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TWI264564B - Radiation sensitive composition for color filter, color filter, manufacturing method of liquid crystal color display, and forming method of colored layer of color filter - Google Patents

Radiation sensitive composition for color filter, color filter, manufacturing method of liquid crystal color display, and forming method of colored layer of color filter Download PDF

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Publication number
TWI264564B
TWI264564B TW092132336A TW92132336A TWI264564B TW I264564 B TWI264564 B TW I264564B TW 092132336 A TW092132336 A TW 092132336A TW 92132336 A TW92132336 A TW 92132336A TW I264564 B TWI264564 B TW I264564B
Authority
TW
Taiwan
Prior art keywords
color filter
acid
weight
meth
pigment
Prior art date
Application number
TW092132336A
Other languages
Chinese (zh)
Other versions
TW200417755A (en
Inventor
Hideyuki Kamii
Yoshinobu Suzuki
Kazuaki Niwa
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200417755A publication Critical patent/TW200417755A/en
Application granted granted Critical
Publication of TWI264564B publication Critical patent/TWI264564B/en

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)

Abstract

The present invention provides a forming method of a radiation sensitive composition of a color filter and a colored layer of a color filter, which can form a colored layer of an even thickness with a high production yield without making uneven coating often caused by a slot die coater. The radiation sensitive composition of a color filter contains (A) pigment, (B) alkaline soluble resin, (C)poly-function monomer, (D) optical radical generator, and (E) solvent. When denoting its viscosity by A (mPa.s), its surface tension by B (mN/m), and the coating speed by V (m/s), the value (AxV/B)is less than 4.0x10<-2>, and it is used when coating by using a slot die coater. The forming method of the colored layer of a color filter uses the above composition, while making the coating speed 0.07 m/s or faster but 0.15 m/s or less.

Description

1264564 0) 玖、發明說明 【發明所屬之技術領域】 本發明係有關彩色濾光片用輻射線敏感性組成物、彩 色濾光片、彩色液晶顯示裝置及彩色濾光片用著色層的形 成方法,更詳細係有關可用於製造穿透型或反射型之彩色 液晶顯示裝置、彩色攝像管元件等所用之彩色濾光片之狹 縫模塗機塗佈用之彩色濾光片用輻射線敏感性組成物、具 有由該彩色濾光片用輻射線敏感性組成物所形成之著色層 之彩色濾光片、具備該彩色濾光片之彩色液晶顯示裝置及 使用該彩色濾光片用輻射線敏感性組成物之彩色濾光片用 著色層的形成方法。 【先前技術】 使用著色輻射敏感性組成物製造彩色濾光片時,一般 係使用旋轉塗佈機或狹縫、旋轉塗佈機塗佈,但是近年爲 了高效率塗佈被塗液,降低成本,使無旋轉機構之塗佈機 、即狹縫模塗機受到矚目。 近年,爲了增加一片基板之斜面數,使基板朝大尺寸 發展,因此必須提高塗佈速度,防止生產時間過長的情形 〇 狹縫模塗機如月刊顯不器((股)T e c h η 〇 t i m e s發行 ),’〇2,9月份,pi 1卜1 15或月刊顯示器((股) Technotimes發行),’02,9月份,p.34-41所介紹,具備 具有與塗佈方向直交之狹縫噴嘴之狹縫模,使該狹縫模或 -5- 1264564 塗佈之基板依塗佈方向移動,由該狹縫噴嘴吐出被塗液, 然後進行塗佈之裝置5可將被塗液在不浪費的狀態下塗佈 於基板上5且相較於旋轉器等之旋轉系之塗佈機而言,狹 縫模塗機之生產時間較短:可節省使用之能源等之優點。 但是以狹縫模塗機塗佈提高塗佈速度時,以往之彩色 濾光片用輻射線敏感性組成物對於狹縫噴嘴之吐出速度與 基板之潤濕性失去平衡,產生塗佈不均的問題。 【發明內容】 發明欲解決的問題 本發明之目的係提供利用狹縫模塗機塗佈時,不會產 生塗佈不均,可以高產品良率,且高效率形成均勻膜厚之 著色層的彩色濾光片用輻射線敏感性組成物及彩色濾光片 用著色層的形成方法。本發明之其他目的即優點如下述。 解決問題的方法 本發明人等精心檢討狹縫模塗機之前述問題,結果發 現彩色濾光片用輻射線敏感性組成物之黏度及由表面張力 與塗佈速度所得之特定參數與塗佈性有密切關係,遂完成 本發明。 依據本發明時,本發明之上述目的及優點,第1可藉 由下述彩色濾光片用_射線敏感性組成物來達成,該彩色 濾光片用輻射線敏感性組成物係含有(A )顏料、(B ) 鹼可溶性樹脂、(C )多官能性單體、(D )光自由基引 -6- (3) 1264564 發劑及(E )溶媒,其黏度爲A(mPa· 爲B ( mN / m ),且塗佈速度爲V ( m / B )之値未達4.〇χ1 (Γ2,用於狹縫模塗機 本發明中所謂「輻射線」係指包含 遠紫外線、電子射線、X射線等。 依據本發明時,本發明之上述目的 由下述彩色濾光片用著色層的形成方法 使用前述彩色濾光片用輻射線敏感性組 成者色層的方法,其中該輻射線敏感性 爲〇.〇7 m/ s以上,且利用狹縫模塗機家 發明之效果 依據本發明時,利用狹縫模塗機塗 佈不均,可以高產品良率,且高效率形 濾光片用著色層。 因此,本發明之彩色濾光片用輻射 彩色濾光片用著色層的形成方法極適用 域之彩色液晶顯示裝置用彩色濾光片之 【實施方式】 實施發明之最佳形態 以下詳細說明本發明。 s )、其表面張力 / S )時,(A X V 二 之塗佈。 可見光 '紫外線、 及優點,第2可藉 來達成,其特徵係 成物,在基板上形 組成物之塗佈速度 15形成。 佈時,不會產生塗 成均勻膜厚之彩色 線敏感性組成物及 於形成電子工業領 各種彩色濾光片用 (4) 1264564 彩色濾光片用輻射線敏感性組成物 一 (A )顏料一 本發明之顏料由於彩色濾光片要求高純度及高透過性 之發色及耐熱性 &gt; 因此有機顏料爲佳。 前述有機顏料例如有顏料索引(C.l. ( Colour Index );The Society of Dyers and Colourists 公司出版)中分 類爲色素(Pigment )之化合物,具體例如下述顏料索引 (C。I ·)編號者。 C,I.色素黃12、C。I.色素黃13、C. I.色素黃14、C. I.色素黃17、C· I.色素黃20、C. I.色素黃24、C. I.色素 黃31、C. I.色素黃55、C. I.色素黃83、C. I.色素黃93、 C. I.色素黃109、C. I.色素黃110、C. I.色素黃 138、C. I.色素黃139、α I.色素黃150、C. I.色素黃153、C· I.色 素黃154、C. I.色素黃155、C. I.色素黃166、C. I.色素 黃168、C.I.色素黃211; c。I.色素橘36、C· I.色素橘43、C. I.色素橘51、C. I.色素橘6 1、C . I.色素橘7 1 ; C . L色素紅9、C . I.色素紅9 7、C · I.色素紅1 2 2、C . I.色素紅123、C. I.色素紅149、C. I.色素紅168、C. I.色 素紅1 7 6、C „ I.色素紅1 7 7、C „ I.色素紅1 8 0、C . I.色素 紅2 0 7、C . I.色素紅2 0 8、C . I.色素紅2 0 9、C . I.色素紅 215、C. I.色素紅224、C. I.色素紅242、C. I.色素紅254 C.I.色素紫19、C.I.色素紫23、C.I.色素紫29; (5) 1264564 C. I.色素監15、C. I·色素藍6〇、c· I.色素藍15: 3 、(:.I·色素藍 1 5 : 4、C. I.色素藍 1 5 : 6、 C. I»色素’祿7、C。I.色素綠36、c· I.色素綠136、C. I色素綠2 1 Ο ; C. I·色素棕23、C. I.色素棕25; 這些有機顏料可單獨或混合2種以上使用。 本發明中’有機顏料可使用再結晶法、再沉澱法、溶 劑洗淨法、昇華法、真空加熱法或這些組合之方法來純化 〇 無機顏料例如有氧化鈦、硫酸鋇、碳酸鈣、氧化鋅、 硫酸鉛、黃色錯、鋅黃、紅色氧化鐵(III )、鎘紅、群 青、普魯士藍、氧化鉻綠、鈷綠、琥珀、酞黑、合成鐵黑 、碳黑等。 這些無機顏料可單獨使用或混合兩種以上使用。 本發明中,必要時,前述顏料可與一種以上之染料、 天然色素等倂用。 本發明中,各顏料可依需要以聚合物將其粒子表面改 質來使用。顏料之粒子表面之改質之聚合物例如有日本特 開平8 - 2 5 98 76號公報等所記載之聚合物或市售之各種顏 料分散用之聚合物或低聚物等。 本發明中,必要時,顏料可與分散劑一同使用。 前述分散劑,例如有陽離子系、陰離子系、非離子系 、兩性、聚矽氧烷系、氟系等之界面活性劑。 這種界面活性劑例如有聚氧乙録月桂醚、聚氧乙烯硬 (6) 1264564 脂醯醚、聚氧乙烯油醚等之聚氧乙烯烷醚類;聚氧乙烯正 辛基苯釀、聚氧乙燒正壬基苯醚等之聚氧乙烯烷基苯醚類 ;聚乙二醇二月桂酸酯、聚乙二醇二硬脂酸酯等之聚乙二 醇二醋類;山梨糖醇酐脂肪酸酯類;脂肪酸改性聚酯類; 三級胺改性聚胺基甲酸酯類;聚乙烯亞胺類等,及以下商 品名之KP(信越化學工業(股)製)、p〇ly fl〇W (共榮 公司化學(股)製)、FTOP(TOKEM PRODUCTS公司製 )、Megafac (大日本油墨化學工業(股)製)、Fi〇rade (住友 3Μ(β又)製)、AsahiGard、Sarflone (以上爲旭 玻璃(股)製)、Disperbyk ( Beak Chemi 公司製)、 Solserse ( ZENEKA 公司製)等。 這些界面活性劑可單獨或混合兩種以上使用。 分散劑之使用量係對於顏料1 〇 〇重量份時,通常爲 5 〇重量份以下,理想爲3 0重量份以下。 一(B )鹼可溶性樹脂一 本發明之(B )鹼可溶性樹脂係對於(a )顏料具有 黏著劑作用,且於製造彩色濾光片時,對於顯像處理步驟 中所用之顯像液,特別是對於鹼顯像液具有可溶性者即可 ’並無特別限定,但以具有羧基之鹼可溶性樹脂爲佳,特 別以具有1個以上之羧基的乙烯性不飽和單體(以下稱爲 「含羧基不飽和單體」)與其他可共聚之乙烯性不飽和單 體(以下稱爲「共聚性不飽和單體」)的共聚物(以下稱 爲「含羧基共聚物」)爲佳。 -10 - (7) 1264564 含羧基不飽和單體例如有: (甲基)丙烯酸、丁烯酸、α -氯丙烯酸、肉桂酸等 不飽和單羧酸類; 馬來知、馬來酸酐、富馬酸衣康酸、衣康酸酐、檸 康酸、檸康酸酐 '中康酸等之不飽和二羧酸或其酸酐類; 二價以上之不飽和多元羧酸或其酸酐類; 號拍酸單〔2-(甲基)丙烯醯氧基乙基〕酯、琥珀酸 單L 2-(甲基)丙烯醯氧基乙基〕酯等之二價以上之多元 殘酸之單〔(甲基)丙烯醯氧基烷基〕酯類; ω -竣基聚己內酯單(甲基)丙烯酸酯等之兩末端具 有竣基與羥基之聚合物的單(甲基、)丙烯酸酯類等。 适些含殘基不飽和單體中,琥珀酸單(2_丙烯醯氧基 乙基)醋及苯二甲酸單(2 -丙烯醯氧基乙基)酯係分別以 Μ-5 3 00及Μ- 5 4 0 0 (東亞合成(股)公司製)之商品名在 市面販售。 上述含羧基不飽和單體可單獨或混合2種以上使用。 此外,共聚性不飽和單體例如有: 苯乙烯、α -甲基苯乙烯、鄰-乙烯基甲苯、間-乙烯 基甲苯、對··乙烯基甲苯、對-氯苯乙烯、鄰-甲氧基苯乙 烯、間-甲氧基苯乙烯、對-甲氧基苯乙烯、鄰-乙烯苯甲 基甲醚、間-乙烯苯甲基甲醚、對-乙烯苯甲基甲醚、鄰_ 乙烯苯甲基縮水甘油醚、間-乙燒苯甲基縮水甘油醚、對_ 乙烯苯甲基縮水甘油醚等芳香族乙烯基化合物; 茚、1-甲基茚等之茚類; - 11 - (8) 1264564 (甲基)丙稀酸甲醋、(甲基)丙烯酸乙酯、(甲基 )界烯酸正丙酯、(甲基)丙烯酸骞丙酯、(甲基)丙烯 酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二 丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸2 -羥 乙酯、(甲基)丙烯酸2 -羥丙酯、(甲基)丙烯酸3 -羥 汽酯、(甲基)丙烯酸2-羥丁酯、(甲基)丙烯酸3_羥 丁醋、(甲基)丙嫌酸I羥丁酯、(甲基)丙烯酸烯丙 醋、(甲基)丙烯酸苯甲酯、(甲基)丙烯酸環己酯、( 甲棊)芮烯酸苯酯、(甲基)丙烯酸2_甲氧基乙酯、( 甲基)丙烯酸2-苯氧基乙酯、(甲基)丙烯酸甲氧基二 乙二醇酯、(甲基)丙烯酸甲氧基Η乙二醇酯、(甲基) 丙烯酸甲氧基丙二醇醋、(甲基)丙烯酸甲氧基二丙二醇 醋、(甲基)丙烯酸異冰片酯、(甲基)丙烯酸三環〔 5.2.1.02,6〕癸烷-I酯、(甲基)丙烯酸2 -羥基-3-苯氧基 丙醋、(甲基)甘油單丙烯酸酯等之不飽和羧酸酯類; (甲基)丙烯酸2 -胺基乙酯、(甲基)丙烯酸2 -二 甲胺基乙酯、(甲基)丙烯酸2-胺基丙酯、(甲基)丙 烯酸2-二甲胺基丙酯、(甲基)丙烯酸3-胺基丙酯、( 甲基)丙烯酸3 -二甲胺基丙酯等之不飽和羧酸胺基烷酯 類; (甲基)丙烯酸縮水甘油酯等之不飽和羧酸縮水甘油 酯類; 乙酸乙烯酯、丙酸乙烯酯、丁酸乙烯酯、苯甲酸乙烯 酯等之羧酸乙烯酯類; -12 - (9) 1264564 乙烯基甲醚、乙烯基乙醚、烯丙基縮水甘油醚等之不 飽和醚類; (甲基)丙烯醯腈' α -氯丙烯醯腈、乙烯叉二腈等 之乙烯腈化合物; (甲基)丙烯醯胺、α-氯丙烯醯胺、(甲基)Ν-2-羥基乙基丙烯醯胺等之不飽和醯胺類; 馬來醯亞胺、Ν -苯基馬來醯亞胺、Ν -環己基馬來醯亞 胺等之不飽和醯亞胺類; 1,3 -丁二烯、異戊二烯、氯丁二烯等之脂肪族共軛二 烯類; 聚苯乙烯、(甲基)聚丙烯酸甲酯、(甲基)聚丙烯 酸正丁酯、聚矽氧烷等之聚合物分子鏈末端具有單(甲基 )丙烯醯基之巨分子單體類等。 這些共聚性不飽和單體可單獨或混合.2種以上使用。 本發明中含羧基共聚物係以(甲基)丙烯酸爲必須成 分,視情況可爲含有至少一種選自琥珀酸單〔2 -(甲基) 丙烯醯氧基乙基〕酯及羧基聚己內酯單(甲基)丙烯 酸酯群之化合物之含羧基不飽和單體成分與至少一種選自 苯乙烯、(甲基)丙烯酸甲酯、(甲基)2-羥基乙基丙烯 酸酯、(甲基)烯丙基丙烯酸酯、(甲基)丙烯酸苯甲酯 、(甲基)甘油單甲基丙烯酸酯、Ν-苯基馬來醯亞胺、聚 苯乙烯巨單體及聚甲基丙烯酸甲酯巨單體組群之單體的共 聚物。 這種共聚物之具體例有: -13- (10) 1264564 (甲基)丙烯酸/ (甲基)丙烯酸甲酯共聚物、 (甲基)丙烯酸/(甲基)丙烯酸苯甲酯共聚物、 (甲基)丙烯酸/(甲基)丙烯酸2 -羥乙酯/(甲 基)丙烯酸苯甲酯共聚物、 (甲基)丙烯酸/(甲基)丙烯酸甲酯/聚苯乙烯巨 單體共聚物、1264564 0) TECHNICAL FIELD OF THE INVENTION The present invention relates to a radiation sensitive composition for a color filter, a color filter, a color liquid crystal display device, and a method for forming a colored layer for a color filter. More detailed is the radiation sensitivity of a color filter for coating a slot die coater which can be used for manufacturing a color filter for a transmissive or reflective type color liquid crystal display device, a color image sensor device, or the like. a composition, a color filter having a coloring layer formed of the radiation sensitive composition of the color filter, a color liquid crystal display device having the color filter, and radiation sensitive using the color filter A method of forming a colored layer for a color filter of a sexual composition. [Prior Art] When a color filter is produced by using a colored radiation-sensitive composition, it is generally applied by a spin coater, a slit, or a spin coater, but in recent years, in order to apply a coating liquid with high efficiency, cost is reduced. The coater without a rotating mechanism, that is, the slit die coater, was noticed. In recent years, in order to increase the number of slopes of a substrate and to develop the substrate toward a large size, it is necessary to increase the coating speed and prevent the production time from being too long. The slit die coater such as the monthly publication T ech η 〇 Times release), '〇2, September, pi 1 Bu 1 15 or monthly display ((Technology) issued by Technotimes), '02, September, p.34-41, with the narrowness of the direction of the coating Slotting the slot die to move the slot die or the -5 - 264564 coated substrate in the coating direction, and discharging the coating liquid from the slit nozzle, and then applying the device 5 to apply the coating liquid The coating machine which is applied to the substrate 5 without waste and which is compared with the rotary system of the rotator or the like has a short production time of the slit die coater: it can save the advantages of energy used and the like. However, when the coating speed is increased by the slit die coater, the radiation sensitive composition of the conventional color filter is out of balance with the discharge speed of the slit nozzle and the wettability of the substrate, resulting in uneven coating. problem. DISCLOSURE OF INVENTION PROBLEM TO BE SOLVED BY THE INVENTION An object of the present invention is to provide a color layer which can be formed by a slit die coater without uneven coating, high product yield, and high efficiency to form a uniform film thickness. A method of forming a luminescent composition for a color filter and a colored layer for a color filter. Other objects and advantages of the present invention are as follows. Means for Solving the Problems The inventors of the present invention have carefully reviewed the aforementioned problems of the slit die coater, and as a result, found that the viscosity of the radiation sensitive composition of the color filter and the specific parameters and coating properties obtained from the surface tension and the coating speed are found. There is a close relationship between the completion of the present invention. According to the present invention, the above objects and advantages of the present invention can be attained by the following color filter using a ray-sensitive composition containing a radiation sensitive composition (A) ) pigment, (B) alkali-soluble resin, (C) polyfunctional monomer, (D) photoradical -6-(3) 1264564 hair agent and (E) solvent, the viscosity of which is A (mPa· is B) (mN / m), and the coating speed is V (m / B) is less than 4.〇χ1 (Γ2, for the slot die coater, the term "radiation" in the present invention means that it contains far ultraviolet rays, electrons According to the present invention, the above object of the present invention is to provide a method for forming a colored layer for a color filter, which is a method for forming a color layer of a radiation sensitive composition for a color filter, wherein the radiation is used. The line sensitivity is 〇.〇7 m/s or more, and the effect of the invention by the slit die coater according to the present invention is unevenly coated by the slit die coater, and can be high in product yield and high in efficiency. a coloring layer for a filter. Therefore, the color filter for a color filter of the present invention uses a colored layer for a color filter. BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described in detail below. s), surface tension / S), (AXV II coating). The visible light 'ultraviolet light, and the advantages, the second can be achieved by borrowing, and the characteristic system is formed on the substrate at a coating speed of 15 on the substrate. When the cloth is applied, the color line sensitive composition coated with the uniform film thickness is not generated. For the formation of various color filters for the electronics industry (4) Radiation sensitive composition for 1264564 color filters - (A) pigments - Pigments of the invention require high purity and high permeability due to color filters Color development and heat resistance&gt; Therefore, an organic pigment is preferable. The above-mentioned organic pigment is, for example, a compound classified as a pigment in a pigment index (Cl (Color Index); published by The Society of Dyers and Colourists), specifically, for example, The pigment index (C.I.) number is C. I. Pigment Yellow 12, C. I. Pigment Yellow 13, CI Pigment Yellow 14, CI Pigment Yellow 17, C·I. Pigment Yellow 20, CI Pigment 24, CI Pigment Yellow 31, CI Pigment Yellow 55, CI Pigment Yellow 83, CI Pigment Yellow 93, CI Pigment Yellow 109, CI Pigment Yellow 110, CI Pigment Yellow 138, CI Pigment Yellow 139, α I. Pigment Yellow 150, CI Pigment Yellow 153, C·I. Pigment Yellow 154, CI Pigment Yellow 155, CI Pigment Yellow 166, CI Pigment Yellow 168, CI Pigment Yellow 211; c. I. Pigment orange 36, C·I. Pigment orange 43, CI pigment orange 51, CI pigment orange 6 1 , C. I. Pigment orange 7 1 ; C. L pigment red 9, C. I. Pigment red 9 7 C · I. Pigment Red 1 2 2, C. I. Pigment Red 123, CI Pigment Red 149, CI Pigment Red 168, CI Pigment Red 167, C „ I. Pigment Red 1.7, C „ I. Pigment Red 1 800, C. I. Pigment Red 2 0 7 , C. I. Pigment Red 2 0 8 , C. I. Pigment Red 2 0 9 , C. I. Pigment Red 215, CI Pigment Red 224, CI Pigment Red 242, CI Pigment Red 254 CI Pigment Violet 19, CI Pigment Violet 23, CI Pigment Violet 29; (5) 1264564 CI Pigment Monitoring 15, C. I. Pigment Blue 6〇, c· I. Pigment Blue 15: 3, (:.I. Pigment Blue 1 5 : 4, CI Pigment Blue 1 5 : 6, C. I» Pigment 'Lu 7, C. I. Pigment Green 36, c· I. Pigment Green 136, C. I Pigment Green 2 1 Ο ; C. I·Pigment Brown 23, CI Pigment Brown 25; These organic pigments may be used alone or in combination of two or more. In the present invention, the organic pigment may be subjected to a recrystallization method, a reprecipitation method, a solvent washing method, or the like. Sublimation method, vacuum heating method or a combination of these methods to purify cerium inorganic pigments such as titanium oxide or barium sulfate Calcium carbonate, zinc oxide, lead sulfate, yellow wrong, zinc yellow, red iron oxide (III), cadmium red, ultramarine blue, Prussian blue, chrome oxide green, cobalt green, amber, black, synthetic iron black, carbon black and the like. These inorganic pigments may be used singly or in combination of two or more. In the present invention, if necessary, the pigment may be used in combination with one or more dyes, natural pigments, etc. In the present invention, each pigment may be a polymer in a particle thereof as needed. For the modification of the surface of the pigment, the polymer of the surface of the pigment is modified, for example, a polymer described in JP-A No. 8-2, 98, 76, or a commercially available polymer or oligomer for dispersing various pigments. In the present invention, the pigment may be used together with a dispersing agent, if necessary. The dispersing agent may, for example, be a cationic, anionic, nonionic, amphoteric, polyoxyalkylene or fluorine surfactant. The surfactants include polyoxyethylene alkyl ethers such as polyoxyethylene laurate, polyoxyethylene hard (6) 1264564 decyl ether, polyoxyethylene oleyl ether, polyoxyethylene n-octyl benzene, and polyoxyethylene.乙烧正壬Polyoxyethylene alkyl phenyl ethers such as phenyl ether; polyethylene glycol diacetates such as polyethylene glycol dilaurate or polyethylene glycol distearate; sorbitan fatty acid esters; fatty acids Modified polyesters; tertiary amine modified polyurethanes; polyethyleneimines, etc., and KP (Shin-Etsu Chemical Co., Ltd.), p〇ly fl〇W (commonly owned) Company chemical (share) system, FTOP (made by TOKEM PRODUCTS), Megafac (made by Dainippon Ink Chemical Industry Co., Ltd.), Fi〇rade (made by Sumitomo 3Μ (β), AsahiGard, Sarflone (above is Asahi Glass) (share) system, Disperbyk (made by Beak Chemi), Solserse (made by ZENEKA), etc. These surfactants can be used singly or in combination of two or more. The amount of the dispersant used is usually 5 parts by weight or less, and preferably 30 parts by weight or less, based on 1 part by weight of the pigment. (B) alkali-soluble resin - (B) The alkali-soluble resin has an adhesive action on (a) a pigment, and is particularly useful for a developing liquid used in a developing treatment step in the production of a color filter. It is not particularly limited as long as it is soluble in the alkali developing solution, but it is preferably an alkali-soluble resin having a carboxyl group, and particularly an ethylenically unsaturated monomer having one or more carboxyl groups (hereinafter referred to as "carboxyl group-containing". A copolymer of an unsaturated monomer ") and another copolymerizable ethylenically unsaturated monomer (hereinafter referred to as "copolymerizable unsaturated monomer") (hereinafter referred to as "carboxyl-containing copolymer") is preferred. -10 - (7) 1264564 Carboxyl-containing unsaturated monomers are, for example, unsaturated monocarboxylic acids such as (meth)acrylic acid, crotonic acid, α-chloroacrylic acid, and cinnamic acid; maleic anhydride, maleic anhydride, and fumar An unsaturated dicarboxylic acid or an anhydride thereof, such as acid itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride, meconic acid, or the like; a divalent or higher unsaturated polycarboxylic acid or an anhydride thereof; [2-(meth) propylene oxiranyl ethyl] ester, succinic acid mono L 2-(methyl) propylene methoxyethyl] ester, etc. An acryloxyalkylene ester; a mono(methyl) acrylate having a polymer of a thiol group and a hydroxyl group at both ends of the ω-mercaptopolycaprolactone mono(meth)acrylate or the like. Among the suitable residue-containing unsaturated monomers, succinic acid mono(2-propenyloxyethyl) vinegar and phthalic acid mono(2-propenyloxyethyl) ester are respectively Μ-5 3 00 and商品 - 5 4 0 0 (product of East Asia Synthetic Co., Ltd.) is sold in the market. These carboxyl group-containing unsaturated monomers may be used alone or in combination of two or more. Further, the copolymerizable unsaturated monomer is, for example, styrene, α-methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxy Styrene, m-methoxystyrene, p-methoxystyrene, o-vinylbenzyl methyl ether, m-vinylbenzyl methyl ether, p-vinylbenzyl methyl ether, o-ethylene An aromatic vinyl compound such as benzyl glycidyl ether, m-ethyl benzyl glycidyl ether, p-vinyl benzyl glycidyl ether; anthracene such as hydrazine or 1-methyl hydrazine; - 11 - ( 8) 1264564 methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (methyl) bromide, isopropyl propyl (meth) acrylate, n-butyl (meth) acrylate, Isobutyl (meth)acrylate, second butyl (meth)acrylate, tert-butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate , 3-hydroxyl ester of (meth)acrylic acid, 2-hydroxybutyl (meth)acrylate, 3-hydroxybutyrate (meth)acrylate, (meth)acrylic acid Ihydroxybutyrate , (meth)acrylic acrylic acid, benzyl (meth) acrylate, cyclohexyl (meth) acrylate, phenyl (meth) decenoate, 2-methoxyethyl (meth) acrylate , 2-phenoxyethyl (meth)acrylate, methoxydiethylene glycol (meth)acrylate, methoxyethylene glycol (meth)acrylate, methoxy (meth)acrylate Propylene glycol vinegar, methoxydipropylene glycol (meth)acrylate, isobornyl (meth)acrylate, tricyclo [5.2.1.02,6]decane-I ester, (meth)acrylic acid 2 -Unsaturated carboxylic acid esters such as hydroxy-3-phenoxypropyl vinegar and (meth) glycerol monoacrylate; 2-aminoethyl (meth)acrylate and 2-dimethylamine (meth)acrylate Ethyl ethyl ester, 2-aminopropyl (meth)acrylate, 2-dimethylaminopropyl (meth)acrylate, 3-aminopropyl (meth)acrylate, 3 -di(meth)acrylate Aminoalkyl esters of unsaturated carboxylic acids such as methylaminopropyl acrylate; glycidyl acrylates of unsaturated carboxylic acid such as glycidyl (meth)acrylate; vinyl acetate Vinyl carboxylate such as vinyl propionate, vinyl butyrate or vinyl benzoate; -12 - (9) 1264564 unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether and allyl glycidyl ether (meth)acrylonitrile compound such as (meth)acrylonitrile nitrile 'α-chloropropene nitrile or vinylidene dinitrile; (meth)acrylamide, α-chloropropenylamine, (methyl)fluoren-2-hydroxyl Unsaturated guanamines such as ethyl acrylamide; unsaturated quinones such as maleimide, fluorene-phenylmaleimide, fluorene-cyclohexylmaleimide; - aliphatic conjugated dienes such as butadiene, isoprene, chloroprene, etc.; polystyrene, (methyl) polymethyl acrylate, (methyl) polybutyl acrylate, polyoxyl A macromolecular monomer having a mono(meth)acrylinyl group at the terminal of a polymer molecular chain such as an alkane or the like. These copolymerizable unsaturated monomers can be used singly or in combination of two or more kinds. The carboxyl group-containing copolymer of the present invention contains (meth)acrylic acid as an essential component, and optionally contains at least one selected from the group consisting of mono[2-(methyl)propenyloxyethyl] succinate and carboxyl group. The carboxyl group-containing unsaturated monomer component of the compound of the ester mono(meth)acrylate group and at least one selected from the group consisting of styrene, methyl (meth)acrylate, (meth) 2-hydroxyethyl acrylate, (methyl) Allyl acrylate, benzyl (meth) acrylate, (meth) glycerol monomethacrylate, Ν-phenyl maleimide, polystyrene macromonomer and polymethyl methacrylate a copolymer of monomers of the macromonomer group. Specific examples of such a copolymer are: -13-(10) 1264564 (meth)acrylic acid / methyl (meth)acrylate copolymer, (meth)acrylic acid / benzyl (meth)acrylate copolymer, ( Methyl)acrylic acid/2-hydroxyethyl (meth)acrylate/benzyl (meth)acrylate copolymer, (meth)acrylic acid/methyl (meth)acrylate/polystyrene macromonomer copolymer,

(甲基)丙烯酸/(甲基)丙烯酸甲酯/聚甲基丙烯 酸甲酯巨單體共聚物、 (甲基)丙烯酸/(甲基)丙烯酸苯甲酯/聚苯乙烯 巨單體共聚物、 (甲基)丙烯酸/(甲基)丙烯酸苯甲酯/聚甲基丙 烯酸甲酯巨單體共聚物、 (甲基)丙烯酸/(甲基)丙烯酸 2 -羥乙酯/(甲 基)丙烯酸苯甲酯共聚物/聚苯乙烯巨單體共聚物、(meth)acrylic acid/methyl (meth)acrylate/polymethyl methacrylate macromonomer copolymer, (meth)acrylic acid/benzyl methacrylate/polystyrene macromonomer copolymer, (Meth)acrylic acid / benzyl (meth) acrylate / polymethyl methacrylate macromonomer copolymer, (meth) acrylate / 2-hydroxyethyl (meth) acrylate / benzene (meth) acrylate Methyl ester copolymer/polystyrene macromonomer copolymer,

(甲基)丙烯酸/(甲基)丙烯酸 2 -羥乙酯/(甲 基)丙烯酸苯甲酯/聚甲基丙烯酸甲酯巨單體共聚物、 甲基丙烯酸/苯乙烯/(甲基)丙烯酸苯甲酯/ N-苯 基馬來醯亞胺共聚物、 (甲基)丙烯酸/琥珀酸單〔2-(甲基)丙烯醯氧基 乙基〕酯/苯乙烯/(甲基)丙烯酸苯甲酯/ N-苯基馬來 醯亞胺共聚物、 (甲基)丙烯酸/琥珀酸單〔2 -(甲基)丙烯醯氧基 乙基〕酯/苯乙烯/(甲基)丙烯酸烯丙酯/ N-苯基馬來 醯亞胺共聚物、 -14 - (11) 1264564 (甲基)丙烯酸/苯乙烯/ (甲基)丙烯酸苯甲酯/ 甘油單(甲基)丙烯酸酯/ N -苯基馬來醯亞胺共聚物、 (甲基)丙烯酸/ω -羧基聚己內酯單(甲基)丙烯 酸酯/苯乙烯/(甲基)丙烯酸苯甲酯/甘油單(甲基) 丙烯酸酯/ Ν -苯基馬來醯亞胺共聚物等。 含羧基共聚物中含羧基不飽和單體之共聚比例理想爲 5〜5 0重量%,更理想爲1 〇〜4 0重量%。此種情況下,若 上述共聚比例未達5重量%時,所得輻射線敏感性組成物 對鹼顯像液之溶解度有降低的傾向,又超過5 0重量%時 ,對鹼顯像液之溶解度過高,以鹼顯像液顯像時,容易導 致由著色層基板上脫落或畫素表面產生膜粗糙的傾向。 鹼可溶性樹脂以膠體滲透層析法(GPC、溶出溶劑: 四氫呋喃)所測定之聚苯乙烯換算的重量平均分子量(以 下稱爲「]\^」)爲 3,000〜]00,000,更佳爲5;000〜 50.000 ° 又,鹼可溶性樹脂以膠體滲透層析法(GP C、溶出溶 劑:四氫呋喃)所測定之聚苯乙烯換算的數目平均分子量 (以下稱爲「Μη」)爲1,〇〇〇〜40,000,較佳爲2,〇〇〇〜 20.000 ° 又,鹼可溶性樹脂之M w與Μ η比(μ w / Μ η )理想 爲1〜5,更理想爲1〜4。 本發明中,藉由使用具有這種特定Mw及Μη之鹼可 溶性樹脂,可獲得顯像性優異之輻射線敏感性組成物,藉 此可形成具有淸晰圖案邊緣之像素圖案,而且顯像時未曝 -15- (12) 1264564 光部分之基板上及遮光層上不易產生殘渣、污染、膜殘留 等。 本發明中,(B )鹼可溶性樹脂可單獨使用或混合2 種以上來使用。 本發明之(B )鹼可溶性樹脂之使用量係對於(A ) 顏料1 0 〇重量份時,理想爲使用1 〇〜1,⑽〇重量份,更理 想爲2 0〜5 0 0重量份。此種情況下’若驗可溶性樹脂之使 用量未達1 〇重量份時,可能發生例如鹼顯像性降低,未 曝光部分之基板上及遮光層上產生污染或膜殘留,另一方 面若超過1,〇〇〇重量份時,由於顏料濃度降低’因此,有 時薄膜難以達到目的之色濃度。 —(C )多官能性單體一 本發明之(c )多官能性單體係具有2個以上聚合性 不飽和鍵之單體。 多官能性單體例如有: 乙二醇、丙二醇等之烷二醇之二(甲基)丙烯酸酯類 聚乙二醇、聚丙二醇等之聚烷二醇之二(甲基)丙烯 酸酯類; 甘油、三羥甲基丙烷、季戊四醇、二季戊四醇等之3 價以上之多元醇之聚(甲基)丙烯酸酯類或其二羧酸改質 物; 聚酯、環氧樹脂、胺基甲酸酯樹酯、醇酸樹脂、聚矽 -16 - (13) 1264564 氧樹醋、螺烷樹酯等之低聚(甲基)丙烯酸酯類 兩末端羥基聚丁二烯、兩末端羥基聚異 兩末端羥基聚己內酯等兩末端羥基化聚合物之二 丙烯酸酯類;或 三〔2-(甲基)丙烯醯氧基乙基〕磷酸酯等 這些多官能性單體中,3價以上之多元醇之 )丙烯酸酯類或其二羧酸改質物中,從著色層之 面平滑性優越,且未曝光部分之基板上及遮光層 生污染、膜殘留等方面而言,較佳者爲三羥甲基 甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯 醇四(甲基)丙烯酸酯、二季戊四醇五(甲基) 、二季戊四醇六(甲基)丙烯酸酯等,特別理想 基丙烷三丙烯酸酯、季戊四醇三丙烯酸酯及二季 丙烯酸酯。 上述多官能性單體可單獨使用或混合兩種以 本發明之多官能性單體之使用量係對於(B 性樹脂]0 0重量份時,理想爲使用5 〇〜2 〇 〇重量 想爲7 5〜1 5 0重量份。此時,若多官能性單體之 達5重量份時,著色層之強度或表面平滑性有降 ’另一方面,若超過200重量份時,例如有鹼顯 或未曝光部分之基板上或遮光層上容易產生表面 殘留等的傾向。 本發明中,可以具有1個聚合性不飽和鍵之 單體取代多官能性單體之一部份。 戊二烯、 (甲基) 聚(甲基 強度及表 上不易產 丙烷三( 、季戊四 丙烯酸酯 爲三羥甲 戊四醇六 上使用。 )鹼可溶 份,更理 使用量未 低的傾向 像性降低 污染、膜 單官能性 -17 - (14) 1264564 上述單官能性單體例如有與(B )鹼可溶性樹脂所例 示之含羧基之不飽和單體或共聚性不飽和單體相同之單體 ,或N -(甲基)丙嫌醯基嗎啉、N -乙烯基吡略院酮、N — 乙錄基-£ &quot;己內釀胺;以及巾售品1\/1~5。00、\/1 - 5 4 0 0、1\/[-5 6 〇 0 (商品名,東亞合成(股)公司製)等。 這些單官能性單體可單獨使用或混合兩種以上使用。 單官能性單體之使用比例係對於單官能性單體與多官 能性單體之合計量時,使用5 0重量%以下,更理想爲2 0 重量%以下。此種情況下,若單官能性單體之使用比例超 過5 0重量%時,著色層之強度或表面平滑性恐不足。 此外,本發明中多官能性單體與單官能性單體之合計 使用量係對於(B )鹼可溶性樹脂之使用,量1 〇 〇重量份時 ,使用5 0〜3 0 0重量份,更理想爲7 5至1 8 0重量份。此 種情況時’上述合g十使用量未達 5 0重量份時,著色層之 強度或表面平滑性有降低之傾向,而超過3 0 0重量份時, 例如有鹼顯像性降低或未曝光部分之基板上或遮光層上容 易產生污染、膜殘留等的情形。 一 (D)光自由基產生劑一 本發明之光自由基產生劑係經可見光、紫外線、遠紫 外線電子線、X射線等之曝光,產生可使上述(c )多 B能性單體及視情況使用之單官能性單體開始聚合之自由 基的化合物。這種光自由基產生劑例如有乙醯苯系化合物 、聯二咪卩坐系化合物、m合物、苯偶姻系化合物、 -18 - (15) 1264564 二苯甲酮系化合物、α -二酮系化合物、多核醌系 '噻噸酮系化合物、重氮系化合物等。 本發明中,光自由基產生劑可單獨使用或混合 上使用,但本發明之中光自由基產生劑理想爲選自 系化合物、聯二咪唑系化合物及三畊系化合物群之 種 ° 本發明之較佳光自由基產生劑中,乙醯苯系化 具體例有: 羥基-2-甲基-1-苯基丙烷-卜酮、 2 -甲基—1- ( 4 -甲硫基苯基)-2 -嗎啉基丙酮-1、 2 &gt;苯甲基-2 -二甲胺基-1- ( 4 -嗎啉基苯基)丁酮 羥基環己基·苯基酮、 2,2 -二甲氧基_1,2 -二苯基乙烷-卜酮等。 這些乙醯苯系化合物中,特別理想爲2 -甲基-甲硫基苯基)-2 -嗎啉基丙酮-1、2 -苯甲基-2 -二甲 (4 -嗎啉基苯基)丁酮-1等。 上述乙醯苯系化合物可單獨使用或混合兩種以 〇 本發明中,光自由基產生劑使用乙醯苯系化合 其使用量係對於(C )多官能性單體與單官能性單j 計1 0 0重量份時,使用5〜8 0重量份,更理想爲 重量份,更理想爲2 0〜5 0重量份。此種情況下, 系化合物之使用量未達5重量份時,藉由曝光之硬 ,有時很難獲得畫素依據所期望排列配置之像素陣 化合物 兩種以 乙醯苯 至少一 合物之 1-(4-g 基 &gt;1- 上使用 物時, 體之合 ]0 〜60 乙醯苯 化不足 列,而 (16) 1264564 超過8 0重量份,所形成之著色層在顯像時,容易由基板 上脫落的傾向。 聯二咪唑系化合物之具體例有: 雙(2~氯苯基)-454\5,5^四(4 -乙氧羰基苯基 )-1,2 5 -聯二咪唑、 252、雙(2-溴苯基)-4,4’,5,5’·四(4-乙氧羰基苯基 )-1 ; 2、聯二咪唑、 2,25 -雙(2-氯苯基)-4,4’;5,5’-四苯基-1,2^聯二咪唑 2.2、 雙(2,4-二氯苯基)-4,4’,5,5、四苯基-1,2、聯二 咪唑、 2 5 2’-雙(254,6-三氯苯基)-454,55,5、四苯基-1;2’-聯 二咪唑、 2 ; 2、雙(2 -溴苯基)-4,4 ’,5 5 5、四苯基,2、聯二咪唑 2.2、 雙(2,4-二溴苯基)-454’,5,5、四苯基-1;2、聯二 咪唑、 2.2、 雙(2,4,6-三溴苯基)-4,4’;5;5、四苯基-1,2、聯 二咪唑等。 這些聯二咪唑系化合物中,較佳者爲2,2’-雙(2-氯 苯基)-4,4’55,5、四苯基-1,2、聯二咪唑、2,2、雙(2,4-二 氯苯基)-4,4’;5;5、四苯基-1,2’ -聯二咪唑、2;2、雙( 2,4,6-三氯苯基)_4;4’;5,5’-四苯基-1;2、聯二咪唑等,特 別理想爲2:2^雙(2,4-二氯苯基)-4,4’;5:5’-四苯基 -20- (17) 1264564 聯二咪唑。 前述聯二咪唑系化合物對於溶劑之溶解性優異,不會 產生未溶解物或析出物等異物’而且感度高,僅以少能量 曝光可充分進行硬化反應’且未曝光部位不產生硬化反應 ,因此,曝光後之塗膜可明確區分爲對於顯像液爲不溶性 之硬化部分與對於顯像液具有高溶解性之未硬化部分,藉 此可形成無凹陷之像素圖案依所定排列配置之高精細的像 素陣列。 前述聯二咪唑系化合物可單獨使用或混合兩種以上使 用。 本發明中,光自由基產生劑使用聯二咪唑系化合物時 之使用量係對於(C )多官能性單體與單官能性單體之合 計100重量份時,使用0.1〜40重量份,較佳爲0.1〜3〇 重量份,更佳爲0 . 1〜2 0重量份。此時,聯二咪唑系化合 物之使用量未達0 ·]重量份時,曝光之硬化不足,很難獲 得畫素圖案依所定排列配置之像素陣列,另一方面若超過 4 〇重量份時,顯像時,形成後之著色層有容易自基板脫 落的傾向。 一氫給予體〜 本發明中,光自由基產生劑使用聯二咪唑系化合物時 ,與下述氫給予體倂用可進一步改良感度。 所謂「氫給予體」係指對於經曝光由聯二咪唑系化合 物產生之自由基,可提供氫原子的化合物。 -21 - (18) 1264564 本發明之氯給予體理想爲以下述定義之锍系化合物、 胺系化合物等。 上述魷系化合物係由以苯環或雜環爲母核,具有丨個 以上,較佳爲1〜3個,更佳爲i〜2個直接與該母環鍵結 之基的化合物(以下稱爲「巯系氫給予體」)所構成。 胺系化合物係由以苯環或雜環爲母核,具有1個以上 ,較佳爲1〜3個,更佳爲1〜2個直接與該母環鍵結之胺 基的化合物(以下稱爲「胺系氫給予體」)所構成。 又’這些氫給予體也可同時具有毓基與胺基。 以下更具體說明這些氫給予體。 毓系氫給予體可分別具有1個以上之苯環或雜環,也 可同時具有苯環與雜環,具有2個以上之這些環時,可形 成或不形成縮合環。 又,锍系氫給予體具有2個以上酼基時,只要有至少 1個游離锍基殘留時,其餘锍基之丨個以上可被烷基、芳 燒基或芳基取代,此外只要至少有1個游離毓基殘留時, 可具有2個硫原子經由伸烷基等2價有機基鍵結之結構單 位’或具有2個硫原子以二硫形式鍵結的結構單位。 又,系氫給予體在毓基以外的部位可被羧基、烷氧 _基、取代之烷氧羰基、苯氧羰基、取代之苯氧羰基、腈 基等取代。 此類锍系氫給予體可具體例有2 -酼基苯并噻唑、2 -毓 基苯并噁噻唑、2 -锍基苯并咪唑、2,5 -二锍基-〗;3,4 -噻二 呼、2 -锍基-2,5 -二甲胺基吡啶等。 -22 - (19) 1264564 适些锍系氫給予體中’較佳者爲2 -酼基苯并噻ti坐、2、 锍基苯并噁噻D坐等’特別理想爲2 -巯基苯并噻D坐。 其次’胺系氫給予體可分別具有1個以上之苯環或雜 環’也可同時具有苯環與雜環二者,具有2個以上之這些 環時,可形成或不形成縮合環。 胺系氫給予體之1個以上之胺基可被院基或取代之院 基取代’此外’胺基以外之部位可被羧基、院氧鑛基、取 代之烷氧羰基、苯氧羰基、取代之苯氧羰基、腈基等取代 〇 這種胺系氫給予體之具體例有4,4,-雙(二甲胺基) 二苯甲酮、4;4、雙(二乙胺基)二苯甲酮、4_二乙胺基乙 醯苯、4 -二甲胺基丙醯苯、乙基-4 -二甲胺基苯甲酸酯、4 _ 二甲胺基苯甲酸、4 -二甲胺基苯腈等。 這些胺系氫給予體中,較佳者爲4,4,-雙(二甲胺基 )二苯甲酮、4,4 ^雙(二乙胺基)二苯甲酮等,特別理想 爲4,4,-雙(二乙胺基)二苯甲酮。 胺系氫給予體即使在聯二咪唑系化合物以外之光聚合 起始劑中,也具有增感劑之作用。 本發明中,氫給予體可單獨使用或混合兩種以上使用 ’組合1種以上之锍系氫給予體與1種以上之胺系氫給予 體來使用,可使形成後之著色層在顯像時不易自基板脫落 ’且可提高著色層之強度及感度。 锍系氫給予體與胺系氫給予體之組合之具體例爲2-毓基苯并噻唑/ 4,4 乂雙(二甲胺基)二苯甲酮、2 -锍基苯 -23- (20) 1264564 并噻唑/ 4 ^ 雙(二乙胺基)二苯甲酮、2 _锍基苯并噁唑 / 4,4 ^雙(二甲胺基)二苯甲酮、2-酼基苯并噁唑/ 4;4’-雙(二乙胺基)二苯甲酮等,更佳之組合爲2 -毓基苯并 噻唑/ 4,4 ^雙(二乙胺基)二苯甲酮、2 »锍基苯并噁唑/ 4,4 ^雙(二乙胺基)二苯甲酮等,特別理想的組合爲 2 -毓基苯并噻唑/ 4,4’-雙(二乙胺基)二苯甲酮。 锍系氫給予體與胺系氫給予體之組合,其中锍系氫給 予體與胺系氫給予體之重量比一般爲1 : 1〜1 : 4,更佳 爲 1 : 1 〜1 : 3。 本發明中,氫給予體與聯二咪唑系化合物倂用時,其 使用量係對於(C )多官能性單體與單官能性單體之合計 1 0 0重量份時,使用0 . 1〜3 0重量份、,更佳爲0 . 1〜2 0重 量份,特別理想爲〇. 1〜1 〇重量份。此時,氫給予體之使 用量未達0 . 1重量份時,感度之改良效果有降低的傾向, 而超過 3 0重量份時,形成後之著色層在顯像時有容易自 基板脫落的傾向。 上述三嗪系化合物之具體例有 2,4,6 -三(三氯甲基)-s-三嗪、 2-甲基- 4;6-雙(三氯甲基)-s-三嗪、 2-〔 2-(5-甲基呋喃-2-基)乙烯基〕-4,6-雙(三氯甲 基)-s -三嗪、 2-〔2-(呋喃-2-基)乙烯基〕-4,6-雙(三氯甲基)-s -三嗪、 2 ·〔 2 - ( 4 -二乙胺基-2 -甲基苯基)乙烯基〕-4,6 -雙( -24 - (21) 1264564 三氯甲基)-s -三嗪、 2-〔 2-(3,4-二甲氧基苯基)乙烯基 甲基)-s -三嗪、 2-(4 -甲氧基苯基)-4,6 -雙(三氯甲; 2-(4 -乙氧基苯乙烯基)-4,6-雙(三 2-(4-正丁氧基苯基)-4,6-雙(三氯 具有鹵甲基之三嗪系化合物。 這些三嗪系化合物中,特別理想者爲2 氧基苯基)乙烯基〕-4,6-雙(三氯甲基) 上述三嗪系化合物可單獨使用或混合 本發明中,使用三嗪系化合物作爲光 之使用量係對於(C )多官能性單體與單 計1 0 0重量份時,使用1〜4 0重量份,較 份,更佳爲1〜2 0重量份。此時,三嗪系 未達1重量份時,曝光之硬化不足,很難 所定排列配置之像素陣列,而超過4 0重 之著色層在顯像時,有容易自基板脫落的 —添加劑- 本發明之彩色濾光片用輻射線敏感性 時可添加各種添加劑。 前述添加劑例如進一步改善輻射線敏 鹼顯像液之溶解特性,且抑制顯像後未溶 〕-4,6-雙(三氯 基)-s -三嗪、 氯甲基)三D秦 甲基)-S -三嗪等 -〔2-( 3,4-二甲 -S -三嗦 〇 兩種以上使用。 自由基產生劑時 官能性單體之合 佳爲1〜3 0重籩 化合物之使用纛 獲得畫素圖案依 量份時,形成後 傾向。 組成物中,必荽 感性組成物對於 解物殘留的作用 -25- (22) 1264564 等之有機酸或有機胺化合物(但是不包括前述氫給予體) 〇 前述有機酸係以分子中具有1個以上羧基之脂族羧酸 或含苯基之羧酸爲佳。 上述脂族羧酸例如有甲酸、乙酸、丙酸、丁酸、戊酸 、三甲基乙酸、己酸、二乙基乙酸、庚酸、辛酸等脂族單 羧酸類; 草酸、丙二酸、琥珀酸、戊二酸、己二酸、庚二酸、 辛二酸、壬二酸、癸二酸、巴西二酸、甲基丙二酸、乙基 丙二酸、二甲基丙二酸、甲基琥珀酸、四甲基琥珀酸、環 辛二酸、衣康酸、檸康酸、馬來酸、富馬酸、中康酸等脂 族二羧酸類; 丙三殘酸、烏頭酸、樟腦三酸等脂族三羧酸類等。 上述含苯基之羧酸例如有羧基直接與苯基鍵結之化合 物或羧基經由碳鏈與苯基連接之化合物等。 含苯基之羧酸例如有: 苯甲酸、甲苯甲酸、枯茗酸、二甲基苯甲酸、三甲基 苯甲酸等芳族單羧酸類; 鄰-苯二甲酸、間、苯二甲酸、對-苯二甲酸等芳族二 羧酸類; 偏苯三酸、均苯三酸、偏苯四甲酸、均苯四甲酸等三 價以上之芳族多羧酸類;或 苯基乙酸、氫阿托酸、氫肉桂酸、苦杏仁酸、苯基琥 珀酸、阿托酸、肉桂酸、肉桂叉二酸、香豆酸、傘形酸等 -26- (23) 1264564 這些有機酸中,從對於鹼溶解性、後述溶劑之溶解性 及防止未曝光部之基板及遮光層上產生污染或膜殘留等觀 點而S ’脂族殘酸類以脂族二殘酸類爲佳,特別是己二酸 、衣康酸、檸康酸、富馬酸、中康酸等更佳,含苯基之羧 酸以芳族二羧酸類爲佳,苯二甲酸更佳。 上述有機酸可單獨使用或混合2種以上來使用。 有機酸之使用量係對於(A )〜(D )之各成分及添 加劑之合計1 〇 〇重量份時,一般使用1 5重量份以下,較 佳爲1 〇重量份以下。此種情況,若有機酸之使用量超過 1 5重量份時,形成後之著色層對於基板之接著性有降低 的傾向。 上述有機胺化合物以分子中具有1個以上胺基之脂族 胺或含苯基之胺爲佳。 上述脂族胺例如有正丙胺、異丙胺、正丁胺、異丁胺 、第二丁胺、第三丁胺、正戊胺、正己胺等單(環)烷胺 類; 甲基乙胺、二乙胺、甲基正丙胺、乙基正丙胺、二正 丙胺、二異丙胺、二正丁胺、二異丁胺、二第二丁胺、二 第三丁胺等二(環)烷胺類; 二甲基乙胺、甲基二乙胺、三乙胺、二甲基正丙胺、 二乙基正丙胺·、甲基二正丙胺、乙基二正丙胺、三正丙胺 、三異丙胺、三正丁胺、三異丁胺、三第二丁胺、三第三 丁胺等三(環)烷胺類; -27- (24) 1264564 2 -胺基乙醇、3 -胺基-丙醇、b胺基-2 -丙醇、4 -胺 基-1 - 丁醇等單(環)烷醇胺類; 二乙醇胺、二正丙醇胺、二異丙醇胺、二正丁醇胺、 二異丁醇胺等二(環)烷醇胺類; 三乙醇胺、三正丙醇胺、三異丙醇胺、三正丁醇胺、 三異丁醇胺等三(環)烷醇胺類; 3 -胺基-1,2 -丙二醇、2 -胺基-1,3 -丙二醇、4 -胺基-1,2-丁二醇、4 -胺基-1 5 3 - 丁二醇、3 -二甲胺基-1 5 2 -丙二醇、3 -二乙胺基-1,2 -丙二醇、2 -二甲胺基-1,3 -丙二醇、2 -二乙胺 基-1,3-丙二醇等胺基(環)烷二醇類; yS -丙胺酸、2-胺基丁酸、3-胺基丁酸、4-胺基丁酸、 2-胺基異丁酸、3-胺基異丁酸等胺基羧酸類等。 又,含苯基之胺例如有胺基直接與苯基鍵結之化合物 、胺基經由碳鏈與苯基鍵結之化合物等。 含苯基之胺例如有: 苯胺、鄰-甲基苯胺、間-甲基苯胺、對-甲基苯胺、 對-乙基苯胺、卜萘胺乙胺、2-萘胺、N,N-二乙基苯胺、 對-甲基·Ν,Ν-二甲基苯胺等芳族胺類; 鄰-胺基苯甲醇、間-胺基苯甲醇、對-胺基苯甲醇、 對-二甲胺基苯甲醇、對-二乙胺基苯甲醇等胺基苯甲醇類 鄰-胺基酚、間-胺基酚、對-胺基酚、對-二甲基胺基 酚、對-二乙基胺基酚等胺基酚類; 間1安基苯甲酸、對-胺基苯甲酸、對·二甲胺基苯甲 -28- (25) 1264564 酸、對-二乙胺基苯甲酸等胺基苯甲酸類等。 這些有機胺化合物中,從對於下述溶劑之溶解性及防 止未曝光部之基板及遮光層上產生污染或膜殘留等觀點而 言,脂族胺以單(環)烷醇胺類及胺基(環)烷二醇類爲 佳5特別是2 -胺基乙醇、3 -胺基-卜丙醇、5 -胺基-K戊醇 、3 -胺基-1,2 -丙二醇、2 -胺基- i53 -丙二醇、4 -胺基- 丁 一 _等更佳’又含本基之胺以胺基_類爲佳,特別是鄰-胺基酚、間-胺基酚、對-胺基酚等更佳。 上述有機胺化合物可單獨使用或混合2種以上來使用 〇 有機胺化合物之使用量係對於(A )至(D )成分及 添加劑之合計1 0 0、重量份時,一般使用1 5重量份以下, 較佳爲1 0重量份以下。此時若有機胺化合物之使用量超 過1 5重量份時,形成之著色層與基板之接著性有降低的 傾向。 其他添加劑例如有: 銅酞菁衍生物等藍色顏料衍生物或黃色顏料衍生物等 之分散助劑; 玻璃、氧化鋁等塡充劑; 聚乙烯醇、聚乙二醇單烷基醚類、聚(氟烷基丙烯酸 醋)類等局分子化合物; 非離子系、陽離子系、陰離子系等界面活性劑: 乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基 參(2 -甲氧基乙氧基)矽烷、N,(2 —胺乙基)_3_胺丙基· -29- (26) 1264564 甲基·二甲氧基矽烷' N-(2 -胺乙基)-31安丙基三甲氧 基砂烷、3 -胺丙基三乙氧基矽烷、3 -環氧丙氧基丙基三甲 氧基矽烷、3_環氧丙氧基丙基·甲基·二甲氧基矽烷、2_ (3,4〜環氧基環己基)乙基三甲氧基矽烷、3-氯丙基·甲 ^ •二甲氧基矽烷' 3 -氯丙基三甲氧基矽烷、3 -甲基丙烯 _氧基丙基三甲氧基矽烷、3 -锍基丙基三甲氧基矽烷等接 考促進劑;(Meth)acrylic acid / 2-hydroxyethyl (meth)acrylate / benzyl (meth)acrylate / polymethyl methacrylate macromonomer copolymer, methacrylic acid / styrene / (meth) acrylic acid Benzyl ester / N-phenylmaleimide copolymer, (meth)acrylic acid / succinic acid mono [2-(methyl) propylene methoxyethyl] ester / styrene / (meth) acrylate benzene Methyl ester / N-phenyl maleimide copolymer, (meth)acrylic acid / succinic acid mono [2-(methyl) propylene methoxyethyl] ester / styrene / (meth) acrylate Ester / N-phenylmaleimide copolymer, -14 - (11) 1264564 (meth)acrylic acid / styrene / benzyl (meth) acrylate / glycerol mono (meth) acrylate / N - Phenyl maleimide copolymer, (meth)acrylic acid / omega -carboxypolycaprolactone mono (meth) acrylate / styrene / benzyl (meth) acrylate / glycerol mono (meth) acrylate Ester / Ν - phenyl maleimide copolymer and the like. The copolymerization ratio of the carboxyl group-containing unsaturated monomer in the carboxyl group-containing copolymer is desirably 5 to 50% by weight, more preferably 1 to 40% by weight. In this case, when the copolymerization ratio is less than 5% by weight, the solubility of the obtained radiation-sensitive composition to the alkali developing solution tends to decrease, and when it exceeds 50% by weight, the solubility to the alkali developing solution When it is too high, when it develops with an alkali developing solution, it tends to fall off from the coloring layer substrate or the film surface is rough. The polystyrene-equivalent weight average molecular weight (hereinafter referred to as "]\^") measured by colloidal permeation chromatography (GPC, elution solvent: tetrahydrofuran) is 3,000 to 00,000, more preferably 5,000. ~ 50.000 ° Further, the number average molecular weight (hereinafter referred to as "Μη") of the alkali-soluble resin measured by colloidal permeation chromatography (GP C, elution solvent: tetrahydrofuran) is 1, 〇〇〇~40,000 Preferably, the ratio of M w to η η (μ w / η η ) of the alkali-soluble resin is preferably from 1 to 5, more preferably from 1 to 4. In the present invention, by using an alkali-soluble resin having such a specific Mw and Μη, a radiation-sensitive composition excellent in developability can be obtained, whereby a pixel pattern having a sharp pattern edge can be formed, and when developing Unexposed -15- (12) 1264564 On the substrate of the light portion and on the light-shielding layer, residue, contamination, film residue, and the like are less likely to occur. In the present invention, the (B) alkali-soluble resin may be used singly or in combination of two or more. When the amount of the (B) alkali-soluble resin of the present invention is 10 parts by weight based on the weight of the (A) pigment, it is preferably used in an amount of from 1 Torr to 1, 10 parts by weight, more preferably from 2 0 to 50,000 parts by weight. In this case, if the amount of the soluble resin used is less than 1 part by weight, for example, a decrease in alkali developability may occur, and contamination or film residue may occur on the unexposed portion of the substrate and on the light shielding layer. 1. When the weight is part by weight, the pigment concentration is lowered. Therefore, it is sometimes difficult for the film to reach the target color density. —(C) Polyfunctional monomer— (c) A monomer having two or more polymerizable unsaturated bonds in the polyfunctional single system of the present invention. Examples of the polyfunctional monomer include di(meth)acrylate polyethylene glycol such as ethylene glycol or propylene glycol, and di(meth)acrylates of polyalkylene glycol such as polypropylene glycol; a poly(meth) acrylate of a polyvalent alcohol having a valence of 3 or more, such as glycerin, trimethylolpropane, pentaerythritol or dipentaerythritol, or a dicarboxylic acid modification thereof; a polyester, an epoxy resin, a urethane tree Ester, alkyd resin, polyfluorene-16 - (13) 1264564 Oxygen vinegar, spiro resin, etc., oligomeric (meth) acrylates, two-terminal hydroxyl polybutadiene, two terminal hydroxyl groups Among the polyfunctional monomers such as polycaprolactone and other terminal hydroxylated polymers; or tris[2-(meth)acryloxyethyl]phosphate, etc., a trivalent or higher polyhydric alcohol The acrylate or its dicarboxylic acid modified material is superior in smoothness from the surface of the colored layer, and is preferably a tris-hydroxyl group on the unexposed portion of the substrate and the light-shielding layer, and the film remains. Methyl) acrylate, pentaerythritol tri(meth) acrylate alcohol IV Methyl) acrylate, dipentaerythritol penta(methyl), dipentaerythritol hexa(meth) acrylate, etc., particularly preferred are propane triacrylate, pentaerythritol triacrylate, and diquaternary acrylate. The above polyfunctional monomer may be used alone or in combination. When the amount of the polyfunctional monomer of the present invention is 0 (parts by weight of the resin), it is preferably 5 〇 2 2 〇〇. 7 5 to 150 parts by weight. In this case, when the amount of the polyfunctional monomer is 5 parts by weight, the strength or surface smoothness of the colored layer is lowered. On the other hand, if it exceeds 200 parts by weight, for example, there is a base. The surface of the exposed or unexposed portion or the light shielding layer tends to have a surface residue or the like. In the present invention, a monomer having one polymerizable unsaturated bond may be substituted for a part of the polyfunctional monomer. (Methyl) poly (methyl strength and on the surface is not easy to produce propane III (, pentaerythritol is used on trishydroxypentaerythritol). Alkali soluble fraction, more suitable use is not low Reduced pollution, film monofunctionality -17 - (14) 1264564 The above monofunctional monomer is, for example, the same as the carboxyl group-containing unsaturated monomer or copolymerizable unsaturated monomer exemplified as the (B) alkali-soluble resin. Or N-(methyl)-propyl decylmorpholine, N-vinyl Affiliated ketone, N - B-base - £ &quot;caprolactam; and towel sales 1\/1~5.00, \/1 - 5 4 0 0, 1\/[-5 6 〇0 ( Trade name, manufactured by Toagos Corporation, etc. These monofunctional monomers may be used singly or in combination of two or more. Monofunctional monomers are used in a ratio of monofunctional monomers to polyfunctional monomers. In the total amount, it is 50% by weight or less, more preferably 20% by weight or less. In this case, if the use ratio of the monofunctional monomer exceeds 50% by weight, the strength or surface smoothness of the colored layer Further, in the present invention, the total amount of the polyfunctional monomer and the monofunctional monomer is used for the (B) alkali-soluble resin, and when the amount is 1 part by weight, the weight is 50 to 300. More preferably, it is from 7 5 to 180 parts by weight. In this case, when the amount of the above-mentioned combination is less than 50 parts by weight, the strength or surface smoothness of the colored layer tends to decrease, and more than 30 When the amount is 0 parts by weight, for example, the alkali developability is lowered or the unexposed portion is liable to cause contamination or film residue on the substrate or the light shielding layer. A (D) photoradical generator: The photoradical generator of the present invention is exposed to visible light, ultraviolet light, far ultraviolet ultraviolet electrons, X-rays, etc., to produce the above (c) multi-B energy single a compound which initiates polymerization of a monofunctional monomer as the case may be. The photoradical generator includes, for example, an acetophenone compound, a bismuth oxime compound, a m compound, and a benzoin system. Compound, -18-(15) 1264564 benzophenone-based compound, α-diketone-based compound, polynuclear oxime-thiophenone-based compound, diazo-based compound, etc. In the present invention, the photoradical generating agent can be used alone. It is used or mixed, but the photoradical generator in the present invention is preferably selected from the group consisting of a compound, a biimidazole compound, and a tri-farming compound. In the preferred photoradical generator of the present invention, Specific examples of the indole system include: hydroxy-2-methyl-1-phenylpropane-buxone, 2-methyl-1-(4-methylthiophenyl)-2-morpholinylacetone-1, 2 &gt; Benzyl-2-dimethylamino-1-(4-morpholinylphenyl)butanone hydroxycyclohexane Phenyl ketone, 2,2 - dimethoxy _1,2 - diphenylethane - Bu ketone. Among these acetophenone compounds, 2-methyl-methylthiophenyl)-2- morpholinylacetone-1, 2-benzyl-2-dimethyl (4-morpholinylphenyl) is particularly preferred. ) butanone-1 and the like. The above acetophenone-based compound may be used singly or in combination of two or more. In the present invention, the photoradical generating agent is converted to an acetonitrile-based compound, and the amount is used for (C) a polyfunctional monomer and a monofunctional single j meter. In the case of 100 parts by weight, 5 to 80 parts by weight, more preferably parts by weight, more preferably 20 to 50 parts by weight are used. In this case, when the amount of the compound used is less than 5 parts by weight, it is sometimes difficult to obtain a pixel array compound having a pixel according to a desired arrangement, and at least a compound of at least one acetophenone is used. When 1-(4-g group>1 is used, the combination of the body is 0~60 acetonitrile is insufficient, and (16) 1264564 is more than 80 parts by weight, and the formed color layer is in development. It is easy to fall off from the substrate. Specific examples of the biimidazole-based compound are: bis(2-chlorophenyl)-454\5,5^tetrakis(4-ethoxycarbonylphenyl)-1,2 5 - Diimidazole, 252, bis(2-bromophenyl)-4,4',5,5'·tetrakis(4-ethoxycarbonylphenyl)-1; 2, diimidazole, 2,25-double ( 2-chlorophenyl)-4,4';5,5'-tetraphenyl-1,2^biimidazole 2.2, bis(2,4-dichlorophenyl)-4,4',5,5 , tetraphenyl-1,2, didiimidazole, 2 5 2'-bis(254,6-trichlorophenyl)-454,55,5, tetraphenyl-1; 2'-biimidazole, 2 ; 2, bis(2-bromophenyl)-4,4 ',5 5 5, tetraphenyl, 2, diimidazole 2.2, bis(2,4-dibromophenyl)-454', 5,5 , tetraphenyl-1; Bibiimidazole, 2.2, bis(2,4,6-tribromophenyl)-4,4';5;5,tetraphenyl-1,2,biimidazole, etc. Among these biimidazole compounds, Preferred are 2,2'-bis(2-chlorophenyl)-4,4'55,5, tetraphenyl-1,2, diimidazole, 2,2, bis(2,4-dichloro Phenyl)-4,4';5;5,tetraphenyl-1,2'-biimidazole, 2;2, bis(2,4,6-trichlorophenyl)-4; 4'; 5'-tetraphenyl-1; 2, biimidazole, etc., particularly preferably 2:2^bis(2,4-dichlorophenyl)-4,4'; 5:5'-tetraphenyl-20 - (17) 1264564 Bithylene imidazole. The biimidazole-based compound is excellent in solubility in a solvent, and does not generate foreign matter such as undissolved matter or precipitates, and has high sensitivity, and can sufficiently perform a hardening reaction only with low energy exposure. The unexposed portion does not cause a hardening reaction, and therefore, the film after exposure can be clearly distinguished into a hardened portion which is insoluble to the developing liquid and an unhardened portion which has high solubility to the developing liquid, whereby a pixel having no recess can be formed. A high-definition pixel array in which the patterns are arranged in a predetermined arrangement. The foregoing biimidazole compound can be used alone. In the present invention, when the photo-free radical generating agent is used in the case of using a bisimidazole-based compound, the amount of the (C) polyfunctional monomer and the monofunctional monomer is 100 parts by weight. It is used in an amount of 0.1 to 40 parts by weight, preferably 0.1 to 3 parts by weight, more preferably 0.1 to 2 parts by weight. In this case, when the amount of the biimidazole-based compound used is less than 0 parts by weight, the hardening of the exposure is insufficient, and it is difficult to obtain a pixel array in which the pixel patterns are arranged in a predetermined arrangement, and on the other hand, if it exceeds 4 parts by weight, At the time of development, the colored layer after formation tends to be easily detached from the substrate. In the present invention, when a photodiradazole-based compound is used as the photoradical generator, the sensitivity can be further improved by using the following hydrogen donor. The "hydrogen donor" refers to a compound which provides a hydrogen atom for a radical generated by exposure of a biimidazole-based compound. -21 - (18) 1264564 The chlorine donor of the present invention is preferably an anthraquinone compound, an amine compound or the like defined as follows. The above lanthanoid compound is a compound having a benzene ring or a heterocyclic ring as a core, and having more than one, preferably 1 to 3, more preferably i 2 or 2 groups directly bonded to the parent ring (hereinafter referred to as It is composed of "anthracene hydrogen donor". The amine compound is a compound having one or more, preferably 1 to 3, more preferably 1 to 2, amine groups directly bonded to the parent ring, which is a nucleus or a heterocyclic ring. It is composed of an "amine-based hydrogen donor". Further, these hydrogen donors may have both a mercapto group and an amine group. These hydrogen donors are more specifically described below. The hydrazine-based hydrogen donor may have one or more benzene rings or heterocyclic rings, and may have both a benzene ring and a hetero ring. When two or more of these rings are present, a condensed ring may or may not be formed. Further, when the fluorene-based hydrogen donor has two or more fluorenyl groups, if at least one free sulfhydryl group remains, more than one of the remaining fluorenyl groups may be substituted by an alkyl group, an aryl group or an aryl group, and at least When one free sulfhydryl group remains, it may have a structural unit in which two sulfur atoms are bonded via a divalent organic group such as an alkylene group or a structural unit having two sulfur atoms bonded in a disulfide form. Further, the hydrogen donor may be substituted with a carboxyl group, an alkoxy group, a substituted alkoxycarbonyl group, a phenoxycarbonyl group, a substituted phenoxycarbonyl group, a nitrile group or the like at a site other than the fluorenyl group. Specific examples of such lanthanide hydrogen donors are 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, 2,5-dimercapto-; 3,4- Thia-h, 2-mercapto-2,5-dimethylaminopyridine, and the like. -22 - (19) 1264564 In the case of some hydrazine-based hydrogen donors, 'better is 2-mercaptobenzothiazepine, 2, mercaptobenzothiazepine D, etc.' is particularly desirable as 2-mercaptobenzothiophene. D sit. Further, the 'amine-based hydrogen donor may have one or more benzene rings or heterocycles', and may have both a benzene ring and a hetero ring. When two or more of these rings are present, a condensed ring may or may not be formed. One or more amine groups of the amine-based hydrogen donor may be substituted by a substituent or a substituted substituent, and the moiety other than the 'other' amine group may be substituted by a carboxyl group, a oxo group, a substituted alkoxycarbonyl group, a phenoxycarbonyl group. Specific examples of the amine-based hydrogen donor which is substituted with phenoxycarbonyl, nitrile or the like are 4,4,-bis(dimethylamino)benzophenone, 4;4, bis(diethylamino)di Benzophenone, 4-diethylaminoethylbenzene, 4-dimethylaminopropenylbenzene, ethyl-4-dimethylaminobenzoate, 4-dimethylaminobenzoic acid, 4-di Methylaminobenzonitrile and the like. Among these amine-based hydrogen donors, preferred are 4,4,-bis(dimethylamino)benzophenone, 4,4 bis(diethylamino)benzophenone, etc., and particularly preferably 4 , 4,-bis(diethylamino)benzophenone. The amine-based hydrogen donor has a function as a sensitizer even in a photopolymerization initiator other than the bisimidazole-based compound. In the present invention, the hydrogen donor may be used singly or in combination of two or more kinds of hydrazine-based hydrogen donors and one or more amine-based hydrogen donors, and the coloring layer after formation may be used for image formation. It is not easy to fall off from the substrate, and the strength and sensitivity of the colored layer can be improved. Specific examples of the combination of the lanthanide hydrogen donor and the amine hydrogen donor are 2-mercaptobenzothiazole / 4,4 bis(dimethylamino)benzophenone, 2-nonylbenzene-23- ( 20) 1264564 and thiazole / 4 ^ bis(diethylamino)benzophenone, 2 -mercaptobenzoxazole / 4,4 ^ bis(dimethylamino)benzophenone, 2-mercaptobenzene And oxazole / 4; 4'-bis (diethylamino) benzophenone, etc., a better combination is 2-mercaptobenzothiazole / 4,4 ^ bis (diethylamino) benzophenone, 2 » Mercaptobenzoxazole / 4,4 ^ bis(diethylamino)benzophenone, etc. A particularly desirable combination is 2-mercaptobenzothiazole / 4,4'-bis(diethylamino) )Benzophenone. The combination of the lanthanide hydrogen donor and the amine hydrogen donor, wherein the weight ratio of the lanthanide hydrogen donor to the amine hydrogen donor is generally from 1:1 to 1:4, more preferably from 1:1 to 1:3. In the present invention, when the hydrogen donor and the biimidazole-based compound are used in an amount of 10 parts by weight based on the total of (C) the polyfunctional monomer and the monofunctional monomer, 0.1 to 1 is used. 30 parts by weight, more preferably 0.1 to 2 parts by weight, particularly preferably 〇. 1 to 1 〇 by weight. In this case, when the amount of the hydrogen donor is less than 0.1 part by weight, the effect of improving the sensitivity tends to be lowered, and when it exceeds 30 parts by weight, the colored layer after formation may easily fall off from the substrate during development. tendency. Specific examples of the above triazine-based compound are 2,4,6-tris(trichloromethyl)-s-triazine, 2-methyl-4;6-bis(trichloromethyl)-s-triazine, 2-[2-(5-methylfuran-2-yl)vinyl]-4,6-bis(trichloromethyl)-s-triazine, 2-[2-(furan-2-yl)ethylene 4-]6-bis(trichloromethyl)-s-triazine, 2 ·[2-(4-diethylamino-2-methylphenyl)vinyl]-4,6-double ( -24 - (21) 1264564 trichloromethyl)-s-triazine, 2-[2-(3,4-dimethoxyphenyl)vinylmethyl)-s-triazine, 2-(4 -methoxyphenyl)-4,6-bis(trichloromethane; 2-(4-ethoxystyryl)-4,6-bis(tris-2-(4-n-butoxyphenyl) -4,6-bis (trichloromethane-containing triazine-based compound. Among these triazine-based compounds, particularly preferred is 2-oxyphenyl)vinyl]-4,6-bis(trichloromethyl) The above triazine-based compound may be used singly or in combination with the present invention, and a triazine-based compound is used as the amount of light. For the (C) polyfunctional monomer and 100 parts by weight, 1 to 4 0 is used. The parts by weight, more parts, more preferably 1 to 20 parts by weight. When the triazine system is less than 1 part by weight, the hardening of the exposure is insufficient, and it is difficult to arrange the pixel arrays in a predetermined arrangement, and when the coloring layer of more than 40 weights is developed, there is an easy-to-separate-additive-invention - the present invention When the color filter is sensitive to radiation, various additives may be added. The foregoing additives, for example, further improve the dissolution characteristics of the radiation-sensitive alkali developing solution, and suppress the undissolved after the imaging]-4,6-bis(trichloro) )-s-triazine, chloromethyl)tris-methylmethyl)-S-triazine, etc.-[2-(3,4-dimethyl-S-triazine) is used in two or more. The combination of the monomers is preferably from 1 to 3 0. The use of the ruthenium compound is obtained when the pixel pattern is obtained according to the amount of the component. In the composition, the effect of the inductive composition on the residue of the solution is observed - 25 - (22) An organic acid or an organic amine compound such as 1264564 (but not including the hydrogen donor). The organic acid is preferably an aliphatic carboxylic acid having one or more carboxyl groups or a carboxylic acid having a phenyl group in the molecule. Acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, and top three An aliphatic monocarboxylic acid such as acetic acid, caproic acid, diethyl acetic acid, heptanoic acid or octanoic acid; oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid , azelaic acid, bran diacid, methylmalonic acid, ethylmalonic acid, dimethylmalonic acid, methyl succinic acid, tetramethyl succinic acid, cyclooctanedioic acid, itaconic acid, citrine Aliphatic dicarboxylic acids such as acid, maleic acid, fumaric acid, and mesaconic acid; aliphatic tricarboxylic acids such as triglyceride, aconitic acid, and camphoric acid. The phenyl group-containing carboxylic acid may, for example, be a compound in which a carboxyl group is directly bonded to a phenyl group or a compound in which a carboxyl group is bonded to a phenyl group via a carbon chain. The phenyl group-containing carboxylic acid is, for example, an aromatic monocarboxylic acid such as benzoic acid, toluic acid, decanoic acid, dimethylbenzoic acid or trimethylbenzoic acid; ortho-phthalic acid, m-, phthalic acid, or the like. An aromatic dicarboxylic acid such as phthalic acid; an aromatic polycarboxylic acid having a trivalent or higher trivalent or higher such as trimellitic acid, trimesic acid, pyromellitic acid or pyromellitic acid; or phenylacetic acid or hydrogen atoric acid , hydrogen cinnamic acid, bitter almond acid, phenyl succinic acid, atropic acid, cinnamic acid, cinnamic acid, coumaric acid, umbrella acid, etc. -26- (23) 1264564 These organic acids, from the dissolution of alkali S' aliphatic residual acid is preferably an aliphatic di-residual acid, especially adipic acid or itaconic acid, from the viewpoints of the solubility of the solvent described later and the prevention of contamination or film residue on the substrate and the light-shielding layer in the unexposed portion. More preferably, citraconic acid, fumaric acid, mesaconic acid, etc., and the carboxylic acid having a phenyl group is preferably an aromatic dicarboxylic acid, and more preferably phthalic acid. These organic acids may be used singly or in combination of two or more. When the amount of the organic acid used is 1 part by weight or less based on the total of the components (A) to (D) and the additive, it is usually 15 parts by weight or less, preferably 1 part by weight or less. In this case, when the amount of the organic acid used exceeds 15 parts by weight, the subsequent coloring layer tends to lower the adhesion to the substrate. The above organic amine compound is preferably an aliphatic amine or a phenyl group-containing amine having one or more amine groups in the molecule. The above aliphatic amines are, for example, mono(cyclo)alkylamines such as n-propylamine, isopropylamine, n-butylamine, isobutylamine, second butylamine, third butylamine, n-pentylamine, n-hexylamine; methylethylamine, Di(cyclo)alkylamines such as diethylamine, methyl n-propylamine, ethyl n-propylamine, di-n-propylamine, diisopropylamine, di-n-butylamine, diisobutylamine, di-second-butylamine, and di-tert-butylamine Class; dimethylethylamine, methyldiethylamine, triethylamine, dimethyl-n-propylamine, diethyl-n-propylamine, methyldi-n-propylamine, ethyldi-n-propylamine, tri-n-propylamine, triisopropylamine , tri-n-butylamine such as tri-n-butylamine, tri-isobutylamine, tri-second butylamine, tri-tert-butylamine; -27- (24) 1264564 2-aminoethanol, 3-amino-propyl Mono(cyclo)alkanolamines such as alcohol, b-amino-2-propanol, 4-amino-1-butanol; diethanolamine, di-n-propanolamine, diisopropanolamine, di-n-butanolamine a di(cyclo)alkanolamine such as diisobutanolamine; a tri(cyclo)alkanolamine such as triethanolamine, tri-n-propanolamine, triisopropanolamine, tri-n-butanolamine or triisobutanolamine Class; 3-amino-1,2-propanediol, 2-amino-1,3- Propylene glycol, 4-amino-1,2-butanediol, 4-amino-1 5 3 -butanediol, 3-dimethylamino-1 5 2 -propanediol, 3-diethylamino-1, Amino (cyclo)alkanediols such as 2-propanediol, 2-dimethylamino-1,3-propanediol, 2-diethylamino-1,3-propanediol; yS-alanine, 2-aminobutyl An aminocarboxylic acid such as an acid, 3-aminobutyric acid, 4-aminobutyric acid, 2-aminoisobutyric acid or 3-aminoisobutyric acid. Further, the phenyl group-containing amine is, for example, a compound in which an amine group is directly bonded to a phenyl group, a compound in which an amine group is bonded to a phenyl group via a carbon chain, or the like. Examples of phenyl-containing amines are: aniline, o-methylaniline, m-methylaniline, p-methylaniline, p-ethylaniline, naphthylamine, 2-naphthylamine, N,N-di Aromatic amines such as ethyl aniline, p-methyl hydrazine, hydrazine-dimethylaniline; o-aminobenzyl alcohol, m-aminobenzyl alcohol, p-aminobenzyl alcohol, p-dimethylamino Aminobenzyl alcohol o-aminophenol such as benzyl alcohol or p-diethylaminobenzyl alcohol, m-aminophenol, p-aminophenol, p-dimethylaminophenol, p-diethylamine Aminophenols such as phenols; amino groups such as 1 amphobenzoic acid, p-aminobenzoic acid, p-dimethylaminobenzamide-28-(25) 1264564 acid, p-diethylaminobenzoic acid Benzoic acid and the like. Among these organic amine compounds, aliphatic amines are mono(cyclo)alkanolamines and amine groups from the viewpoints of solubility in the following solvents and prevention of contamination or film residue on the substrate and the light-shielding layer in the unexposed portion. (cyclo)alkanediols are preferred 5 especially 2-aminoethanol, 3-amino-propanol, 5-amino-K-pentanol, 3-amino-1,2-propanediol, 2-amine The base-i53-propylene glycol, 4-amino-butyl-I, etc., and the amine-containing amine are preferably an amine group, particularly an ortho-aminophenol, an m-aminophenol, a p-amino group. Phenol and the like are better. The organic amine compound may be used singly or in combination of two or more kinds. The amount of the organic amine compound used is generally 10 parts by weight or less based on the total of the components (A) to (D) and the additives. It is preferably 10 parts by weight or less. In this case, when the amount of the organic amine compound used exceeds 15 parts by weight, the adhesion between the formed coloring layer and the substrate tends to decrease. Other additives include, for example, a blue pigment derivative such as a copper phthalocyanine derivative or a dispersing aid such as a yellow pigment derivative; a chelating agent such as glass or alumina; a polyvinyl alcohol or a polyethylene glycol monoalkyl ether; a molecular compound such as poly(fluoroalkyl acrylate vinegar); a surfactant such as nonionic, cationic or anionic: vinyl trimethoxy decane, vinyl triethoxy decane, vinyl ginseng (2-A) Oxyethoxy ethoxy) decane, N, (2-aminoethyl) _3_aminopropyl -29- (26) 1264564 methyl dimethoxy decane 'N-(2-amineethyl)-31 Propyltrimethoxy sulphate, 3-aminopropyltriethoxydecane, 3-glycidoxypropyltrimethoxydecane, 3-glycidoxypropylmethyldimethoxy Base decane, 2_(3,4~epoxycyclohexyl)ethyltrimethoxydecane, 3-chloropropyl-methyldimethoxydecane'3-chloropropyltrimethoxydecane, 3-methyl a test accelerator such as propylene-oxypropyltrimethoxydecane or 3-mercaptopropyltrimethoxydecane;

2,2-硫雙(4-甲基-6-第三丁基酚)、2,6-二-第三丁基 酌等抗氧化劑; ( 3_第三丁基-5-甲基-2-經苯基)-5 -氯苯并三卩坐、 ^氧基二苯甲酮類等紫外線吸收劑; 聚丙烯酸鈉等抗凝劑; : 1,1、偶氮雙(環己烷-1-甲腈)、2-苯基偶氮-4-甲氧 基—二甲基戊腈等熱自由基產生劑等。 一 (E )溶劑一 本發明之溶劑只要是可將構成輻射敏感性組成物之( A)〜(D)成分或添加劑成分予以分散或溶解,且不與 這些成分產生反應,具有適度揮發性者,即可適當選擇使 用。 這種溶劑例如有: 乙二醇單甲醚、乙二醇單乙醚、乙二醇單正丙醚、乙 二醇單正丁醚、二乙二醇單甲醚、二乙二醇單乙醚、二乙 二醇單正丙醚、二乙二醇單正丁醚、三乙二醇單甲醚、三 -30- (27) 1264564 乙二醇單乙醚、丙二醇單甲醚、丙二醇單乙醚、丙二醇單 正丙醚、丙二醇單正丁醚、二丙二醇單甲醚、二丙二醇單 乙醚、二丙二醇單正丙醚、二丙二醇單正丁醚、三丙二醇 單甲醚 '三丙二醇單乙醚等之(聚)烷二醇單烷醚類; 乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、二乙二 醇單甲醚乙酸酯、二乙二醇單乙醚乙酸酯、丙二醇單甲醚 乙酸酯、丙二醇單乙醚乙酸酯等之(聚)烷二醇單烷醚乙 酸酯類; 二乙二醇單二甲醚、二乙二醇甲基乙醚、二乙二醇二 乙醚、四氫呋喃等其他醚類; 甲基乙基酮、2-庚酮、3-庚酮、環己酮等酮類; 2-羥基丙酸甲酯、2-羥基丙酸乙酯等乳酸烷酯類; 2 -羥基-2-甲基丙酸乙酯、3 -甲氧基丙酸甲酯、3 -甲氧 基丙酸乙酯、3 -乙氧基丙酸甲酯、3 -乙氧基丙酸乙酯、乙 氧基乙酸乙酯、羥基乙酸乙酯、2 -羥基-3-甲基丁酸甲酯 ' 甲基-3—甲氧基丁基丙酸酯、乙酸乙酯、乙酸正丙酯 、乙酸異丙酯、乙酸正丁酯、乙酸異丁酯、甲酸正戊酯、 乙酸異戊酯、丙酸正丁酯、丁酸乙酯、丁酸正丙酯、丁酸 異丙酯、丁酸正丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸 正丙酯、乙醯乙酸甲酯、乙醯乙酸乙酯、2 -氧代丁酸乙酯 等其他酯類;甲苯、二甲苯等芳族烴類; N-甲基吡咯烷酮、N;N-二甲基甲醯胺、N;N-二甲基乙 醯胺等醯胺類等。 這些溶劑中,從溶解性、顏料之分散性及塗佈性等觀 -31 - 4s64 (28) ^ ^ _ 巾言,較佳爲丙二醇單甲醚、乙二醇單甲醚乙酸酯、丙 \ _單甲醚乙酸酯、丙二醇單乙醚乙酸酯、二乙二醇二甲 、二乙二醇曱基乙醚、2 -庚酮、3 -庚酮、環己酮、2 -羥 1酸乙酯、甲氧基丙酸乙酯、3 -乙氧基丙酸甲酯、3- ^織基丙酸乙酯、3 -甲氧基丁基乙酸酯、3 -甲基-3-甲氧基 趣丙酸酯、乙酸正丁酯、乙酸異丁酯、甲酸正戊酯、乙 ’戊酯、丙酸正丁酯、丁酸乙酯、丁酸異丙酯、丁酸正 _、丙酮酸乙酯等,更理想爲丙二醇單甲醚乙酸酯、二 〜醇甲基乙醚、3 -乙氧基丙酸乙酯、3 -甲氧基丁基乙酸 、環己酮等。 前述溶劑可單獨使用或混合兩種以上使用。 又,上述溶劑可與苯甲基乙醚、二正己醚、丙酮基丙 異佛爾酮、己酸、辛酸、1-辛醇、卜萘酚、苯甲醇、 乙酸苯甲酯、苯甲酸乙酯、草酸二乙酯、馬來酸二乙酯、 γ、丁內酯、碳酸乙烯酯、碳酸丙烯酯、乙二醇單苯醚乙 酸酯等高沸點溶劑倂用。 這些高沸點溶劑可單獨使用或混合兩種以上使用。 溶劑之使用量並無特別限制,但就所得之輻射敏感性 組成物之塗佈性及安全性等觀點而言,使該組成物之不含 溶劑之各成分的合計濃度成爲5〜3 0重量°/。,更佳爲1 0〜 2 0重量%的量。 彩色濾光片用輻射線敏感性組成物之特性 本發明之彩色濾光片用輻射線敏感性組成物,其係具 有當表面張力爲B ( mN / m ),黏度爲A ( m Ρ a · S )、且 -32 - (29) 1264564 形成著色層之塗佈速度爲 V(m/s)時,以(AxVtB) 所得之數値(以下稱爲「A V / B値」)未達4 . Ο X 1 〇 ·2, 理想爲 2 . Ο X ] 〇_3〜3 . 5 X 1 (Γ 2,特別理想爲2川X 1 (Γ 3〜3 . 〇 X ] (Γ2的特性。此時A V / B値爲4.0 X ] 〇'2以上時,容易 產生塗佈不均的傾向。 本發明之彩色濾光片用福射線敏感性組成物係藉由 A V / B値滿足前述要件,因此利用狹縫模塗機在基板上 形成彩色濾光片用著色層時,可保持狹縫噴嘴之吐出速度 與基板之潤濕性的高度平衡,不會產生塗佈不均,可以高 產品良率,且高效率形成均勻膜厚之彩色濾光片用著色層 〇 本發明之彩色濾光片用輻射線敏感性組成物之黏度爲 2.0mPa· s 〜8.0mPa· s,特別理想爲 2.0mPa· s 〜6.0mPa 彩色濾光片用著色層之形成方法 本發明之彩色濾光片用著色層之形成方法係使用具有 前述特性之彩色濾光片用輻射線敏感性組成物,該輻射線 敏感性組成物之塗佈速度爲0.0 7 m / s以上,利用狹縫模 塗機在基板上形成彩色濾光片用著色層的方法。 以下更具體說明本發明之彩色濾光片用著色層之形成 方法。 首先在基板表面上,視需要形成遮光層以區分形成像 素陣列之部分,於該基板上藉由狹縫模塗機塗佈例如已有 -33- (30) 1264564 分散紅色顏料之輻射敏感性組成物。 接著’進行預烘烤,使溶劑蒸發形成塗膜,經由光罩 對此塗膜進行曝光後,特別理想爲使用鹼顯像液顯像,溶 解除去塗膜之未曝光部,然後藉由後烘烤在相同基板上形 成綠色像素陣列及藍色的像素陣列,可得到在基板上配置 紅色、綠色及藍色三原色之像素陣列的著色層。 但是本發明之各色之像素陣列的形成順序未被限定如 上述。 塗佈厚度爲去除溶劑後之膜厚一般爲〇 . ;! μιη〜1 0 μπι ,更理想爲0.2 μηι〜8.0 μ1Ώ,特別理想爲0.2 μιη〜6.0 μιη 〇 形成著色層所使用之幅射線例如有可見光、紫外線、 遠紫外線、電子線、X射線等,而以波長爲! 90〜45〇nnl 圍之幅射線爲佳。 輻射線之曝光量理想爲10〜10;000 J / 。 又’前述理想之鹼顯影液例如有碳酸鈉、氫氧化鈉、 氫氧化鉀、氫氧化四甲基銨、膽鹼、1,8 -二氮雜雙環-〔 5.4.0〕-7-十一烯、1,5 -二氮雜雙環-〔4.3。0〕-5-壬烯等之 水溶液。 前述鹼顯影液中可添加適量之甲醇、乙醇等之水溶性 有機溶媒或界面活性劑等。鹼顯影後,通常進行水洗。 顯影處理法可應用淋洗顯影法、噴霧顯影法、浸漬顯 影法、攪拌顯影法等。顯影條件係在常溫下,5〜3 0 0秒 爲佳。 -34 - (31) 1264564 形成彩色濾光片之著色層時所使用之基板例如有玻璃 、聚矽氧、聚碳酸酯、聚酯 '芳族聚醯胺、聚醯胺醯亞胺 、聚醯亞胺、聚醚砸 '環狀®烴之開環聚合物或其加氫物2,2-thiobis(4-methyl-6-tert-butylphenol), 2,6-di-t-butyl group, etc.; (3_t-butyl-5-methyl-2) - UV-absorbing agent such as phenyl)-5-chlorobenzotriazine, oxybenzophenone, etc.; anticoagulant such as sodium polyacrylate; 1, 1, azobis(cyclohexane-1) a thermal radical generator such as -carbonitrile) or 2-phenylazo-4-methoxy-dimethylvaleronitrile. (E) Solvent - The solvent of the present invention is a solvent having a moderate volatility as long as it can disperse or dissolve the components (A) to (D) constituting the radiation-sensitive composition or the additive component, and does not react with these components. , you can choose to use. Such solvents are, for example, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, Diethylene glycol mono-n-propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, tri-30-(27) 1264564 ethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol Mono-n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether 'tripropylene glycol monoethyl ether, etc. Alkanediol monoalkyl ethers; ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol (poly)alkylene glycol monoalkyl ether acetates such as monomethyl ether acetate, propylene glycol monoethyl ether acetate; diethylene glycol monodimethyl ether, diethylene glycol methyl ether, diethylene glycol II Other ethers such as diethyl ether and tetrahydrofuran; ketones such as methyl ethyl ketone, 2-heptanone, 3-heptanone and cyclohexanone; methyl 2-hydroxypropionate, 2-hydroxyl Alkyl lactate such as ethyl propyl propionate; ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, 3-ethoxypropane Methyl ester, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutyrate 'methyl-3-methoxybutyl propyl Acid ester, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-amyl formate, isoamyl acetate, n-butyl propionate, ethyl butyrate, butyric acid N-propyl ester, isopropyl butyrate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate, n-propyl pyruvate, methyl acetate, ethyl acetate, 2-oxobutyric acid Other esters such as ethyl ester; aromatic hydrocarbons such as toluene and xylene; guanamines such as N-methylpyrrolidone, N; N-dimethylformamide, N; N-dimethylacetamide. Among these solvents, solubility, pigment dispersibility, and coatability are considered to be -31 - 4s64 (28) ^ ^ _ towel, preferably propylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, and C. \ _monomethyl ether acetate, propylene glycol monoethyl ether acetate, diethylene glycol dimethyl, diethylene glycol decyl ether, 2-heptanone, 3-heptanone, cyclohexanone, 2-hydroxyl acid Ethyl ester, ethyl methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-methyl-propionate, 3-methoxybutyl acetate, 3-methyl-3-methyl Oxyxypropionate, n-butyl acetate, isobutyl acetate, n-amyl formate, ethyl p-amyl ester, n-butyl propionate, ethyl butyrate, isopropyl butyrate, butyric acid, _, acetone The acid ethyl ester or the like is more preferably propylene glycol monomethyl ether acetate, dimethyl alcohol methyl ether, ethyl 3-ethoxypropionate, 3-methoxybutyl acetic acid, cyclohexanone or the like. The above solvents may be used singly or in combination of two or more. Further, the above solvent may be mixed with benzyl ether, di-n-hexyl ether, acetone acephosone, caproic acid, octanoic acid, 1-octanol, bnaphthol, benzyl alcohol, benzyl acetate, ethyl benzoate, A high boiling point solvent such as diethyl oxalate, diethyl maleate, γ, butyrolactone, ethylene carbonate, propylene carbonate or ethylene glycol monophenyl ether acetate is used. These high boiling point solvents may be used singly or in combination of two or more. The amount of the solvent to be used is not particularly limited, but the total concentration of each component of the composition containing no solvent is 5 to 30 weights from the viewpoints of coatability and safety of the radiation-sensitive composition obtained. °/. More preferably, the amount is from 1 0 to 2 0% by weight. Characteristics of Radiation Sensing Composition for Color Filters The radiation sensitive composition for color filters of the present invention has a surface tension of B (mN / m) and a viscosity of A (m Ρ a · S), and -32 - (29) 1264564 When the coating speed of the colored layer is V (m/s), the number of ( (hereinafter referred to as "AV / B値") obtained by (AxVtB) is less than 4. Ο X 1 〇·2, ideally 2. Ο X ] 〇 _3~3 . 5 X 1 (Γ 2, especially ideally 2 Sichuan X 1 (Γ 3~3 . 〇X ] (Γ2 characteristics. When AV / B 値 is 4.0 X ] 〇 '2 or more, coating unevenness tends to occur. The color filter for the color filter of the present invention satisfies the above requirements by AV / B ,, and thus utilizes When the slit die coater forms a colored layer for a color filter on a substrate, the height of the discharge speed of the slit nozzle and the wettability of the substrate can be kept balanced, and uneven coating can be prevented, and the product yield can be high. And a coloring layer for color filters having a uniform film thickness with high efficiency. The viscosity of the radiation sensitive composition for a color filter of the present invention is 2.0 mPa·s to 8.0 mPa· s, particularly preferably 2.0 mPa·s to 6.0 mPa. Method of forming a colored layer for a color filter. The method for forming a colored layer for a color filter of the present invention uses radiation sensitivity of a color filter having the aforementioned characteristics. The composition, the coating speed of the radiation sensitive composition is 0.07 m / s or more, and a method of forming a colored layer for a color filter on a substrate by a slit die coater. The color of the present invention will be more specifically described below. A method of forming a colored layer for a filter. First, on the surface of the substrate, a light shielding layer is formed as needed to distinguish a portion forming the pixel array, and the substrate is coated with, for example, a -33- (30) by a slit die coater. 1264564 Disperse the radiation-sensitive composition of the red pigment. Next, 'pre-baking, evaporating the solvent to form a coating film, and exposing the coating film through a photomask, it is particularly preferable to use an alkali developing solution to dissolve and remove The unexposed portions of the coating film are then formed by forming a green pixel array and a blue pixel array on the same substrate by post-baking, thereby obtaining pixels in which three primary colors of red, green, and blue are disposed on the substrate. The coloring layer of the column is not limited as described above. The film thickness after removing the solvent is generally 〇. ;! μιη~1 0 μπι, more preferably 0.2 μηι~ 8.0 μ1 Ώ, particularly preferably 0.2 μηη~6.0 μιη 〇 The ray used to form the color layer is, for example, visible light, ultraviolet light, far ultraviolet light, electron beam, X-ray, etc., and the wavelength is 90~45〇nnl Ray is better. The exposure amount of the radiation is desirably 10 to 10;000 J / . Further, the above-mentioned ideal alkali developing solution is, for example, sodium carbonate, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, choline, 1,8-diazabicyclo-[5.4.0]-7- An aqueous solution of an alkene, 1,5-diazabicyclo-[4.3.0]-5-nonene or the like. An appropriate amount of a water-soluble organic solvent such as methanol or ethanol or a surfactant may be added to the alkali developer. After alkali development, it is usually washed with water. The development treatment method may employ a rinse development method, a spray development method, a dip development method, a stirring development method, or the like. The development conditions are preferably 5 to 300 seconds at room temperature. -34 - (31) 1264564 The substrate used to form the color layer of the color filter is, for example, glass, polyoxyethylene, polycarbonate, polyester 'aromatic polyamine, polyamidimide, polyfluorene Ring-opening polymer of imine, polyether 砸'cyclic® hydrocarbon or its hydrogenated product

等C 這些基板視需要可施與砂偶合劑等之樂品處理、電獎 處理、離子電鍍、濺鍍 '氣相反應法、真空蒸鍍等適當之 前處理。 彩色濾光片 本發明之彩色濾光片係具有由本發明之彩色濾光片用 輻射線敏感性組成物所形成之著色層者。 本發明之彩色濾光片非常適合作爲穿透型或反射型之 彩色液晶顯示裝置、彩色攝影元件、彩色感知器等。 彩色液晶顯示裝置 本發明之彩色液晶顯示裝置係具備本發明之彩色濾光 片者ϋ 本發明之彩色液晶顯示裝置可採用適當的構造。例如 與配置薄膜電晶體(TFT )之驅動用基板不同之基板上, 製作彩色濾光片,而驅動用基板與彩色濾光片經由液晶層 對向配置的構造。另外也可採用在配置薄膜電晶體(TFT )之驅動用基板表面上形成彩色濾光片的基板,與形成 1 τ 〇 (摻雜錫之氧化銦)電極之基板經由液晶層對向配置 的構造。後者之構造可格外提昇開口率,可獲得明亮、高 -35- (32) I264564 示元件 精钿之_ 〔貪施例〕 下、舉實施例更具體說明本發明之實施形態。但本 發日β # 迎不限定於下列實施例。 貪施例] ^合(A )顏料之C . I.顏料紅2 5 4與c . I。顏料黃1 3 9 ^ / 3 5 (重量比)混合物切重量份、(β )鹼可溶性 $甲基丙烯酸/苯乙烯/苯甲基甲基丙烯酸酯/甘油 基丙烯酸酯/ Ν-苯基順丁烯二胺共聚物(共聚重量 綦單_ 比 υ / / 1 5 / 3 5 / 1 0 / 2 5,Mw = 30,000、Μη= 10,000 ) 70C. These substrates may be subjected to appropriate treatments such as sand treatment, music award treatment, ion plating, sputtering, gas phase reaction, vacuum vapor deposition, etc., as needed. Color filter The color filter of the present invention has a coloring layer formed of a radiation sensitive composition for a color filter of the present invention. The color filter of the present invention is very suitable as a transmissive or reflective type color liquid crystal display device, a color photographic element, a color sensor, and the like. Color liquid crystal display device The color liquid crystal display device of the present invention is provided with the color filter of the present invention. The color liquid crystal display device of the present invention can adopt an appropriate configuration. For example, a color filter is formed on a substrate different from the substrate on which the thin film transistor (TFT) is disposed, and the driving substrate and the color filter are disposed to face each other via the liquid crystal layer. Further, a substrate in which a color filter is formed on a surface of a driving substrate on which a thin film transistor (TFT) is disposed may be used, and a substrate on which a 1 τ 〇 (tin-doped indium oxide) electrode is formed may be disposed to face each other via a liquid crystal layer. . The latter structure can particularly increase the aperture ratio, and can obtain bright and high -35- (32) I264564. The components are as follows. [Examples] The embodiments of the present invention will be described more specifically by way of embodiments. However, the present day β #迎迎 is not limited to the following examples. Greedy Example] ^ (A) Pigment C. I. Pigment Red 2 5 4 and c. I. Pigment Yellow 1 3 9 ^ / 3 5 (by weight) mixture cut by weight, (β) alkali soluble $methacrylic acid / styrene / benzyl methacrylate / glyceryl acrylate / Ν - phenyl cis Ene diamine copolymer (copolymer weight 綦 _ / / 1 5 / 3 5 / 1 0 / 2 5, Mw = 30,000, Μ η = 10,000) 70

Μ M fA 17J v ( C )多官能性單體之六丙烯酸二季戊四醇酯8 0 ^_份、(D)光自由基產生劑之2_苯甲基二甲胺基- ~ ( 4、嗎啉基苯基)丁酮-1 5 0重量份及(E )溶劑之丙二 酉享留 I甲醚乙酸酯1,〇 〇 〇重量份,調製組成物(R 1 )。 組成物(R1 )之黏度係藉由EL·型黏度計(東機產業 (股)製D V Μ - Ε Π型:測定溫度2 5 °c、以2 〇 r P m在3 0 矛/J、後所測定之數値爲黏度値)測定,測得黏度爲3.6 mPa 以D y η 〇 m e t e r ((股)島津製作所製)測定表面張Μ M fA 17J v ( C ) polyfunctional monomer dipentaerythritol hexaacrylate 8 0 ^ _ parts, (D) photoradical generator 2 - benzyl dimethylamino - ~ (4, morpholine Phenylphenyl)butanone-1 50 parts by weight and (E) solvent of propylene dioxime IME ether acetate 1, hydrazine parts by weight, to prepare a composition (R 1 ). The viscosity of the composition (R1) is determined by the EL·type viscometer (DV Μ - Ε 制 type: Measured temperature 2 5 °c, 2 〇r P m at 3 0 spear/J, The measured number of 値 is the viscosity 値), and the measured viscosity is 3.6 mPa. The surface sheet is measured by D y η 〇meter (manufactured by Shimadzu Corporation)

P S 禪j得表面張力27 mN/m。 爹膜之形成&gt;P S Zen has a surface tension of 27 mN/m. Formation of ruthenium film&gt;

II 用狹縫模塗機(東京應化工業(股)製T R 6 3 2 1 0 S_ -36 - (33) 1264564 C L ) ’塗佈速度爲 0.0 7 m / s、0 . ] 1 m / s 或 0 . 1 5 ni / 將組成物(R ])旋轉塗佈於表面上形成防止鈉離子溶 S i 〇 2 §吴之鈉|丐玻璃基板(1,〗〇 〇 m m X ],2 5 0 m m )表 1,Q 8 0 m m χ 1 5 2 3 0 m m (由基板之各端緣往內側各 1 ( 之區域內)上5然後使溶劑揮發,製作3片分別形成 2-〇 μηι之塗膜的基板。 此時,組成物(R1 )之 A V / Β値配合塗佈速度 爲 9·3χ1(Γ3,14.7x10_3 及 20.0xl(T3。 &lt;塗佈性之評價&gt; 塗佈後之塗膜表面以鈉燈光照射,進行觀察時, 域未發現乾燥斑等外觀上之問題的塗佈斑時,評價爲 ’有塗佈斑時,評價爲不良,結果如表1所示。 如圖1所示,測定由基板1之各端緣往內側各] 之細線所圍繞之區域所形成之塗膜2,包括塗膜之端 與其附近部及中央部共計3 5個測定點(黑色圓點) 膜厚時,若所有的測定點之膜厚偏差在± 〇 . i 〇 μηΊ以 顯不非常均勻之塗佈性時,評價爲優良,膜厚偏差 0.2 Ο μΓη以內’顯示非常均勻之塗佈性時,評價爲良 膜厚偏差超過±0.20 μηι時,評價爲不良。 實施例2 混合(Α )顏料之C . I.顏料綠3 6與C · I.顏料黃1 6 0 / 4 0 (重量比)混合物6 0重量份、(B )鹼可溶性 出之 面之 mm 膜厚 依序 全區 良好 Omm 緣部 測定 內, 在士 好’ 丨8之 樹脂 -37- (34) 1264564 之甲基丙烯酸/苯乙烯/苯甲基甲基丙烯酸酯/甘油基單 甲基丙烯酸酯/ N -苯基順丁烯二胺共聚物(共聚重量比 = 1 5 / 15 / 35 / 10 / 25,Mw = 30,000 ' Mn=105000 ) 70 重 量份、(C )多官能性單體之六丙烯酸二季戊四醇酯8 〇重 量份' (D)光自由基產生劑之 2-苯甲基-2-二甲胺基-1-(4 -嗎啉基苯基)丁 _ _ i 5 〇重量份及(E )溶劑之3 „甲氧 基丁基乙酸酯8 0 0重量份,調製組成物(R2 )。 與實施例1相同測定組成物(R2 )之黏度及表面張力 的結果及A V / B値如表1所示。 與實施例1相同評價塗佈性,結果如表1所示。 實施例3 混合(A )顏料之C . I.顏料紅2 5 4與C . I.顏料黃1 3 9 之 6 5 / 3 5 (重量比)混合物9 0重量份、(B )鹼可溶性 樹脂之甲基丙烯酸/苯乙烯/苯甲基甲基丙烯酸酯/甘油 基單甲基丙烯酸酯/ N-苯基順丁烯二胺共聚物(共聚重量 t 匕=15 / 15/35 / 10/25, M 1 5,0 0 0 ' Mn = 65000 ) 7 0 重 量份、(C )多官能性單體之六丙烯酸二季戊四醇酯8 0重 量份、(D)光自由基產生劑之2-苯甲基-2-二甲胺基-卜 (4 -嗎啉基苯基)丁酮_ 1 3 0重量份及(E )溶劑之丙二醇 單甲醚乙酸酯1 ; 5 0 0重量份,調製組成物(R3 )。 與實施例1相同測定組成物(R3 )之黏度及表面張力 的結果及A V / B値如表1所示。 與實施例1相同評價塗佈性,結果如表]所示。 -38· (35) Ϊ264564 貫施例4 混合(A )顏料之C · I ·顏料綠3 6與C . I.顏料黃1 3 8之 6 〇 / 4 0 (重量比)混合物1 〇 〇重量份' (B )驗可溶性樹 脂之甲基丙烯酸/苯乙烯/苯甲基甲基丙烯酸酯/甘油基 單甲基丙燒酸醋/ N -苯基順丁稀二胺共聚物(共聚重量比 —^/ 15/35/ 10/25,M w=12, 〇〇〇、Mn = 5,000) 70 重量 ^ ( C )多官能性單體之六丙烯酸二季戊四醇酯8 〇重量 份、(D)光自由基產生劑之2 -苯甲基-2-二甲胺基-1-( 4 -嗎啉基苯基)丁酮-1 30重量份及(E)溶劑之3 -甲氧基 丁 _乙酸酯1,2 0 0重量份,調製組成物(R4 )。 與實施例1相同測定組成物(R4 )之黏度及表面張力 的結果及A V / B値如表]所示。 與實施例1相同評價塗佈性,結果如表1所示。 實施例5 除了實施例1之丙二醇單甲醚乙酸酯的量改爲7 0 0重 量份外,其餘與實施例1相同調製組成物(R 5 )。 與實施例1相同測定組成物(R5 )之黏度及表面張力 的結果及A V / B値如表1所示。 與實施例1相同評價塗佈性’結果如表1所示。 實施例6 混合(A )顏料之C · I.顏料紅2 5 4與C . I ·顏料黃]7 7 之9 0 / 1 0 (重量比)混合物8 0重量份、(B )鹼可溶性 -39- (36) 1264564 樹脂之甲基丙烯酸/苯乙烯/苯甲基甲基丙烯酸酯/甘油 基單甲基丙烯酸酯/ N -苯基順丁烯二胺共聚物(共聚重量 比二 15/20/30 / 10/25,Mw=15,000、Μη二 6,000) 6 0 重 量份、(C )多官能性單體之六丙烯酸二季戊四醇酯9 0重 量份' (D)光自由基產生劑之2 -苯甲基-2-二甲胺基-1-(4-嗎啉基苯基)丁酮-1 / 雙(2;4-二氯苯基)- 4 : 4 5,5 , 5 ’ -四苯基-1,2、聯二咪唑/ 4,4、雙(二乙胺基)二 苯甲酮之3 0 / 4 / 2 / 4 (重量比)混合物4 0重量份及(Ε )溶劑之3 -乙氧基丙酮酸乙酯/丙二醇單甲醚乙酸酯50 / 50 (重量比)1,4 00重量份,調製組成物(R6 )。 與實施例1相同測定組成物(R6 )之黏度及表面張力 的結果及AV/ Β値如表1所示。 與實施例1相同評價塗佈性,結果如表1所示。 實施例7 混合(A )顏料之C.I.顏料藍15 : 6與C.I.顏料紫23 之9 7 / 3 (重量比)混合物8 0重量份、(B )鹼可溶性樹 脂之甲基丙烯酸/苯乙烯/苯甲基甲基丙烯酸酯/甘油基 單甲基丙烯酸酯/ N-苯基順丁烯二胺共聚物(共聚重量比 = 15/ 15 / 30/ 10/30,Mw=12:000、Mn = 5;0 0 0 ) 6 5 重量 份、(C )多官能性單體之六丙烯酸二季戊四醇酯8 5重量 份、(D)光自由基產生劑之 2 -甲基-甲基苯硫基 )-2-嗎啉基丙酮雙(2,4-二氯苯基)-4,4’,5;5^ 四苯基聯二咪唑/ 2-毓基苯并噻唑/ 4,4’-雙(二乙 -40- 1264564 (37) 胺基)二苯甲酮之3 0 / 3 / 2 / 5 (重量比)混合物4 0重 量份及(E )溶劑之3 -乙氧基丙酮酸乙酯/丙二醇單甲醚 乙酸酯/二乙二醇甲基乙醚之 45/40/15 (重量比) ],6 0 0重量份,調製組成物(R7 )。 與實施例1相同測定組成物(R7 )之黏度及表面張力 的結果及AV/ B値如表1所示。 與實施例1相同評價塗佈性,結果如表1所示。 1264564 I漱 實施例7 卜 塗佈速度〇.〇7m/s 7Ό xlO'3 良好 優良 塗佈速度O.llm/s 11.0 xlO·3 良好 優良 塗佈速度0.15m/s 15.,0 xlO-3 良好 優良 實施例6 8.3 xlO'3 良好 : 優良 13.0 xlO-3 良好 優良 17.8 xlO'3 良好 優良 實施例5 20.7 xlO'3 良好 優良 「 32.6 xlO'3 i- 1 良好 良好 44.4 xlO-3 不良 不良 實施例4 CN 13.2 xl(T3 良好 優良 20.8 xHT3 良好 優良 28.3 xlO&quot;3 良好 優良 實施例3 σ&gt; oi 7.5 xlO-3 ! 」 1 良好i I 優良1 丨 ! 11.8 xlO*3 良好 優良 16.1 xlO-3 良好 優良 實施例2 ο vd oo (N 15.0 xlO-3 1 良好 優良 I ! 23.6 xlO-3 良好 優良 32.1 xlO'3 良好 良好 實施例1 m 9.3 xlO&quot;3 良好 優良 14.7 xlO'3 1 ! 良好 j 優良 20.0 xlO·3 良好 優良 黏度 表面張力 1 (AV/B)丨 1 塗佈不均! 1 膜厚差 (AV/B) 塗佈不均 膜厚差 (av/b) 塗佈不均 膜厚差 -42 - (39) 1264564 【圖式簡單說明】 圖1係膜厚測定要領的說明圖。 符號說明 ]:基板 2 :塗膜II Using a slit die coater (TR 6 3 2 1 0 S_ -36 - (33) 1264564 CL by Tokyo Chemical Industry Co., Ltd.) 'Coating speed is 0.0 7 m / s, 0 . ] 1 m / s Or 0.15 ni / Rotating the composition (R)) on the surface to prevent sodium ion dissolution S i 〇 2 § Wu Sodium | 丐 glass substrate (1, 〗 〖mm X ], 2 5 0 Mm ) Table 1, Q 8 0 mm χ 1 5 2 3 0 mm (from the inner edge of each side of the substrate to the inner side 1 (in the region) 5 and then volatilize the solvent to make 3 pieces of coating respectively forming 2-〇μηι The substrate of the film. At this time, the coating speed of the composition of the composition (R1) was 9·3χ1 (Γ3, 14.7x10_3, and 20.0xl (T3. &lt; evaluation of coating property> coating after coating) When the surface of the film was irradiated with sodium light, when the coating spot having no problem of appearance such as dry spots was observed in the field, it was evaluated as "when the coated spot was observed, the evaluation was poor, and the results are shown in Table 1. As shown in the figure, the coating film 2 formed by the region surrounded by the thin lines of the respective end edges of the substrate 1 is measured, and includes a total of 35 measurement points (black dots) at the end of the coating film and the vicinity and the center portion thereof.When it is thick, if the film thickness deviation of all the measurement points is ± 〇. i 〇μηΊ, the coating property is not very uniform, and it is evaluated as excellent, and when the film thickness deviation is within 0.2 Ο μΓη, it shows a very uniform coating property. When it was evaluated that the film thickness deviation exceeded ±0.20 μηι, it was evaluated as poor. Example 2 Mixed (Α) pigment C. I. Pigment green 3 6 and C · I. Pigment yellow 1 6 0 / 4 0 (weight ratio) ) 60 parts by weight of the mixture, (B) the thickness of the alkali-soluble surface of the film is in the range of good Omm edge measurement, in the resin of the 'good' 丨8-37- (34) 1264564 methacrylic acid / Styrene/benzyl methacrylate/glyceryl monomethacrylate/N-phenyl maleic acid diamine copolymer (copolymer weight ratio = 1 5 / 15 / 35 / 10 / 25, Mw = 30,000 ' Mn=105000) 70 parts by weight, (C) polyfunctional monomer dipentaerythritol hexaacrylate 8 〇 parts by weight '(D) photo-radical generator 2-benzyl-2-dimethylamino-1 -(4- morpholinylphenyl) butyl _ _ i 5 〇 by weight and (E) solvent 3 „ methoxybutyl acetate 80 parts by weight, the composition (R2 ) Determination of the same composition of Example 1 (R2) embodiment of viscosity and surface tension results and A V / B as shown in Table 1 Zhi. The coatability was evaluated in the same manner as in Example 1. The results are shown in Table 1. Example 3 Mixing (A) Pigment C. I. Pigment Red 2 5 4 and C. I. Pigment Yellow 1 3 9 6 5 / 3 5 (by weight) mixture 90 parts by weight, (B) alkali-soluble resin Methacrylic acid / styrene / benzyl methacrylate / glyceryl monomethacrylate / N-phenyl maleimide copolymer (copolymerization weight t 匕 = 15 / 15 / 35 / 10 / 25 , M 1 5,0 0 0 ' Mn = 65000 ) 7 0 parts by weight, (C) 80 parts by weight of dipentaerythritol hexaacrylate, (D) 2-benzoyl photodegradation agent Base-2-dimethylamino-b (4-morpholinylphenyl)butanone _ 1 3 0 parts by weight and (E) solvent propylene glycol monomethyl ether acetate 1 ; 500 parts by weight, modulation composition (R3). The results of measuring the viscosity and surface tension of the composition (R3) in the same manner as in Example 1 and A V / B are shown in Table 1. The applicability was evaluated in the same manner as in Example 1. The results are shown in Table. -38· (35) Ϊ264564 Example 4 Mixing (A) Pigment C · I · Pigment Green 3 6 and C . I. Pigment Yellow 1 3 8 6 〇 / 4 0 (by weight) Mixture 1 〇〇 Weight (B) methacrylic acid / styrene / benzyl methacrylate / glyceryl monomethyl propylene sulphuric acid / N - phenyl cis-butyl diamine copolymer (copolymer weight ratio - ^/ 15/35/ 10/25, M w=12, 〇〇〇, Mn = 5,000) 70 parts by weight (C) polyfunctional monomer dipentaerythritol hexaacrylate 8 〇 parts by weight, (D) optical freedom 2-Benzyl-2-dimethylamino-1-(4-morpholinylphenyl)butanone-1 30 parts by weight of the base generator and (E) solvent 3 - methoxybutane-acetic acid The ester (1,200 parts by weight) was prepared to prepare a composition (R4). The results of measuring the viscosity and surface tension of the composition (R4) in the same manner as in Example 1 and A V / B are shown in the table. The coatability was evaluated in the same manner as in Example 1. The results are shown in Table 1. Example 5 The composition (R 5 ) was prepared in the same manner as in Example 1 except that the amount of the propylene glycol monomethyl ether acetate of Example 1 was changed to 7000 parts by weight. The results of measuring the viscosity and surface tension of the composition (R5) in the same manner as in Example 1 and A V / B are shown in Table 1. The results of evaluation of coating properties in the same manner as in Example 1 are shown in Table 1. Example 6 Mixing (A) Pigment C · I. Pigment Red 2 5 4 and C. I · Pigment Yellow] 7 7 of 9 0 / 1 0 (weight ratio) mixture 80 parts by weight, (B) alkali solubility - 39- (36) 1264564 Resin methacrylic acid / styrene / benzyl methacrylate / glyceryl monomethacrylate / N - phenyl maleimide copolymer (copolymer weight ratio of 15 / 20 / 20 /30 / 10/25, Mw = 15,000, Μη, 6,000) 60 parts by weight, (C) polyfunctional monomer, dipentaerythritol hexaacrylate, 90 parts by weight '(D) photoradical generator 2 - Benzyl-2-dimethylamino-1-(4-morpholinylphenyl)butanone-1 / bis(2;4-dichlorophenyl)- 4 : 4 5,5 , 5 ' - four Phenyl-1,2, diimidazole/4,4, bis(diethylamino)benzophenone 3 0 / 4 / 2 / 4 (by weight) mixture 40 parts by weight and (Ε) solvent Ethyl 3-ethoxyacetate/propylene glycol monomethyl ether acetate 50 / 50 (weight ratio) 1,400 parts by weight, and the composition (R6) was prepared. The results of measuring the viscosity and surface tension of the composition (R6) in the same manner as in Example 1 and AV/Β値 are shown in Table 1. The coatability was evaluated in the same manner as in Example 1. The results are shown in Table 1. Example 7 Mixing (A) Pigment of CI Pigment Blue 15 : 6 with CI Pigment Violet 23 9 7 / 3 (by weight) mixture 80 parts by weight, (B) alkali soluble resin methacrylic acid / styrene / benzene Methyl methacrylate / glyceryl monomethacrylate / N-phenyl maleimide copolymer (copolymerization weight ratio = 15/ 15 / 30 / 10 / 30, Mw = 12:00 0, Mn = 5 ; 0 0 0 ) 6 5 parts by weight, (C) polyfunctional monomer, pentaerythritol hexaacrylate, 85 parts by weight, (D) photo-radical generator 2-methyl-methylphenylthio)- 2-morpholinylacetone bis(2,4-dichlorophenyl)-4,4',5;5^tetraphenyldiimidazole/2-mercaptobenzothiazole/4,4'-double (two B-40- 1264564 (37) Amino) benzophenone 3 0 / 3 / 2 / 5 (by weight) mixture 40 parts by weight and (E) solvent 3 - ethoxyethyl pyruvate / propylene glycol The composition (R7) was prepared by using 45/40/15 (by weight) of monomethyl ether acetate/diethylene glycol methyl ether], and 60 parts by weight. The results of measuring the viscosity and surface tension of the composition (R7) in the same manner as in Example 1 and AV/B are shown in Table 1. The coatability was evaluated in the same manner as in Example 1. The results are shown in Table 1. 1264564 I漱Example 7 Bu coating speed 〇.〇7m/s 7Ό xlO'3 Good excellent coating speed O.llm/s 11.0 xlO·3 Good excellent coating speed 0.15m/s 15.,0 xlO-3 Good Excellent Example 6 8.3 xlO'3 Good: Excellent 13.0 xlO-3 Good Excellent 17.8 xlO'3 Good Excellent Example 5 20.7 xlO'3 Good and good" 32.6 xlO'3 i- 1 Good good 44.4 xlO-3 Poor implementation Example 4 CN 13.2 xl (T3 is good and excellent 20.8 xHT3 is good and excellent 28.3 xlO&quot; 3 Good Excellent Example 3 σ&gt; oi 7.5 xlO-3 ! ” 1 Good i I Excellent 1 丨! 11.8 xlO*3 Good Excellent 16.1 xlO-3 Good Excellent Example 2 ο vd oo (N 15.0 xlO-3 1 Good Excellent I! 23.6 xlO-3 Good Excellent 32.1 xlO'3 Good Good Example 1 m 9.3 xlO&quot;3 Good Excellent 14.7 xlO'3 1 ! Good j Excellent 20.0 xlO·3 Good Excellent Viscosity Surface Tension 1 (AV/B)丨1 Uneven coating! 1 Film thickness difference (AV/B) uneven coating thickness difference (av/b) uneven coating thickness difference 42 - (39) 1264564 [Simple description of the drawing] Figure 1 is an explanatory diagram of the method for measuring the film thickness. Explanation of symbols]: Plate 2: The coating film

-43 --43 -

Claims (1)

(1) 1264564 拾、申請專利範圍 ].一種彩色濾光片用輻射線敏感性組成物,其係含有 (A )顏料、(B )鹼可溶性樹脂、(c )多官能性單體、(1) 1264564 Pickup, Patent Application Range] A radiation sensitive composition for color filters containing (A) pigment, (B) alkali-soluble resin, (c) polyfunctional monomer, (D )光自由基引發劑及(E )溶媒之輻射線敏感性組成 物,其特徵係黏度爲A ( mPa · s )、其表面張力爲B ( mN/m),且形成著色層之塗佈速度爲V(m/s)時,以 (A X V - B )所得之數値未達4。〇 X 1 (Γ 2,用於狹縫模塗機 之塗佈。 2 ·如申請專利範圍第i項之彩色濾光片用輻射線敏感 性組成物,其中輻射線敏感性組成物之黏度爲2』mpa · s 〜8.0 m P a · s 〇 3 · —種彩色濾光片,其特徵係具有由如申請專利範圍 第1或2項之彩色濾光片用輻射線敏感性組成物所形成之 著色層。(D) a photo-radical initiator and (E) a radiation-sensitive composition of a solvent having a viscosity of A (mPa · s ), a surface tension of B (mN/m), and a coating of a colored layer. When the cloth speed is V (m/s), the number obtained by (AXV - B) is less than 4. 〇X 1 (Γ 2, for coating of a slot die coater. 2) A radiation-sensitive composition for a color filter according to item i of the patent application, wherein the viscosity of the radiation-sensitive composition is 2 mp m · s ~ 8.0 m P a · s 〇 3 · a color filter characterized by having a radiation sensitive composition of a color filter as claimed in claim 1 or 2 The color layer. 4 . 一種彩色液晶顯示裝置,其特徵係具備如申請專利 範圍第3項之彩色濾光片。 5 . —種彩色濾光片用著色層的形成方法,其特徵係使 用如申請專利範圍第1或2項之彩色濾光片用轄射線敏感 性組成物,在基板上形成著色層的方法,其中該輻射線敏 感性組成物之塗佈速度爲〇 . 〇 7 Π1 / s以上,利用狹縫模塗 機來形成。 - 44 -A color liquid crystal display device characterized by having a color filter as in item 3 of the patent application. A method for forming a colored layer for a color filter, which is characterized in that a coloring layer is formed on a substrate by using a color filter for a color filter according to claim 1 or 2, The coating speed of the radiation sensitive composition is 〇7 Π1 / s or more, and is formed by a slit die coater. - 44 -
TW092132336A 2002-12-19 2003-11-18 Radiation sensitive composition for color filter, color filter, manufacturing method of liquid crystal color display, and forming method of colored layer of color filter TWI264564B (en)

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Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI303350B (en) 2002-08-08 2008-11-21 Sumitomo Chemical Co Colored photosensitive resin composition
JP4691877B2 (en) * 2002-08-08 2011-06-01 住友化学株式会社 Colored photosensitive resin composition
JP3960311B2 (en) * 2003-01-21 2007-08-15 三菱化学株式会社 Curable resin composition for die coating, color filter, method for producing color filter, and liquid crystal display device
JP4506224B2 (en) * 2003-03-28 2010-07-21 住友化学株式会社 Colored photosensitive resin composition
KR100482953B1 (en) * 2003-04-15 2005-04-15 삼성전자주식회사 Color filter composition, method and apparatus for manufacturing color filter using the same
JP4449444B2 (en) * 2003-12-12 2010-04-14 凸版印刷株式会社 Method for filtering photosensitive coloring composition and solid-state imaging device
JP2005338831A (en) * 2004-05-25 2005-12-08 Samsung Electronics Co Ltd Photoresist composition for organic film of liquid crystal display, spinless coating method thereof, fabrication method of organic film pattern using the same, and liquid crystal display fabricated by the same
JP4407410B2 (en) * 2004-07-15 2010-02-03 Jsr株式会社 Radiation sensitive composition for color filter and preparation method thereof
KR101119818B1 (en) * 2004-12-07 2012-03-06 주식회사 동진쎄미켐 Photoresist composition for colour filter and preparation method of liquid crystal display colour filter using the same
JP4553128B2 (en) * 2005-02-02 2010-09-29 東洋インキ製造株式会社 COLORING COMPOSITION, COLOR FILTER USING THE SAME, AND METHOD FOR PRODUCING THE SAME
JP4727344B2 (en) * 2005-06-09 2011-07-20 東京応化工業株式会社 Photosensitive composition
JP4826187B2 (en) * 2005-09-26 2011-11-30 大日本印刷株式会社 Manufacturing method of color filter
JP4456562B2 (en) * 2005-12-13 2010-04-28 東洋インキ製造株式会社 Coloring composition and color filter using the same
CN1991580B (en) * 2005-12-31 2011-02-02 财团法人工业技术研究院 Color photosensitive composition and its production method
CN101154043B (en) * 2006-09-26 2011-04-20 新应材股份有限公司 High Resolution Negative Photoresist
JP4947294B2 (en) * 2007-02-23 2012-06-06 Jsr株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element
JP5024107B2 (en) * 2007-03-13 2012-09-12 Jsr株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element
JP2008261947A (en) * 2007-04-10 2008-10-30 Toppan Printing Co Ltd Photosensitive color composition for translucent liquid crystal display, color filter for translucent liquid crystal display using photosensitive color composition and its manufacturing method, and translucent liquid crystal display
TWI559079B (en) * 2008-11-18 2016-11-21 Sumitomo Chemical Co Photosensitive resin composition and display device
KR101813138B1 (en) * 2010-05-27 2017-12-28 제이에스알 가부시끼가이샤 Radiation-sensitive resin composition for forming cured film, method of manufacturing the radiation-sensitive resin composition for forming cured film, cured film, method for forming the cured film and liquid crystal display device
JP5803066B2 (en) * 2010-08-05 2015-11-04 Jsr株式会社 Radiation-sensitive composition, display element spacer and method for forming the same
CN102375338A (en) * 2010-08-16 2012-03-14 Jsr株式会社 Coloring composition, method for manufacturing the same, coloring pattern, color filter, color display component and method for manufacturing the color filter
CN104650281A (en) * 2014-12-26 2015-05-27 北京鼎材科技有限公司 Alkali-soluble resin polymer for color light filter and light-sensitive resin composition
JP6460836B2 (en) * 2015-02-26 2019-01-30 東京応化工業株式会社 Non-rotating coating composition and resin composition film forming method
CN109445249A (en) * 2018-10-23 2019-03-08 武汉华星光电半导体显示技术有限公司 The preparation method of Photosensitve resin composition, display equipment and Photosensitve resin composition

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4203130B2 (en) * 1996-06-27 2008-12-24 大日本印刷株式会社 Application method
JPH10142794A (en) * 1996-11-14 1998-05-29 Hitachi Chem Co Ltd Photosensitive solution for forming colored image and manufacture of color filter by using the same and color filter
TWI232354B (en) 1998-07-31 2005-05-11 Dainippon Printing Co Ltd Photosensitive resin composition and color filter
JP3684878B2 (en) * 1998-11-24 2005-08-17 東レ株式会社 Coating apparatus, coating member manufacturing method, and color filter manufacturing apparatus and manufacturing method
CN1124520C (en) * 1999-10-14 2003-10-15 财团法人工业技术研究院 Water-dispersible negative photosensitive composition
CN1126005C (en) * 1999-12-30 2003-10-29 奇美实业股份有限公司 Photosensitive resin composition
JP4081967B2 (en) * 2000-08-28 2008-04-30 Jsr株式会社 Radiation sensitive composition for color filter and color filter
JP2002258027A (en) * 2001-02-28 2002-09-11 Jsr Corp Radiation sensitive composition for color filter and method of manufacturing the same, color filter and color liquid crystal display element

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