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TW202422868A - Display panel - Google Patents

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TW202422868A
TW202422868A TW111144284A TW111144284A TW202422868A TW 202422868 A TW202422868 A TW 202422868A TW 111144284 A TW111144284 A TW 111144284A TW 111144284 A TW111144284 A TW 111144284A TW 202422868 A TW202422868 A TW 202422868A
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Taiwan
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display panel
electrode pad
electrode
lower substrate
layer
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TW111144284A
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Chinese (zh)
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TWI826130B (en
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陳玠鳴
林彬成
簡伯儒
廖達文
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友達光電股份有限公司
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Priority to TW111144284A priority Critical patent/TWI826130B/en
Priority to CN202310372350.XA priority patent/CN116364725A/en
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Publication of TWI826130B publication Critical patent/TWI826130B/en
Publication of TW202422868A publication Critical patent/TW202422868A/en

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/441Interconnections, e.g. scanning lines
    • H10D86/443Interconnections, e.g. scanning lines adapted for preventing breakage, peeling or short circuiting
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H29/00Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
    • H10H29/10Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00
    • H10H29/14Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00 comprising multiple light-emitting semiconductor components
    • H10H29/142Two-dimensional arrangements, e.g. asymmetric LED layout

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  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Led Device Packages (AREA)

Abstract

A display panel includes a bottom substrate, a LED and an upper substrate. The bottom substrate includes a dielectric layer, a first electrode pad and a second electrode pad. The first electrode pad is on the dielectric layer. The second electrode pad is on the dielectric layer and adjacent to the first electrode pad, and the first electrode pad and the second electrode pad are used to provide different electrical potentials. The LED includes a first electrode and a second electrode on opposite sides of the LED. The first electrode is electrically connected to the first electrode pad. The upper substrate includes a carrier, upper bank structures and a transparent conductive layer. The carrier has a surface facing the bottom substrate. The upper bank structures are disposed at the surface. The transparent conductive layer covers the surface of the carrier and the upper bank structures. The transparent conductive layer electrically connects the second electrode pad and the second electrode.

Description

顯示面板Display Panel

本揭露的一些實施方式是關於一種顯示面板。Some embodiments of the present disclosure relate to a display panel.

發光二極體顯示器為現今常見的顯示器之一。一般而言,製造發光二極體顯示器時,需進行巨量轉移製程,以將大量的發光二極體晶片轉移至特定載板上。接著,在發光二極體晶片與載板上形成透明導電層,以將發光二極體晶片的電極與載板上的電極電性連接。當發光二極體晶片的電極與載板上的電極無法有效連接時,便容易造成發光二極體晶片失效。LED displays are one of the most common displays today. Generally speaking, when manufacturing LED displays, a large number of LED chips need to be transferred to a specific substrate through a mass transfer process. Then, a transparent conductive layer is formed on the LED chip and the substrate to electrically connect the electrodes of the LED chip with the electrodes on the substrate. When the electrodes of the LED chip and the electrodes on the substrate cannot be effectively connected, the LED chip is likely to fail.

本揭露的一些實施方式提供一種顯示面板,包含下部基板、發光二極體晶片與上部基板。下部基板包含介電層、第一電極墊與第二電極墊。第一電極墊位於介電層上。第二電極墊位於介電層上,相鄰第一電極墊,且第一電極墊與第二電極墊用以提供不同電位。發光二極體晶片包含位於相對兩側的第一電極與第二電極,第一電極電性連接第一電極墊。上部基板在下部基板與發光二極體晶片上,上部基板包含載板、上部堤岸結構與透明導電層。載板具有面向下部基板的表面。上部堤岸結構設置在表面。透明導電層覆蓋載板的表面與上部堤岸結構,透明導電層電性連接第二電極與第二電極墊。Some embodiments of the present disclosure provide a display panel, including a lower substrate, a light-emitting diode chip and an upper substrate. The lower substrate includes a dielectric layer, a first electrode pad and a second electrode pad. The first electrode pad is located on the dielectric layer. The second electrode pad is located on the dielectric layer, adjacent to the first electrode pad, and the first electrode pad and the second electrode pad are used to provide different potentials. The light-emitting diode chip includes a first electrode and a second electrode located on opposite sides, and the first electrode is electrically connected to the first electrode pad. The upper substrate is on the lower substrate and the light-emitting diode chip, and the upper substrate includes a carrier, an upper bank structure and a transparent conductive layer. The carrier has a surface facing the lower substrate. The upper bank structure is arranged on the surface. The transparent conductive layer covers the surface of the carrier and the upper bank structure, and the transparent conductive layer is electrically connected to the second electrode and the second electrode pad.

在一些實施方式中,上部堤岸結構的任一者的側面與載板的表面形成夾角,夾角小於或等於50度。In some embodiments, a side surface of any one of the upper bank structures forms an angle with a surface of the carrier plate, and the angle is less than or equal to 50 degrees.

在一些實施方式中,下部基板更包含複數個下部堤岸結構,排列於介電層上,下部堤岸結構在上部堤岸結構下。In some embodiments, the lower substrate further includes a plurality of lower bank structures arranged on the dielectric layer, wherein the lower bank structures are below the upper bank structures.

在一些實施方式中,顯示面板更包含導電材料,導電材料於下部基板的垂直投影與上部堤岸結構於下部基板的複數個垂直投影重疊,且電性連接透明導電層與第二電極墊。In some embodiments, the display panel further includes a conductive material, the vertical projection of the conductive material on the lower substrate overlaps with a plurality of vertical projections of the upper bank structure on the lower substrate, and electrically connects the transparent conductive layer and the second electrode pad.

在一些實施方式中,導電材料為金屬或導電膠。In some embodiments, the conductive material is metal or conductive glue.

在一些實施方式中,導電材料的高度大致等於下部堤岸結構的高度。In some embodiments, the height of the conductive material is approximately equal to the height of the lower bank structure.

在一些實施方式中,上部堤岸結構為吸光材料。In some embodiments, the upper bank structure is a light absorbing material.

在一些實施方式中,下部堤岸結構為反光材料。In some embodiments, the lower bank structure is a reflective material.

在一些實施方式中,顯示面板更包含反光層,位於上部堤岸結構與透明導電層之間。In some embodiments, the display panel further includes a reflective layer located between the upper bank structure and the transparent conductive layer.

在一些實施方式中,上部堤岸結構的其中一者包含上部與下部,上部堤岸結構的其中一者的下部相鄰下部堤岸結構,上部於下部基板的垂直投影與下部於下部基板的垂直投影重疊,下部於下部基板的垂直投影與第二電極墊於下部基板的垂直投影重疊。In some embodiments, one of the upper bank structures includes an upper portion and a lower portion, the lower portion of one of the upper bank structures is adjacent to the lower bank structure, a vertical projection of the upper portion on the lower substrate overlaps with a vertical projection of the lower portion on the lower substrate, and a vertical projection of the lower portion on the lower substrate overlaps with a vertical projection of the second electrode pad on the lower substrate.

在一些實施方式中,上部堤岸結構的其中一者包含上部與下部,上部堤岸結構的第二堤岸結構相鄰下部堤岸結構。In some embodiments, one of the upper bank structures includes an upper portion and a lower portion, and a second bank structure of the upper bank structure is adjacent to the lower bank structure.

綜上所述,本揭露的一些實施方式可用於減少顯示面板的透明導電層斷線的風險。具體而言,可降低透明導電層的坡度來降低透明導電層斷線的風險。如此一來,可減少發光二極體晶片因透明導電層斷線而失效的機率。In summary, some embodiments of the present disclosure can be used to reduce the risk of a transparent conductive layer break in a display panel. Specifically, the slope of the transparent conductive layer can be reduced to reduce the risk of a transparent conductive layer break. In this way, the probability of a LED chip failing due to a transparent conductive layer break can be reduced.

為使熟悉本揭露所屬技術領域之一般技藝者能更進一步了解本揭露,下文特列舉本揭露之較佳實施例,並配合所附圖式,詳細說明本揭露的構成內容及所欲達成之功效。In order to enable a person skilled in the art who is familiar with the technical field to which the present disclosure belongs to further understand the present disclosure, the following specifically lists the preferred embodiments of the present disclosure, and with the accompanying drawings, describes in detail the structure and intended effects of the present disclosure.

本揭露的一些實施方式可用於減少顯示面板的透明導電層斷線的風險。具體而言,可降低透明導電層的坡度來降低透明導電層斷線的風險。如此一來,可減少發光二極體晶片因透明導電層斷線而失效的機率。Some embodiments of the present disclosure can be used to reduce the risk of a transparent conductive layer break in a display panel. Specifically, the slope of the transparent conductive layer can be reduced to reduce the risk of a transparent conductive layer break. In this way, the probability of a light-emitting diode chip failing due to a transparent conductive layer break can be reduced.

第1圖繪示本揭露的一些實施方式的顯示面板10的橫截面視圖。顯示面板10包含下部基板100、發光二極體晶片200與上部基板300。下部基板100包含介電層110、第一電極墊120與第二電極墊130。上部基板300在下部基板100與發光二極體晶片200上,上部基板300包含載板310與透明導電層330。FIG. 1 shows a cross-sectional view of a display panel 10 according to some embodiments of the present disclosure. The display panel 10 includes a lower substrate 100, a light-emitting diode chip 200, and an upper substrate 300. The lower substrate 100 includes a dielectric layer 110, a first electrode pad 120, and a second electrode pad 130. The upper substrate 300 is on the lower substrate 100 and the light-emitting diode chip 200, and includes a carrier 310 and a transparent conductive layer 330.

下部基板100可為包含有驅動元件的面板。下部基板100包含多個由下往上堆疊的介電層110,介電層110可形成在基板140上。在一些實施方式中,如第1圖所示,下部基板100可包含主動元件150,例如薄膜電晶體(thin film transistor,TFT)。在另一些實施方式中,下部基板100也可包含其他的驅動元件例如微晶片(micro chip),又或者主動元件可以不位於如第1圖所示的位置,例如主動元件可位於基板140的下方,並以雙面走線的方式驅動顯示面板10。第一電極墊120位於介電層110上。第二電極墊130位於介電層110上,相鄰第一電極墊120,且第一電極墊120與第二電極墊130用以提供不同電位。在一些實施方式中,下部基板100包含在介電層110之間的介電層112,且介電層112可由氮化矽製成。下部基板100更包含複數個下部堤岸結構160,排列於介電層110上。The lower substrate 100 may be a panel including a driving element. The lower substrate 100 includes a plurality of dielectric layers 110 stacked from bottom to top, and the dielectric layers 110 may be formed on a substrate 140. In some embodiments, as shown in FIG. 1 , the lower substrate 100 may include an active element 150, such as a thin film transistor (TFT). In other embodiments, the lower substrate 100 may also include other driving elements such as a micro chip, or the active element may not be located at the position shown in FIG. 1 , for example, the active element may be located below the substrate 140 and drive the display panel 10 in a double-sided routing manner. The first electrode pad 120 is located on the dielectric layer 110. The second electrode pad 130 is located on the dielectric layer 110, adjacent to the first electrode pad 120, and the first electrode pad 120 and the second electrode pad 130 are used to provide different potentials. In some embodiments, the lower substrate 100 includes a dielectric layer 112 between the dielectric layers 110, and the dielectric layer 112 can be made of silicon nitride. The lower substrate 100 further includes a plurality of lower bank structures 160 arranged on the dielectric layer 110.

發光二極體晶片200包含位於相對兩側的第一電極210與第二電極220,第一電極210電性連接第一電極墊120,且第一電極210與第二電極220具有磊晶層230。具體而言,下部基板100可更包含第一通孔件170與第二通孔件180。第一通孔件170與第二通孔件180位於介電層110中。第一通孔件170電性連接主動元件150與發光二極體晶片200的第一電極210。第二通孔件180電性連接接地電極(未繪示)與發光二極體晶片200A的第二電極220。應注意,雖然第1圖繪示在不同介電層110上的第二通孔件180不互連,但在不同於第1圖所繪示的橫截面上,在不同介電層110上的第二通孔件180仍會互相連接。The LED chip 200 includes a first electrode 210 and a second electrode 220 located at opposite sides, the first electrode 210 is electrically connected to the first electrode pad 120, and the first electrode 210 and the second electrode 220 have an epitaxial layer 230. Specifically, the lower substrate 100 may further include a first through-hole component 170 and a second through-hole component 180. The first through-hole component 170 and the second through-hole component 180 are located in the dielectric layer 110. The first through-hole component 170 electrically connects the active element 150 and the first electrode 210 of the LED chip 200. The second through-hole component 180 electrically connects the ground electrode (not shown) and the second electrode 220 of the LED chip 200A. It should be noted that although FIG. 1 shows that the second via members 180 on different dielectric layers 110 are not interconnected, in a cross-section different from that shown in FIG. 1 , the second via members 180 on different dielectric layers 110 are still connected to each other.

上部基板300可為將發光二極體晶片200的第二電極220與下部基板100的第二電極墊130電性連接的基板。上部基板300包含載板310,載板310具有面向下部基板100的表面310S。複數個上部堤岸結構320設置在表面310S。透明導電層330覆蓋載板310的表面310S與上部堤岸結構320,透明導電層330電性連接第二電極220,並藉由導電材料400電性連接第二電極220。換句話說,透明導電層330電性連接第二電極220與第二電極墊130。The upper substrate 300 may be a substrate that electrically connects the second electrode 220 of the LED chip 200 and the second electrode pad 130 of the lower substrate 100. The upper substrate 300 includes a carrier 310, and the carrier 310 has a surface 310S facing the lower substrate 100. A plurality of upper bank structures 320 are disposed on the surface 310S. The transparent conductive layer 330 covers the surface 310S of the carrier 310 and the upper bank structures 320, and the transparent conductive layer 330 is electrically connected to the second electrode 220, and is electrically connected to the second electrode 220 through the conductive material 400. In other words, the transparent conductive layer 330 electrically connects the second electrode 220 and the second electrode pad 130.

下部基板100的下部堤岸結構160在上部堤岸結構320下。在一些實施方式中,下部堤岸結構160於下部基板100的垂直投影重疊於上部堤岸結構320於下部基板100的垂直投影。更具體而言,上部堤岸結構320包含第一堤岸結構322與第二堤岸結構324。第一堤岸結構322於下部基板100的垂直投影與下部堤岸結構160於下部基板100的複數個垂直投影重疊,第二堤岸結構324於下部基板100的垂直投影與第二電極墊130於下部基板100的垂直投影重疊。第一堤岸結構322的高度H1與第二堤岸結構324的高度H2相同。發光二極體晶片200的高度H4等於在載板310上的透明導電層330與第一電極墊120之間的距離,以確保發光二極體晶片200可同時電性連接透明導電層330與第一電極墊120。The lower bank structure 160 of the lower substrate 100 is below the upper bank structure 320. In some embodiments, the vertical projection of the lower bank structure 160 on the lower substrate 100 overlaps the vertical projection of the upper bank structure 320 on the lower substrate 100. More specifically, the upper bank structure 320 includes a first bank structure 322 and a second bank structure 324. The vertical projection of the first bank structure 322 on the lower substrate 100 overlaps with a plurality of vertical projections of the lower bank structure 160 on the lower substrate 100, and the vertical projection of the second bank structure 324 on the lower substrate 100 overlaps with the vertical projection of the second electrode pad 130 on the lower substrate 100. The height H1 of the first bank structure 322 is the same as the height H2 of the second bank structure 324. The height H4 of the LED chip 200 is equal to the distance between the transparent conductive layer 330 and the first electrode pad 120 on the carrier 310 to ensure that the LED chip 200 can be electrically connected to the transparent conductive layer 330 and the first electrode pad 120 at the same time.

顯示面板10更包含導電材料400,導電材料400於下部基板100的垂直投影與上部堤岸結構320於下部基板100的垂直投影重疊,且電性連接透明導電層330與第二電極墊130。導電材料400的高度H5等於在上部堤岸結構320上的透明導電層330與第二電極墊130之間的距離,以確保導電材料400可同時電性連接透明導電層330與第二電極墊130。在一些實施方式中,導電材料400為金屬或導電膠。舉例而言,第1圖中,導電材料400為導電膠,且導電材料400由密封膠402與導電球404組成。導電球404均勻散佈在密封膠402中。密封膠402可為丙烯酸-環氧樹酯、光起始劑、熱硬化劑、耦合劑、填充劑、其組合或類似物。導電球404可為表面上依序塗佈鎳層與金層的球狀物,並可用於電性連接第二電極墊130與透明導電層330。The display panel 10 further includes a conductive material 400, the vertical projection of the conductive material 400 on the lower substrate 100 overlaps with the vertical projection of the upper bank structure 320 on the lower substrate 100, and electrically connects the transparent conductive layer 330 and the second electrode pad 130. The height H5 of the conductive material 400 is equal to the distance between the transparent conductive layer 330 on the upper bank structure 320 and the second electrode pad 130, so as to ensure that the conductive material 400 can electrically connect the transparent conductive layer 330 and the second electrode pad 130 at the same time. In some embodiments, the conductive material 400 is metal or conductive glue. For example, in FIG. 1, the conductive material 400 is conductive glue, and the conductive material 400 is composed of a sealant 402 and a conductive ball 404. The conductive balls 404 are uniformly dispersed in the sealant 402. The sealant 402 may be acrylic-epoxy resin, photoinitiator, thermosetting agent, coupling agent, filler, combination thereof or the like. The conductive balls 404 may be spherical objects with a nickel layer and a gold layer sequentially coated on the surface, and may be used to electrically connect the second electrode pad 130 and the transparent conductive layer 330.

因為發光二極體晶片200的高度H4實質上等於在載板310上的透明導電層330與第一電極墊120之間的距離,且透明導電層330僅形成在上部堤岸結構320的表面,因此透明導電層330形成的坡度較小。上部堤岸結構320與第二電極墊130之間的電性連接是透過導電材料400,使得透明導電層330較不易因坡度太陡而斷裂,而使發光二極體晶片200失效。在一些實施方式中,上部堤岸結構320的任一者的側面320S與載板310的表面310S形成夾角a1,夾角a1小於或等於50度。當夾角a1小於或等於50度時,透明導電層330的坡度較小,因此較不容易斷裂。反之,當夾角a1大於50度時,則會增加透明導電層330斷裂的機率。Because the height H4 of the LED chip 200 is substantially equal to the distance between the transparent conductive layer 330 and the first electrode pad 120 on the carrier 310, and the transparent conductive layer 330 is only formed on the surface of the upper bank structure 320, the slope formed by the transparent conductive layer 330 is relatively small. The electrical connection between the upper bank structure 320 and the second electrode pad 130 is through the conductive material 400, so that the transparent conductive layer 330 is less likely to break due to a too steep slope, thereby causing the LED chip 200 to fail. In some embodiments, the side surface 320S of any one of the upper bank structures 320 forms an angle a1 with the surface 310S of the carrier 310, and the angle a1 is less than or equal to 50 degrees. When the angle a1 is less than or equal to 50 degrees, the slope of the transparent conductive layer 330 is smaller, so it is less likely to break. On the contrary, when the angle a1 is greater than 50 degrees, the probability of the transparent conductive layer 330 breaking will increase.

在一些實施方式中,上部堤岸結構320與下部堤岸結構160可使用適合的材料製成,且上部堤岸結構320與下部堤岸結構160的形狀經過設計,以強化顯示面板10的視覺體驗。在部分實施例中,上部堤岸結構320與下部堤岸結構160可由不同材料製成。舉例而言,下部堤岸結構160可為反光材料,以將發光二極體晶片200往側邊發出的光往上反射,以提高顯示面板10的向上出光效率。上部堤岸結構320可為吸光材料,以吸收從顯示面板10的外部射入的環境光,以降低由環境光對顯示面板10所造成的干擾。此外,上部堤岸結構320可為倒梯形,下部堤岸結構160可為正梯形。舉例來說,上部堤岸結構320的寬度往下部基板100逐漸變小,而下部堤岸結構160的寬度往下部基板100逐漸增加。因此,下部堤岸結構160的正梯形的傾斜側面有助於將發光二極體晶片200往側邊發出的光往上反射。上部堤岸結構320的倒梯形具有較大的上表面,也能夠更有效地吸收從顯示面板10的外部射入的環境光。在一些實施方式中,上部堤岸結構320可由黑色的有機材料形成,且遮蔽率(optical density)不小於1.0,例如遮蔽率可為2.0。下部堤岸結構160可由白色的有機材料形成,且反射率不低於50%。例如反射率可大於或等於70%。上部堤岸結構320與下部堤岸結構160也可使用可壓縮材料製成。在一些實施方式中,上部堤岸結構320與下部堤岸結構160的材料的壓縮率在80%至90%之間。因此,當上部基板300與下部基板100組裝在一起之前,上部堤岸結構320的厚度與下部堤岸結構160的厚度加總較大。當上部基板300與下部基板100組裝在一起之後,上部堤岸結構320的厚度與下部堤岸結構160的厚度被壓縮,使得上部基板300的透明導電層330能確實地接觸導電材料400。In some embodiments, the upper bank structure 320 and the lower bank structure 160 may be made of suitable materials, and the shapes of the upper bank structure 320 and the lower bank structure 160 are designed to enhance the visual experience of the display panel 10. In some embodiments, the upper bank structure 320 and the lower bank structure 160 may be made of different materials. For example, the lower bank structure 160 may be a reflective material to reflect the light emitted to the side by the LED chip 200 upward to improve the upward light output efficiency of the display panel 10. The upper bank structure 320 may be a light-absorbing material to absorb the ambient light incident from the outside of the display panel 10 to reduce the interference caused by the ambient light to the display panel 10. In addition, the upper bank structure 320 may be an inverted trapezoid, and the lower bank structure 160 may be a regular trapezoid. For example, the width of the upper bank structure 320 gradually decreases toward the lower substrate 100, while the width of the lower bank structure 160 gradually increases toward the lower substrate 100. Therefore, the inclined side surface of the regular trapezoid of the lower bank structure 160 helps to reflect the light emitted to the side of the LED chip 200 upward. The inverted trapezoid of the upper bank structure 320 has a larger upper surface and can also more effectively absorb the ambient light incident from the outside of the display panel 10. In some embodiments, the upper bank structure 320 may be formed of a black organic material, and the optical density is not less than 1.0, for example, the optical density may be 2.0. The lower bank structure 160 may be formed of a white organic material, and the reflectivity may be not less than 50%. For example, the reflectivity may be greater than or equal to 70%. The upper bank structure 320 and the lower bank structure 160 may also be made of a compressible material. In some embodiments, the compression rate of the materials of the upper bank structure 320 and the lower bank structure 160 is between 80% and 90%. Therefore, before the upper substrate 300 and the lower substrate 100 are assembled together, the sum of the thickness of the upper bank structure 320 and the thickness of the lower bank structure 160 is greater. When the upper substrate 300 and the lower substrate 100 are assembled together, the thickness of the upper bank structure 320 and the thickness of the lower bank structure 160 are compressed, so that the transparent conductive layer 330 of the upper substrate 300 can reliably contact the conductive material 400.

顯示面板10更包含黏接層500。黏接層500在上部基板300與下部基板100之間,以用於黏接上部基板300與下部基板100並提供支撐力。在一些實施方式中,黏接層500可由摻雜少量的支撐物的密封膠製成。黏接層500的密封膠可為丙烯酸-環氧樹酯、光起始劑、熱硬化劑、耦合劑、填充劑、其組合或類似物,以黏接上部基板300與下部基板100。支撐物則可為纖維或矽球等可提供支撐力的物件,且可依照上部基板300與下部基板100之間的目標高度選擇支撐物的尺寸。The display panel 10 further includes an adhesive layer 500. The adhesive layer 500 is between the upper substrate 300 and the lower substrate 100 to bond the upper substrate 300 and the lower substrate 100 and provide support. In some embodiments, the adhesive layer 500 may be made of a sealant doped with a small amount of a support. The sealant of the adhesive layer 500 may be an acrylic-epoxy resin, a photoinitiator, a thermosetting agent, a coupling agent, a filler, a combination thereof, or the like to bond the upper substrate 300 and the lower substrate 100. The support may be an object such as fiber or a silicon ball that can provide support, and the size of the support may be selected according to the target height between the upper substrate 300 and the lower substrate 100.

第2圖繪示第1圖的發光二極體晶片200的橫截面視圖。發光二極體晶片200包含第一電極210、第二電極220、磊晶層230與絕緣層240。第一電極210包含第一層212與第二層214,且第二層214在第一層212與磊晶層230之間。第一電極210的第一層212與第二層214可由導體製成。在一些實施方式中,第一層212可由鎳、錫、金或其組合製成。第二層214可由鋁製成。第二電極220可由透明導電層,例如氧化銦錫(ITO)製成,使得發光二極體晶片200往上發光時(即朝著第1圖與第2圖的第二電極220的方向),光仍可穿透第二電極220。磊晶層230在第一電極210與第二電極220之間。磊晶層230的寬度可隨著越靠近第二電極220而越寬,亦即磊晶層230可為正梯形。磊晶層230可包含N型半導體層232、多重量子井(Multiple-Quantum Well,MQW)層234與P型半導體層236。在一些實施方式中,N型半導體層232與P型半導體層236可分別為N型摻雜氮化鎵與P型摻雜氮化鎵。絕緣層240在磊晶層230的側壁上並包覆一部分的第二電極220。在一些實施方式中,絕緣層240可為氧化層。FIG. 2 shows a cross-sectional view of the LED chip 200 of FIG. 1. The LED chip 200 includes a first electrode 210, a second electrode 220, an epitaxial layer 230, and an insulating layer 240. The first electrode 210 includes a first layer 212 and a second layer 214, and the second layer 214 is between the first layer 212 and the epitaxial layer 230. The first layer 212 and the second layer 214 of the first electrode 210 can be made of a conductor. In some embodiments, the first layer 212 can be made of nickel, tin, gold, or a combination thereof. The second layer 214 can be made of aluminum. The second electrode 220 may be made of a transparent conductive layer, such as indium tin oxide (ITO), so that when the LED chip 200 emits light upward (i.e., toward the second electrode 220 in FIG. 1 and FIG. 2), light can still penetrate the second electrode 220. The epitaxial layer 230 is between the first electrode 210 and the second electrode 220. The width of the epitaxial layer 230 may become wider as it gets closer to the second electrode 220, that is, the epitaxial layer 230 may be a positive trapezoid. The epitaxial layer 230 may include an N-type semiconductor layer 232, a multiple-quantum well (MQW) layer 234, and a P-type semiconductor layer 236. In some embodiments, the N-type semiconductor layer 232 and the P-type semiconductor layer 236 may be N-type doped gallium nitride and P-type doped gallium nitride, respectively. The insulating layer 240 is on the sidewall of the epitaxial layer 230 and covers a portion of the second electrode 220. In some embodiments, the insulating layer 240 may be an oxide layer.

第3A圖繪示第1圖的上部基板300的仰視圖。第3B圖繪示第1圖的下部基板100的俯視圖。在第3A圖中,上部基板300的上部堤岸結構320沿著第一方向D1排列於載板310的表面310S。複數個上部堤岸結構320(例如但不限於3個)可組成一個單位,且每單位上部堤岸結構320之間具有一個較大的空間。該較大的空間用於容納發光二極體晶片200。透明導電層330覆蓋載板310的表面310S與上部堤岸結構320。FIG. 3A shows a bottom view of the upper substrate 300 of FIG. 1. FIG. 3B shows a top view of the lower substrate 100 of FIG. 1. In FIG. 3A, the upper bank structure 320 of the upper substrate 300 is arranged on the surface 310S of the carrier 310 along the first direction D1. A plurality of upper bank structures 320 (for example but not limited to 3) can be formed into a unit, and there is a larger space between each unit of upper bank structures 320. The larger space is used to accommodate the LED chip 200. The transparent conductive layer 330 covers the surface 310S of the carrier 310 and the upper bank structure 320.

在第3B圖中,下部基板100的下部堤岸結構160沿著第一方向D1排列於介電層110上,且每個下部堤岸結構160之間的距離大致相同。每個下部堤岸結構160皆可對應至其中一個上部堤岸結構320。發光二極體晶片200可位於兩個相鄰的下部堤岸結構160之間,且發光二極體晶片200可被容納在上部堤岸結構320之間的空間內。在一些實施方式中,發光二極體晶片200可包含發出不同色光的發光二極體晶片200R、200B與200G,發光二極體晶片200R、200B與200G也可沿著第一方向D1排列並各自位於兩個相鄰的下部堤岸結構160之間。導電材料400也可位於兩個相鄰的下部堤岸結構160之間,且導電材料400對應至其中一個上部堤岸結構320。黏接層500位於下部基板100的外圍,因此可用於黏合下部基板100與上部基板300。In FIG. 3B , the lower bank structures 160 of the lower substrate 100 are arranged on the dielectric layer 110 along the first direction D1, and the distance between each lower bank structure 160 is substantially the same. Each lower bank structure 160 may correspond to one of the upper bank structures 320. The LED chip 200 may be located between two adjacent lower bank structures 160, and the LED chip 200 may be accommodated in the space between the upper bank structures 320. In some embodiments, the LED chip 200 may include LED chips 200R, 200B, and 200G that emit light of different colors. The LED chips 200R, 200B, and 200G may also be arranged along the first direction D1 and each located between two adjacent lower bank structures 160. The conductive material 400 may also be located between two adjacent lower bank structures 160, and the conductive material 400 corresponds to one of the upper bank structures 320. The adhesive layer 500 is located on the periphery of the lower substrate 100, and thus can be used to bond the lower substrate 100 and the upper substrate 300.

第4圖至第7圖繪示製造顯示面板10的製程的橫截面視圖。在第4圖中,提供下部基板100’。4 to 7 are cross-sectional views showing the process of manufacturing the display panel 10. In FIG. 4 , a lower substrate 100 ′ is provided.

在第5圖中,在下部基板100’上形成下部堤岸結構160以形成下部基板100,且下部堤岸結構160不覆蓋第一電極墊120與第二電極墊130。下部基板100的相關細節如第1圖所述,因此在此不再贅述。In FIG. 5 , a lower bank structure 160 is formed on the lower substrate 100′ to form the lower substrate 100, and the lower bank structure 160 does not cover the first electrode pad 120 and the second electrode pad 130. The relevant details of the lower substrate 100 are as described in FIG. 1 , and thus will not be repeated here.

在第6圖中,將發光二極體晶片200轉移在第一電極墊120上,使下部基板100的第一電極墊120連接至發光二極體晶片200的第一電極210。In FIG. 6 , the LED chip 200 is transferred onto the first electrode pad 120 , so that the first electrode pad 120 of the lower substrate 100 is connected to the first electrode 210 of the LED chip 200 .

在第7圖中,在下部基板100的第二電極墊130上形成導電材料400並在下部基板100的外圍形成黏接層500,接著放置上部基板300於下部基板100上,使下部基板100的第二電極墊130藉由導電材料400與透明導電層330連接至發光二極體晶片200的第二電極220,以形成顯示面板10。由於透明導電層330已事先形成在上部基板300上,因此當直接將上部基板300置於下部基板100上時,即可同時連接第二電極墊130與第二電極220,而不用在發光二極體晶片200的周圍形成用於電性連接的額外材料,以避免形成額外材料而造成發光二極體晶片200脫落。In FIG. 7 , a conductive material 400 is formed on the second electrode pad 130 of the lower substrate 100 and an adhesive layer 500 is formed on the periphery of the lower substrate 100 , and then the upper substrate 300 is placed on the lower substrate 100 , so that the second electrode pad 130 of the lower substrate 100 is connected to the second electrode 220 of the LED chip 200 through the conductive material 400 and the transparent conductive layer 330 to form a display panel 10 . Since the transparent conductive layer 330 has been formed on the upper substrate 300 in advance, when the upper substrate 300 is directly placed on the lower substrate 100, the second electrode pad 130 and the second electrode 220 can be connected at the same time without forming additional materials for electrical connection around the LED chip 200 to avoid the LED chip 200 falling off due to the formation of additional materials.

第8圖繪示本揭露的另一些實施方式的顯示面板10A的橫截面視圖。顯示面板10A與第1圖的顯示面板10類似,兩者的差別在於顯示面板10A的發光二極體晶片200的結構與顯示面板10的發光二極體晶片200的結構不同、透明導電層330的位置不同與導電材料400的位置不同。具體而言,第8圖的顯示面板10A的發光二極體晶片200的第一電極210藉由透明導電層330電性連接第一電極墊120,且顯示面板10A的發光二極體晶片200的第二電極220直接接觸並電性連接第二電極墊130。第1圖的顯示面板10的發光二極體晶片200的第一電極210直接接觸並電性連接第一電極墊120,且顯示面板10A的發光二極體晶片200的第二電極220藉由透明導電層330電性連接第二電極墊130。此外,第8圖的顯示面板10A的上部堤岸結構320的第二堤岸結構324於下部基板100的垂直投影與第一電極墊120於下部基板100的垂直投影重疊,而第1圖的顯示面板10的上部堤岸結構320的第二堤岸結構324於下部基板100的垂直投影與第二電極墊130於下部基板100的垂直投影重疊。在部分實施例中,至少一個上部堤岸結構320和下部堤岸結構160直接接觸。FIG. 8 shows a cross-sectional view of a display panel 10A of other embodiments of the present disclosure. The display panel 10A is similar to the display panel 10 of FIG. 1, and the difference between the two is that the structure of the LED chip 200 of the display panel 10A is different from the structure of the LED chip 200 of the display panel 10, the position of the transparent conductive layer 330 is different from the position of the conductive material 400. Specifically, the first electrode 210 of the LED chip 200 of the display panel 10A of FIG. 8 is electrically connected to the first electrode pad 120 through the transparent conductive layer 330, and the second electrode 220 of the LED chip 200 of the display panel 10A directly contacts and is electrically connected to the second electrode pad 130. The first electrode 210 of the LED chip 200 of the display panel 10 of FIG. 1 directly contacts and is electrically connected to the first electrode pad 120, and the second electrode 220 of the LED chip 200 of the display panel 10A is electrically connected to the second electrode pad 130 via the transparent conductive layer 330. In addition, the vertical projection of the second bank structure 324 of the upper bank structure 320 of the display panel 10A of FIG. 8 on the lower substrate 100 overlaps with the vertical projection of the first electrode pad 120 on the lower substrate 100, and the vertical projection of the second bank structure 324 of the upper bank structure 320 of the display panel 10 of FIG. 1 on the lower substrate 100 overlaps with the vertical projection of the second electrode pad 130 on the lower substrate 100. In some embodiments, at least one upper bank structure 320 and a lower bank structure 160 are in direct contact.

第9圖繪示第8圖的發光二極體晶片200的橫截面視圖。發光二極體晶片200包含第一電極210、第二電極220、磊晶層230與絕緣層240。第一電極210可由透明導電層,例如氧化銦錫(ITO)製成,使得發光二極體晶片200往上發光時(即朝著第8圖與第9圖的第一電極210的方向),光仍可穿透第一電極210。第二電極220包含第一層222與第二層224,且第二層224在第一層222與磊晶層230之間。第二電極220的第一層222與第二層224可由導體製成。在一些實施方式中,第一層222可由鎳、錫、金或其組合製成。第二層224可由鋁製成。磊晶層230在第一電極210與第二電極220之間。磊晶層230的寬度可隨著越靠近第一電極210而越寬,亦即磊晶層230可為倒梯形。磊晶層230可包含N型半導體層232、多重量子井(Multiple-Quantum Well,MQW)層234與P型半導體層236。在一些實施方式中,N型半導體層232與P型半導體層236可分別為N型摻雜氮化鎵與P型摻雜氮化鎵。絕緣層240在磊晶層230的側壁上並包覆一部分的第一電極210。在一些實施方式中,絕緣層240可為氧化層。FIG. 9 shows a cross-sectional view of the LED chip 200 of FIG. 8. The LED chip 200 includes a first electrode 210, a second electrode 220, an epitaxial layer 230, and an insulating layer 240. The first electrode 210 can be made of a transparent conductive layer, such as indium tin oxide (ITO), so that when the LED chip 200 emits light upward (i.e., toward the direction of the first electrode 210 in FIG. 8 and FIG. 9), light can still penetrate the first electrode 210. The second electrode 220 includes a first layer 222 and a second layer 224, and the second layer 224 is between the first layer 222 and the epitaxial layer 230. The first layer 222 and the second layer 224 of the second electrode 220 may be made of a conductor. In some embodiments, the first layer 222 may be made of nickel, tin, gold or a combination thereof. The second layer 224 may be made of aluminum. The epitaxial layer 230 is between the first electrode 210 and the second electrode 220. The width of the epitaxial layer 230 may be wider as it is closer to the first electrode 210, that is, the epitaxial layer 230 may be an inverted trapezoid. The epitaxial layer 230 may include an N-type semiconductor layer 232, a Multiple-Quantum Well (MQW) layer 234 and a P-type semiconductor layer 236. In some embodiments, the N-type semiconductor layer 232 and the P-type semiconductor layer 236 may be N-type doped gallium nitride and P-type doped gallium nitride, respectively. The insulating layer 240 is on the sidewall of the epitaxial layer 230 and covers a portion of the first electrode 210. In some embodiments, the insulating layer 240 may be an oxide layer.

第10A圖繪示第8圖的上部基板300的仰視圖。第10B圖繪示第8圖的下部基板100的俯視圖。在第10A圖中,上部基板300的上部堤岸結構320沿著第一方向D1排列於載板310的表面310S。複數個上部堤岸結構320(例如但不限於3個)可組成一個單位,且每單位上部堤岸結構320之間具有一個較大的空間。該較大的空間用於容納發光二極體晶片200。透明導電層330覆蓋載板310的表面310S與上部堤岸結構320。與第3A圖的上部基板300不同的是,第3A圖的上部基板300的透明導電層330負責將發光二極體晶片200的第二電極220連接至第二電極墊130(亦即接地電極),因此透明導電層330可覆蓋全部的上部堤岸結構320。另一方面,第10A圖的上部基板300的透明導電層330負責將發光二極體晶片200的第一電極210連接至第一電極墊120與主動元件150,因此上部基板300包含多個透明導電層330,每個透明導電層330覆蓋部分的上部堤岸結構320與用於容納發光二極體晶片200的空間。透明導電層330也可不覆蓋部分的上部堤岸結構320。FIG. 10A is a bottom view of the upper substrate 300 of FIG. 8 . FIG. 10B is a top view of the lower substrate 100 of FIG. 8 . In FIG. 10A , the upper bank structure 320 of the upper substrate 300 is arranged on the surface 310S of the carrier 310 along the first direction D1. A plurality of upper bank structures 320 (for example but not limited to 3) can be formed into a unit, and there is a larger space between each unit of upper bank structures 320. The larger space is used to accommodate the LED chip 200. The transparent conductive layer 330 covers the surface 310S of the carrier 310 and the upper bank structure 320. Different from the upper substrate 300 in FIG. 3A , the transparent conductive layer 330 of the upper substrate 300 in FIG. 3A is responsible for connecting the second electrode 220 of the LED chip 200 to the second electrode pad 130 (ie, the ground electrode), so the transparent conductive layer 330 can cover the entire upper bank structure 320 . On the other hand, the transparent conductive layer 330 of the upper substrate 300 of FIG. 10A is responsible for connecting the first electrode 210 of the LED chip 200 to the first electrode pad 120 and the active element 150, so the upper substrate 300 includes a plurality of transparent conductive layers 330, each of which covers a portion of the upper bank structure 320 and the space for accommodating the LED chip 200. The transparent conductive layer 330 may not cover a portion of the upper bank structure 320.

在第10B圖中,下部基板100的下部堤岸結構160沿著第一方向D1排列於介電層110上,且每個下部堤岸結構160之間的距離大致相同。每個下部堤岸結構160皆可對應至其中一個上部堤岸結構320。發光二極體晶片200可位於兩個相鄰的下部堤岸結構160之間,且發光二極體晶片200可被容納在上部堤岸結構320之間的空間內並接觸透明導電層330。在一些實施方式中,發光二極體晶片200可包含發出不同色光的發光二極體晶片200R、200B與200G,發光二極體晶片200R、200B與200G也可沿著第一方向D1排列並各自位於兩個相鄰的下部堤岸結構160之間。導電材料400也可位於兩個相鄰的下部堤岸結構160之間,且導電材料400對應至其中一個上部堤岸結構320。黏接層500位於下部基板100的外圍,因此可用於黏合下部基板100與上部基板300。In FIG. 10B , the lower bank structures 160 of the lower substrate 100 are arranged on the dielectric layer 110 along the first direction D1, and the distance between each lower bank structure 160 is substantially the same. Each lower bank structure 160 may correspond to one of the upper bank structures 320. The LED chip 200 may be located between two adjacent lower bank structures 160, and the LED chip 200 may be accommodated in the space between the upper bank structures 320 and contact the transparent conductive layer 330. In some embodiments, the LED chip 200 may include LED chips 200R, 200B, and 200G that emit light of different colors. The LED chips 200R, 200B, and 200G may also be arranged along the first direction D1 and each located between two adjacent lower bank structures 160. The conductive material 400 may also be located between two adjacent lower bank structures 160, and the conductive material 400 corresponds to one of the upper bank structures 320. The adhesive layer 500 is located on the periphery of the lower substrate 100, and thus can be used to bond the lower substrate 100 and the upper substrate 300.

第11圖繪示本揭露的另一些實施方式的顯示面板10B的橫截面視圖。顯示面板10B與第1圖的顯示面板10類似,兩者的差別在於第11圖的顯示面板10B的導電材料400為金屬,而第1圖的顯示面板10的導電材料400為導電膠。FIG. 11 shows a cross-sectional view of a display panel 10B according to another embodiment of the present disclosure. The display panel 10B is similar to the display panel 10 of FIG. 1 , and the difference between the two is that the conductive material 400 of the display panel 10B of FIG. 11 is metal, while the conductive material 400 of the display panel 10 of FIG. 1 is conductive glue.

第12圖繪示本揭露的另一些實施方式的顯示面板10C的橫截面視圖。顯示面板10C與第1圖的顯示面板10類似,兩者的差別在於第11圖的顯示面板10B的上部堤岸結構320的其中一者包含上部326與下部328,上部堤岸結構320的下部328相鄰下部堤岸結構160。上部326於下部基板100的垂直投影與下部328於下部基板100的垂直投影重疊,下部328於下部基板100的垂直投影與第二電極墊130於下部基板100的垂直投影重疊。上部堤岸結構320的上部326的側面326S與上部堤岸結構320的下部328的側面328S不互連,且透明導電層330覆蓋上部堤岸結構320的上部326與下部328。上部堤岸結構320的上部326的側面326S與載板310的表面310S形成夾角a2,上部堤岸結構320的下部328的側面328S與載板310的表面310S形成夾角a3,夾角a2與a3小於或等於50度。在一些實施方式中,下部328的下表面相對下部基板100的高度H6小於上部326的下表面相對下部基板100的高度H7,因此下部328可更靠近第二電極墊130,使得不需設置導電材料400即可完成透明導電層330與第二電極墊130之間的電性連接。FIG. 12 shows a cross-sectional view of a display panel 10C according to another embodiment of the present disclosure. The display panel 10C is similar to the display panel 10 of FIG. 1 , and the difference between the two is that one of the upper bank structures 320 of the display panel 10B of FIG. 11 includes an upper portion 326 and a lower portion 328, and the lower portion 328 of the upper bank structure 320 is adjacent to the lower bank structure 160. The vertical projection of the upper portion 326 on the lower substrate 100 overlaps with the vertical projection of the lower portion 328 on the lower substrate 100, and the vertical projection of the lower portion 328 on the lower substrate 100 overlaps with the vertical projection of the second electrode pad 130 on the lower substrate 100. The side surface 326S of the upper portion 326 of the upper bank structure 320 and the side surface 328S of the lower portion 328 of the upper bank structure 320 are not connected to each other, and the transparent conductive layer 330 covers the upper portion 326 and the lower portion 328 of the upper bank structure 320. The side surface 326S of the upper portion 326 of the upper bank structure 320 and the surface 310S of the carrier 310 form an angle a2, and the side surface 328S of the lower portion 328 of the upper bank structure 320 and the surface 310S of the carrier 310 form an angle a3, and the angles a2 and a3 are less than or equal to 50 degrees. In some embodiments, a height H6 of the lower surface of the lower portion 328 relative to the lower substrate 100 is less than a height H7 of the lower surface of the upper portion 326 relative to the lower substrate 100, so that the lower portion 328 can be closer to the second electrode pad 130, so that the electrical connection between the transparent conductive layer 330 and the second electrode pad 130 can be completed without providing the conductive material 400.

第13圖繪示本揭露的另一些實施方式的顯示面板10D的橫截面視圖。顯示面板10D與第1圖的顯示面板10類似,兩者的差別在於顯示面板10D更包含反光層340,位於上部堤岸結構320與透明導電層330之間。反光層340可用於將發光二極體晶片200往側邊發出的光往上反射,進一步提高顯示面板10的向上出光效率。在一些實施方式中,反光層340可由金屬製成。FIG. 13 shows a cross-sectional view of a display panel 10D according to other embodiments of the present disclosure. The display panel 10D is similar to the display panel 10 of FIG. 1 , and the difference between the two is that the display panel 10D further includes a reflective layer 340 located between the upper bank structure 320 and the transparent conductive layer 330. The reflective layer 340 can be used to reflect the light emitted to the side by the LED chip 200 upward, further improving the upward light extraction efficiency of the display panel 10. In some embodiments, the reflective layer 340 can be made of metal.

綜上所述,本揭露的一些實施方式可減少顯示面板中透明導電層斷線的風險。舉例而言,顯示面板可包含上部基板與下部基板。透明導電層可僅形成在上部基板的上部堤岸結構上,且透過額外的導電材料電性連接至下部基板。因此,上部基板的上部堤岸結構的側壁與上部基板的載板表面之間的夾角可設計的較小,以降低透明導電層斷線的風險。如此一來,顯示面板中的發光二極體晶片便不容易因透明導電層斷線而導致失效。In summary, some embodiments of the present disclosure can reduce the risk of a transparent conductive layer breaking in a display panel. For example, the display panel may include an upper substrate and a lower substrate. The transparent conductive layer may be formed only on the upper bank structure of the upper substrate and electrically connected to the lower substrate through an additional conductive material. Therefore, the angle between the side wall of the upper bank structure of the upper substrate and the carrier surface of the upper substrate can be designed to be smaller to reduce the risk of a transparent conductive layer breaking. In this way, the light-emitting diode chip in the display panel is not easily caused to fail due to a transparent conductive layer breaking.

雖然本揭露已以實施例揭露如上,然其並非用以限定本揭露,任何所屬技術領域中具有通常知識者,在不脫離本揭露的精神和範圍內,當可作些許的更動與潤飾,故本揭露的保護範圍當視後附的申請專利範圍所界定者為準。Although the present disclosure has been disclosed as above by way of embodiments, it is not intended to limit the present disclosure. Any person having ordinary knowledge in the relevant technical field may make some changes and modifications without departing from the spirit and scope of the present disclosure. Therefore, the protection scope of the present disclosure shall be subject to the definition of the attached patent application scope.

10:顯示面板 10A:顯示面板 10B:顯示面板 10C:顯示面板 100:下部基板 100’:下部基板 110:介電層 112:介電層 120:第一電極墊 130:第二電極墊 140:基板 150:主動元件 160:下部堤岸結構 170:第一通孔件 180:第二通孔件 200:發光二極體晶片 200B:發光二極體晶片 200G:發光二極體晶片 200R:發光二極體晶片 210:第一電極 212:第一層 214:第二層 220:第二電極 222:第一層 224:第二層 230:磊晶層 232:N型半導體層 234:多重量子井層 236:P型半導體層 240:絕緣層 300:上部基板 310:載板 310S:表面 320:上部堤岸結構 320S:側面 322:第一堤岸結構 324:第二堤岸結構 326:上部 326S:側面 328:下部 328S:側面 330:透明導電層 340:反光層 400:導電材料 402:密封膠 404:導電球 500:黏接層 a1:夾角 a2:夾角 a3:夾角 D1:第一方向 H1:高度 H2:高度 H4:高度 H5:高度 H6:高度 H7:高度 10: Display panel 10A: Display panel 10B: Display panel 10C: Display panel 100: Lower substrate 100’: Lower substrate 110: Dielectric layer 112: Dielectric layer 120: First electrode pad 130: Second electrode pad 140: Substrate 150: Active element 160: Lower bank structure 170: First through-hole component 180: Second through-hole component 200: LED chip 200B: LED chip 200G: LED chip 200R: LED chip 210: First electrode 212: First layer 214: Second layer 220: Second electrode 222: First layer 224: Second layer 230: Epitaxial layer 232: N-type semiconductor layer 234: Multiple quantum well layer 236: P-type semiconductor layer 240: Insulating layer 300: Upper substrate 310: Carrier 310S: Surface 320: Upper bank structure 320S: Side surface 322: First bank structure 324: Second bank structure 326: Upper part 326S: Side surface 328: Lower part 328S: Side surface 330: Transparent conductive layer 340: Reflective layer 400: Conductive material 402: Sealant 404: Conductive ball 500: Adhesive layer a1: Angle a2: Angle a3: Angle D1: First direction H1: Height H2: Height H4: Height H5: Height H6: Height H7: Height

第1圖繪示本揭露的一些實施方式的顯示面板的橫截面視圖。 第2圖繪示第1圖的發光二極體晶的橫截面視圖。 第3A圖繪示第1圖的上部基板的仰視圖。 第3B圖繪示第1圖的下部基板的俯視圖。 第4圖至第7圖繪示製造顯示面板的製程的橫截面視圖。第8圖繪示本揭露的另一些實施方式的顯示面板的橫截面視圖。 第9圖繪示第8圖的發光二極體晶的橫截面視圖。 第10A圖繪示第8圖的上部基板的仰視圖。 第10B圖繪示第8圖的下部基板的俯視圖。 第11圖繪示本揭露的另一些實施方式的顯示面板的橫截面視圖。 第12圖繪示本揭露的另一些實施方式的顯示面板的橫截面視圖。 第13圖繪示本揭露的另一些實施方式的顯示面板的橫截面視圖。 FIG. 1 shows a cross-sectional view of a display panel of some embodiments of the present disclosure. FIG. 2 shows a cross-sectional view of a light-emitting diode crystal of FIG. 1. FIG. 3A shows a bottom view of an upper substrate of FIG. 1. FIG. 3B shows a top view of a lower substrate of FIG. 1. FIG. 4 to FIG. 7 show cross-sectional views of a process for manufacturing a display panel. FIG. 8 shows a cross-sectional view of a display panel of other embodiments of the present disclosure. FIG. 9 shows a cross-sectional view of a light-emitting diode crystal of FIG. 8. FIG. 10A shows a bottom view of an upper substrate of FIG. 8. FIG. 10B shows a top view of a lower substrate of FIG. 8. FIG. 11 shows a cross-sectional view of a display panel of other embodiments of the present disclosure. FIG. 12 shows a cross-sectional view of a display panel of other embodiments of the present disclosure. FIG. 13 shows a cross-sectional view of a display panel of other embodiments of the present disclosure.

國內寄存資訊(請依寄存機構、日期、號碼順序註記) 無 國外寄存資訊(請依寄存國家、機構、日期、號碼順序註記) 無 Domestic storage information (please note in the order of storage institution, date, and number) None Foreign storage information (please note in the order of storage country, institution, date, and number) None

10:顯示面板 10: Display panel

100:下部基板 100: Lower substrate

110:介電層 110: Dielectric layer

112:介電層 112: Dielectric layer

120:第一電極墊 120: first electrode pad

130:第二電極墊 130: Second electrode pad

140:基板 140: Substrate

150:主動元件 150: Active components

160:下部堤岸結構 160: Lower embankment structure

170:第一通孔件 170: First through-hole component

180:第二通孔件 180: Second through-hole component

200:發光二極體晶片 200: LED chip

210:第一電極 210: First electrode

220:第二電極 220: Second electrode

230:磊晶層 230: Epitaxial layer

300:上部基板 300: Upper substrate

310:載板 310: Carrier board

310S:表面 310S: Surface

320:上部堤岸結構 320: Upper embankment structure

322:第一堤岸結構 322: First embankment structure

324:第二堤岸結構 324: Second embankment structure

320S:側面 320S: Side

330:透明導電層 330: Transparent conductive layer

400:導電材料 400: Conductive material

402:密封膠 402: Sealant

404:導電球 404: Conductive ball

500:黏接層 500: Adhesive layer

a1:夾角 a1: Angle

D1:第一方向 D1: First direction

H1:高度 H1: Height

H2:高度 H2: Height

H4:高度 H4: Height

H5:高度 H5: Height

Claims (10)

一種顯示面板,包含: 一下部基板,該下部基板包含: 一介電層; 一第一電極墊,位於該介電層上;以及 一第二電極墊,位於該介電層上,相鄰該第一電極墊,且該第一電極墊與該第二電極墊用以提供不同電位; 一發光二極體晶片,該發光二極體晶片包含位於相對兩側的一第一電極與一第二電極,該第一電極電性連接該第一電極墊;以及 一上部基板,在該下部基板與該發光二極體晶片上,該上部基板包含: 一載板,具有面向該下部基板的一表面; 複數個上部堤岸結構,設置在該表面;以及 一透明導電層,覆蓋該載板的該表面與該些上部堤岸結構,該透明導電層電性連接該第二電極與該第二電極墊。 A display panel comprises: A lower substrate, the lower substrate comprises: A dielectric layer; A first electrode pad, located on the dielectric layer; and A second electrode pad, located on the dielectric layer, adjacent to the first electrode pad, and the first electrode pad and the second electrode pad are used to provide different potentials; A light-emitting diode chip, the light-emitting diode chip comprises a first electrode and a second electrode located on opposite sides, the first electrode is electrically connected to the first electrode pad; and An upper substrate, on the lower substrate and the light-emitting diode chip, the upper substrate comprises: A carrier having a surface facing the lower substrate; A plurality of upper bank structures, arranged on the surface; and A transparent conductive layer covers the surface of the carrier and the upper bank structures, and the transparent conductive layer electrically connects the second electrode and the second electrode pad. 如請求項1所述之顯示面板,其中該些上部堤岸結構的任一者的一側面與該載板的該表面形成一夾角,該夾角小於或等於50度。A display panel as described in claim 1, wherein a side surface of any one of the upper bank structures forms an angle with the surface of the carrier, and the angle is less than or equal to 50 degrees. 如請求項1所述之顯示面板,更包含一導電材料,該導電材料於該下部基板的一垂直投影與該些上部堤岸結構於該下部基板的複數個垂直投影重疊,且電性連接該透明導電層與該第二電極墊。The display panel as described in claim 1 further includes a conductive material, a vertical projection of the conductive material on the lower substrate overlaps with multiple vertical projections of the upper bank structures on the lower substrate, and electrically connects the transparent conductive layer and the second electrode pad. 如請求項3所述之顯示面板,其中該導電材料為金屬或導電膠。A display panel as described in claim 3, wherein the conductive material is metal or conductive glue. 如請求項3所述之顯示面板,其中該下部基板更包含複數個下部堤岸結構,排列於該介電層上,該些下部堤岸結構在該些上部堤岸結構下。A display panel as described in claim 3, wherein the lower substrate further comprises a plurality of lower bank structures arranged on the dielectric layer, the lower bank structures being below the upper bank structures. 如請求項5所述之顯示面板,其中該導電材料的一高度大致等於該些下部堤岸結構的複數個高度。A display panel as described in claim 5, wherein a height of the conductive material is approximately equal to a plurality of heights of the lower bank structures. 如請求項5所述之顯示面板,其中該些下部堤岸結構為反光材料。A display panel as described in claim 5, wherein the lower embankment structures are made of reflective material. 如請求項5所述之顯示面板,其中該些上部堤岸結構的其中一者包含一上部與一下部,該些上部堤岸結構的其中一者的該下部相鄰該些下部堤岸結構,該上部於該下部基板的一垂直投影與該下部於該下部基板的一垂直投影重疊,該下部於該下部基板的該垂直投影與該第二電極墊於該下部基板的一垂直投影重疊。A display panel as described in claim 5, wherein one of the upper bank structures comprises an upper portion and a lower portion, the lower portion of one of the upper bank structures is adjacent to the lower bank structures, a vertical projection of the upper portion on the lower substrate overlaps with a vertical projection of the lower portion on the lower substrate, and the vertical projection of the lower portion on the lower substrate overlaps with a vertical projection of the second electrode pad on the lower substrate. 如請求項1所述之顯示面板,其中該些上部堤岸結構為吸光材料。A display panel as described in claim 1, wherein the upper bank structures are light-absorbing materials. 如請求項1所述之顯示面板,更包含一反光層,位於該些上部堤岸結構與該透明導電層之間。The display panel as described in claim 1 further includes a reflective layer located between the upper bank structures and the transparent conductive layer.
TW111144284A 2022-11-18 2022-11-18 Display panel TWI826130B (en)

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