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TW202415205A - Electronic device and method of manufacturing the same - Google Patents

Electronic device and method of manufacturing the same Download PDF

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TW202415205A
TW202415205A TW111135613A TW111135613A TW202415205A TW 202415205 A TW202415205 A TW 202415205A TW 111135613 A TW111135613 A TW 111135613A TW 111135613 A TW111135613 A TW 111135613A TW 202415205 A TW202415205 A TW 202415205A
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layer
metal
electronic device
aluminum body
bonding film
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TW111135613A
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TWI822346B (en
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葉竣達
張鈞富
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健策精密工業股份有限公司
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Abstract

An electronic device includes a power module, a heat sink and a multilayered metal layer. The power module includes a power unit and a metal surface. The power unit is thermally connected to a metal surface. The heat sink includes an aluminum body. The multilayered metal layer is located between the aluminum body and the metal hosing, and is fixed to the metal surface through a bonding layer.

Description

電子裝置及其製造方法Electronic device and method of manufacturing the same

本發明有關於一種電子裝置,尤指一種具有散熱器之電子裝置及電子裝置之製造方法。The present invention relates to an electronic device, in particular to an electronic device with a heat sink and a manufacturing method of the electronic device.

由於鋁金屬及鋁合金對氧具有高親和力,其所產生之表面氧化物會影響鍍層和鋁金屬之結合力,故,傳統方式會採用鍍鋅製程進行表面置換後,使鋁金屬或鋁合金浸入電鍍液,可以在表面電鍍其他金屬層與焊接。Since aluminum and aluminum alloys have a high affinity for oxygen, the surface oxides they produce will affect the bonding strength between the coating and the aluminum. Therefore, the traditional method is to use a galvanizing process to replace the surface, then immerse the aluminum or aluminum alloy in the plating solution, and then electroplate other metal layers on the surface for welding.

然而,由於鋁容易與酸鹼產生反應,使零件腐蝕,鋁在鋅置換層不良缺陷時,則表面電鍍其他金屬結合力不佳,從而影響零件直接焊接至鋁製品上。因此,必須採取與常規電鍍不同的處理方法,才能在鋁製品上獲得結合力良好的鍍層。However, since aluminum easily reacts with acid and alkali, causing corrosion of parts, and when the aluminum has a poor zinc replacement layer, the surface electroplating has poor bonding with other metals, thus affecting the direct welding of parts to aluminum products. Therefore, a treatment method different from conventional electroplating must be adopted to obtain a coating with good bonding on aluminum products.

由此可見,上述技術顯然仍存在不便與缺陷,而有待加以進一步改良。因此,如何能有效地解決上述不便與缺陷,實屬當前重要研發課題之一,亦成爲當前相關領域亟需改進的目標。It can be seen that the above technology still has inconveniences and defects, and needs to be further improved. Therefore, how to effectively solve the above inconveniences and defects is one of the important research and development topics at present, and has also become a goal that needs to be improved urgently in the current related fields.

本發明之一目的在於提供一種電子裝置及其製造方法,用以解決以上先前技術所提到的困難。One purpose of the present invention is to provide an electronic device and a manufacturing method thereof to solve the difficulties mentioned in the above prior art.

本發明之一實施例提供一種電子裝置。電子裝置包含一連結層、一功率模組、一散熱器及一複合金屬層。功率模組包含至少一功率單元及一金屬表面,功率單元熱連接金屬表面。散熱器包含一鋁質本體。複合金屬層形成於鋁質本體與金屬表面之間,且透過連結層固接金屬表面。An embodiment of the present invention provides an electronic device. The electronic device includes a connection layer, a power module, a heat sink and a composite metal layer. The power module includes at least one power unit and a metal surface, and the power unit is thermally connected to the metal surface. The heat sink includes an aluminum body. The composite metal layer is formed between the aluminum body and the metal surface, and is fixed to the metal surface through the connection layer.

依據本發明一或複數個實施例,在上述之電子裝置中,複合金屬層包含一介面穩定層及一金屬接合膜。介面穩定層直接形成於鋁質本體之一面。金屬接合膜直接形成於介面穩定層相對鋁質本體之一面,且位於介面穩定層與金屬表面之間。According to one or more embodiments of the present invention, in the above-mentioned electronic device, the composite metal layer includes an interface stabilizing layer and a metal bonding film. The interface stabilizing layer is directly formed on one side of the aluminum body. The metal bonding film is directly formed on one side of the interface stabilizing layer opposite to the aluminum body and is located between the interface stabilizing layer and the metal surface.

依據本發明一或複數個實施例,在上述之電子裝置中,介面穩定層為一鈦層及一鉑層其中之一。According to one or more embodiments of the present invention, in the above-mentioned electronic device, the interface stabilizing layer is one of a titanium layer and a platinum layer.

依據本發明一或複數個實施例,在上述之電子裝置中,金屬接合膜為一銅層。According to one or more embodiments of the present invention, in the above-mentioned electronic device, the metal bonding film is a copper layer.

依據本發明一或複數個實施例,在上述之電子裝置中,複合金屬層更包含一電鍍金屬層。電鍍金屬層直接形成於金屬接合膜相對介面穩定層之一面,且位於金屬接合膜與金屬表面之間。連結層為一焊料層,且電鍍金屬層透過此焊料層焊接至表面上。According to one or more embodiments of the present invention, in the above-mentioned electronic device, the composite metal layer further includes an electroplated metal layer. The electroplated metal layer is directly formed on one side of the metal bonding film opposite to the interface stabilizing layer and is located between the metal bonding film and the metal surface. The connecting layer is a solder layer, and the electroplated metal layer is soldered to the surface through the solder layer.

依據本發明一或複數個實施例,在上述之電子裝置中,電鍍金屬層為一鍍銅層及一鍍鎳層其中之一。According to one or more embodiments of the present invention, in the above-mentioned electronic device, the electroplated metal layer is one of a copper-plated layer and a nickel-plated layer.

依據本發明一或複數個實施例,在上述之電子裝置中,連結層為一燒結鍍層,且燒結鍍層直接介於金屬接合膜與金屬表面之間。According to one or more embodiments of the present invention, in the above-mentioned electronic device, the connection layer is a sintered deposition layer, and the sintered deposition layer is directly between the metal bonding film and the metal surface.

依據本發明一或複數個實施例,在上述之電子裝置中,功率模組更包含一金屬底板,金屬底板承載並接觸功率單元,金屬表面為金屬底板之表面。According to one or more embodiments of the present invention, in the above-mentioned electronic device, the power module further includes a metal base plate, the metal base plate carries and contacts the power unit, and the metal surface is the surface of the metal base plate.

依據本發明一或複數個實施例,在上述之電子裝置中,金屬表面為位於功率模組表面之一金屬鍍膜。According to one or more embodiments of the present invention, in the above-mentioned electronic device, the metal surface is a metal coating located on the surface of the power module.

本發明之一實施例提供一種電子裝置之製造方法。製造方法包含多個步驟如下。提供一散熱器之一鋁質本體;提供一功率模組之一金屬表面;形成一複合金屬層至鋁質本體上;以及將複合金屬層透過一連結層固接至金屬表面上。An embodiment of the present invention provides a method for manufacturing an electronic device. The manufacturing method includes a plurality of steps as follows: providing an aluminum body of a heat sink; providing a metal surface of a power module; forming a composite metal layer on the aluminum body; and fixing the composite metal layer to the metal surface through a connecting layer.

依據本發明一或複數個實施例,在上述之製造方法中,形成複合金屬層至鋁質本體上之步驟更包含多個細部步驟如下。部分地遮蔽鋁質本體之表面,並從此表面曝露出一濺鍍區;將鋁質本體移入一真空腔室內,並對鋁質本體之濺鍍區進行真空濺鍍程序,使得鋁質本體之此表面對應濺鍍區之位置濺鍍出一介面穩定層,介面穩定層為一鈦層及一鉑層其中之一;以及再度對鋁質本體進行另一真空濺鍍程序,使得一金屬接合膜直接形成介面穩定層上,金屬接合膜為一銅層。According to one or more embodiments of the present invention, in the above-mentioned manufacturing method, the step of forming a composite metal layer on an aluminum body further includes a plurality of detailed steps as follows: partially shielding the surface of the aluminum body and exposing a sputtering area from the surface; moving the aluminum body into a vacuum chamber and performing a vacuum sputtering process on the sputtering area of the aluminum body so that an interface stabilizing layer is sputtered at a position of the surface of the aluminum body corresponding to the sputtering area, and the interface stabilizing layer is one of a titanium layer and a platinum layer; and performing another vacuum sputtering process on the aluminum body again so that a metal bonding film is directly formed on the interface stabilizing layer, and the metal bonding film is a copper layer.

依據本發明一或複數個實施例,在上述之製造方法中,金屬接合膜直接形成於介面穩定層之步驟後更包含多個細部步驟如下。將鋁質本體從真空腔室移入一電解液,並對鋁質本體進行一電鍍程序,使得一電鍍金屬層直接形成於金屬接合膜上,電鍍金屬層為一鍍銅層及一鍍鎳層其中之一。According to one or more embodiments of the present invention, in the above-mentioned manufacturing method, the step of directly forming the metal bonding film on the interface stabilizing layer further includes a plurality of detailed steps as follows: the aluminum body is moved from the vacuum chamber into an electrolyte, and an electroplating process is performed on the aluminum body, so that an electroplated metal layer is directly formed on the metal bonding film, and the electroplated metal layer is one of a copper-plated layer and a nickel-plated layer.

依據本發明一或複數個實施例,在上述之製造方法中,將複合金屬層透過連結層固接至金屬表面上之步驟更包含多個細部步驟如下。配置一焊料至電鍍金屬層及金屬表面之間,以形成一待加工物;以及將待加工物送入一迴焊爐,使得被熱熔後之該焊料直接形成一能夠焊接電鍍金屬層及金屬表面之焊料層。According to one or more embodiments of the present invention, in the above-mentioned manufacturing method, the step of fixing the composite metal layer to the metal surface through the connecting layer further includes a plurality of detailed steps as follows: placing a solder between the electroplated metal layer and the metal surface to form an object to be processed; and sending the object to be processed into a reflow soldering furnace so that the solder after being hot-melted directly forms a solder layer capable of welding the electroplated metal layer and the metal surface.

依據本發明一或複數個實施例,在上述之製造方法中,將複合金屬層透過連結層固接至金屬表面上之步驟更包含多個細部步驟如下。配置一燒結粉末至金屬接合膜及該金屬表面之間,以形成一待加工物;以及將待加工物進行一燒結程序,使得被燒結後之燒結粉末形成一能夠焊接金屬接合膜及金屬表面之燒結鍍層。According to one or more embodiments of the present invention, in the above-mentioned manufacturing method, the step of fixing the composite metal layer to the metal surface through the connecting layer further includes a plurality of detailed steps as follows: disposing a sintered powder between the metal bonding film and the metal surface to form a workpiece to be processed; and subjecting the workpiece to a sintering process so that the sintered powder after sintering forms a sintered coating layer capable of welding the metal bonding film and the metal surface.

依據本發明一或複數個實施例,在上述之製造方法中,功率模組之金屬底板承載並接觸功率模組之功率單元,且金屬表面為金屬底板之表面。According to one or more embodiments of the present invention, in the above-mentioned manufacturing method, the metal base plate of the power module carries and contacts the power unit of the power module, and the metal surface is the surface of the metal base plate.

依據本發明一或複數個實施例,在上述之製造方法中,金屬表面為位於功率模組表面之一金屬鍍膜。According to one or more embodiments of the present invention, in the above-mentioned manufacturing method, the metal surface is a metal coating located on the surface of the power module.

如此,透過以上各實施例之所述架構,本發明不必採用鍍鋅製程便能完成對鋁金屬及鋁合金之焊接程序,且能夠依據特定區域對鋁及鋁合金提供全部或局部表面處理,降低後製程鍍層之金屬用量之成本。Thus, through the structures described in the above embodiments, the present invention can complete the welding process of aluminum metal and aluminum alloy without using the galvanizing process, and can provide full or partial surface treatment for aluminum and aluminum alloy according to specific areas, thereby reducing the cost of metal usage in the post-process plating.

以上所述僅係用以闡述本發明所欲解決的問題、解決問題的技術手段、及其產生的功效等等,本發明之具體細節將在下文的實施方式及相關圖式中詳細介紹。The above description is only used to explain the problem to be solved by the present invention, the technical means for solving the problem, and the effects produced, etc. The specific details of the present invention will be introduced in detail in the following implementation method and related drawings.

以下將以圖式揭露本發明之複數個實施例,為明確說明起見,許多實務上的細節將在以下敘述中一併說明。然而,應瞭解到,這些實務上的細節不應用以限制本發明。也就是說,在本發明各實施例中,這些實務上的細節是非必要的。此外,為簡化圖式起見,一些習知慣用的結構與元件在圖式中將以簡單示意的方式繪示之。The following will disclose multiple embodiments of the present invention with drawings. For the purpose of clarity, many practical details will be described together in the following description. However, it should be understood that these practical details should not be used to limit the present invention. In other words, in each embodiment of the present invention, these practical details are not necessary. In addition, for the purpose of simplifying the drawings, some commonly used structures and components will be depicted in the drawings in a simple schematic manner.

第1圖為本發明一實施例之電子裝置10的示意圖。第2圖為第1圖沿線段AA所製成之局部剖視圖。第3圖為第1圖之電子裝置10的上視圖。如第1圖至第3圖所示,電子裝置10包含一功率模組200、一散熱器300及一複合金屬層400。功率模組200包含一金屬表面與多個功率單元220。金屬表面例如為一金屬底板210之表面。金屬底板210承載並接觸這些功率單元220,使得這些功率單元220熱連接金屬底板210。功率單元220包含晶片與引線 (圖中未示),然而,本發明不限於此。散熱器300包含一鋁質本體310。複合金屬層400形成於鋁質本體310與金屬底板210之間,且複合金屬層400透過一連結層500與金屬底板210彼此固接。如此,功率模組200之熱能能夠透過複合金屬層400而傳遞至散熱器300之鋁質本體310。FIG. 1 is a schematic diagram of an electronic device 10 of an embodiment of the present invention. FIG. 2 is a partial cross-sectional view of FIG. 1 along line segment AA. FIG. 3 is a top view of the electronic device 10 of FIG. 1. As shown in FIG. 1 to FIG. 3, the electronic device 10 includes a power module 200, a heat sink 300, and a composite metal layer 400. The power module 200 includes a metal surface and a plurality of power units 220. The metal surface is, for example, the surface of a metal base plate 210. The metal base plate 210 carries and contacts these power units 220, so that these power units 220 are thermally connected to the metal base plate 210. The power unit 220 includes a chip and leads (not shown in the figure), however, the present invention is not limited thereto. The heat sink 300 includes an aluminum body 310. The composite metal layer 400 is formed between the aluminum body 310 and the metal base plate 210 , and the composite metal layer 400 is fixed to the metal base plate 210 via a connecting layer 500 . In this way, the heat energy of the power module 200 can be transferred to the aluminum body 310 of the heat sink 300 through the composite metal layer 400 .

更具體地,在本實施例中,鋁質本體310包含一入口312、一出口313與一內部通道314,該內部通道314形成於鋁質本體310內,且分別接通入口312與出口313。故,流體能過從入口312進入內部通道314,並於帶走鋁質本體310之熱能後,而從出口313離開內部通道314。然而,本發明不限於此散熱結構。More specifically, in this embodiment, the aluminum body 310 includes an inlet 312, an outlet 313, and an internal channel 314. The internal channel 314 is formed in the aluminum body 310 and is connected to the inlet 312 and the outlet 313. Therefore, the fluid can enter the internal channel 314 from the inlet 312, and after taking away the heat energy of the aluminum body 310, leave the internal channel 314 from the outlet 313. However, the present invention is not limited to this heat dissipation structure.

此外,在本實施例中,複合金屬層400包含一介面穩定層410、一金屬接合膜420及一電鍍金屬層430。介面穩定層410直接形成於鋁質本體310之一面。金屬接合膜420直接形成於介面穩定層410相對鋁質本體310之一面,且位於介面穩定層410與金屬底板210之間。電鍍金屬層430直接形成於金屬接合膜420相對介面穩定層410之一面,且位於金屬接合膜420與金屬底板210之間。連結層500為一能夠焊接電鍍金屬層430及金屬底板210之焊料層510,故,電鍍金屬層430透過此焊料層510固接至金屬底板210之所述表面上,從而讓金屬底板210、複合金屬層400及鋁質本體310彼此整合為一體。複合金屬層400不限局部或全部地形成於鋁質本體310之頂面311之一部分,然而,本實施例不限於此。In addition, in this embodiment, the composite metal layer 400 includes an interface stabilizing layer 410, a metal bonding film 420, and an electroplated metal layer 430. The interface stabilizing layer 410 is directly formed on one side of the aluminum body 310. The metal bonding film 420 is directly formed on one side of the interface stabilizing layer 410 opposite to the aluminum body 310, and is located between the interface stabilizing layer 410 and the metal base plate 210. The electroplated metal layer 430 is directly formed on one side of the metal bonding film 420 opposite to the interface stabilizing layer 410, and is located between the metal bonding film 420 and the metal base plate 210. The connecting layer 500 is a solder layer 510 capable of soldering the electroplated metal layer 430 and the metal base plate 210. Therefore, the electroplated metal layer 430 is fixed to the surface of the metal base plate 210 through the solder layer 510, so that the metal base plate 210, the composite metal layer 400 and the aluminum body 310 are integrated into one body. The composite metal layer 400 is not limited to being partially or completely formed on a portion of the top surface 311 of the aluminum body 310, however, the present embodiment is not limited thereto.

舉例來說,金屬底板210為銅金屬(Copper)、鋁(aluminum)金屬或其他類似材料,然而,本發明不限於上述材質。介面穩定層410例如為鈦(Titanium)層、鉑(Platinum)層或其他類似材料,並且介面穩定層410之厚度例如為0.15微米(μm),或者不超過0.5微米(μm),然而,本發明不限於上述材質及厚度。金屬接合膜420為銅(Copper)層或其他類似材料,並且金屬接合膜420之厚度例如為0.3微米(μm),或者不超過1微米(μm),然而,本發明不限於上述材質及厚度。電鍍金屬層430例如為鍍銅層、鍍鎳層或其他類似材料,並且電鍍金屬層430之厚度例如為3微米(μm),或者不超過20微米(μm) ,然而,本發明不限於上述材質及厚度。焊料層510例如為錫鉛焊料、無鉛焊料、焊膏或其他類似材料。For example, the metal base plate 210 is copper, aluminum or other similar materials, however, the present invention is not limited to the above materials. The interface stabilizing layer 410 is, for example, a titanium layer, a platinum layer or other similar materials, and the thickness of the interface stabilizing layer 410 is, for example, 0.15 micrometers (μm), or not more than 0.5 micrometers (μm), however, the present invention is not limited to the above materials and thicknesses. The metal bonding film 420 is a copper layer or other similar materials, and the thickness of the metal bonding film 420 is, for example, 0.3 micrometers (μm), or not more than 1 micrometer (μm), however, the present invention is not limited to the above materials and thicknesses. The electroplated metal layer 430 is, for example, a copper-plated layer, a nickel-plated layer, or other similar materials, and the thickness of the electroplated metal layer 430 is, for example, 3 micrometers (μm), or not more than 20 micrometers (μm), however, the present invention is not limited to the above materials and thicknesses. The solder layer 510 is, for example, tin-lead solder, lead-free solder, solder paste, or other similar materials.

又,如第2圖所示,第2圖所呈現出之層疊結構100包含銅層、複合金屬層400及鋁層。複合金屬層400疊合於銅層與鋁層之間,且複合金屬層400透過上述連結層500固接銅層。As shown in FIG. 2 , the stacked structure 100 shown in FIG. 2 includes a copper layer, a composite metal layer 400 and an aluminum layer. The composite metal layer 400 is stacked between the copper layer and the aluminum layer, and the composite metal layer 400 is fixed to the copper layer through the connecting layer 500 .

第4圖為本發明一實施例之電子裝置的局部剖視圖,其剖面處與第2圖之剖面處相同。如第4圖所示,本實施例之層疊結構100與第2圖之層疊結構101大致相同,其差異在於,本實施例之複合金屬層401不具有電鍍金屬層430,並透過另種連結層(即燒結鍍層520)與金屬底板210彼此固接,換句話說,複合金屬層401僅具有介面穩定層410與金屬接合膜420,且金屬接合膜420透過燒結鍍層520固接金屬底板210。FIG. 4 is a partial cross-sectional view of an electronic device according to an embodiment of the present invention, and its cross-sectional area is the same as the cross-sectional area of FIG. 4. As shown in FIG. 4, the layered structure 100 of this embodiment is substantially the same as the layered structure 101 of FIG. 2, and the difference is that the composite metal layer 401 of this embodiment does not have the electroplated metal layer 430, and is fixedly connected to the metal base plate 210 through another connecting layer (i.e., the sintered coating layer 520). In other words, the composite metal layer 401 only has the interface stabilizing layer 410 and the metal bonding film 420, and the metal bonding film 420 is fixedly connected to the metal base plate 210 through the sintered coating layer 520.

舉例來說,燒結鍍層520為鍍銀(Sliver)層、鍍金(Gold)層或其他類似材料,燒結鍍層520之厚度例如為0.05微米(μm),或者不超過1微米(μm),然而,本發明不限於上述材質及厚度。For example, the sintered coating layer 520 is a silver coating layer, a gold coating layer or other similar materials, and the thickness of the sintered coating layer 520 is, for example, 0.05 micrometers (μm), or not more than 1 micrometer (μm). However, the present invention is not limited to the above materials and thicknesses.

第5圖為本發明一實施例之電子裝置10之製造方法的流程圖。如第1圖與第5圖所示,電子裝置10之製造方法包含步驟501至步驟504如下。在步驟501中,提供一散熱器300之一鋁質本體310。在步驟502中,提供一功率模組200之一金屬底板210。在步驟503中,形成一複合金屬層400至鋁質本體310上。在步驟504中,將複合金屬層400透過一連結層500固接至金屬底板210上。FIG. 5 is a flow chart of a method for manufacturing an electronic device 10 according to an embodiment of the present invention. As shown in FIG. 1 and FIG. 5, the method for manufacturing the electronic device 10 includes steps 501 to 504 as follows. In step 501, an aluminum body 310 of a heat sink 300 is provided. In step 502, a metal base plate 210 of a power module 200 is provided. In step 503, a composite metal layer 400 is formed on the aluminum body 310. In step 504, the composite metal layer 400 is fixed to the metal base plate 210 through a connecting layer 500.

第6圖為第5圖之步驟503與步驟504的細部流程圖。如第5圖與第6圖所示,上述步驟503至步驟504更包含數個步驟601至步驟607如下。FIG. 6 is a detailed flow chart of step 503 and step 504 of FIG. 5. As shown in FIG. 5 and FIG. 6, the above-mentioned step 503 to step 504 further includes several steps 601 to step 607 as follows.

在步驟601中,對鋁質本體310之表面(如頂面311)進行表面清潔處理。在步驟602中,例如使用貼膜或遮罩方式,部分地遮蔽鋁質本體310之表面(如頂面311),以並從此表面(如頂面311)曝露出一濺鍍區(圖中未示)。然而,本方法不限於此,其他實施例也可能不遮蔽鋁質本體310之表面(如頂面311)。在步驟603中,將鋁質本體310移入真空濺鍍(Sputtering)製程之真空腔室內,並對鋁質本體310之表面(如頂面311)所曝露出之濺鍍區進行真空濺鍍程序,從而讓鋁質本體310對應濺鍍區之位置被濺鍍出一濺鍍層(如上述之介面穩定層410)。在步驟604中,再度對真空腔室內之鋁質本體310進行另一真空濺鍍程序,使得另一濺鍍層(如上述之金屬接合膜420)直接層疊於所述濺鍍層(如上述之介面穩定層410)上。在步驟605中,將鋁質本體310從真空腔室移入一電解液,並對鋁質本體310進行一電鍍程序,使得一電鍍金屬層430直接形成於另一濺鍍層(如上述之金屬接合膜420)上。在步驟606中,配置一焊料至電鍍金屬層430及金屬底板210之間,以形成一待加工物。在步驟607中,將待加工物送入一迴焊爐中,使得被熱熔後之焊料直接形成一能夠焊接電鍍金屬層430及金屬底板210之焊料層510。In step 601, the surface (such as the top surface 311) of the aluminum body 310 is cleaned. In step 602, the surface (such as the top surface 311) of the aluminum body 310 is partially shielded, for example, by using a film or a mask, so as to expose a sputtered area (not shown) from the surface (such as the top surface 311). However, the method is not limited thereto, and other embodiments may not shield the surface (such as the top surface 311) of the aluminum body 310. In step 603, the aluminum body 310 is moved into a vacuum chamber of a vacuum sputtering process, and a vacuum sputtering process is performed on the exposed sputtering area of the surface (such as the top surface 311) of the aluminum body 310, so that a sputtering layer (such as the above-mentioned interface stabilizing layer 410) is sputtered at the position of the aluminum body 310 corresponding to the sputtering area. In step 604, another vacuum sputtering process is performed on the aluminum body 310 in the vacuum chamber again, so that another sputtering layer (such as the above-mentioned metal bonding film 420) is directly stacked on the sputtering layer (such as the above-mentioned interface stabilizing layer 410). In step 605, the aluminum body 310 is moved from the vacuum chamber into an electrolyte, and an electroplating process is performed on the aluminum body 310, so that an electroplated metal layer 430 is directly formed on another sputtered layer (such as the metal bonding film 420 mentioned above). In step 606, a solder is arranged between the electroplated metal layer 430 and the metal base plate 210 to form a workpiece to be processed. In step 607, the workpiece to be processed is sent into a reflow furnace, so that the hot-melted solder directly forms a solder layer 510 capable of welding the electroplated metal layer 430 and the metal base plate 210.

更具體地,在本實施例中,上述真空濺鍍程序(或鍍膜程序)之環境變數以及操作變數如下。更具體地,設定電漿(Plasma)功率為800W、氣體流量250±50sccm/真空值5.0E-2/時間240sec,以及O2氧氣流量60sccm與AR氬氣流量150sccm,靶材功率4kw。接著,在放入產品後,開啟供電單元(power supply unit,PSU)啟動真空幫浦抽真空、開啟並注入氣體,以啟動真空鍍膜程序(或鍍膜程序)。More specifically, in this embodiment, the environmental variables and operating variables of the above vacuum sputtering process (or coating process) are as follows. More specifically, the plasma power is set to 800W, the gas flow rate is 250±50sccm/vacuum value is 5.0E-2/time is 240sec, and the O2 oxygen flow rate is 60sccm and the AR argon flow rate is 150sccm, and the target power is 4kw. Then, after the product is placed, the power supply unit (PSU) is turned on to start the vacuum pump to evacuate, and the gas is turned on and injected to start the vacuum coating process (or coating process).

上述電鍍程序之環境變數以及操作變數如下。更具體地,經過前處理清洗除油後,先酸活化表面;接著,電鍍依據各金屬電鍍藥液控制濃度與需求厚度調整電流與時間;接著,多槽水洗以洗去藥液;接著,以風刀持續例如5秒吹去主要殘留水;接著,最後依據例如120℃/120秒之參數對鋁質本體310進行烘乾。The environmental variables and operation variables of the above electroplating process are as follows. More specifically, after pre-treatment cleaning and degreasing, the surface is first activated by acid; then, the electroplating controls the concentration and required thickness of each metal electroplating solution to adjust the current and time; then, multiple tanks of water are used to wash away the solution; then, the main residual water is blown away by a wind knife for, for example, 5 seconds; then, the aluminum body 310 is finally dried according to parameters such as 120°C/120 seconds.

第7圖為第5圖之步驟504之另一實施例的細部流程圖。如第7圖所示,本實施例之細部流程與第6圖之細部流程大致相同,其差異在於,本實施例之細部流程為步驟601至步驟604後,不進行步驟605至步驟607,反而是改為進行步驟701與步驟702如下。FIG. 7 is a detailed flow chart of another embodiment of step 504 of FIG. 5. As shown in FIG. 7, the detailed flow of this embodiment is substantially the same as the detailed flow of FIG. 6, except that after step 601 to step 604, the detailed flow of this embodiment does not proceed to step 605 to step 607, but instead proceeds to step 701 and step 702 as follows.

在步驟701中,配置一燒結粉末至金屬接合膜420及該金屬底板210之間,以形成一待加工物。在步驟702中,將待加工物進行一燒結程序,使得被燒結後之燒結粉末形成一能夠焊接金屬接合膜420及金屬底板210之燒結鍍層520。如此,功率模組200之熱能能夠透過燒結鍍層520而傳遞至散熱器300之鋁質本體310。舉例來說,燒結粉末通常為膏、漿型,然而,本發明不限於此。In step 701, a sintered powder is disposed between the metal bonding film 420 and the metal base plate 210 to form a workpiece. In step 702, the workpiece is subjected to a sintering process so that the sintered powder forms a sintered coating layer 520 capable of welding the metal bonding film 420 and the metal base plate 210. In this way, the heat energy of the power module 200 can be transferred to the aluminum body 310 of the heat sink 300 through the sintered coating layer 520. For example, the sintered powder is usually a paste or slurry type, however, the present invention is not limited thereto.

更具體地,在本實施例中,上述燒結程序之環境變數以及操作變數如下,更具體地,於待加工物塗佈銀膏後與功率模組200堆疊放入加熱腔體內,例如在50分鐘內升溫至150℃,持溫50分鐘,在15分鐘加熱至200℃,持溫80分鐘,於50分鐘降至常溫。依據使用不同銀燒結材料,有真空或特殊氣氛或空氣中,有加壓10MPa或不需加壓,以及不同加熱溫度曲線等變數選擇。More specifically, in this embodiment, the environmental variables and operation variables of the sintering process are as follows. More specifically, after the object to be processed is coated with silver paste, it is stacked with the power module 200 and placed in a heating chamber. For example, the temperature is raised to 150°C within 50 minutes, maintained for 50 minutes, heated to 200°C within 15 minutes, maintained for 80 minutes, and cooled to room temperature within 50 minutes. Depending on the use of different silver sintering materials, there are variables such as vacuum or special atmosphere or air, pressure of 10MPa or no pressure, and different heating temperature curves.

第8圖為本發明一實施例之電子裝置11的示意圖。請參閱第8圖,本實施例之電子裝置11與第1圖之電子裝置10大致相同,其差異在於,金屬表面例如為位於功率模組202表面之一金屬鍍膜211。FIG8 is a schematic diagram of an electronic device 11 according to an embodiment of the present invention. Referring to FIG8, the electronic device 11 of this embodiment is substantially the same as the electronic device 10 of FIG1, except that the metal surface is, for example, a metal coating 211 located on the surface of the power module 202.

更具體地,功率模組202包含外殼221、晶片222、引線223、224、絕緣基板225與封裝部230。鋁質本體310覆蓋於外殼221之底面,以於外殼221之正面定義出一容置槽226。絕緣基板225(如覆銅絕緣基板,Direct Bonded Copper,DBC)位於容置槽226內,其外部包覆有上述金屬鍍膜211(如直接披覆在陶瓷基板的厚銅箔)。晶片222固定於絕緣基板225上,其中一引線223分別連接晶片222與外殼221內之其一端子227,另一引線224分別連接絕緣基板225上之電路(圖中未示)與外殼221內之另一端子228。複合金屬層400透過焊料層510連接於述金屬鍍膜211與鋁質本體310之間。封裝部230填滿於容置槽226內,並包覆晶片222、引線223、224、絕緣基板225與複合金屬層400。More specifically, the power module 202 includes a housing 221, a chip 222, leads 223, 224, an insulating substrate 225 and a packaging portion 230. The aluminum body 310 covers the bottom surface of the housing 221 to define a receiving groove 226 on the front surface of the housing 221. The insulating substrate 225 (such as a copper-clad insulating substrate, Direct Bonded Copper, DBC) is located in the receiving groove 226, and its exterior is coated with the above-mentioned metal coating 211 (such as a thick copper foil directly coated on a ceramic substrate). The chip 222 is fixed on the insulating substrate 225, one of the leads 223 is connected to the chip 222 and one of the terminals 227 in the housing 221, and the other lead 224 is connected to the circuit (not shown) on the insulating substrate 225 and the other terminal 228 in the housing 221. The composite metal layer 400 is connected between the metal coating 211 and the aluminum body 310 through the solder layer 510. The package 230 is filled in the receiving groove 226 and covers the chip 222, the leads 223, 224, the insulating substrate 225 and the composite metal layer 400.

如此,透過以上各實施例之所述架構,本發明不必採用鍍鋅製程便能完成對鋁金屬及鋁合金之焊接程序,且能夠依據特定區域對鋁及鋁合金提供全部或局部表面處理,降低後製程鍍層之金屬用量之成本。Thus, through the structures described in the above embodiments, the present invention can complete the welding process of aluminum metal and aluminum alloy without using the galvanizing process, and can provide full or partial surface treatment for aluminum and aluminum alloy according to specific areas, thereby reducing the cost of metal usage in the post-process plating.

最後,上述所揭露之各實施例中,並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,皆可被保護於本發明中。因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。Finally, the above disclosed embodiments are not intended to limit the present invention. Anyone skilled in the art can make various changes and modifications within the spirit and scope of the present invention, and all of them can be protected by the present invention. Therefore, the scope of protection of the present invention shall be determined by the scope of the attached patent application.

10、11:電子裝置 100、101:層疊結構 200、202:功率模組 210:金屬底板 211:金屬鍍膜 220:功率單元 221:外殼 222:晶片 223、224:引線 225:絕緣基板 226:容置槽 227、228:端子 230:封裝部 300:散熱器 310:鋁質本體 311:頂面 312:入口 313:出口 314:內部通道 400、401:複合金屬層 410:介面穩定層 420:金屬接合膜 430:電鍍金屬層 500:連結層 501~504:步驟 510:焊料層 520:燒結鍍層 601~607:步驟 701~702:步驟 AA:線段 10, 11: Electronic device 100, 101: Stacked structure 200, 202: Power module 210: Metal base 211: Metal coating 220: Power unit 221: Housing 222: Chip 223, 224: Leads 225: Insulating substrate 226: Accommodation groove 227, 228: Terminals 230: Package 300: Heat sink 310: Aluminum body 311: Top surface 312: Inlet 313: Outlet 314: Internal channel 400, 401: Composite metal layer 410: Interface stabilizing layer 420: Metal bonding film 430: Electroplated metal layer 500: Bonding layer 501~504: Step 510: Solder layer 520: Sintered plating layer 601~607: Step 701~702: Step AA: Line segment

為讓本發明之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之說明如下: 第1圖為本發明一實施例之電子裝置的示意圖; 第2圖為第1圖沿線段AA所製成之局部剖視圖; 第3圖為第1圖之電子裝置的上視圖; 第4圖為本發明一實施例之電子裝置的局部剖視圖,其剖面處與第2圖之剖面處相同; 第5圖為本發明一實施例之電子裝置之製造方法的流程圖; 第6圖為第5圖之步驟503與504的細部流程圖; 第7圖為第5圖之步驟504之另一實施例的細部流程圖;以及 第8圖為本發明一實施例之電子裝置的示意圖。 In order to make the above and other purposes, features, advantages and embodiments of the present invention more clearly understandable, the attached drawings are described as follows: FIG. 1 is a schematic diagram of an electronic device of an embodiment of the present invention; FIG. 2 is a partial cross-sectional view made along line segment AA of FIG. 1; FIG. 3 is a top view of the electronic device of FIG. 1; FIG. 4 is a partial cross-sectional view of an electronic device of an embodiment of the present invention, and its cross-section is the same as that of FIG. 2; FIG. 5 is a flow chart of a method for manufacturing an electronic device of an embodiment of the present invention; FIG. 6 is a detailed flow chart of steps 503 and 504 of FIG. 5; FIG. 7 is a detailed flow chart of another embodiment of step 504 of FIG. 5; and FIG. 8 is a schematic diagram of an electronic device of an embodiment of the present invention.

國內寄存資訊(請依寄存機構、日期、號碼順序註記) 無 國外寄存資訊(請依寄存國家、機構、日期、號碼順序註記) 無 Domestic storage information (please note in the order of storage institution, date, and number) None Foreign storage information (please note in the order of storage country, institution, date, and number) None

10:電子裝置 10: Electronic devices

200:功率模組 200: Power module

210:金屬底板 210:Metal base plate

220:功率單元 220: Power unit

300:散熱器 300: Radiator

310:鋁質本體 310: Aluminum body

311:頂面 311: Top

312:入口 312:Entrance

313:出口 313:Exit

314:內部通道 314: Internal passage

400:複合金屬層 400: Composite metal layer

410:介面穩定層 410: Interface stabilization layer

420:金屬接合膜 420:Metal bonding film

430:電鍍金屬層 430: Electroplating metal layer

500:連結層 500: Link layer

510:焊料層 510: Solder layer

AA:線段 AA: Line segment

Claims (16)

一種電子裝置,包含: 一連結層; 一功率模組,包含至少一功率單元及一金屬表面,該功率單元熱連接該金屬表面; 一散熱器,包含一鋁質本體;以及 一複合金屬層,位於該鋁質本體與該金屬表面之間,且透過該連結層固接該金屬表面。 An electronic device comprises: a connecting layer; a power module comprising at least one power unit and a metal surface, wherein the power unit is thermally connected to the metal surface; a heat sink comprising an aluminum body; and a composite metal layer located between the aluminum body and the metal surface and fixed to the metal surface through the connecting layer. 如請求項1所述之電子裝置,其中該複合金屬層包含: 一介面穩定層,直接形成於該鋁質本體之一面;以及 一金屬接合膜,直接形成於該介面穩定層相對該鋁質本體之一面,且位於該介面穩定層與該金屬表面之間。 An electronic device as described in claim 1, wherein the composite metal layer comprises: an interface stabilizing layer formed directly on one side of the aluminum body; and a metal bonding film formed directly on one side of the interface stabilizing layer opposite to the aluminum body and located between the interface stabilizing layer and the metal surface. 如請求項2所述之電子裝置,其中該介面穩定層為一鈦層及一鉑層其中之一。An electronic device as described in claim 2, wherein the interface stabilizing layer is one of a titanium layer and a platinum layer. 如請求項2所述之電子裝置,其中該金屬接合膜為一銅層。An electronic device as described in claim 2, wherein the metal bonding film is a copper layer. 如請求項2所述之電子裝置,其中該複合金屬層更包含: 一電鍍金屬層,直接形成於該金屬接合膜相對該介面穩定層之一面,且位於該金屬接合膜與該金屬表面之間, 其中該連結層為一焊料層,該電鍍金屬層透過該焊料層焊接至該金屬表面上。 An electronic device as described in claim 2, wherein the composite metal layer further comprises: an electroplated metal layer, formed directly on one side of the metal bonding film opposite to the interface stabilizing layer, and located between the metal bonding film and the metal surface, wherein the connecting layer is a solder layer, and the electroplated metal layer is soldered to the metal surface through the solder layer. 如請求項5所述之電子裝置,其中該電鍍金屬層為一鍍銅層及一鍍鎳層其中之一。An electronic device as described in claim 5, wherein the electroplated metal layer is one of a copper-plated layer and a nickel-plated layer. 如請求項2所述之電子裝置,其中該連結層為一燒結鍍層,且該燒結鍍層直接介於該金屬接合膜與該金屬表面之間。An electronic device as described in claim 2, wherein the connecting layer is a sintered deposited layer, and the sintered deposited layer is directly between the metal bonding film and the metal surface. 如請求項1所述之電子裝置,其中該功率模組更包含一金屬底板,該金屬底板承載並接觸該功率單元,其中該金屬表面為該金屬底板之表面。An electronic device as described in claim 1, wherein the power module further comprises a metal base plate, the metal base plate supports and contacts the power unit, and the metal surface is the surface of the metal base plate. 如請求項1所述之電子裝置,其中該金屬表面為位於該功率模組表面之一金屬鍍膜。An electronic device as described in claim 1, wherein the metal surface is a metal coating located on the surface of the power module. 一種電子裝置之製造方法,包含: 提供一散熱器之一鋁質本體; 提供一功率模組一金屬表面; 形成一複合金屬層至該鋁質本體上;以及 將該複合金屬層透過一連結層固接至該金屬表面上。 A method for manufacturing an electronic device, comprising: Providing an aluminum body of a heat sink; Providing a metal surface of a power module; Forming a composite metal layer on the aluminum body; and Fixing the composite metal layer to the metal surface through a connecting layer. 如請求項10所述之電子裝置之製造方法,其中形成該複合金屬層至該鋁質本體上之步驟更包含: 部分地遮蔽該鋁質本體之該表面,並從該表面曝露出一濺鍍區; 將該鋁質本體放入一真空腔室內,並對該鋁質本體之該濺鍍區進行真空濺鍍程序,使得該鋁質本體之該表面對應該濺鍍區之位置濺鍍出一介面穩定層,其中該介面穩定層為一鈦層及一鉑層其中之一;以及 再度對該鋁質本體進行另一真空濺鍍程序,使得一金屬接合膜直接形成於該介面穩定層上,其中該金屬接合膜為一銅層。 The manufacturing method of the electronic device as described in claim 10, wherein the step of forming the composite metal layer on the aluminum body further includes: Partially masking the surface of the aluminum body and exposing a sputtering area from the surface; Placing the aluminum body in a vacuum chamber and performing a vacuum sputtering process on the sputtering area of the aluminum body so that an interface stabilizing layer is sputtered at a position of the surface of the aluminum body corresponding to the sputtering area, wherein the interface stabilizing layer is one of a titanium layer and a platinum layer; and The aluminum body is subjected to another vacuum sputtering process so that a metal bonding film is directly formed on the interface stabilizing layer, wherein the metal bonding film is a copper layer. 如請求項11所述之電子裝置之製造方法,其中該金屬接合膜直接形成於該介面穩定層之步驟之後更包含: 將該鋁質本體從該真空腔室移入一電解液,並對該鋁質本體進行一電鍍程序,使得一電鍍金屬層直接形成於該金屬接合膜上,其中該電鍍金屬層為一鍍銅層及一鍍鎳層其中之一。 The manufacturing method of the electronic device as described in claim 11, wherein the step of directly forming the metal bonding film on the interface stabilizing layer further comprises: Moving the aluminum body from the vacuum chamber into an electrolyte, and performing an electroplating process on the aluminum body so that an electroplated metal layer is directly formed on the metal bonding film, wherein the electroplated metal layer is one of a copper-plated layer and a nickel-plated layer. 如請求項12所述之電子裝置之製造方法,其中將該複合金屬層透過該連結層固接至該金屬表面上之步驟更包含: 配置一焊料至該電鍍金屬層及該金屬表面之間,以形成一待加工物;以及 將該待加工物送入一迴焊爐,使得被熱熔後之該焊料直接形成一能夠焊接該電鍍金屬層及該金屬表面之焊料層。 The manufacturing method of the electronic device as described in claim 12, wherein the step of fixing the composite metal layer to the metal surface through the connecting layer further includes: Disposing a solder between the electroplated metal layer and the metal surface to form an object to be processed; and Sending the object to be processed into a reflow soldering furnace so that the solder after being hot-melted directly forms a solder layer capable of welding the electroplated metal layer and the metal surface. 如請求項11所述之電子裝置之製造方法,其中將該複合金屬層透過該連結層固接至該金屬表面上之步驟更包含: 配置一燒結粉末至該金屬接合膜及該金屬表面之間,以形成一待加工物;以及 將該待加工物進行一燒結程序,使得被燒結後之該燒結粉末形成一能夠焊接該金屬接合膜及該金屬表面之燒結鍍層。 The manufacturing method of the electronic device as described in claim 11, wherein the step of fixing the composite metal layer to the metal surface through the connecting layer further includes: Disposing a sintered powder between the metal bonding film and the metal surface to form an object to be processed; and Subjecting the object to be processed to a sintering process so that the sintered powder after sintering forms a sintered coating layer capable of welding the metal bonding film and the metal surface. 如請求項10所述之電子裝置之製造方法,其中該功率模組之一金屬底板承載並接觸該功率模組之一功率單元,且該金屬表面為該金屬底板之表面。A method for manufacturing an electronic device as described in claim 10, wherein a metal base plate of the power module carries and contacts a power unit of the power module, and the metal surface is the surface of the metal base plate. 如請求項10所述之電子裝置之製造方法,其中該金屬表面為位於該功率模組表面之一金屬鍍膜。A method for manufacturing an electronic device as described in claim 10, wherein the metal surface is a metal coating located on the surface of the power module.
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