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TWD194773S - Polishing pad - Google Patents

Polishing pad

Info

Publication number
TWD194773S
TWD194773S TW107302369F TW107302369F TWD194773S TW D194773 S TWD194773 S TW D194773S TW 107302369 F TW107302369 F TW 107302369F TW 107302369 F TW107302369 F TW 107302369F TW D194773 S TWD194773 S TW D194773S
Authority
TW
Taiwan
Prior art keywords
polishing pad
view
case
item
design
Prior art date
Application number
TW107302369F
Other languages
Chinese (zh)
Inventor
尾関晃
Original Assignee
日商霓塔哈斯股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商霓塔哈斯股份有限公司 filed Critical 日商霓塔哈斯股份有限公司
Publication of TWD194773S publication Critical patent/TWD194773S/en

Links

Abstract

【物品用途】;本案設計之物品係研磨墊。;【設計說明】;仰視圖與俯視圖為對稱顯示，左側視圖與右側視圖為對稱顯示。  本案設計係新穎獨特之樣式，藉由獨特地設計研磨墊，可顯現出先前技藝所未有之視覺效果。[Use of item]; The item designed in this case is a polishing pad. ;[Design Description];The bottom view and top view are symmetrically displayed, and the left view and right view are symmetrically displayed. The design of this case is a novel and unique style. By uniquely designing the polishing pad, it can show visual effects that were unprecedented in previous techniques.

Description

研磨墊Abrasive pad

本案設計之物品係研磨墊。The items designed in this case are polishing pads.

仰視圖與俯視圖為對稱顯示，左側視圖與右側視圖為對稱顯示。 本案設計係新穎獨特之樣式，藉由獨特地設計研磨墊，可顯現出先前技藝所未有之視覺效果。The bottom view and the top view are symmetrically displayed, and the left side view and the right side view are symmetrically displayed. The design of this case is a novel and unique style. By uniquely designing the polishing pad, it can show the visual effects that were not available in previous techniques.

TW107302369F 2017-10-30 2018-04-27 Polishing pad TWD194773S (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPD2017-24155F JP1613788S (en) 2017-10-30 2017-10-30
JP2017-024155 2017-10-30

Publications (1)

Publication Number Publication Date
TWD194773S true TWD194773S (en) 2018-12-21

Family

ID=63525013

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107302369F TWD194773S (en) 2017-10-30 2018-04-27 Polishing pad

Country Status (2)

Country Link
JP (1) JP1613788S (en)
TW (1) TWD194773S (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW419739B (en) 1997-05-06 2001-01-21 Ibm Device and method for preventing settlement of particles on a chemical-mechanical polishing pad
TW422759B (en) 1999-04-30 2001-02-21 Norton Co Improved grinding system
TWM331408U (en) 2007-11-20 2008-05-01 Eino Entpr Co Grinding disc
TWM333985U (en) 2007-11-20 2008-06-11 Eino Entpr Co A multi-directional grinding disk
TW201416175A (en) 2012-10-18 2014-05-01 San Fang Chemical Industry Co Polishing pad, polishing apparatus, and method for making the polishing pad

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW419739B (en) 1997-05-06 2001-01-21 Ibm Device and method for preventing settlement of particles on a chemical-mechanical polishing pad
TW422759B (en) 1999-04-30 2001-02-21 Norton Co Improved grinding system
TWM331408U (en) 2007-11-20 2008-05-01 Eino Entpr Co Grinding disc
TWM333985U (en) 2007-11-20 2008-06-11 Eino Entpr Co A multi-directional grinding disk
TW201416175A (en) 2012-10-18 2014-05-01 San Fang Chemical Industry Co Polishing pad, polishing apparatus, and method for making the polishing pad
TWI531442B (en) 2012-10-18 2016-05-01 三芳化學工業股份有限公司 Polishing pad, polishing apparatus, and method for making the polishing pad

Also Published As

Publication number Publication date
JP1613788S (en) 2018-09-18

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