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TWD123707S1 - A microwave introducing antenna for a plasma processing apparatus - Google Patents

A microwave introducing antenna for a plasma processing apparatus

Info

Publication number
TWD123707S1
TWD123707S1 TW096303320F TW96303320F TWD123707S1 TW D123707 S1 TWD123707 S1 TW D123707S1 TW 096303320 F TW096303320 F TW 096303320F TW 96303320 F TW96303320 F TW 96303320F TW D123707 S1 TWD123707 S1 TW D123707S1
Authority
TW
Taiwan
Prior art keywords
microwaves
slot antenna
antenna
article
plasma
Prior art date
Application number
TW096303320F
Other languages
Chinese (zh)
Inventor
山下潤
湯淺珠樹
田才忠
Original Assignee
東京威力科創股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 東京威力科創股份有限公司 filed Critical 東京威力科創股份有限公司
Publication of TWD123707S1 publication Critical patent/TWD123707S1/en

Links

Abstract

【物品用途】;本創作的物品是一種電漿處理裝置用微波導入天線,其用途主要是利用電漿對半導基板進行氧化膜、氮化膜及、氮氧化膜的形成、蝕刻以及成膜的電漿處理裝置用的微波導入用天線。;【創作特點】;本物品係為一圓盤狀的縫隙天線;該縫隙天線係形成有複數個貫通表面,且呈一對(一組)L字狀的縫隙(開口部);該縫隙是在整面同心圓狀地以外側與中心側的縫隙數為5:1,且等間隔的圖案在外側與中心側形成兩列(兩層);使用時,如使用狀態參考圖所示,藉由未圖示的高頻電源所產生的微波,通過導波管,傳送到天線部,天線部是由:遲波板與縫隙天線所形成;微波係傳播經遲波板,且透過本物品(縫隙天線)的縫隙,於頂板的表面形成共振區域(表面波形成區域);其結果,微波會均勻地自該縫隙被導入到真空室內,在真空室內產生穩定且均勻的電漿;藉此對半導體基板施行電漿處理;綜上所述,本創作確為一理想美觀之設計。[Purpose of the article]; The article of this creation is a microwave introduction antenna for plasma processing equipment, and its purpose is mainly to form, etch and form oxide films, nitride films and oxynitride films on semiconductor substrates using plasma. ; [Features of the creation]; This article is a disk-shaped slot antenna; the slot antenna is formed with a plurality of through-surfaces and a pair (a group) of L-shaped slots (openings); the slots are arranged concentrically on the entire surface, with the number of slots on the outer side and the center side being 5:1, and the pattern of equal intervals is formed in two rows (two layers) on the outer side and the center side; when in use, as shown in the reference figure of the use state, the microwaves generated by the high-frequency power source (not shown) pass through the waveguide The microwaves are transmitted through the slow wave plate and the slot antenna to the antenna part, which is formed by the slow wave plate and the slot antenna. The microwaves are transmitted through the slow wave plate and the slot antenna, and a resonance area (surface wave formation area) is formed on the surface of the top plate. As a result, the microwaves are uniformly introduced into the vacuum chamber from the slot, and stable and uniform plasma is generated in the vacuum chamber. The semiconductor substrate is thereby subjected to plasma treatment. In summary, the invention is indeed an ideal and beautiful design.

TW096303320F 2006-12-15 2007-06-14 A microwave introducing antenna for a plasma processing apparatus TWD123707S1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006034514 2006-12-15

Publications (1)

Publication Number Publication Date
TWD123707S1 true TWD123707S1 (en) 2008-07-11

Family

ID=39155854

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096303320F TWD123707S1 (en) 2006-12-15 2007-06-14 A microwave introducing antenna for a plasma processing apparatus

Country Status (2)

Country Link
US (1) USD563950S1 (en)
TW (1) TWD123707S1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD123705S1 (en) * 2006-12-15 2008-07-11 東京威力科創股份有限公司 A microwave introducing antenna for a plasma processing apparatus
USD572707S1 (en) * 2006-12-15 2008-07-08 Tokyo Electron Limited Microwave introducing antenna for a plasma processing apparatus

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60154183A (en) 1984-01-25 1985-08-13 Matsushita Electric Works Ltd Infrared-ray type human body detector
JPH0248806B2 (en) 1984-05-22 1990-10-26 Matsushita Electric Ind Co Ltd NENSHOSOCHI
GB2235590B (en) * 1989-08-21 1994-05-25 Radial Antenna Lab Ltd Planar antenna
JPH0590834A (en) 1991-04-30 1993-04-09 Toppan Printing Co Ltd Production of radial line slot antenna
JP2882713B2 (en) 1992-02-14 1999-04-12 三菱電機株式会社 Slot array antenna
WO2004082073A1 (en) * 1992-12-18 2004-09-23 Naohisa Goto Radial line slot antenna for different polarizations
AUPO425096A0 (en) * 1996-12-18 1997-01-16 University Of Queensland, The Radial line slot antenna
WO1998033362A1 (en) * 1997-01-29 1998-07-30 Tadahiro Ohmi Plasma device
US6910440B2 (en) * 2000-03-30 2005-06-28 Tokyo Electron Ltd. Apparatus for plasma processing
JP4504511B2 (en) * 2000-05-26 2010-07-14 忠弘 大見 Plasma processing equipment
JP4727057B2 (en) * 2001-03-28 2011-07-20 忠弘 大見 Plasma processing equipment
US6897823B2 (en) * 2001-07-31 2005-05-24 Hitachi Maxell, Ltd. Plane antenna and method for manufacturing the same
AU2003231516A1 (en) * 2002-05-16 2003-12-02 Tokyo Electron Limited Method of treating substrate
JP2004080574A (en) * 2002-08-21 2004-03-11 Oki Electric Ind Co Ltd Radial line slot antenna
WO2005081302A1 (en) * 2004-02-19 2005-09-01 Tokyo Electron Limited Method for cleaning treatment chamber in substrate treating apparatus and method for detecting endpoint of cleaning
US7233297B1 (en) * 2004-07-13 2007-06-19 Hrl Laboratories, Llc Steerable radial line slot antenna

Also Published As

Publication number Publication date
USD563950S1 (en) 2008-03-11

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