TW202335857A - Optical assembly and electronic device comprising same - Google Patents
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- 230000003287 optical effect Effects 0.000 title claims abstract description 49
- 239000002245 particle Substances 0.000 claims abstract description 102
- 230000003667 anti-reflective effect Effects 0.000 claims abstract description 63
- 239000000758 substrate Substances 0.000 claims abstract description 18
- 239000000084 colloidal system Substances 0.000 claims description 29
- 239000000463 material Substances 0.000 claims description 24
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 22
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 15
- 239000002994 raw material Substances 0.000 claims description 11
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 8
- 239000004925 Acrylic resin Substances 0.000 claims description 7
- 239000003085 diluting agent Substances 0.000 claims description 7
- -1 polyethylene terephthalate Polymers 0.000 claims description 7
- 239000000377 silicon dioxide Substances 0.000 claims description 7
- 239000007787 solid Substances 0.000 claims description 7
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 6
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 6
- 229920000515 polycarbonate Polymers 0.000 claims description 5
- 239000004417 polycarbonate Substances 0.000 claims description 5
- 230000001681 protective effect Effects 0.000 claims description 5
- 229920002284 Cellulose triacetate Polymers 0.000 claims description 4
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 claims description 4
- 239000011521 glass Substances 0.000 claims description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 4
- 239000004408 titanium dioxide Substances 0.000 claims description 4
- 239000004642 Polyimide Substances 0.000 claims description 3
- 239000003822 epoxy resin Substances 0.000 claims description 3
- 239000000178 monomer Substances 0.000 claims description 3
- 229920000647 polyepoxide Polymers 0.000 claims description 3
- 229920001721 polyimide Polymers 0.000 claims description 3
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims 1
- 238000005452 bending Methods 0.000 abstract description 18
- 239000010410 layer Substances 0.000 description 104
- 238000002310 reflectometry Methods 0.000 description 16
- 239000004814 polyurethane Substances 0.000 description 14
- 229920002635 polyurethane Polymers 0.000 description 14
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 12
- 238000000576 coating method Methods 0.000 description 12
- 239000000654 additive Substances 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 9
- 238000012360 testing method Methods 0.000 description 9
- 230000007704 transition Effects 0.000 description 9
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 8
- 239000003292 glue Substances 0.000 description 8
- GJKGAPPUXSSCFI-UHFFFAOYSA-N 2-Hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone Chemical compound CC(C)(O)C(=O)C1=CC=C(OCCO)C=C1 GJKGAPPUXSSCFI-UHFFFAOYSA-N 0.000 description 7
- 125000001931 aliphatic group Chemical group 0.000 description 7
- 230000008859 change Effects 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- 230000000996 additive effect Effects 0.000 description 6
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 6
- 239000002086 nanomaterial Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000002834 transmittance Methods 0.000 description 5
- 229920000178 Acrylic resin Polymers 0.000 description 4
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 4
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 4
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 2
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 2
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 2
- BMZWRXOVNFVRJL-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;[2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound CCC(CO)(CO)CO.C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C BMZWRXOVNFVRJL-UHFFFAOYSA-N 0.000 description 2
- GTELLNMUWNJXMQ-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical class OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(CO)(CO)CO GTELLNMUWNJXMQ-UHFFFAOYSA-N 0.000 description 2
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 2
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical class C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- ZHPNWZCWUUJAJC-UHFFFAOYSA-N fluorosilicon Chemical compound [Si]F ZHPNWZCWUUJAJC-UHFFFAOYSA-N 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000003678 scratch resistant effect Effects 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
本發明涉及光學技術領域,特別是涉及一種光學元件以及包含該光學元件的電子設備。The present invention relates to the field of optical technology, and in particular to an optical element and an electronic device including the optical element.
減反射是指減少或消除光學元件表面的反射光,從而增加光學元件的透光量,減少或消除系統的雜散光。對於手機、顯示器等電子產品,需要有效的減反射裝置以降低反射率,達到如使電子產品的邊緣呈現“一體黑”外觀表現的目的。“一體黑”會讓電子產品的外觀黑的很均勻,看起來更美觀,同時隨著電子產品中柔性屏、折疊屏的廣泛應用,“一體黑”也可以讓柔性屏、折疊屏在彎曲或折疊時產生的折痕看起來比較不明顯。但是,如果將傳統的減反射塗層直接應用於柔性屏或折疊屏,彎曲或折疊一段時間後會出現塗層開裂的情況。因此,需要進一步開發能夠應用於柔性屏、折疊屏的,具有良好耐彎折性的減反射裝置。Anti-reflection refers to reducing or eliminating the reflected light on the surface of the optical element, thereby increasing the light transmission of the optical element and reducing or eliminating the stray light of the system. For electronic products such as mobile phones and monitors, effective anti-reflection devices are needed to reduce the reflectivity, so as to achieve the purpose of making the edges of electronic products present a "black" appearance. "All-in-one black" will make the appearance of electronic products evenly black and more beautiful. At the same time, with the widespread application of flexible screens and folding screens in electronic products, "all-in-one black" can also make flexible screens and folding screens more comfortable when curved or folded. The creases created when folding appear less noticeable. However, if traditional anti-reflective coatings are applied directly to flexible screens or foldable screens, the coating will crack after being bent or folded for a period of time. Therefore, there is a need to further develop anti-reflection devices that can be applied to flexible screens and folding screens and have good bending resistance.
傳統的減反射裝置的研發主要有兩個方向。第一個方向為在電子產品的表面塗覆一層低折射率的塗層,塗層折射率(Refractive Index)一般介於1.35~1.40之間。由於光經過不同物質時,物質間彼此的折射率不同,所以根據Snell’s law,光就會發生折射與反射(如圖1所示),然而反射率的理論計算只跟折射率有關,反射率R(Reflectivity)計算公式為 ,因此單純從改變材料折射率(N 1)來降低反射率,會有物理上的限制,反射率降低幅度有限,並且低折射率的塗層不耐刮擦、容易脆化。在施工上還會額外增加一道塗布過程。除此之外,低折射率的塗層材料來源較少且價格高昂,還需要進一步篩選滿足與下面塗層的附著,可供選擇的材料十分有限。 The research and development of traditional anti-reflection devices mainly has two directions. The first direction is to apply a low-refractive index coating on the surface of electronic products. The refractive index of the coating (Refractive Index) is generally between 1.35 and 1.40. When light passes through different substances, the refractive index of the substances is different. Therefore, according to Snell's law, light will be refracted and reflected (as shown in Figure 1). However, the theoretical calculation of reflectivity is only related to the refractive index. The reflectance R (Reflectivity) calculation formula is , so simply reducing the reflectivity by changing the refractive index (N 1 ) of the material will have physical limitations. The range of reflectivity reduction is limited, and the low-refractive index coating is not scratch-resistant and easily brittle. An additional coating process will be added to the construction. In addition, low-refractive index coating materials are scarce and expensive. Further screening is required to meet the adhesion to the underlying coating, and the available materials are very limited.
第二個方向為在電子產品表面本身具有的硬化塗層中添加一些粒子來達到降低反射率的目的。但是在硬化塗層中額外引入粒子,雖然可以獲得較低程度的反射率,但是會導致硬化塗層的表面耐磨性能下降,難以應用於如電子產品的螢幕表面的塗層中。The second direction is to add some particles to the hardened coating on the surface of electronic products to reduce reflectivity. However, by introducing additional particles into the hardened coating, although a lower degree of reflectivity can be obtained, the surface wear resistance of the hardened coating will be reduced, making it difficult to apply it to coatings such as screen surfaces of electronic products.
同時,傳統的兩個研究方向中均對減反射裝置的耐彎折性能關注較少。At the same time, the two traditional research directions have paid less attention to the bending resistance of anti-reflection devices.
基於此,本發明提供一種在具備減反射光學性能的同時,還具有較高的耐磨性能和耐彎折性能的光學元件,以及包含其的電子設備。Based on this, the present invention provides an optical element that not only has anti-reflective optical properties, but also has high wear resistance and bending resistance, and an electronic device including the same.
本發明的第一方面,提供一種光學元件,包括基材,以及於所述基材表面依次層疊的第一膜層和第二膜層,所述第二膜層中分散有質量百分比為1%~20%的減反射粒子; 以質量百分比計,所述減反射粒子包括48%~52%的第一減反射粒子、28%~32%的第二減反射粒子和18%~22%的第三減反射粒子; 其中,所述第一減反射粒子的粒徑為≥50nm,且≤100nm; 所述第二減反射粒子的粒徑為≥20nm,且<50nm; 所述第三減反射粒子的粒徑為<20nm。 A first aspect of the present invention provides an optical element, including a base material, and a first film layer and a second film layer sequentially laminated on the surface of the base material, with a mass percentage of 1% dispersed in the second film layer. ~20% anti-reflective particles; In terms of mass percentage, the anti-reflective particles include 48% to 52% of the first anti-reflective particles, 28% to 32% of the second anti-reflective particles, and 18% to 22% of the third anti-reflective particles; Wherein, the particle diameter of the first anti-reflective particles is ≥50nm and ≤100nm; The particle size of the second anti-reflective particles is ≥20nm and <50nm; The particle size of the third anti-reflective particles is <20 nm.
在其中一個實施例中,所述減反射粒子在所述第二膜層中的質量百分比為10%~20%。In one embodiment, the mass percentage of the anti-reflection particles in the second film layer is 10% to 20%.
在其中一個實施例中,所述減反射粒子為實心結構。In one embodiment, the anti-reflective particles have a solid structure.
在其中一個實施例中,所述減反射粒子的材料選自二氧化矽和二氧化鈦中的一種或多種。In one embodiment, the material of the anti-reflective particles is selected from one or more of silicon dioxide and titanium dioxide.
在其中一個實施例中,所述第二膜層通過將所述減反射粒子分散在膠體中經固化成型製備,以質量百分比計,所述膠體的製備原料包括: 20%~40%的聚丙烯酸樹脂、10%~30%的環氧樹脂、20%~40%的丙烯酸酯低聚物、5%~25%的UV單體稀釋劑以及1%~5%的光引發劑。 In one embodiment, the second film layer is prepared by dispersing the anti-reflective particles in a colloid and solidifying it. In terms of mass percentage, the raw materials for preparing the colloid include: 20%~40% polyacrylic resin, 10%~30% epoxy resin, 20%~40% acrylate oligomer, 5%~25% UV monomer diluent and 1%~5% Photoinitiator.
在其中一個實施例中,以質量百分比計,所述第一膜層的製備原料包括: 20%~40%的聚丙烯酸樹脂、10%~30%的環氧樹脂、20%~40%的丙烯酸酯低聚物、5%~25%的UV單體稀釋劑以及1%~5%的光引發劑。 In one embodiment, in terms of mass percentage, the raw materials for preparing the first film layer include: 20%~40% polyacrylic resin, 10%~30% epoxy resin, 20%~40% acrylate oligomer, 5%~25% UV monomer diluent and 1%~5% Photoinitiator.
在其中一個實施例中,所述第一膜層的折射率大於所述第二膜層的折射率。In one embodiment, the refractive index of the first film layer is greater than the refractive index of the second film layer.
在其中一個實施例中,所述第二膜層的厚度為0.1μm~2μm;及/或 所述第一膜層的厚度為3μm~10μm。 In one embodiment, the thickness of the second film layer is 0.1 μm ~ 2 μm; and/or The thickness of the first film layer is 3 μm~10 μm.
在其中一個實施例中,所述基材的材料為聚醯亞胺、聚對苯二甲酸乙二酯、三醋酸纖維素、玻璃、聚碳酸酯或聚甲基丙烯酸甲酯。In one embodiment, the material of the substrate is polyimide, polyethylene terephthalate, cellulose triacetate, glass, polycarbonate or polymethyl methacrylate.
本發明的第二方面,提供一種電子設備,包括本體以及嵌合於所述本體的減反射裝置,所述減反射裝置為如上所述的光學元件。A second aspect of the present invention provides an electronic device, including a body and an anti-reflection device embedded in the body, where the anti-reflection device is the optical element as described above.
在其中一個實施例中,所述減反射裝置為保護蓋板。In one embodiment, the anti-reflection device is a protective cover.
上述光學元件通過在基材與第二膜層之間設置第一膜層,同時合理控制第二膜層中減反射粒子的占比,並採用不同粒徑的三種減反射粒子設置合理的級配,由此:1)通過不同粒徑的三種減反射粒子之間的互相配合,能夠較大限度的減少反射,保證元件的減反射光學特性,同時還能夠在第二膜層中形成較為穩定的膠內連結,使膜層具有較佳的耐磨性,且能夠保證膜層硬度;2)適量的、不同粒徑的三種減反射粒子分散的第二膜層還具有一定的柔韌性,配合設置第一膜層,使第二膜層與基材之間的附著緻密,如此可以使光學元件具有較佳的耐彎折性。The above-mentioned optical element sets a first film layer between the base material and the second film layer, while reasonably controlling the proportion of anti-reflective particles in the second film layer, and using three types of anti-reflective particles with different particle sizes to set a reasonable gradation. , thus: 1) Through the cooperation between three types of anti-reflection particles with different particle sizes, reflection can be reduced to the greatest extent, ensuring the anti-reflection optical properties of the element, and at the same time, a relatively stable film can be formed in the second film layer The connection within the glue makes the film layer have better wear resistance and can ensure the hardness of the film layer; 2) The second film layer dispersed with an appropriate amount of three types of anti-reflective particles of different particle sizes also has a certain degree of flexibility and can be matched with the settings The first film layer makes the adhesion between the second film layer and the substrate dense, so that the optical element can have better bending resistance.
此外,上述光學元件能夠作為電子設備最外層的保護層,保護內部的結構,如顯示面板和觸控元件等,當使用者在對電子設備進行點擊時,不會壓傷其內部的結構。In addition, the above-mentioned optical elements can be used as the outermost protective layer of electronic devices to protect internal structures, such as display panels and touch components. When users click on electronic devices, the internal structures will not be damaged.
以下結合具體實施例對本發明的光學元件以及包含該光學元件的電子設備作進一步詳細的說明。本發明可以以許多不同的形式來實現,並不限於本文所描述的實施方式。相反地,提供這些實施方式的目的是使對本發明公開內容理解更加透徹全面。The optical element of the present invention and the electronic device including the optical element will be described in further detail below with reference to specific embodiments. The invention may be embodied in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
除非另有定義,本文所使用的所有的技術和科學術語與屬於本發明的技術領域的技術人員通常理解的含義相同。本文中在本發明的說明書中所使用的術語只是為了描述具體的實施例的目的,不是旨在於限制本發明。Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the technical field to which the invention belongs. The terminology used herein in the description of the invention is for the purpose of describing specific embodiments only and is not intended to limit the invention.
本發明中,“一種或多種”指所列項目的任一種、任兩種或任兩種以上。In the present invention, "one or more" refers to any one, any two or more than two of the listed items.
本發明中,“第一方面”、“第二方面”等僅用於描述目的,不能理解為指示或暗示相對重要性或數量,也不能理解為隱含指明所指示的技術特徵的重要性或數量。而且“第一”、“第二”等僅起到非窮舉式的列舉描述目的,應當理解並不構成對數量的封閉式限定。In the present invention, "first aspect", "second aspect", etc. are only used for descriptive purposes and cannot be understood as indicating or implying the relative importance or quantity, nor can they be understood as implicitly indicating the importance or quantity of the indicated technical features. quantity. Moreover, "first", "second", etc. only serve the purpose of non-exhaustive enumeration and description, and it should be understood that they do not constitute a closed limitation of quantity.
本發明中,以開放式描述的技術特徵中,包括所列舉特徵組成的封閉式技術方案,也包括包含所列舉特徵的開放式技術方案。In the present invention, the technical features described in open terms include closed technical solutions composed of the listed features, and also include open technical solutions including the listed features.
本發明中,涉及到數值區間,如無特別說明,上述數值區間內視為連續,且包括該範圍的最小值及最大值,以及這種最小值與最大值之間的每一個值。進一步地,當範圍是指整數時,包括該範圍的最小值與最大值之間的每一個整數。此外,當提供多個範圍描述特徵或特性時,可以合併該範圍。換言之,除非另有指明,否則本文中所公開之所有範圍應理解為包括其中所歸入的任何及所有的子範圍。In the present invention, when it comes to numerical intervals, unless otherwise specified, the above numerical interval is regarded as continuous and includes the minimum value and maximum value of the range, as well as every value between the minimum value and the maximum value. Further, when a range refers to an integer, every integer between the minimum value and the maximum value of the range is included. Additionally, when multiple ranges are provided to describe a feature or characteristic, the ranges can be combined. In other words, unless otherwise indicated, all ranges disclosed herein are to be understood to include any and all subranges subsumed therein.
本發明中,涉及的百分比含量,如無特別說明,對於固液混合和固相-固相混合均指質量百分比,對於液相-液相混合指體積百分比。In the present invention, the percentage content involved, unless otherwise specified, refers to mass percentage for solid-liquid mixing and solid-solid phase mixing, and refers to volume percentage for liquid-liquid phase mixing.
本發明中,涉及的百分比濃度,如無特別說明,均指終濃度。所述終濃度,指添加成分在添加該成分後的體系中的占比。In the present invention, the percentage concentration involved refers to the final concentration unless otherwise specified. The final concentration refers to the proportion of the added component in the system after adding the component.
本發明中,的溫度參數,如無特別限定,既允許為恒溫處理,也允許在一定溫度區間內進行處理。所述的恒溫處理允許溫度在儀器控制的精度範圍內進行波動。In the present invention, if the temperature parameter is not particularly limited, it is allowed to be treated at a constant temperature, or it is allowed to be treated within a certain temperature range. The thermostatic treatment described allows the temperature to fluctuate within the accuracy of the instrument control.
本發明中,“層疊於……表面”、“設置於……之間”可以指與層疊(設置)物件直接接觸,也可以與層疊(設置)物件間接接觸,即通過其它中間結構實現連接。In the present invention, "laminated on the surface of..." and "arranged between..." may refer to direct contact with the stacked (arranged) objects, or indirect contact with the stacked (arranged) objects, that is, connection through other intermediate structures.
本發明中,“低聚物”是指由較少的重複單元所組成的聚合物,其相對分子質量介於小分子和高分子之間。不作限制地,本發明中“低聚物”是指由10~20個重複單元所組成的聚合物。In the present invention, "oligomer" refers to a polymer composed of fewer repeating units, and its relative molecular mass is between small molecules and macromolecules. Without limitation, "oligomer" in the present invention refers to a polymer composed of 10 to 20 repeating units.
本發明提供一種光學元件,包括基材以及於所述基材表面依次層疊的第一膜層和第二膜層,第二膜層中分散有質量百分比為1%~20%的減反射粒子;以質量百分比計,減反射粒子包括48%~52%的第一減反射粒子、28%~32%的第二減反射粒子和18%~22%的第三減反射粒子;其中,第一減反射粒子的粒徑為≥50nm,且≤100nm;第二減反射粒子的粒徑為≥20nm,且<50nm;第三減反射粒子的粒徑為<20nm。The invention provides an optical element, which includes a base material and a first film layer and a second film layer sequentially laminated on the surface of the base material. Anti-reflection particles with a mass percentage of 1% to 20% are dispersed in the second film layer; In terms of mass percentage, the anti-reflective particles include 48% to 52% of the first anti-reflective particles, 28% to 32% of the second anti-reflective particles and 18% to 22% of the third anti-reflective particles; among which, the first anti-reflective particles The particle diameter of the reflective particles is ≥50nm and ≤100nm; the particle diameter of the second anti-reflective particles is ≥20nm and <50nm; the particle diameter of the third anti-reflective particles is <20nm.
可以理解地,第一膜層的主要作用在於在基材與第二膜層之間形成過渡,即作為過渡層使第二膜層與基材之間的附著緻密。It can be understood that the main function of the first film layer is to form a transition between the substrate and the second film layer, that is, as a transition layer to make the adhesion between the second film layer and the substrate dense.
不作限制地,第二膜層可為電子設備基材表面的任意功能膜層,根據電子設備的不同而設置。進一步地,第二膜層並非光學塗層。在其中一個具體的示例中,第二膜層為保護膜層,即提供對其下膜層的封裝和保護作用。進一步地,第二膜層為硬質層。Without limitation, the second film layer can be any functional film layer on the surface of the electronic device substrate, and is configured according to different electronic devices. Further, the second film layer is not an optical coating. In one specific example, the second film layer is a protective film layer, which provides encapsulation and protection for the film layer below it. Further, the second film layer is a hard layer.
不作限制地,上述光學元件的減反射原理如下: 當光線進入光學元件的第二膜層內時,遇到其中分散的減反射粒子,光線會改變原本直直的行徑路線,產生了折射與反射的變化,不同粒徑的減反射粒子改變光的折射與反射路徑不同,光線在不同粒徑的減反射粒子之間發生更多的折射和反射,反射率也因此降的更低。參見圖1和2,圖1為正常的光線行徑介質材料時的折射與反射行為,圖2是光線遇到第二膜層中分散的減反射粒子時,改變了原本行徑的路線,也改變光線的折射與反射路徑,進而降低反射率。同時,減反射粒子的存在除了改變光線的行徑方向外,還使光線多走了路徑,因此也會衰減光的能量,進一步降低反射率。 Without limitation, the anti-reflection principle of the above optical elements is as follows: When light enters the second film layer of an optical element and encounters dispersed anti-reflective particles, the light will change its original straight path, resulting in changes in refraction and reflection. Anti-reflective particles of different particle sizes change the direction of light. The paths of refraction and reflection are different. Light undergoes more refraction and reflection between anti-reflection particles of different particle sizes, and the reflectivity is therefore lowered. See Figures 1 and 2. Figure 1 shows the refraction and reflection behavior of normal light when it travels through dielectric materials. Figure 2 shows that when light encounters anti-reflection particles dispersed in the second film layer, it changes its original path and also changes the light. refraction and reflection paths, thereby reducing reflectivity. At the same time, the presence of anti-reflective particles not only changes the direction of the light, but also causes the light to take more paths, thus attenuating the energy of the light and further reducing the reflectivity.
特別地,上述光學元件在第二膜層中採用特定粒徑組合的減反射粒子,可以經由空隙,增加改變光的行徑方向。其中,48%~52%的第一減反射粒子的粒徑為≥50nm,且≤100nm,其在第二膜層中分佈範圍最廣,首先起到改變光線路徑的作用,28%~32%的第二減反射粒子(粒徑為≥20nm,且<50nm)和18%~22%的第三減反射粒子(<20nm),可以在第一減反射粒子之間找到空隙,再次改變光線的行徑方向。當三種減反射粒子的占比和粒徑在上述範圍之外時,光學特性容易發生偏差,無法有效降低反射率。In particular, the above-mentioned optical element uses anti-reflective particles with a specific particle size combination in the second film layer, which can increase the change in the direction of the light path through the gaps. Among them, 48%~52% of the first anti-reflection particles have a particle size of ≥50nm and ≤100nm. They have the widest distribution range in the second film layer. They first play the role of changing the light path. 28%~32% The second anti-reflective particles (particle diameter is ≥20nm and <50nm) and 18%~22% of the third anti-reflective particles (<20nm) can find gaps between the first anti-reflective particles and change the light again. direction of travel. When the proportions and particle sizes of the three anti-reflective particles are outside the above range, the optical properties are prone to deviation and the reflectivity cannot be effectively reduced.
在其中一個具體的示例中,第三減反射粒子的粒徑為≥10μm,且<20nm。In one specific example, the particle diameter of the third anti-reflective particles is ≥10 μm and <20 nm.
進一步地,減反射粒子在第二膜層中的質量百分比為1%~20%。添加量不足,會發生光入射到表面層後,無法碰到減反射粒子,因為碰不到減反射粒子,就無法改變光的行徑方向。無法改變光的行徑方向,光就會直直走,產生反射,導致反射率提升,無法有效降低反射率。添加量過多,可能會發生經過攪拌後的減反射粒子,仍然過於集中,過於集中的微小減反射粒子,雖然還是可以改變光的行徑方向,但過於集中,會影響整體的穿透率,將會導致從底部發出的光線被遮蔽,導致穿透率降低,且無法有效降低反射率。同時,添加量過多,光學元件的霧度也會增加,影響產品的外觀。具體地,減反射粒子在第二膜層中的質量百分比包括但不限於:1%、3%、4%、5%、6%、7%、8%、9%、10%、11%、12%、13%、14%、15%、16%、17%、20%。Further, the mass percentage of the anti-reflection particles in the second film layer is 1% to 20%. If the added amount is insufficient, it will happen that after the light is incident on the surface layer, it will not be able to hit the anti-reflective particles. Because it cannot hit the anti-reflective particles, it will not be able to change the direction of the light. Without the ability to change the direction of the light, the light will go straight and reflect, resulting in an increase in reflectivity and an inability to effectively reduce the reflectivity. If too much is added, the anti-reflective particles after stirring may still be too concentrated. Although the tiny anti-reflective particles that are too concentrated can still change the direction of the light, being too concentrated will affect the overall transmittance and will As a result, the light emitted from the bottom is blocked, resulting in reduced transmittance, and the reflectivity cannot be effectively reduced. At the same time, if too much is added, the haze of the optical components will also increase, affecting the appearance of the product. Specifically, the mass percentage of anti-reflective particles in the second film layer includes but is not limited to: 1%, 3%, 4%, 5%, 6%, 7%, 8%, 9%, 10%, 11%, 12%, 13%, 14%, 15%, 16%, 17%, 20%.
在其中一個具體的示例中,減反射粒子在第二膜層中的質量百分比為10%~20%。In one specific example, the mass percentage of anti-reflective particles in the second film layer is 10% to 20%.
可以理解地,第二膜層通過將減反射粒子分散在膠體中經固化成型製備,減反射粒子需要在膠體中實現均勻分散。在其中一個具體的示例中,以質量百分比計,膠體的製備原料包括: 20%~40%的丙烯酸樹脂低聚物、10%~20%的光固化活性稀釋劑、1%~5%的光引發劑、1.5%~8%的添加劑以及50%~70%的溶劑。 It can be understood that the second film layer is prepared by dispersing anti-reflective particles in colloid and curing and molding, and the anti-reflective particles need to be uniformly dispersed in the colloid. In one specific example, in terms of mass percentage, the raw materials for preparing the colloid include: 20%~40% acrylic resin oligomer, 10%~20% light-curing reactive diluent, 1%~5% photoinitiator, 1.5%~8% additives and 50%~70% solvent.
其中,不作限制地,丙烯酸樹脂低聚物的官能度為6~15官,可選自聚醚型聚氨酯丙烯酸酯低聚物、聚酯型聚氨酯丙烯酸酯低聚物、聚碳酸酯型聚氨酯丙烯酸酯低聚物、脂肪族聚氨酯丙烯酸酯低聚物、有機矽改性聚氨酯丙烯酸酯低聚物、氟改性聚氨酯丙烯酸酯低聚物、環氧改性聚氨酯丙烯酸酯低聚物和聚酯丙烯酸酯低聚物中的一種或多種。Among them, without limitation, the functionality of the acrylic resin oligomer is 6 to 15, and can be selected from the group consisting of polyether polyurethane acrylate oligomer, polyester polyurethane acrylate oligomer, and polycarbonate polyurethane acrylate. Oligomers, aliphatic urethane acrylate oligomers, silicone-modified urethane acrylate oligomers, fluorine-modified urethane acrylate oligomers, epoxy-modified urethane acrylate oligomers and polyester acrylate oligomers one or more polymers.
不作限制地,光固化活性稀釋劑的官能度主要為2~6官,可選自季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、雙季戊四醇五丙烯酸酯、雙季戊四醇六丙烯酸酯、三羥甲基丙烷三丙烯酸酯、乙氧化三羥甲基丙烷三丙烯酸酯、三羥甲基丙烷三甲基丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、三羥甲基丙烷三丙烯酸酯、三羥甲基戊烷三甲基丙烯酸酯、三羥甲基丙烷季戊四醇三丙烯酸酯、丙氧化新戊二醇二丙烯酸酯、乙氧化1,6-己二醇二丙烯酸酯和三(2-丙烯醯氧乙基)異氰脲酸酯中的一種或多種。Without limitation, the functionality of the photocurable reactive diluent is mainly 2 to 6 functional groups, and can be selected from the group consisting of pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, and trimethylolpropane triacrylate. Acrylates, ethoxylated trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, 1,6-hexanediol di(meth)acrylate, trimethylolpropane triacrylate, trisacrylate Hydroxymethylpentane trimethacrylate, trimethylolpropane pentaerythritol triacrylate, propoxylated neopentyl glycol diacrylate, ethoxylated 1,6-hexanediol diacrylate and tris(2-acrylamide) Oxyethyl) one or more isocyanurates.
不作限制地,光引發劑可選自1-羥環己基苯酮(光引發劑184)、2-羥基-2-甲基-1-苯基-1-丙酮(光引發劑1173)、2,4,6-三甲基苯甲醯基-二苯基氧化膦(光引發劑TPO)和2-羥基-4-(2-羥乙氧基)-2-甲基苯丙酮(光引發劑2959)中的一種或多種。Without limitation, the photoinitiator can be selected from the group consisting of 1-hydroxycyclohexylphenone (Photoinitiator 184), 2-hydroxy-2-methyl-1-phenyl-1-propanone (Photoinitiator 1173), 2, 4,6-trimethylbenzoyl-diphenylphosphine oxide (photoinitiator TPO) and 2-hydroxy-4-(2-hydroxyethoxy)-2-methylpropiophenone (photoinitiator 2959 ) one or more.
不作限制地,添加劑可選自無機納米材料和氟矽類添加劑中的一種或多種。Without limitation, the additive may be selected from one or more of inorganic nanomaterials and fluorosilicon additives.
不作限制地,溶劑可選自醋酸乙酯、醋酸丁酯、丁酮、甲基異丁基甲酮、丙二醇甲醚和丙二醇甲醚醋酸酯中的一種或多種。Without limitation, the solvent may be selected from one or more of ethyl acetate, butyl acetate, methyl ethyl ketone, methyl isobutyl ketone, propylene glycol methyl ether and propylene glycol methyl ether acetate.
在其中一個具體的示例中,減反射粒子為實心結構。在上述第二膜層的製備原料中,採用實心結構的減反射粒子能夠實現與膠體之間較好的相容性,同時,實心結構在破壞反射光的效果上更優,且生產和獲得皆較為方便,價格也更低,不會因為環境溫度變化太大而產生形變,耐用耐磨性好,信耐性(信耐性或又稱信賴性(Reliability Test),指的是產品在不同使用環境下,就算經過長時間使用,使用後的產品特性可以與一開始使用時的特性一樣,不會因為隨著使用時間增加而特性越來越差)表現更優。In one specific example, the anti-reflective particles are solid structures. Among the raw materials for preparing the above-mentioned second film layer, the use of solid structure anti-reflection particles can achieve better compatibility with colloids. At the same time, the solid structure is better at destroying reflected light, and is easy to produce and obtain. It is more convenient and cheaper. It will not be deformed due to large changes in ambient temperature. It has good durability and wear resistance. Reliability (Reliability Test) refers to the performance of the product in different usage environments. , even after long-term use, the product characteristics after use can be the same as the characteristics at the beginning of use, and the performance will not become worse as the use time increases).
可以理解地,減反射粒子優選為透明無色的減反射粒子。在其中一個具體的示例中,減反射粒子的材料選自二氧化矽和二氧化鈦中的一種或多種。二氧化鈦和二氧化矽具有較低的折射率且是透明的,且與第二膜層的製備原料在合成時,能有效地鏈結,提高外觀透明度,霧度低。具體地,前述折射率介於1.2~1.3。如果進一步小於1.2,與第二膜層製備原料的相容性會變差,導致無法溶解,會影響透明度、光的穿透率,增加霧度。It can be understood that the anti-reflective particles are preferably transparent and colorless anti-reflective particles. In one specific example, the material of the anti-reflective particles is selected from one or more of silicon dioxide and titanium dioxide. Titanium dioxide and silicon dioxide have a low refractive index and are transparent, and can be effectively linked with the raw materials for preparing the second film layer during synthesis to improve the appearance of transparency and low haze. Specifically, the aforementioned refractive index ranges from 1.2 to 1.3. If it is further less than 1.2, the compatibility with the raw materials for preparing the second film layer will become worse, resulting in inability to dissolve, which will affect the transparency, light transmittance, and increase haze.
不作限制地,前述第二膜層的製備方法包括如下步驟: 將第二膜層的膠體的製備原料混合,製備膠體溶液; 將減反射粒子分批加入至膠體溶液中,攪拌分散。 Without limitation, the preparation method of the aforementioned second film layer includes the following steps: Mix the raw materials for preparing the colloid of the second film layer to prepare a colloid solution; Add the anti-reflective particles to the colloidal solution in batches and stir to disperse.
可以理解地,第二膜層可以為一層,也可以為兩層以上,如三層。多層之間可以通過未添加減反射粒子的第二膜層的膠體層連接,也可以直接接觸層疊,未添加減反射粒子的第二膜層的膠體層也可以為一層以上。具體可如圖3~5所示:圖3展示於基材100表面依次層疊第一膜層200、兩層膠體層301以及第二膜層300;圖4展示於基材100表面依次層疊第一膜層200以及三層第二膜層300;圖5展示於基材100表面依次層疊第一膜層200、第二膜層300、膠體層301以及第二膜層300。It can be understood that the second film layer may be one layer, or may be two or more layers, such as three layers. The multiple layers may be connected through a colloid layer of the second film layer without adding anti-reflective particles, or they may be directly contacted and laminated. There may be more than one colloid layer of the second film layer without added anti-reflective particles. Specifically, it can be shown in Figures 3 to 5: Figure 3 shows that the
在其中一個具體的示例中,第二膜層的厚度為0.1μm~2μm。研究中發現,厚度過高反射率、耐磨耗性能彎折性能均有不同程度的下降,膜厚過小,則會使得膜表面不平整,外觀不良。In one specific example, the thickness of the second film layer is 0.1 μm~2 μm. The study found that if the thickness is too high, the reflectivity, wear resistance, and bending performance will decrease to varying degrees. If the film thickness is too small, the film surface will be uneven and the appearance will be poor.
在其中一個具體的示例中,第一膜層的厚度為3μm~10μm。研究中發現,過厚說明層數較多,生產的良率會降低,膜厚過小,則可能會發生密著不良的狀況。In one specific example, the thickness of the first film layer is 3 μm~10 μm. The study found that if the film thickness is too small, poor adhesion may occur if the film thickness is too small.
在其中一個具體的示例中,以質量百分比計,第一膜層的製備原料包括:In one specific example, in terms of mass percentage, the raw materials for preparing the first film layer include:
20%~40%的丙烯酸樹脂低聚物、10%~20%的光固化活性稀釋劑、1%~5%的光引發劑、1.5%~8%的添加劑以及50%~70%的溶劑。20%~40% acrylic resin oligomer, 10%~20% light-curing reactive diluent, 1%~5% photoinitiator, 1.5%~8% additives and 50%~70% solvent.
其中,不作限制地,丙烯酸樹脂低聚物的官能度為6~15官,可選自聚醚型聚氨酯丙烯酸酯低聚物、聚酯型聚氨酯丙烯酸酯低聚物、聚碳酸酯型聚氨酯丙烯酸酯低聚物、脂肪族聚氨酯丙烯酸酯低聚物、有機矽改性聚氨酯丙烯酸酯低聚物、氟改性聚氨酯丙烯酸酯低聚物、環氧改性聚氨酯丙烯酸酯低聚物和聚酯丙烯酸酯低聚物中的一種或多種。Among them, without limitation, the functionality of the acrylic resin oligomer is 6 to 15, and can be selected from the group consisting of polyether polyurethane acrylate oligomer, polyester polyurethane acrylate oligomer, and polycarbonate polyurethane acrylate. Oligomers, aliphatic urethane acrylate oligomers, silicone-modified urethane acrylate oligomers, fluorine-modified urethane acrylate oligomers, epoxy-modified urethane acrylate oligomers and polyester acrylate oligomers one or more polymers.
不作限制地,光固化活性稀釋劑的官能度主要為2~6官,可選自季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、雙季戊四醇五丙烯酸酯、雙季戊四醇六丙烯酸酯、三羥甲基丙烷三丙烯酸酯、乙氧化三羥甲基丙烷三丙烯酸酯、三羥甲基丙烷三甲基丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、三羥甲基丙烷三丙烯酸酯、三羥甲基戊烷三甲基丙烯酸酯、三羥甲基丙烷季戊四醇三丙烯酸酯、丙氧化新戊二醇二丙烯酸酯、乙氧化1,6-己二醇二丙烯酸酯和三(2-丙烯醯氧乙基)異氰脲酸酯中的一種或多種。Without limitation, the functionality of the photocurable reactive diluent is mainly 2 to 6 functional groups, and can be selected from the group consisting of pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, and trimethylolpropane triacrylate. Acrylates, ethoxylated trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, 1,6-hexanediol di(meth)acrylate, trimethylolpropane triacrylate, trisacrylate Hydroxymethylpentane trimethacrylate, trimethylolpropane pentaerythritol triacrylate, propoxylated neopentyl glycol diacrylate, ethoxylated 1,6-hexanediol diacrylate and tris(2-acrylamide) Oxyethyl) one or more isocyanurates.
不作限制地,光引發劑可選自1-羥環己基苯酮(光引發劑184)、2-羥基-2-甲基-1-苯基-1-丙酮(光引發劑1173)、2,4,6-三甲基苯甲醯基-二苯基氧化膦(光引發劑TPO)和2-羥基-4-(2-羥乙氧基)-2-甲基苯丙酮(光引發劑2959)中的一種或多種。Without limitation, the photoinitiator can be selected from the group consisting of 1-hydroxycyclohexylphenone (Photoinitiator 184), 2-hydroxy-2-methyl-1-phenyl-1-propanone (Photoinitiator 1173), 2, 4,6-trimethylbenzoyl-diphenylphosphine oxide (photoinitiator TPO) and 2-hydroxy-4-(2-hydroxyethoxy)-2-methylpropiophenone (photoinitiator 2959 ) one or more.
不作限制地,添加劑可選自無機納米材料和氟矽類添加劑中的一種或多種。Without limitation, the additive may be selected from one or more of inorganic nanomaterials and fluorosilicon additives.
不作限制地,溶劑可選自醋酸乙酯、醋酸丁酯、丁酮、甲基異丁基甲酮、丙二醇甲醚和丙二醇甲醚醋酸酯中的一種或多種。Without limitation, the solvent may be selected from one or more of ethyl acetate, butyl acetate, methyl ethyl ketone, methyl isobutyl ketone, propylene glycol methyl ether and propylene glycol methyl ether acetate.
在其中一個具體的示例中,第一膜層的折射率大於第二膜層的折射率。如此可以避免產生過多的反射折射,與第二膜層之間互相影響,出現干涉條紋,影響外觀。進一步地,第一膜層的折射率為1.465~1.505,第二膜層的折射率為1.465 ~ 1.485。In one specific example, the refractive index of the first film layer is greater than the refractive index of the second film layer. This can avoid excessive reflection and refraction, which will interact with the second film layer and cause interference fringes, which will affect the appearance. Further, the refractive index of the first film layer is 1.465~1.505, and the refractive index of the second film layer is 1.465~1.485.
在其中一個具體的示例中,基材的材料為聚醯亞胺(CPI)、聚對苯二甲酸乙二酯(PET)、三醋酸纖維素(TAC)、玻璃(如超薄玻璃UTG)、聚碳酸酯(PC)或聚甲基丙烯酸甲酯(PMMA)。In one specific example, the material of the substrate is polyimide (CPI), polyethylene terephthalate (PET), triacetylcellulose (TAC), glass (such as ultra-thin glass UTG), Polycarbonate (PC) or polymethylmethacrylate (PMMA).
進一步地,上述光學元件還包括設置於基材與第一膜層之間的介質層,介質層的達因值≥40。不作限制地,需要添加介質層的情況之一在於,基材的表面能太小,當達因值小於40(可用達因筆測達因值)時,第一膜層在基材上會發生密著性不佳,導致功能層很容易從基材上剝離,該介質層的存在可以提高基材的表面能,使第一膜層與基材的密著性良好。Furthermore, the above-mentioned optical element further includes a dielectric layer disposed between the base material and the first film layer, and the dyne value of the dielectric layer is ≥40. Without limitation, one of the situations where a dielectric layer needs to be added is that the surface energy of the substrate is too small. When the dyne value is less than 40 (the dyne value can be measured with a dyne pen), the first film layer will appear on the substrate. Poor adhesion causes the functional layer to be easily peeled off from the substrate. The presence of the dielectric layer can increase the surface energy of the substrate and ensure good adhesion between the first film layer and the substrate.
在其中一個具體的示例中,介質層的厚度為100nm~300nm。In one specific example, the thickness of the dielectric layer is 100nm~300nm.
在其中一個具體的示例中,介質層的材料為primer(例如氯化聚丙烯、SBS樹脂等)或者是Corona(Corona是指以電暈處理配合硬化膠附著或使硬化膠易於塗布在基材表面)In one specific example, the material of the dielectric layer is primer (such as chlorinated polypropylene, SBS resin, etc.) or Corona (Corona refers to the use of corona treatment to adhere to the hardened glue or to make the hardened glue easy to coat on the surface of the substrate. )
本發明還提供一種電子設備,包括本體以及嵌合於本體的減反射裝置,所減反射裝置為上述的光學元件。進一步地,電子設備可如手機、顯示器。The present invention also provides an electronic device, including a body and an anti-reflection device embedded in the body, where the anti-reflection device is the above-mentioned optical element. Further, electronic devices may include mobile phones and monitors.
在其中一個具體的示例中,減反射裝置為保護蓋板。進一步地,保護蓋板為螢幕蓋板。In one specific example, the anti-reflection device is a protective cover. Further, the protective cover is a screen cover.
以下為具體的實施例。The following are specific examples.
實施例和對比例中形成過渡層的膠水相同,組成如下(質量百分比): 傑事達DSP-552F(6官氟改性聚氨酯丙烯酸酯低聚物)15%、長興化學6195-100(10官脂肪族聚氨酯丙烯酸酯低聚物)10%、雙季戊四醇六丙烯酸酯10%、光引發劑2959 2%、NANOBYK-3605(無機納米材料)2.5%、信越KY-1203(氟矽類添加劑)1%、丙二醇甲醚20%和醋酸丁酯39.5%。 The glue forming the transition layer in the embodiment and the comparative example is the same, and its composition is as follows (mass percentage): JESTA DSP-552F (6-functional fluorine modified polyurethane acrylate oligomer) 15%, Changxing Chemical 6195-100 (10-functional aliphatic polyurethane acrylate oligomer) 10%, dipentaerythritol hexaacrylate 10%, Photoinitiator 2959 2%, NANOBYK-3605 (inorganic nanomaterial) 2.5%, Shin-Etsu KY-1203 (fluorosilicone additive) 1%, propylene glycol methyl ether 20% and butyl acetate 39.5%.
實施例1~5和對比例1~3提供的光學元件,其製作方法如下: (1)過渡層製作:將過渡層的膠水倒在基材PET上,使用線棒將膠均勻塗在基材上,經過UV燈照射硬化,UV燈照射能量約220mJ,得到過渡層,層厚約6μm; (2)硬質膜層製作: 2.1 按照表1(質量百分比)的級配混合二氧化矽實心粒子; 2.2 按照如下配方配製膠體(質量百分比): 膠體1:傑事達DSP-552F(6官氟改性聚氨酯丙烯酸酯低聚物)15%、長興化學6195-100(10官脂肪族聚氨酯丙烯酸酯低聚物)10%、雙季戊四醇六丙烯酸酯10%、光引發劑2959 2%、NANOBYK-3605(無機納米材料)2.5%、信越KY-1203(氟矽類添加劑)1%、丙二醇甲醚20%和醋酸丁酯39.5%。 膠體2:八禾新材料BW8025(平均10官氟改性聚氨酯丙烯酸酯低聚物)10%、沙多瑪CN9006NS(6官脂肪族聚氨酯丙烯酸酯低聚物)18%、三羥甲基丙烷三丙烯酸酯(TMPTA)12%、光引發劑2959 2.2%、NANOBYK-3605(無機納米材料)2.5%、信越KY-1203(氟矽類添加劑)1%、丙二醇甲醚15%和醋酸丁酯30.7%。 膠體3:長興化學6196-100(15官脂肪族聚氨酯丙烯酸酯低聚物)10%、沙多瑪CN9006NS(6官脂肪族聚氨酯丙烯酸酯低聚物)15%、季戊四醇三丙烯酸酯 13%、光引發劑1173 2.5%、NANOBYK-3605(無機納米材料)2.5%、信越KY-1203(氟矽類添加劑)1%、丙二醇甲醚19%和醋酸丁酯37%。 2.3 按照表1的質量百分比將二氧化矽實心粒子分批倒入相應的膠體中均勻攪拌,攪拌轉速控制為每分鐘180轉,加入完成後繼續攪拌10分鐘; 2.4 將步驟2.3所得混合物倒在過渡層的表面,利用滾輪均勻塗在基材上,控制滾輪與過渡層表面間的距離約1μm~2μm,經過UV燈照射硬化,UV燈照射能量約220mJ,得到硬質膜層,膜層厚度為2μm。 The manufacturing methods of the optical elements provided in Examples 1 to 5 and Comparative Examples 1 to 3 are as follows: (1) Transition layer production: Pour the glue of the transition layer on the base material PET, use a wire rod to evenly apply the glue on the base material, and harden it after UV light irradiation. The UV light irradiation energy is about 220mJ to obtain the transition layer. The layer thickness About 6μm; (2) Hard film layer production: 2.1 Mix silica solid particles according to the gradation in Table 1 (mass percentage); 2.2 Prepare the colloid according to the following formula (mass percentage): Colloid 1: Jestar DSP-552F (6-functional fluorine modified polyurethane acrylate oligomer) 15%, Changxing Chemical 6195-100 (10-functional aliphatic polyurethane acrylate oligomer) 10%, dipentaerythritol hexaacrylate 10%, photoinitiator 2959 2%, NANOBYK-3605 (inorganic nanomaterial) 2.5%, Shin-Etsu KY-1203 (fluorosilicone additive) 1%, propylene glycol methyl ether 20% and butyl acetate 39.5%. Colloid 2: Bahe New Material BW8025 (average 10-functional fluorine-modified polyurethane acrylate oligomer) 10%, Shaduomo CN9006NS (6-functional aliphatic polyurethane acrylate oligomer) 18%, trimethylolpropane trimethylol Acrylate (TMPTA) 12%, photoinitiator 2959 2.2%, NANOBYK-3605 (inorganic nanomaterial) 2.5%, Shin-Etsu KY-1203 (fluorosilicone additive) 1%, propylene glycol methyl ether 15% and butyl acetate 30.7% . Colloid 3: Changxing Chemical 6196-100 (15-functional aliphatic polyurethane acrylate oligomer) 10%, Sartosan CN9006NS (6-functional aliphatic polyurethane acrylate oligomer) 15%, pentaerythritol triacrylate 13%, light Initiator 1173 2.5%, NANOBYK-3605 (inorganic nanomaterial) 2.5%, Shin-Etsu KY-1203 (fluorosilicone additive) 1%, propylene glycol methyl ether 19% and butyl acetate 37%. 2.3 Pour the solid silica particles into the corresponding colloid in batches according to the mass percentage in Table 1 and stir evenly. The stirring speed is controlled to 180 rpm. After the addition is completed, continue stirring for 10 minutes; 2.4 Pour the mixture obtained in step 2.3 on the surface of the transition layer, use a roller to evenly apply it on the base material, control the distance between the roller and the surface of the transition layer to about 1μm~2μm, and harden it after irradiation with a UV lamp. The UV lamp irradiation energy is about 220mJ, and you get Hard film layer, film thickness is 2μm.
對比例3提供的光學元件的製作方法和原料同實施例1,主要區別在於:未進行步驟(1)過渡層的製作。The manufacturing method and raw materials of the optical element provided in Comparative Example 3 are the same as those in Example 1. The main difference is that step (1) of the transition layer is not made.
其中,實施例1製作得到的光學元件的電鏡圖如圖6所示。
表1
對實施例1~7以及對比例1~3的光學元件的測試方法如下: (1)反射率測試方法(光譜儀型號:柯尼卡美能達CM-5;光源為D65,角度為100): 1.1 準備兩個線性偏光片(Polarizer); 1.2 垂直粘合兩個偏光片(Polarizer); 1.3. 粘合測試樣品和交叉偏光片; 1.4. 將測試樣品面放在感測器區域; 1.5. 確保被測樣品平整且各粘合劑間無氣泡; 1.6. 開始量測,確認量測結果。 (2)彎折性能測試方法(設備型號:湯淺DML HB-FS): 2.1 準備用於折疊的測試樣品; 2.2 被測樣品長度不小於150mm; 2.3 對於內折疊,硬質膜層朝上; 2.4 將測試樣品的兩側固定在折疊板上; 2.5 設置折疊頻率為每秒一次; 2.6 每5萬次監測一次,直到20萬次停止; 2.7 檢查外觀並比較折疊前與折疊後的光學結果。 (3)穿透率(Transmittance)/霧度: 一束入射光穿過產品後,部分光會直直走,部分光會發生散射。+/-3度的光,定義為直線走的光,超過+/- 3度的光稱為散射光。 穿透率測試直線走的光與入射光的比值;霧度測試散射光與入射光的比值。 (4)耐磨: 0000#鋼絲絨負重1kg上放法碼重物來對產品做摩擦測試,1500次無明顯劃痕。 (5)硬度: 750g負重條件下進行測試。 The test methods for the optical elements of Examples 1 to 7 and Comparative Examples 1 to 3 are as follows: (1) Reflectance test method (spectrometer model: Konica Minolta CM-5; light source is D65, angle is 100): 1.1 Prepare two linear polarizers (Polarizer); 1.2 Glue two polarizers vertically; 1.3. Bond the test sample and crossed polarizer; 1.4. Place the test sample surface on the sensor area; 1.5. Make sure the sample being tested is flat and there are no bubbles between the adhesives; 1.6. Start measurement and confirm the measurement results. (2) Bending performance test method (Equipment model: Yuasa DML HB-FS): 2.1 Prepare test samples for folding; 2.2 The length of the sample to be tested shall not be less than 150mm; 2.3 For inward folding, the hard film layer faces upward; 2.4 Fix both sides of the test sample on the folding plate; 2.5 Set the folding frequency to once per second; 2.6 Monitor every 50,000 times until it stops at 200,000 times; 2.7 Check the appearance and compare the optical results before and after folding. (3) Transmittance/Haze: After a beam of incident light passes through the product, part of the light will go straight and part of the light will be scattered. Light at +/-3 degrees is defined as light traveling in a straight line, and light exceeding +/-3 degrees is called scattered light. The transmittance tests the ratio of straight light to incident light; the haze tests the ratio of scattered light to incident light. (4) Wear resistance: 0000# steel wool was loaded with a weight of 1kg and a heavy object was placed on the product to conduct a friction test. There were no obvious scratches after 1500 times. (5) Hardness: Tested under 750g load-bearing conditions.
結果如下表2所示:
表2
以上所述實施例的各技術特徵可以進行任意的組合,為使描述簡潔,未對上述實施例中的各個技術特徵所有可能的組合都進行描述,然而,只要這些技術特徵的組合不存在矛盾,都應當認為是本說明書記載的範圍。The technical features of the above-described embodiments can be combined in any way. To simplify the description, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, All should be considered to be within the scope of this manual.
以上所述實施例僅表達了本發明的幾種實施方式,便於具體和詳細地理解本發明的技術方案,但並不能因此而理解為對發明專利保護範圍的限制。應當指出的是,對於本領域的普通技術人員來說,在不脫離本發明構思的前提下,還可以做出若干變形和改進,這些都屬於本發明的保護範圍。應當理解,本領域技術人員在本發明提供的技術方案的基礎上,通過合乎邏輯的分析、推理或者有限的試驗得到的技術方案,均在本發明所附權利要求的保護範圍內。因此,本發明專利的保護範圍應以所附權利要求的內容為准,說明書及附圖可以用於解釋權利要求的內容。The above-mentioned embodiments only express several implementation modes of the present invention to facilitate a specific and detailed understanding of the technical solutions of the present invention, but they should not be construed as limiting the scope of protection of the invention patent. It should be noted that, for those of ordinary skill in the art, several modifications and improvements can be made without departing from the concept of the present invention, and these all belong to the protection scope of the present invention. It should be understood that technical solutions obtained by those skilled in the art through logical analysis, reasoning or limited testing based on the technical solutions provided by the present invention are within the protection scope of the appended claims of the present invention. Therefore, the protection scope of the patent of the present invention shall be subject to the contents of the appended claims, and the description and drawings may be used to interpret the contents of the claims.
100:基材 200:第一膜層 300:第二膜層 301:膠體層 N Air:空氣折射率 N 1:第一膜層折射率 100: Substrate 200: First film layer 300: Second film layer 301: Colloidal layer N Air : Air refractive index N 1 : First film layer refractive index
第1圖,為光通過介質發生折射與反射的示意圖。 第2圖,為光線遇到第二膜層中分散的減反射粒子時的折射與反射的示意圖。 第3圖,為本發明一示例的光學元件結構示意圖。 第4圖,為本發明又一示例的光學元件結構示意圖。 第5圖,為本發明再一示例的光學元件結構示意圖。 第6圖,為本發明一實施例的光學元件的電鏡圖。 Figure 1 is a schematic diagram of the refraction and reflection of light through a medium. Figure 2 is a schematic diagram of the refraction and reflection of light when it encounters anti-reflection particles dispersed in the second film layer. Figure 3 is a schematic structural diagram of an optical element according to an example of the present invention. Figure 4 is a schematic structural diagram of an optical element of another example of the present invention. Figure 5 is a schematic structural diagram of an optical element according to another example of the present invention. Figure 6 is an electron microscope image of an optical element according to an embodiment of the present invention.
100:基材 100:Substrate
200:第一膜層 200: first film layer
300:第二膜層 300: Second film layer
301:膠體層 301: Colloidal layer
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