TW202327404A - Focus ring temperature control component, base and plasma processing equipment capable of realizing more accurate and precise temperature control for focus ring and achieving more reliable safety - Google Patents

Abstract

The present invention discloses a focus ring temperature control component, a base, and a plasma processing equipment, in which the focus ring temperature control component is applied in the plasma processing equipment. The plasma processing equipment comprises: a base, an insulation ring and a focus ring disposed surrounding the base, wherein the focus ring is located above the insulation ring. The focus ring temperature control component includes: an edge ring disposed surrounding the base and located between the focus ring and the insulation ring; a heating component disposed on the edge ring; a flange disposed between the insulation ring and the base, located below the heating component, and configured with a power channel therein; and a temperature control cable passing through the power channel to be electrically connected with the heating component for controlling temperature of focus ring through the heating component. The present invention may realize more accurate and precise temperature control for focus ring and achieve more reliable safety.

Description

Focus ring temperature control components, base and plasma treatment equipment

The invention relates to the technical field of semiconductor equipment, in particular to a focus ring temperature control component, a base and plasma processing equipment.

Capacitively coupled plasma processing equipment (CCP) generates plasma by means of radio frequency coupling discharge, and then uses plasma for deposition, etching and other processing processes.

However, in the etching chamber of the capacitively coupled plasma processing equipment, different processes have different temperature requirements for the focus ring. As shown in Figure 1, the capacitively coupled plasma processing equipment includes a reaction chamber, the bottom of which is provided with a base 10, the base is provided with an electrostatic chuck, a focus ring 50 arranged around the base 10, an edge ring 40, an insulating ring 20 and ground ring 30; the focus ring 50 and the edge ring 40 are located above the insulating ring 20 and the ground ring (ground ring) 30, and an electrostatic electrode is arranged inside the electrostatic chuck for generating electrostatic attraction to Realize the support and fixation of the substrate to be processed during the process. A heating device is arranged under the electrostatic chuck to control the temperature of the substrate during the process. The focus ring 50 and the edge ring 40 are used to adjust the electric field or temperature distribution around the substrate to improve the uniformity of substrate processing.

A film coating heater 60 is placed under the edge ring (ceramic isolation ring, ceramic isolation ring) 40 under the focus ring 50 to heat the edge ring 40, and a first thermally conductive adhesive 70 is placed between the edge ring 40 and the electrostatic chuck 10, as Cooling: place the second heat conduction glue 71 between the edge ring 40 and the focus ring 50, the heat on the edge ring 40 is transferred to the focus ring 50 through the second heat conduction glue 71, and the temperature of the focus ring 50 is adjusted.

However, the existing technology only considers how to improve the heat transfer performance of the focus ring 50 or keep its temperature constant, but lacks effective means to further adjust and control the temperature of the focus ring 50 . Please continue to refer to FIG. 1. In the prior art, a circle of heaters is directly added to the steps of the base 10, but the heating equipment for the focus ring cannot be maintained separately; A power transmission channel 61 is made on the ground ring 30 , but due to the limited width of the ground ring 30 , it is difficult to achieve a very good seal between the ground ring 30 and the edge ring. Moreover, due to the setting of the power transmission channel 61, if the plasma in the reaction chamber leaks into the power transmission channel 61 due to poor sealing and is exposed to the plasma environment, the plasma is likely to explode when encountering a strong current.

The purpose of the present invention is to provide a focus ring temperature control component, base and plasma processing equipment, to achieve more accurate and fine temperature control of the focus ring, so that it can be adjusted in etching and other treatments, so as to meet higher process requirements the goal of.

In order to achieve the above object, the present invention is achieved through the following technical solutions: A focus ring temperature control assembly, which is used in plasma processing equipment, the plasma processing equipment includes: a base, an insulating ring and a focus ring arranged around the base, the focus ring is located above the insulating ring ; The focus ring temperature control assembly includes: an edge ring, which is arranged around the base, and is located between the focus ring and the insulating ring; a heating assembly, which is arranged on the edge ring. A flange, which is arranged between the insulating ring and the base, is located under the heating assembly, and a power channel is arranged inside the flange. A temperature control cable, which is electrically connected to the heating component through the power channel, so as to control the temperature of the focus ring through the heating component.

Preferably, the heating component is a thick film circuit heater, which is arranged between the edge ring and the flange, and is electrically connected to the temperature control cable. The thick film circuit heater is used to heat the edge ring, the cooling channel of the base is used to cool the edge ring to control the temperature of the edge ring, and the contact between the edge ring and the focus ring is performed Heat Conduction.

Preferably, the thick-film circuit heater is sealed with the flange.

Preferably, the contact surface between the thick film circuit heater and the flange is a sealing surface, and its surface roughness is Ra<0.4.

Preferably, it further includes a first sealing member disposed between the thick film circuit heater and the flange.

Preferably, one end of the flange close to the thick film circuit heater is provided with a first sealing groove, and the first sealing member is located inside the first sealing groove.

Preferably, the edge ring includes a first edge ring piece and a second edge ring piece arranged up and down oppositely; The heating component is a thick film circuit heater, which is arranged between the first edge ring piece and the second edge ring piece, and is connected with the temperature control cable. The thick film circuit heater is used to heat the edge ring, the cooling channel of the base is used to cool the edge ring to control the temperature of the edge ring, and the contact between the edge ring and the focus ring is performed Heat Conduction.

Preferably, the splicing gap between the first edge ring piece and the second edge ring piece is sealed with a sealing material.

Preferably, there is a sealing arrangement between the second edge ring piece and the flange.

Preferably, the contact surface between the second edge ring piece and the flange is a sealing surface, and its surface roughness is Ra<0.4.

Preferably, it also includes a second sealing component, which is arranged between the second edge ring piece and the flange.

Preferably, the end of the flange close to the second edge ring is provided with a second sealing groove, and the second sealing component is located inside the second sealing groove.

Preferably, the flange is divided into a plurality of flange segments that are sealed and connected to each other.

Preferably, there are two flange segments, denoted as a first flange segment and a second flange segment, the first flange segment is set close to the heating assembly; the second flange segment is far away from all The above heating element settings; A first passage is provided in the first flange section, a second passage is provided in the second flange section, and the first passage and the second passage communicate with each other.

The second channel is bent toward the base and communicates with the outlet at the bottom center of the base; One end of the temperature control cable runs through the second channel and the first channel and is electrically connected to the heating assembly, and the other end communicates with an external temperature control system through an outlet at the bottom center of the base.

Preferably, it further includes: a third sealing component arranged between the first flange segment and the second flange segment.

Preferably, a third sealing groove is provided on the contact surface between the first flange segment and the second flange segment, and the third sealing component is arranged inside the third sealing groove.

Preferably, it further includes: a fourth sealing component, which is arranged between the second flange segment and the side wall of the base.

Preferably, a fourth sealing groove surrounding the second channel is provided on the side wall of the second flange section, and the fourth sealing member is disposed in the fourth sealing groove.

Preferably, the flange is a non-metallic flange.

Preferably, the number of the flanges is multiple and arranged at intervals along the circumference of the base.

Preferably, a plurality of mounting grooves are arranged at intervals in the circumferential direction of the insulating ring, and each of the mounting grooves is located between the insulating ring and the side wall of the base, and the flanges are arranged one by one on each of the mounting grooves. Inside the installation groove, each side wall of the flange is in contact with the side wall of the base.

Preferably, it further includes: a plurality of temperature sensors, each of the temperature sensors is arranged at the heating assembly through the corresponding power supply channel, and is used for detecting the temperature of the focus ring.

Preferably, there is a step on the edge of the base, a part of the edge ring rests on the step, and another part rests on the flange, and a first thermal pad is provided on the upper surface of the step; A second heat conduction pad is arranged between the focus ring and the edge ring.

In another aspect, the present invention also provides a base, including: the focus ring temperature control assembly as described above.

In yet another aspect, the present invention also provides a plasma treatment device, comprising: a reaction chamber, a gas shower head and a base opposite to the gas shower head are arranged in the reaction chamber, and the base is base as above.

The present invention has at least one of the following advantages: The temperature control assembly of the focus ring provided by the present invention uses a flange arranged between the insulating ring and the base, and a power channel is provided inside the flange. A temperature control cable, which is electrically connected to the heating component through the power channel, so as to control the temperature of the focus ring through the heating component. It can be seen that the flange has sufficient space for setting the power supply channel, which solves the problem that due to the limited space of the grounding ring in the prior art, it is difficult to achieve very good sealing. If this causes the power transmission channel to be exposed to the plasma environment , The plasma is prone to explosion when it encounters a strong current, resulting in potential safety hazards.

The heating assembly provided by the present invention is a thick-film circuit heater, and the thick-film circuit heater can be pre-sintered on the corresponding position of the lower surface of the edge ring through a sintering process, so as to achieve Heating further achieves the purpose of heating the focus ring, and because the manufacturing process is mature, the manufacturing cost can be reduced.

The thick-film circuit heater is sealed with the flange, and its surface roughness is Ra<0.4, thereby further ensuring that the power channel is separated from the vacuum environment and improving the safety performance of the equipment.

In the present invention, the purpose of isolating the power channel from the vacuum environment is realized through the first sealing component arranged between the thick-film circuit heater and the flange, and the safety performance of the equipment is further improved.

The setting of the first sealing groove ensures the setting stability of the first sealing component, and further achieves the purpose of improving the safety performance of the equipment.

In the present invention, the thick film circuit heater is arranged between the first edge ring piece and the second edge ring piece, so it can be seen that the thick film circuit heater is close to the focus ring, and thus This more effectively controls the temperature of the focus ring.

In the present invention, the flange is divided into a plurality of flange sections that are hermetically connected to each other, thereby facilitating maintenance and reducing manufacturing costs.

Due to the setting of the flange, and the flange is a non-metallic flange, the inside of the flange can be provided with a second channel with any bending angle, thereby realizing the temperature control cable from the base The outlet at the center of the bottom of the seat extends out to connect with the external temperature control system, which solves the problem in the prior art that due to the space limitation of the grounding ring, it is difficult to arrange a nearly 90-degree curved power transmission channel inside it.

In the present invention, by setting a plurality of flanges, the thick-film circuit heaters can also be multiple, and arranged at intervals along the circumference of the base, so as to achieve better control of the focus ring. temperature control, since the thick film circuit heater is set on the edge ring, the focus ring temperature control system can be replaced by replacing the edge ring and the flange, which saves costs and solves the problem of the existing focus ring It is directly integrated on the base, and the temperature control of the focus ring is realized through the temperature control system on the base. The focus ring can only be maintained as a whole, and the base and the focus ring need to be replaced as a whole during maintenance.

The present invention realizes more accurate temperature control on the focus ring through the provided temperature sensor, so as to facilitate the purpose of making the temperature of the focus ring meet the requirements of different manufacturing processes.

A focus ring temperature control assembly, base and plasma processing equipment proposed by the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. The advantages and features of the present invention will become clearer from the following description. It should be noted that the drawings are in a very simplified form and all use imprecise scales, which are only used to facilitate and clearly assist the purpose of illustrating the embodiments of the present invention. In order to make the objects, features and advantages of the present invention more comprehensible, please refer to the accompanying drawings. It should be noted that the structures, proportions, sizes, etc. shown in the drawings attached to this specification are only used to match the content disclosed in the specification, for those who are familiar with this technology to understand and read, and are not used to limit the implementation of the present invention. condition, so it has no technical substantive meaning, and any modification of structure, change of proportional relationship or adjustment of size shall still fall within the scope of the present invention without affecting the effect and purpose of the present invention. within the scope covered by the disclosed technical content.

Embodiment one

As shown in Figure 2, this embodiment provides a focus ring temperature control assembly, which is applied in plasma processing equipment, and the plasma processing equipment includes: a base 100, an insulating ring 200 arranged around the base 100, Grounding ring 300 and focusing ring 500, the grounding ring 300 is arranged around the outer circumference of the insulating ring 200, the focusing ring 500 is located above the insulating ring 200; the focusing ring temperature control assembly includes: an edge ring 400, which It is arranged around the base 100 and is located between the focus ring 500 and the insulation ring 200 ; a heating component is arranged on the edge ring 400 . A flange, which is arranged between the insulating ring 200 and the base 100, is located below the heating assembly, and a power channel is arranged inside the flange. A temperature control cable 810 is electrically connected to the heating assembly through the power channel, so as to control the temperature of the focus ring 500 through the heating assembly.

It can be seen that, in the focus ring temperature control assembly provided in this embodiment, through the flange provided between the insulating ring 200 and the base, there is sufficient space for the power supply channel in the flange, which solves the problems caused by the prior art. The space of the grounding ring is limited, and it is difficult to achieve very good sealing. If the power transmission channel is exposed to the plasma environment, the plasma will easily explode when encountering a strong current, resulting in potential safety hazards, and because the flange setting Between the insulating ring 200 and the base 100, the heating assembly and the temperature control channel are brought closer to the base, and the corresponding upper edge ring 400 does not need to be extended outward, which saves space.

Please continue to refer to FIG. 2 , the heating component is a first thick film circuit heater 600 , which is disposed between the edge ring 400 and the flange, and is electrically connected to the temperature control cable 810 . The first thick film circuit heater 600 is used to heat the edge ring 400, and a cooling channel is provided in the base 100 for cooling the edge ring 400, so as to control the temperature of the edge ring 400. The contact between the ring 400 and the focus ring 500 conducts heat conduction. It can be understood that the first thick film circuit heater 600 can be pre-sintered on the corresponding position on the lower surface of the edge ring 400 through a sintering process, so as to realize heating of the edge ring 400, because the edge ring 400 The purpose of heat conduction to the focus ring 500 is realized by being in contact with the focus ring 500 , and because the sintering process is mature, the manufacturing cost of the focus ring temperature control system can be reduced.

Please continue to refer to FIG. 2 . In this embodiment, the first thick film circuit heater 600 is sealed between the flange. Specifically, in order to achieve the above-mentioned sealing, on the one hand, this embodiment can arrange a first sealing member 802, which is arranged between the first thick-film circuit heater 600 and the flange. One end of the flange close to the first thick film circuit heater 600 is provided with a first sealing groove, and the first sealing member 802 is located inside the first sealing groove. The first sealing member 802 may be an O-ring, and the first sealing groove may be annularly arranged around the outlet and/or inlet of the power channel, but the present invention is not limited thereto. Because the width of the flange provided here is sufficient, the first sealing part can be placed on it, and the setting of the first sealing groove can separate the power channel from the vacuum environment and prevent the plasma from leaking to the power supply. In the channel, the security performance of the equipment is improved.

On the other hand, the contact surface between the first thick film circuit heater 600 and the flange is a sealing surface, and its surface roughness is Ra<0.4. The surface roughness of the sealing surface is Ra<0.4, which further improves the sealing performance at the sealing surface and further improves the safety performance of the equipment.

In some other embodiments, for the convenience of installation and preparation, the flange can be divided into a plurality of flange segments that are sealed and connected with each other.

Please continue to refer to FIG. 2, in this embodiment, there are two flange segments, denoted as a first flange segment 800 and a second flange segment 801, and the first flange segment 800 is close to the The heating assembly is arranged; the second flange section 801 is arranged away from the heating assembly.

A first passage is provided in the first flange section 800 , a second passage is provided in the second flange section 801 , and the first passage and the second passage communicate with each other. The second channel is bent toward the base 100 and communicates with the outlet at the center of the bottom of the base 100; one end of the temperature control cable 810 runs through the second channel and the first channel to connect with the The heating element is electrically connected, and the other end communicates with an external temperature control system through an outlet at the bottom center of the base 100 . In some embodiments, the base 100 includes a mounting plate at the bottom of the base, and the outlet at the center of the bottom of the base is disposed on the mounting plate.

It can be understood that since the temperature control cable 810 runs through the first channel and the second channel, the positions of the first channel and the second channel can also refer to the temperature control in FIG. 2 Where the cable 810 is located.

Please continue to refer to FIG. 2 , in this embodiment, it further includes: a third sealing member 803 disposed between the first flange segment 800 and the second flange segment 801 . Specifically, the contact surface between the first flange segment 800 and the second flange segment 810 is provided with a third sealing groove, and the third sealing member 803 is arranged inside the third sealing groove .

In this embodiment, it further includes: a fourth sealing member 804 disposed between the second flange segment 801 and the side wall of the base 100 . A fourth sealing groove surrounding the second passage is provided on the side wall of the second flange section 801 , and the fourth sealing member 804 is disposed in the fourth sealing groove.

It can be seen from this that the arrangement of the third sealing member 803 and the fourth sealing member 804 further ensures that the temperature control cable 810 is isolated from the atmospheric environment and/or vacuum environment, so that the temperature control cable 810 and the The plasma does not touch, which further improves the safety performance of the equipment.

As shown in Fig. 4, the flange described in this embodiment is a non-metallic flange. For example, hard plastic materials can be used for preparation, but the present invention is not limited thereto.

There are multiple flanges, that is, there may be multiple first flange segments 800 , and they are arranged at intervals along the circumference of the base 100 . The circumferential interval of the insulating ring 200 is provided with a plurality of installation grooves, each of which is located between the insulating ring 200 and the side wall of the base 100, and the flange (the first flange section 800 and the second flange segment 801 ) are disposed inside the installation groove one by one, and each flange side wall is in contact with the side wall of the base 100 .

Due to the arrangement of the non-metallic flange, a second passage with any bending angle can be provided inside the flange, thereby enabling the temperature control cable 810 to protrude from the outlet at the bottom center of the base 100 The purpose of connecting with the external temperature control system is to solve the problem in the prior art that due to the space limitation of the grounding ring, if the internal power transmission channel is also bent to the bottom of the center of the base, it is difficult to arrange a power transmission channel close to 90 degrees inside. .

In this embodiment, a plurality of flanges are provided, so that the first thick film circuit heater 600 can also be multiple, and arranged at intervals along the circumference of the base 100, thus achieving the realization of the The focus ring 500 performs better temperature control. Since the first thick film circuit heater 600 is arranged on the edge ring 400, the focus ring temperature control system can be replaced by replacing the edge ring 400 and the flange. , save cost, and solve the problem that the existing focus ring is directly integrated on the base, and the temperature control of the focus ring is realized through the temperature control system on the base. This focus ring can only be maintained as a whole, and it needs to be replaced as a whole during maintenance. problems with the base and focus ring described above.

Please continue to refer to FIG. 2, the edge of the base 100 has a step, a part of the edge ring 400 rides on the step, and another part rides on the flange (the first flange segment in FIG. 1 800), the upper surface of the step is provided with a first thermal pad 700; that is, the lower surface of the edge ring 400 is in contact with both the step and the flange. A second heat conduction pad 710 is disposed between the focus ring 500 and the edge ring 400 . The heat conduction efficiency between different components is improved by the first heat conduction pad 700 and the second heat conduction pad 710 .

It can be seen that, in this embodiment, the first thick film circuit heater 600 is used to heat the edge ring 400 , and the heat of the edge ring 400 is transferred to the focus ring 500 through the second thermal pad 710 ; and Through the contact surfaces of the focus ring 500 and the edge ring 400 , heat is transferred by contact.

In this embodiment, since the lower surface of the edge ring 400 is in contact with the step, the cooling channel in the base 100 can be used in this embodiment to cool down the edge ring 400 to realize the temperature control of the edge ring 400. control. The arrangement of the first heat conduction pad 700 enables good heat conduction between the edge ring 400 and the base 100 , and finally realizes the temperature control of the focus ring 500 . Through more accurate and fine temperature control of the focus ring 500 , it can be adjusted in etching and other processes, so as to meet higher process requirements.

In this embodiment, it further includes: a plurality of temperature sensors, each of the temperature sensors is arranged at the heating assembly through the corresponding power channel, and is used for detecting the temperature of the focus ring 500 . It can be understood that each of the temperature sensors can be an optical fiber temperature sensor, or can be other forms of temperature measurement elements.

Embodiment two

As shown in FIG. 3 , the difference between this embodiment and Embodiment 1 is that the edge ring 400 includes a first edge ring piece 401 and a second edge ring piece 402 arranged up and down oppositely;

The heating component is a second thick film circuit heater 610 , which is arranged between the first edge ring piece 401 and the second edge ring piece 402 and connected to the temperature control cable 810 . The second thick film circuit heater 610 is used to heat the edge ring (the first edge ring piece 401 and the second edge ring piece 402 ), and the cooling channel of the base 100 is used to heat the edge ring 400 (the first edge ring piece 402 ). The temperature of the first edge ring piece 401 and the second edge ring piece 402 ) is lowered to control the temperature of the edge ring 400 , and the contact between the edge ring 400 and the focus ring 500 conducts heat.

In this embodiment, there are splicing gaps between the first edge ring 401 and the second edge ring 402 at the inner or outer circumference of the second thick film circuit heater 610, and all the splicing gaps Sealed with sealing material.

That is, in this embodiment, the second thick film circuit heater 610 may be disposed inside the edge ring. The second thick film circuit heater 610 is pre-sintered on the first edge ring piece 401 or the second edge ring piece 402, and then after the two edge ring pieces are covered up and down, the resulting splicing gap can be glued with non-metallic materials. Next, two pieces of ceramic rings can also be welded together after melting the filler metal material, so as to achieve vacuum sealing of the second thick film circuit heater 610.

Please continue to refer to FIG. 3 , the seal between the second edge ring piece 402 and the flange (specifically, the first flange segment 800 ) is arranged. The contact surface between the second edge ring piece 402 and the flange is a sealing surface, and its surface roughness is Ra<0.4.

This embodiment further includes a second sealing member 805 disposed between the second edge ring piece 402 and the flange (specifically, the first flange segment 800 ). The flange (specifically, the first flange section 800 ) is provided with a second sealing groove at one end close to the second edge ring piece 402 , and the second sealing member 805 is located inside the second sealing groove .

On the other hand, this embodiment also provides a base, including: the focus ring temperature control assembly as described in the above embodiments.

On the other hand, as shown in FIG. 5 , this embodiment also provides a plasma processing equipment, including: a reaction chamber 900, a gas shower head 901 and a gas shower head 901 are arranged above the reaction chamber 900 The pedestal opposite to the head 901, the pedestal is as described above, including an electrostatic chuck 910 for carrying the substrate, a focus ring 911 for regulating the edge plasma distribution of the substrate, and a cover ring 913 Used to protect the outer edge of the focus ring 911, the edge ring 912 is located under the focus ring 911, and a heating assembly is arranged inside it, and the insulating ring 914 is arranged under the edge ring 912, and a flange with a power channel is arranged inside, through which the power supply The channel electrically connects the DC power supply to the heating assembly, and is used to control the temperature change of the focus ring 911 by using the edge ring 912 to achieve etching uniformity of the substrate. Because the power channel is indirectly arranged in the insulating ring 914, the insulating ring 914 is closer to the base, which has a larger ring width, which is beneficial to provide seals on the upper and lower edges of the insulating ring 914 to prevent the plasma from entering the power channel and causing arc discharge. , because of the space requirements of the semiconductor processing equipment, the power line needs to be arranged out of the reaction chamber 900 from the bottom of the base and then connected to the power supply, so the insulating ring 914 closer to the base can reduce the bending degree of the wire and does not need to be folded into The right angle is good for the power cord to maintain its strength.

To sum up, the focus ring temperature control assembly provided by the present invention uses a flange arranged between the insulating ring and the base, and a power channel is provided inside the flange. A temperature control cable, which is electrically connected to the heating component through the power channel, so as to control the temperature of the focus ring through the heating component. It can be seen that the flange has sufficient space for setting the power supply channel, which solves the problem that due to the limited space of the grounding ring in the prior art, it is difficult to achieve very good sealing. If this causes the power transmission channel to be exposed to the plasma environment , The plasma is prone to explosion when it encounters a strong current, resulting in potential safety hazards.

In this embodiment, the film circuit heater is used to heat the edge ring, and heat is transferred through contact between the edge ring and the focus ring. The temperature of the edge ring is cooled by using the cooling channel in the base, so as to realize the temperature control of the edge ring and finally realize the temperature control of the focus ring. In this embodiment, the focus ring can be adjusted in etching and other processes through more accurate and fine temperature independent control, so as to meet higher process requirements.

It should be noted that in this article, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply that there is a relationship between these entities or operations. There is no such actual relationship or order between them. Furthermore, the term "comprises", "comprises" or any other variation thereof is intended to cover a non-exclusive inclusion such that a process, method, article, or apparatus comprising a set of elements includes not only those elements, but also includes elements not expressly listed. other elements of or also include elements inherent in such a process, method, article, or device. Without further limitations, an element defined by the phrase "comprising a ..." does not exclude the presence of additional identical elements in the process, method, article or apparatus comprising said element.

In describing the present invention, it is to be understood that the terms "center", "height", "thickness", "upper", "lower", "vertical", "horizontal", "top", "bottom", " The orientation or positional relationship indicated by "inner", "outer", "axial", "radial" and "circumferential" are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description , rather than indicating or implying that the device or element referred to must have a particular orientation, be constructed and operate in a particular orientation, and thus should not be construed as limiting the invention. In the description of the present invention, unless otherwise specified, "plurality" means two or more.

In the description of the present invention, unless otherwise specified and limited, the terms "installation", "connection", "connection" and "fixation" should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection , or integrated; it can be mechanically connected or electrically connected; it can be directly connected or indirectly connected through an intermediary, and it can be the internal communication of two components or the interaction relationship between two components. For those skilled in the technical field to which the present invention belongs, specific meanings of the above terms in the present invention can be understood in specific situations.

In the present invention, unless otherwise clearly specified and limited, a first feature being "on" or "under" a second feature may include direct contact between the first and second features, and may also include the first and second features Not in direct contact but through another characteristic contact between them. Moreover, "on", "above" and "above" the first feature on the second feature include that the first feature is directly above and obliquely above the second feature, or simply means that the level of the first feature is higher than that of the second feature. "Below", "under" and "under" the first feature on the second feature include that the first feature is directly below and obliquely below the second feature, or simply means that the level of the first feature is smaller than that of the second feature.

Although the content of the present invention has been described in detail through the above preferred embodiments, it should be understood that the above description should not be considered as limiting the present invention. Various modifications and substitutions of the present invention will be apparent to those skilled in the art to which the present invention pertains after reading the foregoing. Therefore, the protection scope of the present invention should be defined by the appended patent application scope.

100: base 200,914: insulation ring 300: Grounding ring 400,912: edge ring 401: first edge ring piece 402: second edge ring piece 500,911: focus ring 600: First Thick Film Circuit Heater 610: Second thick film circuit heater 700: The first thermal pad 710: Second thermal pad 800: The first flange section 801: Second flange segment 802: the first sealing part 803: The third sealing part 804: The fourth sealing part 805: Second sealing part 810: temperature control cable 900: reaction chamber 901: Gas sprinkler head 910: Electrostatic Chuck 913: cover ring

FIG. 1 is a schematic structural diagram of a focus ring temperature control assembly in the prior art; Fig. 2 is a schematic structural diagram of a focus ring temperature control assembly provided by an embodiment of the present invention; Fig. 3 is a schematic structural diagram of a focus ring temperature control assembly provided by another embodiment of the present invention; Fig. 4 is a top view schematic diagram of flange distribution in the focus ring temperature control assembly provided by another embodiment of the present invention; and Fig. 5 is a schematic diagram of the main structure of the plasma treatment equipment provided by an embodiment of the present invention.

100: base

200: insulating ring

300: Grounding ring

400: edge ring

500: focus ring

600: First Thick Film Circuit Heater

700: The first thermal pad

710: Second thermal pad

800: The first flange section

801: Second flange segment

802: the first sealing part

803: The third sealing part

804: The fourth sealing part

810: temperature control cable

Claims (25)

A focus ring temperature control component, which is applied in a plasma processing equipment, the plasma processing equipment includes: a base, an insulating ring and a focus ring arranged around the base, the focus ring is located above the insulating ring ; Wherein, the focus ring temperature control assembly includes: an edge ring, which is arranged around the base, and is located between the focus ring and the insulating ring; a heating assembly, which is arranged on the edge ring; a flange, which is arranged between the insulating ring and the base, and is located below the heating element, and a power channel is arranged inside the flange; and A temperature control cable is electrically connected to the heating component through the power supply channel, so as to control the temperature of the focus ring through the heating component. The focus ring temperature control assembly as claimed in claim 1, wherein the heating assembly is a thick film circuit heater, which is arranged between the edge ring and the flange, and is electrically connected to the temperature control cable; The thick film circuit heater is used for heating the edge ring, a cooling channel of the base is used for cooling the edge ring, so as to control the temperature of the edge ring, and the contact between the edge ring and the focus ring conducts heat conduction. The focus ring temperature control assembly as claimed in claim 2, wherein the thick film circuit heater is sealed with the flange. The focus ring temperature control assembly according to claim 3, wherein the contact surface between the thick film circuit heater and the flange is a sealing surface, and its surface roughness is Ra<0.4. The focus ring temperature control assembly as claimed in claim 4, further comprising a first sealing member disposed between the thick film circuit heater and the flange. The focus ring temperature control assembly as claimed in claim 5, wherein a first sealing groove is provided at the end of the flange close to the thick film circuit heater, and the first sealing member is located inside the first sealing groove. The focus ring temperature control assembly as claimed in item 1, wherein, The edge ring includes a first edge ring piece and a second edge ring piece arranged up and down oppositely; The heating component is a thick film circuit heater, which is arranged between the first edge ring piece and the second edge ring piece, and is connected with the temperature control cable; The thick film circuit heater is used to heat the edge ring, a cooling channel of the base is used to cool the edge ring to control the temperature of the edge ring, and the contact between the edge ring and the focus ring is for heat conduction. The focus ring temperature control assembly as claimed in item 7, wherein the splicing gap between the first edge ring piece and the second edge ring piece is sealed with a sealing material. The focus ring temperature control assembly as claimed in item 8, wherein the sealing is arranged between the second edge ring piece and the flange. The focus ring temperature control assembly according to claim 9, wherein the contact surface between the second edge ring piece and the flange is a sealing surface, and its surface roughness is Ra<0.4. The focus ring temperature control assembly as claimed in claim 10, further comprising a second sealing member disposed between the second edge ring piece and the flange. The focus ring temperature control assembly as claimed in claim 11, wherein a second sealing groove is formed on the end of the flange close to the second edge ring piece, and the second sealing member is located inside the second sealing groove. The focus ring temperature control assembly as claimed in Claim 1, wherein the flange is divided into a plurality of flange segments that are sealed and connected to each other. The focus ring temperature control assembly according to claim 13, wherein there are two flange sections, which are denoted as a first flange section and a second flange section, and the first flange section is arranged close to the heating assembly ; The second flange segment is disposed away from the heating component; A first passage is provided in the first flange section, a second passage is provided in the second flange section, and the first passage and the second passage communicate with each other; The second channel is bent toward the base and communicates with the outlet at the bottom center of the base; One end of the temperature control cable runs through the second channel and the first channel and is electrically connected to the heating assembly, and the other end communicates with an external temperature control system through an outlet at the bottom center of the base. The focus ring temperature control assembly as claimed in claim 14, further comprising: a third sealing member disposed between the first flange segment and the second flange segment. The focus ring temperature control assembly according to claim 15, wherein a third sealing groove is provided on the contact surface between the first flange segment and the second flange segment, and the third sealing member is arranged on the first flange segment. Triple seal groove inside. The focus ring temperature control assembly as claimed in claim 16, further comprising: a fourth sealing member disposed between the second flange segment and the side wall of the base. The focus ring temperature control assembly according to claim 17, wherein a fourth sealing groove surrounding the second channel is provided on the side wall of the second flange section, and the fourth sealing member is provided with the fourth sealing groove in the slot. The focus ring temperature control assembly as claimed in claim 18, wherein the flange is a non-metallic flange. The focus ring temperature control assembly as claimed in claim 1, wherein there are multiple flanges arranged at intervals along the circumference of the base. The focus ring temperature control assembly as claimed in claim 20, wherein a plurality of mounting grooves are arranged at circumferential intervals of the insulating ring, and each mounting groove is located between the insulating ring and the side wall of the base, and the flange One-to-one correspondence is arranged inside the installation groove, and each side wall of the flange is in contact with the side wall of the base. The focus ring temperature control assembly according to claim 21, further comprising: a plurality of temperature sensors, each of which is arranged at the heating assembly through the corresponding power supply channel, and is used to detect the focus ring temperature. The focus ring temperature control assembly as described in Claim 1, wherein the edge of the base has a step, a part of the edge ring rests on the step, and the other part rests on the flange, and the upper surface of the step A first heat conduction pad is provided; A second heat conduction pad is arranged between the focus ring and the edge ring. A base, including: the focus ring temperature control assembly as described in any one of claims 1-23. A plasma processing equipment, including: a reaction chamber, a gas shower head and a base opposite to the gas shower head are arranged in the reaction chamber, and the base is the base as described in Claim 24 seat.