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TW201903058A - Resin composition, prepreg, resin sheet, metal foil-clad laminate, printed circuit board, and resin composition manufacturing method - Google Patents

Resin composition, prepreg, resin sheet, metal foil-clad laminate, printed circuit board, and resin composition manufacturing method Download PDF

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TW201903058A
TW201903058A TW107117663A TW107117663A TW201903058A TW 201903058 A TW201903058 A TW 201903058A TW 107117663 A TW107117663 A TW 107117663A TW 107117663 A TW107117663 A TW 107117663A TW 201903058 A TW201903058 A TW 201903058A
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resin composition
resin
compound
formula
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TW107117663A
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TWI769258B (en
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古田亞衣子
大西展義
田所弘晃
山口翔平
高橋博史
河合英利
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日商三菱瓦斯化學股份有限公司
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    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
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    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/24Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
    • C08J5/241Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres
    • C08J5/244Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using inorganic fibres using glass fibres
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
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    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
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    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
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    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/24Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
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    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/0353Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/0353Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • H05K1/0373Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement containing additives, e.g. fillers
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    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0137Materials
    • H05K2201/0154Polyimide

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
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  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Inorganic Chemistry (AREA)
  • Reinforced Plastic Materials (AREA)
  • Laminated Bodies (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)

Abstract

A resin composition containing an aromatic compound (A) in which a monovalent substituent represented by formula (1a) set forth below and a monovalent substituent represented by formula (1b) set forth below bind directly to an aromatic ring, and a maleimide compound (B). CH2=CR<SP>a</SP>CH2- (1a) R<SP>b</SP>O- (1b) (In formula (1a), R<SP>a</SP> represents a hydrogen atom or a monovalent organic group, and in figure (1b), R<SP>b</SP> represents a monovalent organic group.).

Description

樹脂組成物、預浸體、樹脂片、覆金屬箔疊層板與印刷電路板及樹脂組成物之製造方法Resin composition, prepreg, resin sheet, metal foil-clad laminate, printed circuit board, and method for producing resin composition

本發明係關於樹脂組成物、預浸體、樹脂片、覆金屬箔疊層板及印刷電路板、及樹脂組成物之製造方法。The present invention relates to a method for producing a resin composition, a prepreg, a resin sheet, a metal foil-clad laminate, a printed circuit board, and a resin composition.

近年來,伴隨電子設備、通訊器材、個人電腦等廣泛使用的半導體封裝體的高機能化、小型化進展。半導體封裝體用之各零件之高整合化、高密度安裝化近年來愈益加速。隨之,半導體元件與半導體塑膠封裝體用印刷電路板間之熱膨脹率之差距所致產生之半導體塑膠封裝體之翹曲成為問題,已提出了各式各樣的對策。In recent years, advances have been made in the performance and miniaturization of semiconductor packages that are widely used in electronic equipment, communication equipment, and personal computers. The high integration and high-density mounting of various components used in semiconductor packages have been accelerating in recent years. Accordingly, the warpage of the semiconductor plastic package caused by the difference in the thermal expansion rate between the semiconductor element and the printed circuit board for the semiconductor plastic package becomes a problem, and various countermeasures have been proposed.

作為其中一對策,有人探討藉由併用二烯丙基雙酚A與馬來醯亞胺化合物,來提高印刷電路板中之疊層板之玻璃轉移溫度(高Tg化)(例如參照專利文獻1)。 [先前技術文獻] [專利文獻]As a countermeasure, it has been considered to increase the glass transition temperature (higher Tg) of a laminated board in a printed circuit board by using a combination of diallyl bisphenol A and a maleimide compound (for example, refer to Patent Document 1). ). [Prior Art Literature] [Patent Literature]

專利文獻1:日本特開平02-097561號公報Patent Document 1: Japanese Patent Application Laid-Open No. 02-097561

(發明欲解決之課題)(Problems to be Solved by the Invention)

但是依照本案發明人等的詳細研究,上述習知技術中,印刷電路板之成形性不足。又,成為印刷電路板之原料之預浸體之保存安定性有進一步改善的餘地。故希望能進一步改良。However, according to a detailed study by the inventors of the present invention, in the above-mentioned conventional technology, the formability of the printed circuit board is insufficient. In addition, there is room for further improvement in the storage stability of the prepreg, which is a raw material for printed circuit boards. It is hoped that further improvements can be made.

本發明有鑑於上述情事,目的在於提供印刷電路板之成形性及預浸體之保存安定性優異的樹脂組成物、預浸體、樹脂片、覆金屬箔疊層板及印刷電路板、及樹脂組成物之製造方法。 (解決課題之方式)The present invention has been made in view of the foregoing circumstances, and an object thereof is to provide a resin composition, a prepreg, a resin sheet, a metal foil-clad laminate, a printed circuit board, and a resin having excellent formability of a printed circuit board and storage stability of the prepreg. Manufacturing method of composition. (The way to solve the problem)

本案發明人等為了達成上述目的而努力研究。其結果,以往印刷電路板之成形性有改善餘地是因為成為其原料之預浸體之熔融黏度高、將此預浸體疊層並使其硬化時,預浸體中含有的樹脂組成物之流動性不良。並且,發現:預浸體之熔融黏度高且其保存安定性有改善餘地,是因為如二烯丙基雙酚A之在芳香環有烯丙基(也可經取代。以下此段落亦同。)與苯酚性羥基之芳香族化合物中之烯丙基容易與馬來醯亞胺化合物中之馬來醯亞胺基進行反應的原故。並且進一步研究的結果,發現適當妨礙烯丙基與馬來醯亞胺基之反應的方法,藉此可獲得印刷電路板之成形性及預浸體之保存安定性優異的樹脂組成物,乃完成本發明。The inventors of the present case have worked hard to achieve the above-mentioned object. As a result, the conventional moldability of printed circuit boards has room for improvement because the prepreg used as the raw material has a high melt viscosity. When this prepreg is laminated and hardened, the resin composition contained in the prepreg has a high melt viscosity. Poor mobility. In addition, it was found that the prepreg has a high melt viscosity and there is room for improvement in storage stability, because, for example, diallyl bisphenol A has an allyl group in the aromatic ring (which may also be substituted. The same applies to the following paragraphs. ) The reason why allyl groups in aromatic compounds with phenolic hydroxyl groups easily react with maleimide groups in maleimide compounds. As a result of further research, it was found that a method for appropriately hindering the reaction between an allyl group and a maleimide group can be used to obtain a resin composition having excellent formability of a printed circuit board and excellent storage stability of a prepreg. this invention.

亦即,本發明如下。 [1]一種樹脂組成物,包括:下式(1a)表示之1價取代基與下式(1b)表示之1價取代基直接鍵結在芳香環而成的芳香族化合物(A),及馬來醯亞胺化合物(B); CH2 =CRa CH2 -  (1a) Rb O-  (1b) 式(1a)中,Ra 表示氫原子或1價有機基,式(1b)中,Rb 表示1價有機基。 [2]如[1]之樹脂組成物,其中,該芳香族化合物(A)中,該芳香環中的與該式(1a)表示之1價取代基鍵結之碳原子與該芳香環中的與該式(1b)表示之1價取代基鍵結之碳原子彼此相鄰。 [3]如[1]或[2]之樹脂組成物,其中,該式(1b)表示之1價取代基係下式(2)、(3)及(4)表示之1價取代基中之任一者; 【化1】式(2)、(3)及(4)中,R1 表示也可以有取代基之直鏈狀或分支狀之碳數1以上之烷基或芳基。 [4]如[3]之樹脂組成物,其中,該R1 為下式(5)表示之取代基; 【化2】式(5)中,R2 表示氫原子或1價有機基。 [5]如[1]~[4]中任一項之樹脂組成物,其中,該芳香族化合物(A)包括下式(6)表示之化合物; 【化3】式(6)中,2個R3 各自獨立地表示羥基或下式(2)、(3)及(4)表示之任一取代基,且至少其中一者表示下式(2)、(3)及(4)表示之任一取代基,R4 表示單鍵、伸烷基、伸苯基、伸聯苯基、或伸萘基,R5 各自獨立地表示氫原子、烷基、苯基、聯苯基、或萘基; 【化4】式(2)、(3)及(4)中,R1 表示也可以有取代基之直鏈狀或分支狀之碳數1以上之烷基或芳基。 [6]如[1]~[5]中任一項之樹脂組成物,其中,該馬來醯亞胺化合物(B)係選自由雙(4-馬來醯亞胺苯基)甲烷、2,2-雙{4-(4-馬來醯亞胺苯氧基)-苯基}丙烷、雙(3-乙基-5-甲基-4-馬來醯亞胺苯基)甲烷、聚環丁烷氧化物-雙(4-馬來醯亞胺苯甲酸酯)及下式(7)表示之馬來醯亞胺化合物構成之群組中之至少1種; 【化5】式(7)中,R6 各自獨立地表示氫原子或甲基,n1 表示1以上之整數。 [7]如[1]~[6]中任一項之樹脂組成物,更包含選自由環氧樹脂、氰酸酯化合物及經烯基取代之納迪克醯亞胺(nadiimide)構成之群組中之至少1種。 [8]如[1]~[7]中任一項之樹脂組成物,更包含無機填充材(C)。 [9]如[8]之樹脂組成物,其中,該無機填充材(C)包括選自由二氧化矽、氧化鋁及軟水鋁石構成之群組中之至少1種。 [10]如[8]或[9]之樹脂組成物,其中,該無機填充材(C)之含量相對於樹脂固體成分100質量份為30~500質量份。 [11]一種預浸體,具備:基材;及含浸或塗佈於該基材之如[1]~[10]中任一項之樹脂組成物。 [12]一種樹脂片,具備:支持體;及塗佈於該支持體之如[1]~[10]中任一項之樹脂組成物。 [13]一種疊層板,係將1片以上之選自由如[11]之預浸體、及如[12]之樹脂片構成之群組中之至少1種重疊而成, 含有包含在選自由該預浸體及該樹脂片構成之群組中之至少1種中的樹脂組成物之硬化物。 [14]一種覆金屬箔疊層板,具有選自由如[11]之預浸體、及如[12]之樹脂片構成之群組中之至少1種、及配置在選自由該預浸體及該樹脂片構成之群組中之至少1種之單面或兩面之金屬箔, 含有包含在選自由該預浸體及該樹脂片構成之群組中之至少1種中的樹脂組成物之硬化物。 [15]一種印刷電路板,含有絕緣層及形成在該絕緣層之表面之導體層, 該絕緣層含有如[1]~[10]中任一項之樹脂組成物。 [16]一種樹脂組成物之製造方法,包括下列步驟: 使由下式(1a)表示之1價取代基與苯酚性羥基直接鍵結在芳香環而成之芳香族化合物(A1)、與會和苯酚性羥基反應之化合物反應,而獲得由下式(1a)表示之1價取代基與下式(1b)表示之1價取代基直接鍵結在芳香環而成之芳香族化合物(A); 摻合該芳香族化合物(A)與馬來醯亞胺化合物(B)之步驟; CH2 =CRa CH2 -  (1a) Rb O-  (1b) 式(1a)中,Ra 表示氫原子或1價有機基,式(1b)中,Rb 表示1價有機基。 (發明之效果)That is, the present invention is as follows. [1] A resin composition comprising: an aromatic compound (A) in which a monovalent substituent represented by the following formula (1a) and a monovalent substituent represented by the following formula (1b) are directly bonded to an aromatic ring; and Maleimide compound (B); CH 2 = CR a CH 2- (1a) R b O- (1b) In formula (1a), R a represents a hydrogen atom or a monovalent organic group, in formula (1b) R b represents a monovalent organic group. [2] The resin composition according to [1], wherein in the aromatic compound (A), the carbon atom in the aromatic ring bonded to the monovalent substituent represented by the formula (1a) is in the aromatic ring The carbon atoms bonded to the monovalent substituent represented by the formula (1b) are adjacent to each other. [3] The resin composition according to [1] or [2], wherein the monovalent substituent represented by the formula (1b) is a monovalent substituent represented by the following formulae (2), (3), and (4) Any one of In formulae (2), (3), and (4), R 1 represents a linear or branched alkyl or aryl group having 1 or more carbon atoms which may have a substituent. [4] The resin composition according to [3], wherein R 1 is a substituent represented by the following formula (5); In formula (5), R 2 represents a hydrogen atom or a monovalent organic group. [5] The resin composition according to any one of [1] to [4], wherein the aromatic compound (A) includes a compound represented by the following formula (6); In formula (6), two R 3 each independently represent a hydroxyl group or any of the substituents represented by the following formulae (2), (3), and (4), and at least one of them represents the following formulae (2), (3 ) And (4), each of R 4 represents a single bond, an alkylene group, a phenylene group, a phenylene group, or a naphthyl group, and R 5 each independently represents a hydrogen atom, an alkyl group, or a phenyl group. , Biphenyl, or naphthyl; [Chem 4] In formulae (2), (3), and (4), R 1 represents a linear or branched alkyl or aryl group having 1 or more carbon atoms which may have a substituent. [6] The resin composition according to any one of [1] to [5], wherein the maleimide compound (B) is selected from the group consisting of bis (4-maleimidephenyl) methane, 2 , 2-bispyrene 4- (4-maleimide phenoxy) -phenylpyrene propane, bis (3-ethyl-5-methyl-4-maleimide phenyl) methane, poly At least one member of the group consisting of cyclobutane oxide-bis (4-maleimide iminobenzoate) and a maleimide compound represented by the following formula (7); [Chem. 5] In formula (7), R 6 each independently represents a hydrogen atom or a methyl group, and n 1 represents an integer of 1 or more. [7] The resin composition according to any one of [1] to [6], further comprising a group selected from the group consisting of an epoxy resin, a cyanate compound, and nadiimide substituted with an alkenyl group. At least one of them. [8] The resin composition according to any one of [1] to [7], further including an inorganic filler (C). [9] The resin composition according to [8], wherein the inorganic filler (C) includes at least one selected from the group consisting of silica, alumina, and boehmite. [10] The resin composition according to [8] or [9], wherein the content of the inorganic filler (C) is 30 to 500 parts by mass relative to 100 parts by mass of the resin solid content. [11] A prepreg comprising: a substrate; and the resin composition according to any one of [1] to [10] impregnated or coated on the substrate. [12] A resin sheet comprising: a support; and the resin composition according to any one of [1] to [10] applied to the support. [13] A laminated board made by stacking at least one of at least one selected from the group consisting of a prepreg such as [11] and a resin sheet such as [12]. The cured product of the resin composition in at least one of the group consisting of the prepreg and the resin sheet is free. [14] A metal foil-clad laminate having at least one selected from the group consisting of a prepreg as in [11] and a resin sheet as in [12], and disposed in a group selected from the prepreg And at least one kind of single-sided or double-sided metal foil in the group consisting of the resin sheet and the resin composition contained in at least one kind selected from the group consisting of the prepreg and the resin sheet Hardened. [15] A printed circuit board comprising an insulating layer and a conductor layer formed on a surface of the insulating layer, the insulating layer containing the resin composition according to any one of [1] to [10]. [16] A method for producing a resin composition, comprising the following steps: an aromatic compound (A1) in which a monovalent substituent represented by the following formula (1a) and a phenolic hydroxyl group are directly bonded to an aromatic ring; A phenolic hydroxyl-reactive compound is reacted to obtain an aromatic compound (A) in which a monovalent substituent represented by the following formula (1a) and a monovalent substituent represented by the following formula (1b) are directly bonded to an aromatic ring; A step of blending the aromatic compound (A) and the maleimide compound (B); CH 2 = CR a CH 2- (1a) R b O- (1b) In the formula (1a), R a represents hydrogen An atom or a monovalent organic group. In the formula (1b), R b represents a monovalent organic group. (Effect of the invention)

依照本發明,能夠提供印刷電路板之成形性及預浸體之保存安定性優異之樹脂組成物、預浸體、樹脂片、覆金屬箔疊層板及印刷電路板、及樹脂組成物之製造方法。According to the present invention, it is possible to provide a resin composition, a prepreg, a resin sheet, a metal-clad laminate, a printed circuit board, and a resin composition that are excellent in formability of a printed circuit board and storage stability of the prepreg. method.

以下針對本實施方式(以下簡單稱為「本實施形態」)詳細説明,但本發明不限於下列本實施形態。本發明在不脫離其要旨的範圍內可以為各式各樣的變形。Hereinafter, this embodiment (hereinafter simply referred to as "this embodiment") will be described in detail, but the present invention is not limited to the following this embodiment. The present invention may be modified in various ways without departing from the spirit thereof.

(樹脂組成物) 本實施形態之樹脂組成物,包括下式(1a)表示之1價取代基(以下稱為「取代烯丙基」)與下式(1b)表示之1價取代基(以下稱為「取代羥基」)直接鍵結於芳香環而成之芳香族化合物(A);及馬來醯亞胺化合物(B)。在此,芳香環例如:苯環、萘環及蒽環,較佳為苯環及萘環,更佳為苯環。 CH2 =CRa CH2 -  (1a) Rb O-  (1b) 在此,式(1a)中,Ra 表示氫原子或1價有機基,且有碳原子時之碳數較佳為1~60。Ra 更佳為氫原子或碳數1~60之烷基或芳基,且較佳為氫原子或碳數1~6之烷基或芳基,尤佳為氫原子或甲基,極佳為氫原子。另一方面,式(1b)中,Rb 表示1價有機基,其碳數較佳為3~60。Rb 之碳數更佳為3~45,又更佳為4~43。(Resin composition) The resin composition of this embodiment includes a monovalent substituent represented by the following formula (1a) (hereinafter referred to as "substituted allyl group") and a monovalent substituent represented by the following formula (1b) (hereinafter (Referred to as "substituted hydroxy") an aromatic compound (A) directly bonded to an aromatic ring; and a maleimide compound (B). Here, the aromatic ring is, for example, a benzene ring, a naphthalene ring, and an anthracene ring, preferably a benzene ring and a naphthalene ring, and more preferably a benzene ring. CH 2 = CR a CH 2- (1a) R b O- (1b) Here, in the formula (1a), R a represents a hydrogen atom or a monovalent organic group, and the number of carbon atoms is preferably 1 ~ 60. R a is more preferably a hydrogen atom or an alkyl group or an aryl group having 1 to 60 carbon atoms, and is more preferably a hydrogen atom or an alkyl group or an aryl group having 1 to 6 carbon atoms, particularly preferably a hydrogen atom or a methyl group. Is a hydrogen atom. On the other hand, in formula (1b), R b represents a monovalent organic group, and its carbon number is preferably from 3 to 60. The carbon number of R b is more preferably 3 to 45, and even more preferably 4 to 43.

此樹脂組成物中,芳香族化合物(A)中,相對於取代烯丙基具有比起苯酚性羥基有更大立體障礙的取代羥基。所以,上述取代烯丙基與馬來醯亞胺化合物中之馬來醯亞胺基之反應進行會由於上述取代羥基而適度地阻礙。藉此,使用了本實施形態之樹脂組成物之預浸體之熔融黏度能比上述習知技術中者更低。其結果,將此預浸體疊層並使其硬化時,樹脂組成物之流動性良好,疊層板、覆金屬箔疊層板及印刷電路板之成形性優異。又,藉由適度妨礙上述反應之進行,預浸體之經時之黏度上昇亦受抑制,其保存安定性變得優良。惟考慮的要因不限於此。In this resin composition, the aromatic compound (A) has a substituted hydroxyl group which has a greater steric hindrance than the phenolic hydroxyl group with respect to the substituted allyl group. Therefore, the progress of the reaction of the substituted allyl group with the maleimide group in the maleimide compound is moderately hindered by the substituted hydroxyl group. As a result, the melt viscosity of the prepreg using the resin composition of the present embodiment can be lower than that of the conventional techniques. As a result, when this prepreg is laminated and hardened, the fluidity of the resin composition is good, and the laminate, the metal foil-clad laminate, and the printed circuit board are excellent in moldability. In addition, by moderately hindering the progress of the above-mentioned reaction, an increase in the viscosity of the prepreg over time is also suppressed, and its storage stability becomes excellent. But the factors to consider are not limited to this.

(芳香族化合物(A)) 本實施形態之芳香族化合物(A),係取代烯丙基與取代羥基直接鍵結在芳香環而成。就取代羥基而言,宜為Rb 有羥基者較理想,Rb 若為下式(1c)表示之基則更理想。 Rc -CH(OH)-CH2 -  (1c) 在此,Rc 表示也可以有取代基也可在鏈內有氧之直鏈狀或分支狀之碳數1以上之烷基或芳基。烷基之碳數較佳為4~14,芳基之碳數較佳為6~12。(Aromatic compound (A)) The aromatic compound (A) according to this embodiment is obtained by directly bonding a substituted allyl group and a substituted hydroxyl group to an aromatic ring. As for the substituted hydroxyl group, it is preferable that R b has a hydroxyl group, and R b is more preferably a group represented by the following formula (1c). R c -CH (OH) -CH 2- (1c) Here, R c represents a linear or branched alkyl or aryl group having a carbon number of 1 or more, which may have a substituent or may have oxygen in the chain. . The carbon number of the alkyl group is preferably 4 to 14, and the carbon number of the aryl group is preferably 6 to 12.

取代羥基更具體而言可列舉下式(2)、(3)及(4)表示之任一1價取代基。考量更有效且確實地發揮本發明所獲致之作用效果之觀點,宜為下式(2)、(3)及(4)表示之任一1價取代基。More specifically, the substituted hydroxy group may be any monovalent substituent represented by the following formulae (2), (3), and (4). In consideration of the viewpoint of more effectively and surely exerting the effect obtained by the present invention, it is preferably any of the monovalent substituents represented by the following formulae (2), (3), and (4).

【化6】在此,式(2)、(3)及(4)中,R1 表示也可以有取代基之直鏈狀或分支狀之碳數1以上之烷基或芳基。烷基之碳數較佳為4~12,芳基之碳數較佳為6~12。該等中,考量更有效且確實地發揮利用本發明獲致之作用效果之觀點,也可以有取代基之芳基較理想,也可以有取代基之苯基、聯苯基或萘基更佳,下式(5)表示之也可以有取代基之苯基更理想。 【化7】在此,式(5)中,R2 表示氫原子或1價有機基,為1價有機基時,其碳數為1以上。[Chemical 6] Here, in formulae (2), (3), and (4), R 1 represents a linear or branched alkyl or aryl group having 1 or more carbon atoms which may have a substituent. The carbon number of the alkyl group is preferably 4 to 12, and the carbon number of the aryl group is preferably 6 to 12. Among these, from the viewpoint of more effectively and surely exerting the effect obtained by utilizing the present invention, an aryl group having a substituent is preferable, and a phenyl group, a biphenyl group, or a naphthyl group having a substituent is more preferable. The phenyl group which may have a substituent represented by the following formula (5) is more preferable. [Chemical 7] Here, in formula (5), R 2 represents a hydrogen atom or a monovalent organic group, and when it is a monovalent organic group, its carbon number is 1 or more.

R1 中之取代基,例如1價有機基。此1價有機基及R2 中之1價有機基更具體而言,可列舉也可以有取代基之碳數1~40之1價飽和或不飽和之直鏈狀或分支狀烴基、也可以有取代基之碳數1~40之1價飽和或不飽和之脂環族烴基、及也可以有取代基之碳數1~40之1價芳香族烴基。該等烴基之中也可具有選自由氧原子、氮原子及硫原子構成之群組中之1種原子。作為也可以有取代基之碳數1~40之1價飽和或不飽和之直鏈狀或分支狀烴基,例如:甲基、乙基、丙基、異丙基、丁基、異丁基、第二丁基、第三丁基、戊基、及癸基為代表之碳數1~40之烷基、甲氧基、乙氧基、及3-甲基甲氧基為代表之碳數1~40之烷氧基、及乙烯基。也可以有取代基之碳數1~40之1價飽和或不飽和之脂環族烴基,例如:環丙基、2,2-二甲基環丙基、環戊基、環己基、環辛基、環癸基、薄荷腦基、及環十二基。也可以有取代基之碳數1~40之1價芳香族烴基,例如:4-(第三丁基)苯基、2-甲基苯基、4-甲基苯基、及4-甲氧基苯基為代表之也可以有取代基之苯基、及苯氧基為代表之也可以有取代基之苯氧基。又,上述各烴基中之碳數,考量更有效且確實地發揮利用本發明獲致之作用效果之觀點,宜為3~20。又,R2 為1價有機基時,宜為碳數1~9。如此的1價有機基,可列舉上述例示之基中之碳數為1~9者。The substituent in R 1 is, for example, a monovalent organic group. More specifically, this monovalent organic group and the monovalent organic group of R 2 include a monovalent saturated or unsaturated linear or branched hydrocarbon group having 1 to 40 carbon atoms which may have a substituent. The monovalent saturated or unsaturated alicyclic hydrocarbon group having 1 to 40 carbon atoms having a substituent, and the monovalent aromatic hydrocarbon group having 1 to 40 carbon atoms having a substituent may be used. The hydrocarbon group may have one atom selected from the group consisting of an oxygen atom, a nitrogen atom, and a sulfur atom. As a monovalent saturated or unsaturated straight-chain or branched hydrocarbon group having 1 to 40 carbon atoms which may have a substituent, for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, 1 to 40 carbon atoms represented by second butyl, third butyl, pentyl, and decyl, alkyl, methoxy, ethoxy, and 3-methylmethoxy represented by carbon 1 ~ 40 of alkoxy and vinyl. It may also have a monovalent saturated or unsaturated alicyclic hydrocarbon group having 1 to 40 carbon atoms, such as cyclopropyl, 2,2-dimethylcyclopropyl, cyclopentyl, cyclohexyl, and cyclooctyl. Base, cyclodecyl, menthol, and cyclododecyl. It may also have a monovalent aromatic hydrocarbon group having 1 to 40 carbon atoms, such as 4- (third butyl) phenyl, 2-methylphenyl, 4-methylphenyl, and 4-methoxy. The phenyl group is typified by a phenyl group which may be substituted, and the phenoxy group is typified by a phenoxy group which may be substituted. In addition, the number of carbons in each of the above-mentioned hydrocarbon groups is preferably 3 to 20 in view of the viewpoint of more effectively and surely exerting the effect obtained by utilizing the present invention. When R 2 is a monovalent organic group, the number of carbon atoms is preferably 1 to 9. Examples of such a monovalent organic group include those having 1 to 9 carbon atoms in the groups exemplified above.

芳香族化合物(A)更具體而言可列舉下式(6)表示之化合物。考量更有效且確實地發揮利用本發明獲致之作用效果之觀點,此化合物較佳。芳香族化合物(A)可單獨使用1種或組合使用2種以上。Specific examples of the aromatic compound (A) include compounds represented by the following formula (6). This compound is preferable from the viewpoint of more effectively and surely exerting the effect obtained by utilizing the present invention. The aromatic compound (A) may be used singly or in combination of two or more kinds.

【化8】在此,式(6)中,2個R3 各自獨立地表示羥基或上式(2)、(3)及(4)表示之任一取代基,且至少其中一者表示上式(2)、(3)及(4)表示之任一取代基,R4 表示單鍵、伸烷基、伸苯基、伸聯苯基、或伸萘基,R5 各自獨立地表示氫原子、烷基、苯基、聯苯基、或萘基。R5 中之烷基,例如:甲基、乙基、丙基、異丙基、丁基、異丁基、第二丁基、第三丁基、戊基、及癸基。又,R4 ,例如:將雙酚A、雙酚AP、雙酚AF、雙酚B、雙酚BP、雙酚C、雙酚C、雙酚E、雙酚F、雙酚G、雙酚M、雙酚S、雙酚P、雙酚PH、雙酚TMC、及雙酚Z中之2個芳香環予以鍵結之2價基。該等之中,R4 宜為將雙酚A中之2個芳香環予以鍵結之2價基,亦即,異亞丙基(>C(CH3 )2 )。[Chemical 8] Here, in the formula (6), two R 3 each independently represent a hydroxyl group or any of the substituents represented by the above formulae (2), (3), and (4), and at least one of them represents the above formula (2) , (3) and (4), each of R 4 represents a single bond, an alkylene group, a phenylene group, a biphenylene group, or a naphthyl group, and R 5 each independently represents a hydrogen atom or an alkyl group. , Phenyl, biphenyl, or naphthyl. Examples of the alkyl group in R 5 include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, second butyl, third butyl, pentyl, and decyl. R 4 is , for example, bisphenol A, bisphenol AP, bisphenol AF, bisphenol B, bisphenol BP, bisphenol C, bisphenol C, bisphenol E, bisphenol F, bisphenol G, or bisphenol. Divalent groups in which two aromatic rings in M, bisphenol S, bisphenol P, bisphenol PH, bisphenol TMC, and bisphenol Z are bonded. Among these, R 4 is preferably a divalent group in which two aromatic rings in bisphenol A are bonded, that is, isopropylidene (> C (CH 3 ) 2 ).

本實施形態之芳香族化合物(A)中,取代烯丙基所鍵結之芳香環之碳原子與取代羥基所鍵結之芳香環之碳原子宜彼此相鄰。藉此,能夠更適度地抑制芳香族化合物(A)中之取代烯丙基與馬來醯亞胺化合物(B)中之馬來醯亞胺基間之反應進行。其結果,本實施形態之樹脂組成物之印刷電路板之成形性及預浸體之保存安定性更優良。In the aromatic compound (A) of this embodiment, the carbon atom of the aromatic ring bonded by the substituted allyl group and the carbon atom of the aromatic ring bonded by the substituted hydroxyl group are preferably adjacent to each other. Thereby, the reaction between the substituted allyl group in the aromatic compound (A) and the maleimide group in the maleimide compound (B) can be more moderately suppressed. As a result, the moldability of the printed circuit board of the resin composition of this embodiment and the storage stability of the prepreg are more excellent.

芳香族化合物(A)可依常法製造,也可取得市售品。芳香族化合物(A)之製造方法,例如:後述本實施形態之樹脂組成物之製造方法中之獲得芳香族化合物(A)之步驟、及實施例記載之製造方法。The aromatic compound (A) can be produced by a conventional method, or a commercially available product can be obtained. The method for producing the aromatic compound (A) includes, for example, the steps for obtaining the aromatic compound (A) in the method for producing the resin composition of the present embodiment described later, and the method for producing as described in the examples.

本實施形態之樹脂組成物中,芳香族化合物(A)之含量相對於樹脂固體成分100質量份為5質量份以上50質量份以下較佳,8質量份以上30質量份以下更理想。芳香族化合物(A)之含量藉由為上述範圍內,印刷電路板之成形性及預浸體之保存安定性變得更優異。又,本實施形態中,「樹脂固體成分」,若無特別指明,係指樹脂組成物中之溶劑及填充材以外的成分,「樹脂固體成分100質量份」,係指樹脂組成物中之溶劑及填充材以外的成分之合計為100質量份。In the resin composition of this embodiment, the content of the aromatic compound (A) is preferably 5 parts by mass or more and 50 parts by mass or less, and more preferably 8 parts by mass or more and 30 parts by mass or less based on 100 parts by mass of the resin solid content. When the content of the aromatic compound (A) is within the above range, the moldability of the printed circuit board and the storage stability of the prepreg become more excellent. In addition, in this embodiment, "resin solid content" means a component other than a solvent and a filler in a resin composition unless otherwise specified, and "100 parts by mass of a resin solid content" means a solvent in the resin composition. The total of components other than the filler is 100 parts by mass.

(馬來醯亞胺化合物(B)) 本實施形態之馬來醯亞胺化合物(B),只要是在分子中有1個以上之馬來醯亞胺基之化合物即無特殊限制。其具體例可列舉N-苯基馬來醯亞胺、N-羥基苯基馬來醯亞胺、雙(4-馬來醯亞胺苯基)甲烷、2,2-雙{4-(4-馬來醯亞胺苯氧基)-苯基}丙烷、雙(3,5-二甲基-4-馬來醯亞胺苯基)甲烷、雙(3-乙基-5-甲基-4-馬來醯亞胺苯基)甲烷、雙(3,5-二乙基-4-馬來醯亞胺苯基)甲烷、下式(7)表示之馬來醯亞胺化合物、此等馬來醯亞胺化合物之預聚物、或馬來醯亞胺化合物與胺化合物之預聚物。可使用它們中的1種或將2種以上適當混合使用。(Maleimide compound (B)) The maleimide compound (B) of this embodiment is not particularly limited as long as it is a compound having one or more maleimide groups in the molecule. Specific examples thereof include N-phenylmaleimide, N-hydroxyphenylmaleimide, bis (4-maleimidephenyl) methane, 2,2-bisamidine 4- (4 -Maleimide phenoxy) -phenylammonium propane, bis (3,5-dimethyl-4-maleimide phenyl) methane, bis (3-ethyl-5-methyl- 4-maleimide phenyl) methane, bis (3,5-diethyl-4-maleimide phenyl) methane, a maleimide compound represented by the following formula (7), etc. Prepolymer of maleimide compound, or prepolymer of maleimide compound and amine compound. One of them may be used or two or more of them may be appropriately mixed and used.

其中,雙(4-馬來醯亞胺苯基)甲烷、2,2-雙{4-(4-馬來醯亞胺苯氧基)-苯基}丙烷、雙(3-乙基-5-甲基-4-馬來醯亞胺苯基)甲烷、及下式(7)表示之馬來醯亞胺化合物較理想,特別下式(7)表示之馬來醯亞胺化合物較佳。藉由含有如此的馬來醯亞胺化合物,獲得之硬化物之耐熱性及彈性模數維持率有更優良的傾向。 【化9】在此,式(7)中,R6 各自獨立地表示氫原子或甲基,其中氫原子為較佳。又,式中,n1 表示1以上之整數。n1 之上限値較佳為10,更佳為7。Among them, bis (4-maleimideiminophenyl) methane, 2,2-bisammonium 4- (4-maleimimidephenoxy) -phenylarsinepropane, and bis (3-ethyl-5 -Methyl-4-maleimide phenyl) methane and a maleimide compound represented by the following formula (7) are preferred, and a maleimide compound represented by the following formula (7) is particularly preferred. By containing such a maleimidine imine compound, the heat resistance and the elastic modulus maintenance ratio of the obtained hardened product tend to be more excellent. [Chemical 9] Here, in the formula (7), R 6 each independently represents a hydrogen atom or a methyl group, and a hydrogen atom is preferred. In the formula, n 1 represents an integer of 1 or more. The upper limit 値 of n 1 is preferably 10, and more preferably 7.

本實施形態之樹脂組成物中,馬來醯亞胺化合物(B)之含量相對於樹脂固體成分100質量份為5質量份以上70質量份以下較佳,10質量份以上50質量份以下更理想。馬來醯亞胺化合物(B)之含量藉由為上述範圍內,印刷電路板之成形性及預浸體之保存安定性更優異,而且有獲得之硬化物之熱膨脹率更下降且耐熱性更好的傾向。In the resin composition of this embodiment, the content of the maleimide compound (B) is preferably 5 parts by mass or more and 70 parts by mass or less based on 100 parts by mass of the resin solid content, and more preferably 10 parts by mass or more and 50 parts by mass or less. . When the content of the maleimide compound (B) is within the above range, the formability of the printed circuit board and the storage stability of the prepreg are more excellent, and the thermal expansion rate of the hardened product obtained is further reduced and the heat resistance is more improved. Good tendency.

又,本實施形態之樹脂組成物中含有的具烯基之化合物僅有芳香族化合物(A)時,芳香族化合物(A)中之烯基之數(α)與馬來醯亞胺化合物(B)中之馬來醯亞胺基之數(β)之比((β)/(α))宜為0.9~4.3,1.5~4.0更理想。此比((β)/(α))藉由為上述範圍內,印刷電路板之成形性及預浸體之保存安定性更良好,而且可獲得低熱膨脹、熱彈性模數、耐熱性、吸濕耐熱性、耐除膠渣性、耐藥品性、易硬化性更優良的印刷電路板。When the compound having an alkenyl group contained in the resin composition of this embodiment is only the aromatic compound (A), the number of alkenyl groups (α) in the aromatic compound (A) and the maleimide compound ( The ratio ((β) / (α)) of the maleimidine imine group (B) in B) should be 0.9 ~ 4.3, more preferably 1.5 ~ 4.0. This ratio ((β) / (α)) is in the above range, and the formability of the printed circuit board and the storage stability of the prepreg are better, and low thermal expansion, thermoelastic modulus, heat resistance, absorption Printed circuit board with better wet heat resistance, deslagging resistance, chemical resistance, and easy hardening.

(任意成分) 本實施形態之樹脂組成物,宜更含有選自由環氧樹脂、氰酸酯化合物及經烯基取代之納迪克醯亞胺(nadiimide)構成之群組中之至少1種。該等之中,考量更有效且確實地發揮利用本發明獲致之作用效果之觀點,本實施形態之樹脂組成物含有經烯基取代之納迪克醯亞胺更佳。(Optional component) The resin composition of the present embodiment preferably further contains at least one selected from the group consisting of an epoxy resin, a cyanate compound, and a nadiimide substituted with an alkenyl group. Among these, from the viewpoint of more effectively and surely exerting the effect obtained by utilizing the present invention, it is more preferable that the resin composition of the present embodiment contains an alkenyl-substituted nadicarium imine.

本實施形態之經烯基取代之納迪克醯亞胺,只要是在分子中有1個以上之經烯基取代之納迪克醯亞胺基之化合物即無特殊限制。其具體例可列舉下式(8)表示之化合物。 【化10】在此,式(8)中,R7 各自獨立地表示氫原子、碳數1~6之烷基,R8 表示碳數1~6之伸烷基、伸苯基、伸聯苯基、伸萘基、或下式(9)或(10)表示之基。 【化11】在此,式(9)中,R9 表示亞甲基、異亞丙基、CO、O、S、或SO2 表示之取代基。 【化12】在此,式(10)中,R10 表示各自獨立地選出的碳數1~4之伸烷基、或碳數5~8之環伸烷基。There is no particular limitation on the nadic acid imidate substituted with alkenyl in this embodiment, as long as it is a compound having at least one nadic acid imidate substituted with alkenyl in the molecule. Specific examples thereof include compounds represented by the following formula (8). [Chemical 10] Here, in formula (8), R 7 each independently represents a hydrogen atom and an alkyl group having 1 to 6 carbon atoms, and R 8 represents an alkylene group having 1 to 6 carbon atoms, phenylene group, phenylene group, and phenylene group. Naphthyl, or a group represented by the following formula (9) or (10). [Chemical 11] Here, in formula (9), R 9 represents a substituent represented by methylene, isopropylidene, CO, O, S, or SO 2 . [Chemical 12] Here, in the formula (10), R 10 represents an alkylene group having 1 to 4 carbon atoms or a cycloalkylene group having 5 to 8 carbon atoms which are independently selected.

又,式(8)表示之經烯基取代之納迪克醯亞胺也可使用市售品。市售品不特別限定,例如:下式(11)表示之化合物(BANI-M(丸善石油化學(股)製))、及下式(12)表示之化合物(BANI-X(丸善石油化學(股)製))。此等可以單獨使用1種也可組合使用2種以上。 【化13】【化14】 In addition, a commercially available product may be used as the aldiyl-substituted nadicarium imine represented by the formula (8). Commercial products are not particularly limited, and examples include a compound represented by the following formula (11) (BANI-M (Maruzen Petrochemical Co., Ltd.)) and a compound represented by the following formula (12) (BANI-X (Maruzen Petrochemical ( Share) system)). These may be used individually by 1 type, and may use 2 or more types together. [Chemical 13] [Chemical 14]

本實施形態之樹脂組成物中,經烯基取代之納迪克醯亞胺之含量相對於樹脂固體成分100質量份為10~60質量份較佳,20~40質量份更佳。經烯基取代之納迪克醯亞胺之含量藉由為如此的範圍內,無機填充材填充時之成形性優異。又,可獲得硬化性例如於250℃之彎曲彈性模數、焊料回流溫度下之彎曲彈性模數之類的熱彈性模數、耐除膠渣性、耐藥品性優異之印刷電路板。惟考量印刷電路板之成形性更高之觀點,樹脂組成物宜不含經烯基取代之納迪克醯亞胺較佳。In the resin composition of this embodiment, the content of the aldiyl-substituted nadicarium imine is preferably from 10 to 60 parts by mass, and more preferably from 20 to 40 parts by mass, relative to 100 parts by mass of the resin solid content. When the content of the aldiyl-substituted nadicarium imine is within such a range, the moldability when the inorganic filler is filled is excellent. Further, a printed circuit board excellent in hardening properties such as a flexural modulus at 250 ° C, a thermoelastic modulus such as a flexural modulus at a solder reflow temperature, a slag resistance, and a chemical resistance can be obtained. However, from the viewpoint of higher formability of the printed circuit board, it is preferable that the resin composition does not contain nadicarium imine substituted with an alkenyl group.

又,本實施形態之樹脂組成物中除了芳香族化合物(A)以外含有如經烯基取代之納迪克醯亞胺之具烯基之任意成分時,樹脂組成物中之各成分之烯基之數之總和(αt)與馬來醯亞胺化合物(B)中之馬來醯亞胺基之數(β)之比((β)/(αt))宜為0.9~4.3,1.5~4.0更理想。此比((β)/(αt))藉由為上述範圍內,可獲得印刷電路板之成形性及預浸體之保存安定性更良好,且低熱膨脹、熱彈性模數、耐熱性、吸濕耐熱性、耐除膠渣性、耐藥品性、易硬化性更優良的印刷電路板。In addition, when the resin composition of the present embodiment contains, in addition to the aromatic compound (A), any component having an alkenyl group such as nadicarium imine substituted with an alkenyl group, the alkenyl group of each component in the resin composition The ratio of the sum of the numbers (αt) to the number of maleimide groups (β) in the maleimide compound (B) ((β) / (αt)) should be 0.9 ~ 4.3, 1.5 ~ 4.0 more ideal. When the ratio ((β) / (αt)) is within the above range, the formability of the printed circuit board and the storage stability of the prepreg can be obtained better, and the low thermal expansion, thermoelastic modulus, heat resistance, absorption Printed circuit board with better wet heat resistance, deslagging resistance, chemical resistance, and easy hardening.

(氰酸酯化合物) 本實施形態之樹脂組成物也可更含有氰酸酯化合物。氰酸酯化合物不特別限定,例如:下式(13)表示之萘酚芳烷基型氰酸酯、下式(14)表示之酚醛清漆型氰酸酯、聯苯芳烷基型氰酸酯、雙(3,5-二甲基4-氰氧基苯基)甲烷、雙(4-氰氧基苯基)甲烷、1,3-二氰氧基苯、1,4-二氰氧基苯、1,3,5-三氰氧基苯、1,3-二氰氧基萘、1,4-二氰氧基萘、1,6-二氰氧基萘、1,8-二氰氧基萘、2,6-二氰氧基萘、2,7-二氰氧基萘、1,3,6-三氰氧基萘、4,4'-二氰氧基聯苯、雙(4-氰氧基苯基)醚、雙(4-氰氧基苯基)硫醚、雙(4-氰氧基苯基)碸、及2,2'-雙(4-氰氧基苯基)丙烷;此等氰酸酯之預聚物。該等氰酸酯化合物可單獨使用1種或組合使用2種以上。(Cyanate ester compound) The resin composition according to this embodiment may further contain a cyanate ester compound. The cyanate compound is not particularly limited, and examples thereof include a naphthol aralkyl cyanate represented by the following formula (13), a novolac cyanate represented by the following formula (14), and a biphenylaralkyl cyanate , Bis (3,5-dimethyl 4-cyanooxyphenyl) methane, bis (4-cyanooxyphenyl) methane, 1,3-dicyanooxybenzene, 1,4-dicyanooxy Benzene, 1,3,5-tricyanooxybenzene, 1,3-dicyanoxynaphthalene, 1,4-dicyanoxynaphthalene, 1,6-dicyanoxynaphthalene, 1,8-dicyanocyanine Oxynaphthalene, 2,6-dicyanoxynaphthalene, 2,7-dicyanoxynaphthalene, 1,3,6-tricyanoxynaphthalene, 4,4'-dicyanoxybiphenyl, bis ( 4-cyanooxyphenyl) ether, bis (4-cyanoxyphenyl) sulfide, bis (4-cyanoxyphenyl) fluorene, and 2,2'-bis (4-cyanoxyphenyl) ) Propane; prepolymers of these cyanates. These cyanate ester compounds can be used individually by 1 type or in combination of 2 or more types.

【化15】在此,式(13)中,R11 各自獨立地表示氫原子或甲基,其中氫原子為較佳。又,式(13)中,n2 表示1以上之整數。n2 之上限値通常為10,較佳為6。[Chemical 15] Here, in the formula (13), R 11 each independently represents a hydrogen atom or a methyl group, and among them, a hydrogen atom is preferred. In formula (13), n 2 represents an integer of 1 or more. The upper limit 値 of n 2 is usually 10, and preferably 6.

【化16】在此,式(14)中,R12 各自獨立地表示氫原子或甲基,其中,氫原子為較佳。又,式(14)中,n3 表示1以上之整數。n3 之上限値通常為10,較佳為7。[Chemical 16] Here, in Formula (14), R 12 each independently represents a hydrogen atom or a methyl group, and among them, a hydrogen atom is preferred. In formula (14), n 3 represents an integer of 1 or more. The upper limit 値 of n 3 is usually 10, preferably 7.

該等之中,氰酸酯化合物宜包括選自由式(13)表示之萘酚芳烷基型氰酸酯、式(14)表示之酚醛清漆型氰酸酯、及聯苯芳烷基型氰酸酯構成之群組中之1種以上較佳,包括選自由式(13)表示之萘酚芳烷基型氰酸酯及式(14)表示之酚醛清漆型氰酸酯構成之群組中之1種以上更佳。藉由使用如此的氰酸酯化合物,有能獲得阻燃性更優良、硬化性更高、且熱膨脹係數更低之硬化物之傾向。Among these, the cyanate compound preferably includes a naphthol aralkyl type cyanate represented by the formula (13), a novolac type cyanate represented by the formula (14), and a biphenylaralkyl type cyanate One or more members of the group consisting of acid esters are preferred, and are selected from the group consisting of naphthol aralkyl cyanates represented by formula (13) and novolac cyanates represented by formula (14) More than one of them is preferable. By using such a cyanate ester compound, there is a tendency that a hardened product having better flame retardancy, higher hardenability, and a lower thermal expansion coefficient can be obtained.

該等氰酸酯化合物之製造方法不特別限定,可以使用公知之方法作為氰酸酯化合物之合成方法。公知之方法不特別限定,例如:使酚醛樹脂(phenolic resin)與鹵化氰在鈍性有機溶劑中於鹼性化合物存在下反應之方法、使酚醛樹脂與鹼性化合物之鹽形成於含水之溶液中,之後使獲得之鹽與鹵化氰在2相系界面反應之方法。The manufacturing method of these cyanate ester compounds is not specifically limited, A well-known method can be used as a synthesis method of a cyanate ester compound. The known method is not particularly limited, for example, a method in which a phenolic resin and a cyanogen halide are reacted in a passive organic solvent in the presence of a basic compound, and a salt of the phenolic resin and the basic compound is formed in an aqueous solution. Then, the method of reacting the obtained salt with cyanogen halide at the interface of the 2-phase system.

成為該等氰酸酯化合物之原料之酚醛樹脂不特別限定,例如:下式(15)表示之萘酚芳烷基型酚醛樹脂、酚醛清漆型酚醛樹脂、聯苯芳烷基型酚醛樹脂。 【化17】在此,式(15)中,R11 各自獨立地表示氫原子或甲基,其中,氫原子為較佳。又,式(15)中,n4 表示1以上之整數。n4 之上限値通常為10,較佳為6。The phenol resin used as a raw material of these cyanate compounds is not particularly limited, and examples thereof include a naphthol aralkyl phenol resin, a novolac phenol resin, and a biphenylaralkyl phenol resin represented by the following formula (15). [Chem. 17] Here, in Formula (15), R 11 each independently represents a hydrogen atom or a methyl group, and among them, a hydrogen atom is preferred. In formula (15), n 4 represents an integer of 1 or more. The upper limit 値 of n 4 is usually 10, preferably 6.

式(15)表示之萘酚芳烷基型酚醛樹脂,可使萘酚芳烷基樹脂與氰酸縮合而得。萘酚芳烷基型酚醛樹脂不特別限定,例如:利用α-萘酚及β-萘酚等萘酚類、與對亞二甲苯二醇、α,α'-二甲氧基-對二甲苯、及1,4-二(2-羥基-2-丙基)苯等苯類之反應獲得者。萘酚芳烷基型氰酸酯,可以從如上述獲得之萘酚芳烷基樹脂與氰酸縮合而獲得者當中選擇。The naphthol aralkyl type phenol resin represented by the formula (15) can be obtained by condensing a naphthol aralkyl resin and cyanic acid. The naphthol aralkyl-type phenol resin is not particularly limited. For example, naphthols such as α-naphthol and β-naphthol, and p-xylylene glycol and α, α'-dimethoxy-p-xylene are used. , And 1,4-bis (2-hydroxy-2-propyl) benzene and other benzenes. The naphthol aralkyl cyanate can be selected from those obtained by condensing a naphthol aralkyl resin obtained as described above and cyanic acid.

氰酸酯化合物之含量,相對於樹脂固體成分100質量份較佳為0.5~45質量份,更佳為5~20質量份。氰酸酯化合物之含量藉由為上述範圍內,有獲得之硬化物之耐熱性與耐藥品性更好的傾向。The content of the cyanate ester compound is preferably 0.5 to 45 parts by mass, more preferably 5 to 20 parts by mass based on 100 parts by mass of the resin solid content. When the content of the cyanate ester compound is within the above range, the heat resistance and chemical resistance of the obtained cured product tend to be better.

(環氧樹脂) 本實施形態之樹脂組成物也可更含有環氧樹脂。該環氧樹脂只要是在1分子中有2個以上之環氧基之樹脂即不特別限定,例如:雙酚A型環氧樹脂、雙酚E型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、苯酚酚醛清漆型環氧樹脂、雙酚A酚醛清漆型環氧樹脂、甲酚酚醛清漆型環氧樹脂、聯苯型環氧樹脂、萘型環氧樹脂、蒽型環氧樹脂、3官能苯酚型環氧樹脂、4官能苯酚型環氧樹脂、環氧丙酯型環氧樹脂、苯酚芳烷基型環氧樹脂、聯苯芳烷基型環氧樹脂、芳烷基酚醛清漆型環氧樹脂、萘酚芳烷基型環氧樹脂、二環戊二烯型環氧樹脂、多元醇型環氧樹脂、異氰尿酸酯環含有環氧樹脂、或該等之鹵化物。該等之中,聯苯芳烷基型環氧樹脂為較佳。(Epoxy resin) The resin composition of this embodiment may further contain an epoxy resin. The epoxy resin is not particularly limited as long as it is a resin having two or more epoxy groups in one molecule, for example, bisphenol A epoxy resin, bisphenol E epoxy resin, and bisphenol F epoxy resin. Bisphenol S epoxy resin, phenol novolac epoxy resin, bisphenol A novolac epoxy resin, cresol novolac epoxy resin, biphenyl epoxy resin, naphthalene epoxy resin, anthracene Epoxy resin, trifunctional phenol epoxy resin, 4-functional phenol epoxy resin, propylene oxide epoxy resin, phenol aralkyl epoxy resin, biphenylaralkyl epoxy resin, aromatic Alkyl novolac epoxy resin, naphthol aralkyl epoxy resin, dicyclopentadiene epoxy resin, polyol epoxy resin, isocyanurate ring containing epoxy resin, or the like Of the halide. Among these, a biphenylaralkyl-type epoxy resin is preferable.

環氧樹脂之含量相對於樹脂固體成分100質量份較佳為1~30質量份,更佳為5~20質量份。環氧樹脂之含量藉由為上述範圍內,有獲得之硬化物之柔軟性、銅箔剝離強度、耐藥品性、及耐除膠渣性更好的傾向。The content of the epoxy resin is preferably 1 to 30 parts by mass, and more preferably 5 to 20 parts by mass based on 100 parts by mass of the resin solid content. When the content of the epoxy resin is within the above range, the softness of the obtained cured product, copper foil peeling strength, chemical resistance, and slag resistance tend to be better.

(無機填充材(C)) 本實施形態之樹脂組成物中也可以更含有無機填充材(C)。無機填充材(C)不特別限定,例如:天然二氧化矽、熔融二氧化矽、合成二氧化矽、非晶質二氧化矽、Aerosil、中空二氧化矽等二氧化矽類;白碳等矽化合物;鈦白、氧化鋅、氧化鎂、氧化鋯等金屬氧化物;氮化硼、凝聚氮化硼、氮化矽、軟水鋁石等金屬氮化物;硫酸鋇等金屬硫酸化物;氫氧化鋁、氫氧化鋁加熱處理品(將氫氧化鋁進行加熱處理並減少了一部分結晶水者)、軟水鋁石、氫氧化鎂等金屬水合物;氧化鉬、鉬酸鋅等鉬化合物;硼酸鋅、錫酸鋅等鋅化合物;氧化鋁、黏土、高嶺土、滑石、煅燒黏土、煅燒高嶺土、煅燒滑石、雲母、E-玻璃、A-玻璃、NE-玻璃、C-玻璃、L-玻璃、D-玻璃、S-玻璃、M-玻璃G20、玻璃短纖維(包括E玻璃、T玻璃、D玻璃、S玻璃、Q玻璃等玻璃微粉末類。)、中空玻璃、及球狀玻璃。無機填充材(C)可單獨使用1種也可併用2種以上。(Inorganic Filler (C)) The resin composition of this embodiment may further contain an inorganic filler (C). The inorganic filler (C) is not particularly limited, for example: natural silicon dioxide, fused silicon dioxide, synthetic silicon dioxide, amorphous silicon dioxide, aerosil, hollow silicon dioxide, and other silicon dioxide; silicon such as white carbon Compounds; titanium oxide, zinc oxide, magnesium oxide, zirconia and other metal oxides; boron nitride, condensed boron nitride, silicon nitride, boehmite and other metal nitrides; metal sulfates such as barium sulfate; aluminum hydroxide, Aluminum hydroxide heat-treated products (heating aluminum hydroxide and reducing some crystal water), metal hydrates such as boehmite and magnesium hydroxide; molybdenum compounds such as molybdenum oxide and zinc molybdate; zinc borate and stannic acid Zinc compounds such as zinc; alumina, clay, kaolin, talc, calcined clay, calcined kaolin, calcined talc, mica, E-glass, A-glass, NE-glass, C-glass, L-glass, D-glass, S -Glass, M-glass G20, glass short fibers (including glass micropowders such as E glass, T glass, D glass, S glass, and Q glass.), Hollow glass, and spherical glass. The inorganic filler (C) may be used individually by 1 type, and may use 2 or more types together.

其中又以無機填充材(C)包括選自由二氧化矽、氧化鋁、氧化鎂、氫氧化鋁、軟水鋁石、氮化硼、凝聚氮化硼、氮化矽、及軟水鋁石構成之群組中之至少1種較佳,包括選自由二氧化矽、氧化鋁、及軟水鋁石構成之群組中之至少1種更佳。藉由使用如此的無機填充材(C),有獲得之硬化物之高剛性化及低翹曲化更好的傾向。Among them, the inorganic filler (C) includes a group selected from the group consisting of silicon dioxide, aluminum oxide, magnesium oxide, aluminum hydroxide, boehmite, boron nitride, agglomerated boron nitride, silicon nitride, and boehmite. At least one member in the group is preferred, and at least one member selected from the group consisting of silica, alumina, and boehmite is more preferred. By using such an inorganic filler (C), the hardened | cured material obtained will tend to become high rigidity and low warpage.

無機填充材(C)之含量,相對於樹脂固體成分100質量份較佳為30~500質量份,更佳為100~400質量份,又更佳為150~300質量份。無機填充材(C)之含量藉由為上述範圍內,有獲得之硬化物之高剛性化、低翹曲化更好的傾向。The content of the inorganic filler (C) is preferably 30 to 500 parts by mass, more preferably 100 to 400 parts by mass, and still more preferably 150 to 300 parts by mass with respect to 100 parts by mass of the resin solid content. When the content of the inorganic filler (C) is within the above range, the obtained hardened product tends to have higher rigidity and lower warpage.

(矽烷偶聯劑及濕潤分散劑) 本實施形態之樹脂組成物,也可更含有選自由矽烷偶聯劑及濕潤分散劑構成之群組中之1種以上。樹脂組成物藉由含有矽烷偶聯劑、濕潤分散劑,有上述無機填充材(C)之分散性、樹脂成分、無機填充材(C)、及後述基材之黏著強度更好的傾向。(Silane coupling agent and wetting and dispersing agent) The resin composition according to this embodiment may further contain one or more members selected from the group consisting of a silane coupling agent and a wetting and dispersing agent. When the resin composition contains a silane coupling agent and a wetting and dispersing agent, the dispersibility of the inorganic filler (C), the resin component, the inorganic filler (C), and the adhesive strength of the substrate described later tend to be better.

矽烷偶聯劑只要是一般在無機物之表面處理使用之矽烷偶聯劑即不特別限定,例如:γ-胺基丙基三乙氧基矽烷、N-β-(胺基乙基)-γ-胺基丙基三甲氧基矽烷等胺基矽烷系化合物;γ-環氧丙氧基丙基三甲氧基矽烷等環氧矽烷系化合物;γ-丙烯醯氧基丙基三甲氧基矽烷等丙烯酸基矽烷系化合物;N-β-(N-乙烯基苄胺基乙基)-γ-胺基丙基三甲氧基矽烷鹽酸鹽等陽離子矽烷系化合物;及苯基矽烷系化合物。矽烷偶聯劑可單獨使用1種也可併用2種以上。The silane coupling agent is not particularly limited as long as it is a silane coupling agent generally used for the surface treatment of inorganic substances, for example: γ-aminopropyltriethoxysilane, N-β- (aminoethyl) -γ- Aminosilane compounds such as aminopropyltrimethoxysilane; γ-glycidoxypropyltrimethoxysilane; silane-based epoxy compounds; γ-acrylic acid propyltrimethoxysilane; acrylic groups Silane-based compounds; cationic silane-based compounds such as N-β- (N-vinylbenzylaminoethyl) -γ-aminopropyltrimethoxysilane hydrochloride; and phenylsilane-based compounds. The silane coupling agent may be used singly or in combination of two or more kinds.

濕潤分散劑只要是在塗料用使用之分散安定劑即不特別限定,例如:BYK Chemie Japan(股)製之DISPERBYK-110、111、118、180、161、BYK-W996、W9010、W903等。The wetting and dispersing agent is not particularly limited as long as it is a dispersion stabilizer used in coatings, for example, DISPERBYK-110, 111, 118, 180, 161, BYK-W996, W9010, W903, etc., manufactured by BYK Chemie Japan.

(其他樹脂等) 本實施形態之樹脂組成物中,視需要也可更含有選自由酚醛樹脂、氧雜環丁烷樹脂、苯并㗁化合物、及具可聚合之不飽和基之化合物構成之群組中之1種或2種以上。樹脂組成物藉由含有如此的其他樹脂等,有獲得之硬化物之銅箔剝離強度、彎曲強度、及彎曲彈性模數等更好的傾向。(Other resins, etc.) The resin composition of this embodiment may further contain, if necessary, a material selected from the group consisting of phenol resin, oxetane resin, and benzofluorene. One or two or more of the group consisting of a compound and a compound having a polymerizable unsaturated group. By containing such other resins, the resin composition tends to have better copper foil peel strength, flexural strength, flexural modulus, and the like of the hardened material obtained.

(酚醛樹脂) 酚醛樹脂只要是在1分子中有2個以上之羥基之酚醛樹脂即可,可使用一般公知者,其種類無特殊限制。其具體例可列舉雙酚A型酚醛樹脂、雙酚E型酚醛樹脂、雙酚F型酚醛樹脂、雙酚S型酚醛樹脂、苯酚酚醛清漆樹脂、雙酚A酚醛清漆型酚醛樹脂、環氧丙酯型酚醛樹脂、芳烷基酚醛清漆型酚醛樹脂、聯苯芳烷基型酚醛樹脂、甲酚酚醛清漆型酚醛樹脂、多官能酚醛樹脂、萘酚樹脂、萘酚酚醛清漆樹脂、多官能萘酚樹脂、蒽型酚醛樹脂、萘骨架改性酚醛清漆型酚醛樹脂、苯酚芳烷基型酚醛樹脂、萘酚芳烷基型酚醛樹脂、二環戊二烯型酚醛樹脂、聯苯型酚醛樹脂、脂環族酚醛樹脂、多元醇型酚醛樹脂、含磷之酚醛樹脂、及羥基含有聚矽氧樹脂類,無特殊限制。該等酚醛樹脂可單獨使用1種或組合使用2種以上。樹脂組成物藉由含有如此的酚醛樹脂,有獲得之硬化物之黏著性、可撓性等更優良的傾向。(Phenolic resin) The phenolic resin may be a phenolic resin having two or more hydroxyl groups in one molecule, and generally known ones can be used, and its type is not particularly limited. Specific examples thereof include bisphenol A-type phenol resin, bisphenol E-type phenol resin, bisphenol F-type phenol resin, bisphenol S-type phenol resin, phenol novolac resin, bisphenol A novolac phenol resin, and propylene oxide Ester-type phenolic resin, aralkyl novolac-type phenolic resin, biphenylaralkyl-type phenolic resin, cresol novolac-type phenolic resin, polyfunctional phenolic resin, naphthol resin, naphthol novolac resin, polyfunctional naphthol Resin, anthracene phenolic resin, naphthalene skeleton modified novolac phenolic resin, phenol aralkyl phenolic resin, naphthol aralkyl phenolic resin, dicyclopentadiene phenolic resin, biphenyl phenolic resin, grease There are no special restrictions on cyclic phenol resins, polyhydric alcohol phenol resins, phosphorus-containing phenol resins, and hydroxyl-containing polysiloxane resins. These phenol resins can be used individually by 1 type or in combination of 2 or more types. By containing such a phenol resin, the resin composition tends to be more excellent in adhesiveness and flexibility of the obtained hardened material.

酚醛樹脂之含量相對於樹脂固體成分100質量份較佳為0~99質量份,更佳為1~90質量份,又更佳為3~80質量份。酚醛樹脂之含量藉由為上述範圍內,有獲得之硬化物之黏著性、可撓性等更優良的傾向。The content of the phenolic resin is preferably 0 to 99 parts by mass, more preferably 1 to 90 parts by mass, and still more preferably 3 to 80 parts by mass with respect to 100 parts by mass of the resin solid content. When the content of the phenol resin is within the above range, the adhesiveness and flexibility of the obtained hardened product tend to be more excellent.

(氧雜環丁烷樹脂) 氧雜環丁烷樹脂可使用一般公知者,其種類無特殊限制。其具體例可列舉氧雜環丁烷、2-甲基氧雜環丁烷、2,2-二甲基氧雜環丁烷、3-甲基氧雜環丁烷、3,3-二甲基氧雜環丁烷等烷基氧雜環丁烷、3-甲基-3-甲氧基甲基氧雜環丁烷、3,3'-二(三氟甲基)全氟氧雜環丁烷、2-氯甲基氧雜環丁烷、3,3-雙(氯甲基)氧雜環丁烷、聯苯型氧雜環丁烷、OXT-101(東亞合成製商品名)、及OXT-121(東亞合成製商品名)。該等氧雜環丁烷樹脂可使用1種或組合使用2種以上。樹脂組成物藉由含有如此的氧雜環丁烷樹脂,有獲得之硬化物之黏著性、可撓性等更優良的傾向。(Oxetane resin) As the oxetane resin, generally known ones can be used, and the kind thereof is not particularly limited. Specific examples include oxetane, 2-methyloxetane, 2,2-dimethyloxetane, 3-methyloxetane, 3,3-dimethyl Alkyloxetane such as oxetane, 3-methyl-3-methoxymethyloxetane, 3,3'-bis (trifluoromethyl) perfluorooxane Butane, 2-chloromethyloxetane, 3,3-bis (chloromethyl) oxetane, biphenyl type oxetane, OXT-101 (trade name of Toa Synthetic), And OXT-121 (trade name of East Asia Synthesis). These oxetane resins can be used singly or in combination of two or more kinds. The resin composition containing such an oxetane resin tends to be more excellent in adhesiveness, flexibility, and the like of the hardened material obtained.

氧雜環丁烷樹脂之含量相對於樹脂固體成分100質量份較佳為0~99質量份,更佳為1~90質量份,又更佳為3~80質量份。氧雜環丁烷樹脂之含量藉由為上述範圍內,有獲得之硬化物之密合性、可撓性等更優良的傾向。The content of the oxetane resin is preferably 0 to 99 parts by mass, more preferably 1 to 90 parts by mass, and still more preferably 3 to 80 parts by mass, relative to 100 parts by mass of the resin solid content. When the content of the oxetane resin is within the above range, the adhesiveness and flexibility of the obtained cured product tend to be more excellent.

(苯并㗁化合物) 苯并㗁化合物只要是在1分子中有2個以上之二氫苯并㗁環之化合物即可,可使用一般公知者,其種類無特殊限制。其具體例可列舉雙酚A型苯并㗁BA-BXZ(小西化學製商品名)雙酚F型苯并㗁BF-BXZ(小西化學製商品名)、及雙酚S型苯并㗁BS-BXZ(小西化學製商品名)。該等苯并㗁化合物可使用1種或混用2種以上。樹脂組成物藉由含有如此的苯并㗁化合物,有獲得之硬化物之阻燃性、耐熱性、低吸水性、低介電特性等更優良的傾向。(Benzopyrene Compound) Benzopyrene As long as the compound is two or more dihydrobenzofluorenes in one molecule A ring compound is sufficient, and generally known ones can be used, and there is no particular limitation on the kind. Specific examples thereof include bisphenol A benzofluorene BA-BXZ (trade name, manufactured by Konishi Chemical) bisphenol F benzopyrene BF-BXZ (trade name of Konishi Chemical Co., Ltd.) and bisphenol S benzopyrene BS-BXZ (trade name of Konishi Chemical Co., Ltd.). Benzopyrene The compounds may be used singly or in combination of two or more. The resin composition contains such a benzofluorene The compound tends to be more excellent in flame retardancy, heat resistance, low water absorption, and low dielectric properties of the obtained cured product.

苯并㗁化合物之含量相對於樹脂固體成分100質量份較佳為0~99質量份,更佳為1~90質量份,又更佳為3~80質量份。苯并㗁化合物之含量藉由為上述範圍內,有獲得之硬化物之耐熱性等更優良的傾向。Benzopyrene The content of the compound is preferably 0 to 99 parts by mass, more preferably 1 to 90 parts by mass, and still more preferably 3 to 80 parts by mass with respect to 100 parts by mass of the resin solid content. Benzopyrene When the content of the compound is within the above range, the heat resistance of the obtained hardened product tends to be more excellent.

(具可聚合之不飽和基之化合物) 具可聚合之不飽和基之化合物可使用一般公知者,其種類無特殊限制。其具體例可列舉乙烯、丙烯、苯乙烯、二乙烯基苯、二乙烯基聯苯等乙烯基化合物;(甲基)丙烯酸甲酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、聚丙二醇二(甲基)丙烯酸酯、三羥甲基丙烷二(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、新戊四醇四(甲基)丙烯酸酯、二新戊四醇六(甲基)丙烯酸酯等一元或多元醇之(甲基)丙烯酸酯類;雙酚A型環氧(甲基)丙烯酸酯、雙酚F型環氧(甲基)丙烯酸酯等環氧(甲基)丙烯酸酯類;及苯并環丁烯樹脂。該等具不飽和基之化合物可使用1種或混用2種以上。樹脂組成物藉由含有如此的具可聚合之不飽和基之化合物,有獲得之硬化物之耐熱性、靱性等更優良的傾向。(Compounds Having Polymerizable Unsaturated Groups) Compounds having polymerizable unsaturated groups can be generally known, and their types are not particularly limited. Specific examples thereof include vinyl compounds such as ethylene, propylene, styrene, divinylbenzene, and divinylbiphenyl; methyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, and (meth) 2-hydroxypropyl acrylate, polypropylene glycol di (meth) acrylate, trimethylolpropane di (meth) acrylate, trimethylolpropane tri (meth) acrylate, neopentaerythritol tetra (methyl) (Meth) acrylates, dipentaerythritol hexa (meth) acrylates and other mono- or polyhydric alcohols (meth) acrylates; bisphenol A epoxy (meth) acrylates, bisphenol F epoxy Epoxy (meth) acrylates such as (meth) acrylates; and benzocyclobutene resins. These unsaturated compounds can be used singly or in combination of two or more kinds. A resin composition containing such a polymerizable unsaturated group-containing compound tends to have better heat resistance, heat resistance, and the like of the obtained hardened material.

具可聚合之不飽和基之化合物之含量相對於樹脂固體成分100質量份較佳為0~99質量份,更佳為1~90質量份,又更佳為3~80質量份。具可聚合之不飽和基之化合物之含量藉由為上述範圍內,有獲得之硬化物之耐熱性、靱性等更優良的傾向。The content of the polymerizable unsaturated group-containing compound is preferably 0 to 99 parts by mass, more preferably 1 to 90 parts by mass, and still more preferably 3 to 80 parts by mass, relative to 100 parts by mass of the solid content of the resin. When the content of the compound having a polymerizable unsaturated group is within the above range, the heat resistance and heat resistance of the obtained hardened product tend to be more excellent.

(硬化促進劑) 本實施形態之樹脂組成物也可更含有硬化促進劑。硬化促進劑不特別限定,例如:三苯基咪唑等咪唑類;過氧化苯甲醯、過氧化月桂醯、過氧化乙醯、對氯過氧化苯甲醯、二過氧化鄰苯二甲酸二第三丁酯等有機過氧化物;偶氮雙腈等偶氮化合物;N,N-二甲基苄胺、N,N-二甲基苯胺、N,N-二甲基甲苯胺、N,N-二甲基吡啶、2-N-乙基苯胺基乙醇、三正丁胺、吡啶、喹啉、N-甲基啉、三乙醇胺、三乙二胺、四甲基丁烷二胺、N-甲基哌啶等三級胺類;苯酚、二甲酚、甲酚、間苯二酚、兒茶酚等苯酚類;環烷酸鉛、硬脂酸鉛、環烷酸鋅、辛酸鋅、油酸錫、蘋果酸二丁基錫、環烷酸錳、環烷酸鈷、乙醯基丙酮鐵等有機金屬鹽;此等有機金屬鹽溶於苯酚、雙酚等含羥基之化合物而成者;氯化錫、氯化鋅、氯化鋁等無機金屬鹽;二辛基氧化錫、其他之烷基錫、及烷基氧化錫等有機錫化合物。該等之中,三苯基咪唑會促進硬化反應,有玻璃轉移溫度、熱膨脹率優良的傾向,故特別理想。(Hardening Accelerator) The resin composition of this embodiment may further contain a hardening accelerator. The hardening accelerator is not particularly limited, for example: imidazoles such as triphenylimidazole; benzamidine peroxide, laurel oxide, acetamidine peroxide, benzamidine peroxychloride, and diperoxyphthalate Organic peroxides such as tributyl ester; azo compounds such as azobisnitrile; N, N-dimethylbenzylamine, N, N-dimethylaniline, N, N-dimethyltoluidine, N, N -Dimethylpyridine, 2-N-ethylaniline ethanol, tri-n-butylamine, pyridine, quinoline, N-methyl Tertiary amines such as phosphine, triethanolamine, triethylenediamine, tetramethylbutanediamine, N-methylpiperidine; phenols such as phenol, xylenol, cresol, resorcinol, and catechol ; Organometallic salts such as lead naphthenate, lead stearate, zinc naphthenate, zinc octoate, tin oleate, dibutyltin malate, manganese naphthenate, cobalt naphthenate, iron ethylacetonate; etc. Organic metal salts prepared by dissolving hydroxyl-containing compounds such as phenol and bisphenol; inorganic metal salts such as tin chloride, zinc chloride, and aluminum chloride; dioctyl tin oxide, other alkyl tin, and alkyl oxides Organotin compounds such as tin. Among these, triphenylimidazole is particularly preferable because it promotes a hardening reaction and tends to have excellent glass transition temperature and thermal expansion coefficient.

(溶劑) 本實施形態之樹脂組成物也可以更含有溶劑。樹脂組成物藉由含有溶劑,有樹脂組成物之製備時之黏度下降,操作性更好,且對於後述基材之含浸性更好的傾向。(Solvent) The resin composition of the present embodiment may further contain a solvent. When the resin composition contains a solvent, the viscosity of the resin composition during preparation is lowered, the handleability is better, and the impregnation property to the substrate described later tends to be better.

溶劑只要是可將樹脂組成物中之樹脂成分之一部分或全部予以溶解即不特別限定,例如:丙酮、甲乙酮、甲基賽珞蘇等酮類;甲苯、二甲苯等芳香族烴類;二甲基甲醯胺等醯胺類;及丙二醇單甲醚及其乙酸酯。溶劑可單獨使用1種也可併用2種以上。The solvent is not particularly limited as long as it can dissolve a part or all of the resin components in the resin composition, for example, ketones such as acetone, methyl ethyl ketone, and methylcythreon; aromatic hydrocarbons such as toluene and xylene; Methylamines such as methylamine; and propylene glycol monomethyl ether and its acetate. The solvents may be used singly or in combination of two or more kinds.

(樹脂組成物之製造方法) 本實施形態之樹脂組成物之製造方法不特別限定,例如具有下列步驟:使取代烯丙基與苯酚性羥基直接鍵結在芳香環而成之芳香族化合物(A1)、與會和苯酚性羥基反應之化合物反應而獲得取代烯丙基與取代羥基直接鍵結在芳香環而成之芳香族化合物(A);及將芳香族化合物(A)與馬來醯亞胺化合物(B)予以摻合之步驟。(Manufacturing method of resin composition) The manufacturing method of the resin composition of this embodiment is not particularly limited. For example, the method includes the following steps: an aromatic compound (A1) in which a substituted allyl group and a phenolic hydroxyl group are directly bonded to an aromatic ring; ), An aromatic compound (A) obtained by reacting a compound that reacts with a phenolic hydroxyl group to obtain a substituted allyl group and a substituted hydroxyl group directly bonded to an aromatic ring; and an aromatic compound (A) and maleimide A step of compound (B) blending.

芳香族化合物(A1),係取代烯丙基與苯酚性羥基直接鍵結在芳香環而成者。如此的芳香族化合物(A1)不特別限定,例如下式(16)表示之化合物。 【化18】在此,式(16)中,R4 及R5 和上式(6)中者為同義。The aromatic compound (A1) is a substituted allyl group and a phenolic hydroxyl group directly bonded to an aromatic ring. Such an aromatic compound (A1) is not particularly limited, and for example, a compound represented by the following formula (16). [Chemical 18] Here, in formula (16), R 4 and R 5 are synonymous with those in formula (6).

又,作為會和苯酚性羥基反應之化合物,例如:單官能環氧化合物。作為單官能環氧化合物,例如:下式(17)、(18)及(19)表示之任一化合物,考量更有效且確實地發揮利用本發明獲致之作用效果之觀點,宜為此等化合物較佳。 【化19】在此,式(17)、(18)及(19)中,R1 和上式(2)、(3)及(4)中者為同義。針對R1 ,考量更有效且確實地發揮利用本發明獲致之作用效果之觀點,宜為也可以有取代基之芳基較理想,也可以有取代基之苯基、聯苯基或萘基更佳,上式(5)表示之也可以有取代基之苯基較佳。Moreover, as a compound which reacts with a phenolic hydroxyl group, a monofunctional epoxy compound is mentioned, for example. As the monofunctional epoxy compound, for example, any of the compounds represented by the following formulae (17), (18), and (19), considering the viewpoint of more effectively and reliably exerting the effects obtained by utilizing the present invention, such compounds are preferred. Better. [Chemical 19] Here, in the formulae (17), (18), and (19), R 1 is synonymous with the formulae (2), (3), and (4). Regarding R 1 , considering the viewpoint of more effectively and surely exerting the effect obtained by utilizing the present invention, an aryl group which may have a substituent is more preferable, and a phenyl group, a biphenyl group, or a naphthyl group which has a substituent is more preferable. Preferably, a phenyl group which may also have a substituent represented by the above formula (5) is preferred.

本實施形態之芳香族化合物(A1)中,取代烯丙基所鍵結之芳香環中之碳原子、與苯酚性羥基所鍵結之芳香環中的碳原子宜互相相鄰較理想。藉此,芳香族化合物(A)中之取代烯丙基與馬來醯亞胺化合物(B)中之馬來醯亞胺基之反應之進行可更適度地抑制。其結果,本實施形態之樹脂組成物的印刷電路板之成形性及預浸體之保存安定性更優良。In the aromatic compound (A1) of this embodiment, it is preferable that carbon atoms in an aromatic ring bonded by an allyl group and carbon atoms in an aromatic ring bonded by a phenolic hydroxyl group are adjacent to each other. Thereby, the progress of the reaction between the substituted allyl group in the aromatic compound (A) and the maleimide group in the maleimide compound (B) can be more appropriately suppressed. As a result, the moldability of the printed circuit board of the resin composition of this embodiment and the storage stability of the prepreg are more excellent.

獲得芳香族化合物(A)之步驟中,視需要亦可適當添加硬化促進劑。硬化促進劑可列舉上述者。硬化促進劑之添加量只要是可獲得芳香族化合物(A)之量即不特別限定,相對於獲得之芳香族化合物(A)100質量份為0.01質量份以上5質量份以下較理想,為0.01質量份以上1質量份以下更理想。In the step of obtaining the aromatic compound (A), a hardening accelerator may be appropriately added if necessary. Examples of the hardening accelerator include the above. The addition amount of the hardening accelerator is not particularly limited as long as the amount of the aromatic compound (A) can be obtained, and it is preferably 0.01 to 5 parts by mass based on 100 parts by mass of the aromatic compound (A) to be obtained, and is 0.01. More preferably, it is more than 1 mass part.

獲得芳香族化合物(A)之步驟中,反應溫度只要是可獲得芳香族化合物(A)之溫度即不特別限定,宜為50℃以上160℃以下,100℃以上140℃以下更理想。In the step of obtaining the aromatic compound (A), the reaction temperature is not particularly limited as long as the temperature at which the aromatic compound (A) can be obtained, and it is preferably 50 ° C or higher and 160 ° C or lower, and more preferably 100 ° C or higher and 140 ° C or lower.

然後,將芳香族化合物(A)與馬來醯亞胺化合物(B)進行摻合。在此步驟中,可不只將芳香族化合物(A)及馬來醯亞胺化合物(B),也將其他在樹脂組成物含有之各成分按順序摻合到溶劑並充分攪拌,以獲得樹脂組成物。此時,為了使各成分均勻地溶解或分散,可進行攪拌、混合、混練處理等公知之處理。具體而言,可藉由使用附設具適當攪拌能力之攪拌機的攪拌槽來進行攪拌分散處理,以使無機填充材(C)對於樹脂組成物之分散性更好。上述攪拌、混合、混練處理,可使用例如球磨機、珠磨機等以混合為目的之裝置、或公轉或自轉型之混合裝置等公知裝置來適當進行。Then, the aromatic compound (A) and the maleimide compound (B) are blended. In this step, not only the aromatic compound (A) and the maleimide compound (B), but also other components contained in the resin composition are sequentially blended into the solvent and stirred sufficiently to obtain the resin composition. Thing. In this case, in order to dissolve or disperse each component uniformly, a known treatment such as stirring, mixing, and kneading can be performed. Specifically, the dispersibility of the inorganic filler (C) with respect to the resin composition can be improved by performing the stirring and dispersing treatment by using a stirring tank equipped with a stirrer having an appropriate stirring ability. The above-mentioned stirring, mixing, and kneading treatment can be appropriately performed using, for example, a device for mixing, such as a ball mill and a bead mill, or a known device such as a revolving or self-converting mixing device.

又,本實施形態之樹脂組成物製備時,視需要可以使用有機溶劑、及/或硬化促進劑。有機溶劑之種類只要可以溶解樹脂組成物中之樹脂即無特殊限制。其具體例如上所述。又,硬化促進劑之種類只要是可促進樹脂組成物之硬化者即無特殊限制。其具體例如上所述。Moreover, when preparing the resin composition of this embodiment, an organic solvent and / or a hardening accelerator can be used as needed. The type of the organic solvent is not particularly limited as long as it can dissolve the resin in the resin composition. Specific examples are as described above. The type of the hardening accelerator is not particularly limited as long as it can harden the resin composition. Specific examples are as described above.

(用途) (預浸體) 本實施形態之預浸體,具備:基材;及含浸或塗佈於該基材之上述樹脂組成物。預浸體之製造方法可依照常法進行,無特殊限制。例如:可使本實施形態中之樹脂成分含浸或塗佈於基材後,在100~200℃之乾燥機中進行1~30分鐘加熱等並使其半硬化(B階段化),以製作本實施形態之預浸體。(Use) (Prepreg) The prepreg according to this embodiment includes: a substrate; and the resin composition impregnated or coated on the substrate. The manufacturing method of the prepreg can be carried out according to a conventional method, and there is no particular limitation. For example, the resin component in this embodiment can be impregnated or coated on a substrate, and then heated in a dryer at 100 to 200 ° C for 1 to 30 minutes, etc., and then semi-hardened (B-staged) to produce this product. The prepreg of the embodiment.

樹脂組成物(包括無機填充材)之含量不特別限定,相對於預浸體之總質量較佳為30~90質量%,更佳為35~85質量%,又更佳為40~80質量%。樹脂組成物之含量藉由為上述範圍內,有成形性更好的傾向。考量同樣之觀點,基材之含量相對於預浸體之總質量較佳為10~70質量%,更佳為15~65質量%,又更佳為20~60質量%。The content of the resin composition (including the inorganic filler) is not particularly limited, and is preferably 30 to 90% by mass, more preferably 35 to 85% by mass, and still more preferably 40 to 80% by mass relative to the total mass of the prepreg. . When the content of the resin composition is within the above range, the moldability tends to be better. Considering the same viewpoint, the content of the substrate is preferably 10 to 70% by mass, more preferably 15 to 65% by mass, and still more preferably 20 to 60% by mass relative to the total mass of the prepreg.

基材不特別限定,可視目的之用途、性能適當選擇使用各種印刷電路板材料使用的公知品。其具體例不特別限定,例如:E玻璃、D玻璃、S玻璃、Q玻璃、球狀玻璃、NE玻璃、L玻璃、T玻璃等玻璃纖維;石英等玻璃以外之無機纖維;聚對伸苯基對苯二甲醯胺(KEVLAR(註冊商標)、杜邦(股)公司製)、共聚對亞苯基- 3, 4'- 氧代二亞苯基對苯二甲醯胺(TECHNORA(註冊商標)、Teijin Technoproducts(股)公司製)等全芳香族聚醯胺;2,6-羥基萘甲酸・對羥基苯甲酸(VECTRAN(註冊商標)、可樂麗(股)公司製)、Zxion(註冊商標、KB Seiren製)等聚酯;聚對伸苯基苯并雙㗁唑(Zylon(註冊商標)、東洋紡(股)公司製)、聚醯亞胺等有機纖維。該等之中,考量低熱膨脹率之觀點,E玻璃、T玻璃、S玻璃、Q玻璃及有機纖維為較佳。此等基材可單獨使用1種也可併用2種以上。The substrate is not particularly limited, and known products used in various printed circuit board materials may be appropriately selected depending on the intended use and performance. Specific examples thereof are not particularly limited, for example: glass fibers such as E glass, D glass, S glass, Q glass, spherical glass, NE glass, L glass, T glass; inorganic fibers other than glass such as quartz; polyparaphenylene Amides terephthalamide (KEVLAR (registered trademark), Dupont (shares) Corporation), copoly-p-phenylene - 3,4 '- (oxybis trademark phenylene terephthalamide Amides (TECHNORA,) , Teijin Technoproducts, etc.) Fully aromatic polyamines; 2,6-hydroxynaphthoic acid and p-hydroxybenzoic acid (VECTRAN (registered trademark), Kuraray (stock) company), Zxion (registered trademark, KB Seiren) and other polyesters; polyparaphenylene benzobisoxazole (Zylon (registered trademark), Toyobo Co., Ltd.), organic fibers such as polyimide. Among these, from the viewpoint of low thermal expansion, E glass, T glass, S glass, Q glass, and organic fibers are preferred. These substrates may be used alone or in combination of two or more.

基材之形狀不特別限定,例如:織布、不織布、粗紗、切股氈、及表面氈。織布之織法不特別限定,例如已知平織、斜子織(basket weave)、斜紋織(twill weave)等,可以視目的之用途、性能從此等公知品當中適當選用。又,宜使用將它們進行了開纖處理者、以如矽烷偶聯劑之矽烷化合物等進行了表面處理的玻璃織布。基材之厚度、質量不特別限定,通常宜使用約0.01~0.3mm厚度之基材。特別是,考量強度與吸水性之觀點,基材宜為厚度200μm以下、質量(單位面積重量)250g/m2 以下之玻璃織布較理想,選自由E玻璃、S玻璃、T玻璃、及Q玻璃之玻璃纖維及有機纖維構成之群組中之1種以上之纖維之織布(布料)更理想。The shape of the substrate is not particularly limited, and examples thereof include woven fabrics, non-woven fabrics, rovings, cut strand felts, and surface felts. The weaving method of the woven fabric is not particularly limited. For example, a plain weave, a basket weave, a twill weave, etc. are known, and can be appropriately selected from these known products depending on the purpose and performance of the purpose. Further, it is preferable to use a glass woven fabric that has been fiber-opened and surface-treated with a silane compound such as a silane coupling agent. The thickness and quality of the substrate are not particularly limited, and generally a substrate having a thickness of about 0.01 to 0.3 mm is preferably used. In particular, from the viewpoint of strength and water absorption, it is preferable that the substrate is a glass woven fabric having a thickness of 200 μm or less and a mass (weight per unit area) of 250 g / m 2 or less. A woven fabric (cloth) of one or more kinds of fibers in a group composed of glass fiber and organic fiber of glass is more preferable.

本實施形態之預浸體,藉由具備上述樹脂組成物,保存安定性優異。據認為原因在於:芳香族化合物(A)中之上述取代烯丙基與馬來醯亞胺化合物中之馬來醯亞胺基之反應之進行,由於芳香族化合物(A)中之上述取代基而適度地妨礙,結果抑制了預浸體之經時之黏度上昇。The prepreg according to this embodiment is excellent in storage stability by being provided with the resin composition. It is considered that the reason is that the reaction of the above-mentioned substituted allyl group in the aromatic compound (A) with the maleimide group in the maleimide compound proceeds due to the above-mentioned substituent in the aromatic compound (A). However, it moderately hindered, and as a result, the increase in the viscosity of the prepreg over time was suppressed.

(樹脂片) 本實施形態之樹脂片,具備支持體(片基材)及塗佈在該片基材之上述樹脂組成物,上述樹脂組成物疊層在該片基材之單面或兩面。樹脂片,係作為薄片化之一種構件使用,例如可在金屬箔、薄膜等支持體上直接塗佈預浸體等中使用的熱硬化性樹脂(包括無機填充材)並乾燥而製造。(Resin sheet) The resin sheet according to this embodiment includes a support (sheet substrate) and the resin composition coated on the sheet substrate, and the resin composition is laminated on one or both sides of the sheet substrate. The resin sheet is used as a thin-formed member. For example, a thermosetting resin (including an inorganic filler) used in a prepreg or the like can be directly coated on a support such as a metal foil, a film, and dried.

片基材不特別限定,可以使用在各種印刷電路板材料使用之公知品。片基材,例如:聚醯亞胺薄膜、聚醯胺薄膜、聚酯薄膜、聚對苯二甲酸乙二醇酯(PET)薄膜、聚對苯二甲酸丁二醇酯(PBT)薄膜、聚丙烯(PP)薄膜、聚乙烯(PE)薄膜、鋁箔、銅箔及金箔。其中電解銅箔及PET薄膜為較佳。The sheet substrate is not particularly limited, and known products used in various printed circuit board materials can be used. Sheet substrates, such as: polyimide film, polyimide film, polyester film, polyethylene terephthalate (PET) film, polybutylene terephthalate (PBT) film, polymer Acrylic (PP) film, polyethylene (PE) film, aluminum foil, copper foil and gold foil. Among them, electrolytic copper foil and PET film are preferred.

塗佈方法,例如:使本實施形態之樹脂組成物溶於溶劑而成的溶液以塗佈棒、模塗機、刮刀、貝克塗抹器等塗佈在片基材上之方法。The coating method is, for example, a method in which a solution obtained by dissolving the resin composition of the present embodiment in a solvent is coated on a sheet substrate with a coating rod, a die coater, a doctor blade, a Baker applicator, or the like.

樹脂片,宜為將上述樹脂組成物塗佈在支持體(片基材)後使其半硬化(B階段化)者較佳。作為獲得如此的樹脂片之方法,具體而言,可以列舉將上述樹脂組成物塗佈在銅箔等片基材後,於100~200℃之乾燥機中加熱1~60分鐘之方法等使其半硬化,製造樹脂片之方法。樹脂組成物對於支持體之附著量,按樹脂片之樹脂厚度計,宜為1~300μm之範圍為較佳。本實施形態之樹脂片可作為印刷電路板之增層材料使用。The resin sheet is preferably one in which the above-mentioned resin composition is applied to a support (sheet substrate) and then semi-hardened (B-staged). As a method of obtaining such a resin sheet, specifically, after coating the said resin composition on a sheet base material, such as a copper foil, and heating it in a dryer at 100-200 degreeC for 1-60 minutes, etc., are mentioned. Semi-hardened method for manufacturing resin sheet. The adhesion amount of the resin composition to the support is preferably in the range of 1 to 300 μm based on the resin thickness of the resin sheet. The resin sheet of this embodiment can be used as a build-up material for a printed circuit board.

(疊層板及覆金屬箔疊層板) 本實施形態之疊層板,係將選自由上述預浸體及樹脂片構成之群組中之至少1種的1片以上重疊而成,包括選自由上述預浸體及樹脂片構成之群組中之至少1種中含有的樹脂組成物之硬化物。此疊層板,例如可將選自由上述預浸體及樹脂片構成之群組中之至少1種之1片以上重疊而硬化獲得。又,本實施形態之覆金屬箔疊層板,具有選自由上述預浸體及樹脂片構成之群組中之至少1種與配置在選自由上述預浸體及樹脂片構成之群組中之至少1種之單面或兩面的金屬箔,包括選自由上述預浸體及樹脂片構成之群組中之至少1種中含有的樹脂組成物之硬化物。此覆金屬箔疊層板,可藉由重疊選自由上述預浸體及樹脂片構成之群組中之至少1種1片以上,並在其單面或兩面配置金屬箔而疊層成形以獲得。更具體而言,可藉由重疊1片或多片前述預浸體及/或樹脂片,視情形在其單面或兩面配置銅、鋁等金屬箔,並將其視需要予以疊層成形而製得覆金屬箔疊層板。在此使用之金屬箔只要是在印刷電路板材料中使用者即不特別限定,宜為壓延銅箔、電解銅箔等公知之銅箔較佳。又,金屬箔之厚度不特別限定,宜為1~70μm較理想,更佳為1.5~35μm。針對覆金屬箔疊層板之成形方法及其成形條件亦不特別限定,可採用一般的印刷電路板用疊層板及多層板的方法及條件。例如:覆金屬箔疊層板之成形時可以使用多段壓製機、多段真空壓製機、連續成形機、及高壓釜成形機等。又,覆金屬箔疊層板之成形,一般而言,溫度為100~300℃、壓力為面壓2~100kgf/cm2 、加熱時間為0.05~5小時之範圍。再者,視需要,也可於150~300℃之溫度進行後硬化。又,可藉由將上述預浸體與另外製作的內層用之配線板予以組合並疊層成形而製成多層板。(Laminated sheet and metal-clad laminated sheet) The laminated sheet of this embodiment is formed by stacking at least one sheet selected from the group consisting of the above-mentioned prepreg and resin sheet. The cured product of the resin composition contained in at least one of the group consisting of the prepreg and the resin sheet is free. This laminated board can be obtained, for example, by laminating one or more sheets of at least one selected from the group consisting of the above-mentioned prepreg and a resin sheet, and curing them. The metal foil-clad laminate according to this embodiment has at least one selected from the group consisting of the prepreg and the resin sheet, and has a structure selected from the group consisting of the prepreg and the resin sheet. At least one type of single-sided or double-sided metal foil includes a hardened product of a resin composition contained in at least one selected from the group consisting of the above-mentioned prepreg and a resin sheet. The metal foil-clad laminate can be formed by laminating at least one or more types selected from the group consisting of the above-mentioned prepreg and resin sheet, and arranging metal foils on one or both sides to form a laminate. . More specifically, one or more of the aforementioned prepregs and / or resin sheets may be stacked, and metal foils such as copper and aluminum may be disposed on one or both sides of the prepregs, as appropriate, and laminated as necessary. A metal foil-clad laminate was prepared. The metal foil used here is not particularly limited as long as it is a user in a printed circuit board material, and is preferably a known copper foil such as a rolled copper foil or an electrolytic copper foil. The thickness of the metal foil is not particularly limited, but is preferably 1 to 70 μm, and more preferably 1.5 to 35 μm. The method and conditions for forming the metal foil-clad laminated board are also not particularly limited, and methods and conditions for general laminated boards and multilayer boards for printed circuit boards can be used. For example, multi-stage presses, multi-stage vacuum presses, continuous forming machines, and autoclave forming machines can be used when forming metal-clad laminates. In addition, the formation of a metal foil-clad laminate generally has a temperature of 100 to 300 ° C., a pressure of 2 to 100 kgf / cm 2 , and a heating time in the range of 0.05 to 5 hours. Furthermore, if necessary, post-curing may be performed at a temperature of 150 to 300 ° C. Furthermore, a multilayer board can be produced by combining the above-mentioned prepreg and a wiring board for an inner layer which is separately produced, and forming the multilayer board.

(印刷電路板) 本實施形態之印刷電路板,包括絕緣層及在此絕緣層之表面形成之導體層,上述絕緣層含有上述樹脂組成物。成為電路之導體層,可由上述覆金屬箔疊層板中之金屬箔形成。或導體層亦可藉由在絕緣層之表面進行無電解鍍敷而形成。此印刷電路板的耐藥品性、耐除膠渣性及絕緣可靠性優異,可特別有效地使用於作為要求如此的半導體封裝體用印刷電路板。(Printed circuit board) The printed circuit board of this embodiment includes an insulating layer and a conductor layer formed on a surface of the insulating layer, and the insulating layer contains the resin composition. The conductor layer that becomes a circuit can be formed from the metal foil in the metal foil-clad laminate described above. Alternatively, the conductor layer may be formed by electroless plating on the surface of the insulating layer. This printed circuit board is excellent in chemical resistance, scum resistance, and insulation reliability, and can be particularly effectively used as a printed circuit board for such a semiconductor package.

本實施形態之印刷電路板,具體而言,例如可利用以下方法製造。首先準備上述覆金屬箔疊層板(覆銅疊層板等)。對於覆金屬箔疊層板之表面實施蝕刻處理並形成內層電路,製作內層基板。在此內層基板之內層電路表面視需要進行為了提高黏著強度之表面處理。其次,在此內層電路表面重疊預定片數的上述預浸體,並於其外側疊層外層電路用之金屬箔,加熱加壓並一體成形。依此方式,可以製造於內層電路與外層電路用之金屬箔之間形成了基材及由熱硬化性樹脂組成物之硬化物構成的絕緣層的多層疊層板。其次對此多層疊層板施以通孔、介層孔用之開孔加工。之後,實施用以去除來自硬化物層所含之樹脂成分之樹脂之殘渣即膠渣的除去處理,即除膠渣處理。並於此孔之壁面形成用以使內層電路與外層電路用之金屬箔導通之鍍敷金屬皮膜,再對於外層電路用之金屬箔實施蝕刻處理而形成外層電路,如此製造印刷電路板。Specifically, the printed wiring board of this embodiment can be manufactured by the following method, for example. First, the above-mentioned metal-clad laminate (copper-clad laminate, etc.) is prepared. The surface of the metal foil-clad laminate is etched to form an inner-layer circuit, and an inner-layer substrate is produced. The inner layer circuit surface of the inner layer substrate is optionally subjected to a surface treatment for improving the adhesive strength. Next, a predetermined number of the above-mentioned prepregs are stacked on the surface of the inner-layer circuit, and a metal foil for the outer-layer circuit is laminated on the outer side of the inner-layer circuit, heated and pressurized, and integrally formed. In this way, a multilayer laminated board in which a base material and an insulating layer made of a cured product of a thermosetting resin composition is formed between the inner layer circuit and the metal foil for the outer layer circuit can be manufactured. Secondly, the multilayer laminated board is subjected to an opening process for through holes and interlayer holes. Thereafter, a slag removal process, that is, a slag removal process, is performed to remove residues of the resin from the resin component contained in the hardened layer, that is, a slag removal process. A plating metal film is formed on the wall surface of the hole to make the inner layer circuit and the outer layer metal foil conductive, and then the metal foil for the outer layer circuit is etched to form the outer layer circuit, so that a printed circuit board is manufactured.

例如:上述預浸體(基材及附著於此基材之上述樹脂組成物)、覆金屬箔疊層板之樹脂組成物層(構成上述樹脂組成物之層),構成含有上述樹脂組成物之絕緣層。For example, the prepreg (the substrate and the resin composition attached to the substrate), the resin composition layer (the layer constituting the resin composition) of the metal foil-clad laminate, and the resin composition layer containing the resin composition Insulation.

又,不使用覆金屬箔疊層板時,亦可在上述預浸體、或上述樹脂片形成成為電路之導體層並製作印刷電路板。此時導體層之形成也可使用無電解鍍敷的方法。When a metal foil-clad laminate is not used, a printed circuit board can be formed by forming a conductor layer for a circuit on the prepreg or the resin sheet. In this case, the formation of the conductive layer can also be performed by electroless plating.

依本實施形態,芳香族化合物(A)中之取代烯丙基與馬來醯亞胺化合物中之馬來醯亞胺基之反應之進行,會藉由芳香族化合物(A)中之上述取代基而適度妨礙。其結果,預浸體之熔融黏度比起習知技術者低,所以將此預浸體疊層並使其硬化時樹脂組成物之流動性良好,印刷電路板之成形性優異。 實施例According to this embodiment, the reaction of the substituted allyl group in the aromatic compound (A) with the maleimide group in the maleimide compound proceeds through the above-mentioned substitution in the aromatic compound (A). Base and moderate obstruction. As a result, the melt viscosity of the prepreg is lower than that of a conventional art. Therefore, when this prepreg is laminated and cured, the resin composition has good fluidity, and the printed circuit board has excellent moldability. Examples

以下利用實施例對於本發明更詳細説明,但是本發明不限於該等實施例。Hereinafter, the present invention will be described in more detail using examples, but the present invention is not limited to these examples.

(合成例1)α-萘酚芳烷基型氰酸酯樹脂之合成 使α-萘酚芳烷基型酚醛樹脂(SN495V、OH基當量:236g/eq.、新日鐵化學(股)製)300g(OH基換算1.28mol)及三乙胺194.6g(1.92mol;相對於羥基1mol為1.5mol)溶於二氯甲烷1800g,將其作為溶液1。將氯化氰125.9g(2.05mol;相對於羥基1mol為1.6mol)、二氯甲烷293.8g、36%鹽酸194.5g(1.92mol;相對於羥基1mol為1.5mol)、水1205.9g於攪拌下保持液溫-2~-0.5℃的狀態,費時30分鐘加注溶液1。溶液1之加注結束後,於同溫度攪拌30分鐘後,費時10分鐘加注使三乙胺65g(0.64mol;相對於羥基1mol為0.5mol)溶於二氯甲烷65g之溶液(溶液2)。溶液2之加注結束後,於同溫度攪拌30分鐘,使反應完成。之後,將反應液靜置,將有機相與水相分離。將獲得之有機相以水1300g洗淨5次。水洗第5次的廢水的電氣傳導度為5μS/cm,確認利用水洗淨已充分去除可以去除的離子性化合物。將水洗後之有機相於減壓下濃縮,最終於90℃使其進行1小時濃縮乾固,獲得上式(13)表示之萘酚芳烷基型氰酸酯化合物(式中之R11 皆為氫原子。SN495V-CN,氰酸酯基當量:261g/eq.、橙色黏性物)331g。獲得之SN495V-CN之紅外吸收光譜顯示2250cm-1 (氰酸酯基)之吸收且未顯示羥基之吸收。(Synthesis example 1) Synthesis of α-naphthol aralkyl cyanate resin. Α-naphthol aralkyl phenol resin (SN495V, OH group equivalent: 236 g / eq., Manufactured by Nippon Steel Chemical Co., Ltd. 300 g (1.28 mol in terms of OH group) and 194.6 g (1.92 mol; 1.5 mol with respect to 1 mol of hydroxyl group) of triethylamine were dissolved in 1800 g of methylene chloride, and this was used as solution 1. 125.9 g of cyanogen chloride (2.05 mol; 1.6 mol relative to 1 mol of hydroxyl group), 293.8 g of dichloromethane, 194.5 g of 36% hydrochloric acid (1.92 mol; 1.5 mol relative to 1 mol of hydroxyl group), and 1205.9 g of water were kept under stirring. In the state of liquid temperature of -2 ~ -0.5 ℃, it takes 30 minutes to fill solution 1. After the addition of solution 1 was completed, after stirring at the same temperature for 30 minutes, a solution of 65 g of triethylamine (0.64 mol; 0.5 mol relative to 1 mol of hydroxyl group) in 65 g of dichloromethane was added over 10 minutes (solution 2). . After the addition of solution 2 was completed, the mixture was stirred at the same temperature for 30 minutes to complete the reaction. After that, the reaction solution was allowed to stand, and the organic phase and the aqueous phase were separated. The obtained organic phase was washed 5 times with 1300 g of water. The electrical conductivity of the wastewater that was washed for the fifth time was 5 μS / cm, and it was confirmed that the ionic compounds that can be removed were sufficiently removed by water washing. After washing with water the organic phase was concentrated under reduced pressure, finally allowed 1 hour and concentrated to dryness at 90 ℃, to obtain the naphthol aralkyl type cyanate ester compound R (in the formula represented by the above formula (13) are 11 It is a hydrogen atom. SN495V-CN, cyanate group equivalent: 261 g / eq., Orange sticky substance) 331 g. The infrared absorption spectrum of the obtained SN495V-CN showed an absorption of 2250 cm -1 (cyanate group) and did not show an absorption of a hydroxyl group.

(合成例2)芳香族化合物(A)之合成 於反應器內將相當於芳香族化合物(A1)之二烯丙基雙酚A(DABPA、大和化成工業(股)製、羥基當量:154g/eq.)5.0質量份、及相當於會和苯酚性羥基反應之化合物之單官能環氧化合物(製品名「ED-509E」、ADEKA公司製)7.5質量份、及咪唑系硬化促進劑(2,4,5-三苯基咪唑(東京化成工業(股)製))0.05質量份進行混合。將此混合物於135℃加熱1小時以上直到反應完成,獲得相當於芳香族化合物(A)之下式(21)表示之化合物。反應之完成利用GPC(凝膠滲透層析)確認。 【化20】 (Synthesis Example 2) Synthesis of aromatic compound (A) In the reactor, diallyl bisphenol A (DABPA, manufactured by Daiwa Chemical Industry Co., Ltd.) equivalent to the aromatic compound (A1), hydroxyl equivalent: 154 g / eq.) 5.0 parts by mass and 7.5 parts by mass of a monofunctional epoxy compound (product name "ED-509E", manufactured by ADEKA) equivalent to a compound that reacts with a phenolic hydroxyl group, and an imidazole-based hardening accelerator (2, 4,5-triphenylimidazole (Tokyo Chemical Industry Co., Ltd.) 0.05 parts by mass was mixed. This mixture was heated at 135 ° C. for 1 hour or more until the reaction was completed to obtain a compound represented by the formula (21) corresponding to the aromatic compound (A). The completion of the reaction was confirmed by GPC (gel permeation chromatography). [Chemical 20]

(合成例3)芳香族化合物之合成 於反應器內將相當於芳香族化合物(A1)之二烯丙基雙酚A(DABPA、大和化成工業(股)製、羥基當量:154g/eq.)5.3質量份、單官能環氧化合物(製品名「YED-188」、三菱化學公司製)7.1質量份、及咪唑系硬化促進劑(2,4,5-三苯基咪唑(東京化成工業(股)製))0.05質量份混合。將此混合物於135℃加熱1小時以上直到反應完成,獲得相當於芳香族化合物(A)之下式(22)表示之化合物。反應之完成以GPC(凝膠滲透層析)確認。 【化21】 (Synthesis Example 3) Synthesis of aromatic compound In the reactor, diallyl bisphenol A (DABPA, manufactured by Daiwa Chemical Industry Co., Ltd., hydroxyl equivalent weight: 154 g / eq.) Corresponding to the aromatic compound (A1). 5.3 parts by mass, monofunctional epoxy compound (product name "YED-188", manufactured by Mitsubishi Chemical Corporation), 7.1 parts by mass, and imidazole-based hardening accelerator (2,4,5-triphenylimidazole (Tokyo Chemical Industry Co., Ltd. Manufactured))) 0.05 parts by mass are mixed. This mixture was heated at 135 ° C for 1 hour or more until the reaction was completed to obtain a compound represented by the formula (22) corresponding to the aromatic compound (A). The completion of the reaction was confirmed by GPC (gel permeation chromatography). [Chemical 21]

(實施例1) 將合成例1獲得之α-萘酚芳烷基型氰酸酯樹脂10.0質量份、酚醛清漆型馬來醯亞胺化合物(BMI-2300、大和化成工業(股)製、官能基當量:186g/eq.)45.0質量份、雙烯丙基納迪克醯亞胺(BANI-M、丸善石油化學(股)製、官能基當量:286g/eq.)25.0質量份、合成例2獲得之上式(21)表示之化合物12.5質量份、聯苯芳烷基型環氧化合物(NC-3000H、日本化藥(股)製、官能基當量:290g/eq.)7.0質量份、矽烷偶聯劑(Z-6040、東麗道康寧(股)製)6.9質量份、濕潤分散劑(DISPERBYK-111、BYK Chemie Japan(股)製)1.0質量份及濕潤分散劑DISPERBYK-161、BYK Chemie Japan(股)製)1.0質量份、咪唑系硬化促進劑(2,4,5-三苯基咪唑(東京化成工業(股)製))0.5質量份、及熔融二氧化矽(SC-4053SQ、Admatechs(股)製)200質量份進行混合,以甲乙酮稀釋,獲得清漆。將此清漆含浸塗佈於E玻璃織布(厚度:95μm、質量(單位面積重量):108g/m2 。以下同),於130℃進行3分鐘加熱乾燥,獲得樹脂組成物含量45質量%之預浸體。(Example 1) 10.0 parts by mass of an α-naphthol aralkyl-type cyanate resin obtained in Synthesis Example 1, a novolac-type maleimide compound (BMI-2300, manufactured by Yamato Chemical Industries, Ltd., functional Group equivalent: 186 g / eq.) 45.0 parts by mass, bisallyl nadic acid imine (BANI-M, manufactured by Maruzan Petrochemical Co., Ltd., functional group equivalent: 286 g / eq.) 25.0 parts by mass, Synthesis Example 2 12.5 parts by mass of the compound represented by the above formula (21), 7.0 parts by mass of biphenylaralkyl-type epoxy compound (NC-3000H, manufactured by Nippon Kayaku Co., Ltd., functional group equivalent: 290 g / eq.), And silane Coupling agent (Z-6040, Toray Dow Corning Co., Ltd.) 6.9 parts by mass, wetting dispersant (DISPERBYK-111, BYK Chemie Japan (product)) 1.0 part by mass, and wetting dispersant DISPERBYK-161, BYK Chemie Japan (Manufactured) 1.0 part by mass, imidazole-based hardening accelerator (2,4,5-triphenylimidazole (manufactured by Tokyo Chemical Industry Co., Ltd.)) 0.5 part by mass, and fused silica (SC-4053SQ, Admatechs (Co., Ltd.) 200 parts by mass were mixed and diluted with methyl ethyl ketone to obtain a varnish. This varnish was impregnated and coated on an E glass woven fabric (thickness: 95 μm, mass (weight per unit area): 108 g / m 2. The same applies hereinafter), and dried at 130 ° C. for 3 minutes to obtain a resin composition content of 45% by mass. Prepreg.

(實施例2) 將合成例1獲得之α-萘酚芳烷基型氰酸酯樹脂10.0質量份、酚醛清漆型馬來醯亞胺化合物(BMI-2300、大和化成工業(股)製、官能基當量:186g/eq.)45.0質量份、雙烯丙基納迪克醯亞胺(BANI-M、丸善石油化學(股)製、官能基當量:286g/eq.)25.0質量份、合成例3獲得之上式(22)表示之化合物13.0質量份、聯苯芳烷基型環氧化合物(NC-3000H、日本化藥(股)製、官能基當量:290g/eq.)7.0質量份、矽烷偶聯劑(Z-6040、東麗・道康寧(股)製)6.9質量份、濕潤分散劑(DISPERBYK-111、BYK Chemie Japan(股)製)1.0質量份及濕潤分散劑DISPERBYK-161、BYK Chemie Japan(股)製)1.0質量份、咪唑系硬化促進劑(2,4,5-三苯基咪唑(東京化成工業(股)製))0.5質量份、及熔融二氧化矽(SC-4053SQ、Admatechs(股)製)200質量份進行混合,以甲乙酮稀釋,獲得清漆。將此清漆含浸塗佈於E玻璃織布,於130℃進行3分鐘加熱乾燥,獲得樹脂組成物含量45質量%之預浸體。(Example 2) 10.0 parts by mass of an α-naphthol aralkyl-type cyanate resin obtained in Synthesis Example 1, a novolac-type maleimide compound (BMI-2300, manufactured by Yamato Chemical Industries, Ltd., functional Base equivalent: 186 g / eq.) 45.0 parts by mass, bisallyl nadic acid imine (BANI-M, manufactured by Maruzan Petrochemical Co., Ltd., functional group equivalent: 286 g / eq.) 25.0 parts by mass, Synthesis Example 3 13.0 parts by mass of the compound represented by the above formula (22), 7.0 parts by mass of biphenylaralkyl-type epoxy compound (NC-3000H, manufactured by Nippon Kayaku Co., Ltd., functional group equivalent: 290 g / eq.), And silane Coupling agent (Z-6040, Toray Dow Corning Co., Ltd.) 6.9 parts by mass, moist dispersant (DISPERBYK-111, BYK Chemie Japan), 1.0 part by mass and wetting dispersant DISPERBYK-161, BYK Chemie 1.0 parts by mass, manufactured by Japan, 0.5 parts by mass of imidazole-based hardening accelerator (2,4,5-triphenylimidazole (manufactured by Tokyo Chemical Industry Co., Ltd.)), and fused silica (SC-4053SQ, 200 parts by mass of Admatechs (products) were mixed and diluted with methyl ethyl ketone to obtain a varnish. This varnish was impregnated and coated on an E glass woven fabric, and heated and dried at 130 ° C. for 3 minutes to obtain a prepreg having a resin composition content of 45% by mass.

(比較例1) 將合成例1獲得之α-萘酚芳烷基型氰酸酯樹脂10.0質量份、酚醛清漆型馬來醯亞胺化合物(BMI-2300、大和化成工業(股)製、官能基當量:186g/eq.)45.0質量份、雙烯丙基納迪克醯亞胺(BANI-M、丸善石油化學(股)製、官能基當量:286g/eq.)25.0質量份、屬於芳香族化合物(A1)之二烯丙基雙酚A(DABPA、大和化成工業(股)製、羥基當量:154g/eq.)5.0質量份、具有屬於R表示之1價有機基之化合物之單官能環氧化合物(製品名「ED-509E」、ADEKA公司製)7.5質量份、聯苯芳烷基型環氧化合物(NC-3000H、日本化藥(股)製、官能基當量:290g/eq.)7.0質量份、矽烷偶聯劑(Z-6040、東麗・道康寧(股)製)6.9質量份、濕潤分散劑(DISPERBYK-111、BYK Chemie Japan(股)製)1.0質量份及濕潤分散劑DISPERBYK-161、BYK Chemie Japan(股)製)1.0質量份、咪唑系硬化促進劑(2,4,5-三苯基咪唑(東京化成工業(股)製))0.5質量份、及熔融二氧化矽(SC-4053SQ、Admatechs(股)製)200質量份混合,以甲乙酮稀釋,獲得清漆。將此清漆含浸塗佈於E玻璃織布,於130℃進行3分鐘加熱乾燥,獲得樹脂組成物含量45質量%之預浸體。(Comparative Example 1) 10.0 parts by mass of an α-naphthol aralkyl cyanate resin obtained in Synthesis Example 1, a novolac maleimide compound (BMI-2300, manufactured by Yamato Chemical Industries, Ltd., functional Base equivalent: 186 g / eq.) 45.0 parts by mass, bisallyl nadic acid imine (BANI-M, manufactured by Maruzan Petrochemical Co., Ltd., functional group equivalent: 286 g / eq.) 25.0 parts by mass, which is aromatic 5.0 parts by mass of diallyl bisphenol A (DABPA, manufactured by Daiwa Chemical Industry Co., Ltd., hydroxyl equivalent: 154 g / eq.) Of compound (A1), a monofunctional ring of a compound having a monovalent organic group represented by R 7.5 parts by mass of an oxygen compound (product name "ED-509E", manufactured by ADEKA), a biphenylaralkyl epoxy compound (NC-3000H, manufactured by Nippon Kayaku Co., Ltd., functional group equivalent: 290 g / eq.) 7.0 parts by mass, silane coupling agent (Z-6040, manufactured by Toray Dow Corning Co., Ltd.) 6.9 parts by mass, moist dispersant (DISPERBYK-111, BYK Chemie Japan Co., Ltd.) 1.0 part by mass, and moist dispersant DISPERBYK -161, 1.0 part by mass of BYK Chemie Japan (stock), 0.5 part by mass of imidazole-based hardening accelerator (2,4,5-triphenylimidazole (manufactured by Tokyo Chemical Industry Co., Ltd.)), and melting Silicon oxide (SC-4053SQ, Admatechs (shares) Ltd.) 200 parts by mass mixed, diluted with methyl ethyl ketone to obtain a varnish. This varnish was impregnated and coated on an E glass woven fabric, and heated and dried at 130 ° C. for 3 minutes to obtain a prepreg having a resin composition content of 45% by mass.

(比較例2) 將合成例1獲得之α-萘酚芳烷基型氰酸酯樹脂10.0質量份、酚醛清漆型馬來醯亞胺化合物(BMI-2300、大和化成工業(股)製、官能基當量:186g/eq.)47.0質量份、雙烯丙基納迪克醯亞胺(BANI-M、丸善石油化學(股)製、官能基當量:286g/eq.)36.0質量份、聯苯芳烷基型環氧化合物(NC-3000H、日本化藥(股)製、官能基當量:290g/eq.)7.0質量份、矽烷偶聯劑(Z-6040、東麗・道康寧(股)製)6.9質量份、濕潤分散劑(DISPERBYK-111、BYK Chemie Japan(股)製)1.0質量份及濕潤分散劑DISPERBYK-161、BYK Chemie Japan(股)製)1.0質量份、咪唑系硬化促進劑(2,4,5-三苯基咪唑(東京化成工業(股)製))0.5質量份及熔融二氧化矽(SC-4053SQ、Admatechs(股)製)200質量份混合,以甲乙酮稀釋,獲得清漆。將此清漆含浸塗佈於E玻璃織布,於130℃進行3分鐘加熱乾燥,獲得樹脂組成物含量45質量%之預浸體。(Comparative Example 2) 10.0 parts by mass of an α-naphthol aralkyl-type cyanate resin obtained in Synthesis Example 1, a novolac-type maleimide compound (BMI-2300, manufactured by Yamato Chemical Industries, Ltd., functional Group equivalent: 186 g / eq.) 47.0 parts by mass, bisallyl nadic acid imine (BANI-M, manufactured by Maruzan Petrochemical Co., Ltd., functional group equivalent: 286 g / eq.) 36.0 parts by mass, biphenyl aromatic Alkyl type epoxy compound (NC-3000H, manufactured by Nippon Kayaku Co., Ltd., functional group equivalent: 290 g / eq.) 7.0 parts by mass, silane coupling agent (Z-6040, manufactured by Toray Dow Corning Co., Ltd.) 6.9 parts by mass, 1.0 part by mass of a wet dispersant (DISPERBYK-111, BYK Chemie Japan (stock)) and 1.0 part by mass of a wet dispersant DISPERBYK-161, manufactured by BYK Chemie Japan (stock), imidazole-based hardening accelerator (2 0.5 parts by mass of 4,5-triphenylimidazole (manufactured by Tokyo Chemical Industry Co., Ltd.) and 200 parts by mass of fused silica (SC-4053SQ, manufactured by Admatechs Co., Ltd.) were mixed and diluted with methyl ethyl ketone to obtain a varnish. This varnish was impregnated and coated on an E glass woven fabric, and heated and dried at 130 ° C. for 3 minutes to obtain a prepreg having a resin composition content of 45% by mass.

[覆金屬箔疊層板之製作] 對於上述獲得之預浸體1片,將12μm厚之電解銅箔(3EC-III、三井金屬礦業(股)製)以上下配置,於壓力30kgf/cm2 、溫度220℃之條件實施120分鐘之疊層成形,獲得絕緣層厚度0.1mm之覆銅疊層板。[Production of a metal foil-clad laminate] For one piece of the prepreg obtained as described above, a 12 μm-thick electrolytic copper foil (3EC-III, manufactured by Mitsui Metals Mining Co., Ltd.) was placed at a pressure of 30 kgf / cm 2 The laminate was formed at a temperature of 220 ° C for 120 minutes to obtain a copper-clad laminate having an insulation layer thickness of 0.1 mm.

[玻璃轉移溫度(Tg)] 如上述方式獲得覆銅疊層板後,將其兩面的銅箔利用蝕刻除去,獲得試樣。針對此試樣,依JIS K7244-3(JIS C6481),使用動態黏彈性測定裝置(TA Instrument Japan(股)公司製),以開始溫度50℃、結束溫度350℃、升溫速度10℃/分之條件測定動態黏彈性。定義此時獲得之損失彈性模數(E")之最大値為玻璃轉移溫度。玻璃轉移溫度為耐熱性之指標。又,表1中,350℃以下之區域有玻璃轉移溫度時登記其値,350℃以下之區域無玻璃轉移溫度時登記「>350℃」。結果示於表1。[Glass Transition Temperature (Tg)] After obtaining the copper-clad laminate as described above, the copper foils on both sides thereof were removed by etching to obtain a sample. For this sample, a dynamic viscoelasticity measuring device (manufactured by TA Instrument Japan Co., Ltd.) was used in accordance with JIS K7244-3 (JIS C6481) at a start temperature of 50 ° C, an end temperature of 350 ° C, and a heating rate of 10 ° C / min. Conditions determine dynamic viscoelasticity. The maximum value of the loss elastic modulus (E ") obtained at this time is the glass transition temperature. The glass transition temperature is an index of heat resistance. Also, in Table 1, the glass transition temperature is registered in the region below 350 ° C. When there is no glass transition temperature in the area below 350 ° C, "> 350 ° C" is registered. The results are shown in Table 1.

[印刷電路板之成形性] 如上述獲得覆銅疊層板後,將其兩面的銅箔以蝕刻除去,獲得試樣。針對此試樣,以目視觀察表面,並評價有無孔隙。確認有許多孔隙存在時,當作無法成形而評為「C」,確認有孔隙存在但數量少時,當作可成形而評為「B」,未確認孔隙存在時,當作可良好地成形而評為「A」。結果示於表1。[Formability of Printed Circuit Board] After the copper-clad laminated board was obtained as described above, the copper foils on both sides thereof were removed by etching to obtain a sample. The surface of this sample was visually observed, and the presence or absence of porosity was evaluated. When many pores are confirmed, they are regarded as incapable of forming, and they are rated as "C". When there are many pores, but they are few, they are rated as "formable." Rated "A". The results are shown in Table 1.

[預浸體之最低熔融黏度] 針對上述實施例及比較例獲得之預浸體之最低熔融黏度,使用流變儀(TA Instrument Japan(股)公司製),以開始溫度80℃、結束溫度180℃、升溫速度3℃/min、頻率10pts/s、應變0.1%之條件測定。此最低熔融黏度越低,則代表疊層板製作時之流動特性(樹脂流動性)越良好,成形性優異。結果示於表1。[Minimum Melt Viscosity of Prepregs] Regarding the minimum melt viscosity of the prepregs obtained in the above examples and comparative examples, a rheometer (manufactured by TA Instrument Japan Co., Ltd.) was used to start the temperature at 80 ° C and end the temperature at 180 Measured under the conditions of ℃, heating rate of 3 ℃ / min, frequency of 10 pts / s, and strain of 0.1%. The lower the minimum melt viscosity, the better the flow characteristics (resin flowability) at the time of manufacturing the laminate, and the better the moldability. The results are shown in Table 1.

[預浸體之保存安定性] 將如上述獲得之預浸體容納在恆溫槽內,於40℃保存1週。此保存前後之黏度之變化以流動計測定。詳情係使用流動計(島津製作所製(股)公司),以測定溫度120℃、拉伸負荷10kg、模孔徑φ1mm、模長度10mm的條件測定。此黏度的變化越少,代表疊層板製作時之流動特性(樹脂流動性)維持良好可保存的期間越長,意指預浸體保存安定性優異。結果示於表1。[Preservation stability of prepreg] The prepreg obtained as described above was stored in a thermostatic bath and stored at 40 ° C for one week. The change in viscosity before and after this storage was measured using a flow meter. The details were measured using a flow meter (Shimadzu Corporation) under the conditions of a measurement temperature of 120 ° C., a tensile load of 10 kg, a mold hole diameter of 1 mm, and a mold length of 10 mm. The smaller the change in viscosity, the longer the period during which the flow characteristics (resin fluidity) of the laminated board is maintained and the longer the preservation period is, which means that the storage stability of the prepreg is excellent. The results are shown in Table 1.

【表1】 【Table 1】

本申請案係基於2017年5月26日提申的日本專利申請案(日本特願2017-104096),其內容納入於此作為參照。 (產業利用性)This application is based on a Japanese patent application filed on May 26, 2017 (Japanese Patent Application No. 2017-104096), the contents of which are incorporated herein by reference. (Industrial availability)

依照本發明可以提供印刷電路板之成形性及預浸體之保存安定性優異之樹脂組成物等,故於半導體塑膠封裝體中使用的印刷電路板等領域有產業利用性。According to the present invention, a resin composition and the like having excellent formability of a printed circuit board and storage stability of a prepreg can be provided. Therefore, the printed circuit board used in a semiconductor plastic package has industrial applicability.

Claims (16)

一種樹脂組成物,包括:下式(1a)表示之1價取代基與下式(1b)表示之1價取代基直接鍵結在芳香環而成的芳香族化合物(A),及馬來醯亞胺化合物(B); CH2 =CRa CH2 -  (1a) Rb O-  (1b) 式(1a)中,Ra 表示氫原子或1價有機基,式(1b)中,Rb 表示1價有機基。A resin composition comprising: an aromatic compound (A) in which a monovalent substituent represented by the following formula (1a) and a monovalent substituent represented by the following formula (1b) are directly bonded to an aromatic ring; Imine compound (B); CH 2 = CR a CH 2- (1a) R b O- (1b) In the formula (1a), R a represents a hydrogen atom or a monovalent organic group, and in the formula (1b), R b Represents a monovalent organic group. 如申請專利範圍第1項之樹脂組成物,其中,該芳香族化合物(A)中,該芳香環中的與該式(1a)表示之1價取代基鍵結之碳原子與該芳香環中的與該式(1b)表示之1價取代基鍵結之碳原子彼此相鄰。For example, the resin composition of claim 1 in the patent application, wherein in the aromatic compound (A), the carbon atom in the aromatic ring bonded to the monovalent substituent represented by the formula (1a) and the aromatic ring The carbon atoms bonded to the monovalent substituent represented by the formula (1b) are adjacent to each other. 如申請專利範圍第1或2項之樹脂組成物,其中,該式(1b)表示之1價取代基係下式(2)、(3)及(4)表示之1價取代基中之任一者; [化1]式(2)、(3)及(4)中,R1 表示也可以有取代基之直鏈狀或分支狀之碳數1以上之烷基或芳基。For example, the resin composition according to item 1 or 2 of the patent application scope, wherein the monovalent substituent represented by the formula (1b) is any of the monovalent substituents represented by the following formulas (2), (3), and (4). One of In formulae (2), (3), and (4), R 1 represents a linear or branched alkyl or aryl group having 1 or more carbon atoms which may have a substituent. 如申請專利範圍第3項之樹脂組成物,其中,該R1 為下式(5)表示之取代基; [化2]式(5)中,R2 表示氫原子或1價有機基。For example, the resin composition of claim 3, wherein R 1 is a substituent represented by the following formula (5); In formula (5), R 2 represents a hydrogen atom or a monovalent organic group. 如申請專利範圍第1或2項之樹脂組成物,其中,該芳香族化合物(A)包括下式(6)表示之化合物; [化3]式(6)中,2個R3 各自獨立地表示羥基或下式(2)、(3)及(4)表示之任一取代基,且至少其中一者表示下式(2)、(3)及(4)表示之任一取代基,R4 表示單鍵、伸烷基、伸苯基、伸聯苯基、或伸萘基,R5 各自獨立地表示氫原子、烷基、苯基、聯苯基、或萘基; [化4]式(2)、(3)及(4)中,R1 表示也可以有取代基之直鏈狀或分支狀之碳數1以上之烷基或芳基。For example, the resin composition of the scope of application for the patent item 1 or 2, wherein the aromatic compound (A) includes a compound represented by the following formula (6); In formula (6), two R 3 each independently represent a hydroxyl group or any of the substituents represented by the following formulae (2), (3), and (4), and at least one of them represents the following formulae (2), (3 ) And (4), each of R 4 represents a single bond, an alkylene group, a phenylene group, a phenylene group, or a naphthyl group, and R 5 each independently represents a hydrogen atom, an alkyl group, or a phenyl group. , Biphenyl, or naphthyl; In formulae (2), (3), and (4), R 1 represents a linear or branched alkyl or aryl group having 1 or more carbon atoms which may have a substituent. 如申請專利範圍第1或2項之樹脂組成物,其中,該馬來醯亞胺化合物(B)係選自由雙(4-馬來醯亞胺苯基)甲烷、2,2-雙{4-(4-馬來醯亞胺苯氧基)-苯基}丙烷、雙(3-乙基-5-甲基-4-馬來醯亞胺苯基)甲烷、聚環丁烷氧化物-雙(4-馬來醯亞胺苯甲酸酯)及下式(7)表示之馬來醯亞胺化合物構成之群組中之至少1種; [化5]式(7)中,R6 各自獨立地表示氫原子或甲基,n1 表示1以上之整數。For example, the resin composition of claim 1 or 2, wherein the maleimide compound (B) is selected from the group consisting of bis (4-maleimidephenyl) methane, 2,2-bisamidine 4 -(4-maleimidoiminophenoxy) -phenylphosphonium propane, bis (3-ethyl-5-methyl-4-maleimidophenyl) methane, polycyclobutane oxide- At least one member of the group consisting of bis (4-maleimide iminobenzoate) and a maleimide compound represented by the following formula (7); [化 5] In formula (7), R 6 each independently represents a hydrogen atom or a methyl group, and n 1 represents an integer of 1 or more. 如申請專利範圍第1或2項之樹脂組成物,更包含選自由環氧樹脂、氰酸酯化合物及經烯基取代之納迪克醯亞胺(nadiimide)構成之群組中之至少1種。For example, the resin composition of item 1 or 2 of the patent application scope further includes at least one selected from the group consisting of epoxy resin, cyanate compound, and nadiimide substituted with alkenyl group. 如申請專利範圍第1或2項之樹脂組成物,更包含無機填充材(C)。For example, the resin composition in the scope of claims 1 or 2 further includes an inorganic filler (C). 如申請專利範圍第8項之樹脂組成物,其中,該無機填充材(C)包括選自由二氧化矽、氧化鋁及軟水鋁石構成之群組中之至少1種。For example, the resin composition according to item 8 of the patent application scope, wherein the inorganic filler (C) includes at least one selected from the group consisting of silica, alumina, and boehmite. 如申請專利範圍第8項之樹脂組成物,其中,該無機填充材(C)之含量相對於樹脂固體成分100質量份為30~500質量份。For example, the resin composition according to item 8 of the patent application range, wherein the content of the inorganic filler (C) is 30 to 500 parts by mass relative to 100 parts by mass of the resin solid content. 一種預浸體,具備:基材;及含浸或塗佈於該基材之如申請專利範圍第1至10項中任一項之樹脂組成物。A prepreg comprising: a substrate; and a resin composition impregnated or coated on the substrate as described in any one of claims 1 to 10 of the scope of patent application. 一種樹脂片,具備:支持體;及塗佈於該支持體之如申請專利範圍第1至10項中任一項之樹脂組成物。A resin sheet comprising: a support; and the resin composition according to any one of claims 1 to 10 applied to the support. 一種疊層板,係將1片以上之選自由如申請專利範圍第11項之預浸體、及如申請專利範圍第12項之樹脂片構成之群組中之至少1種重疊而成, 含有包含在選自由該預浸體及該樹脂片構成之群組中之至少1種中的樹脂組成物之硬化物。A laminated board is formed by stacking more than one piece of at least one selected from the group consisting of a prepreg such as item 11 of the patent application scope and a resin sheet such as item 12 of the patent application scope, and containing A hardened product of a resin composition included in at least one selected from the group consisting of the prepreg and the resin sheet. 一種覆金屬箔疊層板,具有選自由如申請專利範圍第11項之預浸體、及如申請專利範圍第12項之樹脂片構成之群組中之至少1種、及配置在選自由該預浸體及該樹脂片構成之群組中之至少1種之單面或兩面之金屬箔, 含有包含在選自由該預浸體及該樹脂片構成之群組中之至少1種中的樹脂組成物之硬化物。A metal foil-clad laminate having at least one member selected from the group consisting of a prepreg as in item 11 of the patent application scope and a resin sheet as in item 12 of the patent application scope, and arranged in a group selected from the group consisting of A prepreg and at least one kind of metal foil in a group consisting of the resin sheet and a resin containing at least one kind selected from the group consisting of the prepreg and the resin sheet A hardened composition. 一種印刷電路板,含有絕緣層及形成在該絕緣層之表面之導體層, 該絕緣層含有如申請專利範圍第1至10項中任一項之樹脂組成物。A printed circuit board includes an insulating layer and a conductor layer formed on a surface of the insulating layer, and the insulating layer contains the resin composition according to any one of claims 1 to 10. 一種樹脂組成物之製造方法,包括下列步驟: 使由下式(1a)表示之1價取代基與苯酚性羥基直接鍵結在芳香環而成之芳香族化合物(A1)、與會和苯酚性羥基反應之化合物反應,而獲得由下式(1a)表示之1價取代基與下式(1b)表示之1價取代基直接鍵結在芳香環而成之芳香族化合物(A); 摻合該芳香族化合物(A)與馬來醯亞胺化合物(B)之步驟; CH2 =CRa CH2 -  (1a) Rb O-  (1b) 式(1a)中,Ra 表示氫原子或1價有機基,式(1b)中,Rb 表示1價有機基。A method for producing a resin composition, comprising the following steps: an aromatic compound (A1) in which a monovalent substituent represented by the following formula (1a) and a phenolic hydroxyl group are directly bonded to an aromatic ring; a meeting; and a phenolic hydroxyl group The reacted compound is reacted to obtain an aromatic compound (A) in which a monovalent substituent represented by the following formula (1a) and a monovalent substituent represented by the following formula (1b) are directly bonded to an aromatic ring; Step of aromatic compound (A) and maleimide compound (B); CH 2 = CR a CH 2- (1a) R b O- (1b) In the formula (1a), R a represents a hydrogen atom or 1 Valent organic group, in the formula (1b), R b represents a monovalent organic group.
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