TW202043146A - SiOC structure and composition for negative electrode using same, negative electrode, and secondary battery - Google Patents
SiOC structure and composition for negative electrode using same, negative electrode, and secondary battery Download PDFInfo
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Abstract
Description
本發明是有關於一種碳氧化矽(SiOC)結構體以及使用其的負極用組成物、負極及二次電池。The present invention relates to a silicon oxycarbide (SiOC) structure and a negative electrode composition, negative electrode and secondary battery using the same.
於各種電子設備或通訊設備以及混合動力汽車(hybrid vehicle)等環保車(eco-car)中,利用二次電池作為驅動電源。作為此種二次電池,主要推進將自層間釋放鋰離子的鋰插層(intercalation)化合物用於正極物質,將充放電時可在結晶面間的層間吸藏、釋放鋰離子的碳質材料(例如石墨等)用於負極物質的各種鋰離子電池的開發,而且亦加以實用化。In various electronic equipment or communication equipment, as well as hybrid vehicles and other eco-cars, secondary batteries are used as driving power sources. As this type of secondary battery, it is mainly promoted to use lithium intercalation compounds that release lithium ions from the interlayers for positive electrode materials, and carbonaceous materials that can absorb and release lithium ions between the layers between the crystal planes during charge and discharge ( For example, graphite, etc.) are used in the development of various lithium-ion batteries for anode materials, and they are also put into practical use.
於如上所述的背景下,近年來,隨著各種電子設備、通訊設備的小型化、混合動力汽車等的快速普及,作為該些設備等的驅動電源,強烈要求開發容量更高、且循環特性或放電率特性等各種電池特性進一步提高的二次電池。為了實現此種高性能的二次電池,正持續進行尤其關注負極活性物質的研究開發,例如已知如下技術。Under the background described above, in recent years, with the rapid spread of various electronic equipment, communication equipment, and hybrid vehicles, etc., as a driving power source for these equipment, there is a strong demand for higher development capacity and cycle characteristics. Or a secondary battery with improved battery characteristics such as discharge rate characteristics. In order to realize such a high-performance secondary battery, research and development with particular attention to negative electrode active materials are continuing, and the following technologies are known, for example.
例如,專利文獻1中揭示有一種藉由將各種聚倍半矽氧烷與矽粒子物理混合,並於規定的條件下對由此而得的混合物進行加熱處理而獲得的SiOC複合材料、以及將該SiOC複合材料用作負極活性物質的負極及鋰離子電池。專利文獻1中示出,若利用所述負極活性物質,則於電池循環試驗中可提高電池容量及循環耐久性。再者,專利文獻1中記載有於所揭示的SiOC複合材料中,將矽粒子埋入源自聚倍半矽氧烷的SiOC基質中,所謂該矽粒子向SiOC基質中的「埋入」,如上所述,是指藉由聚倍半矽氧烷與矽粒子的物理混合而實現的結構,即,可理解為是指矽粒子僅分散於SiOC基質中的結構。For example,
進而,專利文獻2中揭示有一種包含複合粒子的負極材料,所述複合粒子藉由陶瓷來被覆能夠將鋰離子吸藏、脫離的無機質粒子的整面或一部分。更詳細而言,專利文獻2所揭示的負極材料是一種非水電解液二次電池用負極材料,其特徵在於,所述無機質粒子含有選自由Si、Sn及Zn所組成的群組中的至少一種作為構成元素,所述陶瓷包括含有選自由Si、Ti、Al及Zr所組成的群組中的至少一種元素的氧化物、氮化物或碳化物。專利文獻2中暗示有:根據具有該構成的負極材料,可降低因鋰離子等的插層/脫插層而產生的負極材的體積變化,可提高充放電循環特性等電池特性。於專利文獻2中,作為所述負極材料的具體的實施方式,記載有幾個利用SiOC陶瓷來被覆包含Si等的無機微粒子的例子,鑒於該些例子,專利文獻2所揭示的負極材料是經過如下的製造步驟而製造者。即,作為前驅物有機分子,將苯基三甲氧基矽烷溶膠化,於由此而得的溶膠中添加所述無機微粒子,進而進行水解反應及縮聚反應使其凝膠化,形成塊狀凝膠。藉由對該塊狀凝膠進行加熱處理,而將轉換為SiOC陶瓷者用作負極材料。因此,認為於專利文獻2所揭示的負極材料中,無機微粒子以分散於源自塊狀凝膠的SiOC陶瓷中的狀態加以保持。Furthermore,
進而,於專利文獻3中揭示有藉由將矽、矽合金或氧化矽的微粒子與有機矽化合物或其混合物一起燒結而獲得的矽複合體粒子、以及使用該矽複合體粒子的非水電解質二次電池用負極材。專利文獻3所揭示的矽複合體粒子的特徵在於,藉由將所述有機矽化合物或其混合物燒結而形成的矽系無機化合物成為黏合劑(binder),且是在其中分散有矽或矽合金微粒子而成,並且具有在該粒子內存在空隙的結構。專利文獻3中示出,若將此種矽複合體粒子用作負極材,則可獲得良好的循環特性。具體而言,專利文獻3所揭示的矽複合體粒子是使矽微粒子與包含矽氧烷化合物等各種有機矽化合物的硬化性矽氧烷組成物的混合物硬化,對所得的塊狀物熱處理並對所獲得的矽複合體進行破碎處理而得者。因此,關於專利文獻3所揭示的負極材,亦可認為矽等微粒子以分散於矽複合體中般的狀態存在。Furthermore,
進而,於專利文獻4中揭示有一種包含陶瓷複合材料的非水電解質二次電池用負極活性物質,所述陶瓷複合材料是金屬矽及SiC分散於SiOC陶瓷中而成。更詳細而言,專利文獻4所揭示的陶瓷複合材料的特徵在於,當將使用CuKα特性X射線的X射線繞射中的所述金屬矽的(111)面繞射線的峰值強度設為b1、將所述SiC的(111)面繞射線的峰值強度設為b2時,由b1/b2所表示的比及以30 MPa壓縮時的密度分別處於規定的數值範圍內。專利文獻4中暗示有,根據使用了包含此種陶瓷複合材料的負極活性物質的二次電池,發揮優異的初始效率、充放電容量及循環特性。具體而言,專利文獻4所揭示的陶瓷複合材料是經過如下的製造步驟而製造者。即,於溶解有作為碳源的酚醛清漆型酚樹脂的碳前驅物溶液中添加金屬矽粒子,繼而加入四乙氧基矽烷,對藉由使該矽烷化合物聚合而獲得的聚合物,經過加熱硬化及脫溶媒處理的步驟而進行煆燒,將由此而得的陶瓷複合材料用作負極活性物質。因此,專利文獻4所揭示的陶瓷複合材料亦是於SiOC陶瓷中分散有金屬矽及SiC的粒子而成者。Furthermore, Patent Document 4 discloses a negative electrode active material for a non-aqueous electrolyte secondary battery comprising a ceramic composite material in which metallic silicon and SiC are dispersed in SiOC ceramics. In more detail, the ceramic composite material disclosed in Patent Document 4 is characterized in that the peak intensity of the (111) plane-wound rays of the metal silicon in the X-ray diffraction using CuKα characteristic X-rays is set to b1, When the peak intensity of the (111) plane-wound ray of the SiC is set to b2, the ratio represented by b1/b2 and the density when compressed at 30 MPa are within predetermined numerical ranges. Patent Document 4 suggests that a secondary battery using a negative electrode active material containing such a ceramic composite material exhibits excellent initial efficiency, charge and discharge capacity, and cycle characteristics. Specifically, the ceramic composite material disclosed in Patent Document 4 is manufactured through the following manufacturing steps. That is, metal silicon particles are added to a carbon precursor solution in which novolak-type phenol resin is dissolved as a carbon source, and then tetraethoxysilane is added, and the polymer obtained by polymerizing the silane compound is cured by heating And the step of solvent removal treatment is sintered, and the ceramic composite material thus obtained is used as a negative electrode active material. Therefore, the ceramic composite material disclosed in Patent Document 4 is also obtained by dispersing particles of metallic silicon and SiC in SiOC ceramics.
進而,專利文獻5為中國專利申請公開公報,可認為揭示了如各圖所示的核-殼結構的奈米矽能量吸藏材料以及含有該吸藏材料的鋰離子電池。專利文獻5所揭示的奈米矽能量吸藏材料具體而言可認為是藉由以下方式而取得的複合材料,即,對Si奈米粒子進行利用矽烷偶合劑的表面處理,於各種有機矽烷化合物的水解物中均勻地分散進行了所述表面處理的Si奈米粒子,進而利用石油瀝青對藉由使該水解物縮聚而取得的縮聚物進行被覆處理後,進行煆燒。根據各圖所示的核-殼結構,亦可認為該複合材料包括:為矽奈米粒子的核、源自聚合性有機矽氧烷的中間層、以及位於該中間層的外側的源自石油瀝青的外殼,於專利文獻5中,雖然刊載有示出實際上取得的複合材料的外觀的掃描式電子顯微鏡(Scanning Electron Microscope,SEM)照片(該文獻的圖5),但並未示出任何調查其內部結構得到的結果,關於是否實際形成有該文獻的圖3或圖4的示意圖所示般的核-殼結構,不明確的點有很多。
[現有技術文獻]
[專利文獻]Furthermore,
[專利文獻1]日本專利特表2018-502029號公報 [專利文獻2]日本專利特開2004-335335號公報 [專利文獻3]日本專利特開2005-310759號公報 [專利文獻4]日本專利特開2017-62974號公報 [專利文獻5]中國專利申請公開第107464926號公報[Patent Document 1] Japanese Patent Publication No. 2018-502029 [Patent Document 2] Japanese Patent Laid-Open No. 2004-335335 [Patent Document 3] Japanese Patent Laid-Open No. 2005-310759 [Patent Document 4] Japanese Patent Laid-Open No. 2017-62974 [Patent Document 5] Chinese Patent Application Publication No. 107464926
[發明所欲解決之課題] 如上所述,隨著各種電子設備、通訊設備的小型化、混合動力汽車等的快速普及,對於作為該些設備等的驅動電源而採用的二次電池,一直要求包括容量維持率及庫侖效率等各種循環特性在內的各種電池特性的進一步提高,尤其積極進行關注負極活性物質的研究開發。[The problem to be solved by the invention] As described above, with the miniaturization of various electronic equipment, communication equipment, and the rapid spread of hybrid vehicles, etc., secondary batteries used as driving power sources for these equipment have been required to include capacity retention and coulomb efficiency. Various battery characteristics including various cycle characteristics are further improved, and research and development focusing on negative electrode active materials are particularly active.
於此種狀況下,本發明者等人亦以專利文獻1所記載的負極活性物質為代表而開發各種負極活性物質,特別是對於使用SiOC複合材料的負極活性物質,亦反覆研究適合產業規模的量產、關注各種製造步驟的研究。其中,本發明者等人於負極活性物質的用途中,推進了藉由將矽奈米粒子與聚倍半矽氧烷的複合材料煆燒而得的各種SiOC複合材料的開發。於此種SiOC複合材料的開發中,本發明者等人發現:若在靜置條件下而非攪拌條件下進行將成為聚倍半矽氧烷合成的起始材料的官能性矽烷化合物水解,繼而,於矽系奈米粒子的存在下使該水解物縮聚而合成聚倍半矽氧烷的步驟,則生成矽系奈米粒子由具有較平滑的外表面的聚倍半矽氧烷塗層均勻地被覆而成的矽系奈米粒子/聚倍半矽氧烷複合體,此種塗層對矽系奈米粒子的均勻的被覆結構於藉由加熱處理而轉換為SiOC結構體後亦可維持。進而,本發明者等人發現,若將具有此種結構的SiOC結構體用作負極活性物質來製作鋰離子二次電池,則循環容量維持率、平均庫侖效率等電池特性有所提高。
即,本發明是根據所述發現而完成者,本發明的課題在於提供一種可實現良好的容量維持率及庫侖效率的負極活性物質用材料及該材料的製造方法、以及將該材料用作負極活性物質的負極用組成物、負極及二次電池。
[解決課題之手段]Under such circumstances, the inventors of the present invention have also developed various negative electrode active materials represented by the negative electrode active material described in
為解決所述課題,根據本發明可提供以下內容。In order to solve the problem, according to the present invention, the following can be provided.
[1]一種SiOC結構體,包含: (A)至少一個矽系微粒子;以及 (B)至少含有Si(矽)、O(氧)及C(碳)作為構成元素的SiOC塗層, 所述至少一個矽系微粒子由所述SiOC塗層被覆, 所述SiOC結構體的布厄特(Brunauer-Emmett-Teller,BET)比表面積為20 m2 /g以下,且 藉由雷射繞射散射式粒度分佈測定法而獲得的累計10%粒徑(D10)、累計50%粒徑(D50)及累計90%粒徑(D90)滿足1 nm≦D50≦990 μm且D90/D10≦13.0的條件。[1] A SiOC structure comprising: (A) at least one silicon-based fine particle; and (B) a SiOC coating containing at least Si (silicon), O (oxygen) and C (carbon) as constituent elements, said at least A silicon-based fine particle is covered by the SiOC coating, and the Brunauer-Emmett-Teller (BET) specific surface area of the SiOC structure is 20 m 2 /g or less, and the particle size is dispersed by laser diffraction The cumulative 10% particle size (D10), cumulative 50% particle size (D50), and cumulative 90% particle size (D90) obtained by the distribution measurement method satisfy the conditions of 1 nm≦D50≦990 μm and D90/D10≦13.0.
[2]如[1]所述的SiOC結構體,其中所述至少一個矽系微粒子與所述SiOC塗層相互化學鍵結。 [3]如[1]或[2]所述的SiOC結構體,其中所述BET比表面積為15 m2 /g以下。 [4]如[1]~[3]中任一項所述的SiOC結構體,其中所述BET比表面積為10 m2 /g以下。 [5]如[1]~[4]中任一項所述的SiOC結構體,其中所述累計50%粒徑(D50)滿足500 nm≦D50≦100 μm的條件。[2] The SiOC structure according to [1], wherein the at least one silicon-based fine particle and the SiOC coating are chemically bonded to each other. [3] The SiOC structure according to [1] or [2], wherein the BET specific surface area is 15 m 2 /g or less. [4] The SiOC structure according to any one of [1] to [3], wherein the BET specific surface area is 10 m 2 /g or less. [5] The SiOC structure according to any one of [1] to [4], wherein the cumulative 50% particle size (D50) satisfies the condition of 500 nm≦D50≦100 μm.
[6]如[1]~[5]中任一項所述的SiOC結構體,其中所述累計50%粒徑(D50)滿足1 μm≦D50≦20 μm的條件。 [7]如[1]~[6]中任一項所述的SiOC結構體,其中所述累計10%粒徑(D10)及所述累計90%粒徑(D90)滿足2.0≦D90/D10≦12.0的條件。 [8]如[1]~[7]中任一項所述的SiOC結構體,其中所述累計10%粒徑(D10)及所述累計90%粒徑(D90)滿足2.5≦D90/D10≦8.0的條件。 [9]如[1]~[8]中任一項所述的SiOC結構體,其中所述至少一個矽系微粒子具有1 nm~2 μm的範圍的體積基準平均粒子徑。[6] The SiOC structure according to any one of [1] to [5], wherein the cumulative 50% particle size (D50) satisfies the condition of 1 μm≦D50≦20 μm. [7] The SiOC structure according to any one of [1] to [6], wherein the cumulative 10% particle size (D10) and the cumulative 90% particle size (D90) satisfy 2.0≦D90/D10 The condition of ≦12.0. [8] The SiOC structure according to any one of [1] to [7], wherein the cumulative 10% particle size (D10) and the cumulative 90% particle size (D90) satisfy 2.5≦D90/D10 The condition of ≦8.0. [9] The SiOC structure according to any one of [1] to [8], wherein the at least one silicon-based fine particle has a volume-based average particle diameter in the range of 1 nm to 2 μm.
[10]如[1]~[9]中任一項所述的SiOC結構體,其中所述至少一個矽系微粒子具有10 nm~500 nm的範圍的體積基準平均粒子徑。 [11]如[1]~[10]中任一項所述的SiOC結構體,其中藉由所述至少一個矽系微粒子由所述SiOC塗層完全被覆而形成多個二次粒子,該多個二次粒子經由所述SiOC塗層相互連結。 [12]如[1]~[11]中任一項所述的SiOC結構體,其中基於SiOC結構體的總質量,含有50質量%~90質量%的範圍的Si、5質量%~35質量%的範圍的O、及2質量%~35質量%的範圍的C作為主要的構成元素。 [13]一種負極用組成物,含有如[1]~[12]中任一項所述的SiOC結構體作為負極活性物質。 [14]如[13]所述的負極用組成物,更含有碳系導電助劑及/或黏結劑。[10] The SiOC structure according to any one of [1] to [9], wherein the at least one silicon-based fine particle has a volume-based average particle diameter in the range of 10 nm to 500 nm. [11] The SiOC structure according to any one of [1] to [10], wherein the at least one silicon-based fine particle is completely covered by the SiOC coating to form a plurality of secondary particles, The two secondary particles are connected to each other via the SiOC coating. [12] The SiOC structure according to any one of [1] to [11], which contains Si in the range of 50% to 90% by mass and 5% to 35% by mass based on the total mass of the SiOC structure O in the range of% and C in the range of 2% by mass to 35% by mass are main constituent elements. [13] A composition for a negative electrode containing the SiOC structure according to any one of [1] to [12] as a negative electrode active material. [14] The negative electrode composition according to [13], further containing a carbon-based conductive auxiliary agent and/or a binder.
[15]一種負極,含有如[13]或[14]所述的負極用組成物。 [16]一種二次電池,包括至少一個如[15]所述的負極。 [17]如[16]所述的二次電池,其為鋰離子二次電池。[15] A negative electrode comprising the negative electrode composition according to [13] or [14]. [16] A secondary battery including at least one negative electrode as described in [15]. [17] The secondary battery according to [16], which is a lithium ion secondary battery.
[18]一種製造SiOC結構體的方法,包括: (p)將由通式(I)所表示的矽烷化合物水解,繼而,於矽系微粒子的存在下進行縮聚,藉此生成由含有至少一種含矽聚合物的塗層被覆至少一個矽系微粒子而成的矽系微粒子/含矽聚合物複合體;以及 (q)於非氧化性氣體氛圍下,對所述矽系微粒子/含矽聚合物複合體實施加熱處理,藉此轉換為如[1]~[10]中任一項所述的SiOC結構體, R1 n SiX1 4-n …(I) (式中,R1 為氫、羥基或碳數1~45的經取代或未經取代的烴,且於碳數1~45的烴中,任意的氫可經鹵素取代,任意的-CH2 -可經-O-、-CH=CH-、伸環烷基或伸環烯基取代, X1 為鹵素、碳數1~6的烷基氧基或乙醯氧基, 於R1 及X1 分別存在多個的情況下,分別相互獨立, n為0~3的整數)。[18] A method of manufacturing a SiOC structure, comprising: (p) hydrolyzing the silane compound represented by the general formula (I), and then performing polycondensation in the presence of silicon-based fine particles, thereby generating a silicon-containing compound containing at least one A silicon-based microparticle/silicon-containing polymer composite formed by coating at least one silicon-based microparticle with a polymer coating; and (q) treating the silicon-based microparticle/silicon-containing polymer composite under a non-oxidizing atmosphere Heat treatment is performed to convert into the SiOC structure as described in any one of [1] to [10], R 1 n SiX 1 4-n … (I) (where R 1 is hydrogen, hydroxyl or A substituted or unsubstituted hydrocarbon having 1 to 45 carbon atoms, and in the hydrocarbon having 1 to 45 carbon atoms, any hydrogen can be substituted by halogen, and any -CH 2 -can be -O-, -CH=CH -, cycloalkylene or cycloalkenylene substitution, X 1 is halogen, alkyloxy or acetoxy having 1 to 6 carbons, and when there are multiple R 1 and X 1 respectively, they are mutually Independent, n is an integer from 0 to 3).
[19]如[18]所述的方法,其中由通式(I)所表示的矽烷化合物為由下述通式(II)所表示的矽烷化合物: R10 Si(R7 )(R8 )(R9 ) …(II) (式中,R7 、R8 及R9 分別獨立地為氫、鹵素、羥基或碳數1~4的烷基氧基,R10 選自由碳數1~45的經取代或未經取代的烷基、經取代或未經取代的芳基、及經取代或未經取代的芳基烷基所組成的群組中,且於碳數1~45的烷基中,任意的氫可經鹵素取代,任意的-CH2 -可經-O-、-CH=CH-、伸環烷基或伸環烯基取代,於經取代或未經取代的芳基烷基中的伸烷基中,任意的氫可經鹵素取代,任意的-CH2 -可經-O-、-CH=CH-、伸環烷基或伸環烯基取代)。[19] The method according to [18], wherein the silane compound represented by the general formula (I) is a silane compound represented by the following general formula (II): R 10 Si(R 7 )(R 8 ) (R 9 ) …(II) (In the formula, R 7 , R 8 and R 9 are each independently hydrogen, halogen, hydroxyl, or alkyloxy group having 1 to 4 carbon atoms, and R 10 is selected from the group consisting of 1 to 45 carbon atoms The substituted or unsubstituted alkyl group, the substituted or unsubstituted aryl group, and the substituted or unsubstituted arylalkyl group, and the alkyl group having 1 to 45 carbon atoms Among them, any hydrogen can be substituted by halogen, and any -CH 2 -can be substituted by -O-, -CH=CH-, cycloalkylene or cycloalkenylene, in the case of substituted or unsubstituted arylalkane In the alkylene group, any hydrogen may be substituted by halogen, and any -CH 2 -may be substituted by -O-, -CH=CH-, cycloalkylene or cycloalkenylene).
[20]如[18]或[19]所述的方法,其中所述含矽聚合物包含選自由聚倍半矽氧烷所組成的群組中的至少一個,所述聚倍半矽氧烷分別具有分別由下述的通式(III)、通式(IV)、通式(V)及通式(VI)所表示的聚倍半矽氧烷結構: (式中,R1 及R4 分別獨立地選自由碳數1~45的經取代或未經取代的烷基、經取代或未經取代的芳基、及經取代或未經取代的芳基烷基所組成的群組中,於碳數1~45的烷基中,任意的氫可經鹵素取代,任意的-CH2 -可經-O-、-CH=CH-、伸環烷基或伸環烯基取代,於經取代或未經取代的芳基烷基中的伸烷基中,任意的氫可經鹵素取代,任意的-CH2 -可經-O-、-CH=CH-或伸環烷基取代; R2 、R3 、R5 及R6 分別獨立地選自由氫、碳數1~45的經取代或未經取代的烷基、經取代或未經取代的芳基、及經取代或未經取代的芳基烷基所組成的群組中,於碳數1~45的烷基中,任意的氫可經鹵素取代,任意的-CH2 -可經-O-、-CH=CH-、伸環烷基、伸環烯基或-SiR1 2 -取代,於經取代或未經取代的芳基烷基中的伸烷基中,任意的氫可經鹵素取代,任意的-CH2 -可經-O-、-CH=CH-、伸環烷基、伸環烯基或-SiR1 2 -取代;n表示1以上的整數)。[20] The method according to [18] or [19], wherein the silicon-containing polymer comprises at least one selected from the group consisting of polysilsesquioxanes, the polysilsesquioxanes They respectively have the polysilsesquioxane structure represented by the following general formula (III), general formula (IV), general formula (V) and general formula (VI): (In the formula, R 1 and R 4 are each independently selected from a substituted or unsubstituted alkyl group having 1 to 45 carbon atoms, a substituted or unsubstituted aryl group, and a substituted or unsubstituted aryl group In the group of alkyl groups, in the alkyl group with 1 to 45 carbon atoms, any hydrogen can be substituted by halogen, and any -CH 2 -can be -O-, -CH=CH-, cycloalkylene Or cycloalkenylene substitution. In the alkylene group in the substituted or unsubstituted arylalkyl group, any hydrogen can be replaced by halogen, and any -CH 2 -can be -O-, -CH=CH -Or cycloalkylene substitution; R 2 , R 3 , R 5 and R 6 are each independently selected from hydrogen, substituted or unsubstituted alkyl having 1 to 45 carbons, and substituted or unsubstituted aryl In the group consisting of substituted or unsubstituted arylalkyl groups, in the alkyl group with 1 to 45 carbon atoms, any hydrogen may be substituted by halogen, and any -CH 2 -may be -O -, -CH=CH-, cycloalkylene, cycloalkenylene or -SiR 1 2 -substituted, in the alkylene group in the substituted or unsubstituted arylalkyl group, any hydrogen may be halogenated Substitution, any -CH 2 -may be substituted by -O-, -CH=CH-, cycloalkylene, cycloalkenylene or -SiR 1 2 -; n represents an integer of 1 or more).
[21]如[18]~[20]中任一項所述的方法,其中於步驟(p)中進行下述(p-1)至(p-3): (p-1)於pH為3~6的酸性溶液中添加由通式(I)所表示的矽烷化合物,使該矽烷化合物水解; (p-2)於藉由步驟(p-1)而獲得的反應液中添加矽系微粒子或其分散液; (p-3)於藉由步驟(p-2)而獲得的混合液中添加規定量的酸或其溶液,而將所述混合液的pH調整為2以下,並使該混合液以規定時間且以規定溫度靜置,藉此進行所述矽烷化合物的縮聚,生成所述矽系微粒子/含矽聚合物複合體。[21] The method according to any one of [18] to [20], wherein the following (p-1) to (p-3) are performed in step (p): (P-1) Add the silane compound represented by the general formula (I) to an acidic solution with a pH of 3-6 to hydrolyze the silane compound; (P-2) Add silicon-based fine particles or its dispersion to the reaction solution obtained in step (p-1); (P-3) Add a predetermined amount of acid or its solution to the mixed liquid obtained in step (p-2), and adjust the pH of the mixed liquid to 2 or less, and make the mixed liquid for a predetermined time And it is allowed to stand at a predetermined temperature, whereby the polycondensation of the silane compound is performed, and the silicon-based fine particles/silicon-containing polymer composite is produced.
[22]如[18]~[21]中任一項所述的方法,其中於步驟(p)中進行下述(p-1’)至(p-3’): (p-1’)於pH為3~6的酸性溶液中,在攪拌條件下階段地添加由通式(I)所表示的矽烷化合物,並在攪拌條件下使該矽烷化合物以規定時間且以規定溫度水解; (p-2’)於藉由步驟(p-1’)而獲得的反應液中添加矽系微粒子或其分散液,使該矽系微粒子或其分散液均勻地分散於所述反應液中; (p-3’)於藉由步驟(p-2’)而獲得的混合液中添加規定量的酸或其溶液,而將所述混合液的pH調整為2以下,繼而,使該混合液以規定時間且以規定溫度靜置,藉此進行所述矽烷化合物的縮聚,生成所述矽系微粒子/含矽聚合物複合體。[22] The method according to any one of [18] to [21], wherein the following steps (p-1') to (p-3') are performed in step (p): (P-1') In an acidic solution with a pH of 3-6, the silane compound represented by the general formula (I) is added step by step under stirring conditions, and the silane compound is made to be used for a predetermined period of time under stirring conditions. Hydrolysis at specified temperature; (P-2') Adding silicon-based fine particles or its dispersion to the reaction solution obtained in step (p-1'), so that the silicon-based fine particles or its dispersion are uniformly dispersed in the reaction solution; (P-3') Add a predetermined amount of acid or its solution to the mixed liquid obtained in step (p-2'), and adjust the pH of the mixed liquid to 2 or less, and then make the mixed liquid It is allowed to stand for a predetermined time and at a predetermined temperature, whereby the polycondensation of the silane compound proceeds to produce the silicon-based fine particles/silicon-containing polymer composite.
[23]如[18]~[22]中任一項所述的方法,其中於步驟(p)中,使用酸或其水溶液作為酸觸媒。 [24]如[18]~[23]中任一項所述的方法,其中於通式(I)中,n=1,R1 為碳數1~10的烴,存在三個的X1 分別獨立地為鹵素、碳數1~6的烷基氧基或乙醯氧基。 [25]如[18]~[24]中任一項所述的方法,其中於步驟(p)中,由通式(I)所表示的矽烷化合物包含選自由甲基三甲氧基矽烷及苯基三甲氧基矽烷所組成的群組中的至少一個矽烷化合物。 [26]如[18]~[25]中任一項所述的方法,其中步驟(q)中的所述非氧化性氣體氛圍為含有惰性氣體的氛圍。 [27]如[18]~[26]中任一項所述的方法,其中步驟(q)中的所述非氧化性氣體氛圍為含有氮氣及/或氬氣的氛圍。[23] The method according to any one of [18] to [22], wherein in step (p), an acid or its aqueous solution is used as an acid catalyst. [24] The method according to any one of [18] to [23], wherein in the general formula (I), n=1, R 1 is a hydrocarbon having 1 to 10 carbons, and there are three X 1 Each is independently a halogen, an alkyloxy group having 1 to 6 carbon atoms, or an acetoxy group. [25] The method according to any one of [18] to [24], wherein in step (p), the silane compound represented by the general formula (I) comprises selected from methyltrimethoxysilane and benzene At least one silane compound in the group consisting of trimethoxysilane. [26] The method according to any one of [18] to [25], wherein the non-oxidizing gas atmosphere in step (q) is an atmosphere containing an inert gas. [27] The method according to any one of [18] to [26], wherein the non-oxidizing gas atmosphere in step (q) is an atmosphere containing nitrogen and/or argon.
[28]如[18]~[27]中任一項所述的方法,其中於步驟(q)中,將所述矽系微粒子/含矽聚合物複合體加熱至處於400℃~1800℃的範圍內的溫度,於該溫度下以30分鐘~10小時的範圍的時間進行加熱。 [29]一種製造負極用組成物的方法,包括:藉由將如[1]~[12]中任一項所述的SiOC結構體用作負極活性物質而取得負極用組成物。 [發明的效果][28] The method according to any one of [18] to [27], wherein in step (q), the silicon-based fine particles/silicon-containing polymer composite is heated to a temperature of 400°C to 1800°C The temperature within the range is heated at this temperature for a time ranging from 30 minutes to 10 hours. [29] A method of manufacturing a composition for a negative electrode, comprising: obtaining the composition for a negative electrode by using the SiOC structure as described in any one of [1] to [12] as a negative electrode active material. [Effects of the invention]
根據本發明,可於二次電池中實現良好的循環容量維持率及庫侖效率。According to the present invention, a good cycle capacity maintenance rate and coulomb efficiency can be achieved in a secondary battery.
以下,對本發明進行更詳細地說明。 <SiOC結構體> 根據本發明的第一實施方式,提供一種SiOC結構體,包含: (A)至少一個矽系微粒子;以及 (B)至少含有Si(矽)、O(氧)及C(碳)作為構成元素的SiOC塗層, 所述至少一個矽系微粒子由所述SiOC塗層被覆, 所述SiOC結構體的BET比表面積為20 m2 /g以下,且 藉由雷射繞射散射式粒度分佈測定法而獲得的累計10%粒徑(D10)、累計50%粒徑(D50)及累計90%粒徑(D90)滿足1 nm≦D50≦990 μm且D90/D10≦13.0的條件。 以下,對本發明的SiOC結構體進行詳述。Hereinafter, the present invention will be explained in more detail. <SiOC structure> According to the first embodiment of the present invention, there is provided a SiOC structure including: (A) at least one silicon-based fine particle; and (B) containing at least Si (silicon), O (oxygen), and C (carbon) ) SiOC coating as a constituent element, the at least one silicon-based fine particle is covered by the SiOC coating, and the SiOC structure has a BET specific surface area of 20 m 2 /g or less, and is diffused by laser diffraction The cumulative 10% particle size (D10), cumulative 50% particle size (D50), and cumulative 90% particle size (D90) obtained by the particle size distribution measurement method satisfy the conditions of 1 nm≦D50≦990 μm and D90/D10≦13.0. Hereinafter, the SiOC structure of the present invention will be described in detail.
(矽系微粒子) 本發明第一實施方式的SiOC結構體包含至少一個矽系微粒子。 於本發明中,「矽系微粒子」是包括實質上僅包含矽的矽微粒子、以及包含原子組成中含有矽(silicon)的化合物(例如二氧化矽、含矽金屬化合物)的微粒子的概念。(Silicon-based fine particles) The SiOC structure of the first embodiment of the present invention includes at least one silicon-based fine particle. In the present invention, "silicon-based fine particles" is a concept including silicon fine particles that essentially only contain silicon, and fine particles containing compounds containing silicon in their atomic composition (such as silicon dioxide and silicon-containing metal compounds).
矽系微粒子的粒子徑(體積基準平均粒子徑)只要為處於奈米尺度或微米尺度的範圍內者則能夠使用。雖並無特別限定,但例如可使用體積基準平均粒子徑處於1 nm~2 μm的範圍內的矽系微粒子。若考量將SiOC結構體用作二次電池的負極材料,則矽系微粒子的體積基準平均粒子徑(平均粒徑)較佳為處於例如10 nm~500 nm、較佳為10 nm~200 nm、更佳為20 nm~100 nm的範圍內。The particle diameter (volume-based average particle diameter) of the silicon-based fine particles can be used as long as it is in the range of the nanometer or micrometer scale. Although not particularly limited, for example, silicon-based fine particles having a volume-based average particle diameter in the range of 1 nm to 2 μm can be used. Considering the use of the SiOC structure as the negative electrode material of the secondary battery, the volume-based average particle diameter (average particle diameter) of the silicon-based fine particles is preferably, for example, 10 nm to 500 nm, preferably 10 nm to 200 nm, More preferably, it is in the range of 20 nm to 100 nm.
(SiOC塗層) 進而,本發明的第一實施方式的SiOC結構體包含被覆所述至少一個矽系微粒子的SiOC塗層。 此處,如上所述,SiOC塗層至少含有Si(矽)、O(氧)及C(碳)作為構成元素,但除該些之外,並未排除含有其他元素。 於本發明中,所謂SiOC塗層,並無特別限定,具體而言,如後所述,只要為含有至少一種含矽聚合物且被覆矽系微粒子的塗層藉由規定的加熱處理而陶瓷化者即可。(SiOC coating) Furthermore, the SiOC structure of the first embodiment of the present invention includes a SiOC coating layer covering the at least one silicon-based fine particle. Here, as described above, the SiOC coating contains at least Si (silicon), O (oxygen), and C (carbon) as constituent elements, but in addition to these, the inclusion of other elements is not excluded. In the present invention, the so-called SiOC coating is not particularly limited. Specifically, as described later, as long as it contains at least one silicon-containing polymer and is coated with silicon-based fine particles, it is ceramized by a predetermined heat treatment. Who can.
(利用SiOC塗層被覆矽系微粒子) 此外,本發明的SiOC結構體的特徵之一在於,「所述至少一個矽系微粒子由所述SiOC塗層完全被覆」。(Silic particles are coated with SiOC coating) In addition, one of the features of the SiOC structure of the present invention is that "the at least one silicon-based fine particle is completely covered by the SiOC coating layer."
此處,作為此種「被覆」的實施方式,只要SiOC結構體具有至少一個矽系微粒子由SiOC塗層完全被覆而成的結構部分即可,未必需要SiOC結構體所含的矽系微粒子全部由SiOC塗層完全被覆。即,於本發明中,作為利用SiOC塗層被覆矽系微粒子的實施方式,具體而言,可列舉以下的實施形態。 (i)SiOC結構體所含的矽系微粒子全部由SiOC塗層完全被覆的實施形態;以及 (ii)SiOC結構體所含的矽系微粒子中的至少一個由SiOC塗層完全被覆,而剩餘的矽系微粒子由SiOC塗層被覆一部分,該剩餘的矽系微粒子表面的一部分自SiOC塗層露出的實施形態。 此外,於本發明的SiOC結構體中,亦設想在含有多個矽系微粒子的情況下,該多個矽系微粒子的兩個以上相互直接且物理接觸,以該方式接觸的兩個以上的矽系微粒子由SiOC塗層完全被覆的實施形態。Here, as an embodiment of such "coating", as long as the SiOC structure has at least one structural part in which the silicon-based fine particles are completely covered by the SiOC coating, it is not necessary that all the silicon-based fine particles contained in the SiOC structure are The SiOC coating is completely covered. That is, in the present invention, as an embodiment in which silicon-based fine particles are coated with a SiOC coating, specifically, the following embodiments can be cited. (I) The embodiment in which the silicon-based fine particles contained in the SiOC structure are completely covered by the SiOC coating; and (Ii) At least one of the silicon-based fine particles contained in the SiOC structure is completely covered by the SiOC coating, while the remaining silicon-based fine particles are partially covered by the SiOC coating, and a part of the surface of the remaining silicon-based fine particles is exposed from the SiOC coating The implementation form. In addition, in the SiOC structure of the present invention, it is also envisaged that when a plurality of silicon-based fine particles are contained, two or more of the plurality of silicon-based fine particles are in direct and physical contact with each other, and the two or more silicon particles in contact in this way This is an embodiment in which the fine particles are completely covered by the SiOC coating.
進而,利用SiOC塗層被覆矽系微粒子的形態可藉由SEM等電子顯微鏡觀察進行確認。 作為以該方式所觀察到的SiOC結構體的形態,具體而言可列舉如圖2(a)及圖3(a)、圖3(b)所示的SEM照片中所觀察到的形態。更詳細而言,於本發明的SiOC結構體中,較佳為如圖2(a)及圖3(a)、圖3(b)的SEM照片中所觀察到般,藉由利用SiOC塗層來被覆至少一個矽系微粒子而形成多個二次粒子,該多個二次粒子經由所述SiOC塗層相互連結而成的形態。其原因在於,於SiOC結構體中顯現出矽系微粒子由SiOC塗層被覆、且經由SiOC塗層相互連結而成的形態的情況下,該SiOC結構體作為負極用活性物質發揮優異的性能,於二次電池中可期待容量維持率及庫侖效率的提高。Furthermore, the morphology of the silicon-based fine particles coated with the SiOC coating can be confirmed by electron microscope observation such as SEM. As the morphology of the SiOC structure observed in this manner, specifically, the morphology observed in the SEM photographs shown in FIGS. 2(a), 3(a), and 3(b) can be cited. In more detail, in the SiOC structure of the present invention, it is preferable to use the SiOC coating as observed in the SEM photos of Figure 2(a) and Figure 3(a) and Figure 3(b). To coat at least one silicon-based fine particle to form a plurality of secondary particles, which are connected to each other through the SiOC coating. The reason is that when the SiOC structure shows a form in which silicon-based fine particles are covered with a SiOC coating and are connected to each other via the SiOC coating, the SiOC structure exhibits excellent performance as an active material for negative electrodes. The improvement of the capacity retention rate and the coulombic efficiency can be expected in secondary batteries.
此外,於本發明中,矽系微粒子與SiOC塗層較佳為相互化學鍵結。 如上所述矽系微粒子與SiOC塗層相互化學鍵結的SiOC構造體具體而言可藉由後述的方法進行製造。 更詳細而言,藉由使用酸性觸媒使規定的官能性矽烷化合物水解,並於矽系微粒子的存在下進行縮聚,而於該矽系微粒子的周圍生成含有含矽聚合物的塗層,藉此取得矽系微粒子/含矽聚合物的複合體。根據此種矽系微粒子的存在下的矽烷化合物的縮聚反應,於所生成的矽系微粒子/含矽聚合物複合體中,顯現出矽系微粒子表面與藉由縮聚反應而生成的含矽聚合物化學鍵結的狀態。繼而,藉由於規定的條件下對該矽系微粒子/含矽聚合物複合體進行加熱處理,該塗層被陶瓷化,藉此轉換為SiOC結構體,所述矽系微粒子表面與含矽聚合物化學鍵結的結構於將矽系微粒子/含矽聚合物複合體轉換為SiOC結構體後亦可維持。即,於該SiOC結構體中,矽系微粒子與SiOC塗層藉由伴隨含矽聚合物的生成而產生的化學骨架來連結。作為此種化學骨架,可列舉含有Si-O-C、Si-O、Si-O-Si等的化學骨架。In addition, in the present invention, the silicon-based particles and the SiOC coating are preferably chemically bonded to each other. The SiOC structure in which the silicon-based fine particles and the SiOC coating are chemically bonded to each other as described above can be specifically manufactured by the method described below. In more detail, by using an acidic catalyst to hydrolyze a predetermined functional silane compound and perform polycondensation in the presence of silicon-based fine particles, a coating containing a silicon-containing polymer is formed around the silicon-based fine particles. This obtains a composite of silicon-based particles/silicon-containing polymer. According to the polycondensation reaction of the silane compound in the presence of such silicon-based fine particles, the surface of the silicon-based fine particles and the silicon-containing polymer formed by the polycondensation reaction appear in the formed silicon-based fine particles/silicon-containing polymer composite. The state of the chemical bond. Then, by heating the silicon-based fine particles/silicon-containing polymer composite under prescribed conditions, the coating is ceramized and converted into a SiOC structure. The surface of the silicon-based fine particles and the silicon-containing polymer The chemically bonded structure can also be maintained after the silicon-based microparticle/silicon-containing polymer composite is converted into an SiOC structure. That is, in the SiOC structure, the silicon-based fine particles and the SiOC coating are connected by a chemical skeleton that is generated along with the formation of the silicon-containing polymer. Examples of such chemical skeletons include chemical skeletons containing Si-O-C, Si-O, Si-O-Si, and the like.
(SiOC結構體的BET比表面積) 如上所述,本發明的SiOC結構體的BET比表面積需要為20 m2 /g以下。 SiOC結構體的BET比表面積的下限並無特別限定,例如,可設為1 m2 /g,即,該BET比表面積可為1 m2 /g~20 m2 /g的範圍。如上所述,於本發明的SiOC結構體中,具有至少一個矽系微粒子由SiOC塗層完全被覆而成的結構部分。更具體而言,該特徵與本發明的SiOC結構體即使在受到破碎處理等物理處理之後亦可整體上保持平滑且均勻的表面而不會出現表面粗糙有關。就更確實地保持此種光滑且均勻的表面的觀點而言,SiOC結構體的BET比表面積較佳為15 m2 /g以下,更佳為10 m2 /g以下,進而作為該BET比表面積的範圍,較佳為1 m2 /g~15 m2 /g,更佳為1 m2 /g~10 m2 /g。 再者,BET比表面積是指本領域技術人員公知的利用布魯諾-厄米特-特勒(Brunauer-Emmett-Teller,BET)法所得的比表面積。(BET specific surface area of SiOC structure) As described above, the BET specific surface area of the SiOC structure of the present invention needs to be 20 m 2 /g or less. The lower limit of the BET specific surface area of the SiOC structure is not particularly limited. For example, it may be 1 m 2 /g, that is, the BET specific surface area may be in the range of 1 m 2 /g to 20 m 2 /g. As described above, in the SiOC structure of the present invention, at least one silicon-based fine particle is completely covered by the SiOC coating. More specifically, this feature is related to that the SiOC structure of the present invention can maintain a smooth and uniform surface as a whole without surface roughness even after being subjected to physical treatment such as crushing treatment. From the viewpoint of maintaining such a smooth and uniform surface more reliably, the BET specific surface area of the SiOC structure is preferably 15 m 2 /g or less, more preferably 10 m 2 /g or less, and is further used as the BET specific surface area The range of is preferably 1 m 2 /g to 15 m 2 /g, more preferably 1 m 2 /g to 10 m 2 /g. Furthermore, the BET specific surface area refers to the specific surface area obtained by the Brunauer-Emmett-Teller (BET) method known to those skilled in the art.
(SiOC結構體的粒子徑) 於本發明的SiOC結構體中,如上所述,藉由雷射繞射散射式粒度分佈測定法而獲得的累計10%粒徑(D10)、累計50%粒徑(D50)及累計90%粒徑(D90)滿足1 nm≦D50≦990 μm且D90/D10≦13.0的條件。(The particle diameter of the SiOC structure) In the SiOC structure of the present invention, as described above, the cumulative 10% particle size (D10), cumulative 50% particle size (D50) and cumulative 90% particle size obtained by the laser diffraction scattering particle size distribution measurement method The diameter (D90) satisfies the conditions of 1 nm≦D50≦990 μm and D90/D10≦13.0.
此處,累計10%粒徑(D10)、累計50%粒徑(D50,所謂的中值粒徑)及累計90%粒徑(D90)是可藉由粒度分佈測定技術的領域中為公知技術的雷射繞射散射式粒度分佈測定法而測定及算出的粒徑。該些粒徑並無特別限定,可使用市售的雷射繞射/散射式粒度分佈測定裝置(例如麥奇克拜爾(MicrotracBEL)公司製造的MT-3300EX II)進行測定。Here, the cumulative 10% particle size (D10), the cumulative 50% particle size (D50, the so-called median particle size), and the cumulative 90% particle size (D90) are known technologies in the field of particle size distribution measurement technology. The particle size measured and calculated by the laser diffraction scattering particle size distribution method. These particle diameters are not particularly limited, and can be measured using a commercially available laser diffraction/scattering particle size distribution measuring device (for example, MT-3300EX II manufactured by MicrotracBEL).
於本發明的SiOC結構體中,所述累計50%粒徑(D50)較佳為500 nm≦D50≦100 μm,更佳為500 nm≦D50≦50 μm,進而更佳為500 nm≦D50≦20 μm,視情況亦可滿足1 μm≦D50≦20 μm、2 μm≦D50≦18 μm、2 μm≦D50≦17 μm、3 μm≦D50≦16 μm、4 μm≦D50≦16 μm的條件。In the SiOC structure of the present invention, the cumulative 50% particle size (D50) is preferably 500 nm≦D50≦100 μm, more preferably 500 nm≦D50≦50 μm, and even more preferably 500 nm≦D50≦ 20 μm, as appropriate, the conditions of 1 μm≦D50≦20 μm, 2 μm≦D50≦18 μm, 2 μm≦D50≦17 μm, 3 μm≦D50≦16 μm, 4 μm≦D50≦16 μm can also be satisfied.
此外,於本發明的SiOC結構體中,累計50%粒徑(D50)及累計90%粒徑(D90)較佳為2.0≦D90/D10≦12.0,更佳為2.0≦D90/D10≦11.0,進而更佳為2.0≦D90/D10≦10.0,特佳為2.0≦D90/D10≦9.5,例如亦可滿足2.0≦D90/D10≦9.0、2.0≦D90/D10≦8.5、2.5≦D90/D10≦8.0、2.5≦D90/D10≦7.0、3.0≦D90/D10≦7.0、視情況3.0≦D90/D10≦6.0的條件。In addition, in the SiOC structure of the present invention, the cumulative 50% particle size (D50) and the cumulative 90% particle size (D90) are preferably 2.0≦D90/D10≦12.0, more preferably 2.0≦D90/D10≦11.0, More preferably 2.0≦D90/D10≦10.0, particularly preferably 2.0≦D90/D10≦9.5, for example, 2.0≦D90/D10≦9.0, 2.0≦D90/D10≦8.5, 2.5≦D90/D10≦8.0 , 2.5≦D90/D10≦7.0, 3.0≦D90/D10≦7.0, and optionally 3.0≦D90/D10≦6.0.
於本發明的SiOC結構體中,在累計10%粒徑(D10)、累計50%粒徑(D50,所謂的中值粒徑)及累計90%粒徑(D90)滿足如上所述的條件的情況下,顯示出較均勻的粒度分佈,在將該SiOC結構體用作負極材料的情況下,可實現良好的電池特性。In the SiOC structure of the present invention, the cumulative 10% particle size (D10), the cumulative 50% particle size (D50, the so-called median particle size), and the cumulative 90% particle size (D90) satisfy the above-mentioned conditions In this case, it shows a relatively uniform particle size distribution, and when the SiOC structure is used as a negative electrode material, good battery characteristics can be achieved.
再者,於本發明的SiOC結構體中,只要累計10%粒徑(D10)、累計50%粒徑(D50,所謂的中值粒徑)及累計90%粒徑(D90)滿足所述條件,則並無特別限定,由頻率(%)所表示的粒度分佈中的體積基準平均粒子徑可處於1 nm~990 μm的範圍內。於在二次電池中用作負極活性物質的情況下,該平均粒子徑可處於較佳為500 nm~100 μm、更佳為1 μm~50 μm、進而更佳為1 μm~20 μm、特佳為1 μm~15 μm的範圍內。 再者,該平均粒子徑與累計10%粒徑(D10)、累計50%粒徑(D50,所謂的中值粒徑)及累計90%粒徑(D90)同樣地,可藉由使用雷射繞射/散射式粒度分佈測定裝置的雷射繞射散射法進行測定。Furthermore, in the SiOC structure of the present invention, as long as the cumulative 10% particle size (D10), the cumulative 50% particle size (D50, the so-called median particle size), and the cumulative 90% particle size (D90) satisfy the conditions , There is no particular limitation, and the volume-based average particle diameter in the particle size distribution represented by the frequency (%) may be in the range of 1 nm to 990 μm. In the case of being used as a negative electrode active material in a secondary battery, the average particle diameter may be preferably 500 nm to 100 μm, more preferably 1 μm to 50 μm, and even more preferably 1 μm to 20 μm. It is preferably in the range of 1 μm to 15 μm. Furthermore, the average particle diameter is the same as the cumulative 10% particle size (D10), the cumulative 50% particle size (D50, the so-called median particle size), and the cumulative 90% particle size (D90), which can be achieved by using laser Diffraction/scattering type particle size distribution measuring device using laser diffraction scattering method for measurement.
(SiOC結構體的元素組成) 本發明的SiOC結構體的元素組成並無特別限定,SiOC結構體可為基於SiOC結構體的總質量,含有例如50質量%~90質量%的範圍的Si、5質量%~35質量%的範圍的O、及2質量%~35質量%的範圍的C作為主要的構成元素者。進而,於一些實施形態中,本發明的SiOC結構體可為基於SiOC結構體的總質量,含有60質量%~90質量%的範圍的Si、10質量%~35質量%的範圍的O、及2質量%~20質量%的範圍的C作為主要的構成元素者,於另一實施形態中,含有65質量%~82質量%的範圍的Si、15質量%~35質量%的範圍的O、及3質量%~15質量%的範圍的C作為主要的構成元素。再者,除了Si、O及C以外,本發明的SiOC結構體當然亦可含有其他元素作為構成元素。(Elemental composition of SiOC structure) The elemental composition of the SiOC structure of the present invention is not particularly limited. The SiOC structure may be based on the total mass of the SiOC structure, and may contain, for example, Si in the range of 50% to 90% by mass, and the range of 5% to 35% by mass. O and C in the range of 2% to 35% by mass as the main constituent elements. Furthermore, in some embodiments, the SiOC structure of the present invention may be based on the total mass of the SiOC structure, containing Si in the range of 60% to 90% by mass, O in the range of 10% to 35% by mass, and C in the range of 2% by mass to 20% by mass as the main constituent element, in another embodiment, Si in the range of 65% to 82% by mass, O in the range of 15% to 35% by mass And C in the range of 3% by mass to 15% by mass as the main constituent element. Furthermore, in addition to Si, O, and C, the SiOC structure of the present invention may of course contain other elements as constituent elements.
<SiOC結構體的製造方法> 根據本發明的第二實施方式,提供一種製造SiOC結構體的方法(以下,有時稱為「SiOC結構體的製造方法」),包括: (p)將由通式(I)所表示的矽烷化合物水解,繼而,於矽系微粒子的存在下進行縮聚,藉此生成由含有至少一種含矽聚合物的塗層被覆至少一個矽系微粒子而成的矽系微粒子/含矽聚合物複合體;以及 (q)於非氧化性氣體氛圍下,對所述矽系微粒子/含矽聚合物複合體實施加熱處理,藉此轉換為所述SiOC結構體, R1 n SiX1 4-n …(I) (式中,R1 為氫、羥基或碳數1~45的經取代或未經取代的烴,且於碳數1~45的烴中,任意的氫可經鹵素取代,任意的-CH2 -可經-O-、-CH=CH-、伸環烷基或伸環烯基取代, X1 為鹵素、碳數1~6的烷基氧基或乙醯氧基, 於R1 及X1 分別存在多個的情況下,分別相互獨立, n為0~3的整數)。 以下,對本發明的SiOC結構體的製造方法進行詳述。<The manufacturing method of the SiOC structure> According to the second embodiment of the present invention, a method of manufacturing the SiOC structure (hereinafter, sometimes referred to as "the manufacturing method of the SiOC structure") is provided, including: (p) will be determined by the general formula (I) The silane compound represented by (I) is hydrolyzed and then polycondensed in the presence of silicon-based fine particles, thereby generating silicon-based fine particles/containing at least one silicon-based fine particles covered by a coating containing at least one silicon-containing polymer A silicon polymer composite; and (q) heat processing the silicon-based fine particles/silicon-containing polymer composite under a non-oxidizing gas atmosphere, thereby converting it into the SiOC structure, R 1 n SiX 1 4-n …(I) (In the formula, R 1 is hydrogen, a hydroxyl group or a substituted or unsubstituted hydrocarbon with 1 to 45 carbons, and among the hydrocarbons with 1 to 45 carbons, any hydrogen may be halogenated Substitution, any -CH 2 -can be substituted by -O-, -CH=CH-, cycloalkylene or cycloalkenylene, X 1 is halogen, alkyloxy with 1 to 6 carbons or acetyloxy When a plurality of R 1 and X 1 respectively exist, they are independent of each other, and n is an integer of 0 to 3). Hereinafter, the manufacturing method of the SiOC structure of the present invention will be described in detail.
(水解性矽烷化合物) 於本發明的SiOC結構體的製造方法中,首先,如上所述,於步驟(p)中,作為水解性矽烷化合物,使由通式(I)所表示的矽烷化合物水解,並使所得的水解物於矽系微粒子的存在下縮聚,藉此生成由含有至少一種含矽聚合物的塗層被覆至少一個矽系微粒子而成的矽系微粒子/含矽聚合物複合體。(Hydrolyzable silane compound) In the manufacturing method of the SiOC structure of the present invention, first, as described above, in step (p), as the hydrolyzable silane compound, the silane compound represented by the general formula (I) is hydrolyzed, and the resulting hydrolyzed The substance is polycondensed in the presence of silicon-based microparticles, thereby forming a silicon-based microparticle/silicon-containing polymer composite formed by coating at least one silicon-based microparticle with a coating containing at least one silicon-containing polymer.
作為較佳的實施形態,可採用以下實施方式:於通式(I)中,n=1,R1 為碳數1~10的烴,存在三個的X1 分別獨立地為鹵素、碳數1~6的烷基氧基或乙醯氧基。As a preferred embodiment, the following embodiments can be adopted: In the general formula (I), n=1, R 1 is a hydrocarbon with 1 to 10 carbons, and there are three X 1s each independently being a halogen and a carbon number. 1 to 6 alkyloxy or acetoxy.
進而,於一些實施形態中,作為由通式(I)所表示的矽烷化合物,亦可採用由以下的通式(II)所表示的矽烷化合物。 R10 Si(R7 )(R8 )(R9 ) …(II) (式中,R7 、R8 及R9 分別獨立地為氫、鹵素、羥基或碳數1~4的烷基氧基,R10 選自由碳數1~45的經取代或未經取代的烷基、經取代或未經取代的芳基、及經取代或未經取代的芳基烷基所組成的群組中,且於碳數1~45的烷基中,任意的氫可經鹵素取代,任意的-CH2 -可經-O-、-CH=CH-、伸環烷基或伸環烯基取代,於經取代或未經取代的芳基烷基中的伸烷基中,任意的氫可經鹵素取代,任意的-CH2 -可經-O-、-CH=CH-、伸環烷基或伸環烯基取代) 此處,於通式(II)中,作為所述經取代的烷基的取代基,較佳為鹵素、碳數1~10的烷基、碳數2~10的烯基、碳數1~5的烷氧基、苯基或萘基等芳香族基。Furthermore, in some embodiments, as the silane compound represented by the general formula (I), the silane compound represented by the following general formula (II) may also be used. R 10 Si(R 7 )(R 8 )(R 9 ) …(II) (wherein R 7 , R 8 and R 9 are each independently hydrogen, halogen, hydroxy, or alkyl oxygen having 1 to 4 carbon atoms Group, R 10 is selected from the group consisting of substituted or unsubstituted alkyl groups having 1 to 45 carbon atoms, substituted or unsubstituted aryl groups, and substituted or unsubstituted arylalkyl groups , And in an alkyl group with 1 to 45 carbon atoms, any hydrogen can be substituted by halogen, and any -CH 2 -can be substituted by -O-, -CH=CH-, cycloalkylene or cycloalkenylene, In the alkylene group in the substituted or unsubstituted arylalkyl group, any hydrogen can be substituted by halogen, and any -CH 2 -can be -O-, -CH=CH-, cycloalkylene or Cycloalkenylene substitution) Here, in the general formula (II), the substituent of the substituted alkyl group is preferably a halogen, an alkyl group having 1 to 10 carbons, and an alkene having 2 to 10 carbons. Group, C1-C5 alkoxy, phenyl or naphthyl and other aromatic groups.
作為由通式(I)所表示的矽烷化合物,更具體而言,主要可列舉有機三氯矽烷或有機三烷氧基矽烷類。 更詳細而言,可列舉:甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、三甲氧基(丙基)矽烷、正丁基三乙氧基矽烷、異丁基三甲氧基矽烷、正戊基三乙氧基矽烷、正己基三甲氧基矽烷、異辛基三乙氧基矽烷、癸基三甲氧基矽烷、甲基二甲氧基乙氧基矽烷、甲基二乙氧基甲氧基矽烷、2-氯乙基三乙氧基矽烷、甲氧基甲基三乙氧基矽烷、甲硫基甲基三乙氧基矽烷、甲氧基羰基甲基三乙氧基矽烷、2-丙烯醯氧基乙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷等經取代或未經取代的烷基三烷氧基矽烷化合物類;苯基三甲氧基矽烷、4-甲氧基苯基三甲氧基矽烷、2-氯苯基三甲氧基矽烷、苯基三乙氧基矽烷、2-甲氧基苯基三乙氧基矽烷、苯基二甲氧基乙氧基矽烷、苯基二乙氧基甲氧基矽烷等經取代或未經取代的芳基三烷氧基矽烷化合物類等。 特別是,由通式(I)所表示的矽烷化合物較佳為包含選自由甲基三甲氧基矽烷及苯基三甲氧基矽烷所組成的群組中的至少一個矽烷化合物。 進而,亦可除如上所述的有機三氯矽烷或有機三烷氧基矽烷以外,亦使用二烷氧基二烷基矽烷等其他類型的矽烷化合物;或者代替如上所述的有機三氯矽烷或有機三烷氧基矽烷,而使用二烷氧基二烷基矽烷等其他類型的矽烷化合物。As the silane compound represented by the general formula (I), more specifically, organotrichlorosilanes or organotrialkoxysilanes are mainly cited. In more detail, examples include: methyl trimethoxy silane, methyl triethoxy silane, ethyl trimethoxy silane, ethyl triethoxy silane, trimethoxy (propyl) silane, n-butyl Triethoxysilane, isobutyltrimethoxysilane, n-pentyltriethoxysilane, n-hexyltrimethoxysilane, isooctyltriethoxysilane, decyltrimethoxysilane, methyl dimethyl Oxyoxyethoxysilane, methyldiethoxymethoxysilane, 2-chloroethyltriethoxysilane, methoxymethyltriethoxysilane, methylthiomethyltriethoxysilane , Methoxycarbonylmethyltriethoxysilane, 2-propenyloxyethyltrimethoxysilane, 3-methacryloxypropyltriethoxysilane and other substituted or unsubstituted alkanes Trialkoxysilane compounds; Phenyltrimethoxysilane, 4-methoxyphenyltrimethoxysilane, 2-chlorophenyltrimethoxysilane, phenyltriethoxysilane, 2-methoxysilane Substituted or unsubstituted aryl trialkoxysilane compounds such as phenyl triethoxy silane, phenyl dimethoxy ethoxy silane, phenyl diethoxy methoxy silane, etc. In particular, the silane compound represented by the general formula (I) preferably includes at least one silane compound selected from the group consisting of methyltrimethoxysilane and phenyltrimethoxysilane. Furthermore, in addition to the above-mentioned organotrichlorosilane or organotrialkoxysilane, other types of silane compounds such as dialkoxydialkylsilane can also be used; or instead of the aforementioned organotrichlorosilane or For organotrialkoxysilanes, other types of silane compounds such as dialkoxydialkylsilanes are used.
其次,對步驟(p)中的所述矽烷化合物的水解及縮聚的條件進行詳述。
(溶媒)
構成步驟(p)中的反應液的溶媒只要是使所述矽烷化合物的水解/縮聚進行者則並無特別限定。具體而言,為了輔助所述矽烷化合物的水解而可含有水,除水之外可列舉:包含甲醇、乙醇、2-丙醇等醇類、二乙醚等醚類、丙酮或甲基乙基酮等酮類、己烷、二甲基甲醯胺(dimethyl formamide,DMF)、甲苯等芳香族烴溶劑的有機溶媒。該些可單獨使用一種,或者亦可混合使用兩種以上。Next, the conditions for the hydrolysis and polycondensation of the silane compound in step (p) will be described in detail.
(Solvent)
The solvent constituting the reaction liquid in the step (p) is not particularly limited as long as it is capable of proceeding the hydrolysis/polycondensation of the silane compound. Specifically, in order to assist the hydrolysis of the silane compound, water may be included. In addition to water, examples include alcohols such as methanol, ethanol, 2-propanol, ethers such as diethyl ether, acetone, or methyl ethyl ketone. Organic solvents such as ketones, hexane, dimethyl formamide (DMF), toluene and other aromatic hydrocarbon solvents. These may be used individually by 1 type, or may mix and
(酸性觸媒) 於本發明中,酸性觸媒並非必須的成分,但為了適當地控制水解及/或縮聚反應,可視情況使用。作為酸性觸媒,能夠使用有機酸、無機酸的任一種。 具體而言,有機酸可例示甲酸、乙酸、丙酸、草酸、檸檬酸等,無機酸可例示鹽酸、硫酸、硝酸、磷酸等。該些中,就可容易地控制水解反應及其後的縮聚反應、成本低且反應後的處理亦容易的方面而言,較佳為使用鹽酸及/或乙酸。(Acid catalyst) In the present invention, the acid catalyst is not an essential component, but it can be used as appropriate in order to appropriately control the hydrolysis and/or polycondensation reaction. As the acid catalyst, either organic acid or inorganic acid can be used. Specifically, the organic acid can be exemplified by formic acid, acetic acid, propionic acid, oxalic acid, and citric acid, and the inorganic acid can be exemplified by hydrochloric acid, sulfuric acid, nitric acid, and phosphoric acid. Among these, it is preferable to use hydrochloric acid and/or acetic acid in terms of easy control of the hydrolysis reaction and the subsequent polycondensation reaction, low cost, and easy handling after the reaction.
另外,於使用三氯矽烷等鹵化矽烷作為所述矽烷化合物的情況下,於水的存在下形成酸性水溶液,實現可進行該矽烷化合物的水解及縮聚的「酸性條件」。因此,於如上所述使用鹵化矽烷的情況下,即使不在反應體系中另行加入酸性觸媒,水解及縮聚反應亦會進行,因此亦無需另行加入觸媒。即,此種情況下,於步驟(p)中,酸性觸媒如上所述並非必須的要素。In addition, in the case of using a silane halide such as trichlorosilane as the silane compound, an acidic aqueous solution is formed in the presence of water to achieve "acidic conditions" under which the silane compound can be hydrolyzed and polycondensed. Therefore, in the case of using the silane halide as described above, even if an acidic catalyst is not added to the reaction system, the hydrolysis and polycondensation reaction will proceed, so there is no need to add a catalyst. That is, in this case, in step (p), the acid catalyst is not an essential element as described above.
(矽系微粒子) 關於矽系微粒子,如上所述,是包括實質上僅包含矽的矽微粒子、以及包含原子組成中含有矽(silicon)的化合物(例如二氧化矽、含矽金屬化合物)的微粒子的概念,於該概念的範圍內可無特別限制地利用。作為矽系微粒子,可較佳地利用實質上僅包含矽的矽微粒子,特別是由於市售有各種矽粉末,因此較佳為利用該些。再者,其平均粒子徑等條件如上所述。(Silicon-based fine particles) Regarding silicon-based fine particles, as described above, it is a concept that includes silicon fine particles that essentially only contain silicon, and fine particles that contain silicon in their atomic composition (such as silicon dioxide and silicon-containing metal compounds). The concept can be used without particular limitation. As the silicon-based fine particles, silicon fine particles that substantially contain only silicon can be preferably used. In particular, since various silicon powders are commercially available, these are preferably used. In addition, the conditions such as the average particle diameter are as described above.
(水解及縮聚反應的條件) 其次,對步驟(p)中的水解及縮聚的反應條件進行說明。(Conditions for hydrolysis and polycondensation) Next, the reaction conditions of the hydrolysis and polycondensation in step (p) will be described.
反應液中,所述矽烷化合物的比例並無特別限定,相對於反應液100質量份,例如為約0.1質量份~約30質量份,較佳為約0.1質量份~約25質量份,更佳為約0.5質量份~約20質量份。只要以此種範圍為基準,依照最終生成的SiOC結構體中欲實現的原子組成比,與矽系微粒子的添加比例一併適當地設定即可。The ratio of the silane compound in the reaction solution is not particularly limited. Relative to 100 parts by mass of the reaction solution, it is, for example, about 0.1 parts by mass to about 30 parts by mass, preferably about 0.1 parts by mass to about 25 parts by mass, and more preferably It is about 0.5 parts by mass to about 20 parts by mass. As long as this range is used as a reference, the ratio of the atomic composition to be realized in the SiOC structure to be finally produced can be appropriately set together with the addition ratio of the silicon-based fine particles.
對於矽系微粒子的添加比例,亦無特別限定,只要考慮於最終生成的SiOC結構體中欲實現的元素組成比、所期望的電池特性,與矽烷化合物一併適當地設定即可。相對於所述矽烷化合物100質量份,矽系微粒子的添加比例例如為約0.1質量份~約70質量份,較佳為約1.0質量份~約60.0質量份,更佳為約5.0質量份~約55質量份,特佳為約10質量份~約50質量份。The addition ratio of the silicon-based fine particles is also not particularly limited, as long as it considers the element composition ratio to be achieved in the SiOC structure to be finally produced, and the desired battery characteristics, and can be appropriately set together with the silane compound. With respect to 100 parts by mass of the silane compound, the addition ratio of the silicon-based fine particles is, for example, about 0.1 parts by mass to about 70 parts by mass, preferably about 1.0 parts by mass to about 60.0 parts by mass, more preferably about 5.0 parts by mass to about 55 parts by mass, particularly preferably about 10 parts by mass to about 50 parts by mass.
所述水解或縮聚時的反應液中所含的溶媒的比例只要適當地進行水解或縮聚反應,則並無特別限定,可列舉相對於所述矽烷化合物100質量份,例如為約50質量份~約2500質量份、較佳為約100質量份~約2400質量份、更佳為約100質量份~約2300質量份、特佳為約150質量份~約2200質量份的範圍。 進而,於特定的實施形態中,亦可相對於所述矽烷化合物100質量份,將水解反應時的反應液中所含的溶媒的比例設為例如約50質量份~約1500質量份,較佳為約100質量份~約1000質量份,更佳為約150質量份~約800質量份,特佳為約150質量份~約600質量份,相對於所述矽烷化合物100質量份,將縮聚反應時的反應液中所含的溶媒的比例設為例如約400質量份~約2500質量份,較佳為約500質量份~約2400質量份,更佳為約550質量份~約2300質量份,特佳為約600質量份~約2200質量份,視情況為約700質量份~約2000質量份。 再者,於採用所述比例範圍的情況下,如上所述可僅使用水作為溶媒,或者亦可使用水與其他溶媒(醇或有機溶媒等)的混合溶媒。The ratio of the solvent contained in the reaction solution during the hydrolysis or polycondensation is not particularly limited as long as the hydrolysis or polycondensation reaction is appropriately carried out, and it may be, for example, about 50 parts by mass to 100 parts by mass of the silane compound. It is about 2500 parts by mass, preferably about 100 parts by mass to about 2400 parts by mass, more preferably about 100 parts by mass to about 2300 parts by mass, particularly preferably about 150 parts by mass to about 2200 parts by mass. Furthermore, in a specific embodiment, the ratio of the solvent contained in the reaction liquid during the hydrolysis reaction may be, for example, about 50 parts by mass to about 1500 parts by mass relative to 100 parts by mass of the silane compound. It is about 100 parts by mass to about 1000 parts by mass, more preferably about 150 parts by mass to about 800 parts by mass, particularly preferably about 150 parts by mass to about 600 parts by mass, relative to 100 parts by mass of the silane compound, the polycondensation reaction The ratio of the solvent contained in the reaction solution at that time is set, for example, from about 400 parts by mass to about 2500 parts by mass, preferably from about 500 parts by mass to about 2400 parts by mass, more preferably from about 550 parts by mass to about 2300 parts by mass, It is particularly preferably about 600 parts by mass to about 2,200 parts by mass, and optionally about 700 parts by mass to about 2000 parts by mass. In addition, in the case of adopting the ratio range, as described above, only water may be used as a solvent, or a mixed solvent of water and other solvents (alcohol, organic solvent, etc.) may also be used.
於水解或縮聚反應時添加酸觸媒的情況下,該酸觸媒的比例只要以可獲得所期望的水解或縮聚反應的方式適當地調整即可,並無特別限定,相對於所述矽烷化合物100質量份,例如為約0.02質量份~約15質量份,較佳為約0.02質量份~約10質量份,更佳為約0.02質量份~約8質量份,視情況為約0.04質量份~約7質量份、約0.08質量份~約6質量份。When an acid catalyst is added during the hydrolysis or polycondensation reaction, the ratio of the acid catalyst may be appropriately adjusted so as to obtain the desired hydrolysis or polycondensation reaction, and is not particularly limited. 100 parts by mass, for example, about 0.02 parts by mass to about 15 parts by mass, preferably about 0.02 parts by mass to about 10 parts by mass, more preferably about 0.02 parts by mass to about 8 parts by mass, as appropriate, about 0.04 parts by mass to about About 7 parts by mass, about 0.08 parts by mass to about 6 parts by mass.
各成分的添加順序或添加方法並無特別限定,一般而言,例如可向反應容器中投入溶媒(將溶媒與觸媒混合而得的觸媒溶液),視情況將反應容器內的氛圍置換為規定的氣體氛圍(例如氮、氬、氦等惰性氣體)後,於攪拌下將所述矽烷化合物添加(滴加)至反應容器內的溶液中,於攪拌反應液的同時或於靜置狀態下,以規定的反應溫度及反應時間進行水解及/或縮聚反應。 再者,關於各成分的添加順序及水解/縮聚反應的方法,以下詳細敘述較佳的實施形態。The order or method of addition of each component is not particularly limited. Generally speaking, for example, a solvent (a catalyst solution obtained by mixing a solvent and a catalyst) can be put into the reaction vessel, and the atmosphere in the reaction vessel can be replaced with After a prescribed gas atmosphere (such as nitrogen, argon, helium and other inert gases), add (dropwise) the silane compound to the solution in the reaction vessel under stirring, while stirring the reaction solution or in a static state , The hydrolysis and/or polycondensation reaction is carried out at the specified reaction temperature and reaction time. Furthermore, regarding the order of addition of each component and the method of the hydrolysis/polycondensation reaction, preferred embodiments are described in detail below.
進而,水解及/或縮聚的反應溫度並無特別限定,例如為約-20℃~約80℃,較佳為約0℃~約70℃,視情況為約0℃~約40℃、約10℃~約30℃,例如可列舉常溫(例如室溫:20℃~25℃左右)。關於反應時間,亦無特別限定,例如可列舉約0.5小時~約100小時,視情況為約1小時~約80小時、約1小時~約6小時。Furthermore, the reaction temperature of hydrolysis and/or polycondensation is not particularly limited, and is, for example, about -20°C to about 80°C, preferably about 0°C to about 70°C, and optionally about 0°C to about 40°C, about 10°C. °C to about 30°C, for example, room temperature (for example, room temperature: about 20°C to 25°C). The reaction time is also not particularly limited, and for example, about 0.5 hour to about 100 hours, and about 1 hour to about 80 hours, and about 1 hour to about 6 hours as appropriate.
反應液的pH只要以所述矽烷化合物的水解及縮聚反應良好地進行的方式適當地調整即可,並無特別限定,通常只要在0.8~12的範圍內,根據所使用的具體的矽烷化合物或所期望的有機矽化合物(聚倍半矽氧烷)生成物的形狀或性質進行選擇即可。此處,反應液pH的調整可利用包含所述酸性觸媒的酸。The pH of the reaction solution is not particularly limited as long as the hydrolysis and polycondensation reaction of the silane compound proceed satisfactorily. The pH of the reaction solution is usually in the range of 0.8 to 12, depending on the specific silane compound or The shape or properties of the desired organosilicon compound (polysilsesquioxane) product can be selected. Here, the pH of the reaction liquid can be adjusted using the acid containing the acidic catalyst.
更詳細而言,於步驟(p)中,首先使所述矽烷化合物的水解反應於規定的條件下進行,然後,於矽系微粒子的存在下進行縮聚反應,藉此可合成本發明規定的矽系微粒子/含矽聚合物複合體。 更詳細而言,於一些實施形態中,亦可於步驟(p)中,進行下述(p-1)至(p-3)。In more detail, in step (p), the hydrolysis reaction of the silane compound is first performed under specified conditions, and then the polycondensation reaction is performed in the presence of silicon-based fine particles, whereby the silicon specified in the present invention can be synthesized It is a fine particle/silicon-containing polymer composite. In more detail, in some embodiments, the following (p-1) to (p-3) may also be performed in step (p).
(p-1)於pH為3~6的酸性溶液中添加由通式(I)所表示的矽烷化合物,使該矽烷化合物水解; (p-2)於藉由步驟(p-1)而獲得的反應液中添加矽系微粒子或其分散液; (p-3)於藉由步驟(p-2)而獲得的混合液中添加規定量的酸或其溶液,而將所述混合液的pH調整為2以下(視情況為1.5以下,例如0.9~2.0、0.9~1.5),並使該混合液以規定時間且以規定溫度靜置,藉此進行所述矽烷化合物的縮聚,生成所述矽系微粒子/含矽聚合物複合體。(P-1) Add the silane compound represented by the general formula (I) to an acidic solution with a pH of 3-6 to hydrolyze the silane compound; (P-2) Add silicon-based fine particles or its dispersion to the reaction solution obtained in step (p-1); (P-3) Add a prescribed amount of acid or its solution to the mixed liquid obtained in step (p-2), and adjust the pH of the mixed liquid to 2 or less (1.5 or less as the case may be, such as 0.9 ~2.0, 0.9~1.5), and the mixed solution is allowed to stand still at a predetermined temperature for a predetermined time, whereby the polycondensation of the silane compound is carried out to produce the silicon-based fine particles/silicon-containing polymer composite.
此外,於特定的實施形態中,亦可於步驟(p)中進行下述(p-1’)至(p-3’)。In addition, in a specific embodiment, the following (p-1') to (p-3') may also be performed in step (p).
(p-1’)於pH為3~6的酸性溶液中,在攪拌條件下階段地添加由通式(I)所表示的矽烷化合物,並在攪拌條件下使該矽烷化合物以規定時間且以規定溫度水解; (p-2’)於藉由步驟(p-1’)而獲得的反應液中添加矽系微粒子或其分散液,使該矽系微粒子或其分散液均勻地分散於所述反應液中; (p-3’)於藉由步驟(p-2’)而獲得的混合液中添加規定量的酸或其溶液,而將所述混合液的pH調整為2以下(視情況為1.5以下,例如0.9~2.0、0.9~1.5),繼而,使該混合液以規定時間且以規定溫度靜置,藉此進行所述矽烷化合物的縮聚,生成所述矽系微粒子/含矽聚合物複合體。(P-1') In an acidic solution with a pH of 3-6, the silane compound represented by the general formula (I) is added step by step under stirring conditions, and the silane compound is made to be used for a predetermined period of time under stirring conditions. Hydrolysis at specified temperature; (P-2') Adding silicon-based fine particles or its dispersion to the reaction solution obtained in step (p-1'), so that the silicon-based fine particles or its dispersion are uniformly dispersed in the reaction solution; (P-3') Add a predetermined amount of acid or its solution to the mixed liquid obtained in step (p-2'), and adjust the pH of the mixed liquid to 2 or less (1.5 or less as the case may be, For example, 0.9-2.0, 0.9-1.5), and then, the mixed solution is allowed to stand still for a predetermined time and at a predetermined temperature, whereby the polycondensation of the silane compound is performed, and the silicon-based fine particles/silicon-containing polymer composite is produced.
此處,於特定的實施形態中,作為步驟(p-1)或步驟(p-1’)中的「pH為3~6的酸性溶液」,例如可使用規定濃度的乙酸溶液(較佳為乙酸水溶液),作為乙酸濃度的範圍,例如可列舉約0.001 M~約0.1 M濃度、較佳為約0.005 M~約0.09 M濃度。進而,於特定的實施形態中,作為步驟(p-3)或步驟(p-3’)中的「規定量的酸或其溶液」,例如可使用規定濃度的鹽酸溶液(較佳為鹽酸水溶液),關於鹽酸的濃度範圍,並無特別限定,例如可列舉約10質量%~約40質量%、較佳為約20質量%~約40質量%的範圍。Here, in a specific embodiment, as the "acidic solution with a pH of 3 to 6" in step (p-1) or step (p-1'), for example, an acetic acid solution of a predetermined concentration (preferably Aqueous acetic acid), as the range of the acetic acid concentration, for example, a concentration of about 0.001 M to about 0.1 M, and preferably a concentration of about 0.005 M to about 0.09 M can be cited. Furthermore, in a specific embodiment, as the "predetermined amount of acid or its solution" in step (p-3) or step (p-3'), for example, a hydrochloric acid solution of a predetermined concentration (preferably an aqueous hydrochloric acid solution) can be used. ), the concentration range of hydrochloric acid is not particularly limited. For example, a range of about 10% by mass to about 40% by mass, preferably about 20% by mass to about 40% by mass can be cited.
以下,對步驟(p-1)至步驟(p-3)以及步驟(p-1’)至步驟(p-3’)進行詳述,並且示出更佳的實施形態。Hereinafter, steps (p-1) to (p-3) and steps (p-1') to (p-3') are described in detail, and a more preferable embodiment is shown.
於步驟(p-1)或步驟(p-1’)中,更具體而言,可藉由於酸性水性介質中使所述矽烷化合物水解而生成水解物,該矽烷化合物的水解反應例如可藉由將所述矽烷化合物滴加至酸性水性介質中而進行。 此處,於步驟(p-1)或步驟(p-1’)中,為了充分進行所期望的水解,採用水解反應速度高於縮聚反應速度,優先進行水解反應的酸性條件。實現此種酸性條件的pH區域視作為原料的矽烷化合物的種類而不同,但通常可調整為pH3~6、較佳為pH4~6。其原因在於,若反應液的pH處於此種範圍內,則生成的聚合物不會於反應液中析出,可實現良好的水解反應。再者,所述酸性的程度會影響到水解物生成的平衡、反應時間或部分縮合物的量及縮合數等,但不會對粒子徑產生大的影響。In step (p-1) or step (p-1'), more specifically, a hydrolyzate can be generated by hydrolyzing the silane compound in an acidic aqueous medium. The hydrolysis reaction of the silane compound can be, for example, The silane compound is added dropwise to an acidic aqueous medium. Here, in step (p-1) or step (p-1'), in order to fully perform the desired hydrolysis, acidic conditions are adopted in which the hydrolysis reaction rate is higher than the polycondensation reaction rate and the hydrolysis reaction proceeds preferentially. The pH range that realizes such acidic conditions varies depending on the type of the silane compound used as the raw material, but it can usually be adjusted to pH 3-6, preferably pH 4-6. The reason is that if the pH of the reaction liquid is in such a range, the produced polymer will not be precipitated in the reaction liquid, and a good hydrolysis reaction can be realized. Furthermore, the degree of acidity will affect the balance of hydrolyzate production, reaction time, or the amount of partial condensate and the number of condensation, etc., but it will not have a major impact on the particle size.
再者,作為製備該酸性pH區域的介質時可使用的酸,只要使用所述酸性觸媒即可,就可容易地控制並進行水解反應及之後的縮聚反應、獲取或pH調整亦容易的方面而言,最佳為使用乙酸。例如,於使用稀乙酸水溶液作為酸性水性介質的情況下,pH值為5.0~5.8左右。Furthermore, as the acid that can be used when preparing the medium in the acidic pH range, as long as the acid catalyst is used, the hydrolysis reaction and subsequent polycondensation reaction can be easily controlled, and the acquisition or pH adjustment is also easy In general, it is best to use acetic acid. For example, in the case of using a dilute aqueous acetic acid solution as the acidic aqueous medium, the pH is about 5.0 to 5.8.
繼而,於步驟(p-2)或步驟(p-2’)中,更具體而言,對包含步驟(p-1)中所獲得的水解物的反應液添加矽系微粒子(較佳為預先製備的矽系微粒子的分散液),將所得的混合溶液攪拌例如10秒~2小時、較佳為1分鐘~1.5小時左右。Then, in step (p-2) or step (p-2'), more specifically, silicon-based fine particles (preferably preliminarily) are added to the reaction solution containing the hydrolysate obtained in step (p-1) The prepared dispersion liquid of silicon-based fine particles), the resulting mixed solution is stirred, for example, for 10 seconds to 2 hours, preferably for about 1 minute to 1.5 hours.
繼而,於步驟(p-3)或步驟(p-3’)中,向步驟(p-2)或步驟(p-2’)中所獲得的混合溶液中添加規定量的酸或酸溶液,將該混合溶液攪拌例如1秒~30秒、較佳為1秒~15秒左右後,不攪拌而靜置例如2小時~36小時、較佳為4小時~24小時、更佳為4小時~12小時左右,藉此使步驟(p-1)中生成的水解物於矽系微粒子的存在下縮聚,取得具有本發明規定的結構的矽系微粒子/含矽聚合物複合體。Then, in step (p-3) or step (p-3'), a prescribed amount of acid or acid solution is added to the mixed solution obtained in step (p-2) or step (p-2'), After stirring the mixed solution for, for example, 1 second to 30 seconds, preferably 1 second to 15 seconds or so, it is allowed to stand without stirring, for example, 2 hours to 36 hours, preferably 4 hours to 24 hours, more preferably 4 hours to In about 12 hours, the hydrolyzate produced in step (p-1) is polycondensed in the presence of silicon-based fine particles to obtain a silicon-based fine particle/silicon-containing polymer composite having the structure specified in the present invention.
若如上所述,於步驟(p-3)或步驟(p-3’)中,不攪拌反應液而在靜置狀態下,於矽系微粒子的存在下使所述矽烷化合物的水解物的縮聚反應進行,則生成由含有含矽聚合物的塗層均勻地被覆至少一個矽系微粒子而成的矽系微粒子/含矽聚合物複合體(更具體而言為圖1所示的結構體),作為最終產品,確實製造出具有本發明規定的結構的SiOC結構體。As described above, in step (p-3) or step (p-3'), the hydrolysate of the silane compound is polycondensed in the presence of silicon-based fine particles without stirring the reaction liquid and in a static state As the reaction progresses, a silicon-based microparticle/silicon-containing polymer composite (more specifically, the structure shown in Figure 1) is formed by uniformly covering at least one silicon-based microparticle with a coating containing a silicon-containing polymer. As the final product, a SiOC structure having the structure specified in the present invention is indeed manufactured.
如上所述,步驟(p)中生成的矽系微粒子/含矽聚合物複合體中,作為構成部件而包含:含有含矽聚合物的塗層。 此處,含矽聚合物是經由所述規定的水解性矽烷化合物的水解及縮聚而生成者。於本發明中,含矽聚合物更具體而言可包含選自由聚碳矽烷、聚矽烷、聚矽氧烷及聚倍半矽氧烷所組成的群組中的至少一種聚合物。As described above, the silicon-based fine particles/silicon-containing polymer composite produced in step (p) includes as a constituent: a coating layer containing a silicon-containing polymer. Here, the silicon-containing polymer is produced by hydrolysis and polycondensation of the predetermined hydrolyzable silane compound. In the present invention, the silicon-containing polymer may more specifically include at least one polymer selected from the group consisting of polycarbosilane, polysiloxane, polysiloxane, and polysilsesquioxane.
一般而言,聚碳矽烷包含由以下的(1)~(3)所表示的各結構單元中的至少一個。 (1)(R1 R2 SiCH2 ) (2)(R1 Si(CH2 )1.5 ) (3)(R1 R2 R3 Si(CH2 )0.5 ) 此處,R1 、R2 及R3 分別獨立地為氫或碳數1~20(較佳為碳數1~6)的烴。作為烴的例子,可列舉甲基、乙基、丙基及丁基等烷基;乙烯基及烯丙基等烯基;苯基等芳基。此外,烴可為任意的部位經矽、氮或硼等雜原子取代者。 此外,聚碳矽烷可藉由例如鋁、鉻及鈦等各種金屬基將任意的部位取代。此種經金屬基取代的聚碳矽烷於現有技術中已知有各種化合物及其合成製程,故於本發明的SiOC結構體的製造方法中,可組合該些公知的合成製程。Generally, polycarbosilane contains at least one of the structural units represented by the following (1) to (3). (1) (R 1 R 2 SiCH 2 ) (2) (R 1 Si(CH 2 ) 1.5 ) (3) (R 1 R 2 R 3 Si(CH 2 ) 0.5 ) Here, R 1 , R 2 and R 3 is each independently hydrogen or a hydrocarbon having 1 to 20 carbons (preferably 1 to 6 carbons). Examples of hydrocarbons include alkyl groups such as methyl, ethyl, propyl, and butyl; alkenyl groups such as vinyl and allyl; and aryl groups such as phenyl. In addition, the hydrocarbon may be substituted with heteroatoms such as silicon, nitrogen, or boron at any position. In addition, polycarbosilane can be substituted with various metal groups such as aluminum, chromium, and titanium at any position. Various compounds and their synthesis processes are known in the prior art for such metal-substituted polycarbosilanes. Therefore, in the manufacturing method of the SiOC structure of the present invention, these known synthesis processes can be combined.
於本發明中,作為可作為含矽聚合物採用的聚矽烷,例如可列舉包含至少一個由以下(4)~(6)所示的結構單元的各種聚矽烷。In the present invention, as the polysilane that can be used as the silicon-containing polymer, for example, various polysilanes containing at least one structural unit shown in the following (4) to (6) can be cited.
(4)(R1 R2 R3 Si) (5)(R1 R2 Si) (6)(R3 Si) 此處,R1 、R2 及R3 如上所述。於特定的實施形態中,作為含矽聚合物的聚矽烷可為包含選自由(Me2 Si)、(PhMeSi)、(MeSi)、(PhSi)、(ViSi)、(PhHSi)、(MeHSi)、(MeViSi)、(Ph2 Si)、(PhViSi)及(Me3 Si)所組成的群組中的至少一個結構單元者。再者,Me表示甲基,Ph表示苯基,Vi表示乙烯基。 此外,聚矽烷可由任意的金屬基取代,即,可為含有規定個數的任意的金屬-Si的重複單元者。作為較佳的金屬基的例子,可列舉鋁、鉻及鈦。(4) (R 1 R 2 R 3 Si) (5) (R 1 R 2 Si) (6) (R 3 Si) Here, R 1 , R 2 and R 3 are as described above. In a specific embodiment, the polysilane as a silicon-containing polymer may be selected from (Me 2 Si), (PhMeSi), (MeSi), (PhSi), (ViSi), (PhHSi), (MeHSi), At least one structural unit in the group consisting of (MeViSi), (Ph 2 Si), (PhViSi) and (Me 3 Si). Furthermore, Me represents a methyl group, Ph represents a phenyl group, and Vi represents a vinyl group. In addition, polysilane may be substituted with any metal group, that is, it may contain a predetermined number of repeating units of any metal-Si. As examples of preferable metal bases, aluminum, chromium and titanium can be cited.
於本發明中,作為可作為含矽聚合物採用的聚矽氧烷,例如可列舉包含以下(7)所示的結構單元的各種聚矽氧烷。 (7)(R1 R2 R3 SiO0.5 )w (R4 R5 SiO)x (R6 SiO1.5 )y (SiO4/2 )z 此處,R1 、R2 、R3 、R4 、R5 及R6 分別獨立地如關於R1 、R2 及R3 所記載般,為氫或碳數1~20(較佳為碳數1~6)的烴。此外,w、x、y及z為分別所指示的各構成要素的莫耳比率,w=0~0.8,x=0.3~1,y=0~0.9,z=0~0.9,且w+x+y+z=1。In the present invention, as the polysiloxane that can be used as the silicon-containing polymer, for example, various polysiloxanes including the structural unit shown in (7) below can be cited. (7) (R 1 R 2 R 3 SiO 0.5 ) w (R 4 R 5 SiO) x (R 6 SiO 1.5 ) y (SiO 4/2 ) z Here, R 1 , R 2 , R 3 , R 4 , R 5 and R 6 are each independently hydrogen or a hydrocarbon having 1 to 20 carbons (preferably 1 to 6 carbons) as described for R 1 , R 2 and R 3 . In addition, w, x, y, and z are the molar ratios of the respective constituent elements indicated respectively, w=0 to 0.8, x=0.3 to 1, y=0 to 0.9, z=0 to 0.9, and w+x +y+z=1.
作為本發明中可採用的矽氧烷單元的具體例,可列舉(MeSiO1.5 )、(PhSiO1.5 )、(ViSiO1.5 )、(HSiO1.5 )、(PhMeSiO)、(MeHSiO)、(PhViSiO)、(MeViSiO)、(Ph2 SiO)、(Me2 SiO)、(Me3 SiO0.5 )(Ph2 ViSiO0.5 )、(Ph2 HSiO0.5 )、(H2 ViSiO0.5 )、(Me2 ViSiO0.5 )、(SiO4/2 )等。再者,Me表示甲基,Ph表示苯基,Vi表示乙烯基。Specific examples of siloxane units that can be used in the present invention include (MeSiO 1.5 ), (PhSiO 1.5 ), (ViSiO 1.5 ), (HSiO 1.5 ), (PhMeSiO), (MeHSiO), (PhViSiO), ( MeViSiO), (Ph 2 SiO), (Me 2 SiO), (Me 3 SiO 0.5 ) (Ph 2 ViSiO 0.5 ), (Ph 2 HSiO 0.5 ), (H 2 ViSiO 0.5 ), (Me 2 ViSiO 0.5 ), ( SiO 4/2 ) and so on. Furthermore, Me represents a methyl group, Ph represents a phenyl group, and Vi represents a vinyl group.
於本發明中,作為可作為含矽聚合物採用的聚倍半矽氧烷,主要包括含有(RSiO3/2 )X 單元的聚倍半矽氧烷。此處,R為飽和或不飽和、直鏈、支鏈或環狀的烴基,例如為-Cn H2n+1 (n為處於1~20的範圍內的整數),更具體而言,可為甲基、乙基、丙基、丁基、戊基、己基、庚基、辛基、壬基、癸基、十二烷基、十三烷基、十四烷基、十六烷基、十八烷基及二十烷基;亦可為芳基,特別是苯基或甲苯基;亦可為環烷基,詳細而言為環丁基、環戊基或環己基;亦可為烯基,特別是乙烯基或烯丙基;或者亦可為包含2-苯基乙基或苄基的芳烷基。R可於其中包含雜原子,特別是氮或鹵素,較佳為R為甲基、乙基、丙基或苯基。R亦可為兩種以上的不同基的組合。x為重複單元的個數,且為1以上的整數,例如可設為選自4~10,000的範圍中的任意的整數。In the present invention, polysilsesquioxanes that can be used as silicon-containing polymers mainly include polysilsesquioxanes containing (RSiO 3/2 ) X units. Here, R is a saturated or unsaturated, linear, branched or cyclic hydrocarbon group, for example -C n H 2n+1 (n is an integer in the range of 1 to 20), more specifically, For methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, dodecyl, tridecyl, tetradecyl, hexadecyl, Octadecyl and eicosyl; can also be aryl, especially phenyl or tolyl; can also be cycloalkyl, specifically cyclobutyl, cyclopentyl or cyclohexyl; can also be alkene Group, especially vinyl or allyl; or aralkyl containing 2-phenylethyl or benzyl. R may contain heteroatoms, especially nitrogen or halogen, preferably R is methyl, ethyl, propyl or phenyl. R may also be a combination of two or more different groups. x is the number of repeating units, and is an integer of 1 or more, and can be, for example, an arbitrary integer selected from the range of 4 to 10,000.
於較佳的實施形態中,作為被覆矽系微粒子的塗層的主要成分的含矽聚合物包含聚倍半矽氧烷。於更佳的實施形態中,該含矽聚合物實質上包含聚倍半矽氧烷,較佳為於步驟(p)中生成至少一個矽系微粒子由塗層被覆的矽系微粒子/含矽聚合物複合體,所述塗層包括包含聚倍半矽氧烷的含矽聚合物。此種結構的矽系微粒子/含矽聚合物複合體可藉由於步驟(p)中,於所述條件及程序的範圍內,使任意的三官能性有機矽烷(有機三烷氧基矽烷、有機三氯矽烷等)水解及縮聚而取得。In a preferred embodiment, the silicon-containing polymer as the main component of the coating layer covering the silicon-based fine particles contains polysilsesquioxane. In a more preferred embodiment, the silicon-containing polymer substantially contains polysilsesquioxane. Preferably, in step (p), at least one silicon-based fine particle is formed by coating silicon-based fine particle/silicon-containing polymer In a composite body, the coating includes a silicon-containing polymer containing polysilsesquioxane. The silicon-based microparticle/silicon-containing polymer composite of this structure can be made of any trifunctional organosilane (organotrialkoxysilane, organic Trichlorosilane, etc.) obtained by hydrolysis and polycondensation.
作為聚倍半矽氧烷,可包含選自由梯形聚倍半矽氧烷、POSS(TR 8 )等籠型聚倍半矽氧烷、不完全籠型聚倍半矽氧烷及其他類型的聚倍半矽氧烷所組成的群組中的至少一種。已知有各種類型的聚倍半矽氧烷及該些的合成方法,故可於本發明中利用該些合成方法(倍半矽氧烷材料的化學與應用展開,CMC出版,2013年普及版等)。As polysilsesquioxanes, it can include trapezoidal polysilsesquioxanes, POSS (T R 8 ) and other cage polysilsesquioxanes, incomplete cage polysilsesquioxanes and other types At least one of the group consisting of polysilsesquioxanes. Various types of polysilsesquioxanes and their synthesis methods are known, so these synthesis methods can be used in the present invention (Chemistry and Application Development of Silsesquioxane Materials, CMC Publication, 2013 Popular Edition Wait).
更詳細而言,於特定的實施形態中,該含矽聚合物可包含選自由聚倍半矽氧烷所組成的群組中的至少一個,所述聚倍半矽氧烷分別具有分別由下述的通式(III)、通式(IV)、通式(V)及通式(VI)所表示的聚倍半矽氧烷結構。 In more detail, in a specific embodiment, the silicon-containing polymer may include at least one selected from the group consisting of polysilsesquioxanes, the polysilsesquioxanes respectively having The polysilsesquioxane structure represented by the general formula (III), the general formula (IV), the general formula (V) and the general formula (VI).
式中,R1 及R4 分別獨立地選自由碳數1~45的經取代或未經取代的烷基、經取代或未經取代的芳基、及經取代或未經取代的芳基烷基所組成的群組中,於碳數1~45的烷基中,任意的氫可經鹵素取代,任意的-CH2 -可經-O-、-CH=CH-、伸環烷基或伸環烯基取代,於經取代或未經取代的芳基烷基中的伸烷基中,任意的氫可經鹵素取代,任意的-CH2 -可經-O-、-CH=CH-或伸環烷基取代; R2 、R3 、R5 及R6 分別獨立地選自由氫原子、碳數1~45的經取代或未經取代的烷基、經取代或未經取代的芳基、及經取代或未經取代的芳基烷基所組成的群組中,於碳數1~45的烷基中,任意的氫可經鹵素取代,任意的-CH2 -可經-O-、-CH=CH-、伸環烷基、伸環烯基或-SiR1 2 -取代,於經取代或未經取代的芳基烷基中的伸烷基中,任意的氫可經鹵素取代,任意的-CH2 -可經-O-、-CH=CH-、伸環烷基、伸環烯基或-SiR1 2 -取代; n表示1以上的整數。 於本發明中,「鹵素」可如字面意思來理解,表示氟、氯、溴、碘等,其中較佳為氟或氯。In the formula, R 1 and R 4 are each independently selected from a substituted or unsubstituted alkyl group having 1 to 45 carbon atoms, a substituted or unsubstituted aryl group, and a substituted or unsubstituted aryl alkyl group In the group formed by the group, in the alkyl group with 1 to 45 carbon atoms, any hydrogen can be substituted by halogen, and any -CH 2 -can be -O-, -CH=CH-, cycloalkylene or Cycloalkenylene substitution. In the alkylene group in the substituted or unsubstituted arylalkyl group, any hydrogen can be replaced by halogen, and any -CH 2 -can be replaced by -O-, -CH=CH- Or cycloalkylene substitution; R 2 , R 3 , R 5 and R 6 are each independently selected from a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 45 carbon atoms, and a substituted or unsubstituted aromatic group. In the group consisting of substituted or unsubstituted arylalkyl groups, in the alkyl group with 1 to 45 carbon atoms, any hydrogen may be substituted by halogen, and any -CH 2 -may be -O -, -CH=CH-, cycloalkylene, cycloalkenylene or -SiR 1 2 -substituted, in the alkylene group in the substituted or unsubstituted arylalkyl group, any hydrogen may be halogenated Substitution, any -CH 2 -may be substituted by -O-, -CH=CH-, cycloalkylene, cycloalkenylene or -SiR 1 2 -; n represents an integer of 1 or more. In the present invention, "halogen" can be understood literally and means fluorine, chlorine, bromine, iodine, etc., among which fluorine or chlorine is preferred.
本發明的SiOC結構體的製造方法可進而任意地包括如下步驟的至少一個。 (a)於經過水解反應及縮聚反應而生成矽系微粒子/含矽聚合物複合體後,任意地藉由過濾分離(例如加壓過濾)、固液分離、溶媒蒸餾去除、離心分離或者傾斜等方法,將液體組分分離及去除,並將所得的固體組分作為被熱處理對象而供試於步驟(q)中。關於此種固體成分與液體的分離方法,本領域技術人員已知有各種通用技術,故可適當地使用該些方法。 (b)進而,對以上所取得的固體組分進行水清洗或者有機溶劑清洗,並進行有機溶媒的蒸餾去除、乾燥(減壓乾燥及/或加熱乾燥)等。The manufacturing method of the SiOC structure of the present invention may further optionally include at least one of the following steps. (A) After the hydrolysis reaction and the polycondensation reaction produce a silicon-based fine particle/silicon-containing polymer composite, optionally filtration separation (such as pressure filtration), solid-liquid separation, solvent distillation removal, centrifugal separation or tilting, etc. In the method, the liquid component is separated and removed, and the obtained solid component is used as the heat-treated object to be tested in step (q). Regarding the separation method of such a solid component and a liquid, various general techniques are known to those skilled in the art, so these methods can be used appropriately. (B) Furthermore, the solid components obtained above are washed with water or organic solvent, and the organic solvent is distilled off and dried (drying under reduced pressure and/or heat drying).
關於步驟(q)的實施方式中的熱處理條件,只要考慮所使用的熱處理裝置的種類或容量等而適當地設定即可,例如可於非氧化性氛圍下,以0.5℃/分鐘~200℃/分鐘、較佳為0.5℃/分鐘~100℃/分鐘、更佳為1℃/分鐘~50℃/分鐘、進而更佳為1℃/分鐘~30℃/分鐘、特佳為2℃/分鐘~10℃/分鐘的升溫速度加熱至處於400℃~1800℃、較佳為600℃~1400℃、更佳為900℃~1300℃的範圍內的溫度,於該溫度下以5分鐘~20小時、較佳為30分鐘~10小時、更佳為1小時~8小時的範圍進行加熱處理。然而,關於升溫速度、熱處理溫度、加熱時間等熱處理條件,只要在考慮用作原料的聚倍半矽氧烷的性質、所期望的SiOC結構體的物性及其他性狀、生產率或經濟性的基礎上適當地選擇必要最小限度的熱處理條件即可,並無特別限定。Regarding the heat treatment conditions in the embodiment of step (q), it may be appropriately set in consideration of the type or capacity of the heat treatment device used, for example, it can be set at 0.5° C./min to 200° C./min in a non-oxidizing atmosphere. Minutes, preferably 0.5°C/minute to 100°C/minute, more preferably 1°C/minute to 50°C/minute, still more preferably 1°C/minute to 30°C/minute, particularly preferably 2°C/minute to Heating at a temperature increase rate of 10°C/min to a temperature in the range of 400°C to 1800°C, preferably 600°C to 1400°C, more preferably 900°C to 1300°C, and at this temperature for 5 minutes to 20 hours, The heat treatment is preferably performed in the range of 30 minutes to 10 hours, more preferably 1 hour to 8 hours. However, regarding the heat treatment conditions such as the heating rate, heat treatment temperature, and heating time, it is only necessary to consider the properties of the polysilsesquioxane used as a raw material, the physical properties of the desired SiOC structure, and other properties, productivity, or economy. The minimum necessary heat treatment conditions may be appropriately selected, and they are not particularly limited.
再者,本發明的「非氧化性氣體氛圍」中包括惰性氣體氛圍、還原性氛圍、併用該些氛圍的混合氛圍。作為惰性氣體氛圍,可列舉氮、氬、氦等惰性氣體,該些惰性氣體可單獨使用一種,或者亦可混合使用兩種以上。此外,惰性氣體只要為一般所使用者即可,較佳為高純度規格者。作為還原性氛圍,亦包括含有氫等還原性氣體的氛圍。例如可列舉2容積%以上的氫氣與惰性氣體的混合氣體氛圍。此外,作為還原性氛圍,視情況亦可使用氫氣氛圍本身。In addition, the "non-oxidizing gas atmosphere" of the present invention includes an inert gas atmosphere, a reducing atmosphere, and a mixed atmosphere using these atmospheres. Examples of the inert gas atmosphere include inert gases such as nitrogen, argon, and helium. These inert gases may be used alone or in combination of two or more. In addition, the inert gas may be used by general users, and is preferably of high purity specifications. The reducing atmosphere also includes an atmosphere containing a reducing gas such as hydrogen. For example, a mixed gas atmosphere of 2% by volume or more of hydrogen and inert gas can be cited. In addition, as a reducing atmosphere, a hydrogen atmosphere itself may be used as appropriate.
此外,非氧化性氛圍的環境是藉由以所述規定的氣體來對熱處理爐內的氛圍進行置換或將所述規定的氣體供給至該爐內而製作。 於將所述氣體供給至熱處理爐內的情況下,其氣體流量只要根據所採用的熱處理爐的規格(例如爐的形狀或尺寸)而適當地調整為恰當的範圍即可,並無特別限定,可設為每分鐘為爐內容量的5%~100%左右、較佳為每分鐘為5%~30%左右。更具體而言,於以實驗室規模使用一般所使用的真空吹掃(purge)式管式爐的情況下,氣體流量(吹掃量)例如可設為50 mL/分鐘~1 L/分鐘左右,較佳為100 mL/分鐘~500 mL/分鐘左右。此外,於藉由使用爐內容積為40 L左右的熱處理爐來製造本發明的SiOC結構體的情況下,氣體流量(吹掃量)例如可設為10 L/分鐘~15 L/分鐘左右。In addition, the non-oxidizing atmosphere is produced by replacing the atmosphere in the heat treatment furnace with the predetermined gas or supplying the predetermined gas into the furnace. When the gas is supplied into the heat treatment furnace, the gas flow rate may be appropriately adjusted to an appropriate range according to the specifications of the heat treatment furnace used (for example, the shape or size of the furnace), and is not particularly limited. It can be about 5% to 100% of the furnace content per minute, preferably about 5% to 30% per minute. More specifically, when a generally used vacuum purge tube furnace is used on a laboratory scale, the gas flow rate (purge amount) can be set to, for example, about 50 mL/min to 1 L/min. , Preferably about 100 mL/minute to 500 mL/minute. In addition, when manufacturing the SiOC structure of the present invention by using a heat treatment furnace with a furnace inner volume of about 40 L, the gas flow rate (purge amount) can be set to, for example, about 10 L/min to 15 L/min.
作為步驟(q)中能夠使用的熱處理爐,除真空吹掃式管式爐以外,亦可列舉例如旋轉窯(rotary kiln)型、輥底式窯(roller hearth kiln)型、間歇式窯(batch kiln)型、推板窯(pusher kiln)型、網帶窯(mesh belt kiln)型、碳爐、隧道窯(tunnel kiln)型、梭動窯(shuttle kiln)型、台車升降式窯型等各種熱處理爐。該些熱處理爐可僅使用一種,或者亦可組合兩種以上。再者,於組合兩種以上的情況下,各熱處理爐可串聯或並聯地連結。As heat treatment furnaces that can be used in step (q), in addition to vacuum-purge tube furnaces, for example, rotary kiln (rotary kiln) type, roller hearth kiln (roller hearth kiln) type, batch kiln (batch kiln type, pusher kiln type, mesh belt kiln type, carbon furnace, tunnel kiln type, shuttle kiln type, trolley lift kiln type, etc. Heat treatment furnace. Only one type of these heat treatment furnaces may be used, or two or more types may be combined. Furthermore, in the case of combining two or more types, the heat treatment furnaces may be connected in series or in parallel.
本發明的SiOC結構體的製造方法可更包括將藉由所述步驟(q)的熱處理而獲得的SiOC結構體破碎及/或分級等的追加步驟。該些步驟中能夠利用的破碎方法、分級方法並無特別限定,例如可採用公知的各種方法,可利用乳缽或各種破碎機、篩或旋風分級裝置等。The manufacturing method of the SiOC structure of the present invention may further include additional steps such as crushing and/or classification of the SiOC structure obtained by the heat treatment of the step (q). The crushing method and classification method that can be used in these steps are not particularly limited. For example, various known methods can be adopted, and a mortar, various crushers, sieves, cyclone classification devices, etc. can be used.
<負極用組成物及其製造方法> 根據本發明的另一實施方式,揭示一種負極用組成物。所述負極用組成物包含所述SiOC結構體作為負極活性物質。 此外,根據本發明的又一實施方式,亦揭示一種該負極用組成物的製造方法。該負極用組成物的製造方法包括:藉由將所述SiOC結構體用作負極活性物質而取得負極用組成物。<Composition for negative electrode and its manufacturing method> According to another embodiment of the present invention, a composition for a negative electrode is disclosed. The negative electrode composition includes the SiOC structure as a negative electrode active material. In addition, according to another embodiment of the present invention, a method of manufacturing the negative electrode composition is also disclosed. The method for producing the negative electrode composition includes obtaining the negative electrode composition by using the SiOC structure as a negative electrode active material.
本發明的負極用組成物亦可更含有後述的碳系導電助劑及/或黏結劑等追加成分。The composition for a negative electrode of the present invention may further contain additional components such as a carbon-based conductive auxiliary agent and/or a binder described later.
作為碳系導電助劑發揮功能的碳系物質的具體例可較佳地列舉:石墨、碳黑、富勒烯、碳奈米管、碳奈米泡沫、瀝青系碳纖維、聚丙烯腈系碳纖維及非晶形碳等碳系物質。該些碳系物質可單獨使用,或者亦可使用兩種以上的混合物。Specific examples of carbon-based materials that function as carbon-based conductive additives include graphite, carbon black, fullerenes, carbon nanotubes, carbon nanofoam, pitch-based carbon fibers, polyacrylonitrile-based carbon fibers, and Carbon-based substances such as amorphous carbon. These carbon-based substances may be used alone, or a mixture of two or more kinds may be used.
作為本發明中可使用的黏結劑,只要為二次電池中能夠使用者即可,例如可列舉羧甲基纖維素、聚丙烯酸、海藻酸、葡甘露聚糖、直鏈澱粉、蔗糖及其衍生物或聚合物、以及各自的鹼金屬鹽,除此之外亦可列舉聚醯亞胺樹脂或聚醯亞胺醯胺樹脂。該些黏結劑可單獨使用,亦可使用兩種以上的混合物。As the binder that can be used in the present invention, as long as it can be used in secondary batteries, for example, carboxymethyl cellulose, polyacrylic acid, alginic acid, glucomannan, amylose, sucrose and their derivatives can be cited. In addition to the substance or polymer, and the respective alkali metal salt, polyimide resin or polyimide resin may be mentioned. These binders can be used alone or in mixture of two or more.
進而,除黏結劑以外,例如亦可視需要而添加可賦予提高集電體與負極活性物質的黏結性、改善負極活性物質的分散性、提高黏結劑自身的導電性等其他功能的添加劑。作為此種添加劑的具體例,可列舉苯乙烯-丁二烯橡膠系聚合物、苯乙烯-異戊二烯橡膠系聚合物等。Furthermore, in addition to the binder, additives that can provide other functions such as improving the adhesion between the current collector and the negative electrode active material, improving the dispersibility of the negative electrode active material, and improving the conductivity of the binder itself, can also be added as necessary. Specific examples of such additives include styrene-butadiene rubber-based polymers, styrene-isoprene rubber-based polymers, and the like.
於如上所述本發明的負極用組成物更含有碳系導電助劑及/或黏結劑等追加成分的情況下,本發明的負極用組成物的製造方法可包括以下的步驟(r)。 步驟(r):將本發明的SiOC結構體與所述追加成分混合,或者使所述追加成分複合或被覆於本發明的SiOC結構體。When the composition for a negative electrode of the present invention further contains additional components such as a carbon-based conductive aid and/or a binder as described above, the method for producing the composition for a negative electrode of the present invention may include the following step (r). Step (r): mixing the SiOC structure of the present invention with the additional component, or compounding or coating the additional component on the SiOC structure of the present invention.
作為於達成步驟(r)的方面可利用的具體的方法,可列舉藉由使用各種攪拌子(stirring bar)或攪拌刀片、機械融合、球磨機、振動磨機等的機械混合法等,使所述SiOC結構體與碳系物質分散的方法,其中可較佳地利用使用普萊密克斯(Primix)股份有限公司製造的薄膜旋轉型高速混合器〔非米克斯(Filmix)(註冊商標)系列〕等可實現的基於薄膜旋轉方式的分散處理。於本發明的負極用組成物的製造方法中,該些機械混合法或分散方法可單獨使用一種來取得負極用組成物,亦可階段性地組合多種方法來取得負極用組成物。As a specific method that can be used to achieve step (r), there can be mentioned a mechanical mixing method using various stirring bars or stirring blades, mechanical fusion, ball mills, vibration mills, etc., to make the The method for dispersing SiOC structure and carbon-based substances can preferably use a thin-film rotary high-speed mixer manufactured by Primix Co., Ltd. (Filmix (registered trademark) series ] Dispersion processing based on film rotation method that can be realized. In the method for producing the negative electrode composition of the present invention, these mechanical mixing methods or dispersion methods may be used alone to obtain the negative electrode composition, or multiple methods may be combined step by step to obtain the negative electrode composition.
例如,於步驟(r)中,可於約1重量%~5重量%濃度的黏結劑水溶液中,分別以規定量添加本發明的SiOC結構體及任意的碳系導電助劑,並使用攪拌子或其他混合器等進行混合。進而亦可於所得的混合物中,以成為規定的固體成分濃度的方式視需要進而添加水,進一步繼續攪拌而製成漿料狀組成物,將其作為本發明的負極用組成物。此外,亦可對所述漿料狀組成物施加所述基於薄膜旋轉方式的分散處理,將所得者作為本發明的負極用組成物。For example, in step (r), the SiOC structure of the present invention and any carbon-based conductive auxiliary agent can be added in a predetermined amount to a binder aqueous solution with a concentration of about 1% to 5% by weight, and a stirrer can be used Or other mixers for mixing. Furthermore, to the obtained mixture, water may be further added as needed so that it may become a predetermined solid content concentration, and stirring may be continued to make a slurry-form composition, and this may be used as the composition for negative electrodes of this invention. In addition, the dispersion treatment based on the thin film rotation method may be applied to the slurry composition, and the resultant may be used as the negative electrode composition of the present invention.
進而,於所述任意選擇的步驟(r)中,只要適當地根據目的,另外以可獲得所期望的電池特性的方式將所述SiOC結構體與碳系物質以任意的比例混合即可。 再者,本發明的負極用組成物的製造方法可先於所述步驟而任意地包括所述製造SiOC結構體的方法中可包括的各步驟,包括該些任意的步驟的實施形態亦為本說明書中明確地揭示者。Furthermore, in the arbitrarily selected step (r), the SiOC structure and the carbon-based substance may be mixed in an arbitrary ratio so as to obtain desired battery characteristics according to the purpose. Furthermore, the method of manufacturing the negative electrode composition of the present invention may precede the steps and optionally include the steps that can be included in the method of manufacturing the SiOC structure, and the embodiment including these arbitrary steps is also the same Those clearly disclosed in the manual.
<負極及其製造方法> 根據本發明的又一實施方式,揭示一種負極。 進而,根據本發明的又一實施方式,亦揭示一種製造負極的方法,本發明的負極是藉由該製造負極的方法而取得。該方法包括:使用所述SiOC結構體或負極用組成物而取得負極。 以下示出具體的製造步驟的例子。<Anode and its manufacturing method> According to another embodiment of the present invention, a negative electrode is disclosed. Furthermore, according to another embodiment of the present invention, a method of manufacturing a negative electrode is also disclosed. The negative electrode of the present invention is obtained by the method of manufacturing a negative electrode. The method includes: obtaining a negative electrode using the SiOC structure or the negative electrode composition. Examples of specific manufacturing steps are shown below.
具體而言,本發明的負極是使用作為所述負極活性物質的SiOC結構體、或包含該SiOC結構體作為負極活性物質的所述負極用組成物而製造者。 更詳細而言,例如負極可基於將所述SiOC結構體或負極用組成物成形為一定形狀的方法、或塗佈於銅箔等集電體的方法來製造。負極的成形方法只要無特別限定地使用任意的方法即可,可使用各種公知的方法。Specifically, the negative electrode of the present invention is manufactured using the SiOC structure as the negative electrode active material, or the negative electrode composition containing the SiOC structure as the negative electrode active material. In more detail, for example, the negative electrode can be manufactured based on a method of molding the SiOC structure or the composition for a negative electrode into a certain shape, or a method of coating on a current collector such as copper foil. The method of forming the negative electrode may use any method without particular limitation, and various known methods can be used.
更詳細而言,例如可藉由刮刀法、漿料澆注法、網版印刷法等方法將預先製備的負極用組成物直接塗佈於以銅、鎳、不鏽鋼等為主體的棒狀體、板狀體、箔狀體、網狀體等集電體。或者,亦可將所述負極用組成物另行澆注於支撐體上,並將該支撐體上所形成的負極用組成物膜剝離,將剝離的負極用組成物膜層壓於集電體而形成負極極板。 此外,亦可對塗敷於所述集電體或支撐體上的負極用組成物進行風乾處理或以規定溫度實施的乾燥處理步驟,及/或進而視需要進行藉由壓製處理或衝壓處理等而實施的加工處理步驟,藉此取得最終的負極體。In more detail, for example, the pre-prepared negative electrode composition can be directly coated on a rod-shaped body or plate mainly composed of copper, nickel, stainless steel, etc., by a doctor blade method, a slurry casting method, a screen printing method, etc. Current collectors such as shaped bodies, foil-shaped bodies, and mesh bodies. Alternatively, the negative electrode composition may be separately cast on the support, and the negative electrode composition film formed on the support may be peeled off, and the peeled negative electrode composition film may be laminated on the current collector to form Negative electrode plate. In addition, the composition for the negative electrode coated on the current collector or the support may be air-dried or a drying treatment step performed at a predetermined temperature, and/or may be further subjected to pressing treatment or punching treatment as necessary The processing steps are implemented to obtain the final negative electrode body.
再者,本發明的該製造負極的方法可先於所述步驟而任意地包括所述製造SiOC結構體的方法以及製造負極用組成物的方法中可包括的各步驟,該些實施形態亦為本說明書中明確地揭示者。此外,所述負極的形態僅為例示,負極的形態並不限定於該些,當然可以其他的形態來提供。Furthermore, the method of manufacturing a negative electrode of the present invention may precede the steps and optionally include the steps that can be included in the method of manufacturing the SiOC structure and the method of manufacturing the negative electrode composition, and these embodiments are also It is clearly disclosed in this specification. In addition, the form of the negative electrode is only an example, and the form of the negative electrode is not limited to these, and it can of course be provided in other forms.
<二次電池及其製造方法> 根據本發明的又一實施方式,提供一種二次電池。 進而,根據本發明的又一實施方式,亦提供一種二次電池的製造方法。該方法包括:藉由使用所述負極而製造二次電池。<Secondary battery and its manufacturing method> According to still another embodiment of the present invention, a secondary battery is provided. Furthermore, according to another embodiment of the present invention, a method for manufacturing a secondary battery is also provided. The method includes manufacturing a secondary battery by using the negative electrode.
本發明的二次電池包括至少一個本發明的負極。本發明的二次電池只要包括至少一個本發明的負極且作為二次電池發揮功能,則其他構成部件或結構並無特別限定,更具體而言,除所述負極外,亦包括各至少一個的正極及隔板(separator)。於本發明的負極、以及正極與隔板分別包括多個的情況下,本發明的二次電池可採用以正極/隔板/負極/隔板的順序將該些構成部件交替積層的層壓型的積層結構。或者,亦可採用經由隔板將正極與負極捲繞為線圈狀的積層結構。此外,本發明的二次電池可包含電解液或固體電解質。The secondary battery of the present invention includes at least one negative electrode of the present invention. As long as the secondary battery of the present invention includes at least one negative electrode of the present invention and functions as a secondary battery, other constituent members or structures are not particularly limited. More specifically, in addition to the negative electrode, each of at least one Positive electrode and separator (separator). In the case where the negative electrode and the positive electrode and the separator of the present invention include a plurality of each, the secondary battery of the present invention can be a laminate type in which these components are alternately laminated in the order of positive electrode/separator/negative electrode/separator The layered structure. Alternatively, a layered structure in which the positive electrode and the negative electrode are wound into a coil shape via a separator may also be adopted. In addition, the secondary battery of the present invention may include an electrolytic solution or a solid electrolyte.
具體而言,本發明的二次電池是藉由本發明的二次電池的製造方法而取得的二次電池。該二次電池只要考慮所期望的用途或功能等而適當地設計即可,其構成並無特別限定,可參考現有的二次電池的構成,使用本發明的負極來構成二次電池。此外,作為本發明的二次電池的類型,只要為可應用所述負極者則並無特別限定,例如可列舉鋰離子二次電池、鋰離子聚合物二次電池。該些電池如以下實施例中所證實般,可發揮本發明的所期望的效果,因此可謂之特佳的實施形態。 以下,特別針對鋰離子二次電池情況下的實施形態來對本發明的二次電池及其製造方法進行例示。Specifically, the secondary battery of the present invention is a secondary battery obtained by the method of manufacturing a secondary battery of the present invention. The secondary battery may be appropriately designed in consideration of the intended use, function, etc., and its configuration is not particularly limited, and the configuration of the existing secondary battery can be referred to, and the negative electrode of the present invention can be used to construct the secondary battery. In addition, the type of the secondary battery of the present invention is not particularly limited as long as the negative electrode can be applied, and examples include lithium ion secondary batteries and lithium ion polymer secondary batteries. As demonstrated in the following examples, these batteries can exhibit the desired effects of the present invention, and therefore can be described as particularly preferred embodiments. Hereinafter, the secondary battery of the present invention and its manufacturing method will be exemplified particularly with respect to an embodiment in the case of a lithium ion secondary battery.
首先,將能夠可逆地吸藏及釋放鋰離子的正極活性物質、導電助劑、黏結劑及溶媒混合,準備正極活性物質組成物。與負極同樣地,使用各種方法將所述正極活性物質組成物直接塗佈於金屬集電體上及加以乾燥,準備正極板。 亦能夠將所述正極活性物質組成物另行澆注於支撐體上,並將該支撐體上所形成的膜剝離,將該膜層壓於金屬集電體上而製造正極。正極的成形方法並無特別限定,可使用各種公知的方法來形成。First, a positive electrode active material capable of reversibly absorbing and releasing lithium ions, a conductive auxiliary agent, a binder, and a solvent are mixed to prepare a positive electrode active material composition. As with the negative electrode, the positive electrode active material composition is directly coated on the metal current collector and dried using various methods to prepare a positive electrode plate. It is also possible to separately cast the positive electrode active material composition on a support body, peel off the film formed on the support body, and laminate the film on a metal current collector to produce a positive electrode. The method of forming the positive electrode is not particularly limited, and various well-known methods can be used to form it.
作為所述正極活性物質,可使用該二次電池的領域中一般所使用的鋰金屬複合氧化物。例如可列舉:鈷酸鋰、鎳酸鋰、具有尖晶石結構的錳酸鋰、鈷錳酸鋰、具有橄欖石結構的磷酸鐵、所謂的三元系鋰金屬複合氧化物、鎳系鋰金屬複合氧化物等。另外,亦可使用作為鋰離子能夠脫離-插入的化合物的V2 O5 、TiS及MoS等。As the positive electrode active material, lithium metal composite oxides generally used in the field of secondary batteries can be used. Examples include: lithium cobalt oxide, lithium nickel oxide, lithium manganate having a spinel structure, lithium cobalt manganese oxide, iron phosphate having an olivine structure, so-called ternary lithium metal composite oxide, and nickel-based lithium metal Composite oxides and so on. In addition, V 2 O 5 , TiS, MoS, etc., which are compounds capable of detaching and inserting lithium ions, can also be used.
亦可添加導電助劑,可利用鋰離子電池中一般所使用者。較佳為於所製造的電池中不會引起分解或變質的電子傳導性材料。作為具體例,可列舉碳黑(乙炔黑等)、石墨微粒子、氣相生長碳纖維、及該些的兩種以上的組合等。另外,作為黏結劑,例如可列舉偏二氟乙烯/六氟丙烯共聚合物、聚偏二氟乙烯(polyvinylidene fluoride,PVDF)、聚丙烯腈、聚甲基丙烯酸甲酯、聚四氟乙烯及其混合物、苯乙烯丁二烯橡膠系聚合物等,但並不限定於該些。另外,作為溶媒,例如可列舉N-甲基吡咯啶酮、丙酮、水等,但並不限定於該些。 此時,正極活性物質、導電助劑、黏結劑及溶媒的含量並無特別限定,可以鋰離子電池中一般所使用的量為基準適當地選擇。A conductive assistant can also be added, which can be used by ordinary users in lithium ion batteries. It is preferably an electron conductive material that does not cause decomposition or deterioration in the manufactured battery. Specific examples include carbon black (acetylene black, etc.), graphite fine particles, vapor-grown carbon fiber, and combinations of two or more of these. In addition, as the binder, for example, vinylidene fluoride/hexafluoropropylene copolymer, polyvinylidene fluoride (PVDF), polyacrylonitrile, polymethylmethacrylate, polytetrafluoroethylene and the like Mixtures, styrene butadiene rubber-based polymers, etc., but are not limited to these. Moreover, as a solvent, N-methylpyrrolidone, acetone, water, etc. are mentioned, for example, but it is not limited to these. At this time, the contents of the positive electrode active material, the conductive auxiliary agent, the binder, and the solvent are not particularly limited, and can be appropriately selected based on the amounts generally used in lithium ion batteries.
作為介於正極與負極之間的隔板,只要利用鋰離子電池中一般所使用者即可,並無特別限定,且只要在考量所期望的用途或功能等的基礎上適當地選擇即可。較佳為對電解質的離子遷移的阻抗低、或電解液含浸能力優異者。具體而言為選自玻璃纖維、聚酯、聚乙烯、聚丙烯、聚四氟乙烯、聚醯亞胺、或者其化合物中的材質,亦可為不織布或織布的形態。 更具體而言,較佳為於鋰離子電池的情況下,使用包含如聚乙烯、聚丙烯般的材料的能夠捲繞的隔板,於鋰離子聚合物電池的情況下,使用有機電解液含浸能力優異的隔板。As the separator between the positive electrode and the negative electrode, it is not particularly limited as long as it is used by general users in lithium ion batteries, and it may be appropriately selected in consideration of the desired use or function. It is preferable that the resistance to ion migration of the electrolyte is low, or the electrolyte is excellent in impregnation ability. Specifically, it is a material selected from glass fiber, polyester, polyethylene, polypropylene, polytetrafluoroethylene, polyimide, or a compound thereof, and may be in the form of non-woven fabric or woven fabric. More specifically, in the case of a lithium ion battery, it is preferable to use a coilable separator containing a material such as polyethylene and polypropylene, and in the case of a lithium ion polymer battery, use an organic electrolyte to impregnate Excellent separator.
作為電解液,可使用:於碳酸伸丙酯、碳酸伸乙酯、碳酸二甲酯、碳酸二乙酯、碳酸乙基甲酯、碳酸甲基丙酯、碳酸伸丁酯、碳酸二丁酯、苯甲腈、乙腈、四氫呋喃、2-甲基四氫呋喃、γ-丁內酯、二氧雜環戊烷、4-甲基二氧雜環戊烷、N,N-二甲基甲醯胺、二甲基乙醯胺、二甲基亞碸、二噁烷、1,2-二甲氧基乙烷、環丁碸、二氯乙烷、氯苯、硝基苯或二乙醚等溶媒或該些溶媒的混合溶媒中,溶解包含六氟磷酸鋰、四氟硼酸鋰、六氟銻酸鋰、六氟砷酸鋰、過氯酸鋰、三氟甲磺酸鋰、Li(CF3 SO2 )2 N、LiC4 F9 SO3 、LiSbF6 、LiAlO4 、LiAlCl4 、LiN(Cx F2x+1 SO2 )(Cy F2y+1 SO2 )(其中,x及y為自然數)、LiCl、LiI般的鋰鹽的電解質中的一種或該些的兩種以上混合者而成的物質。As an electrolyte, you can use: propylene carbonate, ethylene carbonate, dimethyl carbonate, diethyl carbonate, ethyl methyl carbonate, methyl propyl carbonate, butyl carbonate, dibutyl carbonate, Benzoonitrile, acetonitrile, tetrahydrofuran, 2-methyltetrahydrofuran, γ-butyrolactone, dioxolane, 4-methyldioxolane, N,N-dimethylformamide, two Solvents such as methyl acetamide, dimethyl sulfide, dioxane, 1,2-dimethoxyethane, cyclobutane, dichloroethane, chlorobenzene, nitrobenzene or diethyl ether, or these In the mixed solvent of the solvent, it dissolves lithium hexafluorophosphate, lithium tetrafluoroborate, lithium hexafluoroantimonate, lithium hexafluoroarsenate, lithium perchlorate, lithium trifluoromethanesulfonate, Li(CF 3 SO 2 ) 2 N, LiC 4 F 9 SO 3 , LiSbF 6 , LiAlO 4 , LiAlCl 4 , LiN(C x F 2x+1 SO 2 )(C y F 2y+1 SO 2 ) (where x and y are natural numbers), LiCl, LiI A substance composed of one or a mixture of two or more of these in the electrolyte of a general lithium salt.
另外,亦可使用各種非水系電解質或固體電解質來代替電解液。例如能夠使用添加有鋰離子的各種離子液體、將離子液體與微粉末混合的擬固體電解質、鋰離子導電性固體電解質等。In addition, various non-aqueous electrolytes or solid electrolytes can be used instead of the electrolyte. For example, various ionic liquids to which lithium ions are added, pseudo-solid electrolytes in which ionic liquids are mixed with fine powders, lithium ion conductive solid electrolytes, and the like can be used.
進而,另外為了提高充放電循環特性,亦可於所述電解液中適當地含有促進在負極活性物質表面形成穩定的被膜的化合物。例如有效果的是碳酸伸乙烯酯(vinylene carbonate,VC)、氟苯、環狀氟化碳酸酯〔氟代碳酸伸乙酯(fluoro ethylene carbonate,FEC)、三氟代碳酸伸丙酯(trifluoropropylenecarbonate,TFPC)等〕、或鏈狀氟化碳酸酯〔三氟代碳酸二甲酯(trifluorodimethylcarbonate,TFDMC)、三氟代碳酸二乙酯(trifluorodiethylcarbonate,TFDEC)、三氟代碳酸乙基甲酯(trifluoroethylmethylcarbonate,TFEMC)等〕等氟化碳酸酯。再者,所述環狀氟化碳酸酯及鏈狀氟化碳酸酯亦可如碳酸伸乙酯等般用作溶媒。Furthermore, in order to improve the charge-discharge cycle characteristics, a compound that promotes the formation of a stable coating on the surface of the negative electrode active material may be appropriately contained in the electrolyte solution. For example, the effective ones are vinylene carbonate (VC), fluorobenzene, cyclic fluorinated carbonate [fluoro ethylene carbonate (FEC), trifluoropropylene carbonate, TFPC), etc.], or chain fluorinated carbonate [trifluorodimethylcarbonate (TFDMC), trifluorodiethylcarbonate (TFDEC), trifluoroethylmethylcarbonate (trifluoroethylmethylcarbonate, TFEMC) and other fluorinated carbonates. Furthermore, the cyclic fluorinated carbonate and the chain fluorinated carbonate can also be used as a solvent like ethylene carbonate.
亦可在如上所述的正極極板與負極極板之間配置隔板而形成電池結構體,將該電池結構體纏繞(winding)、或折疊而放入至圓筒形電池殼體或方型電池殼體中後,注入電解液,藉此完成鋰離子電池。或者,亦可在將所述電池結構體積層為疊片電池(bi-cell)結構後,使其含浸於有機電解液中,將所得的物體放入袋(pouch)中加以密封,藉此取得鋰離子聚合物電池作為本發明的二次電池。It is also possible to arrange a separator between the positive electrode plate and the negative electrode plate as described above to form a battery structure, and the battery structure can be wound or folded and placed in a cylindrical battery case or square shape After being put into the battery case, electrolyte is injected to complete the lithium ion battery. Alternatively, after the battery structure volume layer is a bi-cell structure, it is impregnated in an organic electrolyte, and the resulting object is put into a pouch and sealed to obtain A lithium ion polymer battery is used as the secondary battery of the present invention.
再者,除所述步驟以外,本發明的二次電池的製造方法亦可先行地更包括所述SiOC結構體的製造方法、負極用組成物的製造方法以及負極的製造方法中所包括的各步驟。Furthermore, in addition to the steps described above, the method of manufacturing a secondary battery of the present invention may further include the method of manufacturing the SiOC structure, the method of manufacturing the negative electrode composition, and the method of manufacturing the negative electrode. step.
以下示出實施例及比較例來對本發明進行更具體的說明,但本發明不限定於該些實施例。 [實施例]Examples and comparative examples are shown below to describe the present invention more specifically, but the present invention is not limited to these examples. [Example]
對各實施例及各比較例中製造的材料進行各種分析、評價。 首先,將各種分析、評價的方法示於以下。 再者,以下,Ph表示苯基,Me表示甲基。Various analyses and evaluations were performed on the materials manufactured in each Example and each Comparative Example. First, the various analysis and evaluation methods are shown below. In addition, in the following, Ph represents a phenyl group, and Me represents a methyl group.
<掃描式電子顯微鏡(SEM)觀察> 對實施例及比較例中製造的各材料進行SEM觀察。 作為SEM,使用超高解析度分析掃描電子顯微鏡SU-70(日立高新技術(Hitachi High-technologies)股份有限公司製造)及3D實際表面視圖顯微鏡(3D Real Surface View Microscope)VE-9800(基恩士(Keyence)股份有限公司製造),以規定的加速電壓進行測定。<Scanning electron microscope (SEM) observation> SEM observation was performed on each material manufactured in the examples and comparative examples. As the SEM, an ultra-high-resolution analysis scanning electron microscope SU-70 (manufactured by Hitachi High-technologies Co., Ltd.) and a 3D Real Surface View Microscope (3D Real Surface View Microscope) VE-9800 (Keyence (Manufactured by Keyence Co., Ltd.), measured at the specified acceleration voltage.
(粒度分佈測定) 對以下的實施例1~實施例4及比較例1中製造的各SiOC結構體及SiOC材料測定粒度分佈,算出粒度分佈中的10%、50%及90%累計質量粒子徑分佈直徑(D10、D50及D90)。粒度分佈的測定方法如下。將所製備的含矽奈米粒子的氫聚倍半矽氧烷煆燒物取少量至燒杯中,加入數滴水及0.5%的曲拉通(Triton)X-100水溶液,使用日本精機製作所股份有限公司製造的超音波均質機US-150進行3分鐘分散處理,製備測定用樣品。使用麥奇克拜爾(MicrotracBEL)股份有限公司製造的雷射繞射散射式粒子徑分佈測定裝置MT3300II對該測定用樣品進行測定。(Determination of particle size distribution) The particle size distribution of each SiOC structure and SiOC material manufactured in the following Examples 1 to 4 and Comparative Example 1 were measured, and the 10%, 50%, and 90% cumulative mass particle diameter distribution diameters (D10, D50 and D90). The measurement method of particle size distribution is as follows. Take a small amount of the prepared hydrogen polysilsesquioxane sintered product containing silicon nanoparticles into a beaker, add a few drops of water and 0.5% Triton X-100 aqueous solution, using Nippon Seiki Co., Ltd. The US-150 ultrasonic homogenizer manufactured by the company was subjected to dispersion treatment for 3 minutes to prepare samples for measurement. The measurement sample was measured using a laser diffraction scattering particle diameter distribution measuring device MT3300II manufactured by MicrotracBEL Co., Ltd.
<元素分析法> 關於碳元素分析,作為利用氧循環燃燒-熱導檢測器(Thermal Conductivity Detector,TCD)檢測方式的碳元素分析裝置,使用住化分析中心股份有限公司製造的NCH-21型,關於氧元素分析,作為利用高溫碳反應-不分光紅外線(non-dispersive infrared,NDIR)檢測方式的氧元素分析裝置,使用堀場製作所股份有限公司的EMGA-2800,進而關於Si元素分析,作為利用灰化-鹼熔融-酸溶解-電感耦合電漿(Inductively Coupled Plasma,ICP)發光分析法的矽元素分析裝置,使用精工電子工業股份有限公司製造的SPS4000,分別進行元素分析。<Elemental Analysis Method> For carbon element analysis, as a carbon element analysis device using the oxygen cycle combustion-thermal conductivity detector (Thermal Conductivity Detector, TCD) detection method, the NCH-21 model manufactured by Sumika Analysis Center Co., Ltd. is used. For oxygen element analysis, As an oxygen element analysis device using high-temperature carbon reaction-non-dispersive infrared (NDIR) detection method, Horiba Manufacturing Co., Ltd.'s EMGA-2800 is used, and Si element analysis is used as the use of ashing-alkali melting- An acid-dissolved-inductively coupled plasma (Inductively Coupled Plasma, ICP) luminescence analysis device for silicon element analysis was performed using SPS4000 manufactured by Seiko Instruments Inc. for elemental analysis.
<BET比表面積的測定> 關於BET比表面積,將試樣粉末1 g投入至測定池後,將脫氣條件設為250℃、1小時,利用全自動比表面積測定裝置麥克索蔔(Macsorb)(註冊商標)HM Model-1210(貿科技(Mountech)公司製造)進行測定。<Measurement of BET specific surface area> Regarding the BET specific surface area, after putting 1 g of sample powder into the measuring cell, set the degassing conditions to 250°C for 1 hour, and use the automatic specific surface area measuring device Macsorb (registered trademark) HM Model-1210 (Made by Mountech Corporation) for measurement.
<電池特性的評價> 製備含有實施例及比較例中製造的材料的負極活性物質,對使用該些負極活性物質的負極以及鋰離子二次電池,如下所述進行充放電循環試驗來評價電池特性。以下示出其程順。 使用北斗電工製造的HJR-110mSM、HJ1001SM8A或HJ1010mSM8A,充電及放電均以定電流來進行測定。此時,相對於負極活性物質(SiOC粒子)每1 g重量,採用如相對於理論容量而為20分之一的電流值0.05 C。 另外,充電時設為電池電壓降低至0 V為止的容量,放電時設為電池電壓到達1.5 V為止的容量。於各充放電的切換時,藉由開路而休止30分鐘後,進行放電。<Evaluation of battery characteristics> A negative electrode active material containing the materials produced in the Examples and Comparative Examples was prepared, and the negative electrode and lithium ion secondary battery using these negative electrode active materials were subjected to a charge-discharge cycle test as described below to evaluate battery characteristics. The following shows its Cheng Shun. Use HJR-110mSM, HJ1001SM8A or HJ1010mSM8A manufactured by Beidou Electric Works, charging and discharging are measured with constant current. At this time, with respect to the weight of the negative electrode active material (SiOC particles) per 1 g, a current value of 0.05 C, which is one-twentieth relative to the theoretical capacity, is used. In addition, it is assumed that the battery voltage drops to 0 V during charging and the battery voltage reaches 1.5 V during discharge. At the time of switching between charging and discharging, discharge is performed after 30 minutes of inactivity by opening the circuit.
於所述條件下,反覆進行50次充放電循環,測定電池特性。 再者,可逆容量設為初次的放電容量,初次充放電率設為第一循環中放電容量相對於充電容量的比率,循環試驗後的容量維持率由相對於初次的充電量而言的循環後的充電容量來表示。Under the conditions, 50 cycles of charge and discharge were repeated to determine the battery characteristics. In addition, the reversible capacity is set as the initial discharge capacity, the initial charge-discharge rate is set as the ratio of the discharge capacity to the charge capacity in the first cycle, and the capacity retention rate after the cycle test is defined as the ratio after the cycle relative to the initial charge The charging capacity is expressed.
[實施例1](MeSiO0.5 ) (矽奈米粒子/甲基聚倍半矽氧烷複合體的製造) 於燒杯中放入0.01 M乙酸水溶液100 g及矽奈米粉末(西格瑪奧瑞奇(Sigma Aldrich)公司製造;體積基準平均粒子徑小於100 nm;但粒子徑超過10 nm)10 g,使用超音波清洗機來製備矽奈米粒子分散液。繼而,向300 ml的三口燒瓶中放入0.01 M乙酸水溶液100 g,於攪拌下,以25℃向該乙酸水溶液中滴加甲基三甲氧基矽烷(東京化成工業公司製造)24.3 g(178 mmol)後,使其反應30分鐘。繼而,於所得的反應溶液中加入所述矽奈米粒子分散液,進而於室溫下攪拌1小時。於以該方式獲得的混合液中,進而加入36重量%濃度的鹽酸2.00 g(20 mmol),於室溫下攪拌10秒,停止攪拌。然後,將該混合液放置一夜,使用膜濾器(孔徑0.45 μm、親水性)過濾所得的反應產物,回收固體。將所得的固體於80℃下減壓乾燥10小時,獲得矽奈米粒子/甲基聚倍半矽氧烷複合體(1)的粉體21.9 g。 將以該方式取得的矽奈米粒子/甲基聚倍半矽氧烷複合體(1)的粉體的一部分供試於SEM觀察。 再者,於本實施例中,水解反應中使用的是0.01 M乙酸水溶液,因此計算出水解反應時的pH為3.29。此外,聚合反應中使用的是0.1 M鹽酸,故計算出縮聚反應時的pH為1。[Example 1] (MeSiO 0.5 ) (Production of silicon nanoparticle/methyl polysilsesquioxane composite) In a beaker, 100 g of 0.01 M acetic acid aqueous solution and 100 g of silicon nano powder (Sigma Orich ( Sigma Aldrich) company; the volume-based average particle diameter is less than 100 nm; but the particle diameter exceeds 10 nm) 10 g, using an ultrasonic cleaner to prepare silicon nanoparticle dispersion. Next, 100 g of a 0.01 M acetic acid aqueous solution was placed in a 300 ml three-necked flask, and 24.3 g (178 mmol) of methyltrimethoxysilane (manufactured by Tokyo Chemical Industry Co., Ltd.) was added dropwise to the aqueous acetic acid solution at 25°C under stirring. ), let it react for 30 minutes. Then, the silicon nanoparticle dispersion was added to the resulting reaction solution, and then stirred at room temperature for 1 hour. To the mixed solution obtained in this way, 2.00 g (20 mmol) of hydrochloric acid with a concentration of 36% by weight was further added, and stirred at room temperature for 10 seconds, and the stirring was stopped. Then, the mixed solution was allowed to stand overnight, and the resulting reaction product was filtered with a membrane filter (pore size 0.45 μm, hydrophilic) to recover the solid. The obtained solid was dried under reduced pressure at 80° C. for 10 hours to obtain 21.9 g of silicon nanoparticle/methylpolysilsesquioxane composite (1) powder. A part of the powder of the silicon nanoparticle/methylpolysilsesquioxane composite (1) obtained in this way was tested by SEM observation. Furthermore, in this example, 0.01 M acetic acid aqueous solution was used in the hydrolysis reaction, so the calculated pH during the hydrolysis reaction was 3.29. In addition, 0.1 M hydrochloric acid was used in the polymerization reaction, so the pH during the polycondensation reaction was calculated to be 1.
(SiOC結構體的製造) 接下來,將所述矽奈米粒子/甲基聚倍半矽氧烷複合體(1)的粉體21.9 g置於SSA-S等級的氧化鋁製舟皿中後,將該氧化鋁製舟皿置於真空吹掃式管式爐KTF43N1-VPS(光洋熱系統(Koyo Thermo System)公司製造)中。作為熱處理條件,於氬氣氛圍下(高純度氬氣99.999%),以250 ml/分鐘的流量供給氬氣,同時以4℃/分鐘的比例升溫,以1200℃、5小時進行熱處理,藉此獲得矽奈米粒子/甲基聚倍半矽氧烷複合體(1)的煆燒物。 繼而,利用乳缽將所得的煆燒物破碎粉碎5分鐘,使用孔徑32 μm的不鏽鋼製篩進行分級,藉此獲得最大粒子徑為32 μm的矽奈米粒子/甲基聚倍半矽氧烷複合體(1)的煆燒物〔SiOC結構體(1)〕粉體18.9 g。 將該SiOC結構體(1)粉體的一部分,藉由所述方法供試於SEM觀察、粒度分佈測定、元素分析及BET比表面積的測定中。(Manufacturing of SiOC structure) Next, 21.9 g of the powder of the silicon nanoparticle/methyl polysilsesquioxane composite (1) was placed in an SSA-S grade alumina boat, and the alumina boat The dish is placed in a vacuum purged tube furnace KTF43N1-VPS (manufactured by Koyo Thermo System). As the heat treatment conditions, under an argon atmosphere (high-purity argon 99.999%), argon is supplied at a flow rate of 250 ml/min, and the temperature is increased at a rate of 4°C/min, and heat treatment is performed at 1200°C for 5 hours. The sintered product of silicon nanoparticle/methyl polysilsesquioxane complex (1) is obtained. Then, the resulting sintered product was crushed and crushed for 5 minutes in a mortar, and classified using a stainless steel sieve with a pore size of 32 μm, thereby obtaining silicon nanoparticle/methyl polysilsesquioxane with a maximum particle diameter of 32 μm The sintered product of the composite (1) [SiOC structure (1)] powder is 18.9 g. A part of the SiOC structure (1) powder was tested in SEM observation, particle size distribution measurement, element analysis, and BET specific surface area measurement by the method described above.
(負極用組成物及負極體的製造) 於羧甲基纖維素的2重量%水溶液20 g中,加入3.2 g的SiOC粒子(3)及0.4 g的電氣化學(DENKA)股份有限公司製造的乙炔黑,於燒瓶內使用攪拌子混合15分鐘後,以固體成分濃度成為15重量%的方式加入蒸餾水,進而攪拌15分鐘而製備漿料狀組成物。將該漿料狀組成物移至普萊密克斯(Primix)公司製造的薄膜旋轉型高速混合機(菲爾密克司(Filmix)40-40型)中,以轉速20 m/s進行30秒鐘攪拌分散。對於分散處理後的漿料,利用刮刀法將漿料以150 μm的厚度塗敷於銅箔輥上。(Manufacture of negative electrode composition and negative electrode body) Add 3.2 g of SiOC particles (3) and 0.4 g of acetylene black manufactured by Denka Co., Ltd. to 20 g of a 2% by weight aqueous solution of carboxymethyl cellulose, and mix for 15 minutes with a stir bar in the flask After that, distilled water was added so that the solid content concentration became 15% by weight, and further stirred for 15 minutes to prepare a slurry composition. The slurry-like composition was transferred to a thin-film rotary high-speed mixer (Filmix 40-40 type) manufactured by Primix, and the rotation speed was 20 m/s for 30 seconds Stir to disperse. For the slurry after the dispersion treatment, the slurry was applied to a copper foil roll with a thickness of 150 μm by a doctor blade method.
於塗敷後進行30分鐘風乾,然後利用80℃的加熱板進行90分鐘乾燥。乾燥後,利用2 t小型精密輥壓機(塞克金屬(Thank-Metal)公司製造)壓製負極片。壓製後,利用ϕ14.50 mm的電極衝壓衝頭HSNG-EP衝壓電極,利用玻璃管烘箱GTO-200(柴田科學(SIBATA))於80℃下進行12小時以上的減壓乾燥,製作負極體。Air-dried for 30 minutes after coating, and then dried on a hot plate at 80°C for 90 minutes. After drying, the negative electrode sheet was pressed using a 2 t small precision roller press (manufactured by Thank-Metal). After pressing, press the electrode with a 14.50 mm electrode punch HSNG-EP, and use a glass tube oven GTO-200 (Shibata Scientific (SIBATA)) to dry under reduced pressure at 80°C for more than 12 hours to produce a negative electrode body.
(鋰離子二次電池的製造及評價)
製作圖6所示結構的2032型硬幣電池(鋰離子二次電池)300。使用金屬鋰作為正極(鋰對電極)303,使用微多孔性的聚丙烯製膜作為隔板302,使用所述負極體作為負極(負極材)301,使用以1莫耳/L的比例溶解有LiPF6
的碳酸伸乙酯與碳酸二乙酯1:1(體積比)的混合溶媒作為電解液。
繼而,實施鋰離子二次電池的電池特性的評價。作為充放電試驗機,使用北斗電工製造的HJ1001SM8A。作為充放電條件,充電及放電均是在0.05 C下以定電流進行,放電終止電壓設為1 mV,充電終止電壓設為1500 mV。(Manufacturing and Evaluation of Lithium Ion Secondary Battery) A 2032-type coin battery (lithium ion secondary battery) 300 having the structure shown in FIG. 6 was produced. Metal lithium was used as the positive electrode (lithium counter electrode) 303, a microporous polypropylene film was used as the
[實施例2](MePhSiO0.5 ) 於實施例1的矽奈米粒子/甲基聚倍半矽氧烷複合體(1)的製造中,使用甲基三甲氧基矽烷14.4 g(142 mmol)與苯基三甲氧基矽烷7.1 g(36 mmol)的混合物來代替甲基三甲氧基矽烷24.3 g,除此以外,藉由與實施例1同樣的程序而製造矽奈米粒子/甲基聚倍半矽氧烷複合體(2)及其煆燒物〔SiOC結構體(2)〕粉體。 此外,與實施例1同樣地,將矽奈米粒子/甲基聚倍半矽氧烷複合體(2)的一部分供試於SEM觀察,進而將SiOC結構體(2)粉體的一部分,藉由所述方法供試於SEM觀察、粒度分佈測定、元素分析及BET比表面積的測定中。 進而,使用本實施例中獲得的SiOC結構體(2)來代替實施例1中取得的SiOC結構體(1),除此以外,與實施例1同樣地製作負極用組成物及負極體以及鋰離子二次電池,並進行電池特性的評價。[Example 2] (MePhSiO 0.5 ) In the production of the silicon nanoparticle/methylpolysilsesquioxane composite (1) of Example 1, 14.4 g (142 mmol) of methyltrimethoxysilane and Except for the mixture of 7.1 g (36 mmol) of phenyltrimethoxysilane instead of 24.3 g of methyltrimethoxysilane, the same procedure as in Example 1 was used to produce silicon nanoparticle/methylpolysilsane Siloxane complex (2) and its sintered [SiOC structure (2)] powder. In addition, as in Example 1, a part of the silicon nanoparticle/methylpolysilsesquioxane composite (2) was observed by SEM, and then a part of the SiOC structure (2) powder was used The method is used for SEM observation, particle size distribution measurement, element analysis and BET specific surface area measurement. Furthermore, the SiOC structure (2) obtained in this example was used instead of the SiOC structure (1) obtained in Example 1. Except for this, the negative electrode composition and the negative electrode body and lithium were produced in the same manner as in Example 1. Ion secondary batteries, and evaluation of battery characteristics.
[實施例3](MeSiO0.7 ) 於實施例1的矽奈米粒子/甲基聚倍半矽氧烷複合體(1)的製造中,將甲基三甲氧基矽烷的滴加量變更為42.5 g,除此以外,藉由與實施例1同樣的程序而製造矽奈米粒子/甲基聚倍半矽氧烷複合體(3)及其煆燒物〔SiOC結構體(3)〕粉體。 此外,與實施例1同樣地,將矽奈米粒子/甲基聚倍半矽氧烷複合體(3)的一部分供試於SEM觀察,進而將SiOC結構體(3)粉體的一部分,藉由所述方法供試於SEM觀察、粒度分佈測定及BET比表面積的測定中。 進而,使用本實施例中獲得的SiOC結構體(3)來代替實施例1中取得的SiOC結構體(1),除此以外,與實施例1同樣地製作負極用組成物及負極體以及鋰離子二次電池,並進行電池特性的評價。[Example 3] (MeSiO 0.7 ) In the production of the silicon nanoparticle/methylpolysilsesquioxane composite (1) of Example 1, the dropping amount of methyltrimethoxysilane was changed to 42.5 g. Except for this, the silicon nanoparticle/methyl polysilsesquioxane composite (3) and its sintered product [SiOC structure (3)] powder were produced by the same procedure as in Example 1. . In addition, as in Example 1, a part of the silicon nanoparticle/methylpolysilsesquioxane composite (3) was observed by SEM, and then a part of the SiOC structure (3) powder was used The method was tested in SEM observation, particle size distribution measurement and BET specific surface area measurement. Furthermore, the SiOC structure (3) obtained in this example was used instead of the SiOC structure (1) obtained in Example 1. Except for this, the negative electrode composition, the negative electrode body, and lithium were produced in the same manner as in Example 1. Ion secondary batteries, and evaluation of battery characteristics.
[實施例4](MePhSiO0.7 ) 於實施例1的矽奈米粒子/甲基聚倍半矽氧烷複合體(1)的製造中,使用甲基三甲氧基矽烷34.0 g與苯基三甲氧基矽烷12.4 g的混合物來代替甲基三甲氧基矽烷24.3 g,除此以外,藉由與實施例1同樣的程序而製造矽奈米粒子/甲基聚倍半矽氧烷複合體(4)及其煆燒物〔SiOC結構體(4)〕粉體。 此外,與實施例1同樣地,將矽奈米粒子/甲基聚倍半矽氧烷複合體(4)的一部分供試於SEM觀察,進而將SiOC結構體(4)粉體的一部分,藉由所述方法供試於SEM觀察、粒度分佈測定及BET比表面積的測定中。 進而,使用本實施例中獲得的SiOC結構體(4)來代替實施例1中取得的SiOC結構體(1),除此以外,與實施例1同樣地製作負極用組成物及負極體以及鋰離子二次電池,並進行電池特性的評價。[Example 4] (MePhSiO 0.7 ) In the production of the silicon nanoparticle/methylpolysilsesquioxane composite (1) of Example 1, 34.0 g of methyltrimethoxysilane and phenyltrimethoxysilane were used Except for the mixture of 12.4 g of silyl silane instead of 24.3 g of methyl trimethoxy silane, the same procedure as in Example 1 was used to produce a silicon nanoparticle/methyl polysilsesquioxane composite (4) Its sintered [SiOC structure (4)] powder. In addition, as in Example 1, a part of the silicon nanoparticle/methylpolysilsesquioxane composite (4) was tested for SEM observation, and a part of the SiOC structure (4) powder was used The method was tested in SEM observation, particle size distribution measurement and BET specific surface area measurement. Furthermore, the SiOC structure (4) obtained in this example was used instead of the SiOC structure (1) obtained in Example 1. Except for this, the negative electrode composition and the negative electrode body and lithium were produced in the same manner as in Example 1. Ion secondary batteries, and evaluation of battery characteristics.
[比較例1](MeSiO0.5 ) 於燒杯中放入水3.6 g、異丙醇7 g及矽奈米粉末(西格瑪奧瑞奇(Sigma Aldrich),小於100 nm(體積基準平均粒子徑,但超過10 nm))4.12 g,利用超音波清洗機來製備矽奈米粒子分散液。於該分散液中加入甲基三甲氧基矽烷10.0 g後,加入1 M鹽酸0.1 g攪拌30分鐘。將該反應溶液放入80℃的恆溫槽中放置一夜,製成具有塊狀凝膠的形態的矽奈米粒子/甲基聚倍半矽氧烷複合體(5)。[Comparative Example 1] (MeSiO 0.5 ) Place 3.6 g of water, 7 g of isopropanol, and silicon nanometer powder (Sigma Aldrich) in a beaker, less than 100 nm (volume-based average particle diameter, but more than 10 nm)) 4.12 g, using an ultrasonic cleaner to prepare silicon nanoparticle dispersion. After adding 10.0 g of methyltrimethoxysilane to the dispersion, 0.1 g of 1 M hydrochloric acid was added and stirred for 30 minutes. The reaction solution was placed in a thermostat at 80° C. and left overnight to prepare a silicon nanoparticle/methylpolysilsesquioxane composite (5) in the form of a massive gel.
將所得的矽奈米粒子/甲基聚倍半矽氧烷複合體(5)置於SSA-S等級的氧化鋁製舟皿中後,將該舟皿置於真空吹掃式管式爐KTF43N1-VPS(光洋熱系統(Koyo Thermo System)公司製造)中,作為熱處理條件,於氬氣氛圍下(高純度氬氣99.999%),以250 ml/分鐘的流量供給氬氣,同時以4℃/分鐘的比例升溫,於1200℃下煆燒5小時,藉此製備矽奈米粒子/甲基聚倍半矽氧烷複合體(5)的煆燒物。After placing the obtained silicon nanoparticle/methyl polysilsesquioxane composite (5) in a boat made of SSA-S grade alumina, the boat was placed in a vacuum purged tube furnace KTF43N1 -In VPS (manufactured by Koyo Thermo System), as the heat treatment condition, argon is supplied at a flow rate of 250 ml/min under an argon atmosphere (high purity argon 99.999%), and at the same time at 4°C/ The temperature is increased within minutes, and the mixture is sintered at 1200°C for 5 hours to prepare a sintered product of silicon nanoparticle/methyl polysilsesquioxane complex (5).
繼而,利用乳缽將如上所述而獲得的矽奈米粒子/甲基聚倍半矽氧烷複合體(5)的煆燒物粉碎,使用孔徑32 μm的不鏽鋼製篩進行分級,藉此獲得最大粒子徑為32 μm的SiOC複合材(5)的粉體7.2 g。Then, the sintered product of the silicon nanoparticle/methylpolysilsesquioxane composite (5) obtained as described above was pulverized in a mortar and classified using a stainless steel sieve with a pore size of 32 μm to obtain 7.2 g powder of SiOC composite material (5) with a maximum particle diameter of 32 μm.
對以該方式獲得的SiOC複合材的一部分,與實施例1同樣地進行SEM觀察、粒度分佈測定及BET比表面積的測定。 進而,使用本比較例中獲得的SiOC複合材來代替實施例1中取得的SiOC結構體,除此以外,與實施例1同樣地製作負極用組成物及負極體以及鋰離子二次電池,並進行電池特性的評價。As for a part of the SiOC composite material obtained in this way, SEM observation, particle size distribution measurement, and BET specific surface area measurement were performed in the same manner as in Example 1. Furthermore, except that the SiOC composite material obtained in this comparative example was used instead of the SiOC structure obtained in Example 1, a negative electrode composition, a negative electrode body, and a lithium ion secondary battery were produced in the same manner as in Example 1, and Perform evaluation of battery characteristics.
[比較例2](MeSiO0.5 ) 首先,藉由與實施例1同樣的程序,製備矽奈米粒子分散液,並且使用0.01 M乙酸水溶液使甲基三甲氧基矽烷水解,於所得的水解反應溶液中加入所述矽奈米粒子分散液,於室溫下攪拌1小時。 繼而,於以該方式獲得的混合液中加入36重量%濃度的鹽酸2.00 g(20 mmol),於室溫下,以一夜一邊攪拌該混合溶液一邊進行所述矽烷化合物水解物的聚合反應,結果最終獲得餅狀的矽奈米粒子/甲基聚倍半矽氧烷複合體(6)。該複合體(6)是以附著於反應容器內部的狀態生成,因而難以回收。因此,採集該複合體(6)的一部分進行SEM觀察,剩餘部分不煆燒而廢棄。[Comparative Example 2] (MeSiO 0.5 ) First, by the same procedure as in Example 1, a silica nanoparticle dispersion was prepared, and methyltrimethoxysilane was hydrolyzed with a 0.01 M acetic acid aqueous solution, and the resulting hydrolysis reaction solution Add the silicon nanoparticle dispersion liquid to it, and stir at room temperature for 1 hour. Then, 2.00 g (20 mmol) of 36% by weight hydrochloric acid was added to the mixed solution obtained in this way, and the polymerization reaction of the hydrolyzate of the silane compound was carried out while stirring the mixed solution at room temperature overnight. As a result, Finally, a cake-like silicon nanoparticle/methyl polysilsesquioxane composite (6) is obtained. This composite (6) is produced in a state of being attached to the inside of the reaction vessel, and therefore is difficult to recover. Therefore, a part of the composite (6) was collected for SEM observation, and the remaining part was discarded without being burnt.
<結果> (SEM觀察) 圖1中分別示出實施例1~實施例4中製造的各矽奈米粒子/甲基聚倍半矽氧烷複合體(1)~矽奈米粒子/甲基聚倍半矽氧烷複合體(4)的SEM照片。此外,圖2(a)及圖2(b)中分別示出實施例1~實施例4中製造的各SiOC結構體(1)~SiOC結構體(4)、及比較例1中製造的SiOC複合材(5)的SEM照片(10,000倍)。此外,圖2(c)中示出比較例2中製造的矽奈米粒子/甲基聚倍半矽氧烷複合體(6)的SEM照片(20,000倍)。進而,關於實施例1中製造的各SiOC結構體,將提高放大倍率而取得的SEM照片(50,000倍)示於圖3中。<Results> (SEM observation) Figure 1 shows each of the silicon nanoparticle/methylpolysilsesquioxane composites (1) ~ the silicon nanoparticle/methylpolysilsesquioxane composite manufactured in Example 1 to Example 4, respectively SEM photo of body (4). In addition, FIG. 2(a) and FIG. 2(b) respectively show each SiOC structure (1) to SiOC structure (4) manufactured in Example 1 to Example 4, and the SiOC manufactured in Comparative Example 1 SEM photo (10,000 times) of composite material (5). In addition, FIG. 2(c) shows an SEM photograph (20,000 times) of the silicon nanoparticle/methylpolysilsesquioxane composite (6) produced in Comparative Example 2. Furthermore, regarding each SiOC structure manufactured in Example 1, the SEM photograph (50,000 times) obtained by increasing the magnification is shown in FIG. 3.
於圖2(a)及圖3(a)、圖3(b)所示的SEM照片中,實施例1~實施例4中製造的SiOC結構體(1)~SiOC結構體(4)均確認到矽奈米粒子被源自聚倍半矽氧烷的SiOC塗層均勻地被覆、且多個矽奈米粒子經由SiOC塗層而連結的樣子。 此外,由圖1所示的SEM照片可知,實施例1~實施例4中合成的矽奈米粒子/甲基聚倍半矽氧烷複合體(1)~矽奈米粒子/甲基聚倍半矽氧烷複合體(4)均由藉由規定的矽烷化合物的水解及縮聚反應而生成的聚倍半矽氧烷被覆矽奈米粒子,多個矽奈米粒子經由該聚倍半矽氧烷的塗層而連結。即,關於藉由熱處理而取得的SiOC結構體(1)~SiOC結構體(4)的SiOC塗層,認為雖然該聚倍半矽氧烷的塗層因熱處理而陶瓷化,由此轉換為SiOC塗層,但不會因熱處理而發生大的形態變化,可維持由該塗層所得的矽奈米粒子的被覆結構。 並且,著眼於矽奈米粒子/聚矽倍半氧烷複合體的合成製程,實施例1~實施例4中,於酸性觸媒的存在下,於攪拌下使規定的矽烷化合物水解,之後使其縮聚時,藉由不攪拌反應液而靜置一夜的方法來推進縮聚反應,由此推測形成了如下的矽奈米粒子/聚倍半矽氧烷複合體,其具有矽奈米粒子由藉由縮聚而生成的聚倍半矽氧烷部分比較均勻地被覆的結構。In the SEM photographs shown in Fig. 2(a) and Fig. 3(a) and Fig. 3(b), the SiOC structure (1) to the SiOC structure (4) produced in Example 1 to Example 4 are all confirmed The silicon nano-particles are uniformly coated by the SiOC coating derived from polysilsesquioxane, and a plurality of silicon nano-particles are connected through the SiOC coating. In addition, it can be seen from the SEM photograph shown in Fig. 1 that the silicon nanoparticle/methylpolysilsesquioxane composite (1)~silicon nanoparticle/methylpolysiloxane synthesized in Example 1 to Example 4 The semi-siloxane complex (4) is made of polysilsesquioxane-coated silicon nanoparticles produced by the hydrolysis and polycondensation reaction of a prescribed silane compound. Multiple silicon nanoparticles pass through the polysilsesquioxane The alkane coating is connected. That is, regarding the SiOC coating of the SiOC structure (1) to the SiOC structure (4) obtained by the heat treatment, it is considered that although the polysilsesquioxane coating is ceramicized by the heat treatment, it is considered to be converted to SiOC The coating does not undergo major morphological changes due to heat treatment, and can maintain the coating structure of the silicon nanoparticle obtained by the coating. In addition, focusing on the synthesis process of silicon nanoparticle/polysilsesquioxane composite, in Examples 1 to 4, in the presence of an acidic catalyst, a predetermined silane compound was hydrolyzed under stirring, and then During the polycondensation, the polycondensation reaction is promoted by leaving the reaction solution overnight without stirring. It is speculated that the following silicon nanoparticle/polysilsesquioxane complex is formed, which has silicon nanoparticle The structure in which the polysilsesquioxane produced by the polycondensation is relatively uniformly covered.
另一方面,與實施例1~實施例4相對比,關於比較例1中製造的SiOC複合材,如由圖2(b)的SEM照片可知般,無法觀察到源自聚倍半矽氧烷的SiOC部分被覆矽奈米粒子的狀態,確認到大量的相對於外部而許多部分處於露出的狀態的矽奈米粒子。即,關於比較例1中製造的SiOC複合材,確認到並非由SiOC部分均勻地被覆矽奈米粒子,而是兩者相互無序地凝聚般的結構體。 顯現此種凝聚樣結構的原因在於,比較例1中,於矽奈米粒子分散液中一次性添加甲基三甲氧基矽烷及鹽酸,來推進甲基三甲氧基矽烷的水解及縮聚,由此合成具有塊狀凝膠的形態的矽奈米粒子/甲基聚倍半矽氧烷複合體。On the other hand, compared with Example 1 to Example 4, regarding the SiOC composite material produced in Comparative Example 1, as can be seen from the SEM photograph of Figure 2(b), no polysilsesquioxane derived from The SiOC part is covered with silicon nanoparticle, and a large number of silicon nanoparticle is confirmed to be exposed to the outside. That is, regarding the SiOC composite material produced in Comparative Example 1, it was confirmed that the silicon nanoparticle was not uniformly covered by the SiOC part, but a structure in which the two were aggregated in disorder. The reason for the appearance of such agglomerated structure is that in Comparative Example 1, methyltrimethoxysilane and hydrochloric acid were added to the silicon nanoparticle dispersion at one time to promote the hydrolysis and polycondensation of methyltrimethoxysilane. Synthesize a silicon nanoparticle/methyl polysilsesquioxane complex in the form of a massive gel.
進而,在水解後的縮聚期間亦持續攪拌反應液的比較例2中,生成呈餅狀形態的矽奈米粒子/甲基聚倍半矽氧烷複合體(參照圖2(c)的SEM照片)。Furthermore, in Comparative Example 2 in which the reaction solution was continuously stirred during the polycondensation after hydrolysis, a silicanoparticle/methylpolysilsesquioxane complex in the form of a cake was formed (see the SEM picture of Figure 2(c)) ).
如上所述,本發明的實施例中,可製造如下SiOC結構體,其具有矽奈米粒子被源自聚倍半矽氧烷的SiOC塗層均勻地被覆、且多個矽奈米粒子經由SiOC塗層連結的結構。此處,SiOC塗層相較而言並無表面粗糙度等,具有平滑的表面。As described above, in the embodiment of the present invention, the following SiOC structure can be manufactured, which has silicon nanoparticle is uniformly coated by SiOC coating derived from polysilsesquioxane, and a plurality of silicon nanoparticle is passed through SiOC The structure of the coating connection. Here, the SiOC coating layer has no surface roughness, etc., and has a smooth surface.
其次,關於實施例1~實施例4中製造的各SiOC構造體及比較例1中製造的SiOC複合材,將藉由粒度分佈測定而取得的粒度分佈的曲線圖示於圖4(a)、圖4(b)中。進而,將對該些SiOC結構體及SiOC複合材測定出的體積基準平均粒子徑(μm)、BET比表面積(m2 /g)及元素分析(質量%)的結果示於表1中。Next, regarding each SiOC structure manufactured in Examples 1 to 4 and the SiOC composite material manufactured in Comparative Example 1, the graph of the particle size distribution obtained by the particle size distribution measurement is shown in Fig. 4(a), Figure 4(b). Furthermore, the results of the volume-based average particle diameter (μm), BET specific surface area (m 2 /g), and elemental analysis (mass %) measured for these SiOC structures and SiOC composite materials are shown in Table 1.
[表1]
首先,關於比較例1,如表1及圖4(a)、圖4(b)所示,確認到儘管平均粒子徑較大,但BET比表面積顯示出23.2 m2 /g的值,與實施例的SiOC結構體相比明顯大。關於成為此種結果的理由,認為原因在於,如藉由所述SEM照片(圖2(b))而觀察到般,由於欲藉由破碎處理使複合材變細,因此導致微粉的產生及表面粗糙。關於該方面,與圖4(a)、圖4(b)所示的粒度分佈曲線圖中,在比較例1的粒度分佈中,峰值向粒子徑大的方向移動,並且在隔著峰值的左側(即,粒子徑小的區域)亦以規定程度觀察到分佈,可觀察到寬的分佈的結果一致。First, as for Comparative Example 1, as shown in Table 1 and Figure 4(a) and Figure 4(b), it was confirmed that although the average particle diameter was large, the BET specific surface area showed a value of 23.2 m 2 /g. The SiOC structure of the example is significantly larger than that. Regarding the reason for this result, it is believed that the reason is that, as observed from the SEM photograph (Figure 2(b)), the composite material is to be thinned by the crushing treatment, resulting in the generation of fine powder and the surface Rough. In this regard, compared with the particle size distribution graphs shown in Figs. 4(a) and 4(b), in the particle size distribution of Comparative Example 1, the peak shifts in the direction of the larger particle diameter and is on the left side of the peak. (That is, the area where the particle diameter is small) The distribution is also observed at a predetermined level, and the result of observing a wide distribution is consistent.
與此相對,可知實施例1~實施例4中製造的SiOC構造體均為BET比表面積顯示出小於10 m2 /g的值,顯示出較低的值。此外,由圖4(a)、圖4(b)的粒度分佈曲線圖可瞭解到,實施例1~實施例4的SiOC結構體的粒度分佈的峰值尖銳,以更均勻的粒子尺寸的形態提供。並且,關於該方面,與如圖2(a)的SEM照片中所示般,矽奈米粒子由藉由縮聚而生成的聚倍半矽氧烷部分均勻被覆,形成均勻且無表面粗糙的結構,煆燒後亦維持此種均勻且無表面粗糙的結構一致。In contrast, it can be seen that all the SiOC structures produced in Examples 1 to 4 show a BET specific surface area of less than 10 m 2 /g, which is a low value. In addition, it can be understood from the particle size distribution graphs of Figures 4(a) and 4(b) that the particle size distribution peaks of the SiOC structures of Examples 1 to 4 are sharp and are provided in a more uniform particle size form . In this regard, as shown in the SEM photograph of Fig. 2(a), the silicon nanoparticle is uniformly covered by the polysilsesquioxane produced by polycondensation to form a uniform structure without surface roughness. After sintering, the uniform structure without surface roughness is maintained.
再者,與實施例1~實施例3中製造的SiOC結構體相比,實施例4中製造的SiOC結構體的平均粒子徑較大,顯示出較比較例1的值大的值(17.71 μm)。然而,實施例4與比較例1不同,BET比表面積顯示為1.3 m2 /g這一顯著小的值(表1),可知粒度分佈的峰值亦尖銳(圖4(b))。即,可知實施例4雖然粒子徑較大,但整體而言與實施例1~實施例3同樣地形成有均勻且無表面粗糙的結構。關於該方面,根據圖2(a)所示的SEM照片亦明確。Furthermore, compared with the SiOC structure manufactured in Examples 1 to 3, the average particle diameter of the SiOC structure manufactured in Example 4 was larger and showed a value larger than that of Comparative Example 1 (17.71 μm). ). However, Example 4 is different from Comparative Example 1, in that the BET specific surface area is a significantly small value of 1.3 m 2 /g (Table 1), and it can be seen that the peak of the particle size distribution is also sharp (Figure 4(b)). That is, it can be seen that Example 4 has a large particle diameter, but as a whole, it has a uniform structure without surface roughness similarly to Examples 1 to 3. This aspect is also clear from the SEM photograph shown in Fig. 2(a).
(充放電循環試驗的結果) 將對實施例1~實施例4及比較例1中分別製作的鋰離子電池進行的充放電循環試驗的結果示於表2及圖5(a)、圖5(b)中。 再者,圖5(a)、圖5(b)中,實線表示充電容量,虛線表示放電容量。(Result of charge and discharge cycle test) The results of the charge-discharge cycle test performed on the lithium ion batteries prepared in each of Examples 1 to 4 and Comparative Example 1 are shown in Table 2 and Figs. 5(a) and 5(b). In addition, in FIGS. 5(a) and 5(b), the solid line represents the charge capacity, and the broken line represents the discharge capacity.
[表2]
首先,如根據圖5(a)、圖5(b)可領會般,自5個循環附近開始,容量的下降有比較穩定的傾向,因此,關於本充放電循環試驗的結果,藉由算出第50個循環相對於第5個循環的容量維持率及平均庫侖效率(平均CE),而對各鋰離子電池的性能進行評價。First, as can be understood from Fig. 5(a) and Fig. 5(b), the capacity decline tends to be relatively stable starting from around 5 cycles. Therefore, regarding the result of the charge-discharge cycle test, the first The capacity retention rate and the average coulombic efficiency (average CE) of 50 cycles relative to the fifth cycle were used to evaluate the performance of each lithium ion battery.
其結果,如表2及圖5(a)、圖5(b)所示般,關於實施例1~實施例4中製作的鋰離子電池,於充放電循環試驗中,5個循環~50個循環的容量維持率均顯示出65%以上的值,顯示出極其良好的容量維持率。此外,該些鋰離子電池的5個循環~50個循環的平均庫侖效率均顯示出99%附近的值,保持極其良好的平均庫侖效率。As a result, as shown in Table 2 and Figs. 5(a) and 5(b), the lithium ion batteries produced in Examples 1 to 4 were tested in the charge-discharge cycle test from 5 cycles to 50 The cycle capacity retention rate all showed a value of 65% or more, showing an extremely good capacity retention rate. In addition, the average coulombic efficiencies of these lithium ion batteries from 5 cycles to 50 cycles all show values around 99%, and they maintain extremely good average coulombic efficiencies.
與此相對,關於比較例1中製作的鋰離子電池,與將本發明規定的SiOC結構體用作負極材料的實施例1~實施例4相比較,5個循環~50個循環的容量維持率僅顯示出32.9%的值,極差。進而,比較例1的鋰離子電池的5個循環~50個循環的庫侖效率亦僅顯示出97.2%的值,與實施例1~實施例4的鋰離子電池相較而言差。In contrast, regarding the lithium ion battery produced in Comparative Example 1, compared with Examples 1 to 4 in which the SiOC structure specified in the present invention was used as the negative electrode material, the capacity retention rate of 5 to 50 cycles It only shows a value of 32.9%, which is extremely poor. Furthermore, the coulombic efficiency of the lithium ion battery of Comparative Example 1 from 5 cycles to 50 cycles also showed a value of only 97.2%, which is inferior to the lithium ion batteries of Examples 1 to 4.
如上所述,根據實施例1~實施例4及比較例1的結果示出,於採用本發明規定的SiOC結構體的情況下,能夠提供容量維持率及庫侖效率高的二次電池。 [產業上之可利用性]As described above, the results of Examples 1 to 4 and Comparative Example 1 show that when the SiOC structure specified in the present invention is used, a secondary battery with high capacity retention rate and coulomb efficiency can be provided. [Industrial availability]
本發明於製造SiOC材料、負極活性物質、負極材等的材料/化學領域以及二次電池及各種電子設備等電氣電子領域等中具有高的產業上之可利用性。The present invention has high industrial applicability in materials/chemical fields such as SiOC materials, negative electrode active materials, negative electrode materials, and electrical and electronic fields such as secondary batteries and various electronic devices.
300:鋰離子二次電池(硬幣電池) 301:負極材(負極) 302:隔板 303:鋰對電極(正極)300: Lithium ion secondary battery (coin battery) 301: negative electrode material (negative electrode) 302: Partition 303: Lithium counter electrode (positive electrode)
圖1是表示實施例1~實施例4中分別合成的矽奈米粒子/甲基聚倍半矽氧烷複合體的掃描式電子顯微鏡(SEM)照片(1,000倍)的圖。 圖2(a)是表示實施例1~實施例4中分別取得的SiOC結構體的SEM照片(10,000倍)的圖。圖2(b)是表示比較例1中取得的SiOC材料的SEM照片(10,000倍)的圖。圖2(c)是表示比較例2中取得的矽奈米粒子/甲基聚倍半矽氧烷複合體的SEM照片(20,000倍)的圖。 圖3(a)、圖3(b)是表示實施例1中取得的SiOC結構體的SEM照片的圖。圖3(a)是基於10,000倍的放大倍率而得,圖3(b)是基於50,000倍的放大倍率而得。 圖4(a)、圖4(b)是表示測定實施例1~實施例4中取得的SiOC結構體及比較例1中取得的SiOC材料的粒度分佈而得到的結果的圖。 圖5(a)、圖5(b)是表示對實施例1~實施例4及比較例1中製作的鋰離子二次電池,藉由充放電循環試驗來測定電池容量(a)及庫侖效率(b)而得到的結果的圖。 圖6是表示硬幣型的鋰離子電池的構成例的圖。FIG. 1 is a diagram showing a scanning electron microscope (SEM) photograph (1,000 times) of the silicon nanoparticle/methylpolysilsesquioxane composite synthesized in each of Examples 1 to 4. FIG. 2(a) is a diagram showing an SEM photograph (10,000 times) of the SiOC structure obtained in each of Example 1 to Example 4. FIG. FIG. 2(b) is a diagram showing an SEM photograph (10,000 times) of the SiOC material obtained in Comparative Example 1. FIG. FIG. 2(c) is a diagram showing a SEM photograph (20,000 times) of the silicon nanoparticle/methylpolysilsesquioxane composite obtained in Comparative Example 2. FIG. 3(a) and 3(b) are diagrams showing SEM photographs of the SiOC structure obtained in Example 1. FIG. Figure 3(a) is based on a magnification of 10,000 times, and Figure 3(b) is based on a magnification of 50,000 times. 4(a) and 4(b) are graphs showing the results of measuring the particle size distribution of the SiOC structure obtained in Examples 1 to 4 and the SiOC material obtained in Comparative Example 1. FIG. Figures 5(a) and 5(b) show the measurement of battery capacity (a) and coulombic efficiency of lithium ion secondary batteries produced in Examples 1 to 4 and Comparative Example 1 through a charge-discharge cycle test (B) A graph of the result obtained. Fig. 6 is a diagram showing a configuration example of a coin-type lithium ion battery.
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