定位器上實施350°C之脫脂處理 後的物品相同之物品,製作10段積層定位器。 於此處,本實施例中使用之陶瓷板係以PbTi03、PbZr03 、Pb(Mgi/3Nb2/3)〇3 以及 Pb(Zni/3Nb2/3)〇3之 4成分系壓電陶究 爲主要成分的15 mmx35 mm之單板,係自厚度爲0.35 mm之 未加工陶瓷板切取者。另外,此陶瓷板於後述之燒成過程 後,其厚度變爲0.29 mm。 又,本實施例中使用之間隔片與氧化锆定位器材質相同 ,其大小爲4 mmx 4 mm(高度爲0.3 2 mm)。進而,支柱部件 與上述陶變^板材質相同,其大小爲4 mmx5 mm,高度選擇 有3種(0.4 mm、0.45 mm、0.55 mm)。另外,支柱部件之高 度分別爲0.4 mm、0.45 mm以及0.55 mm時,陶莞板與上方 定位器之間的距離分別爲50 jtim、100 μιη及200 /xm。 將如上所述準備之支柱部件厚度不同的3種積層定位器 分別收納於缽盆内以1100°C進行燒成。繼而使用雷射式之 非接觸3次元形狀測定裝置,測定燒成後之各陶瓷板的彎曲 。更具體言之,將同一基板上之最大高低差作爲彎曲量進 行測定。其結果爲支柱部件之高度爲0.4 mm時之彎曲量的 最大值爲25 pm,支柱部件之高度爲0.45 mm時之彎曲量的 最大值爲30 μιη,支柱部件之高度爲0.55 mm時之彎曲量的 最大值爲130 /mi。並且燒成之陶瓷板均未發生破損以及形 狀不良之情形。 91939.doc5 -29- 1323247 備僅於將上述間隔片去除之'點與上述職之 志曰苴不同的積層疋位器’以與上述相同條件進行燒 成。一果爲陶莞板之35%產生破損或形狀不良。如此之 不良多見於積層定位器之下方陶究板。另,採用如圖…斤 不之與包圍部件22相同的包圍部件時,彎曲量之平均值於 任一情形下均降低1〇〜2〇%。 實施例2 於㈣Ti〇3、PbZr〇3、pb(Mgi為/3)〇3以及外㈣義ο 〇3之4成分系壓電陶竞爲主要成分的壓電陶究粉體中添加 黏合劑等使其成爲掏膠狀’使用刮板法形成特定厚度之陶 竞素體。繼而’於此陶究素體表面之特定區域内,將^與 Pb之混合比爲7: 3的内部電極糊膠進行絲網印刷。進而將 如此印刷有電極糊膠之陶£素體積層8片,自其積層方向進 行擠壓,並且將其切分爲15 T〆、刀刀爲mmx35 mm大小,製作複數個 陶究素體之積層體(㈣板)。另,擠壓後之各積層體的厚度 爲0.35 mm,於後述之燒成過程後之各積層體之厚度^ 0.295 mm。 繼而,於與實施例i相同之氧化錯定位器(1〇〇 mm”⑻ mm)上,以如圖10所示之配置,配置積層體、支柱部件及 間隔片。繼而,準備與此定位器上實施35(rc之脫脂處理後 之物品相同的物品1 〇組,製作丨0段積層定位器。 於此處,本實施例中使用之間隔片與氧化錯定位器材質 相同,其大小爲4mmx4mm(高度爲〇.32mm)。又,支柱部 件與上述陶瓷素體材質相同,其大小爲4 mmx5 mm,高1 91939.doc5 -30- 1JZJZ4/ 選擇有3種(0.4_、0.45_、〇.55她)。另外,支柱部件 之高度分別爲0.4 mm、0.45 _以及〇 55麵時,積層體與 上方定位器之間的距離分別爲50_、1〇〇㈣及2〇〇㈣。 將如上所述準備之支柱部件厚度不同的3種積層定位器 分別收納於钵盆内以110吖進行燒成。繼而與實施⑷同樣 ’使用雷射式之非接觸3次元形狀測定裝置,測定燒成後之 各積層體的彎曲。其結果爲支柱部件之高度狀4匪時之 彎曲量的最大值爲2〇叫,支柱部件之高度狀45mm時之 彎曲量的最大值爲25㈣,支柱部件之高度爲G55麵時之 彎曲量的最大值爲12G㈣。並且燒成之積層體均未發生破 損以及形狀不良之情形。 於是K黄僅於將上述間隔片去除之一點與上述i 〇段之 積層定位器不同之積層定位器,以與上述相同條件進行燒 成。其結果爲積層體之40%產生破損或形狀不良。如此之 不良多見於積層定位器之下方陶究板。另,採用如圖"所 示之與包圍部件22相同的包圍部件時,彎曲量之平均值於 任一情形下均降低1〇〜2〇〇/Q。 弟4實施方式 以下參照圖12〜17,說明本發明之第4實施方式。 本實施方式係製造以鈦酸錯或欽酸錯酸錯爲主要成分之 壓電陶曼板者。此壓電陶曼板係用於陶£振堡子、陶㈣ 波器、壓電蜂鳴器、壓電傳感器、以及壓電致動裝置等各 種産品者。 製造如此之麗電陶竟板時,首先如圖12及圖13所示,準 91939.doc5 31 1323247 丫:載置有板狀未加工陶究板31之氧化錯定位器32。氧化錯 疋位器32其氣孔率爲3%以下,較好為具㈣以下之緻密 性者。作爲氧化錯定位器32之材料較好為應提高其财久性 ,例如可使用於氧化錯中添加氧化印2。3)並使其穩定者 。?外’作爲穩定劑,除Υ2〇3之外亦可使用氧化鈣(㈤) 、氧化鎂(MgO)、以及氧化鈽(Ce〇2)等。 併於氧化錯定位器32之載置面上,如圖14所示,形成有物 質逃逸用之凹凸部33,該物質逃逸用之凹凸部训以於載 置有未加工陶瓷板31之狀態下將未加工陶瓷板31加熱時, 未加工陶瓷板31產生的物質自氧化鍅定位器32側逸出。此 處所言之物質係於如後所述之未加工陶究板31進行脫膠時 産生的黏合劑之燃燒灰燼、或後述之未加工陶究板Η燒成 時產生的氣體等。 物質逃逸用之凹凸部33構成氧化錯定位器32的載置面中 心線之平均粗度Ra較好爲1〜2〇μιη ’更好為2〜6从爪。另, 所謂中心線平均粗度以係JIS B〇6〇1中所規定之表面粗度 ,將粗度曲線自中心線折返,由該粗度曲線與中心線所得 之面積除以長度的值。 具有如此之微小物質逃逸用凹凸部33的氧化锆定位器W ,係使用未圖示之模具以如下方式製成者。即,首先於使 用之模具表面進行凹凸加工,使其具備上述之十心線平均 粗度Ra。繼而,藉由該模具使以Ah等之添加劑予以完全 穩定化的氧化锆粉體進行擠壓加工,於粉體成形體之表面 形成微小凹凸。之後藉由燒成該粉體成形體,獲得具有設 91939.doc5 -32- 1323247 另 有物質逃逸用之凹凸部33之恭 <戟置面的氧化锆定位器32。 外’亦可依據需要於氧化參伞、雜士 乳1G链崧體中添加黏合劑進行成形 於燒成前實施粉體成形體之脫膠。 如此’藉由使用模具製作氧化料位器32,與例如使用 投射材料進行鼓風加丄使定位器載置面粗链化之情形相比 ,可更加容易且價格低廉地製造具有微小物質逃逸用之凹 凸部33之氧化錯定位器32。χ,由於粉體成形體燒成後, 無需對粉體成形體進行研磨或鼓風等機械性加卫,因此可 防止氧化錯定位器32之載置面上附著有加工屑 1,或氧化 锆定位器32產生歪斜。 又未加工陶瓷板31係以例如組成為PbTi03-PbZr03-Pb (Zn1/3Nb2/3)〇3之3成分系壓電陶竟而形成者。於包含該等材 料之;C電陶竞私If中添加有機勸纟劑及有機溶劑等使其聚 料化或糊膠化,藉由使用刮板法等進行㈣板成形以獲得 未加工陶板31。未加卫陶曼板31為形成有例如内部電極 圖案之複數片陶瓷板予以層疊所得之積層體。 繼而將如此之複數片(此處爲1〇片)未加工陶瓷板31如圖 12及圖13所示,載置於氧化錯定位器32之載置面上,除去 未加工陶瓷板31中含有之黏合劑,進行所謂之脫膠(脫脂) 。成形時所用之黏合劑若於後述之燒成時由於未加工陶竟 板3 1產生氣化,會破壞燒成環境,引起未加工陶瓷板31之 燒成不良,因此於燒成前預先進行未加工陶瓷板31之脫膠 處理。作為此脫膠處理係將未加工陶瓷板3丨以例如4〇〇ec之 溫度加熱,再使其穩定例如1 〇小時。 91939.doc5 -33- U23247夂 l ra lL 匕' can effectively achieve the uniform temperature and environment of the ceramic plate during the firing process. Further, in order to achieve the above object, the method for producing a ceramic plate according to the present invention is a method for producing a ceramic plate by firing a raw ceramic plate, and is characterized by the following steps: preparing a surface having a concave-convex portion for material escape In the step of the surface, the concave and convex portions for the material escape are used to escape from the unprocessed ceramic plate when the unprocessed ceramic plate is heated under the condition that the unprocessed ceramic plate is placed, and the binder is contained. The step of forming the unprocessed ceramic plate; placing the unprocessed ceramic plate on the mounting surface of the positioner to perform the step of degumming the unprocessed ceramic plate; and placing the unprocessed ceramic plate on the positioner after degumming the unprocessed ceramic plate The step of firing the unprocessed ceramic plate is carried out as it is on the mounting surface. In this way, the degumming and burning of the unreinforced ceramic plate is performed by using the positioner ' having the uneven portion for material escape formed on the mounting surface, and the unprocessed ceramic plate is placed on the mounting surface of the position@@ In the upper state, the contact area between the positioner and the unprocessed ceramic board becomes smaller. Therefore, in the untwisting step of the unguarded ceramic board, the burning ash of the adhesive is easily escaped from the back surface of the unprocessed ceramic board (the side of the side of the positioner), that is, the degumming property is good. Therefore, the carbon content remaining in the unprocessed ceramic plate after the knee is removed is reduced. Thereby, in the firing step of the unprocessed ceramic plate, the evaporation of the element due to the reduction of the oxide in the unreinforced ceramic plate can be suppressed during the vaporization of the residual carbon. Thereby, the composition uniformity of the material obtained by the firing is improved, so that the bending of the (four) plate or the like can be surely alleviated. In addition, in the degumming step of the unprocessed ceramic plate, the escape property of the gas generated on the back surface of the unprocessed ceramic plate is improved by the uneven portion for material escape, thereby suppressing the unprocessed ceramic plate from the locator The situation. Furthermore, 91939.doc5 'When the unprocessed pottery plate is loaded with the unprocessed pottery plate, the unprocessed pottery board is fired in the closed furnace. 'The embossing part for the material escape makes the positioner and the non-worker The difference in heating speed is reduced, so that the gas existing in the furnace can be prevented from being caught on the back surface of the unprocessed ceramic plate to cause the unprocessed ceramic plate to bulge from the positioner 4, and the unheated m can be prevented from being degummed and burned. At the time of the formation, the unmachined ceramic plate is offset with respect to the positioner. As the positioner, it is preferable to use a concavo-convex portion for escaping the object f which has a center line average roughness Ra of the mounting surface of 1 to 2 G. By forming the uneven portion for the material escape due to the mounting surface of the positioner, the burning ash or gas generated by the adhesive of the unprocessed ceramic plate can be effectively escaped from the positioner side. X ′ prevents the shape of the uneven portion of the material from being escaping when the unprocessed ceramic plate is fired, and is transferred to the back of the unprocessed ceramic plate. Therefore, when the ceramic board obtained by firing is commercialized, it is not necessary to perform mechanical processing on the ceramic board. At this time, it is also possible to carry out the step of including no mechanical processing for the ceramic plate obtained by firing the unprocessed Tauman plate, and forming an external electrode on the ceramic plate, such as itb forming an outer electrode on the Tauman plate. At the time, & it is necessary to grind the ceramic board, so that the manufacturing process of the ceramic board can be simplified. Further, as the positioner, it is preferable to use a positioner made of a mold having a concavo-convex shape for forming a concave-convex portion for material escape. Thereby, it is easier and cheaper to manufacture the positioner having the uneven portion by comparison with the case where the locating surface of the locator is honed by, for example, blasting or grinding. Further, it is not necessary to mechanically process the positioner as in the case of blast processing, so that the positioning benefit can be maintained to the strength, and no machining chips or the like remains on the mounting surface of the positioner 91939.doc5 -16 - 1323247. Further, the unprocessed ceramic plate is preferably formed of a lead-containing material, and the locator carrying the unprocessed ceramic plate is placed in a sealed furnace, and the unprocessed ceramic plate is fired. Thereby, the piezoelectric ceramic board with errors can be easily obtained. Further, by burning a raw ceramic plate in a closed furnace, evaporation of lead can be suppressed. [Embodiment] As described above, according to the method for firing a ceramic plate of the present invention, it is possible to prevent bending or deformation of the ceramic plate after firing, and to prevent the positioner from coming into contact with the ceramic plate during firing. . Further, according to the method for producing a ceramic plate of the present invention, the dicing device having the mounting surface on which the uneven portion for material escape is formed is used for degumming and firing the unprocessed ceramic plate, and the uneven portion for escaping the substance is used for The material generated when the unprocessed ceramic plate is heated in the state where the unprocessed ceramic plate is placed is escaping from no m, so that the bending or deformation of the Tauman plate can be reduced, and the ceramic board can be prevented during the treatment (not The machining of the Tauman plate) produces an offset relative to the positioner. Hereinafter, a suitable embodiment of the method for firing the ceramic board of the present invention and the method for producing the manuscript plate will be described in detail with reference to the drawings. First Embodiment First, the first embodiment of the present invention will be described with reference to Figs. 1 to 3, as shown in Figs. 1 and 2, and a] is 〇〇mmx 1〇. A gasification umbrella positioner (first holding member}1 is placed on the square of the compactness of the square of 〇min (the porosity is 3% or less, more preferably, the porosity is 1% or less), and the ceramic plate 2 is placed. The hammer positioner is more stable than the female 91939.doc5 -17- 1323247, which is 8 mol%~12 mol% of oxidized (Υ2〇3) and is completely stabilized because of its low reactivity with the ceramic plate 2 during the firing process. And the durability is good. In addition, the ceramic board 2 is a piezoelectric Taoman containing titanic acid recording acid (more details is 巧丁丨〇3 _ PbZr〇3-Pb(Mg丨η NbWO3-Pb(Zn"3 A veneer formed of Nb2/3) 43, which is a piezoelectric ceramic) is produced in the following manner. That is, the material in the form of oxide or carbonate is wet-mixed by a ball mill, and mixed to 95 (TC). The pseudo-baking is performed. The material after the pseudo-baking is wet-pulverized using a ball mill to prepare a piezoelectric ceramic powder. Then, a binder is added to the piezoelectric ceramic powder. Or a solvent or the like to be slurried, and formed into an unreinforced ceramic plate (Taojing raw material) having a thickness of 0.15 mm by extrusion molding. The unprocessed ceramic plate is extruded and cut to obtain "8〇mmx8〇". a claw-shaped, thin-plate-shaped ceramic plate 2 having a thickness of 0.15 mm". The ceramic plate 2 thus produced is placed in the center of the lead oxide locator, and the four corners of the blank portion of the oxidized misaligner 1JL formed thereby are carried. A spacer 3 having a height of 〇.3 〇 mm is placed. Further, a rod-shaped surrounding member 4 is placed between the adjacent spacers 3 and 3 on the oxidized misalignment device. At this time, the *root surrounding member 4 is respectively The four sides 2a of the ceramic board 2 are separated by a fixed distance. Thus, by arranging the package member 4 between the adjacent spacers 3 and 3, the size of the oxygen: misplacement thief 1 can be reduced. The spacer 3 is preferably made of the same material as the oxidized misalignment device 1 but may be made of a material such as an oxide or an oxidized lock. The shape of the spacer 2 is not limited to a prismatic shape, and may be, for example, a cylindrical shape. Each of the surrounding members 4 is made of the unprocessed ceramic board in the production of the above-mentioned ceramic board 2 The remainder is formed by the knife, and the oxidization error locator (2,91939, doc5 -18-1323247) holding the same shape as the oxidation fault locator 1 is placed on the oxidant leveler. On the opposite side of the spacer 3, the dream of 'the top of the 2nd board of the ceramic board 2 and the lower side of the oxidization error ^ ^ between the gaps of the gap of 0.1 5 mm S. Second two: Chengzhi burned The unit is stored in the closed bowl 7 as shown in Fig. 3. In addition, the pottery (10) is reacted to obtain a _ fired body. The firing temperature is 1 war and the stabilization time is 2 hours. Window: Before the firing of the ceramic board 2, the Tao Jing board 1 and each of the surrounding components 4 are placed in the state of the above-mentioned specific position on the (1) device 1 of the force oxygen, and the second: 〇... Debonding of the plate 1 and each of the surrounding members 4. In the method of firing a ceramic board according to the first embodiment, the surrounding portion (surrounding space) of the pottery board 2 between the oxidation misalignment holders 5 is composed of the same ceramic board 2 The surrounding member 4 of the pottery (10) material is surrounded, and therefore, the gap S between the potting member 2 and the oxidized misaligner 5 is released from each of the surrounding members 4 to make a mistake. Thereby, the wrong evaporation of the wrong state of the material sheet 2 can be suppressed, and the concentration of the intermediate (four) can be kept constant during the firing. Therefore, the shrinkage of the ceramic plate 2 due to the firing can be made uniform, and the ceramic plate 2 after the firing can be prevented from being bent or deformed. Then, when the interval of the gap S is set to be less than or equal to the thickness of the Tao Jing board 2, it can be found from the next experimental result that the degree of curvature of the ceramic board 2 after firing is extremely small. The main reason for this is that the interval between the gaps s is set to be equal to or less than the thickness of the ceramic plate 2, and when the firing is performed, the error concentration in the gap s can be promoted. f first' is set as the interval of the gap s as described above as the thickness of the 〇15_b ceramic plate ^7, and the f curve 1 is 15.7 _, and further, the interval of the gap $ is set to 〇·10 faces ( <When the thickness of the board 2), the amount of bending is 15.5 (four). In contrast to this 91939.doc5 1323247, when the interval of the gap S is set to 0.30 mm (> the thickness of the ceramic plate 2), the amount of bending is 95.5 μm. Thus, setting the interval of the gap S to be less than the thickness of the ceramic plate 2 can control the amount of bending to about one-sixth. Here, the amount of the test piece is the maximum height difference of the ceramic plate 2 measured by the laser type non-contact three-dimensional shape measuring device, and is an average value of 100 ceramic plates 2. When the interval of the gap S is set to be less than 0.1 〇 mm, it is found that the square shape of the ceramic plate 2 is skewed into a trapezoidal shape or a parallelogram, or the ceramic plate 2 tends to be cracked or defective. Therefore, it is preferable to set the interval of the gap s to be larger than 〇.1〇 mm. Further, when a dense zirconia retainer was replaced and a porous zirconia retainer having a porosity of about 15% was used, it was found that the amount of bending tends to increase. Further, in the method for firing a ceramic plate according to the first embodiment, the height of the surrounding member 4 is substantially the same as the thickness of the ceramic plate 2. Therefore, when the height of the spacer 3 is adjusted so that the cerium oxide locator 5 approaches the ceramic plate 2, The surrounding member 4 does not become an obstacle. Since the respective surrounding members 4 are spaced apart from the side faces 2a of the ceramic sheets 2, the lead concentration in the gap S on the ceramic sheets 2 can be made uniform. And by adjusting the distance between the side 2a of the ceramic plate 2 and the surrounding member 4, the bending or the good shape in the ceramic plate 2 can be suppressed according to the thickness or composition of the ceramic plate 2, thereby adjusting the gap. The concentration of lead in S. Further, since the surrounding member 4 is the remaining portion of the unprocessed ceramic plate after the ceramic plate 2 is cut out, it can be efficiently formed to contain 4° of the component (4) and (4) which are composed of the ceramic plate 2 and 'because the material often becomes waste The remaining part of the slabs of the slabs, so that the cost of the slabs of the slabs of the slabs of the slabs of the slabs of the slabs of the slabs of the slabs of the slabs of the slabs of the slabs is reduced. Second Embodiment Next, a second embodiment of the present invention will be described with reference to Figs. 2 to 5 '. In the firing method of the ceramic plate of the first known method, the layered body of the ceramic plate which forms the electrode is used as the Taoshen plate 2 system. This ceramic board is formed into a rectangular thin plate shape which is formed by laminating a body (ceramic material) of a raw ceramic plate which has been subjected to a stamping process, and is formed into a "33 mm x 12, thickness 〇 still surface". Further, the ceramic sheet 2 is fired in the following manner, and then subjected to a polarization treatment or the like to form a laminated piezoelectric element. As shown in Fig. 4 and Fig. 5, 10 ceramic plates 2 cut out from the laminated body of the unprocessed ceramic plate are placed on the yttrium oxide locator ,, and the central portion of the yttrium oxide locator i is arranged in 2 columns. A matrix of 5 rows. Further, the four rod-shaped surrounding members 4 are placed on the oxidation misalignment positioner ljL so as to surround the peripheral portion of the collection of the ceramic plates 2. Further, a spacer 3.75 mmi spacer 3 was placed on the four corners of the blank portion of the yttrium oxide locator. Further, each of the surrounding members 4 is formed by cutting out the remaining portion of the laminated body of the unprocessed ceramic plate of the ceramics. Then, the ruthenium oxide locator 5 having the same shape as the yttrium oxide locator 1 is placed on the spacer 3 so as to face the yttrium oxide locator. Thereby, a gap S of 0.375 mm is formed between the upper surface 2b of each ceramic plate 2 and the lower surface 5a of the yttrium oxide positioner 5. The firing unit 100 having the above-described structure is degreased at a temperature of 35 〇t, and then stored in the sealed bowl 7 in the same manner as in the above-described first embodiment, and the ceramic plate 2 is subjected to a sintering reaction to obtain a firing of the ceramic plate 2. body. In addition, the firing temperature was 11 〇〇. Oh, the stabilization time is 2 hours. 91939.doc5 1323247 In the method of firing a ceramic plate according to the second embodiment, as in the first embodiment, the peripheral portion of each of the ceramic plates 2 between the yttrium oxide locators 1, 5 and the ceramic plate 2 is included. Since the surrounding members 4 of the ceramic material having substantially the same composition are surrounded by each other, the shrinkage of each of the ceramic sheets 2 due to the firing can be made uniform, and the ceramic sheets 2 after the firing are prevented from being bent or deformed. Next, the experimental results of the experiment similar to the first embodiment are as follows. First, when the interval of the gap S is set to 〇·375 mm (=the thickness of the ceramic plate 2) as described above, the amount of bending is 13.5 (four), and the interval of the gap 8 is set to 〇1 〇 mm ( When the thickness of the ceramic plate 2 is used, the amount of bending is. On the other hand, when the interval of the gap S is set to 〇.825 mm (> the thickness of the ceramic board 2), the amount of bending is 92.6 (four). In this way, when the interval between the (4) is set to (4) the thickness of the panel 2 is less than or equal to the thickness of the panel 2, the amount of warpage can be controlled to about one-seventh or less. For example, in the i-th π...丄, it is necessary to form a material that is substantially the same as the composition of the ceramic plate. (4) The ceramic raw material behind the porcelain plate Tao Jing board:: Ran reach = the ceramic material is composed to form the surrounding part and the case of the same or better = the same composition of the ceramic material, with a plurality of surrounding parts :Γ可可: The surrounding part of the ring surrounds the surrounding area of the ceramic board: Department: (4) 'But also the south of the ceramic plate and the thickness of the ceramic plate. Moreover, the height of the surrounding parts is less than that of the ceramic plate. (For example, the surrounding portion is bent or deformed. It is possible to prevent the ceramic plate after firing from being produced, and as shown in Fig. 6, the first embodiment or the second embodiment may be 9l939.doc5 22 Ϊ5252ΑΊ firing a single 70 A plurality of layers (for example, one-stage) are stacked in a closed bowl, and a plurality of ceramic sheets are fired at the same time. Further, as a positioner (i and the second holding member), it is not only the first The material used in the first embodiment and the second embodiment may be one which is excellent in enamel quality, low in reactivity with a ceramic plate during firing, and excellent in durability. The third embodiment is described below with reference to FIG. Figure U is a view showing a third embodiment of the present invention. As shown in Fig. 7 (4), the sound is placed at a substantially central position of the square flat-shaped positioner. The positioner 1 is a fully stabilized oxidized hammer with —1% yttrium oxide (γ2〇3) added thereto. The locator has a porosity of about 3% or less, but the porosity is more preferably 1% or less. The ceramic plate 12 is made of a piezoelectric film containing lead titanate citrate PbTl°3 'PbZr〇3 ' The composition of Pb(M^-Nb2/3)03a^Pb(Zni/3Nb2;;)〇3 is a rectangular thin plate-shaped veneer formed by piezoelectric phantom, and the method disclosed in the first solid mode The same method is used. Then, as shown in Fig. 7(b), the pillar member 14 is placed at the four corners of the positioner 10. The pillar member is made of the same material as the above m12 and is the same as the ceramic sheet 12. The uncut (four) plate is cut out. The support member 14 has a square column shape and extends to the positioner: the direction is extended. Thus, when the pillar member 14 is tied with the Tao Jing board When it is composed of the same material, the ceramics as described later are: (4) fired. Main, the shrinkage behavior of the pillar member 14 and the shrinkage behavior of the plate 12 The material of the other 'pillar member 14 is not necessarily the same as that of the ceramic board 12, and 91939.doc5 • 23· U23247 can be selected, for example, from other materials having the same or the same shrinkage characteristics as the H-sheet 12. As shown in Fig. 7(c), four spacers 16 are placed around the ceramic plate on the positioner 1 更. More specifically, the position is close to each side of the ceramic plate 12, and the sides are The spacers 16 are respectively placed at corresponding positions in the central portion. The heights of the four spacers 16 are the same, the height of the spacers 16 is lower than the height of the pillars, and the height of the spacers 16 is higher than that of the spacers as described later. (4) The height of the ceramic board 12 . Further, the spacer 16 is made of the same material as the above-described positioner 10, and has a square column shape having a square cross section. Then, the ceramic plate 12, the strut members 14, and the spacers 16 are placed on the positioner 10, and then heated to the front and rear of the crests, and the detachment of the ceramic plates 12 and the pillar members 14 is performed. The above is a step of placing the ceramic plate, the pillar member, and the spacer in the order of the spacer, and the order of the placement may be appropriately changed. After the degreasing treatment, as shown in Fig. 7 (d), the locator 10 in which the ceramic board 12, the strut member 14, and the spacer 准备 are prepared in the same manner as described above is placed on the strut member 14. The ceramic board 12 and the spacer 16 disposed on the lower positioner 1 are covered by the positioner 1G. Further, the positioner 1 in which the ceramic plate 12, the strut member 14, and the spacer 16 are disposed is repeatedly loaded a plurality of times by the post member 14, and the multi-stage laminated positioner 20 as shown in Fig. 7 (4) is obtained. Further, the multi-layered buildup locator 2 is placed in a crucible bowl as shown in Fig. 8 to carry out a baking treatment. Fig. 8 is a view showing a state in which the multi-stage laminated positioner 2 is fired. The bowl 22 is formed by the housing portion 22a and the lid portion 22b which are open at the top, 91939.doc5 • 24· 1323247. Then, the multi-layered buildup locator 20 is placed in the M body portion, and the portion (10) is covered and sealed, and the multi-stage laminated locator 2 is heated and fired from the outside of the bowl. The firing conditions at this time can be appropriately selected from the well-known conditions for firing the shim. ~ Gas Next, the state of the positioner 1〇, the pottery plate 12 column member Μ, and the spacer 16 in the firing process will be described with reference to Fig. 9 . Fig. 9 is a view showing the state of each element in the firing process. In addition, as shown in FIG. 3, in order to simplify the description, the entirety of the multi-segment layer locator 20 is not shown, but only two pieces of positioning _, ι 〇, and the positioner 1(), 1G between them are shown. For convenience of description, between the two positioners 10, 10, the upper positioner is referred to as the upper positioner 10A, and the lower side positioner 10 is referred to as the lower positioner 1B. First, in the state before the firing process (see Fig. 9 (a)), the height of the four pillar members 14 supporting the upper locator 10A is the highest. Further, the height of the spacer 16 is lower than the height of the ceramic board 12, and the ceramic board 12 is close to the upper positioner 10A. Thus, when the ceramic plate 12 is close to the upper positioner 10A, and the distance d between the ceramic plate 12 and the upper positioner i〇a is set to be small, the ambient temperature of the ceramic plate i2 during the firing process and the self-ceramic plate can be made. The environment of 12 evaporated lead is effectively homogenized', so that the bending of the ceramic plate 2 which is easily generated during the firing process can be suppressed. Then, when the firing of the ceramic plate 12 is started, the ceramic plate 12 and the pillar member 14 start to shrink with sintering. Further, since the spacer 16 is identical to the material of the locator 10 as described above, no substantial shrinkage occurs. Therefore, when the contraction of the column member 14 proceeds to a certain extent, the height of the column member 丨4 and the spacer 16 becomes the same, and is higher than the height of the ceramic plate 12 (refer to Fig. 9(b)). Further, as described above, the strut members 14 and the ceramic sheets 12 are cut out from the same unprocessed pottery plate 91939.doc5 - 25 - 1323247, so that the contraction behavior of the strut members 14 is consistent with the contraction behavior of the ceramic sheets 12. Therefore, a slight distance d can be maintained between the ceramic plate 12 and the upper positioner 1A, and the ambient temperature of the ceramic plate 12 and the environment of the lead evaporated from the ceramic plate 12 can be effectively uniformized. Further, when the pillar member 14 is contracted, the spacer 16 is replaced with the pillar member 14 and referred to Fig. 9 (4). Thereafter, the sintering shrinkage of the ceramic plate 12 and the strut member 丨4 is still performed, but the height of the upper positioner i〇a does not change until the end of the sintering process. As described in detail above, in the method of firing the fourth plate 12 of the present embodiment, the spacer 16 is placed on the positioner H. This spacer is used to replace the contracted pillar member I4 branch locator 10 during the firing of the panel 12. Therefore, even if the contraction behavior of the four pillar members 14 is uneven, when the spacer 16 is used to support the positioner 10 in place of the pillar member 14, it does maintain the upper positioner 10A and the lower positioner 1〇B. Therefore, in the firing process, it is possible to effectively suppress the upper positioner 1〇A downward positioner_the tilt position device is in contact with the ceramic board 12. This makes it possible to increase the yield of the piezoelectric ceramic obtained by the ceramics. In particular, the multi-segment positioning test 2 "the upper load is larger. Therefore, it is easy to = the T side... the component produces the contract member 14 which shrinks more than the pre-phase. At this time, the effect of the above-mentioned W is more "more" In the embodiment, the four spacers 16 are disposed around the pottery 12, and the slabs of the ceramic sheet are evenly increased or decreased. At least part of the thief, so when 91939.doc5 -26- can effectively inhibit the upper locator and the ceramic plate contact. In addition, in the upper embodiment, the plurality of spacers 16 are the same height In the same way, even if the plurality of spacers are different, because they are in the middle of the firing process, the sheet can support at least part of the upper positioner, thereby effectively preventing the upper clamp from contacting the ceramic plate. Further, the height of the spacer that has passed through the firing process is not necessarily higher than the height of the pillar member 14 after firing, and may be the same as or lower than the pillar member 14 after firing. At the end, the spacer is not supported. The positioner, however, can be prevented by disposing such a spacer on the lower positioner even if it causes the upper positioner to come into contact with the ceramic plate. In the embodiment as described above, , which is a spacer which does not cause substantial shrinkage, but can also be used for the spacer which produces shrinkage during the firing process, and the height before the firing process is lower than the south of the pillar member before the firing process. 'And if the height after the firing process is higher than the height of the ceramic plate after the firing process>>: and, as shown in FIG. 10, it is also possible to place a plurality of ceramic plates 12 on the i-plate state 10 The pattern of the plurality of ceramic plates 12 can be fired in a plurality of times. Fig. 10 is a view showing a positioner which is different from the above embodiment. In the aspect shown in Fig. 1A, the 1 positioner 1 ( On the other hand, the Tao competition board 12 is arranged at intervals of 5 lines every 2 sheets, and each line is provided with 3 spacer sheets _ to hold 2 pieces of Tao competition board, that is, '3 spacer sheets 16 along the longitudinal direction of the Tauman board 12 Direction (X direction in the figure) and arranged in the middle position of the two pieces of the ceramic board 12, one between the sheets 16 and Each of the ceramic plates 12 is disposed at a relative position, and 91939.doc5 -27- and 'the three spacers 16 are arranged in five groups along the parallel direction of the ceramic plates 12 (the γ direction in the figure). As shown in the figure, even when a plurality of ceramic boards 12 are disposed on the positioner 1', the spacers 16 can be disposed around the plurality of sheets m12, thereby effectively suppressing the positioner and the pottery loaded on the column member 14. Contact of the plate 12. As shown in Fig. 11, on the positioner 1A shown in Fig. 1A, the surrounding member 22 cut out from the same unprocessed ceramic plate as the ceramic plate η can also be arranged to surround the ceramic plate. 12. Here, Fig. u is a view showing a clamp different from the above embodiment, that is, in this aspect, four corner-shaped surrounding members are placed between two adjacent strut members 14 The 24, 1 ceramic plate 12 is surrounded by the pillar member 4 and the surrounding member 24 cut out from the same raw ceramic plate. In the firing of the ceramic plate 12 as described above, lead in the lead titanate is released from the pillar member 14 and the surrounding member 24. Thereby, evaporation of lead of the ceramic plate 12 surrounded by the pillar member 14 and the surrounding member 24 can be suppressed, and the temperature around the ceramic plate 12 and the lead environment can be kept uniform, so that the shrinkage of the ceramic plate 12 due to firing can be caused. It is uniformized in each region, and as a result, it is possible to effectively suppress the occurrence of bending or deformation on the ceramic plate 12 after firing. Further, since the surrounding member 24 is the remaining portion of the unprocessed ceramic board after the ceramic board 12 is cut out, the surrounding member 4 including the ceramic material substantially the same as the ceramic sheet 2 can be efficiently formed. Further, since the remaining portion of the unprocessed ceramic plate which is usually made of waste material is used, the cost required for firing the ceramic plate 12 can be reduced and the amount of waste material generated can be reduced. Hereinafter, an embodiment of the third embodiment of the present invention will be described. Embodiment 1 91939.doc5 -28- 1323247 A ceramic plate, a strut member, and a spacer are disposed in the same configuration as that shown in Fig. 10 on the same oxidation positioner (100 mm x 100 mm) as the above positioner 10. Then, 10 sets of the same items as those of the article which were subjected to the degreasing treatment at 350 ° C were prepared, and a 10-stage laminated positioner was produced. Here, the ceramic plate used in the present embodiment is mainly composed of piezoelectric materials of PbTi03, PbZr03, Pb (Mgi/3Nb2/3) 〇3, and Pb (Zni/3Nb2/3) 〇3. The 15 mm x 35 mm veneer is from a raw ceramic plate cutter with a thickness of 0.35 mm. Further, this ceramic plate has a thickness of 0.29 mm after the firing process described later. Further, the spacer used in the present embodiment is of the same material as the zirconia locator, and has a size of 4 mm x 4 mm (height of 0.3 2 mm). Further, the pillar member is the same material as the above-mentioned ceramic plate, and has a size of 4 mm x 5 mm and three heights (0.4 mm, 0.45 mm, 0.55 mm). In addition, when the height of the pillar members is 0.4 mm, 0.45 mm, and 0.55 mm, the distance between the pottery board and the upper positioner is 50 jtim, 100 μm, and 200 /xm, respectively. The three laminated positioners having different thicknesses of the pillar members prepared as described above were respectively placed in a bowl and fired at 1,100 °C. Then, a laser-type non-contact three-dimensional shape measuring device was used to measure the bending of each ceramic plate after firing. More specifically, the maximum height difference on the same substrate was measured as the amount of bending. As a result, the maximum value of the bending amount when the height of the strut member is 0.4 mm is 25 pm, the maximum value of the bending amount when the height of the strut member is 0.45 mm is 30 μm, and the bending amount when the height of the strut member is 0.55 mm The maximum value is 130 /mi. And the fired ceramic plates were not damaged or in a bad shape. 91939.doc5 -29- 1323247 The stacker is removed only under the same conditions as described above except that the above-mentioned spacer is removed and the 'pointer is different from the above-mentioned position. One fruit is broken or poorly shaped by 35% of the pottery board. Such a bad is more common in the underlying Locator. Further, when the same surrounding member as the surrounding member 22 is used, the average value of the amount of bending is lowered by 1 〇 to 2 〇% in either case. Example 2 Adding a binder to a piezoelectric ceramic powder in which (4) Ti〇3, PbZr〇3, pb (Mgi is /3)〇3, and the other four components of the external (four) sense ο〇3 are piezoelectric ceramics. It is made into a silicone-like shape using a scraper method to form a specific thickness of the pottery body. Then, in a specific region of the surface of the ceramic body, an internal electrode paste having a mixing ratio of ? and Pb of 7:3 was screen-printed. Further, 8 pieces of the volume layer of the electrode paste which is thus printed with the electrode paste are extruded from the lamination direction, and are cut into 15 T 〆 and the knife is mmx35 mm to prepare a plurality of ceramics. Laminated body ((4) board). Further, the thickness of each of the laminated bodies after extrusion was 0.35 mm, and the thickness of each laminated body after the firing process described later was 0.295 mm. Then, on the same oxidation locator (1 mm "(8) mm) as in Example i, the laminated body, the pillar member, and the spacer were placed as shown in Fig. 10. Then, the locator was prepared. On the other hand, 35 (the article 1 of the same article after degreasing treatment of rc is used to fabricate a stack of locators of 丨0 segment. Here, the spacer used in this embodiment is the same material as the oxidized locator, and its size is 4 mm x 4 mm. (The height is 〇.32mm.) In addition, the pillar members are the same as the above ceramic material, and the size is 4 mmx5 mm, and the height is 1 91939.doc5 -30- 1JZJZ4/ There are 3 types (0.4_, 0.45_, 〇. 55.) In addition, when the height of the strut members is 0.4 mm, 0.45 _, and 〇55, respectively, the distance between the laminated body and the upper positioner is 50_, 1〇〇(4), and 2〇〇(4), respectively. The three types of laminated positioners having different thicknesses of the pillar members to be prepared are respectively stored in the bowl and fired at 110 Torr. Then, similar to the method (4), the laser-type non-contact three-dimensional shape measuring device is used to measure the calcination. The bending of each laminate. The result is the height of the strut members. The maximum value of the bending amount when the shape is 4 为 is 2 〇, the maximum value of the bending amount when the height of the pillar member is 45 mm is 25 (four), and the maximum value of the bending amount when the height of the pillar member is the G55 surface is 12 G (four). In the case where the laminated body was not damaged or in a shape, the K yellow was fired only under the same conditions as described above except that the one of the spacers was removed from the layered positioner of the i 〇 section. As a result, 40% of the laminated body is damaged or has a poor shape. Such a defect is more common in the underlying slab of the laminated locator. Further, when the surrounding member is the same as the surrounding member 22 as shown in the figure " The average value is reduced by 1 〇 2 〇〇 / Q in either case. 弟 4 embodiment Hereinafter, a fourth embodiment of the present invention will be described with reference to Figs. 12 to 17. This embodiment is manufactured by using titanic acid or chin. Piezoelectric terracotta plate with the main component of the acid wrong acid. This piezoelectric terracotta plate is used for the ceramics, the ceramics, the piezoelectric buzzer, the piezoelectric sensor, and the piezoelectric actuator. And other products. When such a beautiful electric ceramic board is used, first as shown in Fig. 12 and Fig. 13, the quasi-91939.doc5 31 1323247 丫: an oxidized misalignment device 32 on which a plate-shaped unprocessed slab 31 is placed. 32 has a porosity of 3% or less, preferably a density of (4) or less. As a material of the oxidation misalignment device 32, it is preferable to increase the durability of the material, for example, it is possible to add an oxidative printing 2 to an oxidation error. 3) and make it stable. As a stabilizer, in addition to Υ2〇3, calcium oxide ((5)), magnesium oxide (MgO), and cerium oxide (Ce〇2) can be used. As shown in FIG. 14, the mounting surface of the positioner 32 is formed with a concavo-convex portion 33 for material escape, and the concavo-convex portion for escape of the substance is used to place the unprocessed ceramic in a state in which the unprocessed ceramic plate 31 is placed. When the plate 31 is heated, the substance generated by the unprocessed ceramic plate 31 escapes from the side of the yttrium oxide positioner 32. The substance to be referred to herein is a burning ash of a binder which is produced when the unprocessed slab 31 as described later is degummed, or a gas generated when the unprocessed slab is fired later. The concavity and convexity portion 33 for the substance escape constitutes the center line of the placement surface of the oxidation error locator 32, and the average thickness Ra is preferably 1 to 2 μm η η and more preferably 2 to 6 from the claw. Further, the center line average roughness is a surface roughness determined by JIS B〇6〇1, and the thickness curve is folded back from the center line, and the area obtained by the thickness curve and the center line is divided by the length value. The zirconia positioner W having such a fine substance escape concave-convex portion 33 is produced by using a mold (not shown) as follows. That is, first, the surface of the mold to be used is subjected to uneven processing to have the above-described ten-line average roughness Ra. Then, the zirconia powder which is completely stabilized by the additive of Ah or the like is subjected to extrusion processing by the mold to form minute irregularities on the surface of the powder molded body. Then, by firing the powder molded body, it is obtained that the concave and convex portion 33 having the escape property of 91939.doc5 - 32 - 1323247 is obtained. <Zirconium locator 32 of the surface. The outer layer may be formed by adding a binder to the oxidized parasol and the 1G chain of the miscellaneous milk as needed to perform degumming of the powder molded body before firing. By using the mold to form the oxidizing leveler 32, it is easier and cheaper to manufacture a material with a smaller substance than the case where the locating surface is thickened by, for example, blasting with a projection material. The oxidization error locator 32 of the uneven portion 33. In addition, since the powder molded body is not required to be mechanically cured by polishing or blowing after the powder molded body is fired, it is possible to prevent the processing chips 1 or zirconia from adhering to the mounting surface of the oxidation error locator 32. The positioner 32 produces a skew. Further, the unprocessed ceramic plate 31 is formed by, for example, a piezoelectric ceramic having a composition of three components of PbTi03-PbZr03-Pb (Zn1/3Nb2/3)〇3. In the case of containing the materials, an organic advisory agent and an organic solvent are added to the polymer or the organic solvent to be aggregated or gelatinized, and (4) sheet forming is performed by using a doctor blade method or the like to obtain an unprocessed ceramic plate 31. . The unprotected Tauman plate 31 is a laminate obtained by laminating a plurality of ceramic plates having, for example, an internal electrode pattern. Then, the plurality of sheets (here, one sheet) of the unprocessed ceramic plate 31 are placed on the mounting surface of the oxidation misalignment holder 32 as shown in Figs. 12 and 13, and the unprocessed ceramic plate 31 is contained. The binder is subjected to so-called degumming (degreasing). When the binder used for the molding is vaporized at the time of firing as described later, the unprocessed ceramic plate 31 is vaporized, the firing environment is destroyed, and the unprocessed ceramic plate 31 is not burned. Therefore, the baking is performed before the firing. The degumming treatment of the processed ceramic plate 31. As the degumming treatment, the unprocessed ceramic plate 3 is heated at a temperature of, e.g., 4 〇〇 ec, and is stabilized, for example, for 1 hr. 91939.doc5 -33- U23247
繼而,將未加工陶瓷板31置於氧化锆定位器32之載置面 上進行未加工陶瓷板31的燒成。具體爲如圖15及圖16所示 ,將裝載有完成脫膠處理之未加工陶瓷板31之複數個氧化 錯疋位器32介由柱狀之氧化錯間隔片34重疊。氧化錯間隔 ^4载置於氧化锆定位器32上之4角。繼而,將於此等氧化 在。疋位⑦32之最上方未裝載有未加卫陶£板3 i之氧化結定 位器32A介由氧化錯間隔片34重疊。另,氧化锆定位器32A 較好為與載置有未加工陶曼板31之氧化錯定位器32構造相 同。此時各氧化錯定位器32之間的間隔可藉由改變氧化錯 間片34之長度進行調整。此外,氧化錯間隔片34較好為 以與氧化锆定位器32、32A相同材料而形成。 接著,將如此多段疊放之氧化錯定位器32、32a收納於密 閉之燒成爐35内,燒成各未加工陶究板31。此時,將未加 工陶究板31以例如咖1之溫度進行加熱,再使其穩定例 如3小時nb將未加m3ix於燒成爐训進行燒成 ’因:可防止未加工陶竞板31中所含有之鉛蒸發。此外, 爲確貫抑制鉛之蒸發’亦可於燒成爐35内加入氧化鉛粉體 藉由進行如此之燒成而獲得壓電陶瓷板。 之後,如圖17所示,於燒成後之屋電陶竞板36之上面形 成外部電極37。此處,由於形成於氧化錯定位器^之載置 面上的物質逃逸用之凹&部33係細小的凹凸,因此幾乎不 會發生物質逃逸用之凹凸部33的形狀轉印至 下面的情形。闵屮— ,…、需對壓電陶瓷板36實施研磨等機械 ,即可於壓電陶究板刊上形成外部電極37。當然, 9\939.doc5 •34- 1323247 於壓電陶瓷板36上形成外部電極”之後,&需對壓電陶瓷 板36進行研磨等。 此時,於壓電陶竞板36之上面塗布Ag糊膠,藉由於此狀 L將屋電陶竞板36以例如7⑽。c進行燒製而形成外部電極 另,作爲外部電極37之材料,除Ag以外,亦可使用Au 等。又,外部電極37之形成方法,除燒製以外,亦可 使用濺鍍法或無電解電鍍法等。 /而#未加工陶莞板31之脫膠步驟中,若未能將黏合 劑f部分清除乾淨,作爲碳成分殘留於未加工陶竟板 中0^於其後之步驟即未加工陶究板31的燒成處理時,殘 留蚊谷易氣化釋放出來。此時’殘留碳可能將未加工陶瓷 板?中之氧化物(ZnO)還原,此時由於Zn自未加工陶瓷板” 中蒸發,故而於未加工陶究板31之表面側與背面側,未加 工陶究板的組成相異。藉此於未加工陶究板以表面側 與背面側,未加工陶竞板31之收縮率產生變化,結果造成 壓電陶瓷板36産生彎曲或變形等。 一爲改善未加工陶竟板31之脫膠性,可考慮使用多孔質之 ^位為。然而,脫膠後將未加工陶瓷板置於相同多孔質之 疋位器上進行燒成時,未加工陶究板31中之鉛㈣會被多 孔一質定位器吸收’從而難以維持未加工陶究板31之背面侧 (疋位态側)之均熱性以及環境均勻性,産生未加工陶瓷板3 1 之燒成斑塊。結果即使未産生壓電陶瓷板之彎曲等現象, 所得之基板亦無法獲得所期望的特性。 又,使用多孔質定位器實施脫膠之後,考慮到可將未加 91939.doc5 -35- 1323247 工陶瓷板31變更為置於緻密質定位器上,然而清除黏合劑 之未加工陶瓷板3丨其保形性較低,因此於未加工陶瓷板3工 之移載時容易引起未加工陶瓷板3 1破損。 相對於此,本實施方式中,作爲氧化鍅定位器32,係使 用具有形成有微小物質逃逸用之凹凸部33的載置面者,因 此將未加工陶竟板31置於氧化鍅定位器32之載置面時,氧 化錯定位器32與未加工陶瓷板31之接觸面積變小。因此, 進行未加工陶瓷板3丨之脫膠處理時,黏合劑之燃燒氣體(碳 )容易自未加工陶究板31之背面(氧化锆定位器32側之面)逸 出’因此脫膠性得以改善。故而,於未加工陶究板31之燒 成處理時,殘留於未加卫陶£板31上之碳(黏合劑之燃燒灰 燼)交J。又,於燒成處理時,當些許殘留之碳氣化時,其 氣體亦容易自未加工陶莞板31之背面逸出。藉此,由於殘 留碳使未加工陶兗板31中之氧化物還原,因而蒸發之以會 減少’故而可抑制|加工陶瓷板31之表面側與背面側的組 成相異之情形。 又,由於使用對與鉛難以反應之緻密質氧化鍅定位器32 因此未加工陶瓷板31之燒成處理時,未加工陶瓷板μ宁 之錯幾乎未被氧化錯定位器32吸收β χ,將未加工陶究板 31置於氧化锆定位器32之載置面上之狀態下,如上所述之 氧化鍅定位器32與未加工陶瓷板31之間的接觸面積變小。 藉由此等方法,未加工陶瓷板31之表面側與 環境均勻性得収良,故而可降低未㈣之燒成 斑塊。 9l939.doc5 •36- U23247 藉由以上方法’未加工陶瓷板31之收縮率整體大致均等 ’故而可確實減少麼電陶究板36産生之彎曲或變形 仔具備所期望特性之壓電陶瓷板36。 μ進而’藉由於氧化料位器32之載置面上形成微小的物 貝逃逸用之凹凸部33,於未加m3i之脫膠處理時, 生於未加工陶瓷板3 i之背面的氣體之逃逸性得以改善, 因此可防止未加工陶究板31自氧化鍅定位器”浮起。:, 於,加工陶究板31之燒成處理時,未加工陶£板31與氧化 錯疋位益32之間的加溫速度差變小,因此可控制原本存在 於燒成爐35中之氣體捲入未加工陶瓷板31的背面。故而, 藉由此氣體之捲入作用’可防止未加工陶究板31自氧化鍅 定位器32浮起。 因此,於未加工陶瓷板31之脫膠以及燒成時,可避免未 加工陶瓷板31對於氧化锆定位器32發生偏移。藉此可防止 未加工陶瓷板31自氧化鍅定位器32脫落,或未加工陶瓷板 3 1之背面産生傷痕或未加工陶瓷板3 i產生變形之情形。 又,製作具有物質逃逸用之凹凸部33之氧化锆定位器32 時,如上所述,由於在粉體成形體燒成後無須對粉體成形 體實施機械性加工,因此於未加工陶瓷板3丨之燒成時,亦 不會産生加工屑等異物附著於未加工陶瓷板31,或因氧化 錯定位器32之歪斜造成氧化锆定位器32破裂之情形。 本發明之第4實施方式係關於含鉛之壓電陶竞板的製造 方法者,但本發明當然亦適用於除此之外的其他陶曼板。 此時,作爲定位器’亦可使用以氧化鋁或氧化鎮等形成之 91939.doc5 -37· 1323247 定位器。又,上述實施方式係進行由積層體所成之未加工 陶-是板的脫膠及燒成者’而本發明亦可 工陶瓷板。 {層之未加 以下說明第4實施方式之實施例及比較例。 實施例 (1)定位器 作爲定位器,係使用於氧化錯中添加8 mol%〜12咖以 之氧化釔(Y2〇3)並使其完全穩定化的緻密質氧化錯定位写 。此氧化鍅定位器之氣孔率爲3%以下。氧化鍅定位器之大 小爲CHOOmmxHK)·,氧化錯定位器之厚度爲15酿。 乳化錯定位||之表面±形成有使㈣均粗仏較好爲 2〜6 /xm的物質逃逸用之凹凸部。 (2)陶瓷 作爲未加工陶竞板之材料,係使用組成為pbTi〇3Then, the unprocessed ceramic plate 31 is placed on the mounting surface of the zirconia retainer 32, and the unprocessed ceramic plate 31 is fired. Specifically, as shown in Figs. 15 and 16, a plurality of oxidized oxime devices 32 loaded with the unprocessed ceramic plate 31 subjected to the degumming treatment are stacked via the columnar oxidized spacer sheets 34. The oxidative error interval ^4 is placed at the four corners of the zirconia positioner 32. Then, it will be oxidized. The oxidation junction locator 32A, which is not loaded with the unguarded ceramic plate 3 i at the top of the clamp 732, is overlapped by the oxidized error spacer 34. Further, the zirconia retainer 32A is preferably constructed in the same manner as the oxidized misaligner 32 on which the unprocessed terracotta plate 31 is placed. At this time, the interval between the respective oxidation error locators 32 can be adjusted by changing the length of the oxidation retardation sheet 34. Further, the oxidized spacer spacer 34 is preferably formed of the same material as the zirconia locators 32, 32A. Then, the oxidation fault locators 32 and 32a stacked in a plurality of stages are housed in a closed firing furnace 35, and each of the unprocessed ceramic plates 31 is fired. At this time, the unprocessed ceramic plate 31 is heated at, for example, the temperature of the coffee 1 and stabilized, for example, for 3 hours, nb, and the m3ix is not added to the firing furnace for firing. The lead contained in it evaporates. Further, in order to surely suppress the evaporation of lead, a lead oxide powder may be added to the firing furnace 35, and the piezoelectric ceramic plate is obtained by performing such firing. Thereafter, as shown in Fig. 17, an external electrode 37 is formed on the upper surface of the house electric ceramic panel 36 after firing. Here, since the concave &lifier portion 33 for material escape formed on the mounting surface of the oxidation error locator is a small unevenness, the shape of the uneven portion 33 for material escape is hardly transferred to the lower surface. situation.闵屮-,..., the piezoelectric ceramic plate 36 is subjected to polishing or the like, and the external electrode 37 can be formed on the piezoelectric ceramic plate. Of course, after 9\939.doc5 • 34-1323247 forms an external electrode on the piezoelectric ceramic plate 36, the piezoelectric ceramic plate 36 needs to be ground, etc. At this time, it is coated on the piezoelectric ceramic plate 36. In the case of the Ag paste, the external electric electrode is formed by firing, for example, 7(10).c, and as the material of the external electrode 37, in addition to Ag, Au or the like may be used. In the method of forming the electrode 37, in addition to firing, a sputtering method, an electroless plating method, or the like may be used. /# In the degumming step of the unprocessed pottery plate 31, if the adhesive f is partially removed, the The residual carbon remains in the unprocessed ceramic board. The oxide (ZnO) in the reduction is reduced, and at this time, since the Zn evaporates from the unprocessed ceramic plate, the composition of the unprocessed ceramic plate differs from the surface side and the back side of the unprocessed ceramic plate 31. Thereby, the shrinkage ratio of the unprocessed terracotta plate 31 is changed on the surface side and the back side of the unprocessed slab, and as a result, the piezoelectric ceramic plate 36 is bent or deformed. In order to improve the degumming property of the unprocessed ceramic board 31, it is considered to use the position of the porous material. However, when the unprocessed ceramic plate is placed on the same porous crucible after degumming and fired, the lead (4) in the unprocessed ceramic plate 31 is absorbed by the porous element locator, thereby making it difficult to maintain the unprocessed ceramics. The soaking plaque of the unprocessed ceramic plate 3 1 is generated by the soaking property of the back side (the 疋 position side) of the plate 31 and the environmental uniformity. As a result, even if a phenomenon such as bending of the piezoelectric ceramic plate did not occur, the obtained substrate could not obtain desired characteristics. Further, after the degumming is performed using the porous locator, it is considered that the unfilled ceramic plate 31 can be changed to be placed on the dense locator, but the unprocessed ceramic plate from which the adhesive is removed is 丨The shape retention property is low, so that the unprocessed ceramic plate 31 is easily damaged when the unprocessed ceramic plate is transferred. On the other hand, in the present embodiment, as the yttrium oxide locator 32, a mounting surface having the uneven portion 33 for forming a small substance escape is used. Therefore, the unprocessed ceramic plate 31 is placed in the yttrium oxide locator 32. When the surface is placed, the contact area between the oxidation misalignment 32 and the unprocessed ceramic plate 31 becomes small. Therefore, when the degumming treatment of the unprocessed ceramic plate 3 is performed, the combustion gas (carbon) of the binder easily escapes from the back surface of the unprocessed ceramic plate 31 (the surface on the side of the zirconia positioner 32), so the degumming property is improved. . Therefore, when the unprocessed ceramic board 31 is subjected to the baking treatment, the carbon (the burning ash of the binder) remaining on the unreinforced ceramic sheet 31 is transferred to J. Further, at the time of the firing treatment, when a small amount of residual carbon is vaporized, the gas easily escapes from the back surface of the unprocessed pottery plate 31. As a result, since the residual carbon reduces the oxide in the unprocessed ceramic plate 31, the evaporation is reduced, so that the composition of the surface side and the back side of the processed ceramic plate 31 can be suppressed. Further, since the hard ceramic yttrium locator 32 which is difficult to react with lead is used, the unprocessed ceramic plate 31 is subjected to the firing treatment, and the unprocessed ceramic plate is substantially unaffected by the oxidizing error locator 32 to absorb β χ. In the state where the unprocessed ceramic plate 31 is placed on the mounting surface of the zirconia retainer 32, the contact area between the yttrium oxide locator 32 and the unprocessed ceramic plate 31 as described above becomes small. By such a method, the surface side of the unprocessed ceramic plate 31 and the environmental uniformity are well obtained, so that the burnt plaque of the (4) can be reduced. 9l939.doc5 • 36- U23247 By the above method, the shrinkage ratio of the unprocessed ceramic plate 31 is substantially equal, it is possible to surely reduce the bending or deformation of the piezoelectric ceramic plate 36, and the piezoelectric ceramic plate 36 having the desired characteristics. . μ and further 'by the formation of a small object-escaped concavo-convex portion 33 on the mounting surface of the oxidizing leveler 32, the escape of gas generated on the back side of the unprocessed ceramic plate 3 i during the degumming treatment without m3i The property is improved, so that the unprocessed ceramic board 31 can be prevented from floating up from the yttrium oxide locator.: When processing the ceramic board 31, the unprocessed slab 31 and the oxidized sputum bit 32 The difference in heating speed between the two becomes small, so that the gas originally present in the firing furnace 35 can be controlled to be wound into the back surface of the unprocessed ceramic plate 31. Therefore, the intrusion of the gas can prevent the unprocessed ceramics. The plate 31 floats from the yttrium oxide locator 32. Therefore, when the unprocessed ceramic plate 31 is degummed and fired, the unprocessed ceramic plate 31 can be prevented from shifting with respect to the zirconia retainer 32. Thereby, the unprocessed ceramic can be prevented. The plate 31 is detached from the yttrium oxide locator 32, or a scratch is formed on the back surface of the unprocessed ceramic plate 31 or the unprocessed ceramic plate 3 i is deformed. Further, a zirconia locator 32 having a concave and convex portion 33 for material escape is produced. When, as mentioned above, due to the powder After the body is fired, it is not necessary to mechanically process the powder molded body. Therefore, when the unprocessed ceramic plate is fired, foreign matter such as machining chips does not adhere to the unprocessed ceramic plate 31, or the oxidized misaligner is used. The skew of 32 causes the zirconia positioner 32 to rupture. The fourth embodiment of the present invention relates to a method for manufacturing a lead-containing piezoelectric ceramic plate, but the present invention is of course applicable to other terrariums other than this. In this case, as the positioner, a 91939.doc5 -37· 1323247 positioner formed of alumina or oxidized town may be used. Further, the above embodiment is an unprocessed pottery made of a laminate. The degumming and firing of the present invention can be performed on the ceramic plate. The embodiment of the fourth embodiment and the comparative example are not described below. Embodiment (1) The positioner is used as a positioner for oxidation error. Add 8 mol%~12 coffee yttria (Y2〇3) and make it completely stabilized by dense oxidization. The porosity of the yttrium oxide locator is 3% or less. The size of the yttrium oxide locator For CHOOmmxHK)·, oxidation error locator The thickness is 15 emulsified. The emulsified misalignment||the surface is formed with the concave and convex parts for the material escape of (4) coarser 仏, preferably 2~6 /xm. (2) Ceramics as the material of the unprocessed Taojing board, Use the composition pbTi〇3
PbZr〇3-Pb(Zni/3 _/3)〇3之3成分系壓電陶究。由此材料所 成之壓電陶聽體係使氧化物或碳酸鹽形態之原料以球磨 機進行濕式混合,混合後以9⑻。c進行假燒成,其後再藉由 球磨機進行濕式粉碎而成微粉化者。 未加m係由以下方法製作。即,於所準備之壓電 陶竟私體中添加黏合劑以及有機溶劑等使其糊膠化,藉由 到板法使其成形爲厚度5〇 _之板。之後使用由Ag/pd=7 :3之金屬構成的内部電極糊膠,藉由絲網印刷法於板上形 成内部電極圖案。之後將板重疊製作積層體以使内部電極 成爲8片進仃擠壓處理形成未加工陶瓷板。接著將未加工 91939.doc5 •38· ㈣板切斷以使未加m之大小爲15_35眶角。 (3) 脫膠 將所準備之10片未加工陶瓷板置於氧化鍅定位器之載置 ,上(參照圖12及圖13),以彻。C之溫度使其穩定10小時, 藉此進行未加工陶瓷板之脫膠。 (4) 燒成 脫膠後’將裝載有未加工陶瓷板之氧化鍅定位器重疊Μ 片’進而於其土層疊未裝載有未加工陶瓷板之氧化錘定位 器’作爲燒成之形狀(參照圖15及圖16)。此時,各氧化錯定 位器之間的間隙藉由氧化錯間隔片進行調整。進而,將如 此積載之1G片氧化錯定位器配置於密閉的燒成爐内,燒成 各未加工陶瓷板。此時,係以燒成溫度爲1 、穩定時 間爲3小時之條件進行燒成。 (5)評估 >使用非接觸之雷射式3次元形狀測定裝置對於藉由燒成 獲得之100片壓電陶瓷板進行彎曲之評估。 其結果爲’壓電陶瓷板之彎曲最大亦於2〇从m以下。又, 關於f曲之發生情形,未發現壓電陶瓷板產生局部性彎曲。 又,使用氧氣流中燃燒—紅外吸收法分析1〇片脫膠後之 未加工陶瓷板之各自的殘留碳量,發現其較少,爲5〇〜15〇 PPM。再者,於壓電陶瓷板之背面未發現凹陷。又,未引起 未加工陶瓷板自氧化錘定位器脫落。 (比較例) 比較例中使用之定位器爲燒成後實施研磨的緻密質的氧 91939.doc5 -39- 1323247 化鍅定位器1,於此氧化锆定位器之載置面上未形成有 如上述實施财之物質逃逸用之凹凸部。使用如此之氧化 鍅定位器,以與上述同樣之方法製作壓電陶免板。 使用與上述相同方法對藉此獲得之⑽片壓電陶究板進 行彎曲之評估,發現最大產生⑽_之彎曲。又,關於彎 曲之產生情形’尤其於基板之四角上產生局部性彎曲。 又’使用與上述相同之方法對脫膠後之未加卫陶究板的 殘留碳量進行分析,發現殘留有_ ppm之碳。進而,存 在有於基板者面產生3忍為因氧化锆定位器之研磨屑而造成 凹,的未加工陶兗板…亦存在有未加工陶莞板自氧化 鍅疋位器脫落之未加工陶瓷板。 【圖式簡單說明】 圖1係第1實施方式之燒成單元的部分剖面正面圖。 圖2係將圖1所示之燒成單元的一部分切去之平面圖。 △圖係表不將圖1所不之燒成單元收納於密閉妹盆中的狀 態之部分剖面正面圖。 圖4係第2實施方式之燒成單元的部分剖面正面圖。 圖5係將圖4所示之燒成單元的-部分切去之平面圖。 圖6係表示將第1或第2實施方式之燒成單元複數段層疊 收納於密輯盆内的狀態之部分剖面正面圖。 圖7⑷〜7⑷係表示第3實施方式之陶究板的燒成 圖。 〜 燒成多段積層定位器的狀 圖8係表示於第3實施方式中 態之圖。 91939.doc5 圖9(a)〜9(c)係表示第3實施方彳由 示J頁她方式中,燒成過程中之各元 件狀態之圖。 圖1〇係表示於第3實施方式中,不同態樣之定位器的圖。 圖11係表示於第3實施方式中,不同態樣之定位器的圖。 圖12係表示根據第4實施方式進行未加工陶瓷板之脫膠 時的狀態之平面圖。 圖13係表示根據第4實施方式進行未加工陶瓷板之脫膠 曰τΓ的狀態之平面圖。 圖14係表示圖12及圖13所示之氧化鍅定位器表面的擴大 圖。 圖15係表示根據第4實施方式進行未加工陶瓷板之燒成 時的狀態之垂直方向剖面圖。 圖16係表示根據第4實施方式進行未加工陶瓷板之燒成 時的狀態之一部分之水平方向剖面圖。 圖17係表示根據第4實施方式最終所得之陶瓷板的立體 【圖式代表符號說明】 1 定位器 2 陶瓷板 2a 陶瓷板之側面 2b 陶瓷板之上面 3 間隔片 4 包圍部件 5 氧化錯定位器 9!939.doc5 -41 - 1323247 5a 氧化鍅定位器之下面 7 缽盆 10 定位器 10A 上定位器 10B 下定位器 12 陶瓷板 14 支柱部件 16 間隔片 20 多段積層定位器 22 砵盆 22a 缽盆上面開口之筐體部 22b 蛛盆蓋部 24 包圍部件 31 板狀未加工陶瓷板 32 氧化鍅定位器 32A 氧化锆定位器 33 物質逃逸用之凹凸部 34 氧化锆間隔片 35 燒成爐 36 壓電陶瓷板 37 外部電極 100 燒成單元 s 間隙 91939.doc5 -42-The three components of PbZr〇3-Pb(Zni/3 _/3)〇3 are piezoelectric ceramics. The piezoelectric ceramic system formed by this material wet-mixes the oxide or carbonate form of the material in a ball mill and mixes it with 9 (8). c is subjected to pseudo-firing, and then wet-pulverized by a ball mill to form a micronized person. The m-free system was produced by the following method. Namely, a binder and an organic solvent are added to the prepared piezoelectric ceramic body to be gelatinized, and formed into a plate having a thickness of 5 Å by a plate method. Thereafter, an internal electrode paste composed of a metal of Ag/pd = 7:3 was used, and an internal electrode pattern was formed on the plate by screen printing. Thereafter, the sheets were overlapped to form a laminate, and the internal electrodes were subjected to 8 sheets of extrusion processing to form a raw ceramic sheet. The unprocessed 91939.doc5 • 38· (4) plate is then severed so that the size of the unfilled m is 15_35. (3) Degumming The prepared 10 pieces of unprocessed ceramic plates were placed on the yttrium oxide locator (see Figs. 12 and 13). The temperature of C was allowed to stabilize for 10 hours, thereby performing degumming of the unprocessed ceramic plate. (4) After firing and degumming, 'the yttrium oxide locator with the unprocessed ceramic plate is placed on the slab' and the oxidized hammer locator that is not loaded with the unprocessed ceramic plate is laminated as the shape of the sinter (see figure) 15 and Figure 16). At this time, the gap between the respective oxidation misaligners is adjusted by the oxidation spacer. Further, the 1G sheet oxidation misalignment device thus loaded is placed in a closed firing furnace to fire each of the unprocessed ceramic sheets. At this time, the firing was carried out under the conditions of a firing temperature of 1 and a stabilization time of 3 hours. (5) Evaluation > Evaluation of bending of 100 pieces of piezoelectric ceramic sheets obtained by firing was performed using a non-contact laser type 3 dimensional shape measuring apparatus. As a result, the bending of the piezoelectric ceramic plate is also at most 2 m from m. Further, regarding the occurrence of the f-curve, no local bending of the piezoelectric ceramic plate was observed. Further, the residual carbon amount of the unprocessed ceramic sheets after degumming of the one sheet was analyzed by the combustion-infrared absorption method in the oxygen stream, and it was found to be less, and it was 5 〇 15 15 Å PPM. Further, no depression was found on the back surface of the piezoelectric ceramic plate. Moreover, the unprocessed ceramic plate was not caused to fall off from the oxidizer hammer positioner. (Comparative Example) The positioner used in the comparative example is a dense oxygen 91939.doc5 -39-1323247 hydrating locator 1 which is polished after firing, and the zirconia locator is not formed on the mounting surface as described above. Implement the concave and convex part of the material escape. Using such a ruthenium oxide locator, a piezoelectric ceramic plate was produced in the same manner as described above. The evaluation of the bending of the (10) piece of piezoelectric ceramic board thus obtained was carried out in the same manner as described above, and it was found that the maximum (10)_ bending was produced. Further, the occurrence of bending is caused by local bending particularly at the four corners of the substrate. Further, the residual carbon amount of the untreated ceramic plate after degumming was analyzed by the same method as described above, and it was found that _ ppm of carbon remained. Further, there is an unprocessed ceramic plate which is formed on the surface of the substrate and which is concave due to the grinding debris of the zirconia locator. There is also an unprocessed ceramic in which the unprocessed pottery plate is detached from the oxidizing clamp. board. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a partial cross-sectional front view of a firing unit according to a first embodiment. Fig. 2 is a plan view showing a part of the firing unit shown in Fig. 1 cut away. The Δ diagram is a partial cross-sectional front view showing a state in which the firing unit shown in Fig. 1 is not stored in the sealed sister. Fig. 4 is a partial cross-sectional front view showing the firing unit of the second embodiment. Fig. 5 is a plan view showing a portion of the firing unit shown in Fig. 4 cut away. Fig. 6 is a partial cross-sectional front view showing a state in which a plurality of firing units of the first or second embodiment are stacked and stored in a pocket. Figs. 7(4) to 7(4) are views showing the firing of the ceramic board of the third embodiment. - Figure 8 is a diagram showing the state of the multi-layered layer locator. Fig. 8 is a view showing the state of the third embodiment. 91939.doc5 Figs. 9(a) to 9(c) are diagrams showing the state of each element in the firing process in the third embodiment. Fig. 1 is a view showing a locator of a different aspect in the third embodiment. Fig. 11 is a view showing a different position locator in the third embodiment. Fig. 12 is a plan view showing a state in which the unprocessed ceramic plate is degummed according to the fourth embodiment. Fig. 13 is a plan view showing a state in which degumming of the unprocessed ceramic plate is performed according to the fourth embodiment. Fig. 14 is an enlarged view showing the surface of the ruthenium oxide locator shown in Figs. 12 and 13; Fig. 15 is a vertical cross-sectional view showing a state in which a raw ceramic plate is fired according to the fourth embodiment. Fig. 16 is a horizontal cross-sectional view showing a part of a state in which a raw ceramic plate is fired according to the fourth embodiment. Figure 17 is a perspective view showing the ceramic plate finally obtained according to the fourth embodiment. [Description of Symbols] 1 Positioner 2 Ceramic Plate 2a Side of Ceramic Plate 2b Upper Surface of Ceramic Plate 3 Spacer 4 Enclosing Member 5 Oxidation Error Locator 9!939.doc5 -41 - 1323247 5a Below the yttrium oxide locator 7 Basin 10 Locator 10A Upper locator 10B Lower locator 12 Ceramic plate 14 Pillar part 16 Spacer 20 Multi-layer Locator 22 Basin 22a Basin Upper opening body portion 22b spider cover portion 24 surrounding member 31 plate-shaped raw ceramic plate 32 yttrium oxide locator 32A zirconia locator 33 material escape concave and convex portion 34 zirconia spacer 35 firing furnace 36 piezoelectric Ceramic plate 37 External electrode 100 Burning unit s Clearance 91939.doc5 -42-