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TW202508824A - Reinforcement film, device manufacturing method and reinforcement method - Google Patents

Reinforcement film, device manufacturing method and reinforcement method Download PDF

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Publication number
TW202508824A
TW202508824A TW113128289A TW113128289A TW202508824A TW 202508824 A TW202508824 A TW 202508824A TW 113128289 A TW113128289 A TW 113128289A TW 113128289 A TW113128289 A TW 113128289A TW 202508824 A TW202508824 A TW 202508824A
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meth
acrylate
adhesive layer
weight
reinforcing film
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TW113128289A
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Chinese (zh)
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渡辺慧
佐佐木翔悟
舟木千尋
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日商日東電工股份有限公司
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Abstract

本發明之補強膜(10)於膜基材(1)之一主面上具備包含光硬化性組合物之黏著劑層(2),該光硬化性組合物包含具有交聯結構之丙烯酸系基礎聚合物、光硬化劑、及光聚合起始劑,且上述補強膜(10)包含不具有胺基甲酸酯鍵之多官能(甲基)丙烯酸酯、及胺基甲酸酯(甲基)丙烯酸酯作為光硬化劑。丙烯酸系基礎聚合物包含(甲基)丙烯酸C 6-9烷基酯、(甲基)丙烯酸C 10-20烷基酯、以及選自由含羥基單體及含羧基單體所組成之群中之1種以上作為單體成分。 The reinforcing film (10) of the present invention has an adhesive layer (2) containing a photocurable composition on one main surface of a film substrate (1), wherein the photocurable composition contains an acrylic base polymer having a crosslinked structure, a photocuring agent, and a photopolymerization initiator, and the reinforcing film (10) contains a multifunctional (meth)acrylate without a urethane bond and a urethane (meth)acrylate as a photocuring agent. The acrylic base polymer contains C6-9 alkyl (meth)acrylate, C10-20 alkyl (meth)acrylate, and one or more selected from the group consisting of hydroxyl-containing monomers and carboxyl-containing monomers as monomer components.

Description

補強膜、裝置之製造方法及補強方法Reinforcement film, device manufacturing method and reinforcement method

本發明係關於一種膜基材與光硬化性之黏著劑層固著積層而成之補強膜。進而,本發明係關於一種表面貼合有補強膜之裝置之製造方法、及於被黏著體之表面固著積層補強膜之補強方法。The present invention relates to a reinforcing film formed by fixing and laminating a film substrate and a photocurable adhesive layer. Furthermore, the present invention relates to a manufacturing method of a device having a reinforcing film attached to a surface, and a reinforcing method of fixing and laminating a reinforcing film on the surface of an adherend.

於顯示器等光學裝置或電子裝置之表面,出於保護表面或賦予耐衝擊性等目的,有時會貼附黏著性膜。此種黏著性膜通常於膜基材之主面固著積層有黏著劑層,且經由該黏著劑層貼合於裝置表面。An adhesive film is sometimes attached to the surface of an optical device or electronic device such as a display for the purpose of protecting the surface or imparting impact resistance. Such an adhesive film usually has an adhesive layer fixedly laminated on the main surface of the film substrate and is attached to the device surface via the adhesive layer.

於裝置之組裝、加工、輸送等使用前之狀態下,在裝置或裝置構成零件之表面暫時黏著黏著性膜,藉此可抑制被黏著體之損傷或破損。於專利文獻1中揭示有一種補強膜,其於膜基材上具備包含丙烯酸系基礎聚合物、作為光硬化劑之多官能(甲基)丙烯酸酯、及光聚合起始劑之光硬化性之黏著劑層。Before the device is assembled, processed, transported, etc., an adhesive film is temporarily adhered to the surface of the device or its components to prevent damage or destruction of the adherend. Patent document 1 discloses a reinforcing film having a photocurable adhesive layer on a film substrate comprising an acrylic base polymer, a multifunctional (meth)acrylate as a photocuring agent, and a photopolymerization initiator.

該補強膜在剛與被黏著體貼合後為低黏著性,因此容易自被黏著體剝離。因此,可自被黏著體進行二次加工,並且亦可自被黏著體之無需補強之部位將補強膜位置選擇性地剝離去除。補強膜之黏著劑藉由光硬化而與被黏著體牢固地接著,因此成為膜基材永久接著於被黏著體之表面的狀態,可用作負責裝置之表面保護等之補強材。 [先前技術文獻] [專利文獻] The reinforcing film has low adhesion immediately after being bonded to the adherend, so it is easy to peel off from the adherend. Therefore, secondary processing can be performed on the adherend, and the reinforcing film can also be selectively peeled off and removed from the part of the adherend that does not need reinforcement. The adhesive of the reinforcing film is firmly bonded to the adherend by light curing, so that the film substrate is permanently bonded to the surface of the adherend, and can be used as a reinforcing material for surface protection of the device. [Prior technical literature] [Patent literature]

[專利文獻1]國際公開第2022/050009號[Patent Document 1] International Publication No. 2022/050009

[發明所欲解決之問題][The problem the invention is trying to solve]

對於貼合於裝置之表面之補強膜,要求如下:於使黏著劑層光硬化後,具有較高之接著力,對於裝置之彎曲等變形或溫度變化,亦不會自被黏著體剝離。專利文獻1中記載有以下內容:藉由使用具有低玻璃轉移溫度之丙烯酸系聚合物作為構成光硬化性黏著劑之基礎聚合物,黏著劑層之儲存彈性模數較低,應力應變之緩和性較高,因此裝置之彎曲部位之黏著劑層之剝離受抑制,接著可靠性優異。The reinforcement film attached to the surface of the device is required to have a high adhesion after the adhesive layer is photocured, and not to peel off from the adherend even when the device is deformed or the temperature changes due to bending. Patent document 1 states that by using an acrylic polymer with a low glass transition temperature as the base polymer constituting the photocurable adhesive, the adhesive layer has a lower storage elastic modulus and a higher stress-strain relaxation, so that the peeling of the adhesive layer at the bent portion of the device is suppressed, and the bonding reliability is excellent.

然而,若於將專利文獻1所揭示之補強膜貼合於使用膜基板之軟性裝置之狀態下進行將溫度由低溫變為高溫、由高溫變為低溫之溫度循環試驗,則存在產生裝置之翹曲或補強膜之剝離之情況。鑒於該課題,本發明之目的在於提供一種補強膜,該補強膜即便於低溫與高溫之間反覆發生溫度變化之時,亦不易產生被黏著體之翹曲或自被黏著體剝離。 [解決問題之技術手段] However, if the reinforcing film disclosed in Patent Document 1 is bonded to a flexible device using a film substrate and a temperature cycle test is performed in which the temperature changes from low temperature to high temperature and from high temperature to low temperature, the device may warp or the reinforcing film may peel off. In view of this topic, the purpose of the present invention is to provide a reinforcing film that is not prone to warping of the adherend or peeling off from the adherend even when the temperature changes repeatedly between low temperature and high temperature. [Technical means for solving the problem]

本發明之補強膜具備固著積層於膜基材之一主面上之黏著劑層。黏著劑層包含光硬化性組合物,該光硬化性組合物包含具有交聯結構之丙烯酸系基礎聚合物、光硬化劑及光聚合起始劑。The reinforcing film of the present invention has an adhesive layer fixedly laminated on one main surface of the film substrate. The adhesive layer contains a photocurable composition, which contains an acrylic base polymer with a cross-linked structure, a photocuring agent and a photopolymerization initiator.

丙烯酸系基礎聚合物包含烷基之碳數為6~9之(甲基)丙烯酸C 6-9烷基酯、烷基之碳數為10~20之(甲基)丙烯酸C 10-20烷基酯、以及選自由含羥基單體及含羧基單體所組成之群中之1種以上作為單體成分。相對於單體成分總量100重量份,(甲基)丙烯酸C 6-9烷基酯之量為40重量份以上。相對於單體成分總量100重量份,(甲基)丙烯酸C 10-20烷基酯之量可為1~40重量份。 The acrylic acid-based polymer comprises C 6-9 alkyl (meth)acrylate having an alkyl group with 6 to 9 carbon atoms, C 10-20 alkyl (meth)acrylate having an alkyl group with 10 to 20 carbon atoms, and one or more selected from the group consisting of hydroxyl-containing monomers and carboxyl-containing monomers as monomer components. The amount of C 6-9 alkyl (meth)acrylate is 40 parts by weight or more relative to 100 parts by weight of the total amount of the monomer components. The amount of C 10-20 alkyl (meth)acrylate can be 1 to 40 parts by weight relative to 100 parts by weight of the total amount of the monomer components.

丙烯酸系基礎聚合物中導入有交聯結構。較佳為使用相對於聚合物100重量份為0.05~1.0重量份之交聯劑導入交聯結構。作為交聯劑之例,可例舉異氰酸酯系交聯劑及環氧系。A crosslinking structure is introduced into the acrylic base polymer. It is preferred to use 0.05 to 1.0 parts by weight of a crosslinking agent relative to 100 parts by weight of the polymer to introduce the crosslinking structure. Examples of the crosslinking agent include isocyanate-based crosslinking agents and epoxy-based crosslinking agents.

構成黏著劑層之光硬化性組合物包含具有環氧烷鏈且不具有胺基甲酸酯鍵之多官能(甲基)丙烯酸酯、及胺基甲酸酯(甲基)丙烯酸酯作為光硬化劑。相對於丙烯酸系基礎聚合物100重量份,具有環氧烷鏈且不具有胺基甲酸酯鍵之多官能(甲基)丙烯酸酯之量較佳為2~25重量份。相對於丙烯酸系基礎聚合物100重量份,胺基甲酸酯(甲基)丙烯酸酯之量較佳為0.03~5重量份。The photocurable composition constituting the adhesive layer includes a multifunctional (meth)acrylate having an alkylene oxide chain and no urethane bond, and urethane (meth)acrylate as a photocuring agent. The amount of the multifunctional (meth)acrylate having an alkylene oxide chain and no urethane bond is preferably 2 to 25 parts by weight relative to 100 parts by weight of the acrylic base polymer. The amount of the urethane (meth)acrylate is preferably 0.03 to 5 parts by weight relative to 100 parts by weight of the acrylic base polymer.

具有環氧烷鏈且不具有胺基甲酸酯鍵之多官能(甲基)丙烯酸酯之(甲基)丙烯醯基之官能基當量可為80~500 g/eq。胺基甲酸酯(甲基)丙烯酸酯之(甲基)丙烯醯基之官能基當量可為80~5000 g/eq。胺基甲酸酯(甲基)丙烯酸酯可為1分子中具有4個以上之(甲基)丙烯醯基者。The functional group equivalent weight of the (meth)acryl group of the multifunctional (meth)acrylate having an alkylene oxide chain and not having a urethane bond may be 80 to 500 g/eq. The functional group equivalent weight of the (meth)acryl group of the urethane (meth)acrylate may be 80 to 5000 g/eq. The urethane (meth)acrylate may have 4 or more (meth)acryl groups in one molecule.

黏著劑層於光硬化前在溫度25℃下對聚醯亞胺膜之接著力F 0較佳為0.6 N/25 mm以下。黏著劑層於光硬化後在溫度25℃下對聚醯亞胺膜之接著力F 1較佳為3.0 N/25 mm以上,在溫度85℃下之接著力F 2較佳為1.0 N/25 mm以上。 The adhesive layer has a bonding force F0 of 0.6 N/25 mm or less at a temperature of 25°C before light curing. The adhesive layer has a bonding force F1 of 3.0 N/25 mm or more at a temperature of 25°C after light curing, and a bonding force F2 of 1.0 N/25 mm or more at a temperature of 85°C.

光硬化後之黏著劑層於溫度25℃下之剪切儲存彈性模數較佳為100 kPa以下,於溫度-40℃下之剪切儲存彈性模數較佳為1000 kPa以下。The shear storage modulus of the adhesive layer after light curing at a temperature of 25°C is preferably less than 100 kPa, and the shear storage modulus of the adhesive layer at a temperature of -40°C is preferably less than 1000 kPa.

於作為被黏著體之裝置之表面貼合並暫時黏著上述補強膜之後,使黏著劑層光硬化,藉此可獲得附補強膜之裝置。裝置可為可彎折之軟性裝置,補強膜之被黏著體(補強對象)可為可彎折之圖像顯示元件。After the reinforcing film is temporarily attached to the surface of the device as the adherend, the adhesive layer is light-cured to obtain the device with the reinforcing film. The device can be a bendable soft device, and the adherend of the reinforcing film (the object of reinforcement) can be a bendable image display element.

可於將補強膜暫時黏著於被黏著體之後且使黏著劑層光硬化之前,對暫時黏著於被黏著體之補強膜進行切割,自被黏著體上之一部分區域(非補強對象區域)剝離去除補強膜。 [發明之效果] After the reinforcing film is temporarily adhered to the adherend and before the adhesive layer is photocured, the reinforcing film temporarily adhered to the adherend can be cut to remove the reinforcing film from a portion of the adherend (non-reinforcement target area). [Effect of the invention]

本發明之補強膜之黏著劑層包含光硬化性組合物,於將本發明之補強膜接著於被黏著體之後,藉由使黏著劑層光硬化,與被黏著體之接著力提昇。黏著劑層於光硬化前對被黏著體之接著力亦較小,容易自被黏著體剝離。光硬化後之黏著劑即便於高溫下亦具有較高之接著力,伴隨溫度變化所產生之剪切儲存彈性模數之變化較小,因此即便於溫度在低溫與高溫之間反覆發生變化之情形時,亦不易產生被黏著體之翹曲或補強膜自被黏著體剝離之情況。The adhesive layer of the reinforcing film of the present invention includes a photocurable composition. After the reinforcing film of the present invention is attached to an adherend, the adhesive layer is photocured to improve the adhesion to the adherend. Before photocuring, the adhesive layer has a relatively low adhesion to the adherend and is easily peeled off from the adherend. The adhesive after photocuring has a relatively high adhesion even at high temperatures, and the change in shear storage elastic modulus caused by temperature changes is relatively small. Therefore, even when the temperature changes repeatedly between low and high temperatures, it is not easy for the adherend to warp or for the reinforcing film to peel off from the adherend.

圖1係表示補強膜之一實施方式之剖視圖。補強膜10於膜基材1之一主面上具備黏著劑層2。黏著劑層2固著積層於膜基材1之一主面上。黏著劑層2為包含光硬化性組合物之光硬化性黏著劑,藉由紫外線等活性光線之照射而硬化,從而與被黏著體之接著力提昇。FIG1 is a cross-sectional view showing an embodiment of a reinforcing film. The reinforcing film 10 has an adhesive layer 2 on one main surface of a film substrate 1. The adhesive layer 2 is fixedly laminated on one main surface of the film substrate 1. The adhesive layer 2 is a photocurable adhesive containing a photocurable composition, which is cured by irradiation with active light such as ultraviolet rays, thereby improving the bonding strength with the adherend.

圖2係於黏著劑層2之主面上暫時黏著有剝離襯墊5之補強膜之剖視圖。圖3係表示於裝置20之表面貼設有補強膜10之狀態之剖視圖。Fig. 2 is a cross-sectional view showing a reinforcing film with a peeling pad 5 temporarily adhered to the main surface of the adhesive layer 2. Fig. 3 is a cross-sectional view showing a state where a reinforcing film 10 is attached to the surface of a device 20.

自黏著劑層2之表面剝離去除剝離襯墊5,將黏著劑層2之露出面貼合於裝置20之表面,藉此於裝置20之表面貼設補強膜10。於該狀態下,黏著劑層2為光硬化前,呈於裝置20上暫時黏著有補強膜10(黏著劑層2)之狀態。藉由使黏著劑層2光硬化,裝置20與黏著劑層2之界面處之接著力提昇,從而裝置20與補強膜10固著。The peeling pad 5 is peeled off and removed from the surface of the adhesive layer 2, and the exposed surface of the adhesive layer 2 is attached to the surface of the device 20, thereby attaching the reinforcing film 10 to the surface of the device 20. In this state, the adhesive layer 2 is in a state of temporarily adhering the reinforcing film 10 (adhesive layer 2) to the device 20 before light curing. By light curing the adhesive layer 2, the bonding force at the interface between the device 20 and the adhesive layer 2 is improved, so that the device 20 and the reinforcing film 10 are fixed.

「固著」係所積層之2個層牢固地接著,於兩者之界面處無法或難以剝離之狀態。「暫時黏著」係所積層之2個層間之接著力較小,於兩者之界面處可容易地剝離之狀態。"Fixed" means that two layers of the stack are firmly attached and cannot or are difficult to peel off at the interface. "Temporary adhesion" means that the adhesion between two layers of the stack is relatively weak and can be easily peeled off at the interface.

於圖2所示之補強膜中,膜基材1與黏著劑層2固著,剝離襯墊5暫時黏著於黏著劑層2。若將膜基材1與剝離襯墊5剝離,則於黏著劑層2與剝離襯墊5之界面處產生剝離,從而會維持黏著劑層2固著於膜基材1上之狀態。於剝離後之剝離襯墊5上未殘存黏著劑。In the reinforcement film shown in FIG2 , the film substrate 1 is fixed to the adhesive layer 2, and the peeling pad 5 is temporarily adhered to the adhesive layer 2. If the film substrate 1 and the peeling pad 5 are peeled off, peeling occurs at the interface between the adhesive layer 2 and the peeling pad 5, thereby maintaining the state in which the adhesive layer 2 is fixed to the film substrate 1. No adhesive remains on the peeling pad 5 after peeling.

關於圖3所示之貼設有補強膜10之裝置,在黏著劑層2之光硬化前,裝置20與黏著劑層2呈暫時黏著狀態。自裝置20剝離膜基材1時,於黏著劑層2與裝置20之界面處產生剝離,從而會維持黏著劑層2固著於膜基材1上之狀態。裝置20上未殘存黏著劑,因此容易進行二次加工。在使黏著劑層2光硬化之後,黏著劑層2與裝置20之接著力提昇,因此不易自裝置20剝離補強膜10,若將兩者剝離,則存在產生黏著劑層2之凝集破壞之情況。Regarding the device with the reinforcement film 10 attached as shown in FIG3, before the light curing of the adhesive layer 2, the device 20 and the adhesive layer 2 are temporarily adhered. When the film substrate 1 is peeled off from the device 20, peeling occurs at the interface between the adhesive layer 2 and the device 20, thereby maintaining the state in which the adhesive layer 2 is fixed to the film substrate 1. No adhesive remains on the device 20, so it is easy to perform secondary processing. After the adhesive layer 2 is photocured, the adhesion between the adhesive layer 2 and the device 20 is enhanced, so it is not easy to peel the reinforcing film 10 from the device 20. If the two are peeled off, there is a possibility that the adhesive layer 2 will be coagulated and destroyed.

[補強膜之構成] <膜基材> 膜基材1使用塑膠膜。為了將膜基材1與黏著劑層2固著,較佳為不對膜基材1之黏著劑層2附設面實施離型處理。 [Construction of the reinforcing film] <Film substrate> The film substrate 1 uses a plastic film. In order to fix the film substrate 1 and the adhesive layer 2, it is preferred not to perform a release treatment on the surface of the film substrate 1 to which the adhesive layer 2 is attached.

膜基材1之厚度例如為4~500 μm左右。就藉由賦予剛性或緩和衝擊等而對裝置進行補強之觀點而言,膜基材1之厚度較佳為12 μm以上,更佳為30 μm以上,進而較佳為45 μm以上。就使補強膜具有可撓性而提高處理性之觀點而言,膜基材1之厚度較佳為300 μm以下,更佳為200 μm以下。為了使補強膜具有可撓性而使其能夠摺疊,膜基材1之厚度較佳為125 μm以下,更佳為100 μm以下。就兼顧機械強度與可撓性之觀點而言,膜基材1之壓縮強度較佳為100~3000 kg/cm 2,更佳為200~2900 kg/cm 2,進而較佳為300~2800 kg/cm 2,尤佳為400~2700 kg/cm 2The thickness of the film substrate 1 is, for example, about 4 to 500 μm. From the viewpoint of reinforcing the device by imparting rigidity or buffering impact, the thickness of the film substrate 1 is preferably 12 μm or more, more preferably 30 μm or more, and further preferably 45 μm or more. From the viewpoint of making the reinforcing film flexible and improving the handling property, the thickness of the film substrate 1 is preferably 300 μm or less, and more preferably 200 μm or less. In order to make the reinforcing film flexible so that it can be folded, the thickness of the film substrate 1 is preferably 125 μm or less, and more preferably 100 μm or less. From the perspective of both mechanical strength and flexibility, the compressive strength of the film substrate 1 is preferably 100-3000 kg/cm 2 , more preferably 200-2900 kg/cm 2 , further preferably 300-2800 kg/cm 2 , and particularly preferably 400-2700 kg/cm 2 .

作為構成膜基材1之塑膠材料,可例舉:聚酯系樹脂、聚烯烴系樹脂、環狀聚烯烴系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂、聚醚醚酮樹脂等。於顯示器等光學裝置用之補強膜中,膜基材1較佳為透明膜。又,於自膜基材1側照射活性光線而進行黏著劑層2之光硬化之情形時,膜基材1較佳為對黏著劑層之硬化所使用之活性光線具有透明性。就兼具機械強度與透明性之方面而言,適宜使用聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯等聚酯系樹脂。於自被黏著體側照射活性光線而使黏著劑層硬化之情形時,被黏著體對活性光線具有透明性即可,膜基材1可對於活性光線不透明。As the plastic material constituting the film substrate 1, there can be cited polyester resins, polyolefin resins, cyclic polyolefin resins, polyamide resins, polyimide resins, polyetheretherketone resins, etc. In the reinforcing film for optical devices such as displays, the film substrate 1 is preferably a transparent film. In addition, when the adhesive layer 2 is photocured by irradiating active light from the side of the film substrate 1, the film substrate 1 is preferably transparent to the active light used for curing the adhesive layer. In terms of both mechanical strength and transparency, polyester resins such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate are preferably used. When the adhesive layer is cured by irradiating the adherend with active light from the adherend side, the adherend only needs to be transparent to the active light, and the film substrate 1 may not be transparent to the active light.

亦可於膜基材1之表面設置易接著層、易滑層、離型層、防靜電層、硬塗層、抗反射層等功能性塗層。再者,如上所述,為了將膜基材1與黏著劑層2固著,較佳為不於膜基材1之黏著劑層2附設面設置離型層。Functional coatings such as an easy-adhesion layer, an easy-slip layer, a release layer, an antistatic layer, a hard coating layer, and an antireflection layer may also be provided on the surface of the film substrate 1. Furthermore, as described above, in order to fix the film substrate 1 and the adhesive layer 2, it is preferred not to provide a release layer on the surface of the film substrate 1 to which the adhesive layer 2 is attached.

<黏著劑層> 固著積層於膜基材1上之黏著劑層2包含光硬化性組合物,該光硬化性組合物包含基礎聚合物、光硬化劑及光聚合起始劑。黏著劑層2由於在光硬化前與裝置或裝置零件等被黏著體之接著力較小,因此容易剝離。黏著劑層2藉由光硬化而與被黏著體之接著力提昇,因此即便於使用裝置時,補強膜亦不易自裝置表面剝離,接著可靠性優異。 <Adhesive layer> The adhesive layer 2 fixedly laminated on the film substrate 1 includes a photocurable composition, which includes a base polymer, a photocuring agent, and a photopolymerization initiator. The adhesive layer 2 has a weak adhesion to the adherend such as the device or device parts before photocuring, so it is easy to peel off. The adhesive layer 2 has an enhanced adhesion to the adherend by photocuring, so even when the device is used, the reinforcement film is not easy to peel off from the device surface, and the adhesion reliability is excellent.

光硬化性之黏著劑於一般之保管環境中幾乎不進行硬化,而藉由紫外線等活性光線之照射而硬化。因此,本發明之補強膜具有如下優點:可任意地設定黏著劑層2之硬化時點,可靈活地應對步驟之準備時間等。Photocurable adhesives hardly cure in normal storage environments, but cure by exposure to active light such as ultraviolet rays. Therefore, the reinforcing film of the present invention has the following advantages: the curing time of the adhesive layer 2 can be set arbitrarily, and the preparation time of the steps can be flexibly responded to.

黏著劑層2之厚度例如為1~300 μm左右。黏著劑層2之厚度越大,則往往越會提高與被黏著體之接著性。另一方面,於黏著劑層2之厚度過大之情形時,存在光硬化前之流動性較高,不易處理之情況。因此,黏著劑層2之厚度較佳為3~100 μm,更佳為5~50 μm,進而較佳為6~40 μm,尤佳為8~30 μm。就薄型化之觀點而言,黏著劑層2之厚度可為25 μm以下、20 μm以下或18 μm以下。The thickness of the adhesive layer 2 is, for example, about 1 to 300 μm. The thicker the adhesive layer 2 is, the better the adhesion to the adherend. On the other hand, when the thickness of the adhesive layer 2 is too large, the fluidity before photocuring is higher, making it difficult to handle. Therefore, the thickness of the adhesive layer 2 is preferably 3 to 100 μm, more preferably 5 to 50 μm, further preferably 6 to 40 μm, and particularly preferably 8 to 30 μm. From the perspective of thinning, the thickness of the adhesive layer 2 may be less than 25 μm, less than 20 μm, or less than 18 μm.

於補強膜用於顯示器等光學裝置之情形時,黏著劑層2之全光線透過率較佳為80%以上,更佳為85%以上,進而較佳為90%以上。黏著劑層2之霧度較佳為2%以下,更佳為1%以下,進而較佳為0.7%以下,尤佳為0.5%以下。When the reinforcing film is used in an optical device such as a display, the total light transmittance of the adhesive layer 2 is preferably 80% or more, more preferably 85% or more, and further preferably 90% or more. The haze of the adhesive layer 2 is preferably 2% or less, more preferably 1% or less, further preferably 0.7% or less, and particularly preferably 0.5% or less.

以下,依次對構成黏著劑層2之光硬化性組合物之各成分之較佳形態進行說明。Hereinafter, preferred forms of the components of the photocurable composition constituting the adhesive layer 2 will be described in turn.

(基礎聚合物) 基礎聚合物為黏著劑組合物之主要構成成分,且為決定黏著劑層之接著力等之主要成分。黏著劑組合物含有丙烯酸系聚合物作為基礎聚合物。黏著劑組合物之50重量%以上較佳為丙烯酸系聚合物。丙烯酸系基礎聚合物之光學透明性及接著性優異,且容易控制接著力。(Base polymer) The base polymer is the main component of the adhesive composition and is the main component that determines the adhesion of the adhesive layer. The adhesive composition contains an acrylic polymer as the base polymer. Preferably, 50% by weight or more of the adhesive composition is an acrylic polymer. The acrylic base polymer has excellent optical transparency and adhesion, and the adhesion is easy to control.

作為丙烯酸系聚合物,適宜使用包含(甲基)丙烯酸烷基酯作為主要單體成分者。再者,於本說明書中,「(甲基)丙烯酸」意指丙烯酸及/或甲基丙烯酸。As the acrylic polymer, one containing an alkyl (meth)acrylate as a main monomer component is preferably used. In the present specification, "(meth)acrylic acid" means acrylic acid and/or methacrylic acid.

作為(甲基)丙烯酸烷基酯,適宜使用烷基之碳數為1~20之(甲基)丙烯酸烷基酯。(甲基)丙烯酸烷基酯之烷基可具有支鏈,亦可具有環狀烷基(脂環式烷基)。As the alkyl (meth)acrylate, preferably used is an alkyl (meth)acrylate having an alkyl group with a carbon number of 1 to 20. The alkyl group of the alkyl (meth)acrylate may have a branched chain or a cyclic alkyl group (alicyclic alkyl group).

作為具有鏈狀烷基之(甲基)丙烯酸烷基酯之具體例,可例舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸異戊酯、(甲基)丙烯酸新戊酯、(甲基)丙烯酸己酯、(甲基)丙烯酸庚酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸壬酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸十一烷基酯、(甲基)丙烯酸十二烷基酯、(甲基)丙烯酸異十三烷基酯、(甲基)丙烯酸十四烷基酯、(甲基)丙烯酸異十四烷基酯、(甲基)丙烯酸十五烷基酯、(甲基)丙烯酸十六烷基酯、(甲基)丙烯酸十七烷基酯、(甲基)丙烯酸十八烷基酯、(甲基)丙烯酸異十八烷基酯、(甲基)丙烯酸十九烷基酯、(甲基)丙烯酸二十烷基酯等。Specific examples of the alkyl (meth)acrylate having a chain alkyl group include methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, isobutyl (meth)acrylate, sec-butyl (meth)acrylate, tert-butyl (meth)acrylate, pentyl (meth)acrylate, isopentyl (meth)acrylate, neopentyl (meth)acrylate, hexyl (meth)acrylate, heptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, octyl (meth)acrylate, isooctyl (meth)acrylate, nonyl (meth)acrylate, isononyl (meth)acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, undecyl (meth)acrylate, dodecyl (meth)acrylate, isotridecyl (meth)acrylate, tetradecyl (meth)acrylate, isotetradecyl (meth)acrylate, pentadecyl (meth)acrylate, hexadecyl (meth)acrylate, heptadecyl (meth)acrylate, octadecyl (meth)acrylate, isooctadecyl (meth)acrylate, nonadecyl (meth)acrylate, eicosyl (meth)acrylate, and the like.

作為具有脂環式烷基之(甲基)丙烯酸烷基酯之具體例,可例舉:(甲基)丙烯酸環戊酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸環庚酯、(甲基)丙烯酸環辛酯等(甲基)丙烯酸環烷基酯;(甲基)丙烯酸異𦯉基酯等具有二環式之脂肪族烴環之(甲基)丙烯酸酯;(甲基)丙烯酸二環戊酯、(甲基)丙烯酸二環戊氧基乙酯、(甲基)丙烯酸三環戊酯、(甲基)丙烯酸1-金剛烷基酯、(甲基)丙烯酸2-甲基-2-金剛烷基酯、(甲基)丙烯酸2-乙基-2-金剛烷基酯等具有三環以上之脂肪族烴環之(甲基)丙烯酸酯。具有脂環式烷基之(甲基)丙烯酸烷基酯可於(甲基)丙烯酸3,3,5-三甲基環己酯等之環上具有取代基。又,具有脂環式烷基之(甲基)丙烯酸烷基酯可為(甲基)丙烯酸二環戊烯酯等包含脂環結構與具有不飽和鍵之環結構之縮合環的(甲基)丙烯酸酯。Specific examples of the alkyl (meth)acrylate having an alicyclic alkyl group include: cycloalkyl (meth)acrylates such as cyclopentyl (meth)acrylate, cyclohexyl (meth)acrylate, cycloheptyl (meth)acrylate, and cyclooctyl (meth)acrylate; (meth)acrylates having a dicyclic aliphatic hydrocarbon ring such as isobutyl (meth)acrylate; and (meth)acrylates having a tricyclic or more aliphatic hydrocarbon ring such as dicyclopentyl (meth)acrylate, dicyclopentyloxyethyl (meth)acrylate, tricyclopentyl (meth)acrylate, 1-adamantyl (meth)acrylate, 2-methyl-2-adamantyl (meth)acrylate, and 2-ethyl-2-adamantyl (meth)acrylate. The alkyl (meth)acrylate having an alicyclic alkyl group may have a substituent on the ring such as 3,3,5-trimethylcyclohexyl (meth)acrylate. The alkyl (meth)acrylate having an alicyclic alkyl group may be a (meth)acrylate having a condensed ring of an alicyclic structure and a ring structure having an unsaturated bond such as dicyclopentenyl (meth)acrylate.

相對於構成聚合物之單體成分總量100重量份,(甲基)丙烯酸烷基酯之含量較佳為50重量份以上,更佳為60重量份以上,亦可為70重量份以上、80重量份以上、90重量份以上或95重量份以上。The content of the alkyl (meth)acrylate is preferably 50 parts by weight or more, more preferably 60 parts by weight or more, and may be 70 parts by weight or more, 80 parts by weight or more, 90 parts by weight or more, or 95 parts by weight or more, relative to 100 parts by weight of the total monomer components constituting the polymer.

就降低丙烯酸系基礎聚合物之玻璃轉移溫度(Tg),提高較寬之溫度範圍內之接著力之觀點而言,(甲基)丙烯酸烷基酯之烷基較佳為鏈狀烷基。鏈狀烷基可為直鏈,亦可具有支鏈。From the viewpoint of lowering the glass transition temperature (Tg) of the acrylic-based polymer and improving the adhesive force in a wider temperature range, the alkyl group of the (meth)acrylic acid alkyl ester is preferably a chain alkyl group. The chain alkyl group may be a straight chain or a branched chain.

於本發明中,丙烯酸系基礎聚合物包含烷基之碳數為6~9之(甲基)丙烯酸C 6-9烷基酯及烷基之碳數為10~20之(甲基)丙烯酸C 10-20烷基酯作為單體成分。 In the present invention, the acrylic base polymer comprises, as monomer components, C 6-9 alkyl (meth)acrylate having an alkyl group with 6 to 9 carbon atoms and C 10-20 alkyl (meth)acrylate having an alkyl group with 10 to 20 carbon atoms.

由於(甲基)丙烯酸C 6-9烷基酯之均聚物之玻璃轉移溫度(Tg)較低,因此藉由使丙烯酸系基礎聚合物包含(甲基)丙烯酸C 6-9烷基酯作為單體成分,丙烯酸系基礎聚合物之Tg降低。就降低Tg之觀點而言,(甲基)丙烯酸C 6-9烷基酯之中,較佳為均聚物之玻璃轉移溫度為-50℃以下者。 Since the glass transition temperature (Tg) of the homopolymer of C6-9 alkyl (meth)acrylate is relatively low, the Tg of the acrylic base polymer is lowered by including C6-9 alkyl (meth)acrylate as a monomer component. From the viewpoint of lowering Tg, among C6-9 alkyl (meth)acrylate, those having a homopolymer glass transition temperature of -50°C or less are preferred.

作為均聚物之玻璃轉移溫度為-50℃以下之(甲基)丙烯酸C 6-9烷基酯之具體例,可例舉:丙烯酸2-乙基己酯(Tg:-70℃)、丙烯酸正己酯(Tg:-65℃)、丙烯酸正辛酯(Tg:-65℃)、丙烯酸異壬酯(Tg:-60℃)、丙烯酸正壬酯(Tg:-58℃)、丙烯酸異辛酯(Tg:-58℃)等。其等之中,就Tg較低且能夠實現黏著劑之低儲存彈性模數化之方面而言,較佳為丙烯酸2-乙基己酯及丙烯酸正辛酯。 Specific examples of (meth)acrylic acid C6-9 alkyl esters having a homopolymer glass transition temperature of -50°C or less include: 2-ethylhexyl acrylate (Tg: -70°C), n-hexyl acrylate (Tg: -65°C), n-octyl acrylate (Tg: -65°C), isononyl acrylate (Tg: -60°C), n-nonyl acrylate (Tg: -58°C), isooctyl acrylate (Tg: -58°C), etc. Among them, 2-ethylhexyl acrylate and n-octyl acrylate are preferred in terms of having a lower Tg and being able to achieve a low storage elastic modulus of the adhesive.

關於丙烯酸系基礎聚合物,較佳為構成單體中含量最多之單體(主要單體)為(甲基)丙烯酸C 6-9烷基酯。相對於聚合物之構成單體成分總量100重量份,(甲基)丙烯酸C 6-9烷基酯之量較佳為40重量份以上,更佳為50重量份以上,亦可為55重量份以上、60重量份以上或65重量份以上。 With respect to the acrylic-based polymer, it is preferred that the monomer with the largest content (main monomer) among the constituent monomers is C 6-9 alkyl (meth)acrylate. The amount of C 6-9 alkyl (meth)acrylate is preferably 40 parts by weight or more, more preferably 50 parts by weight or more, and may also be 55 parts by weight or more, 60 parts by weight or more, or 65 parts by weight or more, relative to 100 parts by weight of the total amount of the constituent monomer components of the polymer.

(甲基)丙烯酸C 10-20烷基酯之均聚物於較Tg更高之溫度下,具有黏彈性之溫度依存較小之溫度範圍(平線區範圍)。因此,藉由使基礎聚合物包含(甲基)丙烯酸C 10-20烷基酯作為單體成分,儲存彈性模數之溫度依存變小,並且存在伴隨溫度變化所產生之被黏著體之翹曲、或補強膜自被黏著體剝離之現象受抑制之情況。 The homopolymer of C 10-20 alkyl (meth)acrylate has a temperature range (flat zone range) in which the temperature dependence of viscoelasticity is small at a temperature higher than Tg. Therefore, by making the base polymer contain C 10-20 alkyl (meth)acrylate as a monomer component, the temperature dependence of the storage elastic modulus becomes small, and there is a situation that the warping of the adherend or the peeling of the reinforcing film from the adherend caused by temperature changes is suppressed.

由於平線區範圍之溫度範圍較寬,且平線區範圍內之儲存彈性模數較小,因此於(甲基)丙烯酸C 10-20鏈狀烷基酯中,較佳為(甲基)丙烯酸C 12-18烷基酯。其中,較佳為(甲基)丙烯酸十二烷基酯及(甲基)丙烯酸異硬脂酯,尤佳為丙烯酸十二烷基酯(丙烯酸月桂酯)。 Since the temperature range of the plateau region is wide and the storage elastic modulus in the plateau region is small, among the C 10-20 chain alkyl (meth)acrylates, C 12-18 alkyl (meth)acrylates are preferred. Among them, lauryl (meth)acrylate and isostearyl (meth)acrylate are preferred, and lauryl acrylate (lauryl acrylate) is particularly preferred.

相對於聚合物之構成單體成分總量100重量份,(甲基)丙烯酸C 10-20烷基酯之量較佳為1~40重量份,更佳為2~30重量份,進而較佳為3~25重量份,亦可為4~20重量份或5~15重量份。 The amount of C 10-20 alkyl (meth)acrylate is preferably 1 to 40 parts by weight, more preferably 2 to 30 parts by weight, further preferably 3 to 25 parts by weight, and may also be 4 to 20 parts by weight or 5 to 15 parts by weight, relative to 100 parts by weight of the total monomer components of the polymer.

丙烯酸系基礎聚合物亦可包含除(甲基)丙烯酸C 6-9烷基酯及(甲基)丙烯酸C 10-20烷基酯以外之(甲基)丙烯酸烷基酯作為單體成分。作為除上述以外之(甲基)丙烯酸烷基酯,較佳為丙烯酸丁酯等(甲基)丙烯酸C 1-5烷基酯。 The acrylic base polymer may also contain (meth)acrylic acid alkyl esters other than (meth)acrylic acid C6-9 alkyl esters and (meth)acrylic acid C10-20 alkyl esters as monomer components. As (meth)acrylic acid alkyl esters other than the above, (meth)acrylic acid C1-5 alkyl esters such as butyl acrylate are preferred.

丙烯酸系基礎聚合物除含有(甲基)丙烯酸烷基酯作為構成單體成分以外,亦含有含羥基單體及/或含羧基單體作為構成單體成分。基礎聚合物之羥基或羧基為與下述交聯劑之反應點。例如,於使用異氰酸酯系交聯劑之情形時,較佳為含有含羥基單體作為基礎聚合物之單體成分。於使用環氧系交聯劑之情形時,較佳為含有含羧基單體作為基礎聚合物之單體成分。藉由向基礎聚合物中導入交聯結構,有凝集力提高,光硬化前之黏著劑層2與被黏著體之剝離性提高之傾向。In addition to containing (meth) alkyl acrylate as a constituent monomer component, the acrylic base polymer also contains a hydroxyl-containing monomer and/or a carboxyl-containing monomer as a constituent monomer component. The hydroxyl group or carboxyl group of the base polymer is a reaction point with the following crosslinking agent. For example, when using an isocyanate crosslinking agent, it is preferred to contain a hydroxyl-containing monomer as a monomer component of the base polymer. When using an epoxy crosslinking agent, it is preferred to contain a carboxyl-containing monomer as a monomer component of the base polymer. By introducing a crosslinking structure into the base polymer, there is a tendency that the cohesive force is improved, and the releasability of the adhesive layer 2 and the adherend before light curing is improved.

作為含羥基單體,可例舉:(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸6-羥基己酯、(甲基)丙烯酸8-羥基辛酯、(甲基)丙烯酸10-羥基癸酯、(甲基)丙烯酸12-羥基月桂酯、(甲基)丙烯酸4-(羥甲基)環己基甲酯等。其等之中,就對提高光硬化後之黏著劑之接著力之貢獻較大之方面而言,較佳為丙烯酸2-羥基乙酯及丙烯酸4-羥基丁酯。Examples of the hydroxyl group-containing monomer include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate, 6-hydroxyhexyl (meth)acrylate, 8-hydroxyoctyl (meth)acrylate, 10-hydroxydecyl (meth)acrylate, 12-hydroxylauryl (meth)acrylate, 4-(hydroxymethyl)cyclohexylmethyl (meth)acrylate, etc. Among them, 2-hydroxyethyl acrylate and 4-hydroxybutyl acrylate are preferred in terms of their greater contribution to improving the adhesion of the adhesive after light curing.

作為含羧基單體,可例舉:(甲基)丙烯酸、(甲基)丙烯酸2-羧基乙酯、(甲基)丙烯酸羧基戊酯、伊康酸、馬來酸、富馬酸、丁烯酸等。其中,就容易藉由提高黏著劑之凝集性而使接著力及接著保持力提昇之方面而言,較佳為丙烯酸及甲基丙烯酸,尤佳為丙烯酸。Examples of carboxyl group-containing monomers include (meth)acrylic acid, 2-carboxyethyl (meth)acrylate, carboxypentyl (meth)acrylate, itaconic acid, maleic acid, fumaric acid, crotonic acid, etc. Among them, acrylic acid and methacrylic acid are preferred, and acrylic acid is particularly preferred, in terms of improving the cohesiveness of the adhesive and thereby increasing the adhesion and adhesion retention.

就適度導入由異氰酸酯系交聯劑或環氧系交聯劑等交聯劑形成之交聯結構之觀點而言,相對於丙烯酸系基礎聚合物之構成單體成分總量100重量份,含羥基單體與含羧基單體之合計量較佳為0.3重量份以上,更佳為0.5重量份以上,亦可為0.7重量份以上或1.0重量份以上。From the viewpoint of appropriately introducing a crosslinking structure formed by a crosslinking agent such as an isocyanate crosslinking agent or an epoxy crosslinking agent, the total amount of the hydroxyl group-containing monomer and the carboxyl group-containing monomer is preferably 0.3 parts by weight or more, more preferably 0.5 parts by weight or more, and may also be 0.7 parts by weight or more or 1.0 parts by weight or more, relative to 100 parts by weight of the total amount of the constituent monomer components of the acrylic base polymer.

由於羥基或羧基為高極性,因此於丙烯酸系基礎聚合物之構成單體成分中之含羥基單體或含羧基單體之量較多之情形時,有聚合物之凝集力提高,光硬化後之黏著劑層之儲存彈性模數變大之傾向。就降低黏著劑層2之儲存彈性模數之觀點而言,相對於丙烯酸系基礎聚合物之構成單體成分總量100重量份,含羥基單體與含羧基單體之合計量較佳為20重量份以下,更佳為15重量份以下,進而較佳為10重量份以下,亦可為7重量份以下或5重量份以下。Since hydroxyl or carboxyl groups are highly polar, when the amount of hydroxyl-containing monomers or carboxyl-containing monomers in the monomer components of the acrylic-based polymer is relatively large, the cohesive force of the polymer is increased, and the storage modulus of the adhesive layer after light curing tends to be larger. From the viewpoint of reducing the storage modulus of the adhesive layer 2, the total amount of hydroxyl-containing monomers and carboxyl-containing monomers is preferably 20 parts by weight or less, more preferably 15 parts by weight or less, and further preferably 10 parts by weight or less, and may also be 7 parts by weight or less or 5 parts by weight or less, relative to 100 parts by weight of the total amount of the monomer components of the acrylic-based polymer.

丙烯酸系基礎聚合物含有含氮原子單體作為構成單體成分。由於含氮原子單體為高極性,凝集力較高,且均聚物之玻璃轉移溫度較高,因此藉由使丙烯酸系基礎聚合物含有含氮原子單體作為單體成分,有光硬化後之黏著劑層於高溫下之接著力提昇之傾向。The acrylic base polymer contains nitrogen-containing monomers as constituent monomer components. Since nitrogen-containing monomers are highly polar, have high cohesive force, and have a high glass transition temperature of the homopolymer, the adhesive layer after light curing tends to have improved adhesion at high temperatures by making the acrylic base polymer contain nitrogen-containing monomers as monomer components.

作為含氮原子單體,可例舉:N-乙烯基吡咯啶酮、甲基乙烯基吡咯啶酮、乙烯基吡啶、乙烯基哌啶酮、乙烯基嘧啶、乙烯基哌𠯤、乙烯基吡𠯤、乙烯基吡咯、乙烯基咪唑、乙烯基㗁唑、乙烯基𠰌啉、N-丙烯醯𠰌啉、N-乙烯基羧醯胺類、N-乙烯基己內醯胺等。其等之中,就凝集力較高且對提昇高溫下之接著力之貢獻較大之方面而言,尤佳為N-乙烯基吡咯啶酮。Examples of nitrogen atom-containing monomers include N-vinylpyrrolidone, methylvinylpyrrolidone, vinylpyridine, vinylpiperidone, vinylpyrimidine, vinylpiperidone, vinylpyrrolidone, vinylpyrrole, vinylimidazole, vinyloxazole, vinyloxaline, N-acryloyloxaline, N-vinylcarboxamides, and N-vinylcaprolactam. Among them, N-vinylpyrrolidone is particularly preferred because it has a high cohesive force and contributes greatly to improving the adhesive force at high temperatures.

於丙烯酸系基礎聚合物含有含氮原子單體作為單體成分之情形時,就提高光硬化後之黏著劑層於高溫下之接著力之觀點而言,相對於聚合物之構成單體成分總量100重量份,含氮原子單體之量較佳為0.3重量份以上,更佳為0.5重量份以上,亦可為0.7重量份以上。含氮原子單體即便為少量亦有助於提昇高溫下之接著力。When the acrylic base polymer contains a nitrogen-containing monomer as a monomer component, from the viewpoint of improving the adhesion of the adhesive layer at high temperature after light curing, the amount of the nitrogen-containing monomer is preferably 0.3 parts by weight or more, more preferably 0.5 parts by weight or more, and can also be 0.7 parts by weight or more relative to 100 parts by weight of the total amount of the monomer components constituting the polymer. Even a small amount of the nitrogen-containing monomer helps to improve the adhesion at high temperature.

於丙烯酸系基礎聚合物之構成單體成分中之含氮原子單體之量較多之情形時,基礎聚合物之凝集力變高,有黏著劑層之玻璃轉移溫度變高之傾向,伴隨於此,有光硬化後之黏著劑層之儲存彈性模數變大之傾向。又,於含氮原子單體之量較多之情形時,光硬化前之黏著劑層2之接著力較高,有補強膜不易自被黏著體剝離之傾向,尤其對經電漿處理等表面活化處理之被黏著體,該傾向較為顯著。就降低光硬化前之黏著劑之接著力以及降低光硬化後之黏著劑之儲存彈性模數之觀點而言,相對於丙烯酸系基礎聚合物之構成單體成分總量100重量份,含氮原子單體之量較佳為10重量份以下,更佳為7重量份以下,亦可為5重量份以下或3重量份以下。When the amount of nitrogen-containing monomers in the monomer components of the acrylic base polymer is relatively high, the cohesive force of the base polymer becomes higher, and the glass transition temperature of the adhesive layer tends to be higher. As a result, the storage elastic modulus of the adhesive layer after light curing tends to be larger. In addition, when the amount of nitrogen-containing monomers is relatively high, the adhesive layer 2 before light curing has a higher adhesion force, and the reinforcing film tends to be difficult to peel off from the adherend. This tendency is particularly significant for the adherend that has been subjected to surface activation treatment such as plasma treatment. From the viewpoint of reducing the adhesion of the adhesive before photocuring and reducing the storage elastic modulus of the adhesive after photocuring, the amount of nitrogen atom-containing monomers is preferably 10 parts by weight or less, more preferably 7 parts by weight or less, and may be 5 parts by weight or less or 3 parts by weight or less, relative to 100 parts by weight of the total amount of monomer components constituting the acrylic base polymer.

丙烯酸系基礎聚合物亦可包含除上述以外之單體成分。丙烯酸系基礎聚合物例如亦可包含乙烯酯單體、芳香族乙烯基單體、含環氧基單體、乙烯醚單體、含磺基單體、含磷酸基單體、含酸酐基單體等作為單體成分。The acrylic base polymer may also contain monomer components other than the above. For example, the acrylic base polymer may also contain vinyl ester monomers, aromatic vinyl monomers, epoxy-containing monomers, vinyl ether monomers, sulfone-containing monomers, phosphoric acid-containing monomers, acid anhydride-containing monomers, etc. as monomer components.

就使黏著劑具有優異之接著性之觀點而言,丙烯酸系基礎聚合物之玻璃轉移溫度較佳為-30℃以下,更佳為-40℃以下,進而較佳為-50℃以下,亦可為-55℃以下或-60℃以下。丙烯酸系基礎聚合物之玻璃轉移溫度通常為-100℃以上,亦可為-80℃以上或-70℃以上。From the viewpoint of making the adhesive have excellent adhesion, the glass transition temperature of the acrylic base polymer is preferably -30°C or lower, more preferably -40°C or lower, further preferably -50°C or lower, and may be -55°C or lower or -60°C or lower. The glass transition temperature of the acrylic base polymer is usually -100°C or higher, and may be -80°C or higher or -70°C or higher.

玻璃轉移溫度(Tg)係黏彈性測定中之損耗正切tanδ為極大之溫度(峰頂溫度)。亦可使用理論玻璃轉移溫度來代替藉由黏彈性測定所得之玻璃轉移溫度。理論Tg係根據聚合物之構成單體成分之均聚物之玻璃轉移溫度Tg i及各單體成分之重量分率W i並藉由下述Fox公式而算出。 1/Tg=Σ(W i/Tg i) The glass transition temperature (Tg) is the temperature (peak temperature) at which the loss tangent tanδ in the viscoelastic measurement is maximum. The theoretical glass transition temperature can also be used instead of the glass transition temperature obtained by the viscoelastic measurement. The theoretical Tg is calculated by the following Fox formula based on the glass transition temperature Tg i of the homopolymer of the monomer components constituting the polymer and the weight fraction Wi of each monomer component. 1/Tg = Σ( Wi /Tg i )

Tg為聚合物之理論玻璃轉移溫度(單位:K),W i為單體成分i之重量分率(重量基準之共聚比率),Tg i為單體成分i之均聚物之玻璃轉移溫度(單位:K)。均聚物之玻璃轉移溫度可採用Polymer Handbook第3版(John Wiley & Sons, Inc., 1989年)中所記載之數值。上述文獻中未記載之單體之均聚物之玻璃轉移溫度採用藉由動態黏彈性測定所得之tanδ之峰頂溫度即可。 Tg is the theoretical glass transition temperature of the polymer (unit: K), Wi is the weight fraction of monomer component i (copolymerization ratio based on weight), and Tgi is the glass transition temperature of the homopolymer of monomer component i (unit: K). The glass transition temperature of the homopolymer can be the value recorded in the Polymer Handbook, 3rd edition (John Wiley & Sons, Inc., 1989). The glass transition temperature of the homopolymer of the monomer not recorded in the above literature can be the peak temperature of tanδ obtained by dynamic viscoelastic measurement.

藉由溶液聚合、乳化聚合、塊狀聚合等各種公知之方法使上述單體成分聚合,藉此可獲得作為基礎聚合物之丙烯酸系聚合物。就黏著劑之接著力、保持力等特性之平衡、或成本等觀點而言,較佳為溶液聚合法。溶液聚合之溶劑使用乙酸乙酯、甲苯等。溶液濃度通常為20~80重量%左右。溶液聚合所使用之聚合起始劑可使用偶氮系、過氧化物系等各種公知者。為了調整分子量,亦可使用鏈轉移劑。反應溫度通常為50~80℃左右,反應時間通常為1~8小時左右。The above-mentioned monomer components are polymerized by various known methods such as solution polymerization, emulsion polymerization, and bulk polymerization, thereby obtaining an acrylic polymer as a base polymer. From the perspective of the balance of the adhesive's adhesion, retention, and other properties, or the cost, solution polymerization is preferred. Ethyl acetate, toluene, and the like are used as solvents for solution polymerization. The solution concentration is usually around 20 to 80% by weight. The polymerization initiator used for solution polymerization can be azo, peroxide, and other known ones. In order to adjust the molecular weight, a chain transfer agent can also be used. The reaction temperature is usually around 50 to 80°C, and the reaction time is usually around 1 to 8 hours.

丙烯酸系基礎聚合物之重量平均分子量較佳為20萬以上,更佳為30萬以上,進而較佳為50萬以上。基礎聚合物之重量平均分子量越大,有高溫下之接著力越高之傾向。丙烯酸系基礎聚合物之重量平均分子量亦可為100萬以上、130萬以上、150萬以上、160萬以上或170萬以上。The weight average molecular weight of the acrylic base polymer is preferably 200,000 or more, more preferably 300,000 or more, and further preferably 500,000 or more. The larger the weight average molecular weight of the base polymer, the higher the adhesion at high temperature tends to be. The weight average molecular weight of the acrylic base polymer may also be 1 million or more, 1.3 million or more, 1.5 million or more, 1.6 million or more, or 1.7 million or more.

若基礎聚合物之重量平均分子量過大,則有黏著劑之儲存彈性模數變大,接著力及柔軟性降低之傾向。因此,丙烯酸系基礎聚合物之重量平均分子量較佳為300萬以下,更佳為250萬以下,亦可為220萬以下或200萬以下。於基礎聚合物中導入有交聯結構之情形時,基礎聚合物之分子量係指導入交聯結構之前之分子量。If the weight average molecular weight of the base polymer is too large, the storage elastic modulus of the adhesive will increase, and the adhesion and flexibility will tend to decrease. Therefore, the weight average molecular weight of the acrylic base polymer is preferably 3 million or less, more preferably 2.5 million or less, and may also be 2.2 million or less or 2 million or less. When a cross-linked structure is introduced into the base polymer, the molecular weight of the base polymer refers to the molecular weight before the cross-linked structure is introduced.

(交聯劑) 就使黏著劑具有適度之凝集力,表現出接著力,並且確保光硬化前之黏著劑層自被黏著體之剝離性之觀點而言,較佳為向基礎聚合物中導入交聯結構。例如,向使基礎聚合物聚合後之溶液中添加交聯劑,視需要進行加熱,藉此導入交聯結構。交聯劑於1分子中具有2個以上之交聯性官能基。交聯劑亦可為1分子中具有3個以上之交聯性官能基者。 (Crosslinking agent) From the perspective of giving the adhesive an appropriate cohesive force, showing adhesion, and ensuring the peelability of the adhesive layer from the adherend before light curing, it is better to introduce a crosslinking structure into the base polymer. For example, a crosslinking agent is added to a solution after the base polymer is polymerized, and heating is performed as needed to introduce a crosslinking structure. The crosslinking agent has two or more crosslinking functional groups in one molecule. The crosslinking agent may also have three or more crosslinking functional groups in one molecule.

作為交聯劑,可例舉:異氰酸酯系交聯劑、環氧系交聯劑、㗁唑啉系交聯劑、氮丙啶系交聯劑、碳二醯亞胺系交聯劑、金屬螯合物系交聯劑等。該等交聯劑與導入至丙烯酸系基礎聚合物中之羥基或羧基等官能基進行反應而形成交聯結構。就與丙烯酸系基礎聚合物之羥基或羧基之反應性較高,容易導入交聯結構之方面而言,較佳為異氰酸酯系交聯劑及環氧系交聯劑。Examples of the crosslinking agent include isocyanate crosslinking agents, epoxy crosslinking agents, oxazoline crosslinking agents, aziridine crosslinking agents, carbodiimide crosslinking agents, and metal chelate crosslinking agents. These crosslinking agents react with functional groups such as hydroxyl groups or carboxyl groups introduced into the acrylic base polymer to form a crosslinking structure. Isocyanate crosslinking agents and epoxy crosslinking agents are preferred because they have a high reactivity with hydroxyl groups or carboxyl groups of the acrylic base polymer and are easy to introduce into the crosslinking structure.

作為異氰酸酯系交聯劑,使用1分子中具有2個以上之異氰酸基之多異氰酸酯。異氰酸酯系交聯劑亦可為1分子中具有3個以上之異氰酸基者。作為異氰酸酯系交聯劑,例如可例舉:伸丁基二異氰酸酯、六亞甲基二異氰酸酯等低級脂肪族多異氰酸酯類;伸環戊基二異氰酸酯、伸環己基二異氰酸酯、異佛爾酮二異氰酸酯等脂環族異氰酸酯類;2,4-甲苯二異氰酸酯、4,4'-二苯基甲烷二異氰酸酯、苯二甲基二異氰酸酯等芳香族異氰酸酯類;三羥甲基丙烷/甲苯二異氰酸酯三聚物加成物(例如三井化學製造之「Takenate D101E」)、三羥甲基丙烷/六亞甲基二異氰酸酯三聚物加成物(例如東曹製造之「Coronate HL」)、苯二甲基二異氰酸酯之三羥甲基丙烷加成物(例如三井化學製造之「Takenate D110N」)、六亞甲基二異氰酸酯之異氰尿酸酯體(例如東曹製造之「Coronate HX」)等異氰酸酯加成物等。作為異氰酸酯系交聯劑,亦可使用具有縮二脲基之異氰酸酯化合物(例如旭化成製造之「Duranate 24A-100」)或具有脲基甲酸酯基之異氰酸酯化合物。As the isocyanate crosslinking agent, a polyisocyanate having two or more isocyanate groups in one molecule is used. The isocyanate crosslinking agent may also have three or more isocyanate groups in one molecule. Examples of the isocyanate crosslinking agent include low-order aliphatic polyisocyanates such as butyl diisocyanate and hexamethylene diisocyanate; alicyclic isocyanates such as cyclopentyl diisocyanate, cyclohexyl diisocyanate, and isophorone diisocyanate; aromatic isocyanates such as 2,4-toluene diisocyanate, 4,4'-diphenylmethane diisocyanate, and xylylene diisocyanate; trihydroxymethylpropane/toluene diisocyanate trimer adducts (e.g., "Takenate D101E" manufactured by Mitsui Chemicals), trihydroxymethylpropane/hexamethylene diisocyanate trimer adducts (e.g., "Coronate D101E" manufactured by Tosoh Corporation); Isocyanate adducts such as "HL" produced by Mitsui Chemicals), trihydroxymethylpropane adducts of xylylene diisocyanate (e.g. "Takenate D110N" produced by Mitsui Chemicals), isocyanurate of hexamethylene diisocyanate (e.g. "Coronate HX" produced by Tosoh), etc. As the isocyanate crosslinking agent, isocyanate compounds having a biuret group (e.g. "Duranate 24A-100" produced by Asahi Kasei) or isocyanate compounds having an allophanate group can also be used.

作為環氧系交聯劑,使用1分子中具有2個以上之環氧基之多官能環氧化合物。環氧系交聯劑亦可為1分子中具有3個以上或4個以上之環氧基者。環氧系交聯劑之環氧基可為縮水甘油基。作為環氧系交聯劑,例如可例舉:N,N,N',N'-四縮水甘油基間苯二甲胺、二縮水甘油基苯胺、1,3-雙(N,N-二縮水甘油胺甲基)環己烷、1,6-己二醇二縮水甘油醚、新戊二醇二縮水甘油醚、乙二醇二縮水甘油醚、丙二醇二縮水甘油醚、聚乙二醇二縮水甘油醚、聚丙二醇二縮水甘油醚、山梨醇聚縮水甘油醚、甘油聚縮水甘油醚、新戊四醇聚縮水甘油醚、聚甘油聚縮水甘油醚、山梨醇酐聚縮水甘油醚、三羥甲基丙烷聚縮水甘油醚、己二酸二縮水甘油酯、鄰苯二甲酸二縮水甘油酯、異氰尿酸三縮水甘油基-三(2-羥基乙基)酯、間苯二酚二縮水甘油醚、雙酚S-二縮水甘油醚等。作為環氧系交聯劑,亦可使用長瀨化成製造之「Denacol」、三菱瓦斯化學製造之「Tetrad X」、「Tetrad C」等市售品。As the epoxy crosslinking agent, a polyfunctional epoxy compound having two or more epoxy groups in one molecule is used. The epoxy crosslinking agent may also be one having three or more or four or more epoxy groups in one molecule. The epoxy group of the epoxy crosslinking agent may be a glycidyl group. Examples of the epoxy crosslinking agent include: N,N,N',N'-tetraglycidyl meta-xylylenediamine, diglycidylaniline, 1,3-bis(N,N-diglycidylaminomethyl)cyclohexane, 1,6-hexanediol diglycidyl ether, neopentyl glycol diglycidyl ether, ethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, and the like. Oleyl ether, sorbitol polyglycidyl ether, glycerol polyglycidyl ether, pentaerythritol polyglycidyl ether, polyglycerol polyglycidyl ether, sorbitan polyglycidyl ether, trihydroxymethylpropane polyglycidyl ether, adipate diglycidyl, phthalate diglycidyl, isocyanuric acid triglycidyl-tri(2-hydroxyethyl) ester, resorcinol diglycidyl ether, bisphenol S-diglycidyl ether, etc. As the epoxy-based crosslinking agent, commercially available products such as "Denacol" manufactured by Nagase Chemicals, "Tetrad X" and "Tetrad C" manufactured by Mitsubishi Gas Chemicals, etc. can also be used.

交聯劑之使用量只要根據丙烯酸系基礎聚合物之組成或分子量等適當調整即可,相對於丙烯酸系基礎聚合物100重量份,較佳為0.01~3重量份左右。交聯劑之量越多,則基礎聚合物之交聯密度越高,越對光硬化前之黏著劑層賦予適度之硬度,儲存彈性模數越大,有將補強膜自被黏著體剝離時之被黏著體上之糊劑殘留受抑制之傾向。另一方面,若交聯劑之量過多,則有光硬化後之黏著劑層之接著力降低之傾向,尤其是高溫下之接著力容易變小。又,於交聯劑之量較多之情形時,有光硬化後之黏著劑層於低溫下之儲存彈性模數變大之傾向,可能會導致被黏著體因溫度變化而發生翹曲或補強膜因溫度變化而自被黏著體剝離。就兼顧光硬化前之黏著劑層之低接著力性(輕剝離性)及光硬化後之黏著劑層之高接著力,並且降低儲存彈性模數之觀點而言,相對於丙烯酸系基礎聚合物100重量份,交聯劑之量更佳為0.05~1.0重量份,進而較佳為0.1~0.7重量份,亦可為0.15~0.6重量份、0.2~0.5重量份或0.25~0.4重量份。The amount of crosslinking agent used can be appropriately adjusted according to the composition or molecular weight of the acrylic base polymer, and is preferably about 0.01 to 3 parts by weight relative to 100 parts by weight of the acrylic base polymer. The more the amount of crosslinking agent, the higher the crosslinking density of the base polymer, the more appropriate hardness is given to the adhesive layer before light curing, the larger the storage elastic modulus, and the tendency to suppress the paste residue on the adherend when the reinforcing film is peeled off from the adherend. On the other hand, if the amount of crosslinking agent is too much, the adhesion of the adhesive layer after light curing tends to decrease, especially the adhesion at high temperature tends to decrease. Furthermore, when the amount of the crosslinking agent is large, the storage elastic modulus of the adhesive layer after light curing tends to increase at low temperatures, which may cause the adherend to warp due to temperature changes or the reinforcing film to peel off from the adherend due to temperature changes. From the viewpoint of achieving both low adhesion (easy peelability) of the adhesive layer before photocuring and high adhesion of the adhesive layer after photocuring, and reducing the storage elastic modulus, the amount of the crosslinking agent is preferably 0.05 to 1.0 part by weight, further preferably 0.1 to 0.7 part by weight, and may also be 0.15 to 0.6 part by weight, 0.2 to 0.5 part by weight, or 0.25 to 0.4 part by weight, relative to 100 parts by weight of the acrylic base polymer.

(光硬化劑) 構成黏著劑層2之黏著劑組合物除含有基礎聚合物以外,亦含有1分子中具有2個以上之光聚合性官能基之化合物作為光硬化劑。含有光硬化劑之黏著劑組合物具有光硬化性,若在與被黏著體貼合後進行光硬化,則與被黏著體之接著力提昇。 (Photocuring agent) The adhesive composition constituting the adhesive layer 2 contains, in addition to the base polymer, a compound having two or more photopolymerizable functional groups in one molecule as a photocuring agent. The adhesive composition containing the photocuring agent has photocuring properties, and if it is photocured after being attached to an adherend, the adhesion to the adherend is improved.

就與基礎聚合物之相溶性之觀點而言,光硬化劑較佳為常溫下為液體者。光硬化劑之光聚合性官能基較佳為具有基於光自由基反應之聚合性者,作為光硬化劑,較佳為1分子中具有2個以上之乙烯性不飽和鍵之化合物,就表現出與丙烯酸系基礎聚合物之適度之相溶性之方面而言,較佳為多官能(甲基)丙烯酸酯。From the perspective of compatibility with the base polymer, the photocuring agent is preferably a liquid at room temperature. The photopolymerizable functional group of the photocuring agent is preferably a polymerizable group based on a photo-free radical reaction. As the photocuring agent, a compound having two or more ethylenically unsaturated bonds in one molecule is preferred. From the perspective of showing a moderate degree of compatibility with the acrylic base polymer, a multifunctional (meth)acrylate is preferred.

於本發明中,光硬化劑併用不具有胺基甲酸酯鍵之多官能(甲基)丙烯酸酯與具有胺基甲酸酯鍵之多官能(甲基)丙烯酸酯。即,構成黏著劑層2之光硬化性組合物包含不具有胺基甲酸酯鍵之多官能(甲基)丙烯酸酯、及具有胺基甲酸酯鍵之多官能(甲基)丙烯酸酯。以下,將具有胺基甲酸酯鍵之多官能(甲基)丙烯酸酯記載為「胺基甲酸酯(甲基)丙烯酸酯」。又,有時將不具有胺基甲酸酯鍵之多官能(甲基)丙烯酸酯僅記載為「多官能(甲基)丙烯酸酯」。In the present invention, the photocuring agent uses a multifunctional (meth)acrylate without a urethane bond and a multifunctional (meth)acrylate with a urethane bond. That is, the photocurable composition constituting the adhesive layer 2 includes a multifunctional (meth)acrylate without a urethane bond and a multifunctional (meth)acrylate with a urethane bond. Hereinafter, the multifunctional (meth)acrylate with a urethane bond is recorded as "urethane (meth)acrylate". In addition, the multifunctional (meth)acrylate without a urethane bond is sometimes recorded only as "multifunctional (meth)acrylate".

作為不具有胺基甲酸酯鍵之多官能(甲基)丙烯酸酯,可例舉:聚乙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、聚四亞甲基二醇二(甲基)丙烯酸酯等於聚環氧烷鏈之兩端具有(甲基)丙烯醯基之化合物;雙酚A二(甲基)丙烯酸酯、烷二醇二(甲基)丙烯酸酯、甘油二(甲基)丙烯酸酯、甘油三(甲基)丙烯酸酯、三環癸烷二甲醇二(甲基)丙烯酸酯、異三聚氰酸三(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、二-三羥甲基丙烷四(甲基)丙烯酸酯、新戊四醇二(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯、新戊四醇四(甲基)丙烯酸酯、二新戊四醇聚(甲基)丙烯酸酯等多元醇與(甲基)丙烯酸之酯;環氧(甲基)丙烯酸酯等。Examples of the multifunctional (meth)acrylates without a urethane bond include compounds having (meth)acryloyl groups at both ends of the polyoxyalkylene chain, such as polyethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, and polytetramethylene glycol di(meth)acrylate; bisphenol A di(meth)acrylate, alkylene glycol di(meth)acrylate, glycerol di(meth)acrylate, glycerol tri(meth)acrylate, and tris(meth)acrylate. Esters of polyols and (meth)acrylic acid such as cyclodecane dimethanol di(meth)acrylate, isocyanuric acid tri(meth)acrylate, trihydroxymethylpropane tri(meth)acrylate, di-trihydroxymethylpropane tetra(meth)acrylate, pentaerythritol di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol poly(meth)acrylate, etc.; epoxy (meth)acrylate, etc.

不具有胺基甲酸酯鍵之多官能(甲基)丙烯酸酯可為經環氧烷改性之多元醇與(甲基)丙烯酸之酯。作為經環氧烷改性之多元醇與(甲基)丙烯酸之酯,可例舉:雙酚A環氧烷改性二(甲基)丙烯酸酯、異三聚氰酸環氧烷改性三(甲基)丙烯酸酯、三羥甲基丙烷環氧烷改性三(甲基)丙烯酸酯、新戊四醇環氧烷改性二(甲基)丙烯酸酯、新戊四醇環氧烷改性三(甲基)丙烯酸酯、二新戊四醇環氧烷改性聚(甲基)丙烯酸酯等。The polyfunctional (meth)acrylate without a urethane bond may be an ester of an alkylene oxide-modified polyol and (meth)acrylic acid. Examples of the ester of an alkylene oxide-modified polyol and (meth)acrylic acid include bisphenol A alkylene oxide-modified di(meth)acrylate, isocyanuric acid alkylene oxide-modified tri(meth)acrylate, trihydroxymethylpropane alkylene oxide-modified tri(meth)acrylate, pentaerythritol alkylene oxide-modified di(meth)acrylate, pentaerythritol alkylene oxide-modified tri(meth)acrylate, dipentaerythritol alkylene oxide-modified poly(meth)acrylate, and the like.

上述之中,就降低光硬化前之黏著劑層之接著力而使剝離變得容易,並且提高光硬化後之黏著劑層之接著力之觀點而言,較佳為具有環氧烷鏈之多官能(甲基)丙烯酸酯。作為具有環氧烷鏈之多官能(甲基)丙烯酸酯,可例舉:聚乙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯等於聚環氧烷鏈之兩端具有(甲基)丙烯醯基之化合物、及經環氧烷改性之多元醇與(甲基)丙烯酸之酯。Among the above, from the viewpoint of reducing the adhesion of the adhesive layer before light curing to facilitate peeling and improving the adhesion of the adhesive layer after light curing, a multifunctional (meth)acrylate having an alkylene oxide chain is preferred. Examples of the multifunctional (meth)acrylate having an alkylene oxide chain include compounds having (meth)acryloyl groups at both ends of the polyalkylene oxide chain such as polyethylene glycol di(meth)acrylate and polypropylene glycol di(meth)acrylate, and esters of polyols modified with alkylene oxide and (meth)acrylic acid.

於包含環氧烷鏈之多官能(甲基)丙烯酸酯中,作為環氧烷,較佳為(聚)環氧乙烷或(聚)環氧丙烷,尤佳為(聚)環氧乙烷。環氧烷之鏈長(環氧烷之重複單元數)n為1~15左右。於1分子中包含複數個環氧烷鏈之情形時,較佳為平均鏈長n為1~15者。環氧烷鏈之(平均)鏈長n亦可為12以下、10以下、8以下、6以下、5以下、4以下或3以下。藉由調整環氧烷之種類及鏈長,能夠調整與丙烯酸系基礎聚合物之相溶性。In the multifunctional (meth)acrylate containing an alkylene oxide chain, the alkylene oxide is preferably (poly)ethylene oxide or (poly)propylene oxide, and is particularly preferably (poly)ethylene oxide. The chain length n of the alkylene oxide (the number of repeating units of the alkylene oxide) is about 1 to 15. When a plurality of alkylene oxide chains are contained in one molecule, the average chain length n is preferably 1 to 15. The (average) chain length n of the alkylene oxide chain may be 12 or less, 10 or less, 8 or less, 6 or less, 5 or less, 4 or less, or 3 or less. By adjusting the type and chain length of the alkylene oxide, the compatibility with the acrylic-based polymer can be adjusted.

作為環氧烷,較佳為(聚)環氧乙烷或(聚)環氧丙烷,環氧烷之鏈長(重複單元數:n)較佳為1~15左右。於1分子中包含複數個環氧烷鏈之情形時,較佳為平均鏈長n為1~15者。環氧烷鏈之(平均)鏈長n亦可為12以下、10以下、8以下、6以下、5以下、4以下或3以下。藉由調整環氧烷之種類及鏈長,能夠調整與丙烯酸系基礎聚合物之相溶性。The alkylene oxide is preferably (poly)ethylene oxide or (poly)propylene oxide, and the chain length (number of repeating units: n) of the alkylene oxide is preferably about 1 to 15. When a plurality of alkylene oxide chains are contained in one molecule, the average chain length n is preferably 1 to 15. The (average) chain length n of the alkylene oxide chain may be 12 or less, 10 or less, 8 or less, 6 or less, 5 or less, 4 or less, or 3 or less. By adjusting the type and chain length of the alkylene oxide, the compatibility with the acrylic-based polymer can be adjusted.

作為光硬化劑,亦可併用2種以上之不具有胺基甲酸酯鍵之多官能(甲基)丙烯酸酯。例如亦可併用與丙烯酸系基礎聚合物之相溶性相對較低之多官能(甲基)丙烯酸酯及與丙烯酸系基礎聚合物之相溶性相對較高之多官能(甲基)丙烯酸酯。例如,與具有環氧烷鏈之多官能(甲基)丙烯酸酯相比,不具有環氧烷鏈之多官能(甲基)丙烯酸酯與丙烯酸系基礎聚合物之相溶性較高。As the photocuring agent, two or more multifunctional (meth)acrylates without urethane bonds may be used in combination. For example, a multifunctional (meth)acrylate with relatively low compatibility with an acrylic base polymer and a multifunctional (meth)acrylate with relatively high compatibility with an acrylic base polymer may be used in combination. For example, a multifunctional (meth)acrylate without an alkylene oxide chain has higher compatibility with an acrylic base polymer than a multifunctional (meth)acrylate with an alkylene oxide chain.

就與丙烯酸系基礎聚合物之相溶性之觀點而言,作為光硬化劑之多官能(甲基)丙烯酸酯之分子量較佳為1500以下,更佳為1000以下,亦可為800以下、500以下或400以下。就兼顧與丙烯酸系基礎聚合物之相溶性及光硬化後之接著力提昇之觀點而言,多官能(甲基)丙烯酸酯之官能基當量(g/eq)較佳為500以下,更佳為400以下,進而較佳為300以下,尤佳為200以下,亦可為180以下或160以下。From the viewpoint of compatibility with acrylic-based polymers, the molecular weight of the multifunctional (meth)acrylate used as a photocuring agent is preferably 1500 or less, more preferably 1000 or less, and may be 800 or less, 500 or less, or 400 or less. From the viewpoint of both compatibility with acrylic-based polymers and improved adhesion after photocuring, the functional group equivalent (g/eq) of the multifunctional (meth)acrylate is preferably 500 or less, more preferably 400 or less, further preferably 300 or less, particularly preferably 200 or less, and may be 180 or less or 160 or less.

另一方面,若多官能(甲基)丙烯酸酯之官能基當量過小,則存在光硬化後之黏著劑層之交聯點密度提高,接著性降低之情況。因此,多官能(甲基)丙烯酸酯之官能基當量較佳為80以上,更佳為100以上,亦可為120以上或130以上。On the other hand, if the functional group equivalent weight of the multifunctional (meth)acrylate is too small, the crosslinking point density of the adhesive layer after light curing may increase, and the adhesion may decrease. Therefore, the functional group equivalent weight of the multifunctional (meth)acrylate is preferably 80 or more, more preferably 100 or more, and may also be 120 or more or 130 or more.

藉由包含具有環氧烷鏈之多官能(甲基)丙烯酸酯及胺基甲酸酯(甲基)丙烯酸酯作為光硬化劑,有光硬化前之黏著劑層之接著力(初始接著力)變小之傾向。又,藉由包含胺基甲酸酯(甲基)丙烯酸酯作為光硬化劑,可於不過度增加光硬化後之黏著劑層之儲存彈性模數之情況下提高接著力、尤其是高溫下之接著力。By including a multifunctional (meth)acrylate having an alkylene oxide chain and a urethane (meth)acrylate as a photocuring agent, the adhesion (initial adhesion) of the adhesive layer before photocuring tends to be reduced. In addition, by including a urethane (meth)acrylate as a photocuring agent, the adhesion, especially the adhesion at high temperature, can be improved without excessively increasing the storage elastic modulus of the adhesive layer after photocuring.

胺基甲酸酯(甲基)丙烯酸酯為1分子中具有1個以上之胺基甲酸酯鍵及2個以上之(甲基)丙烯醯基之化合物,較佳為1分子中包含2個以上之胺基甲酸酯鍵。具有2個以上之胺基甲酸酯鍵之胺基甲酸酯(甲基)丙烯酸酯例如可藉由多異氰酸酯與具有羥基之(甲基)丙烯酸化合物之反應而獲得,多異氰酸酯之異氰酸基與(甲基)丙烯酸化合物之羥基鍵結而形成胺基甲酸酯鍵。Urethane (meth)acrylate is a compound having one or more urethane bonds and two or more (meth)acrylic groups in one molecule, preferably two or more urethane bonds in one molecule. Urethane (meth)acrylate having two or more urethane bonds can be obtained, for example, by the reaction of polyisocyanate with a (meth)acrylic compound having a hydroxyl group, wherein the isocyanate group of the polyisocyanate is bonded with the hydroxyl group of the (meth)acrylic compound to form a urethane bond.

多異氰酸酯可為芳香族多異氰酸酯、脂環族多異氰酸酯及脂環式多異氰酸酯中之任一者。其中,較佳為芳香族多異氰酸酯及脂肪族多異氰酸酯。作為芳香族多異氰酸酯,尤佳為甲苯二異氰酸酯(TDI)。甲苯二異氰酸酯可為2,4-甲苯二異氰酸酯及2,6-甲苯二異氰酸酯中之任一者,亦可為兩者之混合物。作為脂肪族多異氰酸酯,尤佳為六亞甲基二異氰酸酯(HDI)。The polyisocyanate may be any one of an aromatic polyisocyanate, an alicyclic polyisocyanate, and an alicyclic polyisocyanate. Among them, aromatic polyisocyanates and aliphatic polyisocyanates are preferred. As the aromatic polyisocyanate, toluene diisocyanate (TDI) is particularly preferred. Toluene diisocyanate may be any one of 2,4-toluene diisocyanate and 2,6-toluene diisocyanate, or a mixture thereof. As the aliphatic polyisocyanate, hexamethylene diisocyanate (HDI) is particularly preferred.

多異氰酸酯亦可為具有三聚氰酸骨架之3官能異氰酸酯。作為具有三聚氰酸骨架之3官能異氰酸酯,可例舉:TDI三聚物、HDI三聚物等。多異氰酸酯亦可為具有縮二脲基或脲基甲酸酯基者。The polyisocyanate may be a trifunctional isocyanate having a cyanuric acid skeleton. Examples of the trifunctional isocyanate having a cyanuric acid skeleton include TDI trimer and HDI trimer. The polyisocyanate may also have a biuret group or an allophanate group.

多異氰酸酯亦可為藉由多元醇與多異氰酸酯之反應所獲得之異氰酸酯末端胺基甲酸酯預聚物。異氰酸酯末端胺基甲酸酯預聚物可為使聚酯多元醇、聚碳酸酯多元醇、聚醚多元醇等高分子量多元醇與多異氰酸酯進行反應所得之高分子量體。The polyisocyanate may be an isocyanate-terminated urethane prepolymer obtained by reacting a polyol with a polyisocyanate. The isocyanate-terminated urethane prepolymer may be a high molecular weight product obtained by reacting a high molecular weight polyol such as a polyester polyol, a polycarbonate polyol, or a polyether polyol with a polyisocyanate.

作為具有羥基之(甲基)丙烯酸化合物,可例舉:(甲基)丙烯酸羥基乙酯、(甲基)丙烯酸羥基丙酯、(甲基)丙烯酸羥基丁酯、(甲基)丙烯酸羥基己酯、羥甲基丙烯醯胺、羥乙基丙烯醯胺等具有1個羥基及1個(甲基)丙烯醯基之化合物;新戊四醇三(甲基)丙烯酸酯、二新戊四醇五(甲基)丙烯酸酯、三羥甲基丙烷二(甲基)丙烯酸酯、異三聚氰酸二(甲基)丙烯酸酯等具有1個羥基及2個以上之(甲基)丙烯醯基之化合物。Examples of the (meth)acrylic compound having a hydroxyl group include compounds having one hydroxyl group and one (meth)acryl group, such as hydroxyethyl (meth)acrylate, hydroxypropyl (meth)acrylate, hydroxybutyl (meth)acrylate, hydroxyhexyl (meth)acrylate, hydroxymethacrylamide, hydroxyethylacrylamide, and the like; and compounds having one hydroxyl group and two or more (meth)acryl groups, such as pentaerythritol tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, trihydroxymethylpropane di(meth)acrylate, and isocyanuric acid di(meth)acrylate.

其等之中,作為具有羥基之(甲基)丙烯酸化合物,較佳為具有1個羥基及2個以上之(甲基)丙烯醯基之化合物,作為其具體例,可例舉新戊四醇三(甲基)丙烯酸酯、二新戊四醇五(甲基)丙烯酸酯等具有新戊四醇骨架之化合物。Among them, the (meth)acrylic compound having a hydroxyl group is preferably a compound having one hydroxyl group and two or more (meth)acrylic groups, and specific examples thereof include compounds having a pentaerythritol skeleton such as pentaerythritol tri(meth)acrylate and dipentaerythritol penta(meth)acrylate.

藉由二異氰酸酯與1分子中具有1個羥基及2個以上之(甲基)丙烯醯基之(甲基)丙烯酸化合物之反應所獲得之胺基甲酸酯(甲基)丙烯酸酯於1分子中具有2個胺基甲酸酯鍵及4個以上之(甲基)丙烯醯基。胺基甲酸酯(甲基)丙烯酸酯之(甲基)丙烯醯基之數量可為6個以上或8個以上,亦可為12個以下或10個以下。The urethane (meth)acrylate obtained by the reaction of a diisocyanate with a (meth)acrylic compound having one hydroxyl group and two or more (meth)acrylic groups in one molecule has two urethane bonds and four or more (meth)acrylic groups in one molecule. The number of (meth)acrylic groups in the urethane (meth)acrylate may be 6 or more or 8 or less, or 12 or less or 10 or less.

上述胺基甲酸酯(甲基)丙烯酸酯可使用共榮社化學、新中村化學、根上工業、Mitsubishi Chemical、DAICEL-ALLNEX、Resonac等所市售者。As the urethane (meth)acrylate, commercially available products such as Kyoeisha Chemical, Shin-Nakamura Chemical, Negami Industry, Mitsubishi Chemical, DAICEL-ALLNEX, and Resonac can be used.

就調整與丙烯酸系基礎聚合物之相溶性及黏著劑層之接著力之觀點而言,胺基甲酸酯(甲基)丙烯酸酯之分子量較佳為300~10000,更佳為500~2000,亦可為600~1500或700~1200。就同樣之觀點而言,胺基甲酸酯(甲基)丙烯酸酯之(甲基)丙烯醯基之官能基當量(g/eq)較佳為80~5000,更佳為90~1000,進而較佳為100~300,亦可為110~250或120~200。From the viewpoint of adjusting the compatibility with the acrylic base polymer and the adhesion of the adhesive layer, the molecular weight of the urethane (meth) acrylate is preferably 300-10000, more preferably 500-2000, and may be 600-1500 or 700-1200. From the same viewpoint, the functional group equivalent (g/eq) of the (meth) acryl group of the urethane (meth) acrylate is preferably 80-5000, more preferably 90-1000, further preferably 100-300, and may be 110-250 or 120-200.

相對於丙烯酸系基礎聚合物100重量份,黏著劑組合物中之光硬化劑之含量(不具有胺基甲酸酯鍵之多官能(甲基)丙烯酸酯與胺基甲酸酯(甲基)丙烯酸酯之合計)較佳為2重量份以上,更佳為3重量份以上,進而較佳為5重量份以上,亦可為7重量份以上、8重量份以上或10重量份以上。藉由將光硬化劑之調配量設為上述範圍,可獲得光硬化前容易自被黏著體剝離且藉由光硬化可與被黏著體牢固地接著之補強膜。The content of the photocuring agent in the adhesive composition (the total of the multifunctional (meth)acrylate without urethane bond and the urethane (meth)acrylate) is preferably 2 parts by weight or more, more preferably 3 parts by weight or more, further preferably 5 parts by weight or more, and may also be 7 parts by weight or more, 8 parts by weight or more, or 10 parts by weight or more, relative to 100 parts by weight of the acrylic base polymer. By setting the amount of the photocuring agent to the above range, a reinforcing film can be obtained that is easily peeled off from the adherend before photocuring and can be firmly bonded to the adherend by photocuring.

光硬化劑之量越多,則光硬化前之黏著劑與被黏著體之接著力往往越小,剝離性越優異。另一方面,於光硬化劑之量過多之情形時,有黏著劑之黏性較低,接著力或柔軟性不足之傾向。又,光硬化劑之量越多,則光硬化後之黏著劑層之儲存彈性模數、尤其是低溫下之儲存彈性模數往往越大,補強膜及貼合有補強膜之被黏著體越容易因溫度變化而發生翹曲。進而,於光硬化劑之量過多之情形時,存在光硬化劑容易滲出,將補強膜自被黏著體剝離時,滲出之成分轉移黏著至被黏著體,成為污染之原因之情況。因此,相對於基礎聚合物100重量份,光硬化劑之含量較佳為30重量份以下,更佳為25重量份以下,亦可為20重量份以下、15重量份以下、12重量份以下或10重量份以下。The more photocuring agent is used, the smaller the adhesion between the adhesive and the adherend before photocuring, and the better the peeling property. On the other hand, when the amount of photocuring agent is too much, the viscosity of the adhesive is low, and the adhesion or flexibility tends to be insufficient. In addition, the more photocuring agent is used, the greater the storage elastic modulus of the adhesive layer after photocuring, especially the storage elastic modulus at low temperature, and the reinforcing film and the adherend with the reinforcing film are more likely to warp due to temperature changes. Furthermore, when the amount of the photocuring agent is too much, the photocuring agent is likely to seep out, and when the reinforcing film is peeled off from the adherend, the seeped components are transferred to the adherend and become the cause of contamination. Therefore, the content of the photocuring agent is preferably 30 parts by weight or less, more preferably 25 parts by weight or less, and may also be 20 parts by weight or less, 15 parts by weight or less, 12 parts by weight or less, or 10 parts by weight or less, relative to 100 parts by weight of the base polymer.

就將光硬化前及光硬化後之黏著劑層與被黏著體之接著性及光硬化後之黏著劑層之儲存彈性模數調整為適當之範圍之觀點而言,相對於丙烯酸系基礎聚合物100重量份,不具有胺基甲酸酯鍵之多官能(甲基)丙烯酸酯之含量較佳為2~25重量份,更佳為3~20重量份,進而較佳為4~15重量份,亦可為5~13重量份、6~12重量份或7~10重量份。From the viewpoint of adjusting the adhesion between the adhesive layer and the adherend before and after photocuring and the storage elastic modulus of the adhesive layer after photocuring to an appropriate range, the content of the multifunctional (meth)acrylate without a urethane bond is preferably 2 to 25 parts by weight, more preferably 3 to 20 parts by weight, further preferably 4 to 15 parts by weight, and may also be 5 to 13 parts by weight, 6 to 12 parts by weight, or 7 to 10 parts by weight, relative to 100 parts by weight of the acrylic base polymer.

就將光硬化前及光硬化後之黏著劑層與被黏著體之接著性及光硬化後之黏著劑層之儲存彈性模數調整為適當之範圍之觀點而言,相對於丙烯酸系基礎聚合物100重量份,胺基甲酸酯(甲基)丙烯酸酯之含量較佳為0.03~5重量份,更佳為0.05~4重量份,進而較佳為0.08~3重量份,亦可為0.1~2.5重量份或0.15~2重量份。From the viewpoint of adjusting the adhesion between the adhesive layer and the adherend before and after photocuring and the storage elastic modulus of the adhesive layer after photocuring to an appropriate range, the content of urethane (meth) acrylate is preferably 0.03 to 5 parts by weight, more preferably 0.05 to 4 parts by weight, further preferably 0.08 to 3 parts by weight, and may also be 0.1 to 2.5 parts by weight or 0.15 to 2 parts by weight, relative to 100 parts by weight of the acrylic base polymer.

胺基甲酸酯(甲基)丙烯酸酯與丙烯酸系基礎聚合物之相溶性較低。因此,胺基甲酸酯(甲基)丙烯酸酯容易偏集存在於黏著劑層之表面(與被黏著體接著之界面附近)。又,與不具有環氧烷鏈之多官能(甲基)丙烯酸酯相比,具有環氧烷鏈之多官能(甲基)丙烯酸酯與丙烯酸系基礎聚合物之相溶性較低。該等光硬化劑容易偏集存在於黏著劑層之表面(與被黏著體接著之界面附近),藉由偏集存在於與被黏著體接著之界面之光硬化劑,而容易形成接著抑制層(Weak Boundary Layer;WBL)。Urethane (meth)acrylates have low compatibility with acrylic-based polymers. Therefore, urethane (meth)acrylates tend to be concentrated on the surface of the adhesive layer (near the interface with the adherend). In addition, compared with multifunctional (meth)acrylates without alkylene oxide chains, multifunctional (meth)acrylates with alkylene oxide chains have low compatibility with acrylic-based polymers. These photocuring agents tend to be concentrated on the surface of the adhesive layer (near the interface with the adherend), and the photocuring agents concentrated on the interface with the adherend easily form a weak boundary layer (WBL).

若形成WBL,則於保持黏著劑層之儲存彈性模數等塊體特性之狀態下,表面(接著界面)之液狀特性變強,因此有與被黏著體之接著力變小之傾向。因此,光硬化前之黏著劑層容易自被黏著體剝離。若使光硬化劑偏集存在於與被黏著體接著之界面附近而形成有WBL之黏著劑層光硬化,則於光硬化劑之存在密度較高之接著界面附近,容易進行光硬化劑之硬化反應,因此接著界面附近之凝集力容易變大,接著力容易上升。又,於形成有WBL之情形時,於光硬化後之黏著劑中,有作為塊體特性之儲存彈性模數之增大受抑制之傾向。If a WBL is formed, the liquid properties of the surface (bonding interface) become stronger while maintaining the bulk properties such as the storage elastic modulus of the adhesive layer, so the bonding force with the adherend tends to decrease. Therefore, the adhesive layer before photocuring is easily peeled off from the adherend. If the photocuring agent is concentrated near the interface with the adherend and the adhesive layer with a WBL is photocured, the curing reaction of the photocuring agent is easy to proceed near the bonding interface where the density of the photocuring agent is high, so the cohesive force near the bonding interface tends to become larger and the bonding force tends to increase. In addition, when a WBL is formed, the increase in the storage elastic modulus, which is a bulk property, tends to be suppressed in the adhesive after photocuring.

藉由包含胺基甲酸酯(甲基)丙烯酸酯作為光硬化劑,有光硬化前之黏著劑層之接著力變小之傾向。認為其原因之一在於,藉由併用胺基甲酸酯(甲基)丙烯酸酯及不具有胺基甲酸酯鍵之多官能(甲基)丙烯酸酯,會產生促進WBL之形成之作用。By including urethane (meth)acrylate as a photocuring agent, the adhesion of the adhesive layer before photocuring tends to be reduced. One reason for this is believed to be that the combined use of urethane (meth)acrylate and a multifunctional (meth)acrylate having no urethane bond promotes the formation of WBL.

認為於光硬化後之黏著劑層中,具有交聯結構之丙烯酸系基礎聚合物與藉由光硬化劑之硬化所形成之聚合物形成聚合物網路,藉由丙烯酸系基礎聚合物之極性基與胺基甲酸酯(甲基)丙烯酸酯之極性基之相互作用,而使得凝集力提高,因此接著力提高。又,如上所述,認為若於形成有WBL之狀態下進行光硬化,則接著界面附近之凝集力容易變大,因此界面處之接著力及高溫接著力容易變大。It is believed that in the adhesive layer after photocuring, the acrylic-based polymer having a crosslinked structure and the polymer formed by curing the photocuring agent form a polymer network, and the polar groups of the acrylic-based polymer and the polar groups of the urethane (meth)acrylate interact with each other to improve the cohesive force, thereby improving the adhesion. In addition, as described above, it is believed that if the photocuring is performed in a state where the WBL is formed, the cohesive force near the bonding interface is likely to increase, so the adhesion at the interface and the high-temperature adhesion are likely to increase.

(光聚合起始劑) 光聚合起始劑係藉由照射活性光線而產生活性種,從而促進光硬化劑之硬化反應。作為光聚合起始劑,較佳為使用光自由基聚合起始劑(光自由基產生劑)。 (Photopolymerization initiator) The photopolymerization initiator generates active species by irradiating active light, thereby promoting the curing reaction of the photocuring agent. As the photopolymerization initiator, it is preferred to use a photoradical polymerization initiator (photoradical generator).

作為光自由基聚合起始劑,較佳為藉由照射相較於波長450 nm而言為短波長之可見光或紫外線而生成自由基者,可例舉:羥基酮類、苯偶醯二甲基縮酮類、胺基酮類、醯基氧化膦類、二苯甲酮類、含有三氯甲基之三𠯤衍生物等。光聚合起始劑可單獨使用,亦可混合使用2種以上。As the photo-radical polymerization initiator, preferably, one that generates free radicals by irradiation with visible light or ultraviolet light of a wavelength shorter than 450 nm, examples of which include hydroxy ketones, benzoyl dimethyl ketal, amino ketones, acyl phosphine oxides, benzophenones, tris(III) derivatives containing a trichloromethyl group, etc. The photo-polymerization initiator may be used alone or in combination of two or more.

相對於基礎聚合物100重量份,黏著劑層2中之光聚合起始劑之含量較佳為0.01~5重量份,更佳為0.02~3重量份,進而較佳為0.03~2重量份。相對於光硬化劑100重量份,黏著劑層2中之光聚合起始劑之含量較佳為0.02~20重量份,更佳為0.05~10重量份,進而較佳為0.1~7重量份。The content of the photopolymerization initiator in the adhesive layer 2 is preferably 0.01 to 5 parts by weight, more preferably 0.02 to 3 parts by weight, and further preferably 0.03 to 2 parts by weight relative to 100 parts by weight of the base polymer. The content of the photopolymerization initiator in the adhesive layer 2 is preferably 0.02 to 20 parts by weight, more preferably 0.05 to 10 parts by weight, and further preferably 0.1 to 7 parts by weight relative to 100 parts by weight of the photocuring agent.

<其他成分> 如上所述,構成黏著劑層2之光硬化性之黏著劑組合物包含丙烯酸系基礎聚合物、光硬化劑及光聚合起始劑。黏著劑組合物亦可包含除此以外之成分。 <Other components> As described above, the photocurable adhesive composition constituting the adhesive layer 2 includes an acrylic base polymer, a photocuring agent, and a photopolymerization initiator. The adhesive composition may also include components other than these.

例如,黏著劑組合物亦可包含分子量較基礎聚合物更低之低聚物。例如,黏著劑組合物除包含丙烯酸系基礎聚合物以外,亦可包含重量平均分子量為1000~30000左右之丙烯酸系低聚物。For example, the adhesive composition may also include an oligomer with a lower molecular weight than the base polymer. For example, the adhesive composition may include an acrylic oligomer with a weight average molecular weight of about 1,000 to 30,000 in addition to the acrylic base polymer.

黏著劑組合物除包含上述各成分以外,亦可於不損害本發明之特性之範圍內含有矽烷偶合劑、黏著性賦予劑、交聯促進劑、交聯延遲劑、塑化劑、軟化劑、抗氧化劑、抗劣化劑、填充劑、著色劑、紫外線吸收劑、界面活性劑、抗靜電劑等添加劑。In addition to the above-mentioned components, the adhesive composition may also contain additives such as silane coupling agents, adhesion imparting agents, crosslinking promoters, crosslinking delayers, plasticizers, softeners, antioxidants, anti-degradation agents, fillers, colorants, ultraviolet absorbers, surfactants, antistatic agents, etc. within the range that does not impair the characteristics of the present invention.

作為交聯促進劑(交聯觸媒),可例舉:有機金屬錯合物(螯合物)、金屬與烷氧基之化合物、及金屬與醯氧基之化合物等有機金屬化合物;以及三級胺等。就抑制於常溫之溶液狀態下進行交聯反應而確保黏著劑組合物之適用期之觀點而言,尤佳為有機金屬化合物。又,就容易遍佈黏著劑層之整個厚度方向導入均勻之交聯結構之方面而言,作為交聯促進劑,較佳為常溫下為液體之有機金屬化合物。作為有機金屬化合物之金屬,可例舉:鐵、錫、鋁、鋯、鋅、鈦、鉛、鈷、鋅等。As crosslinking promoters (crosslinking catalysts), organic metal compounds such as organic metal complexes (chelates), compounds of metals and alkoxy groups, and compounds of metals and acyloxy groups; and tertiary amines, etc. are exemplified. From the perspective of suppressing the crosslinking reaction in a solution state at room temperature and ensuring the shelf life of the adhesive composition, organic metal compounds are particularly preferred. In addition, from the perspective of easily introducing a uniform crosslinking structure throughout the thickness direction of the adhesive layer, organic metal compounds that are liquid at room temperature are preferred as crosslinking promoters. Metals of organic metal compounds include iron, tin, aluminum, zirconium, zinc, titanium, lead, cobalt, zinc, etc.

作為交聯延遲劑,可例舉:乙醯乙酸甲酯、乙醯乙酸乙酯、乙醯乙酸辛酯、乙醯乙酸油酯、乙醯乙酸月桂酯、乙醯乙酸硬脂酯等β-酮酯;乙醯丙酮、2,4-己二酮、苯甲醯丙酮等β-二酮;第三丁醇等醇類。Examples of the crosslinking retarder include β-ketoesters such as methyl acetylacetate, ethyl acetylacetate, octyl acetylacetate, oleyl acetylacetate, lauryl acetylacetate, and stearyl acetylacetate; β-diketones such as acetylacetone, 2,4-hexanedione, and benzoylacetone; and alcohols such as tert-butyl alcohol.

[補強膜之製作] 藉由於膜基材1上積層光硬化性之黏著劑層2,可獲得補強膜。黏著劑層2可直接形成於膜基材1上,亦可將片狀地形成於其他基材上之黏著劑層轉印至膜基材1上。 [Production of reinforcing film] A reinforcing film can be obtained by laminating a photocurable adhesive layer 2 on a film substrate 1. The adhesive layer 2 can be formed directly on the film substrate 1, or an adhesive layer formed in a sheet form on another substrate can be transferred to the film substrate 1.

藉由輥式塗佈、接觸輥式塗佈、凹版塗佈、反向塗佈、輥式刷塗、噴塗、浸漬輥塗佈、棒式塗佈、刮塗、氣刀塗佈、淋幕式塗佈、模唇塗佈、模嘴塗佈等將上述黏著劑組合物塗佈於基材上,視需要將溶劑乾燥去除,藉此形成黏著劑層。作為乾燥方法,可適宜地採用適當之方法。加熱乾燥溫度較佳為40℃~200℃,更佳為50℃~180℃,進而較佳為70℃~170℃。乾燥時間較佳為5秒~20分鐘,更佳為5秒~15分鐘,進而較佳為10秒~10分鐘。The adhesive composition is applied to the substrate by roller coating, contact roller coating, gravure coating, reverse coating, roller brush coating, spray coating, dip roller coating, rod coating, scraper coating, air knife coating, curtain coating, die lip coating, die nozzle coating, etc., and the solvent is dried and removed as needed to form an adhesive layer. As a drying method, an appropriate method can be appropriately adopted. The heating drying temperature is preferably 40°C to 200°C, more preferably 50°C to 180°C, and further preferably 70°C to 170°C. The drying time is preferably 5 seconds to 20 minutes, more preferably 5 seconds to 15 minutes, and further preferably 10 seconds to 10 minutes.

於黏著劑組合物含有交聯劑之情形時,較佳為在溶劑乾燥之同時或溶劑乾燥後,藉由加熱或老化進行交聯。加熱溫度或加熱時間係根據所使用之交聯劑之種類而適當設定,通常藉由於20℃~160℃之範圍下加熱1分鐘至7天左右而進行交聯。用於將溶劑乾燥去除之加熱亦可兼作用於交聯之加熱。When the adhesive composition contains a crosslinking agent, it is preferred to perform crosslinking by heating or aging while or after the solvent is dried. The heating temperature or heating time is appropriately set according to the type of crosslinking agent used, and crosslinking is usually performed by heating at a temperature in the range of 20°C to 160°C for 1 minute to 7 days. The heating used to dry out the solvent can also serve as the heating for crosslinking.

藉由交聯劑向聚合物中導入交聯結構後,光硬化劑亦維持未反應之狀態。因此,黏著劑層2包含光硬化性之黏著劑組合物,該光硬化性之黏著劑組合物含有導入有交聯結構之丙烯酸系基礎聚合物、光硬化劑、及光聚合起始劑。於在膜基材1上形成黏著劑層2之情形時,出於保護黏著劑層2等目的,較佳為於黏著劑層2上附設剝離襯墊5。亦可於黏著劑層2上附設剝離襯墊5後進行交聯。After the crosslinking structure is introduced into the polymer by the crosslinking agent, the photocuring agent also remains in an unreacted state. Therefore, the adhesive layer 2 includes a photocurable adhesive composition, which contains an acrylic base polymer with a crosslinking structure introduced, a photocuring agent, and a photopolymerization initiator. When the adhesive layer 2 is formed on the film substrate 1, it is preferred to attach a peeling pad 5 to the adhesive layer 2 for the purpose of protecting the adhesive layer 2. It is also possible to attach the peeling pad 5 to the adhesive layer 2 before crosslinking.

於在其他基材上形成黏著劑層2之情形時,在對溶劑進行乾燥後,將黏著劑層2轉印至膜基材1上,藉此可獲得補強膜。可將用於形成黏著劑層之基材直接作為剝離襯墊5。When the adhesive layer 2 is formed on another substrate, after the solvent is dried, the adhesive layer 2 is transferred to the film substrate 1, thereby obtaining a reinforcement film. The substrate used to form the adhesive layer can be directly used as the peeling pad 5.

作為剝離襯墊5,適宜使用聚乙烯、聚丙烯、聚對苯二甲酸乙二酯、聚酯膜等塑膠膜。剝離襯墊之厚度通常為3~200 μm,較佳為10~100 μm左右。較佳為對剝離襯墊5與黏著劑層2之接觸面實施利用矽酮系、氟系、長鏈烷基系、或脂肪醯胺系等離型劑、或者二氧化矽粉末等之離型處理。藉由對剝離襯墊5之表面進行離型處理,於將膜基材1與剝離襯墊5剝離時,在黏著劑層2與剝離襯墊5之界面處產生剝離,維持黏著劑層2固著於膜基材1上之狀態。可對剝離襯墊5之離型處理面及非處理面之任一者或兩者實施防靜電處理。藉由對剝離襯墊5實施防靜電處理,可抑制將剝離襯墊自黏著劑層剝離時之靜電。As the release pad 5, a plastic film such as polyethylene, polypropylene, polyethylene terephthalate, polyester film, etc. is preferably used. The thickness of the release pad is usually 3 to 200 μm, preferably about 10 to 100 μm. It is preferred to subject the release pad 5 and the adhesive layer 2 to a release treatment using a release agent such as a silicone, fluorine, long-chain alkyl, or fatty amide, or a silicon dioxide powder. By subjecting the surface of the peeling pad 5 to a release treatment, when the film substrate 1 and the peeling pad 5 are peeled off, peeling occurs at the interface between the adhesive layer 2 and the peeling pad 5, and the adhesive layer 2 is kept fixed to the film substrate 1. Antistatic treatment may be applied to either or both of the release-treated surface and the non-treated surface of the peeling pad 5. By subjecting the peeling pad 5 to an antistatic treatment, static electricity generated when the peeling pad is peeled off from the adhesive layer can be suppressed.

[補強膜之特性及補強膜之使用] 本發明之補強膜貼合於裝置或裝置構成零件來使用。補強膜10之黏著劑層2與膜基材1固著,且在與被黏著體貼合後光硬化前,與被黏著體之接著力較小。因此,光硬化前容易自被黏著體剝離補強膜。 [Characteristics of the reinforcing film and use of the reinforcing film] The reinforcing film of the present invention is used by being attached to a device or a component of the device. The adhesive layer 2 of the reinforcing film 10 is fixed to the film substrate 1, and the adhesion between the reinforcing film 10 and the adherend is relatively small before being photocured after being attached to the adherend. Therefore, the reinforcing film can be easily peeled off from the adherend before being photocured.

貼合補強膜之被黏著體並無特別限定,可例舉各種電子裝置、光學裝置及其構成零件等。於一實施方式中,補強膜貼合於可彎折之軟性裝置之表面。可彎折裝置具有鉸鏈部,可以該鉸鏈部為中心進行彎折。彎折角度可任意設定,亦可彎折(摺疊)180°。於裝置為顯示裝置之情形時,可將補強膜貼合於畫面側之表面,亦可將補強膜貼合於背面側(殼體)。關於構成為能夠於鉸鏈部等規定部位進行彎折之軟性裝置,於其使用狀態下,在同一部位反覆進行彎曲及展開。The adherend to which the reinforcing film is bonded is not particularly limited, and examples thereof include various electronic devices, optical devices, and components thereof. In one embodiment, the reinforcing film is bonded to the surface of a bendable flexible device. The bendable device has a hinge portion, and can be bent around the hinge portion. The bending angle can be set arbitrarily, and can also be bent (folded) 180°. When the device is a display device, the reinforcing film can be bonded to the surface on the screen side, and can also be bonded to the back side (casing). A flexible device that is configured to bend at a predetermined position such as a hinge, and that repeatedly bends and unfolds at the same position when in use.

補強膜可貼合於被黏著體之整面,亦可僅選擇性地貼合於需要補強之部分(補強對象區域)。於將補強膜貼合於需要補強之部分(補強對象區域)及無需補強之區域(非補強對象區域)之整體後,對補強膜進行切割,自非補強對象區域將補強膜剝離去除,藉此可製作僅於補強對象區域貼合有補強膜之裝置。若黏著劑為光硬化前,則補強膜呈暫時黏著於被黏著體表面之狀態,接著力較小,因此可容易地自被黏著體之表面剝離去除補強膜。The reinforcing film can be attached to the entire surface of the adherend, or can be selectively attached to the portion that needs to be reinforced (reinforcement target area). After attaching the reinforcing film to the entire portion that needs to be reinforced (reinforcement target area) and the area that does not need to be reinforced (non-reinforcement target area), the reinforcing film is cut and peeled off from the non-reinforcement target area, thereby making a device with the reinforcing film attached only to the reinforcement target area. If the adhesive is before light curing, the reinforcing film is temporarily adhered to the surface of the adherend, and the bonding force is relatively small, so the reinforcing film can be easily peeled off from the surface of the adherend.

藉由貼合補強膜,會賦予適度之剛性,因此對於軟性裝置等厚度較小之構件,期待提高處理性或防破損效果。於裝置之製造步驟中,在將補強膜貼合於半成品之情形時,可將補強膜貼合於被切割為製品尺寸之前之大尺寸半成品。亦可以卷對卷式將補強膜貼合於藉由卷對卷式工藝製造之裝置之母輥。By laminating the reinforcing film, appropriate rigidity is given, so for thin components such as soft devices, it is expected to improve the handling or damage prevention effect. In the manufacturing step of the device, when the reinforcing film is laminated to the semi-finished product, the reinforcing film can be laminated to the large-sized semi-finished product before being cut into the product size. The reinforcing film can also be laminated to the mother roll of the device manufactured by the roll-to-roll process in a roll-to-roll manner.

例如,在以卷對卷式將補強膜貼合於裝置或其半成品之母輥之後,將貼合有補強膜之母輥切割分離為單個製品,藉由半切僅對補強膜進行切割,剝離非補強對象區域之補強膜,藉此可獲得於補強對象區域貼合有補強膜之裝置。切割方法並無特別限定,可採用旋切刀、壓入刀(例如Thomson刀)、雷射裁刀等適宜之切割方式。For example, after the reinforcing film is attached to the mother roll of the device or its semi-finished product in a roll-to-roll manner, the mother roll attached with the reinforcing film is cut and separated into individual products, and the reinforcing film is only cut by half-cutting, and the reinforcing film in the non-reinforcement target area is peeled off, thereby obtaining a device with the reinforcing film attached to the reinforcement target area. The cutting method is not particularly limited, and a suitable cutting method such as a rotary cutter, a press-in knife (such as a Thomson knife), a laser cutter, etc. can be used.

在貼合補強膜之前,出於淨化等目的,可進行被黏著體之表面之活化處理。作為表面活化處理,可例舉:電漿處理、電暈處理、輝光放電處理等。Before attaching the reinforcing film, the surface of the adherend may be activated for the purpose of purification. Examples of surface activation treatments include plasma treatment, corona treatment, and fluorescent discharge treatment.

就容易自被黏著體剝離、以及防止剝離補強膜後糊劑殘留於被黏著體之觀點而言,光硬化前之黏著劑層2與被黏著體之接著力(初始接著力)更佳為0.6 N/25 mm以下,更佳為0.5 N/25 mm以下,進而較佳為0.4 N/25 mm以下,亦可為0.3 N/25 mm以下、0.25 N/25 mm以下或0.2 N/25 mm以下。就防止於保管或處理時出現補強膜剝離之情況之觀點而言,光硬化前之黏著劑層2與被黏著體之接著力較佳為0.005 N/25 mm以上,更佳為0.01 N/25 mm以上。From the viewpoint of easy peeling from the adherend and preventing the paste residue from remaining on the adherend after peeling off the reinforcing film, the adhesion force (initial adhesion force) between the adhesive layer 2 and the adherend before light curing is preferably 0.6 N/25 mm or less, more preferably 0.5 N/25 mm or less, and further preferably 0.4 N/25 mm or less, and may also be 0.3 N/25 mm or less, 0.25 N/25 mm or less, or 0.2 N/25 mm or less. From the viewpoint of preventing the reinforcing film from peeling off during storage or handling, the adhesion force between the adhesive layer 2 and the adherend before light curing is preferably 0.005 N/25 mm or more, and more preferably 0.01 N/25 mm or more.

接著力係以聚醯亞胺膜作為被黏著體,藉由拉伸速度300 mm/分鐘、剝離角度180°之剝離試驗而求出。除非另有說明,否則接著力為25℃下之測定值。光硬化前之黏著劑層與被黏著體之接著力係使用貼合後於25℃下靜置30分鐘之試樣進行測定。Adhesion is measured by peeling test with polyimide film as adherend at a tensile speed of 300 mm/min and a peeling angle of 180°. Adhesion is measured at 25°C unless otherwise specified. Adhesion between adhesive layer and adherend before light curing is measured by using samples that were left at 25°C for 30 minutes after bonding.

光硬化前之黏著劑層2於溫度25℃下之剪切儲存彈性模數(以下,僅記載為「儲存彈性模數」)較佳為15 kPa以上,更佳為20 kPa以上,亦可為25 kPa以上或30 kPa以上。光硬化前之黏著劑層於常溫下之儲存彈性模數越大,則越會提昇切割加工性,並且有將補強膜自被黏著體剝離時之被黏著體上之糊劑殘留受抑制之傾向。The shear storage modulus of the adhesive layer 2 at a temperature of 25°C before light curing (hereinafter, simply recorded as "storage modulus") is preferably 15 kPa or more, more preferably 20 kPa or more, and may be 25 kPa or more or 30 kPa or more. The larger the storage modulus of the adhesive layer at room temperature before light curing, the more the cutting processability is improved, and there is a tendency to suppress the paste residue on the adherend when the reinforcing film is peeled off from the adherend.

另一方面,於光硬化前之黏著劑層於常溫下之儲存彈性模數過大之情形時,有光硬化後之黏著劑層之儲存彈性模數變大之傾向,存在對被黏著體之接著性或耐衝擊性不足之情況。又,於光硬化前之黏著劑層之儲存彈性模數較大之情形時,有光硬化後之黏著劑層之儲存彈性模數亦會變大之傾向,於應用於可摺疊裝置時,黏著劑層無法吸收彎曲部位及其周邊之應變,而使得補強膜容易自裝置剝離。因此,光硬化前之黏著劑層於溫度25℃下之儲存彈性模數較佳為50 kPa以下,更佳為45 kPa以下,進而較佳為40 kPa以下。On the other hand, if the storage elastic modulus of the adhesive layer at room temperature before light curing is too large, the storage elastic modulus of the adhesive layer after light curing tends to be larger, and there is a case where the adhesion to the adherend or the impact resistance is insufficient. In addition, if the storage elastic modulus of the adhesive layer before light curing is relatively large, the storage elastic modulus of the adhesive layer after light curing tends to be larger, and when used in a foldable device, the adhesive layer cannot absorb the strain of the bent part and its surroundings, and the reinforcing film is easily peeled off from the device. Therefore, the storage elastic modulus of the adhesive layer before light curing at a temperature of 25° C. is preferably 50 kPa or less, more preferably 45 kPa or less, and further preferably 40 kPa or less.

黏著劑層之儲存彈性模數係藉由如下方式求出:依據JIS K7244-1「塑膠-動態機械特性之試驗方法」所記載之方法,於頻率1 Hz之條件下,在-70~200℃之範圍內以升溫速度5℃/分鐘進行測定時,讀取規定溫度下之值。於本說明書中,除非另有說明,否則儲存彈性模數為溫度25℃下之值。The storage elastic modulus of the adhesive layer is obtained as follows: According to the method described in JIS K7244-1 "Plastics - Test methods for dynamic mechanical properties", the value at the specified temperature is read when the temperature is increased at a rate of 5°C/min within the range of -70 to 200°C at a frequency of 1 Hz. In this manual, unless otherwise specified, the storage elastic modulus is the value at a temperature of 25°C.

於將補強膜貼合於被黏著體之後,對黏著劑層2照射活性光線,藉此使黏著劑層光硬化。作為活性光線,較佳為紫外線。活性光線之照射強度或照射時間根據黏著劑層2之組成或厚度等適當設定即可。關於對黏著劑層2照射活性光線,可自膜基材1側及被黏著體側之任一面實施,亦可自兩面照射活性光線。After the reinforcing film is attached to the adherend, the adhesive layer 2 is irradiated with active light to photo-harden the adhesive layer. Ultraviolet light is preferably used as the active light. The irradiation intensity and irradiation time of the active light can be appropriately set according to the composition and thickness of the adhesive layer 2. The adhesive layer 2 can be irradiated with active light from either the film substrate 1 side or the adherend side, or from both sides.

若使黏著劑層2光硬化,則光硬化劑發生硬化反應,與被黏著體之接著力上升。就裝置之實際使用時之接著可靠性之觀點而言,溫度25℃下之光硬化後之黏著劑層與被黏著體之接著力F 1較佳為3 N/25 mm以上,更佳為5 N/25 mm以上,亦可為7 N/25 mm以上、9 N/25 mm以上或10 N/25 mm以上。光硬化後之黏著劑層與被黏著體之接著力F 1較佳為光硬化前之黏著劑層與被黏著體之接著力F 0之10倍以上,更佳為15倍以上,進而較佳為20倍以上,亦可為30倍以上或50倍以上。 If the adhesive layer 2 is photocured, the photocuring agent undergoes a curing reaction, and the adhesion to the adherend increases. From the perspective of adhesion reliability during actual use of the device, the adhesion F1 between the adhesive layer and the adherend after photocuring at a temperature of 25°C is preferably 3 N/25 mm or more, more preferably 5 N/25 mm or more, and may be 7 N/25 mm or more, 9 N/25 mm or more, or 10 N/25 mm or more. The adhesion F1 between the adhesive layer and the adherend after photocuring is preferably 10 times or more of the adhesion F0 between the adhesive layer and the adherend before photocuring, more preferably 15 times or more, further preferably 20 times or more, and may be 30 times or more or 50 times or more.

於溫度85℃下,光硬化後之黏著劑層與被黏著體之接著力F 2較佳為1 N/25 mm以上,更佳為2 N/25 mm以上,進而較佳為3 N/25 mm以上,亦可為4 N/25 mm以上、5 N/25 mm以上或6 N/25 mm以上。 At a temperature of 85°C, the adhesion force F2 between the adhesive layer after light curing and the adherend is preferably 1 N/25 mm or more, more preferably 2 N/25 mm or more, further preferably 3 N/25 mm or more, and can also be 4 N/25 mm or more, 5 N/25 mm or more, or 6 N/25 mm or more.

如上所述,藉由包含胺基甲酸酯(甲基)丙烯酸酯作為光硬化劑,有接著界面處之凝集力提高,光硬化後之黏著劑層之接著力變大之傾向。As described above, by including urethane (meth)acrylate as a photocuring agent, the cohesive force at the bonding interface is improved, and the bonding force of the adhesive layer after photocuring tends to be increased.

就於光硬化後實現與被黏著體之高接著力之觀點而言,光硬化後之黏著劑層於溫度25℃下之儲存彈性模數較佳為40 kPa以上,更佳為50 kPa以上,亦可為55 kPa以上或60 kPa以上。另一方面,於光硬化後之黏著劑層之儲存彈性模數過大之情形時,有對被黏著體之接著力或衝擊緩和作用(緩衝性)降低之傾向。又,於光硬化後之黏著劑層之儲存彈性模數過大之情形時,於應用於可摺疊裝置時,於彎曲部位及其周邊,補強膜容易自裝置剝離。因此,光硬化後之黏著劑層於溫度25℃下之儲存彈性模數較佳為100 kPa以下,更佳為90 kPa以下,進而較佳為80 kPa以下。From the perspective of achieving high adhesion to the adherend after photocuring, the storage modulus of the adhesive layer after photocuring at a temperature of 25°C is preferably 40 kPa or more, more preferably 50 kPa or more, and may be 55 kPa or more or 60 kPa or more. On the other hand, when the storage modulus of the adhesive layer after photocuring is too large, the adhesion or impact cushioning effect (cushioning property) on the adherend tends to be reduced. Furthermore, when the storage modulus of the adhesive layer after photocuring is too large, when applied to a foldable device, the reinforcing film is easily peeled off from the device at the bent portion and its periphery. Therefore, the storage elastic modulus of the adhesive layer after light curing at a temperature of 25° C. is preferably 100 kPa or less, more preferably 90 kPa or less, and further preferably 80 kPa or less.

交聯劑之量越少且光硬化劑之量越少,則光硬化後之黏著劑層之儲存彈性模數往往越小,光硬化劑之量越少,則由光硬化產生之黏著劑層之儲存彈性模數之增加量往往越小。又,藉由包含不具有胺基甲酸酯鍵之多官能(甲基)丙烯酸酯及胺基甲酸酯(甲基)丙烯酸酯作為光硬化劑,有由光硬化引起之黏著劑層之儲存彈性模數之上升受抑制之同時,與被黏著體之接著力提高之傾向。The smaller the amount of the crosslinking agent and the smaller the amount of the photocuring agent, the smaller the storage elastic modulus of the adhesive layer after photocuring tends to be, and the smaller the amount of the photocuring agent, the smaller the increase in the storage elastic modulus of the adhesive layer caused by photocuring tends to be. In addition, by including a multifunctional (meth)acrylate and a urethane (meth)acrylate without a urethane bond as the photocuring agent, the increase in the storage elastic modulus of the adhesive layer caused by photocuring is suppressed, and the adhesion to the adherend tends to be improved.

光硬化後之黏著劑層於溫度-40℃下之儲存彈性模數較佳為1000 kPa以下,更佳為900 kPa以下,亦可為800 kPa以下、750Pa以下或700 kPa以下。-40℃下之儲存彈性模數越小,則有伴隨溫度變化所產生之儲存彈性模數之變化越小,溫度循環試驗後之補強膜及貼合有補強膜之被黏著體之翹曲越受抑制之傾向。光硬化後之黏著劑層於溫度-40℃下之儲存彈性模數可為300 kPa以上、400 kPa以上、450 kPa以上或500 kPa以上。The storage elastic modulus of the adhesive layer after light curing at a temperature of -40°C is preferably 1000 kPa or less, more preferably 900 kPa or less, and may be 800 kPa or less, 750 Pa or less, or 700 kPa or less. The smaller the storage elastic modulus at -40°C, the smaller the change in the storage elastic modulus caused by temperature change, and the more the warp of the reinforcement film and the adherend with the reinforcement film after the temperature cycle test is suppressed. The storage elastic modulus of the adhesive layer after light curing at a temperature of -40°C may be 300 kPa or more, 400 kPa or more, 450 kPa or more, or 500 kPa or more.

就提昇高溫下之接著力,並且確保黏著劑層對被黏著體之彎曲等變形之追隨性之觀點而言,光硬化後之黏著劑層於溫度85℃下之儲存彈性模數較佳為40~100 kPa,更佳為50~90 kPa,亦可為55~85 kPa或60~80 kPa。From the perspective of improving the adhesion at high temperature and ensuring the adhesive layer's ability to follow deformation such as bending of the adherend, the storage elastic modulus of the adhesive layer after light curing at a temperature of 85°C is preferably 40 to 100 kPa, more preferably 50 to 90 kPa, and may also be 55 to 85 kPa or 60 to 80 kPa.

光硬化後之黏著劑層於-40℃下之儲存彈性模數與85℃下之儲存彈性模數之差較佳為900 kPa以下,更佳為800 kPa以下,進而較佳為700 kPa以下。光硬化後之黏著劑層於-40℃下之儲存彈性模數較佳為85℃下之儲存彈性模數之10倍以下,更佳為9.5倍以下,進而較佳為9倍以下。低溫(-40℃)與高溫(85℃)下之儲存彈性模數差越小,則有溫度循環試驗後之補強膜及貼合有補強膜之被黏著體之翹曲越受抑制之傾向。The difference between the storage elastic modulus of the adhesive layer after light curing at -40°C and the storage elastic modulus at 85°C is preferably 900 kPa or less, more preferably 800 kPa or less, and further preferably 700 kPa or less. The storage elastic modulus of the adhesive layer after light curing at -40°C is preferably 10 times or less, more preferably 9.5 times or less, and further preferably 9 times or less of the storage elastic modulus at 85°C. The smaller the difference between the storage elastic modulus at low temperature (-40°C) and high temperature (85°C), the more the warping of the reinforcing film and the adherend bonded with the reinforcing film after the temperature cycle test is suppressed.

與常溫(25℃)下之儲存彈性模數同樣地,交聯劑之量越少且光硬化劑之量越少,光硬化後之黏著劑層於低溫(-40℃)及高溫(85℃)下之儲存彈性模數往往越小。又,藉由包含不具有胺基甲酸酯鍵之多官能(甲基)丙烯酸酯及胺基甲酸酯(甲基)丙烯酸酯作為光硬化劑,有光硬化後之黏著劑層於低溫下之儲存彈性模數之上升受抑制,並且與被黏著體之接著力提高之傾向。進而,丙烯酸系基礎聚合物之主單體為(甲基)丙烯酸C 6-9烷基酯,除包含(甲基)丙烯酸C 6-9烷基酯作為單體成分以外,亦包含(甲基)丙烯酸C 10-20烷基酯作為單體成分,藉此有光硬化後之黏著劑層之儲存彈性模數之溫度依存變小之傾向。 Similar to the storage elastic modulus at room temperature (25°C), the smaller the amount of the crosslinking agent and the smaller the amount of the photocuring agent, the smaller the storage elastic modulus of the adhesive layer after photocuring at low temperature (-40°C) and high temperature (85°C). In addition, by including a multifunctional (meth)acrylate and urethane (meth)acrylate without a urethane bond as the photocuring agent, the increase in the storage elastic modulus of the adhesive layer after photocuring at low temperature is suppressed, and the bonding strength with the adherend tends to be improved. Furthermore, the main monomer of the acrylic-based polymer is C 6-9 alkyl (meth)acrylate, and in addition to C 6-9 alkyl (meth)acrylate as a monomer component, it also contains C 10-20 alkyl (meth)acrylate as a monomer component, thereby having a tendency to reduce the temperature dependence of the storage elastic modulus of the adhesive layer after light curing.

光硬化後之黏著劑層於25℃下之儲存彈性模數與85℃下之儲存彈性模數之差較佳為50 kPa以下,更佳為30 kPa以下,進而較佳為20 kPa以下,亦可為15 kPa以下、10 kPa以下或5 kPa以下。光硬化後之黏著劑層於85℃下之儲存彈性模數亦可小於25℃下之儲存彈性模數。光硬化後之黏著劑層於85℃下之儲存彈性模數較佳為25℃下之儲存彈性模數之0.8~1.2倍,更佳為0.85~1.15倍,亦可為0.9~1.1倍、0.93~1.07倍或0.95~1.05倍。The difference between the storage elastic modulus of the adhesive layer after light curing at 25°C and the storage elastic modulus at 85°C is preferably 50 kPa or less, more preferably 30 kPa or less, further preferably 20 kPa or less, and may be 15 kPa or less, 10 kPa or less, or 5 kPa or less. The storage elastic modulus of the adhesive layer after light curing at 85°C may also be less than the storage elastic modulus at 25°C. The storage elastic modulus of the adhesive layer after light curing at 85° C. is preferably 0.8 to 1.2 times, more preferably 0.85 to 1.15 times, and may also be 0.9 to 1.1 times, 0.93 to 1.07 times, or 0.95 to 1.05 times the storage elastic modulus at 25° C.

常溫(25℃)與高溫(85℃)下之儲存彈性模數差越小,溫度循環試驗後之補強膜及貼合有補強膜之被黏著體之翹曲有越受抑制之傾向。又,於將補強膜應用於可摺疊裝置時,有彎曲部位(鉸鏈部)及其附近之伴隨變形所產生之補強膜之剝離受抑制之傾向。基礎聚合物之玻璃轉移溫度越低,則黏彈性之溫度依存較小之區域(平線區範圍)越會轉為低溫,因此有常溫與高溫下之儲存彈性模數差變小之傾向。The smaller the difference between the storage elastic modulus at room temperature (25°C) and high temperature (85°C), the more the warping of the reinforcing film and the adherend with the reinforcing film after the temperature cycle test tends to be suppressed. In addition, when the reinforcing film is applied to a foldable device, the peeling of the reinforcing film caused by the deformation of the bending part (hinge) and its vicinity tends to be suppressed. The lower the glass transition temperature of the base polymer, the lower the temperature dependence of the viscoelasticity (flat area range) will be, so there is a tendency for the difference in the storage elastic modulus at room temperature and high temperature to become smaller.

藉由貼合補強膜,會對被黏著體賦予適度之剛性,並且應力經緩和、分散,因此可抑制製造步驟中可能產生之各種不良情況,提高生產效率,改善良率。By laminating the reinforcing film, the adherend will be given appropriate rigidity, and the stress will be relieved and dispersed, thus suppressing various adverse conditions that may occur in the manufacturing steps, improving production efficiency and yield.

本發明之補強膜之黏著劑層2具有光硬化性,可任意設定硬化時點。由於在使黏著劑層光硬化之前,本發明之補強膜對經表面處理之被黏著體之接著力亦較小,因此容易自被黏著體剝離,即便產生積層或貼合不良之情形時,亦容易進行二次加工。又,自非補強對象區域選擇性地去除補強膜等加工亦較為容易。The adhesive layer 2 of the reinforcing film of the present invention is photocurable, and the curing time can be set arbitrarily. Before the adhesive layer is photocured, the reinforcing film of the present invention has a relatively small adhesion to the surface-treated adherend, so it is easy to peel off from the adherend, and even if lamination or poor adhesion occurs, it is easy to perform secondary processing. In addition, it is also relatively easy to selectively remove the reinforcing film from the non-reinforcement target area.

於使黏著劑層光硬化後,對被黏著體顯示出較高之接著力,因此補強膜不易自裝置表面剝離。對於將本發明之補強膜貼合於使用樹脂基板之軟性裝置而成之附補強膜之裝置,即便於反覆進行彎曲之情形時,於彎曲部位亦不易產生補強膜之剝離。又,由於伴隨溫度變化所產生之黏著劑層之儲存彈性模數之變化較小,因此裝置之翹曲受抑制,能夠維持顯示特性,並且不易產生由溫度變化引起之補強膜之剝離,可靠性優異。 [實施例] After the adhesive layer is photocured, it exhibits a higher adhesion to the adherend, so the reinforcing film is not easy to peel off from the device surface. For a device with a reinforcing film formed by attaching the reinforcing film of the present invention to a soft device using a resin substrate, even when the device is repeatedly bent, the reinforcing film is not easy to peel off at the bent part. In addition, since the change in the storage elastic modulus of the adhesive layer caused by temperature changes is small, the warping of the device is suppressed, the display characteristics can be maintained, and the reinforcing film is not easy to peel off due to temperature changes, and the reliability is excellent. [Example]

以下,列舉實施例及比較例進一步進行說明,但本發明並不限定於該等實施例。The following is a further description with reference to embodiments and comparative examples, but the present invention is not limited to these embodiments.

[基礎聚合物之製備] <聚合物A> 向具備溫度計、攪拌機、回流冷凝管及氮氣導入管之反應容器中投入作為單體之丙烯酸丁酯(BA)20重量份、丙烯酸2-乙基己酯(2EHA)70重量份、丙烯酸月桂酯(LA)8重量份、丙烯酸4-羥基丁酯(4HBA)1重量份、及N-乙烯基-2-吡咯啶酮(NVP)1重量份、作為熱聚合起始劑之偶氮二異丁腈(AIBN)0.1重量份、以及作為溶劑之乙酸乙酯233重量份,通入氮氣,一面進行攪拌一面進行約1小時氮氣置換。其後,加熱至60℃,反應7小時,獲得重量平均分子量180萬之丙烯酸系聚合物A之溶液。 [Preparation of base polymer] <Polymer A> Into a reaction vessel equipped with a thermometer, a stirrer, a reflux condenser and a nitrogen inlet tube, 20 parts by weight of butyl acrylate (BA) as monomers, 70 parts by weight of 2-ethylhexyl acrylate (2EHA), 8 parts by weight of lauryl acrylate (LA), 1 part by weight of 4-hydroxybutyl acrylate (4HBA), and 1 part by weight of N-vinyl-2-pyrrolidone (NVP), 0.1 parts by weight of azobisisobutyronitrile (AIBN) as a thermal polymerization initiator, and 233 parts by weight of ethyl acetate as a solvent were added, and nitrogen was introduced and nitrogen replacement was performed for about 1 hour while stirring. Thereafter, the mixture was heated to 60°C and reacted for 7 hours to obtain a solution of acrylic polymer A with a weight average molecular weight of 1.8 million.

<聚合物B~D> 如表1所示變更單體之添加量,於聚合物B及D之聚合中,將熱聚合起始劑(AIBN)之量變更為0.2重量份。除該等變更以外,以與聚合物A之聚合相同之方式獲得聚合物B~D之溶液。 <Polymer B~D> The amount of monomer added was changed as shown in Table 1. In the polymerization of polymers B and D, the amount of thermal polymerization initiator (AIBN) was changed to 0.2 parts by weight. Except for these changes, solutions of polymers B~D were obtained in the same manner as the polymerization of polymer A.

將丙烯酸系聚合物A~D之添加單體比率、及聚合物之重量平均分子量(Mw)一覽示於表1中。重量平均分子量(聚苯乙烯換算)係使用GPC(東曹製造之「HLC-8220GPC」),藉由下述條件進行測定。 樣品濃度:0.2重量%(四氫呋喃溶液) 樣品注入量:10 μL 溶離液:THF 流速:0.6 mL/min 測定溫度:40℃ 樣品管柱:TSKguardcolumn SuperHZ-H(1根)+TSKgel SuperHZM-H(2根) 參考管柱:TSKgel SuperH-RC(1根) Table 1 shows the ratio of added monomers of acrylic polymers A to D and the weight average molecular weight (Mw) of the polymers. The weight average molecular weight (polystyrene conversion) was measured using GPC (HLC-8220GPC manufactured by Tosoh Corporation) under the following conditions. Sample concentration: 0.2 wt% (tetrahydrofuran solution) Sample injection volume: 10 μL Eluent: THF Flow rate: 0.6 mL/min Measurement temperature: 40°C Sample column: TSKguardcolumn SuperHZ-H (1 column) + TSKgel SuperHZM-H (2 columns) Reference column: TSKgel SuperH-RC (1 column)

於表1中,單體係藉由下述簡稱來記載。 BA:丙烯酸丁酯 2EHA:丙烯酸2-乙基己酯 NOAA:丙烯酸正辛酯 LA:丙烯酸月桂酯 2HEA:丙烯酸2-羥基乙酯 4HBA:丙烯酸4-羥基丁酯 AA:丙烯酸 NVP:N-乙烯基-2-吡咯啶酮 In Table 1, the monomers are recorded by the following abbreviations. BA: butyl acrylate 2EHA: 2-ethylhexyl acrylate NOAA: n-octyl acrylate LA: lauryl acrylate 2HEA: 2-hydroxyethyl acrylate 4HBA: 4-hydroxybutyl acrylate AA: acrylic acid NVP: N-vinyl-2-pyrrolidone

[表1] 單體比率(重量份) Mw BA 2EHA NOAA LA 2HEA 4HBA AA NVP A 20 70 - 8 - 1 - 1 180萬 B - 96 - - 4 - - - 55萬 C 20 - 70 - - 10 - - 180萬 D 95 - - - - - 5 - 60萬 [Table 1] Monomer ratio (parts by weight) M BA 2EHA NOAA LA 2HEA 4HBA AA NVP A 20 70 - 8 - 1 - 1 1.8 million B - 96 - - 4 - - - 550,000 C 20 - 70 - - 10 - - 1.8 million D 95 - - - - - 5 - 600,000

[補強膜之製作] <黏著劑組合物之製備> 向丙烯酸系聚合物之溶液中添加交聯劑、作為光硬化劑之多官能丙烯酸酯(不具有胺基甲酸酯鍵者)及胺基甲酸酯丙烯酸酯、以及光聚合起始劑,均勻地進行混合,而製備表2所示之黏著劑組合物。 [Preparation of reinforcing film] <Preparation of adhesive composition> A crosslinking agent, a multifunctional acrylate (without urethane bond) and a urethane acrylate as a photocuring agent, and a photopolymerization initiator were added to a solution of an acrylic polymer and uniformly mixed to prepare an adhesive composition shown in Table 2.

作為光聚合起始劑,添加相對於丙烯酸系聚合物之固形物成分100重量份為0.3重量份之IGM Resins製造之「Omnirad 651」。交聯劑及光硬化劑(多官能丙烯酸酯及胺基甲酸酯丙烯酸酯)係以表2所示之量添加。表2中之添加量係相對於丙烯酸系聚合物100重量份之量(固形物成分之重量份)。交聯劑及光硬化劑之詳情如下所述。As a photopolymerization initiator, 0.3 parts by weight of "Omnirad 651" manufactured by IGM Resins was added relative to 100 parts by weight of the solid content of the acrylic polymer. The crosslinking agent and the photocuring agent (multifunctional acrylate and urethane acrylate) were added in the amounts shown in Table 2. The addition amounts in Table 2 are relative to 100 parts by weight of the acrylic polymer (parts by weight of the solid content). The details of the crosslinking agent and the photocuring agent are as follows.

(交聯劑) C/HX:六亞甲基二異氰酸酯之異氰尿酸酯體(東曹製造之「Coronate HX) T/C:1,3-雙(N,N-二縮水甘油胺甲基)環己烷(4官能之環氧化合物,Mitsubishi Gas Chemical製造之「Tetrad C」) (Crosslinking agent) C/HX: Isocyanurate of hexamethylene diisocyanate ("Coronate HX" manufactured by Tosoh) T/C: 1,3-bis(N,N-dihydroglycerylaminomethyl)cyclohexane (a tetrafunctional epoxy compound, "Tetrad C" manufactured by Mitsubishi Gas Chemical)

(多官能丙烯酸酯) A200:新中村化學工業製造之「NK Ester A200」(聚乙二醇#200(n=4)二丙烯酸酯;分子量308,官能基當量154 g/eq) M350:三羥甲基丙烷EO改性(n=1)三丙烯酸酯(東亞合成製造之「ARONIX M-350」,官能基當量143 g/eq) ADPHE:乙氧化二新戊四醇聚丙烯酸酯(新中村化學工業公司製造之「NK ESTER A-DPH-12E」,官能基當量約200 g/eq) (Multifunctional acrylate) A200: "NK Ester A200" manufactured by Shin-Nakamura Chemical Industry (polyethylene glycol #200 (n=4) diacrylate; molecular weight 308, functional group equivalent 154 g/eq) M350: trihydroxymethylpropane EO modified (n=1) triacrylate ("ARONIX M-350" manufactured by Toa Gosei, functional group equivalent 143 g/eq) ADPHE: ethoxylated dipentatriol polyacrylate ("NK ESTER A-DPH-12E" manufactured by Shin-Nakamura Chemical Industry, functional group equivalent about 200 g/eq)

(胺基甲酸酯丙烯酸酯) UA306:新戊四醇三丙烯酸酯-甲苯二異氰酸酯加成物(共榮社化學製造之「UA-306T」,官能基當量:128 g/eq) UA510:二新戊四醇五丙烯酸酯-六亞甲基二異氰酸酯加成物(共榮社化學製造之「UA-510H」,官能基當量:181 g/eq) UF-X9-83:含有聚碳酸酯骨架之胺基甲酸酯丙烯酸酯(共榮社化學製造之「UF-X9-83」,官能基數2~3,重量平均分子量8400) (Urethane acrylate) UA306: Pentaerythritol triacrylate-toluene diisocyanate adduct ("UA-306T" manufactured by Kyoeisha Chemical, functional group equivalent: 128 g/eq) UA510: Dipentaerythritol pentaacrylate-hexamethylene diisocyanate adduct ("UA-510H" manufactured by Kyoeisha Chemical, functional group equivalent: 181 g/eq) UF-X9-83: Urethane acrylate containing a polycarbonate skeleton ("UF-X9-83" manufactured by Kyoeisha Chemical, functional group number 2 to 3, weight average molecular weight 8400)

<黏著劑溶液之塗佈及交聯> 使用槽輥將上述黏著劑組合物以乾燥後之厚度成為15 μm之方式塗佈於未經表面處理之厚度50 μm之聚對苯二甲酸乙二酯膜基材(Mitsubishi Chemical製造之「DIAFOIL T100」)上。於130℃下乾燥1分鐘而去除溶劑後,於黏著劑之塗佈面貼合剝離襯墊(表面經矽酮離型處理之厚度25 μm之聚對苯二甲酸乙二酯膜)之離型處理面。其後,於25℃之環境中進行4天老化處理,以使交聯進行,獲得於膜基材上固著積層有黏著片材,於其上暫時黏著有剝離襯墊之補強膜。 <Application and cross-linking of adhesive solution> The adhesive composition was applied to a 50 μm thick polyethylene terephthalate film substrate ("DIAFOIL T100" manufactured by Mitsubishi Chemical) without surface treatment using a slot roller in a manner such that the thickness after drying was 15 μm. After drying at 130°C for 1 minute to remove the solvent, the release-treated surface of a release pad (polyethylene terephthalate film with a thickness of 25 μm treated with silicone release) was attached to the adhesive-coated surface. Afterwards, an aging treatment was carried out in an environment of 25°C for 4 days to allow crosslinking to proceed, and a reinforcement film was obtained in which an adhesive sheet was fixedly laminated on the film substrate and a peel-off liner was temporarily adhered thereto.

[評估] <對聚醯亞胺膜之接著力> (光硬化前之黏著劑層之接著力) 經由雙面黏著帶(日東電工製造之「No.531」)將厚度25 μm之聚醯亞胺膜(UBE製造之「Upilex 25S」)貼附於玻璃板,獲得測定用聚醯亞胺膜基板。自切割成寬度25 mm×長度100 mm之補強膜之表面剝離去除剝離襯墊,使用手動輥貼合於測定用聚醯亞胺膜基板。 [Evaluation] <Adhesion to polyimide film> (Adhesion of adhesive layer before light curing) A polyimide film (Upilex 25S, manufactured by UBE) with a thickness of 25 μm was attached to a glass plate via a double-sided adhesive tape (No.531, manufactured by Nitto Denko) to obtain a polyimide film substrate for measurement. The peeling pad was removed from the surface of the reinforcement film cut into 25 mm wide x 100 mm long, and attached to the polyimide film substrate for measurement using a manual roller.

將該試樣於25℃下靜置30分鐘後,利用吸盤保持補強膜之膜基材之端部,於拉伸速度300 mm/分鐘下進行180°剝離試驗,測定剝離強度(補強膜對聚醯亞胺膜之接著力F 0)。 After the sample was left at 25°C for 30 minutes, a 180° peeling test was performed at a tensile speed of 300 mm/min by holding the end of the film substrate of the reinforcing film with a suction cup to measure the peeling strength (adhesion force F 0 of the reinforcing film to the polyimide film).

(光硬化後之黏著劑層之接著力) 於將補強膜貼合於測定用聚醯亞胺膜基板後,自補強膜側(膜基材側),使用波長365 nm之LED光源照射累計光量4000 mJ/cm 2之紫外線而使黏著劑層光硬化。使用該試驗樣品,與上述同樣地,於溫度25℃下藉由180°剝離試驗測定接著力F 1。進而,將使黏著劑層光硬化後之試驗樣品於溫度85℃之烘箱內保管5分鐘後,於溫度85℃之環境下進行180°剝離試驗,測定接著力F 2(Adhesion of the adhesive layer after photocuring) After the reinforcing film was attached to the polyimide film substrate for measurement, the adhesive layer was photocured by irradiating ultraviolet light with a cumulative light amount of 4000 mJ/ cm2 from the reinforcing film side (film substrate side) using a 365 nm LED light source. The adhesion F1 was measured by a 180° peeling test at a temperature of 25°C in the same manner as above. Furthermore, the test sample after the adhesive layer was photocured was stored in an oven at a temperature of 85°C for 5 minutes, and then a 180° peeling test was performed in an environment at a temperature of 85°C to measure the adhesion F2 .

<儲存彈性模數> 於剝離襯墊上,以與上述相同之方式進行黏著劑組合物之塗佈及交聯,而製作黏著片材(光硬化前)。於光硬化前之黏著片材之黏著劑層之表面附設剝離襯墊以阻隔氧氣,利用365 nm之LED燈照射4000 mJ/cm 2之紫外線而使黏著片材光硬化。將光硬化前之黏著片材及光硬化後之黏著片材各者進行積層,製作厚度約1.5 mm之測定用試樣,使用旋轉流變儀(TA Instruments製造之「Discovery-HR2」),於以下條件下進行動態黏彈性測定,讀取-40℃、25℃及85℃下之剪切儲存彈性模數G'之值。 (測定條件) 變形模式:扭轉 測定頻率:1 Hz 升溫速度:5℃/分鐘 測定溫度:-70~200℃ 形狀:平行板8.0 mmϕ <Storage elastic modulus> On a peeling pad, the adhesive composition was coated and cross-linked in the same manner as above to produce an adhesive sheet (before light curing). A peeling pad was attached to the surface of the adhesive layer of the adhesive sheet before light curing to block oxygen, and the adhesive sheet was photocured by irradiating 4000 mJ/ cm2 of ultraviolet light using a 365 nm LED lamp. The adhesive sheet before and after light curing was laminated to prepare a test specimen with a thickness of about 1.5 mm. A rotational rheometer ("Discovery-HR2" manufactured by TA Instruments) was used to perform dynamic viscoelasticity measurement under the following conditions, and the shear storage modulus G' was read at -40℃, 25℃ and 85℃. (Measurement conditions) Deformation mode: torsion Measurement frequency: 1 Hz Heating rate: 5℃/min Measurement temperature: -70~200℃ Shape: parallel plate 8.0 mmφ

<溫度循環試驗> 自補強膜之表面將剝離襯墊剝離去除,使用手動輥貼合於厚度25 μm之聚醯亞胺膜(UBE製造之「Upilex 25S」)後,自補強膜側(膜基材側),使用波長365 nm之LED光源照射累計光量4000 mJ/cm 2之紫外線而使黏著劑層光硬化。將該試驗樣品切成20 mm×100 mm之尺寸,進行溫度循環試驗。溫度循環係將試樣導入試驗槽後,於-40℃下保持30分鐘,升溫至85℃(6.25℃/分鐘),於85℃下保持30分鐘,降溫至-40℃(6.25℃/分鐘),將該操作設為1個循環,實施200個循環。將溫度循環試驗後之試樣以與長邊相接之方式置於水平之台,測定端部之捲曲量。 <Temperature Cycle Test> The peel-off pad was peeled off from the surface of the self-reinforcement film and laminated to a 25 μm thick polyimide film ("Upilex 25S" manufactured by UBE) using a manual roller. The self-reinforcement film side (film substrate side) was irradiated with ultraviolet light with a cumulative light intensity of 4000 mJ/ cm2 using a 365 nm LED light source to photoharden the adhesive layer. The test sample was cut into a size of 20 mm × 100 mm and subjected to the temperature cycle test. The temperature cycle is to introduce the sample into the test tank, keep it at -40℃ for 30 minutes, raise the temperature to 85℃ (6.25℃/min), keep it at 85℃ for 30 minutes, and cool it down to -40℃ (6.25℃/min). This operation is set as one cycle, and 200 cycles are implemented. The sample after the temperature cycle test is placed on a horizontal table in a way that it is connected to the long side, and the curling amount at the end is measured.

<被黏著體污染性> 自切成寬25 mm×長100 mm之補強膜之表面將剝離襯墊剝離去除,使用手動輥貼合於測定用聚醯亞胺膜基板。於25℃下靜置30分鐘或24小時後,自聚醯亞胺膜將補強膜剝離,於螢光燈下藉由目視觀察聚醯亞胺膜之表面,確認有無污染。藉由以下基準評估對被黏著體之污染性。 A:未觀察到靜置24小時後剝離之試樣受到污染 B:觀察到靜置24小時後剝離之試樣受到污染,但未觀察到靜置30分鐘後剝離之試樣受到污染 C:觀察到靜置30分鐘後剝離之試樣受到污染 <Adhesive contamination> Remove the peelable liner from the surface of the reinforcing film cut into 25 mm wide x 100 mm long, and use a manual roller to stick it to the polyimide film substrate for measurement. After standing at 25°C for 30 minutes or 24 hours, peel the reinforcing film from the polyimide film and visually observe the surface of the polyimide film under a fluorescent light to confirm whether there is any contamination. Evaluate the contamination of the adherend using the following criteria. A: No contamination was observed in the sample peeled off after standing for 24 hours B: Contamination was observed in the sample peeled off after standing for 24 hours, but no contamination was observed in the sample peeled off after standing for 30 minutes C: Contamination was observed in the sample peeled off after standing for 30 minutes

將各補強膜之黏著劑之組成(基礎聚合物之種類、交聯劑添加量、光硬化劑之種類及添加量)、以及評估結果示於表2中。The composition of the adhesive of each reinforcement film (type of base polymer, amount of crosslinking agent added, type and amount of photocuring agent added), and the evaluation results are shown in Table 2.

[表2] 組成 接著力(N/25 mm) G'(kPa) 污染性 聚合物 交聯劑 光硬化劑 硬化前 硬化後 硬化前25℃ 硬化後 捲曲(mm) 種類 種類 多官能丙烯酸酯 胺基甲酸酯丙烯酸酯 F 0 25℃ F 1 85℃ F 2 -40℃ 25℃ 85℃ 種類 種類 實施例1 A C/HX 0.3 M350 2 UA306 0.15 0.574 10.01 1.33 41 433 58 59 2 A 實施例2 A C/HX 0.3 M350 5 UA306 0.15 0.378 16.01 2.97 37 521 62 65 4 A 實施例3 A C/HX 0.3 M350 8 UA306 0.15 0.243 17.26 4.49 35 658 65 68 4 A 實施例4 A C/HX 0.3 M350 10 UA306 0.15 0.160 17.90 6.25 30 743 69 71 6 A 實施例5 A C/HX 0.3 M350 15 UA306 0.15 0.019 16.72 5.78 25 883 83 85 7 A 實施例6 A C/HX 0.3 M350 10 UA306 0.30 0.120 15.71 8.66 31 753 71 75 5 A 實施例7 A C/HX 0.3 M350 10 UA306 1.00 0.101 14.13 9.16 30 758 72 73 5 B 實施例8 A C/HX 0.3 M350 10 UA306 3.00 0.087 12.53 9.46 29 763 74 76 5 C 實施例9 A C/HX 0.1 M350 10 UA306 0.15 0.318 21.19 11.03 26 632 56 53 5 A 實施例10 A C/HX 0.2 M350 10 UA306 0.15 0.269 17.47 8.18 28 693 61 61 5 A 實施例11 A C/HX 0.5 M350 10 UA306 0.15 0.099 12.94 3.26 38 903 89 93 7 A 實施例12 A C/HX 0.3 M350 10 UA510 0.15 0.138 12.71 7.14 31 711 71 73 3 A 實施例13 A C/HX 0.3 M350 10 UF-X9-83 0.15 0.219 16.63 5.02 29 743 66 69 3 A 實施例14 A C/HX 0.3 A200 10 UA306 0.15 0.029 5.01 2.33 28 613 62 63 3 B 實施例15 A C/HX 0.3 ADPHE 10 UA306 0.15 0.137 10.69 4.23 33 812 78 83 6 C 比較例1 A C/HX 0.3 M350 2 - 1.004 9.99 0.96 42 342 56 54 4 A 比較例2 A C/HX 0.3 - UA306 0.15 2.102 2.38 0.76 39 412 41 40 3 A 比較例3 A C/HX 0.3 M350 30 UA306 0.15 0.005 2.33 3.49 15 1508 113 118 12 C 比較例4 B C/HX 0.3 M350 10 UA306 0.15 0.141 14.52 1.29 23 1175 45 46 9 A 比較例5 C C/HX 0.3 M350 10 UA306 0.15 0.129 13.79 2.20 28 891 66 68 7 A 比較例6 D T/C 0.5 A200 30 UA306 0.15 0.147 5.40 1.56 68 275934 193 154 13 A [Table 2] Composition Adhesion force (N/25 mm) G'(kPa) Pollution polymer Crosslinking agent Light Hardener Before hardening After hardening Before hardening 25℃ After hardening Curl(mm) Type Type quantity Multifunctional acrylate Urethane Acrylate F 0 25℃ F 1 85℃ F 2 -40℃ 25℃ 85℃ Type quantity Type quantity Embodiment 1 A C/HX 0.3 M350 2 UA306 0.15 0.574 10.01 1.33 41 433 58 59 2 A Embodiment 2 A C/HX 0.3 M350 5 UA306 0.15 0.378 16.01 2.97 37 521 62 65 4 A Embodiment 3 A C/HX 0.3 M350 8 UA306 0.15 0.243 17.26 4.49 35 658 65 68 4 A Embodiment 4 A C/HX 0.3 M350 10 UA306 0.15 0.160 17.90 6.25 30 743 69 71 6 A Embodiment 5 A C/HX 0.3 M350 15 UA306 0.15 0.019 16.72 5.78 25 883 83 85 7 A Embodiment 6 A C/HX 0.3 M350 10 UA306 0.30 0.120 15.71 8.66 31 753 71 75 5 A Embodiment 7 A C/HX 0.3 M350 10 UA306 1.00 0.101 14.13 9.16 30 758 72 73 5 B Embodiment 8 A C/HX 0.3 M350 10 UA306 3.00 0.087 12.53 9.46 29 763 74 76 5 C Embodiment 9 A C/HX 0.1 M350 10 UA306 0.15 0.318 21.19 11.03 26 632 56 53 5 A Embodiment 10 A C/HX 0.2 M350 10 UA306 0.15 0.269 17.47 8.18 28 693 61 61 5 A Embodiment 11 A C/HX 0.5 M350 10 UA306 0.15 0.099 12.94 3.26 38 903 89 93 7 A Embodiment 12 A C/HX 0.3 M350 10 UA510 0.15 0.138 12.71 7.14 31 711 71 73 3 A Embodiment 13 A C/HX 0.3 M350 10 UF-X9-83 0.15 0.219 16.63 5.02 29 743 66 69 3 A Embodiment 14 A C/HX 0.3 A200 10 UA306 0.15 0.029 5.01 2.33 28 613 62 63 3 B Embodiment 15 A C/HX 0.3 ADPHE 10 UA306 0.15 0.137 10.69 4.23 33 812 78 83 6 C Comparison Example 1 A C/HX 0.3 M350 2 - 1.004 9.99 0.96 42 342 56 54 4 A Comparison Example 2 A C/HX 0.3 - UA306 0.15 2.102 2.38 0.76 39 412 41 40 3 A Comparison Example 3 A C/HX 0.3 M350 30 UA306 0.15 0.005 2.33 3.49 15 1508 113 118 12 C Comparison Example 4 B C/HX 0.3 M350 10 UA306 0.15 0.141 14.52 1.29 twenty three 1175 45 46 9 A Comparison Example 5 C C/HX 0.3 M350 10 UA306 0.15 0.129 13.79 2.20 28 891 66 68 7 A Comparative Example 6 D T/C 0.5 A200 30 UA306 0.15 0.147 5.40 1.56 68 275934 193 154 13 A

於使用調配有相對於聚合物A 100重量份為2重量份之多官能丙烯酸酯(M350)作為光硬化劑之黏著劑組合物之比較例1中,對聚醯亞胺膜之接著力F 0超過約1 N/25 mm,顯示出較大之初始接著力。調配有0.15重量份之胺基甲酸酯丙烯酸酯(UA306)作為光硬化劑之比較例2顯示出較比較例1更大之初始接著力。 In Comparative Example 1, in which the adhesive composition was prepared with 2 parts by weight of multifunctional acrylate (M350) as a photocuring agent relative to 100 parts by weight of polymer A, the adhesion force F0 to the polyimide film exceeded about 1 N/25 mm, showing a larger initial adhesion force. Comparative Example 2, in which 0.15 parts by weight of urethane acrylate (UA306) was prepared as a photocuring agent, showed a larger initial adhesion force than Comparative Example 1.

於調配有相對於聚合物A 100重量份為2重量份之多官能丙烯酸酯(M350)及0.15重量份之胺基甲酸酯丙烯酸酯(UA306)作為光硬化劑之實施例1中,與比較例1及比較例2相比,初始接著力F 0較小,於光硬化後,顯示出較大之接著力。又,於實施例1中,光硬化後之黏著劑之儲存彈性模數為60 kPa以下,具有可應用於可摺疊裝置等之柔軟性。 In Example 1, which contains 2 parts by weight of multifunctional acrylate (M350) and 0.15 parts by weight of urethane acrylate (UA306) as the photocuring agent relative to 100 parts by weight of polymer A, the initial adhesion force F0 is smaller than that of Comparative Examples 1 and 2, and a larger adhesion force is exhibited after photocuring. In addition, in Example 1, the storage elastic modulus of the adhesive after photocuring is less than 60 kPa, and has the flexibility that can be applied to foldable devices, etc.

於多官能丙烯酸酯之量較實施例1更大之實施例2~4中,觀察到多官能丙烯酸酯之量越多,則初始接著力F 0越小,光硬化後之接著力F 1越大之傾向。另一方面,於多官能丙烯酸酯之量較實施例4進一步增大之實施例5中,光硬化後之接著力較實施例4更小。於多官能丙烯酸酯之量進一步增大之比較例3中,光硬化後之接著力更小。又,於比較例3中,於黏著劑之光硬化前將補強膜剝離時,觀察到被黏著體受到污染。 In Examples 2 to 4, where the amount of multifunctional acrylate is larger than that of Example 1, it is observed that the larger the amount of multifunctional acrylate, the smaller the initial adhesion force F0 and the larger the adhesion force F1 after photocuring. On the other hand, in Example 5, where the amount of multifunctional acrylate is further increased than that of Example 4, the adhesion force after photocuring is smaller than that of Example 4. In Comparative Example 3, where the amount of multifunctional acrylate is further increased, the adhesion force after photocuring is even smaller. In Comparative Example 3, when the reinforcing film is peeled off before the photocuring of the adhesive, contamination of the adherend is observed.

於實施例1~5及比較例3中,伴隨著多官能丙烯酸酯之量之增大,有光硬化前之黏著劑層之儲存彈性模數變小,光硬化後之黏著劑之儲存彈性模數變大之傾向,尤其是低溫(-40℃)下之儲存彈性模數之增大較為明顯。隨著光硬化後之黏著劑層於低溫下之儲存彈性模數之增大,觀察到低溫(-40℃)與高溫(85℃)下之儲存彈性模數之差變大,溫度循環試驗後之試樣之捲曲變大之傾向。In Examples 1 to 5 and Comparative Example 3, as the amount of multifunctional acrylate increases, the storage modulus of the adhesive layer before light curing decreases, and the storage modulus of the adhesive after light curing tends to increase, especially the increase in the storage modulus at low temperature (-40°C) is more obvious. As the storage modulus of the adhesive layer after light curing increases at low temperature, the difference between the storage modulus at low temperature (-40°C) and high temperature (85°C) increases, and the curling of the sample after the temperature cycle test tends to increase.

於變更了多官能丙烯酸酯之種類之實施例14、15中,與實施例4同樣地,對被黏著體之初始接著力F 0較小,光硬化後之黏著劑層於高溫下之接著力F 2顯示出較大之值。於實施例15中,溫度循環試驗後之試樣之捲曲量與實施例4相等,於使用2官能丙烯酸酯(A200)之實施例14中,與實施例4及實施例15相比,各溫度下之儲存彈性模數較小,溫度循環試驗後之試樣之捲曲減少。 In Examples 14 and 15 in which the type of multifunctional acrylate was changed, the initial adhesion force F0 to the adherend was smaller as in Example 4, and the adhesion force F2 of the adhesive layer after light curing at high temperature showed a larger value. In Example 15, the curling amount of the sample after the temperature cycle test was equal to that of Example 4. In Example 14 using a bifunctional acrylate (A200), the storage elastic modulus at each temperature was smaller than that of Examples 4 and 15, and the curling of the sample after the temperature cycle test was reduced.

於胺基甲酸酯丙烯酸酯之量較實施例4更大之實施例6~8中,與實施例4同樣地,對被黏著體之初始接著力F 0較小,光硬化後之黏著劑層於高溫下之接著力F 2較大,且為低儲存彈性模數,溫度循環試驗後之試樣之捲曲減少。於實施例6~8中,伴隨著胺基甲酸酯丙烯酸酯之量之增加,觀察到高溫下之接著力F 2變大之傾向。又,伴隨著胺基甲酸酯丙烯酸酯之量之增加,觀察到光硬化後之黏著劑層之儲存彈性模數變大之傾向,但儲存彈性模數僅稍微增大,未觀察到溫度循環試驗後之試樣之捲曲量存在差異。 In Examples 6 to 8, where the amount of urethane acrylate is greater than that of Example 4, the initial adhesion force F0 to the adherend is smaller, the adhesion force F2 of the adhesive layer after light curing at high temperature is larger, and the storage elastic modulus is low, and the curling of the sample after the temperature cycle test is reduced. In Examples 6 to 8, a tendency of the adhesion force F2 at high temperature to increase is observed with the increase in the amount of urethane acrylate. In addition, as the amount of urethane acrylate increases, a tendency is observed for the storage modulus of the adhesive layer after light curing to increase, but the storage modulus increases only slightly, and no difference is observed in the amount of curling of the specimens after the temperature cycle test.

於使用不同於實施例4之胺基甲酸酯丙烯酸酯之實施例12及實施例13中,與實施例4同樣地,初始接著力F 0較小,光硬化後之黏著劑層於高溫下之接著力F 2顯示出較大之值。 In Examples 12 and 13 using urethane acrylate different from that in Example 4, similarly to Example 4, the initial adhesion force F0 is small, and the adhesion force F2 of the adhesive layer after photocuring at a high temperature shows a larger value.

於使用10官能之胺基甲酸酯丙烯酸酯(UA510)之實施例12中,初始接著力F 0較使用6官能之胺基甲酸酯丙烯酸酯(UA306)之實施例4更小,且光硬化後之高溫下之接著力F 2較實施例4更大。另一方面,於使用高分子量之胺基甲酸酯丙烯酸酯(UF-X9-83)之實施例13中,與實施例4、12相比,F 0變大,F 2變小。由該等結果可知,胺基甲酸酯丙烯酸酯之官能基數越大、官能基當量越小,則降低初始接著力以及提高接著力之作用越大。 In Example 12 using 10-functional urethane acrylate (UA510), the initial adhesion F0 is smaller than that of Example 4 using 6-functional urethane acrylate (UA306), and the adhesion F2 at high temperature after light curing is larger than that of Example 4. On the other hand, in Example 13 using high molecular weight urethane acrylate (UF-X9-83), F0 is larger and F2 is smaller than that of Examples 4 and 12. From these results, it can be seen that the larger the number of functional groups of urethane acrylate and the smaller the functional group equivalent, the greater the effect of reducing the initial adhesion and improving the adhesion.

若將實施例1與實施例9~11進行對比,則觀察到交聯劑之量越多,則光硬化前及光硬化後之黏著劑層之接著力越小,儲存彈性模數越大之傾向,並且觀察到伴隨著儲存彈性模數之增大,溫度循環試驗後之試樣之捲曲量變大之傾向。When comparing Example 1 with Examples 9 to 11, it is observed that the greater the amount of crosslinking agent, the smaller the adhesion of the adhesive layer before and after photocuring, and the greater the storage elastic modulus. It is also observed that as the storage elastic modulus increases, the curling amount of the sample after the temperature cycle test tends to increase.

於使用具有2EHA/2HEA=96/4之組成之聚合物B作為黏著劑之基礎聚合物之比較例4中,與實施例4相比,光硬化後之黏著劑層於高溫下之接著力F 2變小。又,於比較例4中,光硬化後之黏著劑層於低溫下之儲存彈性模數較大,伴隨於此,低溫與高溫(85℃)下之儲存彈性模數之差變大,因此溫度循環試驗後之試樣之捲曲變大。 In Comparative Example 4 using polymer B having a composition of 2EHA/2HEA=96/4 as the base polymer of the adhesive, the adhesive force F2 of the adhesive layer after light curing at high temperature becomes smaller than that of Example 4. In addition, in Comparative Example 4, the storage elastic modulus of the adhesive layer after light curing at low temperature is larger, and accordingly, the difference between the storage elastic modulus at low temperature and high temperature (85°C) becomes larger, so the curling of the sample after the temperature cycle test becomes larger.

於使用具有2EHA/2HEA=96/4之組成之聚合物B作為黏著劑之基礎聚合物之比較例4中,與實施例4相比,光硬化後之黏著劑層於高溫下之接著力F 2變小。又,於比較例4中,光硬化後之黏著劑層於低溫下之儲存彈性模數較大,伴隨於此,低溫與高溫(85℃)下之儲存彈性模數之差變大,溫度循環試驗後之試樣之捲曲變大。 In Comparative Example 4 using polymer B having a composition of 2EHA/2HEA=96/4 as the base polymer of the adhesive, the adhesive force F2 of the adhesive layer after light curing at high temperature becomes smaller than that of Example 4. In addition, in Comparative Example 4, the storage elastic modulus of the adhesive layer after light curing at low temperature is larger, and accordingly, the difference between the storage elastic modulus at low temperature and high temperature (85°C) becomes larger, and the curling of the sample after the temperature cycle test becomes larger.

於使用具有BA/NOAA/4HBA=20/70/10之組成之聚合物C作為黏著劑之基礎聚合物之比較例5中,高溫下之接著力F 2顯示出較比較例4更小之值。又,於比較例5中,與比較例4相比,光硬化後之黏著劑層於低溫下之儲存彈性模數較小,但與實施例4相比,低溫下之儲存彈性模數、以及低溫與高溫下之儲存彈性模數之差較大,溫度循環試驗後之試樣之捲曲之值亦大於實施例1。 In Comparative Example 5 using polymer C having a composition of BA/NOAA/4HBA=20/70/10 as the base polymer of the adhesive, the adhesion force F2 at high temperature shows a smaller value than that of Comparative Example 4. In Comparative Example 5, the storage elastic modulus of the adhesive layer after light curing at low temperature is smaller than that of Comparative Example 4, but the storage elastic modulus at low temperature and the difference between the storage elastic modulus at low temperature and high temperature are larger than those of Example 4, and the curling value of the sample after the temperature cycle test is also larger than that of Example 1.

於使用具有BA/AA=95/5之組成之聚合物D作為黏著劑之基礎聚合物,且將多官能丙烯酸酯之量設為30重量份之比較例6中,光硬化後之黏著劑層於高溫下之接著力F 2較小,溫度循環試驗後之試樣之捲曲為較大之值。 In Comparative Example 6, in which polymer D having a composition of BA/AA=95/5 was used as the base polymer of the adhesive and the amount of the multifunctional acrylate was set to 30 parts by weight, the adhesion F2 of the adhesive layer after photocuring at high temperature was smaller, and the curling of the sample after the temperature cycle test was a larger value.

由該等結果可知,藉由使用包含作為丙烯酸C 12烷基酯之丙烯酸月桂酯作為基礎聚合物之單體成分的聚合物A,並且將不具有胺基甲酸酯鍵之多官能(甲基)丙烯酸酯及胺基甲酸酯(甲基)丙烯酸酯作為光硬化劑加以併用,光硬化後之黏著劑層能夠兼顧高溫下之高接著力、及由低儲存彈性模數引起之溫度循環時之捲曲之減少。 These results show that by using a polymer A including lauryl acrylate as a C12 alkyl acrylate as a monomer component of a base polymer and using a multifunctional (meth)acrylate and a urethane (meth)acrylate having no urethane bond as photocuring agents, the adhesive layer after photocuring can achieve both high adhesion at high temperature and reduced curling during temperature cycling caused by a low storage elastic modulus.

1:膜基材 2:黏著劑層 5:剝離襯墊 10:補強膜 20:被黏著體 1: Film substrate 2: Adhesive layer 5: Peel-off pad 10: Reinforcement film 20: Adhesive

圖1係表示補強膜之積層構成之剖視圖。 圖2係表示補強膜之積層構成之剖視圖。 圖3係表示貼設有補強膜之裝置之剖視圖。 FIG1 is a cross-sectional view showing a laminated structure of a reinforcing film. FIG2 is a cross-sectional view showing a laminated structure of a reinforcing film. FIG3 is a cross-sectional view showing a device with a reinforcing film attached.

1:膜基材 1: Membrane substrate

2:黏著劑層 2: Adhesive layer

10:補強膜 10: Reinforcement film

Claims (14)

一種補強膜,其具備膜基材、及固著積層於上述膜基材之一主面上之黏著劑層, 上述黏著劑層包含光硬化性組合物,該光硬化性組合物包含丙烯酸系基礎聚合物、具有2個以上之光聚合性官能基之光硬化劑、及光聚合起始劑, 上述丙烯酸系基礎聚合物包含烷基之碳數為6~9之(甲基)丙烯酸C 6-9烷基酯、烷基之碳數為10~20之(甲基)丙烯酸C 10-20烷基酯、以及選自由含羥基單體及含羧基單體所組成之群中之1種以上作為單體成分,且相對於單體成分總量100重量份,(甲基)丙烯酸C 6-9烷基酯之量為40重量份以上, 上述丙烯酸系基礎聚合物中導入有交聯結構, 上述光硬化性組合物包含相對於上述丙烯酸系基礎聚合物100重量份為2~25重量份之不具有胺基甲酸酯鍵之多官能(甲基)丙烯酸酯、及相對於上述丙烯酸系基礎聚合物100重量份為0.03~5重量份之胺基甲酸酯(甲基)丙烯酸酯作為上述光硬化劑。 A reinforcing film comprises a film substrate and an adhesive layer fixedly laminated on one main surface of the film substrate. The adhesive layer comprises a photocurable composition, which comprises an acrylic-based polymer, a photocurable agent having two or more photopolymerizable functional groups, and a photopolymerization initiator. The acrylic-based polymer comprises a (meth)acrylic acid C 6-9 alkyl ester having an alkyl group with 6 to 9 carbon atoms, a (meth)acrylic acid C 10-20 alkyl ester having an alkyl group with 10 to 20 carbon atoms, and one or more selected from the group consisting of a hydroxyl-containing monomer and a carboxyl-containing monomer as monomer components, and the amount of the (meth)acrylic acid C 6-9 alkyl ester is 40 parts by weight or more relative to 100 parts by weight of the total amount of the monomer components. A cross-linked structure is introduced into the acrylic-based polymer. The photocurable composition comprises 2 to 25 parts by weight of a multifunctional (meth)acrylate having no urethane bond relative to 100 parts by weight of the acrylic base polymer, and 0.03 to 5 parts by weight of a urethane (meth)acrylate relative to 100 parts by weight of the acrylic base polymer as the photocuring agent. 如請求項1之補強膜,其中上述丙烯酸系基礎聚合物係使用相對於聚合物100重量份為0.05~1.0重量份之交聯劑導入有交聯結構。The reinforcing film of claim 1, wherein the acrylic-based polymer is introduced with a crosslinking structure using 0.05 to 1.0 parts by weight of a crosslinking agent relative to 100 parts by weight of the polymer. 如請求項2之補強膜,其中上述交聯劑為異氰酸酯系交聯劑或環氧系交聯劑。As in claim 2, the reinforcing film, wherein the crosslinking agent is an isocyanate crosslinking agent or an epoxy crosslinking agent. 如請求項1之補強膜,其中相對於上述丙烯酸系基礎聚合物之單體成分總量100重量份,(甲基)丙烯酸C 10-20烷基酯之量為1~40重量份。 The reinforcing film of claim 1, wherein the amount of the (meth)acrylic acid C10-20 alkyl ester is 1 to 40 parts by weight relative to 100 parts by weight of the total monomer components of the acrylic base polymer. 如請求項1之補強膜,其中上述多官能(甲基)丙烯酸酯之(甲基)丙烯醯基之官能基當量為80~500 g/eq。In the reinforcing film of claim 1, the functional group equivalent of the (meth)acryl group of the multifunctional (meth)acrylate is 80 to 500 g/eq. 如請求項1之補強膜,其中上述胺基甲酸酯(甲基)丙烯酸酯之(甲基)丙烯醯基之官能基當量為80~5000 g/eq。In the reinforcing film of claim 1, the functional group equivalent of the (meth)acryl group of the urethane (meth)acrylate is 80 to 5000 g/eq. 如請求項1之補強膜,其中上述胺基甲酸酯(甲基)丙烯酸酯於1分子中具有4個以上之(甲基)丙烯醯基。The reinforcing film of claim 1, wherein the urethane (meth)acrylate has 4 or more (meth)acryl groups in one molecule. 如請求項1至7中任一項之補強膜,其中上述黏著劑層 於光硬化前在溫度25℃下對聚醯亞胺膜之接著力F 0為0.6 N/25 mm以下, 於光硬化後在溫度25℃之環境下對聚醯亞胺膜之接著力F 1為3.0 N/25 mm以上,在溫度85℃之環境下對聚醯亞胺膜之接著力F 2為1.0 N/25 mm以上。 A reinforcing film as claimed in any one of claims 1 to 7, wherein the adhesive layer has an adhesion force F0 of less than 0.6 N/25 mm to the polyimide film at a temperature of 25°C before photocuring, an adhesion force F1 of more than 3.0 N/25 mm to the polyimide film at a temperature of 25°C after photocuring, and an adhesion force F2 of more than 1.0 N/25 mm to the polyimide film at a temperature of 85°C. 如請求項1至7中任一項之補強膜,其中上述黏著劑層於光硬化後在溫度25℃下之剪切儲存彈性模數為100 kPa以下。A reinforcing film as claimed in any one of claims 1 to 7, wherein the shear storage modulus of the adhesive layer at a temperature of 25° C. after light curing is less than 100 kPa. 如請求項1至7中任一項之補強膜,其中上述黏著劑層於光硬化後在溫度-40℃下之剪切儲存彈性模數為1000 kPa以下。A reinforcing film as claimed in any one of claims 1 to 7, wherein the shear storage modulus of the adhesive layer at a temperature of -40°C after light curing is less than 1000 kPa. 一種裝置之製造方法,其係表面貼合有補強膜之裝置之製造方法,該製造方法係 將如請求項1至10中任一項之補強膜之上述黏著劑層暫時黏著於被黏著體之表面後, 對上述黏著劑層照射活性光線而使上述黏著劑層光硬化,藉此使上述補強膜與上述被黏著體之接著力上升。 A method for manufacturing a device having a reinforcing film attached to the surface thereof, wherein the method comprises: temporarily adhering the adhesive layer of the reinforcing film as in any one of claims 1 to 10 to the surface of an adherend, irradiating the adhesive layer with active light to photo-harden the adhesive layer, thereby increasing the bonding strength between the reinforcing film and the adherend. 如請求項11之裝置之製造方法,其係於將上述補強膜暫時黏著於上述被黏著體之後且使上述黏著劑層光硬化之前,對暫時黏著於上述被黏著體之上述補強膜進行切割,自上述被黏著體上之一部分區域剝離去除上述補強膜。The manufacturing method of the device of claim 11 comprises cutting the reinforcing film temporarily adhered to the adherend after the reinforcing film is temporarily adhered to the adherend and before the adhesive layer is photocured, thereby peeling off and removing the reinforcing film from a portion of the adherend. 如請求項11或12之裝置之製造方法,其中上述被黏著體為可彎折之圖像顯示元件。A method for manufacturing a device as claimed in claim 11 or 12, wherein the adherend is a bendable image display element. 一種補強方法,其係將補強膜貼合於被黏著體之表面者,該補強方法係 將如請求項1至10中任一項之補強膜之上述黏著劑層暫時黏著於被黏著體之表面, 對上述黏著劑層照射活性光線而使上述黏著劑層光硬化,藉此使上述補強膜與上述被黏著體之接著力上升。 A reinforcing method is to adhere a reinforcing film to the surface of an adherend, wherein the reinforcing method is to temporarily adhere the adhesive layer of the reinforcing film as in any one of claims 1 to 10 to the surface of the adherend, and to irradiate the adhesive layer with active light to photo-harden the adhesive layer, thereby increasing the bonding strength between the reinforcing film and the adherend.
TW113128289A 2023-08-10 2024-07-30 Reinforcement film, device manufacturing method and reinforcement method TW202508824A (en)

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