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TW348092B - Process for producing semiconductor mirror wafer - Google Patents

Process for producing semiconductor mirror wafer

Info

Publication number
TW348092B
TW348092B TW085112441A TW85112441A TW348092B TW 348092 B TW348092 B TW 348092B TW 085112441 A TW085112441 A TW 085112441A TW 85112441 A TW85112441 A TW 85112441A TW 348092 B TW348092 B TW 348092B
Authority
TW
Taiwan
Prior art keywords
polishing
mirror
wafer
producing semiconductor
mirror wafer
Prior art date
Application number
TW085112441A
Other languages
Chinese (zh)
Inventor
Kiyoshi Suzuki
Hideo Kudo
Teruaki Fukami
Jiann Huei Ming Shen
Original Assignee
Mutsubishi Gum Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mutsubishi Gum Kk filed Critical Mutsubishi Gum Kk
Priority claimed from JP35321096A external-priority patent/JP3317330B2/en
Application granted granted Critical
Publication of TW348092B publication Critical patent/TW348092B/en

Links

Landscapes

  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

A process for producing a semiconductor mirror wafer, which comprises: performing a first mirror polishing on both faces of the wafer; performing a back face low glow polishing on one face of the both faces which have undergone the first mirror polishing; and performing a surface processing mirror polishing on the remaining face of the semiconductor wafer which has undergone the first mirror polishing; which is characterized in that: the polishing agent used in the back face low glow polishing mainly comprises silicon dioxide as the main component, and a polyolefin fine powder material.
TW085112441A 1996-12-16 1996-10-11 Process for producing semiconductor mirror wafer TW348092B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35321096A JP3317330B2 (en) 1995-12-27 1996-12-16 Manufacturing method of semiconductor mirror surface wafer

Publications (1)

Publication Number Publication Date
TW348092B true TW348092B (en) 1998-12-21

Family

ID=58264017

Family Applications (1)

Application Number Title Priority Date Filing Date
TW085112441A TW348092B (en) 1996-12-16 1996-10-11 Process for producing semiconductor mirror wafer

Country Status (1)

Country Link
TW (1) TW348092B (en)

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