TW202426158A - Laser bonding of glass substrates - Google Patents

Abstract

A method of bonding glass substrates comprises: disposing a first absorbing layer between a first edge of a first glass substrate and a second edge of a second glass substrate; contacting the first edge of a first glass substrate and the second edge of the second glass substrate with the first absorbing layer to form a first interface; disposing a refracting optical element optically upstream of the first glass substrate and the second glass substrate, the refracting optical element forming optical contact with at least one of the first glass substrate and the second glass substrate; and conducting a first welding step by directing a laser beam on an incident side of the refracting optical element such that the laser beam is refracted on the first interface at a first incident side angle to bond the first glass substrate to the second glass substrate and form a first bond location.

Description

Laser bonding of glass substrates

This application claims the benefit of priority under patent law to U.S. Provisional Application No. 63/428,479, filed on November 29, 2022, the contents of which are hereby relied upon and incorporated by reference in their entirety.

This specification generally relates to glass bonding to glass, and specifically to laser bonding of edges of glass substrates.

Welding glass objects is becoming increasingly popular for a wide range of applications. In certain applications, it may be desirable to form a large monolithic object, which can be produced by contacting the edges of relatively small glass substrates and welding the glass substrates together. However, due to the refraction of light, it can be difficult to deliver a focused laser beam to specific portions of the glass substrates (e.g., the edges) to adequately weld the glass substrates.

Therefore, there exists a need for an alternative method of producing welded glass articles formed by welding the edges of glass substrates together.

According to a first aspect A1, a method for laser bonding glass substrates may include: disposing a first absorption layer between a first edge of a first glass substrate and a second edge of a second glass substrate, the first glass substrate and the second glass substrate each including a major opposing surface, the major opposing surfaces of the first glass substrate and the second glass substrate being bounded by respective first and second edges; contacting the first edge of the first glass substrate and the second edge of the second glass substrate to the first absorption layer to form a first interface; disposing a refractive optical element optically upstream of the first glass substrate and the second glass substrate, the refractive optical element forming an optical contact with at least one of the first glass substrate and the second glass substrate; and performing a first welding step by directing a laser beam on an incident side of the refractive optical element so that the laser beam is refracted at a first incident side angle on the first interface to bond the first glass substrate to the second glass substrate and form a first bonding position.

A second aspect A2 comprises the method according to the first aspect A1, wherein the laser beam is directed orthogonal to the first glass substrate and the second glass substrate.

A third aspect A3 comprises a method according to the second aspect A2, wherein the refractive optical element is a prism having a base angle greater than or equal to 70° and less than or equal to 85°.

A fourth aspect A4 comprises the method according to the second aspect A2, wherein the refractive optical element is a diffraction grating having a diffraction angle greater than or equal to 30°.

A fifth aspect A5 includes a method according to the first aspect A1, wherein the laser beam is directed at an angle greater than 0° relative to the first glass substrate and the second glass substrate.

A sixth aspect A6 comprises a method according to the fifth aspect A5, wherein the refractive optical element is a prism having a base angle greater than or equal to 30° and less than or equal to 60°.

A seventh aspect A7 comprises the method according to the fifth aspect A5, wherein the refractive optical element is a diffraction grating having a diffraction angle greater than or equal to 20°.

The eighth aspect A8 includes a method according to any one of the first to seventh aspects A1-A7, wherein the first incident side angle is greater than or equal to 0° and less than or equal to 45°.

A ninth aspect A9 comprises a method according to any one of the first to eighth aspects A1-A8, wherein during the first welding step, the laser beam is displaced relative to the incident side of the refractive optical element.

A tenth aspect A10 comprises a method according to any one of the first to ninth aspects A1-A9, wherein the refractive optical element is a prism comprising a coating disposed on the incident side.

The eleventh aspect A11 includes the method according to the tenth aspect A10, wherein the coating comprises an anti-reflective coating.

A twelfth aspect A12 comprises a method according to any one of the first to ninth aspects A1-A9, wherein the refractive optical element is a diffraction grating having a structured surface.

The thirteenth aspect A13 includes a method according to any one of the first to twelfth aspects A1-A12, wherein the refractive optical element comprises fused silica.

A fourteenth aspect A14 includes a method according to any one of the first to thirteenth aspects A1-A13, wherein the first bonding location has a transmittance greater than or equal to 70% at a given wavelength and at an object thickness of 0.5 mm.

A fifteenth aspect A15 comprises a method according to any one of the first to fourteenth aspects A1-A14, wherein the contacting step comprises aligning major opposing surfaces of the first glass substrate and the second glass substrate along a plane perpendicular to the first interface.

The sixteenth aspect A16 comprises a method according to any one of the first to fifteenth aspects A1-A15, wherein the first absorption layer comprises a metal film, a metal foil, an inorganic specialized glass, a glass frit, or a combination thereof.

The seventeenth aspect A17 includes a method according to the sixteenth aspect A16, wherein the metal film comprises copper, aluminum, stainless steel, chromium, molybdenum, nickel, tin oxide, silicon oxide, tin phosphate, tin fluorophosphate, chalcogenide glass, tellurite glass, borate glass, or a combination of the foregoing.

The eighteenth aspect A18 comprises a method according to the sixteenth aspect A16 or the seventeenth aspect A17, wherein the metal foil comprises aluminum, an aluminum alloy, stainless steel, nickel, a nickel alloy, silver, a silver alloy, titanium, a titanium alloy, tungsten, a tungsten alloy, gold, a gold alloy, copper, a copper alloy, bronze, iron, or a combination of the foregoing.

The nineteenth aspect A19 comprises a method according to any one of the sixteenth to eighteenth aspects A16-A18, wherein the inorganic specialized glass comprises a fluoride glass material, a tin-doped glass material, a transition metal-doped glass material, or a combination of the foregoing.

The twentieth aspect A20 comprises a method according to any one of the sixteenth to nineteenth aspects A16-A19, wherein the glass frit is a low temperature glass frit comprising at least one absorbing ion, the at least one absorbing ion comprising at least one of iron, copper, vanadium, and neodymium.

The twenty-first aspect A21 includes the method according to any one of the first to twentieth aspects A1-A20, wherein the first absorption layer has a thickness greater than or equal to 20 nm and less than or equal to 1 µm.

The twenty-second aspect A22 comprises a method according to any one of the first to twenty-first aspects A1-A21, wherein the method further comprises: disposing a second absorption layer between a second edge of a second glass substrate and a third edge of a third glass substrate, the third glass substrate comprising a main opposing surface, the main opposing surface of the third glass substrate being bounded by the third edge; contacting the second edge of the second glass substrate and the third edge of the third glass substrate to the second absorption layer to form a second interface; disposing a refractive optical element optically upstream of the second glass substrate and the third glass substrate; and performing a second welding step by directing a laser beam on an incident side of the refractive optical element so that the laser beam is refracted at a second incident side angle on the second interface to bond the second glass substrate to the third glass substrate and form a second bonding position.

The twenty-third aspect A23 includes a method according to any one of the first to twenty-second aspects A1-A22, wherein the laser beam comprises a wavelength such that the first glass substrate, the second glass substrate, and the refractive optical element are substantially transparent to the wavelength of the laser beam.

The twenty-fourth aspect A24 comprises a method according to any one of the first to twenty-third aspects A1-A23, wherein the laser beam comprises a wavelength such that the first absorption layer is substantially opaque to the wavelength of the laser beam.

The twenty-fifth aspect A25 includes a method according to any one of the first to twenty-fourth aspects A1-A24, wherein the laser beam comprises a pulsed laser, and the pulsed laser is a nanosecond pulsed laser, a picosecond pulsed laser, or a femtosecond pulsed laser.

A twenty-sixth aspect A26 comprises the method according to the twenty-fifth aspect A25, wherein the pulsed laser comprises: a pulse energy greater than or equal to 0.1 µJ and less than or equal to 1000 µJ; a wavelength greater than or equal to 300 nm and less than or equal to 2000 nm; a repetition rate greater than or equal to 1 kHz and less than or equal to 1000 kHz; and a spot size greater than or equal to 5 µm and less than or equal to 50 µm.

A twenty-seventh aspect A27 includes the method according to the twenty-fifth aspect A25 or the twenty-sixth aspect A26, wherein the pulsed laser comprises a pulse width less than or equal to 10 ps.

The twenty-eighth aspect A28 includes a method according to any one of the first to twenty-seventh aspects A1-A27, wherein the first glass substrate and the second glass substrate include a refractive index greater than or equal to 1.5 and less than or equal to 2.4.

The twenty-ninth aspect A29 includes a method according to any one of the first to twenty-eighth aspects A1-A28, wherein the first glass substrate and the second glass substrate comprise glass or glass ceramics, and the glass or glass ceramics comprise borate glass, silica borate glass, phosphate glass, silicon carbide glass, sodium calcium silicate glass, aluminum silicate glass, alkali metal aluminum silicate glass, borosilicate glass, alkali metal borosilicate glass, aluminum borosilicate glass, alkali metal aluminum borosilicate glass, alkali metal aluminum silicate glass, fused silica, or low expansion glass.

The 30th aspect A30 comprises a method according to the 29th aspect A29, wherein the low expansion glass comprises titanium dioxide silicate glass.

The thirty-first aspect A31 includes the method according to any one of the first to thirtieth aspects A1-A30, wherein the first glass substrate and the second glass substrate have a thickness greater than or equal to 0.5 mm.

According to the thirty-second aspect A32, an object may include: a first glass substrate including a first edge; a second glass substrate including a second edge, the first glass substrate and the second glass substrate each including a major opposing surface, the major opposing surfaces of the first glass substrate and the second glass substrate being bounded by the respective first edge and the second edge; and a first interface weld between the first edge of the first glass substrate and the second edge of the second glass substrate.

The thirty-third aspect A33 comprises an article according to the thirty-second aspect A32, wherein the first interface weld comprises weld lines having a width greater than or equal to 5 µm and less than or equal to 1 mm and a distance between the weld lines greater than or equal to 1 µm and less than or equal to 1000 µm.

A thirty-fourth aspect A34 comprises an object according to the thirty-second aspect A32 or the thirty-third aspect A33, wherein the object further comprises a third glass substrate and a second interface weld between a third edge of the third glass substrate and a second edge of the second glass substrate, the third glass substrate comprising a major opposing surface, the major opposing surface of the third glass substrate being bounded by the third edge.

A thirty-fifth aspect A35 includes the article of any one of aspects A32-A34, wherein the article further comprises an absorbing layer, and at least a portion of the interface weld between the edges of the first glass substrate and the second glass substrate comprises the absorbing layer.

The thirty-sixth aspect A36 comprises the object according to the thirty-fifth aspect A35, wherein the absorption layer comprises a metal film, a metal foil, an inorganic specialized glass, a glass frit, or a combination thereof.

Aspect 37 A37 comprises an object according to aspect 32 A32, wherein the object further comprises a first metal foil and a second metal foil, the first metal foil contacts the first edge and the major opposing surface of the first glass substrate, the second metal foil contacts the second edge and the major opposing surface of the second glass substrate, wherein the first interface weld comprises the first metal foil and the second metal foil.

The thirty-eighth aspect A38 includes an object according to any one of the thirty-second to thirty-seventh aspects A32-A37, wherein the first glass substrate and the second glass substrate comprise glass or glass ceramics, and the glass or glass ceramics comprise borate glass, silica borate glass, phosphate glass, silicon carbide glass, sodium calcium silicate glass, aluminum silicate glass, alkali metal aluminum silicate glass, borosilicate glass, alkali metal borosilicate glass, aluminum borosilicate glass, alkali metal aluminum borosilicate glass, alkali metal aluminum silicate glass, fused silica, or low expansion glass.

According to the thirty-ninth aspect A39, a method for laser bonding glass substrates may include: contacting a first main opposing surface of a first glass substrate to a first metal foil, wherein a first contact position is created between at least a portion of the first main opposing surface and the first metal foil; performing a first welding step by directing a laser beam on at least a portion of the first contact position to bond the first main opposing surface of the first glass substrate to the first metal foil and form a first bonding position; contacting a second main opposing surface of the first glass substrate to the first metal foil, wherein the first main opposing surface and the second main opposing surface are bounded by a first edge, and the second contact position is The method comprises the steps of: placing a refractive optical element at an optical upstream of the first glass substrate, the refractive optical element forming an optical contact with the first glass substrate; performing a second welding step by directing a laser beam on an incident side of the refractive optical element so that the laser beam is refracted at a first incident side angle on at least a portion of the second contact position to bond the second major opposing surface of the first glass substrate to the first metal foil and form a second bonding position; contacting a third major opposing surface of the second glass substrate to the second metal foil, the third contact position being created on at least one of the third major opposing surfaces; and placing a refractive optical element at an optical upstream of the first glass substrate, the refractive optical element forming an optical contact with the first glass substrate. The method further comprises: performing a third welding step by directing a laser beam on at least a portion of the third contact location to bond the third major opposing surface of the second glass substrate to the second metal foil and form a third bonding location; contacting a fourth major opposing surface of the second glass substrate to the second metal foil, the third major opposing surface and the fourth major opposing surface being bounded by a second edge, and a fourth contact location being created between at least a portion of the fourth major opposing surface and the second metal foil; placing a refractive optical element optically upstream of the second glass substrate, the refractive optical element optically contacting the second glass substrate; and performing a third welding step by directing a laser beam on at least a portion of the third contact location to bond the third major opposing surface of the second glass substrate to the second metal foil and form a third bonding location. A fourth welding step is performed by directing a laser beam on an incident side of the optical element so that the laser beam is refracted at a second incident side angle on at least a portion of a fourth contact location to bond the fourth major surface of the second glass substrate to the second metal foil and form a fourth bonding location; the first metal foil is contacted with the second metal foil to create a fifth contact location, and the first major opposing surface and the second major opposing surface of the first glass substrate are aligned with the third major opposing surface and the fourth major opposing surface of the second glass substrate along a plane perpendicular to the fifth contact location; and a fifth welding step is performed to bond the first metal foil and the second metal foil and form the fifth bonding location.

The fortieth aspect A40 comprises the method according to the thirty-ninth aspect A39, wherein the first metal foil and the second metal foil each have a thickness greater than or equal to 5 μm and less than or equal to 50 μm.

The forty-first aspect A41 comprises a method according to the thirty-ninth aspect A39 or the fortieth aspect A40, wherein at least one of the first metal foil and the second metal foil comprises aluminum, an aluminum alloy, stainless steel, nickel, a nickel alloy, silver, a silver alloy, titanium, a titanium alloy, tungsten, a tungsten alloy, gold, a gold alloy, copper, a copper alloy, bronze, iron, or a combination of the foregoing.

According to a forty-second aspect A42, a method for laser bonding glass substrates may include: contacting a first edge of a first glass substrate to a second edge of a second glass substrate, wherein the first glass substrate and the second glass substrate each include a major opposing surface, and the major opposing surfaces of the first glass substrate and the second glass substrate are bounded by respective first edges and second edges; contacting a first non-transparent substrate to one of the major opposing surfaces of each of the first glass substrate and the second glass substrate, such that the first non-transparent substrate covers the first glass substrate; The method comprises: forming a first contact position with at least a portion of the first glass substrate and a second contact position with at least a portion of the second glass substrate; performing a first welding step by directing a laser beam on at least a portion of the first contact position to bond the first glass substrate to the first non-transparent substrate and form a first bonding position; and performing a second welding step by directing a laser beam on at least a portion of the second contact position to bond the second glass substrate to the first non-transparent substrate and form a second bonding position. position; contacting the second non-transparent substrate to the other main opposing surface of each of the first glass substrate and the second glass substrate, so that the second non-transparent substrate covers both the first glass substrate and the second glass substrate, forms a third contact position with at least a portion of the first glass substrate, and forms a fourth contact position with at least a portion of the second glass substrate; placing a refractive optical element at an optical upstream of the first glass substrate and the second glass substrate, the refractive optical element forming an optical contact with the first glass substrate or the second glass substrate; by A third welding step is performed by directing a laser beam on the incident side of the refractive optical element so that the laser beam is refracted at a first incident side angle on at least a portion of a third contact position to bond the first glass substrate to the second non-transparent substrate and form a third bonding position; and a fourth welding step is performed by directing a laser beam on the incident side of the refractive optical element so that the laser beam is refracted at a second incident side angle on at least a portion of a fourth contact position to bond the second glass substrate to the second non-transparent substrate and form a fourth bonding position.

The forty-third aspect A43 comprises a method according to the forty-second aspect A42, wherein at least one of the first non-transparent material and the second non-transparent material comprises aluminum, copper, or a combination thereof.

The forty-fourth aspect A44 includes the method according to the forty-second aspect A42 or the forty-third aspect A43, wherein at least one of the first non-transparent substrate and the second non-transparent substrate has a thickness less than or equal to 50 μm.

Additional features and advantages of the laser bonding method described herein will be described in the following embodiments, and in part will be apparent to a person of ordinary skill in the art from the description or will be recognized by practicing the embodiments described herein including the following embodiments, the scope of the patent application, and the accompanying drawings.

It will be understood that the foregoing general description and the following detailed description describe various embodiments and are intended to provide an overview or framework for understanding the nature and characteristics of the claimed subject matter. The accompanying drawings are included to provide a further understanding of the various embodiments and are incorporated into and constitute a part of the specification. The drawings illustrate various embodiments described herein and together with the specification serve to explain the principles and operation of the claimed subject matter.

Reference will now be made in detail to various embodiments of methods of laser bonding glass substrates along their respective edges. According to an embodiment, a method for bonding glass substrates includes: disposing a first absorbing layer between a first edge of a first glass substrate and a second edge of a second glass substrate, the first glass substrate and the second glass substrate each including a major opposing surface, the major opposing surfaces of the first glass substrate and the second glass substrate being bounded by respective first and second edges; contacting the first edge of the first glass substrate and the second edge of the second glass substrate to the first absorbing layer to form a first interface; disposing a refractive optical element optically upstream of the first glass substrate and the second glass substrate, the refractive optical element forming an optical contact with at least one of the first glass substrate and the second glass substrate; and performing a first welding step by directing a laser beam on an incident side of the refractive optical element so that the laser beam is refracted at a first incident side angle on the first interface to bond the first glass substrate to the second glass substrate and form a first bonding location.

According to other embodiments, an article includes: a first glass substrate including a first edge; a second glass substrate including a second edge, the first glass substrate and the second glass substrate each including a major opposing surface, the major opposing surfaces of the first glass substrate and the second glass substrate being bounded by the respective first and second edges; and a first interface weld between the first edge of the first glass substrate and the second edge of the second glass substrate.

According to some embodiments, a method for bonding glass substrates includes: contacting a first major opposing surface of a first glass substrate to a first metal foil, wherein a first contact location is created between at least a portion of the first major opposing surface and the first metal foil; performing a first welding step by directing a laser beam on at least a portion of the first contact location to bond the first major opposing surface of the first glass substrate to the first metal foil and form the first bonding location; contacting a second major opposing surface of the first glass substrate to the first metal foil, wherein the first major opposing surface and the second major opposing surface are bounded by a first edge, wherein a second contact location is formed between the first major opposing surface and the first metal foil; The invention relates to a method for manufacturing a second welding step in which a laser beam is directed to the first glass substrate and a second major opposing surface is formed between at least a portion of the second major opposing surface and the first metal foil; a refractive optical element is disposed optically upstream of the first glass substrate, the refractive optical element forms an optical contact with the first glass substrate; a second welding step is performed by directing a laser beam on the incident side of the refractive optical element so that the laser beam is refracted at the first incident side angle on at least a portion of the second contact position to bond the second major surface of the first glass substrate to the first metal foil and form a second bonding position; a third major opposing surface of the second glass substrate is contacted to the second metal foil, and a third contact position is created on at least a portion of the third major opposing surface and a second metal foil; performing a third welding step by directing a laser beam on at least a portion of the third contact location to bond the third major opposing surface of the second glass substrate to the first second foil and form a third bonding location; contacting a fourth major opposing surface of the second glass substrate to the second metal foil, the third major opposing surface and the fourth major opposing surface being bounded by a second edge, and a fourth contact location being created between at least a portion of the fourth major opposing surface and the second metal foil; placing a refractive optical element optically upstream of the second glass substrate, the refractive optical element forming an optical contact with the second glass substrate; and performing a third welding step by directing a laser beam on at least a portion of the third contact location to bond the third major opposing surface of the second glass substrate to the first second foil and form a third bonding location. The invention relates to a method for performing a fourth welding step by directing a laser beam on an incident side of the optical element so that the laser beam is refracted at a second incident side angle on at least a portion of a fourth contact location to bond the fourth major surface of the second glass substrate to the second metal foil and form a fourth bonding location; contacting the first metal foil with the second metal foil to create a fifth contact location, wherein the first major opposing surface and the second major opposing surface of the first glass substrate are aligned with the third major opposing surface and the fourth major opposing surface of the second glass substrate along a plane perpendicular to the fifth contact location; and performing a fifth welding step to bond the first metal foil with the second metal foil and form the fifth bonding location.

According to other embodiments, a method for bonding glass substrates includes: contacting a first edge of a first glass substrate to a second edge of a second glass substrate, the first glass substrate and the second glass substrate each including a major opposing surface, the major opposing surfaces of the first glass substrate and the second glass substrate being bounded by respective first edges and second edges; contacting a first non-transparent substrate to one of the major opposing surfaces of each of the first glass substrate and the second glass substrate, such that the first non-transparent substrate covers the first glass substrate and the second glass substrate. The method comprises: forming a first contact position with at least a portion of the first glass substrate and a second contact position with at least a portion of the second glass substrate; performing a first welding step by directing a laser beam at a first incident side angle on at least a portion of the first contact position to bond the first glass substrate to the first non-transparent substrate and form the first bonding position; and performing a second welding step by directing a laser beam at a second incident side angle on at least a portion of the second contact position to bond the second glass substrate to the first non-transparent substrate and form the first bonding position. forming a second bonding position; contacting the second non-transparent substrate to the other main opposing surface of each of the first glass substrate and the second glass substrate, so that the second non-transparent substrate covers both the first glass substrate and the second glass substrate, forming a third contact position with at least a portion of the first glass substrate, and forming a fourth contact position with at least a portion of the second glass substrate; placing a refractive optical element at an optical upstream of the first glass substrate and the second glass substrate, the refractive optical element forming an optical contact with the first glass substrate or the second glass substrate ; performing a third welding step by directing a laser beam on the incident side of the refractive optical element so that the laser beam is refracted at a first incident side angle on at least a portion of a third contact position to bond the first glass substrate to the second non-transparent substrate and form a third bonding position; and performing a fourth welding step by directing a laser beam on the incident side of the refractive optical element so that the laser beam is refracted at a second incident side angle on at least a portion of a fourth contact position to bond the second glass substrate to the second non-transparent substrate and form a fourth bonding position.

Various embodiments of laser bonding glass substrates and objects formed therefrom will be described in detail with reference to the accompanying drawings.

Ranges may be expressed herein as from "about" a particular value, and/or to "about" another particular value. When such a range is expressed, another embodiment includes from the one particular value and/or to the other particular value. Similarly, when a value is expressed as an approximation by use of the prefix "about," it will be understood that the particular value forms another embodiment. It will be further understood that the endpoints of each of the ranges are significant both in relation to the other endpoints and independently of the other endpoints.

The directional terms used herein - e.g., up, down, right, left, front, back, top, bottom - are made with reference only to the diagrams depicted and are not intended to imply an absolute orientation.

Unless otherwise expressly stated, it is in no way intended that any method described herein be construed as requiring that its steps be performed in a specific order, or that any equipment require a specific orientation. Therefore, when a method claim does not exactly describe the order in which its steps are followed, or any equipment claim does not exactly describe the order or orientation of individual components, or is not otherwise expressly stated in the patent scope or specification, If steps are limited to a specific order, or a specific order or orientation of components of the device is not stated, no order or orientation is in any way intended to be inferred. This status applies to any possible nondeclarative basis for explanation, including: logical matters concerning the arrangement of steps, flow of operations, sequence of components, or orientation of components; literal meaning derived from grammatical structure or punctuation, and The number or type of embodiments described in the specification.

As used herein, the singular forms "a," "an," and "the" include plural referents unless the context clearly dictates otherwise. Thus, for example, reference to "a" component includes aspects having two or more such components unless the context clearly dictates otherwise.

As used herein, "substantially transparent" means that a laser beam of one wavelength is transmitted through the material without being substantially absorbed or scattered. For example, in an embodiment, a material that is substantially transparent to a laser beam of one wavelength may be a material that exhibits a transmittance greater than or equal to 90% at a given wavelength and an object thickness of 1 cm.

As used herein, "substantially opaque" means that the material is not substantially transparent to laser light of this wavelength. For example, in an embodiment, a material that is substantially opaque to a laser beam of a wavelength may be a material that exhibits a transmittance of less than or equal to 10% at a given wavelength and at an object thickness of 50 μm.

As used herein, "optical contact" means that the air gap between two surfaces is less than the wavelength of light divided by 4 (i.e., gap < (wavelength of light/4)). For example, in an embodiment, "optical contact" means that the air gap between two surfaces is less than 0.1 μm. As used herein, "optical contact" also means that the gap between two surfaces is filled with a refractive index matching fluid having a refractive index within 0.1 of the glass substrate and/or the refractive optical element.

As used herein, "spot size" refers to the size of a pulsed laser according to ISO 11146. The spot size of a pulsed laser is equivalent to the beam diameter.

Large single piece glass articles may be used in devices such as windows and large area displays for signage. Referring now to FIGS. 1 and 2 , the glass article 100 may be produced by contacting the edges 102 of relatively small glass substrates 104 and welding the glass substrates 104 together to form an interface weld 106. However, when a laser beam is delivered at an angle relative to the glass substrates 104, the laser beam is refracted and the intensity of the laser beam is reduced. Therefore, it may be difficult to deliver a focused laser beam to a specific portion (e.g., an edge) of the glass substrates to adequately weld the glass substrates together.

Disclosed herein is a method of laser bonding glass substrates that alleviates the aforementioned problems, such that the glass substrates can be welded along their individual edges. Specifically, the method of laser bonding glass substrates disclosed herein utilizes refractive optics to refract a laser beam at an interface to an intensity sufficient to achieve adequate welding. The intensity of the laser beam can be based on absorption by an absorbing layer, which will cause the temperature of the absorbing layer to exceed the melting temperature of the glass. In some embodiments, the power density is at least 10-20 mW with a laser spot of ~10 microns.

3 and 4, the method 200 of laser bonding glass substrates begins at block 202 by disposing a first absorbing layer 300 between a first edge 302a of a first glass substrate 302 and a second edge 304a of a second glass substrate 304. The first glass substrate 302 and the second glass substrate 304 each include major opposing surfaces 302b, 304b. The major opposing surfaces 302b, 304b of the first glass substrate 302 and the second glass substrate 304 are bounded by respective first and second edges 302a, 304a.

Still referring to FIGS. 3 and 4 , the method 200 continues at block 204 to contact the first edge 302 a of the first glass substrate 302 and the second edge 304 a of the second glass substrate 304 to the first absorption layer 300 to form a first interface 306. In an embodiment, the contacting step includes aligning the major opposing surfaces 302 b, 304 b of the first glass substrate 302 and the second glass substrate 304 along a plane perpendicular to the first interface 306.

The first absorption layer 300 absorbs the laser beam directed thereon and ensures that the melting temperature of the first and second glass substrates 302 and 304 is reached. In an embodiment, the first absorption layer 300 may include a metal film, a metal foil, an inorganic specialized glass, a glass frit, or a combination thereof. In an embodiment, the metal film may include copper, aluminum, stainless steel, chromium, molybdenum, nickel, tin oxide, silicon oxide, tin phosphate, tin fluorophosphate, chalcogenide glass, tellurite glass, borate glass, or a combination thereof. In embodiments, the metal foil may include aluminum, aluminum alloy, stainless steel, nickel, nickel alloy, silver, silver alloy, titanium, titanium alloy, tungsten, tungsten alloy, gold, gold alloy, copper, copper alloy, bronze, iron, or a combination of the foregoing. In embodiments where the first absorption layer includes a metal foil that may be reflective, absorption may be generated by plasma induced by a pulsed focused laser beam. In embodiments, the inorganic specialized glass may include a fluoride glass material, a tin-doped glass material, a transition metal-doped glass material, or a combination of the foregoing. In an embodiment, the glass frit may include a low temperature glass frit, such as the glass frit described in U.S. Patent Nos. 8,063,560 B2 and 9,281,132, the contents of which are incorporated herein by reference. For example, in an embodiment, the low temperature glass frit may include at least one absorption ion, and the at least one absorption ion includes at least one of iron, copper, vanadium, and neodymium.

In an embodiment, the first absorption layer 300 may be formed of a material that is substantially opaque to the selected wavelength of the laser beam.

In an embodiment, the first absorption layer 300 may have a thickness greater than or equal to 20 nm and less than or equal to 1 μm. In an embodiment, the first absorption layer 300 may have a thickness greater than or equal to 20 nm, greater than or equal to 50 nm, or even greater than or equal to 100 nm. In an embodiment, the first absorption layer 300 may have a thickness less than or equal to 1 μm, less than or equal to 750 nm, less than or equal to 500 nm, or even less than or equal to 250 nm. In an embodiment, the first absorption layer 300 may have a thickness of greater than or equal to 20 nm and less than or equal to 1 μm, greater than or equal to 20 nm and less than or equal to 750 nm, greater than or equal to 20 nm and less than or equal to 500 nm, greater than or equal to 20 nm and less than or equal to 250 nm, greater than or equal to 50 nm and less than or equal to 1 μm, greater than or equal to 50 nm and less than or equal to 750 nm, greater than or equal to 50 nm and less than or equal to 500 nm, greater than or equal to 50 nm and less than or equal to 250 nm, greater than or equal to 100 nm and less than or equal to 1 μm, greater than or equal to 100 nm and less than or equal to 750 nm, greater than or equal to 100 nm and less than or equal to 500 nm, or even greater than or equal to 100 nm and less than or equal to 250 nm. nm, or any and all subranges formed by any of these endpoints.

In an embodiment, the first glass substrate 302 and the second glass substrate 304 may include a refractive index greater than or equal to 1.5 and less than or equal to 2.4. In an embodiment, the first glass substrate 302 and the second glass substrate 304 may include a refractive index greater than or equal to 1.5, greater than or equal to 1.7, or even greater than or equal to 1.9. In an embodiment, the first glass substrate 302 and the second glass substrate 304 may include a refractive index less than or equal to 2.4 or even less than or equal to 2.2. In an embodiment, the first glass substrate 302 and the second glass substrate 304 may include a refractive index greater than or equal to 1.5 and less than or equal to 2.4, greater than or equal to 1.5 and less than or equal to 2.2, greater than or equal to 1.7 and less than or equal to 2.4, greater than or equal to 1.7 and less than or equal to 2.2, greater than or equal to 1.9 and less than or equal to 2.4, or even greater than or equal to 1.9 and less than or equal to 2.2, or any and all sub-ranges formed by any of these endpoints.

In an embodiment, the first glass substrate 302 and the second glass substrate 304 may include glass or glass ceramic. As non-limiting examples, the first glass substrate 302 and the second glass substrate 304 may include borate glass, borosilicate glass, phosphate glass, carborundum glass, sodium calcium silicate glass, aluminum silicate glass, alkali aluminum silicate glass, borosilicate glass, alkali metal borosilicate glass, aluminum borosilicate glass, alkali metal aluminum borosilicate glass, alkali metal aluminum silicate glass, fused silica, or low expansion glass. In an embodiment, the low expansion glass may include titanium dioxide silicate glass.

In an embodiment, the first glass substrate 302 and the second glass substrate 304 may be formed of a material that is substantially transparent to a selected wavelength of the laser beam. In an embodiment, the first glass substrate 302 and the second glass substrate 304 may be substantially transparent to a wavelength of light greater than or equal to 300 nm and less than or equal to 1250 nm, or even greater than or equal to 350 nm and less than or equal to 1000 nm.

In an embodiment, the first glass substrate 302 and the second glass substrate 304 may have a thickness greater than or equal to 0.5 mm. In an embodiment, the first glass substrate 302 and the second glass substrate 304 may have a thickness greater than or equal to 0.5 mm, greater than or equal to 1 mm, greater than or equal to 10 mm, or even greater than or equal to 20 mm. In an embodiment, the first glass substrate 302 may include a thickness less than or equal to 100 mm, less than or equal to 75 mm, or even less than or equal to 50 mm. In an embodiment, the first glass substrate 302 may include a thickness of greater than or equal to 0.5 mm and less than or equal to 100 mm, greater than or equal to 0.5 mm and less than or equal to 75 mm, greater than or equal to 0.5 mm and less than or equal to 50 mm, greater than or equal to 1 mm and less than or equal to 100 mm, greater than or equal to 1 mm and less than or equal to 75 mm, greater than or equal to 1 mm and less than or equal to 50 mm, greater than or equal to 10 mm and less than or equal to 100 mm, greater than or equal to 10 mm and less than or equal to 75 mm, greater than or equal to 10 mm and less than or equal to 50 mm, greater than or equal to 20 mm and less than or equal to 100 mm, greater than or equal to 20 mm and less than or equal to 75 mm, or even greater than or equal to 20 mm and less than or equal to 50 mm. mm, or any and all subranges formed by any of these endpoints.

Still referring to FIGS. 3 and 4 , the method 200 continues at block 206 by positioning a refractive optical element 310 optically upstream of the first glass substrate 302 and the second glass substrate 304. Here, “optically upstream” shall mean located in a direction opposite to the path of travel of the laser beam 312. The refractive optical element 310 forms an optical contact with at least one of the first glass substrate 302 and the second glass substrate 304. Forming an optical contact between the refractive optical element 310 and the refractive optical contact between at least one of the first glass substrate 302 and the second glass substrate 304 ensures that a gap therebetween does not contribute to light propagation.

Still referring to Figures 3 and 4, method 200 continues at block 208 to perform a first welding step by directing the laser beam 312 on the incident side 310a of the refractive optical element 310, so that the laser beam 312 is refracted at the first interface 306 at a first incident side angle _θ1 to bond the first glass substrate 302 to the second glass substrate 304 and form a first bonding position 314.

In an embodiment, refractive optical element 310 may include fused silica.

In an embodiment, the refractive optical element 310 may be a prism 310b as shown in FIG. 4. The prism 310b includes a base angle θ ₂ . In an embodiment, the prism 310b may include a coating (not shown) disposed on the incident side 310a. In an embodiment, the coating may include an anti-reflection coating.

5, in an embodiment, the refractive optical element 310 may be a diffraction grating 310c as shown. In an embodiment, the incident side 310a of the diffraction grating 310c may have a structured surface.

In order to produce the necessary laser beam intensity for sufficient welding, the refraction angle _θ0 at which the laser beam 312 is refracted on the first interface 306 should be as close to 90° as possible, taking into account the manufacturing limitations of the refractive optical element. For example, the base angle _θ2 of the prism 310b affects the first incident side angle _θ1 , which affects the refraction angle _θ0 . A larger base angle _θ2 results in a larger incident side angle _θ1 , where a base angle _θ2 of 0° results in a first incident side angle _θ1 of 90°. As shown, the first incident side angle _θ1 is the angle between the laser beam 312 and a plane perpendicular to the incident side 310a of the refractive optical element 310. However, due to manufacturing limitations, it is difficult to produce a prism 310b with a relatively large base angle (e.g., greater than 60°). In an embodiment, the first incident side angle _θ1 may be greater than or equal to 0° and less than or equal to 45°. In an embodiment, the first incident side angle _θ1 may be greater than or equal to 0°, greater than or equal to 5°, greater than or equal to 10°, or even greater than or equal to 15°. In an embodiment, the first incident side angle _θ1 may be less than or equal to 45°, less than or equal to 30°, or even less than or equal to 20°. In an embodiment, the first incident side angle θ1 may be greater than or equal to 0°, greater than or equal to 5°, greater than or equal to 10°, or even greater than or equal to 15°. ₁ may be greater than or equal to 0° and less than or equal to 45°, greater than or equal to 0° and less than or equal to 30°, greater than or equal to 0° and less than or equal to 20°, greater than or equal to 5° and less than or equal to 45°, greater than or equal to 5° and less than or equal to 30°, greater than or equal to 5° and less than or equal to 20°, greater than or equal to 10° and less than or equal to 45°, greater than or equal to 10° and less than or equal to 30°, greater than or equal to 10° and less than or equal to 20°, greater than or equal to 15° and less than or equal to 45°, greater than or equal to 15° and less than or equal to 30°, or even greater than or equal to 15° and less than or equal to 20°, or any and all sub-ranges formed by any of these endpoints.

In an embodiment, as shown in FIGS. 4 and 5 , the laser beam 312 may be directed orthogonally to the first glass substrate 302 and the second substrate 304 .

In an embodiment where the laser beam 312 is directed orthogonally to the first glass substrate 302 and the second glass substrate 304 and the refractive optical element 310 is a prism 310b as shown in FIG. 4 , the prism 310b may have a base angle _θ2 greater than or equal to 70° and less than or equal to 85° to ensure that a relatively high incident side angle is achieved. In embodiments where the laser beam 312 is directed orthogonally to the first glass substrate 302 and the second glass substrate 304 and the refractive optical element 310 is a prism 310 b, the prism 310 b may have a base angle _θ2 greater than or equal to 70° and less than or equal to 85°, greater than or equal to 70° and less than or equal to 80°, greater than or equal to 75° and less than or equal to 85°, or even greater than or equal to 75° and less than or equal to 89°, or any and all sub-ranges formed by any of these endpoints.

In an embodiment where the laser beam 312 is directed orthogonally to the first glass substrate 302 and the second glass substrate 304 and the refractive optical element 310 is a diversion grating 310c as shown in FIG. 5, the diversion grating 310c may have a diversion grating angle greater than or equal to 30° to ensure that a relatively high incident side angle is achieved. In an embodiment where the laser beam 312 is directed orthogonally to the first glass substrate 302 and the second glass substrate 304 and the refractive optical element 310 is a diversion grating 310c, the diversion grating 310c may have a diversion grating angle greater than or equal to 30° or even greater than or equal to 35. In embodiments where the laser beam 312 is directed normal to the first glass substrate 302 and the second glass substrate 304 and the refractive optical element 310 is a diversion grating 310c, the diversion grating 310c may have a diversion grating angle less than or equal to 45° or even less than or equal to 40°. In embodiments where the laser beam 312 is directed orthogonal to the first glass substrate 302 and the second glass substrate 304 and the refractive optical element 310 is a diversion grating 310c, the diversion grating 310c may have a diversion grating angle greater than or equal to 30° and less than or equal to 45°, greater than or equal to 30° and less than or equal to 40°, greater than or equal to 35° and less than or equal to 45°, or even greater than or equal to 35° and less than or equal to 40°, or any and all sub-ranges formed by any of these endpoints.

6 and 7 , in one embodiment, the laser beam 312 may be directed at an angle greater than 0° relative to the first glass substrate 302 and the second glass substrate 304 (ie, non-orthogonal to the first glass substrate 302 and the second glass substrate 304 ).

In an embodiment where the laser beam 312 is directed at an angle greater than 0° relative to the first glass substrate 302 and the second glass substrate 304 and the refractive optical element 310 is a prism 310b as shown in FIG. 6, the prism 310b may have a base angle _θ2 greater than or equal to 30° and less than or equal to 60° to ensure that a relatively high incident side angle is achieved. In an embodiment where the laser beam 312 is directed at an angle greater than 0° relative to the first glass substrate 302 and the second glass substrate 304 and the refractive optical element 310 is a prism 310b, the prism 310b may have a base angle θ2 greater than or equal to 30° and less than or equal to 60° to ensure that a relatively high incident side angle is achieved. ₂ greater than or equal to 30° and less than or equal to 60°, greater than or equal to 30° and less than or equal to 55°, greater than or equal to 30° and less than or equal to 50°, greater than or equal to 35° and less than or equal to 60°, greater than or equal to 35° and less than or equal to 55°, greater than or equal to 35° and less than or equal to 50°, greater than or equal to 40° and less than or equal to 60°, greater than or equal to 40° and less than or equal to 55°, or even greater than or equal to 40° and less than or equal to 50°, or any and all sub-ranges formed by any of these endpoints.

In embodiments where the laser beam 312 is directed at an angle greater than 0° relative to the first glass substrate 302 and the second glass substrate 304 and the refractive optical element 310 is a diversion grating 310c as shown in FIG. 7 , the diversion grating 310c may have a diversion grating angle greater than or equal to 20° to ensure that a relatively high incident side angle is achieved. In embodiments where the laser beam 312 is directed at an angle greater than 0° relative to the first glass substrate 302 and the second glass substrate 304 and the refractive optical element 310 is a diversion grating 310c as shown in FIG. 7 , the diversion grating 310c may have a diversion grating angle greater than or equal to 20°, greater than or equal to 25°, or even greater than or equal to 30°. In an embodiment where the laser beam 312 is directed at an angle greater than 0° relative to the first glass substrate 302 and the second glass substrate 304 and the refractive optical element 310 is a diffraction grating 310c as shown in FIG. 7 , the diffraction grating 310c may have a diffraction grating angle less than or equal to 45° or even less than or equal to 40°. In an embodiment where the laser beam 312 is directed at an angle greater than 0° relative to the first glass substrate 302 and the second glass substrate 304 and the refractive optical element 310 is a diffraction grating 310c as shown in FIG. 7 , the diffraction grating 310c may have a diffraction grating angle greater than or equal to 20° and less than or equal to 45°, greater than or equal to 20° and less than or equal to 40°, greater than or equal to 25° and less than or equal to 45°, greater than or equal to 25° and less than or equal to 40°, greater than or equal to 30° and less than or equal to 45°, or even greater than or equal to 30° and less than or equal to 40°, or any and all sub-ranges formed by any of these endpoints.

In an embodiment, the laser beam 312 may include a wavelength such that the first glass substrate 302, the second glass substrate 304, and the refractive optical element 310 are substantially transparent to the wavelength of the laser beam 312. In an embodiment, the laser beam 312 may include a wavelength such that the first absorption layer 300 is substantially opaque to the wavelength of the laser beam 312. For example, in an embodiment, the pulsed laser may have a wavelength greater than or equal to 300 nm and less than or equal to 2000 nm. In an embodiment, the pulsed laser may have a wavelength greater than or equal to 300 nm, greater than or equal to 350 nm, greater than or equal to 400 nm, greater than or equal to 450 nm, or even greater than or equal to 500 nm. In embodiments, the pulsed laser may have a wavelength less than or equal to 2000 nm, less than or equal to 1500 nm, less than or equal to 1250 nm, or even less than or equal to 1000 nm. In an embodiment, the pulsed laser may have a wavelength greater than or equal to 300 nm and less than or equal to 2000 nm, greater than or equal to 300 nm and less than or equal to 1500 nm, greater than or equal to 300 nm and less than or equal to 1250 nm, greater than or equal to 300 nm and less than or equal to 1000 nm, greater than or equal to 350 nm and less than or equal to 2000 nm, greater than or equal to 350 nm and less than or equal to 1500 nm, greater than or equal to 350 nm and less than or equal to 1250 nm, greater than or equal to 350 nm and less than or equal to 1000 nm, greater than or equal to 400 nm and less than or equal to 2000 nm, greater than or equal to 400 nm and less than or equal to 1500 nm, greater than or equal to 400 nm and less than or equal to 1500 nm, greater than or equal to 400 nm and less than or equal to 1500 nm, greater than or equal to 400 nm and less than or equal to 1500 nm. nm and less than or equal to 1250 nm, greater than or equal to 400 nm and less than or equal to 1000 nm, greater than or equal to 450 nm and less than or equal to 2000 nm, greater than or equal to 450 nm and less than or equal to 1500 nm, greater than or equal to 450 nm and less than or equal to 1250 nm, greater than or equal to 450 nm and less than or equal to 1000 nm, greater than or equal to 500 nm and less than or equal to 2000 nm, greater than or equal to 500 nm and less than or equal to 1500 nm, greater than or equal to 500 nm and less than or equal to 1250 nm, or even greater than or equal to 500 nm and less than or equal to 1000 nm, or any and all sub-ranges formed by any of these endpoints.

In an embodiment, the pulsed laser may have a wavelength greater than or equal to 300 nm and less than or equal to 1100 nm, greater than or equal to 300 nm and less than or equal to 900 nm, greater than or equal to 300 nm and less than or equal to 700 nm, greater than or equal to 325 nm and less than or equal to 1100 nm, greater than or equal to 325 nm and less than or equal to 900 nm, greater than or equal to 325 nm and less than or equal to 700 nm, greater than or equal to 350 nm and less than or equal to 1100 nm, greater than or equal to 350 nm and less than or equal to 900 nm, or even greater than or equal to 350 nm and less than or equal to 700 nm, or any and all sub-ranges formed by any of these endpoints.

In an embodiment, the laser beam 312 may include a pulsed laser. In an embodiment, the pulsed laser may be a nanosecond pulsed laser, a picosecond pulsed laser, or a femtosecond pulsed laser. In an embodiment where the pulsed laser is a nanosecond pulsed laser, the method may include an absorption layer. In an embodiment where the pulsed laser is a picosecond pulsed laser, the method may not include an absorption layer because absorption may be achieved through multiphoton absorption.

In an embodiment, the pulsed laser may include a pulse energy greater than or equal to 2.8 µJ and less than or equal to 1000 µJ. In an embodiment, the pulsed laser may include a pulse energy greater than or equal to 2.8 µJ, greater than or equal to 10 µJ, greater than or equal to 25 µJ, or even greater than or equal to 50 µJ. In an embodiment, the pulsed laser may include a pulse energy less than or equal to 1000 µJ, less than or equal to 750 µJ, less than or equal to 500 µJ, or even less than or equal to 250 µJ. In an embodiment, the pulsed laser may include a pulse energy greater than or equal to 2.8 µJ and less than or equal to 1000 µJ, greater than or equal to 2.8 µJ and less than or equal to 750 µJ, greater than or equal to 2.8 µJ and less than or equal to 500 µJ, greater than or equal to 2.8 µJ and less than or equal to 250 µJ, greater than or equal to 10 µJ and less than or equal to 1000 µJ, greater than or equal to 10 µJ and less than or equal to 750 µJ, greater than or equal to 10 µJ and less than or equal to 500 µJ, greater than or equal to 10 µJ and less than or equal to 250 µJ, greater than or equal to 25 µJ and less than or equal to 1000 µJ, greater than or equal to 25 µJ and less than or equal to 750 µJ. µJ, greater than or equal to 25 µJ and less than or equal to 500 µJ, greater than or equal to 25 µJ and less than or equal to 250 µJ, greater than or equal to 50 µJ and less than or equal to 1000 µJ, greater than or equal to 50 µJ and less than or equal to 750 µJ, greater than or equal to 50 µJ and less than or equal to 500 µJ, or even greater than or equal to 50 µJ and less than or equal to 250 µJ, or any and all sub-ranges formed by any of these endpoints.

In an embodiment, the pulsed laser may include a repetition rate greater than or equal to 1 kHz and less than or equal to 1000 kHz. In an embodiment, the pulsed laser may include a repetition rate greater than or equal to 1 kHz, greater than or equal to 10 kHz, or even greater than or equal to 25 kHz. In an embodiment, the pulsed laser may include a repetition rate less than or equal to 1000 kHz, less than or equal to 750 kHz, less than or equal to 500 kHz, less than or equal to 250 kHz, less than or equal to 100 kHz, or even less than or equal to 50 kHz. In an embodiment, the pulsed laser may include a repetition rate greater than or equal to 1 kHz and less than or equal to 1000 kHz, greater than or equal to 1 kHz and less than or equal to 750 kHz, greater than or equal to 1 kHz and less than or equal to 500 kHz, greater than or equal to 1 kHz and less than or equal to 250 kHz, greater than or equal to 1 kHz and less than or equal to 100 kHz, greater than or equal to 1 kHz and less than or equal to 50 kHz, greater than or equal to 10 kHz and less than or equal to 1000 kHz, greater than or equal to 10 kHz and less than or equal to 750 kHz, greater than or equal to 10 kHz and less than or equal to 500 kHz, greater than or equal to 10 kHz and less than or equal to 250 kHz, greater than or equal to 10 kHz and less than or equal to 100 kHz, greater than or equal to 10 kHz and less than or equal to 50 kHz, greater than or equal to 25 kHz and less than or equal to 1000 kHz, greater than or equal to 25 kHz and less than or equal to 750 kHz, greater than or equal to 25 kHz and less than or equal to 500 kHz, greater than or equal to 25 kHz and less than or equal to 250 kHz, greater than or equal to 25 kHz and less than or equal to 100 kHz, or even greater than or equal to 25 kHz and less than or equal to 50 kHz, or any and all sub-ranges formed by any of these endpoints.

In an embodiment, the pulsed laser may have a spot size greater than or equal to 5 μm and less than or equal to 50 μm. In an embodiment, the pulsed laser may have a spot size greater than or equal to 5 μm or even greater than or equal to 10 μm. In an embodiment, the pulsed laser may have a spot size less than or equal to 50 μm, less than or equal to 35 μm, or even less than or equal to 20 μm. In embodiments, the pulsed laser may have a spot size greater than or equal to 5 µm and less than or equal to 50 µm, greater than or equal to 5 µm and less than or equal to 35 µm, greater than or equal to 5 µm and less than or equal to 20 µm, greater than or equal to 10 µm and less than or equal to 50 µm, greater than or equal to 10 µm and less than or equal to 35 µm, or even greater than or equal to 10 µm and less than or equal to 20 µm, or any and all sub-ranges formed by any of these endpoints.

In an embodiment, the pulsed laser may include a pulse width less than or equal to 10 ps, less than or equal to 7 ps, or even less than or equal to 5 ps. In an embodiment, the pulsed laser may include a pulse width greater than or equal to 0.1 ps, greater than or equal to 0.5 ps, or even greater than or equal to 1 ps. In an embodiment, the pulsed laser may include a pulse width greater than or equal to 0.1 ps and less than or equal to 10 ps, greater than or equal to 0.1 ps and less than or equal to 7 ps, greater than or equal to 0.1 ps and less than or equal to 5 ps, greater than or equal to 0.5 ps and less than or equal to 10 ps, greater than or equal to 0.5 ps and less than or equal to 7 ps, greater than or equal to 0.5 ps and less than or equal to 5 ps, greater than or equal to 1 ps and less than or equal to 10 ps, greater than or equal to 1 ps and less than or equal to 7 ps, or even greater than or equal to 1 ps and less than or equal to 5 ps, or any and all sub-ranges formed by any of these endpoints.

In certain applications, such as large tiled displays, where the boundaries between tiles are not visible, it is desirable for the article formed by bonding glass substrates together to appear visually transparent so that the bonding is not visible. Therefore, in embodiments, the first bonding location 314 may have a transmittance at a given wavelength and at an article thickness of 0.5 mm of greater than or equal to 70%, greater than or equal to 80%, greater than or equal to 90%, or even greater than or equal to 95%.

Referring now to FIG. 8 , in an embodiment, during a first welding step, the laser beam 312 may be displaced relative to the incident side 310a of the refractive optical element 310 such that the formed article 320 has a first interface weld 322 between the first edge 302a of the first glass substrate 302 and the second edge 304a of the second glass substrate 304. In an embodiment, the first interface weld 322 includes material of the first glass substrate 302 and material of the second glass substrate 304 that are melted and welded together during the welding step. In an embodiment, at least a portion of the first interface weld 322 may also include material of an absorbing layer (not shown) that is melted and welded to the first glass substrate 302 and the second glass substrate 304. In an embodiment, the absorbing layer may melt into the first glass substrate 302 and the second glass substrate 304 and become transparent by forming an oxide.

In an embodiment, the first interface weld 322 may include a weld line having a width greater than or equal to 5 μm and less than or equal to 1 mm. In an embodiment, the weld line may have a width greater than or equal to 5 μm, greater than or equal to 15 μm, or even greater than or equal to 25 μm. In an embodiment, the weld line may have a width less than or equal to 1 mm, less than or equal to 750 μm, less than or equal to 500 μm, less than or equal to 250 μm, or even less than or equal to 100 μm. In an embodiment, the welding line may have a width greater than or equal to 5 µm and less than or equal to 1 mm, greater than or equal to 5 µm and less than or equal to 750 µm, greater than or equal to 5 µm and less than or equal to 500 µm, greater than or equal to 5 µm and less than or equal to 250 µm, greater than or equal to 5 µm and less than or equal to 100 µm, greater than or equal to 15 µm and less than or equal to 1 mm, greater than or equal to 15 µm and less than or equal to 750 µm, greater than or equal to 15 µm and less than or equal to 500 µm, greater than or equal to 15 µm and less than or equal to 250 µm, greater than or equal to 15 µm and less than or equal to 100 µm, greater than or equal to 25 µm and less than or equal to 1 mm, greater than or equal to 25 µm and less than or equal to 750 µm, greater than or equal to 25 µm and less than or equal to 500 µm, greater than or equal to 25 µm and less than or equal to 250 µm, or even greater than or equal to 25 µm and less than or equal to 100 µm, or any and all sub-ranges formed by any of these endpoints.

In an embodiment, the distance between the weld lines of the first interface weld 322 may be greater than or equal to 1 μm and less than or equal to 1000 μm. In an embodiment, the distance between the weld lines may be greater than or equal to 1 μm, greater than or equal to 10 μm, greater than or equal to 25 μm, or even greater than or equal to 50 μm. In an embodiment, the distance between the weld lines may be less than or equal to 1000 μm, less than or equal to 750 μm, less than or equal to 500 μm, less than or equal to 250 μm, or even less than or equal to 100 μm. In an embodiment, the distance between the welding lines 216 may be greater than or equal to 1 μm and less than or equal to 1000 μm, greater than or equal to 1 μm and less than or equal to 750 μm, greater than or equal to 1 μm and less than or equal to 500 μm, greater than or equal to 1 μm and less than or equal to 250 μm, greater than or equal to 1 μm and less than or equal to 100 μm, greater than or equal to 10 μm and less than or equal to 1000 μm, greater than or equal to 10 μm and less than or equal to 750 μm, greater than or equal to 10 μm and less than or equal to 500 μm, greater than or equal to 10 μm and less than or equal to 250 μm, greater than or equal to 10 μm and less than or equal to 100 μm, greater than or equal to 25 μm and less than or equal to 100 μm, or greater than or equal to 1000 μm. µm, greater than or equal to 25 µm and less than or equal to 750 µm, greater than or equal to 25 µm and less than or equal to 500 µm, greater than or equal to 25 µm and less than or equal to 250 µm, greater than or equal to 25 µm and less than or equal to 100 µm, greater than or equal to 50 µm and less than or equal to 1000 µm, greater than or equal to 50 µm and less than or equal to 750 µm, greater than or equal to 50 µm and less than or equal to 500 µm, greater than or equal to 50 µm and less than or equal to 250 µm, or even greater than or equal to 50 µm and less than or equal to 100 µm, or any and all sub-ranges formed by any of these endpoints. In embodiments, the weld lines may be uniformly spaced (i.e., having the same distance therebetween) or unevenly spaced (i.e., having different distances therebetween).

Referring back to FIG. 1 and now to FIG. 9 , the method 200 may optionally continue at block 210 to position a second absorbing layer 400 between a second edge 304a of the second glass substrate 304 and a third edge 330a of the third glass substrate 330. The third glass substrate 330 includes a major opposing surface 330b. The major opposing surface 330b of the third glass substrate 330 is bounded by the third edge 330a. The method 200 may optionally continue at block 212 to contact the second edge 304a of the second glass substrate 304 to the third edge 330a of the third glass substrate 330 with the second absorbing layer 400 to form a second interface 402. The method 200 may optionally continue at block 214 to position a refractive optical element 310 optically upstream of the second glass substrate 304 and the third glass substrate 330. The method 200 may optionally continue at 216 to perform a second welding step by directing a laser beam on the incident side 310a of the refractive optical element such that the laser beam 312 is refracted at the second side incident angle _θ3 on the second interface 402 to bond the second glass substrate 304 to the third glass substrate 330 and form a second bonding location 404.

10 , in an embodiment, during the second welding step, the laser beam 312 may be shifted relative to the incident side 310 a of the refractive optical element 310 such that the object 410 is formed having a second interface weld 412 between the third edge 330 a of the third glass substrate 330 and the second edge 304 a of the second glass substrate 304 .

In an embodiment, blocks 210-216 of method 200 may include substantially similar or identical absorber layers, glass substrates, optical elements, laser beam parameters, and incident side angles as previously described with respect to blocks 202-208. In an embodiment, additional glass substrates may be bonded to the first, second, or third glass substrates 302, 304, 330 described herein until the desired object structure is achieved.

11 and 12, an alternative method 500 for laser bonding glass substrates begins at block 502 by contacting a first major opposing surface 600a of a first glass substrate 600 to a first metal foil 602. A first contact location 604 is created between at least a portion of the first major opposing surface 602a and the first metal foil 602.

The method 500 continues at block 504 by performing a first bonding step by directing a laser beam 606 on at least a portion of a first contact location 604 to bond a first major opposing surface 600a of a first glass substrate 600 to a first metal foil 602 and form a first bonding location 608.

Referring back to FIG. 10 and now to FIG. 13 , the method 500 continues at block 506 by contacting the second major opposing surface 600 b of the first glass substrate 600 to the first metal foil 602. The first and second major opposing surfaces 600 a, 600 b are bounded by a first edge 600 c. A second contact location 622 is created between at least a portion of the second major opposing surface 600 b and the first metal foil 602.

The method 500 continues at block 508 by optically positioning a refractive optical element 620 upstream of the first glass substrate 600. The refractive optical element 620 forms an optical contact with the first glass substrate 600.

The method 500 continues at block 510 to perform a second welding step by directing the laser beam 606 on the incident side 620a of the refractive optical element so that the laser beam 606 is refracted at the first incident side angle _θ4 on at least a portion of the second contact location 622 to bond the second major opposing surface 600b of the first glass substrate 600 to the first metal foil 602 and form a second bonding location 624.

Referring back to FIG. 10 and now to FIG. 14 , the method 500 continues at block 512 to repeat blocks 502-510 for a second glass substrate 630 and a second metal foil 632. Specifically, the method 500 continues by contacting a third major opposing surface 630a of the second glass substrate 630 to the second metal foil 632. A third contact location 634 is created between at least a portion of the third major opposing surface 630a and the second metal foil 632. The method 500 continues by performing a third welding step by directing a laser beam 606 on at least a portion of the third contact location 634 to bond the third major opposing surface 630a of the second glass substrate 630 to the second metal foil 632 and form a third bond location 636. The method 500 continues by contacting the fourth major opposing surface 630b of the second glass substrate 630 to the second metal foil 632. The third and fourth major opposing surfaces 630a, 630b are bounded by a second edge 630c. A fourth contact location 638 is created between at least a portion of the fourth major opposing surface 630b and the second metal foil 632. The method 500 continues by placing a refractive optical element (not shown) optically upstream of the second glass substrate 630. The refractive optical element forms an optical contact with the second glass substrate 630. The method 500 continues by performing a fourth welding step by directing a laser beam (not shown) on the incident side of a refractive optical element (not shown) such that the laser beam is refracted at a second incident angle (not shown) on at least a portion of a fourth contact location 638 to bond the fourth major opposing surface 630 b of the second glass substrate 630 to the second metal foil 632 and form a fourth bonding location 640.

In an embodiment, blocks 502-512 of method 500 may include substantially similar or identical glass substrates, metal foils, laser beam parameters, optical elements, and incident side angles as described hereinbefore with respect to method 200. In an embodiment, first metal foil 602 and second metal foil 632 may each have a thickness greater than or equal to 5 μm and less than or equal to 50 μm. In an embodiment, first metal foil 602 and second metal foil 632 may each have a thickness greater than or equal to 5 μm, greater than or equal to 10 μm, or even greater than or equal to 20 μm. In an embodiment, first metal foil 602 and second metal foil 632 may each have a thickness less than or equal to 50 μm, less than or equal to 40 μm, or even less than or equal to 30 μm. In an embodiment, the first metal foil 602 and the second metal foil 632 may each have a thickness greater than or equal to 5 µm and less than or equal to 50 µm, greater than or equal to 5 µm and less than or equal to 40 µm, greater than or equal to 5 µm and less than or equal to 30 µm, greater than or equal to 10 µm and less than or equal to 50 µm, greater than or equal to 10 µm and less than or equal to 40 µm, greater than or equal to 10 µm and less than or equal to 30 µm, greater than or equal to 20 µm and less than or equal to 50 µm, greater than or equal to 20 µm and less than or equal to 40 µm, or even greater than or equal to 20 µm and less than or equal to 30 µm, or any and all sub-ranges formed by any of these endpoints.

The method continues at block 514 by contacting the first metal foil 602 to the second metal foil 632 to create a fifth contact location 650. During this contacting step, the first and second major opposing surfaces 600a, 600b of the first glass substrate 600 are aligned with the third and fourth major opposing surfaces 630a, 630b of the second glass substrate 630 along a plane perpendicular to the fifth contact location 650.

The method continues at block 516 to perform a fifth welding step to bond the first metal foil 602 to the second metal foil 632 and form a fifth bond location 652. In embodiments, the fifth welding step may occur using a laser beam or a solder gun and a solder metal such as tin or the like. Referring now to FIG. 15 , the fifth welding step may continue along the fifth contact location 650 to form an article 660 having a first interface weld 662. In embodiments, the first interface weld 662 includes material of the first metal foil 602 and material of the second metal foil 632. In embodiments, additional glass substrates may be welded to the first and second glass substrates 600 and 630 as described herein until the desired article structure is achieved.

Referring now to FIGS. 16 and 17 , an alternative method 700 of laser bonding glass substrates begins at block 702 by contacting a first edge 800a of a first glass substrate to a second edge 802a of a second glass substrate 802. The first glass substrate 800 and the second glass substrate 802 each include major opposing surfaces 800b, 802b. The major opposing surfaces 800b, 802b of the first glass substrate 800 and the second glass substrate 802 are bounded by respective first and second edges 800a, 802a.

The method 700 continues at block 704 by contacting a first non-transparent substrate 804 to one of the major opposing surfaces 800 b, 802 b of each of the first and second glass substrates 800, 802 such that the first non-transparent substrate 804 covers both the first and second glass substrates 800, 802, forms a first contact location 806 with at least a portion of the first glass substrate 800, and forms a second contact location 808 with at least a portion of the second glass substrate 802.

The method 700 continues at block 706 to perform a first welding step by directing a laser beam (not shown) at at least a portion of the first contact location 806 to bond the first glass substrate 800 to the first non-transparent substrate 804 and form a first bond location 810. The method 700 continues at block 708 to perform a second welding step by directing a laser beam 812 at at least a portion of the second contact location 808 to bond the second glass substrate 802 to the first non-transparent substrate 804 and form a second bond location 814.

Referring back to FIG. 16 and now to FIG. 18 , the method 700 continues at block 710 by contacting a second non-transparent substrate 820 to the other of the major opposing surfaces 800 b, 802 b of each of the first and second glass substrates 800, 802 such that the second non-transparent substrate 820 overlaps both of the first and second glass substrates 800, 802 to form a third contact location 822 with at least a portion of the first glass substrate 800 and a fourth contact location 824 with at least a portion of the second glass substrate 802.

The method 700 continues at block 712 by positioning a refractive optical element 830 optically upstream of the first glass substrate 800 and the second glass substrate 802. The refractive optical element 830 forms an optical contact with the first glass substrate 800 or the second glass substrate 802.

The method 700 continues at block 714 to perform a third welding step by directing a laser beam (not shown) on an incident side (not shown) of the refractive optical element 830 such that the laser beam is refracted at a first incident side angle (not shown) on at least a portion of the third contact location 822 to bond the first glass substrate 800 to the second non-transparent substrate 820 and form a third bonding location 832.

Method 700 continues at block 716 to perform a fourth welding step by directing the laser beam 812 on the incident side 830a of the refractive optical element 830 so that the laser beam 812 is refracted at a second incident side angle _θ5 on at least a portion of the fourth contact position 824 to bond the second glass substrate 802 to the second non-transparent substrate 820 and form a fourth bonding position 844 and an object 836.

In an embodiment, method 700 may include glass substrates, laser beam parameters, optical elements, and incident side angles substantially similar or identical to those described hereinabove with respect to method 200. In an embodiment, at least one of first non-transparent substrate 804 and second non-transparent substrate 820 comprises aluminum, copper, or a combination thereof. In an embodiment, at least one of the first non-transparent material and the second non-transparent material has a thickness of less than or equal to 50 μm, less than or equal to 40 μm, less than or equal to 30 μm, less than or equal to 20 μm, or even less than or equal to 10 μm.

In an embodiment, additional glass substrates may be welded to the first or second glass substrates 800, 802 described herein until the desired structure of the article is achieved.

Various modifications and variations of the embodiments described herein may be made without departing from the spirit and scope of the subject matter claimed for protection, which will be apparent to those of ordinary skill in the art. Therefore, it is intended that this specification covers modifications and variations of the various embodiments described herein, as long as such modifications and variations fall within the scope of the attached patent application and its equivalents.

100: Glass object 102: Edge 104: Glass substrate 106: Interface welding 200: Method 202, 204, 206, 208, 210, 212, 214, 216: Block 300: First absorbing layer 302: First glass substrate 302a: First edge 302b: Main opposing surface 304: Second glass substrate 304a: Second edge 304b: Main opposing surface 306: First interface 310: Refractive optical element 310a: Incident side 310b: Prism 310c: Diffraction grating 312: Laser beam 314: First bonding location 320: Object 3 22: first interface welding 330: third glass substrate 330a: third edge 330b: main opposing surface 400: second absorption layer 402: second interface 404: second bonding location 410: object 412: second interface welding 500: method 502, 504, 506, 508, 510, 512, 514, 516: block 600: first glass substrate 600a: first main opposing surface 600b: second main opposing surface 600c: first edge 602: first metal foil 602a: first main opposing surface 604: first bonding location 606: laser beam 608: first bonding position 620: refractive optical element 620a: incident side 622: second contact position 624: second bonding position 630: second glass substrate 630a: third major opposing surface 630b: fourth major opposing surface 630c: second edge 632: second metal foil 634: third contact position 636: third bonding position 638: fourth contact position 640: fourth bonding position 650: fifth contact position 652: fifth bonding position 660: object 662: first interface welding 700: method 702, 704, 706, 708, 710, 711 2,714,716: Block 800: First glass substrate 800a: First edge 800b: Main opposing surface 802: Second glass substrate 802a: Second edge 802b: Main opposing surface 804: First non-transparent substrate 806: First contact position 808: Second contact position 810: First bonding position 812: Laser beam 814: Second bonding position 820: Second non-transparent substrate 822: Third contact position 824: Fourth contact position 830: Refractive optical element 830a: Incident side 832: Third bonding position 836: Object 844: Fourth bonding position θ ₀ : Refraction angle θ ₁ : First incident side angle θ ₂ : Bottom angle θ ₃ : Second side incident angle θ ₄ : First incident side angle θ ₅ : Second incident side angle

FIG. 1 diagrammatically depicts a top, plan view of an object according to one or more embodiments described herein;

Figure 2 depicts a side, plan view of the object of Figure 1;

FIG. 3 is a flow chart of a method for laser bonding glass substrates according to one or more embodiments described herein;

FIG. 4 schematically depicts the steps of the method of FIG. 3 , wherein the refractive optical element is a prism and the laser beam is directed orthogonally to the first glass substrate and the second glass substrate according to one or more embodiments described herein;

FIG. 5 schematically depicts the steps of the method of FIG. 3 , wherein the refractive optical element is a diffraction grating and the laser beam is directed orthogonally to the first glass substrate and the second glass substrate according to one or more embodiments described herein;

FIG. 6 schematically depicts the steps of the method of FIG. 3 , wherein the refractive optical element is a prism and the laser beam is directed at an angle greater than 0° relative to the first glass substrate and the second glass substrate according to one or more embodiments described herein;

FIG. 7 schematically depicts the steps of the method of FIG. 3 according to one or more embodiments described herein, wherein the refractive optical element is a diffraction grating and the laser beam is directed at an angle greater than 0° relative to the first glass substrate and the second glass substrate;

FIG. 8 diagrammatically depicts a side, plan view of an example article according to one or more embodiments described herein;

FIG. 9 schematically illustrates optional steps of the method of FIG. 3;

FIG. 10 diagrammatically depicts a side, plan view of another example article according to one or more embodiments described herein;

FIG. 11 is a flow chart of an alternative method for laser bonding glass substrates according to one or more embodiments described herein;

FIG. 12 schematically depicts the steps of the method of FIG. 11 ;

FIG. 13 schematically depicts the steps of the method of FIG. 11 ;

FIG. 14 schematically depicts the steps of the method of FIG. 11 ;

FIG. 15 diagrammatically depicts a side, plan view of an alternative example article according to one or more embodiments described herein;

FIG. 16 is a flow chart of another alternative method for laser bonding glass substrates according to one or more embodiments described herein;

Figure 17 diagrammatically depicts the steps of the method of Figure 16; and

FIG. 18 diagrammatically depicts the steps of the method of FIG. 16 .

Domestic storage information (please note in the order of storage institution, date, and number) None Foreign storage information (please note in the order of storage country, institution, date, and number) None

300: First absorption layer

302: First glass substrate

302a: First edge

302b: Main relative surface

304: Second glass substrate

304a: Second edge

304b: Main relative surface

306: First interface

310: Refractive optical element

310a: Incident side

310b: Prism

312: Laser beam

314: First engagement position

θ ₁ : first incident side angle

θ ₂ : base angle

Claims (44)

A method for laser bonding glass substrates, the method comprising the following steps: Disposing a first absorption layer between a first edge of a first glass substrate and a second edge of a second glass substrate, the first glass substrate and the second glass substrate each comprising a main opposing surface, the main opposing surfaces of the first glass substrate and the second glass substrate being bounded by the first edge and the second edge, respectively; Contacting the first edge of the first glass substrate and the second edge of the second glass substrate to the first absorption layer to form a first interface; Disposing a refractive optical element optically upstream of the first glass substrate and the second glass substrate, the refractive optical element optically contacting at least one of the first glass substrate and the second glass substrate; and A first welding step is performed by directing a laser beam on an incident side of the refractive optical element so that the laser beam is refracted at a first incident side angle on the first interface to bond the first glass substrate to the second glass substrate and form a first bonding position. The method of claim 1, wherein the laser beam is directed orthogonal to the first glass substrate and the second glass substrate. A method as described in claim 2, wherein the refractive optical element is a prism having a base angle greater than or equal to 70° and less than or equal to 85°. A method as described in claim 2, wherein the refractive optical element is a diffraction grating having a diffraction angle greater than or equal to 30°. The method of claim 1, wherein the laser beam is directed at an angle greater than 0° relative to the first glass substrate and the second glass substrate. A method as described in claim 5, wherein the refractive optical element is a prism having a base angle greater than or equal to 30° and less than or equal to 60°. A method as described in claim 5, wherein the refractive optical element is a diffraction grating having a diffraction angle greater than or equal to 20°. A method as described in any of claims 1-7, wherein the first incident side angle is greater than or equal to 0° and less than or equal to 45°. A method as described in any of claims 1-7, wherein during the first welding step, the laser beam is displaced relative to the incident side of the refractive optical element. A method as described in any of claims 1-7, wherein the refractive optical element is a prism, the prism comprising a coating disposed on the incident side. The method of claim 10, wherein the coating comprises an antireflective coating. A method as described in any of claims 1-7, wherein the refractive optical element is a diffraction grating having a structured surface. A method as described in any of claims 1-7, wherein the refractive optical element comprises fused silica. A method as described in any of claims 1-7, wherein the first bonding location has a transmittance greater than or equal to 70% at a given wavelength and at an object thickness of 0.5 mm. A method as described in any one of claims 1-7, wherein the contacting step includes aligning the major opposing surfaces of the first glass substrate and the second glass substrate along a plane perpendicular to the first interface. The method as described in any one of claims 1-7, wherein the first absorption layer comprises a metal film, a metal foil, an inorganic specialized glass, glass frit, or a combination of the foregoing. The method of claim 16, wherein the metal film comprises copper, aluminum, stainless steel, chromium, molybdenum, nickel, tin oxide, silicon oxide, tin phosphate, tin fluorophosphate, chalcogenide glass, tellurite glass, borate glass, or a combination of the foregoing. The method of claim 17, wherein the metal foil comprises aluminum, aluminum alloy, stainless steel, nickel, nickel alloy, silver, silver alloy, titanium, titanium alloy, tungsten, tungsten alloy, gold, gold alloy, copper, copper alloy, bronze, iron, or a combination of the foregoing. A method as described in any one of claims 17-18, wherein the inorganic specialized glass comprises a fluoride glass material, a tin-doped glass material, a transition metal-doped glass material, or a combination of the foregoing. The method of any one of claims 17-18, wherein the glass frit is a low-temperature glass frit comprising at least one absorbing ion, the at least one absorbing ion comprising at least one of iron, copper, vanadium, and neodymium. The method of any one of claims 1-7, wherein the first absorption layer has a thickness greater than or equal to 20 nm and less than or equal to 1 µm. A method as described in any one of claims 1-7, wherein the method further comprises the following steps: Disposing a second absorbing layer between the second edge of the second glass substrate and a third edge of a third glass substrate, the third glass substrate comprising major opposing surfaces, the major opposing surfaces of the third glass substrate being bounded by the third edge; Contacting the second edge of the second glass substrate and the third edge of the third glass substrate to the second absorbing layer to form a second interface; Disposing the refractive optical element optically upstream of the second glass substrate and the third glass substrate; and Performing a second welding step by directing the laser beam on the incident side of the refractive optical element so that the laser beam is refracted at a second incident side angle on the second interface to bond the second glass substrate to the third glass substrate and form a second bonding position. A method as described in any of claims 1-7, wherein the laser beam comprises a wavelength such that the first glass substrate, the second glass substrate, and the refractive optical element are substantially transparent to the wavelength of the laser beam. A method as described in any of claims 1-7, wherein the laser beam comprises a wavelength such that the first absorbing layer is substantially opaque to the wavelength of the laser beam. A method as described in any of claims 1-7, wherein the laser beam comprises a pulsed laser, and the pulsed laser is a nanosecond pulsed laser, a picosecond pulsed laser, or a femtosecond pulsed laser. The method as described in claim 25, wherein the pulsed laser comprises: a pulse energy greater than or equal to 0.1 µJ and less than or equal to 1000 µJ; a wavelength greater than or equal to 300 nm and less than or equal to 2000 nm; a repetition rate greater than or equal to 1 kHz and less than or equal to 1000 kHz; and a spot size greater than or equal to 5 µm and less than or equal to 50 µm. The method of claim 26, wherein the pulsed laser comprises a pulse width less than or equal to 10 ps. A method as described in any one of claims 1-7, wherein the first glass substrate and the second glass substrate comprise a refractive index greater than or equal to 1.5 and less than or equal to 2.4. A method as described in any one of claims 1 to 7, wherein the first glass substrate and the second glass substrate comprise a glass or glass ceramic, and the glass or glass ceramic comprises borate glass, borosilicate glass, phosphate glass, silicon carbide glass, sodium calcium silicate glass, aluminum silicate glass, alkali metal aluminum silicate glass, borosilicate glass, alkali metal borosilicate glass, aluminum borosilicate glass, alkali metal aluminum borosilicate glass, alkali metal aluminum silicate glass, fused silica, or low expansion glass. The method of claim 29, wherein the low expansion glass comprises titanium dioxide silicate glass. The method of any one of claims 1-7, wherein the first glass substrate and the second glass substrate have a thickness greater than or equal to 0.5 mm. An article comprising: a first glass substrate comprising a first edge; a second glass substrate comprising a second edge, the first glass substrate and the second glass substrate each comprising a major opposing surface, the major opposing surfaces of the first glass substrate and the second glass substrate being bounded by the respective first edge and the second edge; and a first interface weld between the first edge of the first glass substrate and the second edge of the second glass substrate. An article as described in claim 32, wherein the first interface weld comprises weld lines having a width greater than or equal to 5 µm and less than or equal to 1 mm and a distance between the weld lines greater than or equal to 1 µm and less than or equal to 1000 µm. An object as described in claim 32 or claim 33, wherein the object further includes a third glass substrate and a second interface weld between a third edge of the third glass substrate and the second edge of the second glass substrate, the third glass substrate including major opposing surfaces, the major opposing surfaces of the third glass substrate being bounded by the third edge. An article as claimed in claim 32 or claim 33, wherein the article further comprises an absorbing layer, and at least a portion of the interface weld between the edges of the first glass substrate and the second glass substrate comprises the absorbing layer. An article as described in claim 35, wherein the absorption layer comprises a metal film, a metal foil, an inorganic specialized glass, glass frit, or a combination of the foregoing. An object as described in claim 32, wherein the object further comprises a first metal foil and a second metal foil, the first metal foil contacts the first edge and the major opposing surfaces of the first glass substrate, the second metal foil contacts the second edge and the major opposing surfaces of the second glass substrate, wherein the first interface welding comprises the first metal foil and the second metal foil. An object as described in claim 32 or claim 33, wherein the first glass substrate and the second glass substrate comprise a glass or glass ceramic, and the glass or glass ceramic comprises borate glass, silica borate glass, phosphate glass, silicon carbide glass, sodium calcium silicate glass, aluminum silicate glass, alkali metal aluminum silicate glass, borosilicate glass, alkali metal borosilicate glass, aluminum borosilicate glass, alkali metal aluminum borosilicate glass, alkali metal aluminum silicate glass, fused silica, or low expansion glass. A method for laser bonding glass substrates, the method comprising the following steps: Contacting a first main opposing surface of a first glass substrate to a first metal foil at a first contact position, the first contact position being between at least a portion of the first main opposing surface and the first metal foil; Performing a first welding step by directing a laser beam on at least a portion of the first contact position to bond the first main opposing surface of the first glass substrate to the first metal foil and form a first bonding position; Contacting a second main opposing surface of the first glass substrate to the first metal foil at a second contact position, the second contact position being between at least a portion of the second main opposing surface and the first metal foil, the first main opposing surface and the second main opposing surface being bounded by a first edge; Disposing a refractive optical element optically upstream of the first glass substrate, the refractive optical element optically contacts the first glass substrate; Performing a second welding step by directing the laser beam on an incident side of the refractive optical element so that the laser beam is refracted at a first incident side angle on at least a portion of the second contact position to bond the second main opposing surface of the first glass substrate to the first metal foil and form a second bonding position; Contacting a third main opposing surface of a second glass substrate to a second metal foil at a third contact position, the third contact position being between at least a portion of the third main opposing surface and the second metal foil; Performing a third welding step by directing the laser beam on at least a portion of the third contact position to bond the third main opposing surface of the second glass substrate to the second metal foil and form a third bonding position; A fourth major opposing surface of the second glass substrate is contacted to the second metal foil, the third major opposing surface and the fourth major opposing surface are bounded by a second edge at a fourth contact position, the fourth contact position is between at least a portion of the fourth major opposing surface and the second metal foil; The refractive optical element is placed optically upstream of the second glass substrate, the refractive optical element optically contacts the second glass substrate; A fourth welding step is performed by directing the laser beam on the incident side of the refractive optical element, so that the laser beam is refracted at a second incident side angle on at least a portion of the fourth contact position to bond the fourth major surface of the second glass substrate to the second metal foil and form a fourth bonding position; The first metal foil is contacted with the second metal foil to create a fifth contact position, the first main opposing surface and the second main opposing surface of the first glass substrate are aligned with the third main opposing surface and the fourth main opposing surface of the second glass substrate along a plane perpendicular to the fifth contact position; and Performing a fifth welding step to join the first metal foil and the second metal foil and form a fifth joining position. The method of claim 39, wherein the first metal foil and the second metal foil each have a thickness greater than or equal to 5 µm and less than or equal to 50 µm. A method as described in claim 39 or claim 40, wherein at least one of the first metal foil and the second metal foil comprises aluminum, an aluminum alloy, stainless steel, nickel, a nickel alloy, silver, a silver alloy, titanium, a titanium alloy, tungsten, a tungsten alloy, gold, a gold alloy, copper, a copper alloy, bronze, iron, or a combination of the foregoing. A method for laser bonding glass substrates, the method comprising the following steps: Contacting a first edge of a first glass substrate to a second edge of a second glass substrate, the first glass substrate and the second glass substrate each comprising a main opposing surface, the main opposing surfaces of the first glass substrate and the second glass substrate being bounded by the first edge and the second edge respectively; Contacting a first non-transparent substrate to one of the main opposing surfaces of each of the first glass substrate and the second glass substrate, so that the first non-transparent substrate covers both the first glass substrate and the second glass substrate, forms a first contact position with at least a portion of the first glass substrate, and forms a second contact position with at least a portion of the second glass substrate; Performing a first welding step by directing a laser beam on at least a portion of the first contact position to bond the first glass substrate to the first non-transparent substrate and form a first bonding position; Performing a second welding step by directing the laser beam on at least a portion of the second contact position to bond the second glass substrate to the first non-transparent substrate and form a second bonding position; Contacting a second non-transparent substrate to the other of the main opposing surfaces of each of the first glass substrate and the second glass substrate, so that the second non-transparent substrate covers both the first glass substrate and the second glass substrate, forms a third contact position with at least a portion of the first glass substrate, and forms a fourth contact position with at least a portion of the second glass substrate; Disposing a refractive optical element optically upstream of the first glass substrate and the second glass substrate, the refractive optical element optically contacts the first glass substrate or the second glass substrate; A third welding step is performed by directing the laser beam on an incident side of the refractive optical element so that the laser beam is refracted at a first incident side angle on at least a portion of the third contact position to bond the first glass substrate to the second non-transparent substrate and form a third bonding position; and A fourth welding step is performed by directing the laser beam on the incident side of the refractive optical element so that the laser beam is refracted at a second incident side angle on at least a portion of the fourth contact position to bond the second glass substrate to the second non-transparent substrate and form a fourth bonding position. The method of claim 42, wherein at least one of the first opaque material and the second opaque material comprises aluminum, copper, or a combination thereof. The method of claim 42 or claim 43, wherein at least one of the first opaque substrate and the second opaque substrate has a thickness less than or equal to 50 μm.

Images