TW202234092A - Optical film provided with antifouling layer - Google Patents

Abstract

An optical film with an anti-fouling layer according to the present invention comprises a substrate layer. This optical film (F) provided with an antifouling layer comprises a transparent substrate (10), an optical function layer (20), and an antifouling layer (30) in the stated order. An outer surface (31) of the antifouling layer (30) on the side opposite from the optical function layer (20) has a water contact angle of 110 DEG or greater.

Description

Optical film with antifouling layer

The present invention relates to an optical film with an antifouling layer.

On the outer surface on the image display side of a display such as a liquid crystal display, for example, a transparent optical film having a layer having a predetermined optical function (optical function layer) is provided. As an optical film, an antireflection film, a transparent conductive film, and an electromagnetic wave shielding film are mentioned, for example. The optical film includes, for example, a transparent base material, an optical functional layer disposed on one side of the transparent base material, and an adhesive layer disposed on the other side of the transparent base material. For example, the following patent document 1 describes the technique concerning such an optical film. [Prior Art Literature] [Patent Literature]

[Patent Document 1] Japanese Patent Laid-Open No. 2017-227898

[Problems to be Solved by Invention]

When the optical functional layer is configured as the outermost optical film, contaminants such as hand grease are easily attached to the optical functional layer, and the attached contaminants are not easily removed from the optical functional layer. From the viewpoint of securing the transparency of the optical film, it is not desirable that contaminants adhere to the optical film. Therefore, for example, an antifouling layer is provided as the outermost layer in the optical film. For such an optical film with an antifouling layer, the antifouling layer is required to have high antifouling properties.

The present invention provides an optical film with an antifouling layer suitable for realizing high antifouling properties of the antifouling layer. [Technical means to solve problems]

The present invention [1] includes an optical film with an antifouling layer, which comprises a transparent substrate, an optical function layer and an antifouling layer in sequence, and the antifouling layer and the optical function layer are opposite to the outer surface having an angle of 110° or more. water contact angle.

The present invention [2] includes the antifouling layer-attached optical film according to the above [1], wherein the outer surface has a surface roughness Ra exceeding 2 nm.

The present invention [3] includes the optical film with an antifouling layer according to the above [1] or [2], wherein the optical functional layer is an antireflection layer.

The present invention [4] includes the optical film with an antifouling layer as described in the above [3], wherein the antireflection layer alternately includes a high refractive index layer with a relatively large refractive index and a low refractive index layer with a relatively small refractive index .

The present invention [5] includes the antifouling layer-attached optical film according to any one of the above [1] to [4], wherein the transparent substrate has a hard coat layer on the optical functional layer side.

The present invention [6] includes the antifouling layer-attached optical film according to the above [5], wherein the hard coat layer contains metal oxide fine particles.

The present invention [7] includes the optical film with an antifouling layer as described in the above [6], wherein the metal oxide fine particles are nano-silicon oxide particles.

The present invention [8] includes the antifouling layer-attached optical film according to any one of the above [5] to [7], wherein the surface on the optical function layer side of the hard coat layer has a surface of 0.5 nm or more and 20 nm or less. Roughness Ra. [Effect of invention]

In the optical film with antifouling layer of the present invention, the outer surface of the antifouling layer on the opposite side to the optical functional layer has a water contact angle of 110° or more, so it is suitable for realizing high antifouling property of the antifouling layer.

As shown in FIG. 1 , as an embodiment of the optical film with an antifouling layer of the present invention, the optical film F includes a transparent substrate 10 , an optical functional layer 20 and an antifouling layer 30 in this order toward one side in the thickness direction D. As shown in FIG. In this embodiment, the optical film F is sequentially provided with a transparent substrate 10 , an adhesive layer 40 , an optical functional layer 20 and an antifouling layer 30 on one side of the thickness direction D, preferably the transparent substrate 10 and the adhesive layer 40 , an optical functional layer 20 and an antifouling layer 30 . Moreover, the optical film F has the shape which spreads in the direction (surface direction) orthogonal to the thickness direction D.

In this embodiment, the transparent base material 10 is provided with the resin film 11 and the hard-coat layer 12 in this order toward one side of the thickness direction D. As shown in FIG.

The resin film 11 is a flexible transparent resin film. As the material of the resin film 11, for example, polyester resin, polyolefin resin, polystyrene resin, acrylic resin, polycarbonate resin, polyether resin, polyamide resin, polyamide resin, polyimide can be mentioned. Resin, cellulose resin, norbornene resin, polyarylate resin and polyvinyl alcohol resin. As polyester resin, polyethylene terephthalate (PET), polybutylene terephthalate, and polyethylene naphthalate are mentioned, for example. As a polyolefin resin, polyethylene, a polypropylene, and a cycloolefin polymer are mentioned, for example. As a cellulose resin, triacetyl cellulose is mentioned, for example. These materials may be used alone or in combination of two or more. From the viewpoint of transparency and strength, as the material of the resin film 11 , it is preferable to use a cellulose resin, and it is more preferable to use triacetyl cellulose.

The surface of the hard coat layer 12 of the resin film 11 may also be subjected to surface modification treatment. As the surface modification treatment, for example, corona treatment, plasma treatment, ozone treatment, primer treatment, glow treatment, and coupling agent treatment may be mentioned.

From the viewpoint of strength, the thickness of the resin film 11 is preferably 5 μm or more, more preferably 10 μm or more, and still more preferably 20 μm or more. From the viewpoint of workability, the thickness of the resin film 11 is preferably 300 μm or less, more preferably 200 μm or less.

From the viewpoint of transparency, the visible light transmittance of the resin film 11 is preferably 80% or more, more preferably 90% or more. The visible light transmittance of the resin film 11 is, for example, 100% or less.

The hard coat layer 12 is arranged on one surface in the thickness direction D of the resin film 11 . The hard coat layer 12 is used to make the exposed surface (the upper surface in FIG. 1 ) of the optical film F difficult to form scratches.

The hard coat layer 12 is a cured product of the curable resin composition. Examples of the curable resin contained in the curable resin composition include polyester resins, acrylic resins, urethane resins, urethane acrylate resins, amide resins, polysiloxane resins, cyclic resins Oxygen resin, and melamine resin. These curable resins may be used alone or in combination of two or more. From the viewpoint of securing high hardness of the hard coat layer 12, it is preferable to use an acrylic resin and/or a urethane acrylate resin as the curable resin.

Moreover, as a curable resin composition, an ultraviolet curable resin composition and a thermosetting resin composition are mentioned, for example. As a curable resin composition, it is preferable to use an ultraviolet curable resin composition, and since it can harden|cure without high temperature heating, it contributes to the improvement of the manufacturing efficiency of the optical film F. The UV-curable resin composition includes at least one selected from the group consisting of UV-curable monomers, UV-curable oligomers, and UV-curable polymers. As an ultraviolet curable resin composition, the composition for hard-coat layer formation described in Unexamined-Japanese-Patent No. 2016-179686 is mentioned, for example.

The hard coat layer 12 may be a hard coat layer having anti-glare properties (anti-glare hard coat layer). The hard coat layer 12 of the anti-glare hard coat layer is a cured product of a curable resin composition, and the curable resin composition contains a curable resin (matrix resin) and fine particles (anti-glare fine particles) for expressing anti-glare properties. ). Examples of the anti-glare fine particles include metal oxide fine particles and organic fine particles. Examples of the material of the metal oxide fine particles include silicon oxide, aluminum oxide, titanium oxide, zirconium oxide, calcium oxide, tin oxide, indium oxide, cadmium oxide, and antimony oxide. As the material of the organic microparticles, polymethyl methacrylate, polysiloxane, polystyrene, polyurethane, acrylic resin-styrene copolymer, benzoguanamine, melamine, and Polycarbonate. These fine particles may be used alone or in combination of two or more. In order to make the hard coat layer 12 exhibit good anti-glare properties, as the anti-glare fine particles, it is preferable to use a group selected from the group consisting of nano-silicon oxide particles, polymethyl methacrylate particles, and polysiloxane particles. at least one of them.

The average particle diameter of the fine particles is, for example, 10 μm or less, preferably 8 μm or less, and, for example, 1 nm or more. When nanoparticles are used as fine particles, the average particle diameter of the fine particles is, for example, 100 nm or less, preferably 70 nm or less, and, for example, 1 nm or more. For example, the particle size distribution is obtained by the particle size distribution measurement method in the laser scattering method, and the D50 value (cumulative 50% median diameter) is obtained as the average particle diameter of the fine particles.

The refractive index of the matrix resin (after curing) is, for example, 1.46 or more, preferably 1.49 or more, more preferably 1.50 or more, and still more preferably 1.51 or more. The refractive index is, for example, 1.60 or less, preferably 1.59 or less, more preferably 1.58 or less, and still more preferably 1.57 or less.

The refractive index of the microparticles may be higher or lower than the above-mentioned refractive index of the matrix resin. When the refractive index of the fine particles is higher than that of the matrix resin, the refractive index of the fine particles is, for example, 1.62 or less, preferably 1.60 or less, more preferably 1.59 or less, and still more preferably 1.50 or less. When the refractive index of the fine particles is lower than the refractive index of the matrix resin, the refractive index of the fine particles is, for example, 1.40 or more, preferably 1.42 or more, and more preferably 1.44 or more.

The content of the fine particles in the hard coat layer 12 is preferably 1 part by mass or more, more preferably 3 parts by mass or more, relative to 100 parts by mass of the matrix resin. The content of the fine particles in the hard coat layer 12 is preferably 30 parts by mass or less, more preferably 20 parts by mass or less, relative to 100 parts by mass of the matrix resin.

From the viewpoint of securing the hardness of the hard coat layer 12, the thickness of the hard coat layer 12 is preferably 0.5 μm or more, and more preferably 1 μm or more. The thickness of the hard coat layer 12 is, for example, 10 μm or less.

Surface modification treatment may also be performed on the side surface of the adhesive layer 40 of the hard coat layer 12 . As the surface modification treatment, for example, plasma treatment, corona treatment, ozone treatment, primer treatment, glow treatment, and coupling agent treatment may be mentioned. To ensure high adhesion between the hard coat layer 12 and the adhesive layer 40 , it is preferable to perform glow treatment on the side surface of the adhesive layer 40 of the hard coat layer 12 .

From the viewpoint of strength, the thickness of the transparent substrate 10 is preferably 5 μm or more, more preferably 10 μm or more, and still more preferably 20 μm or more. From the viewpoint of workability, the thickness of the transparent substrate 10 is preferably 300 μm or less, and more preferably 200 μm or less.

From the viewpoint of transparency, the visible light transmittance of the transparent substrate 10 is preferably 80% or more, more preferably 90% or more. The visible light transmittance of the transparent substrate 10 is, for example, 100% or less.

The surface roughness Ra (arithmetic mean surface roughness) of the surface on the optical functional layer 20 side of the transparent substrate 10 (in this embodiment, the surface on the optical functional layer 20 side of the hard coat layer 12 ) is preferably 0.5 nm or more , more preferably 0.8 nm or more. The surface roughness Ra is preferably 20 nm or less, more preferably 15 nm or less. Surface roughness Ra is calculated|required from the observation image of 1 micrometer square obtained by AFM (Atomic Force Microscopy, atomic force microscope, for example).

The adhesion layer 40 is a layer for ensuring the adhesion between the transparent substrate 10 and the optical function layer 20 . The adhesive layer 40 is disposed on one surface in the thickness direction D of the transparent substrate 10 (specifically, the hard coat layer 12 of the transparent substrate 10 in this embodiment). Examples of the material of the adhesion layer 40 include metals such as silicon, nickel, chromium, aluminum, tin, gold, silver, platinum, zinc, titanium, tungsten, zirconium, and palladium, alloys of two or more of these metals, and oxides of these metals. In order to have both adhesiveness to both the organic layer (specifically, the hard coat layer 12 ) and the oxide layer (specifically, the first high refractive index layer 21 to be described later), and the transparency of the adhesive layer 40 , the adhesive layer is used as an adhesive layer. The material of 40 is preferably indium tin oxide (ITO) or silicon oxide (SiOx). When silicon oxide is used as the material of the adhesion layer 40, it is preferable to use SiOx whose oxygen content is less than the stoichiometric composition, and it is more preferable to use SiOx whose x is 1.2 or more and 1.9 or less.

In order to ensure the adhesion between the transparent substrate 10 and the optical functional layer 20 and realize the transparency of the adhesion layer 40, the thickness of the adhesion layer 40 is, for example, 1 nm or more, and for example, 10 nm or less.

The optical functional layer 20 is disposed on one surface in the thickness direction D of the adhesive layer 40 . In this embodiment, the optical functional layer 20 is an anti-reflection layer for suppressing the reflection intensity of external light. That is, the optical film F is an antireflection film in this embodiment.

The optical function layer 20 (anti-reflection layer) alternately has a high refractive index layer with a relatively large refractive index and a low refractive index layer with a relatively small refractive index in the thickness direction. In the anti-reflection layer, the net reflected light intensity is attenuated by the interference between the reflected light generated by the multiple interfaces of the multiple thin layers (high refractive index layer, low refractive index layer) contained in the anti-reflection layer. In addition, in the antireflection layer, by adjusting the optical film thickness (the product of the refractive index and the thickness) of each thin layer, the interference effect of attenuating the reflected light intensity can be exhibited. In the present embodiment, specifically, the optical function layer 20 serving as an anti-reflection layer has a first high refractive index layer 21, a first low refractive index layer 22, a second high refractive index layer 21, and a second high refractive index layer in sequence toward one side of the thickness direction D. The refractive index layer 23 and the second low refractive index layer 24 .

The first high-refractive index layer 21 and the second high-refractive index layer 23 each contain a high-refractive-index material whose refractive index at a wavelength of 550 nm is preferably 1.9 or more. In order to have both high refractive index and low absorption of visible light, examples of high refractive index materials include niobium oxide (Nb ₂ O ₅ ), titanium oxide, zirconium oxide, tin-doped indium oxide (ITO), and antimony-doped oxide. Tin (ATO), preferably niobium oxide is used.

The optical film thickness (the product of the refractive index and the thickness) of the first high refractive index layer 21 is, for example, 20 nm or more and, for example, 55 nm or less. The optical film thickness of the second high refractive index layer 23 is, for example, 60 nm or more and, for example, 330 nm or less.

The first low-refractive index layer 22 and the second low-refractive index layer 24 each contain a low-refractive-index material whose refractive index at a wavelength of 550 nm is preferably 1.6 or less. In order to have both low refractive index and low absorption of visible light, as the low refractive index material, for example, silicon dioxide (SiO ₂ ) and magnesium fluoride can be exemplified, and silicon dioxide is preferably used. To ensure the adhesion between the second low refractive index layer 24 and the antifouling layer 30 , it is also preferable to use silicon dioxide as the material of the second low refractive index layer 24 .

The optical film thickness of the first low refractive index layer 22 is, for example, 15 nm or more and, for example, 70 nm or less. The optical film thickness of the second low refractive index layer 24 is, for example, 100 nm or more and, for example, 160 nm or less.

In the optical functional layer 20, the thickness of the first high refractive index layer 21 is, for example, 1 nm or more, preferably 5 nm or more, and, for example, 30 nm or less, preferably 20 nm or less. The thickness of the first low refractive index layer 22 is, for example, 10 nm or more, preferably 20 nm or more, and, for example, 50 nm or less, or preferably 30 nm or less. The thickness of the second high refractive index layer 23 is, for example, 50 nm or more, preferably 80 nm or more, and, for example, 200 nm or less, or preferably 150 nm or less. The thickness of the second low refractive index layer 24 is, for example, 60 nm or more, preferably 80 nm or more, and, for example, 150 nm or less, or preferably 100 nm or less.

The antifouling layer 30 is a layer having an antifouling function in the optical film F, and is disposed on one surface in the thickness direction D of the optical function layer 20 . The antifouling layer 30 has an outer surface 31 on the thickness direction D side. The antifouling function of the antifouling layer 30 includes a function of preventing contaminants such as hand grease from adhering to the exposed surface of the film when the optical film F is used, and a function of allowing the adhered contaminants to be easily removed.

As the material of the antifouling layer 30, for example, a fluorine group-containing organic compound can be mentioned. As the organic compound containing a fluorine group, an alkoxysilane compound having a perfluoropolyether group is preferably used. As an alkoxysilane compound which has a perfluoropolyether group, the compound represented by following general formula (1) is mentioned, for example.

R ¹ -R ² -X-(CH ₂ ) _m -Si(OR ³ ) ₃ (1)

In the general formula (1), R ¹ represents a linear or branched fluorinated alkyl group in which one or more hydrogen atoms in the alkyl group are substituted with a fluorine atom (the number of carbon atoms is, for example, 1 to 20), preferably Represents a perfluoroalkyl group in which all hydrogen atoms of an alkyl group are replaced by fluorine atoms.

R ² represents a structure containing at least one repeating structure of a perfluoropolyether (PFPE) group, preferably a structure containing a repeating structure containing two PFPE groups. As a repeating structure of a PFPE group, the repeating structure of a linear PFPE group and the repeating structure of a branched PFPE group are mentioned, for example. The repeating structure of the linear PFPE group may, for example, be the structure represented by -(OC _n F _2n ) _p - (n represents an integer of 1 or more and 20 or less, and p represents an integer of 1 or more and 50 or less. The same applies hereinafter). Examples of the repeating structure of the branched PFPE group include a structure represented by -(OC(CF ₃ ) ₂ ) _p - and a structure represented by -(OCF ₂ CF(CF ₃ )CF ₂ ) _p -. As the repeating structure of the PFPE group, the repeating structure of the linear PFPE group is preferably exemplified, and -(OCF ₂ ) _p - and -(OC ₂ F ₄ ) _p - are more preferred.

R ³ represents an alkyl group having 1 to 4 carbon atoms, preferably a methyl group.

X represents an ether group, a carbonyl group, an amino group or an amide group, preferably an ether group.

m represents an integer of 1 or more. Moreover, m represents an integer which is preferably 20 or less, more preferably 10 or less, and still more preferably 5 or less.

Among the alkoxysilane compounds having such a perfluoropolyether group, those represented by the following general formula (2) are preferably used.

CF ₃ -(OCF ₂ ) _q -(OC ₂ F ₄ ) _r -O-(CH ₂ ) ₃ -Si(OCH ₃ ) ₃ (2)

In the general formula (2), q represents an integer of 1 or more and 50 or less, and r represents an integer of 1 or more and 50 or less.

Moreover, the alkoxysilane compound which has a perfluoropolyether group may be used individually, and may use 2 or more types together.

In this embodiment, the antifouling layer 30 is a film (dry coating film) formed by a dry coating method. As a dry coating method, a sputtering method, a vacuum vapor deposition method, and CVD (Chemical Vapor Deposition, chemical vapor deposition) are mentioned. The antifouling layer 30 is preferably a dry coating film, more preferably a vacuum evaporation film.

The material of the antifouling layer 30 contains an alkoxysilane compound having a perfluoropolyether group, and the antifouling layer 30 is a dry coating film (preferably a vacuum evaporation film), which is suitable for ensuring that the antifouling layer 30 has good optical properties. The functional layer 20 has high bonding force, and therefore, is suitable for ensuring the peeling resistance of the antifouling layer 30 . The antifouling layer 30 has high peeling resistance, which helps to maintain the antifouling performance of the antifouling layer 30 .

The thickness of the antifouling layer 30 is preferably 1 nm or more, more preferably 2 nm or more, and still more preferably 3 nm or more. The thickness of the antifouling layer 30 is preferably 100 nm or less, more preferably 50 nm or less, and still more preferably 30 nm or less.

The water contact angle (pure water contact angle) of the outer surface 31 of the antifouling layer 30 is 110° or more, preferably 111° or more, more preferably 112° or more, further preferably 113° or more, especially preferably 114° or more ° above. The constitution that the water contact angle of the outer surface 31 is so high is suitable for realizing the high antifouling property of the antifouling layer 30 . The water contact angle is, for example, 130° or less. The water contact angle is obtained by measuring the contact angle of the water droplets with respect to the surface of the antifouling layer 30 by forming water droplets (droplets of pure water) with a diameter of 2 mm or less on the outer surface 31 (exposed surface) of the antifouling layer 30 . For example, the water contact angle of the outer surface 31 can be adjusted by adjusting the composition of the antifouling layer 30 , the roughness of the outer surface 31 , the composition of the hard coat layer 12 , and the surface roughness of the optical function layer 20 side of the hard coat layer 12 . .

The surface roughness Ra (arithmetic mean surface roughness) of the outer surface 31 of the antifouling layer 30 is preferably 1 nm or more, more preferably 1.3 nm or more, and still more preferably 2 nm or more. Such a configuration is suitable for preventing the glossiness of the outer surface 31 of the antifouling layer 30 from becoming too strong. The surface roughness Ra is preferably 20 nm or less, more preferably 18 nm or less, and still more preferably 17 nm or less. Such a configuration is better for the optical properties and haze of the optical film F, for example, when the optical film F is disposed on the surface of the display, it is suitable for suppressing white halo of the image observed through the optical film F. blurring).

The total reflection Y value of the antifouling layer 30 is preferably 1 or less, more preferably 0.9 or less. The specular reflection Y value of the antifouling layer 30 is preferably 0.9 or less, more preferably 0.8 or less. When the optical film F is provided on the display surface, these structures are suitable for suppressing the background reflection on the display surface.

The difference ΔY(Y ₁ −Y ₂ ) between the total reflection Y value (Y ₁ ) and the regular reflection Y value (Y ₂ ) is preferably more than 0.13, more preferably 0.15 or more, and still more preferably 0.17 or more. Such a configuration is suitable for securing the anti-glare properties of the antifouling layer 30 and the optical film F. The difference ΔY is preferably 0.8 or less, more preferably 0.7 or less. When the optical film F is disposed on the display surface, this configuration is suitable for suppressing the white halo of the image observed through the optical film F.

The ratio (Y ₂ /Y ₁ ) of the regular reflection Y value (Y ₂ ) to the total reflection Y value (Y ₁ ) is preferably 0.15 or more, more preferably 0.18 or more. When the optical film F is disposed on the display surface, this configuration is suitable for suppressing the white halo of the image observed through the optical film F. The ratio (Y ₂ /Y ₁ ) is preferably 0.6 or less, more preferably 0.58 or less. Such a configuration is suitable for securing the anti-glare properties of the antifouling layer 30 and the optical film F.

The surface haze (external haze) of the antifouling layer 30 is preferably 20% or less, more preferably 10% or less. Such a configuration is suitable for securing the transparency of the optical film F. The surface haze of the antifouling layer 30 is, for example, 0.01% or more.

After the transparent substrate 10 is prepared, the adhesive layer 40 , the optical function layer 20 , and the antifouling layer 30 are sequentially laminated on the transparent substrate 10 by, for example, a roll-to-roll method, whereby the optical film F can be produced. The optical functional layer 20 can be formed by laminating the first high refractive index layer 21 , the first low refractive index layer 22 , the second high refractive index layer 23 , and the second low refractive index layer 24 in this order on the adhesion layer 40 .

The transparent substrate 10 can be produced by forming the hard coat layer 12 on the resin film 11 . For example, the hard coat layer 12 can be formed by coating a curable resin composition containing a curable resin and optionally anti-glare fine particles on the resin film 11 to form a coating film, and then curing the coating film. When the curable resin composition contains an ultraviolet ray resin, the above-mentioned coating film is cured by irradiating ultraviolet rays. When the curable resin composition contains a thermosetting resin, the coating film is cured by heating.

The exposed surface of the hard coat layer 12 formed on the transparent substrate 10 is subjected to surface modification treatment as necessary. In the case of performing the plasma treatment as the surface modification treatment, for example, argon gas is used as the inert gas. In addition, the discharge power at the time of plasma treatment is, for example, 10 W or more, and, for example, 10,000 W or less.

The adhesion layer 40 , the first high refractive index layer 21 , the first low refractive index layer 22 , the second high refractive index layer 23 , and the second low refractive index layer 24 can be formed by forming the material by the dry coating method, respectively. As a dry coating method, a sputtering method, a vacuum vapor deposition method, and CVD are mentioned, Preferably, a sputtering method is used.

In the sputtering method, a gas is introduced into a sputtering chamber under vacuum conditions, and a negative voltage is applied to a target arranged on a cathode. Thereby, a glow discharge is generated, gas atoms are ionized, the gas ions collide with the target surface at a high speed, the target material is ejected from the target surface, and the ejected target material is deposited on a predetermined surface. When forming the metal oxide layer, reactive sputtering is preferably used from the viewpoint of the film formation rate. In reactive sputtering, a metal target is used as a target, and a mixed gas of an inert gas such as argon and oxygen (reactive gas) is used as the gas. By adjusting the flow ratio (sccm) of inert gas and oxygen, the ratio of oxygen contained in the metal oxide layer to be formed can be adjusted.

The power source used to implement the sputtering method can be, for example, a DC power source (Direct Current, direct current), an AC (Alternating Current, alternating current) power source, an RF (Radio Frequency, radio frequency) power source, and a MFAC (Medium Frequency Alternating Current, medium wave) power source. AC) power supply. The discharge voltage of the sputtering method is, for example, 200 V or more and, for example, 1000 V or less. Moreover, the film-forming gas pressure in the sputtering chamber in which the sputtering method is performed is, for example, 0.01 Pa or more, and, for example, 2 Pa or less.

The antifouling layer 30 can be formed by forming a film on the optical functional layer 20, for example, an organic compound containing a fluorine group. As a formation method of the antifouling layer 30, a dry coating method can be mentioned. As a dry coating method, a vacuum vapor deposition method, a sputtering method, and CVD are mentioned, for example, Preferably, a vacuum vapor deposition method is used.

For example, the optical film F can be manufactured as described above. For example, the optical film F is used by bonding the transparent base material 10 side to the adherend via an adhesive.

The optical film F may also be other optical films other than the antireflection film. As an optical film, a transparent conductive film and an electromagnetic wave shielding film are mentioned, for example.

When the optical film F is a transparent conductive film, for example, the optical functional layer 20 of the optical film F is provided with a first dielectric film, a transparent electrode film such as an ITO film, and a second dielectric film in this order toward the side in the thickness direction D, for example. membrane. The optical functional layer 20 having such a laminated structure has both visible light transmittance and conductivity.

When the optical film F is an electromagnetic wave shielding film, the optical function layer 20 of the optical film F alternately includes a metal thin film and a metal oxide film having electromagnetic wave reflection energy in the thickness direction D, for example. The optical functional layer 20 having such a laminated structure has both shielding properties against electromagnetic waves of a specific wavelength and visible light transmittance.

As shown in FIG. 2 , the optical film F may also include the adhesive layer 50 disposed on the other surface in the thickness direction D of the transparent substrate 10 .

The adhesive layer 50 is a layer formed of an adhesive composition and has light transmittance. The adhesive composition contains at least a base polymer that allows the adhesive layer 50 to exhibit adhesiveness. Examples of the base polymer include acrylic polymers, rubber-based polymers, polysiloxane-based polymers, urethane-based polymers, polyester-based polymers, and polyamide-based polymers. To achieve both the adhesive force and high transparency required for the adhesive layer 50 of the optical film F, it is preferable to use an acrylic polymer as the base polymer.

In the optical film F, in order to achieve sufficient adhesion to the adherend, the thickness of the adhesive layer 50 is preferably 5 μm or more, more preferably 10 μm or more, and more preferably 15 μm or more. Moreover, from the viewpoint of ensuring transparency, the thickness of the adhesive layer 50 is preferably 300 μm or less, more preferably 200 μm or less, and still more preferably 100 μm or less.

The optical film F shown in FIG. 2 can be manufactured as follows, for example. First, the adhesive composition is coated on the release liner to form a coating film. Next, the coating film on the release liner is dried as necessary. Thereby, the adhesive layer 50 is formed on the release liner. Next, the exposed surface of the adhesive layer 50 is bonded to the other surface (lower surface in FIG. 1 ) of the optical film F shown in FIG. 1 in the thickness direction D of the transparent substrate 10 . For example, the optical film F shown in FIG. 2 can be manufactured in this way.

When the optical film F is provided with the adhesive layer 50, it is not necessary to use an adhesive separately when it is attached to the adherend. [Example]

The present invention will be specifically described below with reference to Examples. The present invention is not limited to the Examples. In addition, the specific numerical values such as the compounding amount (content), physical property value, parameter, etc. described below can be replaced by the corresponding compounding amount (content), physical property value, parameter, etc. described in the above-mentioned "Embodiment". "under" or "under" value) or lower limit (defined as "above" or "over" value).

[Example 1] First, an anti-glare hard coat layer (hard coat layer forming step) was formed on one side of a triacetate cellulose (TAC) film (thickness 80 μm) as a transparent resin film. In this step, first, the following components were mixed to prepare a composition (varnish) with a solid content concentration of 55% by mass: UV-curable urethane acrylate (trade name "UV1700TL", manufactured by Nippon Synthetic Chemical Industry Co., Ltd. ) 50 parts by mass, UV-curable polyfunctional acrylate (trade name "Viscoat #300", the main component is pentaerythritol triacrylate, manufactured by Osaka Organic Chemical Industry Co., Ltd.) 50 parts by mass, polymethacrylic acid as anti-glare fine particles 3 parts by mass of methyl ester particles (trade name "Techpolymer", average particle size 3 μm, refractive index 1.525, manufactured by Sekisui Chemical Industry Co., Ltd.), polysiloxane particles as anti-glare fine particles (trade name "Tospearl 130", average Particle size 3 μm, refractive index 1.42, manufactured by Momentive Performance Materials Japan) 1.5 parts by mass, thixotropy imparting agent (trade name “Lucentite SAN”, synthetic bentonite as organoclay, manufactured by CO-OP. CHEMICAL Co., Ltd.) 1.5 mass part, 3 parts by mass of a photopolymerization initiator (trade name "OMNIRAD907", manufactured by BASF Corporation), 0.15 mass part of a leveling agent (trade name "LE303", manufactured by Kyoeisha Chemical Co., Ltd.), toluene-ethyl acetate-cyclic Pentanone mixed solvent (mass ratio 35:41:24). The mixing system uses an ultrasonic disperser. Next, the composition is applied to one side of the above-mentioned TAC film to form a coating film. Next, after hardening this coating film by irradiating an ultraviolet-ray, it is made to dry by heating. When irradiating ultraviolet rays, a high-pressure mercury lamp was used as a light source, and ultraviolet rays with a wavelength of 365 nm were used, and the cumulative irradiation light amount was set to 300 mJ/cm ² . In addition, the heating temperature was 80 degreeC, and the heating time was 60 second. Thereby, an anti-glare hard coat layer (1st HC layer) with a thickness of 8 μm was formed on the TAC film.

Next, plasma treatment was performed on the surface of the HC layer of the TAC film with the HC layer in a vacuum environment of 1.0 Pa by means of a roll-to-roll plasma treatment device. In this plasma treatment, argon gas was used as an inert gas, and the discharge power was set to 2400 W.

Next, an adhesion layer and an anti-reflection layer are sequentially formed on the HC layer of the TAC film attached with the HC layer after the plasma treatment (sputtering film forming step). Specifically, a 3.5 nm-thick SiOx layer (x< 2) Nb ₂ O ₅ layer with a thickness of 12 nm as the first high refractive index layer, SiO ₂ layer with a thickness of 28 nm as the first low refractive index layer, and Nb with a thickness of 100 nm as the second high refractive index layer ₂ O ₅ layer, SiO ₂ layer with a thickness of 85 nm as the second low refractive index layer. When forming the adhesion layer, a Si target was used, argon was used as an inert gas, and oxygen was used as a reactive gas of 3 parts by volume relative to 100 parts by volume of argon, the discharge voltage was set to 520 V, and the gas pressure in the film-forming chamber was adjusted to The (film formation pressure) was set to 0.27 Pa, and a SiOx layer (x<2) was formed by MFAC sputtering. When forming the first high refractive index layer, a Nb target was used, 100 parts by volume of argon gas and 5 parts by volume of oxygen gas were used, the discharge voltage was set to 415 V, and the film-forming gas pressure was set to 0.42 Pa, and sputtered by MFAC. _{Membrane Nb2O5} layer. When forming the first low refractive index layer, a Si target was used, 100 parts by volume of argon gas and 30 parts by volume of oxygen gas were used, the discharge voltage was set to 350 V, and the film-forming pressure was set to 0.3 Pa, and sputtered by MFAC. film SiO ₂ layer. When forming the second high refractive index layer, a Nb target was used, 100 parts by volume of argon gas and 13 parts by volume of oxygen gas were used, the discharge voltage was set to 460 V, and the film-forming gas pressure was set to 0.5 Pa, and sputtered by MFAC. _{Membrane Nb2O5} layer. When forming the second low-refractive index layer, a Si target was used, 100 parts by volume of argon gas and 30 parts by volume of oxygen gas were used, the discharge voltage was set to 340 V, and the film formation pressure was set to 0.25 Pa, and sputtered by MFAC. film SiO ₂ layer. In the above manner, an anti-reflection layer (the first high refractive index layer, the first low refractive index layer, the second high refractive index layer, the second low refractive index layer) is formed by lamination on the HC layer of the TAC film with the HC layer via the adhesion layer. Floor).

Next, an antifouling layer is formed on the formed antireflection layer (antifouling layer forming step). Specifically, an antifouling layer with a thickness of 7 nm was formed on the antireflection layer by a vacuum evaporation method using an alkoxysilane compound containing a perfluoropolyether group as an evaporation source. The vapor deposition source is a solid obtained by drying "OPTOOL UD509" (a perfluoropolyether group-containing alkoxysilane compound represented by the above general formula (2), solid content concentration 20 mass %) manufactured by Daikin Industries, Ltd. material composition. In addition, the heating temperature of the vapor deposition source of the vacuum vapor deposition method was made into 260 degreeC.

The optical film of Example 1 was produced in the above manner. The optical film of Example 1 includes a transparent substrate (resin film, hard coat layer), an adhesive layer, an antireflection layer, and an antifouling layer in this order toward one side in the thickness direction.

[Example 2] The solid content obtained by drying "OPTOOL UD120" (perfluoropolyether group-containing alkoxysilane compound) manufactured by Daikin Industries Co., Ltd. was used as a vapor deposition source in the antifouling layer formation step, and other than that The optical film of Example 1 was produced in the same manner as the optical film of Example 2.

[Example 3] First, an anti-glare hard coat layer (hard coat layer forming step) was formed on one side of a triacetyl cellulose (TAC) film (thickness 80 μm) as a transparent resin film. In this step, first, the following components were mixed to prepare a composition (varnish) with a solid content concentration of 55% by mass: 100 parts by mass of an ultraviolet curable acrylic monomer (trade name "GRANDIC PC-1070", manufactured by DIC Corporation) , Organic silica gel containing nano-silica particles as anti-glare fine particles (trade name "MEK-ST-L", the average primary particle size of the nano-silica particles is 50 nm, and the solid content concentration is 30% by mass , Nissan Chemical Co., Ltd.) 25 parts by mass (in terms of nanosilica particles), thixotropy imparting agent (trade name "Lucentite SAN", synthetic bentonite as organoclay, manufactured by CO-OP. CHEMICAL Co., Ltd.) 1.5 parts by mass , 3 parts by mass of a photopolymerization initiator (trade name "OMNIRAD907", manufactured by BASF Corporation), and 0.15 parts by mass of a leveling agent (trade name "LE303", manufactured by Kyoeisha Chemical Co., Ltd.). Use an ultrasonic disperser when mixing. Next, the composition is applied to one side of the above-mentioned TAC film to form a coating film. Next, after hardening this coating film by irradiating an ultraviolet-ray, it is made to dry by heating. When irradiating ultraviolet rays, a high-pressure mercury lamp was used as a light source, and ultraviolet rays with a wavelength of 365 nm were used, and the cumulative irradiation light amount was set to 200 mJ/cm ² . Moreover, the heating time was set to 80 degreeC, and the heating temperature was set to 3 minutes. Thereby, an anti-glare hard coat layer (2nd HC layer) with a thickness of 6 μm was formed on the TAC film.

Next, plasma treatment was performed on the surface of the HC layer of the TAC film with the HC layer in a vacuum environment of 1.0 Pa by means of a roll-to-roll plasma treatment device. In this plasma treatment, argon gas was used as an inert gas, and the discharge power was set to 150 W.

Next, an adhesion layer and an anti-reflection layer are sequentially formed on the HC layer of the TAC film attached with the HC layer after the plasma treatment (sputtering film forming step). Specifically, on the HC layer of the TAC film with the HC layer attached after the plasma treatment, indium tin oxide ( ITO) layer, Nb ₂ O ₅ layer with a thickness of 12 nm as the first high refractive index layer, SiO ₂ layer with a thickness of 28 nm as the first low refractive index layer, and a thickness of 100 nm as the second high refractive index layer Nb ₂ O ₅ layer, SiO ₂ layer with a thickness of 85 nm as the second low refractive index layer. When forming the adhesion layer, an ITO target was used, argon was used as an inert gas, and 10 parts by volume of oxygen was used as a reactive gas relative to 100 parts by volume of argon, and the discharge voltage was set to 400 V, and the pressure in the film-forming chamber ( The film forming pressure) was set to 0.2 Pa, and the ITO layer was formed by MFAC sputtering. The formation conditions of the first high refractive index layer, the first low refractive index layer, the second high refractive index layer and the second low refractive index layer in this example are the same as those of the first high refractive index layer and the first high refractive index layer in Example 1. The above-mentioned formation conditions of the low-refractive index layer, the second high-refractive-index layer, and the second low-refractive index layer are the same.

Next, an antifouling layer is formed on the formed antireflection layer (antifouling layer forming step). Specifically, the steps of forming the antifouling layer were the same as those in Example 1 (the solid content obtained by drying "OPTOOL UD509" manufactured by Daikin Industries, Ltd. was used as a vapor deposition source).

The optical film of Example 3 was produced in the above manner. The optical film of Example 3 includes a transparent substrate (resin film, hard coat layer), an adhesive layer, an antireflection layer, and an antifouling layer in this order toward one side in the thickness direction.

[Example 4] In addition to using the solid content obtained by drying "OPTOOLUD120" (perfluoropolyether group-containing alkoxysilane compound) manufactured by Daikin Industries, Ltd. as a vapor deposition source in the antifouling layer formation step, The optical film of Example 3 was produced in the same manner as the optical film of Example 4.

[Example 5] The solid content obtained by drying "KY-1901" (perfluoropolyether group-containing alkoxysilane compound) manufactured by Shin-Etsu Chemical Co., Ltd. was used as a vapor deposition source in the antifouling layer forming step. The optical film of Example 5 was produced in the same manner as the optical film of Example 3.

[Example 6] The optical film of Example 6 was produced in the same manner as the optical film of Example 3 except for the step of forming a hard coat layer and the step of forming an antifouling layer.

In the hard coat layer forming step of Example 6, first, the following components were mixed to prepare a composition (varnish) with a solid content concentration of 45% by mass: an acrylic monomer composition containing nanosilica particles (trade name "NC035") ”, the average primary particle size of the nano-silica particles is 40 nm, the solid content concentration is 50 mass %, and the ratio of the nano-silica particles in the solid content is 60 mass %, manufactured by Arakawa Chemical Industry Co., Ltd.) 67 parts by mass, UV-curable polyfunctional acrylate (trade name "Binder A", solid content concentration 100% by mass, manufactured by Arakawa Chemical Industry Co., Ltd.) 33 parts by mass, polymethyl methacrylate particles as anti-glare fine particles (trade name " Techpolymer”, average particle size 3 μm, refractive index 1.525, manufactured by Sekisui Chemical Industry Co., Ltd.) 3 parts by mass, polysiloxane particles as anti-glare fine particles (trade name “Tospearl 130”, average particle size 3 μm, refractive index 1.42, manufactured by Momentive Performance Materials Japan Co., Ltd.) 1.5 parts by mass, thixotropy imparting agent (trade name "Lucentite SAN", synthetic bentonite as organoclay, manufactured by CO-OP. CHEMICAL Co., Ltd.) 1.5 parts by mass, photopolymerization initiator (trade name "OMNIRAD907", manufactured by BASF Corporation) 3 parts by mass, leveling agent (trade name "LE303", manufactured by Kyoeisha Chemical Co., Ltd.) 0.15 parts by mass, and toluene. Use an ultrasonic disperser when mixing. Next, the composition is applied to one side of the above-mentioned TAC film to form a coating film. Next, after hardening this coating film by irradiating an ultraviolet-ray, it is made to dry by heating. When irradiating ultraviolet rays, a high-pressure mercury lamp was used as a light source, and ultraviolet rays with a wavelength of 365 nm were used, and the cumulative irradiation light amount was set to 200 mJ/cm ² . In addition, the heating time was made into 60 degreeC, and the heating temperature was made into 60 second. Thereby, an anti-glare hard coat layer (3rd HC layer) with a thickness of 7 μm was formed on the TAC film.

In the antifouling layer forming step of Example 6, the solid content obtained by drying "OPTOOLUD120" (perfluoropolyether group-containing alkoxysilane compound) manufactured by Daikin Industries, Ltd. was used as a vapor deposition source.

[Example 7] The solid content obtained by drying "KY-1901" (perfluoropolyether group-containing alkoxysilane compound) manufactured by Shin-Etsu Chemical Co., Ltd. was used as a vapor deposition source in the antifouling layer forming step. The optical film of Example 7 was produced in the same manner as the optical film of Example 6.

[Example 8] The optical film of Example 8 was produced in the same manner as the optical film of Example 3 except for the hard coat layer forming step and the antifouling layer forming step.

In the hard coat layer forming step of Example 8, first, the following components were mixed to prepare a composition (varnish) with a solid content concentration of 42% by mass: an acrylic monomer composition containing nano-silica particles (trade name "NC035HS") ”, the average primary particle size of the nano-silica particles is 40 nm, the solid content concentration is 50 mass %, and the ratio of the nano-silica particles in the solid content is 60 mass %, manufactured by Arakawa Chemical Industry Co., Ltd.) 83 parts by mass, UV-curable polyfunctional urethane acrylate (trade name "BEAMSET 580", solid content concentration 70% by mass, manufactured by Arakawa Chemical Industry Co., Ltd.) 17 parts by mass, polymethyl methacrylate as anti-glare fine particles Particles (trade name "Techpolymer", average particle size 3 μm, refractive index 1.495, manufactured by Sekisui Chemical Industry Co., Ltd.) 4 parts by mass, polysiloxane particles as anti-glare fine particles (trade name "Tospearl 130", average particle size 3 μm, refractive index 1.42, manufactured by Momentive Performance Materials Japan) 0.1 part by mass, thixotropy imparting agent (trade name “Lucentite SAN”, synthetic bentonite as organoclay, manufactured by CO-OP. CHEMICAL Co., Ltd.) 2.0 parts by mass, 3 parts by mass of a photopolymerization initiator (trade name "OMNIRAD907", manufactured by BASF Corporation), 0.15 parts by mass of a leveling agent (trade name "LE303", manufactured by Kyōeisha Chemical Co., Ltd.), and butyl acetate. Use an ultrasonic disperser when mixing. Next, the composition is applied to one side of the above-mentioned TAC film to form a coating film. Next, after hardening this coating film by irradiating an ultraviolet-ray, it is made to dry by heating. When irradiating ultraviolet rays, a high-pressure mercury lamp was used as a light source, and ultraviolet rays with a wavelength of 365 nm were used, and the cumulative irradiation light amount was set to 200 mJ/cm ² . In addition, the heating time was made into 60 degreeC, and the heating temperature was made into 60 second. Thereby, an anti-glare hard coat layer (4th HC layer) with a thickness of 8 μm was formed on the TAC film.

In the antifouling layer forming step of Example 8, the solid content obtained by drying "KY-1903-1" (perfluoropolyether group-containing alkoxysilane compound) manufactured by Shin-Etsu Chemical Co., Ltd. was used as a vapor deposition source.

[Comparative Example 1] Except for the antifouling layer forming step, the optical film of Comparative Example 1 was produced in the same manner as the optical film of Example 1.

In the antifouling layer forming step of Comparative Example 1, first, "OPTOOL UD509" (manufactured by Daikin Industries, Ltd.) as a coating agent was diluted with a diluting solvent (trade name "Fluorinert", manufactured by 3M Corporation) to prepare a solid content Coating liquid with a concentration of 0.1% by mass. Next, by gravure coating, the coating liquid is coated on the antireflection layer formed by the sputtering film-forming step to form a coating film. Next, the coating film was dried by heating at 60°C for 2 minutes. Thereby, an antifouling layer with a thickness of 7 nm was formed on the antireflection layer.

＜Water Contact Angle＞ For each of the optical films of Examples 1 to 8 and Comparative Example 1, the water contact angle on the surface of the antifouling layer was investigated. First, water droplets were formed by dropping about 1 μL of pure water on the surface of the antifouling layer of the optical film. Next, the angle formed by the surface of the water droplet on the surface of the antifouling layer and the surface of the antifouling layer was measured. A contact angle meter (trade name "DMo-501", manufactured by Kyowa Interface Science Co., Ltd.) was used for the measurement. The measurement results are shown in Table 1.

<Surface Roughness Ra> For each of the optical films of Examples 1 to 8 and Comparative Example 1, the surface roughness Ra of the antifouling layer was investigated. Specifically, the surface of the antifouling layer of each optical film was observed with an atomic force microscope (trade name "SPI3800", manufactured by Seiko Instruments Co., Ltd.), and the surface roughness Ra (arithmetic mean roughness) was determined from the observed image of 1 μm square. . The results are shown in Table 1.

<Total reflection and regular reflection> About each optical film of Examples 1-8 and the comparative example 1, the total reflection Y value and the regular reflection Y value were measured as follows.

First, the transparent substrate side of the sample film (50 mm×50 mm) cut out from the optical film was attached to a black acrylic plate by an adhesive. Next, the total reflection measurement was carried out using a spectrophotometer (trade name "U-4100", manufactured by Hitachi High-Technology Co., Ltd.) about the sample attached to the black acrylic sheet. Based on the spectral reflectance at the wavelength of 380-780 nm obtained by this measurement and the relative spectral distribution of the CIE standard light source D65, calculate the tristimulus value Y of the object color obtained by reflection in the XYZ color system specified in JIS Z8701, Thereby, the total reflection Y value is obtained.

In addition, for the above-mentioned sample attached to the black acrylic sheet, a spectrophotometer (trade name "U-4100") was used, and the jig attached to the U-4100 was used to remove the scattered light, and the light incident angle was measured. Specular reflection measurement at 5°. Based on the spectral reflectance at the wavelength of 380-780 nm obtained by this measurement and the relative spectral distribution of the CIE standard light source D65, the tristimulus value Y of the object color obtained by reflection in the XYZ color system specified in JIS Z8701 is calculated , so as to obtain the Y value of the specular reflection.

The total reflection Y value (Y ₁ ), the specular reflection Y value (Y ₂ ), the difference between the total reflection Y value and the specular reflection Y value ΔY (Y ₁ −Y ₂ ), and the specular reflection Y value relative to the total reflection Y value The ratio (Y ₂ /Y ₁ ) is shown in Table 1.

＜Surface Haze＞ About each optical film of Examples 1-8 and Comparative Example 1, the surface haze was investigated. Specifically, first, with respect to the sample film cut out from the optical film, the haze measurement was carried out based on JIS K 7136 (2000) using "Haze Meter HM150" manufactured by Murakami Color Technology Laboratory Co., Ltd. total haze value). Next, the surface haze of the sample film was eliminated by attaching the cycloolefin polymer film to the antifouling layer side surface of the sample film with an adhesive. In this state, the "Haze Meter HM150" manufactured by Murakami Color Technology Research Institute was used. , based on JIS K 7136 (2000), haze measurement (thereby, the internal haze value of the sample film is measured). Then, the internal haze value was subtracted from the total haze value to obtain the external haze (surface haze) value. This value is shown in Table 1.

＜Evaluation of antifouling properties＞ About each optical film of Examples 1-8 and Comparative Example 1, the antifouling property of the antifouling layer was investigated. Specifically, first, the surface of the antifouling layer of the optical film is touched with a finger to leave a fingerprint. Next, the fingerprints were wiped three times with a cotton waste yarn end (the waste cotton yarn end was brought into contact with the area of the antifouling layer surface including the fingerprint attachment portion, and the waste cotton yarn end was wiped in one direction). In addition, the antifouling properties of the antifouling layer were evaluated as "good" when fingerprints could be wiped off by 3 wiping operations, and "good" when fingerprints could not be wiped off by 3 wiping operations (that is, a part of remaining fingerprints remained). In the case of fingerprints), it was evaluated as "bad". The results are shown in Table 1.

[Table 1] HC layer Antifouling layer Water contact angle [°] Ra [nm] Total reflection Y value (Y ₁ ) Specular Y value (Y ₂ ) Y ₁ -Y ₂ Y ₂ /Y ₁ Surface haze [%] Antifouling Example 1 Tier 1HC dry coating UD509 119.2 17.7 0.8 0.15 0.65 0.19 1.5 good Example 2 Tier 1HC dry coating UD120 114.0 1.33 0.32 0.15 0.17 0.47 0.0 good Example 3 Tier 2HC dry coating UD509 115.4 7.2 0.5 0.29 0.21 0.58 0.2 good Example 4 Tier 2HC dry coating UD120 114.2 5.01 0.44 0.24 0.20 0.55 0.3 good Example 5 Tier 2HC dry coating KY1901 114.6 5.64 0.46 0.21 0.25 0.46 0.2 good Example 6 Layer 3HC dry coating UD120 114.3 5.47 0.47 0.20 0.27 0.43 0.0 good Example 7 Layer 3HC dry coating KY1901 113.7 6.09 0.45 0.18 0.27 0.40 0.0 good Example 8 Tier 4HC dry coating KY1903-1 120 4.5 0.55 0.24 0.31 0.44 0.0 good Comparative Example 1 Tier 1HC wet coating UD509 109.0 1.4 0.30 0.17 0.13 0.57 0.0 bad

10: Transparent substrate 11: Resin film 12: Hard coating 20: Optical functional layer 21: 1st high refractive index layer 22: 1st low refractive index layer 23: Second high refractive index layer 24: Second low refractive index layer 30: Antifouling layer 31: outer surface 40: Adhesion layer 50: Adhesive layer F: Optical film (optical film with antifouling layer)

FIG. 1 is a schematic cross-sectional view of one embodiment of the optical film of the present invention. 2 is a schematic cross-sectional view of a modification of the optical film of the present invention (in this modification, the optical film is provided with an adhesive layer).

10: Transparent substrate

11: Resin film

12: Hard coating

20: Optical functional layer

21: 1st high refractive index layer

22: 1st low refractive index layer

23: Second high refractive index layer

24: Second low refractive index layer

30: Antifouling layer

31: outer surface

40: Adhesion layer

F: Optical film (optical film with antifouling layer)

Claims (8)

An optical film with an antifouling layer, comprising a transparent substrate, an optical functional layer and an antifouling layer in sequence, The outer surface of the antifouling layer on the opposite side to the optical function layer has a water contact angle of 110° or more. The optical film with an antifouling layer according to claim 1, wherein the outer surface has a surface roughness Ra exceeding 2 nm. The optical film with an antifouling layer according to claim 1 or 2, wherein the above-mentioned optical functional layer is an antireflection layer. The optical film with an antifouling layer according to claim 3, wherein the antireflection layer alternately comprises a high refractive index layer with a relatively large refractive index and a low refractive index layer with a relatively small refractive index. The optical film with an antifouling layer according to claim 1, wherein the transparent substrate has a hard coat layer on the side of the optical function layer. The optical film with an antifouling layer according to claim 5, wherein the hard coat layer contains metal oxide fine particles. The optical film with an antifouling layer according to claim 6, wherein the metal oxide fine particles are nano-silicon oxide particles. The optical film with an antifouling layer according to any one of claims 5 to 7, wherein the surface on the optical function layer side of the hard coat layer has a surface roughness Ra of 0.5 nm to 20 nm.

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