TWD159675S - 基板處理裝置用廻轉器 - Google Patents
基板處理裝置用廻轉器Info
- Publication number
- TWD159675S TWD159675S TW102302399F TW102302399F TWD159675S TW D159675 S TWD159675 S TW D159675S TW 102302399 F TW102302399 F TW 102302399F TW 102302399 F TW102302399 F TW 102302399F TW D159675 S TWD159675 S TW D159675S
- Authority
- TW
- Taiwan
- Prior art keywords
- processing device
- substrate processing
- rotator
- motor
- revolving part
- Prior art date
Links
- 235000012431 wafers Nutrition 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 2
- 230000008878 coupling Effects 0.000 abstract 1
- 238000010168 coupling process Methods 0.000 abstract 1
- 238000005859 coupling reaction Methods 0.000 abstract 1
Abstract
【物品用途】;本設計的物品是基板處理裝置用廻轉器，為一種中介著安裝凸緣而安裝在用來處理晶圓的基板處理裝置上來使用的廻轉器，並且是在廻轉部載置著用來保持晶圓的晶舟，可使晶舟廻轉的廻轉器。再者，廻轉部是介設著馬達安裝部(coupling)而被連接在馬達，利用馬達使其驅動。;【設計說明】
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012029398 | 2012-11-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD159675S true TWD159675S (zh) | 2014-04-01 |
Family
ID=90414780
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102302399F TWD159675S (zh) | 2012-11-30 | 2013-04-01 | 基板處理裝置用廻轉器 |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWD159675S (zh) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD858468S1 (en) | 2018-03-16 | 2019-09-03 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD859333S1 (en) | 2018-03-16 | 2019-09-10 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
| USD997111S1 (en) | 2021-12-15 | 2023-08-29 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
| USD998575S1 (en) | 2020-04-07 | 2023-09-12 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
| USD1038901S1 (en) | 2022-01-12 | 2024-08-13 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
-
2013
- 2013-04-01 TW TW102302399F patent/TWD159675S/zh unknown
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD858468S1 (en) | 2018-03-16 | 2019-09-03 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD859333S1 (en) | 2018-03-16 | 2019-09-10 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
| USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
| USD998575S1 (en) | 2020-04-07 | 2023-09-12 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
| USD997111S1 (en) | 2021-12-15 | 2023-08-29 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
| USD1038901S1 (en) | 2022-01-12 | 2024-08-13 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
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