TW201740202A - Photosensitive resin composition, photosensitive resin layer using the same and black column spacer - Google Patents
Photosensitive resin composition, photosensitive resin layer using the same and black column spacerInfo
- Publication number
- TW201740202A TW201740202A TW106105516A TW106105516A TW201740202A TW 201740202 A TW201740202 A TW 201740202A TW 106105516 A TW106105516 A TW 106105516A TW 106105516 A TW106105516 A TW 106105516A TW 201740202 A TW201740202 A TW 201740202A
- Authority
- TW
- Taiwan
- Prior art keywords
- photosensitive resin
- weight
- epoxy group
- containing acrylic
- resin composition
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 85
- 229920005989 resin Polymers 0.000 title claims abstract description 81
- 239000011347 resin Substances 0.000 title claims abstract description 81
- 125000006850 spacer group Chemical group 0.000 title claims abstract description 22
- 125000003700 epoxy group Chemical group 0.000 claims abstract description 89
- 239000003086 colorant Substances 0.000 claims abstract description 64
- 239000000178 monomer Substances 0.000 claims abstract description 24
- 239000003999 initiator Substances 0.000 claims abstract description 18
- 239000002904 solvent Substances 0.000 claims abstract description 17
- 239000011230 binding agent Substances 0.000 claims abstract description 16
- 239000000126 substance Substances 0.000 claims description 41
- 229920005822 acrylic binder Polymers 0.000 claims description 40
- 239000000049 pigment Substances 0.000 claims description 35
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 33
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims description 16
- 239000003795 chemical substances by application Substances 0.000 claims description 11
- 125000003118 aryl group Chemical group 0.000 claims description 9
- 229910052731 fluorine Inorganic materials 0.000 claims description 9
- 238000002834 transmittance Methods 0.000 claims description 9
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 8
- 239000000654 additive Substances 0.000 claims description 8
- 239000007822 coupling agent Substances 0.000 claims description 8
- 239000011737 fluorine Substances 0.000 claims description 8
- 239000004094 surface-active agent Substances 0.000 claims description 8
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 claims description 7
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims description 6
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 4
- 239000004925 Acrylic resin Substances 0.000 claims description 4
- 229920000178 Acrylic resin Polymers 0.000 claims description 4
- 125000004429 atom Chemical group 0.000 claims description 4
- 239000001055 blue pigment Substances 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- 239000001054 red pigment Substances 0.000 claims description 4
- 125000006832 (C1-C10) alkylene group Chemical group 0.000 claims description 3
- KQIGMPWTAHJUMN-UHFFFAOYSA-N 3-aminopropane-1,2-diol Chemical compound NCC(O)CO KQIGMPWTAHJUMN-UHFFFAOYSA-N 0.000 claims description 3
- 239000007870 radical polymerization initiator Substances 0.000 claims description 2
- -1 acryl Chemical group 0.000 abstract description 32
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 35
- 229920006223 adhesive resin Polymers 0.000 description 24
- 238000000034 method Methods 0.000 description 23
- 239000003522 acrylic cement Substances 0.000 description 19
- 239000006185 dispersion Substances 0.000 description 16
- 239000002270 dispersing agent Substances 0.000 description 13
- 239000000203 mixture Substances 0.000 description 10
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 9
- 239000004593 Epoxy Substances 0.000 description 8
- 125000000217 alkyl group Chemical group 0.000 description 8
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 8
- 150000002148 esters Chemical class 0.000 description 8
- 239000010408 film Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- 239000006229 carbon black Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 238000001723 curing Methods 0.000 description 6
- 239000004840 adhesive resin Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 5
- 238000011161 development Methods 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 229910017053 inorganic salt Inorganic materials 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 4
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 4
- 229940022663 acetate Drugs 0.000 description 4
- 239000012965 benzophenone Substances 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 4
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 4
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 3
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 3
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Natural products CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- WWZKQHOCKIZLMA-UHFFFAOYSA-N Caprylic acid Natural products CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 235000000126 Styrax benzoin Nutrition 0.000 description 3
- 244000028419 Styrax benzoin Species 0.000 description 3
- 235000008411 Sumatra benzointree Nutrition 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 3
- 229960002130 benzoin Drugs 0.000 description 3
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 235000019382 gum benzoic Nutrition 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 239000000080 wetting agent Substances 0.000 description 3
- 125000006835 (C6-C20) arylene group Chemical group 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- CNJRPYFBORAQAU-UHFFFAOYSA-N 1-ethoxy-2-(2-methoxyethoxy)ethane Chemical compound CCOCCOCCOC CNJRPYFBORAQAU-UHFFFAOYSA-N 0.000 description 2
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 2
- SFAMKDPMPDEXGH-UHFFFAOYSA-N 2-hydroxyethyl propanoate Chemical compound CCC(=O)OCCO SFAMKDPMPDEXGH-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 2
- 235000010599 Verbascum thapsus Nutrition 0.000 description 2
- 244000178289 Verbascum thapsus Species 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 150000005215 alkyl ethers Chemical class 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 150000004056 anthraquinones Chemical class 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 150000007942 carboxylates Chemical class 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- MTZQAGJQAFMTAQ-UHFFFAOYSA-N ethyl benzoate Chemical compound CCOC(=O)C1=CC=CC=C1 MTZQAGJQAFMTAQ-UHFFFAOYSA-N 0.000 description 2
- 125000005842 heteroatom Chemical group 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 239000003906 humectant Substances 0.000 description 2
- WVDDGKGOMKODPV-UHFFFAOYSA-N hydroxymethyl benzene Natural products OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 2
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 239000004922 lacquer Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 2
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 2
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 1
- FJKOQFIGFHTRRW-UHFFFAOYSA-N (2-methoxy-3-methylphenyl)-(3-methylphenyl)methanone Chemical compound COC1=C(C)C=CC=C1C(=O)C1=CC=CC(C)=C1 FJKOQFIGFHTRRW-UHFFFAOYSA-N 0.000 description 1
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- DIIIISSCIXVANO-UHFFFAOYSA-N 1,2-Dimethylhydrazine Chemical compound CNNC DIIIISSCIXVANO-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- BUZYGTVTZYSBCU-UHFFFAOYSA-N 1-(4-chlorophenyl)ethanone Chemical compound CC(=O)C1=CC=C(Cl)C=C1 BUZYGTVTZYSBCU-UHFFFAOYSA-N 0.000 description 1
- PYKHTOHGCVJJMZ-UHFFFAOYSA-N 1-(4-phenylsulfanylphenyl)butan-1-one Chemical compound C1=CC(C(=O)CCC)=CC=C1SC1=CC=CC=C1 PYKHTOHGCVJJMZ-UHFFFAOYSA-N 0.000 description 1
- VMCRQYHCDSXNLW-UHFFFAOYSA-N 1-(4-tert-butylphenyl)-2,2-dichloroethanone Chemical compound CC(C)(C)C1=CC=C(C(=O)C(Cl)Cl)C=C1 VMCRQYHCDSXNLW-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- BPIUIOXAFBGMNB-UHFFFAOYSA-N 1-hexoxyhexane Chemical compound CCCCCCOCCCCCC BPIUIOXAFBGMNB-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- YIKSHDNOAYSSPX-UHFFFAOYSA-N 1-propan-2-ylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)C YIKSHDNOAYSSPX-UHFFFAOYSA-N 0.000 description 1
- OAMHTTBNEJBIKA-UHFFFAOYSA-N 2,2,2-trichloro-1-phenylethanone Chemical compound ClC(Cl)(Cl)C(=O)C1=CC=CC=C1 OAMHTTBNEJBIKA-UHFFFAOYSA-N 0.000 description 1
- QQCHYQXRQHGKEX-UHFFFAOYSA-N 2,2,3,3-tetrakis(sulfanyl)propanoic acid Chemical compound OC(=O)C(S)(S)C(S)S QQCHYQXRQHGKEX-UHFFFAOYSA-N 0.000 description 1
- BRKORVYTKKLNKX-UHFFFAOYSA-N 2,4-di(propan-2-yl)thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C(C)C)=CC(C(C)C)=C3SC2=C1 BRKORVYTKKLNKX-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
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- YVWPDYFVVMNWDT-UHFFFAOYSA-N methyl 2-ethoxypropanoate Chemical compound CCOC(C)C(=O)OC YVWPDYFVVMNWDT-UHFFFAOYSA-N 0.000 description 1
- AKWHOGIYEOZALP-UHFFFAOYSA-N methyl 2-methoxy-2-methylpropanoate Chemical compound COC(=O)C(C)(C)OC AKWHOGIYEOZALP-UHFFFAOYSA-N 0.000 description 1
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- CQDGTJPVBWZJAZ-UHFFFAOYSA-N monoethyl carbonate Chemical compound CCOC(O)=O CQDGTJPVBWZJAZ-UHFFFAOYSA-N 0.000 description 1
- MWKFXSUHUHTGQN-UHFFFAOYSA-N n-decyl alcohol Natural products CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N n-hexanoic acid Natural products CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- ZNPKAOCQMDJBIK-UHFFFAOYSA-N nitrocyanamide Chemical compound [O-][N+](=O)NC#N ZNPKAOCQMDJBIK-UHFFFAOYSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- ZDHCZVWCTKTBRY-UHFFFAOYSA-N omega-Hydroxydodecanoic acid Natural products OCCCCCCCCCCCC(O)=O ZDHCZVWCTKTBRY-UHFFFAOYSA-N 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- FOWDZVNRQHPXDO-UHFFFAOYSA-N propyl hydrogen carbonate Chemical compound CCCOC(O)=O FOWDZVNRQHPXDO-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000001052 yellow pigment Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13398—Spacer materials; Spacer properties
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
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- Spectroscopy & Molecular Physics (AREA)
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- Architecture (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Mathematical Physics (AREA)
- Materials For Photolithography (AREA)
- Liquid Crystal (AREA)
Abstract
Description
本發明是有關於一種光敏性樹脂組成物以及應用其製造的光敏性樹脂層及黑色柱間隔物。The present invention relates to a photosensitive resin composition and a photosensitive resin layer and a black column spacer to which the same is applied.
製造例如彩色濾光片、液晶顯示材料、有機發光二極體、顯示面板材料等顯示裝置必須使用光敏性樹脂組成物。舉例而言,例如彩色液晶顯示器等彩色濾光片需要在例如紅色、綠色、藍色等著色層之間的邊界上具有黑色矩陣,以增強顯示對比度或發色團效果(chromophore effect)。此黑色矩陣可主要由光敏性樹脂組成物形成。It is necessary to use a photosensitive resin composition for producing a display device such as a color filter, a liquid crystal display material, an organic light emitting diode, or a display panel material. For example, a color filter such as a color liquid crystal display needs to have a black matrix at a boundary between colored layers such as red, green, blue, etc. to enhance display contrast or chromophore effect. This black matrix can be mainly formed of a photosensitive resin composition.
近來,已嘗試使用黑色矩陣材料作為支撐其間具有液晶層的兩個薄膜電晶體(thin-film transistor,TFT)與彩色濾光片(C/F)基板的柱間隔物,且此種柱間隔物被稱作黑色柱間隔物。Recently, attempts have been made to use a black matrix material as a column spacer supporting two thin-film transistor (TFT) and color filter (C/F) substrates having a liquid crystal layer therebetween, and such column spacers It is called a black column spacer.
當應藉由遮罩調整曝光劑量來達成圖案階差差異以及例如壓縮位移(compression displacement)、彈性恢復率(elasticity recovery rate)、裂斷強度(breaking strength)等基本特性時,黑色柱間隔物可恰當地起作用。When the difference in pattern step and the basic characteristics such as compression displacement, elasticity recovery rate, breaking strength, etc. should be achieved by adjusting the exposure dose by the mask, the black column spacer can be Work properly.
然而,用於黑色柱間隔物的傳統光敏性樹脂組成物僅具有優異的擋光性質但低的紫外(UV)透射率等,並因此在顯影之前不發生內部固化而僅發生表面固化,且因此具有可加工性劣化嚴重及低錐角的問題。However, the conventional photosensitive resin composition for black column spacers has only excellent light blocking properties but low ultraviolet (UV) transmittance and the like, and thus does not undergo internal curing before development, but only surface curing occurs, and thus It has the problem of serious deterioration of workability and low taper angle.
因此,持續進行對能夠解決此問題的新穎光敏性樹脂組成物的開發的研究。Therefore, research on the development of a novel photosensitive resin composition capable of solving this problem has been continued.
本發明一實施例提供一種具有提高的製程裕度及高可靠性的光敏性樹脂組成物。An embodiment of the present invention provides a photosensitive resin composition having improved process margin and high reliability.
本發明另一實施例提供一種應用所述光敏性樹脂組成物製造的光敏性樹脂層。Another embodiment of the present invention provides a photosensitive resin layer produced by applying the photosensitive resin composition.
本發明再一實施例提供一種包含所述光敏性樹脂層的黑色柱間隔物。A further embodiment of the present invention provides a black column spacer comprising the photosensitive resin layer.
本發明一實施例提供一種光敏性樹脂組成物,所述光敏性樹脂組成物包含:(A)含環氧基的丙烯酸系黏合劑樹脂;(B)光可聚合單體;(C)光聚合起始劑;(D)黑色著色劑,包含黑色有機著色劑;以及(E)溶劑,其中以所述光敏性樹脂組成物的總量計,包含1重量%至20重量%的量的所述含環氧基的丙烯酸系黏合劑樹脂。An embodiment of the present invention provides a photosensitive resin composition comprising: (A) an epoxy group-containing acrylic binder resin; (B) a photopolymerizable monomer; (C) photopolymerization a starter; (D) a black colorant comprising a black organic colorant; and (E) a solvent, wherein the amount of the photosensitive resin composition is from 1% by weight to 20% by weight, based on the total amount of the photosensitive resin composition An epoxy-based acrylic adhesive resin.
所述含環氧基的丙烯酸系黏合劑樹脂可包含含環氧基的丙烯酸重複單元,且以所述含環氧基的丙烯酸系黏合劑樹脂的總量計,可包含1重量%至40重量%的量的所述含環氧基的丙烯酸重複單元。The epoxy group-containing acrylic binder resin may comprise an epoxy group-containing acrylic repeating unit, and may comprise from 1% by weight to 40% by weight based on the total of the epoxy group-containing acrylic binder resin. The amount of the epoxy group-containing acrylic repeating unit in %.
所述含環氧基的丙烯酸系黏合劑樹脂可包含含環氧基的丙烯酸重複單元,且以所述含環氧基的丙烯酸系黏合劑樹脂的總量計,可包含10重量%至30重量%的量的所述含環氧基的丙烯酸重複單元。The epoxy group-containing acrylic binder resin may comprise an epoxy group-containing acrylic repeating unit, and may comprise 10% by weight to 30% by weight based on the total of the epoxy group-containing acrylic binder resin. The amount of the epoxy group-containing acrylic repeating unit in %.
所述含環氧基的丙烯酸系黏合劑樹脂可包含選自以下中的至少兩者:含環氧基的丙烯酸系黏合劑樹脂(A-1),以所述含環氧基的丙烯酸系黏合劑樹脂的總量計,包含15重量%至22重量%的含環氧基的丙烯酸重複單元;含環氧基的丙烯酸系黏合劑樹脂(A-2),以所述含環氧基的丙烯酸系黏合劑樹脂的總量計,包含23重量%至27重量%的含環氧基的丙烯酸重複單元;以及含環氧基的丙烯酸系黏合劑樹脂(A-3),以所述含環氧基的丙烯酸系黏合劑樹脂的總量計,包含28重量%至35重量%的含環氧基的丙烯酸重複單元。The epoxy group-containing acrylic binder resin may comprise at least two selected from the group consisting of epoxy group-containing acrylic binder resins (A-1), and the epoxy group-containing acrylic binder 15% by weight to 22% by weight of the epoxy group-containing acrylic repeating unit; the epoxy group-containing acrylic binder resin (A-2), and the epoxy group-containing acrylic acid The epoxy resin-containing acrylic repeating unit; and the epoxy group-containing acrylic adhesive resin (A-3), in the total amount of the binder resin, comprising the epoxy group-containing acrylic resin The total amount of the acrylic adhesive resin is from 28% by weight to 35% by weight based on the epoxy group-containing acrylic repeating unit.
所述含環氧基的丙烯酸重複單元可包含選自由化學式1至化學式4表示的重複單元中的至少一者。 [化學式1][化學式2][化學式3][化學式4] The epoxy group-containing acrylic repeating unit may include at least one selected from the group consisting of the repeating units represented by Chemical Formula 1 to Chemical Formula 4. [Chemical Formula 1] [Chemical Formula 2] [Chemical Formula 3] [Chemical Formula 4]
在化學式1至化學式4中, R1 至R4 獨立地為氫原子或者經取代或未經取代的C1至C10烷基, L1 、L2 、L4 及L6 獨立地為單鍵、經取代或未經取代的C1至C10伸烷基、經取代或未經取代的C3至C20伸環烷基、經取代或未經取代的C6至C20伸芳基、或其組合, L3 及L5 獨立地為經取代或未經取代的C1至C10伸烷基、經取代或未經取代的C3至C20伸環烷基、經取代或未經取代的C6至C20伸芳基、或其組合, X為經取代或未經取代的C3至C20脂環族環或者經取代或未經取代的C6至C20芳環,且 *表示連接相同或不同原子或化學式的點。In Chemical Formula 1 to Chemical Formula 4, R 1 to R 4 are independently a hydrogen atom or a substituted or unsubstituted C1 to C10 alkyl group, and L 1 , L 2 , L 4 and L 6 are independently a single bond, a substituted or unsubstituted C1 to C10 alkylene, substituted or unsubstituted C3 to C20 cycloalkyl extending alkyl, substituted or unsubstituted C6-C20 arylene group, or combinations thereof, L 3 and L 5 independently a substituted or unsubstituted C1 to C10 alkyl, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C6 to C20 extended aryl, or a combination thereof X is a substituted or unsubstituted C3 to C20 alicyclic ring or a substituted or unsubstituted C6 to C20 aromatic ring, and * represents a point connecting the same or different atoms or formulas.
所述含環氧基的丙烯酸系黏合劑樹脂可具有2,000克/莫耳至20,000克/莫耳的重量平均分子量。The epoxy group-containing acrylic binder resin may have a weight average molecular weight of from 2,000 g/m to 20,000 g/mol.
所述黑色著色劑可在300奈米至400奈米的波長區中具有最大透射率。The black colorant may have a maximum transmittance in a wavelength region of 300 nm to 400 nm.
所述黑色有機著色劑可包含紅色顏料、紫羅蘭色(violet)顏料及藍色顏料。The black organic colorant may include a red pigment, a violet pigment, and a blue pigment.
所述黑色著色劑可更包含黑色無機著色劑。The black colorant may further comprise a black inorganic colorant.
所述黑色著色劑可以10:1至30:1的重量比包含所述黑色有機著色劑及所述黑色無機著色劑。The black colorant may include the black organic colorant and the black inorganic colorant in a weight ratio of 10:1 to 30:1.
以所述光敏性樹脂組成物的總量計,所述光敏性樹脂組成物可包含:1重量%至20重量%的(A)所述含環氧基的丙烯酸系黏合劑樹脂;0.1重量%至10重量%的(B)所述光可聚合單體;0.1重量%至5重量%的(C)所述光聚合起始劑;30重量%至60重量%的(D)所述黑色著色劑;以及餘量的(E)所述溶劑。The photosensitive resin composition may include: 1% by weight to 20% by weight of (A) the epoxy group-containing acrylic adhesive resin; 0.1% by weight based on the total amount of the photosensitive resin composition Up to 10% by weight of (B) the photopolymerizable monomer; 0.1% by weight to 5% by weight of (C) the photopolymerization initiator; 30% to 60% by weight of (D) the black coloration And the balance of (E) the solvent.
所述光敏性樹脂組成物可更包含以下添加劑:丙二酸、3-胺基-1,2-丙二醇、矽烷系偶合劑、調平劑(leveling agent)、氟系界面活性劑、自由基聚合起始劑或其組合。The photosensitive resin composition may further comprise the following additives: malonic acid, 3-amino-1,2-propanediol, decane-based coupling agent, leveling agent, fluorine-based surfactant, radical polymerization Starting agent or a combination thereof.
本發明另一實施例提供一種應用所述光敏性樹脂組成物製造的光敏性樹脂層。Another embodiment of the present invention provides a photosensitive resin layer produced by applying the photosensitive resin composition.
所述光敏性樹脂層可具有大於或等於20°的錐角。The photosensitive resin layer may have a taper angle of greater than or equal to 20°.
本發明再一實施例提供一種包含所述光敏性樹脂層的黑色柱間隔物。A further embodiment of the present invention provides a black column spacer comprising the photosensitive resin layer.
在以下詳細說明中包含本發明的其他實施例。Other embodiments of the invention are included in the detailed description which follows.
根據一實施例的光敏性樹脂組成物包含預定量的含環氧基的丙烯酸系黏合劑樹脂且因此可達成高的錐角,並且另外,根據一實施例的光敏性樹脂組成物使用能夠保證在特定波長區中的透射率的著色劑且因此可達成適用於黑色柱間隔物的光學密度(optical density,OD)。The photosensitive resin composition according to an embodiment contains a predetermined amount of the epoxy group-containing acrylic adhesive resin and thus a high taper angle can be achieved, and in addition, the use of the photosensitive resin composition according to an embodiment can be guaranteed The color shifting agent in the specific wavelength region and thus the optical density (OD) suitable for the black column spacer can be achieved.
在下文中,詳細闡述本發明的實施例。然而,該些實施例為示範性的,本發明並非僅限於此,且本發明由申請專利範圍的範圍界定。In the following, embodiments of the invention are explained in detail. However, the embodiments are exemplary, and the invention is not limited thereto, and the invention is defined by the scope of the claims.
在本說明書中,當不另外提供具體定義時,「烷基」是指C1至C20烷基,術語「烯基」是指C2至C20烯基,術語「環烯基」是指C3至C20環烯基,術語「雜環烯基」是指C3至C20雜環烯基,術語「芳基」是指C6至C20芳基,術語「芳基烷基」是指C6至C20芳基烷基,術語「伸烷基」是指C1至C20伸烷基,術語「伸芳基」是指C6至C20伸芳基,術語「烷基伸芳基」是指C6至C20烷基伸芳基,術語「伸雜芳基」是指C3至C20伸雜芳基,且術語「伸烷氧基」是指C1至C20伸烷氧基。In the present specification, when no specific definition is provided, "alkyl" means C1 to C20 alkyl, the term "alkenyl" means C2 to C20 alkenyl, and the term "cycloalkenyl" means C3 to C20. Alkenyl, the term "heterocycloalkenyl" refers to C3 to C20 heterocycloalkenyl, the term "aryl" refers to C6 to C20 aryl, and the term "arylalkyl" refers to C6 to C20 arylalkyl, The term "alkylene" refers to C1 to C20 alkyl, the term "extended aryl" refers to C6 to C20 extended aryl, and the term "alkyl extended aryl" refers to C6 to C20 alkyl extended aryl, the term "extension" "Heteroaryl" means a C3 to C20 heteroaryl group, and the term "alkyleneoxy" means a C1 to C20 alkylene group.
在本說明書中,當不另外提供具體定義時,術語「經取代」是指經選自以下的取代基取代以替代至少一個氫:鹵素(F、Cl、Br或I)、羥基、C1至C20烷氧基、硝基、氰基、胺基、亞胺基、疊氮基、脒基、肼基、亞肼基(hydrazono group)、羰基、胺甲醯基、硫醇基、酯基、醚基、羧基或其鹽、磺酸基或其鹽、磷酸基或其鹽、C1至C20烷基、C2至C20烯基、C2至C20炔基、C6至C20芳基、C3至C20環烷基、C3至C20環烯基、C3至C20環炔基、C2至C20雜環烷基、C2至C20雜環烯基、C2至C20雜環炔基、C3至C20雜芳基或其組合。In the present specification, the term "substituted", when not specifically defined otherwise, is substituted with at least one hydrogen substituted with a substituent selected from the group consisting of halogen (F, Cl, Br or I), hydroxyl group, C1 to C20. Alkoxy, nitro, cyano, amine, imine, azide, sulfhydryl, fluorenyl, hydrazono group, carbonyl, amine carbaryl, thiol, ester, ether a base, a carboxyl group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphate group or a salt thereof, a C1 to C20 alkyl group, a C2 to C20 alkenyl group, a C2 to C20 alkynyl group, a C6 to C20 aryl group, a C3 to C20 cycloalkyl group a C3 to C20 cycloalkenyl group, a C3 to C20 cycloalkynyl group, a C2 to C20 heterocycloalkyl group, a C2 to C20 heterocycloalkenyl group, a C2 to C20 heterocycloalkynyl group, a C3 to C20 heteroaryl group, or a combination thereof.
在本說明書中,當不另外提供具體定義時,術語「雜」是指在化學式中包含至少一個選自N、O、S及P的雜原子。In the present specification, the term "hetero" means that at least one hetero atom selected from N, O, S and P is contained in the chemical formula when a specific definition is not additionally provided.
在本說明書中,當不另外提供具體定義時,「(甲基)丙烯酸酯」是指「丙烯酸酯」及「甲基丙烯酸酯」兩者,且「(甲基)丙烯酸」是指「丙烯酸」及「甲基丙烯酸」。In the present specification, "(meth)acrylate" means both "acrylate" and "methacrylate", and "(meth)acrylic" means "acrylic acid" when no specific definition is provided. And "methacrylic acid".
在本說明書中,當不另外提供具體定義時,術語「組合」是指混合或共聚合。In the present specification, the term "combination" means mixing or copolymerization when a specific definition is not additionally provided.
在本說明書中,當不另外提供具體定義時,不飽和鍵是指包含另一原子的鍵,例如羰基鍵、偶氮基鍵以及碳-碳原子之間的多重鍵(multiple bond)。In the present specification, when a specific definition is not additionally provided, an unsaturated bond means a bond containing another atom, such as a carbonyl bond, an azo bond, and a multiple bond between carbon-carbon atoms.
在本說明書中,當不另外提供具體定義時,最大透射率是指300奈米至700奈米的區範圍,而不考慮小於300奈米的範圍與大於700奈米的範圍。In the present specification, when a specific definition is not additionally provided, the maximum transmittance means a range of a range of 300 nm to 700 nm, regardless of a range of less than 300 nm and a range of more than 700 nm.
在本說明書中,當不另外提供具體定義時,「*」表指連接相同或不同原子或化學式的點。In the present specification, a "*" table refers to a point connecting the same or different atoms or chemical formulas when no specific definition is provided.
根據一實施例的光敏性樹脂組成物包含:(A)含環氧基的丙烯酸系黏合劑樹脂;(B)光可聚合單體;(C)光聚合起始劑;(D)黑色著色劑,包含黑色有機著色劑;以及(E)溶劑,其中以所述光敏性樹脂組成物的總量計,包含1重量%至20重量%的量的所述含環氧基的丙烯酸系黏合劑樹脂。The photosensitive resin composition according to an embodiment comprises: (A) an epoxy group-containing acrylic binder resin; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a black colorant a black organic colorant; and (E) a solvent, wherein the epoxy group-containing acrylic adhesive resin is contained in an amount of from 1% by weight to 20% by weight based on the total of the photosensitive resin composition .
根據一實施例的光敏性樹脂組成物可提高黏合劑樹脂的交聯密度且可在彩色濾光片製程期間達成高的錐角及優異的製程裕度,乃因以光敏性樹脂組成物的總量計,含環氧基的丙烯酸系黏合劑樹脂的含量為1重量%至20重量%。The photosensitive resin composition according to an embodiment can increase the crosslinking density of the binder resin and can achieve a high taper angle and an excellent process margin during the color filter process, because the total of the photosensitive resin composition The content of the epoxy group-containing acrylic binder resin is from 1% by weight to 20% by weight.
以下,對每一組分進行具體闡述。Hereinafter, each component will be specifically described.
(( AA )黏合劑樹脂Adhesive resin
根據一實施例的光敏性樹脂組成物包含丙烯酸系黏合劑樹脂,且所述丙烯酸系黏合劑樹脂包含環氧基。所述丙烯酸系黏合劑樹脂包含環氧基,且因此可提高所述丙烯酸系黏合劑樹脂的交聯密度,並且可達成優異的製程裕度。The photosensitive resin composition according to an embodiment includes an acrylic binder resin, and the acrylic binder resin contains an epoxy group. The acrylic adhesive resin contains an epoxy group, and thus the crosslinking density of the acrylic adhesive resin can be improved, and an excellent process margin can be achieved.
具體而言,以所述光敏性樹脂組成物的總量計,包含1重量%至20重量%的量的根據一實施例的含環氧基的丙烯酸系黏合劑樹脂。當以所述光敏性樹脂組成物的總量計包含小於1重量%的量的含環氧基的丙烯酸系黏合劑樹脂時,所使用的環氧基的量太少且因此可能不會提高所述黏合劑樹脂的交聯密度,並且所包含的光可聚合單體相對較多,因此可能不會達成優異的製程裕度,但當以所述光敏性樹脂組成物的總量計包含大於20重量%的量的含環氧基的丙烯酸系黏合劑樹脂時,製程裕度並不足夠,而錐角或抗老化穩定性可被劣化,並且光敏性樹脂組成物中包含相對較少的著色劑,因此可能不會達成黑色柱間隔物的適當的光學密度(OD)。黑色柱間隔物的適當的光學密度每1微米應大於或等於1。Specifically, the epoxy group-containing acrylic adhesive resin according to an embodiment is contained in an amount of from 1% by weight to 20% by weight based on the total of the photosensitive resin composition. When the epoxy group-containing acrylic adhesive resin is contained in an amount of less than 1% by weight based on the total amount of the photosensitive resin composition, the amount of the epoxy group to be used is too small and thus may not be improved. The crosslinking density of the binder resin, and the relatively large amount of the photopolymerizable monomer contained, so that an excellent process margin may not be achieved, but when it contains more than 20 based on the total amount of the photosensitive resin composition When the epoxy group-containing acrylic adhesive resin is used in an amount of % by weight, the process margin is not sufficient, and the taper angle or the anti-aging stability may be deteriorated, and the photosensitive resin composition contains relatively few color formers. Therefore, the proper optical density (OD) of the black column spacer may not be achieved. The appropriate optical density of the black column spacer should be greater than or equal to 1 per 1 micron.
含環氧基的丙烯酸系黏合劑樹脂包含含環氧基的丙烯酸重複單元,且以所述含環氧基的丙烯酸系黏合劑樹脂的總量計,可包含1重量%至40重量%、例如10重量%至30重量%的量的含環氧基的丙烯酸重複單元。當以所述含環氧基的丙烯酸系黏合劑樹脂的總量計包含處於所述範圍內的含環氧基的丙烯酸重複單元時,可在維持大於或等於20°的錐角同時將應用根據一實施例的所述光敏性樹脂組成物製造的光敏性樹脂層穩定地圖案化。舉例而言,當所述黏合劑樹脂中包含小於1重量%的量的含環氧基的丙烯酸重複單元時,光敏性樹脂層可具有小於或等於20°的低的錐角,且因此不能穩定地圖案化,而當包含大於40重量%的量的含環氧基的丙烯酸重複單元時,光敏性樹脂層亦可因臨界尺寸(critical dimension,CD)偏差增加而不能穩定地圖案化。The epoxy group-containing acrylic binder resin contains an epoxy group-containing acrylic repeating unit, and may include 1% by weight to 40% by weight, for example, based on the total of the epoxy group-containing acrylic binder resin. An epoxy group-containing acrylic repeating unit in an amount of from 10% by weight to 30% by weight. When the epoxy group-containing acrylic repeating unit in the range is contained in the total amount of the epoxy group-containing acrylic binder resin, the taper angle of 20° or more can be maintained while applying The photosensitive resin layer produced by the photosensitive resin composition of one embodiment is stably patterned. For example, when the epoxy resin-containing acrylic repeating unit is contained in an amount of less than 1% by weight in the binder resin, the photosensitive resin layer may have a low taper angle of less than or equal to 20°, and thus may not be stable The pattern is patterned, and when the epoxy group-containing acrylic repeating unit is contained in an amount of more than 40% by weight, the photosensitive resin layer may not be stably patterned due to an increase in critical dimension (CD) deviation.
含環氧基的丙烯酸系黏合劑樹脂(A)可包含選自以下中的至少兩者:含環氧基的丙烯酸系黏合劑樹脂(A-1),以所述含環氧基的丙烯酸系黏合劑樹脂的總量計,包含10重量%至22重量%、例如15重量%至22重量%的含環氧基的丙烯酸重複單元;含環氧基的丙烯酸系黏合劑樹脂(A-2),以所述含環氧基的丙烯酸系黏合劑樹脂的總量計,包含23重量%至27重量%的含環氧基的丙烯酸重複單元;以及含環氧基的丙烯酸系黏合劑樹脂(A-3),以所述含環氧基的丙烯酸系黏合劑樹脂的總量計,包含28重量%至35重量%、例如28重量%至30重量%的含環氧基的丙烯酸重複單元。當根據一實施例的丙烯酸系黏合劑樹脂包括多於兩種分別包含各種不同量的含環氧基的丙烯酸重複單元的丙烯酸系黏合劑樹脂時,可同時提高製程裕度及錐角兩者。The epoxy group-containing acrylic adhesive resin (A) may contain at least two selected from the group consisting of epoxy group-containing acrylic binder resins (A-1), and the epoxy group-containing acrylic resin. 10% by weight to 22% by weight, for example, 15% by weight to 22% by weight, based on the total amount of the binder resin, of the epoxy group-containing acrylic repeating unit; the epoxy group-containing acrylic binder resin (A-2) , comprising from 23% by weight to 27% by weight, based on the total of the epoxy group-containing acrylic binder resin, of an epoxy group-containing acrylic repeating unit; and an epoxy group-containing acrylic binder resin (A) And -3) comprising 28% by weight to 35% by weight, for example 28% by weight to 30% by weight, based on the total of the epoxy group-containing acrylic binder resin, of the epoxy group-containing acrylic repeating unit. When the acrylic adhesive resin according to an embodiment includes more than two acrylic adhesive resins each containing various amounts of epoxy group-containing acrylic repeating units, both process margin and taper angle can be simultaneously improved.
舉例而言,所述含環氧基的丙烯酸重複單元可包含選自由化學式1至化學式4表示的重複單元中的至少一者,但並非僅限於此。 [化學式1][化學式2][化學式3][化學式4] For example, the epoxy group-containing acrylic repeating unit may include at least one selected from the group consisting of the repeating units represented by Chemical Formula 1 to Chemical Formula 4, but is not limited thereto. [Chemical Formula 1] [Chemical Formula 2] [Chemical Formula 3] [Chemical Formula 4]
在化學式1至化學式4中, R1 至R4 獨立地為氫原子或者經取代或未經取代的C1至C10烷基, L1 、L2 、L4 及L6 獨立地為單鍵、經取代或未經取代的C1至C10伸烷基、經取代或未經取代的C3至C20伸環烷基、經取代或未經取代的C6至C20伸芳基、或其組合, L3 及L5 獨立地為經取代或未經取代的C1至C10伸烷基、經取代或未經取代的C3至C20伸環烷基、經取代或未經取代的C6至C20伸芳基、或其組合,且 X為經取代或未經取代的C3至C20脂環族環或者經取代或未經取代的C6至C20芳環。In Chemical Formula 1 to Chemical Formula 4, R 1 to R 4 are independently a hydrogen atom or a substituted or unsubstituted C1 to C10 alkyl group, and L 1 , L 2 , L 4 and L 6 are independently a single bond, a substituted or unsubstituted C1 to C10 alkylene, substituted or unsubstituted C3 to C20 cycloalkyl extending alkyl, substituted or unsubstituted C6-C20 arylene group, or combinations thereof, L 3 and L 5 independently a substituted or unsubstituted C1 to C10 alkyl, substituted or unsubstituted C3 to C20 cycloalkyl, substituted or unsubstituted C6 to C20 extended aryl, or a combination thereof And X is a substituted or unsubstituted C3 to C20 alicyclic ring or a substituted or unsubstituted C6 to C20 aromatic ring.
舉例而言,經取代或未經取代的C3至C20脂環族環可為經取代或未經取代的C3至C20環烷烴、經取代或未經取代的雙環己烷等。For example, the substituted or unsubstituted C3 to C20 cycloaliphatic ring may be a substituted or unsubstituted C3 to C20 cycloalkane, a substituted or unsubstituted bicyclohexane, and the like.
舉例而言,X可為選自化學式5-1至化學式5-7中的一者。 [化學式5-1][化學式5-2][化學式5-3][化學式5-4][化學式5-5][化學式5-6][化學式5-7] For example, X may be one selected from the group consisting of Chemical Formula 5-1 to Chemical Formula 5-7. [Chemical Formula 5-1] [Chemical Formula 5-2] [Chemical Formula 5-3] [Chemical Formula 5-4] [Chemical Formula 5-5] [Chemical Formula 5-6] [Chemical Formula 5-7]
舉例而言,含環氧基的丙烯酸重複單元可為自環氧基誘導型單體(epoxy group-inducing monomer)誘導出的重複單元,所述環氧基誘導型單體為例如(甲基)丙烯酸縮水甘油基酯、3,4-環氧環己基甲基(甲基)丙烯酸酯、3,4-環氧基丁基(甲基)丙烯酸酯、4-羥基丁基(甲基)丙烯酸酯縮水甘油醚等,但並非僅限於此。For example, the epoxy group-containing acrylic repeating unit may be a repeating unit derived from an epoxy group-inducing monomer, for example, (meth) Glycidyl acrylate, 3,4-epoxycyclohexylmethyl (meth) acrylate, 3,4-epoxy butyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate Glycidyl ether, etc., but not limited to this.
根據一實施例的含環氧基的丙烯酸系黏合劑樹脂可為環氧基誘導型單體與不包含環氧基的烯系不飽和單體(ethylenic unsaturated monomer)的共聚物。The epoxy group-containing acrylic adhesive resin according to an embodiment may be a copolymer of an epoxy group-inducing monomer and an ethylenic unsaturated monomer not containing an epoxy group.
不包含環氧基的烯系不飽和單體可為例如包含至少一個羧基的烯系不飽和化合物,例如丙烯酸、甲基丙烯酸、順丁烯二酸、衣康酸、反丁烯二酸等;芳族乙烯基化合物,例如苯乙烯、α-甲基苯乙烯、乙烯基甲苯、乙烯基苯甲基甲醚等;不飽和羧酸酯化合物,例如(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丁酯、(甲基)丙烯酸苯甲酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸苯酯等;不飽和羧酸胺基烷基酯化合物,例如(甲基)丙烯酸2-胺基乙酯、(甲基)丙烯酸2-二甲基胺基乙酯等;羧酸乙烯酯化合物,例如乙酸乙烯酯、苯甲酸乙烯酯等;不飽和羧酸縮水甘油基酯化合物,例如(甲基)丙烯酸縮水甘油基酯等;氰化乙烯化合物,例如(甲基)丙烯腈等;不飽和醯胺化合物,例如(甲基)丙烯醯胺等;等等化合物。該些化合物可單獨使用或以二或更多者的混合物形式使用。The ethylenically unsaturated monomer not containing an epoxy group may be, for example, an ethylenically unsaturated compound containing at least one carboxyl group, such as acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or the like; An aromatic vinyl compound such as styrene, α-methylstyrene, vinyltoluene, vinylbenzyl methyl ether or the like; an unsaturated carboxylate compound such as methyl (meth)acrylate, (methyl) Ethyl acrylate, butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, benzyl (meth)acrylate, cyclomethacrylate Ester, phenyl (meth) acrylate, etc.; unsaturated carboxylic acid aminoalkyl ester compound, such as 2-aminoethyl (meth) acrylate, 2-dimethylaminoethyl (meth) acrylate, etc. a vinyl carboxylate compound such as vinyl acetate, vinyl benzoate or the like; an unsaturated carboxylic acid glycidyl ester compound such as glycidyl (meth)acrylate or the like; a vinyl cyanide compound such as (methyl) Acrylonitrile or the like; unsaturated guanamine compound, such as (meth) acrylamide, etc.; . These compounds may be used singly or in the form of a mixture of two or more.
含環氧基的丙烯酸系黏合劑樹脂可具有1,000克/莫耳至100,000克/莫耳、例如2,000克/莫耳至50,000克/莫耳、例如2,000克/莫耳至20,000克/莫耳的重量平均分子量。當含環氧基的丙烯酸系黏合劑樹脂具有處於所述範圍內的重量平均分子量時,黑色柱間隔物的例如耐化學性、顯影裕度等性質可被極大地最佳化。The epoxy-containing acrylic adhesive resin may have from 1,000 g/m to 100,000 g/mole, for example from 2,000 g/m to 50,000 g/mole, for example from 2,000 g/m to 20,000 g/mole Weight average molecular weight. When the epoxy group-containing acrylic binder resin has a weight average molecular weight within the above range, properties such as chemical resistance, development margin, and the like of the black column spacer can be greatly optimized.
另一方面,根據一實施例的光敏性樹脂組成物僅包含丙烯酸系黏合劑樹脂作為黏合劑樹脂而不包含卡多系黏合劑樹脂。當根據一實施例的光敏性樹脂組成物包含卡多系黏合劑樹脂時,圖案的錐角可能會急劇降低,且亦可使製程裕度劣化。On the other hand, the photosensitive resin composition according to an embodiment contains only an acrylic binder resin as a binder resin and does not contain a cardo binder resin. When the photosensitive resin composition according to an embodiment contains a card-based adhesive resin, the taper angle of the pattern may be drastically lowered, and the process margin may be deteriorated.
(( BB )光可聚合單體) photopolymerizable monomer
光可聚合單體可為包含至少一個烯系不飽和雙鍵的(甲基)丙烯酸的單官能酯或多官能酯。The photopolymerizable monomer may be a monofunctional ester or a polyfunctional ester of (meth)acrylic acid containing at least one ethylenically unsaturated double bond.
光可聚合單體可因烯系不飽和雙鍵而在圖案形成製程中的曝光期間引起充分聚合且形成具有優異的耐熱性、耐光性及耐化學性的圖案。The photopolymerizable monomer can cause sufficient polymerization during exposure during the pattern forming process due to the ethylenically unsaturated double bond and form a pattern having excellent heat resistance, light resistance, and chemical resistance.
光可聚合單體的具體實例可為乙二醇二(甲基)丙烯酸酯、二乙二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、丙二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、1,4-丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、雙酚A二(甲基)丙烯酸酯、季戊四醇二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、季戊四醇六(甲基)丙烯酸酯、二季戊四醇二(甲基)丙烯酸酯、二季戊四醇三(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、雙酚A環氧(甲基)丙烯酸酯、乙二醇單甲醚(甲基)丙烯酸酯、三羥甲基丙烷三(甲基)丙烯酸酯、三(甲基)丙烯醯氧基磷酸乙酯、酚醛清漆環氧(甲基)丙烯酸酯等。Specific examples of the photopolymerizable monomer may be ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, propylene glycol di(methyl) Acrylate, neopentyl glycol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, bisphenol A (meth) acrylate, pentaerythritol di(meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol hexa (meth) acrylate, dipentaerythritol di (methyl) Acrylate, dipentaerythritol tri(meth)acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa(meth) acrylate, bisphenol A epoxy (meth) acrylate, ethylene glycol monomethyl Ether (meth) acrylate, trimethylolpropane tri(meth) acrylate, tris(meth) propylene decyl oxyphosphate, novolac epoxy (meth) acrylate, and the like.
光可聚合單體的市售實例如下。單官能(甲基)丙烯酸酯可包括:亞羅尼斯(Aronix)M-101® 、M-111® 、M-114® (東亞合成化工有限公司(Toagosei Chemistry Industry Co., Ltd.));卡亞拉得(KAYARAD)TC-110S® 、TC-120S® (日本化藥有限公司(Nippon Kayaku Co., Ltd.));V-158® 、V-2311® (大阪有機化工有限公司(Osaka Organic Chemical Ind., Ltd.))等。二官能(甲基)丙烯酸酯的實例可包括:Aronix M-210® 、M-240® 、M-6200® (東亞合成化工有限公司),KAYARAD HDDA® 、HX-220® 、R-604® (日本化藥有限公司),V-260® 、V-312® 、V-335 HP® (大阪有機化工有限公司)等。三官能(甲基)丙烯酸酯的實例可包括:Aronix M-309® 、M-400® 、M-405® 、M-450® 、M-7100® 、M-8030® 、M-8060® (東亞合成化工有限公司),KAYARAD TMPTA® 、DPCA-20® 、DPCA-30® 、DPCA-60® 、DPCA-120® (日本化藥有限公司),V-295® 、V-300® 、V-360® 、V-GPT® 、V-3PA® 、V-400® (大阪有機化工有限公司(Osaka Yuki Kayaku Kogyo Co. Ltd.))等。該些產品可單獨使用或以二或更多者的混合物形式使用。Commercially available examples of photopolymerizable monomers are as follows. Monofunctional (meth) acrylates may include: Aronix M-101 ® , M-111 ® , M-114 ® (Toagosei Chemistry Industry Co., Ltd.); KAYARAD TC-110S ® , TC-120S ® (Nippon Kayaku Co., Ltd.); V-158 ® , V-2311 ® (Osaka Organic) Chemical Ind., Ltd.)). Examples of difunctional (meth) acrylates may include: Aronix M-210 ® , M-240 ® , M-6200 ® (East Asia Synthetic Chemical Co., Ltd.), KAYARAD HDDA ® , HX-220 ® , R-604 ® ( Nippon Kayaku Co., Ltd.), V-260 ® , V-312 ® , V-335 HP ® (Osaka Organic Chemical Co., Ltd.), etc. Examples of trifunctional (meth) acrylates may include: Aronix M-309 ® , M-400 ® , M-405 ® , M-450 ® , M-7100 ® , M-8030 ® , M-8060 ® (East Asia Synthetic Chemical Co., Ltd.), KAYARAD TMPTA ® , DPCA-20 ® , DPCA-30 ® , DPCA-60 ® , DPCA-120 ® (Nippon Chemical Co., Ltd.), V-295 ® , V-300 ® , V-360 ® , V-GPT ® , V-3PA ® , V-400 ® (Osaka Yuki Kayaku Kogyo Co. Ltd.). These products may be used singly or in the form of a mixture of two or more.
光可聚合單體可用酸酐處理以改良顯影性。The photopolymerizable monomer can be treated with an acid anhydride to improve developability.
以光敏性樹脂組成物的總量計,可包含0.1重量%至10重量%、例如1重量%至5重量%的量的光可聚合單體。當包含處於所述範圍內的光可聚合單體時,光可聚合單體在圖案形成製程中的曝光期間充分固化且具有優異的可靠性,並且會提高鹼性顯影溶液的顯影性。The photopolymerizable monomer may be contained in an amount of 0.1% by weight to 10% by weight, for example, 1% by weight to 5% by weight based on the total amount of the photosensitive resin composition. When the photopolymerizable monomer in the range is contained, the photopolymerizable monomer is sufficiently cured during exposure in the pattern forming process and has excellent reliability, and the developability of the alkaline developing solution is improved.
(( CC )光聚合起始劑Photopolymerization initiator
光聚合起始劑可為常用於光敏性樹脂組成物中的光聚合起始劑,例如苯乙酮系化合物、二苯甲酮系化合物、噻噸酮系化合物、安息香系化合物、肟系化合物或其組合。The photopolymerization initiator may be a photopolymerization initiator commonly used in a photosensitive resin composition, such as an acetophenone compound, a benzophenone compound, a thioxanthone compound, a benzoin compound, an anthraquinone compound, or Its combination.
苯乙酮系化合物的實例可為2,2'-二乙氧基苯乙酮、2,2'-二丁氧基苯乙酮、2-羥基-2-甲基苯丙酮、對第三丁基三氯苯乙酮、對第三丁基二氯苯乙酮、4-氯苯乙酮、2,2'-二氯-4-苯氧基苯乙酮、2-甲基-1-(4-(甲硫基)苯基)-2-嗎啉基丙-1-酮、2-二甲基胺基-2-(4-甲基-苯甲基)-1-(4-嗎啉-4-基-苯基)-丁-1-酮等。Examples of the acetophenone-based compound may be 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylpropiophenone, and a third butyl group. Trichloroacetophenone, p-tert-butyldichloroacetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1-( 4-(Methylthio)phenyl)-2-morpholinylpropan-1-one, 2-dimethylamino-2-(4-methyl-benzyl)-1-(4-morpholine 4-yl-phenyl)-butan-1-one and the like.
二苯甲酮系化合物的實例可為二苯甲酮、苯甲酸苯甲醯基酯、苯甲酸苯甲醯基甲酯、4-苯基二苯甲酮、羥基二苯甲酮、丙烯酸化二苯甲酮、4,4'-雙(二甲基胺基)二苯甲酮、4,4'-雙(二乙基胺基)二苯甲酮、4,4'-二甲基胺基二苯甲酮、4,4'-二氯二苯甲酮、3,3'-二甲基-2-甲氧基二苯甲酮等。Examples of the benzophenone-based compound may be benzophenone, benzhydryl benzoate, benzhydryl methyl benzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylated Benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dimethylamino Benzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, and the like.
噻噸酮系化合物的實例可為噻噸酮、2-甲基噻噸酮、異丙基噻噸酮、2,4-二乙基噻噸酮、2,4-二異丙基噻噸酮、2-氯噻噸酮等。Examples of the thioxanthone-based compound may be thioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone , 2-chlorothioxanthone and the like.
安息香系化合物的實例可為安息香、安息香甲醚、安息香乙醚、安息香異丙醚、安息香異丁醚、苯甲基二甲基縮酮等。Examples of the benzoin-based compound may be benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyl dimethyl ketal or the like.
三嗪系化合物的實例可為2,4,6-三氯-s-三嗪、2-苯基-4,6-雙(三氯甲基)-s-三嗪、2-(3',4'-二甲氧基苯乙烯基)-4,6-雙(三氯甲基)-s-三嗪、2-(4'-甲氧基萘基)-4,6-雙(三氯甲基)-s-三嗪、2-(對甲氧基苯基)-4,6-雙(三氯甲基)-s-三嗪、2-(對甲苯基)-4,6-雙(三氯甲基)-s-三嗪、2-聯苯基-4,6-雙(三氯甲基)-s-三嗪、雙(三氯甲基)-6-苯乙烯基-s-三嗪、2-(萘酚1-基)-4,6-雙(三氯甲基)-s-三嗪、2-(4-甲氧基萘酚1-基)-4,6-雙(三氯甲基)-s-三嗪、2-4-雙(三氯甲基)-6-胡椒基-s-三嗪、2-4-雙(三氯甲基)-6-(4-甲氧基苯乙烯基)-s-三嗪等。Examples of the triazine-based compound may be 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(3', 4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloro) Methyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-double (trichloromethyl)-s-triazine, 2-biphenyl-4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s -triazine, 2-(naphthol 1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphthol-1-yl)-4,6- Bis(trichloromethyl)-s-triazine, 2-4-bis(trichloromethyl)-6-piperidinyl-s-triazine, 2-4-bis(trichloromethyl)-6-( 4-methoxystyryl)-s-triazine or the like.
肟系化合物的實例可為O-醯基肟系化合物、2-(O-苯甲醯基肟)-1-[4-(苯硫基)苯基]-1,2-辛二酮、1-(O-乙醯基肟)-1-[9-乙基-6-(2-甲基苯甲醯基)-9H-哢唑-3-基]乙酮、O-乙氧基羰基-α-氧基胺基-1-苯基丙-1-酮等。O-醯基肟系化合物的具體實例可為1,2-辛二酮、2-二甲基胺基-2-(4-甲基苯甲基)-1-(4-嗎啉-4-基-苯基)-丁-1-酮、1-(4-苯硫基苯基)-丁烷-1,2-二酮-2-肟-O-苯甲酸酯、1-(4-苯硫基苯基)-辛烷-1,2-二酮-2-肟-O-苯甲酸酯、1-(4-苯硫基苯基)-辛-1-酮肟-O-乙酸酯、1-(4-苯硫基苯基)-丁-1-酮肟-O-乙酸酯等。An example of the lanthanoid compound may be an O-mercapto lanthanide compound, 2-(O-benzylidene fluorenyl)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1 -(O-ethylhydrazinyl)-1-[9-ethyl-6-(2-methylbenzylidenyl)-9H-indazol-3-yl]ethanone, O-ethoxycarbonyl- Α-oxyamino-1-phenylpropan-1-one and the like. A specific example of the O-mercapto lanthanide compound may be 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4- -Phenyl)-butan-1-one, 1-(4-phenylthiophenyl)-butane-1,2-dione-2-indole-O-benzoate, 1-(4- Phenylthiophenyl)-octane-1,2-dione-2-indole-O-benzoate, 1-(4-phenylthiophenyl)-oct-1-one oxime-O-B An acid ester, 1-(4-phenylthiophenyl)-butan-1-one oxime-O-acetate or the like.
光聚合起始劑除所述化合物之外可更包含哢唑系化合物、二酮系化合物、硼酸鋶系化合物、疊氮系化合物、咪唑系化合物、聯咪唑系化合物等。The photopolymerization initiator may further contain an oxazole compound, a diketone compound, a lanthanum borate compound, an azide compound, an imidazole compound, a biimidazole compound or the like in addition to the above compound.
光聚合起始劑可與能夠藉由吸收光引起化學反應且變得激發並隨後傳輸其能量的光敏劑一起使用。The photopolymerization initiator can be used together with a photosensitizer capable of causing a chemical reaction by absorbing light and becoming excited and then transmitting its energy.
光敏劑的實例可為四乙二醇雙-3-巰基丙酸酯、季戊四醇四-3-巰基丙酸酯、二季戊四醇四-3-巰基丙酸酯等。Examples of the photosensitizer may be tetraethylene glycol bis-3-mercaptopropionate, pentaerythritol tetrakis-mercaptopropionate, dipentaerythritol tetrakis-mercaptopropionate or the like.
以所述光敏性樹脂組成物的總量計,可包含0.1重量%至5重量%、例如0.1重量%至3重量%的量的光聚合起始劑。當包含處於所述範圍內的光聚合起始劑時,可因在圖案形成製程中的曝光期間充分固化而保證優異的可靠性,圖案可具有優異的解析度及緊密接觸性質以及優異的耐熱性、耐光性及耐化學性,且可防止透射率因非反應起始劑而劣化。The photopolymerization initiator may be contained in an amount of 0.1% by weight to 5% by weight, for example, 0.1% by weight to 3% by weight based on the total amount of the photosensitive resin composition. When the photopolymerization initiator in the range is contained, excellent reliability can be ensured due to sufficient curing during exposure in the pattern forming process, and the pattern can have excellent resolution and close contact properties as well as excellent heat resistance. It has light resistance and chemical resistance, and can prevent the transmittance from deteriorating due to the non-reactive starter.
(( DD )黑色著色劑) black colorant
藉由將光敏性樹脂組成物曝光、顯影及固化而形成的光敏性樹脂層應具有高的光學密度以用作黑色柱間隔物。當所述光敏性樹脂組成物中包含僅包含黑色無機著色劑作為黑色著色劑時,可不使用400奈米的波長區中的光,且因此可使製程裕度嚴重劣化,並且因此,根據一實施例的光敏性樹脂組成物包含黑色有機著色劑作為著色劑。黑色有機著色劑可為例如內醯胺系有機黑、RGB黑、RVB黑等。黑色著色劑除包含黑色有機著色劑之外亦可包含黑色無機著色劑或其組合,例如苯胺黑、苝黑、鈦黑、花青黑、木質素黑、碳黑或其組合。The photosensitive resin layer formed by exposing, developing, and curing the photosensitive resin composition should have a high optical density to be used as a black column spacer. When the photosensitive resin composition contains only a black inorganic colorant as a black colorant, light in a wavelength region of 400 nm may not be used, and thus the process margin may be seriously deteriorated, and thus, according to an implementation The photosensitive resin composition of the example contains a black organic colorant as a colorant. The black organic colorant may be, for example, an intrinsic amine organic black, RGB black, RVB black or the like. The black colorant may contain, in addition to the black organic colorant, a black inorganic colorant or a combination thereof, such as nigrosine, phthalocyanine, titanium black, cyanine black, lignin black, carbon black, or a combination thereof.
RGB黑、RVB黑等表示藉由將紅色顏料、綠色顏料、藍色顏料、紫羅蘭色顏料、黃色顏料、紫色顏料等中的至少兩種彩色顏料混合而示出黑色的顏料。RGB black, RVB black, or the like means a black pigment by mixing at least two color pigments of a red pigment, a green pigment, a blue pigment, a violet pigment, a yellow pigment, a violet pigment, and the like.
舉例而言,黑色有機著色劑可包括包含紅色顏料、紫羅蘭色顏料及藍色顏料的RVB黑等,且黑色無機著色劑可包括碳黑等。For example, the black organic colorant may include RVB black or the like including a red pigment, a violet pigment, and a blue pigment, and the black inorganic colorant may include carbon black or the like.
黑色著色劑可以20:1至30:1、例如20:1至25:1的重量比包含黑色有機著色劑及黑色無機著色劑。The black colorant may comprise a black organic colorant and a black inorganic colorant in a weight ratio of from 20:1 to 30:1, for example from 20:1 to 25:1.
如上所述,當黑色著色劑僅包含例如碳黑等黑色無機著色劑時,可因優異的擋光性質而獲得高的光學密度,但例如碳黑等黑色無機著色劑具有0%的紫外透射率,因此光敏性樹脂組成物在曝光期間僅發生表面固化而不發生內部固化,且因此可在隨後顯影期間使製造裕度劣化。因此,根據一實施例的光敏性樹脂組成物可包含能夠保證在可見光區中的擋光性質且同時保證在300奈米至400奈米的區中的透射率並且因此充分光固化的黑色著色劑。As described above, when the black colorant contains only a black inorganic colorant such as carbon black, a high optical density can be obtained due to excellent light blocking properties, but a black inorganic colorant such as carbon black has an ultraviolet transmittance of 0%. Therefore, the photosensitive resin composition only undergoes surface curing during exposure without internal solidification, and thus the manufacturing margin can be deteriorated during subsequent development. Therefore, the photosensitive resin composition according to an embodiment may contain a black colorant capable of ensuring light blocking properties in the visible light region while ensuring transmittance in a region of 300 nm to 400 nm and thus sufficiently photocuring .
換言之,根據一實施例的光敏性樹脂組成物中的黑色著色劑可在300奈米至400奈米的波長區中具有最大透射率。In other words, the black colorant in the photosensitive resin composition according to an embodiment can have the maximum transmittance in a wavelength region of 300 nm to 400 nm.
當黑色有機著色劑與例如碳黑等黑色無機著色劑一起使用、具體而言以10:1至30:1、例如20:1至30:1及例如20:1至25:1的重量比使用以作為黑色著色劑時,可將呈黑色有機著色劑與黑色無機著色劑的混合物形式的黑色著色劑調整成在300奈米至400奈米的波長區中具有最大透射率。When a black organic colorant is used with a black inorganic colorant such as carbon black, specifically, a weight ratio of 10:1 to 30:1, for example 20:1 to 30:1, and for example 20:1 to 25:1 When used as a black colorant, the black colorant in the form of a mixture of a black organic colorant and a black inorganic colorant can be adjusted to have a maximum transmittance in a wavelength region of 300 nm to 400 nm.
另一方面,黑色著色劑可與色彩校準器(color calibrator)一起使用,例如蒽醌系顏料、苝系顏料、酞青系顏料、偶氮系顏料等。On the other hand, the black colorant can be used together with a color calibrator such as an anthraquinone pigment, an anthraquinone pigment, an indigo pigment, an azo pigment, or the like.
可一起使用分散劑以改良例如顏料等黑色著色劑或色彩校準器的分散。具體而言,例如顏料等黑色著色劑或色彩校準器可用分散劑進行表面預處理,抑或例如顏料等黑色著色劑或色彩校準器以及分散劑可在光敏性樹脂組成物的製備期間一起添加。Dispersing agents can be used together to improve the dispersion of black colorants such as pigments or color aligners. Specifically, a black colorant such as a pigment or a color aligner may be subjected to surface pretreatment with a dispersant, or a black colorant such as a pigment or a color aligner and a dispersant may be added together during preparation of the photosensitive resin composition.
分散劑可為非離子分散劑、陰離子分散劑、陽離子分散劑等。分散劑的具體實例可為聚烷二醇及其酯、聚氧伸烷基、多元醇酯環氧烷加成產物、醇環氧烷加成產物、磺酸酯、磺酸鹽、羧酸酯、羧酸鹽、烷基醯胺環氧烷加成產物、烷基胺等,且可單獨使用或以二或更多者的混合物形式使用。The dispersant may be a nonionic dispersant, an anionic dispersant, a cationic dispersant or the like. Specific examples of the dispersant may be a polyalkylene glycol and an ester thereof, a polyoxyalkylene group, a polyol ester alkylene oxide addition product, an alcohol alkylene oxide addition product, a sulfonate, a sulfonate, a carboxylate A carboxylate, an alkylguanamine alkylene oxide addition product, an alkylamine or the like, and may be used singly or in the form of a mixture of two or more.
分散劑的市售實例可包括由畢克有限公司(BYK Co., Ltd.)製造的迪斯帕畢克(DISPERBYK)-101、DISPERBYK-130、DISPERBYK-140、DISPERBYK-160、DISPERBYK-161、DISPERBYK-162、DISPERBYK-163、DISPERBYK-164、DISPERBYK-165、DISPERBYK-166、DISPERBYK-170、DISPERBYK-171、DISPERBYK-182、DISPERBYK-2000、DISPERBYK-2001等;由埃夫卡化學公司(EFKA Chemicals Co.)製造的埃夫卡(EFKA)-47、EFKA-47EA、EFKA-48、EFKA-49、EFKA-100、EFKA-400、EFKA-450等;由澤尼卡公司(Zeneka Co.)製造的索思帕(Solsperse)5000、Solsperse 12000、Solsperse 13240、Solsperse 13940、Solsperse 17000、Solsperse 20000、Solsperse 24000GR、Solsperse 27000、Solsperse 28000等;或由味之素公司(Ajinomoto Inc.)製造的PB711或PB821。Commercially available examples of dispersants may include DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, manufactured by BYK Co., Ltd. DISPERBYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165, DISPERBYK-166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-2000, DISPERBYK-2001, etc.; by EFKA Chemicals Co., manufactured by EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450, etc.; manufactured by Zeneka Co. Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse 24000GR, Solsperse 27000, Solsperse 28000, etc.; or PB711 or PB821 manufactured by Ajinomoto Inc. .
以光敏性樹脂組成物的總重量計,可包含0.1重量%至15重量%的量的分散劑。當包含處於所述範圍內的分散劑時,樹脂組成物具有優異的分散性質,且因此可在黑色柱間隔物的製造期間具有優異的穩定性、顯影性以及圖案形成能力。The dispersant may be contained in an amount of from 0.1% by weight to 15% by weight based on the total mass of the photosensitive resin composition. When the dispersant in the range is contained, the resin composition has excellent dispersion properties, and thus can have excellent stability, developability, and pattern forming ability during the manufacture of the black column spacer.
可使用水溶性無機鹽及濕潤劑對例如顏料等黑色著色劑進行預處理。當預處理例如顏料等黑色顏料時,顏料的初級粒子可變得較細。A black colorant such as a pigment can be pretreated with a water-soluble inorganic salt and a wetting agent. When a black pigment such as a pigment is pretreated, the primary particles of the pigment may become finer.
預處理可藉由將例如顏料等黑色著色劑與水溶性無機鹽及濕潤劑捏合(kneading),且隨後過濾並洗滌所捏合的顏料來執行。The pretreatment can be carried out by kneading a black colorant such as a pigment with a water-soluble inorganic salt and a wetting agent, and then filtering and washing the kneaded pigment.
捏合可在介於40℃至100℃範圍內的溫度下執行,且過濾及洗滌可藉由在用水等洗去無機鹽之後過濾顏料來執行。Kneading can be carried out at a temperature ranging from 40 ° C to 100 ° C, and filtration and washing can be carried out by filtering the pigment after washing off the inorganic salt with water or the like.
水溶性無機鹽的實例可為氯化鈉、氯化鉀等,但並非僅限於此。濕潤劑可使得例如顏料等黑色著色劑與水溶性無機鹽均一地混合均一地且粉碎。濕潤劑的實例包含烷二醇單烷基醚,例如乙二醇單乙醚、丙二醇單甲醚、二乙二醇單甲醚等;以及醇,例如乙醇、異丙醇、丁醇、己醇、環己醇、乙二醇、二乙二醇、聚乙二醇、丙三醇聚乙二醇等。該些濕潤劑可單獨使用或以二或更多者的混合物形式使用。Examples of the water-soluble inorganic salt may be sodium chloride, potassium chloride or the like, but are not limited thereto. The humectant can uniformly and pulverize the black colorant such as a pigment uniformly mixed with the water-soluble inorganic salt. Examples of the wetting agent include alkanediol monoalkyl ethers such as ethylene glycol monoethyl ether, propylene glycol monomethyl ether, diethylene glycol monomethyl ether, and the like; and alcohols such as ethanol, isopropanol, butanol, hexanol, Cyclohexanol, ethylene glycol, diethylene glycol, polyethylene glycol, glycerol polyethylene glycol, and the like. These humectants may be used singly or in the form of a mixture of two or more.
具體而言,例如顏料等黑色著色劑可以包含分散劑及有機溶劑的顏料分散液形式使用,且顏料分散液可包含固體顏料(黑色著色劑)、分散劑以及有機溶劑。在本文中,以顏料分散液的總量計,可包含8重量%至30重量%的量的固體顏料(黑色著色劑)。以光敏性樹脂組成物的總量計,可包含5重量%至30重量%、例如5重量%至20重量%、例如5重量%至10重量%的量的顏料分散液。當包含處於所述範圍內的顏料分散液時,解析度及圖案線性度得以改良。Specifically, a black colorant such as a pigment may be used in the form of a pigment dispersion containing a dispersant and an organic solvent, and the pigment dispersion may contain a solid pigment (black colorant), a dispersant, and an organic solvent. Herein, the solid pigment (black colorant) may be contained in an amount of from 8 to 30% by weight based on the total amount of the pigment dispersion. The pigment dispersion may be contained in an amount of from 5% by weight to 30% by weight, for example from 5% by weight to 20% by weight, for example from 5% by weight to 10% by weight, based on the total of the photosensitive resin composition. When the pigment dispersion in the range is included, the resolution and pattern linearity are improved.
以光敏性樹脂組成物的總量計,可包含30重量%至60重量%、例如40重量%至55重量%的量的黑色著色劑(例如,顏料分散液)。當包含處於所述範圍內的著色劑(例如,顏料分散液)時,亮度、色彩再現性、圖案的可固化性、耐熱性及緊密接觸力得以改良。A black colorant (for example, a pigment dispersion) may be contained in an amount of 30% by weight to 60% by weight, for example, 40% by weight to 55% by weight based on the total amount of the photosensitive resin composition. When a coloring agent (for example, a pigment dispersion) within the range is contained, brightness, color reproducibility, pattern curability, heat resistance, and close contact force are improved.
(( EE )溶劑Solvent
溶劑為與包含黑色著色劑的顏料分散液、含環氧基的丙烯酸系黏合劑樹脂、光可聚合單體及光聚合起始劑具有相容性但不與包含黑色著色劑的顏料分散液、含環氧基的丙烯酸系黏合劑樹脂、光可聚合單體及光聚合起始劑反應的材料。The solvent is compatible with a pigment dispersion liquid containing a black colorant, an epoxy group-containing acrylic binder resin, a photopolymerizable monomer, and a photopolymerization initiator, but not with a pigment dispersion containing a black colorant. A material which reacts with an epoxy group-containing acrylic binder resin, a photopolymerizable monomer, and a photopolymerization initiator.
溶劑的實例可包括醇,例如甲醇、乙醇等;醚,例如二氯乙醚、正丁醚、二異戊醚、甲基苯基醚、四氫呋喃等;二醇醚,例如乙二醇單甲醚、乙二醇單乙醚、乙二醇二甲醚等;乙酸溶纖劑,例如甲基溶纖劑乙酸酯、乙基溶纖劑乙酸酯、二乙基溶纖劑乙酸酯等;卡必醇,例如甲基乙基卡必醇、二乙基卡必醇、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇二甲醚、二乙二醇甲乙醚、二乙二醇二乙醚等;丙二醇烷基醚乙酸酯,例如丙二醇甲醚乙酸酯、丙二醇丙醚乙酸酯等;芳族烴,例如甲苯、二甲苯等;酮,例如甲乙酮、環己酮、4-羥基-4-甲基-2-戊酮、甲基正丙基酮、甲基正丁基酮、甲基正戊基酮、2-庚酮等;飽和脂族單羧酸烷基酯,例如乙酸乙酯、乙酸正丁酯、乙酸異丁酯等;乳酸酯,例如乳酸甲酯、乳酸乙酯等;氧基乙酸烷基酯,例如氧基乙酸甲酯、氧基乙酸乙酯、氧基乙酸丁酯等;烷氧基乙酸烷基酯,例如甲氧基乙酸甲酯、甲氧基乙酸乙酯、甲氧基乙酸丁酯、乙氧基乙酸甲酯、乙氧基乙酸乙酯等;3-氧基丙酸烷基酯,例如3-氧基丙酸甲酯、3-氧基丙酸乙酯等;3-烷氧基丙酸烷基酯,例如3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸乙酯、3-乙氧基丙酸甲酯等;2-氧基丙酸烷基酯,例如2-氧基丙酸甲酯、2-氧基丙酸乙酯、2-氧基丙酸丙酯等;2-烷氧基丙酸烷基酯,例如2-甲氧基丙酸甲酯、2-甲氧基丙酸乙酯、2-乙氧基丙酸乙酯、2-乙氧基丙酸甲酯等;2-氧基-2-甲基丙酸酯,例如2-氧基-2-甲基丙酸甲酯、2-氧基-2-甲基丙酸乙酯等;單氧基單羧酸烷基酯的2-烷氧基-2-甲基丙酸烷基酯,例如2-甲氧基-2-甲基丙酸甲酯、2-乙氧基-2-甲基丙酸乙酯等;酯,例如丙酸2-羥基乙酯、丙酸2-羥基-2-甲基乙酯、乙酸羥基乙酯、丁酸2-羥基-3-甲基甲酯等;酮酸酯,例如丙酮酸乙酯等。另外,亦可使用高沸點溶劑,例如N-甲基甲醯胺、N,N-二甲基甲醯胺、N-甲基甲醯苯胺、N-甲基乙醯胺、N,N-二甲基乙醯胺、N-甲基吡咯啶酮、二甲亞碸、苯甲基乙基醚、二己基醚、乙醯丙酮、異佛爾酮、己酸、辛酸、1-辛醇、1-壬醇、苯甲醇、乙酸苯甲酯、苯甲酸乙酯、乙二酸二乙酯、順丁烯二酸二乙酯、γ-丁內酯、碳酸伸乙酯、碳酸伸丙酯、苯基纖維素乙酸酯等。Examples of the solvent may include an alcohol such as methanol, ethanol, etc.; an ether such as dichloroethyl ether, n-butyl ether, diisoamyl ether, methylphenyl ether, tetrahydrofuran or the like; a glycol ether such as ethylene glycol monomethyl ether, Ethylene glycol monoethyl ether, ethylene glycol dimethyl ether, etc.; cellosolve acetate, such as methyl cellosolve acetate, ethyl cellosolve acetate, diethyl cellosolve acetate, etc.; Alcohol, such as methyl ethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, two Ethylene glycol diethyl ether or the like; propylene glycol alkyl ether acetate, such as propylene glycol methyl ether acetate, propylene glycol propyl ether acetate, etc.; aromatic hydrocarbons such as toluene, xylene, etc.; ketones, such as methyl ethyl ketone, cyclohexanone , 4-hydroxy-4-methyl-2-pentanone, methyl n-propyl ketone, methyl n-butyl ketone, methyl n-amyl ketone, 2-heptanone, etc.; saturated aliphatic monocarboxylic acid alkyl Esters such as ethyl acetate, n-butyl acetate, isobutyl acetate, etc.; lactates such as methyl lactate, ethyl lactate, etc.; alkyl oxyacetates, such as methyl oxyacetate, Ethyl oxyacetate, butyl oxyacetate, etc.; alkyl alkoxyacetate, such as methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, Ethyl ethoxyacetate or the like; alkyl 3-oxopropionate such as methyl 3-oxypropionate, ethyl 3-oxypropionate or the like; alkyl 3-alkoxypropionate, for example Methyl 3-methoxypropionate, ethyl 3-methoxypropionate, ethyl 3-ethoxypropionate, methyl 3-ethoxypropionate, etc.; alkyl 2-oxopropionate For example, methyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate, etc.; alkyl 2-alkoxypropionate, such as 2-methoxypropionic acid Ester, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate, methyl 2-ethoxypropionate, etc.; 2-oxy-2-methylpropionate, such as 2-oxo Methyl 2-methylpropionate, ethyl 2-oxy-2-methylpropionate, etc.; 2-alkoxy-2-methylpropanoic acid alkyl of monooxymonocarboxylic acid alkyl ester Esters such as methyl 2-methoxy-2-methylpropanoate, ethyl 2-ethoxy-2-methylpropionate, etc.; esters such as 2-hydroxyethyl propionate, 2-hydroxyl propionate -2-methylethyl ester, hydroxyl acetate Butyrate, methyl 2-hydroxy-methyl and the like; ketones esters, such as acetone and ethyl. In addition, high boiling solvents such as N-methylformamide, N,N-dimethylformamide, N-methylformamide, N-methylacetamide, N,N-di can also be used. Methylacetamide, N-methylpyrrolidone, dimethyl hydrazine, benzyl ethyl ether, dihexyl ether, acetamidine, isophorone, hexanoic acid, octanoic acid, 1-octanol, 1 - decyl alcohol, benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethyl carbonate, propyl carbonate, benzene Cellulose acetate and the like.
考慮到溶混性及反應性,可較佳地使用二醇醚,例如乙二醇單乙醚、乙二醇二甲醚、乙二醇二乙醚、二乙二醇甲乙醚等;乙二醇烷基醚乙酸酯,例如乙基溶纖劑乙酸酯等;酯,例如丙酸2-羥基乙酯等;卡必醇,例如二乙二醇單甲醚等;丙二醇烷基醚乙酸酯,例如丙二醇單甲基醚乙酸酯、丙二醇丙基醚乙酸酯等。In view of miscibility and reactivity, a glycol ether such as ethylene glycol monoethyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol methyl ethyl ether or the like can be preferably used; Ethyl acetate, such as ethyl cellosolve acetate; esters, such as 2-hydroxyethyl propionate; carbitol, such as diethylene glycol monomethyl ether; propylene glycol alkyl ether acetate For example, propylene glycol monomethyl ether acetate, propylene glycol propyl ether acetate, and the like.
以光敏性樹脂組成物的總量計,以餘量(例如20重量%至90重量%)使用溶劑。當包含處於所述範圍內的溶劑時,光敏性樹脂組成物可具有適當黏度,因而改良黑色柱間隔物的塗佈特性。The solvent is used in the balance (for example, 20% by weight to 90% by weight) based on the total amount of the photosensitive resin composition. When a solvent in the range is contained, the photosensitive resin composition may have an appropriate viscosity, thereby improving the coating characteristics of the black column spacer.
(( FF )其他添加劑Other additives
光敏性樹脂組成物可更包含以下添加劑:丙二酸;3-胺基-1,2-丙二醇;矽烷系偶合劑;調平劑;氟系界面活性劑;自由基聚合起始劑;或其組合。The photosensitive resin composition may further comprise the following additives: malonic acid; 3-amino-1,2-propanediol; a decane-based coupling agent; a leveling agent; a fluorine-based surfactant; a radical polymerization initiator; combination.
矽烷系偶合劑可具有以下反應性取代基以改良與基板的緊密接觸性質:乙烯基、羧基、甲基丙烯醯氧基、異氰酸酯基、環氧基等。The decane coupling agent may have the following reactive substituents to improve the intimate contact properties with the substrate: vinyl, carboxyl, methacryloxy, isocyanate, epoxy, and the like.
矽烷系偶合劑的實例可包括三甲氧基矽烷基苯甲酸、γ-甲基丙烯醯氧基丙基三甲氧基矽烷、乙烯基三乙醯氧基矽烷、乙烯基三甲氧基矽烷、γ-異氰酸酯丙基三乙氧基矽烷、γ-縮水甘油氧基丙基三甲氧基矽烷、β-(3,4-環氧環己基)乙基三甲氧基矽烷等等。該些矽烷系偶合劑可單獨使用或者以二或更多者的混合物形式使用。Examples of the decane coupling agent may include trimethoxydecyl benzoic acid, γ-methyl propylene methoxy propyl trimethoxy decane, vinyl triethoxy decane, vinyl trimethoxy decane, γ-isocyanate. Propyltriethoxydecane, γ-glycidoxypropyltrimethoxydecane, β-(3,4-epoxycyclohexyl)ethyltrimethoxydecane, and the like. These decane-based coupling agents may be used singly or in the form of a mixture of two or more.
以100重量份(parts by weight)的光敏性樹脂組成物計,可包含0.01重量份至10重量份的量的矽烷系偶合劑。當包含處於所述範圍內的矽烷系偶合劑時,可改良緊密接觸性質、儲存性質等。The decane-based coupling agent may be contained in an amount of from 0.01 part by weight to 10 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the decane-based coupling agent in the range is contained, the close contact property, the storage property, and the like can be improved.
光敏性樹脂組成物可更包含氟系界面活性劑或調平劑以改良塗佈性質並在必要時防止缺陷。The photosensitive resin composition may further contain a fluorine-based surfactant or a leveling agent to improve coating properties and prevent defects as necessary.
氟系界面活性劑或調平劑可為市售氟系界面活性劑或調平劑,例如BM-1000® 、BM-1100® 等(BM化學公司(BM Chemie Inc.));美佳法(MEGAFACE)F 142D® 、F 172® 、F 173® 、F 183® 、F 554® 等(大日本油墨化工有限公司(Dainippon Ink Kagaku Kogyo Co., Ltd.));弗拉德(FULORAD)FC-135® 、FC-170C® 、FC-430® 、FC-431® 等(住友3M有限公司(Sumitomo 3M Co., Ltd.));沙福隆(SURFLON)S-112® 、S-113® 、S-131® 、S-141® 、S-145® 等(旭硝子玻璃有限公司(Asahi Glass Co., Ltd.));SH-28PA® 、SH-190® 、SH-193® 、SZ-6032® 及SF-8428® 等(東麗矽酮有限公司(Toray Silicone Co., Ltd.))。The fluorine-based surfactant or leveling agent may be a commercially available fluorine-based surfactant or leveling agent, such as BM-1000 ® , BM-1100 ® , etc. (BM Chemie Inc.); MEGAFACE ) F 142D ® , F 172 ® , F 173 ® , F 183 ® , F 554 ® , etc. (Dainippon Ink Kagaku Kogyo Co., Ltd.); FULORAD FC-135 ® , FC-170C ® , FC-430 ® , FC-431 ® , etc. (Sumitomo 3M Co., Ltd.); SURFLON S-112 ® , S-113 ® , S -131 ® , S-141 ® , S-145 ® , etc. (Asahi Glass Co., Ltd.); SH-28PA ® , SH-190 ® , SH-193 ® , SZ-6032 ® and SF-8428 ®, etc. (manufactured by Toray Silicone Co., Ltd. -one (Toray Silicone Co., Ltd.)) .
以100重量份的光敏性樹脂組成物計,可使用0.001重量份至5重量份的量的氟系界面活性劑或調平劑。當包含處於所述範圍內的氟系界面活性劑或調平劑時,可保證氧化銦鋅(indium zinc oxide,IZO)基板或玻璃基板上的優異的濕潤以及塗佈均勻性,且可不會產生汙點。The fluorine-based surfactant or leveling agent may be used in an amount of from 0.001 part by weight to 5 parts by weight based on 100 parts by weight of the photosensitive resin composition. When a fluorine-based surfactant or leveling agent in the range is included, excellent wetting and coating uniformity on an indium zinc oxide (IZO) substrate or a glass substrate can be ensured, and no generation can be caused. stain.
此外,除非其他添加劑使得光敏性樹脂組成物的性質劣化,否則所述光敏性樹脂組成物可包含預定量的其他添加劑(例如抗氧化劑、穩定劑等)。Further, the photosensitive resin composition may contain a predetermined amount of other additives (for example, an antioxidant, a stabilizer, etc.) unless other additives deteriorate the properties of the photosensitive resin composition.
本發明另一實施例提供一種應用所述光敏性樹脂組成物製造的光敏性樹脂層。Another embodiment of the present invention provides a photosensitive resin layer produced by applying the photosensitive resin composition.
光敏性樹脂層(例如所述光敏性樹脂層)的圖案可具有大於或等於20°(例如大於或等於20°且小於或等於60°)的錐角。The pattern of the photosensitive resin layer (for example, the photosensitive resin layer) may have a taper angle of greater than or equal to 20 (for example, greater than or equal to 20 and less than or equal to 60).
本發明另一實施例提供一種藉由將光敏性樹脂組成物曝光並顯影(例如,曝光、顯影及固化)而製造的黑色柱間隔物。Another embodiment of the present invention provides a black column spacer manufactured by exposing and developing (for example, exposing, developing, and curing) a photosensitive resin composition.
一種製造黑色柱間隔物製造方法的方法如下。A method of manufacturing a black column spacer is as follows.
(1)塗佈及膜形成(1) Coating and film formation
利用旋塗或狹縫塗佈方法、輥塗方法、網版印刷方法、塗料器方法等在經受預定預先處理的基板(例如玻璃基板或氧化銦鋅基板)上將光敏性樹脂組成物塗佈成具有所期望的厚度,並藉由真空乾燥(vacuum dry,VCD)製程在70℃至100℃下將所述光敏性樹脂組成物加熱1分鐘至10分鐘以移除溶劑,從而形成光敏性樹脂層。The photosensitive resin composition is coated on a substrate (for example, a glass substrate or an indium zinc oxide substrate) subjected to a predetermined pretreatment by a spin coating or a slit coating method, a roll coating method, a screen printing method, a coater method, or the like. The photosensitive resin composition is heated at 70 ° C to 100 ° C for 1 minute to 10 minutes by a vacuum dry (VCD) process to remove the solvent, thereby forming a photosensitive resin layer. .
(2)曝光(2) exposure
藉由以下方式對光敏性樹脂膜進行圖案化:安置由用於達成黑色矩陣圖案的半色調(half tone)部分及用於達成柱間隔物圖案的全色調(full tone)組成的遮罩,然後照射介於200奈米至500奈米範圍內的光化射線(actinic ray)。藉由使用例如具有低壓、高壓或超高壓的水銀燈、金屬鹵化物燈、氬氣雷射等光源來執行照射。亦可使用X射線、電子束等。The photosensitive resin film is patterned by: arranging a mask composed of a half tone portion for achieving a black matrix pattern and a full tone for achieving a pillar spacer pattern, and then Irradiating actinic ray in the range of 200 nm to 500 nm. Irradiation is performed by using, for example, a mercury lamp having a low pressure, a high pressure, or an ultrahigh pressure, a metal halide lamp, an argon laser, or the like. X-rays, electron beams, and the like can also be used.
當使用高壓水銀燈時,曝光製程使用例如約500毫焦/平方公分或小於500毫焦/平方公分的光劑量(利用365奈米感測器)。然而,所述光劑量可依據每一組分的種類、其組合比率及乾膜厚度而變化。When a high pressure mercury lamp is used, the exposure process uses, for example, a light dose of about 500 millijoules per square centimeter or less than 500 millijoules per square centimeter (using a 365 nanometer sensor). However, the light dose may vary depending on the kind of each component, the combination ratio thereof, and the dry film thickness.
(3)顯影(3) Development
在曝光製程之後,使用鹼性水溶液藉由溶解並移除除被曝光部分外的多餘部分而將被曝光膜顯影,以形成圖案。After the exposure process, the exposed film is developed using an alkaline aqueous solution by dissolving and removing excess portions other than the exposed portion to form a pattern.
(4)後處理(4) Post processing
可對被顯影影像圖案進行後加熱,以達成耐熱性、光阻、緊密接觸性質、抗裂性、耐化學性、高強度、儲存穩定性等方面的優異品質。The developed image pattern can be post-heated to achieve excellent quality in terms of heat resistance, photoresist, close contact properties, crack resistance, chemical resistance, high strength, storage stability, and the like.
本發明另一實施例提供一種包含黑色柱間隔物的彩色濾光片。Another embodiment of the present invention provides a color filter including a black pillar spacer.
在下文中,參考實例更詳細地說明本發明。然而,該些實例不應在任何意義上被解釋為限制本發明的範圍。(實例) Hereinafter, the present invention will be described in more detail with reference to examples. However, the examples are not to be construed as limiting the scope of the invention in any way. (example)
(光敏性樹脂組成物的製備)(Preparation of photosensitive resin composition)
實例Instance 11 至實例To instance 44 以及比較例And comparative examples 11 至比較例To comparative example 55
藉由使用以下組分將根據實例1至實例4以及比較例1至比較例5的各光敏性樹脂組成物製備成分別具有表1中所示的組成。Each of the photosensitive resin compositions according to Examples 1 to 4 and Comparative Examples 1 to 5 was prepared to have the compositions shown in Table 1 by using the following components, respectively.
具體而言,精確地秤量了光聚合起始劑的量,向其中添加了溶劑,且對所述混合物進行了充分攪拌直至將光聚合起始劑完全溶解於溶劑中(大於或等於30分鐘)。然後,向其中依序添加了黏合劑樹脂及光可聚合單體,且再次將所獲得混合物攪拌了1小時。隨後,在其中放入了著色劑(顏料分散液),向其中添加了其他添加劑,且最終將所獲得混合物攪拌了大於或等於2小時,以製備光敏性樹脂組成物。Specifically, the amount of the photopolymerization initiator is accurately weighed, a solvent is added thereto, and the mixture is sufficiently stirred until the photopolymerization initiator is completely dissolved in the solvent (greater than or equal to 30 minutes). . Then, a binder resin and a photopolymerizable monomer were sequentially added thereto, and the obtained mixture was stirred again for 1 hour. Subsequently, a coloring agent (pigment dispersion) was placed therein, other additives were added thereto, and finally the obtained mixture was stirred for 2 hours or more to prepare a photosensitive resin composition.
在光敏性樹脂組成物中使用的每一組分如下。Each component used in the photosensitive resin composition is as follows.
( A )黏合劑樹脂 (A-1)含環氧基的丙烯酸系黏合劑樹脂(重量平均分子量:6,000克/莫耳,RY-20,昭和電工有限公司(Showa Denko K.K.)),以所述黏合劑樹脂的總量計,包含20重量%的量的自甲基丙烯酸縮水甘油基酯衍生出的含環氧基的丙烯酸重複單元。 (A-2)含環氧基的丙烯酸系黏合劑樹脂(重量平均分子量:6,500克/莫耳,RY-48,昭和電工有限公司),以所述黏合劑樹脂的總量計,包含30重量%的量的自沙克瑪(Cyclomer)M100(3,4-環氧環己基甲基(甲基)丙烯酸酯)誘導出的含環氧基的丙烯酸重複單元 (A-3)含環氧基的丙烯酸系黏合劑樹脂(重量平均分子量:5,500克/莫耳,RY-20-6,昭和電工有限公司),以所述黏合劑樹脂的總量計,包含25重量%的量的自(甲基)丙烯酸縮水甘油基酯誘導出的含環氧基的丙烯酸重複單元 (A-4)卡多系黏合劑樹脂(V259ME,新日鐵及住友化學(Nippon Steel & Sumikin Chemical,NSSC)有限公司) ( A ) Adhesive Resin (A-1) an epoxy-based acrylic adhesive resin (weight average molecular weight: 6,000 g/mole, RY-20, Showa Denko KK), as described The epoxy resin-containing repeating unit derived from glycidyl methacrylate was contained in an amount of 20% by weight based on the total amount of the binder resin. (A-2) an epoxy-based acrylic adhesive resin (weight average molecular weight: 6,500 g/mole, RY-48, Showa Denko Co., Ltd.), containing 30 parts by weight based on the total amount of the binder resin The amount of the epoxy group-containing acrylic acid repeating unit (A-3) induced by Cyclomer M100 (3,4-epoxycyclohexylmethyl (meth) acrylate) contains an epoxy group. Acrylic binder resin (weight average molecular weight: 5,500 g/mole, RY-20-6, Showa Denko Co., Ltd.), containing 25% by weight of the total amount of the binder resin Epoxy-containing repeating unit (A-4) card-based adhesive resin (V259ME, Nippon Steel & Sumikin Chemical (NSSC) Co., Ltd.)
( B )光可聚合單體 二季戊四醇六(甲基)丙烯酸酯(DPHA,日本化藥有限公司) ( B ) Photopolymerizable monomer Dipentaerythritol hexa(meth)acrylate (DPHA, Nippon Chemical Co., Ltd.)
( C )光聚合起始劑 肟系起始劑1(NCI-831,艾迪科公司(ADEKA Corp.)) ( C ) Photopolymerization initiator lanthanide initiator 1 (NCI-831, ADEKA Corp.)
( D )黑色著色劑 (D-1)紅色漆漿(mill base)(CI-IM-R179)分散液(阪田公司(SAKATA Corp.)) (D-2)紫羅蘭色漆漿(CI-IM-R29)分散液(阪田公司) (D-3)藍色漆漿(CI-IM-R15:6)分散液(阪田公司) (D-4)碳黑漆漿(CI-IM-R179)分散液(特色有限公司(TOKUSIKI Co., Ltd.)) ( D ) Black colorant (D-1) red mill base (CI-IM-R179) dispersion (SAKATA Corp.) (D-2) violet paint paste (CI-IM- R29) Dispersion (Sakada Co., Ltd.) (D-3) Blue lacquer (CI-IM-R15:6) dispersion (Sakada Co., Ltd.) (D-4) Carbon black lacquer (CI-IM-R179) dispersion (TOKUSIKI Co., Ltd.)
( E )溶劑 (E-1)丙二醇單甲醚乙酸酯(PGMEA) (E-2)二乙二醇甲乙醚 ( E ) Solvent (E-1) Propylene Glycol Monomethyl Ether Acetate (PGMEA) (E-2) Diethylene Glycol Methyl Ether
( F )其他添加劑
調平劑(F-554(10%的稀釋溶液),迪愛生有限公司(DIC Co., Ltd.)) [表1] (單位:克)
(評估)(assessment)
製程裕度及錐角Process margin and cone angle
依據塗佈機器(三笠有限公司(MIKASA Co., Ltd.))利用旋塗方法、狹縫塗佈方法、輥塗方法、網版印刷方法、塗料器方法等在玻璃基板上將根據實例1至實例4以及比較例1至比較例5的光敏性樹脂組成物分別塗佈成具有預定厚度,在70℃至100℃下在熱板上將所述光敏性樹脂組成物加熱了1分鐘至10分鐘(乾燥)以移除溶劑並獲得膜。藉由使用曝光器(HB-50110AA,優志旺公司(Ushio Inc.))及曝光劑量為50毫焦/平方公分的半色調遮罩曝光了所述膜。隨後,利用顯影器(SSP-200,SVS公司(SVS Corp.))在0.2%的KOH水溶液中將所述膜顯影了150秒,且在230℃下在烤箱中硬性烘烤(hard-bake)(或後烘烤)了30分鐘以獲得圖案化光敏性樹脂膜樣品。關於圖案化樣品,藉由使用掃描式電子顯微鏡(SEM)量測了其錐角,且結果示於表2以及圖1至圖6中。According to the coating machine (MIKASA Co., Ltd.), the spin coating method, the slit coating method, the roll coating method, the screen printing method, the coater method, and the like are used on the glass substrate according to Example 1 to The photosensitive resin compositions of Example 4 and Comparative Example 1 to Comparative Example 5 were respectively coated to have a predetermined thickness, and the photosensitive resin composition was heated on a hot plate at 70 ° C to 100 ° C for 1 minute to 10 minutes. (drying) to remove the solvent and obtain a film. The film was exposed by using an exposure device (HB-50110AA, Ushio Inc.) and a halftone mask having an exposure dose of 50 mJ/cm 2 . Subsequently, the film was developed in a 0.2% aqueous KOH solution using a developing device (SSP-200, SVS Corp.) for 150 seconds, and hard-bake in an oven at 230 ° C. (or post-baking) for 30 minutes to obtain a patterned photosensitive resin film sample. Regarding the patterned sample, the taper angle thereof was measured by using a scanning electron microscope (SEM), and the results are shown in Table 2 and FIGS. 1 to 6.
另外,藉由量測在使用半色調遮罩而進行的曝光中曝光之前及曝光之後的半色調區域的高度評估了製程裕度,且結果示於表3中。 [表2]
參考表2及表3以及圖1至圖6,根據一實施例的以光敏性樹脂組成物的總量計包含1重量%至20重量%的含環氧基的丙烯酸系黏合劑樹脂(但無卡多系黏合劑樹脂)的光敏性樹脂組成物提供了具有大於或等於20°的錐角的圖案化光敏性樹脂層,且相較於其他光敏性樹脂組成物示出了優異的製程裕度。Referring to Tables 2 and 3 and FIGS. 1 to 6, according to an embodiment, the epoxy group-containing acrylic adhesive resin is contained in an amount of from 1% by weight to 20% by weight based on the total amount of the photosensitive resin composition (but not The photosensitive resin composition of the card-based adhesive resin) provides a patterned photosensitive resin layer having a taper angle of 20 or more, and exhibits an excellent process margin compared to other photosensitive resin compositions. .
由於含環氧基的丙烯酸系黏合劑樹脂中更包含環氧基,因此圖案化光敏性樹脂層的圖案具有更高的錐角。Since the epoxy group-containing acrylic binder resin further contains an epoxy group, the pattern of the patterned photosensitive resin layer has a higher taper angle.
雖然本發明已結合目前視為實用的示例性實施例加以闡述,但應理解,本發明不限於所揭露的實施例,而是相反地意欲涵蓋包含在隨附申請專利範圍的精神及範圍內的各種修改及等效配置。因此,應理解上述實施例為示範性的,而不以任何方式限制本發明。Although the present invention has been described in connection with the exemplary embodiments of the present invention, it is understood that the invention is not to be construed as limited Various modifications and equivalent configurations. Therefore, the above embodiments are to be considered as illustrative and not restrictive.
無no
圖1至圖6獨立地為應用根據實例1至實例4以及比較例1至比較例2的光敏性樹脂組成物製造的光敏性樹脂層的掃描式電子顯微鏡(scanning electron microscope,SEM)照片。1 to 6 are scanning electron microscope (SEM) photographs of photosensitive resin layers produced by using the photosensitive resin compositions of Examples 1 to 4 and Comparative Examples 1 to 2, respectively.
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- 2016-11-10 WO PCT/KR2016/012938 patent/WO2017179783A1/en active Application Filing
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2017
- 2017-02-20 TW TW106105516A patent/TWI629565B/en active
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Publication number | Publication date |
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KR20170117746A (en) | 2017-10-24 |
WO2017179783A1 (en) | 2017-10-19 |
TWI629565B (en) | 2018-07-11 |
KR101906280B1 (en) | 2018-10-10 |
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