TWD214328S - 氣體分配組件蓋 - Google Patents
氣體分配組件蓋 Download PDFInfo
- Publication number
- TWD214328S TWD214328S TW109302179F TW109302179F TWD214328S TW D214328 S TWD214328 S TW D214328S TW 109302179 F TW109302179 F TW 109302179F TW 109302179 F TW109302179 F TW 109302179F TW D214328 S TWD214328 S TW D214328S
- Authority
- TW
- Taiwan
- Prior art keywords
- gas distribution
- distribution assembly
- assembly lid
- lid
- design
- Prior art date
Links
Images
Abstract
【物品用途】;本設計請求具有視覺效果之氣體分配組件蓋。;【設計說明】;無。
Description
本設計請求具有視覺效果之氣體分配組件蓋。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/724,071 | 2020-02-12 | ||
| US29/724,071 USD936187S1 (en) | 2020-02-12 | 2020-02-12 | Gas distribution assembly lid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD214328S true TWD214328S (zh) | 2021-10-01 |
Family
ID=75966944
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109302179F TWD214328S (zh) | 2020-02-12 | 2020-04-22 | 氣體分配組件蓋 |
| TW109302179D01F TWD214329S (zh) | 2020-02-12 | 2020-04-22 | 氣體分配組件蓋 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109302179D01F TWD214329S (zh) | 2020-02-12 | 2020-04-22 | 氣體分配組件蓋 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD936187S1 (zh) |
| JP (1) | JP1686169S (zh) |
| TW (2) | TWD214328S (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD1052548S1 (en) | 2023-06-26 | 2024-11-26 | Applied Materials, Inc. | Gas diffuser |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD879609S1 (en) * | 2017-11-14 | 2020-03-31 | Silgan Containers Llc | Can lid |
| US11634254B2 (en) * | 2020-10-06 | 2023-04-25 | Pws Packaging Services, Inc. | Child-resistant lid and related methods |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201610220A (zh) | 2014-05-30 | 2016-03-16 | 蘭姆研究公司 | 可抑制空心陰極放電的電容耦合式電漿電極及氣體分配面板 |
| TW201834111A (zh) | 2016-11-21 | 2018-09-16 | 美商應用材料股份有限公司 | 用於有效氣體分配組件冷卻的具有同心或螺旋通道的兩區域流動冷卻板設計 |
| TWM576592U (zh) | 2017-04-27 | 2019-04-11 | 美商應用材料股份有限公司 | 氣體分配板及包括此氣體分配板的處理腔室 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6037574A (en) * | 1997-11-06 | 2000-03-14 | Watlow Electric Manufacturing | Quartz substrate heater |
| JP4567148B2 (ja) * | 2000-06-23 | 2010-10-20 | 東京エレクトロン株式会社 | 薄膜形成装置 |
| TWD125598S1 (zh) * | 2006-09-28 | 2008-10-21 | 東京威力科創股份有限公司 | 半導體製造用加熱器 |
| TWD125599S1 (zh) * | 2006-09-28 | 2008-10-21 | 東京威力科創股份有限公司 | 半導體製造用加熱器 |
| CN102174693B (zh) * | 2007-01-12 | 2014-10-29 | 威科仪器有限公司 | 气体处理系统 |
| USD664170S1 (en) | 2011-03-04 | 2012-07-24 | Applied Materials, Inc. | Cleaning plate for inducing turbulent flow of a processing chamber cleaning glass |
| USD708651S1 (en) | 2011-11-22 | 2014-07-08 | Applied Materials, Inc. | Electrostatic chuck |
| TWD169790S (zh) * | 2013-07-10 | 2015-08-11 | 日立國際電氣股份有限公司 | 基板處理裝置用氣化器之部分 |
| US9353440B2 (en) | 2013-12-20 | 2016-05-31 | Applied Materials, Inc. | Dual-direction chemical delivery system for ALD/CVD chambers |
| JP1541874S (zh) * | 2015-03-16 | 2016-01-18 | ||
| USD798248S1 (en) * | 2015-06-18 | 2017-09-26 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
| USD819580S1 (en) * | 2016-04-01 | 2018-06-05 | Veeco Instruments, Inc. | Self-centering wafer carrier for chemical vapor deposition |
| USD787458S1 (en) * | 2015-11-18 | 2017-05-23 | Asm Ip Holding B.V. | Gas supply plate for semiconductor manufacturing apparatus |
| WO2017117221A1 (en) * | 2016-01-01 | 2017-07-06 | Applied Materials, Inc. | Non-metallic thermal cvd/ald gas injector and purge system |
| KR102251209B1 (ko) * | 2016-06-15 | 2021-05-11 | 어플라이드 머티어리얼스, 인코포레이티드 | 고 전력 플라즈마 에칭 프로세스들을 위한 가스 분배 플레이트 조립체 |
| KR102477354B1 (ko) * | 2018-03-29 | 2022-12-15 | 삼성전자주식회사 | 가스 분배 판을 갖는 플라즈마 처리 장치 |
-
2020
- 2020-02-12 US US29/724,071 patent/USD936187S1/en active Active
- 2020-04-22 TW TW109302179F patent/TWD214328S/zh unknown
- 2020-04-22 TW TW109302179D01F patent/TWD214329S/zh unknown
- 2020-04-23 JP JPD2020-8353F patent/JP1686169S/ja active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201610220A (zh) | 2014-05-30 | 2016-03-16 | 蘭姆研究公司 | 可抑制空心陰極放電的電容耦合式電漿電極及氣體分配面板 |
| TWI680203B (zh) | 2014-05-30 | 2019-12-21 | 美商蘭姆研究公司 | 可抑制空心陰極放電的電容耦合式電漿電極及氣體分配面板 |
| TW201834111A (zh) | 2016-11-21 | 2018-09-16 | 美商應用材料股份有限公司 | 用於有效氣體分配組件冷卻的具有同心或螺旋通道的兩區域流動冷卻板設計 |
| TWM576592U (zh) | 2017-04-27 | 2019-04-11 | 美商應用材料股份有限公司 | 氣體分配板及包括此氣體分配板的處理腔室 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD1052548S1 (en) | 2023-06-26 | 2024-11-26 | Applied Materials, Inc. | Gas diffuser |
Also Published As
| Publication number | Publication date |
|---|---|
| TWD214329S (zh) | 2021-10-01 |
| JP1686169S (zh) | 2021-05-24 |
| USD936187S1 (en) | 2021-11-16 |
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