TW459354B - Semiconductor chip with surface mounting components - Google Patents
Semiconductor chip with surface mounting components Download PDFInfo
- Publication number
- TW459354B TW459354B TW89117704A TW89117704A TW459354B TW 459354 B TW459354 B TW 459354B TW 89117704 A TW89117704 A TW 89117704A TW 89117704 A TW89117704 A TW 89117704A TW 459354 B TW459354 B TW 459354B
- Authority
- TW
- Taiwan
- Prior art keywords
- semiconductor wafer
- component
- scope
- patent application
- item
- Prior art date
Links
Landscapes
- Semiconductor Integrated Circuits (AREA)
Abstract
Description
459 35 4459 35 4
面接著元件的半導體晶片 女t於半導體晶片正面 五、發明說明u) 【發明領域】 本發明係有關於一 其特徵在於直接將表 【先前技術】 電子封裝構造一般包含一個以 基板。該主動元件一般係為晶的主動元件設於—電路 製成)切割而得的晶片封=二上以矽、砷化鍺或砷化鎵 單一晶月封裝(SCM ),而包人^造若只包含—個元件稱為 多晶片封裝(MCM )。 3 文個元件的封裝構造稱為 隨著電子封裝構造迷度的辦 接地線路的雜訊將漸漸成A = 來自直流電源線路以及 常利用被動元件例如電容見的間題。S此〜般 c —“。…來降低電源電容(d—^、 , '^'^3il(power supply noise) (其=於電源電壓以及接地電壓間電位差的變化而產生 〇Λ耦電容係儘可能靠近主動元件設置以增加其效 用。一般而言,該去耦電容係連接於儘可能靠近主動~ 的電源(power)或接地(gr〇und)。 $知的去耗電容一般係為表面接著元件,其係利用表面 接著技術(SMT)將其兩端部接點(en(j contact)分別固著在 基板上。然而將這些電容直接設置於基板上將大幅減低其 效能’並且其將降低基板有效使用面積而降低封裝效率。 有些基板係將電容直接埋設於其中,然而其亦無法大幅改 善其%性效能。因此有些晶圓將電容内建於每一個晶片結 構中’藉此大幅增進電性效能。然而如果要將電容直接内A semiconductor wafer with components attached to the front of the semiconductor wafer. V. Description of the invention u) [Field of the invention] The present invention relates to a method which is characterized by directly displaying a table. [Prior art] Electronic package structures generally include a substrate. The active device is generally a crystal active device (made of a circuit). A chip package obtained by cutting = a single crystal moon package (SCM) with silicon, germanium arsenide, or gallium arsenide on the top. Containing only one component is called a multi-chip package (MCM). The packaging structure of three components is called as the electronic packaging structure is fascinated. The noise of the ground line will gradually become A = from the DC power line and often used passive components such as capacitors. S ~~ c — "... to reduce the power supply capacitance (d- ^ ,, '^' ^ 3il (power supply noise) (which = generated by the change in potential difference between the power supply voltage and the ground voltage). It may be placed close to the active component to increase its effectiveness. Generally speaking, the decoupling capacitor is connected to the power or ground as close to the active ~ as possible. The known depletion capacitor is generally a surface Next, the components are fixed on the substrate using surface-mount technology (SMT) at both ends (j contact). However, placing these capacitors directly on the substrate will greatly reduce their performance 'and it will Reduce the effective use area of the substrate and reduce the packaging efficiency. Some substrates have capacitors buried directly in them, but they also cannot significantly improve their% performance. Therefore, some wafers have capacitors built into each chip structure, thereby greatly improving Electrical performance. However, if the capacitor is to be directly
POG-m.ptd 第4頁 459354 五、發明說明(2) 、— 建於晶片結構中將使晶圓製程複雜化並且增加成本。 因此有必要尋求一種在半導體晶圓正面直接安裝表面接 著元件的方法,從而克服或至V改善前述之先前技術的問 題。 【發明概要】 本發明之主要目的係提供種具有表面接著元件之半導 體晶片,其特徵在於直接將表面接著元件安裝於半導體晶 片正面,藉此表面接著元件可以盡量靠近半導體晶片的電 源或接地設置而又不大幅增加其製造成本。 本發明之另一目的係提供一種將表面接著元件直接安裝 於半導體晶圓正面的製程’藉此表面接著元件可以直接設 置在晶圓中每一晶片的正面而又不會使晶圓製程複雜化, 藉此可控制其製造成本。 佳實施例之具 體晶具有複 連接至該複數 部接點跨接於 表面接著元件 此表面接著元 置而又不大幅 一種將表面接 '其包含:U) 根據本發明較 片,其中該半導 並且該半導體晶片之正面設有 面接者元件。該每條線路具 其t第一端部係 著元件具有兩端 二端部。由於該 面的線路上,藉 的電源或接地設 本發明另提供 (waf er )的製程 數個金屬接墊設於其此〒, 複,條線硌用以連接至言 有第一端部以及第二端部 個金屬接墊之一。該表面^ 該複數條線路其中兩條的j 係直接安装於半導體晶片^ ,可:盡量靠近半導體晶) 增加其製造成本。 著元件安裝於半導體晶圓 形成金屬層於該半導POG-m.ptd Page 4 459354 V. Description of the Invention (2)-Built in the wafer structure will complicate the wafer process and increase the cost. Therefore, it is necessary to find a method for directly mounting surface-mount components on the front side of a semiconductor wafer, so as to overcome or improve the aforementioned problems of the prior art. [Summary of the Invention] The main object of the present invention is to provide a semiconductor wafer having a surface bonding element, which is characterized in that the surface bonding element is directly mounted on the front surface of the semiconductor wafer, whereby the surface bonding element can be placed as close to the power or ground of the semiconductor wafer as possible. Without significantly increasing its manufacturing costs. Another object of the present invention is to provide a process for directly mounting a surface bonding element on a front surface of a semiconductor wafer, whereby the surface bonding element can be directly disposed on the front side of each wafer in the wafer without complicating the wafer process. , Which can control its manufacturing costs. The specific crystal of the preferred embodiment has multiple connections to the plurality of contacts across the surface and then the component and the surface are then arranged without substantially connecting the surface. 'It includes: U) The film according to the present invention, wherein the semiconductor And the semiconductor wafer is provided with a face-to-face component on the front side. Each of the lines has a first end tethered component having two ends and two ends. As the line on this side, the borrowed power supply or grounding device is provided in the manufacturing process of the present invention. Several metal pads are provided here, and the line is used to connect to the first end and the first. One of the two metal pads at the two ends. The surface ^ two of the plurality of lines j are directly mounted on the semiconductor wafer ^, may: as close as possible to the semiconductor crystal) increase its manufacturing cost. The component is mounted on the semiconductor wafer to form a metal layer on the semiconductor.
POO-lll.ptd 第5頁 459354 五、發明說明(3) 晶圓正面;(b)選擇性蝕 該每一條線路具有第—产a °Λ ^•屬層而形成複數條線路 端部 係連接至設於半導體曰二°卩以及第二端部,其中第 (c )將導電膠點在該複 的複數個金屬接墊之一; 接著元件置於該半導體曰條線路之第二端部;(d)將表面 contact)分別與該禮赵:圓正面,使得其兩端部接點(end 及(e)固化該導電條線路其中兩條的第二端部對齊; 體晶圓並且電性連接,f此將該表:接f元件固定於半導 本發明再提供=表面接著兀件至半導體晶圓。 / 種將表面接著元件安裝於半導胃b $ (waf er )的製程,Α Α 丁守瓶a日圓 g hi含:(a)形成一金屬層於号本道Μ 晶圓正面;(b)逻锂w 0 33曰A 4牛導體 ^ Λ. 、擇性絲刻該金屬層而形成複U@ # 该母一條線路具有篦—山 ^ ^ , ^ X极數條線路, >Λ Αϊή部以及第一 Μ)部,宜φ笛 (C)形士一八带垃體日日圓正面的複數個金屬接墊之一, 7成一"電層覆蓋於該半導體晶圓正面以片 ,使得該每一條線路第二端部至少有部分裸欽^ ^線 ;^d)將接合物質塗佈於該每一條線路第二:邹]: ^义;(e )將表面接著元件置於該半導體 σ卩之^路 甘τ 叫BEa圓正面,插;;θ '、兩端部接點(e n d c ο n t a c t )分別與該複數你于 條的第二端部對齊;及(f)回焊該接合物皙 ^ γ兩 面接著元件固定於半導體晶圓並且電性連接兮主 °Λ表 J^L ^ * A表面接荖分 件至半導體晶圓。 l 為了讓本發明之上述和其他目的、特徵、和 ^ 顯特徵,下文特舉本發明較佳實施例’並配入點成更明 作·^ 4 1合所附圖示, 1下评細說明如下。POO-lll.ptd Page 5 459354 V. Description of the invention (3) Front side of the wafer; (b) Selectively etching each line to have a first layer of a ° Λ ^ • layer to form a plurality of line end connections. To the semiconductor terminal at two degrees and the second end portion, (c) the conductive adhesive is placed on one of the plurality of metal pads; then the component is placed on the second end portion of the semiconductor line; (D) the surface contact) and the Li Zhao: round front side, so that the two ends (end and (e) of the cured strip line) are aligned with the second end of two of the conductive strip lines; Connection, f this table: the f element is fixed to the semiconductor, and the present invention provides = surface bonding element to the semiconductor wafer. / A process of mounting the surface bonding element on the semiconductor b b (waf er), Α Α 丁 守 瓶 a Yen g hi contains: (a) forming a metal layer on the front side of the wafer M; (b) logic lithium w 0 33: A 4 cattle conductor ^ Λ, selective silk engraving the metal layer and Form a complex U @ # The mother has a line with 篦 — 山 ^ ^, ^ X poles, > Λ Αϊή and the first M), should be φ flute (C) One of the plurality of metal pads on the front side of the eight-band Japanese yen, 70% of the "electrical layer" covers the front side of the semiconductor wafer to form a sheet, so that at least a part of the second end of each of the lines has a bare ^ ^ line; ^ d) coating the bonding substance on each of the circuits second: Zou]: ^ meaning; (e) placing a surface bonding element on the semiconductor σ 卩 ^ Lugan τ called BEa circle front, insert; θ ' 2. The two end contacts (endc ο ntact) are respectively aligned with the second end of the plurality of strips; and (f) the solder joint is re-soldered. ^ Both sides are fixed to the semiconductor wafer and electrically connected. The main ° Λ table J ^ L ^ * A surface is connected to the semiconductor wafer. l In order to make the above and other objects, features, and features of the present invention obvious, the following describes the preferred embodiment of the present invention, and the point of entry is made clearer. ^ 4 1 attached drawings, 1 review details described as follows.
p〇〇-'ii.ptdp〇〇-'ii.ptd
ms 3δ 4 .,ms 3δ 4.,
_案號 89117704 五、發明說明(4) 【發明說明】 第一圖揭示根據本發明較佳具體實施例之具有表面接著 兀件1 0 0之半導體晶片11 0。如圖所示,該半導體晶片i i 〇 具有複數個金屬接塾110a設於其正面。一般而言,該半導 體晶片110包含一護層(passivati〇n layer)11〇b覆蓋到金 屬接墊11 Oa的頂部邊緣,而只留下其中間表面部分裸露於 護層11 Ob (參見第三® 。該護層110b可以是一聚醯亞胺 層(poly imide layer)、二氧化矽層、氮化矽層或是由其 他業界熟知的護層材料形成。如第一圖所示,該半導體晶 片11 0之正面設有複數條線路1丨2用以連接至該表面接著元 件100。該每一條線路112具有第—端部n2a以及第二端部 112b,其中第一端部112a係連接至該複數個金屬接墊〗i〇a 之一。該表面接著元件1 〇 〇 —般係包含兩端部接點。根據 本發明之表面接著元件1〇〇較佳係為一被動 解的是,該被動元件可以包括電容、電阻以及牛電感了二 波器(fU ter)藉此壓制t源供應雜訊並且提高晶片之運作 速度》該表面接著元件1〇〇係利用表面接著技術(SMT)將其 兩端部接點分別固著在該複數條線路丨丨2其令兩條的第二 端4 112b。由於該表面接著元件係直接安裝於半導體晶片 正面的線路上,藉此表面接著元件可以盡量靠近半導體晶 片的電源墊(power pad)或接地墊(gr〇und pad)設置而又 不大幅增加其製造成本。 本發明另提供一種將表面接著元件安裝於半導體晶圓 (wafer)的製程,其中該半導體晶圓係尚未切割成個別晶_ Case number 89117704 V. Description of the invention (4) [Explanation of the invention] The first figure discloses a semiconductor wafer 110 having a surface bonding element 100 according to a preferred embodiment of the present invention. As shown in the figure, the semiconductor wafer i i 〇 has a plurality of metal contacts 110 a provided on the front surface thereof. Generally speaking, the semiconductor wafer 110 includes a passivating layer 11〇b covering the top edge of the metal pad 11 Oa, leaving only the middle surface portion exposed on the protecting layer 11 Ob (see the third ®. The protective layer 110b may be a polyimide layer, a silicon dioxide layer, a silicon nitride layer, or other protective materials known in the industry. As shown in the first figure, the semiconductor The front surface of the chip 110 is provided with a plurality of lines 1 and 2 for connecting to the surface bonding element 100. Each of the lines 112 has a first end portion n2a and a second end portion 112b, where the first end portion 112a is connected to One of the plurality of metal pads i0a. The surface bonding element 100 generally includes two end contacts. The surface bonding element 100 according to the present invention is preferably a passive solution, The passive component can include a capacitor, a resistor, and a two-wave filter (fU ter) to suppress the noise supply of the t source and improve the operation speed of the chip. The surface bonding device 100 uses surface bonding technology (SMT). The contacts at both ends are fixed at Plural lines 丨 2 It has two second ends 4 112b. Since the surface bonding component is directly mounted on the front surface of the semiconductor wafer, the surface bonding component can be as close as possible to the power pad of the semiconductor wafer. Or the ground pad is provided without greatly increasing its manufacturing cost. The present invention further provides a process for mounting surface-attached components on a semiconductor wafer, wherein the semiconductor wafer has not been cut into individual crystals.
第7頁 459354 五、發明說明(5) 片。該製程係包含:(a)將一金屬層(例如鋁層或銅層) 濺鍍沉積在半導體晶圓正面之護層上(包含金屬接墊裸露 於護層之部分);(b)塗佈光阻以及形成圖案結構 (P a 11 e r n i n g ) ’( c )飯刻裸露於光組之金屬層而形成複數 條線路1 1 2 (參見第二圖以及第三圖),該每一條線路具 有第一端部1 1 2a以及第二端部1 1 2b,其中第一端部11 2a係 連接至設於半導體晶圓正面的複數個金屬接墊11 Oa之一; (j )移除剩餘之光阻;(㊀)將導電滕(例如銀膠)點在該 ^數條線路n 2之第二端部1 1 2 b ;( f )將表面接著元件1 〇 0 條=Ϊ ί體晶圓正面,使得其兩端部接點分別與該複數 = 第二端部對齊;及(g)嶋導電耀, ⑷前較佳先將介導二-圓/可以理解的是該製程在步驟 mask )或乾膣扣作w ^ s (例如光可顯像之拒銲劑(so 1 der 料:====體晶圓正面以Y數 介電層只在特定區域成像,而在2:―光罩被用展使該 劑會被移除,藉此使得該每^後該特定區域之拒鮮 裸露於該介電層。 $ 4路第二端部至少有部分 /金屬層較佳另包含—層鎳 金覆蓋於該鎳[可以理解的2於該銘或銅層以及-層 :鐵沉積在該紹或銅層上,然層可以在步驟⑷中 Ν層上。此外,該鎳/金層亦可以Λ層再藏鑛沉積在該鎳Page 7 459354 V. Description of Invention (5). The process includes: (a) sputter depositing a metal layer (such as an aluminum layer or a copper layer) on a protective layer on the front surface of a semiconductor wafer (including a portion of the metal pad exposed on the protective layer); (b) coating Photoresist and formation of a pattern structure (P a 11 erning) '(c) The metal layer exposed on the light group is carved to form a plurality of lines 1 1 2 (see the second and third figures), each of which has a first One end portion 1 1 2a and second end portion 1 1 2b, wherein the first end portion 11 2a is connected to one of the plurality of metal pads 11 Oa provided on the front surface of the semiconductor wafer; (j) removing the remaining light (㊀) point conductive pads (such as silver glue) at the second end 1 1 2 b of the plurality of lines n 2; (f) stick the surface to the component 100 = ί the front side of the body wafer , So that the contacts at its two ends are aligned with the complex number = the second end, respectively; and (g) 嶋 is electrically conductive, and preferably 二 is first mediated by a two-circle / understandable that the process is in step mask) or Interfering with w ^ s (for example, photo-imageable solder resist (so 1 der material: ==== bulk wafer front surface with Y-number dielectric layer imaging only in specific areas, and at 2:- The mask is used so that the agent will be removed, so that the freshness of the specific area is exposed to the dielectric layer after each step. At least part of the second end of the 4-way / metal layer preferably further includes— A layer of nickel-gold covers the nickel [understandably 2 or the copper layer and-layer: iron is deposited on the copper or copper layer, but the layer may be on the N layer in step ⑷. In addition, the nickel / gold layer It can also be deposited in the nickel
Nl/Au)的方式沉積在已形成圖宰'二鑛錄’金(electr〇less *結構的鋁或銅層 4 5 9 35 4 五、發明說明(6) (patterned aluminum or copper layer)上 〇 本發明再提供一種將表面接著元件安裝於半導體晶圓 (wafer )的製程,其步驟(a)至步驟(d)大致如前所述,其 另包含步驟(E)形成一介電層覆蓋於該半導體晶圓正面以 及複數條線路Π 2,使得該每一條線路第二端部11 2 b至少 有部分裸露於該介電層;步驟(F)將接合物質電% # (e 1 e c t r 〇 d e ρ 〇 s i t i ο η)或印刷於該每一條線路第二端部 1 1 2b裸露於該介電層之區域(該接合物質可以是含有錫、 鉛、鉍、銦、銀之導電焊錫合金,較佳為共晶銲锡 (eutectic solder));步驟(G) 將表面接著元件丨〇〇對齊 置於該半導體晶圓正面;以及步驟(Η )回焊該接合物質, 藉此將該表面接著元件固定於半導體晶圓並且電性連接該 表面接著元件至半導體晶圓。 根據本發明之具有表面接者元件之半導體晶片,其特徵 在於直接將表面接著元件安裝於半導體晶片正面,藉此# 面接著元件可以盡量靠近半導體晶片的電源或接地設置 又不大幅增加其製造成本。此外’相較於習知技術將表面 接著元件安裝於基板,本發明係直接將表面接著元件安農 於半導體晶片上,因此可增加基板有效使用面積而增進封 裝效率。 雖然本發明已以前述較佳實施例揭示,然其並非用以限 定本發明,任何熟習此技藝者’在不脫離本發明之精神和 範圍内’當可作各種之更動與修改。因此本發明之保護範 圍當視後附之申請專利範圍所界定者為準。Nl / Au) method is deposited on the aluminum or copper layer that has been formed in the figure “Electrorless * structure” 4 5 9 35 4 V. Description of the invention (6) (patterned aluminum or copper layer). The present invention further provides a process for mounting a surface-adhesive element on a semiconductor wafer. The steps (a) to (d) are substantially as described above, and further include step (E) forming a dielectric layer to cover the The front side of the semiconductor wafer and the plurality of lines Π 2 such that the second end portion 11 2 b of each line is at least partially exposed to the dielectric layer; step (F) electrically bonds the bonding material. # (E 1 ectr 〇de ρ 〇siti ο η) or printed on the area where the second end of each line 1 1 2b is exposed on the dielectric layer (the bonding substance may be a conductive solder alloy containing tin, lead, bismuth, indium, and silver. (Eutectic solder); step (G) aligning the surface bonding component on the front side of the semiconductor wafer; and step (i) re-soldering the bonding material, thereby bonding the surface to the component Fixed to the semiconductor wafer and electrically connected to the surface bonding component Semiconductor wafer. According to the present invention, a semiconductor wafer with surface-connected components is characterized in that the surface-attached component is directly mounted on the front surface of the semiconductor wafer, whereby the # surface-attached component can be placed as close to the power or ground of the semiconductor wafer as possible without large Increasing its manufacturing cost. In addition, compared with the conventional technology of mounting surface-adhesive components on a substrate, the present invention directly mounts surface-adhesive components on a semiconductor wafer, thereby increasing the effective area of the substrate and improving packaging efficiency. The invention has been disclosed in the foregoing preferred embodiments, but it is not intended to limit the invention. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the invention is protected. The scope shall be determined by the scope of the attached patent application.
POO-111-ptd 第9頁 ^4,5¾35 4 _Ά 89117704_年月曰 修正_ 圊式簡單說明 【圖示說明】 第1圖:根據本發明較佳具體實施例之具有表面接著元 件之半導體晶片之上視圖;及 第2圖:其係用以說明根據本發明第1圖具有表面接著元 件之半導體晶圓之製造方法;及 第3圖:沿第2圖2 - 2線之局部剖面放大圖。 【圖號說明】 100 表面接著元件 110 半導體晶片 110a 金屬接墊 110b 護層 112 線路 112a 第一端部 112b 第二端部POO-111-ptd Page 9 ^ 4,5¾35 4 _Ά 89117704_ Year Month Revision _ Simple Description [Illustration] Figure 1: Semiconductor wafer with surface-bonding element according to a preferred embodiment of the present invention Top view; and FIG. 2: It is a view for explaining a method for manufacturing a semiconductor wafer having a surface-attached element according to FIG. 1 of the present invention; and FIG. 3: An enlarged partial cross-sectional view taken along line 2-2 of FIG. 2 . [Illustration of drawing number] 100 surface-attached component 110 semiconductor wafer 110a metal pad 110b protective layer 112 circuit 112a first end 112b second end
POO-lll.ptc 第10頁POO-lll.ptc Page 10
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW89117704A TW459354B (en) | 2000-08-30 | 2000-08-30 | Semiconductor chip with surface mounting components |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW89117704A TW459354B (en) | 2000-08-30 | 2000-08-30 | Semiconductor chip with surface mounting components |
Publications (1)
Publication Number | Publication Date |
---|---|
TW459354B true TW459354B (en) | 2001-10-11 |
Family
ID=21660979
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW89117704A TW459354B (en) | 2000-08-30 | 2000-08-30 | Semiconductor chip with surface mounting components |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW459354B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7245011B2 (en) | 2003-10-21 | 2007-07-17 | Advanced Semiconductor Engineering, Inc. | Prevention of contamination on bonding pads of wafer during SMT |
-
2000
- 2000-08-30 TW TW89117704A patent/TW459354B/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7245011B2 (en) | 2003-10-21 | 2007-07-17 | Advanced Semiconductor Engineering, Inc. | Prevention of contamination on bonding pads of wafer during SMT |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5982018A (en) | Thin film capacitor coupons for memory modules and multi-chip modules | |
US6028358A (en) | Package for a semiconductor device and a semiconductor device | |
TW457602B (en) | Flip chip metallization | |
TW388936B (en) | Semiconductor device and manufacture thereof | |
JP3313547B2 (en) | Manufacturing method of chip size package | |
JPH0332914B2 (en) | ||
JPH0846076A (en) | Packing structure of semiconductor package | |
TW200532750A (en) | Circuit device and method for making same | |
TW200411886A (en) | An assembly method for a passive component | |
JPH0432541B2 (en) | ||
CN101930960A (en) | Integrated circuit chip packaging and method of forming | |
TWI271829B (en) | Semiconductor device | |
TW459354B (en) | Semiconductor chip with surface mounting components | |
TW396467B (en) | Semiconductor device | |
TW447053B (en) | Semiconductor apparatus and its manufacturing method, circuit board and electronic machine | |
JP3279470B2 (en) | Semiconductor device and manufacturing method thereof | |
JPS61251047A (en) | Method and apparatus for linking electrode of semiconductor chip to package lead and electronic package | |
JPH06177315A (en) | Multi-layered lead frame | |
JP3080106B2 (en) | IC module connection method | |
JP2748771B2 (en) | Film carrier semiconductor device and method of manufacturing the same | |
TWI245378B (en) | Substrate for use in forming electronic package | |
JPS63122135A (en) | Electrically connecting method for semiconductor chip | |
KR100253379B1 (en) | Shell case semiconductor package and fabrication method thereof | |
JPH07142631A (en) | Semiconductor device and manufacture thereof | |
CN101771017B (en) | Substrate structure and semiconductor package structure including the substrate structure |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4A | Issue of patent certificate for granted invention patent | ||
MM4A | Annulment or lapse of patent due to non-payment of fees |