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TWD149063S1 - Baffle plate for manufacturing semiconductor - Google Patents

Baffle plate for manufacturing semiconductor

Info

Publication number
TWD149063S1
TWD149063S1 TW101301467F TW101301467F TWD149063S1 TW D149063 S1 TWD149063 S1 TW D149063S1 TW 101301467 F TW101301467 F TW 101301467F TW 101301467 F TW101301467 F TW 101301467F TW D149063 S1 TWD149063 S1 TW D149063S1
Authority
TW
Taiwan
Prior art keywords
article
holes
baffle
baffle plate
gas flow
Prior art date
Application number
TW101301467F
Other languages
Chinese (zh)
Inventor
Naoki Matsumoto
Jun Yoshikawa
Original Assignee
東京威力科創股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JPD2011-21502F external-priority patent/JP1438319S/ja
Priority claimed from JPD2011-21503F external-priority patent/JP1438745S/ja
Application filed by 東京威力科創股份有限公司 filed Critical 東京威力科創股份有限公司
Publication of TWD149063S1 publication Critical patent/TWD149063S1/en

Links

Abstract

【物品用途】;本創作的物品是半導體製造裝置用擋板,作為電漿處理裝置腔體用之半導體製造裝置用擋板。;【創作特點】;從各視圖觀之,本物品呈薄形圓片形體,中央為中空之圓孔,由前視圖觀之,沿外圓周內側同心環繞有複數個小圓形孔部,該等孔部於一側較密集排列,另一側較稀疏排列;如使用狀態參考圖所示,本物品孔部較稀疏側係朝向排氣管側設置,進而限制靠近排氣管側之氣體流量,使腔體內部之氣體流量均一化。[Purpose of the article]; The article of this invention is a baffle for semiconductor manufacturing equipment, which is used as a baffle for semiconductor manufacturing equipment in the chamber of a plasma processing device.; [Features of the invention]; From each view, the article is in the shape of a thin disc with a hollow circular hole in the center. From the front view, there are multiple small circular holes concentrically surrounding the inner side of the outer circumference. These holes are arranged more densely on one side and more sparsely on the other side. As shown in the reference figure of the use state, the side with more sparse holes of the article is arranged toward the exhaust pipe side, thereby limiting the gas flow near the exhaust pipe side and making the gas flow inside the cavity uniform.

TW101301467F 2011-09-20 2012-03-19 Baffle plate for manufacturing semiconductor TWD149063S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPD2011-21502F JP1438319S (en) 2011-09-20 2011-09-20
JPD2011-21503F JP1438745S (en) 2011-09-20 2011-09-20

Publications (1)

Publication Number Publication Date
TWD149063S1 true TWD149063S1 (en) 2012-09-01

Family

ID=92175526

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101301467F TWD149063S1 (en) 2011-09-20 2012-03-19 Baffle plate for manufacturing semiconductor

Country Status (1)

Country Link
TW (1) TWD149063S1 (en)

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