TW202501943A - Driving circuit - Google Patents
Driving circuit Download PDFInfo
- Publication number
- TW202501943A TW202501943A TW112121958A TW112121958A TW202501943A TW 202501943 A TW202501943 A TW 202501943A TW 112121958 A TW112121958 A TW 112121958A TW 112121958 A TW112121958 A TW 112121958A TW 202501943 A TW202501943 A TW 202501943A
- Authority
- TW
- Taiwan
- Prior art keywords
- coupled
- gate
- source
- power terminal
- field effect
- Prior art date
Links
- 230000005669 field effect Effects 0.000 claims abstract description 54
- 229910044991 metal oxide Inorganic materials 0.000 claims description 23
- 150000004706 metal oxides Chemical group 0.000 claims description 23
- 239000004065 semiconductor Substances 0.000 claims description 23
- 238000010586 diagram Methods 0.000 description 10
- 230000003071 parasitic effect Effects 0.000 description 5
- 239000003990 capacitor Substances 0.000 description 3
- 230000001808 coupling effect Effects 0.000 description 2
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
Images
Landscapes
- Semiconductor Integrated Circuits (AREA)
Abstract
Description
本發明是關於一種驅動電路,特別是關於一種具有靜電放電保護能力的驅動電路。The present invention relates to a driving circuit, and more particularly to a driving circuit with electrostatic discharge protection capability.
因靜電放電(electrostatic discharge;ESD)所造成之元件損害對積體電路產品來說已經成為最主要的可靠度問題之一。尤其是隨著尺寸不斷地縮小至深次微米之程度,金氧半導體之閘極氧化層也越來越薄,積體電路更容易因靜電放電現象而遭受破壞。Component damage caused by electrostatic discharge (ESD) has become one of the most important reliability issues for integrated circuit products. In particular, as the size continues to shrink to the sub-micron level, the gate oxide layer of metal oxide semiconductors is becoming thinner and thinner, making integrated circuits more susceptible to damage due to ESD.
在一般的工業標準中,積體電路產品之輸出入接腳(I/O pin)必需能夠通過2000伏特以上之人體模式靜電放電測試以及200伏特以上之機械模式靜電放電測試。因此,在積體電路產品中,靜電放電防護元件必需設置在所有輸出入銲墊(pad)附近,以保護內部之核心電路(core circuit)不受靜電放電電流之侵害。In general industrial standards, the I/O pins of integrated circuit products must be able to pass the human body model electrostatic discharge test of more than 2000 volts and the mechanical model electrostatic discharge test of more than 200 volts. Therefore, in integrated circuit products, electrostatic discharge protection components must be installed near all input and output pads to protect the internal core circuit from electrostatic discharge current.
本發明之一實施例提供一種驅動電路,用以供電予一內部電路,並包括一接面場效電晶體、一阻抗元件以及一靜電放電保護電路。接面場效電晶體具有一第一閘極、一第一汲極以及一第一源極。第一源極耦接內部電路。阻抗元件耦接於第一閘極與一第一電源端之間。靜電放電保護電路耦接於第一源極與第一電源端之間。在一正常操作期間,內部電路根據第一源極的電壓而動作。在一保護期間,靜電放電保護電路導通,用以釋放一靜電放電電流至第一電源端。One embodiment of the present invention provides a driving circuit for supplying power to an internal circuit, and includes a junction field effect transistor, an impedance element and an electrostatic discharge protection circuit. The junction field effect transistor has a first gate, a first drain and a first source. The first source is coupled to the internal circuit. The impedance element is coupled between the first gate and a first power supply terminal. The electrostatic discharge protection circuit is coupled between the first source and the first power supply terminal. During a normal operation period, the internal circuit operates according to the voltage of the first source. During a protection period, the electrostatic discharge protection circuit is turned on to release an electrostatic discharge current to the first power supply terminal.
在另一實施例中,第一汲極耦接一第二電源端。當第二電源端的電壓上升時,第一源極的電壓增加。In another embodiment, the first drain is coupled to a second power terminal. When the voltage of the second power terminal rises, the voltage of the first source increases.
在另一實施例中,阻抗元件係為一電阻。電阻的阻值大於5M歐姆。In another embodiment, the impedance element is a resistor, and the resistance of the resistor is greater than 5M ohms.
在另一實施例中,阻抗元件係為一金屬氧化半導體場效電晶體。金屬氧化半導體場效電晶體具有一第二閘極、一第二源極以及一第二汲極。第二閘極耦接第二源極。第二汲極耦接第一閘極。第二源極耦接第一電源端。In another embodiment, the impedance element is a metal oxide semiconductor field effect transistor. The metal oxide semiconductor field effect transistor has a second gate, a second source and a second drain. The second gate is coupled to the second source. The second drain is coupled to the first gate. The second source is coupled to the first power terminal.
在另一實施例中,阻抗元件係為一金屬氧化半導體場效電晶體。金屬氧化半導體場效電晶體具有一第二閘極、一第二源極以及一第二汲極。第二閘極耦接第二源極。第二源極耦接第一閘極。第二汲極耦接第一電源端。In another embodiment, the impedance element is a metal oxide semiconductor field effect transistor. The metal oxide semiconductor field effect transistor has a second gate, a second source and a second drain. The second gate is coupled to the second source. The second source is coupled to the first gate. The second drain is coupled to the first power terminal.
在另一實施例中,阻抗元件係為一雙載子接面電晶體。雙載子接面電晶體具有一基極、一集極以及一射極。基極耦接射極。集極耦接第一閘極。射極耦接第一電源端。In another embodiment, the impedance element is a bipolar junction transistor. The bipolar junction transistor has a base, a collector and an emitter. The base is coupled to the emitter. The collector is coupled to the first gate. The emitter is coupled to the first power terminal.
在另一實施例中,阻抗元件係為一雙載子接面電晶體。雙載子接面電晶體具有一基極、一集極以及一射極。基極耦接射極。射極耦接第一閘極。集極耦接第一電源端。In another embodiment, the impedance element is a bipolar junction transistor. The bipolar junction transistor has a base, a collector and an emitter. The base is coupled to the emitter. The emitter is coupled to the first gate. The collector is coupled to the first power terminal.
在另一實施例中,當一靜電放電事件發生時,第一閘極的電壓大於第一源極的電壓。In another embodiment, when an electrostatic discharge event occurs, the voltage of the first gate is greater than the voltage of the first source.
為讓本發明之目的、特徵和優點能更明顯易懂,下文特舉出實施例,並配合所附圖式,做詳細之說明。本發明說明書提供不同的實施例來說明本發明不同實施方式的技術特徵。其中,實施例中的各元件之配置係為說明之用,並非用以限制本發明。另外,實施例中圖式標號之部分重覆,係為了簡化說明,並非意指不同實施例之間的關聯性。In order to make the purpose, features and advantages of the present invention more clearly understood, the following is a detailed description of the embodiments and the accompanying drawings. The present invention specification provides different embodiments to illustrate the technical features of different embodiments of the present invention. The configuration of each component in the embodiments is for illustration purposes only and is not intended to limit the present invention. In addition, the repetition of some of the figure numbers in the embodiments is for the purpose of simplifying the description and does not mean the correlation between different embodiments.
第1圖為本發明之控制晶片的示意圖。如圖所示,控制晶片100包括一驅動電路110以及一內部電路120。驅動電路110耦接於電源端130與電源端140之間。在一正常操作期間,驅動電路110供電予內部電路120。在一保護期間,驅動電路110保護內部電路120,避免一靜電放電(electrostatic discharge;ESD)電流進入內部電路120。FIG. 1 is a schematic diagram of the control chip of the present invention. As shown in the figure, the
舉例而言,當一靜電放電事件未發生時,驅動電路120操作於一正常模式。在正常模式下,電源端130接收一第一操作電壓,電源端140接收一第二操作電壓。第二操作電壓可能係為一接地電壓。在此例中,第一操作電壓大於接地電壓。在正常模式下,驅動電路110可能傳送第一操作電壓予內部電路120,或是提供一略小於第一操作電壓的電壓予內部電路120。當靜電放電事件發生於電源端130並且電源端140接收一接地電壓時,驅動電路110操作於一保護模式。在保護模式下,驅動電路110提供一放電路徑,用以將一靜電放電電流由電源端130釋放至電源端140。For example, when an electrostatic discharge event does not occur, the
驅動電路110包括一接面場效電晶體(junction field effect transistor;JFET)111、一阻抗元件112以及一靜電放電保護電路113。在本實施例中,接面場效電晶體111係為一超高壓元件(ultra-high-voltage;UHV),也是一初始導通(initial-on)元件。如圖所示,接面場效電晶體111具有一閘極G_1、一汲極D_1以及一源極S_1。閘極G_1耦接阻抗元件112。汲極D_1耦接電源端130。源極S_1耦接內部電路120及靜電放電保護電路113。在本實施例中,接面場效電晶體111的汲極D_1與閘極G_1之間具有一寄生電容Cgd。The
當電源端130接收一第一操作電壓,電源端140接收一第二操作電壓時,接面場效電晶體111導通。因此,源極S_1的電壓逐漸上升。在源極S_1的電壓穩定後(如接近第一操作電壓),內部電路120根據源極S_1的電壓而動作。在此例中,源極S_1的電壓作為內部電路120的操作電壓。When the
當靜電放電事件發生於電源端130並且電源端140接收一接地電壓時,藉由寄生電容Cgd的電容耦合效應(capacitive coupling),閘極G_1的電壓上升。由於閘極G_1的電壓大於源極S_1的電壓,故接面場效電晶體111維持於導通狀態。此時,源極S_1的電壓增加。當源極S_1的電壓達一觸發電壓時,靜電放電保護電路113動作,用以提供一放電路徑。該放電路徑將一靜電放電電流由電源端130釋放至電源端140。When an electrostatic discharge event occurs at the
阻抗元件112耦接於閘極G_1與電源端140之間,用以阻擋靜電放電電流灌入閘極G_1。另外,在靜電放電事件發生時,藉由阻抗元件112,接面場效電晶體111的閘極G_1的電壓大於源極S_1的電壓。因此,阻抗元件112確保接面場效電晶體111在靜電放電事件下維持導通。The
本發明並不限定阻抗元件112的種類。在一可能實施例中,阻抗元件112係為一電阻。在此例中,電阻的阻值大於5M歐姆。在一些實施例中,電阻的阻值大於10M歐姆。當一靜電放電事件發生於電源端130並且電源端140接收一接地電壓時,由於阻抗元件112耦接於閘極G_1與電源端140之間,故可避免靜電放電電流灌入並傷害閘極G_1。在一些實施例中,藉由阻抗元件112耦接於接面場效電晶體111的閘極G_與電源端140之間,接面場效電晶體111可承受4.6KV以上的電壓。The present invention does not limit the type of the
靜電放電保護電路113耦接於接面場效電晶體111的源極S_1與電源端140之間,用以避免一靜電放電電流進入內部電路120。舉例而言,當一靜電放電事件發生於電源端130並且電源端140接收一接地電壓時,由於寄生電容Cgd所引起的電容耦合效應,閘極G_1的電壓增加。由於接面場效電晶體111的閘極G_1的電壓大於源極S_1的電壓,故接面場效電晶體111導通。因此,源極S_1的電壓逐漸上升。當接面場效電晶體111的源極S_1的電壓達一觸發電壓時,靜電放電保護電路113導通,用以將一靜電放電電流由電源端130釋放至電源端140。The electrostatic
當靜電放電事件未發生時,電源端130接收一第一操作電壓,並且電源端140接收一第二操作電壓。此時,接面場效電晶體111導通。因此,接面場效電晶體111的源極S_1的電壓上升。由於接面場效電晶體111的源極S_1的電壓不足以觸發靜電放電保護電路113,故靜電放電保護電路113不動作。此時,內部電路120根據源極S_1的電壓而動作。When an ESD event does not occur, the
第2A圖為本發明之阻抗元件的示意圖。在本實施例中,阻抗元件112係為一N型金屬氧化半導體場效電晶體(N-type metal-oxide semiconductor FET;NMOSFET)210。N型金屬氧化半導體場效電晶體210具有一閘極G_2、一汲極D_2以及一源極S_2。FIG. 2A is a schematic diagram of an impedance element of the present invention. In this embodiment, the
N型金屬氧化半導體場效電晶體210的閘極G_2耦接源極S_2及電源端140。N型金屬氧化半導體場效電晶體210的汲極D_2耦接接面場效電晶體111的閘極G_1。在一些實施例中,閘極G_2直接電性連接源極S_2及電源端140。在此例中,汲極D_2直接電性連接接面場效電晶體111的閘極G_1。The gate G_2 of the NMOS 210 is coupled to the source S_2 and the
在N型金屬氧化半導體場效電晶體210導通時,N型金屬氧化半導體場效電晶體210具有一等效阻抗(equivalent resistance)。藉由N型金屬氧化半導體場效電晶體210導通時的等效阻抗,可避免來自電源端130的靜電放電電流灌入接面場效電晶體111的閘極G_1。因此,N型金屬氧化半導體場效電晶體210不讓閘極G_1受到靜電放電電流的傷害。When the N-type metal oxide semiconductor field effect transistor 210 is turned on, the N-type metal oxide semiconductor field effect transistor 210 has an equivalent resistance. The equivalent resistance when the N-type metal oxide semiconductor field effect transistor 210 is turned on can prevent the electrostatic discharge current from the
第2B圖為本發明之阻抗元件的另一示意圖。在本實施例中,阻抗元件112係為一P型金屬氧化半導體場效電晶體(PMOSFET)220。P型金屬氧化半導體場效電晶體220具有一閘極G_3、一汲極D_3以及一源極S_3。FIG. 2B is another schematic diagram of the impedance element of the present invention. In this embodiment, the
P型金屬氧化半導體場效電晶體220的閘極G_3電性耦接源極S_3及接面場效電晶體111的閘極G_1。P型金屬氧化半導體場效電晶體220的汲極D_3電性耦接電源端140。在一些實施例中,閘極G_3直接電性連接源極S_3及接面場效電晶體111的閘極G_1。另外,汲極D_3可能直接電性連接電源端140。The gate G_3 of the P-type metal oxide semiconductor
在P型金屬氧化半導體場效電晶體220導通時,P型金屬氧化半導體場效電晶體220具有一等效阻抗。藉由P型金屬氧化半導體場效電晶體220導通時的等效阻抗,可避免來自電源端130的靜電放電電流直接灌入接面場效電晶體111的閘極G_1。因此,P型金屬氧化半導體場效電晶體220可保護接面場效電晶體111的閘極G_1,避免閘極G_1受到靜電放電電流的傷害。When the P-type metal oxide semiconductor
第2C圖為本發明之阻抗元件的另一示意圖。在本實施例中,阻抗元件112係為一雙載子接面電晶體(bipolar junction transistor;BJT)230。雙載子接面電晶體230為npn型。雙載子接面電晶體230具有一基極B_1、一集極C_1以及一射極E_1。FIG. 2C is another schematic diagram of the impedance element of the present invention. In the present embodiment, the
雙載子接面電晶體230的集極C_1耦接接面場效電晶體111的閘極G_1。雙載子接面電晶體230的基極B_1耦接射極E_1及電源端140。在一些實施例中,雙載子接面電晶體230的集極C_1直接電性連接接面場效電晶體111的閘極G_1。在此例中,雙載子接面電晶體230的基極B_1直接電性連接射極E_1及電源端140。The collector C_1 of the
當雙載子接面電晶體230導通時,雙載子接面電晶體230具有一等效阻抗。藉由雙載子接面電晶體230導通時的等效阻抗,可避免來自電源端130的靜電放電電流直接灌入接面場效電晶體111的閘極G_1。因此,雙載子接面電晶體230可保護接面場效電晶體111的閘極G_1,避免閘極G_1受到靜電放電電流的傷害。When the
第2D圖為本發明之阻抗元件的另一示意圖。在本實施例中,阻抗元件112係為一雙載子接面電晶體240。雙載子接面電晶體240為pnp型。雙載子接面電晶體240具有一基極B_2、一集極C_2以及一射極E_2。FIG. 2D is another schematic diagram of the impedance element of the present invention. In this embodiment, the
雙載子接面電晶體240的基極B_2電性耦接射極E_2及接面場效電晶體111的閘極G_1。雙載子接面電晶體240的集極C_2電性耦接電源端140。在一些實施例中,雙載子接面電晶體230的基極B_2直接電性連接射極E_2及接面場效電晶體111的閘極G_1。在此例中,雙載子接面電晶體240的集極C_2直接電性連接電源端140。The base B_2 of the
當雙載子接面電晶體240導通時,雙載子接面電晶體240具有一等效阻抗。藉由雙載子接面電晶體240導通時的等效阻抗,可避免來自電源端130的靜電放電電流直接灌入接面場效電晶體111的閘極G_1。因此,雙載子接面電晶體240可保護接面場效電晶體111的閘極G_1,避免閘極G_1受到靜電放電電流的傷害。When the
必須瞭解的是,當一個元件或層被提及與另一元件或層「耦接」時,係可直接耦接或連接至其它元件或層,或具有其它元件或層介於其中。反之,若一元件或層「連接」至其它元件或層時,將不具有其它元件或層介於其中。It should be understood that when an element or layer is referred to as being "coupled" to another element or layer, it may be directly coupled or connected to the other element or layer, or have other elements or layers interposed therebetween. Conversely, if an element or layer is "connected" to another element or layer, there will be no other elements or layers interposed therebetween.
除非另作定義,在此所有詞彙(包含技術與科學詞彙)均屬本發明所屬技術領域中具有通常知識者之一般理解。此外,除非明白表示,詞彙於一般字典中之定義應解釋為與其相關技術領域之文章中意義一致,而不應解釋為理想狀態或過分正式之語態。雖然“第一”、“第二”等術語可用於描述各種元件,但這些元件不應受這些術語的限制。這些術語只是用以區分一個元件和另一個元件。Unless otherwise defined, all terms (including technical and scientific terms) herein are generally understood by those with ordinary knowledge in the art to which the present invention belongs. In addition, unless otherwise expressly stated, the definitions of terms in general dictionaries should be interpreted as consistent with the meanings in articles in the relevant art, and should not be interpreted as ideal or overly formal. Although terms such as "first" and "second" can be used to describe various components, these components should not be limited by these terms. These terms are only used to distinguish one component from another.
雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾。舉例來說,本發明實施例所述之系統、裝置或是方法可以硬體、軟體或硬體以及軟體的組合的實體實施例加以實現。因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。Although the present invention has been disclosed as above with preferred embodiments, it is not intended to limit the present invention. Any person with ordinary knowledge in the relevant technical field may make some changes and modifications without departing from the spirit and scope of the present invention. For example, the system, device or method described in the embodiments of the present invention can be implemented in the form of hardware, software or a combination of hardware and software. Therefore, the scope of protection of the present invention shall be determined by the scope of the attached patent application.
100:控制晶片
100:控制晶片
110:驅動電路
120:內部電路
130、140:電源端
111:接面場效電晶體
112:阻抗元件
113:靜電放電保護電路
G_1、G_2、G_3:閘極
D_1、D_2、D_3:汲極
S_1、S_2、S_3:源極
Cgd:寄生電容
210:N型金屬氧化半導體場效電晶體
220:P型金屬氧化半導體場效電晶體
230、240:雙載子接面電晶體
B_1、B_2:基極
C_1、C_2:集極
E_1、E_2:射極
100: Control chip
100: Control chip
110: Drive circuit
120:
第1圖為本發明之控制晶片的示意圖。 第2A圖為本發明之阻抗元件的示意圖。 第2B圖為本發明之阻抗元件的另一示意圖。 第2C圖為本發明之阻抗元件的另一示意圖。 第2D圖為本發明之阻抗元件的另一示意圖。 Figure 1 is a schematic diagram of the control chip of the present invention. Figure 2A is a schematic diagram of the impedance element of the present invention. Figure 2B is another schematic diagram of the impedance element of the present invention. Figure 2C is another schematic diagram of the impedance element of the present invention. Figure 2D is another schematic diagram of the impedance element of the present invention.
100:控制晶片 100: Control chip
110:驅動電路 110:Drive circuit
120:內部電路 120: Internal circuit
130、140:電源端 130, 140: Power supply terminal
111:接面場效電晶體 111: Junction Field Effect Transistor
112:阻抗元件 112: Impedance element
113:靜電放電保護電路 113: Electrostatic discharge protection circuit
G_1:閘極 G_1: Gate
D_1:汲極 D_1: Drain
S_1:源極 S_1: Source
Cgd:寄生電容 Cgd: parasitic capacitance
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW112121958A TW202501943A (en) | 2023-06-13 | 2023-06-13 | Driving circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW112121958A TW202501943A (en) | 2023-06-13 | 2023-06-13 | Driving circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
TW202501943A true TW202501943A (en) | 2025-01-01 |
Family
ID=95152778
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW112121958A TW202501943A (en) | 2023-06-13 | 2023-06-13 | Driving circuit |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW202501943A (en) |
-
2023
- 2023-06-13 TW TW112121958A patent/TW202501943A/en unknown
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0827252A2 (en) | Non-breakdown triggered electrostatic discharge protection circuit for an integrated circuit and method therefor | |
US7589945B2 (en) | Distributed electrostatic discharge protection circuit with varying clamp size | |
Polgreen et al. | Improving the ESD failure threshold of silicided n-MOS output transistors by ensuring uniform current flow | |
US7889470B2 (en) | ESD protection circuit with active triggering | |
TW560038B (en) | Electrostatic discharge protection circuit using whole chip trigger technique | |
US8830640B2 (en) | Electrostatic discharge protection circuit | |
US20080151446A1 (en) | Electrostatic discharge protection device and layout thereof | |
US6927957B1 (en) | Electrostatic discharge clamp | |
US20090268359A1 (en) | Electrostatic discharge power clamp with improved electrical overstress robustness | |
JP2012516571A (en) | Method and apparatus for reducing the area required for ESD protection in an integrated circuit | |
JP2011071502A (en) | Method for designing integrated electronic circuit having esd protection and circuit obtained thereof | |
US11804708B2 (en) | Fast triggering electrostatic discharge protection | |
TW200828557A (en) | Device for protecting semiconductor IC | |
US6744107B1 (en) | ESD protection circuit with self-triggered technique | |
US6351364B1 (en) | Electrostatic discharge protection circuit | |
US7746610B2 (en) | Device for discharging static electricity | |
WO2017157117A1 (en) | Electrostatic discharge (esd) protective circuit for integrated circuit | |
US9331067B2 (en) | BigFET ESD protection that is robust against the first peak of a system-level pulse | |
US10714933B2 (en) | Method and apparatus for low clamping voltage ESD solution for transient sensitive applications | |
US20150085409A1 (en) | Active esd protection circuit with blocking diode | |
CN100517895C (en) | Electrostatic discharge circuit and method thereof | |
JPH10242400A (en) | Circuits for protection against electrostatic discharge | |
US6317306B1 (en) | Electrostatic discharge protection circuit | |
TWI227560B (en) | Electrostatic discharge protection circuit and its method through control of substrate potential | |
Ker et al. | Overview on electrostatic discharge protection designs for mixed-voltage I/O interfaces: Design concept and circuit implementations |