TW201824404A - A method of semiconductor package without substrate - Google Patents
A method of semiconductor package without substrate Download PDFInfo
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- TW201824404A TW201824404A TW105143430A TW105143430A TW201824404A TW 201824404 A TW201824404 A TW 201824404A TW 105143430 A TW105143430 A TW 105143430A TW 105143430 A TW105143430 A TW 105143430A TW 201824404 A TW201824404 A TW 201824404A
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- package
- metal
- adhesive layer
- transparent substrate
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 75
- 239000000758 substrate Substances 0.000 title claims abstract description 60
- 238000000034 method Methods 0.000 title claims abstract description 12
- 239000012790 adhesive layer Substances 0.000 claims abstract description 52
- 239000002184 metal Substances 0.000 claims description 73
- 239000008393 encapsulating agent Substances 0.000 claims description 45
- 239000013078 crystal Substances 0.000 claims description 13
- 239000010410 layer Substances 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 239000000853 adhesive Substances 0.000 claims description 5
- 230000001070 adhesive effect Effects 0.000 claims description 5
- 239000007769 metal material Substances 0.000 claims description 5
- 238000003825 pressing Methods 0.000 claims description 3
- 238000005520 cutting process Methods 0.000 claims 3
- 230000001678 irradiating effect Effects 0.000 claims 3
- 239000003292 glue Substances 0.000 abstract 3
- 238000004806 packaging method and process Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000011810 insulating material Substances 0.000 description 3
- 238000004382 potting Methods 0.000 description 3
- -1 acryl Chemical group 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/2612—Auxiliary members for layer connectors, e.g. spacers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/93—Batch processes
- H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L2224/96—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being encapsulated in a common layer, e.g. neo-wafer or pseudo-wafer, said common layer being separable into individual assemblies after connecting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/93—Batch processes
- H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L2224/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
Landscapes
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Led Device Packages (AREA)
Abstract
Description
本發明乃是關於一種半導體封裝方法,特別是指一種無基板的半導體封裝方法。 The present invention relates to a semiconductor packaging method, and more particularly to a substrateless semiconductor packaging method.
請參考第1圖,第1圖揭示傳統半導體封裝,其具有一晶粒20,晶粒20經由黏膠30附著於基板10之上,晶粒以傳統打線方式(Wire bonding)或以覆晶方式(Flip chip)(未繪示)與基板10上的導電線路連接,而后經由基板10上的導電通孔40電性連接至封裝焊墊50。此種傳統的封裝方式,不管是以打線方式或覆晶方式置放晶粒,其最後封裝的厚度H1都太厚,不利於微型化的電子產品。以第1圖為例,最後封裝厚度H1等於基板10本身的厚度H2加上封裝膠厚度H3。因應微型化電子產品的需求,有必要使封裝後半導體產品的厚度減小。 Please refer to FIG. 1. FIG. 1 illustrates a conventional semiconductor package having a die 20, and the die 20 is attached to the substrate 10 via the adhesive 30. The die is wire bonded or flipped. A Flip chip (not shown) is connected to the conductive line on the substrate 10 and then electrically connected to the package pad 50 via the conductive via 40 on the substrate 10. In this conventional packaging method, whether the die is placed in a wire bonding manner or a flip chip manner, the thickness H1 of the final package is too thick, which is disadvantageous for miniaturized electronic products. Taking FIG. 1 as an example, the final package thickness H1 is equal to the thickness H2 of the substrate 10 itself plus the thickness H3 of the package. In response to the demand for miniaturized electronic products, it is necessary to reduce the thickness of semiconductor products after packaging.
一種無基板半導體封裝的製造方法,包含:提供至少一個半導體晶粒,半導體晶粒的每一個接合墊上具有一金屬凸塊。提供一透光基板,其具有一第一表面與一第二表面。形成一黏著層在透光基板的第一表面上。將半導體晶粒以覆晶方式附著於黏著層上。 A method of fabricating a substrateless semiconductor package, comprising: providing at least one semiconductor die, each of the semiconductor pads having a metal bump thereon. A light transmissive substrate is provided having a first surface and a second surface. An adhesive layer is formed on the first surface of the light transmissive substrate. The semiconductor crystal grains are attached to the adhesive layer in a flip chip manner.
提供一凹形模具,並灌注一封裝膠至凹形模具的凹槽裡。將附著有半導體晶粒的透明基板倒置,使透明基板以第二表面朝上與第一表面朝下的方式,置放入凹形模具裡,使半導體晶粒沒入封裝膠,但露出部份等金屬凸塊於封裝膠外。固化封裝膠後,移除凹形模具。從該透光基板的第二表面上照射紫外光線,使黏著層脆化。移除透光基板與黏著層以形成一封裝件,其中封裝件露出每一個金屬凸塊的頂部。 A concave mold is provided and an encapsulant is poured into the recess of the female mold. Inverting the transparent substrate to which the semiconductor crystal grains are attached, and placing the transparent substrate in the concave mold with the second surface facing upward and the first surface facing downward, so that the semiconductor crystal grains are immersed in the encapsulant, but the exposed portion The metal bumps are outside the encapsulant. After curing the encapsulant, the concave mold is removed. Ultraviolet light is irradiated from the second surface of the light-transmitting substrate to embrittle the adhesive layer. The transparent substrate and the adhesive layer are removed to form a package, wherein the package exposes the top of each of the metal bumps.
另一方法為將半導體晶粒以覆晶方式附著於黏著層上後。灌注一封裝膠在黏著層與半導體晶粒上。使用一凹形模具壓合封裝膠。移除凹形模具。 從透光基板的第二表面上照射紫外光線,使黏著層脆化。移除透光基板與黏著層以形成一封裝件,其中封裝件露出每一個金屬凸塊的頂部。 Another method is to attach the semiconductor crystal grains to the adhesive layer in a flip chip manner. A potting compound is poured over the adhesive layer and the semiconductor die. The encapsulant is pressed using a concave mold. Remove the concave mold. The ultraviolet light is irradiated from the second surface of the light-transmitting substrate to embrittle the adhesive layer. The transparent substrate and the adhesive layer are removed to form a package, wherein the package exposes the top of each of the metal bumps.
另一方法,包含提供一透光基板。形成一黏著層在透光基板的第一表面上,形成一金屬圖案層在黏著層上,其中金屬圖案層包含有複數個金屬內接墊、複數個金屬外接墊與複數條金屬連線。等半導體晶粒以覆晶方式附著於金屬圖案層上,使每一個金屬凸塊附著於每一個金屬內接墊。灌注一封裝膠在金屬圖案層與半導體晶粒上。使用一凹形模具壓合封裝膠,使封裝膠定型固化封裝膠後,移除凹形模具。從透光基板的第二表面上照射紫外光線,使黏著層脆化。移除透光基板與黏著層以形成一封裝件,其中封裝件露出等金屬外接墊的底部。 Another method includes providing a light transmissive substrate. Forming an adhesive layer on the first surface of the transparent substrate to form a metal pattern layer on the adhesive layer, wherein the metal pattern layer comprises a plurality of metal inner pads, a plurality of metal outer pads and a plurality of metal wires. The semiconductor crystal grains are attached to the metal pattern layer in a flip chip manner, so that each metal bump is attached to each of the metal inner pads. An encapsulant is poured over the metal pattern layer and the semiconductor die. The concave mold is removed by pressing the encapsulant with a concave mold to fix the encapsulant after curing the encapsulant. The ultraviolet light is irradiated from the second surface of the light-transmitting substrate to embrittle the adhesive layer. The transparent substrate and the adhesive layer are removed to form a package, wherein the package exposes the bottom of the metal ferrule.
100 101 102‧‧‧半導體晶粒 100 101 102‧‧‧Semiconductor grain
110‧‧‧金屬凸塊 110‧‧‧Metal bumps
111‧‧‧頂部 111‧‧‧ top
200‧‧‧透光基板 200‧‧‧Transparent substrate
201‧‧‧第一表面 201‧‧‧ first surface
202‧‧‧第二表面 202‧‧‧ second surface
210‧‧‧黏著層 210‧‧‧Adhesive layer
300‧‧‧凹形模具 300‧‧‧ concave mold
301‧‧‧凹槽 301‧‧‧ Groove
400‧‧‧封裝膠 400‧‧‧Package
900‧‧‧封裝件 900‧‧‧Package
910‧‧‧A型子封裝件 910‧‧‧A type sub-package
920‧‧‧B型子封裝件 920‧‧‧B type sub-package
500‧‧‧金屬圖案 500‧‧‧Metal pattern
510‧‧‧金屬內接墊 510‧‧‧Metal inner pad
520‧‧‧金屬外接墊 520‧‧‧Metal ferrule
530‧‧‧金屬連線 530‧‧‧Metal connection
501‧‧‧底部 501‧‧‧ bottom
600‧‧‧絕緣墊 600‧‧‧Insulation mat
UV‧‧‧紫外光線 UV‧‧‧UV light
為讓本發明之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之詳細說明如下:第1圖繪示傳統半導體封裝方法;第2(A)圖繪示一實施例中半導體晶粒置放於透明基板;第2(B)圖繪示一實施例中半導體晶粒浸入封裝膠;第2(C)圖繪示一實施例中移除透明基板;第2(D)圖繪示一實施例中形成封裝件;第2(E)圖繪示一實施例中分割出子封裝件;第3(A)圖繪示一實施例中半導體晶粒置放於透明基板;第3(B)圖繪示一實施例中灌注封裝膠;第3(C)圖繪示一實施例中壓模封裝膠;第3(D)圖繪示一實施例中移除凹型模具;第3(E)圖繪示一實施例中移除透明基板,形成封裝件;第3(F)圖繪示一實施例中分割出子封裝件;第4(A)圖繪示一實施例中半在透明基板上形成金屬圖案;第4(B)圖繪示一實施例中半導體晶粒置放於透明基板上;第4(C)圖繪示一實施例中灌注封裝膠;第4(D)圖繪示一實施例中壓模封裝膠;第4(E)圖繪示一實施例中移除透明基板,形成封裝件; 第4(F)圖繪示一實施例中分割出子封裝件。 The above and other objects, features, advantages and embodiments of the present invention will become more <RTIgt; <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; In the embodiment, the semiconductor die is placed on the transparent substrate; the second (B) is an embodiment in which the semiconductor die is immersed in the encapsulant; and the second (C) is an embodiment in which the transparent substrate is removed; (D) illustrates a package formed in an embodiment; FIG. 2(E) illustrates a sub-package divided in an embodiment; and FIG. 3(A) illustrates a semiconductor die placed in an embodiment. a transparent substrate; FIG. 3(B) illustrates a potting encapsulant in an embodiment; FIG. 3(C) illustrates a stamper encapsulant in an embodiment; and FIG. 3(D) illustrates an embodiment in which removal is performed a concave mold; FIG. 3(E) illustrates a transparent substrate removed in an embodiment to form a package; FIG. 3(F) illustrates a sub-package divided in an embodiment; and FIG. 4(A) shows In one embodiment, a metal pattern is formed on a transparent substrate; a fourth (B) is an embodiment in which a semiconductor die is placed on a transparent substrate; and a fourth (C) is an embodiment of a potting package. ; 4(D) is a view showing a stamper encapsulant in an embodiment; FIG. 4(E) is a view showing an embodiment of removing a transparent substrate to form a package; and FIG. 4(F) is a diagram showing division in an embodiment; Out of the package.
以下將以圖式揭露本發明之複數個實施方式,為明確說明起見,許多實務上的細節將在以下敘述中一併說明。然而,應瞭解到,這些實務上的細節不應用以限制本發明。也就是說,在本發明部分實施方式中,這些實務上的細節是非必要的。此外,為簡化圖式起見,一些習知慣用的結構與元件在圖式中將以簡單示意的方式繪示之。 The embodiments of the present invention are disclosed in the following drawings, and the details of However, it should be understood that these practical details are not intended to limit the invention. That is, in some embodiments of the invention, these practical details are not necessary. In addition, some of the conventional structures and elements are shown in the drawings in a simplified schematic manner in order to simplify the drawings.
第2(A)~2(E)圖為本發明一實施例說明圖,請參考第2(A)圖,首先提供複數個半導體晶粒100 101 103,在該等半導體晶粒上的每個接合墊上(未繪示)長金屬凸塊110。提供一透光基板200,其具有第一表面201與第二表面202,且其材質為玻璃、石英、壓克力等可以透過可見光與紫外光的材質,在透光基板200的第一表面201上塗佈一層黏著層210。然後半導體晶粒100 101 103以覆晶的方式,以金屬凸塊110的頂部111接觸並固著在黏著層210上。提供一凹形模具300,並在凹形模具300的凹槽301內注入封裝膠400。 2(A) to 2(E) are diagrams illustrating an embodiment of the present invention. Referring to FIG. 2(A), a plurality of semiconductor dies 100 101 103 are first provided, each of the semiconductor dies. A long metal bump 110 is placed on the bonding pad (not shown). A transparent substrate 200 is provided, which has a first surface 201 and a second surface 202, and is made of glass, quartz, acryl, etc., which can transmit visible light and ultraviolet light, on the first surface 201 of the transparent substrate 200. An adhesive layer 210 is coated on the upper layer. The semiconductor die 100 101 103 is then contacted with the top portion 111 of the metal bump 110 and fixed to the adhesive layer 210 in a flip chip manner. A concave mold 300 is provided, and the encapsulant 400 is injected into the recess 301 of the concave mold 300.
然後,請參考第2(B)圖,將整個透光基板200倒置,以第二表面202朝上,第一表面201朝下的方式把固著在黏著層210上的半導體晶粒100 101 103完並浸入封裝膠400內,但露出部分的金屬凸塊110。此時封裝膠400具有高度的流動性,使封裝膠400可以完全填滿半導體晶粒100 101 103間的縫隙。 Then, referring to FIG. 2(B), the entire transparent substrate 200 is inverted, and the second surface 202 faces upward, and the first surface 201 faces downward to fix the semiconductor die 100 101 103 on the adhesive layer 210. After being immersed in the encapsulant 400, a portion of the metal bumps 110 are exposed. At this time, the encapsulant 400 has a high fluidity, so that the encapsulant 400 can completely fill the gap between the semiconductor crystal grains 100 101 103 .
接下來,請同時參考第2(C)圖與第2(D)圖,由透光基板200的第二表面202照射紫外光線(UV),使黏著層210脆化而失去黏性,然後移除透光基板200與黏著層210,最後移除凹形模具300而形成一封裝件900。封裝件900是以封裝膠400包覆半導體晶粒100 101 102,但露出金屬凸塊110的頂部111。本實施例封裝件900包覆3個半導體晶粒,其僅為例示,實際應用上可包覆複數個半導體晶粒。最後請參考第2(E)圖,將封裝件900切割成數個子封裝件910,每個封裝件910以封裝膠400包覆一個半導體晶粒,並露出金屬凸塊110的頂部111,形成一無基板的半導體封裝件,金屬凸塊110同時成為半導體封裝件的外接腳。 Next, referring to the second (C) and the second (D), the ultraviolet light (UV) is irradiated from the second surface 202 of the transparent substrate 200 to make the adhesive layer 210 embrittled and lose the viscosity, and then move. In addition to the transparent substrate 200 and the adhesive layer 210, the concave mold 300 is finally removed to form a package 900. The package 900 encloses the semiconductor die 100 101 102 with an encapsulant 400, but exposes the top 111 of the metal bump 110. The package 900 of the present embodiment covers three semiconductor dies, which are merely examples, and may be coated with a plurality of semiconductor dies in practical applications. Finally, referring to FIG. 2(E), the package 900 is cut into a plurality of sub-packages 910. Each package 910 encapsulates a semiconductor die with a package adhesive 400 and exposes the top portion 111 of the metal bump 110 to form a The semiconductor package of the substrate, the metal bumps 110 simultaneously become the external pins of the semiconductor package.
第3(A)~3(F)圖為本發明一實施例說明圖,請參考第3(A)圖,首先提供複數個半導體晶粒100 101 103,在該等半導體晶粒上的每個接合墊上(未 繪示)長金屬凸塊110。提供一透光基板200,其具有第一表面201與第二表面202,且其材質為玻璃、石英、壓克力等可以透過可見光與紫外光的材質,在透光基板200的第一表面201上塗佈一層黏著層210。然後半導體晶粒100 101 103以覆晶的方式,以金屬凸塊110的頂部111接觸並固著在黏著層210上。 3(A) to 3(F) are diagrams illustrating an embodiment of the present invention. Referring to FIG. 3(A), a plurality of semiconductor dies 100 101 103 are first provided, each of the semiconductor dies. A long metal bump 110 is placed on the bonding pad (not shown). A transparent substrate 200 is provided, which has a first surface 201 and a second surface 202, and is made of glass, quartz, acryl, etc., which can transmit visible light and ultraviolet light, on the first surface 201 of the transparent substrate 200. An adhesive layer 210 is coated on the upper layer. The semiconductor die 100 101 103 is then contacted with the top portion 111 of the metal bump 110 and fixed to the adhesive layer 210 in a flip chip manner.
請參考第3(B)圖,在黏著層210上方注入封裝膠400,然後以一凹形模具300壓合封裝膠400。請參考第3(C)圖,對凹形模具300施力,以凹槽301的形狀壓合封裝膠400並使之定型,封裝膠400具有流動性,其會填滿黏著層210與半導體晶粒100 101 102間的縫隙。對凹形模具300施加較大的壓力,可以讓封裝膠400有更好的緻密度。請參考第3(D)圖,固化封裝膠400後,移除凹形模具300。固化封裝膠400的方式包含高溫烘烤,或是以紫外光線照射。 Referring to FIG. 3(B), the encapsulant 400 is injected over the adhesive layer 210, and then the encapsulant 400 is pressed by a concave mold 300. Referring to FIG. 3(C), the concave mold 300 is biased, and the encapsulant 400 is pressed and shaped in the shape of the groove 301. The encapsulant 400 has fluidity, which fills the adhesive layer 210 and the semiconductor crystal. A gap between the granules 100 101 102 . Applying a relatively large pressure to the concave mold 300 allows the encapsulant 400 to have a better density. Referring to FIG. 3(D), after the encapsulant 400 is cured, the concave mold 300 is removed. The manner in which the encapsulant 400 is cured includes high temperature baking or irradiation with ultraviolet light.
請參考第3(E)圖,使用紫外光線從透光基板200的第二表面202照射黏著層210,使黏著層210脆化而降低黏性,接著移除透光基板200與黏著層210而形成一封裝件900。封裝件900是以封裝膠400包覆半導體晶粒100 101 102,但露出金屬凸塊110的頂部111。本實施例封裝件900包覆3個半導體晶粒,其僅為例示,實際應用上可包覆複數個半導體晶粒。最後請參考第3(F)圖,將封裝件900切割成數個子封裝件910,每個封裝件910以封裝膠400包覆一個半導體晶粒,並露出金屬凸塊110的頂部111,形成一無基板的半導體封裝件,金屬凸塊110同時成為半導體封裝件的外接腳。 Referring to FIG. 3(E), the adhesive layer 210 is irradiated from the second surface 202 of the transparent substrate 200 by using ultraviolet light to embrittle the adhesive layer 210 to reduce the viscosity, and then the transparent substrate 200 and the adhesive layer 210 are removed. A package 900 is formed. The package 900 encloses the semiconductor die 100 101 102 with an encapsulant 400, but exposes the top 111 of the metal bump 110. The package 900 of the present embodiment covers three semiconductor dies, which are merely examples, and may be coated with a plurality of semiconductor dies in practical applications. Finally, referring to FIG. 3(F), the package 900 is cut into a plurality of sub-packages 910, each of which encapsulates a semiconductor die with a package adhesive 400 and exposes the top portion 111 of the metal bump 110 to form a The semiconductor package of the substrate, the metal bumps 110 simultaneously become the external pins of the semiconductor package.
第4(A)~4(F)圖為本發明一實施例說明圖,請參考第4(A)圖,首先在透光基板200的第一表面201形成一黏著層210,然後在黏著層210形成一絕緣材料,經微影蝕刻製程圖案化上述的絕緣材料而形成絕緣墊600。然後形成一金屬材料,接著經微影蝕刻製程圖案化上述的金屬材料而形成一金屬圖案500。形成絕緣材料與金屬材料的方法包含物理氣相沉積(PVD)、化學氣相沉積(CVD)或印刷塗佈。 4(A) to 4(F) are explanatory views of an embodiment of the present invention. Referring to FIG. 4(A), an adhesive layer 210 is first formed on the first surface 201 of the transparent substrate 200, and then in an adhesive layer. 210 forms an insulating material, and the insulating material is patterned by a lithography process to form an insulating pad 600. Then, a metal material is formed, and then the metal material is patterned by a photolithography process to form a metal pattern 500. Methods of forming an insulating material and a metal material include physical vapor deposition (PVD), chemical vapor deposition (CVD), or printing coating.
金屬圖案500包含金屬內接墊510、金屬外接墊520與金屬連線530。金屬內接墊510置於絕緣墊600上,金屬外接墊520與金屬連線530在黏著層210上。請參考4(B)圖,半導體晶粒100 101 102以覆晶方式將金屬凸塊110附著並固定在金屬內接墊510上,半導體晶粒100 101 102之間若有需要彼此電性連接,則以金屬連線530連接。 The metal pattern 500 includes a metal inner pad 510, a metal outer pad 520, and a metal wire 530. The metal inner pad 510 is placed on the insulating pad 600, and the metal outer pad 520 and the metal wire 530 are on the adhesive layer 210. Referring to FIG. 4(B), the semiconductor die 100 101 102 is attached and fixed on the metal pad 510 in a flip chip manner. If the semiconductor die 100 101 102 need to be electrically connected to each other, Then, the metal connection 530 is connected.
接著請參考第4(C)圖,在黏著層210上方注入封裝膠400,然後 以一凹形模具300壓合封裝膠400。請同時參考第4(D)圖,對凹形模具300施力,以凹槽301的形狀壓合封裝膠400並使之定型,封裝膠400具有流動性,其會填滿金屬圖案500、絕緣墊600與半導體晶粒100 101 102間的縫隙。對凹形模具300施加較大的壓力,可以讓封裝膠400有更好的緻密度。固化封裝膠400後,移除凹形模具300。固化封裝膠400的方式包含高溫烘烤,或是以紫外光線照射。 Next, referring to FIG. 4(C), the encapsulant 400 is injected over the adhesive layer 210, and then the encapsulant 400 is pressed by a concave mold 300. Referring to FIG. 4(D), the concave mold 300 is biased, and the encapsulant 400 is pressed and shaped in the shape of the groove 301. The encapsulant 400 has fluidity, which fills the metal pattern 500 and is insulated. A gap between the pad 600 and the semiconductor die 100 101 102. Applying a relatively large pressure to the concave mold 300 allows the encapsulant 400 to have a better density. After the encapsulant 400 is cured, the concave mold 300 is removed. The manner in which the encapsulant 400 is cured includes high temperature baking or irradiation with ultraviolet light.
請參考4(E)圖,使用紫外光線從透光基板200的第二表面202照射黏著層210,使黏著層210脆化而降低黏性,接著移除透光基板200與黏著層210而形成一封裝件900。封裝件900是以封裝膠400包覆半導體晶粒100 101 102,但露出金屬外接墊520與金屬連線530的底部501。 Referring to FIG. 4(E), the adhesive layer 210 is irradiated from the second surface 202 of the transparent substrate 200 by using ultraviolet light to embrittle the adhesive layer 210 to reduce the viscosity, and then the transparent substrate 200 and the adhesive layer 210 are removed to form. A package 900. The package 900 encloses the semiconductor die 100 101 102 with the encapsulant 400, but exposes the bottom 501 of the metal ferrule 520 and the metal trace 530.
最後請參考第4(F)圖,將封裝件900切割成一個A型子封裝件910與一個B型子封裝件920,但本圖僅為例示,實際應用上封裝件900可分割成複數個A型子封裝件910與複數個B型子封裝件920。A型子封裝件910是以封裝膠400包覆一個半導體晶粒100,金屬外接墊520形成子封裝件910的外接腳,完成一無基板的半導體封裝。B型子封裝件920是以封裝膠400包覆至少二個半導體晶粒101 102,晶粒與晶粒之間以金屬連線530電性連接,金屬外接墊520形成子封裝件920的外接腳,完成一無基板的多半導體晶粒封裝模組。 Finally, referring to FIG. 4(F), the package 900 is cut into an A-type sub-package 910 and a B-type sub-package 920. However, the figure is merely an example. In practical applications, the package 900 can be divided into a plurality of parts. The A-type sub-package 910 and the plurality of B-type sub-packages 920. The A-type sub-package 910 encloses a semiconductor die 100 with a package adhesive 400, and the metal external pad 520 forms an external pin of the sub-package 910 to complete a substrateless semiconductor package. The B-type sub-package 920 is coated with at least two semiconductor dies 101 102 by an encapsulant 400. The die and the die are electrically connected by a metal connection 530. The metal ferrule 520 forms an external pin of the sub-package 920. A multi-semiconductor die package module without a substrate is completed.
本實施例金屬圖案的主要作用為重新佈線(Re-distriubtion),若半導體晶粒的金屬凸塊相當多且密集,不利於直接利用凸塊頂面焊接到系統板子,則可利用金屬圖案重新佈線,使封裝後的半導體晶粒具有較大面積與大間距的外接腳。另一作用為當作為多模組封裝時,可利用金屬圖案上的金屬連線作為數個半導體晶粒間的電性連接,同一子封裝件內的半導體晶粒包含不同功能的晶粒。例如一個控制晶片與一個記憶體晶片同時封裝在一個子封裝件裡,或者一個高頻晶片(RF)與一基頻晶片(Base band)同時封裝在一個子封裝件裡,但不限於上述兩例子。 The main function of the metal pattern in this embodiment is re-distrition. If the metal bumps of the semiconductor die are rather and dense, it is not suitable for directly soldering the top surface of the bump to the system board, and the metal pattern can be re-routed. The packaged semiconductor die has a large area and a large pitch of the external pins. Another function is that when used as a multi-module package, the metal wiring on the metal pattern can be used as an electrical connection between the plurality of semiconductor dies, and the semiconductor dies in the same sub-package contain crystal grains having different functions. For example, a control chip and a memory chip are simultaneously packaged in one sub-package, or a high-frequency chip (RF) and a base band are simultaneously packaged in one sub-package, but are not limited to the above two examples. .
雖然本發明已以實施方式揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and the present invention can be modified and modified without departing from the spirit and scope of the present invention. The scope is subject to the definition of the scope of the patent application attached.
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TWI694555B (en) * | 2019-02-28 | 2020-05-21 | 鴻海精密工業股份有限公司 | Chip packaging structure and method for manufacturing the same |
CN111627867A (en) * | 2019-02-28 | 2020-09-04 | 富泰华工业(深圳)有限公司 | Chip packaging structure and manufacturing method thereof |
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TWI694555B (en) * | 2019-02-28 | 2020-05-21 | 鴻海精密工業股份有限公司 | Chip packaging structure and method for manufacturing the same |
CN111627867A (en) * | 2019-02-28 | 2020-09-04 | 富泰华工业(深圳)有限公司 | Chip packaging structure and manufacturing method thereof |
US11056411B2 (en) | 2019-02-28 | 2021-07-06 | Socle Technology Corp. | Chip packaging structure |
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