TWD146034S - Side wall of a reactor for semiconductor manufacturing (I) - Google Patents
Side wall of a reactor for semiconductor manufacturing (I)Info
- Publication number
- TWD146034S TWD146034S TW100301721F TW100301721F TWD146034S TW D146034 S TWD146034 S TW D146034S TW 100301721 F TW100301721 F TW 100301721F TW 100301721 F TW100301721 F TW 100301721F TW D146034 S TWD146034 S TW D146034S
- Authority
- TW
- Taiwan
- Prior art keywords
- ring body
- reactor
- side wall
- plate portion
- flat plate
- Prior art date
Links
Abstract
【物品用途】;本創作係一種對半導體基板表面依序供給複數反應氣體而製膜的反應爐所組裝之側壁。;【創作特點】;本創作具有形狀略呈圓形且具有一定厚度之環體，環體向外延伸設置有兩凸耳部，且環體上設有複數個圓形穿孔，該環體另設有一中空平板部，平板部於環體之圓周方向形成有凹槽，藉此以呈現出不同的視覺感受。;使用狀態參考剖面圖係表示本創作置於反應爐內之狀態。[Article Use];This invention is a side wall of a reactor for forming a film by sequentially supplying multiple reaction gases to the surface of a semiconductor substrate.; [Article Features];This invention has a ring body with a slightly circular shape and a certain thickness. The ring body is provided with two lugs extending outward, and a plurality of circular perforations are provided on the ring body. The ring body is also provided with a hollow flat plate portion, and the flat plate portion is formed with grooves in the circumferential direction of the ring body, thereby presenting different visual experiences.; The reference cross-sectional view of the use state shows the state of this invention placed in the reactor.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010025237 | 2010-10-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD146034S true TWD146034S (en) | 2012-03-21 |
Family
ID=45758271
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW100301721F TWD146034S (en) | 2010-10-21 | 2011-04-14 | Side wall of a reactor for semiconductor manufacturing (I) |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | USD655258S1 (en) |
| TW (1) | TWD146034S (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD739832S1 (en) * | 2013-06-28 | 2015-09-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| JP1546345S (en) * | 2015-09-04 | 2016-03-22 | ||
| JP1638504S (en) * | 2018-12-06 | 2019-08-05 | ||
| US12100577B2 (en) | 2019-08-28 | 2024-09-24 | Applied Materials, Inc. | High conductance inner shield for process chamber |
| USD913979S1 (en) * | 2019-08-28 | 2021-03-23 | Applied Materials, Inc. | Inner shield for a substrate processing chamber |
| USD910400S1 (en) * | 2019-09-04 | 2021-02-16 | Yongkang Moyi Tools Co., Ltd. | Grinder dust shroud |
-
2011
- 2011-04-13 US US29/389,557 patent/USD655258S1/en active Active
- 2011-04-14 TW TW100301721F patent/TWD146034S/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| USD655258S1 (en) | 2012-03-06 |
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