TW202423553A - Device and system for delivering a stream of liquid and apparatus and method for non-immersive wet-chemical treatment of a planar substrate - Google Patents

Abstract

A device for delivering a stream of liquid for wetting a surface of a vertically-held planar substrate (1) comprises a vessel (5) for holding liquid. The vessel (5) is provided with at least one discharge passage through a side wall of the vessel (5), each defining a respective inflow aperture open to an interior (37) of the vessel (5). The device is provided with at least one orifice (17;40) in an exterior of the device, for delivering liquid passing through at least one of the discharge passages as the stream. The device is provided with at least one delivery port opening into the interior (37) of the vessel (5) and in liquid communication with at least one connection device (21;62) for connecting the device to a supply conduit (61) for supplying liquid to the device. At least one overflow opens into the interior (37) of the vessel (5) at a level between the at least one discharge passage inflow apertures and a highest level of the vessel interior (37), for conducting liquid out of the vessel interior (37).

Description

Device and system for delivering liquid stream and apparatus and method for non-immersion wet chemical treatment of planar substrates

The present invention relates to a device for delivering a liquid stream to moisten a surface of a vertically held planar substrate, the device comprising a container for storing liquid, wherein the container is provided with at least one discharge channel passing through a side wall of the container, each discharge channel defining a respective inflow opening opening into an interior of the container, wherein the device is provided with at least one hole in an exterior of the device, the at least one hole being used to deliver liquid passing through at least one of the discharge channels as the stream, and wherein the device is provided with at least one delivery port, the at least one delivery port opening into the interior of the container and being in liquid communication with at least one connecting device, the at least one connecting device being used to connect the device to a supply conduit for supplying liquid to the device.

The present invention also relates to a system for delivering a liquid stream to moisten a surface of a vertically held planar substrate, comprising: at least one overflow device, wherein each overflow device comprises a container for storing liquid, wherein the container is provided with at least one discharge channel passing through a side wall of the container, each discharge channel defining a respective inlet opening opening into an interior of the container, the overflow device is provided with at least one hole in an exterior of the device, the at least one hole being used to deliver liquid passing through at least one of the discharge channels as the stream; and a liquid supply system for supplying liquid to the interior of the container of each overflow device.

The present invention also relates to an apparatus for immersion wet chemical processing of a planar substrate.

The present invention also relates to a method of making a device for delivering a liquid stream to wet a surface of a vertically held planar substrate.

The present invention also relates to a method for wetting a surface of a vertically held planar substrate.

US 10,513,779 B2 discloses a surface treatment system. A substrate is pinched and held at an upper end by a clamp of a suspension. In one embodiment, a pipeline as a treatment solution release section is arranged on both sides of the substrate held by the suspension. Each pipeline has a hole so that a treatment solution can be discharged upward at an angle. The discharged treatment solution flows downward over the surface of the substrate and reaches the bottom, and is circulated and discharged from the pipeline again by a pump. In an alternative embodiment, the treatment solution is discharged downward at an angle from a slope. The treatment solution pumped up by the pump is stored in a storage tank. When the liquid level is higher than the edge of the slope, the treatment solution overflows onto the slope. The processing solution that has overflowed onto the ramp contacts the processing solution receiving member of the suspension and flows down onto the substrate. One problem with this system is that the ramp must extend very close to a lower edge of the processing solution receiving member of the suspension. This means that great care must be taken to avoid contact between the suspension and the fixed part of the processing section.

US 9,359,676 B2 discloses an electrodeless copper plating tank, which includes a tank body mounted on a frame and a circulation pump for circulating a treatment solution accumulated on the bottom of the tank by supplying the treatment solution to a liquid spraying part. The treatment solution is sprayed upward from a spray port of the liquid spraying part toward a plate-like workpiece at an angle relative to a horizontal plane. Therefore, the treatment solution adheres to the upper side of the plate-like workpiece, and the plate-like workpiece is clamped by a transport suspension inside the tank body. The liquid spraying part is composed of a circular pipe as a pipe member having an internal space. Its two sides in the longitudinal direction are sealed. The spray port includes a plurality of holes arranged at predetermined intervals along a longitudinal direction. In addition, a flexible pipe and a piping system are connected to the liquid spraying part. The flexible pipe and the piping system penetrate a side wall of the tank body. A spray angle of the spray port is set to be inclined upward relative to the horizontal plane. Therefore, a liquid flow of the processing solution sprayed from the spray port moves into a parabolic path. The jet flow velocity of the processing solution depends on the pressure from the pump and the size of the spray port. One problem is that since the pressure from the pump is difficult to accurately control and the pipeline will generate a back pressure, the flow rate and thereby the contact angle between the liquid flow and the workpiece surface are difficult to control. Almost inevitably, the flow will hit the workpiece surface relatively hard, creating turbulence that extends down over the surface and results in an uneven surface preparation.

It is an object of the present invention to provide a device, a system and a method of the type mentioned above in the opening paragraph which allow a liquid stream to impinge on a substrate surface or an adjacent surface of a device holding the substrate from a reasonable distance and at a relatively well-controlled angle.

According to a first aspect, the present object is achieved by a device according to the present invention, characterized in that at least one overflow port opens into the interior of the container at a liquid level between at least one discharge channel inflow orifice and a maximum liquid level inside the container, for example, at least one overflow port opens into the interior of the container at a liquid level between at least one discharge channel inflow orifice and a maximum liquid level inside the container to conduct liquid out of the interior of the container.

The device comprises a container for storing a liquid. In use, the liquid is present in the interior, which is generally delimited by at least one bottom wall and a side wall. It is therefore possible to determine a liquid level, i.e. a liquid level relative to the bottom wall. The container may be covered or closed at the top. The interior of the container may be ventilated. The container is provided with at least one discharge channel passing through a side wall of the container. For example, the discharge channel may be a simple orifice or defined by a conduit extending through the side wall. In use, the or each discharge channel defines a respective inflow opening open to an interior of the container, through which liquid can flow from the interior of the container into the discharge channel.

The device is provided with at least one hole in an exterior of the device. This hole may be defined by the discharge channel, wherein the discharge channel terminates at an end opposite the inflow orifice. In other embodiments, the discharge channel is only in communication with the hole, for example via an intermediate flow conducting portion. The flow is a free-flowing flow. That is, the flow is not guided from the point at which the flow leaves the orifice.

The device is provided with at least one delivery port, which opens into the interior of the container and is in fluid communication with at least one connection device, which connects the device to a supply conduit for supplying liquid to the device. For example, the connection device can be a fitting, or a hose or pipe end that can be connected to a fitting. The liquid is generally pumped into the device by a pump external to the device.

The device comprises at least one overflow port, which opens into the interior of the container at a level between at least one discharge channel inflow orifice and a maximum liquid level inside the container, for example, at least one overflow port opens into the interior of the container at a level between at least one discharge channel inflow orifice and a maximum liquid level inside the container. This overflow port or these overflow ports are configured to conduct liquid out of the container, more specifically out of the container interior. By supplying liquid at a sufficient rate, the liquid level of the liquid in the container is maintained and determined by the liquid level of the overflow or at least the overflow at the minimum liquid level. Because this liquid level is lower than a maximum liquid level inside the container, there is a free surface of the liquid inside the container. The pressure at which the liquid flows through one or more discharge channels and then flows through the hole is the static pressure of the fluid. When a spray rod is used, there is no back pressure. The pressure at which the liquid is supplied is irrelevant. The liquid flow is gravity driven. According to Torricelli’s law, the flow emerges from the orifice at a substantially constant rate, the rate being determined solely by the level of the liquid inside the container (neglecting viscosity and streamline contraction). The direction in which the opening is pointed is irrelevant, nor is the density of the liquid. There is no need to control a pump supplying liquid to the device to maintain a constant pressure.

The flow emerges from the hole as a jet along a parabolic path. Thus, when on a downward trajectory, the flow will impinge on the substrate or a portion of an adjacent substrate. This reduces the amount of turbulence in the flow travelling along the surface of the substrate. Furthermore, because the speed and direction are constant, it is possible to optimise the size of the portion of the substrate or substrate holder on which the liquid flow impinges and the distance between that region and the hole to ensure that a balanced film flow is always established over the substrate.

Because the level of the free liquid surface in the interior of the container is determined by the overflow position(s), there is no need to control the liquid level by means of sensors and a controller configured to control the supply of liquid. This makes the device relatively robust, useful in applications where the process liquid is relatively aggressive. In addition, a supply pump can be run at substantially a single operating point, rather than operating intermittently.

In one embodiment of the device, the hole is formed by a slit.

Thus, the liquid stream will be sheet-like or film-like. The liquid may impinge on the substrate or substrate holding device and flow down a major surface of the substrate in a film that is relatively uniform over the width of the planar substrate. The film has substantially uniform thickness and velocity across the width of the substrate. In addition, a slit has a relatively small height so that the velocity is substantially constant over the height of the hole. The hole is formed where the slit emerges from an external surface of the device.

In an example of any of the embodiments, wherein the hole is formed by a slit, the slit has a height, a width and a depth as viewed from an exterior of the device, and the width decreases as the depth from the hole increases in the direction of the container.

Thus, to an observer moving through the slit in the direction of the container, the slit appears to have a reduced lateral dimension, i.e. a reduced width. An effect is to produce a sheet or film-like liquid stream emanating from the hole as a jet that does not shrink laterally. This increases the uniformity of the flow of the liquid stream.

In an example of any embodiment, wherein the hole is formed by a slit, the slit has a height, a width and a depth as viewed from the outside of the device, and at least a section of the slit extending from the hole has a uniform height, and a ratio of a width of the entire section having a uniform height to the height has a value between 5 and 15, for example between 9 and 11.

For example, the value of the ratio may be about 10. It has been found that this ratio results in a relatively stable sheet-like liquid flow, particularly for liquid types commonly used in electrochemical processes such as electroplating.

In one example of any of the embodiments, wherein the hole is formed by a slit, the discharge passage includes a section between the slit and the inlet opening, the section expanding outwardly toward the interior of the container in a height direction.

Here, the height specifies the distance between the lowest surface and the highest surface of the discharge channel. Thus, the height increases towards the interior of the container. An effect is that constriction of the liquid flow at the inlet of the discharge channel is largely avoided. The pressure drop across the discharge channel is also minimized. In use, a stable and uniform sheet of liquid flow is thereby obtained. In this embodiment, the slit may have a uniform height.

In one embodiment of the device, the device includes a body formed integrally and having a cavity formed therein, and the cavity at least partially defines the interior of the container.

The body can be obtained by molding, machining or a combination thereof. In this embodiment, the effort required to seal the interior of the container is reduced. The dimensions can also have a smaller tolerance range. It is observed that the term cavity does not imply a completely closed hollow interior.

In one example of any of the embodiments, wherein the hole is formed by a slit and the device includes a body made in one piece and having a cavity formed therein, wherein the cavity at least partially defines the interior of the container, the device includes at least a first shielding portion, the first shielding portion is different from the body and is mounted to an exterior of the body, and the slit is defined between the first shielding portion and one of a protrusion of the container and a second shielding portion mounted to the exterior of the body.

In this embodiment, the body may be relatively large and the dimensions of the slit may be set relatively accurately.

In a specific example of this embodiment, wherein the hole is formed by a slit and the device includes a body made in one piece and having a cavity formed therein, wherein the cavity at least partially defines the interior of the container, the device includes at least a first shielding portion, which is different from the body and is mounted to an exterior of the body, and the slit is defined between the first shielding portion and one of a protrusion of the container and a second shielding portion mounted to the exterior of the body, and at least the first shielding portion at least partially closes the cavity.

Thus, the first shielding part forms a part of a wall of the device, for example a side wall. In particular, the first shielding part may delimit at least the interior of the container. In case the slit is defined between the first shielding part and a second shielding part which is different from the body and mounted to the exterior of the body, the second shielding part may also partially close the cavity. The first shielding part and the second shielding part may together close the cavity except for the discharge channel defined by the first shielding part and the second shielding part together and any port defined in the body as appropriate. This embodiment may be implemented with relatively few parts.

In one embodiment of the device, at least one of the overflow openings extends above a peak of a barrier separating the interior of the container from a space for receiving liquid leading from the interior of the container through the overflow opening.

Thus, a weir is formed inside the device that determines the level of the liquid inside the container. In use, the liquid level can be maintained slightly above the level of the peak, so that the inside of the container is constantly overflowing. In use, the overflowing liquid is collected in the space and is led out of the device from there. For example, there may be a port open to the space for receiving liquid. This port can be connected or can be connected to a conduit. Compared with an open container that simply overflows, this embodiment allows the liquid to be better separated from the environment of the device.

In one example of any embodiment of the device, at least one of the overflow ports extends above a peak of a barrier to separate the interior of the container from a space for receiving liquid conducted from the interior of the container through the overflow port, and the device includes a body made in one piece and having a cavity formed therein, wherein the cavity at least partially defines the interior of the container and the space for receiving the liquid conducted from the interior of the container through the overflow port.

The barrier may be separate from the body or integrated into the body. This embodiment requires relatively few parts, in particular also the need to seal the interior of the container and the space for receiving the liquid via the overflow. If there are two or more such spaces and associated overflows, each of the spaces may be at least partially defined by the body.

In one example of any embodiment, wherein at least one of the overflow ports extends above a peak of a barrier to separate the interior of the container from a space for receiving liquid conducted from the interior of the container through the overflow port, at least the interior of the container has an elongated shape as viewed from above, and a respective overflow port extending above a peak of a barrier to separate the interior of the container from a respective space for receiving liquid conducted from the interior of the container through the overflow port is arranged on either side of the interior of the container in the longitudinal direction.

In this embodiment, a relatively large volume flow rate of the overflowing liquid can be set. Moreover, due to the symmetrical configuration, a relatively uniform flow of the liquid inside the container is achieved. This is particularly useful in the case where the hole is formed by a slit aligned in the longitudinal direction.

In one embodiment of the device, the exhaust channels are greater than one in number.

One effect is that the side wall sections through which the discharge channels extend remain relatively strong compared to providing a discharge channel with a large width and/or cross-sectional area. The individual inlet openings may be arranged in a row, for example a row at a generally constant liquid level. The inlet openings and/or the discharge channels may have corresponding shapes and sizes. In a particular example, the interior of the container has a polygonal shape, such as a quadrilateral shape, viewed from the top, and the inlet openings are configured as a row extending over a large portion of a dimension of one side. The spacing between the openings (in the direction in which the row extends) may be smaller than the corresponding dimension of the inlet openings (i.e. the dimension in the same direction). All of this helps to reduce the effect of streamline contraction so that the velocity of the liquid outflow is more accurately determined by only the level of the liquid in the container.

In one example of an embodiment, wherein the exhaust channels are greater than one in number and the hole is formed by a slit, the exhaust channels define respective outlet openings at ends of the exhaust channels opposite to the respective inlet openings, and the device includes a channel extending parallel to the slit and in liquid communication with the slit, the outlet openings opening into the channel.

The channel helps to equalize the flow so that the liquid flow has a relatively uniform velocity across the width of the slit.

In one example of any embodiment, wherein the hole is formed by a slit, the exhaust channels define respective outlet openings at ends of the channels opposite the respective inlet openings, the device includes at least a first shielding portion that is different from the container and is mounted to an exterior of the container in front of the outlet openings, and the slit is defined between the first shielding portion and one of a second shielding portion mounted to the exterior of the container and a protrusion of the container.

A goal is to provide the flow as a relatively thin liquid sheet or film. Therefore, the slit should have a relatively small height. For uniformity, the height should be relatively well defined over the entire width of the slit. This can be achieved by defining the slit between a first shielding portion mounted to an exterior of the container and a second shielding portion or an integrally protruding portion of the container. The height can be set with the aid of a gauge having a size corresponding to the expected height of the slit. The first shielding portion is placed against the gauge and then secured to the container. Subsequently, the gauge is removed to open the slit. This requires a good quality surface on the first shielding part and the corresponding part (second shielding part or protruding part), but is more easily achieved than when the slit is machined in a solid part. It is also easier to provide a hole with a relatively sharp edge to ensure that the liquid stream flows along a parabolic trajectory.

In one example of any embodiment, wherein the number of the exhaust channels is greater than 1, the hole is formed by a slit, the exhaust channels define respective outlet openings at the ends of the exhaust channels opposite the respective inlet openings, the device includes a channel extending parallel to the slit and in liquid communication with the slit, the outlet openings open into the channel, the device includes at least one first shielding portion, the first shielding portion is different from the container and is mounted to an exterior of the container in front of the outlet openings, and the slit is defined between the first shielding portion and one of a second shielding portion mounted to the exterior of the container and a protrusion of the container, and the channel is formed between the exterior of the container and at least the first shielding portion.

This allows relatively easy manufacturing, since the channel can be defined by, for example, a groove in the container exterior and/or a chamfer on the first shielding portion and/or the second shielding portion. In other words, the channel sidewalls can be machined on an exposed external surface of a component of the device and then closed by assembling the components.

In an example of any of the embodiments, wherein the hole is formed by a slit, the slit has a height, a width and a depth as viewed from an exterior of the device, and the width decreases with increasing depth from the hole in the direction of the container.

Thus, to an observer moving through the slit in the direction of the container, the slit appears to have a decreasing transverse dimension, i.e. a decreasing width. An effect is to produce a sheet or film-like liquid stream emanating from the hole as a jet that does not contract laterally. This increases the uniformity of the flow of the liquid stream.

In one embodiment, the at least one overflow comprises at least one overflow port extending through a side wall of the container.

The device will generally be positioned in a station in an apparatus for wet chemical non-immersion surface treatment of the substrate. The bottom of this station will generally include a pool or tank in which the processing liquid that has flowed downward across the main surface of the substrate is collected. The liquid discharged from the overflow port extending through the side wall of the container will drip into the pool. A recirculation system can be used to supply the collected liquid back to the device. For many applications, it is useful to ventilate the processing liquid. The type of recirculation just described is suitable for this. In addition, when the overflow port extends through a side wall of the container, it is possible to provide relatively many and/or relatively large overflow ports.

In a particular example of this embodiment, at least one (e.g., all) of the at least one overflow port extending through a side wall of the container is disposed on a side of the container opposite the at least one discharge channel.

This ensures that overflowing liquid remains clearly separated from the liquid flow used to wet the substrate.

An example of any embodiment in which the at least one overflow port includes at least one overflow port extending through the side wall of the container further includes at least one flow guide on an exterior of the container, wherein the flow guide is provided with an inclined surface segment below an external hole of at least one of the at least one overflow ports extending through the side wall of the container, the inclined surface segment extending to an external surface in which the external hole is defined and angled so that a lower end of the inclined surface segment is away from the external surface in which the external hole is defined.

This ensures that the overflow liquid is directed away from the device and also away from the substrate. The overflow liquid can be directed to a side wall of a processing station of the apparatus for non-immersion wet chemical processing of the substrate in which the device is disposed. This allows the device to be located relatively high in the processing station without splashing or causing a spray when the overflow liquid impacts the liquid collected at the bottom of the processing station.

In one example of this embodiment, the inclined surface segment transitions at the lower end into a finger-like surface segment, such as a finger-like surface segment that is at an angle to the inclined surface segment.

There is an empty gap between adjacent fingers through which the liquid can flow. Thus, the fingers interrupt the flow of liquid. This allows a higher amount of aeration of overflowing process liquid before collection and recirculation.

In one example of any of the embodiments, the at least one overflow port includes at least one overflow port extending through a side wall of the container, and the device further includes at least one flow guide on the outside of the container, the flow guide having an inclined surface segment below an external hole of at least one of the at least one overflow ports extending through a side wall of the container, the inclined surface segment extending to an external surface in which the external hole is defined and angled so that a lower end of the inclined surface segment is away from the external surface in which the external hole is defined, and at least a section of the inclined surface segment close to the external surface in which the external hole is defined is laterally bounded by a portion of the upright surface segment that defines the facing surface.

This further helps to direct the overflowing liquid to minimize splashing.

In one example of any embodiment, wherein the at least one overflow port comprises at least one overflow port extending through a side wall of the container, and the device further comprises at least one flow guide on an exterior of the container, the flow guide having an inclined surface segment below an exterior hole of at least one of the at least one overflow port extending through a side wall of the container, the inclined surface segment extending to an exterior surface defining the exterior hole and angled such that a lower end of the inclined surface segment is distal from the exterior surface defining the exterior hole, the flow guide being different from the container and mounted to a portion of an exterior of the container.

This simplifies manufacturing. In particular, the flow guide can be composed of plate-like sections that are connected together, for example adhesively or by welding or soldering.

In one embodiment of the device, the at least one overflow port comprises at least one overflow port defined in a conduit extending through at least a portion of the interior of the container, such as at least one overflow port opening into the interior in a direction away from a bottom of the interior of the container.

The conduit allows the overflowing liquid to be collected for rapid recirculation without contamination. Furthermore, it is possible to provide relatively numerous and/or relatively slender overflow ports along the length of the conduit without substantially weakening the container. Furthermore, the overflow ports in the conduit may face upwards.

In one embodiment of the device, the at least one overflow port comprises at least one overflow port, the at least one overflow port being in fluid communication with a connection device connected to a conduit for carrying the liquid overflowing into the at least one overflow port away from the device.

This allows a relatively high rate of recirculation and removal of liquid from the device. Coupled with a high supply rate, the level of the free surface of the liquid inside the container is therefore relatively undisturbed. The connecting device may be a fitting, or simply a pipe or hose end that can be coupled to a fitting or connector.

In one embodiment, the at least one delivery port includes, for example consists of, at least one delivery port formed in a conduit extending through at least a portion of the interior of the container.

Thus, liquid can enter the interior of the container in one dimension, for example, over a width of the interior of the container. This helps to ensure a uniform level of liquid in the interior of the container. In addition, it is only necessary to pass a conduit through a side wall to supply liquid at a relatively high rate and low pressure.

In an embodiment of the device, the container comprises a single body at least at a bottom and at least one wall delimiting the interior of the container on all sides.

The single body may be a one-piece, unitary body. The body may be molded and/or machined. The body may be made of metal, a polymer material or a composite. Seams formed by bonding are largely avoided, so that the risk of accidental leakage is minimized. The wall does not need to completely delimit the interior of the container. For example, there may be an orifice closed by a block or cover separated from the body. In another embodiment, the wall of the interior of the container is completely included in the body, wherein the wall delimits the interior of the container.

In one example of this embodiment, wherein the container comprises a single body at least at a bottom and at least one wall defining the interior of the container on all sides, the body leaves the interior of the container at least partially open at a top.

This makes manufacturing easier. In addition, the interior of the container does not need to be sealed.

In one example of this embodiment, the body partially delimits the interior of the container at the top, and at least one (e.g., multiple) orifices are defined in the portion of the body that partially delimits the interior of the container at the top.

Thus, the portion of the top wall in which the orifices are defined serves as a reinforcing strut to make the container more rigid and therefore shape-stable.

An example of any embodiment in which the container comprises a single body defining a wall delimiting the interior of the container at least at a bottom and on all sides and the body leaves the interior of the container at least partially open at a top comprises at least one lid mounted to the body and closing the interior of the container at the top.

The cap helps prevent the liquid inside the container from being contaminated.

In one embodiment of the device, at least the interior of the container has an elongated shape, seen from above, and at least one (e.g. all) of the discharge channels extend through the side wall on a longer side of the interior of the container.

This is useful for relatively uniformly wetting a relatively wide substrate. For example, the elongated shape may be a polygonal (eg, quadrilateral) shape.

In one embodiment of the device, at least one of the at least one overflow opening comprises an overflow port that is elongated in shape, with a width greater than a height as viewed in a direction of flow.

This allows the overflowing liquid to have a relatively large flow rate. A lower edge will usually be at a level that corresponds to the expected level of the free surface of the liquid in the interior of the container.

In one embodiment of the device, the at least one inlet opening is located at a bottom of the interior of the container.

Thus, the inlet openings may have a lower edge or lowest point of the edge at the liquid level of the bottom of the interior of the container. This allows the device to be emptied for maintenance or the like. In use, stagnant volumes of process liquid are substantially avoided. Furthermore, because the gas rises to the top, the risk of bubbles in the process liquid flowing through the discharge channels remains relatively low.

One embodiment of the device includes at least one liquid displacement structure configured to reduce a volume of the container interior that can be occupied by liquid while leaving space adjacent to the liquid displacement structure within the container interior to form a liquid column extending to a bottom surface that defines the container interior.

Thus, it is possible to provide a relatively high liquid column, for example a relatively high hydrostatic pressure of the fluid, at the inlet opening, without bringing the inlet opening close to the bottom surface. On the other hand, when operation of the device is stopped, the liquid level drops relatively quickly below the horizontal surface of the inlet opening, because the displacement formations occupy some of the volume that would otherwise be occupied by the liquid.

In one example of any embodiment of the device comprising at least one liquid displacement structure, the liquid displacement structure is configured to reduce a volume of the interior of the container that can be occupied by liquid, while leaving space for the liquid adjacent to the displacement structure within the container to form a liquid column extending to a bottom surface that bounds the interior of the container, and the at least one displacement structure includes at least one replaceable displacement body mounted in the container.

This allows the device to be adapted to different applications. One or more displacement bodies may be removed or replaced to provide a larger volume for the liquid to occupy.

In one example of any embodiment of the device comprising at least one liquid displacement structure, the liquid displacement structure is configured to reduce a volume of the interior of the container that can be occupied by liquid, while leaving space for the liquid in the interior of the container adjacent to the displacement structure to form a liquid column extending to a bottom surface bounding the interior of the container, and the at least one displacement structure is separated from a bottom surface bounding the interior of the container.

In particular, the displacement structures may be spaced apart from the bottom surface by a distance greater than the liquid level of one or more inlet orifices. The displacement structure of this embodiment provides the effect of allowing the flow of liquid through the hole to stop relatively quickly after the supply of liquid through the delivery port is stopped, but with little effect on the pressure distribution at the inlet orifices leading to the discharge channels.

According to another aspect, the system for delivering a liquid stream to moisten a surface of a vertically held planar substrate according to the present invention is characterized in that the system is configured to maintain a liquid level of a free surface of the liquid in the interior of the container of each overflow device at a level between the at least one discharge channel inlet orifice and a maximum liquid level in the interior of the container.

In one embodiment, the system is configured to maintain the level of the free surface of the liquid in the container of each overflow device at a level between the at least one discharge channel inlet orifice and a maximum liquid level inside the container by employing a device according to the present invention or a device further comprising any of the features explained above, either alone or in combination, as one or more overflow devices. In the case where the overflow devices are devices according to the present invention, the resulting system is a relatively simple embodiment that provides a liquid flow with a well-defined and constant velocity, since the liquid supply system can be configured to supply liquid at a rate that exceeds the flow rate of the liquid flow, so that excess liquid is permanently discharged through the overflows, for example through one or more overflow ports.

In another embodiment, the system includes a sensor arrangement, a controller, and a controllable liquid supply system for maintaining the liquid level of the free surface of the liquid in the container.

In either case, there is no back pressure because the level of a free surface of liquid in the container of each overflow is at a level between the at least one discharge channel inlet orifice and a maximum liquid level inside the container. The fluid static pressure determines the flow rate out of the orifice. The flow of liquid is gravity driven. By keeping the liquid level constant, pressure fluctuations supplying liquid to the overflow have no effect on the free-flowing stream of liquid gushing out of the orifice of the overflow.

According to another aspect, the apparatus for non-immersion wet chemical treatment of a planar substrate according to the present invention comprises at least one substrate holding device, at least one processing station, at least one support member for at least suspending the substrate holding device in the processing station, and at least one system for delivering a liquid flow according to the present invention, which is configured in the processing station to guide the liquid flow onto at least one of the substrate and the substrate holding device.

Since the substrate holder is suspended, the planar substrate is held in a vertical orientation in use. The main surfaces of the substrate make a negligible small angle with the vertical (their normals are essentially oriented horizontally). When the liquid flow is directed onto the substrate, a relatively uniform film-like liquid flow is formed on the main surface of the relevant substrate, but for a small area at the top, the liquid flow impinges on the surface. When the flow is directed onto the substrate holder, the existence of such a small area can even be avoided by first allowing the liquid to flow a sufficient distance over a flat surface of the substrate holder. In either case, due to the fact that the liquid flow is gravity-driven, the liquid flow impinges at a well-determined speed and angle.

In one embodiment of the apparatus, at least one of the substrate holding devices comprises: a support structure, wherein the support structure comprises at least one portion for engaging at least one of the at least one support member so as to suspend the support structure in the processing station of the apparatus; at least one clamping device supported by the support structure for holding the substrate in a plane; and at least one first upper flow guide portion disposed on one side of the plane and having an inner-facing surface facing inwardly relative to the plane and an outer-facing surface facing outwardly, wherein the outer-facing surface comprises: an upper outer-facing surface segment, wherein at least one of the systems for delivering a liquid stream is configured to direct the liquid stream onto the upper outer-facing surface segment, and A lower outwardly facing surface segment extending from a transition portion between at least a central segment of the upper outwardly facing surface segment and the lower outwardly facing surface segment to a lower edge, wherein at least one segment of the lower outwardly facing surface segment extending to the lower edge is oriented at a less acute angle relative to the plane than the upper outwardly facing surface segment.

The substrate holding device is suitable for holding the substrate in an apparatus for non-immersion wet chemical treatment during the treatment. In this type of treatment, the substrate is not immersed in a bath of treatment liquid but is held in the apparatus and in this case moistened by means of liquid directed onto the upper flow guide portion. From there, the liquid flows downward onto an exposed area of a main surface of the substrate to effect the treatment. The liquid then drips onto the bottom of a pool or tank included in the apparatus.

The planar substrate may be flexible such that the substrate is planar only when held by the clamping devices.

The substrate holding device comprises a support structure, the support structure comprising at least one portion for engaging a support member so as to suspend the support structure in the apparatus. Thus, the configuration and orientation of the at least one portion for engaging the support member determines that the substrate holding device is oriented upwards in use, and thus determines which outwardly facing surface segment is the upper outwardly facing surface segment and which is the lower outwardly facing surface segment. Similarly, the position, orientation and configuration of the at least one clamping device determines the position and orientation of the plane, and thus the position and orientation of the plane can be determined even in the absence of a substrate.

The substrate holding device includes at least one first upper flow guide section, which is arranged on one side of the plane and has an inner-facing surface facing inward relative to the plane and an outer-facing surface facing outward. That is, the first upper flow guide section does not cross the plane, but has an inner-facing surface facing the direction of the plane and an outer-facing surface facing away from the plane. In this context, the direction in which the inner-facing surface faces has at least one component perpendicular to the plane. The outer-facing surface faces a direction that does not have such a component. In principle, the outer-facing surface may include a section facing a direction that is completely parallel to the plane.

The inwardly facing surface and the outwardly facing surface need not be completely flat. The outwardly facing surface is generally unimpeded by and wetted by the liquid flow directed onto the upper outwardly facing surface segment. A lower outwardly facing surface segment is adjacent to the upper outwardly facing surface segment or at least a central segment thereof and extends to a lower edge of the outwardly facing surface segment. This will also be a lower edge of the first upper flow guiding portion. The lower edge may be a straight edge or a curve. Embodiments with a straight edge are relatively easy to implement.

Depending on whether two major surfaces of the substrate are to be processed, there may be a second upper flow guide portion on an opposite side of the plane. Generally, there may be at most one upper flow guide portion for either of the two sides. In most cases, the lower edge will extend over a maximum dimension of an exposed area of the major surface of either substrate held in the plane by the clamping devices. In most cases, this dimension will be determined by the support structure, which will typically frame the area of the plane in which a substrate can be held.

As previously mentioned, the apparatus and system for delivering a liquid stream provides a liquid stream having a well-defined, generally constant velocity and trajectory. Thus, this stream can be targeted to the upper outwardly facing surface section so that when reaching the lower edge, the flow is always laminar. Thus, the entire exposed area of the major surface is treated relatively uniformly over its width.

In one example of this embodiment, a strip of the inner facing surface extends longitudinally along the lower edge and laterally to the lower edge, and at least a central longitudinal section of the strip is movable to engage a major surface of a planar substrate over the entire length of that section.

It is possible to define a strip of inwardly facing surface, of which at least a central section (seen in the longitudinal direction along the length of the edge) is movable, in use, into engagement with a major surface of any planar substrate lying in the plane defined by the at least one clamping device. Thus, there is no gap between the lower edge and the major surface. The engagement between at least the central section of the strip and the major surface of the substrate is substantially uninterrupted over the length of that central section. In use, any liquid flowing downwardly over the upper outwardly facing surface section and the lower outwardly facing surface section will smoothly transition to the exposed area of the major surface of the planar substrate, and the flow continues as a balanced film flow over and over the exposed area. There is relatively little or no eddy current, thereby ensuring uniform treatment of the exposed area of the major surface of the substrate up to or close to the contact line with the lower edge.

A central longitudinal section of the strip is a section in the middle, looking at the outward or inward facing surface. Where the lower edge is rounded at the corners at the longitudinal ends, it may not engage with a planar major surface of a planar substrate. In many embodiments, the strip will be movable over an entire length of the strip into engagement with a major surface of a planar substrate.

The strip of the inner facing surface need not be flat on a micro level, especially if made of a material having a hardness substantially different from that of the substrate surface.

In one example of any one of the embodiments of the apparatus, wherein at least one of the substrate holding devices comprises: a supporting structure; at least one clamping device supported by the supporting structure for holding the substrate in a plane; and at least one first upper flow guide portion as defined above, wherein a strip facing the inner surface extends longitudinally along the lower edge and laterally to the lower edge, and at least one central longitudinal section of the strip is movable to engage with a major surface of a planar substrate over the entire length of that section, and the at least one clamping device of the substrate holding device comprises at least one upper clamping device, wherein an arm of the upper clamping device is configured to engage with a major surface of the substrate at a level equal to or higher than a liquid level of the strip.

One effect is that the arm does not interfere with the flow of liquid from the first upper flow guiding portion onto or over the major surface of the substrate.

In one example of any one of the embodiments of the apparatus, wherein at least one of the substrate holding devices comprises: a support structure; at least one clamping device supported by the support structure for holding the substrate in a plane; and at least one first upper flow guide portion as defined above, a strip of the inner surface extending longitudinally along the lower edge and extending laterally to the lower edge, at least one of the strips extending longitudinally along the lower edge and extending transversely to the lower edge. The central longitudinal portion is movable to engage with a major surface of a planar substrate over an entire length of that section, the at least one clamping device of the substrate holding device includes at least one upper clamping device, and an arm of the upper clamping device is configured to engage with a major surface of the substrate at a level equal to or higher than a liquid level of the strip, and the arm of the upper clamping device is configured to engage the major surface between the plane and the strip.

Thus, the clamping joint is located between the upper flow guide portion and the major surface of the substrate. In use, this can be close to the upper edge of the planar substrate so that most of the major surface of the substrate is exposed and can be processed.

In one example of any embodiment, wherein at least one clamping device includes at least one upper clamping device, and an arm of the upper clamping device is configured to engage a major surface of the substrate at a level equal to or above a liquid level of the strip, the first upper flow guide portion forms the arm of the upper clamping device.

Thus, no separate clamping device is required and the substrate holding device can be relatively compact and have relatively few parts. The other arm of the upper clamping device can be included in the support structure of the substrate holding device or fixed to a part of the support structure.

In one example of any one of the embodiments of the apparatus, at least one of the substrate holding devices comprises: a supporting structure; at least one clamping device supported by the supporting structure for holding the substrate in a plane; and at least one first upper flow guide portion as defined above, at least one of the substrate holding devices comprising at least one first upper flow guide portion further comprises a second one of the upper flow guide portions, which is arranged on a side of the plane opposite to the first upper flow guide portion.

This embodiment is suitable for relatively uniformly processing two major surfaces of a planar substrate. The second upper flow guide portion may include any or all of the features of the embodiments of the first upper flow guide portion. In many such cases, the second upper flow guide portion will be at least a mirror image (relative to the plane) of the first upper flow guide portion if not identical in shape and size.

In one example of this embodiment, the first upper flow guide portion and the second upper flow guide portion are configured to clamp the substrate therebetween.

Therefore, no additional upper clamping device is required. This makes the device relatively compact and economical in parts. One or more elastic components can be provided to urge the first flow guiding part and the second flow guiding part (more specifically, the strips facing the inner surface thereof) towards each other. Because at least one central longitudinal section of the strip can be moved over the entire length of that section to engage with a major surface of the planar substrate, there is a relatively long contact area extending substantially over the width of the substrate. This helps to prevent damage to the substrate surface. In addition, when the substrate is held under tension, the tension is relatively evenly distributed over the width of the substrate.

In one example of any one of the embodiments of the apparatus, at least one of the substrate holding devices comprises: a support structure; at least one clamping device supported by the support structure for holding the substrate in a plane; and at least one first upper flow guide portion as defined above, at least the first of the upper flow guide portions being pivotably attached to the support structure with a pivot axis extending parallel to the plane.

Thus, it is relatively easy to move the strip or a central section thereof into engagement with the major surface of the planar substrate regardless of the exact thickness of the planar substrate. One or more biasing devices may be provided between the support structure and one or more pivoting upper flow guide portions to bias the strip towards the plane. If the lower edge is straight, the lower edge will be at least approximately parallel to the pivot axis. The pivotable attachment may be through a hinge protruding from one of the support structure and the upper flow guide portion, the hinge being inserted through respective apertures in the other of the support structure and the upper flow guide portion.

In one example of any one of the embodiments of the apparatus, at least one of the substrate holding devices comprises: a supporting structure; at least one clamping device supported by the supporting structure for holding the substrate in a plane; and at least one first upper flow guide portion as defined above, at least the first of the upper flow guide portions being composed of a plate-like segment defining at least the inward-facing surface and the outward-facing surface.

This makes it relatively easy to manufacture the upper flow guiding part by cutting the segments out of a plate-like material and joining the segments together (e.g. by welding or gluing). The portion of the upper flow guiding part used to attach the upper flow guiding part to the support structure need not be made from plate-like segments. At least those portions defining the inwardly facing surface and the outwardly facing surface are typically made from one or more plate-like segments.

In one example of any one of the embodiments of the apparatus, at least one of the substrate holding devices comprises: a supporting structure; at least one clamping device supported by the supporting structure for holding the substrate in a plane; and at least one first upper flow guide portion as defined above, the outward-facing surface segment folding inwardly toward the plane at a transition from the upper outward-facing surface segment to the lower outward-facing surface segment.

In particular, this embodiment is relatively easy to manufacture, combining features of the previous embodiments. The transition can be along a straight line, such as a straight line parallel to the lower edge, for uniform flow across the width of the outwardly facing surface (looking at that surface in the direction of the plane). This embodiment allows one or both of the upper outwardly facing surface segment and the lower outwardly facing surface segment to be flat, but facing in a different direction than the other of the upper outwardly facing surface segment and the lower outwardly facing surface segment.

In one example of any embodiment of the apparatus, wherein at least one of the substrate holding devices comprises: a supporting structure; at least one clamping device supported by the supporting structure for holding the substrate in a plane; and at least one first upper flow guide portion as defined above, wherein at least one of the upper outward-facing surface segment and the lower outward-facing surface segment is flat over at least a large portion of a surface area thereof.

This provides unimpeded flow across the relevant surface segments.

In one example of any one of the embodiments of the apparatus, at least one of the substrate holding devices comprises: a support structure; at least one clamping device supported by the support structure for holding the substrate in a plane; and at least one first upper flow guide portion as defined above, at least the upper outwardly facing surface segment being laterally bounded by surfaces facing each other and extending at an angle (e.g., transversely) relative to the plane.

In use, the upper outwardly facing surface section is the section against which the process liquid stream impinges. The surfaces facing towards each other and extending at an angle to the plane delimit the upper outwardly facing surface section so that liquid cannot flow out of the upper outwardly facing surface section at its side edges but is forced to flow onto the lower outwardly facing surface section.

In one example of any one of the embodiments of the apparatus, wherein at least one of the substrate holding devices comprises: a support structure; at least one clamping device supported by the support structure for holding the substrate in a plane; and at least one first upper flow guide portion as defined above, the lower edge extending between side edges of the lower outwardly facing surface segment, the side edges meeting the lower edge at respective corners of the lower outwardly facing surface segment.

Thus, the lower outwardly facing surface section is substantially lip-shaped. The side edges may abut members of the support structure or be located closely adjacent to the members so that the lower outwardly facing surface section extends partially between the members. The side edges may be straight over most of their extent, as may the lower edge.

In one example of this embodiment, the outward-facing surface further includes a transversely lower outward-facing surface segment that is separated from the lower outward-facing surface segment and adjacent to the upper outward-facing surface segment, and the transversely lower outward-facing surface segment and the upper outward-facing surface segment extend at an angle less than 180° between each other.

Although the lower outwardly facing surface section slopes inwardly in the direction of the plane towards the lower edge, the transversely downwardly facing surface sections therefore slope outwardly towards their lower edge. In use, this helps to carry process liquid away from the part of the support structure that laterally frames the substrate. Furthermore, in case the surface sections are defined by plate-like segments, the transversely downwardly facing surface sections increase the rigidity of the upper flow guiding part.

In one example of any one of the embodiments of the apparatus, at least one of the substrate holding devices comprises: a supporting structure; at least one clamping device supported by the supporting structure for holding the substrate in a plane; and at least one first upper flow guide portion as defined above, the at least one clamping device comprising at least one lower clamping device configured to engage the substrate at a lower edge of the substrate.

This allows the substrate device to be used to hold a relatively flexible substrate in a well-defined position in the plane. No wobble or warping of the substrate is possible.

In one example of any embodiment of the apparatus, wherein at least one of the substrate holding devices comprises: a support structure; at least one clamping device supported by the support structure for holding the substrate in a plane; and at least one first upper flow guide portion as defined above, the substrate holding device further comprises at least one first lower flow guide portion, the first lower flow guide portion being arranged on a respective side of the plane and having an inwardly facing orientation relative to the plane. An inner-facing surface and an outer-facing surface facing outward, the outer-facing surface including at least one upper outer-facing surface segment extending to an upper edge of the outer-facing surface and tilting inwardly toward the plane in the direction of the upper edge, wherein a strip of the inner-facing surface extends longitudinally along the upper edge and laterally to the upper edge, and wherein at least a central longitudinal segment of the strip is movable to engage with a major surface of a substrate over an entire length of that segment.

The lower flow guide portion guides the film flow away from the device at the bottom edge of the exposed area of the major surface of the substrate. This helps protect the support structure and/or lower clamping device from the impact of the processing liquid.

In one example of any of the embodiments, at least one of the substrate holding devices includes: a supporting structure; at least one clamping device supported by the supporting structure for holding the substrate in a plane; at least one first upper flow guide portion as defined above and at least one first lower flow guide portion as defined above, the upper edge extending between the side edges of the upper outwardly facing surface segment, and the side edges meeting the upper edge at respective corners of the upper outwardly facing surface segment.

This embodiment is easy to manufacture with a straight upper edge and therefore straight strips. A continuous contact line with the flat main surface of the planar substrate can be achieved relatively easily.

In one example of this embodiment, the side edges extend from respective corners of the upper outwardly facing surface segment to respective second corners, and the upper outwardly facing surface segment widens at the second corner to increase a width of the upper outwardly facing surface segment in a direction parallel to the upper edge.

In this embodiment, the portion of the lower flow guide portion defining the upper outwardly facing surface section may be folded between lateral members of the support structure framing the region of the plane in which the substrate is configured to be held.

In one example of any of the embodiments, at least one of the substrate holding devices includes: a supporting structure; at least one clamping device supported by the supporting structure for holding the substrate in a plane; at least one first upper flow guide portion as defined above and at least one first lower flow guide portion as defined above, at least one of the upper outward-facing surface segments being laterally bounded by surfaces facing each other and extending at an angle (e.g., transversely) relative to the plane.

These surfaces facing toward each other and extending at an angle (e.g., transversely) relative to the plane guide the liquid to flow downward from the major surface of the substrate onto the lower flow guide portion without spreading. Therefore, the flow across the major surface being processed is also relatively uniform at the bottom edge of an exposed area thereof.

In one example of any one of the embodiments, at least one of the substrate holding devices includes: a supporting structure; at least one clamping device supported by the supporting structure for holding the substrate in a plane; at least one first upper flow guide portion as defined above and at least one first lower flow guide portion as defined above, the outward-facing surface of the lower flow guide portion includes a lower outward-facing surface segment adjacent to the upper outward-facing surface segment, and the upper outward-facing surface segment and the lower outward-facing surface segment extend at an angle greater than 180° between each other.

In use, the lower outwardly facing surface section may be at a relatively small or negligible angle to the vertical, while the upper outwardly facing surface section is inclined. The lower outwardly facing surface section may protect the lower portion of the support structure or clamping device. In either case, an effect is that the balanced membrane flow will not break away at the lower end of the upper outwardly facing surface section.

In one example of any of the embodiments, at least one of the substrate holding devices includes: a supporting structure; at least one clamping device supported by the supporting structure for holding the substrate in a plane; at least one first upper flow guide portion as defined above and at least one first lower flow guide portion as defined above, at least the upper outward surface section is flat.

This provides smooth, even, unobstructed flow across the upper outward facing surface section.

In one example of any of the embodiments, at least one of the substrate holding devices includes: a supporting structure; at least one clamping device supported by the supporting structure and used to hold the substrate in a plane; at least one first upper flow guide portion as defined above and at least one first lower flow guide portion as defined above, wherein the at least one clamping device includes at least one lower clamping device configured to engage the substrate at a lower edge of the substrate, and an arm of the lower clamping device is configured to engage a main surface of the substrate at a liquid level equal to or lower than a liquid level of the strip of the first lower flow guide portion.

Thus, the lower gripper arm does not interrupt flow across the major surface of the substrate at the lower end of the exposed area of that major surface.

In one example of this embodiment, the arm of the lower clamping device is configured to engage the major surface between the plane of the first lower flow guide section and the strip.

Thus, the lower clamping device and the first lower flow guiding part can be arranged at the same liquid level or even coincide.

In one example of any of the embodiments, at least one of the substrate holding devices includes: a supporting structure; at least one clamping device, which is supported by the supporting structure and is used to hold the substrate in a plane; at least one first upper flow guide portion as defined above and at least one first lower flow guide portion as defined above, wherein the at least one clamping device includes at least one lower clamping device configured to engage the substrate at a lower edge of the substrate, and the first lower flow guide portion forms the arm of the lower clamping device.

Therefore, there is no need to provide a separate clamping device. Moreover, the strip can engage the substrate to clamp the substrate. Because at least one central longitudinal section of the strip can be moved over the entire length of that section into engagement with a major surface of a substrate, there is a relatively extended contact area between the clamping device and the substrate. When the substrate is held under tension, the tension is evenly distributed. In either case, there are no acute stresses on the isolated pieces of the substrate surface.

In one example of any one of the embodiments, at least one of the substrate holding devices includes: a supporting structure; at least one clamping device, which is supported by the supporting structure and is used to hold the substrate in a plane; and at least one first upper flow guide part as defined above and at least one first lower flow guide part as defined above, the substrate holding device further includes a second one of the lower flow guide parts, which is arranged on a side of the plane opposite to the first lower flow guide part.

In this embodiment, both major surfaces of the substrate may be processed simultaneously. The second lower flow guide portion may include any of the features of any of the embodiments of the first lower flow guide portion. The second lower flow guide portion may be at least the mirror image (relative to the plane) of the first lower flow guide portion, for example the mirror image is identical in shape and size.

In one example of this embodiment, the first lower flow guide portion and the second lower flow guide portion are configured to clamp the substrate therebetween.

Therefore, a separate clamping device is not required. The substrate holding device is very suitable for holding substrates of different thicknesses.

In one example of any of the embodiments, at least one of the substrate holding devices includes: a supporting structure; at least one clamping device supported by the supporting structure for holding the substrate in a plane; and at least one first upper flow guide portion as defined above and at least one first lower flow guide portion as defined above, at least the first of the lower flow guide portions being pivotably attached to the supporting structure by means of a pivot axis extending parallel to the plane.

This makes it relatively easy to move the strip facing the inner surface into engagement with the surface of the substrate. One or more biasing devices may be provided between the support structure and the pivoting lower flow guide portion to bias the strip facing the inner surface towards the plane. If the upper edge is straight, the upper edge will be at least approximately parallel to the pivot axis. The pivotable attachment may be through a hinge protruding from one of the support structure and the lower flow guide portion, the hinge being inserted through respective apertures in the other of the support structure and the lower flow guide portion.

In one example of any one of the embodiments, at least one of the substrate holding devices includes: a supporting structure; at least one clamping device supported by the supporting structure for holding the substrate in a plane; and at least one first upper flow guide portion as defined above and at least one first lower flow guide portion as defined above, at least the first of the lower flow guide portions being composed of a plate-like segment defining at least the inward-facing surface and the outward-facing surface.

This allows the lower flow guiding part to be manufactured relatively easily by cutting it into segments from a plate-like material and joining the segments together, for example by welding or gluing. The portion of the lower flow guiding part used to attach the lower flow guiding part to the support structure need not be made of plate-like segments. However, at least those portions defining the inwardly facing surface and the outwardly facing surface are typically made of one or more plate-like segments.

According to another aspect, the present invention provides a method of manufacturing any embodiment of a device according to the present invention, the device being used to deliver a liquid stream to wet a surface of a vertically held planar substrate, wherein: the discharge channels define respective outlet openings at ends of the discharge channels opposite to the respective inlet openings, the device comprises at least one first shielding portion, the first shielding portion being different from the container and being mounted to an exterior of the container in front of the outlet openings, and the slit being defined between the first shielding portion and one of a second shielding portion mounted to the exterior of the container and a protruding portion of the container.

The present invention also provides a method of manufacturing any embodiment of a device for delivering a liquid stream to moisten a surface of a vertically held planar substrate, wherein: The device includes a body formed in one piece and having a cavity formed therein, The cavity at least partially defines the interior of the container, The hole is formed by a slit, The device includes at least a first shielding portion that is different from the body and mounted to an exterior of the body, and The slit is defined between the first shielding portion and one of a protrusion of the container and a second shielding portion mounted to the exterior of the body.

Each of the two manufacturing methods includes: providing the container and at least the first shielding portion; placing a gauge having a dimension defining a height of the slit as viewed in the flow direction between the first shielding portion and one of the second shielding portion and the protruding portion of the container to define the slit; securing at least the first shielding portion to the container; and removing the gauge from the slit.

The method allows the liquid stream to emerge from the hole in the shape of a sheet. The sheet has a relatively well-defined height. Moreover, the method allows the slit height to be varied by using a gauge of different sizes.

According to another aspect, in a method for moistening a surface of a vertically held planar substrate according to the present invention, liquid is supplied to at least one device according to the present invention, and a flow rate of the liquid supplied to the device is at least equal to a total flow rate of the liquid through the at least one discharge channel.

The flow rate can in particular be greater. Thus, the level of a free liquid in the interior of the container remains constant. However, the supply rate does not need to be controlled very accurately. Furthermore, the supply does not have to be intermittent, but can be continuous.

An embodiment of the method includes: mounting the substrate to a substrate holding device, the substrate holding device including a supporting structure and at least one clamping device supported by the supporting structure, for holding the substrate in a plane; suspending the supporting structure to hold the substrate in a vertical direction; and guiding the liquid flow to an upper outward-facing surface segment of an outward-facing surface of an upper flow guide portion arranged on one side of the plane, the outward-facing surface facing outward relative to the plane, so as to establish a film flow on a main surface of the substrate on the upper outward-facing surface segment.

Thus, a balanced flow of liquid is established before the liquid reaches the main surface of the substrate to be processed. This allows the main surface to be processed relatively uniformly over its entire height.

An embodiment of the method comprises using an apparatus according to the invention.

Therefore, the devices, systems and apparatus according to the present invention are each suitable for use in a method according to the present invention.

In the following, an embodiment of an apparatus for non-immersion wet chemical treatment of a planar substrate 1 (FIGS. 26 to 28) will be described. Instead of being immersed in a bath of treatment liquid, the substrate 1 is wetted on at least one side with treatment liquid, which flows in the form of a relatively thin film across a major surface of the substrate 1 on that side. This reduces the amount of treatment liquid required, thereby providing environmental and economic benefits. For example, the treatment may include rinsing, desmearing, etching, swelling, reduction or plating, including, for example, electrodeless plating. In fact, the apparatus may include a plurality of treatment stations, each configured in a manner to be explained in more detail, but the treatment liquid differs between at least two of the stations.

Although the substrate 1 is referred to as being planar, the substrate may be flexible, such as a foil. The device is particularly suitable for substrates such as printed circuit boards, semiconductor chips or integrated circuit substrates.

In the illustrated embodiment, the apparatus is configured to treat the two main surfaces of a substrate 1 by wetting the two main surfaces with a treatment liquid, which flows down the surface as a balanced thin film flow over substantially the entire width of the relevant main surface. In view of this, the substrate 1 is held in a substrate holding device 2, which will be explained in more detail below. The treatment liquid is directed onto the substrate holding device 2 from either side in the form of individual liquid flows. The flows are lamellar and follow a parabolic trajectory that intersects the surface of the substrate holding device at an acute angle. A laminar flow is established before the liquid flows onto the main surface of the substrate 1.

Two examples of apparatus using the same substrate holding device 2 will be explained in detail. The two examples differ in the device used to deliver the liquid stream.

Since both main surfaces of the substrate 1 are processed, the apparatus in the first example comprises two first overflow devices 3a, 3b (FIG. 1) for delivering the liquid stream. The first overflow devices 3a, 3b are identical, so that only one is described and shown in detail.

The first overflow device 3 comprises a body 4 (FIGS. 2 to 8) forming a container 5 for storing liquids. In the illustrated embodiment, the body 4 is made in one piece, although surface treatments (including coating and anodization) are also possible. The body 4 can be molded or machined and made of metal or polymer materials (including polymer composites). The body 4 defines a container interior for storing liquids, which is bounded by a bottom wall and a side wall. From the top, the side wall is quadrilateral, wherein the side wall bounds the container interior. Otherwise, from the top, the container interior and the body 4 both have an elongated shape.

In the illustrated embodiment, the body 4 has a top wall including four elongated orifices 6a to 6d (FIGS. 4 and 8). The top wall delimits the container interior at the top. Thus, the body 4 partially opens the container interior at the top. A cover 7 is mounted on the body 4 to cover the orifices 6a to 6d. In the illustrated embodiment, the cover 7 is fixed to the body 4 by screws. Other types of fasteners or other types of attachments are conceivable, such as a reversible spring lock connection.

A row of discharge channels through the side wall of the container defined by the body 4 defines a respective row of inlet orifices open to an interior of the container 5. At the other end, the discharge channel defines a row of outlet orifices in an outer surface 8 of the body 4. The outlet orifices are retracted relative to a flat main portion of the outer surface 8 arranged in an elongated recess 9 extending in the row direction. The discharge channel, the inlet orifices and the outflow orifices have an elongated cross-section (transverse to the flow direction). The width of the discharge channel, the inlet orifices and the outflow orifices is greater than their height. In the illustrated embodiment, the discharge channel, the inlet orifices and the outflow orifices have an elongated cross-section, wherein a width is greater than the width of the wall segment separating adjacent discharge channels. In the illustrated embodiment, the cross-section is constant and the discharge channel is straight. The elongated recess has a length equal to at least 90% of the corresponding dimension of the interior of the container. Each of these features helps to establish relatively uniform flow through the wall of the body 4 forming the container 5.

The illustrated first overflow device 3 comprises an upper shielding part 10 (FIGS. 9 to 11) and a lower shielding part 11 (FIGS. 10 to 14). The upper shielding part 10 and the lower shielding part 11 are each mounted against the outer surface 8 of the main body 4. The upper shielding part 10 and the lower shielding part 11 are mounted in front of the outflow orifice of the discharge channel. The mounting can be carried out by means of screws or other fasteners.

The upper shielding part 10, the lower shielding part 11 and the elongated recess 9 together define an equalizing channel 12 (FIG. 5) into which the outflow opening of the discharge channel opens. This equalizing channel 12 is elongated and closed at the longitudinal end.

In the illustrated embodiment, the upper shielding portion 10 has a flat lower surface 13, but has a recess along one edge close to the body 4, which recess partially defines the equalizing channel 12. The opposite edge of the lower surface 13 is relatively sharp.

The lower shielding part 11 has an upper surface in which a flat central section 14 is set back relative to adjacent flat transverse end sections 15a, 15b. The flat central section 14 and the lower surface 13 of the upper shielding part 10 define a slit 16 (FIG. 5) therebetween forming an aperture 17 from which a sheet of liquid is discharged in use.

From the outside, the slit 16 has a height, a width and a depth. A value of the height may be in the range of 0.5 mm to 1.5 mm, for example in the range of 0.6 mm to 1.3 mm. A value of the depth may be at least 10 mm, for example at least 25 mm. This helps to ensure that the liquid stream gushing out of the hole 17 is generally guided horizontally when leaving the hole 17. The maximum value is not very important, but may be at most 50 mm. The width decreases from the hole 17 in the direction of the main body 4 forming the container. The transverse edges 18a, 18b (Figure 12) of the central section 14 of the upper surface extend at a certain angle to the straight front edge 19, for example an angle in the range of 20° to 40°. This helps to prevent the sheet-like liquid stream gushing out of the hole 17 from shrinking laterally. The front edge 19 is relatively sharp to ensure that a well-defined jet of liquid emerges from the hole 17.

When the upper shielding part 10 and the lower shielding part 11 are mounted to the main body 4, the height of the slit 16 can be set relatively accurately by placing a gauge between the upper shielding part 10 and the lower shielding part 11. After the upper shielding part 10 and the lower shielding part 11 are fixed in place, the gauge is removed to open the slit 16.

In use, liquid is supplied to the first overflow device 3 by a pump (not shown) through a supply pipe (not shown) connected to a supply conduit 20 via a fitting 21 (Figs. 3, 4, 7). The supply conduit 20 enters the interior of the container through a side wall at a longitudinal end of the main body 4 and extends substantially over the entire extent of the interior of the container to the opposite longitudinal end. The supply conduit 20 is closed at the other end. One or more delivery ports are provided along the length of the section of the supply conduit 20 extending through the interior of the container. In the illustrated embodiment, these ports include relatively large numbers of small holes through a lower side of the section of the supply conduit 20 extending through the interior of the container. The inlet orifice of the discharge channel is at a lower liquid level so that it is impossible for air bubbles to enter the discharge channel.

The first overflow device 3 is provided with a plurality of overflow ports which open into the interior of the container at a level between the level of the inlet opening of the discharge channel and a maximum level of the interior of the container. The latter level is the maximum level that a free surface of the liquid may reach in the absence of overflow ports. This is usually determined by the upper edge of an inner surface of a side wall delimiting the interior of the container.

The overflow port includes a plurality of side wall overflow ports 22a to 22d (FIG. 2) extending through a side wall of the body 4 forming the container 5. The side wall overflow ports 22a to 22d are disposed on a side of the body 4 forming the container 5 opposite to the discharge passage, and the side wall overflow ports are located at a higher liquid level.

In the illustrated embodiment, the side wall overflow ports 22a to 22d are greater than 1 in number and are arranged in a row at a common liquid level. Viewed in the flow direction, the side wall overflow ports 22a to 22d have an elongated cross-section with a width greater than their height. The transverse extent of the section of the side wall separating adjacent side wall overflow ports 22a to 22d is less than the width of any one of the side wall overflow ports 22a to 22d. Providing a plurality of slit overflow ports in succession results in a stronger side wall for a given wall thickness than providing one extremely wide slit overflow port.

The first overflow device 3 further comprises a flow guide 23 mounted against an outer surface 24 of the body 4 forming the container 5. In the illustrated embodiment, the side wall overflow ports 22a to 22d extend through both the side wall of the body 4 and a plate-like section of the flow guide 23. The outer holes of the side wall overflow ports 22a to 22d are formed in the plate-like section of the flow guide 23. In other embodiments, the flow guide 23 may be located entirely at a lower liquid level than the side wall overflow ports 22.

The external apertures are defined in a surface section 25 (FIG. 5) that is generally parallel to the external surface 24. This parallel flow guiding surface section 25 transitions into an inclined flow guiding surface section 26. The inclined flow guiding surface section 26 is angled so that a lower end is away from the parallel flow guiding surface section 25 in which the external apertures of the sidewall overflow ports 22a-22d are defined.

The inclined flow guiding surface section 26 transforms into a finger surface section 27 at a lower end of the inclined flow guiding surface section 26. The finger surface section 27 is bent so that the distal ends of the fingers point downward. The fingers are arranged in a row and are spaced apart to allow the liquid flow to be dispersed and thereby increase ventilation.

The wings 28a, 28b define upright surface sections 29a, 29b facing towards each other and delimiting laterally the parallel flow guiding surface section 25 and at least one upper section of the inclined flow guiding surface section 26. These upright surface sections 29a, 29b guide the liquid to flow over the inclined flow guiding surface section 26. The inclined flow guiding surface section 26 carries the overflowing process liquid away from the first overflow device 3 to a position sufficiently close to a side wall of a treatment station of the treatment apparatus, where the first overflow device 3 is included for the liquid to flow downwardly along the side wall.

The overflow port of the first overflow device 3 further comprises an elongated overflow port 30 in an overflow conduit 31 extending through an interior of the body 4 forming the container 5. In the illustrated embodiment, the overflow conduit 31 extends through the interior in a longitudinal direction from one end of the interior to the other end. The elongated overflow port 30 is slightly shorter.

In the illustrated embodiment, the elongated overflow port 30 opens inwardly in a direction away from a bottom of the interior of the body 4 forming the container 5. The overflow conduit 31 extends through the side wall of the body 4 forming the container 5 to an overflow conduit fitting 32. This overflow conduit fitting 32 is connected to a return pipe 33 for returning the process liquid to a pump (not shown) or a storage tank, the pump being configured to pump the process liquid from the storage tank. One or more filters or sedimentation tanks may be interposed between the return pipe 33 and the pump.

In an alternative embodiment, there may be more than one overflow port in the overflow conduit 31, rather than a single elongated overflow port 30. A hose may be used in place of the return line 33.

The liquid stream that overflows through the slit 16 defined between the upper shielding part 10 and the lower shielding part 11 will flow in the form of a curved sheet, the curve (i.e. the flow trajectory) being essentially parabolic in shape. The liquid stream will overflow in a substantially horizontal direction. The speed is determined solely by the static pressure of the fluid. In use, the pump is configured to supply liquid at a higher volume flow rate than it would be able to leave the first overflow device 3 through the discharge channel at a flow rate determined by the static pressure of the fluid. This ensures that there is always an overflow of the processed liquid. The liquid level of the free surface of the liquid in the interior of the body 4 forming the container 5 is thereby determined relatively accurately and remains constant, even if there are changes in the rate at which the liquid is supplied by the pump. Therefore, the exit velocity through the hole 17 defined by the slit 16 formed between the upper shielding part 10 and the lower shielding part 11 is constant. The angle at which the liquid stream impinges on the substrate holding device 2 is likewise constant.

A second overflow device 34 (FIGS. 15 to 25) comprises a body 35 forming a container for storing liquid. In the illustrated embodiment, the body 35 is made in one piece, although surface treatments (including coating and anodization) are also possible. The body 35 can be molded or machined and made of metal or polymer materials (including polymer composites). In a particular embodiment, the body 35 can be obtained by both molding and machining.

A cavity 36 (FIG. 18) is formed in the body 35. The cavity 36 at least partially defines a container interior 37 and two overflow spaces 38, 39. More specifically, the body 35 defines surfaces delimiting the container interior 37 and the overflow spaces 38, 39 on five sides. These are all sides except for one side on which a hole 40 for delivering liquid as a liquid stream is provided. On that side, the cavity 36 is closed by an upper shielding part 41 and a lower shielding part 42 mounted to an exterior of the body 35.

Therefore, the upper shielding portion 41 and the lower shielding portion 42 form a side wall of the container.

The upper shielding portion 41 and the lower shielding portion 42 are mounted against a flat outer surface 43 (FIG. 18, FIG. 19) of the body 35, for example, by means of screws or other fasteners. In the illustrated embodiment, a groove 44 for accommodating one or more sealing elements (not shown) is formed (e.g., machined) in the outer surface 43.

A discharge passage is provided through the side wall of the container formed by the upper shielding portion 41 and the lower shielding portion 42. The discharge passage is defined between the upper shielding portion 41 and the lower shielding portion 42.

The drain channel (FIG. 25) comprises a flared section 45 and a slit 46. In use, the slit 46 forms the hole 40 for delivering the liquid passing through the drain channel as a liquid stream to wet one of the main surfaces of the substrate 1 held in the substrate holding device 2. The flared section 45 interconnects the slit 46 with the container interior 37 and flares outwardly in the height direction towards the container interior 37. This is achieved by providing the upper shielding part 41 and the lower shielding part 42 with respective inclined surfaces 47, 48.

The slit 46 has a height, a width and a depth when viewed from the outside of the second overflow device 34. The height between the hole 40 and the start of the expanded discharge channel section 45 is consistent. The width decreases with increasing depth in the direction from the hole to the container interior 37. In use, the slit 46 ensures that a sheet-like liquid flow is discharged.

A value of the height of the slit 46 may be in the range of 0.5 mm to 1.5 mm, for example in the range of 0.6 mm to 1.3 mm. A value of the depth may be at least 5 mm, for example in the range of 6 mm to 12 mm. A value of the ratio of the depth to the height may be in the range of 5 to 15, for example in the range of 9 mm to 11 mm, for example about 10.

In the illustrated embodiment, a flat section of a lower surface 49 of the upper shielding portion 41 delimits the slit 46. The slit 46 is defined by a central section 50 (FIG. 20, FIG. 21) that is retracted relative to a remaining portion of an upper surface 51 of the lower shielding portion 42. This central surface section 50 extends between two transverse edges 52a, 52b that are at an angle, for example, in the range of 20° to 40°, to a straight front edge 53. In use, this helps prevent the sheet-like liquid stream gushing from the hole 40 from shrinking laterally. The surface section front edge 53 is relatively sharp to ensure that a well-defined liquid jet gushing from the hole 40.

In an alternative embodiment, the upper surface 51 may be flat and the slit 46 defined by a recessed portion of the upper shielding portion 41.

When the upper shielding portion 41 and the lower shielding portion 42 are mounted to the main body 35, the height of the slit 46 can be relatively accurately set by placing a gauge between the upper shielding portion 41 and the lower shielding portion 42. After the upper shielding portion 41 and the lower shielding portion 42 are fixed in place, the gauge is removed to open the slit 46.

It should be understood that, viewed from above, the second overflow device 34 has an elongated shape, as do the body 35 and the container interior 37. Similarly, the hole 40 is elongated and extends in the longitudinal direction. In the illustrated embodiment, the container interior 37 is delimited by a planar bottom surface 54.

The overflow spaces 38, 39 are arranged on either side of the container interior 37, viewed in the longitudinal direction. Thus, in the illustrated embodiment there are two overflow openings 55, 56 (FIG. 19). The discharge channel formed by the expanded discharge channel section 45 and the slit 46 defines an inflow opening which is open only to the container interior 37. There is no direct liquid connection between the overflow spaces 38, 39 and the discharge channel.

The overflow spaces 38, 39 are separated from the container interior 37 by respective barriers 57, 58. The barriers 57, 58 of the illustrated embodiment are an integral part of the body 35. The barriers 57, 58 act as weirs to define overflow openings 55, 56 extending above respective tops 59, 60 of the barriers 57, 58. The tops 59, 60 are located at a higher liquid level (relative to the bottom surface 54 of the container interior 37) than the discharge channel. The tops 59, 60 are lower (relative to the bottom surface 54 of the container interior 37) than an upper edge of the side wall through which the discharge channel extends, at least where the side wall delimits the container interior 37. It should be remembered that in this embodiment, the side wall is formed by the upper shielding portion 41 and the lower shielding portion 42. Therefore, in use, the liquid level can have a free surface at a level higher than the peaks 59, 60, thereby allowing the liquid in the container interior 37 to overflow into the overflow spaces 38, 39.

In use, liquid is supplied to the second overflow device 34 by a pump (not shown) through a supply conduit connected to a supply conduit 61 via a fitting 62. The supply conduit 61 opens into the container interior 37 through a supply orifice 63 in the bottom surface 54 defining the container interior 37. Thus, there is a relatively steady upward flow of liquid as liquid overflows through the overflow openings 55, 56. Stagnation zones in the container interior 37 are largely avoided.

The second overflow device 34 is provided with outflow ports, each of which opens into one of the overflow spaces 38, 39 through a respective outflow orifice 64, 65 (FIG. 19). In the illustrated embodiment, the outflow port extends through a side wall which is located on a side opposite to the side on which the wall with the discharge channel is located. The outflow orifice 64, 65 has at least one lower edge section at a liquid level delimiting a bottom surface of the overflow space 38, 39 configured to be emptied. When the operation of the second overflow device 34 is stopped, the overflow space 38, 39 can thus be completely emptied.

The outflow port connects the overflow space 38, 39 to an outflow conduit section 66, 67 (FIG. 15, FIG. 16) connected to a return conduit 68 for returning the overflow liquid to the pump. In use, the rate at which the liquid is supplied is such that the liquid in the second overflow device 34 has a free surface at a substantially constant level, which is slightly higher than the level of the lowest level of the overflow openings 55, 56, which is determined by the position of the peaks 59, 60 of the barriers 57, 58.

The pressure of the liquid at the inlet opening defined by the discharge channel formed by the expanded discharge channel section 45 and the slit 46 is determined by the height difference between the level of the free surface of the liquid and the level of the discharge channel. However, there is a certain distance between the inlet opening and the bottom surface 54 delimiting the container interior 37. This improves the uniformity of the flow in the longitudinal direction. When the operation of the second overflow device 34 stops, the liquid should not continue to flow through the slit 46 for too long. To achieve this, the illustrated second overflow device 34 comprises a plurality of displacement bodies 69a to 69f (FIGS. 18, 19) which are arranged to reduce a volume of the container interior 37 that can be occupied by the liquid while leaving space adjacent thereto for the liquid to form a liquid column extending to the bottom surface 54. In the illustrated embodiment, the displacement bodies 69a to 69f are suspended above the bottom surface 54. Furthermore, the displacement bodies 69a to 69f are replaceable, in fact removable, without the need for replacement.

In an alternative embodiment, one or more displacement formations are provided which are an integral part of the body and protrude into the interior 37 of the container.

In the illustrated embodiment, the barriers 57, 58 present surfaces 70, 71 that bound the container interior 37 and slope inwardly (i.e., toward a center of the container interior 37) as the distance from the bottom surface 54 that bounds the container interior 37 increases. This also provides the effect of enabling liquid to stop flowing through the drain channel more quickly when the supply of liquid to the container interior 37 is stopped.

The substrate holding device 2 comprises a supporting structure 72 ( FIGS. 26 to 28 ) which, viewed perpendicularly to the main surface of the substrate 1 , is in the form of a frame surrounding the substrate 1 on all sides.

In the illustrated embodiment, the support structure 72 includes transverse protruding arms 73a, 73b for engaging a support member (not shown) so as to suspend the support structure 72 in a processing station of a processing apparatus. In the illustrated embodiment, claws 74a, 74b opening in a downward direction are formed at the distal ends of the transverse protruding arms 73a, 73b. These claws 74a, 74b can engage horizontally extending pins (not shown) of the respective support member. Examples of such support members are disclosed in WO 2020/260389 A1.

In an alternative embodiment, the support structure 72 may include a hook or similar device for suspending the support structure 72 on an overhead conveyor, which in turn includes a portion of a support member that is used to suspend the support structure 72 in a station of the processing equipment.

In the illustrated embodiment, the substrate holding device 2 includes first and second upper flow guide portions 75 and 76 and first and second lower flow guide portions 77a and 77b. The first and second lower flow guide portions 77a and 77b are identical so that only one will be described.

In use, the substrate 1 is held in a plane by the substrate holding device 2. The substrate 1 occupies an area of the plane framed by the support structure 72. The upper flow guide portions 75, 76 are supported by the support structure 72 and are located on opposite sides of the plane, as are the lower flow guide portions 77a, 77b.

The first upper flow guide portion 75 and the second upper flow guide portion 76 form respective arms of an upper clamping device, and the respective arms are used to clamp the substrate 1 close to the upper edge of the substrate 1. The lower flow guide portions 77a, 77b form respective arms of a lower clamping device, and the respective arms are used to clamp the substrate 1 close to a lower edge of the substrate 1.

To this end, the first upper flow guide part 75 is pivotably attached to the support structure 72 by means of protruding upper pivot stubs 78a, 78b (FIG. 29), which define a pivot axis parallel to the plane in which the substrate 1 is held. The upper pivot stubs 78a, 78b are received in holes (not shown in detail) in the support structure 72. The upper biasing means 79a, 79b (FIG. 36) push the first upper flow guide part 75 towards the second upper flow guide part 76 and apply a clamping force. In the illustrated embodiment, the upper biasing means 79a, 79b are coil springs. In alternative embodiments, they may include other types of resilient elements, gas springs, or magnets.

Each lower flow guide portion 77 is provided with protruding lower pivot stubs 80a, 80b (Figure 37), which are used to be pivotally attached to the support structure 72.

The protruding lower pivot stubs 80a, 80b define a pivot axis parallel to the plane in which the substrate 1 is held. The lower pivot stubs 80a, 80b are received in holes (not shown in detail) in the support structure 72. The lower biasing devices 81a, 81b (Figure 40) push the lower flow guide portions 77a, 77b toward each other and apply a clamping force. In the illustrated embodiment, the lower biasing devices 81a, 81b are also coil springs. In alternative embodiments, they may include other types of elastic elements, gas springs or magnets.

In use, the first upper flow guide portion 75 has an inner facing surface 82 facing inwardly relative to the plane in which the substrate 1 is configured to be held and an outer facing surface facing outwardly. The inner facing surface 82 includes a strip 83 for continuously engaging a major surface of the substrate 1 over the entire longitudinal extent of the strip 83. When the strip 83 contacts the (flat) major surface, a remaining portion of the inner facing surface 82 is spaced from that surface.

The strip 83 is provided with a groove or a similar surface structure for better bonding. In other words, the surface roughness of the strip 83 is higher than that of the other parts facing the inner surface 82.

The outwardly facing surface comprises an upper outwardly facing surface section 84 on which one of the first overflow devices 3a, 3b or the second overflow device 34 is arranged to guide the process liquid flow. The upper outwardly facing surface section 84 is flat. In use, the upper outwardly facing surface section 84 is oriented substantially parallel to the plane in which the substrate 1 is arranged to be held. This means that in use, the upper outwardly facing surface section 84 is substantially vertically oriented. The distance between the overflow device 3, 34 and the first upper flow guide part 75 is such that the liquid flow impinges on the upper outwardly facing surface section 84 from above at an acute angle.

A first lower outwardly facing surface section 85 extends from a fold 86, thereby forming a transition between a central section of the upper outwardly facing surface section 84 to a lower edge 87. The first lower outwardly facing surface section 85 is flat. The first lower outwardly facing surface section 85 faces downward, i.e., the lower edge 87 is closer to the plane in which the substrate 1 is held than the fold 86.

In the illustrated embodiment, the lower edge 87 is straight.

The lower edge 87 extends between the transverse edges of the first lower outwardly facing surface segment 85 , and the transverse edges meet the lower edge 87 at respective corners 88a , 88b of the first lower outwardly facing surface segment 85 .

The outwardly facing surface of the first upper flow guiding portion 75 further includes transversely downwardly facing surface segments 89a, 89b (FIGS. 28, 30, 31) spaced from the first lower outwardly facing surface segment 85 and adjacent to the upper outwardly facing surface segment 84. The transition is at the fold 86, but the transversely downwardly facing surface segments 89a, 89b face upward. Thus, each transversely downwardly facing surface segment 89a, 89b extends at an angle α (FIG. 31) less than 180° relative to the upper outwardly facing surface segment 84. The transversely downwardly facing surface segments 89a, 89b reinforce the first upper flow guiding portion 75 and guide the liquid away from the support structure 72.

The upper outwardly facing surface segment 84 is laterally bounded by facing surfaces 90a, 90b (Figs. 30, 31, 36) that face toward each other and extend at an angle (e.g., transversely) to the plane in which the substrate is configured to be held. The facing surfaces 90a, 90b direct liquid onto the lower outwardly facing surface segment 85.

In use, the second upper flow guide portion 76 (FIGS. 32-36) has an inner facing surface 91 facing inwardly and an outer facing surface facing outwardly relative to the plane in which the substrate 1 is configured to be held. The inner facing surface 91 includes a strip 92 for continuously engaging a major surface of the substrate 1 over the entire longitudinal extent of the strip 92. When the strip 92 contacts the (flat) major surface, a remaining portion of the inner facing surface 91 is spaced from that surface.

The strip 92 is provided with a groove or a similar surface structure for better bonding. In other words, the surface roughness of the strip 92 is higher than the surface roughness of the other parts facing the inner surface 91.

The outwardly facing surface comprises an upper outwardly facing surface section 93 on which one of the first overflow device 3a, 3b or the second overflow device 34 is arranged to guide the process liquid flow. The upper outwardly facing surface section 93 is flat. In use, the upper outwardly facing surface section 93 is oriented substantially parallel to the plane in which the substrate 1 is arranged to be held. Therefore, the upper outwardly facing surface section 93 is substantially vertically oriented. The distance between the overflow device 3, 34 and the second upper flow guide portion 76 is such that the liquid flow impinges on the upper outwardly facing surface section 93 from above at an acute angle.

A second lower outwardly facing surface section 94 extends from a fold 95, thereby forming a transition between a central section of the upper outwardly facing surface section 93 to a lower edge 96. The second lower outwardly facing surface section 94 is flat. The second lower outwardly facing surface section 94 faces downward, i.e., the lower edge 96 is closer to the plane in which the substrate 1 is held than the fold 95.

In the illustrated embodiment, the lower edge 96 is straight.

The lower edge 96 extends between the transverse edges of the first lower outwardly facing surface segment 94 , and the transverse edges meet the lower edge 96 at respective corners 97 a , 97 b of the first lower outwardly facing surface segment 94 .

The outwardly facing surface of the second upper flow guiding portion 76 further includes transversely downwardly facing outwardly facing surface segments 98a, 98b spaced apart from the centrally located second lower outwardly facing surface segment 94 and adjacent to the upper outwardly facing surface segment 93. The transition is at the fold 95, but the transversely downwardly facing outwardly facing surface segments 98a, 98b face upwardly. Thus, each transversely downwardly facing outwardly facing surface segment 98a extends to the upper outwardly facing surface segment 93 at an angle β (FIG. 35) less than 180°. This angle β is typically greater than 90°. The transversely downwardly facing outwardly facing surface segments 98a, 98b reinforce the second upper flow guiding portion 76 and direct the liquid away from the support structure 72.

The upper outwardly facing surface segment 93 is laterally bounded by facing surfaces 99a, 99b (FIG. 33) that face toward each other and extend at an angle (e.g., transversely) relative to the plane in which the substrate is configured to be held. The facing surfaces 99a, 99b direct liquid onto the lower outwardly facing surface segments 94, 98a, 98b.

In use, each lower flow guide portion 77 (FIGS. 37-40) has an inner facing surface 100 facing inwardly and an outer facing surface facing outwardly relative to the plane in which the substrate 1 is configured to be held. The inner facing surface 100 includes an elongated strip 101 for uninterruptedly engaging a major surface of the substrate 1 over the entire longitudinal extent of the strip 101. When the strip 101 contacts the (flat) major surface, a remaining portion of the inner facing surface 100 is spaced from the other surface of the substrate 1.

The strip 101 is provided with grooves or a similar surface structure for better bonding. In other words, the surface roughness of the strip 101 is higher than the surface roughness of the other parts facing the inner surface 100.

The outwardly facing surface comprises an inclined upper outwardly facing surface section 102 extending to an upper edge 103 and arranged towards the substrate 1 to be inclined inwardly in a plane held therein in the direction of the upper edge 103 .

In the illustrated embodiment, the inclined upper outwardly facing surface section 102 is flat.

The strip 101 extends longitudinally along the upper edge 103 and extends transversely to the upper edge 103 .

The upper edge 103 extends between the transverse edges of the first inclined upper outwardly facing surface segment 102 , the transverse edges meeting the upper edge 103 at respective first corners 104a , 104b of the inclined upper outwardly facing surface segment 102 .

The transverse edges extend from the first corners 104a, 104b to respective second corners 105a, 105b (Figure 37), wherein the inclined upper outwardly facing surface section 102 widens to increase the width of the inclined upper outwardly facing surface section 102.

The wider portion of the inclined upper outwardly facing surface section 102 is delimited laterally by facing surfaces 106 (only one of which is visible in the figure) that face toward each other and extend at an angle (e.g. transversely) relative to the plane in which the substrate 1 is configured to be held. The plate-like segments 107a, 107b defining the facing surfaces 106 are interconnected with a plate-like segment defining the inclined upper outwardly facing surface section 102 by respective webs 108a, 108b that extend at an angle relative to both of the plate-like segments.

A lower outwardly facing surface section 109 extends from a fold 110, thereby forming a transition between the inclined upper outwardly facing surface section 102 and the lower outwardly facing surface section 109. The lower outwardly facing surface section 109 is flat. In use, the lower outwardly facing surface section 109 is oriented generally parallel to the plane in which the substrate 1 is configured to be held. In either case, the inclined upper outwardly facing surface section 102 and the lower outwardly facing surface section 109 extend at an angle greater than 90° to each other. The lower outwardly facing surface section 109 primarily performs a protective function for keeping liquid away from the support structure.

In use, the processing liquid is directed onto the upper outwardly facing surface section 84, 93 of one of the first upper flow guide portion 75 and the second upper flow guide portion 76 and from there flows as an equilibrium film flow over the lower outwardly facing surface section 85, 94 onto the major surface of the substrate 1. The film flow then continues onto the inclined upper outwardly facing surface section 102 of the lower flow guide portion 77 before leaving the substrate holding device 2. The liquid is then collected for recirculation, optionally after filtering or another type of treatment. In essence, the entire exposed area of the major surface of the substrate 1 is wetted in a relatively uniform manner.

The present invention is not limited to the embodiments described above, which may be varied within the scope of the appended patent claims. For example, in an alternative embodiment, the second upper flow guide portion 76 may be pivotable relative to the support structure 72 in the same manner as the first upper flow guide portion 75.

1: substrate/flat substrate/vertically held flat substrate 2: substrate holding device 3: device/overflow device/first overflow device 3a: first overflow device 3b: first overflow device 4: body 5: container 6a: orifice/slender orifice/top wall orifice 6b: orifice/slender orifice/top wall orifice 6c: orifice/slender orifice/top wall orifice 6d: orifice/slender orifice/top wall orifice 7: cover 8: external surface/front external surface 9: slender recess 10: upper shielding portion/first shielding portion/second shielding portion 11: lower shielding portion/first shielding portion/second shielding portion 12: channel/equalizing channel 13: Lower surface/flat lower surface/lower surface of upper shielding part 14: Central section/flat central section/central section of upper surface of lower shielding part 15a: adjacent to flat transverse end section/section of upper surface of lower shielding part at transverse end 15b: adjacent to flat transverse end section/section of upper surface of lower shielding part at transverse end 16: Slit 17: Hole 18a: Transverse edge/transverse edge of central section of upper surface of lower shielding part 18b: Transverse edge/transverse edge of central section of upper surface of lower shielding part 19: Front edge/straight front edge/front edge of central section of upper surface of lower shielding part 20: Supply duct 21: Accessory/Supply accessory/Connection device 22a: Overflow port/Side wall overflow port/Overflow port in the side wall 22b: Overflow port/Side wall overflow port/Overflow port in the side wall 22c: Overflow port/Side wall overflow port/Overflow port in the side wall 22d: Overflow port/Side wall overflow port/Overflow port in the side wall 23: Flow guide 24: External surface/Rear external surface 25: Surface segment/Parallel flow guide surface segment 26: Inclined flow guide surface segment 27: Finger surface segment 28a: Winglet 28b: Winglet 29a: Upright surface segment 29b: Upright surface segment 30: overflow port/slender overflow port 31: conduit/overflow conduit 32: connection device/overflow conduit fitting 33: conduit/return pipe 34: device/overflow device/second overflow device 35: body 36: cavity 37: interior/container interior 38: overflow space/first overflow space 39: overflow space/second overflow space 40: hole 41: upper shielding part 42: lower shielding part 43: outer surface/flat outer surface/outer surface of body 44: groove/groove in outer surface 45: expansion section/expansion discharge channel section 46: slit 47: inclined surface/inclined surface on upper shielding part 48: Inclined surface/inclined surface on lower shielding portion 49: Lower surface/lower surface of upper shielding portion 50: Central section/central surface section 51: Upper surface/upper surface of lower shielding portion 52a: Transverse edge/edge of transverse surface section 52b: Transverse edge/edge of transverse surface section 53: Straight front edge/front edge of surface section 54: Bottom surface/flat bottom surface 55: Overflow/first overflow 56: Overflow/second overflow 57: Barrier/first barrier 58: Barrier/second barrier 59: Peak/peak of first barrier 60: Peak/peak of second barrier 61: Supply conduit 62: Accessory/supply accessory/connection device 63: Supply orifice 64: Overflow orifice/first overflow orifice 65: Overflow orifice/second overflow orifice 66: Overflow conduit section/first overflow conduit section 67: Overflow conduit section/second overflow conduit section 68: Return conduit 69a: Displacement body 69b: Displacement body 69c: Displacement body 69d: Displacement body 69e: Displacement body 69f: Displacement body 70: Surface/first barrier surface 71: Surface/second barrier surface 72: Support structure 73a: Arm/laterally protruding arm 73b: Arm/laterally protruding arm 74a: Claw 74b: Claw 75: Upper flow guide part/first upper flow guide part 76: Upper flow guide part/second upper flow guide part 77: Lower flow guide part 77a: Lower flow guide part/first lower flow guide part 77b: Lower flow guide part/second lower flow guide part 78a: Pivot stub/upper pivot stub 78b: Pivot stub/upper pivot stub 79a: Upper biasing device 79b: Upper biasing device 80a: Lower pivot stub/protruding lower pivot stub/pivot stub of lower flow guide part 80b: lower pivot stub/protruding lower pivot stub/pivot stub of lower flow guide section 81a: lower biasing device 81b: lower biasing device 82: inner surface facing/inner surface facing of first upper flow guide section 83: strip/strip facing inner surface of first upper flow guide section 84: upper outer surface facing section/upper outer surface facing section of first upper flow guide section 85: lower outer surface facing section/first lower outer surface facing section/lower outer surface facing section of first upper flow guide section 86: folded section/folded section in outer surface facing section of first upper flow guide section 87: lower edge/upper and lower edges of first upper flow guide section 88a: Corner/corner of the lower outward-facing surface section of the first upper flow guide section 88b: Corner/corner of the lower outward-facing surface section of the first upper flow guide section 89a: Laterally downward outward-facing surface section/laterally downward outward-facing surface section of the first upper flow guide section 89b: Laterally downward outward-facing surface section/laterally downward outward-facing surface section of the first upper flow guide section 90a: Facing surface/facing surface of the first upper flow guide section 90b: Facing surface/facing surface of the first upper flow guide section 91: Inward-facing surface/inward-facing surface of the second upper flow guide section 92: Stripe/strip of the inward-facing surface of the second upper flow guide section 93: Upper outward-facing surface section/upper outward-facing surface section of the second upper flow guide section 94: lower outward-facing surface section/first lower outward-facing surface section/second lower outward-facing surface section/lower outward-facing surface section of the second upper flow guide section 95: folded portion/folded portion in the outward-facing surface of the second upper flow guide section 96: lower edge/lower edge of the second upper flow guide section 97a: corner/corner of the lower outward-facing surface section of the second upper flow guide section 97b: corner/corner of the lower outward-facing surface section of the second upper flow guide section 98a: lower outward-facing surface section/laterally lower outward-facing surface section/laterally lower outward-facing surface section of the second upper flow guide section 98b: lower outward-facing surface segment/laterally lower outward-facing surface segment/laterally lower outward-facing surface segment of the second upper flow-guiding portion 99a: facing surface/facing surface of the second upper flow-guiding portion 99b: facing surface/facing surface of the second upper flow-guiding portion 100: facing surface/facing surface of the lower flow-guiding portion 101: strip/slim strip/strip facing the inner surface of the lower flow-guiding portion 102: inclined upper outward-facing surface segment 103: upper edge/upper edge of the lower flow-guiding portion 104a: first corner 104b: first corner 105a: second corner 105b: second corner 106: facing surface/facing surface of the lower flow-guiding portion 107a: Plate-shaped segment/plate-shaped segment of the lower flow-guiding portion 107b: Plate-shaped segment/plate-shaped segment of the lower flow-guiding portion 108a: Web 108b: Web 109: Lower outward-facing surface segment/lower outward-facing surface segment of the lower flow-guiding portion 110: Folding portion/folding portion in the outward-facing surface segment of the lower flow-guiding portion A-A: line B-B: line α: angle β: angle

The invention will be explained in more detail with reference to the accompanying drawings, in which: FIG. 1 is a cross-sectional view of a portion of a processing station of an apparatus for non-immersion wet chemical processing of a planar substrate; FIG. 2 is a perspective view of one of the two first overflow devices present in a portion of the station shown in FIG. 1 ; FIG. 3 is a second perspective view of the first overflow device of FIG. 2 ; FIG. 4 is a top view of the first overflow device of FIG. 2 and FIG. 3 with a cover removed; FIG. 5 is a cross-sectional view of the first overflow device along line A-A in FIG. 4 ; FIG. 6 is a side plan view of the first overflow device of FIG. 2 to FIG. 5 ; FIG. 7 is a cross-sectional view of the first overflow device along line B-B in FIG. 6 ; Figure 8 is a perspective view of a body forming a container in the first overflow device of Figures 2 to 7; Figure 9 is a perspective view of an upper shielding portion of the first overflow device of Figures 2 to 8; Figure 10 is a front plan view of the upper shielding portion of Figure 9; Figure 11 is a cross-sectional view of the upper shielding portion of Figures 9 and 10; Figure 12 is a perspective view of a lower shielding portion of the first overflow device of Figures 2 to 11; Figure 13 is a front plan view of the lower shielding portion of Figure 12; Figure 14 is a cross-sectional view of the lower shielding portion of Figures 12 and 13; Figure 15 is a perspective view of an alternative second overflow device for use in a portion of the station shown in Figure 1; Figure 16 is a rear view of the second overflow device shown in Figure 15; Figure 17 is a front view of the second overflow device shown in Figures 15 and 16; Figure 18 is a perspective view of a body forming a container in the second overflow device; Figure 19 is a front view of a portion of the second overflow device shown in Figure 18; Figure 20 is a perspective view of a lower shielding portion of the second overflow device; Figure 21 is a top view of the lower shielding portion shown in Figure 20; Figure 22 is a rear view of the lower shielding portion shown in Figures 20 and 21; Figure 23 is a perspective view of an upper shielding portion of the second overflow device; Figure 24 is a rear view of the upper shielding portion shown in Figure 23; Figure 25 is a cross-sectional view through a portion of a front wall of the second overflow device formed by the upper shielding portion and the lower shielding portion; FIG. 26 is a perspective view of a substrate holding device for use in the apparatus of FIG. 1 ; FIG. 27 is a front plan view of the substrate holding device of FIG. 26 ; FIG. 28 is a cross-sectional view along line A-A in FIG. 27 ; FIG. 29 is a perspective view of a first upper flow guide portion included in the substrate holding device of FIG. 26 to FIG. 28 ; FIG. 30 is a cross-sectional view of the first upper flow guide portion of FIG. 29 ; FIG. 31 is a detailed cross-sectional view of a portion of the first upper flow guide portion of FIG. 29 and FIG. 30 ; FIG. 32 is a perspective view of a second upper flow guide portion included in the substrate holding device of FIG. 26 to FIG. 28 ; FIG. 33 is a front plan view of the second upper flow guide portion of FIG. 32 ; Figure 34 is a cross-sectional view of the second upper flow guide portion of Figures 32 and 33; Figure 35 is a detailed cross-sectional view of a portion of the second upper flow guide portion of Figures 32 to 34; Figure 36 is a cross-sectional view of a portion of the first upper flow guide portion and the second upper flow guide portion of Figures 29 to 35 installed in the substrate holding device of Figures 26 to 27; Figure 37 is a perspective view of one of the two lower flow guide portions of equal shape included in the substrate holding device of Figures 26 to 35; Figure 38 is a cross-sectional view of the lower flow guide portion of Figure 37; Figure 39 is a detailed cross-sectional view of a portion of the lower flow guide portions of Figures 37 and 38; and FIG. 40 is a side plan view of one of the two lower flow guide portions as shown in FIGS. 37 to 39 installed in the substrate holding device of FIGS. 26 to 35 .

2: Substrate holding device

3a: First overflow device

3b: First overflow device

Claims (15)

A device for delivering a liquid stream to moisten a surface of a vertically held planar substrate (1), the device comprising a container (5) for storing the liquid, wherein the container (5) is provided with at least one discharge channel passing through a side wall of the container (5), each discharge channel defining a respective inflow opening open to an interior (37) of the container (5), The device is provided with at least one hole (17; 40) in an exterior of the device, the at least one hole is used to deliver the liquid passing through at least one of the discharge channels as the flow, and the device is provided with at least one delivery port, the at least one delivery port is open to the interior (37) of the container (5) and is in liquid communication with at least one connecting device (21; 62), the at least one connecting device is used to connect the device to a supply conduit (61) for supplying liquid to the device, and is characterized in that at least one overflow port is open to the interior (37) of the container (5) at a liquid level between the inflow port of the at least one discharge channel and a highest liquid level in the interior (37) of the container to conduct liquid out of the interior (37) of the container. A device as claimed in claim 1, wherein the number of such discharge channels is greater than 1. A device as claimed in claim 1 or 2, wherein the hole (17; 40) is formed by a slit (16; 46). A device as claimed in claim 2, wherein the discharge channels define respective outlet openings at ends of the discharge channels opposite to the respective inlet openings, and wherein the device comprises a channel (12) extending parallel to the slit (16) and in fluid communication with the slit (16), the outlet openings opening into the channel (12). A device as claimed in claim 3, wherein the discharge channels define respective outlet openings at the ends of the discharge channels opposite the respective inlet openings, wherein the device comprises at least one first shielding portion (10, 11) which is different from the container (5) and is mounted to an exterior of the container (5) in front of the respective outlet openings, and wherein the slit (16) is defined between the first shielding portion (10, 11) and one of a second shielding portion (10, 11) mounted to the exterior of the container (5) and a protrusion of the container (5). A device as claimed in claim 3, wherein the slit (16) has a height, a width and a depth when viewed from an exterior of the device, and wherein the width decreases with increasing depth from the hole (17) in the direction of the container (5). A device as claimed in claim 1 or 2, wherein the at least one overflow port comprises at least one overflow port (22a to 22d) extending through a side wall of the container (5). A device as claimed in claim 1 or 2, wherein the at least one overflow port comprises at least one overflow port (30) defined in a conduit (31) extending through at least a portion of the interior (37) of the container (5), for example at least one overflow port (30) opening into the interior (37) in a direction away from a bottom of the interior (37) of the container (5). A device as claimed in claim 1 or 2, wherein the at least one overflow port comprises at least one overflow port (30), the at least one overflow port being in liquid communication with a connection device (32) for connecting to a conduit (33), the conduit being used to carry liquid overflowing into the at least one overflow port (30) away from the device, wherein at least the interior (37) of the container (5) has an elongated shape when viewed from above, and wherein at least one (e.g. all) of the discharge channels extend through the side wall on a longer side of the interior (37) of the container (5). A system for delivering a liquid stream to moisten a surface of a vertically held planar substrate (1), comprising: at least one overflow device (3; 34), for example in the form of a device as claimed in any one of claims 1 to 9, wherein each overflow device (3; 34) comprises a container (5) for storing the liquid, wherein the container (5) is provided with at least one discharge channel passing through a side wall of the container (5), each discharge channel defining a respective inflow opening open to an interior (37) of the container (5), The overflow device (3; 34) is provided with at least one hole (17; 40) in an exterior of the device (3), the at least one hole being used to deliver liquid through at least one of the discharge channels as the flow; and a liquid supply system, which is used to supply liquid to the interior (37) of the container (5) of each overflow device (3; 34), characterized in that the system is configured to maintain a liquid level of a free surface of the liquid in the interior (37) of the container (5) of each overflow device (3; 34) at a liquid level between the inlet opening of the at least one discharge channel and a maximum liquid level of the interior (37) of the container (5). An apparatus for non-immersion wet chemical treatment of a planar substrate (1), comprising at least one substrate holding device (2), at least one processing station, at least one support for suspending the substrate holding device (2) at least in the processing station, and at least one system as claimed in claim 10, wherein the at least one system is configured in the processing station to direct a liquid flow onto at least one of the substrate (1) and the substrate holding device (2). A method for manufacturing a device (3) as claimed in claim 5 or 6, comprising: providing a container (5) and at least a first shielding portion (10, 11); placing a gauge having a dimension of a height defining a slit (16) viewed in the flow direction between the first shielding portion (10, 11) and a second shielding portion (10, 11) and one of the protruding portions of the container (5) to define the slit (16); fixing at least the first shielding portion (10, 11) to the container (5); and removing the gauge from the slit (16). A method for wetting a surface of a vertically held planar substrate (1), wherein a liquid is supplied to at least one device (3; 34) as claimed in any one of claims 1 to 9, and wherein the liquid is supplied to the device (3; 34) at a flow rate that is at least equal to a total flow rate of the liquid through at least one discharge channel. A method as claimed in claim 13, comprising: mounting a substrate (1) to a substrate holding device (2), the substrate holding device comprising a supporting structure (72) and at least one clamping device supported by the supporting structure (72) for holding the substrate (1) in a plane; suspending the supporting structure (72) to hold the substrate (1) in a vertical orientation; and directing a liquid flow to an upper outward-facing surface section (84) of an outward-facing surface of an upper flow guide portion (75) arranged on one side of the plane, the outward-facing surface facing outward relative to the plane to establish a film flow on a main surface of the substrate (1) on the upper outward-facing surface section (84). A method as claimed in claim 14, comprising using an apparatus as claimed in claim 11.