TW562736B - Multilayer antireflection coating with a transparent conductive layer - Google Patents

Abstract

Multilayer antireflection coating on an optical substrate comprises the first, second, third and fourth layers, consecutively from the farthest layer thereof; the first layer is a transparent conductive surface layer of good conductivity and anti-scratching character; and the antireflection layer of the transparent conductive surface layer has a low reflective rate to thereby be used as the panel of a display or touch screen.

Description

562136 1. Feeding instructions u) I invention led to 1 Winter invention is about a kind of anti-radiation coating layer with a conductive surface layer, which can be coated on plastic or glass substrate, which has a transparent conductive surface The anti-reflection coating layer of the layer is related to a layer system including a transparent conductive oxide layer as a surface layer. [Background of the Invention] Coating J; 0.0492176; discloses an embodiment of a multilayer anti-reflection / Λ, the surface of this layer system ΐ 1.46. Said at a wavelength of 55 nm, the refractive index is a U.S. patent-= layer. According to one of its listed implementations: exposing the second reflection, and the surface layer at the wavelength of…, the refractive index surface layer is a layer US Patent No. 5147125 ^-cloth layer according to its listed- Implementation: Reveal:;? Multi-layer anti-reflection, MgF2 and the surface layer at the wavelength of 5 is the surface layer of the system US Patent No. It has an anti-reflection effect I The surface layer is at a wavelength of 5 US Patent No. 5 5 1.38. At 1 hour, the refractive index is • 52 1 6542 福 乾 一 # Second, the surface layer system of a multilayer system, at 50 nm, the refractive index is 0 2 and the .5 3 6 2 5 5 2 reveals—species. " And the surface layer of this layer system in Table 2 is the Si i layer system, and the refractive index is 1 at 0 nm. Page 4 562736 V. Description of the invention (2) US Patent Nos. 5728456 and 5783049 disclose an improved method for An anti-reflection coating layer is deposited on the plastic. According to one of its examples, the surface layer of this layer system is Si02 and the surface layer has a refractive index of 1.46 at a wavelength of 550 nm. In the known patent, the surface layer of the optical system layer is S0 02 or MgFs, and its refractive index is a smaller value of 1.46 or 1.38 at a wavelength of 5500nm. Traditional large-scale manufacturing resistance Reflective optical coatings are widely used in the coating of semiconductors, optical disc read heads, liquid crystal displays, cathode ray tubes, building materials glass, touch panels, screen filters and plastic substrates for decades. This ΐ ΐ Shooting school: the structure of the layer has a general rule, that is, the nine faces of the anti-reflection optical coating 3 It is a material with a low refractive index, for example, the surface film is s i. 46 or i and its refractive index ^ ^ ^ ^ d 8. However, in the application of this anti-reflective optics = screen filters, optical filters, or Plane Λ: When glass, the traditional anti-reflection coating layer surface F + j ^ I g F 2 'conductive layer is buried in Si 02 or M g F 2, so in the mass production, the bottle will be encountered in the traditional Anti-reflection optical coating a In the design principle of the layer of the mask that touches the substrate, the general coating principle is that the coating surface is adjacent to another layer with a low iC: (that is, H). Next, the structure of the optical coating layer is HL. ', T t) ° Therefore, the traditional anti-reflective is a simpler example:, or HLULHL. For example, a material with a low refractive index L and a material with a refractive index 1 1T〇 2' These four layers, structure For glass /

Page 5 562736 V. Description of the invention (3) I T 〇 / s i 〇 2 / Electrical properties. Here the conductive layer shielding layer or static elimination layer is Si02, which has good electrical insulation. Therefore, since the Ibut0 layer is covered by the τ0 layer electrode, this process destroys the electrical contact of this Si. This is the neck. On the other hand, this amount will cause the solder chip to break evenly. The above disadvantages will have a yield, so if the purpose of the invention of a high-reflective optical coating layer] the reflective coating layer of the present invention, a package of transparent conductive surface ^, ^ high refractive index, scratch-resistant and anti-reflective coating layer has a substrate Display Industry / 1 T〇 / S i02. Since J Ding has a conductive ground, this conductive layer can be used as an electromagnetic interference shielding layer. However, the material properties of the surface of the conventional anti-reflection optical coating layer 1 0 2 are good chemical inertness and good. When this anti-reflection optical coating layer is used in a display, the f 1 0 2 layer is covered, so it is difficult The formation of I anti-reflective optical coating layer requires ultrasonic welding of 0.2 layers, so that the solder can be compatible with the ITO layer. For the production of this anti-reflective optical coating bottle in large quantities, liquid tin and ultrasonic energy during the sonic welding process are bright. Pollution. Moreover, the ultrasonic welding process cannot guarantee si 0 2 layers, and a conductive layer (such as a 1 but 0 layer) that forms a uniform connection with the J but 0 layer and reduces the refractive index of the traditional anti-reflective optical coating layer can be used as an anti-surface layer. 'Can overcome the above problems. The purpose is to provide an anti-oxidation layer with a transparent conductive surface layer, and its surface layer (first layer). The conductive surface layer has characteristics such as 1 · 9 ~ 2 · ί, and the transparent conductive surface layer has Low reflectivity, so it can be used in glass or plastic or touch screen, and can overcome a large number of conventional techniques

562736 V. Description of the invention (4) Bottlenecks encountered during production, thereby increasing the yield during production. [Inventive Features] The present invention provides an anti-reflective coating layer having a transparent conductive surface layer. The anti-reflective coating layer has a four-layer structure and is formed on a substrate. The four-layer structure is calculated from the direction away from the substrate. The multilayer structure of the first layer, the second layer, the third layer, and the fourth layer; wherein the first layer is a transparent conductive surface layer with a wavelength of 520 to 55011111 'and its refractive index is 1 · 9 ~ 2 · 1, the The first layer has a thickness of 10 to 40 nm; the second layer is an oxide layer with a wavelength of 520 to 5500 nm and a refractive index of 1.45 to 1.50. The thickness of the second layer The refractive index is 2 · 1 ~ 2 · 3, and the thickness of the second layer is 3〇. ~ 80nm; the fourth layer is an oxide layer, the wavelength is 520 ~ 550nm, the refractive index is 1.9 ~ 2.1, and the thickness of the fourth layer is 40 ~ 80 n in. In order for your review committee to further understand the features and technical contents of the present invention, please refer to the following detailed contents and drawings of the present invention, and present several preferred and feasible embodiments in conjunction with the drawings. The purpose, features, and advantages of the present invention can be obtained in-depth and understandable. [Example] A view of Example 1 of the anti-reflective coating layer with a transparent conductive surface layer (shown in the first figure) of the present invention, including: a substrate 6 made of transparent materials made of glass and plastic The substrate 6 has an interface 5 which is

Page 7 562736

V. Description of the invention (5) The direction of the substrate 6 facing the observer, the observation direction is from top to bottom (as shown by the arrow). A four-layer four is in contact with the interface 5 of the substrate 6; along the direction of the adviser, there is a third layer 3, which is located on the fourth layer 4; along the observer The direction is followed by a second layer 2, the first-home 2 series is located above the third layer 3; along the direction of the observer, ^ a & second layer 1, the first layer 1 series is located on the second layer 2 Above, the first layer 第一 has an upper surface 7; the first layer 1, the second layer 2, the third layer g, and the fourth layer 4 constitute a four-layer system of the present invention. In the first embodiment of the anti-reflection coating layer having a transparent conductive surface layer in the present invention, the first layer 1 is also a surface layer, which is a j τ〇 layer, which is 15 nm, and the refractive index is 52. 2 7 at nm ◦ Thick The second layer 2 is a Si02 layer with a thickness of 58nm and a refractive index of 1.46 at a wavelength of 520nm; the third layer 3 is an Nb0 layer and a thickness of 4 5 nm, the refractive index is ^ • 2 'at a wavelength of 5 20 nm. The fourth layer 4 is a 1 ^ 8 10 layer with a thickness of 6; 11 m' The refractive index is 1 · 8 at a wavelength of 520 nm. . The wavelength range of visible light is 400 ~ 700 nm. In this range, the wavelength of specific light is taken on the surface 7 before the first layer 1, and the experiment amount is $ /. The anti-reflection coating with a transparent conductive surface layer of the present invention is obtained. Corresponding numerical relationship between the inverse and emissivity of the layer and the wavelength of visible light (as shown in Table 1): Table 1 Wavelength (nm) Reflectance (%)

562736 V. Description of the invention (6) ο ο ο ο 6 8 0 2 4 4 5 5 3 116 • ·. See 9 8 9 9

ο ο ο ο 4 6 8 0 5 5 5 6 9 17 6 ··· «7 6 9 2

ο ο ο ο 2 2 1 From Table 1, it can be seen that the four-layer structure of the anti-reflection coating layer with a transparent conductive surface layer has a reflection coefficient lower than 0 when the visible light wavelength is 4 600 nm to 600 nm. 3%, this low reflectivity will not cause damage to human vision, so it can be used as an optical anti-reflection coating for the display industry. In a second embodiment of the anti-reflection coating layer having a transparent conductive surface layer of the present invention, the first layer 1 is also a surface layer, which is an I but 0 layer with a thickness of 15 nm and a refractive index at a wavelength of 52 nm. The time is 2.0; the second layer 2 is a Si02 layer and has a thickness of 5 8 nm, and the refractive index is 1.46 at a wavelength of 520nm; the third layer 3 is an Nb0 layer and has a thickness of 4 5 nm, the refractive index is 2.1 at a wavelength of 520 nm; the fourth layer 4 is a Ta0 layer with a thickness of 57 nm, and the refractive index is 1.95 at a wavelength of 5 20 nm. The wavelength range of visible light is from 400nm to 7000nm. Within this range, the wavelength of specific light is taken on the surface 7 before the first layer 1, respectively.

562736 V. Description of the invention (7) The corresponding numerical relationship between the reflectance of the anti-reflective coating layer with a transparent conductive surface layer and the wavelength of visible light according to the present invention (as shown in Table 2): Table 2 Wavelength (nm) Reflectivity (%) 4 6 0 6 4 6 X 1 0 -2 4 8 0 6 7 0 X 1 0 -2 5 0 0 6 4 5 X 1 0 -2 5 2 0 5 9 6 X 1 0 -2 5 4 0 5 3 5 X 1 0 -2 5 6 0 4 8 4 X 1 0 -2 5 8 0 4 5 5 X 1 0 -2 6 0 0 4 5 5 X 1 0 -2 The four-layer structure of the anti-reflection coating layer with a transparent conductive surface layer has a reflection coefficient lower than 0 · 0.77% at a visible light wavelength of 460 nm to 600 nm. This low reflectivity will not affect humans. Vision causes damage, so it can be used as an optical anti-reflection coating in the display industry. The manufacturing steps of the embodiment of the anti-reflection coating layer with a transparent conductive surface layer according to the present invention are as follows: 1. Sputter the glass substrate using an AC electromagnetic control electrode sputtering method.

Page 10 562736 V. Description of the invention (8) The target material used in plating is Nb Si or Ta, and the temperature of the glass substrate is maintained by a heater between 100 and 300, and the target material and the glass substrate are at When the sputtering distance is 15 cm, a mixed gas of Ar and 〇2 is added, and the pressure of the mixed gas is maintained at 2 m τ 〇rr. Thus, a glass substrate having a NbSi0 or Ta0 layer (fourth layer) can be obtained. 2 · Sputtering the glass substrate with Nb S 10 or Ta 0 layer obtained in step 1 by using the sputtering method of AC electromagnetic control electrode sputtering. The target material used during sputtering is N b, and the heater is used to hold the The temperature of the broken glass substrate is 100 ~ 300 ° C, the distance between the target and the glass substrate during sputtering is 15 cm, and a mixed gas of ar and 〇2 is added, with the pressure of the mixed gas being 2. 5 m τ 0 rr, a glass substrate with Nb0 layer (third layer) on Nbs 丄 0 or D30 ^ 4 layer thus obtained; and Le 3 · Sputtering using magnetron electrode sputtering method The result of step 2

Layer and the third layer of the glass substrate, the target material used during sputtering is two or ten, and the temperature of the glass substrate is maintained at S 300 ° C with a heater. The target and the glass substrate are sputtered during sputtering. Distance ^ 〇 ～ m, and add the mixed gas of ar and 〇2, keep this, and c pressure to 2πι Torr, so you can get s 丨 a gas (second layer) in Nb0 layer (third layer) Nb ^ 2 layer and three layers) on the glass substrate of NbSiO or Ta0 layer (fourth 厣) layer (the plate; 9) 4 · Sputter this method using DC or DC pulse magnetron electrode sputtering method

Page 11 562736 V. Description of the invention (9) The glass substrate with two layers, the third layer and the fourth layer obtained in step 3, the material used in the plating process is IT0, and the glass substrate is held by a heater. The temperature is 100 ~ 300 ° C, the distance between the target and the glass substrate during sputtering is 15 cm, and a mixed gas of Ar and a small amount of 02 is added, and the pressure of the mixed gas is maintained at 3 mT. rr, so that it can be obtained that the IT0 layer (first layer) is on the Si 102 layer (second layer), and the Si 102 layer (second layer) is on the Nb0 layer (third layer), and Nb The O layer (third layer) is a glass substrate according to the embodiment of the present invention in the NbS 100 or Ta 0 layer (fourth layer). To sum up, the anti-reflection coating layer of the present invention having a transparent conductive surface layer has the following advantages: 1. The anti-reflection coating layer of the present invention having a transparent conductive surface layer, wherein the surface of the transparent conductive surface layer (IT0 layer) The resistance value will change with the thickness of the surface layer. When the surface layer thickness is 10 ~ 40nm, the surface resistance value is about 400 ~ 900Ω / cm 2 through experiments. Therefore, the transparent conductive surface layer has a good Conductive, can be used in the display industry to resist electromagnetic interference. 2. The anti-reflection coating layer of the present invention having a transparent conductive surface layer has a low reflectance of less than 0.3% under visible light, and the refractive index of the transparent conductive surface layer is 1 · 9 ~ 2 · 1, so it is used for In the display industry, it will not cause harm to human eyes, and meets the standards of visual requirements. The transparent conductive surface layer uses a polyacetal-made stylus to scrape back and forth at a pressure of 4 50 g / cm 2 10,000 times, the test results of this anti-injury experiment can meet the MLIL-C 4 8 4 9 7 standard

Page 12 562736 V. Description of Invention (ίο) (US Army Army Anti-Scratch Standard), so the anti-reflection coating layer with a transparent conductive surface layer can be used for touch sensing screens. 3 · The anti-reflection coating layer with a transparent conductive surface layer of the present invention can directly form electrical contacts on the transparent conductive surface layer, which can solve the conventional reflective optical coating layer when a conductive layer (such as an I TO layer) is used in a display. ) It is covered by an inert layer (Sio2 layer), which needs to use the small bright spots caused by the ultrasonic welding process to contaminate the conductive layer and the problem of poor yield during mass production. Of course, the above are only a few preferred embodiments of the present invention, and they should not be used to limit the implementation scope of the present invention. Any modification made by those skilled in the art without departing from the spirit of the present invention shall belong to the present invention. The scope of protection of the present invention should therefore be based on the scope of patent application described below.

Page 13 562736 Brief description of the drawings The first figure is a cross-sectional view of an embodiment of an anti-reflection coating layer having a transparent conductive surface layer according to the present invention. Explanation of Symbols: [Invention] 1 First layer 5 Interface 2 Second layer 6 Substrate 3 Third layer 7 Upper surface 4 Fourth layer B1 Page 14

Claims (1)

Jiang, Minato Patent scope y 1 · An anti-reflective coating layer with a transparent conductive surface layer. The anti-reflective coating layer has a four-layer structure and is formed on a substrate. The four-layer structure is calculated from the direction away from the substrate. The multilayer structure of the first layer, the second layer, the third layer, and the fourth layer: wherein the first layer is a transparent conductive surface layer, and its refractive index is 1.9 to 2 when the wavelength is 5 2 0 to 550 nm. 1, the thickness of the first layer is 10 ~ 40nm; The second layer is an oxide layer with a refractive index of 1.45 to 1.50 at a wavelength of 5 2 0 to 5 50 nm, and the thickness of the second layer is 30 to 60 nm; the third layer is a An oxide layer having a refractive index of 2 · 1 ~ 2 · 3 at a wavelength of 520 ~ 550nm and a thickness of the third layer of 30nm ~ 80nm; the fourth layer is an oxide layer with a wavelength of 5 At 2 0 to 5 50 nm, its refractive index is 1 · 9 ~ 2 · 1, and the thickness of the fourth layer is 40 to 80 nm. 〇2. The anti-reflection coating layer, wherein the material of the first layer is IT0. 3. The anti-reflective coating layer with a transparent conductive surface layer as described in item 1 of the scope of patent application, wherein the material of the second layer is Si02. 4. The anti-reflective coating layer with a transparent conductive surface layer as described in item 1 of the scope of patent application, wherein the material of the third layer is NbO. 5. The anti-reflective coating layer with a transparent conductive surface layer according to item 1 of the patent application scope, wherein the material of the fourth layer is Nb S i 0 or Ta Page 15 562736 6. Scope of patent application 〇. 6. The anti-reflective coating layer with a transparent conductive surface layer according to item 1 of the application, wherein the four-layer structure is made of a sputtering device. 1ϋ · 第 16