TWI258619B - Liquid crystal display device, color filter substrate and protrusion structure thereof, and manufacturing method therefor - Google Patents

Abstract

A liquid crystal display device, a color filter substrate and a protrusion structure thereof, and a manufacturing method therefor are provided. The color filter substrate includes a transparent substrate, a black matrix, a plurality of color filters, a plurality of first protrusion structures, and a plurality of second protrusion structures. The black matrix is disposed on the transparent substrate and exposes part of the transparent substrate for defining a plurality of first openings, a plurality of second openings, and a plurality of pixel regions, wherein the size of each first opening is different from the size of each second opening. In addition, the color filters are disposed in the pixel regions. The first protrusion structures and the second protrusion structures are disposed on the transparent substrate, wherein the first protrusion structures are corresponding to the first openings respectively, and the second protrusion structures are corresponding to the second openings respectively. Each first protrusion structure and each second protrusion structure are in different heights.

Description

1258619 15836twf.doc/y IX. Description of the invention: [Technical field to which the invention pertains] The present invention relates to a method for displaying a knot of a skirt, a method for producing the same, and particularly relates to a structure in which a liquid crystal display is difficult to Production Method. , /' 1 [Prior Art] Liquid: The display device typically includes a pair of substrates = row =. The space between the silk plates is generally called the liquid crystal marriage or the early το gap (10) gap). - a liquid crystal material is interposed between the two substrates, in a gap of -3 yuan, which can be changed in response to an applied electronic signal. A plurality of electrodes are placed on the inner surface of the substrate for use in the liquid crystal material. Some types of liquid crystal display devices have electrode sides, (4) produce -_ fixed text or symbols, while other types of liquid crystal display devices have electrode matrices, pots forming a face, including a very large number of individually accessible Pixels (thin!) ^Niuwaiting mother--a pixel element is selectively activated to form an infinite change (Beijing: Μ冢. 3 ^ to ensure the correct operation of the liquid crystal display device, it is very important to maintain the entire display surface Uniform and fine ΐ, even very small errors in the cell gap will cause the display surface to be 'visible and defective appearance (so-called panel chromaticity unevenness, fatigue, sinking). When using a fingertip Even with a slight pressure, this effect can easily be seen in the LCD panel of the conventional LCD. For the pressure back to 6 1258619 15836twf.doc/y, the cell gap in the affected area will be slightly reduced. , causing dark spots, contrast reduction, or other undesirable shortcomings in the display image. In a conventional technique, as shown in FIG. 1, the liquid crystal display device includes a thin film electro-crystal a Thin Film Transistor (TFT) substrate 61, a color filter (CF) substrate 71, and a liquid crystal material 69 interposed therebetween. The cell gap is provided on the two substrates 61, 71. The gaps 79 are maintained by a plurality of gaps 79. The gaps 79 are consistently high φ degrees, and the book is randomly placed in the gap of the unit, such as by a sprinkling technique. This usually results in a local density of the spacers. Non-uniform distribution. In order to ensure that the gaps placed on all areas of the display surface are of sufficient concentration to maintain proper cell clearance, excess spacers must be used. Furthermore, according to such conventional techniques for spacer configuration, It is placed on the display panel, in the inactive '' and ''active'' areas. The dynamic, area is the area where the liquid crystal material can be selectively activated. Because the system is located between the two opposite electrodes, the electrode is disposed on the substrate. The non-dynamic, the region is the region where the liquid crystal material cannot be selectively activated, because the substrate is not repaired. The opposite electrode. ^ In essence, in the above-mentioned gap technique, there are several unfavorable disadvantages in the liquid crystal display surface, the structure and the complication of the board. In particular, the gap falling in the dynamic display area , which may cause certain disadvantages, such as a decrease in the ratio, or a poor light emission near the edge of the gap. Therefore, European Patent No. 1,030,211, No. 2, which is incorporated herein by reference, discloses a liquid crystal display, such as the second As shown in the figure, it is possible to slightly spread the step of the gap and thus avoid the difference in the cell thickness of the 7 1258619 15836 twf.doc/y. The liquid crystal display device of this type generally comprises a thin film. A Thin Film Transistor (TFT) substrate 30, a color filter (CF) substrate 40, and a liquid crystal material layer 49 sealed therebetween. As shown in Fig. 2, the protruding pattern formed on the CF substrate 40, that is, the spacer 45 has a height of about 4·0 μm to maintain a uniform cell gap. In general, the cell gap of a liquid crystal display is the average distance between the alignment films of the two substrates, and is usually about the height of the spacer after the pair of substrates. However, the gap 45 in the two liquid crystal displays of the prior art and the above-mentioned European patent is placed on a glass substrate 41, and the color filter layer 43 is disposed on the spacer 45 and the glass substrate. 41 between the two. Referring now to Figure 3, it is described that a columnar spacer of 2 〇φμη at room temperature is directly placed on a glass substrate, and a color filter layer is provided between the column spacer and the glass substrate. Stress_strain diagram. It is understood that the spacer directly placed on the glass substrate is substantially an elastic body, as shown by a curved line, but the spacer on the glass substrate and having the color filter layer interposed therebetween Partially elastic, as shown by curve B, in which a permanent strain d is maintained after the load is released. Therefore, if a pressure (or stress) of the load on the LCD device is large enough to generate the permanent strain, the total height of the spacer and the color filter layer disposed on the glass substrate will be change. In other words, after the LCD panel is subjected to a considerable pressure, the cell gap may be uneven, and 8

In recent years, a faster filling technique has been developed, that is, the 1258619 15836twf.doc/y panel unevenness of color (Mura defect) may occur. Furthermore, many methods have been provided in the prior art in connection with the bonding of two substrates in a liquid crystal display and the filling process of a liquid crystal material. For example, the two substrates of the display first construct all necessary thin film transistors (TFTs), circuits, and color filters. The two substrates are then aligned with each other and spaced apart by a distance of about 5 microns and bonded together with epoxy at their edges. The combined substrate and a liquid crystal dish filled with liquid crystal material are placed in a vacuum chamber such that the gap in the bonded substrate is in a vacuum state. Then, the filling port of the bonding substrate faces the liquid crystal dish and contacts the liquid crystal material, and then the vacuum is broken, so that the filling port of the bonding substrate has a capillary effect and a pressure difference between the inside and the outside of the bonding substrate. The liquid crystal material is gradually sucked in. The so-called One Drop Fill technology. In this technique, one of the substrates of the two substrates accommodates the liquid crystal material filled with the droplets before the two substrates are bonded. The method of manufacturing a liquid crystal display panel (Meth〇d 〇f Manufacture 〇f) is disclosed in U.S. Patent No. 5,263,888 issued to Teruhisa Ishihara et al.

Liquid Crystal Display Panel),, which is incorporated herein by reference. In this process, in the elastic drop-filling technique of the spacer, the operation window of the amount of liquid crystal is dropped onto the substrate. When the amount of the gap is too small or the amount of plastic deformation is too large (e.g., the modulus of elasticity is too low), the amount of the liquid crystal is relatively large, and the gravity mura is also caused. If there is too much gap or the amount of elastic deformation is too low (for example, if the elastic coefficient is too high), the amount of liquid crystal is relatively small, and bubbles are likely to be generated. In the ideal elastic lay-up, the higher the height, the larger the operating range can be obtained. [Description of the Invention] The purpose of the present invention is to provide a raised structure of a raised structure by providing a convex structure to adjust the south degree of the convex structure formed by the opening size of the light shielding pattern. As a _ sub and / or alignment protrusion. SUMMARY OF THE INVENTION It is an object of the present invention to provide a construction of a liquid crystal display device and a method of fabricating the same that can simultaneously produce spacers of different heights to maintain a uniform and accurate cell gap of the liquid crystal display device. SUMMARY OF THE INVENTION An object of the present invention is to provide a structure of a liquid crystal display device and a method of fabricating the same, which can form alignment protrusions while forming a spacer to simplify the process and save manufacturing costs. θ Based on the above or other objects, the present invention provides a embossing structure for a raised structure. First, a length: for a color light-emitting substrate or a thin film transistor array substrate, wherein the color filter substrate or thin film transistor array The substrate has a light shielding pattern, and the light shielding pattern defines a plurality of openings. Next, a photoresist is formed on the two masked, patterned color filter substrate or thin film transistor array substrate. New, with a blackout® (four) mask, and the back side of the active substrate array substrate or the other side of the active device array substrate is exposed to the photoresist to adjust the exposure depth of the photoresist at the opening by the size of the opening . The photoresist is then developed to form a plurality of raised structures corresponding to the openings. The present invention further provides a liquid crystal display device comprising a first substrate 1258619 15836 twf.doc/y Γ a second substrate: a narrow crystal shield, a first ridge-convex structure and a plurality of second convex structures. /, medium ★, the first substrate is bonded to the second substrate, and the I cavity and the first substrate have a plurality of first openings and a plurality of second openings of different sizes. In addition, the liquid crystal layer is disposed in the cavity. In addition, the first structure is located in the cavity, wherein the first protrusion structure is in the position of the ^^ position, and the second protrusion structure is correspondingly disposed in the === position, and the first protrusion structure and the second structure The method of manufacturing the convex first. The first-light-shielding pattern, and the two-foot c-plate has a plurality of second openings. Then, in the first: = and the light-shielding pattern is used as a mask, and the other side of the second substrate is opposite to the light-resistance = exposure, wherein the photoresist at the first opening and the photoresist at the second opening σ With two different exposure depths. And then developing the photoresist to form a plurality of first-convex structures corresponding to the opening and corresponding to the second open σ g structure, wherein the first-convex structure and the second convex structure have no A color filter substrate mainly comprising a substrate, a black matrix, a plurality of color light-emitting sheets, a plurality of first, and a plurality of second raised structures. Wherein, the black matrix system configuration =, upper: and exposes a portion of the transparent substrate to define a plurality of second base openings and a plurality of pixel regions 'where the first opening and the second opening 11 1258619 15836twf.doc/ The y port has a different size. In addition, the color filter is coupled to the second raised structure and the second raised structure corresponding to L, with a convex structure and a different height. The present invention proposes a method for fabricating a color light-emitting sheet substrate. A transparent substrate is provided. Then, formed on a transparent substrate -

To define a plurality of first openings, a plurality of second openings to & = ' wherein the first opening 盥 first opening and the old class & field, the U- opening has a different size, and the first opening and the first opening A portion of the transparent substrate is exposed. Weaving, in the pixel area (four) into a plurality of color filters. Next, a photoresist is coated on the transparent substrate, 2 is a black matrix and a color filter, and the light film is used as a mask, and the photoresist is back-exposed by the other side of the transparent substrate, wherein the photoresist at the first opening is It has a different exposure depth from the photoresist at the second opening. Thereafter, the photoresist is developed to form a plurality of first protrusion structures corresponding to the first opening and a first protrusion structure corresponding to the second opening, wherein the first protrusion structure and the second protrusion structure Have different heights. Another color filter substrate is proposed by the present invention, which mainly comprises a transparent substrate, a black matrix, a plurality of color filters, a plurality of first protrusion structures and a plurality of second protrusion structures. Wherein, the black matrix is disposed on the transparent substrate ′ and a portion of the transparent substrate is exposed to define a plurality of first openings and a plurality of pixel regions. Further, the color filter is disposed in the pixel region, wherein the color filter has a plurality of second openings, and the first opening and the second opening have different sizes. In addition, the first raised structure and the second raised structure 12

1258619 15836twf.doc/y system configuration=transparent substrate, wherein the first (10) structure corresponds to the first open two convex structure corresponding to the second opening, and the first convex structure has a different height from the young one. The invention proposes another coloring method for manufacturing a light sheet substrate. First, providing a transparent substrate. Then, forming a black matrix on the transparent substrate to define a plurality of first openings and a plurality of pixel regions, and first Open turbulence = sub-transparent substrate 1 after 'in the pixel area _ into a plurality of color slabs', having a plurality of second openings to expose a portion of the transparent substrate, and the first opening and the second opening are different Then, the photoresist is coated on the transparent substrate, and the black matrix and the color (four) film are used as the mask, and the other side of the transparent substrate is exposed to the f-direction, wherein the photoresist at the first opening is The photoresist at the second opening has a different exposure depth. Thereafter, the photoresist is developed to form a plurality of first protruding structures corresponding to the first opening and a plurality of second protruding structures corresponding to the second opening, The first raised structure and the second raised structure have different heights. The present invention provides a color filter substrate, which mainly comprises a transparent substrate, a black matrix, a plurality of color light-emitting sheets, and a plurality of first convex portions. Structure and more a second raised structure. The towel, the black matrix is disposed on the transparent substrate, and a portion of the transparent substrate is exposed to define a plurality of colors, and the color filter is disposed in the pixel region, wherein the color film has a plurality of a first opening and a plurality of second openings, and the first opening and the second opening have different sizes. In addition, the first protrusion structure and the second protrusion structure are disposed on the transparent substrate, wherein the first protrusion The structure corresponds to the first opening, and the second raised structure corresponds to the second opening, and the first raised structure ^ 13 1258619 15836twf.doc / y second raised structure has a different height. A method of fabricating a filter substrate. First, a transparent substrate is provided. Next, a plurality of pixel regions are defined on the phase substrate to define a plurality of pixel regions. (10), a plurality of shirt color filters are formed in the pixel region, which have a plurality of first openings and a plurality of second openings to expose a portion of the transparent substrate, wherein the first opening and the second opening have different sizes. Then, 'coating the photoresist on the transparent substrate, and using a black matrix and color The light-receiving sheet is a mask' and the photoresist is back-exposed by the other side of the transparent substrate. The photoresist at the first opening has a different exposure depth from the photoresist at the second opening. Thereafter, the photoresist is _ shadow, _ depends on the first opening of the buddha-a raised structure and a plurality of second raised structures corresponding to the second opening, wherein the first raised structure and the second raised structure have different south degrees Based on the above, the gap sub-system of the present invention is directly placed on the glass substrate and can have different heights, so that after receiving a pressure or a force, the liquid crystal display device can be sufficiently recovered and the cell gap can be kept consistent. In addition, the present invention can adjust the exposure depth by the size of the opening on the light-shielding pattern to simultaneously form convex structures of different heights, which can be used as spacers or alignment protrusions, thereby contributing to simplifying the process and reducing the manufacturing cost. In addition, the present invention also contributes to further increasing the operation interval in which the amount of liquid crystal is dropped in the processing of the liquid crystal dropping type...neDr〇pFi(1). The above and other objects, features and advantages of the present invention will become more <RTIgt; 14 1258619 15836twf.doc/y [Embodiment] Referring to Figures 4a, 4b and 4c, there is shown a spacer sub-substrate, such as a color filter (c〇1〇rFilter; below), in accordance with an embodiment of the present invention. Referred to as CF) substrate 1〇〇, used in a thin film transistor (Thin Film)

Transistor, TFT) Liquid Crystal Display (LCD) device.

As shown in Fig. 4a, it shows a pixel φ (Pixel) on the CF substrate loo, which contains three sub-pixels. The pixel corresponds to a thin film transistor on a TFT substrate (not shown) of the LCD device. Reference is now made to Figures 4b and 4c, which are cross-sectional views of the CF substrate 1A along section lines 4b-4b and 4c-4c in Figure 4a. The CF substrate 1 has a transparent substrate such as a glass substrate 120. A black matrix 15 is generally made of metal, such as chromium (Cr) or chromium oxide (CrOx) in the form of a film, or a black resin, and covers the glass substrate 12, and exposes a portion thereof. The glass substrate 12 is defined to define a plurality of pixel regions, and a gap sub-region 152. • the black matrix 150 and the gap sub-region 152 are generally associated with the non-dynamic portion of the LCD device, the portion including the source bus line and the gate bus line on the TFT substrate , auxiliary capacitor electrode, • and thin film transistor. The pixel area corresponds to a dynamic portion of the LCD device and corresponds to a pixel electrode on the TFT substrate. Color filters 16A, such as a red color filter layer 16a, a green color filter, a light layer 160b, and a blue color filter layer 160c, are strip-shaped and alternately corresponding to the pixel region. 15 1258619 15836twf.doc/y It will be appreciated by those skilled in the art that the color filter 160 can be arranged in a variety of different patterns. A common electrode 140, such as made of ITO, covers the black matrix 150 and the color filter 160. A plurality of spacers 180 are disposed on the common electrode 140 at the gap sub-region 152. In other words, the spacer 180 is disposed on the glass substrate 120, and the common electrode 14 is disposed between the spacer 180 and the glass substrate 120. It will be appreciated by those skilled in the art that in certain types of liquid crystal displays, such as In Plane Switching (IPS) liquid crystal displays, the color filter (CF) substrate 100 does not provide this common The electrode 14 is. One skilled in the art will appreciate that an alignment film 170, such as formed of polyamidamine, can be further applied over the glass substrate 120 to have a thickness of about 0.1 μm. The surface of the alignment film no is suitable for aligning the liquid crystals. The alignment film is subjected to a rubbing process, a photo-aligning process, or a molecular property thereof to make the liquid crystal molecules have a certain arrangement. Direction without the need for a friction machining process. In this embodiment, the black matrix 150, the color filter 16A, the electrode layer 140, and the spacer 180 have a thickness of about 〇, about 15 μm, about 0.15 μm, and about 5.81 μm, respectively. It will be apparent that the height of the spacer 180 according to the present invention is greater than the cell gap, and in the processing of the liquid crystal drop type, the operation interval is further increased. Further, when the spacer sub-substrate according to the present invention is applied to a vertically-aligned (VA) form of the LCD device, the β-spaced sub-substrate may have a regional regulating device (plus regUlating 16 1258619 15836twf.doc/y Means, such as protrusions formed on the substrate (^3), or slits using transparent electrodes (eg, IT〇slit), to regulate the direction of the liquid crystal. The vertical § &amp;amplitude of the LCD device is disclosed in the European Patent Publication No. 884,626_A2, which is incorporated herein by reference. Referring now to Figure 5, there is shown a [CD device 200 in accordance with the present invention. The LCD device 200 includes the cf substrate 1 〇〇 and the TFT substrate 220 according to the present invention, and the CF substrate 1 〇〇 and the TFT substrate 22 〇 • • • , , , , 以 以 以 杂 杂 杂 杂 杂 杂 杂 杂 杂 杂 , , Liquid crystal material 210. The cavity 212 has a uniform and precise gap (cell gap) defined by the plurality of spacers 18(). The structure of the TFT substrate 220 will be described below. On a glass substrate 222, a gate 224, a gate line (scanning line) 225, and the auxiliary capacitance line 226 are formed, respectively. The gate 224, the gate line 225, and the auxiliary capacitor line 226 are covered with an insulating film 23; A semiconductor layer 227, which is a TFT (Thin Film Transistor) channel, is formed on the insulating film 233 over the mother gate 224. Furthermore, the metal layers 229a, 229b as the source and drain regions of the τρτ are formed in the upper portion of each semiconductor layer 227, and are connected to the source line and the pixel electrode 22. The pixel electrode 228 composed of ITO covers each of the auxiliary capacitance lines 226, and the insulating film 233 is disposed therebetween. Further, an alignment film 234 is formed on the source and drain regions 229a, 22%, and the pixel electrode 228. The present invention further provides a method for fabricating the CF substrate 100. First, referring to Fig. 6, there is provided a plate 120 having a flat surface, such as a glass substrate. In order to satisfy the optical density value (〇ρ^&amp;ι force 17 1258619 15836twf.doc/y is greater than 3.5, to achieve a high contrast value, a black matrix is formed, for example, a chromium film having a thickness of about 0.16 μm is formed on the glass substrate 12 Above the crucible, a photoresist is formed on the chromium film. Thereafter, a photomask is used which has a predetermined pattern for exposing the photoresist. After development, the chromium film is etched to form the black A matrix 150, and the black matrix 150 has a gap sub-region 152, such as a circular shape, an octagon, a polygon, a quadrangle, a triangle or a square shape, etc. I refer to Fig. 7, red, green, and blue color filters 16 For example, the red resin, the green resin, and the blue resin are respectively formed by coating the glass substrate 120. The thickness of the color filter 16 is different depending on the color resist material and the color requirement. For example, the color filter ι 60 and the black matrix 15 are thick at the edge. The color filter 160 is shaped into a pattern to expose the black matrix 1 located below. 5 and the gap sub-region 152. The color filter 160 is formed by, for example, a yellow lithography process. Thereafter, referring to FIG. 8, a common electrode 140 is formed, for example, by sputtering indium tin oxide (111). 11111 丨 11 (^ (16; 1 〇 〇), about 150 150111 thickness of indium tin oxide covering the color filter 160, the black matrix 150, and the gap sub-region 152. Then, Referring to FIG. 9, a negative photoresist 182 is coated on the glass substrate 120 and covers the gap sub-region 152. A light suitable for forming the photoresist into a curing reaction, for example, an ultraviolet light 184 is used by another The glass substrate 120 is irradiated on one side for exposing the negative photoresist 182. The negative photoresist 182 is irradiated with the ultraviolet light 184 to generate a bond (d〇ss 18 1258619 15836twf.doc/y linking)' The negative photoresist 182 is cured by the ultraviolet light 184 without being dissolved in the developer. After development and baking curing, the negative photoresist 182 forms a spacer of about 5·81 μηι thickness. As can be seen by those skilled in the art, the spacer 18 can be arbitrarily shaped. Such as a cone, an octagonal column, an octagonal cone, a polygonal corner column, a polygonal pyramid, or a square column, etc., is not limited to a cylindrical shape. The color filter 16 is opaque to the ultraviolet light 184 to avoid color filtering. The negative photoresist 182 is cured on the upper side of the sheet 16. In this case, the color filter 16 and the black matrix 150 act as a mask to shape the spacer 18, as shown in FIG. In a specific experimental example, for the color filters, iridium, and glass substrates used today, the transmittances of ultraviolet light corresponding to different wavelengths are as follows:

Wave length (λ) R/ITO R745-4 (2um) G/ITO G772-4 (2um) B/ITO B764-4 (2um) ITO-fglass 0.6mm glass bare glass 0.6 mm J line (335 nm) 0 0 0 54.45% 74.39% I line (365 nm) 7.10% 1.31% 0 66.73% 84.99% H line (405 nm) 5.07% 0.54% 36.51% 70.36% 90.64% G line (437 nm) 1.13% 0.27% 64.92% 81.77% 91.15% In the transmittance list, the first column is arranged as ultraviolet light J line (wavelength 335 nm), I line (wavelength 365 nm), H line (wavelength 405 nm), and Gline (wavelength 437 nm), and The first line is ITO+red negative photoresist (JSR R745_4, thickness 1258619 15836twf.doc/y 2um) and ITO+green negative photoresist on 0.6mm thick glass (JSR company) Model G772-4, thickness 2um), ιΤ〇+blue negative photoresist on glass 0.6mm (JSR company model B764-4, thickness 2um), ITO + barTglas's (thickness 0.6mm) and bare glass (thickness) It is 吸收.6mm) the absorption value of light transmitted through different wavelengths. The ultraviolet light J line (wavelength 335 nm), Iline (wavelength 365 nm), H line (wavelength 405 nm) and G line (wavelength 437 nm) can be emitted by a USHIO 10KW lamp used in an exposure apparatus, and ultraviolet light is used. UV Spectrum Meter, such as machine model: USHIO Spectroadiometer USR-405 force measurement. As shown in the table, when the UV light J line (wavelength 335) is irradiated with ITO + red negative photoresist, ITO + green negative photoresist and ITO + blue negative photoresist, its transmittance is the lowest, but its irradiation energy is the smallest. The process time for hardening the negative photoresist 182 on the gap sub-region 152 into the spacer 180 is increased. Furthermore, when A, H light (wavelength 405 nm) and G line (wavelength 437 nm) are irradiated with ITO + blue negative photoresist, the transmittance is higher, which will make the gap sub-region 152 negative. The photoresist 182 is hardened to change the space in which the liquid crystal is accommodated or to accommodate the liquid crystal. Therefore, since the transmittance of ultraviolet light (I line) at a wavelength of 365 nm is substantially between J line (wavelength 335), ultraviolet light H Hne (wavelength 405 nm), and G line (wavelength 437 nm), it has For ITO and glass substrates, the transmittance is higher, and for red, green, and blue color filters, the transmittance is lower. Therefore, ultraviolet light with a wavelength of 365 nm is selected to reflect the negative photoresist 182. 'You can use a variety of color filters, such as red, green, and blue color filters' to form a mask naturally, so most of the UV light can only penetrate 20

A TFT substrate 220 is bonded, and the edges of the CF substrate 1 and the TFT substrate 220 are adhered together to define a cavity 212 for accommodating the liquid crystal material 210. The cavity 212 has a uniform and precise gap (cell gap) defined by the plurality of spacers 18A. Thereafter, after a polarizing plate is separately mounted to the CF substrate 1 and the TFT substrate, the LCD device according to the present invention is completed. The liquid crystal material 210 can be disposed between the two substrates 100 and 220 by a vacuum suction technique or a One Drop Fill technique. 1258619 15836twf.doc/y The sub-region hardens the negative photoresist material of the _ sub-section == case, the area outside the rape area is fine; the penetration rate is J at 7.1/. And the penetration rate is less than ΐ 3ι%. In addition, the photoresist used in the spacer is considered to be in the colorant (in this embodiment, the 36-wavelength violet color ▲ light layer (in this case, added to the red, green color consideration layer) to ensure the ultraviolet cylinder It can penetrate the gap sub-area, and can form a reticle by using red, green, blue color filter and black matrix, and use light to form a _ sub-position in the (4): sub-region. Finally, the alignment film is formed. Covering the surface of the glass substrate 12A, as shown in the first drawing. Further, as shown in Fig. 5, the CF substrate 1 can further be combined with the spacer 180 according to the present invention as described above. Directly disposed on the glass substrate 120, the spacer 180 is substantially elastic. When the LCD device is subjected to an external pressure or a force, only the spacer 180 is deformed because it is directly placed according to the present invention. The spacers 180 on the glass substrate 120 are substantially elastic so that when the external pressure or load is released 21 1258619 15836 twf.doc/y, the spacers 180 will return to their original size to maintain uniformity. And precise cell gap without causing surface The chromaticity of the plate is not uniform. Furthermore, the spacer 180 has a high height, so that the operation interval can be further increased in the processing process of the One Drop Fill. Please refer to FIG. A color filter (CF) substrate 500 according to another embodiment of the present invention is used in a Thin Film Transistor (TFT) liquid crystal display (LCD) device. The CF substrate 500 is substantially similar to the CF substrate 100, wherein similar components are labeled with similar numbers. In the CF substrate 500, the spacer 580 is disposed in the color filter 560. During the manufacturing process of the substrate 500, a black matrix 550 is overlaid on the glass substrate 520, and a portion of the glass substrate 520 is exposed to define a plurality of pixel regions or color filter regions. The plurality of color filters 560 Arranging on the color filter region, and having a plurality of openings, the glass substrate 52 is exposed, and thereby defining a plurality of the spacer sub-regions 552. When coating and developing the negative photoresist, the light is Passing through the gap sub-region 552, and hardening a portion of the negative photoresist, thereby forming a plurality of spacers 580. Since in this embodiment, the spacer sub-region is located inside the pixel region, The material of the spacer 580 is a material of the same color as the color filter region in the pixel region to increase the transmittance of the display. Referring to FIG. 12, there is shown another embodiment in accordance with the present invention. A liquid crystal display (LCD) device 7A has a thin film transistor (TFT) substrate 620. 22 1258619 15836 twf.doc/y The liquid crystal display 700 is substantially similar to the liquid crystal display 200, in which like elements are labeled with similar reference numerals. The thin film transistor substrate 62 includes a transparent substrate 622, a gate 624, a source 629, and a pixel electrode 628 (such as ITO). The gate 624, the source 629, and the pixel electrode 628 A known technique is formed on the transparent substrate 622. In general, the gate 624 is connected to the broom line and is formed by a first metal lithography process and the source 629 is connected to the data line by a second metal. Formed in the lithography process. In the thin film transistor substrate 620, a plurality of color filters 66 are formed on the pixel electrode 628, and a plurality of spacers 68 are disposed in the color filter 660. During the fabrication of the thin film transistor substrate 620, a plurality of color filters 660 are formed on the pixel electrode 628, and a portion of the pixel electrodes 628 are exposed to define a plurality of pixel regions. The plurality of color filters 660 have a plurality of openings, the pixel electrodes 628 are exposed, and a plurality of the spacer sub-regions 652 are defined by j. After coating and developing the negative photoresist, ultraviolet light passes through the gap sub-region 652 from the outer side of the transparent substrate 622, and a portion of the negative photoresist is hardened, thereby forming a plurality of gaps. 680. Further, an alignment film 634 is formed on the source electrode 629, the color filter 660, and the spacer 680. The thin film transistor substrate 620 can be further combined with another substrate 623, and the edge of the thin film transistor substrate 62 and the substrate 623 is adhered to define a cavity 612 for accommodating a liquid crystal material 61? Thus, the liquid crystal display device 7 is formed. The cavity 612 has a uniform and precise gap (cell gap) defined by the plurality of spacers 680 of the 23 1258619 15836 twf.doc/y. It will be appreciated by those skilled in the art that two polarizing plates (not shown) will be separately applied to the outer surface of the thin film transistor substrate 620 and the substrate 623. Referring now to Figure 13, there is shown a color filter (CF) substrate 800 in accordance with another embodiment of the present invention. The CF substrate 800 is substantially similar to the CF substrate 100, with like elements being numbered similarly. During the manufacturing process of the color filter substrate 800, a black matrix | 850 is overlaid on a glass substrate, and a portion of the glass substrate is exposed to define a plurality of pixel regions or color filter regions, and a plurality of Opening 878. A plurality of color filters 860a, 860b, and 860c are disposed on the color filter region and the opening 878, and the glass substrate is exposed, thereby defining a plurality of the spacer sub-regions 852. When the negative photoresist is applied and developed, the light passes through the gap sub-region 852, and a portion of the negative photoresist is hardened, thereby forming a plurality of spacers 88. Furthermore, those skilled in the art will appreciate that the spacer 880 can correspond to the position of the thin film transistor of a thin film transistor substrate (not shown). Referring now to Figure 14, there is shown a color filter (CF) substrate 900 in accordance with another embodiment of the present invention. The CF substrate 900 is substantially similar to the CF substrate 1 , wherein like elements are numbered similarly. During the fabrication of the color filter substrate 9A, a black matrix 950 is overlaid on a glass substrate and a portion of the glass substrate is exposed to define a plurality of pixel regions or color filter regions. A plurality of color filters 960a, 960b, and 960c are disposed on the color filter region, and have a plurality of openings to expose the glass substrate, and the boundary is 24 1258619

15836twf.docA

A plurality of the gap sub-regions 952 are defined. After coating and developing the negative photoresist, the line will pass through the gap sub-area, and this part will be replaced by the number of side gaps. Furthermore, it is good to know that the gap 980 can correspond to the retention capacitor region 987 of the thin film transistor substrate, that is, the position of the auxiliary capacitor electrode, as shown by the strict line. As described above, the present invention is characterized in that a liquid crystal is used to display an existing pattern, such as a black matrix, a color filter, a metal line or a first metal (Metal One), or a data line or a second gold. ^ (Metal Two), defines the gap sub-area. Moreover, the patterns are opaque to the light exposed by the photoresist of the gap, so that the spacers can be exposed on the outer side of any of the substrates of the liquid crystal display and formed on the substrate. Thus, in the manufacturing process of the spacer according to the present invention, an additional mask is not required to expose the photoresist, and the spacer can be directly formed by the spacer region on the pattern. Further, the spacer of the present invention is not limited to use alone, and may be mixed with a conventional ball spacer or an adhesive spacer. Moreover, it will be apparent to those skilled in the art that the spacer of the present invention can be formed from an opaque material (e.g., a di-black resin) to avoid light leakage. In the present invention, a light-shielding pattern is formed on a CF substrate or an opaque film layer on a TFT substrate, and a spacer is formed in a back_exp〇sure process. It should be noted that, based on the technology disclosed in the above embodiments, the present invention can adjust the light corresponding to the opening position by designing the opening size defined by the light shielding pattern (ie, the gap sub-region described above). The depth of exposure is blocked, and the gaps of different heights can be formed at the same time (hybrid 25 1258619 15836twf.doc/y (4)". The design with different heights will help to improve the pressure resistance of the liquid crystal display panel. It is more conducive to increasing the operation interval of dropping liquid crystal into the liquid crystal. Please refer to Fig. 15 and Fig. 16, wherein Fig. 15 shows the relationship between the height of the convex structure of the different shapes and sizes of the light. Figure 16 is a schematic view showing the size of the opening defined by the different masks in Fig. 15. The horizontal coordinate shown in Fig. 15 is the opening size of the mask, and the vertical coordinate is the convex structure formed. The height of the figure, wherein the 15th figure lists the reticle openings of different shapes such as a shape, a rectangle, a square, and an octagon, and the size of the reticle opening of these shapes is indicated by the symbol s in Fig. 16. It is obvious from Fig. 15. It has been found that different heights of the protrusion structure can be formed corresponding to different opening sizes. In more detail, by the design of the mask opening ruler, the exposure depth of the corresponding photoresist can be controlled, and thus formed after development. The height of the raised structure may vary. In combination with the above-described techniques of back exposure and adjustment of the reticle opening, the present invention can simultaneously form raised structures of different heights in the liquid crystal display device as a spacer. (Hybrid spacer), the method for forming the convex structure of the same or different heights of the present invention will be exemplified hereinafter, and the contents of all the above embodiments can be incorporated into the following. 17A to 17D, which sequentially illustrate the manufacturing method of the raised ridge structure of the present invention. ^ First, as shown in Fig. 17A, a substrate 1 〇 1 〇 is provided, wherein the substrate 1010 is, for example, the color filter described above. a substrate or a thin film transistor array 26 1258619 15836 twf. doc / y column substrate, and the substrate 1010 has a corresponding one of the first surface 1012 and a second surface 1014. In addition, the first of the substrate 1010 The surface 1012 has a light shielding pattern 1020. The light shielding pattern 1020 is, for example, the black matrix, the color filter, the scan line or the first metal layer (Metal One), or the data line or the second metal layer (Metal Two). The plurality of openings 1022 are defined, and the opening 1022 is, for example, the gap sub-region described above.

Next, as shown in Fig. 17B, a photoresist 1030 is formed on the substrate 1010, which covers the light-shielding pattern 1〇2〇, and the photoresist 1〇3〇 is, for example, a negative photoresist. Then, as shown in Fig. 17C, the light-shielding pattern 1〇2〇 is used as a mask, and the photoresist 1〇3〇 is back-exposed by the side of the second surface 1014 of the substrate 1010. According to the relationship between the size of the opening of the reticle and the height of the convex structure according to FIG. 15, for example, a reticle design of one of the shapes may be selected, and the opaque pattern is designed corresponding to the relationship curve in FIG. = The shape and size of the opening 1G22. In the preferred embodiment, for example, the opening 1G22' can be opened and the exposure depth of the photoresist 1030 at the opening / 1022 can be adjusted by the size of the opening σ 1G22. Thereafter, as shown in Fig. 17D, the photoresist 1 〇 3 〇 is developed to correspond to the plurality of convex structures 1 〇 32 of the opening 1022. The convex depth formed by the reduction of the exposure depth is shown in Fig. 18, and the edge is shown as a protrusion of 27 1258619 15836twf.doc/y, which is a different height. The towel, the light-shielding pattern 1 (4) on the substrate has different first openings 1〇22a and second openings 1〇2沘, and by means of these openings, i〇22a and the second opening i〇22b, Steps of forming a photoresist, back exposure, and development are performed while forming a first bump structure 103a and a second bump 1032b having different heights. For example, the height difference between the first convex structure 32a and the second convex structure 1b32b is, for example, 111', and the first convex structure 1032a and the second convex structure '1 〇32b曰 is used as a spacer to form a liquid crystal display panel having hybrid spaces. Taking the structure of the liquid crystal display device disclosed in Figs. 5, 11 and 12 as an example, the 19th to 21st drawings respectively show the spacers having different heights. As shown in Fig. 19, the black matrix 150 on the color filter substrate 1 is used as a light-shielding pattern, wherein the black matrix 15 defines different sizes of the spacer sub-regions 152a and 152b for photoresist coating. After the steps of back exposure and development, spacers 18 〇 &amp; and 180 b of different heights are formed on the color filter substrate 100. In addition, as shown in Fig. 20, a color light-receiving sheet 56 is used as a masking and light pattern, wherein the color filter 560 defines gap sub-regions 552a and 552b of different sizes, and the color filter 560 is further For example, a light absorbing agent may be added to increase its light blocking effect. Similarly, after performing the steps of photoresist coating, back exposure and development, spacers 580a and 580b of different heights can be formed on the color filter substrate 5, wherein the description of other members and their fabrication methods is described. Please refer to the above embodiment, and the details are not repeated here. Further, as shown in Fig. 21, the thin film transistor substrate 62 is fabricated 28

1258619 15836twf.doc/y has a color filter 660 structure (stacked color filter, c〇1〇r on array, COA), wherein the color filter 660 disposed on the pixel electrode 628 can also be defined The gap sub-regions of different sizes are combined with 652b, so that gaps 68 and 68 of different heights can be formed. For the other components and the manufacturing method of the first embodiment, please refer to the description of the foregoing embodiments, and the details are not repeated here. Of course, except for the embodiments shown in the above 19th to 21st. In the present invention, the gap sub-regions of different sizes can be defined by the black matrix and the color filter at the same time. In addition, the spacers on the black matrix can correspond to, for example, the tft base, the thin film transistor, the scan line, and the f material. The portion such as the line, and the Pt between the % color filter and the optical sheet, for example, is applied to the auxiliary capacitor electrode on the TFT substrate, without affecting the aperture ratio of the liquid crystal display device. In other words, it is preferable. In an embodiment, the gap sub-system is located on a corresponding portion of the non-dynamic portion of the lcd device, the portion including the source bus line (scanning line), the gate bus line (data line), and the auxiliary on the tft substrate. Capacitor electrode, and thin film transistor. The technique for forming a convex structure of the present invention can be applied to a multi-domain vertical alignment (four) coffee 嶋匕 alignment 'MVA) liquid, in addition to a scorpion. In the case of the display device, the second opening 1132 can also be made at the location of the first opening 1122, for example, the size of the first opening 1122 is about 2 μm, and the size of the first opening 1132 is about 11 μm. The heights of the first raised structure 1142 and the second raised structure 1144 formed by the first raised structure 1142 and the second raised structure 1144 are, for example, a sum of (5) and 1·4 μηη, respectively, which have a height difference of about 2·6 μηι. Of course, it is necessary to form the height difference. The size of the opening can also be obtained, for example, by the relationship between the opening of the reticle and the height of the convex structure as exemplified in Fig. 15. The first convex structure 1142 having a height of (5) can be used as a spacer and the height is 14jLlm. The second raised structure 1144 can serve as an alignment protrusion. Referring to FIG. 23, the present invention can further retain a portion of the light shielding pattern 1150 in the second opening 1132 defined by the color filter 1130, for example, a color filter. The light sheet or the black matrix, and the light-shielding pattern 114G thus retained can control the exposure depth of the photoresist in the second opening m2 to adjust the height of the formed second convex structure (alignment protrusion). Is, as the second The black matrix 1120 described in FIG. 2 or 23 can also define openings of various sizes to form spacers of different heights, thereby providing a liquid crystal display device having both a mixed gap and an alignment protrusion. · Manufacture of _ sub- and alignment protrusions on a thin-film transistor substrate. Those skilled in the art should be able to easily refer to the above embodiments and descriptions, and therefore will not be described in detail, and the present invention has at least the following Features and Benefits: () The gap sub-system is placed directly on the glass substrate, and after being subjected to -pressure or force, the liquid crystal display is sufficiently restored and the cell gap can be kept consistent. (2) The exposure depth can be adjusted by the size of the opening on the shading pattern, 1258619 15836twf.doc/y to form a convex structure of different heights at the same time, which can be used as a gap or a directional protrusion, thereby helping to reduce the use of The number of masks and the number of processes, which in turn leads to production efficiency and lower production costs. A (3) The gaps of different heights help to further increase the production yield of the liquid crystal in the processing process of the liquid drop type (Drop Fill). Although the present invention has been described in the above preferred embodiments, it is not intended to limit the invention, and those skilled in the art can make some modifications and refinements without departing from the spirit and scope of the invention. The scope of the invention is defined by the scope of the appended claims. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view of a conventional LCD device having a spherical spacer. Figure 2 is a schematic cross-sectional view of a conventional lcd device having a protruding pattern spacer. Figure 3 is a diagram showing the spacer directly placed on a glass substrate and having a color filter layer interposed between the spacer and the glass substrate. Figure 4a is a plan view of a colored tear film substrate of one of the LCD devices in accordance with the present invention. Fig. 4b is a schematic cross-sectional view of the color filter and the optical sheet substrate along the section line 5b-5b of Fig. 5a. Fig. 4c is a schematic cross-sectional view of the color filter and the optical sheet substrate along the section line 5c-5c of Fig. 5a. 31 1258619 15836 twf.doc/y Fig. 5 is a partial cross-sectional view of an LCD device according to an embodiment of the present invention. 6 to 10 are schematic cross-sectional views showing a method of manufacturing a color filter substrate of an LCD device according to the present invention. Figure 11 is a cross-sectional view showing a portion of an LCD device in accordance with another embodiment of the present invention. Figure 12 is a cross-sectional view showing a portion of an LCD device in accordance with another embodiment of the present invention. Figure 13 shows a color filter substrate 800 in accordance with another embodiment of the present invention. Figure 14 shows a color filter (CF) substrate 9 根据 according to another embodiment of the present invention. &quot; Fig. 15 is a view showing the relationship between the reticle opening of different shapes and sizes corresponding to the height of the convex structure formed therein. Fig. 16 is a schematic view showing the opening size defined by the different masks in Fig. 15. The process of embossing the convex structure of the present invention is a substrate having a convex structure of different heights at the same time. ί 22 Ξ 示意图 示意图 示意图 不同 不同 不同 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图 示意图Lai. Another example - the color of the shirt 32 1258619 15836twf.doc / y [main symbol description]

30 TFT substrate 40 41 glass substrate 43 45 spacer 49 61 TFT substrate 69 71 color filter substrate 79 100 CF substrate 120 140 electrode layer 150 152 gap sub-region 152a gap sub-region 152b 160 color filter 160a 160b color filter Sheet 160c 170 alignment film 180 180a spacer 180b 182 negative photoresist 184 200 LCD device 210 liquid crystal material 212 220 TFT substrate 222 224 gate 225 226 auxiliary capacitance line 227 228 pixel electrode 229a 22% drain metal layer 233 234 alignment Film 500 CF substrate 520 CF substrate color filter layer liquid crystal material layer liquid crystal material spacer glass substrate black matrix gap sub-region color filter color filter spacer spacer ultraviolet light cavity glass substrate gate line semiconductor layer source Metal layer insulating film glass substrate of pole region 33 1258619 15836twf.doc/y

550 black matrix 552a gap sub-region 560 color filter 580a spacer 610 liquid crystal material 620 thin film transistor substrate 623 substrate 624 gate 629 source 652 gap sub-region 652a gap sub-region 660 color filter 680a spacer 700 LCD device 800 color filter substrate 852 gap sub-region 860b color filter 878 opening 900 color filter substrate 952 gap sub-region 960b color filter 980 spacer S photomask opening size 1010 substrate 552 gap sub-region 552b spacer Region 580 spacer 580b spacer 612 cavity 622 transparent substrate 628 pixel electrode 634 to film 652b gap sub-region 680 spacer 680b spacer 850 black matrix 860a color filter 860c color filter 880 spacer 950 black matrix 960a color Filter 960c Color Filter 987 Retention Capacitor Region 1012 First Surface 34 1258619 15836twf.doc/y 1014 Second Surface 1020 Shading Pattern 1022 Opening 1022a First Opening 1022b Second Opening 1030 Photoresist 1032 Raised Structure 1032a First Raised structure 1032b second raised structure 1120 black matrix 1 122 first opening 1132 second opening 1142 first convex structure 1144 second convex structure 1150 light shielding pattern 35

Claims (1)

1258619 15836twf.doc/y X. Patent Application Range: ΐ· A method for fabricating a raised structure, comprising: providing a color filter substrate or a thin film transistor array substrate, and a color slab substrate or the thin film transistor array The substrate has a light-shielding pattern, and the light-shielding pattern defines a plurality of openings; ..., the crystal color of the crystals is used to make the light of the film or the size of the main opening. _exposure depth; structure develops the photoresist to form a plurality of bumping methods corresponding to the openings, == =1, the fabrication of the raised structure /, T, the shading pattern comprises a black matrix. Method, Item 1 2: Protrusion method 'Second == There are 1: Two-bump structure fabrication method 7. Producer of the raised structure as described in claim 1 of the patent scope 36 1258619 15836twf.doc/y The method wherein the raised structures comprise spacers and/or alignment protrusions. 8. A liquid crystal display device comprising: a first substrate; a second substrate bonded to the first substrate to form a cavity, wherein the second substrate has a light shielding pattern, and the light shielding pattern Defining a plurality of first openings and a plurality of second openings of different sizes; a liquid crystal layer disposed in the cavity; φ a plurality of first protruding structures corresponding to the first openings of the light shielding patterns Positioned in the cavity; and a plurality of second protrusion structures corresponding to the second openings of the light shielding pattern and located in the cavity, wherein the first protrusion structure and The second raised structure has a different height. 9. The liquid crystal display device of claim 8, wherein the second substrate comprises a color filter and light substrate. 10. The liquid crystal display device of claim 9, wherein the light shielding pattern comprises a black matrix. The liquid crystal display device of claim 9, wherein the light shielding pattern comprises a color filter. 12. The liquid crystal display device of claim 11, wherein the color filter comprises a light absorbing agent. 13. The liquid crystal display device of claim 8, wherein the second substrate comprises a thin film transistor array substrate. 14. The liquid crystal display device of claim 13, wherein the light shielding pattern comprises a color filter. The liquid crystal I device device of claim 13, wherein the light shielding pattern comprises a first metal layer. The liquid crystal display device of claim 13, wherein the $Heiling pattern comprises a second metal layer. The liquid crystal display device of claim 8, wherein the first raised structures and the second raised structures are formed by photohardening. The liquid crystal display device of claim 8, wherein the light-shielding pattern has a light transmittance of less than 7.1%. The liquid crystal display device of claim 18, wherein the light-shielding pattern has an optimum light transmittance of less than 131 Å/〇. The liquid crystal display device of claim 8, wherein each of the first protruding structures or each of the second protruding structures is disposed corresponding to a thin film transistor. The liquid crystal display device of claim 8, wherein each of the first protrusion structures or each of the second bump electrodes is disposed on an auxiliary capacitor electrode. The liquid crystal display device of claim 8, wherein each of the first-protrusion turns or each of the second raised structures is disposed corresponding to a scan line. 23: The liquid day and day display device according to claim 4, wherein each of the first convex structures or the second convex structures is configured corresponding to a data line. A manufacturing method of a liquid crystal display device, comprising: 38 1258619 15836t wf. doc/y providing a first substrate and a second substrate, wherein the second base pattern defines a plurality of different sizes, the second Applying a photoresist on the substrate; using the light-shielding pattern as a mask, and exposing from the second substrate m, wherein the photoresist at the first opening::: the photoresist has different exposure depths; And the first photoresist development, forming a plurality of (four) corresponding to the first openings, the germanium structure and a plurality of second bumps corresponding to the second openings. The first protruding structure and the second protruding structure are different. The method of the liquid crystal display device of claim 24, further comprising: combining the first substrate and the second substrate Forming a cavity; and 'lumber filling a liquid crystal material into the cavity. The method of claim 1, wherein the liquid crystal material is dropped onto the first substrate or the second substrate; and the first substrate is combined with the second substrate to The liquid crystal material e is sealed between the _-substrate and the second substrate. The liquid crystal display device described in claim 24, wherein the light shielding pattern comprises a black matrix. A manufacturing method of a liquid crystal display device according to claim 24, wherein the light shielding pattern comprises a color filter. The method of manufacturing a liquid crystal display device according to claim 24, wherein the light shielding pattern comprises a first metal layer. The method of manufacturing a liquid crystal display device according to claim 24, wherein the light shielding pattern comprises a second metal layer. σ, 31· a color filter substrate, comprising: a transparent substrate; a plurality of color light-emitting sheets are disposed in the pixel region; and a plurality of first-convex structures are disposed corresponding to the first openings on the transparent substrate; The slabs have different heights, and the color filter substrates of the above-mentioned smear structures include the spacers. 33. The color slab substrate according to claim 31, further comprising a aligning film affixed on the flip substrate and covering the black matrix, the color grading sheets, and the raised structures . The color (four) substrate according to claim 31 of the patent application, further comprising a common electrode disposed on the flip substrate and covering the 1258619 15836 twf.doc/y black matrix and the color filters. 35. The color filter substrate of claim 31, wherein the color light guide sheets have a plurality of third openings, and the color filter substrate further comprises a majority (four) three convex structure, which rides The third openings are disposed on the transparent substrate. The color illuminator substrate of claim 35, wherein the third protrusions and structures comprise alignment protrusions. 37. A method for fabricating a color light substrate, comprising: providing a transparent substrate; forming a black matrix on the transparent substrate to define a plurality of first openings, a plurality of second openings, and recording pixel regions, The second openings have different sizes, and the first openings 第二 2 the second openings expose portions of the transparent substrate; forming a plurality of color filters in the pixel regions; Applying a photoresist on the substrate; the black matrix and the color light-passing sheets are masks, and the transparent: the other side of the board is f-directed to the photoresist, wherein the first openings are = the resistance and the second opening of the second opening π have different exposure depths, and the flute-track development '(four) depends on the majority of the m-portion, Gan I, and corresponding to the second opening The height of the majority of the second protrusions of π ^. The method of manufacturing the first and second convex structures of the color secret film substrate of claim 37, wherein the first convex portions are The structure and the second raised structures include a spacer. 39. The method for fabricating a color slab substrate according to claim 37, wherein after forming the first protrusion structure and the second protrusion structures, the towel further comprises covering an alignment film a black matrix, the color filters, the first protrusion structures and the second protrusion structures. 40. The method for fabricating a color filter substrate according to claim 37, wherein before coating the photoresist on the transparent substrate, further comprising covering a common electrode to the black matrix and the color filters Chip. 41. The method of fabricating a color filter substrate according to claim 37, wherein the color light-emitting sheets have a plurality of third openings, and after the photoresist is subjected to back exposure and development, A plurality of third protruding structures are formed at the third openings. 42. The method according to claim 41, wherein the third raised structures comprise alignment protrusions. 43. A color filter substrate comprising: a transparent substrate; a first-black matrix 'disposed on the transparent substrate, and exposing a portion of the Qianming substrate 'called 四 (4) first calling and recording a pixel area; a plurality of color filters are disposed in the pixel area, wherein the color light film has a plurality of second openings, and the first openings and the openings have different sizes; a first protruding structure corresponding to the plurality of first transparent structures on the transparent substrate; and ~ 42 1258619 15836 twf.doc/y, corresponding to the second openings, and configured with Γ Ϊ Ϊ ΐ ΐ The first raised structures have different degrees from the second raised structures. The color filter substrate of item 43, wherein the first raised structures comprise a spacer. Applying for the color filter substrate of the 43rd, wherein the "protruding structure includes a _ sub or a aligning protrusion. The color filter substrate according to the second item, and the aligning film, The color filter substrate is further disposed on the transparent substrate, and covers the black matrix, the color filters, and the raised structures. Forming an electrode, such as a substrate, covering the black matrix and the color filters. 48. According to the patent, the color (four) light substrate according to the fourth item of the patent brain, wherein the color filters The sheet further has a plurality of third openings, and the color light sheet substrate further includes a plurality of third protruding structures disposed on the transparent substrate, and is disposed on the transparent substrate. The color illuminator substrate of claim 48, wherein the third protrusion structures comprise a spacer or an alignment protrusion. 50. A method for fabricating a color filter substrate, comprising: providing a transparent substrate; a black matrix is formed on the transparent substrate to define a plurality of Opening a plurality of pixel regions 'and the first substrate of the first σ-exposed portion; 43 1258619 15836 twf.doc/y, wherein the plurality of color louvers are formed in the pixel regions, and have a plurality of first openings Π And exposing a portion of the transparent substrate, wherein the first openings and the second openings have different sizes; coating a photoresist on the transparent substrate; and the matrix of the pads and the color filters are masks And the photoresist is back-exposed by the other side of the transparent substrate, wherein the first openings c wide green, some of the contact material _ exposure deep develops the photoresist 'and forms corresponding to the two convex = and corresponding to the second open: two second raised 'high i wide wide first convex The structure and the second raised structures have ϋ/the first raised structures of the color substrate substrate described in item 5G of the fourth aspect, including the spacers. f The 3 Γ second raised structure of the pure filter substrate described in item 5G includes a spacer or an alignment protrusion. f is the method of the color-sheet substrate of the 5G item, wherein the cover-alignment film is on the black matrix, and the color cores 54 are as claimed in the patented structure. The manufacturing method is as follows: coating on the transparent substrate; = filtering; sheet covering two = circumference r - claiming patent _ 50 item of the color-cut county substrate 44 1258619 15836 twf. doc / y production method, the towel A plurality of third openings are formed in the color filters #, and after the photoresist is subjected to back exposure and development, a plurality of third protrusion structures are formed at the third openings. The method of fabricating the color filter substrate of claim 55, wherein the third raised structures comprise spacers or alignment protrusions. a color filter substrate comprising: a transparent substrate; a black matrix disposed on the transparent substrate and exposing a portion of the transparent substrate to define a plurality of pixel regions; and a plurality of color filters disposed in the pixel region, wherein the color light The sheet has a plurality of first openings and a plurality of second openings, and the openings of the other brothers have different sizes from the second openings; the plurality of first-convex structures corresponding to the first openings are matched with And on the transparent substrate; and the first plurality of 々 趄 趄 、 、 、 、 、 、 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应 对应The structure has different heights. And the color filter according to item 57 of the patent scope is the substrate, and the second protrusion structure includes a gap or an alignment protrusion. The color filter, optical sheet substrate, and the medium red convex structure described in item 57 of the patent scope include a spacer or an alignment protrusion. The color filter substrate of the 57th item of the patent (4), the land-alignment film, is disposed on the transparent substrate, and covers the black car, the color light-emitting sheets, and the convex portions. Structure. 45 1258619 15836twf.doc/y 61 The color filter substrate of claim 57, further comprising an electrode, which is covered by the gamma tree plate and covers the black matrix and the color filters, Light film. 62. A method for fabricating a color filter substrate, comprising: providing a transparent substrate; forming a black matrix on the transparent plate to define a plurality of pixel regions, wherein a plurality of color light films are formed in the pixel region, a plurality of second opening 'to expose the portion of the transparent substrate 'the first opening has a different size from the second openings α; coating a photoresist on the transparent substrate; 3 black array and the color light curtains are curtains, and the transparent photoresist is used for back exposure, wherein the first opening and the opening of the photoresist have different exposure deep structures, ί, 中= a plurality of second protrusions of the second opening, the same height of the protrusion structure and the second structure of the wire have a color filter substrate not described in item 62. The structure includes a spacer or an alignment protrusion. The manufacturing method, wherein the color-sheet substrate is 65. The structure of the structure includes a spacer or an alignment protrusion. It is a method for manufacturing a color (four) light substrate according to the above-mentioned (4) light-emitting substrate, wherein the forming of the first convex structure and the second convex structures further comprises covering an alignment film. And the black matrix, the color filters, the first protrusion structures and the second protrusion structures. The method for fabricating a color filter substrate according to claim 62, wherein before coating the photoresist on the transparent substrate, further comprising covering a common electrode on the black matrix and the color filters Chip. 47