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TW202423570A - Copper powder - Google Patents

Copper powder Download PDF

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Publication number
TW202423570A
TW202423570A TW112131315A TW112131315A TW202423570A TW 202423570 A TW202423570 A TW 202423570A TW 112131315 A TW112131315 A TW 112131315A TW 112131315 A TW112131315 A TW 112131315A TW 202423570 A TW202423570 A TW 202423570A
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Taiwan
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copper powder
copper
mass
polyether
molecular weight
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TW112131315A
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Chinese (zh)
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森脇和弘
前西原修
船橋泰知
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日商Jx金屬股份有限公司
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Publication of TW202423570A publication Critical patent/TW202423570A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/05Metallic powder characterised by the size or surface area of the particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/10Metallic powder containing lubricating or binding agents; Metallic powder containing organic material
    • B22F1/102Metallic powder coated with organic material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00Making metallic powder or suspensions thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00Making metallic powder or suspensions thereof
    • B22F9/16Making metallic powder or suspensions thereof using chemical processes
    • B22F9/18Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
    • B22F9/24Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from liquid metal compounds, e.g. solutions

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Powder Metallurgy (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
  • Conductive Materials (AREA)

Abstract

This copper powder has a BET specific surface area of 1.0 m2/g to 10.0 m2/g and includes an organic matter having a molecular weight of 500 or less and a polyether and/or a polyol.

Description

銅粉Copper powder

本說明書係揭示一種與銅粉有關之技術。This specification discloses a technology related to copper powder.

例如,粒徑為1 μm以下之次微米尺寸之銅粉,有時會在含有於導電膏之狀態下,用於積層陶瓷電容器或電感器等電子零件之內外電極用材料或噴墨配線之製造。For example, submicron copper powder with a particle size of less than 1 μm is sometimes used in the form of conductive paste to make internal and external electrode materials for electronic parts such as multilayer ceramic capacitors or inductors or for the manufacture of inkjet wiring.

含有銅粉之導電膏,係以電路之形成或半導體元件與基板之接合等為目的,而印刷於基板上並受到加熱,用於燒結銅粉。對於使用於導電膏之銅粉,可能要求於低溫下燒結,即低溫燒結性。其原因在於,於低溫燒結之銅粉相較於高溫燒結之銅粉,除了在加熱時之成本方面更有利之外,亦可應用於耐熱性低之基板。Conductive paste containing copper powder is printed on a substrate and heated to sinter the copper powder for the purpose of forming a circuit or bonding a semiconductor element to a substrate. Copper powder used in conductive paste may be required to be sintered at a low temperature, i.e., low-temperature sinterability. The reason is that copper powder sintered at a low temperature is more cost-effective than copper powder sintered at a high temperature, and can also be applied to substrates with low heat resistance.

作為與此相關聯之技術,例如有專利文獻1中所記載者。於專利文獻1中,在提供「具有優異之低溫燒結性之銅粉」此一課題下,提出有「一種銅粉,其緊密體密度(Packed Bulk Density)為1.30 g/cm 3~2.96 g/cm 3,且D50與微晶直徑D滿足D/D50≧0.060,上述D50係於銅粒子之體積基準之粒徑直方圖中累積頻度達到50%時之50%粒徑,而上述微晶直徑D,則是從對該銅粉藉由粉末X射線繞射法所獲得之X射線繞射曲線中的Cu(111)面之繞射峰,利用謝樂方程式而求得者」。 [先前技術文獻] [專利文獻] As a technology related to this, there is one described in Patent Document 1, for example. In patent document 1, under the topic of "providing a copper powder with excellent low-temperature sintering properties", it is proposed that "a copper powder has a packed bulk density of 1.30 g/cm 3 to 2.96 g/cm 3 , and D50 and a crystallite diameter D satisfy D/D50≧0.060, wherein the above D50 is the 50% particle size when the cumulative frequency reaches 50% in the particle size histogram based on the volume of the copper particles, and the above crystallite diameter D is obtained by using the Scherrer equation from the diffraction peak of the Cu (111) plane in the X-ray diffraction curve obtained by powder X-ray diffraction of the copper powder." [Prior art literature] [Patent literature]

[專利文獻1]日本特許第7122436號公報[Patent Document 1] Japanese Patent No. 7122436

[發明所欲解決之課題][The problem that the invention wants to solve]

專利文獻1中所記載之銅粉,雖可在相對較低之溫度燒結,但有時要求以與其不同之手法或觀點來有效地提高銅粉之低溫燒結性。Although the copper powder described in Patent Document 1 can be sintered at a relatively low temperature, sometimes different techniques or viewpoints are required to effectively improve the low-temperature sinterability of the copper powder.

於本說明書中,提供一種具有優異之低溫燒結性之銅粉。 [解決課題之技術手段] In this specification, a copper powder with excellent low-temperature sintering properties is provided. [Technical means to solve the problem]

本說明書中揭示之銅粉,係BET比表面積為1.0 m 2/g~10.0 m 2/g,且含有分子量為500以下之有機物、與聚醚及/或多元醇者。 [發明之效果] The copper powder disclosed in this specification has a BET specific surface area of 1.0 m 2 /g to 10.0 m 2 /g and contains an organic substance with a molecular weight of 500 or less, and polyether and/or polyol. [Effects of the Invention]

上述銅粉係具有優異之低溫燒結性者。The copper powder has excellent low temperature sintering properties.

以下,詳細說明上述銅粉之實施形態。 一實施形態之銅粉,其BET比表面積為1.0 m 2/g~10.0 m 2/g。銅粉之比表面積在一定程度上較大,有粒徑越小,越易在低溫區域發生燒結之傾向。 The following is a detailed description of the above copper powder embodiments. In one embodiment, the copper powder has a BET specific surface area of 1.0 m 2 /g to 10.0 m 2 /g. The specific surface area of the copper powder is relatively large to a certain extent, and the smaller the particle size, the easier it is to sinter in the low temperature region.

又,該銅粉含有分子量為500以下之有機物(以下,亦稱為「低分子有機物」)、與聚醚及/或多元醇。銅粉中之聚醚或多元醇於受到加熱而熱分解時,會還原生成於銅粉表面之銅氧化物,而認為經以此方式去除表面氧化物之銅粉於低溫下之燒結得到促進。再者,實際上,藉由X射線繞射法對銅粉之燒結體進行分析後,結果確認到存在於銅粉之銅氧化物被還原。又,藉由熱分析等,亦確認到聚醚或多元醇之分解溫度與銅粉之燒結溫度大致一致。 而且,低分子有機物具有抑制銅粉凝聚之效果。若於銅粉之製造時添加此種低分子有機物,則可推測上述聚醚或多元醇充分地附著於因低分子有機物而分散之大部分銅粒子。藉此,可顯著發揮聚醚或多元醇所帶來之低溫燒結效果。因此,就提升低溫燒結性之觀點而言,關鍵在於銅粉含有低分子有機物、與聚醚及/或多元醇兩者。此外,低分子有機物之分子量為500以下,於熱分解時能夠阻礙銅粉燒結之碳之殘留量少。 Furthermore, the copper powder contains an organic substance with a molecular weight of 500 or less (hereinafter, also referred to as "low molecular organic substance"), and polyether and/or polyol. When the polyether or polyol in the copper powder is heated and thermally decomposed, the copper oxide generated on the surface of the copper powder will be reduced, and it is believed that the sintering of the copper powder at a low temperature is promoted by removing the surface oxide in this way. Furthermore, in fact, after analyzing the sintered body of the copper powder by X-ray diffraction method, it was confirmed that the copper oxide present in the copper powder was reduced. In addition, by thermal analysis, etc., it was also confirmed that the decomposition temperature of the polyether or polyol is roughly the same as the sintering temperature of the copper powder. Moreover, the low molecular organic substance has the effect of inhibiting the aggregation of copper powder. If such low molecular weight organic matter is added during the manufacture of copper powder, it can be inferred that the above-mentioned polyether or polyol is fully attached to most of the copper particles dispersed by the low molecular weight organic matter. In this way, the low temperature sintering effect brought by the polyether or polyol can be significantly exerted. Therefore, from the perspective of improving low temperature sintering properties, the key is that the copper powder contains both low molecular weight organic matter and polyether and/or polyol. In addition, the molecular weight of the low molecular weight organic matter is less than 500, and the amount of carbon residue that can hinder the sintering of copper powder during thermal decomposition is small.

作為該等之結果,認為此實施形態之銅粉之低溫燒結性變得優異。惟,並不限定於如上述之理論。As a result, it is considered that the low-temperature sintering property of the copper powder of this embodiment becomes excellent. However, it is not limited to the above theory.

(比表面積) 銅粉之BET比表面積為1.0 m 2/g~10.0 m 2/g。BET比表面積在一定程度上如此較大之銅粉,粒徑小,於非活性氣體中之燒結起始溫度相對較低。再者,於BET比表面積過大之情形時,難以確保耐氧化性,又,由於吸濕或凝聚等,而擔心導電膏等之膏特性產生問題。由此觀點,銅粉之BET比表面積進而更佳為2.0 m 2/g~7.0 m 2/g。 (Specific surface area) The BET specific surface area of copper powder is 1.0 m 2 /g to 10.0 m 2 /g. Copper powder with such a large BET specific surface area has a small particle size and a relatively low sintering starting temperature in an inert gas. Furthermore, when the BET specific surface area is too large, it is difficult to ensure oxidation resistance, and there is a concern that the paste properties of conductive pastes may be affected due to moisture absorption or agglomeration. From this point of view, the BET specific surface area of copper powder is more preferably 2.0 m 2 /g to 7.0 m 2 /g.

銅粉之BET比表面積之測定可依據JIS Z8830:2013,例如使用MicrotracBEL公司之BELSORP-mini II進行。更詳而言之,係將3 g銅粉樣品在真空中以70℃之溫度歷時5小時進行脫氣後,測定氮吸附等溫線,並用BET法對由此獲得之結果進行分析,藉此算出BET比表面積。The BET specific surface area of copper powder can be measured according to JIS Z8830:2013, for example, using BELSORP-mini II of MicrotracBEL. More specifically, 3 g of copper powder sample is degassed at 70°C in a vacuum for 5 hours, the nitrogen adsorption isotherm is measured, and the results obtained are analyzed by the BET method to calculate the BET specific surface area.

(組成) 銅粉係大部分為銅,進而含有低分子有機物、與聚醚及/或多元醇者。典型上,銅粉係其銅粒子之表面之至少一部分被低分子有機物、與聚醚及/或多元醇被覆者。 (Composition) Copper powder is mostly copper, and further contains low molecular weight organic matter, polyether and/or polyol. Typically, copper powder is a copper powder in which at least a portion of the surface of the copper particles is coated with low molecular weight organic matter, polyether and/or polyol.

銅粉藉由含有低分子有機物,而如上所述,凝聚得到抑制,分散性變高。於實施銅粉製造時之聚醚及/或多元醇之表面處理時,若含有低分子有機物,則可獲得有效地附著有聚醚及/或多元醇之銅粉。聚醚或多元醇係提升銅粉之低溫燒結性者,故不僅含有聚醚及/或多元醇而且亦含有低分子有機物之銅粉,有效地達成了利用聚醚或多元醇之燒結低溫化。As mentioned above, the copper powder is suppressed from agglomeration and has high dispersibility by containing low molecular weight organic matter. When the copper powder is subjected to surface treatment of polyether and/or polyol during the manufacture of the copper powder, if low molecular weight organic matter is contained, the copper powder to which the polyether and/or polyol is effectively attached can be obtained. Polyether or polyol is used to improve the low temperature sintering property of the copper powder, so the copper powder containing not only polyether and/or polyol but also low molecular weight organic matter effectively achieves the sintering temperature reduction by using the polyether or polyol.

又,低分子有機物存在分子量為500以下,且氧含量為50質量%以上之情況,為不含有那麼多碳者。因此,於經加熱銅粉以進行燒結時,低分子有機物發生熱分解時所殘留之碳之量相對較少,不易妨礙燒結。In addition, low molecular weight organic matter does not contain that much carbon when the molecular weight is less than 500 and the oxygen content is more than 50 mass%. Therefore, when the copper powder is heated for sintering, the amount of carbon remaining when the low molecular weight organic matter undergoes thermal decomposition is relatively small, and it is not easy to hinder sintering.

再者,作為參考,將低分子有機物之具體例之氧含量示於以下。 葡萄糖(C 6H 12O 6):53.29質量% 半乳糖(C 6H 12O 6):53.29質量% 甘露糖(C 6H 12O 6):53.29質量% 麥芽糖(C 12H 22O 11):51.42質量% 蔗糖(C 12H 22O 11):51.42質量% 乳糖(C 12H 22O 11):51.42質量% 檸檬酸(C 6H 8O 7):58.29質量% 乙酸(C 2H 4O 2):53.29質量% 蘋果酸(C 4H 6O 5):59.66質量% 丙二酸(C 3H 4O 4):61.50質量% 琥珀酸(C 4H 6O 4):54.19質量% 富馬酸(C 4H 4O 4):55.14質量% 酒石酸(C 4H 6O 6):63.96質量% 葡萄糖酸(C 6H 12O 7):57.10質量% 甲酸(CH 2O 2):69.52質量% 草酸(C 2H 2O 4):71.08質量% 烏頭酸(C 6H 6O 6):55.14質量% 丙酮酸(C 3H 4O 3):54.50質量% 草乙酸(C 4H 4O 5):60.57質量% 乳酸(C 3H 6O 3):53.29質量% 抗壞血酸(C 6H 8O 6):54.50質量% For reference, specific examples of oxygen contents of low molecular weight organic substances are shown below. Glucose (C 6 H 12 O 6 ): 53.29 mass% Galactose (C 6 H 12 O 6 ): 53.29 mass% Mannose (C 6 H 12 O 6 ): 53.29 mass% Maltose (C 12 H 22 O 11 ): 51.42 mass% Sucrose (C 12 H 22 O 11 ): 51.42 mass% Lactose (C 12 H 22 O 11 ): 51.42 mass% Citric acid (C 6 H 8 O 7 ): 58.29 mass% Acetic acid (C 2 H 4 O 2 ): 53.29 mass% Apple acid (C 4 H 6 O 5 ): 59.66 mass% Malonic acid (C 3 H 4 O 4 ): 61.50 mass % Succinic acid (C 4 H 6 O 4 ): 54.19 mass % Fumaric acid (C 4 H 4 O 4 ): 55.14 mass % Tartaric acid (C 4 H 6 O 6 ): 63.96 mass % Gluconic acid (C 6 H 12 O 7 ): 57.10 mass % Formic acid (CH 2 O 2 ): 69.52 mass % Oxalic acid (C 2 H 2 O 4 ): 71.08 mass % Aconitic acid (C 6 H 6 O 6 ): 55.14 mass % Pyruvic acid (C 3 H 4 O 3 ): 54.50 mass % Oxalacetic acid (C 4 H 4 O 5 ): 60.57 mass % Lactic acid (C 3 H 6 O 3 ): 53.29 mass % Ascorbic acid (C 6 H 8 O 6 ): 54.50 mass%

銅粉較佳含有低分子有機物中選自由羧酸、羧酸鹽、葡萄糖、麥芽糖、蔗糖及乳糖所組成之群中之至少1種。藉此,可製成抑制凝聚且燒結不受妨礙之銅粉。The copper powder preferably contains at least one selected from the group consisting of carboxylic acid, carboxylic acid salt, glucose, maltose, sucrose and lactose among low molecular weight organic substances. Thus, the copper powder can be produced which suppresses aggregation and does not hinder sintering.

於上述低分子有機物中,羧酸若於銅粉之製造時添加,則會配位於銅,使反應速度或銅粒子之生長速度降低。藉此,銅粉除了粒子形狀接近於球形,粒度分佈變窄之外,凝聚亦變少。因此,銅粉較佳含有低分子有機物中之羧酸。Among the above-mentioned low molecular weight organic substances, if carboxylic acid is added during the production of copper powder, it will coordinate with copper, reducing the reaction rate or the growth rate of copper particles. As a result, the copper powder particles not only become closer to spherical in shape, but also have a narrower particle size distribution and less agglomeration. Therefore, copper powder preferably contains carboxylic acid among the low molecular weight organic substances.

作為羧酸,具體而言,可舉:檸檬酸、乙酸、蘋果酸、甲基二羥戊酸、丙二酸、琥珀酸、富馬酸、酒石酸、葡萄糖酸、甲酸、草酸、烏頭酸、丙酮酸、草乙酸、乳酸、其等之鹽等。尤其是銅粉進而更佳含有檸檬酸及/或檸檬酸鹽作為低分子有機物。檸檬酸或檸檬酸鹽抑制凝聚且不妨礙燒結之效果高。As carboxylic acid, specifically, there can be mentioned: citric acid, acetic acid, malic acid, methyl dihydroxyvaleric acid, malonic acid, succinic acid, fumaric acid, tartaric acid, gluconic acid, formic acid, oxalic acid, aconic acid, pyruvic acid, oxalacetic acid, lactic acid, and salts thereof. In particular, the copper powder preferably contains citric acid and/or a citrate as a low molecular weight organic substance. Citric acid or a citrate has a high effect of inhibiting aggregation and not hindering sintering.

再者,銅粉較理想不含阿拉伯膠等高分子有機物(分子量超過500之有機物)。其原因在於,高分子有機物在加熱時之熱分解中會招致大量碳殘留,其有妨礙銅粉於相對低溫下之燒結之虞。Furthermore, copper powder should preferably not contain high molecular weight organic substances (organic substances with a molecular weight of more than 500) such as gum arabic. The reason is that high molecular weight organic substances will cause a large amount of carbon residue during thermal decomposition when heated, which may hinder the sintering of copper powder at relatively low temperatures.

銅粉除上述低分子有機物之外,亦含有聚醚及/或多元醇。銅粉中之聚醚或多元醇係於加熱時發揮作用,以便將可能自然生成於銅粉表面之氧化銅還原為銅。藉此,可促進銅粉於低溫下之燒結。認為聚醚或多元醇對銅粉表面之還原力較低分子有機物強。In addition to the above-mentioned low molecular weight organic substances, copper powder also contains polyethers and/or polyols. The polyethers or polyols in the copper powder function when heated to reduce copper oxide that may be naturally generated on the surface of the copper powder to copper. This can promote the sintering of the copper powder at low temperatures. It is believed that the reducing power of polyethers or polyols on the surface of copper powder is stronger than that of low molecular weight organic substances.

於銅粉含有聚醚之情形時,該聚醚較佳包含通式(1):RO(C 2H 4O) nH(R為H、或者C4~18之飽和或不飽和烴,n為2~30之整數)所表示之化合物、及/或通式(2):RO(C 3H 6O) nH(R為H、或者C4~18之飽和或不飽和烴,n為2~30之整數)所表示之化合物。於銅粉含有上述通式(1)或通式(2)之化合物之情形時,能夠於相對低溫下還原銅氧化物。作為通式(1)之化合物,可舉:HO(C 2H 4O) nH之聚乙二醇、H 2m 1C mO(C 2H 4O) nH(m:4~18之整數)之聚氧乙烯烷基醚等。又,作為通式(2)之化合物,可舉:HO(C 3H 6O) nH之聚丙二醇、H 2m 1C mO(C 3H 6O) nH(m:4~18之整數)之聚氧丙烯烷基醚等。又,亦可舉聚氧乙烯部位與聚氧丙烯部位組合而成之H 2m 1C mO(C 2H 4O) n(C 3H 6O) lH之聚氧乙烯聚氧丙烯烷基醚等。 When the copper powder contains a polyether, the polyether preferably comprises a compound represented by the general formula (1): RO(C 2 H 4 O) n H (R is H, or a saturated or unsaturated hydrocarbon of C4 to 18, and n is an integer of 2 to 30) and/or a compound represented by the general formula (2): RO(C 3 H 6 O) n H (R is H, or a saturated or unsaturated hydrocarbon of C4 to 18, and n is an integer of 2 to 30). When the copper powder contains the compound of the general formula (1) or (2), copper oxide can be reduced at a relatively low temperature. Examples of the compound of the general formula (1) include polyethylene glycol of HO(C 2 H 4 O) n H and polyoxyethylene alkyl ether of H 2m 1 C m O(C 2 H 4 O) n H (m: an integer of 4 to 18). Examples of the compound of the general formula (2) include polypropylene glycol of HO(C 3 H 6 O) n H and polyoxypropylene alkyl ether of H 2m 1 C m O(C 3 H 6 O) n H (m: an integer of 4 to 18). Examples of the compound of the general formula (2) include polyoxyethylene polyoxypropylene alkyl ether of H 2m 1 C m O(C 2 H 4 O) n (C 3 H 6 O) l H in which a polyoxyethylene moiety and a polyoxypropylene moiety are combined.

可含有於銅粉之聚醚較佳具有烷基鏈(即直鏈狀或支鏈狀之烷基)。若為具有烷基鏈者,則銅粉在膏中之分散性得到提升。其原因在於,由於烷基鏈為疏水性之官能基,故而與膏之同為疏水性之有機溶劑的親和性良好。因此,認為於將具有烷基鏈之銅粉與有機溶劑混合之情形時,能夠長時間維持銅粉之分散狀態。The polyether that can be contained in the copper powder preferably has an alkyl chain (i.e., a linear or branched alkyl group). If it has an alkyl chain, the dispersibility of the copper powder in the paste is improved. The reason is that since the alkyl chain is a hydrophobic functional group, it has a good affinity with the hydrophobic organic solvent of the paste. Therefore, it is believed that when the copper powder with an alkyl chain is mixed with the organic solvent, the dispersion state of the copper powder can be maintained for a long time.

又,銅粉亦可為含有多元醇者。作為多元醇,可舉:甘油(glycerol)、聚甘油、丁二醇、戊二醇、己二醇、庚二醇、辛二醇、壬二醇、癸二醇、季戊四醇(pentaerythriol)、二季戊四醇等。The copper powder may also contain a polyol. Examples of the polyol include glycerol, polyglycerol, butanediol, pentanediol, hexanediol, heptanediol, octanediol, nonanediol, decanediol, pentaerythritol, and dipentaerythritol.

關於銅粉含有低分子有機物或聚醚、多元醇,可藉由紅外光譜法或質譜法等來加以確認。Whether copper powder contains low molecular weight organic substances, polyethers, or polyols can be confirmed by infrared spectroscopy or mass spectrometry.

於利用紅外光譜法進行之鑑定中,可使用漫反射法,裝置可使用日本分光股份有限公司製造之FT/IR-6700。關於漫反射單元之試樣支架,係使用具有多個用以放入試樣之槽,且藉由旋轉支架而可改變待測定之試樣者。作為試樣之銅粉,係在不用溴化鉀等進行稀釋之情況下,直接放入至漫反射單元之試樣支架之槽,並用藥勺之平坦部分刮平,使表面平整。背景測定係藉由以下形態進行:對於試樣支架之槽中未放入任何物質之部分,以4 cm -1之解析度掃描400~4000 cm -1之波長。其後,旋轉支架,對準經放入銅粉之槽,在與上述相同之條件下進行測定。再者,測定係於室溫進行,為了獲得充分之光譜,將累計次數設為256次以上。 In the identification using infrared spectroscopy, the diffuse reflectance method can be used, and the device can be FT/IR-6700 manufactured by JASCO Corporation. Regarding the sample holder of the diffuse reflectance unit, a plurality of slots for placing the samples are used, and the sample to be measured can be changed by rotating the holder. The copper powder as the sample is directly placed in the slot of the sample holder of the diffuse reflectance unit without dilution with potassium bromide, etc., and the surface is flattened by scraping with the flat part of the medicine spoon. The background measurement is performed in the following form: For the part of the slot of the sample holder where no substance is placed, the wavelength of 400 to 4000 cm -1 is scanned at a resolution of 4 cm -1 . Thereafter, the holder is rotated to align with the slot where the copper powder has been placed, and the measurement is performed under the same conditions as above. Furthermore, the measurement was performed at room temperature, and the number of accumulations was set to 256 or more in order to obtain a sufficient spectrum.

於銅粉含有上述之通式(1)或通式(2)所表示之聚醚的情形時,若使用上述紅外光譜法,則於3000~2840 cm -1處檢測到來自飽和烴(烷基)之波峰,於1260~1000 cm -1處檢測到來自醚鍵之波峰。因此,藉此可判斷為銅粉含有聚醚。又,來自低分子有機物中之羧酸或羧酸鹽之波峰,係於1500~1750 cm -1處檢測到,因此亦能夠確認銅粉是否含有羧酸或羧酸鹽。 When the copper powder contains the polyether represented by the general formula (1) or (2), the infrared spectroscopy method described above detects a peak derived from a saturated hydrocarbon (alkyl) at 3000 to 2840 cm -1 and a peak derived from an ether bond at 1260 to 1000 cm -1 . Therefore, it can be determined that the copper powder contains the polyether. In addition, a peak derived from a carboxylic acid or a carboxylic acid salt in a low molecular weight organic substance is detected at 1500 to 1750 cm -1 , so it can also be confirmed whether the copper powder contains a carboxylic acid or a carboxylic acid salt.

又,於利用質譜法進行之鑑定中,可使用液相層析-軌道阱(Orbitrap)質譜儀(Thermo Fisher Scientific公司製造,LC-Orbitrap MS,LC:Vanquish分析精製LC系統,Orbitrap MS:Orbitrap Exploris240質譜儀)。藉此,能夠確認銅粉是否含有多元醇或低分子有機物。測定條件如下。向混合有10 mmol/L之乙酸銨水溶液及乙腈之溶液(以體積比計為1:1)放入銅粉(相對於1 g銅粉,混合溶劑為4 mL),利用振盪機及超音波洗淨機進行攪拌操作,藉由離心分離而分離為銅粉及提取液,藉由針筒過濾器過濾(Merck Millipore公司製造,Millex(註冊商標)-LCR,材質:親水性PTEF,孔徑:0.45 μm)來採集提取液。利用上述液相層析-軌道阱質譜儀來測定該提取液。管柱使用Hypersil GOLD(C18),流動相係以自10 mmol/L之乙酸銨水溶液變為乙腈之方式導入,管柱溫度可設為40℃。於負離子檢測模式下,檢測到m/z值500以下之波峰之情形時,可稱銅粉含有分子量500以下之有機物。又,作為一例,於正離子檢測模式下,檢測到離子加成於C 3H 8O 3之波峰之情形時,可稱銅粉含有為多元醇之一種的甘油。 In addition, in the identification by mass spectrometry, a liquid chromatography-orbitrap mass spectrometer (manufactured by Thermo Fisher Scientific, LC-Orbitrap MS, LC: Vanquish analytical purification LC system, Orbitrap MS: Orbitrap Exploris240 mass spectrometer) can be used. In this way, it is possible to confirm whether the copper powder contains polyols or low molecular weight organic substances. The measurement conditions are as follows. Copper powder (4 mL of mixed solvent relative to 1 g of copper powder) was added to a solution of 10 mmol/L ammonium acetate aqueous solution and acetonitrile (volume ratio of 1:1), stirred by a shaker and an ultrasonic cleaner, separated into copper powder and extract by centrifugal separation, and the extract was collected by syringe filter filtration (Millex (registered trademark)-LCR manufactured by Merck Millipore, material: hydrophilic PTEF, pore size: 0.45 μm). The extract was measured by the above-mentioned liquid chromatography-orbitrap mass spectrometer. The column used is Hypersil GOLD (C18), and the mobile phase is introduced by changing from 10 mmol/L ammonium acetate aqueous solution to acetonitrile, and the column temperature can be set to 40°C. In the negative ion detection mode, when a peak with an m/z value of 500 or less is detected, the copper powder can be said to contain an organic substance with a molecular weight of 500 or less. In addition, as an example, in the positive ion detection mode, when a peak of ion addition to C 3 H 8 O 3 is detected, the copper powder can be said to contain glycerol, which is a type of polyol.

銅粉較佳為碳含量為0.15質量%~1.00質量%。銅粉中之碳包括來自低分子有機物者及來自多元醇及/或聚醚者。於銅粉之碳含量過少之情形時,低溫燒結所需之低分子有機物、及/或多元醇或聚醚有可能不足。另一方面,若碳含量過多,則銅粉之燒結後,碳之殘留量變多,而擔心燒結性會降低或不利低電阻。由此觀點,銅粉之碳含量進而更佳為0.15質量%~0.70質量%。The copper powder preferably has a carbon content of 0.15% to 1.00% by mass. The carbon in the copper powder includes carbon from low molecular weight organic substances and carbon from polyols and/or polyethers. When the carbon content of the copper powder is too low, the low molecular weight organic substances and/or polyols or polyethers required for low temperature sintering may be insufficient. On the other hand, if the carbon content is too high, the amount of carbon residue after the copper powder is sintered increases, and there is a concern that the sinterability will be reduced or it will be disadvantageous for low resistance. From this point of view, the carbon content of the copper powder is further preferably 0.15% to 0.70% by mass.

銅粉之碳含量,係藉由高頻感應加熱爐燃燒-紅外線吸收法進行測定。具體而言,可使用LECO製造之CS844型等碳硫分析裝置,將試樣採集量設為0.2 g,調整為校準曲線之強度範圍內,將助燃劑設為LECO製造之LECOCEL II及Fe屑,使用標準物質之測針作為校準曲線,來測定銅粉之碳含量。再者,試樣放入至鋁坩堝進行測定後,該鋁坩堝係於進行下述預處理後用於測定銅粉之碳含量,上述預處理係預先在空氣中歷時2小時以一定之升溫速度自室溫升溫至1000℃後,於1000℃保持2小時。The carbon content of copper powder is measured by high-frequency induction furnace combustion-infrared absorption method. Specifically, a carbon-sulfur analysis device such as CS844 manufactured by LECO can be used, the sample collection amount is set to 0.2 g, adjusted to the intensity range of the calibration curve, the combustion aid is set to LECOCEL II and Fe chips manufactured by LECO, and a probe of a standard substance is used as the calibration curve to measure the carbon content of copper powder. Furthermore, after the sample is placed in an aluminum crucible for measurement, the aluminum crucible is used to measure the carbon content of copper powder after the following pretreatment, which is to heat the sample from room temperature to 1000°C at a certain heating rate in air for 2 hours, and then maintain it at 1000°C for 2 hours.

(燒結起始溫度) 如上述之銅粉當經在非活性氣體中加熱之情形時,有時於相對較低之溫度下燒結,例如燒結起始溫度為300℃以下。銅粉在非活性氣體中之燒結起始溫度較佳為250℃以下。 (Sintering start temperature) When the copper powder is heated in an inert gas as described above, it is sometimes sintered at a relatively low temperature, for example, the sintering start temperature is below 300°C. The sintering start temperature of the copper powder in an inert gas is preferably below 250°C.

上述燒結起始溫度係使用熱機械分析(TMA;Thermomechanical Analysis)進行測定。具體而言,以如下方式進行。即,將銅粉(約0.3 g)放入至開有直徑5 mm之孔的製粒模具中,用1 kN之力進行壓縮,製作圓柱狀(高度:約3 mm,直徑:約5 mm)之銅粉顆粒。使用測微計(Mitutoyo公司製造,防冷卻液測微計(Coolant Proof Micrometer)MDC-25MX,最大容許誤差±1 μm)測定其高度,將其作為初始顆粒高度。將該顆粒設置於熱機械分析裝置(NETZSCH公司製造,TMA4000SE),抽真空至-0.1 MPa以下後,導入N 2形成非活性環境,一面以500 mL/分鐘之流量使N 2流入,一面施加10 g重之負載,同時以10℃/分鐘之升溫速度自室溫(25℃)升溫至700℃。此時,在自室溫至700℃之加熱期間,每隔1秒測定顆粒之高度,將顆粒高度自初始高度收縮了2%時之溫度作為燒結起始溫度。 The above sintering starting temperature is measured using thermomechanical analysis (TMA). Specifically, it is carried out as follows. That is, copper powder (about 0.3 g) is placed in a pelletizing mold with a hole of 5 mm in diameter, and compressed with a force of 1 kN to produce cylindrical (height: about 3 mm, diameter: about 5 mm) copper powder particles. The height is measured using a micrometer (manufactured by Mitutoyo, coolant proof micrometer (Coolant Proof Micrometer) MDC-25MX, maximum allowable error ±1 μm), and it is used as the initial particle height. The particles were placed in a thermomechanical analysis device (TMA4000SE manufactured by NETZSCH), evacuated to below -0.1 MPa, and then N 2 was introduced to form an inactive environment. N 2 was flowed in at a flow rate of 500 mL/min, while a load of 10 g was applied. The temperature was raised from room temperature (25°C) to 700°C at a rate of 10°C/min. During the heating period from room temperature to 700°C, the height of the particles was measured every 1 second, and the temperature at which the height of the particles shrunk by 2% from the initial height was taken as the sintering starting temperature.

(製造方法) 要製造銅粉,雖可採用化學還原法或歧化法等液相法等各種方法,但例如於液相法之情形時,重要的是添加規定之有機物,以及較佳於藉由反應生成銅粒子後,使銅粒子與表面處理劑接觸。以下,對採用化學還原法之情形之具體例進行詳細說明。 (Manufacturing method) To manufacture copper powder, various methods such as chemical reduction method or disproportionation method and liquid phase method can be used. However, in the case of liquid phase method, it is important to add a predetermined organic substance and preferably make the copper particles contact with the surface treatment agent after the copper particles are generated by reaction. The following is a detailed description of a specific example of the case of using chemical reduction method.

於化學還原法中,進行如下步驟:藉由將硫酸銅等銅鹽、低分子有機物(分子量為500以下之有機物)、還原劑及鹼在液體中混合並使之反應,而生成銅粒子,獲得含有銅粒子之銅漿。低分子有機物如上所述,例如包括檸檬酸、檸檬酸鈉或檸檬酸鉀等檸檬酸鹽。作為還原劑,可舉肼或硼氫化鈉等,又,作為鹼,可舉氫氧化鈉或氨等。In the chemical reduction method, the following steps are performed: copper salts such as copper sulfate, low molecular weight organic substances (organic substances with a molecular weight of 500 or less), reducing agents, and bases are mixed in a liquid and reacted to generate copper particles, thereby obtaining copper slurry containing copper particles. The low molecular weight organic substances include, as described above, citrate salts such as citric acid, sodium citrate, or potassium citrate. As the reducing agent, hydrazine or sodium borohydride can be used, and as the base, sodium hydroxide or ammonia can be used.

作為該步驟之更詳細之一例,將硫酸銅水溶液升溫至適當之反應溫度後,用氫氧化鈉水溶液或氨水溶液來調整pH值,然後一次性添加肼水溶液進行反應,將硫酸銅還原為粒徑100 nm左右之氧化亞銅粒子。將含有氧化亞銅粒子之氧化亞銅漿升溫至反應溫度後,滴加含有氫氧化鈉及肼之水溶液,進而,其後滴加肼水溶液,藉此將氧化亞銅粒子還原為銅粒子。As a more detailed example of this step, after heating the copper sulfate aqueous solution to an appropriate reaction temperature, the pH value is adjusted with a sodium hydroxide aqueous solution or an ammonia aqueous solution, and then a hydrazine aqueous solution is added at once to react, thereby reducing the copper sulfate to cuprous oxide particles with a particle size of about 100 nm. After heating the cuprous oxide slurry containing the cuprous oxide particles to the reaction temperature, an aqueous solution containing sodium hydroxide and hydrazine is added dropwise, and then a hydrazine aqueous solution is added dropwise, thereby reducing the cuprous oxide particles to copper particles.

繼而,進行將上述銅漿洗淨,獲得洗淨後銅漿之步驟。洗淨方法並無特別限定,可採用壓濾機或傾析等。Next, the copper slurry is washed to obtain washed copper slurry. The washing method is not particularly limited, and a filter press or decanting may be used.

繼而,於上述洗淨後銅漿添加例如聚氧乙烯烷基醚等表面處理劑,對洗淨後銅漿中之銅粒子實施表面處理。此時,由於銅粒子之凝聚受到洗淨後銅漿所含之低分子有機物的抑制,因此多數銅粒子之大致整體被聚氧乙烯烷基醚等有效地處理。於銅粒子發生凝聚之情形時,由於在凝聚之部位銅粒子彼此接觸,故而無法充分地實施表面處理。Next, a surface treatment agent such as polyoxyethylene alkyl ether is added to the above-mentioned copper slurry after washing, and the copper particles in the copper slurry after washing are subjected to surface treatment. At this time, since the aggregation of copper particles is inhibited by the low molecular weight organic matter contained in the copper slurry after washing, the majority of copper particles are effectively treated by polyoxyethylene alkyl ether and the like. When the copper particles are aggregated, the copper particles are in contact with each other at the aggregated part, so the surface treatment cannot be fully performed.

如上述,表面處理較佳於生成銅粒子之反應後進行。若於反應時添加聚氧乙烯烷基醚,則有液體因發泡而自反應容器中溢出之虞。於使用肼作為還原劑之情形時,就安全性之觀點而言,不希望發泡。於使用消泡劑之情形時,除了其成本增加以外,還可能導致消泡劑之成分殘留於銅粉,而對燒結特性或膏分散性產生影響。As mentioned above, the surface treatment is preferably performed after the reaction of generating copper particles. If polyoxyethylene alkyl ether is added during the reaction, there is a risk that the liquid will overflow from the reaction container due to foaming. When hydrazine is used as a reducing agent, foaming is undesirable from the perspective of safety. When a defoaming agent is used, in addition to the increase in cost, the components of the defoaming agent may remain in the copper powder, which may affect the sintering characteristics or paste dispersibility.

關於表面處理劑,為了在漿料中與銅粒子均勻地接觸,較佳為水溶性聚氧乙烯烷基醚。若為非水溶性者,則擔心與漿料分離而無法均勻地混合,或無法控制附著量。Regarding the surface treatment agent, in order to uniformly contact the copper particles in the slurry, it is preferred to use a water-soluble polyoxyethylene alkyl ether. If it is a non-water-soluble agent, there is a concern that it will separate from the slurry and cannot be mixed uniformly, or the amount of adhesion cannot be controlled.

繼而,進行使表面處理後銅漿乾燥,獲得乾燥粉末之步驟。乾燥方法並無特別限定,但就控制表面處理劑之附著量的觀點而言,較佳為可進行全量乾燥之方法,例如噴霧乾燥器乾燥、FM攪拌機、真空乾燥、真空加熱乾燥、或非活性氣體環境下之加熱乾燥等。Next, the surface treated copper slurry is dried to obtain a dry powder. The drying method is not particularly limited, but from the perspective of controlling the amount of the surface treatment agent attached, a method that can perform full drying is preferred, such as spray drying, FM mixer, vacuum drying, vacuum heating drying, or heating drying in an inert gas environment.

繼而,進行使用噴射磨機、行星型球磨機或研缽等將乾燥粉末破碎之步驟。其後,進行藉由真空乾燥、真空加熱乾燥或非活性氣體環境下之加熱乾燥等,使破碎粉末乾燥之步驟。藉此,可製造銅粉。Next, the dried powder is crushed using a jet mill, a planetary ball mill, or a mortar. Thereafter, the crushed powder is dried by vacuum drying, vacuum heating drying, or heating drying in an inert gas environment. In this way, copper powder can be produced.

如上述,雖使洗淨後銅漿中之銅粒子在乾燥前與表面處理劑接觸,但銅粒子與表面處理劑之接觸時期亦可在乾燥之後。例如,亦可於進行破碎粉末之乾燥步驟之後,使銅粒子與作為表面處理劑之聚氧乙烯烷基醚或聚氧乙烯烷基醚水溶液等接觸。於此情形時,其後可視需要進行乾燥或破碎等。 [實施例] As described above, although the copper particles in the washed copper slurry are in contact with the surface treatment agent before drying, the contact period between the copper particles and the surface treatment agent may also be after drying. For example, after the drying step of crushing the powder, the copper particles may be in contact with polyoxyethylene alkyl ether or polyoxyethylene alkyl ether aqueous solution as a surface treatment agent. In this case, drying or crushing may be performed as needed. [Example]

其次,由於試製了如上述之銅粉,並確認了其特性,故而於以下進行說明。但是,此處之說明僅為了例示,並不意欲限定於此。Next, since the copper powder as described above was produced and its characteristics were confirmed, it will be described below. However, the description here is for illustrative purposes only and is not intended to be limiting.

(實施例1) 準備以1 mol/L之硫酸銅水溶液1 kg中檸檬酸為2.7g之比率混合而成之溶液,作為溶液A。準備以純水1 L中30質量%氫氧化鈉水溶液為369 g、80質量%肼水溶液為37.5 g之比率混合而成之溶液,作為溶液B。準備以純水1 L中30質量%氫氧化鈉水溶液為374 g、80質量%肼水溶液為31.4 g之比率混合而成之溶液,作為溶液C。準備以純水1 L中30質量%氫氧化鈉水溶液為489 g之比率混合而成之溶液,作為溶液D。準備以純水1 L中檸檬酸為200 g之比率混合而成之溶液,作為溶液E。準備以純水1 L中80質量%肼水溶液為76.7 g之比率混合而成之溶液,作為溶液F。 (Example 1) A solution prepared by mixing 1 kg of 1 mol/L copper sulfate aqueous solution with 2.7 g of citric acid was prepared as solution A. A solution prepared by mixing 369 g of 30 mass% sodium hydroxide aqueous solution and 37.5 g of 80 mass% hydrazine aqueous solution in 1 L of pure water was prepared as solution B. A solution prepared by mixing 374 g of 30 mass% sodium hydroxide aqueous solution and 31.4 g of 80 mass% hydrazine aqueous solution in 1 L of pure water was prepared as solution C. A solution prepared by mixing 489 g of 30 mass% sodium hydroxide aqueous solution in 1 L of pure water was prepared as solution D. A solution prepared by mixing 200 g of citric acid in 1 L of pure water was prepared as solution E. Prepare a solution of 76.7 g of 80 mass% hydrazine aqueous solution in 1 L of pure water as solution F.

關於以下之添加比率,只要沒有特別之記述,係記載相對於1 L溶液A之添加比率。 將溶液A放入至反應容器,加溫至50℃,以達到0.66 L之比率之方式添加溶液B。繼而,加溫至70℃,以達到0.24 kg之比率之方式添加溶液C。繼而,以pH值成為10.5之方式添加溶液D,以達到1.5 g之比率之方式添加溶液E作為檸檬酸成分。繼而,以達到0.18 kg之比率之方式添加溶液F,獲得銅漿。藉由對其進行水洗而獲得洗淨後銅漿。 The following addition ratios are described as addition ratios relative to 1 L of solution A unless otherwise specified. Solution A was placed in a reaction vessel, heated to 50°C, and solution B was added at a ratio of 0.66 L. Next, the temperature was raised to 70°C, and solution C was added at a ratio of 0.24 kg. Next, solution D was added so that the pH value became 10.5, and solution E was added as a citric acid component at a ratio of 1.5 g. Next, solution F was added at a ratio of 0.18 kg to obtain copper slurry. The washed copper slurry was obtained by washing it with water.

藉由利用紅外線水分計所進行之水分蒸發量測定,而算出上述洗淨後銅漿中之銅質量%,將聚氧乙烯烷基醚(AE,三洋化成工業股份有限公司製造之EMULMIN NL-70)經稀釋為10質量%而獲得之水溶液作為表面處理劑,添加上述聚氧乙烯烷基醚相對於上述洗淨後銅漿中之銅質量成為1質量%之量,然後進行攪拌,獲得表面處理後銅漿。對上述表面處理後銅漿進行乾燥、氣流破碎、真空乾燥,而獲得銅粉。The mass % of copper in the washed copper slurry is calculated by measuring the amount of water evaporated using an infrared moisture meter. A polyoxyethylene alkyl ether (AE, EMULMIN NL-70 manufactured by Sanyo Chemical Industries, Ltd.) is diluted to 10 mass % to obtain an aqueous solution as a surface treatment agent. The polyoxyethylene alkyl ether is added to the washed copper slurry in an amount of 1 mass % relative to the mass of copper in the washed copper slurry, and then stirred to obtain a surface treated copper slurry. The surface treated copper slurry is dried, air flow crushed, and vacuum dried to obtain copper powder.

(實施例2) 以達到0.65 L之比率之方式添加溶液B,將溶液D替換為30質量%氫氧化鈉水溶液,並以pH值成為10.3之方式進行添加,添加上述聚氧乙烯烷基醚相對於洗淨後銅漿中之銅質量成為0.65質量%之量,除此以外,進行與實施例1相同之操作,而獲得銅粉。 (Example 2) Solution B was added in a ratio of 0.65 L, solution D was replaced with a 30 mass % sodium hydroxide aqueous solution, and the pH value was added in a way that the pH value became 10.3, and the above-mentioned polyoxyethylene alkyl ether was added in an amount of 0.65 mass % relative to the copper mass in the copper slurry after washing. Except for this, the same operation as in Example 1 was performed to obtain copper powder.

(實施例3) 除了添加上述聚氧乙烯烷基醚相對於洗淨後銅漿中之銅質量成為0.14質量%之量以外,進行與實施例2相同之操作,而獲得銅粉。 (Example 3) Except for adding the above-mentioned polyoxyethylene alkyl ether in an amount of 0.14 mass % relative to the copper mass in the copper slurry after washing, the same operation as in Example 2 was performed to obtain copper powder.

(實施例4) 以達到0.67 L之比率之方式添加溶液B,以達到0.25 kg之比率之方式添加溶液C,添加上述聚氧乙烯烷基醚相對於洗淨後銅漿中之銅質量成為0.03質量%之量,除此以外,進行與實施例2相同之操作,而獲得銅粉。 (Example 4) Solution B was added in a ratio of 0.67 L, solution C was added in a ratio of 0.25 kg, and the polyoxyethylene alkyl ether was added in an amount of 0.03 mass % relative to the copper mass in the copper slurry after washing. The same operation as in Example 2 was performed to obtain copper powder.

(實施例5) 除了添加上述聚氧乙烯烷基醚相對於洗淨後銅漿中之銅質量成為0.55質量%之量以外,進行與實施例4相同之操作,而獲得銅粉。 (Example 5) Except for adding the above-mentioned polyoxyethylene alkyl ether in an amount of 0.55 mass % relative to the copper mass in the copper slurry after washing, the same operation as in Example 4 was performed to obtain copper powder.

(實施例6) 於添加溶液D前以pH值成為8.0之方式添加30質量%氫氧化鈉水溶液,以pH值成為10.4之方式添加溶液D,不添加聚氧乙烯烷基醚,除此以外,進行與實施例2相同之操作。於藉此獲得之銅粉,將聚乙二醇200(PEG 200,FUJIFILM Wako Pure Chemical股份有限公司製造)之水溶液作為表面處理劑,添加聚乙二醇200相對於銅質量成為1質量%之量,並進行乾燥、破碎,而獲得銅粉。 (Example 6) Before adding solution D, a 30% by mass sodium hydroxide aqueous solution was added to a pH value of 8.0, and solution D was added to a pH value of 10.4. The same operation as in Example 2 was performed except that polyoxyethylene alkyl ether was not added. To the copper powder thus obtained, an aqueous solution of polyethylene glycol 200 (PEG 200, manufactured by FUJIFILM Wako Pure Chemical Co., Ltd.) was added as a surface treatment agent in an amount of 1% by mass relative to the mass of copper, and the mixture was dried and crushed to obtain copper powder.

(實施例7) 除了將表面處理劑改變為聚乙二醇400(PEG 400,FUJIFILM Wako Pure Chemical股份有限公司製造)以外,進行與實施例6相同之操作,而獲得銅粉。 (Example 7) Except that the surface treatment agent was changed to polyethylene glycol 400 (PEG 400, manufactured by FUJIFILM Wako Pure Chemical Co., Ltd.), the same operation as in Example 6 was performed to obtain copper powder.

(實施例8) 除了將表面處理劑改變為聚乙二醇1000(PEG 1000,FUJIFILM Wako Pure Chemical股份有限公司製造)以外,進行與實施例6相同之操作,而獲得銅粉。 (Example 8) Except that the surface treatment agent was changed to polyethylene glycol 1000 (PEG 1000, manufactured by FUJIFILM Wako Pure Chemical Co., Ltd.), the same operation as in Example 6 was performed to obtain copper powder.

(實施例9) 除了將表面處理劑改變為聚丙二醇400二醇型(PPG 400二醇型,FUJIFILM Wako Pure Chemical股份有限公司製造)以外,進行與實施例6相同之操作,而獲得銅粉。 (Example 9) Except that the surface treatment agent was changed to polypropylene glycol 400 diol type (PPG 400 diol type, manufactured by FUJIFILM Wako Pure Chemical Co., Ltd.), the same operation as in Example 6 was performed to obtain copper powder.

(實施例10) 除了將表面處理劑改變為聚丙二醇700二醇型(PPG 700二醇型,FUJIFILM Wako Pure Chemical股份有限公司製造)以外,進行與實施例6相同之操作,而獲得銅粉。 (Example 10) Except that the surface treatment agent was changed to polypropylene glycol 700 diol type (PPG 700 diol type, manufactured by FUJIFILM Wako Pure Chemical Co., Ltd.), the same operation as in Example 6 was performed to obtain copper powder.

(實施例11) 除了將表面處理劑改變為聚丙二醇1000二醇型(PPG 1000二醇型,FUJIFILM Wako Pure Chemical股份有限公司製造)以外,進行與實施例6相同之操作,而獲得銅粉。 (Example 11) Except that the surface treatment agent was changed to polypropylene glycol 1000 diol type (PPG 1000 diol type, manufactured by FUJIFILM Wako Pure Chemical Co., Ltd.), the same operation as in Example 6 was performed to obtain copper powder.

(實施例12) 除了將表面處理劑改變為甘油(FUJIFILM Wako Pure Chemical股份有限公司製造)以外,進行與實施例6相同之操作,而獲得銅粉。 (Example 12) Except that the surface treatment agent was changed to glycerin (manufactured by FUJIFILM Wako Pure Chemical Co., Ltd.), the same operation as in Example 6 was performed to obtain copper powder.

(比較例1) 除了不添加聚氧乙烯烷基醚作為表面處理劑以外,進行與實施例1相同之操作,而獲得銅粉。 (Comparative Example 1) Except for not adding polyoxyethylene alkyl ether as a surface treatment agent, the same operation as Example 1 was performed to obtain copper powder.

(比較例2) 關於比較例2中之添加比率,係記載相對於氧化亞銅1 kg之添加比率。 將氧化亞銅與純水混合,準備15.8質量%之氧化亞銅漿,以成為阿拉伯膠為6 g之比率之方式添加0.016質量%之阿拉伯膠水溶液。於其中以達到1.8 kg之比率之方式添加32質量%硫酸。其後,以成為阿拉伯膠為4 g之比率之方式添加0.016質量%之阿拉伯膠水溶液,獲得銅漿。藉由對其進行水洗而獲得洗淨後銅漿。對該洗淨後銅漿進行乾燥、氣流破碎、真空乾燥,而獲得銅粉。 (Comparative Example 2) The addition ratio in Comparative Example 2 is the addition ratio relative to 1 kg of cuprous oxide. Cuprous oxide is mixed with pure water to prepare 15.8 mass% cuprous oxide slurry, and 0.016 mass% of an aqueous gum arabic solution is added in a ratio of 6 g of gum arabic. 32 mass% sulfuric acid is added thereto in a ratio of 1.8 kg. Thereafter, 0.016 mass% of an aqueous gum arabic solution is added in a ratio of 4 g of gum arabic to obtain copper slurry. Washed copper slurry is obtained by washing it with water. The washed copper slurry is dried, air flow crushed, and vacuum dried to obtain copper powder.

(比較例3) 準備於比較例2之製造條件下所合成之銅粉,將聚氧乙烯烷基醚(AE,三洋化成工業股份有限公司製造之EMULMIN NL-70)之水溶液作為表面處理劑,添加上述聚氧乙烯烷基醚相對於銅質量成為1質量%之量於該銅粉,並進行乾燥、破碎,而獲得銅粉。 (Comparative Example 3) Prepare the copper powder synthesized under the manufacturing conditions of Comparative Example 2, use an aqueous solution of polyoxyethylene alkyl ether (AE, EMULMIN NL-70 manufactured by Sanyo Chemical Industries, Ltd.) as a surface treatment agent, add the polyoxyethylene alkyl ether to the copper powder in an amount of 1 mass % relative to the mass of copper, and dry and crush to obtain copper powder.

(比較例4) 變更比較例1中之原料之比率,而獲得BET比表面積較比較例1之銅粉大的銅粉。 (Comparative Example 4) The ratio of the raw materials in Comparative Example 1 was changed to obtain a copper powder having a larger BET specific surface area than the copper powder in Comparative Example 1.

(有機物之鑑定) 作為一例,藉由上述紅外光譜法對實施例5之銅粉進行分析,結果觀測到2900 cm -1附近(來自飽和烴)、1600 cm -1附近(來自羧酸、羧酸鹽)、1100 cm -1附近(來自醚鍵)之波峰。根據該結果可知,實施例5之銅粉含有通式(1)或通式(2)所記載之聚醚(來自其之烴及醚鍵)、及羧酸或羧酸鹽。 (Identification of organic matter) As an example, the copper powder of Example 5 was analyzed by the above-mentioned infrared spectroscopy method, and peaks were observed near 2900 cm -1 (from saturated hydrocarbons), near 1600 cm -1 (from carboxylic acids and carboxylic acid salts), and near 1100 cm -1 (from ether bonds). According to the results, the copper powder of Example 5 contains the polyether described by the general formula (1) or the general formula (2) (from its hydrocarbons and ether bonds), and carboxylic acids or carboxylic acid salts.

又,作為一例,藉由上述質譜法對實施例5之銅粉進行分析,結果,於正離子檢測模式下,m/z值為自275.2579至1040.7299,以44為刻度檢測出m/z值。m/z值556.4418時強度最大,其與對相當於通式(1)之n=8的化學式加成了銨離子之[C 28H 58O 9+NH 4] +之單一同位素質量(Monoisotopic mass)即556.4425大致一致。又,於負離子檢測模式下,檢測出m/z值191.0196。其與質子自相當於檸檬酸之化學式脫離之[C 6H 8O 7-H] -之單一同位素質量即191.0192大致一致。根據該結果可知,實施例5之銅粉含有通式(1)所表示之化合物及檸檬酸。 As an example, the copper powder of Example 5 was analyzed by the mass spectrometry method. As a result, in the positive ion detection mode, the m/z value ranged from 275.2579 to 1040.7299, and the m/z value was detected at a scale of 44. The intensity was the highest when the m/z value was 556.4418, which was roughly consistent with the monoisotopic mass (monoisotopic mass) of [C 28 H 58 O 9 +NH 4 ] + to which ammonium ions were added to the chemical formula corresponding to n=8 of the general formula (1), which was 556.4425. In addition, in the negative ion detection mode, the m/z value was detected to be 191.0196. This is roughly consistent with the single isotopic mass of [C 6 H 8 O 7 -H] -, which is 191.0192, when a proton is released from the chemical formula equivalent to citric acid. From this result, it can be seen that the copper powder of Example 5 contains the compound represented by the general formula (1) and citric acid.

(比表面積) 藉由上述方法測定實施例1~12及比較例1~4中所獲得之各銅粉之BET比表面積。將其結果示於表1及表2。 (Specific surface area) The BET specific surface area of each copper powder obtained in Examples 1 to 12 and Comparative Examples 1 to 4 was measured by the above method. The results are shown in Tables 1 and 2.

(SEM圖像) 將實施例1、2及4以及比較例1及2中所獲得之各銅粉之掃描電子顯微鏡圖像(SEM圖像)分別示於圖1~5。 (SEM image) The scanning electron microscope images (SEM images) of each copper powder obtained in Examples 1, 2 and 4 and Comparative Examples 1 and 2 are shown in Figures 1 to 5, respectively.

若將實施例1、2及4以及比較例1及2之各銅粉之表1中所示之BET比表面積與圖1~5進行比較,則可知BET比表面積取決於粒子尺寸。表1中將BET比表面積設為「1~10」之實施例6~12及比較例3之銅粉雖未進行BET比表面積之測定,但由於粒子尺寸由生成銅粒子之步驟決定,故以與實施例2同樣方式生成了銅粒子之實施例6~12之銅粉、及以與比較例2同樣方式生成了銅粒子之比較例3之銅粉,其BET比表面積極有可能在1 m 2/g~10 m 2/g之範圍內。 If the BET specific surface areas of the copper powders of Examples 1, 2 and 4 and Comparative Examples 1 and 2 shown in Table 1 are compared with Figures 1 to 5, it can be seen that the BET specific surface area depends on the particle size. Although the BET specific surface areas of the copper powders of Examples 6 to 12 and Comparative Example 3, which have BET specific surface areas of "1 to 10" in Table 1, have not been measured, since the particle size is determined by the step of generating copper particles, the copper powders of Examples 6 to 12, which generated copper particles in the same manner as Example 2, and the copper powder of Comparative Example 3, which generated copper particles in the same manner as Comparative Example 2, may have BET specific surface areas in the range of 1 m 2 /g to 10 m 2 /g.

又,若將圖1及4與圖5進行比較,則可知實施例1及比較例1之由檸檬酸被覆之各銅粉(圖1及4)相較於比較例2之未經檸檬酸被覆之銅粉(圖5),粒子間之頸縮減少,各個粒子接近真球。由此認為由檸檬酸被覆之銅粉在膏中之分散性得到提升。Furthermore, if Figures 1 and 4 are compared with Figure 5, it can be seen that the copper powders coated with citric acid in Example 1 and Comparative Example 1 (Figures 1 and 4) have less necking between particles than the copper powders not coated with citric acid in Comparative Example 2 (Figure 5), and each particle is closer to a true sphere. It is believed that the dispersibility of the copper powders coated with citric acid in the paste is improved.

(碳含量) 藉由上述方法,測定實施例1~12及比較例1~4中所獲得之各銅粉之碳含量。將其結果示於表1及表2。 (Carbon content) The carbon content of each copper powder obtained in Examples 1 to 12 and Comparative Examples 1 to 4 was measured by the above method. The results are shown in Tables 1 and 2.

(低溫燒結性) 對於實施例1~12及比較例1~4中所獲得之各銅粉,藉由上述方法來確認於非活性氣體中之燒結起始溫度後,結果如表1所示。 (Low-temperature sintering properties) For each copper powder obtained in Examples 1 to 12 and Comparative Examples 1 to 4, the sintering starting temperature in an inert gas was confirmed by the above method, and the results are shown in Table 1.

自表1可知,實施例1~12之銅粉含有低分子有機物、與聚醚及/或多元醇兩者,因此與比較例1~4之銅粉相比,燒結起始溫度變低。As can be seen from Table 1, the copper powders of Examples 1 to 12 contain both low molecular weight organic matter and polyether and/or polyol, and therefore have lower sintering starting temperatures than the copper powders of Comparative Examples 1 to 4.

(銅粉膏之製備) 對於實施例3及比較例4各者之銅粉,製作銅粉膏。具體而言,將α-萜品醇(80.5 g)、油酸(6.5 g)、及乙基纖維素(49%乙氧基)10(13.0 g)用自轉公轉混合機進行混合,將其作為媒液。其後,將銅粉(8.0 g)及媒液(2.0 g)用自轉公轉混合機進行混合,而獲得銅粉膏。 (Preparation of copper powder paste) For the copper powder of each of Example 3 and Comparative Example 4, a copper powder paste was prepared. Specifically, α-terpineol (80.5 g), oleic acid (6.5 g), and ethyl cellulose (49% ethoxy) 10 (13.0 g) were mixed with a rotary mixer and used as a medium. Thereafter, copper powder (8.0 g) and the medium (2.0 g) were mixed with a rotary mixer to obtain a copper powder paste.

(膏之黏度) 藉由以下方法測定所製作之銅粉膏之黏度。關於銅粉膏之黏度,係使用Anton Paar公司製造之旋轉式黏度計MCR102進行。將銅粉膏置於將設定溫度設為25℃之恆溫板,使用圓錐角2°之錐板(型號:CP25-2)作為測定治具,測定位置之間隙設定設為1 mm,將錐板壓抵於銅粉膏,其後,去除自錐板溢出之銅粉膏。測定程序係歷時392秒之時間,自剪切速率0緩慢提高至1000 s -1。藉此,測定各剪切速率下之膏黏度。將剪切速率1 s -1時之銅粉膏之黏度示於表2。 (Viscosity of the paste) The viscosity of the prepared copper powder paste was measured by the following method. The viscosity of the copper powder paste was measured using a rotational viscometer MCR102 manufactured by Anton Paar. The copper powder paste was placed on a constant temperature plate set at 25°C, and a cone plate with a cone angle of 2° (model: CP25-2) was used as a measuring fixture. The gap at the measuring position was set to 1 mm, and the cone plate was pressed against the copper powder paste. Thereafter, the copper powder paste overflowing from the cone plate was removed. The measurement procedure lasted 392 seconds, and the shear rate was slowly increased from 0 to 1000 s -1 . In this way, the viscosity of the paste at each shear rate was measured. The viscosity of the copper powder paste at a shear rate of 1 s -1 is shown in Table 2.

自表2可知,實施例3之銅粉與比較例4之銅粉之區別在於是否添加有聚氧乙烯烷基醚,兩者之BET比表面積相等。 使用添加有聚氧乙烯烷基醚之實施例3之銅粉所得到的銅粉膏之黏度,低於使用未添加有聚氧乙烯烷基醚之比較例4之銅粉所得到的銅粉膏之黏度。 As can be seen from Table 2, the difference between the copper powder of Example 3 and the copper powder of Comparative Example 4 is whether polyoxyethylene alkyl ether is added, and the BET specific surface areas of the two are equal. The viscosity of the copper powder paste obtained by using the copper powder of Example 3 added with polyoxyethylene alkyl ether is lower than the viscosity of the copper powder paste obtained by using the copper powder of Comparative Example 4 without adding polyoxyethylene alkyl ether.

銅粉膏之黏度,係銅粉於膏中越分散,則越低。因此,可稱實施例3之銅粉在膏中之分散性高於比較例4之銅粉。作為其原因,發明人認為藉由將含有疏水性烷基鏈之聚氧乙烯烷基醚添加至銅粉,使得同為疏水性之媒液與銅粉之相容性變高,銅粉在膏中之分散性獲得提高。The viscosity of the copper powder paste is lower as the copper powder is more dispersed in the paste. Therefore, it can be said that the copper powder of Example 3 has a higher dispersibility in the paste than the copper powder of Comparative Example 4. As the reason for this, the inventors believe that by adding polyoxyethylene alkyl ether containing a hydrophobic alkyl chain to the copper powder, the compatibility of the hydrophobic medium and the copper powder is increased, and the dispersibility of the copper powder in the paste is improved.

[表1] 銅粒子 製法 低分子 有機物 聚醚/多元醇 BET比表面積 [m 2/g] C [wt%] 燒結起始溫度 [℃] 實施例1 化學 還原法 檸檬酸 AE (聚醚、通式(1)) 2.1 0.46 277 實施例2 化學 還原法 檸檬酸 AE (聚醚、通式(1)) 4.3 0.47 236 實施例3 化學 還原法 檸檬酸 AE (聚醚、通式(1)) 4.8 0.22 257 實施例4 化學 還原法 檸檬酸 AE (聚醚、通式(1)) 4.8 0.19 289 實施例5 化學 還原法 檸檬酸 AE (聚醚、通式(1)) 4 0.47 235 實施例6 化學 還原法 檸檬酸 PEG200 (聚醚、通式(1)) 1~10 0.41 241 實施例7 化學 還原法 檸檬酸 PEG 400 (聚醚、通式(1)) 1~10 0.64 247 實施例8 化學 還原法 檸檬酸 PEG 1000 (聚醚、通式(1)) 1~10 0.66 239 實施例9 化學 還原法 檸檬酸 PPG 400二醇型 (聚醚、通式(2)) 1~10 0.66 274 實施例10 化學 還原法 檸檬酸 PPG 700二醇型 (聚醚、通式(2)) 1~10 0.67 270 實施例11 化學 還原法 檸檬酸 PPG 1000二醇型 (聚醚、通式(2)) 1~10 0.66 269 實施例12 化學 還原法 檸檬酸 甘油 (多元醇) 1~10 0.43 245 比較例1 化學 還原法 檸檬酸 - 1.8 0.05 398 比較例2 歧化法 阿拉伯膠 - 2.9 0.26 376 比較例3 歧化法 阿拉伯膠 AE (聚醚、通式(1)) 1~10 未測定 327 比較例4 化學 還原法 檸檬酸 - 4.8 0.12 344 [Table 1] Copper particle preparation method Low molecular weight organic matter Polyether polyol BET specific surface area [m 2 /g] C [wt%] Sintering starting temperature [℃] Embodiment 1 Chemical reduction method Citric Acid AE (polyether, general formula (1)) 2.1 0.46 277 Embodiment 2 Chemical reduction method Citric Acid AE (polyether, general formula (1)) 4.3 0.47 236 Embodiment 3 Chemical reduction method Citric Acid AE (polyether, general formula (1)) 4.8 0.22 257 Embodiment 4 Chemical reduction method Citric Acid AE (polyether, general formula (1)) 4.8 0.19 289 Embodiment 5 Chemical reduction method Citric Acid AE (polyether, general formula (1)) 4 0.47 235 Embodiment 6 Chemical reduction method Citric Acid PEG200 (polyether, general formula (1)) 1~10 0.41 241 Embodiment 7 Chemical reduction method Citric Acid PEG 400 (polyether, general formula (1)) 1~10 0.64 247 Embodiment 8 Chemical reduction method Citric Acid PEG 1000 (polyether, general formula (1)) 1~10 0.66 239 Embodiment 9 Chemical reduction method Citric Acid PPG 400 diol type (polyether, general formula (2)) 1~10 0.66 274 Embodiment 10 Chemical reduction method Citric Acid PPG 700 diol type (polyether, general formula (2)) 1~10 0.67 270 Embodiment 11 Chemical reduction method Citric Acid PPG 1000 diol type (polyether, general formula (2)) 1~10 0.66 269 Embodiment 12 Chemical reduction method Citric Acid Glycerin (polyol) 1~10 0.43 245 Comparison Example 1 Chemical reduction method Citric Acid - 1.8 0.05 398 Comparison Example 2 Disproportionation Gum Arabic - 2.9 0.26 376 Comparison Example 3 Disproportionation Gum Arabic AE (polyether, general formula (1)) 1~10 Not determined 327 Comparison Example 4 Chemical reduction method Citric Acid - 4.8 0.12 344

[表2] 銅粒子 製法 低分子 有機物 聚醚/多元醇 BET比表面積 [m 2/g] C [wt%] 燒結起始溫度 [℃] 膏黏度 [Pa・s] 實施例3 化學 還原法 檸檬酸 AE (聚醚、通式(1)) 4.8 0.22 257 1025 比較例4 化學 還原法 檸檬酸 - 4.8 0.12 344 1272 [Table 2] Copper particle preparation method Low molecular weight organic matter Polyether polyol BET specific surface area [m 2 /g] C [wt%] Sintering starting temperature [℃] Paste viscosity [Pa・s] Embodiment 3 Chemical reduction method Citric Acid AE (polyether, general formula (1)) 4.8 0.22 257 1025 Comparison Example 4 Chemical reduction method Citric Acid - 4.8 0.12 344 1272

根據以上內容,提示了上述銅粉具有優異之低溫燒結性之可能性。Based on the above content, it is suggested that the copper powder has the possibility of excellent low-temperature sintering properties.

without

[圖1]係實施例1中所獲得之銅粉之SEM圖像。 [圖2]係實施例2中所獲得之銅粉之SEM圖像。 [圖3]係實施例4中所獲得之銅粉之SEM圖像。 [圖4]係比較例1中所獲得之銅粉之SEM圖像。 [圖5]係比較例2中所獲得之銅粉之SEM圖像。 [Figure 1] is a SEM image of the copper powder obtained in Example 1. [Figure 2] is a SEM image of the copper powder obtained in Example 2. [Figure 3] is a SEM image of the copper powder obtained in Example 4. [Figure 4] is a SEM image of the copper powder obtained in Comparative Example 1. [Figure 5] is a SEM image of the copper powder obtained in Comparative Example 2.

Claims (8)

一種銅粉,其BET比表面積為1.0 m 2/g~10.0 m 2/g,含有分子量為500以下之有機物、與聚醚及/或多元醇。 A copper powder has a BET specific surface area of 1.0 m 2 /g to 10.0 m 2 /g and contains an organic substance with a molecular weight of 500 or less, and a polyether and/or a polyol. 如請求項1之銅粉,其含有下述通式(1)所表示之化合物、及/或下述通式(2)所表示之化合物作為該聚醚, RO(C 2H 4O) nH   (1) (通式(1)中,R為H、或者C4~18之飽和或不飽和烴,n為2~30之整數) RO(C 3H 6O) nH   (2) (通式(2)中,R為H、或者C4~18之飽和或不飽和烴,n為2~30之整數)。 The copper powder of claim 1 contains a compound represented by the following general formula (1) and/or a compound represented by the following general formula (2) as the polyether: RO(C 2 H 4 O) n H (1) (in the general formula (1), R is H or a saturated or unsaturated hydrocarbon of C4 to 18, and n is an integer of 2 to 30) RO(C 3 H 6 O) n H (2) (in the general formula (2), R is H or a saturated or unsaturated hydrocarbon of C4 to 18, and n is an integer of 2 to 30). 如請求項1或2之銅粉,其中,該分子量為500以下之有機物包含選自由羧酸、羧酸鹽、葡萄糖、麥芽糖、蔗糖及乳糖所組成之群中之至少1種。The copper powder of claim 1 or 2, wherein the organic substance with a molecular weight of 500 or less comprises at least one selected from the group consisting of carboxylic acid, carboxylic acid salt, glucose, maltose, sucrose and lactose. 如請求項1或2之銅粉,其中,該分子量為500以下之有機物含有檸檬酸及/或檸檬酸鹽。The copper powder of claim 1 or 2, wherein the organic substance with a molecular weight of 500 or less contains citric acid and/or citrate. 如請求項1或2之銅粉,其含有具有烷基鏈之該聚醚。The copper powder of claim 1 or 2, which contains the polyether having an alkyl chain. 如請求項1或2之銅粉,其含有甘油作為該多元醇。The copper powder of claim 1 or 2, comprising glycerol as the polyol. 如請求項1或2之銅粉,其碳含量為0.15質量%~1.00質量%。The copper powder of claim 1 or 2 has a carbon content of 0.15 mass % to 1.00 mass %. 如請求項1或2之銅粉,其於非活性氣體中之燒結起始溫度為300℃以下。The copper powder of claim 1 or 2 has a sintering starting temperature of 300°C or less in an inert gas.
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