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TWI227585B - Resonant cavity component array applicable on wavelength division multiplexing (WDM) and method for producing the same - Google Patents

Resonant cavity component array applicable on wavelength division multiplexing (WDM) and method for producing the same Download PDF

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TWI227585B
TWI227585B TW091136182A TW91136182A TWI227585B TW I227585 B TWI227585 B TW I227585B TW 091136182 A TW091136182 A TW 091136182A TW 91136182 A TW91136182 A TW 91136182A TW I227585 B TWI227585 B TW I227585B
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oxidation
resonant cavity
adjustment layer
wavelength
cavity
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TW091136182A
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TW200410467A (en
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Jyh-Shyang Wang
Yi-Tsuo Wu
Nikolai A Maleev
Alexey V Sakharov
Alexey R Kovsh
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Ind Tech Res Inst
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    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00Nanooptics, e.g. quantum optics or photonic crystals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18308Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
    • H01S5/18311Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
    • H01S5/18313Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation by oxidizing at least one of the DBR layers
    • HELECTRICITY
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    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18361Structure of the reflectors, e.g. hybrid mirrors
    • H01S5/18369Structure of the reflectors, e.g. hybrid mirrors based on dielectric materials
    • H01S5/18372Structure of the reflectors, e.g. hybrid mirrors based on dielectric materials by native oxidation
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    • H01S5/00Semiconductor lasers
    • H01S5/40Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/42Arrays of surface emitting lasers
    • H01S5/423Arrays of surface emitting lasers having a vertical cavity
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
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    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18308Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
    • H01S5/18311Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18308Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
    • H01S5/18322Position of the structure
    • H01S5/1833Position of the structure with more than one structure
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    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • H01S5/34Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
    • H01S5/343Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/34313Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer having only As as V-compound, e.g. AlGaAs, InGaAs
    • H01S5/3432Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser with a well layer having only As as V-compound, e.g. AlGaAs, InGaAs the whole junction comprising only (AI)GaAs
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/40Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/4025Array arrangements, e.g. constituted by discrete laser diodes or laser bar
    • H01S5/4087Array arrangements, e.g. constituted by discrete laser diodes or laser bar emitting more than one wavelength

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
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  • Life Sciences & Earth Sciences (AREA)
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  • Crystallography & Structural Chemistry (AREA)
  • Semiconductor Lasers (AREA)

Abstract

The present invention relates to a resonant cavity component array applicable on wavelength division multiplexing (WDM) and a method for producing the same. A selective oxidation structure is formed in an epitaxial structure of a resonant cavity component, and comprises more than one AlxGa1-xAs oxidation adjustment layer. The wavelength of the wave emitted by a resonant cavity component is altered and controlled by using the properties that the reflective index and the thickness of a film will be altered when AlGaAs is oxidized into AlGaO. The amount of change of the wavelength for a resonant cavity component is determined by the number of layers, the thickness, and the composition of the AlxGa1-xAs oxidation adjustment layers contained in the selective oxidation structure.

Description

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【發明所屬之技術領域】 本發明{關於-種共振月空元件 是關於一種應用於多工分你夕Α>二衣每方法,知別 法。 刀波之共振腔兀件陣列及其製造方 【先前技術】 隨著網際網路的盛行和多 求也日益迫切,光通訊技術將 要而關鍵的角色。其中,分波 Division Multiplexing, WDM 傳輸容量的最佳方式。其藉由 纖’不同資料訊號以相對應但 工為轉換成單一光纖之光束, 單一光纖上,進而提昇光纖頻 以一個完整的高密度分波多工 接收模組、波長多工器/解多 長擷取多工器、色散補償裝置 他光通訊元件、處理電路以及 而’其中需包含多波長的光發 困難而且成本昂貴;而由於垂 具有共振波長改變容易且與光 腔元件陣列來作為分波多工系 很好的解決方案;.但如何在單 共振腔仍有相當的難度。 如美國第6 1 7 4 7 4 9號專利^ 媒體的普及,對網路頻寬的需 在未來之資訊傳輪上扮演著重 多工系統(Wavelength )是增加光纖通訊頻寬與提高 若干不同波長來分享單一光 不同之光波長傳輸,經分波多 可將不同來源之資料封包置於 旯之傳輸效益。 系統而言,它包含了光發射/ 工器、·光纖放大器(EDFA)、波 、滤波器、光開關路由器及其 架構光學系統的機構等。然 射/接收模組在製作上相當的 直共振腔元件(vertical RCD) 纖麵合效率高的特性,以共振 統的光發射/接收模組即成為 一基板製作出多個不同波長之 6先於基板上形成磊晶的圖案[Technical field to which the invention belongs] The present invention {about-a kind of resonant moon-sky element is about a method applied to multiplexing A > Eryi every method, knowing different methods. Resonant Cavity Element Array of Knife Wave and Its Manufacture [Previous Technology] With the prevalence and demand of the Internet, the optical communication technology will play a key role. Among them, the best way of WDM transmission capacity. It uses fiber's different data signals to convert the corresponding beam into a single optical fiber, which is then converted to a single optical fiber, and then the optical fiber frequency is increased. A complete high-density demultiplexing multiplexing receiving module, wavelength multiplexer, and solution length are used. Extraction multiplexer, dispersion compensation device, other optical communication components, processing circuits, and the need to include multi-wavelength light transmission are difficult and expensive; and because the resonance wavelength is easy to change, and it is used as an array of optical cavity elements, The engineering department has a good solution; but how to use it in a single cavity is still quite difficult. For example, the US patent No. 6 1 7 4 7 4 9 ^ The popularity of the media, the need for network bandwidth will play a heavy multiplexing system (Wavelength) in the future information transmission wheel is to increase the optical fiber communication bandwidth and increase several different wavelengths To share a single light with different light wavelength transmission, data packets from different sources can be placed in the transmission efficiency of 旯 through multi-wave division. As far as the system is concerned, it includes optical transmitters / engineers, fiber amplifiers (EDFAs), waves, filters, optical switch routers, and the mechanisms that construct their optical systems. However, the transmitting / receiving module is equivalent to the vertical RCD, which has a high fiber surface combining efficiency. With the light transmission / receiving module of the resonance system, it becomes a substrate to produce six different wavelengths. Form an epitaxial pattern on the substrate

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五、發明說明(2) (pattern) ’然後控制其各個區域 個共振腔,來達到多波長的效果 曰曰長二率而形成多 當困難,且通常於基板圖案上“的;於=上:: 吴國第6 1 1 7 6 9 Θ號專利,其原理是於浐 ^(DlSt;lbuted Reflector; DBR)^^ :出:同的共振腔厚度,然後利用再成長( ;頂 :,布拉格反射鏡,以形成不同波長之共振腔, 刻的珠度無法精準控制因此亦很難控制。 ' 【發明内容】 八為解決習知技術的問題,本發明係提供一種應用於多工 为波之共振腔元件陣歹彳及里^ t , ; r Λ ! P A W/V ^ 卞汉/、衣k方法。精由砷化鋁鎵 a S);乳化之後會形成氧化鋁鎵(AlGaO)而改變盆折射 率與厚度,於是利用元件盥f裎讯呼决、竖摆^ΑΑ^艾其折射 元件陳列Φ少;^ / 又汁來返擇性的氧化共振腔 兀件陣歹】中之砷化鋁鎵(A1GaAs) 一 化侷限型共振腔元件的波長。 改又與控制乳 本發明係猎由在北搞阶;1 石 化結構,其包含一個以f牛之“結構中形成選擇性氧 声 ;:二:以上之石申化銘鎵(AlxGai_xAs)氧化調整 i中的_ 1 is ϊ ^ Ϊ部分該神化1呂鎵(AlxGVxAs)氧化調整 砷化鋁鎵(Α1Γ Α ί之後形成氧化鋁鎵(MGa0),以改變 Χ \-Χ S )氧化調整層之部分區域的折射率盥厚 度,並由於每一丘te脱;从,L丄 / T /、/于 層的選擇性氧化程p n石化銘鎵AlxGaHAS)氧化調整 件的丘> ϋ #又不同,因而能夠逐一改變每個共振腔元 2振波長進而達到多波長的目的。其中 ,/、振k 7L件建立不同尺寸的上方平台結構,每V. Description of the invention (2) (pattern) 'Then control the resonant cavities in each area to achieve the multi-wavelength effect. It is difficult to form a second rate and is usually on the substrate pattern. : Wu Guo Patent No. 6 1 1 7 6 9 Θ, the principle of which is Yu D (DlSt; lbuted Reflector; DBR) ^^: Out: the same thickness of the cavity, and then use the growth (;;: Bragg reflection) Mirrors to form resonant cavities of different wavelengths, and the engraved sphericity cannot be accurately controlled and therefore difficult to control. '[Summary of the Invention] In order to solve the problems of the conventional technology, the present invention provides a resonance applied to multiplexed waves Cavity element array and ^ t,; r Λ! PAW / V ^ 卞 Han /, clothing k method. Fine from aluminum gallium arsenide a S); after the emulsification will form aluminum gallium (AlGaO) to change the pot refraction Rate and thickness, so the use of components to determine the signal, vertical pendulum ^ ΑΑ ^ 艾 其 refracting element display Φ less; ^ / and the alternative oxidative resonance cavity element array] [] (A1GaAs) Limits the wavelength of the resonant cavity element. It is also related to the control of the present invention. Engage in order; 1 petrochemical structure, which contains a selective oxygen sound in the structure of "Fox"; 2: the above-mentioned Shi Shenhua indium gallium (AlxGai_xAs) oxidation adjustment i in _ 1 is ϊ ^ Ϊ part of the deification 1 Lu The gallium (AlxGVxAs) oxidation adjusts the aluminum gallium arsenide (Α1Γ Α ί) to form aluminum gallium oxide (MGa0), so as to change the refractive index thickness of a part of the χ \-× S oxidization adjustment layer. From the selective oxidation range of L 丄 / T /, // layers, the tuners of the oxidizing regulators of the gallium oxide AlxGaHAS) ϋ # are different, so it is possible to change the 2 wavelengths of each resonant cavity one by one to achieve multiple The purpose of the wavelength. Among them, /, vibrating k 7L pieces establish upper platform structures of different sizes, each

第7頁 1227585 五、發明說明(3) =上方平台結構係含有一層以上之砷化鋁鎵(AlxGaHAs)氧化 调整層。同時,每一共振腔元件的波長改變量係由選擇性氧 化結構所含之砷化鋁鎵(AlxGai_xAs)氧化調整層的層數、厚度 與組成來決定。 為使對本發明的目的、構造特徵及其功能有進一步的了 解’茲配合圖示詳細說明如下: 【實施方式】 制本叙明所揭露之應用於多工分波之共振腔元件陣列及其 製造方法,係藉由結構和實驗設計來決定每一共振腔元件的 波長。以面射型雷射(vertical—cavity surface emiuing \aser,VCSEL)元件陣列為實施例來進一步說明本發明,請 麥考第1圖,其為三種波長元件之陣列結構示意圖。其中, 三種不同波長的元件係建立於砷化鎵(GaAs)基板丨丨上,並且 各由上中下三部分之平台(mesa)所組成。其中各元件之下方 平台結構10與中間平台結構2〇皆相同,其下方平台結構1〇係 由下而上依序於砷化鎵基板丨丨堆疊底部布拉格反射鏡 12(bottom DBR)和底部接觸層 13(b〇tt〇m c〇ntacted )。 然後,承接之中間平台結構2〇係為以對稱之電流侷限砷 化鋁鎵(Al^Ga^As)氧化層22夾著發光層23、24的三明治 …構其由下而上之結構係依序堆疊底部接觸層2 1、電流侷 限神化銘鎵UlQ.98GaQ.Q2As)氧化層22、、發光層23、24和電 流侷限砷化鋁鎵(Al。98GaQ Q2As)氧化層22(current confinement),最後再覆蓋頂部接觸層21(丨叩 contacted)。各元件之浊县罢显总小甘,丄 ^ 丁 <I长呈異係由其上方平台結構3 〇所決Page 7 1227585 V. Description of the invention (3) = The upper platform structure contains more than one layer of aluminum gallium arsenide (AlxGaHAs) oxidation adjustment layer. At the same time, the amount of change in the wavelength of each cavity element is determined by the number, thickness and composition of the AlxGai_xAs oxidation adjustment layers contained in the selective oxidation structure. In order to further understand the purpose, structural features, and functions of the present invention, the drawings are described in detail as follows: [Embodiment] The resonator cavity element array applied to multiplexed partial wave and its manufacturing method disclosed in the manufacturing statement The wavelength of each cavity element is determined by the structure and experimental design. A surface-emitting laser (vertical-cavity surface emiuing \ aser, VCSEL) element array is used as an example to further illustrate the present invention. Please refer to Fig. 1 for a schematic view of an array structure of three wavelength elements. Among them, three kinds of elements with different wavelengths are built on a gallium arsenide (GaAs) substrate, and each is composed of a platform (mesa) of three parts: upper, middle, and lower. The lower platform structure 10 of each element is the same as the intermediate platform structure 20, and the lower platform structure 10 is sequentially from the bottom to the top of the gallium arsenide substrate 丨 the bottom bottom Bragg reflector 12 (bottom DBR) and the bottom contact Layer 13 (bottommcntacted). Then, the intermediate platform structure 20 to be accepted is a sandwich sandwiching the light emitting layers 23 and 24 with a symmetrical current limiting aluminum gallium arsenide (Al ^ Ga ^ As) oxide layer 22. The structure from bottom to top is structured according to Sequentially stacking the bottom contact layer 2 1. Current-limiting deuterium gallium UlQ.98GaQ.Q2As) oxide layer 22, light-emitting layers 23, 24 and current-limiting aluminum gallium arsenide (Al.98GaQ Q2As) oxide layer 22 (current confinement), Finally, the top contact layer 21 is covered again. The total count of the components in Zhuoxian County is shown, and the difference between the length and the length is determined by the platform structure above it.

1227585 五 發明說明(5) 米’其第一調整層3 2和第二調整層3 3對應於中間平台的電流 侷限孔徑的部分則仍未被氧化,而維持原厚度並提供一第一 波長11。而第二面射型雷射2〇〇上方平台結構3〇的直徑為30 微米’其第一調整層3 2對應於中間平台的電流侷限孔徑的部 分則仍未被氧化;而第二調整層3 3則完全氧化,其整體折射 率與厚度產生部分變化並提供一第二波長12。第三面射型雷 射3 0 0上方平台結構的30直徑為2〇微米,因此,其第一調整 層3 2和第二調整層3 3對應於中間平台的電流侷限孔徑的部分 則^全被氧化,整體折射率與厚度亦產生更大變化,而提供 一第三波長1 3。即利用選擇性的氧化方法於一次製程中製作 出具有不同波長的元件。 由於本發明之各調整層的氧化程度可以準確的控制,故氧化 ^程誤差容許度大且穩定性高;而且各元件間的波長改變量 ^ ^氧化前調整層的厚度與組成來決定,而厚度與組成可由 磊晶成長來精確控制,故波長控制相當精準。例如,四分之 :波長(1/4叉)厚的調整層‘氧化後其波長改變為8nm,則十六 分之一波長(1/16 λ)厚的調整層其波長改變就為2nm。而利 用不同的調整層組合,即可製作出多種波長元件。 =更^步解釋其波長的組態數目與調整層的關係,係 為土板衣作五個共振腔兀件,其上方平台結構之尺寸分別 ί被米、10微米、20微米、30微米和40微米,同時,各具 有四調整層(Layerl〜Layer4),其氧化° 每小時5微米、每小時10微米和每小時ι5ς二母=^敗米、 振腔元件於氧化一小時後不同尺寸的上方平台結表構中為其^整1227585 Five invention descriptions (5) m 'The first adjustment layer 3 2 and the second adjustment layer 3 3 corresponding to the current-limited aperture of the intermediate platform have not been oxidized, and the original thickness is maintained and a first wavelength 11 is provided. . The diameter of the second surface-emitting laser 200 above the platform structure 30 is 30 microns, and the portion of the first adjustment layer 32 corresponding to the current-limited aperture of the intermediate platform has not been oxidized; and the second adjustment layer 3 3 is completely oxidized, and its overall refractive index and thickness are partially changed, and a second wavelength 12 is provided. The 30 diameter of the platform structure above the third surface-emitting laser 300 is 20 micrometers. Therefore, the portions of the first adjustment layer 32 and the second adjustment layer 33 corresponding to the current-limited aperture of the intermediate platform are full. Being oxidized, the overall refractive index and thickness also change more, and a third wavelength 13 is provided. That is, the selective oxidation method is used to produce devices with different wavelengths in one process. Since the oxidation degree of each adjustment layer of the present invention can be accurately controlled, the tolerance of the oxidation process error is large and the stability is high; and the amount of wavelength change between each element is determined by the thickness and composition of the adjustment layer before oxidation, and The thickness and composition can be precisely controlled by epitaxial growth, so the wavelength control is quite accurate. For example, a quarter-wavelength (1 / 4-fork) -thickness adjustment layer changes its wavelength to 8 nm after oxidation, and a sixteenth-wavelength (1/16 λ) -thickness adjustment layer has a wavelength change of 2 nm. By using different combinations of adjustment layers, multiple wavelength elements can be fabricated. = To further explain the relationship between the number of configuration wavelengths and the adjustment layer, the system is made of five resonant cavity elements for the slab coat, and the dimensions of the platform structure above it are covered by meters, 10 microns, 20 microns, 30 microns, and 40 micrometers, each with four adjustment layers (Layerl ~ Layer4), its oxidation ° 5 micrometers per hour, 10 micrometers per hour and 5 micrometers per hour = 2 meters, vibrating element of different sizes after one hour of oxidation It is integrated in the structure of the upper platform

1227585 五、 層 表 " —-----^__ 的氧化情況。 上方平台結構 (μπι) _ 401227585 Five, the layer table " —----- ^ __ oxidation. Upper platform structure (μπι) _ 40

Layerl (15 μιη/hr) '~No Yes Yes '~~Yes '~Y^sLayerl (15 μιη / hr) '~ No Yes Yes' ~~ Yes' ~ Y ^ s

Layer2 (10 μηι/hr) No No Yes YesLayer2 (10 μηι / hr) No No Yes Yes

Layers ^ Mjl/hr) N〇^~Layers ^ Mjl / hr) N〇 ^ ~

Y^TY ^ T

Layer4 (2 um/hr) No ~~~' No No~. ~Layer4 (2 um / hr) No ~~~ 'No No ~. ~

長,2表一所示,每一種尺寸的上方平台結構可得一種波 ς而總組態數為調整層數加一,(即NUNtH,其中Nt 鐵二數、’ N1為波長組態數)。此外,此種厚度的改變不僅改 =二振波長,同時也會改變共振腔内之駐波的光場分佈,禾 特性可將不同波長之發光層長在不同波長的光場強度最 ^ 可同時對不同波長的元件做最佳化的設計。 本發明可包含各種應用於多工分波之共振腔元件陣列, 如共振腔债測器(resonant cavity photodetector, RCPD)面射型雷射(Vertical-cavity surface emitting laser,VCSEL)和共振腔發光二極體(resonant cavity light emitting &〇&,RCLED)等。As shown in Table 1, each type of the upper platform structure can obtain a wave, and the total configuration number is the number of adjustment layers plus one, (ie NUNtH, where Nt iron is two, and N1 is the number of wavelength configurations) . In addition, such a change in thickness not only changes the two-wavelength, but also changes the light field distribution of the standing wave in the resonant cavity. The characteristics can maximize the light field intensity of the light-emitting layers of different wavelengths at different wavelengths. Optimized design for components with different wavelengths. The present invention may include various resonant cavity element arrays applied to multiplexed division waves, such as a resonant cavity photodetector (RCPD) vertical-cavity surface emitting laser (VCSEL) and a resonant cavity light emitting diode. Body (resonant cavity light emitting & 0 &, RCLED) and the like.

由於本發明係採用選擇性的氧化方法,不僅波長控制精 準且對於氧化製程誤差容許度大,同時矸在單一次製程中製 作出特性好、成本低之多波長的共振腔元件。 雖然本發明之較佳實施例揭露如上所述,然其並非用以 限定本發明,任何熟習相關技藝者,在不脫離本發明之精神Since the present invention adopts a selective oxidation method, not only the wavelength control is precise, but the tolerance for the oxidation process is large. At the same time, a multi-wavelength resonant cavity element with good characteristics and low cost is produced in a single process. Although the preferred embodiment of the present invention is disclosed as described above, it is not intended to limit the present invention. Any person skilled in the relevant arts will not depart from the spirit of the present invention.

第11頁 1227585Page 11 1227585

第12頁 1227585 圖式簡單說明 第1圖為三種波長元件之陣列結構示意圖。 【圖 式符號說明】 10 下方平台結構 11 神化鎵基板 12 底部布拉格反射鏡 13 底部接觸層 20 中間平台結構 21 接觸層 22 電流彳局限珅化銘蘇氧化層 23 發光層 24 發光層 30 上方平台結構 31 接觸層 32 第一調整層 33 第二調整層 100 第一面射型雷 射 200 第二面射型雷 射 300 第三面射型雷 射Page 12 1227585 Brief Description of Drawings Figure 1 is a schematic diagram of the array structure of three wavelength elements. [Illustration of Symbols] 10 Lower platform structure 11 Deified gallium substrate 12 Bottom Bragg reflector 13 Bottom contact layer 20 Intermediate platform structure 21 Contact layer 22 Current limitation Limitation Su Ming oxide layer 23 Luminous layer 24 Luminous layer 30 Upper platform structure 31 Contact layer 32 First adjustment layer 33 Second adjustment layer 100 First surface-emitting laser 200 Second surface-emitting laser 300 Third surface-emitting laser

第13頁Page 13

Claims (1)

1227585 六、申請專利範圍 1. 一種應用於多工分波之共振腔元件陣列,係於— 立具有不同波長之複數個氧化褐限型共振腔元件U =在於二該氧化侷限型共振腔元件之磊晶結構中含有一 廷擇性氧化結構,該選擇性氧化結構係包含一個以 砷化鋁鎵(AlxGal-xAs)氧化調整層,係於氧化萝程中使 ^之後形成氧化鋁鎵(A1G a 0),以改變砷化鋁鎵 (AlxGVxAs)氧化調整層之部分區域的折射率盥厚产,並 A'於每一該氧化侷‘限型共振腔元件的石申化銘鎵⑴rGa" 化调整層的選擇性氧化程度不同,因而改變每一 Γ ^化侷限型共振腔元件的共振波長進而達到多波長的 目的。 2. 專利範圍第1項所述之應用於多工分波之共振腔 ::列,其中該選擇性氧化結構係為於每一該氧化侷 方'平2 f腔兀件建立不同尺寸的一上方平台結構,該上 化hi構係含有—層以上之該石申化銘鎵⑷如»氧 3· =利範圍第1項所述之應用於h分波之共振腔 俜由兮挥其中該氧化侷限型共振腔元件的波長改變量 之該坤化 _1一 4如由铁;的層數厚度與組成來決定。 •元# ^ π利範圍第1項所述之應用於多工分波之共振腔 兀件陣列,其中該基板係為—石申化鎵基板。1227585 VI. Scope of patent application 1. An array of resonant cavity elements applied to multiplexed sub-waves. It is based on-a plurality of oxidized brown-limited resonator elements with different wavelengths. The crystal structure contains a selective oxidation structure. The selective oxidation structure includes an AlxGal-xAs oxidation adjustment layer, which is formed in the oxidation process to form aluminum gallium oxide (A1G a 0 ) To change the refractive index of a part of the AlxGVxAs oxidation adjustment layer, and to select the appropriate adjustment layer for each of the oxidized local cavity elements. The degree of sexual oxidation is different, so the resonance wavelength of each Γ ^^ confined cavity element is changed to achieve the purpose of multi-wavelength. 2. Resonant cavity applied to multiplexed division wave :: column as described in item 1 of the patent scope, wherein the selective oxidation structure is to create a top of different size for each of the oxidation flat 'flat 2 f cavity elements. The platform structure, the Shanghua hi system contains-above the layer of the Shishenhua Ming gallium, as described in the "oxygen 3 · = range of the first range of the resonance cavity applied to the h-wave," and the oxidation limitation type The amount of change in the wavelength of the resonant cavity element is determined by the thickness and composition of the layer, such as iron; • Yuan # ^ π The range of resonant cavity element arrays applied to multiplexed sub-waves as described in item 1, wherein the substrate is a Shishenhua gallium substrate. 第14頁 1227585 六、申請專利範圍 5 ·〆雜應用於多工分波之共振腔元件陣列的製造方法,其 步驟包含有: 提供一基板; 於該基板表面形成複數個氧化侷限型共振腔元件, 每一該氧化侷限型共振腔元件之磊晶結構中含有一選擇 性氧化結構,該選擇性氧化結構係包含一個以上之砷化 銘鍊(AlxGapxAs)氧化調整層; 氧化邊氧化侷限型共振腔元件,使部分該砷化鋁鎵 (A lxGa^xAs)氧化調整層中的砷化鋁鎵於氧化之後形成氧 =鋁鎵(AlGaO),以改變砷化鋁鎵(AixGaHAs)氧化調整 層之部分區域的折射率與厚度,並由於每—該氧化侷限 ^共振腔兀件之坤化銘鎵(ΑΙΑ—xAs)氧化調整層的選擇 : =度不同,以改變每一該氧化侷限型共振腔元件 fi I由=長,开^應用於多工分波之共振腔元件陣列。 = 第5項所述之應用於多工分波之共振腔 、十、夕虛田白、衣造方& ’其中該如申請專利範圍第1項所 :::構?為於每一該氧化偏限型共振腔= :寸:上方平台結構,該上方平台結構係含Ϊ一戶以 上之该砷化鋁鎵(AlxGai—xAs)氧化調整声。 曰 7·如申請專利範圍第5項所述之應/ 元件陣列的製造方法,其中、夕工^刀波之共振腔 波長改變量係由該選擇性氧的 ⑴如—山)氧化調整層的層數、厚度與組成來決=豕Page 141227585 6. Application patent scope 5 · A manufacturing method of a hybrid cavity element array applied to multiplexed sub-waves, the steps include: providing a substrate; forming a plurality of oxidation-limited resonant cavity elements on the substrate surface, The epitaxial structure of each of the oxidized confined cavity elements contains a selective oxidation structure, the selective oxidized structure includes more than one AlxGapxAs oxidation adjustment layer; oxidized edge oxidized confined cavity elements To make part of the aluminum gallium arsenide (AlxGa ^ xAs) oxidation adjustment layer after oxidation to form oxygen = aluminum gallium (AlGaO) to change a part of the area of the aluminum gallium arsenide (AixGaHAs) oxidation adjustment layer Refractive index and thickness, and due to the choice of the oxidation limitation of the resonator cavity element GaN GaAs (ΑΙΑ-xAs) oxidation adjustment layer: = different degrees to change each of the oxidation-limited resonant cavity elements fi I == long, open ^ applied to the multiplexed sub-wave resonator element array. = Resonant cavity applied to multiplexed sub-waves described in item 5, ten, yujita white, clothing manufacturing & For each of the oxidation partial-limit resonators =: inch: upper platform structure, the upper platform structure contains more than one aluminum gallium arsenide (AlxGai-xAs) oxidation-adjusted sound. 7. The method for manufacturing a response / element array as described in item 5 of the scope of the patent application, wherein the change in the wavelength of the resonant cavity of Xi Gong ^ knife wave is caused by the selective oxygen oxidation of the adjustment layer. The number of layers, thickness and composition are determined = 豕 12275851227585 第16頁Page 16
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