TW202204476A - Photosensitive resin composition, cured film, laminate, method for producing cured film, and semiconductor device - Google Patents

Abstract

Provided are: a photosensitive resin composition containing at least one resin selected from the group consisting of polyimide precursors, polybenzoxazole precursors, polyimide, and polybenzoxazole, and also containing a compound B that has a photodimerizable group and an alkoxysilyl group; a cured film obtained by curing the photosensitive resin composition; a laminate including the cured film; a method for producing the cured film; and a semiconductor device including the cured film or the laminate.

Description

Photosensitive resin composition, cured film, laminate, manufacturing method of cured film, and semiconductor device

The present invention relates to a photosensitive resin composition, a cured film, a laminate, a method for producing a cured film, and a semiconductor device.

Polyimide and polybenzoxazole are excellent in heat resistance and insulating properties, and are therefore suitable for various applications. Although it does not specifically limit as said use, if the semiconductor device for encapsulation is mentioned, the use as a material of an insulating film or a sealing material, or a protective film can be mentioned. Moreover, it is also used as a base film of a flexible substrate, a coverlay film, or the like.

For example, in the above-mentioned use, the polyimide or polybenzoxazole may be selected from the group consisting of polyimide, polyimide precursor, polybenzoxazole, and polybenzoxazole precursor. The form of the photosensitive resin composition of at least 1 type of resin in the group is used. A cured film can be formed on a base material by applying such a photosensitive resin composition to a base material by, for example, coating or the like to form a resin film, and exposing, developing, heating, etc. as needed. The above-mentioned polyimide precursor and the above-mentioned polybenzoxazole precursor are cyclized by heating, for example, and become polyimide and polybenzoxazole, respectively, in the cured film. Since the photosensitive resin composition can be applied by a known coating method or the like, it can be said that it is excellent in suitability for production. For example, the shape, size, and application position of the applied photosensitive resin composition can be freely designed at the time of application. high degree. In addition to the high performance possessed by polyimide, polybenzoxazole, and the like, from the viewpoint of being excellent in suitability for these productions, the industrial application of the above-mentioned photosensitive resin composition is expected to expand.

For example, Patent Document 1 describes a resin composition containing: (A) an acrylic copolymer having a photodimeric moiety composed of a hydrophobic group and a thermally cross-linked moiety composed of a hydrophilic group, (B) a polyimide precursor having an aromatic ring site, and (C) a crosslinking agent for crosslinking the (A) component and the (B) component. In Patent Document 2, a liquid crystal aligning agent for photo-alignment is described, which is a liquid crystal aligning agent for photo-alignment containing a polymer component having a structural unit including a photoreactive structure, wherein the polymer component is obtained by polymerizing It is composed of a polymer or a derivative thereof comprising at least a monomer composition of a first monomer and a second monomer, wherein the first monomer contains a photoreactive structure in a portion that forms the structural unit of the polymer, and contains The structure in which the part forming the structural unit of the polymer is chemically reacted by heating, the second monomer contains a photoreactive structure in the part forming the structural unit of the polymer, and is one of the structural units forming the polymer. Part of the structure that does not undergo chemical reactions caused by heating.

Patent Document 1: International Publication No. 2012/018121 Patent Document 2: Japanese Patent Laid-Open No. 2019-211777

By exposure and development, a photosensitive resin composition capable of forming a finer pattern is desired. In this specification, the case where a fine pattern can be formed is also referred to as being excellent in pattern formability.

An object of the present invention is to provide a photosensitive resin composition excellent in pattern formability, a cured film obtained by curing the photosensitive resin composition, a laminate comprising the cured film, a method for producing the cured film, and a method comprising The semiconductor device of the said cured film or the said laminated body.

式（1-1）中，R¹ 分別獨立地表示1價的有機基團，n表示0～5的整數，T¹ 及T² 分別獨立地表示氫原子或1價的有機基團，X¹ 為2價的連結基，Z¹ 表示烷氧基矽基。 式（1-2）中，R¹ 分別獨立地表示1價的有機基團，m表示0～4的整數，T³ ～T⁶ 分別獨立地表示氫原子或1價的有機基團，X² 及X³ 分別獨立地表示2價的連結基，Z² 及Z³ 分別獨立地表示烷氧基矽基。 ＜4＞如＜1＞至＜3＞之任一項所述之感光性樹脂組成物，其係還包含作為不具有能夠進行光二量化反應之基團及烷氧基矽基中的至少一個，且具有唑基之化合物的化合物C。 ＜5＞如＜1＞至＜4＞之任一項所述之感光性樹脂組成物，其中 上述化合物C為不具有烷氧基矽基而具有能夠進行光二量化反應之基團及唑基之化合物。 ＜6＞如＜1＞至＜5＞之任一項所述之感光性樹脂組成物，其中 上述化合物C為樹脂。 ＜7＞如＜1＞至＜6＞之任一項所述之感光性樹脂組成物，其中 上述化合物B為樹脂。 ＜8＞如＜1＞至＜7＞之任一項所述之感光性樹脂組成物，其中 上述化合物B包含唑基。 ＜9＞如＜1＞至＜8＞之任一項所述之感光性樹脂組成物，其係用於再配線層用層間絕緣膜的形成。 ＜10＞一種硬化膜，其係將＜1＞至＜9＞之任一項所述之感光性樹脂組成物硬化而成。 ＜11＞一種積層體，其係包含2層以上＜10＞所述之硬化膜，且在任意的上述硬化膜彼此之間包含金屬層。 ＜12＞一種硬化膜之製造方法，其係包括： 膜形成製程，係將＜1＞至＜9＞之任一項所述之感光性樹脂組成物適用於基板來形成膜。 ＜13＞如＜12＞所述之硬化膜之製造方法，其係包括： 曝光製程，係對上述膜進行曝光；及顯影製程，係對上述膜進行顯影。 ＜14＞如＜12＞或＜13＞所述之硬化膜之製造方法，其係包括： 加熱製程，係將上述膜在50～450℃下進行加熱。 ＜15＞一種半導體器件，其係包含＜10＞所述之硬化膜或＜11＞所述之積層體。 [發明效果]Examples of typical embodiments of the present invention are shown below. <1> A photosensitive resin composition comprising: at least one selected from the group consisting of a polyimide precursor, a polybenzoxazole precursor, a polyimide and a polybenzoxazole A resin; and Compound B, which is a compound having a group capable of photo-diquantization reaction and an alkoxysilyl group. <2> The photosensitive resin composition according to <1>, wherein the group capable of performing the above-mentioned photo-diquantization reaction in the compound B has a cinnamyl structure, a coumarin structure, a naphthalene structure or an anthracene structure. <3> The photosensitive resin composition according to <1> or <2>, wherein the compound B is a compound represented by the following formula (1-1) or the following formula (1-2). [Chemical formula 1]

In formula (1-1), R ¹ each independently represents a monovalent organic group, n represents an integer of 0 to 5, T ¹ and T ² each independently represent a hydrogen atom or a monovalent organic group, and X ¹ is a divalent linking group, and Z ¹ represents an alkoxysilyl group. In formula (1-2), R ¹ each independently represents a monovalent organic group, m represents an integer of 0 to 4, T ³ to T ⁶ each independently represent a hydrogen atom or a monovalent organic group, and X ² and X ³ each independently represent a divalent linking group, and Z ² and Z ³ each independently represent an alkoxysilyl group. <4> The photosensitive resin composition according to any one of <1> to <3>, further comprising at least one of a group that does not have a photodimerization reaction and an alkoxysilyl group, And compound C of a compound having an azole group. <5> The photosensitive resin composition according to any one of <1> to <4>, wherein the above-mentioned compound C does not have an alkoxysilyl group but has a group capable of performing a photodimerization reaction and an azole group. compound. <6> The photosensitive resin composition according to any one of <1> to <5>, wherein the compound C is a resin. <7> The photosensitive resin composition according to any one of <1> to <6>, wherein the compound B is a resin. <8> The photosensitive resin composition according to any one of <1> to <7>, wherein the compound B contains an azole group. <9> The photosensitive resin composition according to any one of <1> to <8>, which is used for formation of an interlayer insulating film for a rewiring layer. <10> A cured film obtained by curing the photosensitive resin composition according to any one of <1> to <9>. <11> The laminated body which contains the cured film as described in <10> in two or more layers, and contains a metal layer between arbitrary said cured films. <12> A method for producing a cured film, comprising: a film forming process for forming a film by applying the photosensitive resin composition according to any one of <1> to <9> to a substrate. <13> The manufacturing method of the cured film according to <12>, which comprises: an exposure process for exposing the film; and a development process for developing the film. <14> The manufacturing method of the cured film as described in <12> or <13>, which comprises: the heating process which heats the said film at 50-450 degreeC. <15> A semiconductor device comprising the cured film described in <10> or the laminated body described in <11>. [Inventive effect]

According to the present invention, there are provided a photosensitive resin composition excellent in pattern formability, a cured film obtained by curing the photosensitive resin composition, a laminate including the cured film, a method for producing the cured film, and the cured film. A film or a semiconductor device of the above-mentioned laminate.

Hereinafter, main embodiments of the present invention will be described. However, the present invention is not limited to the specified embodiments. In this specification, the numerical range shown using the symbol "-" means the range which includes the numerical value described before and after "-" as a lower limit and an upper limit, respectively. In this specification, the term "process" includes not only an independent process, but also a process that cannot be clearly distinguished from other processes as long as the intended function of the process can be achieved. In the notation of groups (atomic groups) in this specification, the notation of substituted and unsubstituted includes groups (atomic groups) without substituents and groups (atomic groups) with substituents. For example, "alkyl" includes not only unsubstituted alkyl groups (unsubstituted alkyl groups), but also substituted alkyl groups (substituted alkyl groups). In this specification, unless otherwise specified, "exposure" includes not only exposure using light but also exposure using particle beams such as electron beams and ion beams. Moreover, as light used for exposure, the bright-line spectrum of a mercury lamp, extreme ultraviolet rays typified by excimer lasers, extreme ultraviolet rays (EUV light), X-rays, and electron beams and other actinic rays and radiation can be mentioned. In this specification, "(meth)acrylate" means both or either of "acrylate" and "methacrylate", and "(meth)acrylic" means "acrylic acid" and "methacrylate" "Acrylic" or "(meth)acryloyl" means both or either of "acryloyl" and "methacryloyl". In this specification, Me in the structural formula represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group. In this specification, the total solid content means the total mass of the components after removing the solvent from all the components of the composition. In addition, in this specification, the solid content concentration means the mass percentage of other components other than the solvent with respect to the total mass of a composition. In this specification, unless otherwise stated, the weight average molecular weight (Mw) and the number average molecular weight (Mn) are defined as polystyrene conversion values by gel permeation chromatography (GPC measurement). In this specification, the weight-average molecular weight (Mw) and the number-average molecular weight (Mn) can be obtained, for example, by using HLC-8220GPC (manufactured by TOSOH CORPORATION) and using guard columns HZ-L and TSKgel Super HZM-M as columns , TSKgel Super HZ4000, TSKgel Super HZ3000, and TSKgel Super HZ2000 (manufactured by TOSOH CORPORATION). Unless otherwise stated, these molecular weights shall be those obtained by measuring using THF (tetrahydrofuran) as an eluent. In addition, unless otherwise stated, the detection in the GPC measurement was obtained by using a UV-ray (ultraviolet) wavelength 254 nm detector. In this specification, when describing the positional relationship of each layer constituting the layered product as "upper" or "lower", other layers may be provided on the upper side or lower side of the standard layer among the plurality of layers concerned. That is, a third layer or element may be further interposed between the standard layer and the above-mentioned other layers, and the standard layer and the above-mentioned other layers do not need to be in contact with each other. Also, unless otherwise specified, the direction in which the layers of the substrate are stacked is referred to as "up", or in the presence of a photosensitive layer, the direction from the substrate toward the photosensitive layer is referred to as "up", and the opposite direction is referred to as "up". for "down". In addition, the setting of such an up-down direction is for convenience in this specification, and in an actual aspect, the "up" direction in this specification may also be different from the vertical direction. In the present specification, unless otherwise specified, the composition may contain two or more types of compounds corresponding to the components as each component contained in the composition. In addition, unless otherwise stated, the content of each component in the composition means the total content of all the compounds corresponding to the component. In this specification, unless otherwise stated, the temperature is 23° C., the air pressure is 101,325 Pa (one air pressure), and the relative humidity is 50% RH. In this specification, the combination of the preferred aspects is the more preferred aspect.

(Photosensitive resin composition) The photosensitive resin composition of the present invention comprises: at least one resin selected from the group consisting of a polyimide precursor, a polybenzoxazole precursor, a polyimide and a polybenzoxazole (hereinafter, Also referred to as "specific resin".); and Compound B, which is a compound having a group capable of performing a photodimerization reaction and an alkoxysilyl group.

The photosensitive resin composition of the present invention may be a negative-type photosensitive resin composition or a positive-type photosensitive resin composition, but a negative-type photosensitive resin composition is preferable. The negative-type photosensitive resin composition refers to a composition in which an unexposed part (non-exposed part) is removed by a developing solution when exposing a layer formed of the photosensitive resin composition. The positive-type photosensitive resin composition refers to a composition in which the exposed portion (exposed portion) is removed by the developing solution when exposing the layer formed of the photosensitive resin composition.

The photosensitive resin composition of the present invention is excellent in pattern formability. Although the mechanism by which the above-mentioned effects can be obtained is not clear, it is presumed as follows.

The photosensitive resin composition of this invention contains the compound B which is a compound which has a group and an alkoxysilyl group which can carry out a photodimerization reaction. When this kind of composition is exposed, a part of the exposure light can be absorbed by the above-mentioned compound, the exposure amount is less likely to be excessive, the pattern shape after development is improved, and the pattern formability is excellent. In particular, when the above-mentioned compound B has an azole group and the composition is applied and patterned on a metal support, it is presumed that the above-mentioned compound B is distributed on the metal support from the reasons such as the coordination between the above-mentioned azole group and the metal. nearby (deep part of the membrane). Therefore, it is considered that the influence of the reflection of the exposure light by the metal layer can be suppressed, the pattern shape after development is further improved, and the pattern formability is excellent. In addition, in a system in which radical polymerization or cationic polymerization occurs during exposure, the polymerization in the deep portion of the film, which has little influence of polymerization inhibition by oxygen or water, may become excessive in some cases. However, as described above, it is considered that since the compound B having a group capable of performing a photobindization reaction is distributed in the deep part of the film, part of the exposure light is absorbed, and thus the above-mentioned excessive polymerization is suppressed, especially in the deep part of the film. The pattern shape is easily improved, and the pattern formability is excellent.

Moreover, in a cured film, the said compound B becomes a resinous compound by the bond which the group which can carry out the said photo-dualization reaction photo-dualizes and the bond which the alkoxysilyl group condenses and forms. It is presumed that the adhesiveness is also improved by the interaction between the resinous compound and the support (for example, a metal support). In particular, when the above-mentioned compound B has an azole group and the composition is applied to a metal support for patterning, it is considered that the above-mentioned azole group in the above-mentioned resinous compound is coordinated with the metal, etc. The adhesiveness of the cured film and the metal support is also improved.

Here, in Patent Document 1 and Patent Document 2, there is neither description nor suggestion of a photosensitive resin composition containing a group capable of performing a photobindization reaction and a compound having an alkoxysilyl group.

Hereinafter, the components contained in the photosensitive resin composition of this invention are demonstrated in detail.

＜Specific resin＞ The photosensitive resin composition of the present invention contains at least one resin (specific resin) selected from the group consisting of polyimide, polyimide precursor, polybenzoxazole, and polybenzoxazole precursor . In the photosensitive resin composition of this invention, as a specific resin, it is preferable to contain a polyimide or a polyimide precursor, and it is more preferable to contain a polyimide precursor.

Moreover, it is preferable that a specific resin has a polymerizable group. As a polymerizable group in a specific resin, well-known polymerizable groups, such as a radical polymerizable group, an epoxy group, an oxetanyl group, a methylol group, and an alkoxymethyl group, are mentioned. As the above-mentioned radically polymerizable group, a group having an ethylenically unsaturated bond is preferable. Examples of the group having an ethylenically unsaturated bond include a group having an optionally substituted vinyl group directly bonded to an aromatic ring such as vinyl group, allyl group, vinylphenyl group, etc., (meth)acryloyl group An amine group, a (meth)acryloyloxy group, etc., a (meth)acryloyloxy group is preferable.

Among these, it is preferable that the specific resin contains a radically polymerizable group. When the specific resin has a radically polymerizable group, it is preferable that the photosensitive resin composition contains the photoradical polymerization initiator described later as the photosensitive agent, the photoradical polymerization initiator described later is included as the photosensitive agent, and the photosensitive resin composition contains The radical crosslinking agent described later is more preferable, the photoradical polymerization initiator described later is contained as a sensitizer, the radical crosslinking agent described later is contained, and the sensitizer described later is further more preferably contained. For example, a negative photosensitive layer is formed from such a photosensitive resin composition. In addition, the specific resin may have a polarity conversion group such as an acid-decomposable group. When a specific resin has an acid-decomposable group, it is preferable that the photosensitive resin composition contains the photoacid generator mentioned later as a photosensitive agent. For example, a chemically amplified positive-type photosensitive layer or a negative-type photosensitive layer is formed from such a photosensitive resin composition.

式（2）中，A¹ 及A² 分別獨立地表示氧原子或NH，R¹¹¹ 表示2價的有機基團，R¹¹⁵ 表示4價的有機基團，R¹¹³ 及R¹¹⁴ 分別獨立地表示氫原子或1價的有機基團。[Polyimide Precursor] The type of the polyimide precursor used in the present invention is not particularly limited, but it is preferable to include a repeating unit represented by the following formula (2). Formula (2) [Chemical Formula 2]

In formula (2), A ¹ and A ² each independently represent an oxygen atom or NH, R ¹¹¹ represents a divalent organic group, R ¹¹⁵ represents a tetravalent organic group, and R ¹¹³ and R ¹¹⁴ each independently represent hydrogen Atom or a monovalent organic group.

A ¹ and A ² in the formula (2) each independently represent an oxygen atom or NH, preferably an oxygen atom. R ¹¹¹ in the formula (2) represents a divalent organic group. As the divalent organic group, there can be exemplified groups including linear or branched aliphatic groups, cyclic aliphatic groups, and aromatic groups, including linear or branched aliphatic groups having 2 to 20 carbon atoms. , Cyclic aliphatic groups with 6 to 20 carbon atoms, aromatic groups with 6 to 20 carbon atoms, or groups formed by a combination of these are preferred, and groups containing aromatic groups with 6 to 20 carbon atoms are more preferred. good. As a particularly preferred embodiment of the present invention, a group represented by -Ar-L-Ar- can be exemplified. Wherein, Ar is each independently an aromatic group, and L is an aliphatic hydrocarbon group having 1 to 10 carbon atoms, -O-, -CO-, -S-, -SO ₂ - or -NHCO- which may be substituted by a fluorine atom. Or a group formed by a combination of two or more of the above. The preferred ranges of these are as described above.

Preferably R ¹¹¹ is derived from a diamine. As a diamine used for manufacture of a polyimide precursor, a linear or branched aliphatic, cyclic aliphatic, or aromatic diamine etc. are mentioned. Only one type of diamine may be used, or two or more types may be used. Specifically, it includes a group consisting of a linear or branched aliphatic group having 2 to 20 carbon atoms, a cyclic aliphatic group having 6 to 20 carbon atoms, an aromatic group having 6 to 20 carbon atoms, or a combination thereof. The diamine of the group is preferable, and the diamine containing a group consisting of an aromatic group having 6 to 20 carbon atoms is more preferable. As an example of an aromatic group, the following are mentioned.

式中，A係單鍵或選自可以被氟原子取代之碳數1～10的脂肪族烴基、-O-、-C（=O）-、-S-、-SO₂ -、-NHCO-或該等的組合中之基團為較佳，單鍵或選自可以被氟原子取代之碳數1～3的伸烷基、-O-、-C（=O）-、-S-或-SO₂ -中之基團為更佳，-CH₂ -、-O-、-S-、-SO₂ -、-C（CF₃ ）₂ -或-C（CH₃ ）₂ -為進一步較佳。 式中，*表示與其他結構的鍵結部位。[Chemical formula 3]

In the formula, A is a single bond or is selected from aliphatic hydrocarbon groups having 1 to 10 carbon atoms which may be substituted by fluorine atoms, -O-, -C(=O)-, -S-, -SO ₂ -, -NHCO- Or the group in these combinations is preferably, single bond or selected from alkylene with 1 to 3 carbon atoms which can be substituted by fluorine atom, -O-, -C(=O)-, -S- or The group in -SO ₂ - is more preferred, -CH ₂ -, -O-, -S-, -SO ₂ -, -C(CF ₃ ) ₂ - or -C(CH ₃ ) ₂ - is further preferred good. In the formula, * represents a bonding site with other structures.

Specifically, as the diamine, at least one diamine selected from the group consisting of 1,2-diaminoethane, 1,2-diaminopropane, 1,3-diaminopropane, 1,4-diaminobutane and 1,6-diaminohexane; 1,2- or 1,3-diaminocyclopentane, 1,2-, 1,3- or 1,4- Diaminocyclohexane, 1,2-, 1,3- or 1,4-bis(aminomethyl)cyclohexane, bis-(4-aminocyclohexyl)methane, bis-(3-amine cyclohexyl) methane, 4,4'-diamino-3,3'-dimethylcyclohexylmethane and isophorone diamine; m- or p-phenylenediamine, diaminotoluene, 4,4' - or 3,3'-diaminobiphenyl, 4,4'-diaminodiphenyl ether, 3,3-diaminodiphenyl ether, 4,4'- and 3,3'-diamine Diphenylmethane, 4,4'- and 3,3'-diaminodiphenyl sulfide, 4,4'- and 3,3'-diaminodiphenyl sulfide, 4,4'- or 3 ,3'-Diaminobenzophenone, 3,3'-dimethyl-4,4'-diaminobiphenyl, 2,2'-dimethyl-4,4'-diaminobiphenyl Benzene, 3,3'-dimethoxy-4,4'-diaminobiphenyl, 2,2-bis(4-aminophenyl)propane, 2,2-bis(4-aminophenyl) ) Hexafluoropropane, 2,2-bis(3-hydroxy-4-aminophenyl)propane, 2,2-bis(3-hydroxy-4-aminophenyl)hexafluoropropane, 2,2-bis (3-Amino-4-hydroxyphenyl)propane, 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane, bis(3-amino-4-hydroxyphenyl)sulfane, Bis(4-amino-3-hydroxyphenyl) benzene, 4,4'-diamino-terphenyl, 4,4'-bis(4-aminophenoxy)biphenyl, bis[4-( 4-aminophenoxy) phenyl] bis[4-(3-aminophenoxy) phenyl] bis[4-(2-aminophenoxy) phenyl] bis[4-(2-aminophenoxy) phenyl] bis, 1 ,4-bis(4-aminophenoxy)benzene, 9,10-bis(4-aminophenyl)anthracene, 3,3'-dimethyl-4,4'-diaminodiphenyl Di, 1,3-bis(4-aminophenoxy)benzene, 1,3-bis(3-aminophenoxy)benzene, 1,3-bis(4-aminophenoxy)benzene, 3 ,3'-Diethyl-4,4'-diaminodiphenylmethane, 3,3'-dimethyl-4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylmethane Octafluorobiphenyl, 2,2-bis[4-(4-aminophenoxy)phenyl]propane, 2,2-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane , 9,9-bis(4-aminophenyl)-10-hydroanthracene, 3,3',4,4'-tetraaminobiphenyl, 3,3',4,4'-tetraaminodiphenyl Phenyl ether, 1,4-diaminoanthraquinone, 1,5-diaminoanthraquinone, 3,3-dihydroxy-4,4'-diaminobiphenyl, 9,9'-bis(4- Aminophenyl) fluoride, 4,4'-dimethyl-3,3'-diaminodiphenylene, 3,3',5,5'-tetramethyl-4,4'-diamine diphenylmethane, 2,4- and 2,5 -Diaminocumene, 2,5-dimethyl-p-phenylenediamine, acetguanidine, 2,3,5,6-tetramethyl-p-phenylenediamine, 2,4,6-trimethyl yl-m-phenylenediamine, bis(3-aminopropyl)tetramethyldisiloxane, 2,7-diaminopyridine, 2,5-diaminopyridine, 1,2-bis(4- Aminophenyl)ethane, diaminobenzylaniline, esters of diaminobenzoic acid, 1,5-diaminonaphthalene, diaminotrifluorotoluene, 1,3-bis(4-aminobenzoic acid) phenyl) hexafluoropropane, 1,4-bis(4-aminophenyl)octafluorobutane, 1,5-bis(4-aminophenyl)decafluoropentane, 1,7-bis(4 -aminophenyl)tetrafluoroheptane, 2,2-bis[4-(3-aminophenoxy)phenyl]hexafluoropropane, 2,2-bis[4-(2-aminobenzene) oxy)phenyl]hexafluoropropane, 2,2-bis[4-(4-aminophenoxy)-3,5-dimethylphenyl]hexafluoropropane, 2,2-bis[4- (4-aminophenoxy)-3,5-bis(trifluoromethyl)phenyl]hexafluoropropane, p-bis(4-amino-2-trifluoromethylphenoxy)benzene, 4, 4'-bis(4-amino-2-trifluoromethylphenoxy)biphenyl, 4,4'-bis(4-amino-3-trifluoromethylphenoxy)biphenyl, 4, 4'-bis(4-amino-2-trifluoromethylphenoxy)diphenyl, 4,4'-bis(3-amino-5-trifluoromethylphenoxy)diphenyl Di, 2,2-bis[4-(4-amino-3-trifluoromethylphenoxy)phenyl]hexafluoropropane, 3,3',5,5'-tetramethyl-4,4 '-Diaminobiphenyl, 4,4'-Diamino-2,2'-bis(trifluoromethyl)biphenyl, 2,2',5,5',6,6'-hexafluorotriphenyl 𠯤 and 4,4'-diamino-p-tetraphenyl.

Furthermore, the diamines (DA-1) to (DA-18) described in paragraphs 0030 to 0031 of International Publication No. WO 2017/038598 are also preferred.

In addition to this, the following diamines can also be preferably used. [Chemical formula 4]

In addition, diamines having two or more alkylene glycol units in the main chain described in paragraphs 0032 to 0034 of International Publication No. 2017/038598 can also be preferably used.

From the viewpoint of the flexibility of the obtained organic film, R ¹¹¹ is preferably represented by -Ar-L-Ar-. Wherein, Ar is each independently an aromatic group, and L is an aliphatic hydrocarbon group having 1 to 10 carbon atoms, -O-, -CO-, -S-, -SO ₂ - or -NHCO- which may be substituted by a fluorine atom. Or a group formed by a combination of two or more of the above. Ar is preferably a phenylene group, and L is preferably an aliphatic hydrocarbon group having 1 or 2 carbon atoms, -O-, -CO-, -S- or -SO ₂ - which may be substituted by a fluorine atom. The aliphatic hydrocarbon group here is preferably an alkylene group.

式（51）中，R⁵⁰ ～R⁵⁷ 分別獨立地為氫原子、氟原子或1價的有機基團，R⁵⁰ ～R⁵⁷ 中的至少1個為氟原子、甲基或三氟甲基。 作為R⁵⁰ ～R⁵⁷ 的1價的有機基團，可以舉出碳數1～10（較佳為碳數1～6）的未經取代之烷基、碳數1～10（較佳為碳數1～6）的氟化烷基等。 [化學式6]

式（61）中，R⁵⁸ 及R⁵⁹ 分別獨立地為氟原子或三氟甲基。 作為提供式（51）或（61）的結構之二胺化合物，可以舉出2,2’-二甲基聯苯胺、2,2’-雙（三氟甲基）-4,4’-二胺基聯苯、2,2’-雙（氟）-4,4’-二胺基聯苯、4,4’-二胺基八氟聯苯等。該等可以使用1種或者組合使用2種以上。In addition, it is preferable that R ¹¹¹ is a divalent organic group represented by the following formula (51) or formula (61) from the viewpoint of i-ray transmittance. In particular, the divalent organic group represented by the formula (61) is more preferable from the viewpoint of i-ray transmittance and availability. Formula (51) [Chemical Formula 5]

In formula (51), R ⁵⁰ to R ⁵⁷ are each independently a hydrogen atom, a fluorine atom or a monovalent organic group, and at least one of R ⁵⁰ to R ⁵⁷ is a fluorine atom, a methyl group or a trifluoromethyl group. Examples of the monovalent organic groups of R ⁵⁰ to R ⁵⁷ include unsubstituted alkyl groups having 1 to 10 carbon atoms (preferably carbon atoms of 1 to 6), and unsubstituted alkyl groups having 1 to 10 carbon atoms (preferably carbon atoms of 1 to 10). Fluorinated alkyl groups of numbers 1 to 6), etc. [Chemical formula 6]

In formula (61), R ⁵⁸ and R ⁵⁹ are each independently a fluorine atom or a trifluoromethyl group. As the diamine compound providing the structure of formula (51) or (61), 2,2'-dimethylbenzidine, 2,2'-bis(trifluoromethyl)-4,4'-diamine can be mentioned Aminobiphenyl, 2,2'-bis(fluoro)-4,4'-diaminobiphenyl, 4,4'-diaminooctafluorobiphenyl, etc. These can be used alone or in combination of two or more.

Moreover, R ¹¹¹ may be a structure containing a polymerizable group. For example, R ¹¹¹ can also be a structure derived from a diamine compound having a polymerizable group. The diamine compound having a polymerizable group is not particularly limited, a compound having an aromatic ring structure is preferable, and a compound having a structure in which an amine group and a polymerizable group are directly bonded to the aromatic ring structure is more preferable. As the polymerizable group, a group containing an ethylenically unsaturated group, a cyclic ether group, a methylol group or an alkoxymethyl group is preferable, and a vinyl group, a (meth)allyl group, and a (meth)acryloyl group are preferred. Amino, (meth)acryloyloxy, maleimide, vinylphenyl, epoxy, oxetanyl, methylol or alkoxymethyl are more preferred, ( Meth)acryloyloxy, (meth)acrylamido, epoxy, methylol or alkoxymethyl are further preferred.

式（1-1）中，Y¹ 表示包含芳香族烴基之n+2價的基團，P¹ 表示包含聚合性基之基團，n表示1以上的整數，*分別表示與式（2）中的R¹¹¹ 所鍵結之氮原子的鍵結部位。Moreover, when R ¹¹¹ is a structure containing a polymerizable group, it is preferable that R ¹¹¹ is a structure represented by the following formula (1-1). [Chemical formula 7]

In the formula (1-1), Y ¹ represents an n+2-valent group containing an aromatic hydrocarbon group, P ¹ represents a group containing a polymerizable group, n represents an integer of 1 or more, and * represents the same as the formula (2), respectively. The bonding site of the nitrogen atom to which R ¹¹¹ is bonded.

-Y ¹ - In formula (1-1), Y ¹ represents an n+2-valent group including an aromatic hydrocarbon group. The aromatic hydrocarbon group in Y ¹ is preferably an aromatic hydrocarbon group having 6 to 30 carbon atoms, more preferably an aromatic hydrocarbon group having 6 to 20 carbon atoms, and a group that removes two or more hydrogen atoms from the benzene ring is further Preferably, a group that removes three or more hydrogen atoms from a benzene ring is particularly preferred. In the formula (1-1), it is preferable that the bonding sites of Y ¹ to the two *s described in the formula (1-1) are all aromatic hydrocarbon groups. That is, it is preferable that two * described in formula (1-1) are directly bonded to the aromatic hydrocarbon ring structure contained in Y ¹ . In addition, in the formula (1-1), it is preferable that all the bonding sites of Y ¹ to P ¹ are aromatic hydrocarbon groups. That is, it is preferable that P ¹ and the aromatic hydrocarbon ring structure contained in Y ¹ are directly bonded.

式（A2-1）～（A2-5）中，R^A211 ～R^A214 、R^A221 ～R^A224 、R^A231 ～R^A238 、R^A241 ～R^A248 及R^A251 ～R^A258 分別獨立地表示氫原子、烷基、環狀烷基、烷氧基、羥基、氰基、鹵化烷基或鹵素原子，L^A231 及L^A241 分別獨立地表示單鍵、羰基、磺醯基、2價的飽和烴基、2價的不飽和烴基、雜原子、雜環基或鹵化伸烷基，R^A211 ～R^A214 中至少1個、R^A221 ～R^A224 中至少1個、R^A231 ～R^A238 中至少1個、R^A241 ～R^A248 中至少1個及R^A251 ～R^A258 中至少1個可以係與上述式（1-1）中的P¹ 的鍵結部位，*分別獨立地表示與其他結構的鍵結部位。Preferably, Y ¹ contains at least one structure selected from the group consisting of structures represented by the following formula (A2-1) to (A2-5), and is selected from the group consisting of the above-mentioned formula (A2-1) - At least 1 kind of structure in the group of the structure represented by formula (A2-5) is more preferable. [Chemical formula 8]

In formulae (A2-1) to (A2-5), R ^A211 to R ^A214 , R ^A221 to R ^A224 , R ^A231 to R ^A238 , R ^A241 to R ^A248 and R ^A251 to R ^A258 each independently represent a hydrogen atom, Alkyl group, cyclic alkyl group, alkoxy group, hydroxyl group, cyano group, halogenated alkyl group or halogen atom, L ^A231 and L ^A241 each independently represent a single bond, carbonyl group, sulfonyl group, divalent saturated hydrocarbon group, divalent unsaturated hydrocarbon group, heteroatom, heterocyclic group or halogenated alkylene group, at least one of R ^A211 to R ^A214 , at least one of R ^A221 to R ^A224 , at least one of R ^A231 to R ^A238 , and at least one of R ^A241 to R A238 At least one of R ^A248 and at least one of R ^A251 to R ^A258 may be a bonding site with P ¹ in the above formula (1-1), and * each independently represents a bonding site with other structures.

Among these, from the viewpoint of solvent solubility, Y ¹ preferably includes a structure represented by any one of formula (A2-1) to formula (A2-4), formula (A2-2) or formula The structure represented by any one of (A2-4) is more preferable.

In formulae (A2-1) to (A2-5), R ^A211 to R ^A214 , R ^A221 to R ^A224 , R ^A231 to R ^A238 , R ^A241 to R ^A248 and R ^A251 to R ^A258 do not contain the -1) At least one of R ^A211 to R ^A214 , at least one of R ^A221 to R ^A224 , at least one of R ^A231 to R ^A238 , and at least one of R ^A241 to R ^A248 And at least one of R ^A251 to R ^A258 may be the bonding site of P ¹ in the above formula (1-1). In formula (A2-1), when R ^A211 to R ^A214 are not a bonding site with P ¹ , R ^A211 to R ^A214 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, and an alkyl group having 3 carbon atoms. A cyclic alkyl group of to 12, an alkoxy group of 1 to 6 carbon atoms, a hydroxyl group, a cyano group, a halogenated alkyl group of 1 to 3 carbon atoms, or a halogen atom are preferable. From the viewpoint of solvent solubility, a hydrogen atom is preferable. , an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, and a halogenated alkyl group having 1 to 3 carbon atoms are more preferable, and a hydrogen atom or an alkyl group having 1 to 6 carbon atoms is more preferable. A fluorine atom, a chlorine atom, a bromine atom, an iodine atom, etc. are mentioned as a halogen atom or the said halogen atom in the said halogenated alkyl group in said R ^A211 - ^RA214 , A chlorine atom or a bromine atom is preferable. In formula (A2-2), R ^A221 to R ^A224 have the same meanings as R ^A211 to R ^A214 in formula (A2-1), respectively, and the preferred embodiments are also the same. In formula (A2-3), R ^A231 to R ^A238 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, a cyclic alkyl group having 3 to 12 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, A hydroxyl group, a cyano group, a halogenated alkyl group having 1 to 3 carbon atoms or a halogen atom are preferred, and from the viewpoint of solvent solubility, a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, and an alkoxy group having 1 to 6 carbon atoms are preferred. A group or a halogenated alkyl group having 1 to 3 carbon atoms is more preferable, and a hydrogen atom or an alkyl group having 1 to 6 carbon atoms is more preferable. A fluorine atom, a chlorine atom, a bromine atom, an iodine atom, etc. are mentioned as a halogen atom or the said halogen atom in the said halogenated alkyl group in said R ^{A231-RA238 ,} A chlorine atom or a bromine atom is preferable. In formula (A2-3), L ^A231 represents a single bond, a divalent saturated hydrocarbon group having 1 to 6 carbon atoms, a divalent unsaturated hydrocarbon group having 5 to 24 carbon atoms, -O-, -S-, -NR ^N -, a heterocyclic group or a halogenated alkylene group with 1 to 6 carbon atoms is preferred, representing a single bond, a saturated hydrocarbon group with a carbon number of 1 to 6, -O- or a heterocyclic group is more preferred, representing a single bond or -O - is further preferred. The above R ^N represents a hydrogen atom or a hydrocarbon group, more preferably a hydrogen atom, an alkyl group or an aryl group, more preferably a hydrogen atom or an alkyl group, and particularly preferably a hydrogen atom. The above-mentioned divalent unsaturated hydrocarbon group may be a divalent aliphatic unsaturated hydrocarbon group or a divalent aromatic hydrocarbon group, and is preferably a divalent aromatic hydrocarbon group. As the above-mentioned heterocyclic group, for example, a group obtained by removing two hydrogen atoms from an aliphatic or aromatic heterocyclic ring is preferable, and a pyrrolidine ring, a tetrahydrofuran ring, a tetrahydrothiophene ring, a pyrrole ring, a furan ring, and a thiophene ring are preferred. , piperidine ring, tetrahydropyran, pyridine ring, morpholine ring and other ring structures to remove 2 hydrogen atoms are more preferred. These heterocycles may in turn form fused rings with other heterocycles or hydrocarbon rings. The number of ring members of the above heterocyclic ring is preferably 5 to 10, more preferably 5 or 6. Moreover, as a hetero atom in the said heterocyclic group, an oxygen atom, a nitrogen atom, or a sulfur atom is preferable. As a halogen atom in the said halogenated alkylene group, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, etc. are mentioned, A chlorine atom or a bromine atom is preferable. In formula (A2-4), R ^A241 to R ^A248 and L ^A241 have the same meanings as R ^A231 to R ^A238 and L ^A231 in formula (A2-3), respectively, and the preferred aspects are also the same. In formula (A2-5), R ^A251 to R ^A258 have the same meanings as R ^A211 to R ^A214 in formula (A2-1), respectively, and the preferred embodiments are also the same.

In the formula (A2-1), at least one of R ^A211 to R ^A214 is preferably a bonding site with P ¹ in the formula (1-1), and one of R ^A211 to R ^A214 is preferably the above-mentioned P ¹ The bonding site of R A213 is more preferable, and the bonding site of R ^A213 and the above-mentioned P ¹ is more preferable. In the formula (A2-2), at least one of R ^A221 to R ^A224 is preferably a bonding site with P ¹ in the formula (1-1), and one of R ^A221 to R ^A224 is preferably the above-mentioned P ¹ The bonding site of RA223 is more preferable, and the bonding site of R ^A223 and the above-mentioned P ¹ is more preferable. In the formula (A2-3), at least one of R ^A231 to R ^A238 is preferably the bonding site of P ¹ in the formula (1-1), and two of R ^A231 to R ^A238 are related to the above-mentioned P ¹ The bonding site of R ^A231 to R A234 is more preferable, and 1 of R A231 to R ^A234 and 1 of R ^A235 to R ^A238 , including 2, are further preferably to the bonding site of the above-mentioned P ¹ , and 2 of R ^A231 and R ^A238 The bonding site with the above-mentioned P ¹ is particularly preferred. In the formula (A2-4), at least one of R ^A241 to R ^A248 is preferably the bonding site of P ¹ in the formula (1-1), and two of R ^A241 to R ^A248 are preferably the above-mentioned P ¹ The bonding site of ^RA241 to RA244 is more preferable, and 1 of ^RA241 to ^RA244 and 1 of RA245 to ^RA248 , including 2, are further preferably the bonding site of the above-mentioned P1, and ² of ^RA241 and ^RA248 The bonding site with the above-mentioned P ¹ is particularly preferred. In the formula (A2-5), at least one of R ^A251 to R ^A258 is preferably the bonding site with P ¹ in the formula (1-1), and two of R ^A251 to R ^A258 are related to the above-mentioned P ¹ . The bonding site of ^RA251 to RA254 is more preferable, and 1 of ^RA251 to ^RA254 and 1 of RA255 to ^RA258 , including 2, are further preferably the bonding site of the above-mentioned P1, and ² of ^RA253 and ^RA257 The bonding site with the above-mentioned P ¹ is particularly preferred.

In formula (A2-1) to formula (A2-5), it is preferable that two * are respectively * in formula (1-1). That is, it is preferable that the two nitrogen atoms bonded by R ¹¹¹ in the formula (2) are directly bonded to the positions represented by the two * in the formulas (A2-1) to (A2-5).

式（Y-1）中，R^Y11 、R^Y12 、R^Y13 分別與式（A2-1）中的R^A211 、R^A212 及R^A214 意義相同，較佳態樣亦相同。 式（Y-2）中，R^Y21 ～R^Y26 分別與式（A2-4）中的R^A242 ～R^A247 意義相同，較佳態樣亦相同。 式（Y-1）或式（Y-2）中，*分別表示與式（2）中的R¹¹¹ 所鍵結之2個氮原子的鍵結部位，＃分別表示與式（1-1）中的P¹ 的鍵結部位。Among these, Y ¹ is preferably a group represented by the following formula (Y-1) or (Y-2). [Chemical formula 9]

In formula (Y-1), R ^Y11 , R ^Y12 , and R ^Y13 have the same meanings as R ^A211 , R ^A212 and R ^A214 in formula (A2-1), respectively, and the preferred embodiments are also the same. In formula (Y-2), R ^Y21 to R ^Y26 have the same meanings as R ^A242 to R ^A247 in formula (A2-4), respectively, and the preferred aspects are also the same. In the formula (Y-1) or the formula (Y-2), * respectively represents the bonding site with the two nitrogen atoms bonded to R ¹¹¹ in the formula (2), and # represents the bond with the formula (1-1) The bonding site of P ¹ in .

-P ¹ - In formula (1-1), P ¹ represents a group containing a polymerizable group. As the polymerizable group, a group containing an ethylenically unsaturated group, a cyclic ether group, a methylol group or an alkoxymethyl group is preferable, and a vinyl group, a (meth)allyl group, and a (meth)acryloyl group are preferred. Amino, (meth)acryloyloxy, maleimide, vinylphenyl, epoxy, oxetanyl, methylol or alkoxymethyl are more preferred, ( Meth)acryloyloxy, (meth)acrylamido, epoxy, methylol or alkoxymethyl are further preferred. The number of polymerizable groups contained in P ¹ is 1 or more, preferably 1 to 15, more preferably 1 to 10, further preferably 1 to 5, and particularly preferably 1 or 2, 1 is the best.

式（P-1）中，L¹ 表示單鍵或m+1價的連結基，A² 表示聚合性基，m表示1以上的整數，*表示與Y¹ 的鍵結部位。 式（P-1）中，L¹ 係單鍵或烴基、醚鍵、羰基、硫醚鍵、磺醯基、-NR^N -、或者該等鍵結2個以上之基團為較佳，單鍵或烴基、醚鍵、羰基、-NR^N -、或者該等鍵結2個以上之基團為更佳。 上述R^N 表示氫原子或烴基，係氫原子、烷基或芳基為更佳，氫原子或烷基為進一步較佳，氫原子為特佳。 作為上述L¹ 中的烴基，碳數1～30的飽和脂肪族烴基、碳數6～30的芳香族烴基、或由該等的組合表示之基團為較佳，碳數1～10的飽和脂肪族烴基、從苯環中去除2個以上的氫原子之基團、或由該等的鍵表示之基團為更佳。Moreover, it is preferable that P ¹ is a group represented by the following formula (P-1). [Chemical formula 10]

In formula (P-1), L ¹ represents a single bond or an m+1-valent linking group, A ² represents a polymerizable group, m represents an integer of 1 or more, and * represents a bonding site with Y ¹ . In formula (P-1), L ¹ is preferably a single bond or a hydrocarbon group, an ether bond, a carbonyl group, a thioether bond, a sulfonyl group, -NR ^N -, or two or more of these bonded groups. A bond or a hydrocarbon group, an ether bond, a carbonyl group, -NR ^N -, or a group having two or more of these bonds are more preferable. The above R ^N represents a hydrogen atom or a hydrocarbon group, more preferably a hydrogen atom, an alkyl group or an aryl group, more preferably a hydrogen atom or an alkyl group, and particularly preferably a hydrogen atom. As the hydrocarbon group in the above-mentioned L ¹ , a saturated aliphatic hydrocarbon group having 1 to 30 carbon atoms, an aromatic hydrocarbon group having 6 to 30 carbon atoms, or a group represented by a combination thereof is preferable, and a saturated hydrocarbon group having 1 to 10 carbon atoms is preferable. An aliphatic hydrocarbon group, a group obtained by removing two or more hydrogen atoms from a benzene ring, or a group represented by these bonds are more preferable.

In formula (P-1), A ² is vinyl, (meth)allyl, (meth)acrylamido, (meth)acryloyloxy, maleimide, ethylene phenyl, epoxy, oxetanyl, methylol or alkoxymethyl are preferred, (meth)acryloyloxy, (meth)acrylamido, epoxy, hydroxy Methyl or alkoxymethyl is more preferred.

In formula (P-1), m is preferably an integer of 1 to 15, more preferably an integer of 1 to 10, further preferably an integer of 1 to 5, particularly preferably 1 or 2, and most preferably 1.

式（P-2）中，A² 表示聚合性基，*表示與Y¹ 的鍵結部位。 式（P-2）中，A² 與式（P-1）中的A² 意義相同，較佳態樣亦相同。 式（P-3）中，A² 表示聚合性基，L² 表示烴基或烴基和醚鍵、羰基、硫醚鍵、磺醯基、-NR^N -、或者該等鍵結2個以上之基團，Z¹ 表示醚鍵、酯鍵、胺基甲酸酯鍵、脲鍵、醯胺鍵或碳酸酯鍵，*表示與Y¹ 的鍵結部位。R^N 如上所述。 式（P-3）中，A² 與式（P-1）中的A² 意義相同，較佳態樣亦相同。 式（P-3）中，L² 係烴基、（聚）伸烷氧基或由該等組合表示之基團為較佳。作為上述烴基，係伸烷基、2價的芳香族烴基或由該等的組合表示之基團為較佳，伸烷基為更佳。 在本說明書中，（聚）伸烷氧基是指伸烷氧基或聚伸烷氧基。又，在本發明中，聚伸烷氧基是指伸烷氧基直接鍵結2個以上之基團。聚伸烷氧基中所包含之複數個伸烷氧基中的伸烷基分別可以相同亦可以不同。當聚伸烷氧基包含不同的伸烷基的複數種伸烷氧基的情況下，聚伸烷氧基中的伸烷氧基的排列可以為無規排列，亦可以為具有嵌段之排列，亦可以為具有交替等圖案之排列。 作為上述伸烷基，碳數1～30的伸烷基為較佳，碳數1～20的伸烷基為更佳，碳數1～10的伸烷基為進一步較佳。 作為上述芳香族烴基，碳數6～30的芳香族烴基為較佳，碳數6～20的芳香族烴基為更佳，伸苯基或伸萘基為進一步較佳，伸苯基為特佳。 作為上述（聚）伸烷氧基中的伸烷基，碳數2～10的伸烷基為較佳，碳數2～4的伸烷基為更佳，伸乙基或伸丙基為更佳，伸乙基為進一步較佳。 又，聚伸烷氧基中所包含之伸烷氧基的數量（聚伸烷氧基的重複數量）係2～20為較佳，2～10為更佳，2～5為進一步較佳，2～4為特佳。 式（P-3）中，Z¹ 表示醚鍵、酯鍵、胺基甲酸酯鍵、脲鍵、醯胺鍵或碳酸酯鍵，酯鍵、胺基甲酸酯鍵、脲鍵或醯胺鍵為更佳。 在本發明中，當簡單地記載為“酯鍵”、“胺基甲酸酯鍵”、“醯胺鍵”等的情況下，該等鍵的方向沒有限定。例如，當上述Z¹ 為酯鍵的情況下，Z¹ 中的與L² 的鍵結部位可以為酯鍵中的碳原子，亦可以為氧原子。Moreover, P ¹ is preferably a group represented by the following formula (P-2) or formula (P-3). [Chemical formula 11]

In formula (P-2), A ² represents a polymerizable group, and * represents a bonding site with Y ¹ . In the formula (P-2), A ² has the same meaning as A ² in the formula (P-1), and the preferred aspects are also the same. In formula (P-3), A ² represents a polymerizable group, and L ² represents a hydrocarbon group or a hydrocarbon group and an ether bond, a carbonyl group, a thioether bond, a sulfonyl group, -NR ^N -, or a group having two or more of these bonds. group, Z ¹ represents an ether bond, an ester bond, a urethane bond, a urea bond, an amide bond or a carbonate bond, and * represents a bonding site with Y ¹ . R ^N is as described above. In the formula (P-3), A ² has the same meaning as A ² in the formula (P-1), and the preferred aspects are also the same. In the formula (P-3), L ² is preferably a hydrocarbon group, a (poly)alkaneoxy group, or a group represented by a combination thereof. The above-mentioned hydrocarbon group is preferably an alkylene group, a divalent aromatic hydrocarbon group, or a group represented by a combination of these, and more preferably an alkylene group. In the present specification, the (poly)alkeneoxy group refers to an alkeneoxy group or a polyalkeneoxy group. In addition, in the present invention, the polyalkeneoxy group refers to a group in which two or more alkeneoxy groups are directly bonded. The alkylene groups in the plural alkyleneoxy groups contained in the polyalkeneoxy group may be the same or different, respectively. When the polyalkeneoxy group contains a plurality of alkeneoxy groups with different alkylene groups, the arrangement of the alkeneoxy groups in the polyalkeneoxy group may be random, or may be an arrangement with blocks , and can also be an arrangement with alternating patterns. As the above-mentioned alkylene group, an alkylene group having 1 to 30 carbon atoms is preferable, an alkylene group having 1 to 20 carbon atoms is more preferable, and an alkylene group having 1 to 10 carbon atoms is further preferable. As the above-mentioned aromatic hydrocarbon group, an aromatic hydrocarbon group having 6 to 30 carbon atoms is preferable, an aromatic hydrocarbon group having 6 to 20 carbon atoms is more preferable, a phenylene extension or naphthylene group is further preferable, and a phenylene extension is particularly preferable . As the alkylene group in the above-mentioned (poly)alkaneoxy group, an alkylene group having 2 to 10 carbon atoms is preferable, an alkylene group having 2 to 4 carbon atoms is more preferable, and an ethylene group or a propylidene group is more preferable. Preferably, ethylidene is further preferred. In addition, the number of alkeneoxy groups contained in the polyalkeneoxy group (the number of repeating polyalkeneoxy groups) is preferably 2 to 20, more preferably 2 to 10, and even more preferably 2 to 5. 2 to 4 are particularly good. In formula (P-3), Z ¹ represents ether bond, ester bond, urethane bond, urea bond, amide bond or carbonate bond, ester bond, urethane bond, urea bond or amide bond key is better. In the present invention, when simply described as "ester bond", "urethane bond", "amide bond", etc., the direction of these bonds is not limited. For example, when the above-mentioned Z ¹ is an ester bond, the bonding site with L ² in Z ¹ may be a carbon atom in the ester bond or an oxygen atom.

式（5）中，R¹¹² 係單鍵或選自可以被氟原子取代之碳數1～10的脂肪族烴基、-O-、-CO-、-S-、-SO₂ -及-NHCO-以及該等的組合中之基團為較佳，單鍵或選自可以被氟原子取代之碳數1～3的伸烷基、-O-、-CO-、-S-及-SO₂ -中之基團為更佳，選自包括-CH₂ -、-C（CF₃ ）₂ -、-C（CH₃ ）₂ -、-O-、-CO-、-S-及-SO₂ -之群組中之2價的基團為進一步較佳。R ¹¹⁵ in formula (2) represents a tetravalent organic group. As the tetravalent organic group, a tetravalent organic group including an aromatic ring is preferable, and a group represented by the following formula (5) or formula (6) is more preferable. In formula (5) or formula (6), * each independently represents a bonding site with another structure. [Chemical formula 12]

In formula (5), R ¹¹² is a single bond or selected from aliphatic hydrocarbon groups having 1 to 10 carbon atoms which may be substituted by fluorine atoms, -O-, -CO-, -S-, -SO ₂ - and -NHCO- And the groups in these combinations are preferably single bonds or selected from alkylene groups with 1 to 3 carbon atoms that can be substituted by fluorine atoms, -O-, -CO-, -S- and -SO ₂ - The group in is more preferably selected from the group consisting of -CH ₂ -, -C(CF ₃ ) ₂ -, -C(CH ₃ ) ₂ -, -O-, -CO-, -S- and -SO ₂ - The divalent group in the group is further preferred.

式（O）中，R¹¹⁵ 表示4價的有機基團。R¹¹⁵ 的較佳範圍與式（2）中的R¹¹⁵ 意義相同，較佳範圍亦相同。Specifically, as ^R115 , the tetracarboxylic acid residue etc. which remain after removing the anhydride group from the tetracarboxylic dianhydride are mentioned. Only one type of tetracarboxylic dianhydride may be used, or two or more types may be used. Tetracarboxylic dianhydride is preferably represented by the following formula (O). [Chemical formula 13]

In formula (O), R ¹¹⁵ represents a tetravalent organic group. The preferable range of R ¹¹⁵ is the same as that of R ¹¹⁵ in the formula (2), and the preferable range is also the same.

Specific examples of tetracarboxylic dianhydrides include pyromellitic dianhydride (PMDA), 3,3',4,4'-biphenyltetracarboxylic dianhydride, 3,3',4,4' -Diphenyl sulfide tetracarboxylic dianhydride, 3,3',4,4'-diphenylene tetracarboxylic dianhydride, 3,3',4,4'-benzophenone tetracarboxylic dianhydride, 3,3',4,4'-diphenylmethanetetracarboxylic dianhydride, 2,2',3,3'-diphenylmethanetetracarboxylic dianhydride, 2,3,3',4'-biphenyl Tetracarboxylic dianhydride, 2,3,3',4'-benzophenone tetracarboxylic dianhydride, 4,4'-oxydiphthalic dianhydride, 2,3,6,7-naphthalene Tetracarboxylic dianhydride, 1,4,5,7-naphthalenetetracarboxylic dianhydride, 2,2-bis(3,4-dicarboxyphenyl)propane dianhydride, 2,2-bis(2,3- Dicarboxyphenyl) propane dianhydride, 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride, 1,3-diphenylhexafluoropropane-3,3,4,4-tetra Carboxylic acid dianhydride, 1,4,5,6-naphthalenetetracarboxylic acid dianhydride, 2,2',3,3'-diphenyltetracarboxylic acid dianhydride, 3,4,9,10-perylenetetracarboxylic acid Acid dianhydride, 1,2,4,5-naphthalene tetracarboxylic dianhydride, 1,4,5,8-naphthalene tetracarboxylic dianhydride, 1,8,9,10-phenanthrene tetracarboxylic dianhydride, 1 ,1-bis(2,3-dicarboxyphenyl)ethanedianhydride, 1,1-bis(3,4-dicarboxyphenyl)ethanedianhydride, 1,2,3,4-benzenetetracarboxyl Acid dianhydride, and these C1-C6 alkyl groups and C1-C6 alkyl derivatives.

Moreover, as a preferable example, the tetracarboxylic dianhydride (DAA-1) - (DAA-5) described in the 0038 paragraph of International Publication No. WO 2017/038598 can also be mentioned.

It is also preferable that at least one of R ¹¹¹ and R ¹¹⁵ has an OH group. More specifically, as R ¹¹¹ , a residue of a bisaminophenol derivative can be mentioned.

R ¹¹³ and R ¹¹⁴ each independently represent a hydrogen atom or a monovalent organic group, it is preferable that at least one of R ¹¹³ and R ¹¹⁴ contains a polymerizable group, and it is more preferable that both of them contain a polymerizable group. As a polymerizable group, it is a group which can carry out a crosslinking reaction by the action of heat, a radical, etc., and a radically polymerizable group is preferable. Specific examples of the polymerizable group in the specific resin include a group having an ethylenically unsaturated bond, an alkoxymethyl group, a hydroxymethyl group, an oxymethyl group, an epoxy group, and an oxetanyl group. , benzoxazolyl, blocked isocyanate, methylol, amine. As a radically polymerizable group which a polyimide precursor etc. have, the group which has an ethylenically unsaturated bond is preferable. Examples of the group having an ethylenically unsaturated bond include a vinyl group, a (meth)allyl group, a group represented by the following formula (III), and the like, and the group represented by the following formula (III) is better.

[Chemical formula 14]

In formula (III), R ²⁰⁰ represents a hydrogen atom or a methyl group, and a hydrogen atom is preferred. In formula (III), * represents a bonding site with other structures. In formula (III), R ²⁰¹ represents an alkylene group having 2 to 12 carbon atoms, -CH ₂ CH(OH)CH ₂ - or a polyalkeneoxy group. Preferred examples of R ²⁰¹ include ethylidene, propylidene, trimethylene, tetramethylene, 1,2-butanediyl, 1,3-butanediyl, pentamethylene, Hexamethylene, octamethylene, dodecylene, -CH ₂ CH(OH)CH ₂ -, polyalkyleneoxy, ethylidene, propylidene, trimethylene, -CH ₂ CH ( OH) CH ₂ - and polyalkeneoxy are more preferable, and polyalkoxy is further preferable. In the present invention, the polyalkeneoxy group refers to a group in which two or more alkaneoxy groups are directly bonded. The alkylene groups in the plural alkyleneoxy groups contained in the polyalkeneoxy group may be the same or different, respectively. When the polyalkeneoxy group contains a plurality of alkeneoxy groups with different alkylene groups, the arrangement of the alkeneoxy groups in the polyalkeneoxy group may be random, or may be an arrangement with blocks , and can also be an arrangement with alternating patterns. The carbon number of the above-mentioned alkylene group (when the alkylene group has a substituent, including the carbon number of the substituent) is preferably 2 or more, more preferably 2-10, more preferably 2-6, 2-5 2 to 4 are further preferred, 2 or 3 are particularly preferred, and 2 is the most preferred. Moreover, the said alkylene group may have a substituent. As a preferable substituent, an alkyl group, an aryl group, a halogen atom, etc. are mentioned. In addition, the number of alkeneoxy groups (the number of repetitions of the polyalkeneoxy groups) contained in the polyalkeneoxy group is preferably 2 to 20, more preferably 2 to 10, and even more preferably 2 to 6. From the viewpoint of solvent solubility and solvent resistance, the polyalkeneoxy group includes polyetheneoxy, polypropoxy, polytrimethyleneoxy, polytetramethyleneoxy, or a polytetramethyleneoxy group, or a polytetramethyleneoxy group. A group formed by bonding an oxy group and a plurality of propeneoxy groups is preferable, polyethoxy group or polypropoxy group is more preferable, and polyethoxy group is further preferable. In the group formed by the bonding of the above-mentioned plural ethoxy groups and plural propoxy groups, the ethoxy groups and the propoxy groups may be arranged randomly, or they may be arranged in blocks, or they may be arranged in the form of Alternating and other patterns. The preferable aspect of the repeating number of the ethoxy group etc. in these groups is as mentioned above.

R ¹¹³ and R ¹¹⁴ are each independently a hydrogen atom or a monovalent organic group. Examples of the monovalent organic group include an aromatic group and an aralkyl group in which an acidic group is bonded to one, two, or three carbons constituting an aryl group, preferably one carbon. Specifically, an aromatic group having 6 to 20 carbon atoms having an acidic group, and an aralkyl group having 7 to 25 carbon atoms having an acidic group can be mentioned. More specifically, the phenyl group which has an acidic group and the benzyl group which has an acidic group are mentioned. The acidic group is preferably an OH group. More preferably, R ¹¹³ or R ¹¹⁴ is a hydrogen atom, 2-hydroxybenzyl, 3-hydroxybenzyl and 4-hydroxybenzyl.

From the viewpoint of solubility in an organic solvent, R ¹¹³ or R ¹¹⁴ is preferably a monovalent organic group. The monovalent organic group preferably includes a straight-chain or branched-chain alkyl group, a cyclic alkyl group, and an aromatic group, and more preferably an alkyl group substituted with an aromatic group. The carbon number of the alkyl group is preferably from 1 to 30. The alkyl group may be any one of straight chain, branched chain and cyclic. Examples of straight-chain or branched-chain alkyl groups include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, dodecyl, and tetradecyl. base, octadecyl, isopropyl, isobutyl, sec-butyl, tert-butyl, 1-ethylpentyl, 2-ethylhexyl, 2-(2-(2-methoxyethyl oxy)ethoxy)ethoxy, 2-(2-(2-ethoxyethoxy)ethoxy)ethoxy, 2-(2-(2-(2-methoxyethoxy) yl)ethoxy)ethoxy)ethoxy and 2-(2-(2-(2-ethoxyethoxy)ethoxy)ethoxy)ethoxy. The cyclic alkyl group may be a monocyclic cyclic alkyl group or a polycyclic cyclic alkyl group. As a monocyclic cyclic alkyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group are mentioned, for example. Examples of the polycyclic cyclic alkyl group include adamantyl, norbornyl, camphenyl, camphenyl, decahydronaphthyl, tricyclodecyl, tetracyclodecyl, camphenyl, and bicyclic Hexyl and Pinenyl. Among them, the cyclohexyl group is the most suitable from the viewpoint of achieving high sensitivity. In addition, as the alkyl group substituted with an aromatic group, a straight-chain alkyl group substituted with an aromatic group described later is preferable. As the aromatic group, specifically, a substituted or unsubstituted benzene ring, naphthalene ring, cyclopentadiene ring, indene ring, azulene ring, heptavine ring, indene ring, perylene ring, fused pentaene ring Benzene ring, acenaphthene ring, phenanthrene ring, anthracene ring, condensed tetraphenyl ring, anthracene ring, bi-triphenylene ring, pyridine ring, biphenyl ring, pyrrole ring, furan ring, thiophene ring, imidazole ring, oxazole ring, Thiazole ring, pyridine ring, pyridine ring, pyrimidine ring, pyridine ring, indole ring, indole ring, benzofuran ring, benzothiophene ring, isobenzofuran ring, quinoline ring, quinoline ring , 呔𠯤 ring, naridine ring, quinoxaline ring, quinoxazoline ring, isoquinoline ring, carbazole ring, phenanthrene ring, acridine ring, phenanthrene ring, thien ring, chromene ring, Kou Yamaguchi star ring, phenothia ring, phenothia 𠯤 ring or brown 𠯤 ring. The benzene ring is the best.

In formula (2), when R ¹¹³ is a hydrogen atom or when R ¹¹⁴ is a hydrogen atom, the polyimide precursor can form a conjugate base with a tertiary amine compound having an ethylenically unsaturated bond. As an example of the tertiary amine compound which has such an ethylenically unsaturated bond, N,N- dimethylamino propyl methacrylate is mentioned.

At least one of R ¹¹³ and R ¹¹⁴ may be a polarity conversion group such as an acid-decomposable group. The acid-decomposable group is not particularly limited as long as it decomposes under the action of an acid to generate an alkali-soluble group such as a phenolic hydroxyl group and a carboxyl group, but an acetal group, a ketal group, a silyl group, and a silyl ether group are included. , a tertiary alkyl ester group, etc. are preferable, and an acetal group is more preferable from the viewpoint of exposure sensitivity. Specific examples of acid-decomposable groups include tert-butoxycarbonyl, isopropoxycarbonyl, tetrahydropyranyl, tetrahydrofuranyl, ethoxyethyl, methoxyethyl, and ethoxymethyl. group, trimethylsilyl group, tertiary butoxycarbonyl methyl group, trimethylsilyl ether group, etc. From the viewpoint of exposure sensitivity, an ethoxyethyl group or a tetrahydrofuranyl group is preferable.

Moreover, it is also preferable that the polyimide precursor has a fluorine atom in the structural unit. The content of fluorine atoms in the polyimide precursor is preferably 10% by mass or more, and more preferably 20% by mass or less.

In addition, the polyimide precursor may be copolymerized with an aliphatic group having a siloxane structure for the purpose of improving the adhesion to the substrate. Specifically, as a diamine component, bis(3-aminopropyl)tetramethyldisiloxane, bis(p-aminophenyl)octamethylpentasiloxane, etc. are mentioned.

式（2-A）中，A¹ 及A² 表示氧原子，R¹¹¹ 及R¹¹² 分別獨立地表示2價的有機基團，R¹¹³ 及R¹¹⁴ 分別獨立地表示氫原子或1價的有機基團，R¹¹³ 及R¹¹⁴ 中的至少一者為包含聚合性基之基團，兩者為聚合性基為較佳。The repeating unit represented by the formula (2) is preferably the repeating unit represented by the formula (2-A). That is, at least one of the polyimide precursors and the like used in the present invention preferably has a repeating unit precursor represented by formula (2-A). By setting it as such a structure, the width|variety of exposure latitude can be enlarged further. Formula (2-A) [Chemical Formula 15]

In formula (2-A), A ¹ and A ² represent an oxygen atom, R ¹¹¹ and R ¹¹² each independently represent a divalent organic group, and R ¹¹³ and R ¹¹⁴ each independently represent a hydrogen atom or a monovalent organic group. group, at least one of R ¹¹³ and R ¹¹⁴ is a group containing a polymerizable group, and both are preferably a polymerizable group.

A ¹ , A ² , R ¹¹¹ , R ¹¹³ and R ¹¹⁴ independently have the same meanings as A ¹ , A ² , R ¹¹¹ , R ¹¹³ and R ¹¹⁴ in formula (2), and the preferred ranges are also the same. R ¹¹² has the same meaning as R ¹¹² in formula (5), and the preferred range is also the same.

The polyimide precursor may contain one type of repeating structural unit represented by the formula (2), or may contain two or more types. In addition, structural isomers of the repeating unit represented by the formula (2) may also be included. In addition, the polyimide precursor may, of course, contain other types of repeating structural units in addition to the repeating unit of the above formula (2).

As one embodiment of the polyimide precursor in the present invention, 50 mol % or more, further 70 mol % or more, especially 90 mol % or more of all repeating units are represented by the formula (2). Polyimide precursors for repeating units.

The weight average molecular weight (Mw) of the polyimide precursor is preferably 18,000 to 30,000, more preferably 20,000 to 27,000, and further preferably 22,000 to 25,000. Moreover, as for the number average molecular weight (Mn), 7,200-14,000 are preferable, 8,000-12,000 are more preferable, 9,200-11,200 are still more preferable. The dispersion degree of the molecular weight of the polyimide precursor is preferably 2.5 or more, more preferably 2.7 or more, and even more preferably 2.8 or more. The upper limit of the dispersity of the molecular weight of the polyimide precursor is not particularly specified. For example, 4.5 or less is better, 4.0 or less is more preferred, 3.8 or less is further preferred, 3.2 or less is further preferred, and 3.1 or less is preferred. In order to be more preferable, 3.0 or less is still further preferable, and 2.95 or less is particularly preferable. In this specification, the dispersion degree of molecular weight is a value calculated by weight average molecular weight/number average molecular weight.

[Polyimide] The polyimide used in the present invention may be an alkali-soluble polyimide, or may be a polyimide soluble in a developer whose main component is an organic solvent. In this specification, the alkali-soluble polyimide means that 0.1 g or more of polyimide is dissolved in 100 g of a 2.38 mass % tetramethylammonium aqueous solution at 23°C, and from the viewpoint of pattern formation, 0.5 g or more is dissolved. Polyimide of g or more is preferable, and it is more preferable to dissolve polyimide of 1.0 g or more. The upper limit of the dissolved amount is not particularly limited, but is preferably 100 g or less. Moreover, from the viewpoint of the film strength and insulating properties of the obtained organic film, a polyimide-based polyimide having a plurality of imide structures in the main chain is preferable. In this specification, the "main chain" refers to the relatively longest bonding chain in the molecule of the polymer compound constituting the resin, and the "side chain" refers to other bonding chains.

-Fluorine Atom- From the viewpoint of the film strength of the obtained organic film, it is preferable that the polyimide has a fluorine atom. The fluorine atom is preferably included in, for example, R ¹³² in the repeating unit represented by the formula (4) described later or R ¹³¹ in the repeating unit represented by the formula (4) described later, and it is included as a fluorinated alkyl group described later. R ¹³² in the repeating unit represented by the formula (4) or R ¹³¹ in the repeating unit represented by the formula (4) described later is more preferable. The amount of fluorine atoms is preferably 1 to 50 mol/g, more preferably 5 to 30 mol/g, relative to the total mass of the polyimide.

-Silicon atom- From the viewpoint of the film strength of the obtained organic film, it is preferable that the polyimide system has a silicon atom. For example, it is preferable that the silicon atom is included in R ¹³¹ in the repeating unit represented by the formula (4) described later, and it is included in the compound represented by the formula (4) described later as the organic modified (poly)siloxane structure described later. R ¹³¹ in the repeating unit is more preferred. In addition, the silicon atom or the organic modified (poly)siloxane structure may be included in the side chain of the polyimide, but it is preferably included in the main chain of the polyimide. The amount of silicon atoms is preferably 0.01 to 5 mol/g, more preferably 0.05 to 1 mol/g, relative to the total mass of the polyimide.

-Ethylene unsaturated bond- From the viewpoint of the film strength of the obtained organic film, it is preferable that the polyimide has an ethylenically unsaturated bond. The polyimide may have an ethylenically unsaturated bond at the end of the main chain or may have an ethylenically unsaturated bond in the side chain, but it is preferable to have an ethylenically unsaturated bond in the side chain. It is preferable that the above-mentioned ethylenically unsaturated bond has radical polymerizability. The ethylenically unsaturated bond is preferably included in R ¹³² in the repeating unit represented by the formula (4) described later or R ¹³¹ in the repeating unit represented by the formula (4) described later, as having an ethylenically unsaturated bond It is more preferable that the group is included in R ¹³² in the repeating unit represented by the formula (4) described later or R ¹³¹ in the repeating unit represented by the formula (4) described later. Among these, it is preferable that an ethylenically unsaturated bond is included in R ¹³¹ in the repeating unit represented by the formula (4) described later, and the group having an ethylenically unsaturated bond is included in the formula ( 4) R ¹³¹ in the repeating unit represented is better. Examples of the group having an ethylenically unsaturated bond include a vinyl group, an allyl group, a vinylphenyl group, and the like, which are directly bonded to an aromatic ring and have a vinyl group which may be substituted, and (meth)acryloyl groups. group, a (meth)acryloyloxy group, a group represented by the following formula (IV), and the like.

[Chemical formula 16]

In formula (IV), R ²⁰ represents a hydrogen atom or a methyl group, preferably a methyl group.

In formula (IV), R ²¹ represents an alkylene group having 2 to 12 carbon atoms, -O-CH ₂ CH(OH)CH ₂ -, -C(=O)O-, -O(C=O)NH- , (poly)alkaneoxy with 2-30 carbon atoms (the carbon number of the alkylene group is 2-12 is better, 2-6 is better, 2 or 3 is particularly preferred; the repeating number system 1-12 is Preferably, 1 to 6 are more preferred, 1 to 3 are particularly preferred) or a group formed by combining two or more of these.

式（R1）～（R3）中，L表示單鍵或碳數2～12的伸烷基、碳數2～30的（聚）伸烷氧基或將該等中的2個以上鍵結而成之基團，X表示氧原子或硫原子，*表示與其他結構的鍵結部位，●表示與式（III）中的R²⁰¹ 所鍵結之氧原子的鍵結部位。 式（R1）～（R3）中，L中之碳數2～12的伸烷基或碳數2～30的（聚）伸烷氧基的較佳態樣與上述的R²¹ 中之碳數2～12的伸烷基或碳數2～30的（聚）伸烷氧基的較佳態樣相同。 式（R1）中，X係氧原子為較佳。 式（R1）～（R3）中，*與式（IV）中的*意義相同，較佳態樣亦相同。 式（R1）所表示之結構例如藉由使具有酚性羥基等羥基之聚醯亞胺與具有異氰酸酯基及乙烯性不飽和鍵之化合物（例如，甲基丙烯酸2-異氰酸酯基乙酯等）進行反應而得到。 式（R2）所表示之結構例如藉由使具有羧基之聚醯亞胺與具有羥基及乙烯性不飽和鍵之化合物（例如，甲基丙烯酸2-羥乙酯等）進行反應而得到。 式（R3）所表示之結構例如藉由使具有酚性羥基等羥基之聚醯亞胺與具有縮水甘油基及乙烯性不飽和鍵之化合物（例如，甲基丙烯酸縮水甘油酯等）進行反應而得到。 作為聚伸烷氧基，從溶劑溶解性及耐溶劑性的觀點而言，聚伸乙氧基、聚伸丙氧基、聚三亞甲氧基、聚四亞甲氧基或由複數個伸乙氧基和複數個伸丙氧基鍵結而成之基團為較佳，聚伸乙氧基或聚伸丙氧基為更佳，聚伸乙氧基為進一步較佳。在由上述複數個伸乙氧基和複數個伸丙氧基鍵結而成之基團中，伸乙氧基和伸丙氧基可以無規排列，亦可以形成嵌段而排列，亦可以排列成交替等圖案狀。該等基團中的伸乙氧基等的重複數的較佳態樣如上所述。Among these, R ²¹ is preferably a group represented by any one of the following formulae (R1) to (R3), and more preferably a group represented by the formula (R1). [Chemical formula 17]

In the formulae (R1) to (R3), L represents a single bond, or an alkylene group having 2 to 12 carbon atoms, a (poly)alkaneoxy group having 2 to 30 carbon atoms, or two or more of these. X represents an oxygen atom or a sulfur atom, * represents a bonding site with other structures, and ● represents a bonding site with the oxygen atom bonded to R ²⁰¹ in formula (III). In the formulae (R1) to (R3), the preferred embodiment of the alkylene group having 2 to 12 carbon atoms or the (poly)alkaneoxy group having 2 to 30 carbon atoms in L is the same as the carbon number in the above-mentioned R ²¹ . The preferable aspects of the alkylene group having 2 to 12 or the (poly)alkaneoxy group having 2 to 30 carbon atoms are the same. In the formula (R1), an X-based oxygen atom is preferable. In formulas (R1) to (R3), * has the same meaning as * in formula (IV), and the preferred aspects are also the same. The structure represented by the formula (R1) is obtained, for example, by combining a polyimide having a hydroxyl group such as a phenolic hydroxyl group with a compound having an isocyanate group and an ethylenically unsaturated bond (for example, 2-isocyanatoethyl methacrylate, etc.). obtained by the reaction. The structure represented by formula (R2) is obtained, for example, by reacting a polyimide having a carboxyl group with a compound having a hydroxyl group and an ethylenically unsaturated bond (for example, 2-hydroxyethyl methacrylate, etc.). The structure represented by the formula (R3) is obtained, for example, by reacting a polyimide having a hydroxyl group such as a phenolic hydroxyl group with a compound having a glycidyl group and an ethylenically unsaturated bond (for example, glycidyl methacrylate, etc.). get. From the viewpoint of solvent solubility and solvent resistance, the polyalkeneoxy group includes polyetheneoxy, polypropoxy, polytrimethyleneoxy, polytetramethyleneoxy, or a polytetramethyleneoxy group, or a polytetramethyleneoxy group. A group formed by bonding an oxy group and a plurality of propeneoxy groups is preferable, polyethoxy group or polypropoxy group is more preferable, and polyethoxy group is further preferable. In the group formed by the bonding of the above-mentioned plural ethoxy groups and plural propoxy groups, the ethoxy groups and the propoxy groups may be arranged randomly, or they may be arranged in blocks, or they may be arranged in the form of Alternating and other patterns. The preferable aspect of the repeating number of the ethoxy group etc. in these groups is as mentioned above.

In formula (IV), * represents a bonding site with other structures, and a bonding site with the main chain of polyimide is preferable.

The amount of ethylenically unsaturated bonds is preferably 0.05 to 10 mol/g, more preferably 0.1 to 5 mol/g, relative to the total mass of the polyimide. In addition, from the viewpoint of production suitability, the amount of ethylenically unsaturated bonds is preferably 0.0001 to 0.1 mol/g, more preferably 0.0005 to 0.05 mol/g, relative to the total mass of the polyimide.

-Crosslinkable groups other than ethylenically unsaturated bonds - The polyimide may have crosslinkable groups other than ethylenically unsaturated bonds. Examples of crosslinkable groups other than ethylenically unsaturated bonds include epoxy groups, cyclic ether groups such as oxetanyl groups, alkoxymethyl groups such as methoxymethyl groups, and methylol groups. It is preferable that the crosslinkable group other than the ethylenically unsaturated bond is contained in, for example, R ¹³¹ in the repeating unit represented by the formula (4) described later. The amount of the crosslinkable group other than the ethylenically unsaturated bond is preferably 0.05 to 10 mol/g, more preferably 0.1 to 5 mol/g, relative to the total mass of the polyimide. In addition, from the viewpoint of suitability for production, the amount of the crosslinkable group other than the ethylenically unsaturated bond is preferably 0.0001 to 0.1 mol/g, and 0.001 to 0.05 mol/g relative to the total mass of the polyimide. better.

-Polarity Conversion Group- The polyimide may have a polar conversion group such as an acid-decomposable group. The acid-decomposable groups in the polyimide are the same as the acid-decomposable groups described for R ¹¹³ and R ¹¹⁴ in the above formula (2), and the preferred embodiments are also the same.

-Acid value- When the polyimide is used for alkali development, the acid value of the polyimide is preferably 30 mgKOH/g or more, more preferably 50 mgKOH/g or more, and 70 mgKOH/g from the viewpoint of improving the developability The above is further preferred. Further, the acid value is preferably 500 mgKOH/g or less, more preferably 400 mgKOH/g or less, and even more preferably 200 mgKOH/g or less. In addition, when the polyimide is used for development using a developer containing an organic solvent as a main component (for example, "solvent development" described later), the acid value of the polyimide is 2 to 35 mgKOH/g More preferably, 3-30 mgKOH/g is more preferable, and 5-20 mgKOH/g is further preferable. The above acid value is measured by a known method, for example, by the method described in JIS K 0070:1992. Moreover, as an acid group contained in polyimide, the acid group with a pKa of 0-10 is preferable, and the acid group with a pKa of 3-8 is more preferable from the viewpoint of both storage stability and developability. The pKa is represented by the negative logarithm pKa of the equilibrium constant Ka taking into account the dissociation reaction that releases hydrogen ions from the acid. In this specification, unless otherwise specified, pKa is a calculated value based on ACD/ChemSketch (registered trademark). Alternatively, refer to the values described in "Revision 5th Edition Chemical Handbook Basic Edition" edited by the Chemical Society of Japan. In addition, when the acid group is, for example, a polybasic acid such as phosphoric acid, the above-mentioned pKa is the first dissociation constant. As the acid group, the polyimide preferably contains at least one selected from the group consisting of a carboxyl group and a phenolic hydroxyl group, and more preferably contains a phenolic hydroxyl group.

-Phenolic hydroxyl group- From the viewpoint of making the developing speed by an alkali developer suitable, it is preferable that the polyimide has a phenolic hydroxyl group. The polyimide may have a phenolic hydroxyl group at the end of the main chain, or may have a phenolic hydroxyl group at the side chain. The phenolic hydroxyl group is preferably contained in, for example, R ¹³² in the repeating unit represented by the formula (4) described later or R ¹³¹ in the repeating unit represented by the formula (4) described later. The amount of the phenolic hydroxyl groups is preferably 0.1 to 30 mol/g, more preferably 1 to 20 mol/g, relative to the total mass of the polyimide.

式（4）中，R¹³¹ 表示2價的有機基團，R¹³² 表示4價的有機基團。 當具有聚合性基的情況下，聚合性基可以位於R¹³¹ 及R¹³² 中的至少一者上，如下述式（4-1）或式（4-2）所示，亦可以位於聚醯亞胺的末端。 式（4-1） [化學式19]

式（4-1）中，R¹³³ 為聚合性基，其他基團與式（4）意義相同。 式（4-2） [化學式20]

R¹³⁴ 及R¹³⁵ 中的至少一者為聚合性基，當不是聚合性基的情況下為有機基團，其他基團與式（4）意義相同。The polyimide used in the present invention is not particularly limited as long as it is a polymer compound having an imide ring, but it is preferable to include a repeating unit represented by the following formula (4), including the formula (4). ) represented by a repeating unit and a compound having a polymerizable group is more preferable. Formula (4) [Chemical Formula 18]

In formula (4), R ¹³¹ represents a divalent organic group, and R ¹³² represents a tetravalent organic group. In the case of having a polymerizable group, the polymerizable group may be located on at least one of R ¹³¹ and R ¹³² , as shown in the following formula (4-1) or formula (4-2), or may be located on a polyamide amine end. Formula (4-1) [Chemical Formula 19]

In formula (4-1), R ¹³³ is a polymerizable group, and other groups have the same meanings as in formula (4). Formula (4-2) [Chemical Formula 20]

At least one of R ¹³⁴ and R ¹³⁵ is a polymerizable group, and when it is not a polymerizable group, it is an organic group, and the other groups have the same meanings as in formula (4).

The polymerizable group has the same meaning as the polymerizable group described in the above-mentioned polymerizable group of the polyimide precursor and the like. R ¹³¹ represents a divalent organic group. As a divalent organic group, the same as R ¹¹¹ in formula (2) can be exemplified, and the preferable range is also the same. Moreover, as ^R131 , the diamine residue which remains after removing the amine group of a diamine is mentioned. As a diamine, an aliphatic, cycloaliphatic, or aromatic diamine etc. are mentioned. As a specific example, the example of ^R111 in Formula (2) of a polyimide precursor can be mentioned.

From the viewpoint of more effectively suppressing warpage during calcination, R ¹³¹ is preferably a diamine residue having at least two alkylene glycol units in the main chain. More preferably, one molecule contains a total of two or more diamine residues of either an ethylene glycol chain or a propylene glycol chain, or both, and more preferably a diamine residue that does not contain an aromatic ring.

As a diamine containing two or more ethylene glycol chains and propylene glycol chains in total in one molecule, or both, JEFFAMINE (registered trademark) KH-511, ED-600, and ED-900 can be mentioned. , ED-2003, EDR-148, EDR-176, D-200, D-400, D-2000, D-4000 (the above are trade names, manufactured by HUNTSMAN), 1-(2-(2-(2- Aminopropoxy)ethoxy)propoxy)propan-2-amine, 1-(1-(1-(2-aminopropoxy)propan-2-yl)oxy)propane-2- Amines and the like, but are not limited to these.

R ¹³² represents a tetravalent organic group. As a tetravalent organic group, the same as R ¹¹⁵ in formula (2) can be exemplified, and the preferable range is also the same. For example, four bonders of the tetravalent organic group exemplified as R ¹¹⁵ are bonded to four -C(=O)- moieties in the above formula (4) to form a condensed ring.

Moreover, as R ¹³² , the tetracarboxylic acid residue etc. which remain after removing the anhydride group from the tetracarboxylic dianhydride are mentioned. As a specific example, the example of R ¹¹⁵ in the formula (2) of the polyimide precursor can be mentioned. From the viewpoint of the strength of the organic film, R ¹³² is preferably an aromatic diamine residue having 1 to 4 aromatic rings.

It is also preferable to have an OH group in at least one of R ¹³¹ and R ¹³² . More specifically, as R ¹³¹ , 2,2-bis(3-hydroxy-4-aminophenyl)propane, 2,2-bis(3-hydroxy-4-aminobenzene) can be mentioned as preferred examples base) hexafluoropropane, 2,2-bis(3-amino-4-hydroxyphenyl)propane, 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane, the above (DA- 1) to (DA-18), as R ¹³² , the above-mentioned (DAA-1) to (DAA-5) can be mentioned as more preferable examples.

Moreover, it is also preferable that polyimide has a fluorine atom in a structural unit. The content of the fluorine atoms in the polyimide is preferably 10% by mass or more, and more preferably 20% by mass or less.

Moreover, in order to improve the adhesiveness with a board|substrate, polyimide may be copolymerized with the aliphatic group which has a siloxane structure. Specifically, as a diamine component, bis(3-aminopropyl)tetramethyldisiloxane, bis(p-aminophenyl)octamethylpentasiloxane, etc. are mentioned.

In addition, in order to improve the storage stability of the composition, it is preferable to seal the main chain ends of the polyimide with a blocking agent such as a monoamine, an acid anhydride, a monocarboxylic acid, a monochloride compound, and a monoactive ester compound. Among these, it is more preferable to use a monoamine, and preferable compounds of the monoamine include aniline, 2-ethynylaniline, 3-ethynylaniline, 4-ethynylaniline, and 5-amino-8 -Hydroxyquinoline, 1-hydroxy-7-aminonaphthalene, 1-hydroxy-6-aminonaphthalene, 1-hydroxy-5-aminonaphthalene, 1-hydroxy-4-aminonaphthalene, 2-hydroxy-7 -aminonaphthalene, 2-hydroxy-6-aminonaphthalene, 2-hydroxy-5-aminonaphthalene, 1-carboxy-7-aminonaphthalene, 1-carboxy-6-aminonaphthalene, 1-carboxy-5 -aminonaphthalene, 2-carboxy-7-aminonaphthalene, 2-carboxy-6-aminonaphthalene, 2-carboxy-5-aminonaphthalene, 2-aminobenzoic acid, 3-aminobenzoic acid, 4 -aminobenzoic acid, 4-aminosalicylic acid, 5-aminosalicylic acid, 6-aminosalicylic acid, 2-aminobenzenesulfonic acid, 3-aminobenzenesulfonic acid, 4-aminosalicylic acid Benzenesulfonic acid, 3-amino-4,6-dihydroxypyrimidine, 2-aminophenol, 3-aminophenol, 4-aminophenol, 2-aminothiophenol, 3-aminothiophenol , 4-aminothiophenol, etc. Two or more of these may be used, or a plurality of different terminal groups may be introduced by reacting a plurality of terminal blocking agents.

- Imidization rate (ring closure rate) - The imidization rate (also referred to as "ring closure rate") of polyimide is 70% from the viewpoint of film strength, insulating properties, etc. of the obtained organic film The above is better, more than 80% is more preferable, and more than 90% is more preferable. The upper limit of the imidization rate is not particularly limited, as long as it is 100% or less. The said imidization rate is measured by the following method, for example. The infrared absorption spectrum of the polyimide was measured, and the peak intensity P1 in the vicinity of 1377 cm ⁻¹ was determined as an absorption peak derived from the structure of the imide. Next, after heat-treating this polyimide at 350 degreeC for 1 hour, the infrared absorption spectrum was measured again, and the peak intensity P2 of the vicinity of 1377 cm ^-1 was calculated|required. Using the obtained peak intensities P1 and P2, the imidization rate of the polyimide can be determined according to the following formula. Imidization rate (%) = (peak intensity P1/peak intensity P2) x100

The polyimide may all contain the repeating structural unit of the above formula (4) containing one kind of R ^{131 or R 132, or may contain two or more different kinds of R 131 or R 132 The repeating} structural unit of the above formula (4) repeating unit. Moreover, in addition to the repeating unit of the said formula (4), a polyimide may contain other kinds of repeating structural units.

The polyimide can be synthesized, for example, by a method of reacting a tetracarboxylic dianhydride and a diamine compound (a part of which is substituted with a monoamine end capping agent) at a low temperature; A method of reacting dianhydride (part of replacement with acid anhydride or monochloride compound or monoactive ester compound capping agent) and diamine compound; obtain diester by tetracarboxylic dianhydride and alcohol, and then in diamine ( A method of reacting a part of it with a monoamine end capping agent) and a condensing agent; using tetracarboxylic dianhydride and alcohol to obtain a diester, and then chlorinating the remaining dicarboxylic acid, A method such as a method of reacting it with a diamine (a part of which is replaced by a monoamine end-capping agent) is used to obtain a polyimide precursor, and it is completely imidized using a known imidization reaction method. method; alternatively, a method of stopping the imidization reaction in the middle and introducing a part of the imide structure; and introducing a part of the imide structure by mixing the fully imidized polymer and the polyimide precursor method. As a commercial item of polyimide, Durimide (registered trademark) 284 (manufactured by FUJIFILM Co., Ltd.) and Matrimide 5218 (manufactured by HUNTSMAN) can be exemplified.

The weight average molecular weight (Mw) of the polyimide is 4,000 to 100,000, preferably 5,000 to 70,000, more preferably 8,000 to 50,000, and even more preferably 10,000 to 30,000. By making the weight average molecular weight into 5,000 or more, the folding endurance of the film after hardening can be improved. In order to obtain an organic film excellent in mechanical properties, a weight average molecular weight of 20,000 or more is particularly preferred. Moreover, when two or more types of polyimide are contained, it is preferable that the weight average molecular weight of at least one type of polyimide is within the above-mentioned range.

式（3）中，R¹²¹ 表示2價的有機基團，R¹²² 表示4價的有機基團，R¹²³ 及R¹²⁴ 分別獨立地表示氫原子或1價的有機基團。[Polybenzoxazole Precursor] Although the structure and the like of the polybenzoxazole precursor used in the present invention are not particularly limited, it is preferable to include a repeating unit represented by the following formula (3). Formula (3) [Chemical Formula 21]

In formula (3), R ¹²¹ represents a divalent organic group, R ¹²² represents a tetravalent organic group, and R ¹²³ and R ¹²⁴ each independently represent a hydrogen atom or a monovalent organic group.

In formula (3), R ¹²³ and R ¹²⁴ have the same meanings as R ¹¹³ in formula (2), respectively, and the preferred ranges are also the same. That is, at least one of them is preferably a polymerizable group. In formula (3), R ¹²¹ represents a divalent organic group. The divalent organic group is preferably a group containing at least one of an aliphatic group and an aromatic group. As the aliphatic group, a straight-chain aliphatic group is preferable. R ¹²¹ is preferably a dicarboxylic acid residue. Only one type of dicarboxylic acid residue may be used, or two or more types may be used.

As the dicarboxylic acid residue, a dicarboxylic acid residue containing an aliphatic group and a dicarboxylic acid residue containing an aromatic group are preferable, and a dicarboxylic acid residue containing an aromatic group is more preferable. As the dicarboxylic acid containing an aliphatic group, a dicarboxylic acid containing a linear or branched (preferably linear) aliphatic group is preferred, and a linear or branched (preferably linear) aliphatic The dicarboxylic acid consisting of a group group and 2 -COOH is more preferable. The carbon number of the linear or branched (preferably linear) aliphatic group is preferably 2 to 30, more preferably 2 to 25, further preferably 3 to 20, and further preferably 4 to 15, 5 to 10 is particularly good. The straight-chain aliphatic group is preferably an alkylene group. Examples of the dicarboxylic acid containing a straight-chain aliphatic group include malonic acid, dimethylmalonic acid, ethylmalonic acid, isopropylmalonic acid, di-n-butylmalonic acid, succinic acid, Tetrafluorosuccinic acid, methylsuccinic acid, 2,2-dimethylsuccinic acid, 2,3-dimethylsuccinic acid, dimethylmethylsuccinic acid, glutaric acid, hexafluoroglutaric acid, 2- Methylglutaric acid, 3-methylglutaric acid, 2,2-dimethylglutaric acid, 3,3-dimethylglutaric acid, 3-ethyl-3-methylglutaric acid, hexane Diacid, octafluoroadipic acid, 3-methyladipic acid, pimelic acid, 2,2,6,6-tetramethylpimelic acid, suberic acid, dodecafluorooctanedioic acid, azelaic acid , sebacic acid, hexadecanedioic acid, 1,9- azelaic acid, dodecanedioic acid, tridecanedioic acid, tetradecanedioic acid, pentadecanedioic acid, hexadecanedioic acid, Heptadecanedioic acid, octadecanedioic acid, nonadecanedioic acid, eicosanedioic acid, eicosanedioic acid, docosanedioic acid, tricosanedioic acid, tetracosanedioic acid acid, pentacosanedioic acid, hexadecanedioic acid, heptacosanedioic acid, octacosanedioic acid, nonacosanedioic acid, triacosanedioic acid, tridecanedioic acid, Trisanedioic acid, diglycolic acid, dicarboxylic acid represented by the following formula, and the like.

（式中，Z為碳數1～6的烴基，n為1～6的整數。）[Chemical formula 22]

(In the formula, Z is a hydrocarbon group having 1 to 6 carbon atoms, and n is an integer of 1 to 6.)

As the dicarboxylic acid containing an aromatic group, the following dicarboxylic acids having an aromatic group are preferable, and the following dicarboxylic acids consisting only of an aromatic group and two -COOH are more preferable.

式中，A表示選自包括-CH₂ -、-O-、-S-、-SO₂ -、-CO-、-NHCO-、-C（CF₃ ）₂ -及-C（CH₃ ）₂ -之群組中之2價的基團，*分別獨立地表示與其他結構的鍵結部位。[Chemical formula 23]

In the formula, A represents selected from the group consisting of -CH ₂ -, -O-, -S-, -SO ₂ -, -CO-, -NHCO-, -C(CF ₃ ) ₂ - and -C(CH ₃ ) ₂ A divalent group in the group of -, * each independently represents a bonding site with other structures.

Specific examples of the dicarboxylic acid containing an aromatic group include 4,4'-carbonyldibenzoic acid, 4,4'-dicarboxydiphenyl ether, and terephthalic acid.

In formula (3), R ¹²² represents a tetravalent organic group. The tetravalent organic group has the same meaning as that of R ¹¹⁵ in the above formula (2), and the preferred range is also the same. R ¹²² is also preferably a group derived from a bisaminophenol derivative, and examples of the group derived from a bisaminophenol derivative include 3,3'-diamino-4,4'- Dihydroxybiphenyl, 4,4'-diamino-3,3'-dihydroxybiphenyl, 3,3'-diamino-4,4'-dihydroxydiphenyl, 4,4'-dihydroxydiphenyl Amino-3,3'-dihydroxydiphenyl, bis-(3-amino-4-hydroxyphenyl)methane, 2,2-bis(3-amino-4-hydroxyphenyl)propane, 2 ,2-bis-(3-amino-4-hydroxyphenyl)hexafluoropropane, 2,2-bis-(4-amino-3-hydroxyphenyl)hexafluoropropane, bis-(4-amino- -3-hydroxyphenyl)methane, 2,2-bis-(4-amino-3-hydroxyphenyl)propane, 4,4'-diamino-3,3'-dihydroxybenzophenone, 3,3'-Diamino-4,4'-dihydroxybenzophenone, 4,4'-diamino-3,3'-dihydroxydiphenyl ether, 3,3'-diamino- 4,4'-Dihydroxydiphenyl ether, 1,4-diamino-2,5-dihydroxybenzene, 1,3-diamino-2,4-dihydroxybenzene, 1,3-diamino -4,6-Dihydroxybenzene, etc. These bisaminophenols can be used alone or in combination.

Among the bisaminophenol derivatives, the following bisaminophenol derivatives having an aromatic group are preferable.

式中，X₁ 表示-O-、-S-、-C（CF₃ ）₂ -、-CH₂ -、-SO₂ -、-NHCO-，*及#分別表示與其他結構的鍵結部位。R表示氫原子或1價的取代基，氫原子或烴基為較佳，氫原子或烷基為更佳。又，R¹²² 係由上述式表示之結構亦為較佳。當R¹²² 為由上述式表示之結構的情況下，在共計4個*及#中，任意2個為與式（3）中的R¹²² 所鍵結之氮原子的鍵結部位，且其他2個為與式（3）中的R¹²² 所鍵結之氧原子的鍵結部位為較佳，2個*為與式（3）中的R¹²² 所鍵結之氧原子的鍵結部位，且2個#為與式（3）中的R¹²² 所鍵結之氮原子的鍵結部位，或者2個*為與式（3）中的R¹²² 所鍵結之氮原子的鍵結部位，且2個#為與式（3）中的R¹²² 所鍵結之氧原子的鍵結部位為更佳，2個*為與式（3）中的R¹²² 所鍵結之氧原子的鍵結部位，且2個#為與式（3）中的R¹²² 所鍵結之氮原子的鍵結部位為進一步較佳。[Chemical formula 24]

In the formula, X ₁ represents -O-, -S-, -C(CF ₃ ) ₂ -, -CH ₂ -, -SO ₂ -, -NHCO-, and * and # represent the bonding sites with other structures, respectively. R represents a hydrogen atom or a monovalent substituent, preferably a hydrogen atom or a hydrocarbon group, and more preferably a hydrogen atom or an alkyl group. In addition, the structure in which R ¹²² is represented by the above formula is also preferable. When R ¹²² is a structure represented by the above formula, of the total of 4 * and #, any 2 are a bonding site to the nitrogen atom to which R ¹²² in the formula (3) is bonded, and the other 2 One is preferably a bonding site with an oxygen atom bonded to R ¹²² in the formula (3), and two * are bonding sites with an oxygen atom bonded with R ¹²² in the formula (3), and 2 # are bonding sites with nitrogen atoms bonded to R ¹²² in formula (3), or 2 * are bonding sites with nitrogen atoms bonded with R ¹²² in formula (3), and 2 # are the bonding sites with the oxygen atom bonded to R ¹²² in the formula (3), and 2 * are the bonding sites with the oxygen atom bonded with R ¹²² in the formula (3). , and 2 # is the bonding site with the nitrogen atom bonded to R ¹²² in the formula (3), which is more preferable.

[Chemical formula 25]

In formula (As), R ₁ is hydrogen atom, alkylene, substituted alkylene, -O-, -S-, -SO ₂ -, -CO-, -NHCO-, single bond or selected from the following An organic group in the group of formula (A-sc). R ₂ is any one of a hydrogen atom, an alkyl group, an alkoxy group, an aryloxy group, and a cyclic alkyl group, which may be the same or different. R ₃ is any one of a hydrogen atom, a straight-chain or branched-chain alkyl group, an alkoxy group, an aryloxy group, and a cyclic alkyl group, which may be the same or different.

（式（A-sc）中，*表示鍵結於上述式（A-s）所表示之雙胺基苯酚衍生物的胺基苯酚基的芳香環。）[Chemical formula 26]

(In the formula (A-sc), * represents an aromatic ring bonded to the aminophenol group of the bisaminophenol derivative represented by the above formula (As).)

In the above formula (As), it is considered that having a substituent at the ortho position of the phenolic hydroxyl group, that is, on R ₃ , brings the distance between the carbonyl carbon of the amide bond and the hydroxyl group closer, and it is considered to be a cause of high cyclization rate when hardened at low temperature. It is particularly preferable from the viewpoint that the effect is further improved.

In addition, in the above formula (As), when R ₂ is an alkyl group and R ₃ is an alkyl group, the effects of high transparency to i-rays and high cyclization rate during curing at low temperature are maintained, which is preferable.

In addition, in the above formula (As), it is more preferable that R ₁ is an alkylene group or a substituted alkylene group. Specific examples of the alkylidene and substituted alkylene groups of R ₁ include linear or branched alkyl groups having 1 to 8 carbon atoms, among which, while maintaining high transparency to i-rays and -CH ₂ - and -CH(CH ₃ ) have the effect of high cyclization rate when hardened at a low temperature and can obtain a polybenzoxazole precursor excellent in the balance of sufficient solubility to a solvent. -, -C(CH ₃ ) ₂ - is more preferable.

As a method for producing the bisaminophenol derivative represented by the above formula (As), for example, reference can be made to paragraphs 0085 to 0094 and Example 1 (paragraphs 0189 to 0190) of Japanese Patent Laid-Open No. 2013-256506. The contents are incorporated into this manual.

Specific examples of the structure of the bisaminophenol derivative represented by the above formula (As) include those described in paragraphs 0070 to 0080 of Japanese Patent Laid-Open No. 2013-256506, which are incorporated into the present specification. middle. Of course, it is not limited to these.

The polybenzoxazole precursor may contain other types of repeating structural units in addition to the repeating unit of the above formula (3). It is preferable to contain a diamine residue represented by the following formula (SL) as another kind of repeating structural unit from the viewpoint of suppressing the occurrence of warpage accompanying ring closure.

式（SL）中，Z具有a結構和b結構，R^1s 為氫原子或碳數1～10的烴基，R^2s 為碳數1～10的烴基，R^3s 、R^4s 、R^5s 、R^6s 中的至少1個為芳香族基，其餘為氫原子或碳數1～30的有機基團，其分別可以相同亦可以不同。a結構及b結構的聚合可以為嵌段聚合，亦可以為無規聚合。關於Z部分的莫耳%，a結構為5～95莫耳%、b結構為95～5莫耳%，a+b為100莫耳%。[Chemical formula 27]

In formula (SL), Z has a structure and b structure, R ^1s is a hydrogen atom or a hydrocarbon group with 1 to 10 carbon atoms, R ^2s is a hydrocarbon group with 1 to 10 carbon atoms, R ^3s , R ^4s , R ^5s , R ^6s At least one of them is an aromatic group, and the rest are a hydrogen atom or an organic group having 1 to 30 carbon atoms, which may be the same or different. The polymerization of the a structure and the b structure may be block polymerization or random polymerization. Regarding the mol % of the Z part, the a structure is 5 to 95 mol %, the b structure is 95 to 5 mol %, and a+b is 100 mol %.

In the formula (SL), as preferable Z, those in which R ^5s and R ^6s in the b structure are phenyl groups can be mentioned. In addition, the molecular weight of the structure represented by the formula (SL) is preferably 400 to 4,000, and more preferably 500 to 3,000. By setting the above molecular weight within the above range, the elastic modulus after dehydration and ring closure of the polybenzoxazole precursor can be more effectively reduced, and both the effect of suppressing warpage and the effect of improving solvent solubility can be achieved.

When the diamine residue represented by the formula (SL) is included as another type of repeating structural unit, the tetracarboxylic acid residue remaining after removing the anhydride group from the tetracarboxylic dianhydride is also included as the repeating structural unit. is better. Examples of such tetracarboxylic acid residues include R ¹¹⁵ in the formula (2).

For example, when a polybenzoxazole precursor is used in the composition described later, the weight average molecular weight (Mw) of the polybenzoxazole precursor is preferably 18,000 to 30,000, more preferably 20,000 to 29,000, and further Preferably it is 22,000-28,000. Moreover, as for the number average molecular weight (Mn), 7,200-14,000 are preferable, 8,000-12,000 are more preferable, 9,200-11,200 are still more preferable. The degree of dispersion of the molecular weight of the polybenzoxazole precursor is preferably 1.4 or more, more preferably 1.5 or more, and even more preferably 1.6 or more. The upper limit of the dispersity of the molecular weight of the polybenzoxazole precursor is not particularly specified, for example, 2.6 or less is preferred, 2.5 or less is more preferred, 2.4 or less is further preferred, 2.3 or less is further preferred, and 2.2 or less is preferred. for further better.

式（X）中，R¹³³ 表示2價的有機基團，R¹³⁴ 表示4價的有機基團。 當具有聚合性基或酸分解性基等極性轉換基的情況下，聚合性基或酸分解性基等極性轉換基可以位於R¹³³ 及R¹³⁴ 中的至少一者上，亦可以如下述式（X-1）或式（X-2）所示，位於聚苯并㗁唑的末端。 式（X-1） [化學式29]

式（X-1）中，R¹³⁵ 及R¹³⁶ 中的至少一者為聚合性基或酸分解性基等極性轉換基，當不是聚合性基或酸分解性基等極性轉換基的情況下為有機基，其他基團與式（X）意義相同。 式（X-2） [化學式30]

式（X-2）中，R¹³⁷ 為聚合性基或酸分解性基等極性轉換基，其他為取代基，其他基團與式（X）意義相同。[Polybenzoxazole] The polybenzoxazole is not particularly limited as long as it is a polymer compound having a benzoxazole ring, but a compound represented by the following formula (X) is preferable, and is represented by the following The compound represented by formula (X) and having a polymerizable group is more preferable. As the above-mentioned polymerizable group, a radically polymerizable group is preferable. Moreover, it may be a compound represented by the following formula (X) and having a polarity converting group such as an acid-decomposable group. [Chemical formula 28]

In formula (X), R ¹³³ represents a divalent organic group, and R ¹³⁴ represents a tetravalent organic group. In the case of having a polar conversion group such as a polymerizable group or an acid-decomposable group, the polar conversion group such as a polymerizable group or an acid-decomposable group may be located on at least one of R ¹³³ and R ¹³⁴ , or it may be shown in the following formula ( X-1) or formula (X-2), it is located at the end of polybenzoxazole. Formula (X-1) [Chemical Formula 29]

In formula (X-1), at least one of R ¹³⁵ and R ¹³⁶ is a polar conversion group such as a polymerizable group or an acid-decomposable group, and when it is not a polar conversion group such as a polymerizable group or an acid-decomposable group, it is Organic group, other groups have the same meaning as formula (X). Formula (X-2) [Chemical Formula 30]

In the formula (X-2), R ¹³⁷ is a polar conversion group such as a polymerizable group or an acid-decomposable group, the other groups are substituent groups, and the other groups have the same meanings as those of the formula (X).

The polar conversion group such as a polymerizable group or an acid-decomposable group has the same meaning as the polymerizable group described in the above-mentioned polymerizable group contained in the polyimide precursor or the like.

R ¹³³ represents a divalent organic group. As a divalent organic group, an aliphatic or an aromatic group is mentioned. As a specific example, the example of ^R121 in Formula (3) of a polybenzoxazole precursor is mentioned. In addition, its preferable example is the same as that of ^R121 .

R ¹³⁴ represents a tetravalent organic group. Examples of the tetravalent organic group include R ¹²² in the formula (3) of the polybenzoxazole precursor. In addition, its preferable example is the same as that of R ¹²² . For example, four bonders of the tetravalent organic group exemplified as R ¹²² are bonded to the nitrogen atom and the oxygen atom in the above formula (X) to form a condensed ring. For example, when R ¹³⁴ is the following organic group, the following structure is formed. [Chemical formula 31]

The oxazole rate of polybenzoxazole is preferably 85% or more, more preferably 90% or more. When the oxazolylization ratio is 85% or more, the film shrinkage due to the ring closure generated during oxazolylization by heating is reduced, and the occurrence of warpage can be suppressed more effectively.

All of the polybenzoxazoles may contain the repeating structural unit of the above formula (X) containing one type of R ¹³¹ or R ¹³² , or may contain the above formula (X) containing two or more different types of R ¹³¹ or R ¹³² . repeating unit. Moreover, in addition to the repeating unit of the said formula (X), a polybenzoxazole may contain other kinds of repeating structural units.

Polybenzoxazole is prepared, for example, by mixing a bisaminophenol derivative with a dicarboxylic acid dichloride and a dicarboxylic acid derivative selected from the group consisting of dicarboxylic acids containing R ¹³³ or the above-mentioned dicarboxylic acids, and the like. The compound is reacted to obtain a polybenzoxazole precursor, which is obtained by oxazoleization by a known oxazole method. Moreover, in the case of a dicarboxylic acid, in order to improve reaction yield etc., the active ester type dicarboxylic acid derivative obtained by making 1-hydroxy-1,2,3-benzotriazole etc. react in advance can be used.

The weight average molecular weight (Mw) of the polybenzoxazole is preferably 5,000 to 70,000, more preferably 8,000 to 50,000, and even more preferably 10,000 to 30,000. By making the weight average molecular weight into 5,000 or more, the folding endurance of the film after hardening can be improved. In order to obtain an organic film excellent in mechanical properties, a weight average molecular weight of 20,000 or more is particularly preferred. Moreover, when containing two or more types of polybenzoxazoles, it is preferable that the weight average molecular weight of at least one type of polybenzoxazoles is in the said range.

[Method for producing polyimide precursor, etc.] A polyimide precursor or the like is obtained by reacting a dicarboxylic acid or a dicarboxylic acid derivative with a diamine. It is preferably obtained by reacting with diamine after halogenating a dicarboxylic acid or a dicarboxylic acid derivative using a halogenating agent. In the production method of a polyimide precursor or the like, it is preferable to use an organic solvent when the reaction is carried out. The organic solvent may be one type or two or more types. The organic solvent can be appropriately defined according to the raw material, and examples thereof include pyridine, diethylene glycol dimethyl ether (diglyme), N-methylpyrrolidone, and N-ethylpyrrolidone. Polyimide can be cyclized by thermal imidization, chemical imidization (eg, by enabling a catalyst to promote cyclization) after synthesis of a polyimide precursor. It can also directly synthesize polyimide.

Moreover, it is also preferable to synthesize using a non-halogen-based catalyst without using the above-mentioned halogenating agent. As the above-mentioned non-halogen-based catalyst, a known amination catalyst that does not contain a halogen atom can be used without particular limitation, and examples thereof include boroxine compounds, N-hydroxy compounds, and tertiary amines. , Phosphate esters, amine salts, urea compounds, etc., carbodiimide compounds. As said carbodiimide compound, N,N'-diisopropylcarbodiimide, N,N'-dicyclohexylcarbodiimide, etc. are mentioned.

-Capping agent- When producing polyimide precursors, etc., in order to further improve the storage stability of the composition, the ends of the polyimide precursors, etc. are sealed with end-capping agents such as acid anhydrides, monocarboxylic acids, monoacyl chloride compounds, and monoactive ester compounds. is better. As the blocking agent, it is more preferable to use a monoamine, and preferable compounds of the monoamine include aniline, 2-ethynylaniline, 3-ethynylaniline, 4-ethynylaniline, and 5-amino-8- Hydroxyquinoline, 1-hydroxy-7-aminonaphthalene, 1-hydroxy-6-aminonaphthalene, 1-hydroxy-5-aminonaphthalene, 1-hydroxy-4-aminonaphthalene, 2-hydroxy-7- aminonaphthalene, 2-hydroxy-6-aminonaphthalene, 2-hydroxy-5-aminonaphthalene, 1-carboxy-7-aminonaphthalene, 1-carboxy-6-aminonaphthalene, 1-carboxy-5- aminonaphthalene, 2-carboxy-7-aminonaphthalene, 2-carboxy-6-aminonaphthalene, 2-carboxy-5-aminonaphthalene, 2-aminobenzoic acid, 3-aminobenzoic acid, 4- Aminobenzoic acid, 4-aminosalicylic acid, 5-aminosalicylic acid, 6-aminosalicylic acid, 2-aminobenzenesulfonic acid, 3-aminobenzenesulfonic acid, 4-aminobenzene Sulfonic acid, 3-amino-4,6-dihydroxypyrimidine, 2-aminophenol, 3-aminophenol, 4-aminophenol, 2-aminothiophenol, 3-aminothiophenol, 4-aminothiophenol, 4-aminostyrene, etc. Two or more of these may be used, or a plurality of different terminal groups may be introduced by reacting a plurality of terminal blocking agents.

-Solid Precipitation- When producing a polyimide precursor or the like, a process of precipitating a solid may be included. Specifically, a solid can be deposited by precipitating the polyimide precursor in the reaction solution in water and dissolving it in a soluble solvent such as a polyimide precursor such as tetrahydrofuran. Then, the polyimide precursor or the like is dried to obtain a powdery polyimide precursor or the like.

〔content〕 The content of the specific resin in the composition of the present invention is preferably 20 mass % or more, more preferably 30 mass % or more, more preferably 40 mass % or more, and 50 mass % or more with respect to the total solid content of the composition for further better. Furthermore, the content of the resin in the composition of the present invention is preferably 99.5 mass % or less, more preferably 99 mass % or less, more preferably 98 mass % or less, and 97 mass % or less with respect to the total solid content of the composition. The following is more preferable, and 95 mass % or less is still more preferable. The composition of this invention may contain only 1 type of specific resin, and may contain 2 or more types. When two or more types are included, it is preferable that the total amount falls within the above-mentioned range.

Moreover, it is preferable that the photosensitive resin composition of this invention contains at least 2 types of resin. Specifically, the photosensitive resin composition of the present invention may contain a total of two or more specific resins and other resins described later, or may contain two or more specific resins, but preferably contains two or more specific resins. When the photosensitive resin composition of the present invention contains two or more kinds of specific resins, for example, a polyimide precursor and a dianhydride-derived structure (R ¹¹⁵ in the above formula (2)) is different. Two or more polyimide precursors are preferred.

＜Other resin＞ The composition of the present invention may contain the above-mentioned specific resin and other resin (hereinafter, also simply referred to as "other resin") different from the specific resin. Examples of other resins include polyamide imide, polyamide imide precursor, phenolic resin, polyamide, epoxy resin, polysiloxane, resin containing a siloxane structure, acrylic resin, etc. . For example, by further adding an acrylic resin, a composition excellent in coatability can be obtained, and an organic film excellent in solvent resistance can be obtained. For example, an acrylic resin having a weight average molecular weight of 20,000 or less and a high polymerizable base value is added to the composition in place of the crosslinking agent (also referred to as a polymerizable compound) described later, or in addition to the polymerizable compound described later. , the coating properties of the composition and the solvent resistance of the organic film can be improved.

When the composition of the present invention contains other resins, the content of the other resins is preferably 0.01% by mass or more, more preferably 0.05% by mass or more, and more preferably 1% by mass or more, relative to the total solid content of the composition. Preferably, 2 mass % or more is further more preferable, 5 mass % or more is still more preferable, and 10 mass % or more is still more preferable. In addition, the content of other resins in the composition of the present invention is preferably 80 mass % or less, more preferably 75 mass % or less, more preferably 70 mass % or less, and 60 mass % or less with respect to the total solid content of the composition. % or less is more preferable, and 50 mass % or less is still more preferable. Moreover, as a preferable aspect of the composition of this invention, the aspect in which content of other resin is low can also be set as an aspect. In the above aspect, the content of other resins is preferably 20 mass % or less, more preferably 15 mass % or less, more preferably 10 mass % or less, and 5 mass % or less, based on the total solid content of the composition. It is more preferable, and 1 mass % or less is even more preferable. The lower limit of the content is not particularly limited, as long as it is 0 mass % or more. The composition of this invention may contain only 1 type of other resin, and may contain 2 or more types. When two or more types are included, it is preferable that the total amount falls within the above-mentioned range.

<Compounds having a group capable of photo-diquantization reaction and an alkoxysilyl group> The photosensitive resin composition of this invention contains the compound B which is a compound which has a group and an alkoxysilyl group which can carry out a photodimerization reaction.

[Groups capable of photobindization] Although it does not specifically limit as a group which can carry out a photo-binary reaction, a group which can carry out a two-dimension reaction by ultraviolet light is preferable. In addition, as a group capable of performing a photo-diquantization reaction, a group having a cinnamonyl structure, a coumarin structure, a naphthalene structure or an anthracene structure is preferable, and a group having a cinnamonyl structure is more preferable.

式（P-1）中，T¹ 及T² 分別獨立地表示氫原子或1價的有機基團，j表示1或2，R¹ 分別獨立地表示1價的有機基團，i表示0以上的整數，i+j為6以下，*表示與其他結構的鍵結部位，j為2的情況下，2個T¹ 分別可以相同亦可以不同，j為2的情況下，2個T² 分別可以相同亦可以不同。 式（P-1）中，T¹ 、T² 及R¹ 的較佳態樣與後述之式（1-1）中之T¹ 、T² 及R¹ 的較佳態樣相同。 式（P-1）中，i表示0以上的整數，0～3的整數為較佳，0～2的整數為更佳，0或1為進一步較佳，0為特佳。 式（P-1）中，j表示1或2，1為較佳。Moreover, as a group which can carry out a photobindization reaction, a group represented by the following formula (P-1) is preferable. [Chemical formula 32]

In formula (P-1), T ¹ and T ² each independently represent a hydrogen atom or a monovalent organic group, j represents 1 or 2, R ¹ each independently represents a monovalent organic group, and i represents 0 or more The integer of , i+j is 6 or less, * represents the bonding site with other structures, when j is 2, the two T ¹ can be the same or different, and when j is 2, the two T ² Can be the same or different. In the formula (P-1), the preferred aspects of T ¹ , T ² and R ¹ are the same as the preferred aspects of T ¹ , T ² and R ¹ in the formula (1-1) described later. In formula (P-1), i represents an integer of 0 or more, an integer of 0 to 3 is preferable, an integer of 0 to 2 is more preferable, 0 or 1 is more preferable, and 0 is particularly preferable. In formula (P-1), j represents 1 or 2, and 1 is preferable.

式（P-2）中，T¹ 及T² 分別獨立地表示氫原子或1價的有機基團，k表示0或1，j表示1或2，R¹ 分別獨立地表示1價的有機基團，i表示0以上的整數，i+j為6以下，*表示與其他結構的鍵結部位，j為2的情況下，2以上的T¹ 分別可以相同亦可以不同，j為2的情況下，2以上的T² 分別可以相同亦可以不同，2個k分別可以相同亦可以不同。 式（P-2）中，T¹ 、T² 、R¹ 、i、j的較佳態樣與上述的式（P-1）中之該等的較佳態樣相同。 式（P-2）中，k為0或1，0為更佳。In addition, as a structure containing a group capable of performing a photo-bindization reaction, it is preferable that the compound B contains a structure represented by the following formula (P-2). [Chemical formula 33]

In formula (P-2), T ¹ and T ² each independently represent a hydrogen atom or a monovalent organic group, k represents 0 or 1, j represents 1 or 2, and R ¹ each independently represents a monovalent organic group group, i represents an integer of 0 or more, i+j is 6 or less, * represents a bonding site with other structures, and when j is 2, T ¹ of 2 or more may be the same or different, and when j is 2 Below, T ² of 2 or more may be the same or different, and two k may be the same or different. In the formula (P-2), preferable aspects of T ¹ , T ² , R ¹ , i, and j are the same as those in the above-mentioned formula (P-1). In formula (P-2), k is 0 or 1, and 0 is more preferable.

[Alkoxysilyl] The above-mentioned alkoxysilyl group may be any of a monoalkoxysilyl group, a dialkoxysilyl group, and a trialkoxysilyl group, but from the viewpoints of patterning properties and adhesiveness between the cured film and the metal , trialkoxysilyl is preferred. As the alkoxy group in the above-mentioned alkoxysilyl group, an alkoxy group having 1 to 4 carbon atoms is preferable, a methoxy group or an ethoxy group is more preferable, and an ethoxy group is further preferable.

式（1-1）中，R¹ 分別獨立地表示1價的有機基團，n表示0～5的整數，T¹ 及T² 分別獨立地表示氫原子或1價的有機基團，X¹ 表示2價的連結基，Z¹ 表示烷氧基矽基。 式（1-2）中，R¹ 分別獨立地表示1價的有機基團，m表示0～4的整數，T³ ～T⁶ 分別獨立地表示氫原子或1價的有機基團，X² 及X³ 分別獨立地表示2價的連結基，Z² 及Z³ 分別獨立地表示烷氧基矽基。[Formula (1-1), Formula (1-2)] The compound B is preferably a compound represented by the following formula (1-1) or the following formula (1-2). Moreover, it is preferable that the compound represented by following formula (1-1) or following formula (1-2) corresponds to the low molecular weight compound B mentioned later. [Chemical formula 34]

In formula (1-1), R ¹ each independently represents a monovalent organic group, n represents an integer of 0 to 5, T ¹ and T ² each independently represent a hydrogen atom or a monovalent organic group, and X ¹ represents a divalent linking group, and Z ¹ represents an alkoxysilyl group. In formula (1-2), R ¹ each independently represents a monovalent organic group, m represents an integer of 0 to 4, T ³ to T ⁶ each independently represent a hydrogen atom or a monovalent organic group, and X ² and X ³ each independently represent a divalent linking group, and Z ² and Z ³ each independently represent an alkoxysilyl group.

式（X-1）中，L^X1 表示單鍵或2價的連結基，A^X 表示-O-或-NR^N -，L^X2 表示2價的連結基，*表示與式（1-1）中的鍵結有T¹ 之碳原子的鍵結部位，＃表示式（1-1）中的與Z¹ 的鍵結部位。 上述R^N 如上所述。 式（X-1）中，L^X1 係單鍵或烴基為較佳，單鍵或可以被取代之伸乙基為更佳，單鍵或未經取代之伸乙基為進一步較佳。 作為上述伸乙基中的取代基，可以舉出氰基、鹵素原子等。 式（X-1）中，A^X 係-NR^N -為較佳，-NH-為更佳。 式（X-1）中，L^X2 係烴基或由烴基和選自包括-O-、-S-、-C（=O）-、-S（=O）₂ -及-NR^N -之群組中之至少1個基團的鍵結表示之基團為較佳，烴基為更佳，伸烷基為進一步較佳。作為上述烴基或伸烷基的碳數，2～20為較佳，2～10為更佳，3～6為進一步較佳。 式（1-1）中，Z¹ 的較佳態樣與上述的化合物B中之烷氧基矽基的較佳態樣相同。In formula (1-1), R ¹ each independently represents a hydrogen atom or a monovalent organic group, preferably a hydrogen atom. When R ¹ represents a monovalent organic group, a hydrocarbon group is preferable, and an alkyl group having 1 to 12 carbon atoms, a phenyl group, or a biphenyl group is more preferable. The above-mentioned hydrocarbon groups may be substituted with known substituents. As a substituent, a halogen atom, a cyano group, etc. are mentioned. In formula (1-1), n represents an integer of 0 to 5, preferably an integer of 0 to 3, more preferably 0 or 1, and particularly preferably 0. In addition, when n is 1, it is preferable that R ¹ exists in the para position with respect to the carbon atom to which T ¹ is bonded. In formula (1-1), T ¹ and T ² each independently represent a hydrogen atom or a monovalent organic group, preferably a hydrogen atom, a cyano group or a halogen atom, and more preferably a hydrogen atom. In addition, an aspect in which both T ¹ and T ² are hydrogen atoms, or an aspect in which T ¹ is a hydrogen atom and T ² is a cyano group or a halogen atom is also one of the preferred aspects. In formula (1-1), X ¹ represents a divalent linking group, a hydrocarbon group or a hydrocarbon group and is selected from the group consisting of -O-, -S-, -C(=O)-, -S(=O) ₂ - and The group represented by the bond of at least one group in the group of -NR ^N- is preferred. The above R ^N represents a hydrogen atom or a hydrocarbon group, more preferably a hydrogen atom, an alkyl group or an aryl group, more preferably a hydrogen atom or an alkyl group, and particularly preferably a hydrogen atom. In addition, the aspect in which X ¹ is a group represented by the following formula (X-1) is also one of the preferred aspects. [Chemical formula 35]

In the formula (X-1), L ^X1 represents a single bond or a divalent linking group, A ^X represents -O- or -NR ^N -, L ^X2 represents a divalent linking group, and * represents the same as the formula (1-1) In the bond, there is the bond site of the carbon atom of T ¹ , and # represents the bond site with Z ¹ in the formula (1-1). The above R ^N is as described above. In the formula (X-1), L ^X1 is preferably a single bond or a hydrocarbon group, a single bond or a substituted ethylidene group is more preferred, and a single bond or an unsubstituted ethylidene group is still more preferred. As a substituent in the said ethyl extension, a cyano group, a halogen atom, etc. are mentioned. In the formula (X-1), A ^X is preferably -NR ^N -, and more preferably -NH-. In formula (X-1), L ^X2 is a hydrocarbon group or a hydrocarbon group and is selected from the group consisting of -O-, -S-, -C(=O)-, -S(=O) ₂ - and -NR ^N - The group represented by the bond of at least one group in the group is preferred, the hydrocarbon group is more preferred, and the alkylene group is further preferred. As carbon number of the said hydrocarbon group or alkylene group, 2-20 are preferable, 2-10 are more preferable, and 3-6 are still more preferable. In the formula (1-1), the preferred aspect of Z ¹ is the same as the preferred aspect of the alkoxysilyl group in the compound B described above.

In the formula (1-2), the preferred aspect of R ¹ is the same as the preferred aspect of the formula (1-1). In formula (1-2), T ³ to T ⁶ each independently represent a hydrogen atom or a monovalent organic group, preferably a hydrogen atom, a cyano group or a halogen atom, and more preferably a hydrogen atom. Moreover, the aspect in which both T ¹ and T ² are hydrogen atoms, or the aspect in which T ⁴ and T ⁵ are hydrogen atoms, and the aspect in which T ³ and T ⁶ are cyano groups or halogen atoms is also one of the preferred aspects. In formula (1-2), X ² and X ³ each independently represent a divalent linking group, which is a hydrocarbon group or a hydrocarbon group and is selected from the group consisting of -O-, -S-, -C(=O)-, -S The group represented by the bond of at least one group in the group of (=O) ₂ - and -NR ^N - is preferable. The above R ^N is as described above. In the formula (1-2), an aspect in which one or both of X ² and X ³ is a group represented by the above-mentioned formula (X-1) is also a preferred aspect. However, when X ² is a group represented by the above-mentioned formula (X-1), * in the formula (X-1) represents a carbon atom bonded with T ³ in the formula (1-2) The bonding site of , # represents the bonding site with Z ² in formula (1-2). In addition, when X ³ is a group represented by the above-mentioned formula (X-1), * in the formula (X-1) represents a carbon atom bonded to T ⁶ in the formula (1-2) The bonding site of , # represents the bonding site with Z ³ in formula (1-2). In the formula (1-2), the preferred aspects of Z ² and Z ³ are respectively the same as the preferred aspects of the alkoxysilyl group in the compound B described above.

[azolyl] Moreover, it is also preferable that the compound B contains an azole group. From the above-mentioned aspect, it is thought that the adhesiveness of a cured film and a metal improves further by metal coordination, such as an azole group and copper. As the azole group in compound B, as long as it is a hetero 5-membered ring compound containing one or more nitrogen atoms as ring members, and has one or more hydrogen removed from the hetero 5-membered ring compound which may have a substituent or a condensed ring structure The group of the atomic structure can be a hetero 5-membered ring compound containing only one or more nitrogen atoms and one or more carbon atoms as ring members, and it is a hetero 5-membered ring compound that may have substituents. A group with a structure in which one or more hydrogen atoms are removed is preferred. From the viewpoint of the adhesiveness between the cured film and the metal, the azole group includes a pyrrole ring, a pyrazole ring, an indazole ring, an imidazole ring, a benzimidazole ring, a 1,2,3-triazole ring, a 1,2,3-triazole ring, a , 2,4-triazole ring, benzotriazole ring or tetrazole ring with a structure in which more than one hydrogen atom is removed is preferred, and has a structure from imidazole ring, benzimidazole ring, 1,2,4- A group with a structure in which one or more hydrogen atoms are removed from the triazole ring or the benzotriazole ring is more preferable.

式（B-1）中，R^B1 表示與其他結構的鍵結部位、氫原子或1價的有機基團，Z^B1 ～Z^B4 分別獨立地表示=CR^B7 -或氮原子，R^B7 表示與其他結構的鍵結部位、氫原子或1價的有機基團，式（B-1）中所包含之R^B1 及R^B7 中至少1個表示與其他結構的鍵結部位； 式（B-2）中，R^B2 ～R^B6 分別獨立地表示與其他結構的鍵結部位、氫原子或1價的有機基團，Z^B5 及Z^B6 分別獨立地表示=CR^B8 -或氮原子，R^B8 表示與其他結構的鍵結部位、氫原子或1價的有機基團，式（B-2）中所包含之R^B2 ～R^B6 及R^B8 中至少1個表示與其他結構的鍵結部位。Moreover, it is preferable that the azole group in compound B is a group represented by following formula (B-1) or following formula (B-2). [Chemical formula 36]

In formula (B-1), R ^B1 represents a bonding site with other structures, a hydrogen atom or a monovalent organic group, Z ^B1 to Z ^B4 independently represent =CR ^B7 - or a nitrogen atom, and R ^B7 represents a Bonding sites of other structures, hydrogen atoms or monovalent organic groups, at least one of R ^B1 and R ^B7 included in formula (B-1) represents a bonding site with other structures; formula (B-2 ), R ^B2 to R ^B6 each independently represent a bonding site with other structures, a hydrogen atom or a monovalent organic group, Z ^B5 and Z ^B6 each independently represent =CR ^B8 - or a nitrogen atom, and R ^B8 represents At least one of R ^B2 to R ^B6 and R ^B8 contained in formula (B-2) represents a bonding site to another structure, a hydrogen atom or a monovalent organic group with other structures.

In formula (B-1), R ^B1 represents a bonding site with other structures, a hydrogen atom or a monovalent organic group, and a bonding site with other structures is more preferable. The monovalent organic group in R ^B1 is not particularly limited, and known organic groups can be used as long as the effects of the present invention can be obtained, but hydrocarbon groups or amino groups are preferred, and alkyl groups or amino groups are preferred. for better. The number of carbon atoms in the hydrocarbon group or the alkyl group is not particularly limited, but 1 to 10 are preferable, and 1 to 4 are more preferable. The above-mentioned amino group may be a substituted amino group or an unsubstituted amino group.

In formula (B-1), Z ^B1 to Z ^B4 each independently represent =CR ^B7 - or a nitrogen atom. Among them, two of Z ^B1 to Z ^B4 are nitrogen atoms and two are =CR ^B7 -, and one of Z ^B1 to Z ^B4 is a nitrogen atom and three are =CR ^B7 -, or Z The aspect in which three of ^B1 to Z ^B4 are nitrogen atoms and one is =CR ^B7 - is preferable. Also, among these, Z ^B1 and Z ^B3 are nitrogen atoms and Z ^B2 and Z ^B4 are =CR ^B7 -, Z ^B1 and Z ^B2 are nitrogen atoms, and Z ^B3 and Z ^B4 are =CR ^B7 - A form in which Z ^B2 is a nitrogen atom and Z ^B1 , Z ^B3 and Z ^B4 are a form of =CR ^B7 -, or a form in which Z ^B1 , Z ^B2 and Z ^B3 are a nitrogen atom and Z ^B4 is =CR ^B7 - More preferably, Z ^B1 and Z ^B3 are nitrogen atoms and Z ^B2 and Z ^B4 are =CR ^B7 -. The aforementioned R ^B7 is preferably a hydrogen atom or a monovalent organic group. In addition, when Z ^B1 , Z ^B2 and Z ^B3 are nitrogen atoms and Z ^B4 is =CR ^B7 -, the bonding site between R ^B7 and other structures is preferable. The preferable aspect of the monovalent organic group in R ^B7 is the same as the preferable aspect of the monovalent organic group in R ^B1 described above.

At least one of R ^B1 and R ^B7 included in the formula (B-1) represents a bonding site with other structures, and at least R ^B1 preferably represents a bonding site with other structures. In addition, in formula (B-1), only R ^B1 represents a bonding site with other structures, and R ^B7 independently represents a hydrogen atom or a monovalent organic group, which is also a preferred aspect of the present invention. one.

In formula (B-2), Z ^B5 and Z ^B6 each independently represent =CR ^B8 - or a nitrogen atom. Among them, the aspect in which both Z ^B5 and Z ^B6 represent a nitrogen atom, or the aspect in which Z ^B5 represents a nitrogen atom and Z ^B6 represents =CR ^B8 - is preferable. In formula (B-2), when both Z ^B5 and Z ^B6 represent a nitrogen atom, it is preferable that R ^B6 represents a bonding site with another structure. Moreover, in formula (B-2), Z ^B5 and Z ^B6 both represent nitrogen atoms, and the aspect in which only R ^B6 represents a bonding site with other structures is also one of the preferred aspects of the present invention. In formula (B-2), when Z ^B5 represents a nitrogen atom and Z ^B6 represents =CR ^B8 -, it is preferable that R ^B8 represents a bonding site with another structure. Moreover, in formula (B-2), Z ^B5 represents a nitrogen atom, Z ^B6 represents =CR ^B8 -, and the aspect in which only R ^B8 represents a bonding site with other structures is also a preferred aspect of the present invention. one.

In formula (B-2), it is preferable that R ^B2 to R ^B5 each independently represent a hydrogen atom or a monovalent organic group. The preferable aspect of the monovalent organic group in R ^B2 to R ^B5 is the same as the preferable aspect of the monovalent organic group in R ^B1 described above. In formula (B-2), when Z ^B5 represents a nitrogen atom and Z ^B6 represents =CR ^B8 -, R ^B6 preferably represents a hydrogen atom or a monovalent organic group. The preferable aspect of the monovalent organic group in R ^B6 is the same as the preferable aspect of the monovalent organic group in R ^B1 mentioned above. In other cases, it is preferred that R ^B6 represents a bonding site with other structures. In particular, when Z ^B5 represents a nitrogen atom and Z ^B6 represents =CR ^B8 -, it is preferable that R ^B8 represents a bonding site with another structure. In formula (B-2), it is preferable that R ^B8 represents a bonding site with another structure. When both Z ^B5 and Z ^B6 represent =CR ^B8 -, one of R ^B8 represents a bonding site with another structure, and the other represents a hydrogen atom or a monovalent organic group. The preferable aspect of the monovalent organic group in R ^B8 is the same as the preferable aspect of the monovalent organic group in the above-mentioned R ^B1 .

At least one of R ^B2 to R ^B6 and R ^B8 contained in formula (B-2) represents a bonding site with other structures, and at least R ^B6 or R ^B8 preferably represents a bonding site with other structures. Moreover, in formula (B-2), only one of R ^B6 and R ^B8 represents a bonding site with another structure, and the other of R ^B6 and R ^B8 and R ^B2 to R ^B5 each independently represent a hydrogen atom or The aspect of the monovalent organic group is also one of the preferred aspects of the present invention.

Among these, the azole group is preferably a group represented by any one of the following formulae (B-3) to (B-6). [Chemical formula 37]

In formula (B-3) to formula (B-6), R ^B9 to R ^B20 each independently represent a hydrogen atom or a monovalent organic group, and * represents a bonding site with another structure. Among the formulae (B-3) to (B-6), R ^B9 to R ^B20 are preferably a hydrocarbon group, an amino group or a nitro group. In the formulae (B-3) to (B-6), the preferred aspects of the hydrocarbon group in R ^B9 to R ^B20 are the same as the preferred aspects of the hydrocarbon group in the above-mentioned R ^B1 . In addition, the amino group in R ^B9 to R ^B20 may be a substituted amino group or an unsubstituted amino group.

The compound B may be a compound having a molecular weight of less than 2,000 (hereinafter, also referred to as "low molecular weight compound B"), or may be a resin (hereinafter, also referred to as "resin B"). Moreover, from the viewpoint of the adhesiveness of a cured film and a metal, it is also preferable that the photosensitive resin composition contains both the low molecular weight compound B and the resin B. From the viewpoint of adhesiveness, the compound B-based resin is preferable.

[Low molecular compound B] The molecular weight of the low molecular weight compound B is less than 2,000, preferably 1,500 or less, and more preferably 1,000 or less.

In the low molecular compound B, the number of the groups capable of performing the photo-dimerization reaction is preferably 1 to 4, more preferably 1 or 2, and particularly preferably 1. The number of alkoxysilyl groups in the low molecular compound B is preferably 1 to 4, more preferably 1 or 2, and particularly preferably 1.

The low molecular weight compound B is preferably a compound represented by the above-mentioned formula (1-1) or formula (1-2).

[Resin B] The weight average molecular weight of the resin B is preferably 2,000 to 100,000, more preferably 3,000 to 70,000, and even more preferably 5,000 to 50,000.

In 1 g of resin B, the molar amount of the group capable of performing the photo-diquantization reaction is preferably 0.001-1 mmol/g, more preferably 0.002-0.3 mmol/g, and even more preferably 0.005-0.1 mmol/g.

The molar amount of the alkoxysilyl group in 1 g of resin B is preferably 0.001-1 mmol/g, more preferably 0.002-0.3 mmol/g, and even more preferably 0.005-0.1 mmol/g.

Resin B is a resin having a repeating unit including a group capable of photo-dimerization reaction and a repeating unit including an alkoxysilyl group, or has a repeating unit including a group capable of photo-dimerization reaction and an alkoxysilyl group The resin is preferred, and the resin having repeating units including a group capable of performing photodimerization reaction and repeating unit including an alkoxysilyl group is more preferred.

式（BL-1）中，L^L1 表示單鍵或2價的連結基，X^L1 表示能夠進行光二量化反應之基團，R表示氫原子或甲基。 式（BL-1）中，L^L1 表示單鍵或2價的連結基，2價的連結基為較佳。 作為上述2價的連結基，烴基或由烴基和選自包括-O-、-S-、-C（=O）-、-S（=O）₂ -及-NR^N -之群組中之至少1個基團的鍵結表示之基團為較佳，烴基為更佳。 上述R^N 如上所述。 作為上述烴基，飽和脂肪族烴基為較佳，伸烷基為更佳。 上述烴基或伸烷基的碳數係2～20為較佳，2～10為更佳。 在該等之中，L^L1 係下述式（BL-1-1）所表示之基為較佳。 [化學式39]

式（BL-1-1）中，L^L4 表示2價的連結基，L^L5 表示單鍵或2價的連結基，*表示與式（BL-1）中的羰基的鍵結部位，A^L1 及A^L2 表示-O-或-NR^N -，＃表示與（BL-1）中的X^L1 的鍵結部位。 R^N 如上所述。-Repeating Unit Containing a Group Capable of Photobinary Reaction- Resin B preferably contains a repeating unit represented by the following formula (BL-1) as a repeating unit containing a group capable of photobindization reaction. [Chemical formula 38]

In the formula (BL-1), L ^L1 represents a single bond or a divalent linking group, X ^L1 represents a group capable of performing a photodimerization reaction, and R represents a hydrogen atom or a methyl group. In formula (BL-1), L ^L1 represents a single bond or a divalent linking group, and a divalent linking group is preferable. As the above-mentioned divalent linking group, a hydrocarbon group or a hydrocarbon group selected from the group consisting of -O-, -S-, -C(=O)-, -S(=O) ₂ - and -NR ^N - A group represented by a bond of at least one group is preferable, and a hydrocarbon group is more preferable. The above R ^N is as described above. As the above-mentioned hydrocarbon group, a saturated aliphatic hydrocarbon group is preferable, and an alkylene group is more preferable. The carbon number of the hydrocarbon group or alkylene group is preferably 2 to 20, more preferably 2 to 10. Among these, it is preferable that L ^L1 is a group represented by the following formula (BL-1-1). [Chemical formula 39]

In formula (BL-1-1), L ^L4 represents a divalent linking group, L ^L5 represents a single bond or a divalent linking group, * represents a bonding site with a carbonyl group in formula (BL-1), A ^L1 And A ^L2 represents -O- or -NR ^N- , # represents the bonding site with ^XL1 in (BL-1). R ^N is as described above.

In formula (BL-1-1), L ^L4 is a hydrocarbon group or a hydrocarbon group and is selected from the group consisting of -O-, -S-, -C(=O)-, -S(=O) ₂ - and -NR ^N - The group represented by the bond of at least one group in the group is preferred, and the hydrocarbon group is more preferred. The above R ^N is as described above. As the above-mentioned hydrocarbon group, a saturated aliphatic hydrocarbon group is preferable, and an alkylene group is more preferable. The carbon number of the hydrocarbon group or alkylene group is preferably 2 to 20, more preferably 2 to 10.

In formula (BL-1-1), L ^L5 series single bond is preferable. The preferred aspect when L ^L5 is a divalent linking group is the same as the preferred aspect of L ^L4 described above.

In formula (BL-1-1), A ^L1 and A ^L2 represent -O- or -NR ^N -, and -O- is preferable.

In the formula (BL-1), the preferred aspect of X ^L1 is the same as the preferred aspect of the group capable of performing the photo-diquantization reaction in the above-mentioned compound B.

式（BA-2）中，A³ 表示-O-或-NR^N -，L^P1 表示2價的連結基，X^P1 表示烷氧基矽基，R表示氫原子或甲基。- Repeating Unit Containing an Alkoxysilyl Group- Resin B preferably contains a repeating unit represented by the following formula (BA-2) as a repeating unit containing an alkoxysilyl group. [Chemical formula 40]

In formula (BA-2), A ³ represents -O- or -NR ^N -, L ^P1 represents a divalent linking group, X ^P1 represents an alkoxysilyl group, and R represents a hydrogen atom or a methyl group.

In formula (BA-2), A ³ represents -O- or -NR ^N -, and -O- is preferred. R ^N is as described above.

In formula (BA-2), L ^P1 represents a divalent linking group, which is a hydrocarbon group or a hydrocarbon group and is selected from the group consisting of -O-, -S-, -C(=O)-, -S(=O) ₂ - The group represented by the bond of at least one group in the group of -NR ^N - is preferable, and the hydrocarbon group is more preferable. The above R ^N is as described above. As the above-mentioned hydrocarbon group, a saturated aliphatic hydrocarbon group is preferable, and an alkylene group is more preferable. The carbon number of the hydrocarbon group or alkylene group is preferably 2 to 20, more preferably 2 to 10.

In formula (BA-2), the preferred aspect of X ^P1 is the same as the preferred aspect of the alkoxysilyl group in compound B described above.

式（BA-1）中，L³ 表示單鍵或2價的連結基，X³ 表示唑基，R表示氫原子或甲基。 式（BA-1）中，L³ 表示單鍵或2價的連結基。 作為上述2價的連結基，烴基或由烴基和選自包括-O-、-S-、-C（=O）-、-S（=O）₂ -及-NR^N -之群組中之至少1個基團的鍵結表示之基團為較佳，烴基為更佳。 上述R^N 如上所述。 作為上述烴基，飽和脂肪族烴基為較佳，伸烷基為更佳。 上述烴基或伸烷基的碳數係2～20為較佳，2～10為更佳。 在該等之中，L³ 係單鍵、下述式（BA-1-1）所表示之基團或下述式（BA-1-2）所表示之基團為較佳。 [化學式42]

式（BA-1-1）或式（BA-1-2）中，L⁴ 表示2價的連結基，L⁵ 表示單鍵或2價的連結基，L⁶ 表示2價的連結基，L⁷ 表示單鍵或2價的連結基，*表示式（BA-1）中的與羰基的鍵結部位，A¹ 及A² 表示-O-或-NR^N -，＃表示（BA-1）中的與X³ 的鍵結部位。- Repeating unit containing an azole group- Resin B preferably contains a repeating unit represented by the following formula (BA-1) as a repeating unit containing an azole group. [Chemical formula 41]

In formula (BA-1), L ³ represents a single bond or a divalent linking group, X ³ represents an azole group, and R represents a hydrogen atom or a methyl group. In formula (BA-1), L ³ represents a single bond or a divalent linking group. As the above-mentioned divalent linking group, a hydrocarbon group or a hydrocarbon group selected from the group consisting of -O-, -S-, -C(=O)-, -S(=O) ₂ - and -NR ^N - A group represented by a bond of at least one group is preferable, and a hydrocarbon group is more preferable. The above R ^N is as described above. As the above-mentioned hydrocarbon group, a saturated aliphatic hydrocarbon group is preferable, and an alkylene group is more preferable. The carbon number of the hydrocarbon group or alkylene group is preferably 2 to 20, more preferably 2 to 10. Among these, L ³ is preferably a single bond, a group represented by the following formula (BA-1-1), or a group represented by the following formula (BA-1-2). [Chemical formula 42]

In formula (BA-1-1) or formula (BA-1-2), L ⁴ represents a divalent linking group, L ⁵ represents a single bond or a divalent linking group, L ⁶ represents a divalent linking group, L ⁷ represents a single bond or a divalent linking group, * represents a bonding site with a carbonyl group in the formula (BA-1), A ¹ and A ² represent -O- or -NR ^N -, and # represents (BA-1) The bonding site with X ³ in .

In formula (BA-1-1), L ⁴ is a hydrocarbon group or a hydrocarbon group and is selected from the group consisting of -O-, -S-, -C(=O)-, -S(=O) ₂ - and -NR ^N - The group represented by the bond of at least one group in the group is preferred, and the hydrocarbon group is more preferred. The above R ^N is as described above. As the above-mentioned hydrocarbon group, a saturated aliphatic hydrocarbon group is preferable, and an alkylene group is more preferable. The carbon number of the hydrocarbon group or alkylene group is preferably 2 to 20, more preferably 2 to 10.

In formula (BA-1-1), L ⁵ series single bond is preferable. When L ⁵ is a divalent linking group, L ⁵ is a hydrocarbon group or a hydrocarbon group selected from the group consisting of -O-, -S-, -C(=O)-, -S(=O) ₂ - and - The group represented by the bond of at least one group in the group of NR ^N - is preferable, and the hydrocarbon group is more preferable.

In the formula (BA-1-2), L ⁶ has the same meaning as L ⁴ in the formula (BA-1-1), and the preferred aspects are also the same.

In the formula (BA-1-2), the L ⁷ -series divalent linking group is preferable. When L ⁷ is a divalent linking group, the preferable aspect of L ⁷ is the same as the preferable aspect when L ⁵ in the above-mentioned formula (BA-1-1) is a divalent linking group.

In formula (BA-1-1) or formula (BA-1-2), A ¹ and A ² represent -O- or -NR ^N -, and -O- is preferred. R ^N is as described above.

In formula (BA-1), the preferable aspect of the azole group in X ³ is as described above. The bonding site with other structures in the above-mentioned azole group corresponds to the bonding site with L ³ in the formula (BA-1).

Resin B may contain only one type of repeating unit represented by formula (BA-1), or may contain two or more types of repeating units represented by formula (BA-1). When the resin B is a repeating unit containing an azole group, the molar content of the azole group in 1 g of the resin B is preferably 0.001-5 mmol/g, more preferably 0.01-1 mmol/g.

-Other repeating units- Moreover, resin B may have another repeating unit different from the repeating unit represented by the above-mentioned formula (BL-1), formula (BA-2) or formula (BA-1).

[Specific example] As a specific example of compound B, the compound used in an Example can be mentioned, but it is not limited to this.

〔content〕 The content of Compound B is preferably 0.05 to 10% by mass, more preferably 0.10 to 5% by mass, and even more preferably 0.15 to 2% by mass relative to the total solid content of the photosensitive resin composition of the present invention. The photosensitive resin composition of this invention may contain only 1 type, and may contain 2 or more types of compound B. When two or more types of compound B are contained, it is preferable that the total amount is within the above-mentioned range.

<A compound having an azole group without at least one of a group capable of photo-diquantization reaction and an alkoxysilyl group> From the viewpoint of the adhesiveness of the obtained cured film and metal, the photosensitive resin composition of the present invention contains at least one of a group capable of undergoing a photodimerization reaction and an alkoxysilyl group, and has an azole Compound C of the base compound is preferred. The photosensitive resin composition of the present invention preferably contains a compound (hereinafter, also referred to as "compound C1") having an azole group without any of a group capable of performing a photodimerization reaction and an alkoxysilyl group. Moreover, it is preferable that the photosensitive resin composition of this invention contains the compound (henceforth "compound C2" is also called.) which does not have an alkoxysilyl group, but has a group which can perform a photo-diquantization reaction and an azole group. In addition, the aspect including both the compound C1 and the compound C2 is also one of the preferred aspects of the present invention. Moreover, the photosensitive resin composition of this invention may contain the compound which has an alkoxysilyl group and an azole group without having the group which can carry out a photodimerization reaction.

The preferred embodiments of the group capable of undergoing photo-diquantization reaction, alkoxysilyl group and azole group in compound C, and each group in the compound having the group capable of undergoing the above-mentioned photo-dimerization reaction and alkoxysilyl group The best form of the group is the same.

式（C-1）中，Z¹ ～Z⁴ 分別獨立地表示=CR⁷ -或氮原子，R¹ 表示氫原子或1價的有機基團，R⁷ 表示氫原子或1價的有機基團，在式（C-1）所表示之結構中不包含能夠進行光二量化反應之基團及烷氧基矽基； 式（C-2）中，Z⁵ ～Z⁶ 分別獨立地表示=CR⁸ -或氮原子，R² ～R⁶ 分別獨立地表示氫原子或1價的有機基團，R⁸ 表示氫原子或1價的有機基團，在式（C-2）所表示之結構中不包含能夠進行光二量化反應之基團及烷氧基矽基。[Compound C1] The compound C1 is preferably a compound represented by the following formula (C-1) or the following formula (C-2). [Chemical formula 43]

In formula (C-1), Z ¹ to Z ⁴ each independently represent =CR ⁷ - or a nitrogen atom, R ¹ represents a hydrogen atom or a monovalent organic group, and R ⁷ represents a hydrogen atom or a monovalent organic group , the structure represented by the formula (C-1) does not contain a group capable of performing a photodimerization reaction and an alkoxysilyl group; in the formula (C-2), Z ⁵ to Z ⁶ independently represent =CR ⁸ -or a nitrogen atom, R ² to R ⁶ independently represent a hydrogen atom or a monovalent organic group, R ⁸ represents a hydrogen atom or a monovalent organic group, and not in the structure represented by formula (C-2) It contains a group capable of photodiquantization reaction and an alkoxysilyl group.

In formula (C-1), Z ¹ to Z ⁴ each independently represent =CR ⁷ - or a nitrogen atom. Among them, one of Z ¹ to Z ⁴ is a nitrogen atom and three of them are =CR ⁷ -, and two of Z ¹ to Z ⁴ are nitrogen atoms and two of them are =CR ⁷ -, or Z The aspect in which three of ¹ to Z ⁴ are nitrogen atoms and one is =CR ⁷ - is preferable. Furthermore, among these, Z ¹ and Z ³ are nitrogen atoms and Z ² and Z ⁴ are =CR ⁷ -, Z ¹ and Z ² are nitrogen atoms, and Z ³ and Z ⁴ are =CR ⁷ - or Z ¹ , Z ² and Z ³ are nitrogen atoms and Z ⁴ is =CR ⁷ - is preferred, Z ¹ and Z ³ are nitrogen atoms and Z ² and Z ⁴ are =CR ^B7 - The aspect, or the aspect in which Z ¹ , Z ² and Z ³ are nitrogen atoms and Z ⁴ is =CR ⁷ - is more preferable.

In formula (C-1), R ¹ is preferably a hydrogen atom or a hydrocarbon group, more preferably a hydrogen atom or an alkyl group, and particularly preferably a hydrogen atom. The carbon number of the hydrocarbon group or the alkyl group is preferably 1 to 20, more preferably 1 to 10, and even more preferably 1 to 4.

In formula (C-1), the preferable aspect of R ⁷ is the same as that of R ¹ .

In formula (C-2), Z ⁵ and Z ⁶ each independently represent =CR ⁸ - or a nitrogen atom. Among them, the aspect in which both Z ⁵ and Z ⁶ represent a nitrogen atom, or the aspect in which Z ⁵ represents a nitrogen atom and Z ⁶ represents =CR ⁸ - is preferable.

In formula (C-2), R ² to R ⁶ and R ⁸ are each independently preferably a hydrogen atom or a hydrocarbon group, more preferably a hydrogen atom or an alkyl group, and particularly preferably a hydrogen atom.

式（DA-1）中，X^D1 表示能夠進行光二量化反應之基團，X^D2 表示唑基，n表示1以上的整數，m表示1以上的整數，L^D 表示n+m價的有機基團。 式（DA-1）中，X^D1 中之能夠進行光二量化反應之基團的較佳態樣與具有能夠進行上述光二量化反應之基團及烷氧基矽基之化合物中之能夠進行光二量化反應之基團的較佳態樣相同。尤其，L^D 係式（P-1）所表示之基為較佳。 式（DA-1）中，X^D2 中之唑基的較佳態樣與具有能夠進行上述光二量化反應之基團及烷氧基矽基之化合物中之唑基的較佳態樣相同。 式（DA-1）中，n係1～4的整數為較佳，1或2為更佳，1為進一步較佳。 式（DA-1）中，m係1～4的整數為較佳，1或2為更佳，1為進一步較佳。 式（DA-1）中，L^D 係烴基或由烴基和選自包括-O-、-S-、-C（=O）-、-S（=O）₂ -及-NR^N -之群組中之至少1個基團的鍵結表示之基團為較佳。 上述R^N 如上所述。 作為上述烴基，飽和脂肪族烴基為較佳，伸烷基為更佳。 上述烴基或伸烷基的碳數係1～20為較佳，1～10為更佳。[Compound C2] It is preferable that the photosensitive resin composition of the present invention contains a compound (compound C2) which does not have an alkoxysilyl group but has a group capable of performing a photo-diquantization reaction and an azole group. Compound C2 is preferably a compound represented by the following formula (DA-1). [Chemical formula 44]

In the formula (DA-1), X ^D1 represents a group capable of photo-bindization reaction, X ^D2 represents an azole group, n represents an integer of 1 or more, m represents an integer of 1 or more, and L ^D represents an organic group of n+m valence group. In the formula (DA-1), the preferred aspect of the group capable of performing the photo-diquantization reaction in X ^D1 and the compound having the group capable of performing the above-mentioned photo-dimerization reaction and the alkoxysilyl group are capable of performing the photo-dimerization reaction. Preferred aspects of the groups to be reacted are the same. In particular, the group represented by the L ^D system formula (P-1) is preferable. In the formula (DA-1), the preferred aspect of the azole group in X ^D2 is the same as the preferred aspect of the azole group in the compound having a group capable of performing the above-mentioned photo-diquantization reaction and an alkoxysilyl group. In formula (DA-1), n is preferably an integer of 1 to 4, more preferably 1 or 2, and even more preferably 1. In formula (DA-1), m is preferably an integer of 1 to 4, more preferably 1 or 2, and even more preferably 1. In formula (DA-1), L ^D is a hydrocarbon group or a hydrocarbon group and is selected from the group consisting of -O-, -S-, -C(=O)-, -S(=O) ₂ - and -NR ^N - The group represented by the bond of at least one group in the group is preferred. The above R ^N is as described above. As the above-mentioned hydrocarbon group, a saturated aliphatic hydrocarbon group is preferable, and an alkylene group is more preferable. The carbon number of the hydrocarbon group or alkylene group is preferably 1-20, more preferably 1-10.

式（DA-2）中，X^D1 表示能夠進行光二量化反應之基團，X^D2 表示唑基，L^D1 表示單鍵或2價的連結基，L^D2 表示單鍵或2價的連結基。 式（DA-2）中，X^D1 及X^D2 的較佳態樣與式（DA-1）中的X^D1 及X^D2 的較佳態樣相同。 式（DA-2）中，L^D1 係單鍵或烴基為較佳，單鍵或可以被取代之伸乙基為更佳，單鍵或未經取代之伸乙基為進一步較佳，單鍵為特佳。 作為上述伸乙基中的取代基，可以舉出氰基、鹵素原子等。 式（DA-2）中，L^D2 係單鍵或下述式（LD2）所表示之基團為較佳。 [化學式46]

式（LD2）中，A^D 為-O-或-NR^N -，-NR^N -為較佳。 上述R^N 如上所述。 式（LD2）中，L^D3 為2價的連結基，烴基為較佳，烷基為更佳。上述烴基或伸烷基的碳數係1～10為較佳，1～4為更佳。 式（LD2）中，*表示與式（DA-2）中的羰基的鍵結部位，＃表示與式（DA-2）中的X^D2 的鍵結部位。The compound represented by the formula (DA-1) is preferably a compound represented by the following formula (DA-2). [Chemical formula 45]

In the formula (DA-2), X ^D1 represents a group capable of performing a photodimerization reaction, X ^D2 represents an azole group, L ^D1 represents a single bond or a divalent linking group, and L ^D2 represents a single bond or a divalent linking group. In the formula (DA-2), the preferred aspects of X ^D1 and X ^D2 are the same as the preferred aspects of X ^D1 and X ^D2 in the formula (DA-1). In formula (DA-2), L ^D1 is preferably a single bond or a hydrocarbon group, a single bond or a substituted ethylidene group is more preferred, a single bond or an unsubstituted ethylidene group is further preferred, and a single bond Excellent. As a substituent in the said ethyl extension, a cyano group, a halogen atom, etc. are mentioned. In the formula (DA-2), L ^D2 is preferably a single bond or a group represented by the following formula (LD2). [Chemical formula 46]

In formula (LD2), ^AD is -O- or -NR ^N -, and -NR ^N - is preferably. The above R ^N is as described above. In the formula (LD2), L ^D3 is a divalent linking group, preferably a hydrocarbon group, and more preferably an alkyl group. The carbon number of the hydrocarbon group or alkylene group is preferably 1-10, more preferably 1-4. In the formula (LD2), * represents the bonding site with the carbonyl group in the formula (DA-2), and # represents the bonding site with X ^D2 in the formula (DA-2).

[resin] Compound C may be a compound having a molecular weight of less than 2,000 (hereinafter, also referred to as "low molecular weight compound C".), or may be a resin (hereinafter, also referred to as "resin C"). Moreover, it is also preferable that the photosensitive resin composition contains both low molecular weight compound C and resin C from a viewpoint of the adhesiveness of a cured film and a metal. From the viewpoint of adhesiveness, the compound C-based resin is preferable. In addition, the above-mentioned compound C1 is preferably a compound corresponding to the low-molecular-weight compound C. The above-mentioned compound C2-based resin is preferable. In addition, as the compound C2, an aspect including the compound C2 corresponding to the low molecular weight compound C and the compound C2 corresponding to the resin C is also one of the preferred aspects of the present invention.

[Low molecular compound C] The molecular weight of the low molecular weight compound C is less than 2,000, preferably 1,500 or less, and more preferably 1,000 or less.

The number of azole groups in the low molecular compound C is preferably 1 to 4, more preferably 1 or 2, and particularly preferably 1. When the low-molecular compound C contains a group capable of photo-binary reaction, the number of groups capable of photo-binary reaction is preferably 1 to 4, more preferably 1 or 2, and particularly preferably 1.

When the low molecular weight compound C corresponds to the above-mentioned compound C1, it is preferable that the low molecular weight compound C is a compound represented by the above-mentioned formula (C-1) or (C-2). When the low molecular weight compound C corresponds to the above-mentioned compound C2, the low molecular weight compound C is preferably the compound represented by the above formula (DA-1), and more preferably the compound represented by the formula (DA-2).

[Resin C] The weight average molecular weight of the resin C is preferably 3,000 to 100,000, more preferably 3,000 to 50,000, and even more preferably 5,000 to 30,000.

Resin C is preferably a resin having a repeating unit including an azole group. Moreover, it is more preferable that resin C has a repeating unit containing an azole group and a repeating unit containing a group capable of performing a photobindization reaction. The preferred aspects of the repeating unit including an azole group and the repeating unit including a group capable of photo-dimerization reaction are the same as the preferred aspects of the repeating units in the resin B described above.

The molar amount of the azole group in 1 g of resin C is preferably 0.001 to 15 mmol/g, more preferably 0.01 to 10 mmol/g, and even more preferably 0.1 to 5 mmol/g.

When the resin C contains a group capable of performing a photodimetric reaction, the molar amount of the group capable of performing a photodimetric reaction in 1 g of the resin C is preferably 0.001 to 15 mmol/g, and 0.01 to 10 mmol/g is More preferably, 0.1-5 mmol/g is more preferable.

Resin C may also have other repeating units. As another repeating unit, the repeating unit etc. which have a polymerizable group are mentioned.

[Specific example] As a specific example of compound C, the compound used in an Example can be mentioned, but it is not limited to this.

〔content〕 The content of compound C is preferably 0.05 to 10 mass %, more preferably 0.10 to 5 mass %, and even more preferably 0.15 to 2 mass % with respect to the total solid content of the photosensitive resin composition of the present invention. The photosensitive resin composition of this invention may contain only 1 type of compound C, and may contain 2 or more types of compound C. When two or more types of compound C are contained, it is preferable that the total amount is within the above-mentioned range.

＜Solvent＞ It is preferable that the photosensitive resin composition of this invention contains a solvent. As the solvent, any known solvent can be used. The solvent is preferably an organic solvent. Examples of the organic solvent include compounds such as esters, ethers, ketones, cyclic hydrocarbons, sulfites, amides, ureas, and alcohols.

As esters, preferable ones include, for example, ethyl acetate, n-butyl acetate, isobutyl acetate, hexyl acetate, amyl formate, isoamyl acetate, butyl propionate, and isopropyl butyrate. , ethyl butyrate, butyl butyrate, methyl lactate, ethyl lactate, γ-butyrolactone, ε-caprolactone, δ-valerolactone, alkyl alkoxyacetates (e.g., alkoxy Methyl acetate, ethyl alkoxyacetate, butyl alkoxyacetate (eg, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethoxyacetate ethyl acetate, etc.)), alkyl 3-alkoxypropanoates (for example, methyl 3-alkoxypropionate, ethyl 3-alkoxypropanoate, etc. (for example, 3-methoxypropionate) Methyl propionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, etc.), 2-alkoxypropionate alkyl esters ( For example, methyl 2-alkoxypropionate, ethyl 2-alkoxypropionate, propyl 2-alkoxypropionate, etc. (e.g., methyl 2-methoxypropionate, 2-methoxypropionate Ethyl propionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate)), methyl 2-alkoxy-2-methylpropionate Esters and ethyl 2-alkoxy-2-methylpropanoate (eg, methyl 2-methoxy-2-methylpropanoate, ethyl 2-ethoxy-2-methylpropanoate, etc.) , methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl 2-oxobutyrate, ethyl 2-oxobutyrate, ethyl hexanoate , ethyl heptanoate, dimethyl malonate, diethyl malonate, etc.

As the ethers, preferred ones include, for example, diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl seleux acetate, ethyl seleux Acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, ethylene glycol Monobutyl ether, ethylene glycol monobutyl ether acetate, diethylene glycol ethyl methyl ether, propylene glycol monopropyl ether acetate, etc.

As ketones, preferable ones include, for example, methyl ethyl ketone, cyclohexanone, cyclopentanone, 2-heptanone, 3-heptanone, 3-methylcyclohexanone, levoglucan, Dihydro-levoglucan, etc.

As cyclic hydrocarbons, preferable examples include aromatic hydrocarbons such as toluene, xylene, and anisole, and cyclic terpenes such as limonene.

As the sulfites, preferable ones include, for example, dimethyl sulfene.

As the amides, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, N,N-dimethylacetamide, N,N- Dimethylformamide, N,N-dimethylisobutylamide, 3-methoxy-N,N-dimethylpropionamide, 3-butoxy-N,N-dimethylpropionamide amide, N-formylmorpholine, N-acetylmorpholine, etc.

Preferable examples of the ureas include N,N,N',N'-tetramethylurea, 1,3-dimethyl-2-imidazolidinone, and the like.

Examples of alcohols include methanol, ethanol, 1-propanol, 2-propanol, 1-butanol, 1-pentanol, 1-hexanol, benzyl alcohol, ethylene glycol monomethyl ether, 1-methoxyl Ethyl-2-propanol, 2-ethoxyethanol, diethylene glycol monoethyl ether, diethylene glycol monohexyl ether, triethylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monomethyl ether, Polyethylene glycol monomethyl ether, polypropylene glycol, tetraethylene glycol, ethylene glycol monobutyl ether, ethylene glycol monobenzyl ether, ethylene glycol monophenyl ether, methyl benzyl alcohol, n-amyl alcohol, methyl amyl alcohol alcohol and diacetone alcohol.

From the viewpoint of improvement of the properties of the coating surface, etc., it is also preferable that two or more kinds of solvents are mixed.

In the present invention, selected from methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, acetic acid Butyl ester, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone, cyclopentanone, γ-butyrolactone, dimethyl sulfoxide, ethyl carbitol acetate, butyl carbitol One kind of solvent or a mixed solvent composed of two or more kinds of alcohol acetate, N-methyl-2-pyrrolidone, propylene glycol methyl ether and propylene glycol methyl ether acetate is preferable. It is particularly preferred to use dimethyl sulfoxide and γ-butyrolactone in combination. In addition, the combination of N-methyl-2-pyrrolidone and ethyl lactate, diacetone alcohol and ethyl lactate, cyclopentanone and γ-butyrolactone is also preferable.

Among these, the photosensitive resin composition of the present invention preferably contains esters, and more preferably contains a lactone-based solvent. The lactone-based solvent refers to a solvent containing a lactone structure, and examples thereof include γ-butyrolactone, ε-caprolactone, and δ-valerolactone. The content of the lactone-based solvent is not particularly limited with respect to the total mass of the solvent, but is preferably 30 to 100% by mass, more preferably 40 to 95% by mass, and even more preferably 50 to 90% by mass.

Regarding the content of the solvent, from the viewpoint of coatability, the total solid content concentration of the photosensitive resin composition of the present invention is preferably 5 to 80% by mass, and preferably 5 to 75% by mass The amount is more preferable, and it is more preferable to set it as an amount of 10-70 mass %, and it is more preferable to set it as 40-70 mass %. The solvent content may be adjusted according to the desired thickness of the coating film and the coating method.

A solvent may contain only 1 type, and may contain 2 or more types. When two or more kinds of solvents are contained, the total is preferably within the above range.

＜Sensitizer＞ The composition of the present invention preferably contains a photosensitizer. As a photosensitizer, a photopolymerization initiator is preferable.

[Photopolymerization initiator] In the composition of the present invention, it is preferable to contain a photopolymerization initiator as a photosensitizer. The photopolymerization initiator is preferably a photoradical polymerization initiator. The photoradical polymerization initiator is not particularly limited, and can be appropriately selected from known photoradical polymerization initiators. For example, a photoradical polymerization initiator having photosensitivity to light in the ultraviolet region to the visible region is preferred. Moreover, it can also be an activator which produces|generates active radicals by some action with the sensitizer excited by light. In addition, as the above-mentioned photoradical polymerization initiator, an oxime compound described later is preferable.

Preferably, the photoradical polymerization initiator contains at least one compound having a molar absorption coefficient of at least about 50 L•mol ^-1 •cm ^-1 in the range of about 300 to 800 nm (preferably 330 to 500 nm). The molar absorptivity of a compound can be measured by a known method. For example, it is preferable to measure at a concentration of 0.01 g/L using an ethyl acetate solvent by an ultraviolet-visible spectrophotometer (Cary-5 spectrophotometer manufactured by Varian).

As the photoradical polymerization initiator, a known compound can be arbitrarily used. For example, halogenated hydrocarbon derivatives (for example, compounds having a triazole skeleton, compounds having an oxadiazole skeleton, compounds having a trihalomethyl group, etc.), amidophosphine compounds such as amidophosphine oxide, hexaaryl phosphine compounds, etc. oxime compounds such as bisimidazoles and oxime derivatives, organic peroxides, sulfur compounds, ketone compounds, aromatic onium salts, ketoxime ethers, aminoacetophenone compounds, hydroxyacetophenones, azo compounds, azides Compounds, metallocene compounds, organoboron compounds, iron arene complexes, etc. For details of these, reference can be made to the descriptions of paragraphs 0165 to 0182 of JP 2016-027357 A and paragraphs 0138 to 0151 of International Publication No. 2015/199219, which are incorporated in the present specification.

Examples of the ketone compound include compounds described in paragraph 0087 of JP 2015-087611 A, the contents of which are incorporated in the present specification. Among the commercially available products, KAYACURE DETX (manufactured by Nippon Kayaku Co., Ltd.) can also be preferably used.

In one embodiment of the present invention, as the photo-radical polymerization initiator, a hydroxyacetophenone compound, an aminoacetophenone compound, and an acylphosphine compound can be preferably used. More specifically, for example, the aminoacetophenone-based initiator described in Japanese Patent Laid-Open No. 10-291969 and the acylphosphine oxide-based initiator described in Japanese Patent No. 4225898 can be used.

As the hydroxyacetophenone-based initiator, IRGACURE 184 (IRGACURE is a registered trademark), DAROCURE 1173, IRGACURE 500, IRGACURE-2959, and IRGACURE 127 (trade names: all manufactured by BASF Corporation) can be used.

As the aminoacetophenone-based initiator, commercially available IRGACURE 907, IRGACURE 369, and IRGACURE 379 (trade names: all manufactured by BASF Corporation) can be used.

As the aminoacetophenone-based initiator, compounds described in Japanese Patent Laid-Open No. 2009-191179 can also be used, the absorption maximum wavelength being matched to a light source with a wavelength of 365 nm or 405 nm.

As an acylphosphine-based initiator, 2,4,6-trimethylbenzyl-diphenyl-phosphine oxide etc. are mentioned. In addition, commercially available IRGACURE-819 or IRGACURE-TPO (trade name: both are manufactured by BASF) can be used.

As a metallocene compound, IRGACURE-784, IRGACURE-784EG (both are manufactured by BASF Corporation) etc. can be illustrated.

As a photoradical polymerization initiator, an oxime compound can be mentioned more preferably. By using the oxime compound, the exposure latitude can be improved more effectively. The oxime compound is particularly preferred because it has a wide exposure latitude (exposure margin) and also functions as a photohardening accelerator.

As specific examples of the oxime compound, the compounds described in JP 2001-233842 A, the compounds described in JP 2000-080068 A, and the compounds described in JP 2006-342166 A can be used .

Examples of preferable oxime compounds include compounds having the following structures, 3-benzyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-Propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropane-1- Ketone, 2-Benzyloxyimino-1-phenylpropan-1-one, 3-(4-Tosyloxy)iminobutan-2-one and 2-ethoxycarbonyl Oxyimino-1-phenylpropan-1-one, etc. In the composition of the present invention, it is particularly preferable to use an oxime compound (oxime-based photopolymerization initiator) as a photoradical polymerization initiator. The oxime-based photopolymerization initiator has a linking group >C=N-O-C(=O)- in the molecule.

[Chemical formula 47]

Among the commercially available products, IRGACURE OXE 01, IRGACURE OXE 02, IRGACURE OXE 03, IRGACURE OXE 04 (the above are manufactured by BASF), Adeka Optomer N-1919 (manufactured by ADEKA CORPORATION, Japanese Patent Laid-Open 2012- Photo-radical polymerization initiator 2) described in Gazette 014052. In addition, TR-PBG-304 (manufactured by Changzhou Trolly New Electronic Materials CO., LTD.), ADEKA ARKLS NCI-831, and ADEKA ARKLS NCI-930 (manufactured by ADEKA CORPORATION) can also be used. In addition, DFI-091 (manufactured by Daito Chemix Corporation) can be used. Moreover, the oxime compound of the following structure can also be used. [Chemical formula 48]

As a photopolymerization initiator, an oxime compound having a perylene ring can also be used. Specific examples of the oxime compound having a perylene ring include the compounds described in JP 2014-137466 A and the compounds described in JP 06636081 .

As the photopolymerization initiator, an oxime compound having at least one benzene ring in a carbazole ring serving as a skeleton of a naphthalene ring can also be used. Specific examples of such oxime compounds include compounds described in International Publication No. 2013/083505.

Moreover, the oxime compound which has a fluorine atom can also be used. Specific examples of such oxime compounds include compounds described in JP 2010-262028 A, compounds 24, 36 to 40 described in paragraph 0345 of JP 2014-500852 A, and JP 24-500852 A. Compound (C-3) and the like described in paragraph 0101 of Unexamined Publication No. 2013-164471.

As an optimum oxime compound, the oxime compound which has a specific substituent shown in Unexamined-Japanese-Patent No. 2007-269779, the oxime compound which has a thioaryl group shown in Unexamined-Japanese-Patent No. 2009-191061, etc. are mentioned.

From the viewpoint of exposure sensitivity, the photo-radical polymerization initiator is selected from the group consisting of trihalomethyltrisium compounds, benzyldimethylketal compounds, α-hydroxyketone compounds, α-aminoketone compounds, Phosphine compounds, phosphine oxide compounds, metallocene compounds, oxime compounds, triarylimidazole dimers, onium salt compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds and their derivatives, cyclopentadiene - Compounds in the group of present-iron complexes and salts thereof, halomethyl oxadiazole compounds, and 3-aryl substituted coumarin compounds are preferred.

Further preferred photo-radical polymerization initiators are trihalomethyltriazole compounds, α-amino ketone compounds, acylphosphine compounds, phosphine oxide compounds, metallocene compounds, oxime compounds, triarylimidazole dimers, onium Salt compounds, benzophenone compounds, and acetophenone compounds, selected from the group consisting of trihalomethyltriazole compounds, α-amino ketone compounds, oxime compounds, triarylimidazole dimers, and benzophenone compounds It is further preferable to use at least one compound among them, it is even more preferable to use a metallocene compound or an oxime compound, and it is still more preferable to use an oxime compound.

In addition, N,N'- benzophenone, N,N'-tetramethyl-4,4'-diaminobenzophenone (Michler's Tetraalkyl-4,4'-diaminobenzophenone, 2-benzyl-2-dimethylamino-1-(4-morpholinylphenyl)-butanone-1,2-methyl Aromatic ketones such as base-1-[4-(methylthio)phenyl]-2-morpholinyl-acetone-1, quinones such as alkyl anthraquinones and condensed aromatic rings, benzoin alkyl ethers Benzoin ether compounds such as benzoin, benzoin compounds such as benzoin and alkylbenzoin, benzyl derivatives such as benzyl dimethyl ketal, and the like. Moreover, the compound represented by following formula (I) can also be used.

[Chemical formula 49]

In formula (I), R ^I00 is an alkyl group having 1 to 20 carbon atoms, an alkyl group having 2 to 20 carbon atoms interrupted by one or more oxygen atoms, an alkoxy group having 1 to 12 carbon atoms, a phenyl group, a carbon atom Alkyl group having 1 to 20 carbon atoms, alkoxy group having 1 to 12 carbon atoms, halogen atom, cyclopentyl group, cyclohexyl group, alkenyl group having 2 to 12 carbon atoms, and 2 to carbon carbon group interrupted by one or more oxygen atoms The alkyl group of 18 and the phenyl group or biphenyl group substituted by at least one of the alkyl groups of 1 to 4 carbon atoms, R ^I01 is a group represented by formula (II) or the same group as R ^I00 , R ^I02 to R ^I04 are each independently an alkyl group having 1 to 12 carbons, an alkoxy group having 1 to 12 carbons, or a halogen atom.

[Chemical formula 50]

In the formula, R ^I05 to R ^I07 are the same as R ^I02 to R ^I04 of the above formula (I).

In addition, the compounds described in paragraphs 0048 to 0055 of International Publication No. 2015/125469 can also be used as the photoradical polymerization initiator.

When a photopolymerization initiator is included, its content is preferably 0.1 to 30% by mass, more preferably 0.1 to 20% by mass, and further preferably 0.5 to 30% by mass relative to the total solid content of the composition of the present invention. 15 mass %, more preferably 1.0 to 10 mass %. Only one type of photopolymerization initiator may be contained, or two or more types may be contained. When two or more types of photopolymerization initiators are contained, the total amount thereof is preferably within the above-mentioned range.

[Photoacid generator] Moreover, in the composition of this invention, it is also preferable to contain a photoacid generator as a photosensitizer. By containing a photoacid generator, for example, an acid is generated in the exposed part of the composition layer, and the solubility of the exposed part in a developing solution (for example, an aqueous alkali solution) is increased, and a positive type of the exposed part can be obtained in which the exposed part is removed by the developing solution. pattern. In addition, the composition can also be used as an exposed portion by including a polymerizable compound other than a photoacid generator and a radical polymerizable compound described later, for example, by using an acid generated in the exposed portion to promote the crosslinking reaction of the polymerizable compound described above. It is more difficult to be removed by the developer than the non-exposed part. In this aspect, a negative pattern can be obtained.

The photoacid generator is not particularly limited as long as it generates an acid by exposure, and examples thereof include quinonediazide compounds, diazonium salts, phosphonium salts, pernium salts, onium salt compounds such as iodonium salts, and imidosulfonates. Sulfonate compounds such as acid salts, oxime sulfonates, diazobis, diazo, o-nitrobenzyl sulfonates, etc.

Examples of the quinonediazide compound include a sulfonic acid in which quinonediazide is bonded to a polyhydroxy compound via an ester, and a sulfonic acid in which quinonediazide is bonded to a polyamine compound via a sulfonamide. An acid, a sulfonic acid in which a quinonediazide is bonded to a polyhydroxy polyamine compound through at least one of an ester bond and a sulfonamide bond, and the like. In the present invention, for example, it is preferable that 50 mol% or more of the whole functional groups of these polyhydroxy compounds or polyamine compounds are substituted with quinonediazide groups.

In the present invention, as the quinonediazide, any of 5-naphthoquinonediazidesulfonyl group and 4-naphthoquinonediazidesulfonyl group can be preferably used. The 4-naphthoquinonediazide sulfonate compound has absorption in the i-ray region of a mercury lamp and is suitable for i-ray exposure. The absorption of 5-naphthoquinonediazide sulfonate compound extends to the g-ray region of mercury lamp, which is suitable for g-ray exposure. In the present invention, it is preferable to select the 4-naphthoquinonediazidesulfonate compound and the 5-naphthoquinonediazidesulfonate compound according to the exposure wavelength. In addition, a naphthoquinonediazidesulfonyl ester compound having a 4-naphthoquinonediazidesulfonyl group and a 5-naphthoquinonediazidesulfonyl group may be contained in the same molecule, or a 4-naphthoquinonediazidesulfonyl group may be contained in the same molecule. A nitrogen sulfonate compound and a 5-naphthoquinonediazide sulfonate compound.

The above-mentioned naphthoquinonediazide compound can be synthesized by esterification of a compound having a phenolic hydroxyl group and a quinonediazide sulfonic acid compound, and can be synthesized by a known method. By using these naphthoquinonediazide compounds, the resolution, sensitivity, and residual film rate are further improved. As the above-mentioned naphthoquinonediazide compound, for example, 1,2-naphthoquinone-2-diazide-5-sulfonic acid, 1,2-naphthoquinone-2-diazide-4-sulfonic acid, the salts or esters of the compounds, etc.

As the onium salt compound or the sulfonate compound, the compounds described in paragraphs 0064 to 0122 of JP-A No. 2008-013646 can be mentioned.

It is also preferable that the photoacid generator is a compound containing an oxime sulfonate group (hereinafter, also simply referred to as "oxime sulfonate compound"). The oxime sulfonate compound is not particularly limited as long as it has an oxime sulfonate group, but the following formula (OS-1), formula (OS-103), formula (OS-104), or formula (OS-105) described later The represented oxime sulfonate compounds are preferred.

[Chemical formula 51]

In formula (OS-1), X ³ represents an alkyl group, an alkoxy group or a halogen atom. When there are a plurality of X ³ , they may be the same or different. The alkyl group and the alkoxy group in the above-mentioned X ³ may have a substituent. As the alkyl group in the above-mentioned X ³ , a linear or branched alkyl group having 1 to 4 carbon atoms is preferable. As the alkoxy group in the above-mentioned X ³ , a linear or branched alkoxy group having 1 to 4 carbon atoms is preferable. As the halogen atom in the above-mentioned X ³ , a chlorine atom or a fluorine atom is preferable. In formula (OS-1), m3 represents an integer of 0 to 3, and 0 or 1 is preferable. When m3 is 2 or 3, a plurality of ^X3 may be the same or different. In formula (OS-1), R ³⁴ represents an alkyl group or an aryl group, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, a halogenated alkyl group having 1 to 5 carbon atoms, and an alkyl group having 1 to 10 carbon atoms. The halogenated alkoxy group of 5, the phenyl group which may be substituted with W, the naphthyl group which may be substituted with W, or the anthracenyl group which may be substituted with W are preferred. W represents a halogen atom, a cyano group, a nitro group, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, a halogenated alkyl group having 1 to 5 carbon atoms, or a halogenated alkoxy group having 1 to 5 carbon atoms. , an aryl group with a carbon number of 6-20, a halogenated aryl group with a carbon number of 6-20.

In formula (OS-1), m3 is ³ , ^X3 is a methyl group, the substitution position of X3 is an ortho position, ^R34 is a straight-chain alkyl group having 1 to 10 carbon atoms, 7,7-dimethyl- Compounds of 2-oxonorkanylmethyl or p-tolyl are particularly preferred.

Specific examples of the oxime sulfonate compound represented by the formula (OS-1) include paragraphs 0064 to 0068 of JP 2011-209692 A, and paragraphs 0158 to JP 2015-194674 The following compounds described in 0167 are incorporated into this specification.

[Chemical formula 52]

In formula (OS-103) to formula (OS-105), R ^s1 represents an alkyl group, an aryl group or a heteroaryl group, and sometimes there are plural R ^s2 which independently represent a hydrogen atom, an alkyl group, an aryl group or a halogen. Atom, sometimes there are plural R ^s6 each independently represents a halogen atom, an alkyl group, an alkoxy group, a sulfonic acid group, an aminosulfonyl group or an alkoxysulfonyl group, Xs represents O or S, and ns represents 1 Or 2, ms represents an integer from 0 to 6. In formulas (OS-103) to (OS-105), the alkyl group (preferably carbon number 1-30), aryl group (preferably carbon number 6-30) or heteroaryl group represented by R ^s1 ( (preferably having 4 to 30 carbon atoms) may have a substituent T.

In formulas (OS-103) to (OS-105), R ^s2 is preferably a hydrogen atom, an alkyl group (preferably with a carbon number of 1-12) or an aryl group (preferably with a carbon number of 6-30), A hydrogen atom or an alkyl group is more preferable. Among the two or more R ^s2 that sometimes exist in the compound, one or two are preferably alkyl, aryl or halogen atoms, one is preferably alkyl, aryl or halogen atom, and one is preferably an alkyl group, an aryl group or a halogen atom. It is particularly preferred that it is an alkyl group and the rest are hydrogen atoms. The alkyl group or aryl group represented by R ^s2 may have a substituent T. In formula (OS-103), formula (OS-104) or formula (OS-105), Xs represents O or S, and O is preferred. In the above formulae (OS-103) to (OS-105), the ring including Xs as a ring member is a 5-membered ring or a 6-membered ring.

In formulas (OS-103) to (OS-105), ns represents 1 or 2. When Xs is O, ns is 1, which is better. When Xs is S, ns is 2. good. In formulas (OS-103) to (OS-105), the alkyl group (preferably having 1 to 30 carbon atoms) and alkoxy group (preferably having 1 to 30 carbon atoms) represented by R ^s6 may have a substituent . In formulas (OS-103) to (OS-105), ms represents an integer of 0 to 6, preferably an integer of 0 to 2, more preferably 0 or 1, and particularly preferably 0.

In addition, the compound represented by the above formula (OS-103) is particularly preferably a compound represented by the following formula (OS-106), formula (OS-110) or formula (OS-111), the above formula (OS-104) ) represented by the compound represented by the following formula (OS-107) is particularly preferred, and the compound represented by the above formula (OS-105) is represented by the following formula (OS-108) or formula (OS-109) The compounds indicated are particularly preferred. [Chemical formula 53]

In formulas (OS-106) to (OS-111), R ^t1 represents an alkyl group, an aryl group or a heteroaryl group, R ^t7 represents a hydrogen atom or a bromine atom, and R ^t8 represents a hydrogen atom or an alkane having 1 to 8 carbon atoms group, halogen atom, chloromethyl, bromomethyl, bromoethyl, methoxymethyl, phenyl or chlorophenyl, R ^t9 represents hydrogen atom, halogen atom, methyl or methoxy group, R ^t2 represents hydrogen atom or methyl group. In the formulas (OS-106) to (OS-111), R ^t7 represents a hydrogen atom or a bromine atom, preferably a hydrogen atom.

In formulas (OS-106) to (OS-111), R ^t8 represents a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a halogen atom, a chloromethyl group, a bromomethyl group, a bromoethyl group, and a methoxymethyl group , phenyl or chlorophenyl, preferably an alkyl group with 1 to 8 carbon atoms, a halogen atom or a phenyl group, preferably an alkyl group with 1 to 8 carbon atoms, and even more preferably an alkyl group with 1 to 6 carbon atoms , methyl is particularly good.

In formulas (OS-106) to (OS-111), R ^t9 represents a hydrogen atom, a halogen atom, a methyl group or a methoxy group, and a hydrogen atom is preferable. R ^t2 represents a hydrogen atom or a methyl group, preferably a hydrogen atom. In addition, among the above-mentioned oxime sulfonate compounds, the three-dimensional structure (E, Z) of the oxime may be any of them, or a mixture may be used. Specific examples of the oxime sulfonate compounds represented by the above formulae (OS-103) to (OS-105) include paragraph numbers 0088 to 0095 of JP 2011-209692 A, JP 2015-A The compounds described in paragraphs 0168 to 0194 of Gazette 194674 are incorporated in the present specification.

As another preferable aspect of the oxime sulfonate compound containing at least one oxime sulfonate group, the compound represented by following formula (OS-101) and formula (OS-102) is mentioned.

[Chemical formula 54]

In formula (OS-101) or formula (OS-102), R ^u9 represents a hydrogen atom, an alkyl group, an alkenyl group, an alkoxy group, an alkoxycarbonyl group, an acyl group, a carbamoyl group, a sulfamoyl group, a sulfonyl group group, cyano group, aryl group or heteroaryl group. The aspect where R ^u9 is a cyano group or an aryl group is more preferable, and the aspect where R ^u9 is a cyano group, a phenyl group, or a naphthyl group is more preferable. In formula (OS-101) or formula (OS-102), R ^u2a represents an alkyl group or an aryl group. In formula (OS-101) or formula (OS-102), Xu represents -O-, -S-, -NH-, -NR ^u5 -, -CH ₂ -, ^{-CR u6} H- or CR ^u6 R ^u7 - , R ^u5 to R ^u7 each independently represent an alkyl group or an aryl group.

In formula (OS-101) or formula (OS-102), R ^u1 to R ^u4 each independently represent a hydrogen atom, a halogen atom, an alkyl group, an alkenyl group, an alkoxy group, an amino group, an alkoxycarbonyl group, an alkyl group carbonyl, arylcarbonyl, amido, sulfo, cyano or aryl. Two of R ^u1 to R ^u4 may each be bonded to each other to form a ring. At this time, the ring may be condensed to form a condensed ring together with the benzene ring. As R ^u1 to R ^u4 , a hydrogen atom, a halogen atom, or an alkyl group is preferable, and an aspect in which at least two of R ^u1 to R ^u4 are bonded to each other to form an aryl group is also preferable. Among them, the aspect in which all of R ^u1 to R ^u4 are hydrogen atoms is preferable. All of the above-mentioned substituents may further have a substituent.

More preferably, the compound represented by the above formula (OS-101) is the compound represented by the formula (OS-102). In addition, among the above-mentioned oxime sulfonate compounds, the three-dimensional structure (E, Z, etc.) of the oxime or benzothiazole ring may be any of them, respectively, or a mixture may be used. Specific examples of the compound represented by the formula (OS-101) include those described in paragraphs 0102 to 0106 of JP 2011-209692 A, and paragraphs 0195 to 0207 of JP 2015-194674 A compounds, which are incorporated into this specification. Among the above compounds, b-9, b-16, b-31 and b-33 are preferred.

In addition to this, a commercial item can also be used as a photoacid generator. Commercially available products include WPAG-145, WPAG-149, WPAG-170, WPAG-199, WPAG-336, WPAG-367, WPAG-370, WPAG-443, WPAG-469, WPAG-638, WPAG- 699 (all manufactured by FUJIFILM Wako Pure Chemical Corporation), Omnicat 250, Omnicat 270 (all manufactured by IGM Resins BV Co., Ltd.), Irgacure 250, Irgacure 270, Irgacure 290 (all manufactured by BASF Corporation), MBZ-101 (all manufactured by Midori Kagaku Co., Ltd.) ., Ltd. manufacture) and so on.

Moreover, the compound represented by the following structural formula is also mentioned as a preferable example. [Chemical formula 55]

As the photoacid generator, an organic halogenated compound can also be applied. Specific examples of the organic halogenated compound include Wakabayashi et al. "Bull Chem. Soc Japan" 42, 2924 (1969), the specification of US Pat. No. 3,905,815, JP 46-4605, JP 48-036281 No., Japanese Patent Laid-open No. 55-032070, Japanese Patent Laid-open No. 60-239736, Japanese Patent Laid-open No. 61-169835, Japanese Patent Laid-open No. 61-169837, Japanese Patent Laid-open No. 62-058241, Japanese Patent Laid-open No. 61-169837 Compounds described in No. Sho 62-212401, JP Sho 63-070243, JP Sho 63-298339, MP Hutt "Jurnal of Heterocyclic Chemistry" 1 (No3), (1970), etc., are particularly mentioned. The oxazole compound substituted by trihalomethyl group: S-triazole compound. More preferably, at least one mono-, di- or trihalogen-substituted methyl group is bonded to the s-tris-tris-s-tris-s-tris-derivatives, and specifically, for example, 2,4,6-tris (Monochloromethyl)-s-tris-tris, 2,4,6-tris (dichloromethyl)-s-tris, 2,4,6-tris (trichloromethyl)-s-tris, 2-Methyl-4,6-bis(trichloromethyl)-s-tris, 2-n-propyl-4,6-bis(trichloromethyl)-s-tris, 2-(α, α,β-Trichloroethyl)-4,6-bis(trichloromethyl)-s-tris-tris, 2-phenyl-4,6-bis(trichloromethyl)-s-tris, 2 -(p-Methoxyphenyl)-4,6-bis(trichloromethyl)-s-tris-tris, 2-(3,4-epoxyphenyl)-4,6-bis(trichloromethyl) )-s-tris-tris, 2-(p-chlorophenyl)-4,6-bis(trichloromethyl)-s-tris-tris, 2-[1-(p-methoxyphenyl)-2,4 -Butadienyl]-4,6-bis(trichloromethyl)-s-tris-tris, 2-styryl-4,6-bis(trichloromethyl)-s-tris, 2-( p-Methoxystyryl)-4,6-bis(trichloromethyl)-s-tris-tris, 2-(p-isopropoxystyryl)-4,6-bis(trichloromethyl) -s-tris𠯤, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-tris𠯤, 2-(4-naphthoxynaphthyl)-4,6-bis(tris chloromethyl)-s-tris-tris, 2-phenylsulfanyl-4,6-bis(trichloromethyl)-s-tris-tris, 2-benzylsulfanyl-4,6-bis(trichloromethyl) -s-Tris(Tris), 2,4,6-Tris(dibromomethyl)-s-Tris, 2,4,6-Tris(Tribromomethyl)-s-Tris, 2-Methyl-4 , 6-bis (tribromomethyl)-s-tris, 2-methoxy-4,6-bis (tribromomethyl)-s-tris, etc.

As the photoacid generator, an organic borate compound can also be used. Specific examples of the organic borate compound include Japanese Patent Laid-Open No. 62-143044, Japanese Patent Laid-Open No. 62-150242, Japanese Patent Laid-Open No. 9-188685, Japanese Patent Laid-Open No. 9-188686, and Japanese Patent Laid-Open No. 9-188686. 9-188710, Japanese Patent Laid-Open No. 2000-131837, Japanese Patent Laid-Open No. 2002-107916, Japanese Patent No. 2764769, Japanese Patent Application No. 2000-310808, etc., and Kunz, Martin "Rad Tech'98. Proceeding April 19-22 , 1998, "Chicago" etc., the organoborate complexes described in Japanese Patent Laid-Open No. 6-157623, Japanese Patent Laid-Open No. 6-175564, and Japanese Patent Laid-Open No. 6-175561 Or organoboron oxonium complexes, the organoboronium complexes described in Japanese Patent Laid-Open No. 6-175554, Japanese Patent Laid-Open No. 6-175553, and those described in Japanese Patent Laid-Open No. 9-188710 Organoboronium phosphonium complexes, Japanese Patent Laid-Open No. 6-348011, Japanese Laid-Open No. 7-128785, Japanese Laid-Open No. 7-140589, Japanese Laid-Open No. 7-306527, Japanese Laid-Open No. 7-292014 Gazette, etc. Organoboron transition metal coordination complexes, etc.

As the photoacid generator, a dioxane compound can also be used. As the dibasic compound, the compounds and diazodibasic compounds described in Japanese Patent Application Laid-Open No. 61-166544, Japanese Patent Application No. 2001-132318 and the like can be mentioned.

Examples of the above-mentioned onium salt compounds include the diazonium salts described in SISchlesinger, Photogr. Sci. Eng., 18, 387 (1974), TSBal et al, Polymer, 21, 423 (1980), and U.S. Patent No. 4,069,055 No. specification, ammonium salts described in Japanese Patent Laid-Open No. 4-365049, etc., phosphonium salts described in each specification of US Patent No. 4,069,055, US Patent No. 4,069,056, European Patent No. 104,143, US Patent No. 339,049 , each specification of U.S. Patent No. 410,201, the iodonium salt described in Japanese Patent Laid-Open No. 2-150848, Japanese Patent Laid-Open No. 2-296514, European Patent No. 370,693, European Patent No. 390,214, European Patent No. 233,567, European Patent No. 297,443, European Patent No. 297,442, US Patent No. 4,933,377, US Patent No. 161,811, US Patent No. 410,201, US Patent No. 339,049, US Patent No. 4,760,013, US Patent No. 4,734,444, US Patent No. Permamate salts described in each specification of No. 2,833,827, German Patent No. 2,904,626, German Patent No. 3,604,580, German Patent No. 3,604,581, JV Crivello et al, Macromolecules, 10(6), 1307 (1977), JV Crivello Selenium salts as described in et al, J. Polymer Sci., Polymer Chem. Ed., 17, 1047 (1979), CSWen et al, Teh, Proc. Conf. Rad. Curing ASIA, p478 Tokyo, Oct (1988 ), onium salts such as arsenic salts, pyridinium salts, etc.

式（RI-I）中，Ar11表示可以具有1～6個取代基之碳數20以下的芳基，作為較佳的取代基，可以舉出碳數1～12的烷基、碳數1～12的烯基、碳數1～12的炔基、碳數1～12的芳基、碳數1～12的烷氧基、碳數1～12的芳氧基、鹵素原子、碳數1～12的烷基胺基、碳數1～12的二烷基胺基、碳數1～12的烷基醯胺基或芳基醯胺基、羰基、羧基、氰基、磺醯基、碳數1～12的硫代烷基、碳數1～12的硫代芳基。Z11^- 表示1價的陰離子，為鹵素離子、過氯酸離子、六氟磷酸鹽離子、四氟硼酸鹽離子、磺酸離子、亞磺酸離子、硫代磺酸離子、硫酸離子，從穩定性的方面而言，過氯酸離子、六氟磷酸鹽離子、四氟硼酸鹽離子、磺酸離子、亞磺酸離子為較佳。式（RI-II）中，Ar21、Ar22各自獨立地表示可以具有1～6個取代基之碳數20以下的芳基，作為較佳的取代基，可以舉出碳數1～12的烷基、碳數1～12的烯基、碳數1～12的炔基、碳數1～12的芳基、碳數1～12的烷氧基、碳數1～12的芳氧基、鹵素原子、碳數1～12的烷基胺基、碳數1～12的二烷基胺基、碳數1～12的烷基醯胺基或芳基醯胺基、羰基、羧基、氰基、磺醯基、碳數1～12的硫代烷基、碳數1～12的硫代芳基。Z21^- 表示1價的陰離子，為鹵素離子、過氯酸離子、六氟磷酸鹽離子、四氟硼酸鹽離子、磺酸離子、亞磺酸離子、硫代磺酸離子、硫酸離子，從穩定性、反應性的方面而言，過氯酸離子、六氟磷酸鹽離子、四氟硼酸鹽離子、磺酸離子、亞磺酸離子、羧酸離子為較佳。式（RI-III）中，R31、R32、R33各自獨立地表示可以具有1～6個取代基之碳數20以下的芳基或烷基、烯基、炔基，較佳地，從反應性、穩定性的方面而言，芳基為較佳。作為較佳的取代基，可以舉出碳數1～12的烷基、碳數1～12的烯基、碳數1～12的炔基、碳數1～12的芳基、碳數1～12的烷氧基、碳數1～12的芳氧基、鹵素原子、碳數1～12的烷基胺基、碳數1～12的二烷基胺基、碳數1～12的烷基醯胺基或芳基醯胺基、羰基、羧基、氰基、磺醯基、碳數1～12的硫代烷基、碳數1～12的硫代芳基。Z31^- 表示1價的陰離子，為鹵素離子、過氯酸離子、六氟磷酸鹽離子、四氟硼酸鹽離子、磺酸離子、亞磺酸離子、硫代磺酸離子、硫酸離子，從穩定性、反應性的方面而言，過氯酸離子、六氟磷酸鹽離子、四氟硼酸鹽離子、磺酸離子、亞磺酸離子、羧酸離子為較佳。Examples of the onium salt include those represented by the following general formulae (RI-I) to (RI-III). [Chemical formula 56]

In formula (RI-I), Ar11 represents an aryl group with 20 or less carbon atoms which may have 1 to 6 substituents, and as preferred substituents, an alkyl group with 1 to 12 carbon atoms, an alkyl group with 1 to 12 carbon atoms, and Alkenyl group of 12, alkynyl group of carbon number 1-12, aryl group of carbon number 1-12, alkoxy group of carbon number 1-12, aryloxy group of carbon number 1-12, halogen atom, carbon number of 1-12 12 alkylamine group, carbon number 1-12 dialkylamine group, carbon number 1-12 alkyl amido group or aryl amido group, carbonyl group, carboxyl group, cyano group, sulfonyl group, carbon number 1-12 thioalkyl groups, 1-12 carbon atoms thioaryl groups. Z11 ^- represents a monovalent anion, which is halogen ion, perchloric acid ion, hexafluorophosphate ion, tetrafluoroborate ion, sulfonic acid ion, sulfinic acid ion, thiosulfonic acid ion, and sulfate ion. In terms of this aspect, perchlorate ion, hexafluorophosphate ion, tetrafluoroborate ion, sulfonic acid ion, sulfinic acid ion are preferred. In the formula (RI-II), Ar21 and Ar22 each independently represent an aryl group with 20 or less carbon atoms which may have 1 to 6 substituents. Preferred substituents include an alkyl group with 1 to 12 carbon atoms. , alkenyl with 1 to 12 carbons, alkynyl with 1 to 12 carbons, aryl with 1 to 12 carbons, alkoxy with 1 to 12 carbons, aryloxy with 1 to 12 carbons, halogen atoms , C 1-12 alkylamine group, carbon number 1-12 dialkylamine group, carbon number 1-12 alkyl amide group or aryl amide group, carbonyl, carboxyl, cyano, sulfonic acid Acyl group, thioalkyl group having 1 to 12 carbon atoms, and thioaryl group having 1 to 12 carbon atoms. Z21 ^- represents a monovalent anion, which is halogen ion, perchloric acid ion, hexafluorophosphate ion, tetrafluoroborate ion, sulfonic acid ion, sulfinic acid ion, thiosulfonic acid ion, and sulfate ion. In terms of reactivity, perchlorate ion, hexafluorophosphate ion, tetrafluoroborate ion, sulfonic acid ion, sulfinic acid ion, and carboxylate ion are preferable. In formula (RI-III), R31, R32, and R33 each independently represent an aryl group, an alkyl group, an alkenyl group, and an alkynyl group with a carbon number of 20 or less that may have 1 to 6 substituents. In terms of stability, aryl groups are preferred. Preferred substituents include an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 1 to 12 carbon atoms, an alkynyl group having 1 to 12 carbon atoms, an aryl group having 1 to 12 carbon atoms, and an aryl group having 1 to 12 carbon atoms. Alkoxy group of 12, aryloxy group of carbon number 1-12, halogen atom, alkylamine group of carbon number 1-12, dialkylamine group of carbon number 1-12, alkyl group of carbon number 1-12 An amido group or an aryl amido group, a carbonyl group, a carboxyl group, a cyano group, a sulfonyl group, a thioalkyl group having 1 to 12 carbon atoms, and a thioaryl group having 1 to 12 carbon atoms. Z31 ^- represents a monovalent anion, which is halogen ion, perchloric acid ion, hexafluorophosphate ion, tetrafluoroborate ion, sulfonic acid ion, sulfinic acid ion, thiosulfonic acid ion, and sulfate ion. In terms of reactivity, perchlorate ion, hexafluorophosphate ion, tetrafluoroborate ion, sulfonic acid ion, sulfinic acid ion, and carboxylate ion are preferable.

[化學式58]

[化學式59]

[化學式60]

Specific examples include the following. [Chemical formula 57]

[Chemical formula 58]

[Chemical formula 59]

[Chemical formula 60]

When a photoacid generator is contained, its content is preferably 0.1 to 30% by mass, more preferably 0.1 to 20% by mass, and more preferably 2 to 15% by mass relative to the total solid content of the composition of the present invention. better. A photoacid generator may contain only 1 type, and may contain 2 or more types. When two or more types of photoacid generators are contained, it is preferable that the total is within the above-mentioned range.

[Photobase generator] The photosensitive resin composition of the present invention may contain a photobase generator as a photosensitizer. When the photosensitive resin composition contains a photobase generator and a crosslinking agent, which will be described later, for example, the alkali generated in the exposed portion promotes the cyclization of a specific resin, promotes the crosslinking reaction of the crosslinking agent, etc., so that it can be designed. It is an aspect in which the exposed part is less likely to be removed by the developer than the non-exposed part. In this aspect, a negative pattern can be obtained.

The photobase generator is not particularly limited as long as it generates a base by exposure, and a known one can be used. For example, M.Shirai and M.Tsunooka, Prog.Polym.Sci., 21, 1 (1996); Masahiro Kakuoka, Polymer Processing, 46, 2 (1997); C. Kutal, Coord. Chem. Rev. , 211, 353 (2001); Y. Kaneko, A. Sarker, and D. Neckers, Chem. Mater., 11, 170 (1999); H. Tachi, M. Shirai, and M. Tsunooka, J. Photopolym. Sci. Technol. , 13, 153 (2000); M.Winkle, and K.Graziano, J.Photopolym.Sci.Technol., 3,419 (1990); M.Tsunooka, H.Tachi, and S.Yoshitaka, J.Photopolym.Sci.Technol. , 9, 13 (1996); K.Suyama, H.Araki, M.Shirai, J.Photopolym.Sci.Technol., 19,81 (2006), there can be mentioned transition metal compound complexes, compounds with ammonium Substances with structures such as salts, ionic compounds such as those in which amidine moieties are latentized by forming salts with carboxylic acids, ionic compounds, urethane derivatives, and oxime ester derivatives , a nonionic compound in which a base component such as an acyl compound is latentized by a urethane bond, an oxime bond, or the like. In the present invention, examples of the photobase generator include carbamate derivatives, amide derivatives, amide derivatives, α-cobalt complexes, imidazole derivatives, cinnamamide derivatives, and oxime derivatives. as a better example.

Although it does not specifically limit as a basic substance which generate|occur|produces from a photobase generator, The compound which has an amine group, especially polyamines, such as a monoamine and a diamine, and an amidine, etc. are mentioned. From the viewpoint of the imidization rate, it is preferable that the above-mentioned basic substance has a large pKa in DMSO (dimethylsulfoxide) of the conjugated acid. The above-mentioned pKa is preferably 1 or more, more preferably 3 or more. The upper limit of the above pKa is not particularly limited, but 20 or less is preferable. Here, the above pKa represents the logarithm of the reciprocal of the first dissociation constant of an acid, and can be found in Determination of Organic Structures by Physical Methods (authors: Brown, HC, McDaniel, DH, Hafliger, O., Nachod, FC; editors: Braude, EA, Nachod, FC; Academic Press, New York, 1955) or Data for Biochemical Research (authors: Dawson, RMC et al; Oxford, Clarendon Press, 1959). For compounds not described in these documents, the value calculated from the structural formula using software of ACD/pKa (manufactured by ACD/Labs) was used as pKa.

From the viewpoint of the storage stability of the photosensitive resin composition, as the photobase generator, a photobase generator that does not contain a salt in its structure is preferable, and the photobase generator generates on the nitrogen atom of the alkali moiety. No charge is preferred. As a photobase generator, the base generated is preferably potentialized by covalent bonds, and the mechanism of base generation is that the covalent bond between the nitrogen atom of the generated base part and the adjacent atom is cut to generate the base The mechanism is better. If it is a photobase generator which does not contain a salt in a structure, since a photobase generator can be made neutral, a solvent solubility becomes more favorable, and a service life is extended. From these reasons, the amine produced from the photobase generator used in the present invention is preferably a primary amine or a secondary amine. In addition, from the viewpoint of the chemical resistance of the pattern, it is preferable that the photobase generator contains a salt in the structure as the photobase generator.

In addition, from the above-mentioned reasons, as a photobase generator, as described above, the generated base is preferably latentized by a covalent bond, and the generated base is preferably formed by an amide bond, a urethane bond, and an oxime bond. Potentially better. As the photobase generator of the present invention, for example, the photobase generator having a cinnamamide structure disclosed in Japanese Patent Laid-Open No. 2009-080452 and International Publication No. 2009/123122, such as Japanese Patent Laid-Open No. 2006- Photobase generators with urethane structure disclosed in Gazette 189591 and JP 2008-247747 A, such as those disclosed in JP 2007-249013 Gazette and JP 2008-003581 Gazette having oxime The structure, the photobase generator of the carbamoyl oxime structure, etc., are not limited to these, In addition, the structure of a well-known photobase generator can be used.

In addition, examples of the photobase generator include compounds described in paragraphs 0185 to 0188, 0199 to 0200, and 0202 of JP 2012-093746 A, and paragraph 0022 of JP 2013-194205 A. The compounds described in to 0069, the compounds described in paragraphs 0026 to 0074 of JP 2013-204019 A, and the compounds described in paragraph 0052 of International Publication No. 2010/064631 are exemplified.

In addition to this, as a photobase generator, a commercial item can be used. Commercially available products include WPBG-266, WPBG-300, WPGB-345, WPGB-140, WPBG-165, WPBG-027, WPBG-018, WPGB-015, WPBG-041, WPGB-172, WPGB- 174, WPBG-166, WPGB-158, WPGB-025, WPGB-168, WPGB-167, WPBG-082 (all manufactured by FUJIFILM Wako Pure Chemical Corporation), A2502, B5085, N0528, N1052, O0396, O0447, O0448 ( manufactured by Tokyo Chemical Industry Co., Ltd.), etc.

When a photobase generator is contained, its content is preferably 0.1 to 30 mass %, more preferably 0.1 to 20 mass %, and 2 to 15 mass % with respect to the total solid content of the photosensitive resin composition of the present invention. for further better. Only one type of photobase generator may be contained, or two or more types may be contained. When two or more types of photobase generators are contained, it is preferable that the total is within the above-mentioned range.

<Thermal polymerization initiator> The composition of the present invention may contain a thermal polymerization initiator, especially a thermal radical polymerization initiator. The thermal radical polymerization initiator is a compound that generates radicals by thermal energy to initiate or promote the polymerization reaction of the polymerizable compound. By adding the thermal radical polymerization initiator, the polymerization reaction of the resin and the polymerizable compound can also proceed in the heating process described later, so that the solvent resistance can be further improved.

Specific examples of the thermal radical polymerization initiator include compounds described in paragraphs 0074 to 0118 of JP-A No. 2008-063554.

When a thermal polymerization initiator is included, its content is preferably 0.1 to 30 mass %, more preferably 0.1 to 20 mass %, and further preferably 5 to 30 mass % with respect to the total solid content of the composition of the present invention. 15% by mass. Only one type of thermal polymerization initiator may be contained, or two or more types may be contained. When two or more thermal polymerization initiators are contained, the total amount thereof is preferably within the above-mentioned range.

<Thermal acid generator> The composition of the present invention may contain a thermal acid generator. The thermal acid generator has the effect of generating an acid by heating to promote a compound selected from the group consisting of a hydroxymethyl group, an alkoxymethyl group or an oxymethyl group, an epoxy compound, an oxetane compound, and a benzoyl group Cross-linking reaction of at least one of the 𠯤 compounds.

The thermal decomposition initiation temperature of the thermal acid generator is preferably 50°C to 270°C, more preferably 50°C to 250°C. In addition, when the drying (pre-baking: about 70 to 140° C.) after applying the composition to the substrate is selected, no acid is generated, and the final heating (curing: about 70° C.) after patterning is performed in the subsequent exposure and development. 100 to 400° C.) which generates an acid as a thermal acid generator can suppress the decrease in sensitivity at the time of development, so it is preferable. The thermal decomposition onset temperature was determined as the peak temperature of the exothermic peak with the lowest temperature when the thermal acid generator was heated to 500° C. in a pressure-resistant capsule at 5° C./min. Q2000 (manufactured by TA Instruments) etc. are mentioned as an apparatus used when measuring the thermal decomposition onset temperature.

The acid-based strong acid generated from the thermal acid generator is preferably, for example, arylsulfonic acid such as p-toluenesulfonic acid and benzenesulfonic acid; alkylsulfonic acid such as methanesulfonic acid, ethanesulfonic acid, butanesulfonic acid, Halogenated alkyl sulfonic acids such as methanesulfonic acid are preferred. Examples of such thermal acid generators include those described in paragraph 0055 of Japanese Patent Laid-Open No. 2013-072935.

Among them, from the viewpoint of less residue in the organic film and less likely to degrade the physical properties of the organic film, those that generate alkyl sulfonic acids having 1 to 4 carbon atoms or halogenated alkyl sulfonic acids having 1 to 4 carbon atoms are more preferable, and methanesulfonic acid is preferred. Acid (4-hydroxyphenyl) dimethyl perionate, methanesulfonic acid (4-((methoxycarbonyl)oxy)phenyl)dimethyl perionium, benzyl (4-hydroxyphenyl) methyl methanesulfonate bismuth, benzyl (4-((methoxycarbonyl)oxy)phenyl)methyl methanesulfonate, (4-hydroxyphenyl)methyl((2-methylphenyl)methylmethanesulfonate) (4-hydroxyphenyl) dimethylsulfanium trifluoromethanesulfonate, (4-((methoxycarbonyl)oxy)phenyl) dimethylsulfanium trifluoromethanesulfonate, trifluoromethane Benzyl sulfonate (4-hydroxyphenyl) methyl sulfamate, benzyl trifluoromethanesulfonate (4-((methoxycarbonyl)oxy)phenyl)methyl sulfamate, trifluoromethanesulfonic acid (4- Hydroxyphenyl)methyl((2-methylphenyl)methyl)strontium, 3-(5-(((propylsulfonyl)oxy)imino)thiophene-2(5H)-ylidene )-2-(o-tolyl)propionitrile and 2,2-bis(3-(methanesulfonamido)-4-hydroxyphenyl)hexafluoropropane are preferable as the thermal acid generator.

Moreover, the compound described in the 0059 paragraph of Japanese Unexamined Patent Application Publication No. 2013-167742 is also preferable as a thermal acid generator.

The content of the thermal acid generator is preferably 0.01 part by mass or more, more preferably 0.1 part by mass or more, relative to 100 parts by mass of the specific resin. Since crosslinking reaction is accelerated|stimulated by containing 0.01 mass part or more, the mechanical property and solvent resistance of an organic film can be improved further. In addition, from the viewpoint of the electrical insulating properties of the organic film, 20 parts by mass or less is preferable, 15 parts by mass or less is more preferable, and 10 parts by mass or less is still more preferable.

＜Onium salt＞ The photosensitive resin composition of the present invention may further contain an onium salt. In particular, when the photosensitive resin composition of the present invention contains a polyimide precursor or a polybenzoxazole precursor as a specific resin, it is preferable to contain an onium salt. The type and the like of the onium salt are not particularly limited, and preferred examples thereof include ammonium salts, iminium salts, peronium salts, iodonium salts, and phosphonium salts. Among these, ammonium salts or iminium salts are preferred from the viewpoint of high thermal stability, and periconium salts, iodonium salts, or phosphonium salts are preferred from the viewpoint of compatibility with polymers .

The onium salt is a salt of a cation and an anion having an onium structure, and the cation and anion may or may not be bound through a covalent bond. That is, the onium salt can be an intramolecular salt having a cationic part and an anionic part in the same molecular structure, or an intermolecular salt formed by ion bonding of cationic and anionic molecules of different molecules, but the intermolecular salt is better. Moreover, in the photosensitive resin composition of this invention, the said cation part or a cation molecule and the said anion part or an anion molecule may be bonded by an ionic bond, and may dissociate. As the cation in the onium salt, ammonium cation, pyridinium cation, perium cation, iodonium cation or phosphonium cation are preferred, and at least one cation selected from the group consisting of tetraalkylammonium cation, pericynium cation and iodonium cation is better.

The onium salt used in the present invention may be a thermal base generator described later. The thermal base generator refers to a compound that generates a base by heating, and examples thereof include compounds that generate a base when heated to 40° C. or higher. Examples of the onium salt include the onium salts described in paragraphs 0122 to 0138 of International Publication No. 2018/043262, and the like. In addition, onium salts used in the field of polyimide precursors can be used without particular limitation.

When the photosensitive resin composition of the present invention contains an onium salt, the content of the onium salt is preferably 0.1 to 50% by mass relative to the total solid content of the photosensitive resin composition of the present invention. The lower limit is more preferably 0.5% by mass or more, more preferably 0.85% by mass or more, and still more preferably 1% by mass or more. The upper limit is more preferably 30 mass % or less, more preferably 20 mass % or less, further preferably 10 mass % or less, and may be 5 mass % or less, or 4 mass % or less. One or more of the onium salts can be used. When using 2 or more types, it is preferable that the total amount is in the said range.

<Heat base generator> The photosensitive resin composition of this invention may further contain a heat base generator. In particular, when the photosensitive resin composition of the present invention contains a polyimide precursor or a polybenzoxazole precursor as a specific resin, it is preferable to contain a thermal alkali generator. The other thermal base generator may be a compound corresponding to the above-mentioned onium salt, or may be a thermal base generator other than the above-mentioned onium salt. As a thermal alkali generator other than the above-mentioned onium salt, a nonionic thermal alkali generator can be mentioned. As a nonionic thermal base generator, the compound represented by Formula (B1) or Formula (B2) is mentioned. [Chemical formula 61]

In formula (B1) and formula (B2), Rb ¹ , Rb ² and Rb ³ are each independently an organic group without a tertiary amine structure, a halogen atom or a hydrogen atom. However, Rb ¹ and Rb ² do not become hydrogen atoms at the same time. In addition, Rb ¹ , Rb ² and Rb ³ do not all have a carboxyl group. In addition, in this specification, a tertiary amine structure means the structure in which all three bonds of a trivalent nitrogen atom are covalently bonded to a hydrocarbon-based carbon atom. Therefore, when the carbon atom to be bonded is a carbon atom constituting a carbonyl group, that is, when an amide group is formed together with a nitrogen atom, it is not limited to this.

In the formulae (B1) and (B2), about Rb ¹ , Rb ² and Rb ³ , it is preferable that at least one of them contains a cyclic structure, and it is more preferable that at least two of them contain a cyclic structure. As the cyclic structure, any one of a monocyclic ring and a condensed ring may be used, and a monocyclic ring or a condensed ring formed by condensing two monocyclic rings is preferable. The single ring system is preferably a 5-membered ring or a 6-membered ring, more preferably a 6-membered ring. Monocyclic cyclohexane ring and benzene ring are preferable, and cyclohexane ring is more preferable.

More specifically, Rb ¹ and Rb ² are hydrogen atoms, alkyl groups (preferably having 1 to 24 carbon atoms, more preferably 2 to 18, and even more preferably 3 to 12), alkenyl (having 2 to 24 carbon atoms) is better, 2-18 is better, 3-12 is further better), aryl (carbon number 6-22 is better, 6-18 is better, 6-10 is further better) or aryl Alkyl (preferably having 7 to 25 carbon atoms, more preferably 7 to 19, and even more preferably 7 to 12) is preferred. These groups may have a substituent within a range in which the effects of the present invention are exhibited. Rb ¹ and Rb ² may be bonded to each other to form a ring. As the ring to be formed, a nitrogen-containing heterocyclic ring having 4 to 7 members is preferable. Rb ¹ and Rb ² are especially preferably straight-chain, branched or cyclic alkyl groups that may have substituents (the number of carbons is preferably 1-24, more preferably 2-18, and more preferably 3-12) , a cycloalkyl group that may have a substituent (preferably carbon number 3-24, more preferably 3-18, and more preferably 3-12) is more preferable, and a cyclohexyl group that may have a substituent is further preferable.

Examples of Rb ³ include alkyl (preferably having 1 to 24 carbon atoms, more preferably 2 to 18, and even more preferably 3 to 12), and aryl (preferably having 6 to 22 carbon atoms, preferably 6 to 18 carbon atoms). is more preferable, 6-10 is further preferable), alkenyl (carbon number 2-24 is preferable, 2-12 is more preferable, 2-6 is further preferable), arylalkyl (carbon number 7- 23 is better, 7-19 is better, 7-12 is further better), arylalkenyl (carbon number 8-24 is better, 8-20 is better, 8-16 is further better) , alkoxy (carbon number 1-24 is preferred, 2-18 is more preferred, 3-12 is further preferred), aryloxy (carbon number 6-22 is preferred, 6-18 is more preferred, 6 to 12 are more preferred) or arylalkoxy (the number of carbon atoms is preferably 7 to 23, more preferably 7 to 19, and more preferably 7 to 12). Among them, cycloalkyl (preferably carbon number of 3 to 24, more preferably 3 to 18, and even more preferably 3 to 12), arylalkenyl and arylalkoxy are preferred. Rb ³ may further have a substituent within a range in which the effects of the present invention are exhibited.

The compound represented by the formula (B1) is preferably a compound represented by the following formula (B1-1) or the following formula (B1-2). [Chemical formula 62]

In the formula, Rb ¹¹ and Rb ¹² and Rb ³¹ and Rb ³² are the same as Rb ¹ and Rb ² in the formula (B1), respectively. Rb ¹³ is alkyl (preferably carbon number 1-24, more preferably 2-18, further preferably 3-12), alkenyl (preferably carbon number 2-24, more preferably 2-18, 3-12 is further preferred), aryl (carbon number 6-22 is preferred, 6-18 is more preferred, 6-12 is further preferred), arylalkyl (carbon number 7-23 is preferred) , 7 to 19 are more preferable, and 7 to 12 are further preferable), and may have a substituent within the scope of exerting the effect of the present invention. Among them, Rb ¹³ -series arylalkyl groups are preferred.

Rb ³³ and Rb ³⁴ are independently a hydrogen atom, an alkyl group (preferably having 1 to 12 carbon atoms, more preferably 1 to 8, and even more preferably 1 to 3), an alkenyl group (preferably having a carbon number of 2 to 12). preferably, 2-8 is more preferred, 2-3 is further preferred), aryl (carbon number 6-22 is preferred, 6-18 is more preferred, 6-10 is further preferred), arylalkyl (The number of carbon atoms is preferably 7 to 23, more preferably 7 to 19, and even more preferably 7 to 11), and a hydrogen atom is more preferable.

Rb ³⁵ is alkyl (preferably carbon number 1-24, more preferably 1-12, and further preferably 3-8), alkenyl (preferably carbon number 2-12, more preferably 2-10, 3-8 is further preferred), aryl (carbon number 6-22 is preferred, 6-18 is more preferred, 6-12 is further preferred), arylalkyl (carbon number 7-23 is preferred) , 7-19 are more preferable, 7-12 are further preferable), aryl group is preferable.

It is also preferable that the compound represented by the formula (B1-1) is the compound represented by the formula (B1-1a). [Chemical formula 63]

Rb ¹¹ and Rb ¹² have the same meanings as Rb ¹¹ and Rb ¹² in formula (B1-1). Rb ¹⁵ and Rb ¹⁶ are hydrogen atoms, alkyl groups (preferably having 1 to 12 carbon atoms, more preferably 1 to 6, and even more preferably 1 to 3), alkenyl (preferably having 2 to 12 carbon atoms, and 2 ～6 is better, 2-3 is further better), aryl (carbon number is 6-22 is better, 6-18 is better, 6-10 is further better), arylalkyl (carbon number is better) 7-23 are preferable, 7-19 are more preferable, 7-11 are further preferable), hydrogen atom or methyl group is preferable. Rb ¹⁷ is an alkyl group (preferably carbon number 1-24, more preferably 1-12, and further preferably 3-8), alkenyl (preferably carbon number 2-12, more preferably 2-10, 3-8 is further preferred), aryl (carbon number 6-22 is preferred, 6-18 is more preferred, 6-12 is further preferred), arylalkyl (carbon number 7-23 is preferred) , 7-19 are more preferable, 7-12 are further preferable), among which aryl group is preferable.

The molecular weight of the nonionic thermal alkali generator is preferably 800 or less, more preferably 600 or less, and even more preferably 500 or less. The lower limit is preferably 100 or more, more preferably 200 or more, and even more preferably 300 or more.

The following compounds can be mentioned as a specific example of a compound which is a thermal base generator among the above-mentioned onium salts or a specific example of a thermal base generator other than the above-mentioned onium salt.

[Chemical formula 64]

[Chemical formula 65]

[Chemical formula 66]

The content of the thermal alkali generator is preferably 0.1 to 50 mass % with respect to the total solid content of the photosensitive resin composition of the present invention. The lower limit is more preferably 0.5 mass % or more, and even more preferably 1 mass % or more. The upper limit is more preferably 30 mass % or less, and even more preferably 20 mass % or less. One type or two or more types of thermal alkali generators can be used. When using 2 or more types, it is preferable that the total amount is in the said range.

＜Crosslinking agent＞ It is preferable that the photosensitive resin composition of this invention contains a crosslinking agent. As a crosslinking agent, a radical crosslinking agent and other crosslinking agents are mentioned.

<Radical crosslinking agent> It is preferable that the photosensitive resin composition of this invention further contains a radical crosslinking agent. The radical crosslinking agent is a compound having a radically polymerizable group. The radically polymerizable group is preferably a group containing an ethylenically unsaturated bond. As a group containing the said ethylenically unsaturated bond, the group which has an ethylenically unsaturated bond, such as a vinyl group, an allyl group, a vinylphenyl group, a (meth)acryloyl group, is mentioned. Among these, as the group containing the above-mentioned ethylenically unsaturated bond, a (meth)acryloyl group is preferable, and a (meth)acryloyl group is more preferable from the viewpoint of reactivity.

The radical crosslinking agent should just be a compound which has one or more ethylenically unsaturated bonds, and a compound which has two or more is more preferable. The compound having two ethylenically unsaturated bonds is preferably a compound having two of the above-mentioned groups containing an ethylenically unsaturated bond. Moreover, it is preferable that the photosensitive resin composition of this invention contains the compound which has 3 or more of ethylenically unsaturated bonds as a radical crosslinking agent from a viewpoint of the film strength of the obtained pattern (cured film). As the above-mentioned compound having 3 or more ethylenically unsaturated bonds, a compound having 3 to 15 ethylenically unsaturated bonds is preferable, a compound having 3 to 10 ethylenically unsaturated bonds is more preferable, and a compound having 3 to 15 ethylenically unsaturated bonds is more preferable. The compound of 6 is more preferable. In addition, the compound having 3 or more ethylenically unsaturated bonds is preferably a compound having 3 or more groups containing the ethylenically unsaturated bond, more preferably 3 to 15, and 3 or more Compounds with ∼10 pieces are more preferable, and compounds with 3 to 6 pieces are particularly preferable. Moreover, from the viewpoint of the film strength of the obtained pattern (cured film), the photosensitive resin composition of the present invention contains a compound having two ethylenically unsaturated bonds and a compound having three or more ethylenically unsaturated bonds. Compounds are also preferred.

The molecular weight of the radical crosslinking agent is preferably 2,000 or less, more preferably 1,500 or less, and even more preferably 900 or less. The lower limit of the molecular weight of the radical crosslinking agent is preferably 100 or more.

Specific examples of the radical crosslinking agent include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.) or esters thereof, amides The amines are preferably esters of unsaturated carboxylic acids and polyol compounds, and amides of unsaturated carboxylic acids and polyamine compounds. In addition, unsaturated carboxylic acid esters or amides with nucleophilic substituents such as hydroxyl groups, amine groups, and sulfanyl groups, and monofunctional or polyfunctional isocyanates or epoxy groups can also be preferably used. The addition reactant, or the dehydration condensing reactant with monofunctional or polyfunctional carboxylic acid, etc. In addition, the addition of unsaturated carboxylates or amides having electron-withdrawing substituents such as isocyanate groups or epoxy groups to monofunctional or polyfunctional alcohols, amines, and thiols can also be preferably used. Reactants, as well as unsaturated carboxylic acid esters or amides with detachable substituents such as halogeno group or tosyloxy group and monofunctional or polyfunctional alcohols, amines, Substitution reactants of thiols. In addition, as another example, a compound group substituted with vinylbenzene derivatives such as unsaturated phosphonic acid and styrene, vinyl ether, and allyl ether can also be used in place of the above-mentioned unsaturated carboxylic acid. As a specific example, reference can be made to the descriptions of paragraphs 0113 to 0122 of JP 2016-027357 A, which are incorporated in the present specification.

In addition, it is also preferable that the radical crosslinking agent is a compound having a boiling point of 100° C. or higher under normal pressure. Examples of this include adding ethylene oxide or propylene oxide to polyethylene glycol di(meth)acrylate, trimethylolethane tri(meth)acrylate, and neopentyl glycol di(meth)acrylate. (Meth)acrylate, Neopentaerythritol tri(meth)acrylate, Neotaerythritol tetra(meth)acrylate, Dipivalerythritol penta(meth)acrylate, Dipivalerythritol hexa (Meth)acrylate, Hexylene glycol (meth)acrylate, Trimethylolpropane tris(acrylooxypropyl)ether, tris(acrylooxyethyl)isocyanurate, glycerin or trihydroxy Compounds that have been (meth)acrylated on polyfunctional alcohols such as methyl ethane, such as Japanese Patent Publication No. 48-041708, Japanese Patent Publication No. 50-006034, and Japanese Patent Publication No. 51-037193. Urethane (meth)acrylates described in the gazettes, polyesters described in Japanese Patent Laid-Open No. 48-064183, Japanese Patent Laid-Open No. 49-043191, and Japanese Patent Laid-Open No. 52-030490 Acrylates, polyfunctional acrylates such as epoxy acrylates, which are reaction products of epoxy resins and (meth)acrylic acid, or methacrylates, and mixtures thereof. In addition, compounds described in paragraphs 0254 to 0257 of JP-A-2008-292970 are also preferred. Moreover, polyfunctional (meth)acrylate etc. obtained by making a compound which has a cyclic ether group and an ethylenically unsaturated bond, such as glycidyl (meth)acrylate, react with a polyfunctional carboxylic acid are also mentioned.

In addition, as a preferable radical crosslinking agent other than the above-mentioned ones, those having a pyrene ring described in Japanese Patent Laid-Open No. 2010-160418, Japanese Patent Laid-Open No. 2010-129825, Japanese Patent No. 4364216 and the like can also be used A compound or cardo resin having two or more ethylenically unsaturated bond-containing groups.

In addition, as other examples, specific unsaturated compounds described in Japanese Patent Publication No. 46-043946, Japanese Patent Publication No. 01-040337, and Japanese Patent Publication No. 01-040336, or Japanese Patent Publication No. Hei 02 can also be cited. - Vinylphosphonic acid-based compounds and the like described in Gazette No. 025493. Moreover, the compound containing a perfluoroalkyl group described in Unexamined-Japanese-Patent No. 61-022048 can also be used. In addition, those introduced as photopolymerizable monomers and oligomers in the Journal of Adhesion Association of Japan, vol. 20, No. 7, pp. 300 to 308 (1984) can also be used.

In addition to the above, the compounds described in paragraphs 0048 to 0051 of JP 2015-034964 A and the compounds described in paragraphs 0087 to 0131 of International Publication No. 2015/199219 can also be preferably used. incorporated into this manual.

In addition, as described in Japanese Patent Laid-Open No. 10-062986 as formula (1) and formula (2) together with specific examples thereof, ethylene oxide or propylene oxide was added to a polyfunctional alcohol, and then ( Meth)acrylated compounds can also be used as free-radical crosslinkers.

In addition, the compounds described in paragraphs 0104 to 0131 of JP 2015-187211 A can also be used as a radical crosslinking agent, and these contents are incorporated in the present specification.

As the radical crosslinking agent, dipeotaerythritol triacrylate (available as a commercial item: KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipeotaerythritol tetraacrylate (available as a commercial item as KAYARAD D-320; Nippon Kayaku Co., Ltd., A-TMMT: Shin-Nakamura Chemical Co., Ltd. -310; manufactured by Nippon Kayaku Co., Ltd.), dipivaloerythritol hexa(meth)acrylate (commercially available as KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., A-DPH; Shin-Nakamura Chemical Co., Ltd.) and a structure in which these (meth)acryloyl groups are bonded via ethylene glycol residues or propylene glycol residues is preferable. These oligomeric forms can also be used.

Commercially available products of the radical crosslinking agent include, for example, SR-494 manufactured by Sartomer Company, Inc. as a tetrafunctional acrylate having four ethoxy-extended chains, and as a tetrafunctional acrylate having four ethoxy-extended chains SR-209, 231, 239 manufactured by Sartomer Company, Inc., a bifunctional methacrylate, DPCA-60, a hexafunctional acrylate having 6 pentenoxy chains, manufactured by Nippon Kayaku Co., Ltd. , TPA-330 as trifunctional acrylate having 3 isobutenyloxy chains, urethane oligomer UAS-10, UAB-140 (manufactured by Nippon Paper Industries Co., Ltd.), NK Ester M- 40G, NK Ester 4G, NK Ester M-9300, NK Ester A-9300, UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA- 306H, UA-306T, UA-306I, AH-600, T-600, AI-600 (manufactured by Kyoeisha Chemical Co., Ltd.), BLEMMER PME400 (manufactured by NOF CORPORATION), etc.

As a radical crosslinking agent, for example, the aminomethyl group described in Japanese Patent Publication No. 48-041708, Japanese Patent Publication No. 51-037193, Japanese Patent Publication No. 02-032293, and Japanese Patent Publication No. 02-016765 Acrylic acid esters, ethylene oxides described in Japanese Patent Publication No. 58-049860, Japanese Patent Publication No. 56-017654, Japanese Patent Publication No. 62-039417, and Japanese Patent Publication No. 62-039418 The urethane compounds of the backbone are also preferred. In addition, as the radical crosslinking agent, those described in Japanese Patent Laid-Open No. 63-277653, Japanese Patent Laid-Open No. 63-260909, and Japanese Patent Laid-Open No. Hei 01-105238 having an amino group in the molecule can also be used. Compounds of structure or sulfide structure.

The free-radical cross-linking agent may also be a free-radical cross-linking agent having an acid group such as a carboxyl group and a phosphoric acid group. The free-radical crosslinking agent with an acid group is preferably an ester of an aliphatic polyhydroxy compound and an unsaturated carboxylic acid, and a non-aromatic carboxylic acid anhydride reacts with the unreacted hydroxyl group of the aliphatic polyhydroxy compound to have an acid group. Free radical crosslinking agents are more preferred. Particularly preferably, in a radical crosslinking agent having an acid group by reacting a non-aromatic carboxylic acid anhydride with an unreacted hydroxyl group of an aliphatic polyhydroxy compound, the aliphatic polyhydroxy compound is neopentylerythritol or dipivale. Compounds of tetraols. As a commercial item, M-510, M-520 etc. are mentioned as a polybasic acid-modified acrylic oligomer by TOAGOSEI CO., LTD., for example.

The preferred acid value of the free radical crosslinking agent having an acid group is 0.1-40 mgKOH/g, particularly preferably 5-30 mgKOH/g. When the acid value of the radical crosslinking agent is within the above-mentioned range, workability in production is excellent, and furthermore, developability is excellent. In addition, the polymerizability was good. On the other hand, the acid value of the radical crosslinking agent having an acid group is preferably 0.1 to 300 mgKOH/g, particularly preferably 1 to 100 mgKOH/g, from the viewpoint of the development speed during alkali development. The above acid value is measured according to the description of JIS K 0070:1992.

From the viewpoint of the resolution of a pattern and the stretchability of the film, it is preferable to use a bifunctional methacrylate or acrylate for the photosensitive resin composition of the present invention. As specific compounds, triethylene glycol diacrylate, triethylene glycol dimethacrylate, tetraethylene glycol dimethacrylate, tetraethylene glycol diacrylate, PEG200 diacrylate, PEG200 diacrylate can be used Methacrylate, PEG600 Diacrylate, PEG600 Dimethacrylate, Polytetraethylene Glycol Diacrylate, Polytetraethylene Glycol Dimethacrylate, Neopentyl Glycol Diacrylate, Neopentyl Glycol Diacrylate methacrylate, 3-methyl-1,5-pentanediol diacrylate, 1,6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, dimethylol-triacrylate Cyclodecane diacrylate, dimethylol-tricyclodecane dimethacrylate, EO adduct diacrylate of bisphenol A, EO adduct dimethacrylate of bisphenol A, bisphenol PO adduct diacrylate of A, PO adduct dimethacrylate of bisphenol A, 2-hydroxy-3-acryloyloxypropyl methacrylate, EO modified diacrylic acid of isocyanurate Esters, isocyanuric acid-modified dimethacrylates, and bifunctional acrylates with urethane bonds, and bifunctional methacrylates with urethane bonds. These can be mixed and used 2 or more types as needed. Moreover, as a radical crosslinking agent, a monofunctional radical crosslinking agent can be used suitably from a viewpoint of suppressing the curvature accompanying the elastic modulus control of a pattern (cured film). As the monofunctional radical crosslinking agent, n-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, (meth)acrylate can be preferably used Butoxyethyl acrylate, carbitol (meth)acrylate, cyclohexyl (meth)acrylate, benzyl (meth)acrylate, phenoxyethyl (meth)acrylate, N-methylol (Meth)acrylic acid derivatives such as (meth)acrylamide, glycidyl (meth)acrylate, polyethylene glycol mono(meth)acrylate, polypropylene glycol mono(meth)acrylate, N-ethylene N-vinyl compounds such as pyrrolidone and N-vinyl caprolactam, allyl compounds such as allyl glycidyl ether, diallyl phthalate, triallyl trimellitate, etc. class etc. As the monofunctional radical crosslinking agent, in order to suppress volatilization before exposure, a compound having a boiling point of 100° C. or higher under normal pressure is also preferred.

When a radical crosslinking agent is contained, it is preferable that the content exceeds 0 mass % and 60 mass % or less with respect to the total solid content of the photosensitive resin composition of this invention. The lower limit is more preferably 5 mass % or more. The upper limit is more preferably 50 mass % or less, and even more preferably 30 mass % or less.

A radical crosslinking agent may be used individually by 1 type, and may mix and use 2 or more types. When using 2 or more types together, it is preferable that the total amount is the said range.

<Other crosslinking agents> It is also preferable that the photosensitive resin composition of the present invention contains another crosslinking agent different from the above-mentioned radical crosslinking agent. In the present invention, the other crosslinking agent refers to a crosslinking agent other than the above-mentioned radical crosslinking agent, and has a plurality of other compounds in the molecule or their reaction products which are promoted in the composition by the sensitivity of the above-mentioned photosensitizer. The compound of the group that forms a covalent bond between the reaction groups is preferably, and has a plurality of compounds in the molecule that promote the formation of covalent bonds between other compounds in the composition or their reaction products by the action of an acid or a base. Compounds of reactive groups are preferred. The above acid or base is preferably an acid or base generated from a photoacid generator or a photobase generator as a photosensitive agent in the exposure process. As other cross-linking agents, compounds having at least one group selected from the group consisting of methylol and alkoxymethyl are preferred, and compounds having at least one group selected from the group including methylol and alkoxymethyl are preferred. A compound having a structure in which at least one group in the group is directly bonded to a nitrogen atom is more preferable. As another crosslinking agent, for example, a compound having an amine group such as formaldehyde or formaldehyde and alcohol reacted with melamine, acetylene urea, urea, alkylene urea, benzoguanamine, etc., and a methylol or alkoxyl group can be used. A compound in which the hydrogen atom of the above-mentioned amine group is substituted with a methyl group. The production method of these compounds is not particularly limited, as long as it is a compound having the same structure as the compound produced by the above-mentioned method. Moreover, the oligomer in which the methylol groups of these compounds are self-condensed may be sufficient. The cross-linking agent using melamine as the above-mentioned amine group-containing compound is called melamine-based cross-linking agent, and the cross-linking agent using glycoluril, urea or alkylene urea is called urea-based cross-linking agent. The crosslinking agent of alkylene urea is called alkylene urea type crosslinking agent, and the crosslinking agent using benzoguanamine is called benzoguanamine type crosslinking agent. Among these, the photosensitive resin composition of the present invention preferably contains at least one compound selected from the group consisting of a urea-based crosslinking agent and a melamine-based crosslinking agent, and preferably contains at least one compound selected from the group consisting of glycoluril described later At least one compound in the group of a crosslinking agent and a melamine-based crosslinking agent is more preferable.

Specific examples of the melamine-based crosslinking agent include hexamethoxymethyl melamine, hexaethoxymethyl melamine, hexapropoxymethyl melamine, hexabutoxybutyl melamine, and the like.

Specific examples of the urea-based crosslinking agent include, for example, monohydroxymethylated acetylene carbamide, dihydroxymethylated acetylene carbamide, trihydroxymethylated acetylene carbamide, tetrahydroxymethylated acetylene carbamide, and monomethoxy methoxymethylated acetylene carbamide, dimethoxymethylated acetylene carbamide, trimethoxymethylated acetylene carbamide, tetramethoxymethylated acetylene carbamide, monoethoxymethylated acetylene carbamide, diethoxy Methylated acetylene carbamide, triethoxymethylated acetylene carbamide, tetraethoxymethylated acetylene carbamide, monopropoxymethylated acetylene carbamide, dipropoxymethylated acetylene carbamide, tripropoxymethylated acetylene carbamide Methylated acetylene carbamide, tetrapropoxymethylated acetylene carbamide, monobutoxymethylated acetylene carbamide, dibutoxymethylated acetylene carbamide, tributoxymethylated acetylene carbamide, or tetrabutoxymethylated acetylene carbamide Acetylene carbamide crosslinking agents such as methylated acetylene carbamide, Urea-based crosslinking agents such as bismethoxymethyl urea, bisethoxymethyl urea, bispropoxymethyl urea, bisbutoxymethyl urea, etc., Monohydroxymethylated ethyl urea or dihydroxymethylated ethyl urea, monomethoxymethylated ethyl urea, dimethoxymethylated ethyl urea, monoethoxymethylated ethyl urea , diethoxymethylated ethyl urea, monopropoxymethylated ethyl urea, dipropoxymethylated ethyl urea, monobutoxymethylated ethyl urea or dibutoxymethyl ethyl urea Ethyl urea and other ethyl urea crosslinking agents, Monohydroxymethylated propylene glycol, dihydroxymethylated propylene glycol, monomethoxymethylated propylene glycol, dimethoxymethylated propylene glycol , diethoxymethylated propylene urea, monopropoxymethylated propylene urea, dipropoxymethylated propylene urea, monobutoxymethylated propylene urea, or dibutoxymethyl propylene urea Propylene urea based crosslinking agent such as propylene propylene urea, 1,3-bis(methoxymethyl)4,5-dihydroxy-2-imidazolidinone, 1,3-bis(methoxymethyl)-4,5-dimethoxy-2-imidazole pyridone etc.

Specific examples of the benzoguanamine-based crosslinking agent include, for example, monohydroxymethylated benzoguanamine, dihydroxymethylated benzoguanamine, trihydroxymethylated benzoguanamine, and tetrahydroxymethylated benzoguanamine. Methylated benzoguanamine, monomethoxymethylated benzoguanamine, dimethoxymethylated benzoguanamine, trimethoxymethylated benzoguanamine, tetramethoxymethylated benzene guanamine, monoethoxymethylated benzoguanamine, diethoxymethylated benzoguanamine, triethoxymethylated benzoguanamine, tetraethoxymethylated benzoguanamine Amine, monopropoxymethylated benzoguanamine, dipropoxymethylated benzoguanamine, tripropoxymethylated benzoguanamine, tetrapropoxymethylated benzoguanamine, Monobutoxymethylated benzoguanamine, dibutoxymethylated benzoguanamine, tributoxymethylated benzoguanamine, tetrabutoxymethylated benzoguanamine, etc.

In addition, as a compound having at least one group selected from the group consisting of methylol and alkoxymethyl, those selected from the group consisting of methylol and alkoxymethyl can also be preferably used. A compound in which at least one group in the group is directly bonded to an aromatic ring (preferably a benzene ring). Specific examples of such compounds include benzenedimethanol, bis(hydroxymethyl)cresol, bis(hydroxymethyl)dimethoxybenzene, bis(hydroxymethyl)diphenyl ether, and bis(hydroxymethyl) base) benzophenone, hydroxymethylphenyl hydroxymethylbenzoate, bis(hydroxymethyl)biphenyl, dimethylbis(hydroxymethyl)biphenyl, bis(methoxymethyl)benzene, bis(methoxymethyl)biphenyl (Methoxymethyl)cresol, bis(methoxymethyl)dimethoxybenzene, bis(methoxymethyl)diphenyl ether, bis(methoxymethyl)benzophenone, methyl Methoxymethylphenyl oxymethylbenzoate, bis(methoxymethyl)biphenyl, dimethylbis(methoxymethyl)biphenyl, 4,4',4''-ethylene yltris[2,6-bis(methoxymethyl)phenol], 5,5'-[2,2,2-trifluoro-1-(trifluoromethyl)ethylene]bis[2-hydroxyl -1,3-benzenedimethanol], 3,3',5,5'-tetrakis(methoxymethyl)-1,1'-biphenyl-4,4'-diol, etc.

As other crosslinking agents, commercially available products can also be used, and preferable ones include 46DMOC, 46DMOEP (the above are manufactured by ASAHI YUKIZAI CORPORATION), DML-PC, DML-PEP, DML-OC, DML- OEP, DML-34X, DML-PTBP, DML-PCHP, DML-OCHP, DML-PFP, DML-PSBP, DML-POP, DML-MBOC, DML-MBPC, DML-MTrisPC, DML-BisOC-Z, DML- BisOCHP-Z, DML-BPC, DMLBisOC-P, DMOM-PC, DMOM-PTBP, DMOM-MBPC, TriML-P, TriML-35XL, TML-HQ, TML-BP, TML-pp-BPF, TML-BPE, TML-BPA, TML-BPAF, TML-BPAP, TMOM-BP, TMOM-BPE, TMOM-BPA, TMOM-BPAF, TMOM-BPAP, HML-TPPHBA, HML-TPHAP, HMOM-TPPHBA, HMOM-TPHAP (the above are Honshu Chemical Industry Co., Ltd.), NIKARAC (registered trademark, the same below) MX-290, NIKARAC MX-280, NIKARAC MX-270, NIKARAC MX-279, NIKARAC MW-100LM, NIKARAC MX-750LM (the above are manufactured by Sanwa Chemical Co., Ltd.), etc.

Moreover, it is also preferable that the photosensitive resin composition of this invention contains at least 1 compound chosen from the group which consists of an epoxy compound, an oxetane compound, and a benzodiazepine compound as another crosslinking agent.

[Epoxy compound (a compound having an epoxy group)] As an epoxy compound, the compound which has two or more epoxy groups in 1 molecule is preferable. The epoxy group undergoes a cross-linking reaction at 200° C. or lower, and does not generate a dehydration reaction derived from the cross-linking, so film shrinkage is unlikely to occur. Therefore, containing an epoxy compound is effective for the suppression of low-temperature hardening and warpage of the photosensitive resin composition.

The epoxy compound preferably contains a polyethylene oxide group. Thereby, the elastic modulus is further reduced, and the warpage can be suppressed. The polyethylene oxide group refers to those having 2 or more repeating units of ethylene oxide, and preferably 2 to 15 repeating units.

Examples of epoxy compounds include bisphenol A type epoxy resin; bisphenol F type epoxy resin; propylene glycol diglycidyl ether, neopentyl glycol diglycidyl ether, ethylene glycol diglycidyl ether, butylene glycol Glycol diglycidyl ether, hexamethylene glycol diglycidyl ether, trimethylolpropane triglycidyl ether and other alkylene glycol type epoxy resins or polyol hydrocarbon type epoxy resins; polypropylene glycol diglycidyl Polyalkylene glycol type epoxy resins such as glycerol ethers; epoxy-containing silicones such as polymethyl(glycidoxypropyl)siloxane, etc., but not limited to these. Specifically, EPICLON (registered trademark) 850-S, EPICLON (registered trademark) HP-4032, EPICLON (registered trademark) HP-7200, EPICLON (registered trademark) HP-820, EPICLON (registered trademark) HP- 4700, EPICLON (registered trademark) EXA-4710, EPICLON (registered trademark) HP-4770, EPICLON (registered trademark) EXA-859CRP, EPICLON (registered trademark) EXA-1514, EPICLON (registered trademark) EXA-4880, EPICLON (registered trademark) trademark) EXA-4850-150, EPICLON (registered trademark) EXA-4850-1000, EPICLON (registered trademark) EXA-4816, EPICLON (registered trademark) EXA-4822, EPICLON (registered trademark) EXA-830LVP, EPICLON (registered trademark) ) EXA-8183, EPICLON (registered trademark) EXA-8169, EPICLON (registered trademark) N-660, EPICLON (registered trademark) N-665-EXP-S, EPICLON (registered trademark) N-740, Rika Resin (registered trademark) ) BEO-20E (the above are trade names, manufactured by DIC Corporation), Rika Resin (registered trademark) BEO-60E, Rika Resin (registered trademark) HBE-100, Rika Resin (registered trademark) DME-100, Rika Resin (registered trademark) ) L-200 (trade name, manufactured by New Japan Chemical Co., Ltd.), EP-4003S, EP-4000S, EP-4088S, EP-3950S (the above are trade names, manufactured by ADEKA CORPORATION), CELLOXIDE (registered trademark) 2021P, 2081, 2000, 3000, EHPE3150, EPOLEAD (registered trademark) GT400, CELVENUS (registered trademark) B0134, B0177 (the above are trade names, manufactured by Daicel Corporation), NC-3000, NC-3000-L, NC-3000- H, NC-3000-FH-75M, NC-3100, CER-3000-L, NC-2000-L, XD-1000, NC-7000L, NC-7300L, EPPN-501H, EPPN-501HY, EPPN-502H, EOCN-1020, EOCN-102S, EOCN-103S, EOCN-104S, CER-1020, EPPN-201, B REN-S, BREN-10S (the above are trade names, manufactured by Nippon Kayaku Co., Ltd.), etc.

[Oxetane compound (oxetanyl compound)] Examples of the oxetane compound include compounds having two or more oxetane rings in one molecule, 3-ethyl-3-hydroxymethyl oxetane, 1,4-bis{ [(3-ethyl-3-oxetanyl)methoxy]methyl}benzene, 3-ethyl-3-(2-ethylhexylmethyl)oxetane, 1,4-benzene Dicarboxylic acid-bis[(3-ethyl-3-oxetanyl)methyl]ester, etc. As a specific example, ARON OXETANE series (for example, OXT-121, OXT-221, OXT-191, OXT-223) manufactured by TOAGOSEI CO., LTD. can be preferably used, and these can be used alone or in combination of two or more .

[Benzoxazole compounds (compounds with a benzoxazolyl group)] The benzodiazepine compound is preferable because the crosslinking reaction originating from the ring-opening addition reaction does not cause outgassing during curing, and further reduces thermal shrinkage and suppresses warpage.

Preferable examples of benzodiazepine compounds include Ba-type benzodiazepines, Bm-type benzodiazepines, Pd-type benzodiazepines, and Fa-type benzodiazepines (the above are trade names, SHIKOKU CHEMICALS CORPORATION Manufacture), benzos adducts of polyhydroxy styrene resins, and phenol novolac-type dihydrobenzos. These can be used individually or in mixture of 2 or more types.

The content of other crosslinking agents is preferably 0.1 to 30% by mass, more preferably 0.1 to 20% by mass, and even more preferably 0.5 to 15% by mass relative to the total solid content of the photosensitive resin composition of the present invention, 1.0-10 mass % is especially preferable. The other crosslinking agent may be contained only by one type, or may contain two or more types. When two or more types of other crosslinking agents are contained, the total is preferably within the above range.

<Compounds with Sulfonamide Structure and Compounds with Thiourea Structure> From the viewpoint of improving the adhesiveness to the base material of the obtained pattern (cured film), the photosensitive resin composition of the present invention further contains a compound selected from the group consisting of a compound having a sulfonamide structure and a compound having a thiourea structure. At least one compound from the group is preferred.

在式（S-1）中，R表示氫原子或有機基團，R可以與其他結構鍵結而形成環結構，*分別獨立地表示與其他結構的鍵結部位。 上述R係與下述式（S-2）中的R² 相同的基團為較佳。 具有磺醯胺結構之化合物可以為具有2個以上磺醯胺結構之化合物，具有1個以上磺醯胺結構之化合物為較佳。[Compound having a sulfonamide structure] The sulfonamide structure is a structure represented by the following formula (S-1). [Chemical formula 67]

In formula (S-1), R represents a hydrogen atom or an organic group, R may be bonded to other structures to form a ring structure, and * each independently represents a bonding site to other structures. The above R is preferably the same group as R ² in the following formula (S-2). The compound having a sulfonamide structure may be a compound having two or more sulfonamide structures, and a compound having one or more sulfonamide structures is preferred.

在式（S-2）中，R¹ 、R² 及R³ 分別獨立地表示氫原子或1價有機基團，R¹ 、R² 及R³ 中的2個以上可以相互鍵結而形成環結構。 R¹ 、R² 及R³ 分別獨立地表示1價有機基團為較佳。 作為R¹ 、R² 及R³ 的例子，可以舉出氫原子或烷基、環烷基、烷氧基、烷基醚基、烷基甲矽烷基、烷氧基甲矽烷基、芳基、芳基醚基、羧基、羰基、烯丙基、乙烯基、雜環基、或者將該等組合2個以上之基團等。 作為上述烷基，碳數1～10的烷基為較佳，碳數1～6的烷基為更佳。作為上述烷基，例如，可以舉出甲基、乙基、丙基、丁基、戊基、己基、異丙基、2-乙基己基等。 作為上述環烷基，碳數5～10的環烷基為較佳，碳數6～10的環烷基為更佳。作為上述環烷基，例如，可以舉出環丙基、環丁基、環戊基及環己基等。 作為上述烷氧基，碳數1～10的烷氧基為較佳，碳數1～5的烷氧基為更佳。作為上述烷氧基，可以舉出甲氧基、乙氧基、丙氧基、丁氧基及戊氧基等。 作為上述烷氧基甲矽烷基，碳數1～10的烷氧基甲矽烷基為較佳，碳數1～4的烷氧基甲矽烷基為更佳。作為上述烷氧基甲矽烷基，可以舉出甲氧基甲矽烷基、乙氧基甲矽烷基、丙氧基甲矽烷基及丁氧基甲矽烷基等。 作為上述芳基，碳數6～20的芳基為較佳，碳數6～12的芳基為更佳。上述芳基可具有烷基等取代基。作為上述芳基，可以舉出苯基、甲苯基、二甲苯基及萘基等。 作為上述雜環基，可以舉出從三唑環、吡咯環、呋喃環、噻吩環、咪唑環、㗁唑環、噻唑環、吡唑環、異㗁唑環、異噻唑環、四唑環、吡啶環、嗒𠯤環、嘧啶環、吡𠯤環、哌啶環、哌𠯤環、嗎啉環、二氫哌喃環、四氫哌喃環、三𠯤環等雜環結構去除1個氫原子之基團等。The compound having a sulfonamide structure is preferably a compound represented by the following formula (S-2). [Chemical formula 68]

In formula (S-2), R ¹ , R ² and R ³ each independently represent a hydrogen atom or a monovalent organic group, and two or more of R ¹ , R ² and R ³ may be bonded to each other to form a ring structure. It is preferable that R ¹ , R ² and R ³ each independently represent a monovalent organic group. Examples of R ¹ , R ² and R ³ include a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, an alkyl ether group, an alkylsilyl group, an alkoxysilyl group, an aryl group, An aryl ether group, a carboxyl group, a carbonyl group, an allyl group, a vinyl group, a heterocyclic group, or a group combining two or more of these, and the like. As the above-mentioned alkyl group, an alkyl group having 1 to 10 carbon atoms is preferable, and an alkyl group having 1 to 6 carbon atoms is more preferable. As said alkyl group, a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, an isopropyl group, 2-ethylhexyl group etc. are mentioned, for example. As the cycloalkyl group, a cycloalkyl group having 5 to 10 carbon atoms is preferable, and a cycloalkyl group having 6 to 10 carbon atoms is more preferable. As said cycloalkyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, etc. are mentioned, for example. As the alkoxy group, an alkoxy group having 1 to 10 carbon atoms is preferable, and an alkoxy group having 1 to 5 carbon atoms is more preferable. As said alkoxy group, a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, etc. are mentioned. As the alkoxysilyl group, an alkoxysilyl group having 1 to 10 carbon atoms is preferable, and an alkoxysilyl group having 1 to 4 carbon atoms is more preferable. As said alkoxysilyl group, a methoxysilyl group, an ethoxysilyl group, a propoxysilyl group, a butoxysilyl group, etc. are mentioned. As the aryl group, an aryl group having 6 to 20 carbon atoms is preferable, and an aryl group having 6 to 12 carbon atoms is more preferable. The above-mentioned aryl group may have a substituent such as an alkyl group. As said aryl group, a phenyl group, a tolyl group, a xylyl group, a naphthyl group, etc. are mentioned. Examples of the above-mentioned heterocyclic group include a triazole ring, a pyrrole ring, a furan ring, a thiophene ring, an imidazole ring, an oxazole ring, a thiazole ring, a pyrazole ring, an isoxazole ring, an isothiazole ring, a tetrazole ring, One hydrogen atom is removed from heterocyclic structures such as pyridine ring, pyridine ring, pyrimidine ring, pyridine ring, piperidine ring, piperidine ring, morpholine ring, dihydropyran ring, tetrahydropyran ring, triscal ring, etc. group, etc.

Among these, compounds in which R ¹ is an aryl group and R ² and R ³ are each independently a hydrogen atom or an alkyl group are preferred.

Examples of compounds having a sulfonamide structure include benzenesulfonamide, dimethylbenzenesulfonamide, N-butylbenzenesulfonamide, sulfonamide, o-toluenesulfonamide, p-toluenesulfonamide, Hydroxynaphthylsulfonamide, naphthyl-1-sulfonamide, naphthyl-2-sulfonamide, m-nitrobenzenesulfonamide, p-chlorobenzenesulfonamide, methanesulfonamide, N,N-di Methylmethanesulphonamide, N,N-Dimethylethanesulphonamide, N,N-Diethylmethanesulphonamide, N-Methoxymethanesulphonamide, N-Dodecylmethanesulphonamide amine, N-cyclohexyl-1-butanesulfonamide, 2-aminoethanesulfonamide, etc.

在式（T-1）中，R⁴ 及R⁵ 分別獨立地表示氫原子或1價有機基團，R⁴ 及R⁵ 可以鍵結而形成環結構，R⁴ 可以與*所鍵結之其他結構鍵結而形成環結構，R⁵ 可以與*所鍵結之其他結構鍵結而形成環結構，*分別獨立地表示與其他結構的鍵結部位。[Compound having a thiourea structure] The thiourea structure is a structure represented by the following formula (T-1). [Chemical formula 69]

In formula (T-1), R ⁴ and R ⁵ each independently represent a hydrogen atom or a monovalent organic group, R ⁴ and R ⁵ may be bonded to form a ring structure, and R ⁴ may be bonded to other * The structure is bonded to form a ring structure, and R ⁵ may be bonded to other structures to which * is bonded to form a ring structure, and * each independently represents a bonding site with other structures.

Preferably, R ⁴ and R ⁵ are each independently a hydrogen atom. Examples of R ⁴ and R ⁵ include a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, an alkyl ether group, an alkylsilyl group, an alkoxysilyl group, an aryl group, and an aryl ether group. group, carboxyl group, carbonyl group, allyl group, vinyl group, heterocyclic group, or a combination of two or more of these. As the above-mentioned alkyl group, an alkyl group having 1 to 10 carbon atoms is preferable, and an alkyl group having 1 to 6 carbon atoms is more preferable. As said alkyl group, a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, an isopropyl group, 2-ethylhexyl group etc. are mentioned, for example. As the cycloalkyl group, a cycloalkyl group having 5 to 10 carbon atoms is preferable, and a cycloalkyl group having 6 to 10 carbon atoms is more preferable. As said cycloalkyl group, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, etc. are mentioned, for example. As the alkoxy group, an alkoxy group having 1 to 10 carbon atoms is preferable, and an alkoxy group having 1 to 5 carbon atoms is more preferable. As said alkoxy group, a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, etc. are mentioned. As the alkoxysilyl group, an alkoxysilyl group having 1 to 10 carbon atoms is preferable, and an alkoxysilyl group having 1 to 4 carbon atoms is more preferable. As said alkoxysilyl group, a methoxysilyl group, an ethoxysilyl group, a propoxysilyl group, a butoxysilyl group, etc. are mentioned. As the aryl group, an aryl group having 6 to 20 carbon atoms is preferable, and an aryl group having 6 to 12 carbon atoms is more preferable. The above-mentioned aryl group may have a substituent such as an alkyl group. As said aryl group, a phenyl group, a tolyl group, a xylyl group, a naphthyl group, etc. are mentioned. Examples of the above-mentioned heterocyclic group include a triazole ring, a pyrrole ring, a furan ring, a thiophene ring, an imidazole ring, an oxazole ring, a thiazole ring, a pyrazole ring, an isoxazole ring, an isothiazole ring, a tetrazole ring, One hydrogen atom is removed from heterocyclic structures such as pyridine ring, pyridine ring, pyrimidine ring, pyridine ring, piperidine ring, piperidine ring, morpholine ring, dihydropyran ring, tetrahydropyran ring, triscal ring, etc. group, etc. The compound having a thiourea structure may be a compound having two or more thiourea structures, but a compound having one thiourea structure is preferred.

在式（T-2）中，R⁴ ～R⁷ 分別獨立地表示氫原子或1價有機基團，R⁴ ～R⁷ 中的至少2個可以相互鍵結而形成環結構。The compound having a thiourea structure is preferably a compound represented by the following formula (T-2). [Chemical formula 70]

In formula (T-2), R ⁴ to R ⁷ each independently represent a hydrogen atom or a monovalent organic group, and at least two of R ⁴ to R ⁷ may be bonded to each other to form a ring structure.

In formula (T-2), R ⁴ and R ⁵ have the same meanings as R ⁴ and R ⁵ in formula (T-1), and the preferred embodiments are also the same. In formula (T-2), it is preferable that R ⁶ and R ⁷ are each independently a monovalent organic group. In the formula (T-2), the preferred aspect of the monovalent organic group in R ⁶ and R ⁷ is the same as the preferred aspect of the monovalent organic group in R ⁴ and R ⁵ in the formula (T-1) Same pattern.

Examples of compounds having a thiourea structure include N-acetylthiourea, N-allylthiourea, N-allyl-N'-(2-hydroxyethyl)thiourea, 1- Adamantyl thiourea, N-benzylthiourea, N,N'-diphenylthiourea, 1-benzyl-phenylthiourea, 1,3-dibutylthiourea, 1,3-diiso Propylthiourea, 1,3-dicyclohexylthiourea, 1-(3-(trimethoxysilyl)propyl)-3-methylthiourea, trimethylthiourea, tetramethylthiourea , N,N-diphenylthiourea, ethylenethiourea (2-imidazoline thione), Carbimazole, 1,3-dimethyl-2-thiohydantoin, etc.

〔content〕 With respect to the total mass of the photosensitive resin composition of the present invention, the total content of the compound having a sulfonamide structure and the compound having a thiourea structure is preferably 0.05 to 10 mass %, more preferably 0.1 to 5 mass % , 0.2 to 3 mass % is more preferable. The photosensitive resin composition of the present invention may contain only one compound selected from the group consisting of a compound having a sulfonamide structure and a compound having a thiourea structure, or may contain two or more types. When only one type is contained, the content of the compound is preferably within the above-mentioned range, and when two or more types are contained, the total amount thereof is preferably within the above-mentioned range.

<Polymerization inhibitor> It is preferable that the photosensitive resin composition of this invention contains a polymerization inhibitor.

As the polymerization inhibitor, for example, hydroquinone, o-methoxyphenol, methoxyhydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, gallic phenol, p-tert-butyl can be preferably used. Catechol (tert-butylcatechol), 1,4-benzoquinone, diphenyl-p-benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butyl) phenol), 2,2'-methylenebis(4-methyl-6-tert-butylphenol), N-nitroso-N-phenylhydroxylamine aluminum salt, phenothiazine, N-nitroso diphenylamine, N-phenylnaphthylamine, ethylenediaminetetraacetic acid, 1,2-cyclohexanediaminetetraacetic acid, glycol ether diaminetetraacetic acid, 2,6-di-tert-butyl- 4-methylphenol, 5-nitroso-8-hydroxyquinoline, 1-nitroso-2-naphthol, 2-nitroso-1-naphthol, 2-nitroso-5-(N -Ethyl-N-sulfopropylamino)phenol, N-nitrosophenylhydroxylamine first cerium salt, N-nitroso-N-(1-naphthyl)hydroxylamine ammonium salt, bis( 4-Hydroxy-3,5-tert-butyl)phenylmethane, N,N'-diphenyl-p-phenylenediamine, 2,4-di-tert-butylphenol, di-tert-butyl hydroxytoluene, 1,4-naphthoquinone, 1,3,5-tris(4-tert-butyl-3-hydroxy-2,6-dimethylbenzyl)-1,3,5-tris𠯤- 2,4,6-(1H,3H,5H)-trione, 4-hydroxy-2,2,6,6-tetramethylpiperidine 1-oxyl radical, phenothia, 1,1-di Phenyl-2-pyrrolehydrazine, copper(II) dibutyldithiocarbamate, nitrobenzene, N-nitroso-N-phenylhydroxylamine aluminum salt, N-nitroso-N-phenyl Hydroxyamine ammonium salt, etc. In addition, the polymerization inhibitors described in paragraph 0060 of JP-A 2015-127817 and the compounds described in paragraphs 0031 to 0046 of WO 2015/125469 can also be used.

In addition, the following compounds (Me is a methyl group) can be used.

[Chemical formula 71]

When the photosensitive resin composition of the present invention has a polymerization inhibitor, the content of the polymerization inhibitor is 0.01 to 20.0% by mass and 0.01 to 5% by mass relative to the total solid content of the photosensitive resin composition of the present invention. % is preferable, 0.02-3 mass % is more preferable, and 0.05-2.5 mass % is more preferable.

Only one type of polymerization inhibitor may be used, or two or more types may be used. When there are two or more kinds of polymerization inhibitors, it is preferable that the total is within the above-mentioned range.

<Metal Adhesion Improver> It is preferable that the photosensitive resin composition of this invention contains the metal adhesiveness improver for improving the adhesiveness with the metal material used for electrodes, wiring, etc.. Examples of the metal adhesion improver include silane coupling agents, aluminum-based adhesive agents, titanium-based adhesive agents, compounds having a sulfonamide structure, compounds having a thiourea structure, phosphoric acid derivative compounds, and beta keto acids. Ester (β keto ester) compounds, amine compounds, etc.

Examples of silane coupling agents include compounds described in paragraph 0167 of International Publication No. 2015/199219, compounds described in paragraphs 0062 to 0073 of JP 2014-191002 A, and compounds described in International Publication No. 2011/ Compounds described in paragraphs 0063 to 0071 of No. 080992, compounds described in paragraphs 0060 to 0061 of JP 2014-191252 A, and compounds described in paragraphs 0045 to 0052 of JP 2014-041264 , the compound described in paragraph 0055 of International Publication No. 2014/097594. Furthermore, as described in paragraphs 0050 to 0058 of JP-A No. 2011-128358, it is also preferable to use two or more different silane coupling agents. Moreover, it is also preferable to use the following compounds as a silane coupling agent. In the following formula, Et represents an ethyl group.

作為其他矽烷偶合劑，例如可以舉出乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、2-（3,4-環氧環己基）乙基三甲氧基矽烷、3-縮水甘油氧基丙基甲基二甲氧基矽烷、3-縮水甘油氧基丙基三甲氧基矽烷、3-縮水甘油氧基丙基甲基二乙氧基矽烷、3-縮水甘油氧基丙基三乙氧基矽烷、對苯乙烯基三甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二乙氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷、N-2-（胺基乙基）-3-胺基丙基甲基二甲氧基矽烷、N-2-（胺基乙基）-3-胺基丙基三甲氧基矽烷、3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-三乙氧基矽基-N-（1,3-二甲基-亞丁基）丙胺、N-苯基-3-胺基丙基三甲氧基矽烷、三-（三甲氧基矽基丙基）異氰脲酸酯、3-脲基丙基三烷氧基矽烷、3-巰基丙基甲基二甲氧基矽烷、3-巰基丙基三甲氧基矽烷、3-異氰酸酯丙基三乙氧基矽烷、3-三甲氧基矽基丙基丁二酸酐。該等能夠單獨使用一種或者組合使用兩種以上。[Chemical formula 72]

Examples of other silane coupling agents include vinyltrimethoxysilane, vinyltriethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, and 3-glycidoxysilane. Propylmethyldimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 3-glycidoxypropyltriethoxy Silane, p-styryltrimethoxysilane, 3-methacryloyloxypropylmethyldimethoxysilane, 3-methacryloyloxypropyltrimethoxysilane, 3-methacryloyl Acrylooxypropylmethyldiethoxysilane, 3-methacrylooxypropyltriethoxysilane, 3-acrylooxypropyltrimethoxysilane, N-2-(aminoethyl) group)-3-aminopropylmethyldimethoxysilane, N-2-(aminoethyl)-3-aminopropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-Aminopropyltriethoxysilane, 3-triethoxysilyl-N-(1,3-dimethyl-butylene)propylamine, N-phenyl-3-aminopropyltrimethoxy Silane, Tris-(trimethoxysilylpropyl)isocyanurate, 3-ureidopropyltrialkoxysilane, 3-mercaptopropylmethyldimethoxysilane, 3-mercaptopropyl Trimethoxysilane, 3-isocyanatopropyltriethoxysilane, 3-trimethoxysilylpropylsuccinic anhydride. These can be used alone or in combination of two or more.

[Aluminum-based Adhesives] As an aluminum-based adhesive agent, for example, tris(acetoacetate ethyl)aluminum, tris(acetoacetone)aluminum, acetoacetate ethyl diisopropoxide aluminum, etc. are mentioned.

In addition, as the metal adhesion improving agent, the compounds described in paragraphs 0046 to 0049 of JP 2014-186186 A and the sulfides described in paragraphs 0032 to 0043 of JP 2013-072935 A can also be used series compounds.

The content of the metal adhesion improver is preferably in the range of 0.1 to 30 parts by mass, more preferably in the range of 0.5 to 15 parts by mass, and even more preferably in the range of 0.5 to 5 parts by mass, relative to 100 parts by mass of the specific resin. By setting it as the said lower limit or more, the adhesiveness of the cured film after a hardening process and a metal layer becomes favorable, and by setting it as below the said upper limit, the heat resistance of the cured film after a hardening process and mechanical properties become favorable . Only one type of metal adhesion improver may be used, or two or more types may be used. When using 2 or more types, it is preferable that the total amount is in the said range.

＜Other additives＞ The photosensitive resin composition of the present invention can contain various additives, such as sensitizers, chain transfer agents, surfactants, higher fatty acid derivatives, inorganic particles, curing agents, as necessary, within the range in which the effects of the present invention can be obtained. agents, hardening catalysts, fillers, antioxidants, UV absorbers, anti-agglomeration agents, etc. When these additives are blended, the total blending amount is preferably 3 mass % or less of the solid content of the photosensitive resin composition.

[Sensitizer] The photosensitive resin composition of the present invention may contain a sensitizer. The sensitizer absorbs specific active radiation and becomes an electronically excited state. The sensitizer in an electronically excited state contacts with a thermal hardening accelerator, a thermal radical polymerization initiator, a photoradical polymerization initiator, etc., to produce electron transfer, energy transfer, and heat generation. Thereby, the thermal hardening accelerator, the thermal radical polymerization initiator, and the photoradical polymerization initiator are chemically changed and decomposed to generate a radical, an acid, or a base. Examples of sensitizers include Michler's ketone, 4,4'-bis(diethylamino)benzophenone, 2,5-bis(4'-diethylaminobenzylidene)cyclopentane Alkane, 2,6-bis(4'-diethylaminobenzylidene)cyclohexanone, 2,6-bis(4'-diethylaminobenzylidene)-4-methylcyclohexanone, 4 ,4'-bis(dimethylamino)chalcone, 4,4'-bis(diethylamino)chalcone, p-dimethylaminophenylallylidene indanone, p-diethylamine Methylaminobenzylidene indanone, 2-(p-dimethylaminophenylbiphenylene)-benzothiazole, 2-(p-dimethylaminophenylvinylidene)benzothiazole , 2-(p-dimethylaminophenylvinylidene)isonaphthylthiazole, 1,3-bis(4'-dimethylaminobenzylidene)acetone, 1,3-bis(4'-bis ethylaminobenzylidene)acetone, 3,3'-carbonyl-bis(7-diethylaminocoumarin), 3-acetyl-7-dimethylaminocoumarin, 3-ethoxy carbonylcarbonyl-7-dimethylaminocoumarin, 3-benzyloxycarbonyl-7-dimethylaminocoumarin, 3-methoxycarbonyl-7-diethylaminocoumarin, 3 -Ethoxycarbonyl-7-diethylaminocoumarin, N-phenyl-N'-ethylethanolamine, N-phenyldiethanolamine, N-p-tolyldiethanolamine, N-phenylethanolamine, 4 -Morpholinobenzophenone, isoamyl dimethylaminobenzoate, isoamyl diethylaminobenzoate, 2-mercaptobenzimidazole, 1-phenyl-5-mercaptotetrazole, 2- mercaptobenzothiazole, 2-(p-dimethylaminostyrene) benzoxazole, 2-(p-dimethylaminostyrene) benzothiazole, 2-(p-dimethylaminostyryl) ) naphtho(1,2-d)thiazole, 2-(p-dimethylaminobenzyl)styrene, diphenylacetamide, benzalaniline, N-methylacetaniline, 3 ',4'-Dimethylacetaniline, etc. As a sensitizer, a sensitizing dye can also be used. Details of the sensitizing dye can be referred to the descriptions in paragraphs 0161 to 0163 of JP 2016-027357 A, which are incorporated in the present specification.

When the photosensitive resin composition of the present invention contains a sensitizer, the content of the sensitizer is preferably 0.01 to 20% by mass, preferably 0.1 to 15% by mass relative to the total solid content of the photosensitive resin composition of the present invention. The mass % is more preferable, and 0.5 to 10 mass % is further preferable. A sensitizer may be used individually by 1 type, and may use 2 or more types together.

[Chain transfer agent] The photosensitive resin composition of the present invention may contain a chain transfer agent. Chain transfer agents are defined, for example, on pages 683-684 of the Polymer Dictionary, 3rd Edition (ed. by the Society for Polymer Science, 2005). As the chain transfer agent, for example, a group of compounds having SH, PH, SiH, and GeH in the molecule can be used. These can generate free radicals by supplying hydrogen to less reactive free radicals, or by deprotonation after oxidation. In particular, a thiol compound can be preferably used.

Moreover, as a chain transfer agent, the compounds described in paragraphs 0152 to 0153 of International Publication No. 2015/199219 can also be used.

When the photosensitive resin composition of the present invention has a chain transfer agent, the content of the chain transfer agent is preferably 0.01 to 20 parts by mass relative to 100 parts by mass of the total solid content of the photosensitive resin composition of the present invention, 1-10 mass parts is more preferable, and 1-5 mass parts is more preferable. Only one type of chain transfer agent may be used, or two or more types may be used. When there are two or more types of chain transfer agents, the total is preferably within the above range.

又，界面活性劑亦能夠使用國際公開第2015/199219號的0159～0165段中所記載之化合物。 關於氟系界面活性劑，亦能夠將在側鏈中具有乙烯性不飽和基之含氟聚合物用作氟系界面活性劑。作為具體例，可以舉出日本特開2010-164965號公報的0050～0090段及0289～0295段中所記載之化合物，例如DIC Corporation製造之MEGAFACE RS-101、RS-102、RS-718K等。[Surfactant] From the viewpoint of further improving coatability, a surfactant may be added to the photosensitive resin composition of the present invention. As the surfactant, various surfactants such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone-based surfactant can be used. Moreover, the following surfactant is also preferable. In the following formula, the parentheses representing the repeating units of the main chain represent the content (mol %) of each repeating unit, and the parentheses representing the repeating units of the side chains represent the repeating number of each repeating unit. [Chemical formula 73]

Moreover, the compound described in the paragraphs 0159 to 0165 of International Publication No. 2015/199219 can also be used as the surfactant. Regarding the fluorine-based surfactant, a fluoropolymer having an ethylenically unsaturated group in a side chain can also be used as the fluorine-based surfactant. Specific examples include compounds described in paragraphs 0050 to 0090 and 0289 to 0295 of JP-A-2010-164965, for example, MEGAFACE RS-101, RS-102, and RS-718K manufactured by DIC Corporation.

The fluorine content in the fluorine-based surfactant is preferably 3 to 40% by mass, more preferably 5 to 30% by mass, and particularly preferably 7 to 25% by mass. A fluorine-based surfactant having a fluorine content within this range is effective from the viewpoint of the uniformity of the thickness of the coating film or the liquid saving property, and the solubility in the composition is also good.

Examples of silicone-based surfactants include Toray Silicone DC3PA, Toray Silicone SH7PA, Toray Silicone DC11PA, Toray Silicone SH21PA, Toray Silicone SH28PA, Toray Silicone SH29PA, Toray Silicone SH30PA, Toray Silicone SH8400 (the above are Dow Corning Toray Co. ., Ltd.), TSF-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4452 (the above are manufactured by Momentive Performance Materials Inc.), KP341, KF6001, KF6002 (the above are Shin-Etsu Chemical Co. ., Ltd.), BYK307, BYK323, BYK330 (the above are manufactured by BYK Chemie GmbH), etc.

Examples of hydrocarbon-based surfactants include PIONIN A-76, New Kalgen FS-3PG, PIONIN B-709, PIONIN B-811-N, PIONIN D-1004, PIONIN D-3104, PIONIN D-3605, PIONIN D-6112, PIONIN D-2104-D, PIONIN D-212, PIONIN D-931, PIONIN D-941, PIONIN D-951, PIONIN E-5310, PIONIN P-1050-B, PIONIN P-1028-P, PIONIN P-4050-T, etc. (the above are manufactured by Takemoto Oil & Fat Co., Ltd.), etc.

Examples of nonionic surfactants include glycerin, trimethylolpropane, trimethylolethane, and their ethoxylates and propoxylates (for example, glycerol propoxylate, glycerol ethoxylate) base, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene nonyl phenyl ether, polyethylene glycol diethyl ether Laurate, polyethylene glycol distearate, sorbitan fatty acid ester, Pluronic (registered trademark) L10, L31, L61, L62, 10R5, 17R2, 25R2 (manufactured by BASF), Tetronic 304, 701 , 704, 901, 904, 150R1 (manufactured by BASF Corporation), Solsperse 20000 (manufactured by Lubrizol Japan Limited.), NCW-101, NCW-1001, NCW-1002 (manufactured by Wako Pure Chemical Industries, Ltd.), PIONIN D-6112 , D-6112-W, D-6315 (manufactured by Takemoto Oil & Fat Co., Ltd.), Olfine E1010, Surfynol 104, 400, 440 (manufactured by Nissin Chemical Co., Ltd.), etc.

Specific examples of the cationic surfactant include organosiloxane polymer KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), (meth)acrylic (co)polymer Polyflow No.75, No.77, No.90, No.95 (manufactured by Kyoeisha Chemical Co., Ltd.), W001 (manufactured by Yusho Co., Ltd.), and the like.

As an anionic surfactant, W004, W005, W017 (made by Yusho Co., Ltd.), SANDET BL (made by SANYO KASEI CO., LTD.) etc. are mentioned specifically,.

When the photosensitive resin composition of the present invention has a surfactant, the content of the surfactant is preferably 0.001 to 2.0 mass % with respect to the total solid content of the photosensitive resin composition of the present invention, and more preferably 0.005 to 1.0 mass %. Only one type of surfactant may be used, or two or more types may be used. When two or more types of surfactants are used, it is preferable that the total is within the above-mentioned range.

[Higher fatty acid derivatives] In order to prevent polymerization inhibition caused by oxygen, the photosensitive resin composition of the present invention may be made uneven in the drying process after coating by adding a higher fatty acid derivative such as behenic acid or behenamide. distributed on the surface of the photosensitive resin composition.

Moreover, the compound described in the paragraph 0155 of International Publication No. 2015/199219 can also be used as a higher fatty acid derivative.

When the photosensitive resin composition of the present invention has a higher fatty acid derivative, the content of the higher fatty acid derivative is preferably 0.1 to 10% by mass relative to the total solid content of the photosensitive resin composition of the present invention. Only one type of higher fatty acid derivatives may be used, or two or more types may be used. When there are two or more kinds of higher fatty acid derivatives, the total is preferably within the above-mentioned range.

[Inorganic particles] The resin composition of the present invention may contain inorganic particles. Specifically, as inorganic particles, calcium carbonate, calcium phosphate, silica, kaolin, talc, titanium dioxide, alumina, barium sulfate, calcium fluoride, lithium fluoride, zeolite, molybdenum sulfide, glass, etc. can be included.

The average particle diameter of the inorganic particles is preferably 0.01 to 2.0 μm, more preferably 0.02 to 1.5 μm, further preferably 0.03 to 1.0 μm, and particularly preferably 0.04 to 0.5 μm. By containing the inorganic particle of the said average particle diameter, the mechanical property of a cured film and the scattering suppression of exposure light can be made compatible.

[Ultraviolet absorber] The composition of the present invention may contain an ultraviolet absorber. As the ultraviolet absorber, ultraviolet absorbers such as salicylate-based, benzophenone-based, benzotriazole-based, substituted acrylonitrile-based, and trisulfuric acid-based absorbers can be used. Examples of salicylate-based ultraviolet absorbers include phenyl salicylate, p-octylphenyl salicylate, p-tert-butylphenyl salicylate, and the like. Examples of benzophenone-based ultraviolet absorbers include Examples of the agent include 2,2'-dihydroxy-4-methoxybenzophenone, 2,2'-dihydroxy-4,4'-dimethoxybenzophenone, 2,2 ',4,4'-Tetrahydroxybenzophenone, 2-hydroxy-4-methoxybenzophenone, 2,4-dihydroxybenzophenone, 2-hydroxy-4-octyloxydiphenyl ketone etc. Moreover, 2-(2'-hydroxy-3',5'-di-tert-butylphenyl)-5-chlorobenzotriazole, 2-(2'-hydroxy-3',5'-di-tert-butylphenyl)-5-chlorobenzotriazole, 2- -(2'-Hydroxy-3'-tert-butyl-5'-methylphenyl)-5-chlorobenzotriazole, 2-(2'-hydroxy-3'-tert-pentyl-5' -isobutylphenyl)-5-chlorobenzotriazole, 2-(2'-hydroxy-3'-isobutyl-5'-methylphenyl)-5-chlorobenzotriazole, 2- (2'-Hydroxy-3'-isobutyl-5'-propylphenyl)-5-chlorobenzotriazole, 2-(2'-hydroxy-3',5'-di-tert-butyl Phenyl)benzotriazole, 2-(2'-hydroxy-5'-methylphenyl)benzotriazole, 2-[2'-hydroxy-5'-(1,1,3,3-tetrakis Methyl)phenyl]benzotriazole, etc.

Examples of substituted acrylonitrile-based ultraviolet absorbers include ethyl 2-cyano-3,3-diphenylacrylate and 2-ethylhexyl 2-cyano-3,3-diphenylacrylate esters, etc. Moreover, 2-[4-[(2-hydroxy-3-dodecyloxypropyl)oxy]-2-hydroxyphenyl]-4,6 is mentioned as an example of a tris-type ultraviolet absorber -Bis(2,4-dimethylphenyl)-1,3,5-tris𠯤, 2-[4-[(2-hydroxy-3-tridecyloxypropyl)oxy]-2- Hydroxyphenyl]-4,6-bis(2,4-dimethylphenyl)-1,3,5-tris𠯤, 2-(2,4-dihydroxyphenyl)-4,6-bis( 2,4-Dimethylphenyl)-1,3,5-tris(hydroxyphenyl)tris-compounds such as 2,4-bis(2-hydroxy-4-propoxyphenyl)-6 -(2,4-Dimethylphenyl)-1,3,5-tris𠯤, 2,4-bis(2-hydroxy-3-methyl-4-propoxyphenyl)-6-(4 -Methylphenyl)-1,3,5-tris𠯤, 2,4-bis(2-hydroxy-3-methyl-4-hexyloxyphenyl)-6-(2,4-dimethyl Phenyl)-1,3,5-tris(bis(hydroxyphenyl)tris) compounds such as bis(hydroxyphenyl)tris; 2,4-bis(2-hydroxy-4-butoxyphenyl)-6-(2,4-bis) Butoxyphenyl)-1,3,5-tris𠯤, 2,4,6-tris(2-hydroxy-4-octyloxyphenyl)-1,3,5-tris𠯤, 2,4, 6-Tris[2-hydroxy-4-(3-butoxy-2-hydroxypropoxy)phenyl]-1,3,5-tris-tris(hydroxyphenyl)tris-compounds, etc.

In this invention, the said various ultraviolet absorbers may be used individually by 1 type, and may be used in combination of 2 or more types. The composition of the present invention may or may not contain an ultraviolet absorber, but when an ultraviolet absorber is contained, the content of the ultraviolet absorber is 0.001 mass % or more and 1 mass % relative to the total solid content mass of the composition of the present invention % or less is preferable, and 0.01 mass % or more and 0.1 mass % or less are more preferable.

[Organo-titanium compound] The resin composition of the present embodiment may contain an organic titanium compound. When the resin composition contains an organic titanium compound, even when it is cured at a low temperature, a resin layer excellent in chemical resistance can be formed.

As an organotitanium compound that can be used, an organic group is bonded to a titanium atom via a covalent bond or an ionic bond. Specific examples of organotitanium compounds are shown in the following I) to VII): I) Titanium chelate compound: Among them, the titanium chelate compound having two or more alkoxy groups is more preferable from the viewpoint that the storage stability of the negative photosensitive resin composition is good and a good hardened pattern can be obtained. . Specific examples are titanium bis(triethanolamine) diisopropoxide, titanium bis(2,4-glutarate) bis(n-butoxy), titanium diisopropoxide bis(2,4-glutarate) ), diisopropoxytitanium bis (tetramethyl pimelic acid ester), diisopropoxytitanium bis (ethyl acetate), etc. II) Tetraalkoxytitanium compounds: for example, tetrakis(n-butoxy)titanium, tetraethoxytitanium, tetrakis(2-ethylhexyloxy)titanium, tetraisobutoxytitanium, tetraisopropoxytitanium Titanium, titanium tetramethoxide, titanium tetramethoxypropoxide, titanium tetramethylphenoxide, titanium tetrakis (n-nonyloxide), titanium tetrakis (n-propoxide), titanium tetrastearyloxide, tetrakis[bis] {2,2-(allyloxymethyl) butoxy}] titanium, etc. III) Titanocene compounds: for example, titanium pentamethylcyclopentadienyltrimethoxide, bis(η5-2,4-cyclopentadien-1-yl)bis(2,6-difluorophenyl)titanium , bis(η5-2,4-cyclopentadien-1-yl)bis(2,6-difluoro-3-(1H-pyrrol-1-yl)phenyl) titanium, etc. IV) Monoalkoxytitanium compounds: for example, tris(dioctylphosphate)isopropoxytitanium, tris(dodecylbenzenesulfonate)isopropoxytitanium, and the like. V) Titanium oxide compounds: for example, bis(glutarate) titanium oxide, bis(tetramethylpimelate) titanium oxide, phthalocyanine titanium oxide, and the like. VI) Titanium tetraacetylacetonate compound: for example, titanium tetraacetylacetonate, etc. VII) Titanate coupling agent: for example, isopropyl tridodecylbenzenesulfonyl titanate and the like.

Among them, the organotitanium compound is selected from the group consisting of the above-mentioned I) titanium chelate compound, II) tetraalkoxytitanium compound and III) titanocene compound from the viewpoint of exhibiting better chemical resistance At least one compound is preferred. In particular, bis(ethylacetate)diisopropoxytitanium, tetrakis(n-butoxy)titanium and bis(η5-2,4-cyclopentadien-1-yl)bis(2,6 -Difluoro-3-(1H-pyrrol-1-yl)phenyl)titanium is preferred.

When the organic titanium compound is blended, the blending amount is preferably 0.05 to 10 parts by mass, more preferably 0.1 to 2 parts by mass, relative to 100 parts by mass of the precursor of the cyclized resin. When the compounding amount is 0.05 parts by mass or more, favorable heat resistance and chemical resistance are exhibited in the obtained cured pattern, and on the other hand, when it is 10 parts by mass or less, the storage stability of the composition is excellent .

〔Antioxidants〕 The composition of the present invention may contain antioxidants. By containing an antioxidant as an additive, the ductility property of the film after hardening and the adhesiveness with a metal material can be improved. As an antioxidant, a phenol compound, a phosphite compound, a thioether compound, etc. are mentioned. As the phenolic compound, any phenolic compound known as a phenolic antioxidant can be used. A hindered phenol compound is mentioned as a preferable phenol compound. A compound having a substituent at a position adjacent to the phenolic hydroxyl group (ortho position) is preferred. As the aforementioned substituent, a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferable. In addition, it is also preferable that the antioxidant is a compound having a phenol group and a phosphite group in the same molecule. In addition, phosphorus-based antioxidants can also be preferably used as antioxidants. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2] Dioxaphosphepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f] [1,3,2]Diethylphosphine-2-yl)oxy]ethyl]amine, bis(2,4-di-tert-butyl-6-methylphenol)ethyl phosphite, etc. . Examples of commercially available antioxidants include ADKSTAB AO-20, ADKSTAB AO-30, ADKSTAB AO-40, ADKSTAB AO-50, ADKSTAB AO-50F, ADKSTAB AO-60, ADKSTAB AO-60G, ADKSTAB AO- 80. ADKSTAB AO-330 (the above are manufactured by ADEKA CORPORATION), etc. In addition, the compounds described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967 can also be used as antioxidants. Moreover, the composition of this invention may contain a latent antioxidant as needed. As a potential antioxidant, a site that functions as an antioxidant is protected by a protective group, and the protective group is removed by heating at 100 to 250°C or heating at 80 to 200°C in the presence of an acid/base catalyst. Compounds that thus act as antioxidants. Examples of potential antioxidants include compounds described in International Publication No. 2014/021023, International Publication No. 2017/030005, and JP-A No. 2017-008219. As a commercial item of a latent antioxidant, ADEKA ARKLS GPA-5001 (made by ADEKA CORPORATION) etc. are mentioned. Examples of preferable antioxidants include 2,2-thiobis(4-methyl-6-tert-butylphenol), 2,6-di-tert-butylphenol, and general formula (3 ) represented by the compound.

[Chemical formula 74]

In the general formula (3), R ⁵ represents a hydrogen atom or an alkyl group having 2 or more carbon atoms, and R ⁶ represents an alkylene group having 2 or more carbon atoms. R ⁷ represents an alkylene group having 2 or more carbon atoms, and a 1- to 4-valent organic group containing at least any one of an O atom and a N atom. k represents an integer of 1-4.

The compound represented by the general formula (3) suppresses the oxidative deterioration of the aliphatic group or the phenolic hydroxyl group of the resin. Moreover, metal oxidation can be suppressed by the rust preventive effect on the metal material.

Since it can act on a resin and a metal material at the same time, k is an integer of 2 to 4 more preferably. Examples of R ⁷ include an alkyl group, a cycloalkyl group, an alkoxy group, an alkyl ether group, an alkylsilyl group, an alkoxysilyl group, an aryl group, an aryl ether group, a carboxyl group, a carbonyl group, and an allyl group. group, vinyl group, heterocyclic group, -O-, -NH-, -NHNH-, a combination of these, etc., and may further have a substituent. Among them, alkyl ethers and -NH- are preferred from the viewpoints of solubility in developing solutions and metal adhesion, and from the viewpoints of interaction with resins and metal adhesion by metal complex formation For example, -NH- is better.

The compounds represented by the following general formula (3) can be exemplified by the following compounds, but are not limited to the following structures.

[Chemical formula 75]

[Chemical formula 76]

[Chemical formula 77]

[Chemical formula 78]

The amount of the antioxidant added is preferably 0.1 to 10 parts by mass, more preferably 0.5 to 5 parts by mass, relative to the resin. When the added amount is less than 0.1 parts by mass, it is difficult to obtain the effect of improving the ductility after hardening or the adhesion to the metal material, and when it is more than 10 parts by mass, there is a possibility that the As a result, the sensitivity of the resin composition decreases. Only one type of antioxidant may be used, or two or more types may be used. When using 2 or more types, it is preferable that these total amounts are in the said range.

＜Restrictions on other contained substances＞ From the viewpoint of coating surface properties, the water content of the photosensitive resin composition of the present invention is preferably less than 5% by mass, more preferably less than 1% by mass, and even more preferably less than 0.6% by mass. As a method of maintaining the moisture content, adjustment of the humidity under storage conditions, reduction of the porosity of the storage container, and the like are exemplified.

From the viewpoint of insulating properties, the metal content of the photosensitive resin composition of the present invention is preferably less than 5 mass ppm (parts per million: parts per million), more preferably less than 1 mass ppm, and less than 0.5 mass ppm Further preferred. As a metal, sodium, potassium, magnesium, calcium, iron, chromium, nickel, etc. are mentioned. When a plurality of metals are contained, the sum of these metals is preferably within the above range.

In addition, as a method for reducing metal impurities unintentionally contained in the photosensitive resin composition of the present invention, there can be mentioned methods such as selecting a raw material with a small metal content as a raw material constituting the photosensitive resin composition of the present invention; The raw material of the photosensitive resin composition of the present invention is filtered through a filter, and the apparatus is lined with polytetrafluoroethylene or the like to perform distillation under conditions that suppress contamination as much as possible.

In the photosensitive resin composition of the present invention, considering the use as a semiconductor material, the content of halogen atoms is preferably less than 500 mass ppm, more preferably less than 300 mass ppm, and less than 200 mass ppm is more preferable. Among them, it is preferable that it is less than 5 mass ppm in the state of a halogen ion, and it is more preferable that it is less than 1 mass ppm, and it is more preferable that it is less than 0.5 mass ppm. As a halogen atom, a chlorine atom and a bromine atom are mentioned. It is preferable that the total of chlorine atom and bromine atom, or chlorine ion and bromide ion is each in the said range. As a method of adjusting the content of halogen atoms, ion exchange treatment and the like can be preferably used.

As the storage container of the photosensitive resin composition of the present invention, a conventionally known storage container can be used. In addition, as the container, for the purpose of suppressing the contamination of impurities into the raw material or the photosensitive resin composition, it is also possible to use a multilayer bottle having an inner wall of the container composed of 6 types of resins with 6 layers or a bottle having a 7-layer structure made of 6 types of resins. better. As such a container, the container described in Unexamined-Japanese-Patent No. 2015-123351 is mentioned, for example.

<Application of photosensitive resin composition> It is preferable that the photosensitive resin composition of this invention is used for formation of the interlayer insulating film for rewiring layers. In addition, it can also be used for formation of an insulating film of a semiconductor device, formation of a stress buffer film, and the like.

<Preparation of photosensitive resin composition> The photosensitive resin composition of the present invention can be prepared by mixing the above-mentioned components. The mixing method is not particularly limited, and can be performed by a conventionally known method.

Moreover, it is preferable to perform filtration using a filter for the purpose of removing foreign substances such as dust and particles in the photosensitive resin composition. The filter pore diameter is preferably 1 μm or less, more preferably 0.5 μm or less, and even more preferably 0.1 μm or less. On the other hand, from the viewpoint of productivity, 5 μm or less is preferable, 3 μm or less is more preferable, and 1 μm or less is still more preferable. The material of the filter is preferably polytetrafluoroethylene, polyethylene or nylon. The filter can be previously washed with an organic solvent. In the filter filtration process, a plurality of filters can be connected in series or in parallel. When multiple types of filters are used, filters with different pore sizes and materials can be used in combination. Also, various materials can be filtered multiple times. When filtering multiple times, it can be loop filtering. Moreover, filtration can be performed by pressurization. When filtration is performed by pressurization, the pressurization pressure is preferably 0.05 MPa or more and 0.3 MPa or less. On the other hand, from the viewpoint of productivity, preferably 0.01 MPa or more and 1.0 MPa or less, more preferably 0.03 MPa or more and 0.9 MPa or less, and even more preferably 0.05 MPa or more and 0.7 MPa or less. In addition to filtration using a filter, removal of impurities using an adsorbent material can also be performed. It is also possible to combine filter filtration and impurity removal treatment using adsorbent material. As the adsorbent, a known adsorbent can be used. For example, inorganic adsorbents such as silica gel and zeolite, and organic adsorbents such as activated carbon can be mentioned.

(Resin films, cured films, laminates, semiconductor devices, and methods for producing the same) Next, a resin film, a cured film, a laminated body, a semiconductor device, and the manufacturing method of these are demonstrated.

The cured film of this invention hardens the photosensitive resin composition of this invention or the resin film of this invention. The film thickness of the cured film of the present invention can be, for example, 0.5 μm or more, or 1 μm or more. Moreover, as an upper limit, it can be 100 micrometers or less, and can also be 30 micrometers or less.

The cured film of the present invention may be laminated in two or more layers, and further 3 to 7 layers may be laminated to form a laminated body. It is preferable that the laminated system of this invention contains the cured film of two or more layers, and contains the metal layer between arbitrary said cured films. For example, as a preferable thing, the laminated body which consists of the layer structure which laminated|stacked at least 3 layers of a 1st cured film, a metal layer, and a 2nd cured film in this order is mentioned. Both the said 1st cured film and the said 2nd cured film are the cured film of this invention, As a preferable example, the said 1st cured film and the said 2nd cured film are both the photosensitive resin composition of this invention, for example, can be mentioned. The state of the hardened film. The photosensitive resin composition of this invention used for formation of the said 1st cured film, and the photosensitive resin composition of this invention used for formation of the said 2nd cured film may be the same composition, and may be different in composition. composition. The metal layer in the laminate of the present invention can be preferably used as metal wiring such as a rewiring layer.

As a field|area to which the cured film of this invention can be applied, the insulating film of a semiconductor device, the interlayer insulating film for rewiring layers, a stress buffer film, etc. are mentioned. Other examples include patterning of sealing films, substrate materials (base films or cover films of flexible printed circuit boards, interlayer insulating films), and insulating films for encapsulation as described above by etching. For such applications, see, for example, SCIENCE AND TECHNOLOGY CO., LTD. "High Functionalization and Application Technology of Polyimide" April 2008, Masaki Kakimoto/Supervisor, CMC Technical library "Polyimide Materials "Basics and Development" published in November 2011, Japan Polyimide and Aromatic Polymer Research Association/Edited "Latest Polyimide Fundamentals and Applications" NTS Inc., August 2010, etc.

Moreover, the cured film in the present invention can also be used for the manufacture of printing plates such as offset printing plates and screen printing plates, the use in etching of forming components, and the protective paint and media in electronics, especially microelectronics. Manufacture of electrical layers, etc.

The manufacturing method of the cured film of the present invention (hereinafter, also simply referred to as "the manufacturing method of the present invention".) includes a film forming process of applying the photosensitive resin composition of the present invention to a substrate to form a film (resin film). is better. Preferably, the manufacturing method of the cured film of the present invention includes the above-mentioned film formation process, an exposure process of exposing the above-mentioned film, and a development process of developing the above-mentioned film. Moreover, the manufacturing method of the cured film of the present invention includes the above-mentioned film forming process and the above-mentioned development process as required, and more preferably includes a heating process of heating the above-mentioned film at 50-450°C. Specifically, processes including the following (a) to (d) are also preferred. (a) Film formation process for forming a film (photosensitive resin composition layer) by applying a photosensitive resin composition to a substrate (b) Exposure process for exposing the film after the film formation process (c) Development process for developing the exposed film above (d) Heating process of heating the developed film at 50-450°C By heating in the above-mentioned heating process, the resin layer hardened by exposure can be further hardened. In this heating process, for example, the above-mentioned thermal alkali generator is decomposed to obtain sufficient hardenability.

The manufacturing method of the laminated body of the preferable embodiment of this invention includes the manufacturing method of the cured film of this invention. In the manufacturing method of the laminated body of this embodiment, after forming a cured film according to the manufacturing method of the said cured film, the process of (a), the process of (a)-(c), or the process of (a)-(d) are performed again. In particular, it is preferable that each of the above-mentioned processes is sequentially performed a plurality of times, for example, 2 to 5 times (that is, 3 to 6 times in total). By laminating a cured film in this way, a laminated body can be produced. In this invention, it is preferable to provide a metal layer especially on the part provided with the cured film or between the cured films, or on the part provided with the cured film and between the cured films. In addition, when manufacturing a laminated body, it is not necessary to repeat all the processes (a) to (d), as described above, by performing (a) at least a plurality of times, preferably (a) to (c) or (a) The process of -(d) can obtain the laminated body of a cured film.

<Film formation process (layer formation process)> The production method of the preferred embodiment of the present invention includes a film formation process (layer formation process) in which the photosensitive resin composition is applied to a substrate to form a film (layer).

The type of base material can be appropriately specified according to the application, and can be made of semiconductors such as silicon, silicon nitride, polysilicon, silicon oxide, and amorphous silicon, quartz, glass, optical film, ceramic material, vapor deposition film, magnetic film, reflection Film, Ni, Cu, Cr, Fe and other metal substrates, paper, SOG (Spin On Glass: spin-on glass), TFT (Thin Film Transistor) array substrates, electrode plates for plasma display panels (PDP), etc., It is not particularly limited. Moreover, these base materials may be provided with layers, such as an adhesive layer and an oxide layer, on the surface. In the present invention, especially semiconductor fabrication substrates are preferred, and silicon substrates, Cu substrates and mold substrates are more preferred. Moreover, these base materials may be provided with layers, such as an adhesive layer and an oxide layer, which consist of hexamethyldisilazane (HMDS) etc. on the surface. Moreover, as a base material, a plate-shaped base material (substrate) can be used, for example. The shape of the base material is not particularly limited, and may be circular or rectangular, but a rectangular shape is preferred. As a size of a base material, if it is a circle, a diameter is 100-450 mm, for example, Preferably it is 200-450 mm. In the case of a rectangle, the length of the short side is, for example, 100 to 1000 mm, preferably 200 to 700 mm.

Moreover, when forming the photosensitive resin composition layer on the surface of a resin layer or the surface of a metal layer, a resin layer or a metal layer becomes a base material.

As a method of applying the photosensitive resin composition to a base material, coating is preferable.

Specifically, as a method to be applied, dip coating, air knife coating, curtain coating, wire bar coating, gravure coating, extrusion coating, spray coating, spin coating can be exemplified. coating method, slit coating method and inkjet method, etc. From the viewpoint of the uniformity of the thickness of the photosensitive resin composition layer, a spin coating method, a slit coating method, a spray coating method, and an ink jet method are more preferred. A resin layer having a desired thickness can be obtained by appropriately adjusting the solid content concentration and coating conditions according to the method. In addition, the coating method can also be appropriately selected according to the shape of the substrate. In the case of a circular substrate such as a wafer, a spin coating method, a spray coating method, an inkjet method, etc. are preferable, and a rectangular substrate is narrowly applied. Slit coating method, spray method, ink jet method, etc. are preferable. In the case of the spin coating method, for example, it can be applied at a rotation speed of 500 to 2,000 rpm for about 10 seconds to 1 minute. In addition, according to the viscosity of the resin composition or the film thickness to be set, it is also preferable to apply it for 10 to 180 seconds at a rotational speed of 300 to 3,500 rpm. Furthermore, in order to obtain the uniformity of the film thickness, it is also possible to apply a combination of a plurality of rotation speeds. Moreover, the method of transcribe|transferring the coating film previously provided by the said application method and formed on the temporary support body to a base material can also be applied. Regarding the transfer method, in the present invention, those described in paragraphs 0023 and 0036 to 0051 of Japanese Patent Laid-Open No. 2006-023696 or paragraphs 0096 to 0108 of Japanese Patent Laid-Open No. 2006-047592 can be preferably used. method. Also, a process of removing excess film at the end of the base material can be performed. Examples of such processes include edge bead residue rinse (EBR), air knife, back rinse, and the like. The following pre-wetting process can also be used: before the resin composition is applied to the substrate, various solvents are applied to the substrate to improve the wettability of the substrate, and then the resin composition is applied.

＜Drying process＞ The manufacturing method of the present invention may include a drying process for removing the solvent after the film forming process (layer forming process). The preferred drying temperature is 50 to 150°C, more preferably 70°C to 130°C, and even more preferably 90°C to 110°C. As the drying time, 30 seconds to 20 minutes can be exemplified, preferably 1 minute to 10 minutes, and more preferably 3 minutes to 7 minutes.

<Exposure process> The manufacturing method of this invention may include the exposure process which exposes with the said film (photosensitive resin composition layer). The exposure amount is not particularly limited as long as the photosensitive resin composition can be cured. For example, in terms of exposure energy at a wavelength of 365 nm, 100 to 10,000 mJ/cm ² is preferable, and 200 to 8,000 mJ/cm ² is irradiated. better.

The exposure wavelength can be appropriately defined in the range of 190 to 1,000 nm, and is preferably 240 to 550 nm.

If the exposure wavelength is described in relation to the light source, (1) semiconductor lasers (wavelengths of 830 nm, 532 nm, 488 nm, 405 nm, etc.), (2) metal halide lamps, (3) high-pressure mercury lamps, g-rays ( Wavelength 436nm), h-ray (wavelength 405nm), i-ray (wavelength 365nm), wide (3 wavelengths of g, h, i-ray), (4) excimer laser, KrF excimer laser (wavelength 248nm), ArF excimer laser (wavelength 193nm), F2 excimer laser (wavelength 157nm), (5) extreme ultraviolet; EUV (wavelength 13.6nm), (6) electron beam, (7) second harmonic of YAG laser 532nm and third harmonic 355nm etc. With regard to the photosensitive resin composition of the present invention, exposure by a high-pressure mercury lamp is particularly preferable, and among them, exposure by i-ray is preferable. Thereby, in particular, high exposure sensitivity can be obtained. Also, from the viewpoint of operation and productivity, a wide (three wavelengths of g, h, and i rays) light source of a high-pressure mercury lamp or a semiconductor laser of 405 nm is also preferable.

＜Development process＞ The production method of the present invention may include a development process of developing the exposed film (photosensitive resin composition layer) (developing the above-mentioned film). If it is a negative type, the unexposed part (non-exposed part) can be removed by developing. The developing method is not particularly limited as long as a desired pattern can be formed, and examples thereof include discharging of the developer from a nozzle, spray spray, and immersion of the substrate in the developer, and the discharge from the nozzle can be preferably used. In the developing process, a process of continuously continuously supplying the developer to the substrate, a process of holding the developer in a substantially static state on the substrate, a process of vibrating the developer with ultrasonic waves or the like, and a combination of these can be used. process, etc.

Development is performed using a developer. As for the developing solution, as long as it is a negative type, the unexposed part (non-exposed part) can be used without particular limitation. As the developer, a developer containing an organic solvent or an aqueous alkali solution can be used.

In the present invention, the developer preferably contains an organic solvent with a ClogP value of -1 to 5, and more preferably contains an organic solvent with a ClogP value of 0 to 3. The ClogP value can be obtained as a calculated value by inputting the structural formula in ChemBioDraw.

When the developing solution is a developing solution containing an organic solvent, as the organic solvent, as esters, for example, ethyl acetate, n-butyl acetate, amyl formate, isoamyl acetate, isobutyl acetate can be preferably mentioned. ester, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl lactate, ethyl lactate, γ-butyrolactone, ε-caprolactone, δ-valerolactone, alkane Alkyl oxyacetate (e.g. methyl alkoxyacetate, ethyl alkoxyacetate, butyl alkoxyacetate (e.g. methyl methoxyacetate, ethyl methoxyacetate, methoxyacetate) butyl ester, methyl ethoxy acetate, ethyl ethoxy acetate, etc.), 3-alkoxy propionate alkyl esters (for example: 3-alkoxy propionate methyl ester, 3-alkoxy propionate acid ethyl ester, etc. (for example, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, etc.), Alkyl 2-alkoxypropanoates (for example: methyl 2-alkoxypropionate, ethyl 2-alkoxypropionate, propyl 2-alkoxypropionate, etc. (for example, 2-methylpropionate) methyl oxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate)), 2 -Methyl alkoxy-2-methylpropanoate and ethyl 2-alkoxy-2-methylpropanoate (for example, methyl 2-methoxy-2-methylpropanoate, 2-ethoxy ethyl 2-methylpropionate, etc.), methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl 2-oxobutyrate, 2 - Ethyl oxobutyrate, etc., and, as ethers, for example, diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl seleux Acetate, Ethyl Siloxane, Diethylene Glycol Monomethyl Ether, Diethylene Glycol Monoethyl Ether, Diethylene Glycol Monobutyl Ether, Propylene Glycol Monomethyl Ether, Propylene Glycol Monomethyl Ether Acetate, Propylene Glycol Monoethyl ether acetate, propylene glycol monopropyl ether acetate, etc., and, as ketones, for example, methyl ethyl ketone, cyclohexanone, cyclopentanone, 2-heptanone, 3-heptane can be preferably used Ketones, N-methyl-2-pyrrolidone, etc., and, as cyclic hydrocarbons, for example, toluene, xylene, anisole, limonene, etc. can be preferably mentioned, and as the sulfites, for example, Preferably, dimethyl sulfoxide is used, and a mixture of these organic solvents can also be preferably used.

When the developing solution is a developing solution containing an organic solvent, in the present invention, cyclopentanone and γ-butyrolactone are particularly preferred, and cyclopentanone is more preferred. Moreover, when a developing solution contains an organic solvent, 1 type of organic solvent can be used, or 2 or more types can also be mixed and used for it.

When the developing solution is a developing solution containing an organic solvent, it is preferable that 50 mass % or more of the developing solution is an organic solvent, 70 mass % or more is an organic solvent, and 90 mass % or more is an organic solvent. good. Moreover, in a developing solution, 100 mass % may be an organic solvent.

The developer may also contain other components. As another component, a well-known surfactant, a well-known antifoamer, etc. are mentioned, for example.

When the developing solution is an alkaline aqueous solution, examples of the alkaline compound that the alkaline aqueous solution can contain include TMAH (tetramethylammonium hydroxide), KOH (potassium hydroxide), sodium carbonate, and the like, and TMAH is preferred. For example, when TMAH is used, the content of the alkaline compound in the developer is preferably 0.01 to 10% by mass, more preferably 0.1 to 5% by mass, and more preferably 0.3 to 3% by mass, based on the total mass of the developer. better.

[How to supply developer] The method of supplying the developer is not particularly limited as long as a desired pattern can be formed, and there are methods of immersing the substrate in the developer, spin-over immersion development in which the developer is supplied to the substrate using a nozzle, or continuous supply of the developer. method. The type of the nozzle is not particularly limited, and examples thereof include a straight nozzle, a shower nozzle, and a spray nozzle. From the viewpoints of the permeability of the developer, the removal of the non-image area, and the efficiency in manufacturing, the method of supplying the developer with a straight nozzle or the method of continuously supplying it with a spray nozzle is preferable. From the viewpoint of the permeability of the image area, the method of supplying with a spray nozzle is more preferable. In addition, after the developer is continuously supplied with the straight nozzle, the substrate can be rotated to remove the developer from the substrate, and after spin drying, the developer can be continuously supplied again with the straight nozzle, and then the substrate can be rotated and removed from the substrate. The process of developing solution, and the process can be repeated several times. Also, as a method of supplying the developer in the developing process, a process of continuously supplying the developer to the substrate, a process of keeping the developer in a substantially static state on the substrate, and using ultrasonic waves to make the developer in the substrate can be used. The process of vibrating on the substrate and the process of combining them, etc.

The development time is preferably 5 seconds to 10 minutes, and more preferably 10 seconds to 5 minutes. The temperature of the developer at the time of development is not particularly limited, but it is usually 10 to 45°C, preferably 20 to 40°C.

After the treatment with the developer, further rinsing may be performed. In addition, a method such as supplying a rinsing liquid may be employed while the developer contacting the pattern is not completely dried. Rinse is preferably carried out in a solvent different from the developer. For example, rinsing can be performed using the solvent contained in the photosensitive resin composition. When the developing solution is a developing solution containing an organic solvent, the rinse solution includes PGMEA (propylene glycol monoethyl ether acetate), IPA (isopropyl alcohol), and the like, and PGMEA is preferred. In addition, as a rinse solution for development by a developer containing an aqueous alkaline solution, water is preferable. The flushing time is preferably 10 seconds to 10 minutes, more preferably 20 seconds to 5 minutes, and even more preferably 5 seconds to 1 minute. The temperature of the rinsing liquid at the time of rinsing is not particularly limited, but it is preferably 10 to 45°C, more preferably 18 to 30°C.

Regarding the organic solvent in the case where the rinse liquid contains an organic solvent, the esters include, for example, ethyl acetate, n-butyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, and butyl propionate. Esters, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl lactate, ethyl lactate, γ-butyrolactone, ε-caprolactone, δ-valerolactone, alkyl alkoxy acetate Esters (eg: methyl alkoxyacetate, ethyl alkoxyacetate, butyl alkoxyacetate (eg, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, ethoxyacetate) methyl ethyl acetate, ethyl ethoxy acetate, etc.), 3-alkoxy propionate alkyl esters (for example: 3-alkoxy propionate methyl ester, 3-alkoxy ethyl propionate, etc. ( For example, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, etc.)), 2-alkoxy Alkyl propionates (e.g. methyl 2-alkoxypropionate, ethyl 2-alkoxypropionate, propyl 2-alkoxypropionate, etc. (e.g. methyl 2-methoxypropionate) ester, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate)), 2-alkoxy- Methyl 2-methylpropionate and ethyl 2-alkoxy-2-methylpropionate (for example, methyl 2-methoxy-2-methylpropionate, 2-ethoxy-2-methylpropionate ethyl propionate, etc.), methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl 2-oxobutyrate, 2-oxobutyric acid Ethyl esters, etc., and, as ethers, for example, diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cyrus acetate, ethyl acetate, etc. Gysellus Acetate, Diethylene Glycol Monomethyl Ether, Diethylene Glycol Monoethyl Ether, Diethylene Glycol Monobutyl Ether, Propylene Glycol Monomethyl Ether (PGME), Propylene Glycol Monomethyl Ether Acetate (PGMEA), Propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, etc., and, as ketones, for example, methyl ethyl ketone, cyclohexanone, cyclopentanone, 2-heptanone, 3- Heptanone, N-methyl-2-pyrrolidone, etc., and, as aromatic hydrocarbons, for example, toluene, xylene, anisole, limonene, etc. are preferably mentioned, and as the sulfites, for example, Preferable examples include dimethylsulfoxide, and examples of alcohols include methanol, ethanol, propanol, isopropanol, butanol, amyl alcohol, octanol, diethylene glycol, propylene glycol, and methyl isobutyl alcohol. Base carbitol, triethylene glycol, etc., and N-methylpyrrolidone, N-ethylpyrrolidone, dimethylformamide, etc. are mentioned as amides.

When the rinsing liquid contains an organic solvent, the organic solvent can be used alone or in combination of two or more. In the present invention, cyclopentanone, γ-butyrolactone, dimethylsulfoxide, N-methylpyrrolidone, cyclohexanone, PGMEA, PGME are particularly preferred, and cyclopentanone, γ-butyrolactone are preferred. Esters, dimethylsulfoxide, PGMEA, and PGME are more preferable, and cyclohexanone and PGMEA are further preferable.

When the rinse liquid contains an organic solvent, more than 50 mass % of the rinse liquid is preferably an organic solvent, more preferably 70 mass % or more is an organic solvent, and more preferably 90 mass % or more is an organic solvent. Moreover, in a rinse liquid, 100 mass % may be an organic solvent.

The rinse fluid may further contain other ingredients. As another component, a well-known surfactant, a well-known antifoamer, etc. are mentioned, for example.

[How to supply the rinse solution] The method of supplying the rinsing liquid is not particularly limited as long as a desired pattern can be formed, and there are a method of immersing the substrate in the rinsing liquid, a method of supplying the rinsing liquid on the substrate by holding the liquid, and a sprayer to the substrate. The method of supplying the rinsing liquid to the material, and the method of continuously supplying the rinsing liquid to the substrate by means of a straight nozzle or the like. From the viewpoint of the permeability of the rinse liquid, the removal of the non-image area, and the efficiency in manufacturing, the method of supplying the rinse liquid by a shower nozzle, a straight nozzle, a spray nozzle, etc., and the method of continuously supplying it by a spray nozzle are: Preferably, from the viewpoint of the permeability of the rinse liquid to the image portion, the method of supplying it with a spray nozzle is more preferable. The type of the nozzle is not particularly limited, and examples thereof include a straight nozzle, a shower nozzle, and a spray nozzle. That is, the rinsing process is preferably a process in which a straight nozzle is used to supply or continuously supply a rinsing liquid to the above-mentioned exposed film, and a process in which the rinsing liquid is supplied by a spray nozzle is more preferable. Also, as a method of supplying the developer in the rinsing process, a process of continuously supplying the rinsing solution to the substrate, a process of keeping the rinsing solution in a substantially static state on the substrate, and using ultrasonic waves to make the rinsing solution in the substrate can be used. The process of vibrating on the substrate and the process of combining them, etc.

＜Heating process＞ The manufacturing method of the present invention preferably includes a process (heating process) in which the developed film is heated at 50-450°C. It is preferable to include the heating process after the film forming process (layer forming process), drying process and developing process. In the heating process, for example, a cyclization reaction as a precursor of a specific resin is performed by decomposing the above-mentioned thermal alkali generator to generate a base. In addition, the photosensitive resin composition of the present invention may contain a radically polymerizable compound other than the specific resin precursor, and curing of the radically polymerizable compound other than the unreacted specific resin precursor can also be performed during the process. conduct. As the heating temperature (maximum heating temperature) of the layer in the heating process, 50°C or higher is preferable, 80°C or higher is more preferable, 140°C or higher is further preferable, 150°C or higher is further preferable, and 160°C or higher is even more preferable More preferably, 170°C or higher is still more preferable. The upper limit is preferably 500°C or lower, more preferably 450°C or lower, still more preferably 350°C or lower, still more preferably 250°C or lower, and still more preferably 220°C or lower.

The heating system is preferably performed at a temperature increase rate of 1 to 12°C/min, more preferably 2 to 10°C/min, and even more preferably 3 to 10°C/min from the temperature at the start of heating to the maximum heating temperature. By setting the temperature increase rate to be 1°C/min or more, while ensuring productivity, excessive volatilization of the amine can be prevented, and by setting the temperature increase rate to 12°C/min or less, the residual stress of the cured film can be reduced. Furthermore, in the case of an oven capable of rapid heating, it is preferable to carry out a temperature increase rate of 1 to 8°C/sec, more preferably 2 to 7°C/sec, from the temperature at the start of heating to the maximum heating temperature, and 3 to 3°C/sec. 6°C/sec is more preferable.

The temperature at the start of heating is preferably 20°C to 150°C, more preferably 20°C to 130°C, and even more preferably 25°C to 120°C. The temperature at the start of heating refers to the temperature at which the process of heating up to the maximum heating temperature is started. For example, when the photosensitive resin composition is applied to a substrate and then dried, the temperature of the dried film (layer) is, for example, higher than the boiling point of the solvent contained in the photosensitive resin composition. It is preferable to gradually increase the temperature at a lower temperature of 30 to 200°C.

The heating time (heating time at the highest heating temperature) is preferably 10 to 360 minutes, more preferably 20 to 300 minutes, and even more preferably 30 to 240 minutes.

In particular, in the case of forming a multilayered laminate, from the viewpoint of the adhesiveness between layers of the cured film, the heating temperature is preferably 180°C to 320°C, and 180°C to 260°C is preferred. Heating is better. Although the reason for this is not clear, it is considered that the acetylene groups of the specific resins between the layers undergo a crosslinking reaction by setting the temperature to this temperature.

Heating can be performed in stages. As an example, the following pretreatment process can be performed: from 25°C to 180°C at 3°C/min, hold at 180°C for 60 minutes, from 180°C to 200°C at 2°C/min, at 200°C Hold for 120 minutes. The heating temperature of the pretreatment process is preferably 100-200°C, more preferably 110-190°C, and further preferably 120-185°C. In the pretreatment process, as described in the specification of US Pat. No. 9,159,547, it is also preferable to perform treatment while irradiating ultraviolet rays. The characteristics of the film can be improved by such a pretreatment process. The pretreatment process can be carried out in a short time of about 10 seconds to 2 hours, preferably 15 seconds to 30 minutes. The pretreatment can also be performed in two or more steps. For example, the pretreatment process 1 can be performed in the range of 100 to 150°C, and then the pretreatment process 2 can be performed in the range of 150 to 200°C.

Cooling after heating may be further performed, and the cooling rate at this time is preferably 1 to 5°C/min.

From the viewpoint of preventing the decomposition of the specific resin, it is preferable to perform the heating process in an atmosphere with a low oxygen concentration by flowing an inert gas such as nitrogen, helium, and argon. The oxygen concentration is preferably 50 ppm (volume ratio) or less, and more preferably 20 ppm (volume ratio) or less. Although it does not specifically limit as a heating means, For example, a hotplate, an infrared furnace, an electric heating oven, a hot air oven, etc. are mentioned.

<Metal layer formation process> The production method of the present invention preferably includes a metal layer forming process in which a metal layer is formed on the surface of the developed film (photosensitive resin composition layer).

The metal layer is not particularly limited, and existing metals can be used, and examples thereof include copper, aluminum, nickel, vanadium, titanium, chromium, cobalt, gold, and tungsten. Copper, aluminum, and alloys containing these metals are more preferred. , copper is further preferred.

The method of forming the metal layer is not particularly limited, and conventional methods can be applied. For example, the methods described in JP 2007-157879 A, JP 2001-521288 A, JP 2004-214501 A, and JP 2004-101850 A can be applied. For example, photolithography, lift off, electrolytic plating, electroless plating, etching, printing, methods of combining the same, and the like are contemplated. More specifically, a patterning method combining sputtering, photolithography and etching, and a patterning method combining photolithography and electrolytic plating can be mentioned.

The thickness of the metal layer is preferably 0.01 to 100 μm, more preferably 0.1 to 50 μm, and even more preferably 1 to 10 μm in the thickest portion.

＜Lamination process＞ Preferably, the manufacturing method of the present invention further includes a lamination process.

The lamination process refers to the process of performing (a) film formation process (layer formation process), (b) exposure process, (c) development process, (d) heating process on the surface of the cured film (resin layer) or metal layer in sequence. A series of processes. However, only the film formation process of (a) may be repeatedly performed. In addition, it is also possible to carry out the (d) heating process collectively at the end or in the middle of the build-up. That is, the steps (a) to (c) can be repeated a predetermined number of times, and then the heating of (d) can be performed, whereby the laminated photosensitive resin composition layer can be collectively cured. In addition, the (e) metal layer formation process may be included after the (c) development process, and in this case, the (d) heating may be performed each time, or the (d) heating may be performed collectively after laminating a predetermined number of times. Of course, the above-mentioned drying process or heating process, etc. may be further appropriately included in the lamination process.

When the build-up process is further performed after the build-up process, the surface activation treatment process may be further performed after the above-mentioned heating process, after the above-mentioned exposure process, or after the above-mentioned metal layer formation process. As the surface activation treatment, plasma treatment can be exemplified.

Preferably, the above lamination process is performed 2 to 20 times, more preferably 2 to 5 times, and even more preferably 3 to 5 times. In addition, each layer in the lamination process may be a layer with the same composition, shape, film thickness, etc., or may be a different layer.

For example, as resin layer/metal layer/resin layer/metal layer/resin layer/metal layer, the structure of resin layers is preferably 3 or more and 7 or less, and more preferably 3 or more and 5 or less.

In this invention, after providing a metal layer, the aspect which forms the cured film (resin layer) of the said photosensitive resin composition further so that the said metal layer may be covered is preferable. Specifically, it is possible to repeat the order of (a) film formation process, (b) exposure process, (c) development process, (e) metal layer formation process, and (d) heating process, or The sequence of (a) film formation process, (b) exposure process, (c) development process, and (e) metal layer formation process is repeated, and the (d) heating process is arranged at the end or in the middle. The photosensitive resin composition layer (resin layer) and the metal layer can be alternately laminated by alternately performing the lamination process of laminating the photosensitive resin composition layer (resin layer) and the metal layer forming process.

(Surface activation treatment process) The manufacturing method of the layered product of the present invention may include a surface activation treatment process of subjecting at least a part of the metal layer and the photosensitive resin composition layer to a surface activation treatment. The surface activation treatment process is usually performed after the metal layer formation process, but the metal layer formation process can also be performed after the above-mentioned exposure and development process, and after the surface activation treatment process for the photosensitive resin composition layer. The surface activation treatment may be performed only on at least a part of the metal layer, may be performed only on at least a part of the exposed photosensitive resin composition layer, or may be performed on both the metal layer and the exposed photosensitive resin composition layer, respectively. at least part of it. Surface activation treatment is preferably performed on at least a part of the metal layer, and surface activation treatment is preferably performed on a part or all of a region of the metal layer where the photosensitive resin composition layer is formed on the surface. In this way, by performing the surface activation treatment on the surface of the metal layer, the adhesiveness with the resin layer provided on the surface can be improved. Moreover, it is preferable to also perform a surface activation process with respect to a part or all of the photosensitive resin composition layer (resin layer) after exposure. In this way, by subjecting the surface of the photosensitive resin composition layer to the surface activation treatment, the adhesiveness with the metal layer or resin layer provided on the surface activation treatment can be improved. The surface activation treatment is specifically selected from plasma treatment of various raw material gases (oxygen, hydrogen, argon, nitrogen, nitrogen/hydrogen mixed gas, argon/oxygen mixed gas, etc.), corona discharge treatment, CF4 _- based treatment /O ₂ , NF ₃ /O ₂ , SF ₆ , NF ₃ , NF ₃ /O ₂ etching treatment, surface treatment based on ultraviolet (UV) ozone method, immersion in hydrochloric acid aqueous solution to remove oxide film, and then immersion in amine containing amine The treatment in the organic surface treatment agent of the compound of at least one of the base and the thiol group, the mechanical roughening treatment using a brush, and the plasma treatment are preferred, especially the oxygen plasma treatment using oxygen in the raw material gas. better. In the case of corona discharge treatment, the energy is preferably 500 to 200,000 J/m ² , more preferably 1000 to 100,000 J/m ² , and most preferably 10,000 to 50,000 J/m ² .

The present invention also discloses a semiconductor device including the cured film or laminate of the present invention. As a specific example of a semiconductor device in which the photosensitive resin composition of the present invention is used for the formation of the interlayer insulating film for rewiring layers, reference can be made to the descriptions in paragraphs 0213 to 0218 of Japanese Patent Laid-Open No. 2016-027357 and the description in FIG. 1 . described, and these contents are incorporated into this specification. [Example]

Hereinafter, the present invention will be described in more detail with reference to Examples. The materials, usage amounts, ratios, processing contents, processing steps, etc. shown in the following examples can be appropriately changed without departing from the gist of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. As long as there is no special description, "parts" and "%" are quality standards.

<Synthesis Example B-1: Synthesis of Compound B-1> In a flask equipped with a stirrer and a condenser, 8.75 g (52.5 mmol) of cinnamon chloride (manufactured by Tokyo Chemical Industry Co., Ltd.) was dissolved in 50 g of ethyl acetate, and cooled to 0 °C. Next, 4.35 g (55 mmol) of pyridine and 8.97 g (50 mmol) of triethoxy-3-aminopropylsilane (manufactured by Tokyo Chemical Industry Co., Ltd.) were dissolved in 20 g of ethyl acetate Then, it dripped over 1 hour using a dropping funnel. After stirring at 0°C for 1 hour, it was stirred at 25°C for 2 hours. Next, it was dissolved in 600 mL of ethyl acetate and transferred to a separatory funnel. Next, this was washed once with 100 mL of water, twice with 100 mL of saturated sodium bicarbonate, twice with 150 mL of saturated saline, and dried with sodium sulfate. This was transferred to a single-necked flask while being filtered with filter paper, and the solvent was removed with a distiller to obtain 12 g of compound B-1. It was confirmed to be compound B-1 from ¹ H-NMR spectrum. The structure of compound B-1 is estimated to be the structure represented by the following formula (B-1). [Chemical formula 79]

<Synthesis Examples B-2 to B-5: Synthesis of Compounds B-2 to B-5, B-7, and B-8> Compounds B-2 to B-5 were synthesized in the same manner as in Synthesis Example B-1 , B-7, B-8. The estimated structures of the compounds B-2 to B-5 are shown in the following formulae (B-2) to (B-5), formula (B-7), and (B-8), respectively. [Chemical formula 80]

<Synthesis Example B-6: Synthesis of Compound B-6> In a flask equipped with a stirrer and a condenser, 8.57 g (52.5 mmol) of 4-aminocinnamic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) ) was dissolved in 80 g of tetrahydrofuran and stirred at 25°C. Next, after dissolving 12.4 g (50 mmol) of 3-(triethoxysilyl)propyl isocyanate (manufactured by Tokyo Chemical Industry Co., Ltd.) in 20 g of tetrahydrofuran, it was passed through a dropping funnel for 1 hour. Dropwise addition was performed. Then, it stirred at 25 degreeC for 3 hours. Next, it was dissolved in 800 mL of ethyl acetate and transferred to a separatory funnel. Next, this was washed once with 100 mL of water, twice with 100 mL of saturated sodium bicarbonate, twice with 150 mL of saturated saline, and dried with sodium sulfate. This was transferred to a single-necked flask while being filtered with filter paper, and the solvent was removed with a distiller to obtain 16 g of compound B-6. It was confirmed to be compound B-6 from ¹ H-NMR spectrum. The structure of compound B-6 is presumed to be a structure represented by the following formula (B-6). [Chemical formula 81]

<Synthesis Examples B-9 and B-10: Synthesis of Compounds B-9 and B-10> In a flask equipped with a stirrer and a condenser, 7-amino-4methylcoumarin (Tokyo Chemical Industry Co. ., Ltd.) 8.06 g (50 mmol) was dissolved in 100 g of tetrahydrofuran. Next, 12.4 g (50 mmol) of 3-(triethoxysilyl)propyl isocyanate (manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise with a dropping funnel over 1 hour, and the mixture was added dropwise at 25 It was stirred at °C for 2 hours. Next, it was dissolved in 600 mL of ethyl acetate and transferred to a separatory funnel. Next, this was washed once with 100 mL of water, twice with 100 mL of saturated sodium bicarbonate, twice with 150 mL of saturated saline, and dried with sodium sulfate. This was transferred to a single-necked flask while being filtered with filter paper, and the solvent was removed with a distiller to obtain 16 g of compound B-9. It was confirmed to be compound B-9 from ¹ H-NMR spectrum. The structure of compound B-9 is presumed to be the structure represented by the following formula (B-9). Compound B-10 was synthesized by the same method as in Synthesis Example B-9. The structure of compound B-10 is estimated to be the structure represented by the following formula (B-10). [Chemical formula 82]

<Synthesis Example M-1: Synthesis of Compound M-1> In a flask equipped with a stirrer and a condenser, 8.75 g (52.5 mmol) of cinnamon chloride (manufactured by Tokyo Chemical Industry Co., Ltd.) was dissolved in 50 g of ethyl acetate, and cooled to 0 °C. Next, after dissolving 4.35 g (55 mmol) of pyridine and 6.57 g (50 mmol) of 2-hydroxyethyl methacrylate (manufactured by Tokyo Chemical Industry Co., Ltd.) in 20 g of ethyl acetate, dripping The addition funnel was added dropwise over 1 hour. After stirring for 1 at 0°C, it was stirred at 25°C for 2 hours. Next, it was dissolved in 600 mL of ethyl acetate and transferred to a separatory funnel. Next, this was washed once with 100 mL of water, twice with 100 mL of saturated sodium bicarbonate, twice with 150 mL of saturated saline, and dried with sodium sulfate. This was transferred to a single-necked flask while being filtered with filter paper, and the solvent was removed with a distiller to obtain 12 g of compound M-1. It was confirmed to be compound M-1 from ¹ H-NMR spectrum. The structure of compound M-1 is estimated to be the structure represented by the following formula (M-1). [Chemical formula 83]

<Synthesis Example PB-1: Synthesis of Compound PB-1> 15 g of propylene glycol monomethyl ether was added to the flask, and the temperature was raised to 80° C. and stirred while flowing nitrogen gas. Next, 14.52 g (50 mmol) of 3-(triethoxysilyl)propyl methacrylate (manufactured by Tokyo Chemical Industry Co., Ltd.) and 13.15 g (50 mmol) of M-1 were added to the Erlenmeyer flask. mmol), 50 g of propylene glycol monomethyl ether, and 0.46 g of a polymerization initiator V-601 (manufactured by FUJIFILM Wako Pure Chemical Corporation) were dissolved and added dropwise to the flask over 3 hours. Next, it heated up to 85 degreeC, and after stirring 3, it cooled to room temperature, and obtained the PB-1 solution. The solid content concentration (solid content amount/total mass of the solution×100) of the obtained PB-1 solution was 30 mass %, and the weight average molecular weight (Mw) of PB-1 was 20,500. The structure of PB-1 is estimated to be the structure represented by the following formula (PB-1). In the following formula, the subscript in the parentheses represents the content ratio (molar ratio) of the repeating unit. [Chemical formula 84]

<Synthesis Example M-2: Synthesis of Compound M-2> In a flask equipped with a stirrer and a condenser, 7.25 g (105 milliliters of 1,2,4-triazole (manufactured by Tokyo Chemical Industry Co., Ltd.)) molar), Karenz MOI (manufactured by SHOWA DENKO KK) 15.52 g (100 mmol), Neostan U-600 (manufactured by NITTO KASEI CO,.LTD.) 0.01 g were dissolved in tetrahydrofuran (manufactured by Tokyo Chemical Industry Co., Ltd.) ) 70 mL, and stirred at 25°C for 1 hour. Next, after stirring at 45 degreeC for 2, it melt|dissolved in 600 mL of ethyl acetate, and it transferred to a separatory funnel. Next, it was washed twice with 100 mL of water, twice with 150 mL of saturated saline, and dried with sodium sulfate. This was transferred to a single-necked flask while being filtered with filter paper, and the solvent was removed with a distiller to obtain 18 g of compound M-2. It was confirmed to be compound M-2 from ¹ H-NMR spectrum. The structure of compound M-2 is estimated to be the structure represented by the following formula (M-2). [Chemical formula 85]

<Synthesis Example PC-1: Synthesis of Compound PC-1> 15 g of propylene glycol monomethyl ether was added to the flask, and the temperature was raised to 80° C. and stirred while flowing nitrogen gas. Next, to the above-mentioned flask, 11.21 g (50 mmol) of M-2 (the above-mentioned synthetic product), 13.15 g (50 mmol) of M-1, 50 g of propylene glycol monomethyl ether, and a polymerization initiator V-601 were added (manufactured by FUJIFILM Wako Pure Chemical Corporation) 0.46 g was dissolved and added dropwise to the flask over 3 hours. Next, it heated up to 85 degreeC, and after stirring 3 times, it cooled to room temperature, and obtained the PC-1 solution. The structure of PC-1 is estimated to be the structure represented by the following formula (PC-1). In the following formula, the subscript in the parentheses represents the content ratio (molar ratio) of the repeating unit. The Mw of PC-1 is 15,000. [Chemical formula 86]

<Synthesis example CA-1: Synthesis of compound CA-1> In a flask equipped with a stirrer and a condenser, 3.39 g (55 milliliters of 1,2,4-triazole (manufactured by Tokyo Chemical Industry Co., Ltd.)) mol) and 4.35 g (55 mmol) of pyridine were dissolved in 50 g of tetrahydrofuran, and cooled to 0°C. Next, after dissolving 8.33 g (50 mmol) of cinnamon chloride (manufactured by Tokyo Chemical Industry Co., Ltd.) in 30 g of tetrahydrofuran, it was added dropwise over 1 hour using a dropping funnel. After stirring for 1 at 0°C, it was stirred at 25°C for 2 hours. Next, it was dissolved in 400 mL of ethyl acetate and transferred to a separatory funnel. Next, this was washed once with 100 mL of water, twice with 100 mL of saturated sodium bicarbonate, twice with 150 mL of saturated saline, and dried with sodium sulfate. This was transferred to a single-necked flask while being filtered with filter paper, and the solvent was removed with a distiller to obtain 10 g of compound CA-1. It was confirmed to be compound CA-1 from ¹ H-NMR spectrum. The structure of compound CA-1 is estimated to be the structure represented by the following formula (CA-1). [Chemical formula 87]

<Synthesis Examples CA-2 and CA-3: Synthesis of Compounds CA-2 and CA-3> Compounds CA-2 and CA-3 were synthesized in the same manner as in Synthesis Example CA-1. The structures of the compounds CA-2 and CA-3 are estimated to be the structures represented by the following formula (CA-2) or the following formula (CA-3), respectively. [Chemical formula 88]

<Synthesis example A-1: Synthesis of polybenzoxazole precursor from 2,2'-bis(3-amino-4-hydroxyphenyl)hexafluoropropane and 4,4'-oxodibenzoyl chloride A-1> 28.0 g (76.4 mmol) of 2,2'-bis(3-amino-4-hydroxyphenyl)hexafluoropropane were dissolved in 200 g of N-methylpyrrolidone. Next, 12.1 g (153 mmol) of pyridine was added, and while maintaining the temperature at -10 to 0°C, 4,4'-oxobis dissolved in 75 g of N-methylpyrrolidone was added dropwise over 1 hour. A solution of 20.7 g (70.1 mmol) of benzyl chloride. After stirring for 30 minutes, 1.00 g (12.7 mmol) of acetyl chloride was added, and the mixture was further stirred for 60 minutes. Next, the polybenzoxazole precursor resin was precipitated in 6 liters of water, and the water-polybenzoxazole precursor resin mixture was stirred at 500 rpm for 15 minutes. The polybenzoxazole precursor resin was filtered and removed, stirred again in 6 liters of water for 30 minutes, and filtered again. Next, the obtained polybenzoxazole precursor resin was dried at 45° C. for 3 days under reduced pressure to obtain polybenzoxazole precursor A-1. The weight average molecular weight (Mw) and the number average molecular weight (Mn) of the polybenzoxazole precursor A-1 were Mw=21500 and Mn=9500. The structure of the polybenzoxazole precursor A-1 is estimated to be the structure represented by the following formula (A-1). [Chemical formula 89]

<Synthesis example A-2: Synthesis of polyimide precursor from pyromellitic dianhydride, 4,4'-diaminodiphenyl ether, and 2-hydroxyethyl methacrylate (A-2: having a radical Polyimide precursor of polymerizable group) > 14.06 g (64.5 mmol) of pyromellitic dianhydride (dried at 140°C for 12 hours), 16.8 g (129 mmol) of methacrylic acid 2-hydroxyethyl ester, 0.05 g of hydroquinone, 20.4 g (258 mmol) of pyridine, and 100 g of diglyme (diglyme) were mixed and stirred at a temperature of 60°C In 18 hours, a diester of pyromellitic acid and 2-hydroxyethyl methacrylate was produced. Next, after chlorinating the obtained diester with SOCl ₂ , 4,4'-diaminodiphenyl ether was converted into a polyimide precursor in the same manner as in Synthesis Example A-5, and synthesized according to The polyimide precursor A-2 was obtained in the same manner as in Example A-5. The weight average molecular weight of the polyimide precursor A-2 was 21,000. The structure of the polyimide precursor A-2 is presumed to be the structure represented by your following formula (A-2). [Chemical formula 90]

<Synthesis example A-3: Synthesis of polyimide precursor from 4,4'-oxydiphthalic dianhydride, 4,4'-diaminodiphenyl ether and 2-hydroxyethyl methacrylate (A-3: Polyimide precursor having a radically polymerizable group) > 20.0 g (64.5 mmol) of 4,4'-oxydiphthalic dianhydride (dried at 140°C) 12 hours), 16.8 g (129 mmol) of 2-hydroxyethyl methacrylate, 0.05 g of hydroquinone, 20.4 g (258 mmol) of pyridine, and 100 g of diglyme were mixed, It stirred at the temperature of 60 degreeC for 18 hours, and produced the diester of 4,4'- oxydiphthalic acid and 2-hydroxyethyl methacrylate. Next, after chlorinating the obtained diester with SOCl ₂ , 4,4'-diaminodiphenyl ether was converted into a polyimide precursor according to the same method as in Synthesis Example 1, and the precursor was converted into a polyimide precursor according to the same method as in Synthesis Example 1. The polyimide precursor was obtained in the same way. The weight average molecular weight of the polyimide precursor A-3 was 19,600. The structure of the polyimide precursor A-3 is estimated to be the structure represented by the following formula (A-3). [Chemical formula 91]

<Synthesis example A-4: from 4,4'-oxydiphthalic dianhydride, 4,4'-diamino-2,2'-dimethylbiphenyl (bi-o-toluidine) and methylbenzene Synthesis of polyimide precursor based on 2-hydroxyethyl acrylate (A-4: polyimide precursor with radically polymerizable group) > 20.0 g (64.5 mmol) of 4,4'-oxygen diphthalic dianhydride (dry at 140°C for 12 hours), 16.8 g (129 mmol) of 2-hydroxyethyl methacrylate, 0.05 g of hydroquinone, 20.4 g (258 mmol) pyridine and 100 g of diglyme were mixed and stirred at a temperature of 60°C for 18 hours to produce a diester of 4,4'-oxydiphthalic acid and 2-hydroxyethyl methacrylate . Next, after chlorinating the obtained diester with SOCl ₂ , it was converted into a polyimide precursor with 4,4'-diamino-2,2'-dimethylbiphenyl in the same manner as in Synthesis Example 1. and the polyimide precursor was obtained in the same manner as in Synthesis Example 1. The weight average molecular weight of the polyimide precursor A-4 was 23,500. The structure of the polyimide precursor A-4 is estimated to be the structure represented by the following formula (A-4). [Chemical formula 92]

[Synthesis example A-5: from oxydiphthalic dianhydride, 4,4'-diphthalic acid anhydrate, 2-hydroxyethyl methacrylate and 4,4'-diaminodiphenyl Ether Synthesis Polyimide Precursor Resin A-5] In a drying reactor equipped with a flat bottom joint equipped with a stirrer, a condenser and an internal thermometer, 4,4'-diphthalic acid was made anhydrous while removing water. 9.49 g (32.25 mmol) of the compound and 10.0 g (32.25 mmol) of oxydiphthalic dianhydride were suspended in 140 mL of diglyme. Next, 16.8 g (129 mmol) of 2-hydroxyethyl methacrylate, 0.05 g of hydroquinone, 0.05 g of pure water, and 10.7 g (135 mmol) of pyridine were added, and the mixture was stirred at a temperature of 60° C. for 18 hours. . Next, after cooling the mixture to -20°C, 16.1 g (135.5 mmol) of thionium chloride was added dropwise over 90 minutes. A white precipitate of pyridinium hydrochloride was obtained. Next, the mixture was heated to room temperature and stirred for 2 hours, and then 9.7 g (123 mmol) of pyridine and 25 mL of N-methylpyrrolidone (NMP) were added to obtain a clear solution. Next, a solution obtained by dissolving 11.8 g (58.7 mmol) of 4,4′-diaminodiphenyl ether in 100 mL of NMP was added to the obtained transparent liquid by dropwise addition over 1 hour. Next, 5.6 g (17.5 mmol) of methanol and 0.05 g of 3,5-di-tert-butyl-4-hydroxytoluene were added, and the mixture was stirred for 2 hours. Next, the polyimide precursor resin was precipitated in 4 liters of water, and the water-polyimide precursor resin mixture was stirred at 500 rpm for 15 minutes. The polyimide precursor resin was obtained by filtration, stirred again in 4 liters of water for 30 minutes, and filtered again. Next, the obtained polyimide precursor resin was dried under reduced pressure at 45° C. for 3 days to obtain a polyimide precursor A-5. The obtained polyimide precursor A-5 had a weight average molecular weight of 23,800 and a number average molecular weight of 10,400. The structure of the polyimide precursor A-5 is estimated to be the structure represented by the following formula (A-5). [Chemical formula 93]

<Synthesis example A-6: Synthesis of polyimide precursor from 4,4'-oxydiphthalic dianhydride, 4,4'-diaminodiphenyl ether and 2-hydroxyethyl methacrylate A-6＞ 155.1 g of 4,4'-oxydiphthalic dianhydride (ODPA) was put into a separate flask, and 134.0 g of 2-hydroxyethyl methacrylate (HEMA) and 400 ml of γ-butyrolactone were added . While stirring at room temperature, 79.1 g of pyridine was added to obtain a reaction mixture. After the heat generation due to the reaction was completed, it was naturally cooled to room temperature, and was further left to stand for 16 hours. Next, under ice-cooling, a solution obtained by dissolving 206.3 g of dicyclohexylcarbodiimide (DCC) in 180 mL of γ-butyrolactone was added to the reaction mixture over 40 minutes. Next, a suspension obtained by suspending 93.0 g of 4,4'-diaminodiphenyl ether in 350 mL of γ-butyrolactone was added over 60 minutes while stirring. After stirring at room temperature for 2 hours, 30 mL of ethanol was added, followed by stirring for 1 hour. Then, 400 mL of γ-butyrolactone was added. The reaction liquid was obtained by removing the precipitate produced in the reaction mixture by filtration. The obtained reaction solution was added to 3 liters of ethanol, and a precipitate consisting of a crude polymer was formed. The produced crude polymer was collected by filtration and dissolved in 1.5 L of tetrahydrofuran to obtain a crude polymer solution. The obtained crude polymer solution was added dropwise to 28 liters of water, and the polymer was precipitated. After filtering the obtained precipitate, vacuum drying was performed to obtain a powdery polyimide precursor A-6. . As a result of measuring the weight average molecular weight (Mw) of this polyimide precursor A-6, it was 24,000.

<Synthesis example A-7: Synthesis of polyamide from 3,3',4,4'-biphenyltetracarboxylic dianhydride, 4,4'-diaminodiphenyl ether and 2-hydroxyethyl methacrylate Amine precursor A-7> In Synthesis Example 6, except that 147.1 g of 3,3',4,4'-biphenyltetracarboxylic dianhydride was used instead of 155.1 g of 4,4'-oxydiphthalic dianhydride, the The reaction was carried out in the same manner as the method described in Synthesis Example 6 to obtain a polymer A-7. As a result of measuring the weight average molecular weight (Mw) of this polymer A-7, it was 22,900.

<Synthesis example PBI-1: Synthesis of polyimide PBI-1> In a flask equipped with a condenser and a stirrer, 4,4'-(hexafluoroisopropylidene)di-o-phenylene was added while removing water. Diformic anhydride (manufactured by Tokyo Chemical Industry Co., Ltd.) 22.2 g (50 mmol), 2,2,6,6,-tetramethylpiperidine 1-oxyl radical (Tokyo Chemical Industry Co., Ltd.) 0.02 g was dissolved in 100.0 g of N-methylpyrrolidone (NMP). Next, 11.9 g (45 mmol) of diamine (AA-1) described later was added, and the mixture was stirred at 25° C. for 3 hours, and further stirred at 45° C. for 3 hours. Next, 15.8 g (200 mmol) of pyridine, 12.8 g (125 mmol) of acetic anhydride, and 50 g of N-methylpyrrolidone (NMP) were added, and the mixture was stirred at 80° C. for 3 hours, and then N-methyl pyrrolidone was added. Pyrrolidone (NMP) 50g and diluted. The reaction solution was precipitated in 1 liter of methanol, and stirred at 3000 rpm for 15 minutes. The resin was filtered and removed, stirred again in 1 liter of methanol for 30 minutes, and filtered again. The obtained resin was dried at 40°C for 1 day under reduced pressure to obtain polyimide PBI-1. The molecular weight of PBI-1 was Mw=19,000, Mn=8,100. The structure of polyimide PBI-1 is estimated to be the structure represented by the following formula (PBI-1). [Chemical formula 94]

<Synthesis example AA-1: Synthesis of diamine AA-1> In a flask equipped with a condenser and a stirrer, 26.0 g (0.2 mol) of 2-hydroxyethyl methacrylate (manufactured by FUJIFILM Wako Pure Chemical Corporation) 17.4 g (0.22 mol) of dehydrated pyridine (manufactured by FUJIFILM Wako Pure Chemical Corporation) was dissolved in 78 g of ethyl acetate, and cooled to 5°C or lower. Next, 48.4 g (0.21 mol) of 3,5-nitrobenzyl chloride (manufactured by Tokyo Chemical Industry Co., Ltd.) was dissolved in 145 g of ethyl acetate, and the solution was passed through 1 using a dropping funnel. was added dropwise to the flask over a period of hours. After completion of the dropwise addition, the mixture was stirred at 10°C or lower for 30 minutes, heated to 25°C, and stirred for 3 hours. Next, the reaction solution was diluted with 600 mL of ethyl acetate (CH ₃ COOEt), transferred to a separatory funnel, and washed with 300 mL of water, 300 mL of saturated sodium bicarbonate (baking soda), 300 mL of dilute hydrochloric acid, and 300 mL of saturated brine in this order. . After liquid separation and washing, it was dried with 30 g of magnesium sulfate, concentrated in a distiller, and vacuum-dried to obtain 61.0 g of a dinitro body (A-1). Into a flask equipped with a condenser and a stirrer, 27.9 g (500 mmol) of reduced iron (manufactured by FUJIFILM Wako Pure Chemical Corporation) and 5.9 g (110 mmol) of ammonium chloride (manufactured by FUJIFILM Wako Pure Chemical Corporation) were weighed ), acetic acid (manufactured by FUJIFILM Wako Pure Chemical Corporation) 3.0 g (50 mmol), 2,2,6,6,-tetramethylpiperidine 1-oxyl radical (manufactured by Tokyo Chemical Industry Co., Ltd.) 0.03 g, 200 mL of isopropyl alcohol (IPA) and 30 mL of pure water were added and stirred. Next, 16.2 g of the above-mentioned dinitroform (A-1) was added little by little over 1 hour, and the mixture was stirred for 30 minutes. Next, after raising the external temperature to 85° C., stirring for 2 hours, and cooling to 25° C. or lower, filtration was performed using diatomaceous earth (registered trademark). The filtrate was concentrated with a rotary still, and dissolved in 800 mL of ethyl acetate. This was transferred to a separatory funnel, washed twice with 300 mL of saturated sodium bicarbonate, and washed with 300 mL of water and 300 mL of saturated saline in this order. After liquid separation washing, drying with 30 g of magnesium sulfate, concentration and vacuum drying in a distiller, 11.0 g of diamine (AA-1) was obtained. [Chemical formula 95]

<Examples and Comparative Examples> In each Example, each photosensitive resin composition was obtained by mixing the components described in the following table, respectively. In addition, in each comparative example, each composition for comparison was obtained by mixing the components described in the following table, respectively. Specifically, the content of the components other than the solvent described in the table is the amount (parts by mass) described in the column of each "addition amount" in the table. In addition, about PB-1 and PC-1, it added so that the solid content in a solution may be called the quantity (mass part) described in each "addition amount" of a table|surface. The obtained photosensitive resin composition and the composition for comparison were subjected to pressure filtration through a filter made of polytetrafluoroethylene having a pore width of 0.8 μm. In addition, in the table|surface, the description of "-" shows that a composition does not contain the corresponding component.

[Table 1] resin A compound having a group capable of photodiquantization reaction and an alkoxysilyl group Compounds with an azole group Compounds with an azole group and a group capable of photodimetric reaction Metal Adhesion Improver photopolymerization initiator polymeric compound polymerization inhibitor alkali generator Other additives solvent Hardening temperature (℃) pattern formation Copper adhesion type added amount type added amount type added amount type added amount type added amount type added amount type added amount type added amount type added amount type added amount type added amount type added amount Example 1 A-3 32 B-1 0.3 - 0 C-1 0.12 CA-1 0.1 D-1 0.1 OXE-01 1.2 A-DPH 6.0 G-1 0.08 H-1 0.1 - 0 DMSO/GBL 60 230 A A Example 2 A-3 32 B-2 0.3 - 0 C-2 0.12 CA-1 0.1 D-1 0.1 OXE-01 1.2 SR-209 6.0 G-2 0.08 H-2 0.1 - 0 DMSO/GBL 60 230 A A Example 3 A-3 32 B-3 0.3 - 0 C-3 0.12 CA-1 0.1 D-1 0.1 OXE-02 1.2 SR-209 6.0 G-3 0.08 H-1 0.1 - 0 DMSO/GBL 60 230 A B Example 4 A-3 32 B-4 0.2 PB-1 0.1 C-4 0.12 CA-1 0.1 D-1 0.1 OXE-01 1.2 SR-209 6.0 G-1 0.08 H-2 0.1 - 0 DMSO/GBL 60 230 B A Example 5 A-3 32 B-5 0.3 - 0 C-1 0.12 PC-1 0.1 D-1 0.1 OXE-01 1.2 SR-209 6.0 G-1 0.08 H-4 0.1 - 0 DMSO/GBL 60 230 B B Example 6 A-2 32 - 0 PB-1 0.25 C-7 0.12 CA-1 0.15 D-1 0.1 OXE-01 1.2 A-DPH 6.0 G-2 0.08 H-1 0.1 - 0 DMSO/GBL 60 230 B B Example 7 A-3 32 B-6 0.3 - 0 C-1 0.12 CA-2 0.1 D-1 0.1 OXE-01 1.2 SR-209 6.0 G-1 0.08 H-2 0.1 - 0 DMSO/GBL 60 230 A B Example 8 A-3 32 B-7 0.3 - 0 C-1 0.12 CA-3 0.1 D-1 0.1 OXE-01 1.2 A-DPH 6.0 G-1 0.08 H-1 0.1 - 0 DMSO/GBL 60 230 A B Example 9 A-3 32 B-8 0.3 - 0 C-1 0.12 PC-1 0.1 D-1 0.1 OXE-01 1.2 A-DPH 6.0 G-1 0.08 H-1 0.1 - 0 DMSO/GBL 60 230 B A Example 10 A-3 32 B-2 0.2 PB-1 0.2 C-5 0.12 - 0 D-2 0.1 OXE-02 1.2 SR-209 6.0 G-2 0.08 H-2 0.1 - 0 NMP 60 230 A A Example 11 A-4 32 B-1 0.2 - 0 C-6 0.12 - 0 D-1 0.1 OXE-02 1.2 SR-209 6.0 G-2 0.08 H-3 0.1 I-1 0.2 DMSO/GBL 60 230 B B Example 12 A-5 32 B-2 0.3 - 0 - 0 CA-1 0.22 D-1 0.1 OXE-01 1.2 SR-231 6.0 G-2 0.08 H-2 0.1 - 0 DMSO/GBL 60 230 A A Example 13 A-6 32 B-1 0.2 - 0 C-1 0.22 CA-2 0.1 D-2 0.1 OXE-01 1.2 SR-239 6.0 G-2 0.08 H-1 0.1 - 0 DMSO/GBL 60 230 B B

[Table 2] resin A compound having a group capable of photodiquantization reaction and an alkoxysilyl group Compounds with an azole group Compounds with an azole group and a group capable of photodimetric reaction Metal Adhesion Improver photopolymerization initiator polymeric compound polymerization inhibitor alkali generator Other additives solvent Hardening temperature (℃) pattern formation Copper adhesion type added amount type added amount type added amount type added amount type added amount type added amount type added amount type added amount type added amount type added amount type added amount type added amount Example 14 A-7 32 B-2 0.2 PB-1 0.15 C-5 0.12 CA-3 0.05 D-1 0.1 OXE-02 1.2 SR-209 6.0 G-2 0.08 H-1 0.1 - 0 DMSO/GBL 60 230 A A Example 15 A-1 32 B-1 0.2 PB-1 0.15 C-1 0.12 CA-1 0.05 D-1 0.1 OXE-01 1.2 A-DPH 6.0 G-1 0.08 H-2 0.1 - 0 DMSO/GBL 60 280 B B Example 16 A-3 32 B-9 0.3 - 0 C-2 0.12 CA-3 0.1 D-3 0.1 OXE-01 1.2 SR-209 6.0 G-3 0.08 H-2 0.1 - 0 DMSO/GBL 60 230 B B Example 17 A-3 32 B-10 0.3 - 0 C-2 0.12 CA-1 0.1 D-3 0.1 OXE-02 1.2 SR-209 6.0 G-3 0.08 H-2 0.1 - 0 DMSO/GBL 60 230 B B Example 18 PBI-1 28.1 B-2 0.2 PB-1 0.1 C-1 0.12 CA-1 0.1 D-1 0.1 OXE-01 1.2 SR-209 10.0 G-2 0.08 - 0 - 0 NMP 60 230 B A Comparative Example 1 A-1 32 - 0 - 0 C-5 0.31 - 0 D-2 0.31 OXE-02 1.2 SR-209 6.0 G-1 0.08 H-1 0.1 - 0 DMSO/GBL 60 280 D C Comparative Example 2 PBI-1 29 - 0 - 0 C-5 0.31 - 0 D-2 0.31 OXE-02 1.2 SR-209 9.1 G-1 0.08 - 0 - 0 NMP 60 230 D C Comparative Example 2 A-7 32 - 0 - 0 C-5 0.2 - 0 D-2 0.20 OXE-01 1.2 SR-209 6.0 G-1 0.08 H-1 0.1 I-1 0.22 NMP 60 230 C E

The details of each component described in the table are as follows.

[resin] •A-1 to A-7, PBI-1: Polybenzoxazole precursor A-1, polyimide precursor A-2 to A-7, polyimide precursor synthesized in the above synthesis example PBI-1

[Compounds having a group capable of photo-diquantization reaction and an alkoxysilyl group] •B-1 to B-10: B-1 to B-10 synthesized in the above synthesis example •PB-1: PB-1 synthesized in the above synthesis example In addition, PB-1 is a resin having a group capable of photo-dimerization reaction and an alkoxysilyl group.

[Compounds with an azole group (compounds that do not have either a group capable of photo-diquantization reaction and an alkoxysilyl group, and have an azole group)] • C-1 to C-7: the following formulas (C- 1) Compounds represented by (C-7) [Chemical formula 96]

[Compounds with an azole group and a group capable of photo-dimerization reaction (compounds having a group capable of photo-dimerization reaction and an azole group without an alkoxysilyl group)] • CA-1 to CA-3: the following Compounds represented by the above formulae (CA-1) to (CA-3) • PC-1: PC-1 synthesized in the above-mentioned synthesis example In addition, PC-1 has an azole group and a group capable of performing a photodimerization reaction of resin. [Chemical formula 97]

[Metal Adhesion Improver] • D-1 to D-3: Compounds represented by the following formulae (D-1) to (D-3) [Chemical formula 98]

[Photopolymerization initiators (all trade names)] • OXE-01: IRGACURE OXE 01 (manufactured by BASF) • OXE-02: IRGACURE OXE 02 (manufactured by BASF)

[Polymerizable compounds (all trade names)] • SR-209: SR-209 (manufactured by Sartomer Company, Inc) • SR-231: SR-231 (manufactured by Sartomer Company, Inc) • SR-239: SR-239 (manufactured by Sartomer Company, Inc) •A-DPH: Dipivalerythritol hexaacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd.)

[Polymerization inhibitor] • G-1: 1,4-benzoquinone • G-2: 4-methoxyphenol • G-3: 1,4-dihydroxybenzene • G-4: compound of the following structure [ Chemical formula 99]

[Base generator] • H-1 to H-3: compounds of the following structures • H-4: WPBG-27 (FUJIFILM Wako Pure Chemical Corporation) [Chemical formula 100]

[Other additives] •I-1: N-Phenyldiethanolamine (manufactured by Tokyo Chemical Industry Co., Ltd.)

[Solvent] • DMSO: dimethyl sulfoxide • GBL: gamma-butyrolactone • NMP: N-methylpyrrolidone In the table, the description of "DMSO/GBL" indicates that a mixture obtained by mixing DMSO and GBL at a mixing ratio (mass ratio) of 80:20 was used.

<Evaluation> [Evaluation of Copper Adhesion] Each photosensitive resin composition or composition for comparison after the filtration was applied to a copper substrate in a layered form by a spin coating method to form a photosensitive resin composition layer. The copper substrate to which the obtained photosensitive resin composition layer was applied was dried at 100° C. for 5 minutes on a hot plate to form a photosensitive resin composition layer with a uniform thickness of 20 μm on the copper substrate. Using a stepper (Nikon NSR 2005 i9C), the photosensitive resin composition layer on the copper substrate was exposed at an exposure energy of 500 mJ/cm ² using a photomask having a square shape of 100 μm square without a mask. , and then developed with cyclopentanone for 60 seconds to obtain a 100 μm square resin layer. Furthermore, the temperature was increased at a temperature increase rate of 10° C./min in a nitrogen atmosphere, and after reaching the temperature described in the column of “hardening temperature (° C.)” in the table, the temperature was maintained for 3 hours to obtain a resin film. 2. However, in the case of using I-4 as the alkali generator, after reaching the temperature described in the column of the above "hardening temperature (°C)", the pattern was exposed to an exposure amount of 500 mJ/cm ² while maintaining for 3 hours. The entire face of the i exposure was performed. In an environment of 25° C. and 65% relative humidity (RH), the shear force was measured on the 100 μm square resin film 2 on the copper substrate using an adhesive strength tester (manufactured by XYZTEC, CondorSigma). The larger the shearing force, the larger the adhesion force, and it can be said that the adhesion between the metal and the cured film is excellent, which is a preferable result. The evaluation was performed according to the following evaluation criteria, and the evaluation results were described in the column of "Copper Adhesion" in the table. ―Evaluation Criteria― A: Shear force exceeds 40gf B: Shear force exceeds 35gf and 40gf or less C: Shear force exceeds 30gf and 35gf or less D: Shear force exceeds 25gf and 30gf or less E: Shear force is 25gf or less 1gf is 9.80665×10 ^-3 N.

[Evaluation of Pattern Formability] Each photosensitive resin composition or composition for comparison was applied on a silicon wafer by spin coating (3,500 rpm, 30 seconds). The silicon wafer to which the composition was applied was dried on a heating plate at 100° C. for 5 minutes, and a uniform polymer layer with a thickness of 10 μm was formed on the silicon wafer. -exposure- A suitable aligner (Karl-Suss MA150) exposed the polymer layer on the silicon wafer. The exposure was performed with a high-pressure mercury lamp, and the exposure amount was set to the exposure amount at which the line width described later became the smallest. Exposure was performed by forming a reticle with a 1:1 line and space pattern with line widths ranging from 5 μm to 25 μm in steps of 1 μm. It was confirmed that the exposure energy at a wavelength of 365 nm required for producing a good structure. -Pattern formability- After exposure, the pattern was formed by developing with cyclopentanone for 60 seconds. The line width capable of having good edge sharpness was evaluated according to the following evaluation criteria. It indicates that the smaller the line width, the greater the difference in solubility in the developing solution between the light-irradiated portion and the light-non-irradiated portion, and the smaller the difference in solubility in the developing solution between the upper and lower layers of the film in the exposed portion, and the pattern is formed. Good performance is the best result. -evaluation standard- A: More than 5 μm and 10 μm or less B: More than 10 μm and 15 μm or less C: More than 15 μm but less than 20 μm D: More than 20 μm.

From the above results, it was found that the photosensitive resin composition of the present invention has excellent pattern formability. The compositions for comparison of Comparative Examples 1 to 3 did not contain a compound having a group capable of performing a photodimerization reaction and an alkoxysilyl group. It turned out that the pattern formability of this kind of composition for comparison was inferior.

<Example 101> By spin coating, the photosensitive resin composition used in Example 1 was applied to the surface of the copper thin layer of the resin substrate with the copper thin layer formed on the surface in a layered form, and dried at 100°C for 4 After forming a photosensitive resin composition layer with a film thickness of 20 μm in minutes, exposure was performed using a stepper (manufactured by Nikon Co., Ltd., NSR1505 i6). Exposure was performed at a wavelength of 365 nm via a mask (a binary mask with a 1:1 line-to-space pattern and a line width of 10 μm). After exposure, it was heated at 100°C for 4 minutes. After the above heating, the layer pattern was obtained by developing with cyclohexanone for 2 minutes and rinsing with PGMEA for 30 seconds. Next, the temperature was increased at a temperature increase rate of 10° C./min in a nitrogen atmosphere, and after reaching 230° C., the temperature was maintained at 230° C. for 3 hours to form an interlayer insulating film for rewiring layers. This interlayer insulating film for rewiring layers is excellent in insulating properties. Moreover, a semiconductor device was manufactured using these interlayer insulating films for rewiring layers, and as a result, it was confirmed that there was no problem in the operation.

without.

Claims (15)

A photosensitive resin composition comprising: at least one resin selected from the group consisting of a polyimide precursor, a polybenzoxazole precursor, a polyimide, and a polybenzoxazole; and Compound B, which is a compound having a group capable of performing a photodimerization reaction and an alkoxysilyl group. The photosensitive resin composition according to claim 1, wherein In the aforementioned compound B, the group capable of performing the aforementioned photo-diquantization reaction has a cinnamyl structure, a coumarin structure, a naphthalene structure or an anthracene structure. The photosensitive resin composition according to claim 1 or claim 2, wherein the compound B is a compound represented by the following formula (1-1) or the following formula (1-2), [Chemical formula 1]

In formula (1-1), R ¹ each independently represents a monovalent organic group, n represents an integer of 0 to 5, T ¹ and T ² each independently represent a hydrogen atom or a monovalent organic group, and X ¹ is a divalent linking group, Z ¹ represents an alkoxysilyl group, in formula (1-2), R ¹ each independently represents a monovalent organic group, m represents an integer of 0 to 4, and T ³ to T ⁶ Each independently represents a hydrogen atom or a monovalent organic group, X ² and X ³ each independently represent a divalent linking group, and Z ² and Z ³ each independently represent an alkoxysilyl group. The photosensitive resin composition according to claim 1 or claim 2, which further comprises a compound that does not have at least one of a group capable of photo-diquantization reaction and an alkoxysilyl group, and has an azole group C. The photosensitive resin composition according to claim 1 or claim 2, wherein The above-mentioned compound C is a compound which does not have an alkoxysilyl group, but has a group capable of performing a photodimerization reaction and an azole group. The photosensitive resin composition according to claim 1 or claim 2, wherein The aforementioned compound C is a resin. The photosensitive resin composition according to claim 1 or claim 2, wherein The aforementioned compound B is a resin. The photosensitive resin composition according to claim 1 or claim 2, wherein The aforementioned compound B contains an azole group. The photosensitive resin composition according to claim 1 or claim 2, which is used for formation of an interlayer insulating film for rewiring layers. A cured film obtained by curing the photosensitive resin composition according to any one of Claims 1 to 9. A layered body comprising two or more layers of the cured film according to claim 10, and including a metal layer between any of the cured films. A method for manufacturing a hardened film, comprising: The film formation process is to form a film by applying the photosensitive resin composition described in any one of Claims 1 to 9 to a substrate. The method for manufacturing a cured film as claimed in claim 12, comprising: The exposure process is to expose the aforementioned film; and the development process is to develop the aforementioned film. The method for manufacturing a cured film as claimed in claim 12, comprising: In the heating process, the aforementioned film is heated at 50-450°C. A semiconductor device comprising the cured film of claim 10.