TW543211B - Manufacturing method of LED having transparent conduction adhesion layer - Google Patents
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543211 五、發明說明(1) 本發明係關於一種發光二極體製法,尤其關於一種具 有黏結層之發光二極體製法。 、 發光一極體之應用頗為廣泛,例如,可應用於光學顯 示裝置、交通號諸、資料儲存裝置、通訊裝置、照明裝、 置、以及醫療裝置。如何提高發光二極體之亮度,是在 光二極體之製造上之重要課題。 $ 於中華民國專利公告第4740 94號揭露一種發光二極體 及其製法,利用一透明絕緣黏結層,將一發光二極體叠爲 與一透明基板接合在一起。由於該方法利用加溫將兩$ ^ 體材料鍵結在一起,由於傳統之黏結劑之熱膨脹係數約 10_60PPm/cC,而半導體材質熱膨脹係數約為21〇ppm/馬 °C,當元件黏結面積小於lcm2時,黏結效果仍能夠維持, 但是當元件大於1cm2或者黏結!吋以上之晶片時,則因為 黏結面積較大,而黏結劑與半導體之間熱膨脹係數差異過 大,因此當利用-黏結層黏結兩片晶片時,於製程中經過 力:溫作用,熱膨脹係數差異過大,使得兩晶片產 情況,如圖1所示。 本案發明人於思考如何解決前述之缺點時,獲得一發 明靈感,認為若藉使用一黏結層黏結前述之發光二極體義 $與j明基板,其中於該黏結層上形成一預定之分佈“ 案,另外於發光二極體疊層與該透明導電黏結層之黏结 面,以及該透明基板與該透明導電黏結層之黏結面分別存 在一反應層,以加強鍵結強度。發光二極體疊層、分佈式 黏結層以及透明基板經過加壓加溫作用後,該分佈式黏結543211 V. Description of the invention (1) The present invention relates to a light-emitting diode system method, and more particularly to a light-emitting diode system method with a bonding layer. The application of light-emitting diodes is quite wide, for example, it can be applied to optical display devices, traffic signals, data storage devices, communication devices, lighting devices, devices, and medical devices. How to improve the brightness of light-emitting diodes is an important issue in the manufacture of light-emitting diodes. $ Patent Publication No. 4740 94 of the Republic of China discloses a light-emitting diode and a method for manufacturing the same. A light-emitting diode is laminated with a transparent substrate by using a transparent insulating adhesive layer. Because this method uses heating to bond two bulk materials together, because the thermal expansion coefficient of traditional adhesives is about 10_60PPm / cC, and the thermal expansion coefficient of semiconductor materials is about 21ppm / ma ° C, when the component bonding area is less than At lcm2, the adhesion effect can still be maintained, but when the component is larger than 1cm2 or is stuck! In the case of wafers larger than one inch, because of the large bonding area, the thermal expansion coefficient difference between the adhesive and the semiconductor is too large. Therefore, when the two wafers are bonded with the -adhesive layer, the force during the process: temperature effect, the thermal expansion coefficient difference is too large , So that the production of two wafers, as shown in Figure 1. When thinking about how to solve the aforementioned shortcomings, the inventor of the present case obtained an inspiration for the invention, and thought that if a light-emitting diode and a light-emitting diode substrate were bonded by using a bonding layer, a predetermined distribution was formed on the bonding layer. In addition, a reaction layer exists on the bonding surface of the light-emitting diode stack and the transparent conductive adhesive layer, and on the bonding surface of the transparent substrate and the transparent conductive adhesive layer to enhance the bonding strength. The light-emitting diode stack Layer, distributed bonding layer and transparent substrate are subjected to pressure and heating, the distributed bonding
543211 五、發明說明(2) 層因有足夠之空間供黏結層進行熱膨脹,使得黏結層能均 勻分佈,形成良好之黏結作用,如此,即可解決前述之熱 膨脹作用產生剝離的問題。 發明概要 本發明之主要目的在於提供具有黏結層之發光二極體 製法,在其製程中,藉使用一透明黏結層,連結一發光二 極體疊層與一透明基板,其中於該黏結層上形成一預定之 分佈式圖案,另外發光二極體疊層與該透明黏結層之黏結 面,以及該透明基板與該透明黏結層之黏結面分別存在一 反應層,將發光二極體疊層、第一反應層、分佈式透明黏 結層、第二反應層以及透明基板疊合,因該黏結層具有分 佈式圖案,因此經過加壓加溫後,具有較大熱膨脹係數之 黏結層有足夠之空間向外均勻膨脹,使得反應層與分佈式 透明黏結層之間具有良好之鍵結,以避免在後續之製程中 容易產生剝離的問題,達到製程改善之目的。 依本發明一較佳實施例具有黏結層之發光二極體製 法,該發光二極體之製法包含下列步驟:在一第一基板上 依次形成一第二接觸層、一第二束缚層、一發光層、一第 一束缚層、一第一接觸層、一透明導電層、一第二反應 層,構成一第一疊層;在一第二基板上形成一第一反應 層、一透明黏結層,構成一第二疊層;於該透明黏結層上 形成一預定之分佈圖案;利用該透明黏結層將該第一疊層 之第二反應層表面以及該第二疊層之第一反應層表面結合543211 V. Description of the invention (2) Because the layer has enough space for the thermal expansion of the adhesive layer, the adhesive layer can be evenly distributed to form a good bonding effect. In this way, the problem of peeling caused by the thermal expansion effect can be solved. SUMMARY OF THE INVENTION The main object of the present invention is to provide a light-emitting diode system method with a bonding layer. In the process, a light-emitting diode stack is connected to a transparent substrate by using a transparent bonding layer, wherein the bonding layer is on the bonding layer. A predetermined distributed pattern is formed, in addition, a reaction layer exists on the bonding surface of the light emitting diode stack and the transparent bonding layer, and the bonding surface of the transparent substrate and the transparent bonding layer respectively, and the light emitting diode is stacked, The first reaction layer, the distributed transparent adhesive layer, the second reaction layer, and the transparent substrate are superimposed. Because the adhesive layer has a distributed pattern, after pressure heating, there is enough space for the adhesive layer with a large thermal expansion coefficient. The uniform expansion outwards makes the reaction layer and the distributed transparent adhesive layer have good bonding, so as to avoid the problem of easy peeling in the subsequent process and achieve the purpose of improving the process. According to a preferred embodiment of the present invention, a light-emitting diode system with a bonding layer includes the following steps: a second contact layer, a second binding layer, and a A light-emitting layer, a first tie layer, a first contact layer, a transparent conductive layer, and a second reaction layer constitute a first stack; a first reaction layer and a transparent adhesive layer are formed on a second substrate Forming a second stack; forming a predetermined distribution pattern on the transparent adhesive layer; using the transparent adhesive layer to surface the second reaction layer of the first stack and the surface of the first reaction layer of the second stack Combine
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在一起;移除該第一基板,構成一第三疊層;將該第三疊 層適當地姓刻至該透明導電層,形成一透明導電層暴露表 ^區域,以及在該第二接觸層層與該透明導電層暴露表面 區域上分別形成第一接線電極與第二接線電極。 月ίι述第一基板,係包含選自於Gap、GaAs及Ge所構成 材料組群中之至少一種材料;前述第二基板,係包含選自 SlC、A 1 203、玻璃、石英、GaP、GaAsP及AlGaAs所構成材 料組群中之至少一種材料或其它可代替之材料;前述分佈 式透明黏結層係包含選自於聚醯亞胺(1)〇1711111〇^,簡稱 PI)、苯并環丁烷(benzocyclobutane,簡稱BCB)或過氟環 丁烷(perf luorocyclobutane,簡稱PFCB)所構成材料組群 中之至少一種材料;前述第一反應層係包含選自於§丨1、 T 1或Cr所構成材料組群中之至少一種材料;前述第二反應 層係包含選自於Si Nx、Ti或Cr所構成材料組群中之至少二 種材料;前述第一接觸層係包含選自KGap、GaAs、Together; removing the first substrate to form a third stack; appropriately engraving the third stack to the transparent conductive layer to form a transparent conductive layer to expose the surface region, and the second contact layer A first wiring electrode and a second wiring electrode are formed on the layer and the exposed surface area of the transparent conductive layer, respectively. The first substrate is composed of at least one material selected from the group consisting of Gap, GaAs, and Ge; the second substrate is composed of SlC, A 1 203, glass, quartz, GaP, GaAsP At least one material or other replaceable materials in the group of materials composed of AlGaAs and AlGaAs; the aforementioned distributed transparent bonding layer comprises a material selected from polyimide (1) 〇1711111〇 ^, referred to as PI), benzocyclobutane At least one material from the group consisting of benzocyclobutane (BCB) or perf luorocyclobutane (PFCB); the first reaction layer includes a material selected from the group consisting of §1, T 1 or Cr. At least one material constituting the material group; the second reaction layer includes at least two materials selected from the group consisting of Si Nx, Ti, or Cr; the first contact layer includes the material selected from KGap, GaAs ,
GaAsP、InGaP、AlGalnP及AlGaAs所構成材料組群中之至 少一種材料;前述第一束缚層、發光層與第二束缚層,係 包含AlGalnP ;前述第二接觸層,係包含選自於Gap : ^At least one material from the group of materials consisting of GaAsP, InGaP, AlGalnP, and AlGaAs; the first binding layer, the light-emitting layer, and the second binding layer each include AlGalnP; the second contact layer includes a member selected from Gap: ^
GaAs、GaAsP、InGaP、AlGaInP&A1GaAs 所構成材料组群 中之至少一種材料;前述透明導電層包含選自於氧化銦 錫、乳化鑛錫、氧化綈錫、氧化辞、氧化鋅錫、au、 G e A u及N i / A u所構成材料組群中之至少一種材料。 詳細說明At least one material from the group consisting of GaAs, GaAsP, InGaP, AlGaInP &A1GaAs; the transparent conductive layer includes a material selected from the group consisting of indium tin oxide, emulsified mineral tin, hafnium tin oxide, zinc oxide, zinc tin oxide, au, G At least one material in the material group composed of e A u and N i / A u. Detailed description
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止-=i制Γ2 ’依本發明一較佳實施例具有黏結層之發 展一二口 χ法形成陣列1之部分剖面圖,其中該透明黏結 二乂白之蝕刻方法形成複數個矩形之圖案,當該矩形圖 /、f大大於切割後晶粒之大小時,則部分晶粒上之黏結 層亚無蝕刻之圖案,部分之晶粒上之黏結層將有蝕刻後之 圖案$現若黏結層之矩形圖案小於晶粒大小,則所有切 J後aa粒之黏結層都有蝕刻後之圖案。該發光二極體陣列 之製法包合下列步驟:在一第一基板18(未於圖式中標示) 上依次形成一第二接觸層17、一第二束缚層16、一發光層 15、一第一束缚層14、一第一接觸層。、一透明導電層 21、一第二反應層22,構成一第一疊層;在一第二基板10 上形成一第一反應層U、一透明黏結層12,構成一第二疊 層,於瀛透明黏結層上形成一預定之矩形圖案,該圖案小 於切割後晶粒之大小;利用該透明黏結層將該第一疊層之 $二反應層表面以及該第二疊層之第一反應層表面結合在 :起1構成一第三疊層;移除該第一基板18,構成一第四 «層;將該第四疊層適當地蝕刻至該透明導電層2丨,形成 一透明導電層暴露表面區域;以及在該第二接觸層17與該 透明導電層暴露表面區域上分別形成第一接線電極丨9與第 二接線電極2 0。 y 圖3為發光二極體陣列1製法中,利用透明黏結層黏結 後〜果’其中黏結層钱刻後預定之圖案為矩形。由圖中可 知,兩疊曾經過黏結後,並無剝離之現象產生。 請參閱圖4,依本發明另一較佳實施例具有黏結層之Stop- = i system Γ2 'According to a preferred embodiment of the present invention, there is a partial cross-sectional view of the array 1 formed by a two-port χ method, wherein the transparent adhesive two-white etching method forms a plurality of rectangular patterns. When the rectangle / f is larger than the size of the grains after cutting, the bonding layer on some of the grains will not have an etched pattern, and the bonding layer on some of the grains will have an etched pattern. The rectangular pattern is smaller than the size of the grains, so all the bonding layers of the aa grains after cutting J have an etched pattern. The manufacturing method of the light-emitting diode array includes the following steps: forming a second contact layer 17, a second binding layer 16, a light-emitting layer 15, and a first layer on a first substrate 18 (not shown in the figure) in this order. The first binding layer 14 and a first contact layer. A transparent conductive layer 21 and a second reaction layer 22 constitute a first stack. A first reaction layer U and a transparent adhesive layer 12 are formed on a second substrate 10 to form a second stack.预定 A predetermined rectangular pattern is formed on the transparent adhesive layer, the pattern is smaller than the size of the crystal grains after cutting; the transparent adhesive layer is used to surface the second reaction layer of the first stack and the first reaction layer of the second stack The surface is bonded together: 1 constitutes a third stack; the first substrate 18 is removed to form a fourth layer; the fourth stack is appropriately etched to the transparent conductive layer 2 to form a transparent conductive layer An exposed surface area; and a first wiring electrode 9 and a second wiring electrode 20 are formed on the exposed surface area of the second contact layer 17 and the transparent conductive layer, respectively. y Fig. 3 shows a method for manufacturing a light-emitting diode array 1 in which a transparent adhesive layer is used for bonding to fruit ', wherein the predetermined pattern of the adhesive layer after the money is carved is rectangular. It can be seen from the figure that there was no peeling after the two stacks were bonded. Please refer to FIG. 4, according to another preferred embodiment of the present invention, an adhesive layer is provided.
第8頁 543211 五、發明說明(5) 發光二極體2,其結構盥制乂 極體"“以,其不同處;=前:實施例之發光二 反射層23,藉由該金屬反射:佳貫施例增加 反射將光線帶出。 <射層將射向反射層之光線’經由 材料ϋΪί —基板,係包含選自於GaP、GaAs或Ge所構成 之至少一種!!料;前述第二基板,係包含選自 料組群中、玻j、石央、GaP、GaAsP及AlGaAs所構成材 二:类日“之至少一種材料或其它可代替之材料;前述分佈 =月黏結層係包含選自於聚酿亞胺⑺)、苯并環丁燒 (BCB)或過氟環丁烷(PFCB)所構成材料組群中之至少—種 2料;前述第一反應層係包含選自於SiNx、Ti或^所構 材料組群中之至少一種材料;前述第二反應層係包含選自 於Si Νχ、Τι或Cr所構成材料組群中之至少一種材料;前述 金屬反射層係包含選自於In、Srl、Au、Pt、Zrl、GePage 8 543211 V. Description of the invention (5) Light-emitting diode 2 whose structure is made of "" with its differences; = Front: The light-emitting two-reflective layer 23 of the embodiment, reflected by the metal : The Jiaguan embodiment increases the reflection to bring out the light. ≪ The radiation layer will direct the light toward the reflection layer through the material. The substrate includes at least one material selected from the group consisting of GaP, GaAs, or Ge; the foregoing; The second substrate includes at least one material selected from the group of materials, glass j, shiyang, GaP, GaAsP, and AlGaAs: at least one kind of day-like material or other replaceable materials; the aforementioned distribution = moon bonding layer system Containing at least one or two kinds of materials selected from the group consisting of polyimide hydrazone, BCB, or perfluorocyclobutane (PFCB); the first reaction layer system includes At least one material selected from the group consisting of SiNx, Ti, or ^; the second reaction layer includes at least one material selected from the group consisting of Si Νχ, Ti, or Cr; the metal reflective layer includes From In, Srl, Au, Pt, Zrl, Ge
Ag、Ti、Pb、Pd、Cu、AuBe、AuGe、Ni、PbSri 或 AuZn 所構 成材料組群中之至少一種材料;前述第一接觸層係包含選 自於GaP、GaAs、GaAsP、InGaP、AlGalnP 或AlGaAs 所構成 材料組群中之至少一種材料;前述第一束缚層、發光層與 第二束缚層’係包含A 1 Ga I nP ;前述第二接觸層,係包含 選自於GaP、GaAs、GaAsP、InGaP、AlGaInP 或AlGaAs 所構 成材料組群中之至少一種材料;前述透明導電層包含選自 於氧化姻錫、氧化録錫、氧化錄錫、氧化辞、氧化鋅錫、 Be Au、GeAu或N i /Au所構成材料組群中之至少一種材料; 前述黏結層之預定圖案可包含矩形、圓形或條形之形狀。 543211 五、發明說明(6) 雖然本發明之發光二極體已以較佳實施例揭露於上, 然本發明之範圍並不限於上述較佳實施例,應以下述申請 專利範圍所界定為準。因此任何熟知此項技藝者,在不脫 離本發明之申請專利範圍及精神下,當可做任何改變。 #At least one material from the group of materials consisting of Ag, Ti, Pb, Pd, Cu, AuBe, AuGe, Ni, PbSri, or AuZn; the first contact layer includes a material selected from the group consisting of GaP, GaAs, GaAsP, InGaP, AlGalnP, or At least one of the materials in the group consisting of AlGaAs; the first binding layer, the light-emitting layer, and the second binding layer include A 1 Ga I nP; the second contact layer includes a member selected from GaP, GaAs, and GaAsP. At least one material from the group of materials consisting of InGaP, AlGaInP, or AlGaAs; the transparent conductive layer includes a material selected from the group consisting of tin oxide, tin oxide, tin oxide, zinc oxide, zinc tin oxide, Be Au, GeAu, or N At least one material in the material group formed by i / Au; the predetermined pattern of the aforementioned adhesive layer may include a rectangular, circular, or strip shape. 543211 V. Description of the invention (6) Although the light-emitting diode of the present invention has been disclosed above with preferred embodiments, the scope of the present invention is not limited to the above-mentioned preferred embodiments, and should be defined by the scope of the following patent applications . Therefore, any person skilled in the art can make any changes without departing from the scope and spirit of the patent application of the present invention. #
第10頁 543211 圖式簡單說明 圖式之簡單說明: 圖1為一照片,顯示利用無預定之分佈式圖案黏結層 黏結後之發光二極體結果。 圖2為一示意圖,顯示依本發明之製法形成一較佳實 施例之具有黏結層之發光二極體陣列。 圖3為一照片,顯示圖2具有預定之分佈式圖案發光二 極體陣列黏結後之結果。 圖4為一示意圖,顯示依本發明之製法形成另一較佳 實施例之具有黏結層之發光二極體。Page 10 543211 Brief description of the diagrams Brief description of the diagrams: Figure 1 is a photo showing the results of the light-emitting diodes after being bonded using an unordered distributed pattern bonding layer. Fig. 2 is a schematic diagram showing a light emitting diode array having a bonding layer formed according to a preferred embodiment of the present invention. Fig. 3 is a photograph showing the result of the bonding of the light emitting diode array having a predetermined distributed pattern in Fig. 2. Fig. 4 is a schematic diagram showing a light emitting diode having a bonding layer formed according to another preferred embodiment of the present invention.
符號· 說明 1 發 光 二 極 體 2 發 光 二 極 體 10 第 二 基 板 11 第 一 反 應 層 12 透 明 黏 結 層 13 第 -一 接 觸 層 14 第 _ 一 束 m 層 15 發 光 層 16 第 二 束 缚 層 17 第 二 接 觸 層 19 第 一 一 接 線 電Symbols and explanations 1 Light-emitting diode 2 Light-emitting diode 10 Second substrate 11 First reaction layer 12 Transparent adhesive layer 13 First-contact layer 14 First _ bunch of m layers 15 Light-emitting layer 16 Second binding layer 17 Second Contact layer 19 First wiring
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100364120C (en) * | 2004-07-29 | 2008-01-23 | 晶元光电股份有限公司 | Light emitting element array with adhesive layer |
US7560738B2 (en) | 2003-07-04 | 2009-07-14 | Epistar Corporation | Light-emitting diode array having an adhesive layer |
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2002
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7560738B2 (en) | 2003-07-04 | 2009-07-14 | Epistar Corporation | Light-emitting diode array having an adhesive layer |
CN100364120C (en) * | 2004-07-29 | 2008-01-23 | 晶元光电股份有限公司 | Light emitting element array with adhesive layer |
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