TW201721285A - 感光性樹脂組成物、保護膜以及液晶顯示元件 - Google Patents
感光性樹脂組成物、保護膜以及液晶顯示元件 Download PDFInfo
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- TW201721285A TW201721285A TW104141864A TW104141864A TW201721285A TW 201721285 A TW201721285 A TW 201721285A TW 104141864 A TW104141864 A TW 104141864A TW 104141864 A TW104141864 A TW 104141864A TW 201721285 A TW201721285 A TW 201721285A
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- 239000011342 resin composition Substances 0.000 title claims abstract description 59
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 23
- 239000000178 monomer Substances 0.000 claims abstract description 124
- 239000002904 solvent Substances 0.000 claims abstract description 38
- 150000001244 carboxylic acid anhydrides Chemical group 0.000 claims abstract description 28
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims abstract description 10
- 125000004432 carbon atom Chemical group C* 0.000 claims description 91
- 239000000805 composite resin Substances 0.000 claims description 52
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 44
- 125000000217 alkyl group Chemical group 0.000 claims description 36
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 24
- 230000001681 protective effect Effects 0.000 claims description 24
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 19
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 18
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 18
- 229910052799 carbon Inorganic materials 0.000 claims description 18
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 claims description 17
- 125000003118 aryl group Chemical group 0.000 claims description 14
- 239000003795 chemical substances by application Substances 0.000 claims description 14
- 125000003545 alkoxy group Chemical group 0.000 claims description 11
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 11
- 229910052736 halogen Inorganic materials 0.000 claims description 10
- 150000002367 halogens Chemical class 0.000 claims description 9
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 5
- 125000002947 alkylene group Chemical group 0.000 claims description 4
- 125000002843 carboxylic acid group Chemical group 0.000 claims description 4
- NBTOZLQBSIZIKS-UHFFFAOYSA-N methoxide Chemical compound [O-]C NBTOZLQBSIZIKS-UHFFFAOYSA-N 0.000 claims description 3
- 125000005702 oxyalkylene group Chemical group 0.000 claims description 3
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 8
- 150000001735 carboxylic acids Chemical class 0.000 claims 1
- -1 O-Naphthoquinone diazide sulfonic acid ester Chemical class 0.000 abstract description 139
- 239000000126 substance Substances 0.000 abstract description 26
- 239000000203 mixture Substances 0.000 abstract description 20
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract description 17
- 239000011347 resin Substances 0.000 abstract description 4
- 229920005989 resin Polymers 0.000 abstract description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 62
- 239000010408 film Substances 0.000 description 56
- 150000001875 compounds Chemical class 0.000 description 41
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 33
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 31
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 29
- 125000001424 substituent group Chemical group 0.000 description 29
- 239000000243 solution Substances 0.000 description 27
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 26
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 25
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 23
- 230000015572 biosynthetic process Effects 0.000 description 21
- 150000002430 hydrocarbons Chemical group 0.000 description 21
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 19
- 229920001577 copolymer Polymers 0.000 description 19
- 238000003756 stirring Methods 0.000 description 19
- 238000003786 synthesis reaction Methods 0.000 description 19
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 18
- 239000002253 acid Substances 0.000 description 17
- 238000006068 polycondensation reaction Methods 0.000 description 17
- 238000000576 coating method Methods 0.000 description 14
- 239000008367 deionised water Substances 0.000 description 14
- 229910021641 deionized water Inorganic materials 0.000 description 14
- 239000000758 substrate Substances 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 13
- 238000004821 distillation Methods 0.000 description 13
- 125000001624 naphthyl group Chemical group 0.000 description 13
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 12
- 238000006116 polymerization reaction Methods 0.000 description 12
- 150000004060 quinone imines Chemical class 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 11
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 11
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 11
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 10
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 10
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 9
- NECRQCBKTGZNMH-UHFFFAOYSA-N 3,5-dimethylhex-1-yn-3-ol Chemical compound CC(C)CC(C)(O)C#C NECRQCBKTGZNMH-UHFFFAOYSA-N 0.000 description 9
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 9
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 9
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 8
- 230000001476 alcoholic effect Effects 0.000 description 8
- 150000001923 cyclic compounds Chemical class 0.000 description 8
- 229910001873 dinitrogen Inorganic materials 0.000 description 8
- 150000002148 esters Chemical class 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 8
- 239000007787 solid Substances 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 7
- 125000003342 alkenyl group Chemical group 0.000 description 7
- 150000005215 alkyl ethers Chemical class 0.000 description 7
- 125000000304 alkynyl group Chemical group 0.000 description 7
- 239000002585 base Substances 0.000 description 7
- 239000003054 catalyst Substances 0.000 description 7
- 125000006612 decyloxy group Chemical group 0.000 description 7
- 150000002440 hydroxy compounds Chemical class 0.000 description 7
- 150000003839 salts Chemical class 0.000 description 7
- 239000004094 surface-active agent Substances 0.000 description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 6
- GXDMUOPCQNLBCZ-UHFFFAOYSA-N 3-(3-triethoxysilylpropyl)oxolane-2,5-dione Chemical compound CCO[Si](OCC)(OCC)CCCC1CC(=O)OC1=O GXDMUOPCQNLBCZ-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 6
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 5
- 239000002202 Polyethylene glycol Substances 0.000 description 5
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 230000000996 additive effect Effects 0.000 description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 238000007334 copolymerization reaction Methods 0.000 description 5
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 5
- 125000004464 hydroxyphenyl group Chemical group 0.000 description 5
- 150000002466 imines Chemical class 0.000 description 5
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 5
- 125000003367 polycyclic group Chemical group 0.000 description 5
- 229920001223 polyethylene glycol Polymers 0.000 description 5
- 239000011265 semifinished product Substances 0.000 description 5
- UAJRSHJHFRVGMG-UHFFFAOYSA-N 1-ethenyl-4-methoxybenzene Chemical compound COC1=CC=C(C=C)C=C1 UAJRSHJHFRVGMG-UHFFFAOYSA-N 0.000 description 4
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 4
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 4
- CPEXFJVZFNYXGU-UHFFFAOYSA-N 2,4,6-trihydroxybenzophenone Chemical compound OC1=CC(O)=CC(O)=C1C(=O)C1=CC=CC=C1 CPEXFJVZFNYXGU-UHFFFAOYSA-N 0.000 description 4
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 4
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 4
- XNWPXDGRBWJIES-UHFFFAOYSA-N Maclurin Natural products OC1=CC(O)=CC(O)=C1C(=O)C1=CC=C(O)C(O)=C1 XNWPXDGRBWJIES-UHFFFAOYSA-N 0.000 description 4
- 229920000877 Melamine resin Polymers 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 125000000753 cycloalkyl group Chemical group 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 4
- 125000000623 heterocyclic group Chemical group 0.000 description 4
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 4
- 150000002576 ketones Chemical class 0.000 description 4
- 239000012046 mixed solvent Substances 0.000 description 4
- 229960003742 phenol Drugs 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 4
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 4
- ZRDYULMDEGRWRC-UHFFFAOYSA-N (4-hydroxyphenyl)-(2,3,4-trihydroxyphenyl)methanone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=C(O)C(O)=C1O ZRDYULMDEGRWRC-UHFFFAOYSA-N 0.000 description 3
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 3
- RKMGAJGJIURJSJ-UHFFFAOYSA-N 2,2,6,6-Tetramethylpiperidine Substances CC1(C)CCCC(C)(C)N1 RKMGAJGJIURJSJ-UHFFFAOYSA-N 0.000 description 3
- HTQNYBBTZSBWKL-UHFFFAOYSA-N 2,3,4-trihydroxbenzophenone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1 HTQNYBBTZSBWKL-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- IUVCFHHAEHNCFT-INIZCTEOSA-N 2-[(1s)-1-[4-amino-3-(3-fluoro-4-propan-2-yloxyphenyl)pyrazolo[3,4-d]pyrimidin-1-yl]ethyl]-6-fluoro-3-(3-fluorophenyl)chromen-4-one Chemical compound C1=C(F)C(OC(C)C)=CC=C1C(C1=C(N)N=CN=C11)=NN1[C@@H](C)C1=C(C=2C=C(F)C=CC=2)C(=O)C2=CC(F)=CC=C2O1 IUVCFHHAEHNCFT-INIZCTEOSA-N 0.000 description 3
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 3
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical group COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 description 3
- WXYSZTISEJBRHW-UHFFFAOYSA-N 4-[2-[4-[1,1-bis(4-hydroxyphenyl)ethyl]phenyl]propan-2-yl]phenol Chemical compound C=1C=C(C(C)(C=2C=CC(O)=CC=2)C=2C=CC(O)=CC=2)C=CC=1C(C)(C)C1=CC=C(O)C=C1 WXYSZTISEJBRHW-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- 239000013065 commercial product Substances 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Substances NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000006460 hydrolysis reaction Methods 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 239000003456 ion exchange resin Substances 0.000 description 3
- 229920003303 ion-exchange polymer Polymers 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 229920000058 polyacrylate Polymers 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000003505 polymerization initiator Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 3
- DTGKSKDOIYIVQL-WEDXCCLWSA-N (+)-borneol Chemical group C1C[C@@]2(C)[C@@H](O)C[C@@H]1C2(C)C DTGKSKDOIYIVQL-WEDXCCLWSA-N 0.000 description 2
- GBQZZLQKUYLGFT-UHFFFAOYSA-N (2,4-dihydroxyphenyl)-(2,3,4-trihydroxyphenyl)methanone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=C(O)C(O)=C1O GBQZZLQKUYLGFT-UHFFFAOYSA-N 0.000 description 2
- OKJFKPFBSPZTAH-UHFFFAOYSA-N (2,4-dihydroxyphenyl)-(4-hydroxyphenyl)methanone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1O OKJFKPFBSPZTAH-UHFFFAOYSA-N 0.000 description 2
- AXIIFBJDJHDNGW-UHFFFAOYSA-N (2,5-dihydroxyphenyl)-(2,3,4-trihydroxyphenyl)methanone Chemical compound OC1=CC=C(O)C(C(=O)C=2C(=C(O)C(O)=CC=2)O)=C1 AXIIFBJDJHDNGW-UHFFFAOYSA-N 0.000 description 2
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 2
- NJMCHQONLVUNAM-UHFFFAOYSA-N (2-nitrophenyl)methyl n-cyclohexylcarbamate Chemical compound [O-][N+](=O)C1=CC=CC=C1COC(=O)NC1CCCCC1 NJMCHQONLVUNAM-UHFFFAOYSA-N 0.000 description 2
- VPBZZPOGZPKYKX-UHFFFAOYSA-N 1,2-diethoxypropane Chemical compound CCOCC(C)OCC VPBZZPOGZPKYKX-UHFFFAOYSA-N 0.000 description 2
- DCTOHCCUXLBQMS-UHFFFAOYSA-N 1-undecene Chemical compound CCCCCCCCCC=C DCTOHCCUXLBQMS-UHFFFAOYSA-N 0.000 description 2
- SDJHPPZKZZWAKF-UHFFFAOYSA-N 2,3-dimethylbuta-1,3-diene Chemical compound CC(=C)C(C)=C SDJHPPZKZZWAKF-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- AFIAIUIEAKCWCD-UHFFFAOYSA-N 2-cyclohexyl-4-[(5-cyclohexyl-4-hydroxy-2-methylphenyl)-(2-hydroxyphenyl)methyl]-5-methylphenol Chemical compound CC1=CC(O)=C(C2CCCCC2)C=C1C(C=1C(=CC(O)=C(C2CCCCC2)C=1)C)C1=CC=CC=C1O AFIAIUIEAKCWCD-UHFFFAOYSA-N 0.000 description 2
- TUBNHXBTFDDYPI-UHFFFAOYSA-N 2-cyclohexyl-4-[(5-cyclohexyl-4-hydroxy-2-methylphenyl)-(4-hydroxyphenyl)methyl]-5-methylphenol Chemical compound CC1=CC(O)=C(C2CCCCC2)C=C1C(C=1C(=CC(O)=C(C2CCCCC2)C=1)C)C1=CC=C(O)C=C1 TUBNHXBTFDDYPI-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- BNDRWEVUODOUDW-UHFFFAOYSA-N 3-Hydroxy-3-methylbutan-2-one Chemical compound CC(=O)C(C)(C)O BNDRWEVUODOUDW-UHFFFAOYSA-N 0.000 description 2
- VAJVDSVGBWFCLW-UHFFFAOYSA-N 3-Phenyl-1-propanol Chemical compound OCCCC1=CC=CC=C1 VAJVDSVGBWFCLW-UHFFFAOYSA-N 0.000 description 2
- NBLFJUWXERDUEN-UHFFFAOYSA-N 4-[(2,3,4-trihydroxyphenyl)methyl]benzene-1,2,3-triol Chemical compound OC1=C(O)C(O)=CC=C1CC1=CC=C(O)C(O)=C1O NBLFJUWXERDUEN-UHFFFAOYSA-N 0.000 description 2
- FNFYXIMJKWENNK-UHFFFAOYSA-N 4-[(2,4-dihydroxyphenyl)methyl]benzene-1,3-diol Chemical compound OC1=CC(O)=CC=C1CC1=CC=C(O)C=C1O FNFYXIMJKWENNK-UHFFFAOYSA-N 0.000 description 2
- DEZQZRQRHKJVHD-UHFFFAOYSA-N 4-[(4-hydroxy-2,5-dimethylphenyl)-(3-hydroxyphenyl)methyl]-2,5-dimethylphenol Chemical compound C1=C(O)C(C)=CC(C(C=2C=C(O)C=CC=2)C=2C(=CC(O)=C(C)C=2)C)=C1C DEZQZRQRHKJVHD-UHFFFAOYSA-N 0.000 description 2
- PFYOKZAFMIWTQL-UHFFFAOYSA-N 4-[(4-hydroxy-2,5-dimethylphenyl)-(4-hydroxyphenyl)methyl]-2,5-dimethylphenol Chemical compound C1=C(O)C(C)=CC(C(C=2C=CC(O)=CC=2)C=2C(=CC(O)=C(C)C=2)C)=C1C PFYOKZAFMIWTQL-UHFFFAOYSA-N 0.000 description 2
- WHKJCZQKHJHUBB-UHFFFAOYSA-N 4-[(4-hydroxy-3,5-dimethylphenyl)-(3-hydroxyphenyl)methyl]-2,6-dimethylphenol Chemical compound CC1=C(O)C(C)=CC(C(C=2C=C(O)C=CC=2)C=2C=C(C)C(O)=C(C)C=2)=C1 WHKJCZQKHJHUBB-UHFFFAOYSA-N 0.000 description 2
- YMSALPCDWZMQQG-UHFFFAOYSA-N 4-[2-(2,4-dihydroxyphenyl)propan-2-yl]benzene-1,3-diol Chemical compound C=1C=C(O)C=C(O)C=1C(C)(C)C1=CC=C(O)C=C1O YMSALPCDWZMQQG-UHFFFAOYSA-N 0.000 description 2
- QBFWOUJDPJACIQ-UHFFFAOYSA-N 4-[2-[4-[1,1-bis(4-hydroxy-3-methylphenyl)ethyl]phenyl]propan-2-yl]-2-methylphenol Chemical compound C1=C(O)C(C)=CC(C(C)(C)C=2C=CC(=CC=2)C(C)(C=2C=C(C)C(O)=CC=2)C=2C=C(C)C(O)=CC=2)=C1 QBFWOUJDPJACIQ-UHFFFAOYSA-N 0.000 description 2
- QADWFOCZWOGZGV-UHFFFAOYSA-N 4-[bis(4-hydroxy-2,5-dimethylphenyl)methyl]benzene-1,2-diol Chemical compound C1=C(O)C(C)=CC(C(C=2C=C(O)C(O)=CC=2)C=2C(=CC(O)=C(C)C=2)C)=C1C QADWFOCZWOGZGV-UHFFFAOYSA-N 0.000 description 2
- QLLXOMGGDNSEMO-UHFFFAOYSA-N 4-[bis(4-hydroxy-2,5-dimethylphenyl)methyl]benzene-1,3-diol Chemical compound C1=C(O)C(C)=CC(C(C=2C(=CC(O)=CC=2)O)C=2C(=CC(O)=C(C)C=2)C)=C1C QLLXOMGGDNSEMO-UHFFFAOYSA-N 0.000 description 2
- UWFUILMHBCVIMK-UHFFFAOYSA-N 4-[bis(4-hydroxy-3,5-dimethylphenyl)methyl]benzene-1,2-diol Chemical compound CC1=C(O)C(C)=CC(C(C=2C=C(O)C(O)=CC=2)C=2C=C(C)C(O)=C(C)C=2)=C1 UWFUILMHBCVIMK-UHFFFAOYSA-N 0.000 description 2
- WFCQTAXSWSWIHS-UHFFFAOYSA-N 4-[bis(4-hydroxyphenyl)methyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C1=CC=C(O)C=C1 WFCQTAXSWSWIHS-UHFFFAOYSA-N 0.000 description 2
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical group C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- MRABAEUHTLLEML-UHFFFAOYSA-N Butyl lactate Chemical compound CCCCOC(=O)C(C)O MRABAEUHTLLEML-UHFFFAOYSA-N 0.000 description 2
- QBSZKOXEASPZRG-UHFFFAOYSA-N C(=CC)OCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound C(=CC)OCCCC(C(OC)(OC)OC)CCCCCCCC QBSZKOXEASPZRG-UHFFFAOYSA-N 0.000 description 2
- KWAQRVCUMCUIGJ-UHFFFAOYSA-N CC1CCCC(C)N1C(=O)OC1CCCC1 Chemical compound CC1CCCC(C)N1C(=O)OC1CCCC1 KWAQRVCUMCUIGJ-UHFFFAOYSA-N 0.000 description 2
- ZTEZGMOZLBDPTB-UHFFFAOYSA-N CCC(CC)OC(=O)N(C(C)C)C(C)C Chemical compound CCC(CC)OC(=O)N(C(C)C)C(C)C ZTEZGMOZLBDPTB-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- YBCVMFKXIKNREZ-UHFFFAOYSA-N acoh acetic acid Chemical compound CC(O)=O.CC(O)=O YBCVMFKXIKNREZ-UHFFFAOYSA-N 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 239000002518 antifoaming agent Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- VALPXRNQZYGXPS-UHFFFAOYSA-N benzyl pyrrolidine-1-carboxylate Chemical compound C1CCCN1C(=O)OCC1=CC=CC=C1 VALPXRNQZYGXPS-UHFFFAOYSA-N 0.000 description 2
- WXNRYSGJLQFHBR-UHFFFAOYSA-N bis(2,4-dihydroxyphenyl)methanone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=C(O)C=C1O WXNRYSGJLQFHBR-UHFFFAOYSA-N 0.000 description 2
- 239000001191 butyl (2R)-2-hydroxypropanoate Substances 0.000 description 2
- SXPLZNMUBFBFIA-UHFFFAOYSA-N butyl(trimethoxy)silane Chemical compound CCCC[Si](OC)(OC)OC SXPLZNMUBFBFIA-UHFFFAOYSA-N 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 125000004663 dialkyl amino group Chemical group 0.000 description 2
- 229910000071 diazene Inorganic materials 0.000 description 2
- 150000005690 diesters Chemical class 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N diethylenediamine Natural products C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- 150000002009 diols Chemical class 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000032050 esterification Effects 0.000 description 2
- 238000005886 esterification reaction Methods 0.000 description 2
- 229940116333 ethyl lactate Drugs 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- OTTZHAVKAVGASB-UHFFFAOYSA-N hept-2-ene Chemical compound CCCCC=CC OTTZHAVKAVGASB-UHFFFAOYSA-N 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexamethylene diamine Natural products NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- QYZFTMMPKCOTAN-UHFFFAOYSA-N n-[2-(2-hydroxyethylamino)ethyl]-2-[[1-[2-(2-hydroxyethylamino)ethylamino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCNCCO QYZFTMMPKCOTAN-UHFFFAOYSA-N 0.000 description 2
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 2
- 150000002923 oximes Chemical class 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- XKJCHHZQLQNZHY-UHFFFAOYSA-N phthalimide Chemical compound C1=CC=C2C(=O)NC(=O)C2=C1 XKJCHHZQLQNZHY-UHFFFAOYSA-N 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- ZVHCAYYVMFILKM-UHFFFAOYSA-N propan-2-yl 2,6-dimethylpiperidine-1-carboxylate Chemical compound CC(C)OC(=O)N1C(C)CCCC1C ZVHCAYYVMFILKM-UHFFFAOYSA-N 0.000 description 2
- ILVGAIQLOCKNQA-UHFFFAOYSA-N propyl 2-hydroxypropanoate Chemical compound CCCOC(=O)C(C)O ILVGAIQLOCKNQA-UHFFFAOYSA-N 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 238000007142 ring opening reaction Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- KZNICNPSHKQLFF-UHFFFAOYSA-N succinimide Chemical compound O=C1CCC(=O)N1 KZNICNPSHKQLFF-UHFFFAOYSA-N 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 1
- BKQXXLVXLSREHB-UHFFFAOYSA-N (1,3-dioxobenzo[de]isoquinolin-2-yl) 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)ON(C1=O)C(=O)C2=C3C1=CC=CC3=CC=C2 BKQXXLVXLSREHB-UHFFFAOYSA-N 0.000 description 1
- LWHOMMCIJIJIGV-UHFFFAOYSA-N (1,3-dioxobenzo[de]isoquinolin-2-yl) trifluoromethanesulfonate Chemical compound C1=CC(C(N(OS(=O)(=O)C(F)(F)F)C2=O)=O)=C3C2=CC=CC3=C1 LWHOMMCIJIJIGV-UHFFFAOYSA-N 0.000 description 1
- FLBURFVEHMDJPO-UHFFFAOYSA-N (1,3-dioxoisoindol-2-yl) 2-(trifluoromethyl)benzenesulfonate Chemical compound FC(F)(F)C1=CC=CC=C1S(=O)(=O)ON1C(=O)C2=CC=CC=C2C1=O FLBURFVEHMDJPO-UHFFFAOYSA-N 0.000 description 1
- XEDWWPGWIXPVRQ-UHFFFAOYSA-N (2,3,4-trihydroxyphenyl)-(3,4,5-trihydroxyphenyl)methanone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC(O)=C(O)C(O)=C1 XEDWWPGWIXPVRQ-UHFFFAOYSA-N 0.000 description 1
- QWRVAXMLZCMVSL-UHFFFAOYSA-N (2,4,6-trihydroxyphenyl)-(3,4,5-trihydroxyphenyl)methanone Chemical compound OC1=CC(O)=CC(O)=C1C(=O)C1=CC(O)=C(O)C(O)=C1 QWRVAXMLZCMVSL-UHFFFAOYSA-N 0.000 description 1
- WDKXCMCPUBYZBF-UHFFFAOYSA-N (2,5-dioxo-3,4-diphenylpyrrol-1-yl) 2-(trifluoromethyl)benzenesulfonate Chemical compound FC(F)(F)C1=CC=CC=C1S(=O)(=O)ON1C(=O)C(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)C1=O WDKXCMCPUBYZBF-UHFFFAOYSA-N 0.000 description 1
- KQDCUEMOGIRBNY-UHFFFAOYSA-N (2,5-dioxo-3,4-diphenylpyrrol-1-yl) 4-fluorobenzenesulfonate Chemical compound C1=CC(F)=CC=C1S(=O)(=O)ON1C(=O)C(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)C1=O KQDCUEMOGIRBNY-UHFFFAOYSA-N 0.000 description 1
- RLLFCCPTQOZGOL-UHFFFAOYSA-N (2,5-dioxo-3,4-diphenylpyrrol-1-yl) trifluoromethanesulfonate Chemical compound O=C1N(OS(=O)(=O)C(F)(F)F)C(=O)C(C=2C=CC=CC=2)=C1C1=CC=CC=C1 RLLFCCPTQOZGOL-UHFFFAOYSA-N 0.000 description 1
- XMKFJAZDRZNWRC-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) 2-(trifluoromethyl)benzenesulfonate Chemical compound FC(F)(F)C1=CC=CC=C1S(=O)(=O)ON1C(=O)CCC1=O XMKFJAZDRZNWRC-UHFFFAOYSA-N 0.000 description 1
- PRHKHLYZXJWYMP-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) 4-fluorobenzenesulfonate Chemical compound C1=CC(F)=CC=C1S(=O)(=O)ON1C(=O)CCC1=O PRHKHLYZXJWYMP-UHFFFAOYSA-N 0.000 description 1
- OKRLWHAZMUFONP-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) trifluoromethanesulfonate Chemical compound FC(F)(F)S(=O)(=O)ON1C(=O)CCC1=O OKRLWHAZMUFONP-UHFFFAOYSA-N 0.000 description 1
- BQIGWYDQJHZPJL-UHFFFAOYSA-N (2,6-dinitrophenyl)methyl 4-aminobutanoate Chemical compound NCCCC(=O)OCC1=C([N+]([O-])=O)C=CC=C1[N+]([O-])=O BQIGWYDQJHZPJL-UHFFFAOYSA-N 0.000 description 1
- UTVGJHKGLOQOQM-UHFFFAOYSA-N (2,6-dinitrophenyl)methyl n-cyclohexylcarbamate Chemical compound [O-][N+](=O)C1=CC=CC([N+]([O-])=O)=C1COC(=O)NC1CCCCC1 UTVGJHKGLOQOQM-UHFFFAOYSA-N 0.000 description 1
- SDSYKTIIBSOEMS-UHFFFAOYSA-N (2,6-dinitrophenyl)methyl n-phenylcarbamate Chemical compound [O-][N+](=O)C1=CC=CC([N+]([O-])=O)=C1COC(=O)NC1=CC=CC=C1 SDSYKTIIBSOEMS-UHFFFAOYSA-N 0.000 description 1
- TWENFLVRXHKVBS-UHFFFAOYSA-N (2,6-dinitrophenyl)methyl piperidine-1-carboxylate Chemical compound [O-][N+](=O)C1=CC=CC([N+]([O-])=O)=C1COC(=O)N1CCCCC1 TWENFLVRXHKVBS-UHFFFAOYSA-N 0.000 description 1
- WVJRCSCNOMJNLP-UHFFFAOYSA-N (2-hydroxy-5-trimethoxysilylpentyl) 4-hydroxybenzoate Chemical compound CO[Si](OC)(OC)CCCC(O)COC(=O)C1=CC=C(O)C=C1 WVJRCSCNOMJNLP-UHFFFAOYSA-N 0.000 description 1
- XLBGWOVCPLFKCQ-UHFFFAOYSA-N (2-methylphenyl)-(2,3,4-trihydroxyphenyl)methanone Chemical compound CC1=CC=CC=C1C(=O)C1=CC=C(O)C(O)=C1O XLBGWOVCPLFKCQ-UHFFFAOYSA-N 0.000 description 1
- HGXJDMCMYLEZMJ-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy 2,2-dimethylpropaneperoxoate Chemical compound CC(C)(C)OOOC(=O)C(C)(C)C HGXJDMCMYLEZMJ-UHFFFAOYSA-N 0.000 description 1
- WMUZDBZPDLHUMW-UHFFFAOYSA-N (2-nitrophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC=C1[N+]([O-])=O WMUZDBZPDLHUMW-UHFFFAOYSA-N 0.000 description 1
- CSOKJZHSFJVMPT-UHFFFAOYSA-N (2-nitrophenyl)methyl 2-aminoacetate Chemical compound NCC(=O)OCC1=CC=CC=C1[N+]([O-])=O CSOKJZHSFJVMPT-UHFFFAOYSA-N 0.000 description 1
- HHHXRXOIOVPIPM-UHFFFAOYSA-N (2-nitrophenyl)methyl 4-aminobutanoate Chemical compound NCCCC(=O)OCC1=CC=CC=C1[N+]([O-])=O HHHXRXOIOVPIPM-UHFFFAOYSA-N 0.000 description 1
- LNHUMPJUKKMIQC-UHFFFAOYSA-N (2-nitrophenyl)methyl 7-aminoheptanoate Chemical compound NCCCCCCC(=O)OCC1=CC=CC=C1[N+]([O-])=O LNHUMPJUKKMIQC-UHFFFAOYSA-N 0.000 description 1
- AHBXIXRJLUDQNU-UHFFFAOYSA-N (2-nitrophenyl)methyl n-phenylcarbamate Chemical compound [O-][N+](=O)C1=CC=CC=C1COC(=O)NC1=CC=CC=C1 AHBXIXRJLUDQNU-UHFFFAOYSA-N 0.000 description 1
- ZZEHWWYWZYFYBV-UHFFFAOYSA-N (2-nitrophenyl)methyl piperidine-1-carboxylate Chemical compound [O-][N+](=O)C1=CC=CC=C1COC(=O)N1CCCCC1 ZZEHWWYWZYFYBV-UHFFFAOYSA-N 0.000 description 1
- DLDWUFCUUXXYTB-UHFFFAOYSA-N (2-oxo-1,2-diphenylethyl) 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OC(C=1C=CC=CC=1)C(=O)C1=CC=CC=C1 DLDWUFCUUXXYTB-UHFFFAOYSA-N 0.000 description 1
- FCIXQOGTJBVUNW-UHFFFAOYSA-N (3,5-dihydroxyphenyl)-(2,4,5-trihydroxyphenyl)methanone Chemical compound OC1=CC(O)=CC(C(=O)C=2C(=CC(O)=C(O)C=2)O)=C1 FCIXQOGTJBVUNW-UHFFFAOYSA-N 0.000 description 1
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- MIOPJNTWMNEORI-GMSGAONNSA-N (S)-camphorsulfonic acid Chemical compound C1C[C@@]2(CS(O)(=O)=O)C(=O)C[C@@H]1C2(C)C MIOPJNTWMNEORI-GMSGAONNSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- TUTZDQUUZDTAEA-UHFFFAOYSA-N 1,1-bis(tert-butylperoxy)cyclohexane;cyclohexane Chemical compound C1CCCCC1.CC(C)(C)OOC1(OOC(C)(C)C)CCCCC1 TUTZDQUUZDTAEA-UHFFFAOYSA-N 0.000 description 1
- VIESAWGOYVNHLV-UHFFFAOYSA-N 1,3-dihydropyrrol-2-one Chemical compound O=C1CC=CN1 VIESAWGOYVNHLV-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- SGUVLZREKBPKCE-UHFFFAOYSA-N 1,5-diazabicyclo[4.3.0]-non-5-ene Chemical compound C1CCN=C2CCCN21 SGUVLZREKBPKCE-UHFFFAOYSA-N 0.000 description 1
- QWOZZTWBWQMEPD-UHFFFAOYSA-N 1-(2-ethoxypropoxy)propan-2-ol Chemical compound CCOC(C)COCC(C)O QWOZZTWBWQMEPD-UHFFFAOYSA-N 0.000 description 1
- JQIQJUCEFIYYOJ-UHFFFAOYSA-M 1-(4-butoxynaphthalen-1-yl)thiolan-1-ium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C12=CC=CC=C2C(OCCCC)=CC=C1[S+]1CCCC1 JQIQJUCEFIYYOJ-UHFFFAOYSA-M 0.000 description 1
- DPOPGHCRRJYPMP-UHFFFAOYSA-N 1-[diazo(methylsulfonyl)methyl]sulfonyl-4-methylbenzene Chemical compound CC1=CC=C(S(=O)(=O)C(=[N+]=[N-])S(C)(=O)=O)C=C1 DPOPGHCRRJYPMP-UHFFFAOYSA-N 0.000 description 1
- HGTFIJMHKOINNU-UHFFFAOYSA-N 1-[diazo-(4-methylphenyl)methyl]-4-methylbenzene Chemical compound C1=CC(C)=CC=C1C(=[N+]=[N-])C1=CC=C(C)C=C1 HGTFIJMHKOINNU-UHFFFAOYSA-N 0.000 description 1
- NCFIKBMPEOEIED-UHFFFAOYSA-N 1-acridin-9-ylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=C(C=CC=C2)C2=NC2=CC=CC=C12 NCFIKBMPEOEIED-UHFFFAOYSA-N 0.000 description 1
- RZMUHBFEJHQHGM-UHFFFAOYSA-N 1-benzyl-1,2,2-trimethylhydrazine Chemical compound CN(C)N(C)CC1=CC=CC=C1 RZMUHBFEJHQHGM-UHFFFAOYSA-N 0.000 description 1
- MKRBAPNEJMFMHU-UHFFFAOYSA-N 1-benzylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1CC1=CC=CC=C1 MKRBAPNEJMFMHU-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- FUWDFGKRNIDKAE-UHFFFAOYSA-N 1-butoxypropan-2-yl acetate Chemical compound CCCCOCC(C)OC(C)=O FUWDFGKRNIDKAE-UHFFFAOYSA-N 0.000 description 1
- FNBHVKBYRFDOJK-UHFFFAOYSA-N 1-butoxypropan-2-yl propanoate Chemical compound CCCCOCC(C)OC(=O)CC FNBHVKBYRFDOJK-UHFFFAOYSA-N 0.000 description 1
- SMLNDVNTPWRZJH-UHFFFAOYSA-N 1-chloro-4-(trimethoxymethyl)dodecane Chemical compound ClCCCC(C(OC)(OC)OC)CCCCCCCC SMLNDVNTPWRZJH-UHFFFAOYSA-N 0.000 description 1
- RBYYFMWIKIJOTA-UHFFFAOYSA-N 1-chloro-4-[(4-chlorophenyl)-diazomethyl]benzene Chemical compound C1=CC(Cl)=CC=C1C(=[N+]=[N-])C1=CC=C(Cl)C=C1 RBYYFMWIKIJOTA-UHFFFAOYSA-N 0.000 description 1
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 description 1
- CMCBDXRRFKYBDG-UHFFFAOYSA-N 1-dodecoxydodecane Chemical compound CCCCCCCCCCCCOCCCCCCCCCCCC CMCBDXRRFKYBDG-UHFFFAOYSA-N 0.000 description 1
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- ZIKLJUUTSQYGQI-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxypropoxy)propane Chemical compound CCOCC(C)OCC(C)OCC ZIKLJUUTSQYGQI-UHFFFAOYSA-N 0.000 description 1
- JXFITNNCZLPZNX-UHFFFAOYSA-N 1-ethoxy-2-(2-methoxypropoxy)propane Chemical compound CCOCC(C)OCC(C)OC JXFITNNCZLPZNX-UHFFFAOYSA-N 0.000 description 1
- UYVDGHOUPDJWAZ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O.COCC(C)O UYVDGHOUPDJWAZ-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- DOVZUKKPYKRVIK-UHFFFAOYSA-N 1-methoxypropan-2-yl propanoate Chemical compound CCC(=O)OC(C)COC DOVZUKKPYKRVIK-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- UBNPTJSGEYBDCQ-UHFFFAOYSA-N 1-phenylethanone Chemical compound CC(=O)C1=CC=CC=C1.CC(=O)C1=CC=CC=C1 UBNPTJSGEYBDCQ-UHFFFAOYSA-N 0.000 description 1
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 1
- FENFUOGYJVOCRY-UHFFFAOYSA-N 1-propoxypropan-2-ol Chemical compound CCCOCC(C)O FENFUOGYJVOCRY-UHFFFAOYSA-N 0.000 description 1
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 1
- RVNBCIQRFGXLRD-UHFFFAOYSA-N 1-propoxypropan-2-yl propanoate Chemical compound CCCOCC(C)OC(=O)CC RVNBCIQRFGXLRD-UHFFFAOYSA-N 0.000 description 1
- GQCZPFJGIXHZMB-UHFFFAOYSA-N 1-tert-Butoxy-2-propanol Chemical compound CC(O)COC(C)(C)C GQCZPFJGIXHZMB-UHFFFAOYSA-N 0.000 description 1
- QWBBPBRQALCEIZ-UHFFFAOYSA-N 2,3-dimethylphenol Chemical compound CC1=CC=CC(O)=C1C QWBBPBRQALCEIZ-UHFFFAOYSA-N 0.000 description 1
- LXOFYPKXCSULTL-UHFFFAOYSA-N 2,4,7,9-tetramethyldec-5-yne-4,7-diol Chemical compound CC(C)CC(C)(O)C#CC(C)(O)CC(C)C LXOFYPKXCSULTL-UHFFFAOYSA-N 0.000 description 1
- BTRWELPXUDWAGW-UHFFFAOYSA-N 2,4,7,9-tetramethyldecane-4,7-diol Chemical compound CC(C)CC(C)(O)CCC(C)(O)CC(C)C BTRWELPXUDWAGW-UHFFFAOYSA-N 0.000 description 1
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- XKZQKPRCPNGNFR-UHFFFAOYSA-N 2-(3-hydroxyphenyl)phenol Chemical class OC1=CC=CC(C=2C(=CC=CC=2)O)=C1 XKZQKPRCPNGNFR-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- RVGLEPQPVDUSOJ-UHFFFAOYSA-N 2-Methyl-3-hydroxypropanoate Chemical compound COC(=O)CCO RVGLEPQPVDUSOJ-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- PYZCOYROAJKRSK-UHFFFAOYSA-N 2-[(2-carboxy-3-methylbutan-2-yl)diazenyl]-2,3-dimethylbutanoic acid Chemical compound CC(C)C(C)(C(O)=O)N=NC(C)(C(C)C)C(O)=O PYZCOYROAJKRSK-UHFFFAOYSA-N 0.000 description 1
- JFWFAUHHNYTWOO-UHFFFAOYSA-N 2-[(2-ethenylphenyl)methoxymethyl]oxirane Chemical compound C=CC1=CC=CC=C1COCC1OC1 JFWFAUHHNYTWOO-UHFFFAOYSA-N 0.000 description 1
- OCKQMFDZQUFKRD-UHFFFAOYSA-N 2-[(3-ethenylphenyl)methoxymethyl]oxirane Chemical compound C=CC1=CC=CC(COCC2OC2)=C1 OCKQMFDZQUFKRD-UHFFFAOYSA-N 0.000 description 1
- ZADXFVHUPXKZBJ-UHFFFAOYSA-N 2-[(4-ethenylphenyl)methoxymethyl]oxirane Chemical compound C1=CC(C=C)=CC=C1COCC1OC1 ZADXFVHUPXKZBJ-UHFFFAOYSA-N 0.000 description 1
- OENZCYOCXAUZOT-UHFFFAOYSA-N 2-[2-(2-ethenylphenyl)-1-[2-(2-ethenylphenyl)-1-(oxiran-2-yl)ethoxy]ethyl]oxirane Chemical compound C=CC1=CC=CC=C1CC(C1OC1)OC(C1OC1)CC1=CC=CC=C1C=C OENZCYOCXAUZOT-UHFFFAOYSA-N 0.000 description 1
- CWMLFHKGLMSMPE-UHFFFAOYSA-N 2-[2-(3-ethenylphenyl)-1-[2-(3-ethenylphenyl)-1-(oxiran-2-yl)ethoxy]ethyl]oxirane Chemical compound C=CC1=CC=CC(CC(OC(CC=2C=C(C=C)C=CC=2)C2OC2)C2OC2)=C1 CWMLFHKGLMSMPE-UHFFFAOYSA-N 0.000 description 1
- MFAWEYJGIGIYFH-UHFFFAOYSA-N 2-[4-(trimethoxymethyl)dodecoxymethyl]oxirane Chemical compound C(C1CO1)OCCCC(C(OC)(OC)OC)CCCCCCCC MFAWEYJGIGIYFH-UHFFFAOYSA-N 0.000 description 1
- SAFWZKVQMVOANB-UHFFFAOYSA-N 2-[tert-butylsulfonyl(diazo)methyl]sulfonyl-2-methylpropane Chemical compound CC(C)(C)S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C(C)(C)C SAFWZKVQMVOANB-UHFFFAOYSA-N 0.000 description 1
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 1
- SZTBMYHIYNGYIA-UHFFFAOYSA-N 2-chloroacrylic acid Chemical compound OC(=O)C(Cl)=C SZTBMYHIYNGYIA-UHFFFAOYSA-N 0.000 description 1
- YBEBOWPOGZFUTF-UHFFFAOYSA-N 2-cyclohexyl-4-[(3-cyclohexyl-4-hydroxyphenyl)-(2-hydroxyphenyl)methyl]phenol Chemical compound OC1=CC=CC=C1C(C=1C=C(C(O)=CC=1)C1CCCCC1)C1=CC=C(O)C(C2CCCCC2)=C1 YBEBOWPOGZFUTF-UHFFFAOYSA-N 0.000 description 1
- LKLREKOGUCIQMG-UHFFFAOYSA-N 2-cyclohexyl-4-[(3-cyclohexyl-4-hydroxyphenyl)-(3-hydroxyphenyl)methyl]phenol Chemical compound OC1=CC=CC(C(C=2C=C(C(O)=CC=2)C2CCCCC2)C=2C=C(C(O)=CC=2)C2CCCCC2)=C1 LKLREKOGUCIQMG-UHFFFAOYSA-N 0.000 description 1
- XYIJEFGAYUMNPF-UHFFFAOYSA-N 2-cyclohexyl-4-[(5-cyclohexyl-4-hydroxy-2-methylphenyl)-(3-hydroxyphenyl)methyl]-5-methylphenol Chemical compound CC1=CC(O)=C(C2CCCCC2)C=C1C(C=1C(=CC(O)=C(C2CCCCC2)C=1)C)C1=CC=CC(O)=C1 XYIJEFGAYUMNPF-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- IEGVDWILURGTCQ-UHFFFAOYSA-N 2-ethoxypropane ethyl acetate Chemical compound CCOC(C)C.CCOC(C)=O IEGVDWILURGTCQ-UHFFFAOYSA-N 0.000 description 1
- WROUWQQRXUBECT-UHFFFAOYSA-N 2-ethylacrylic acid Chemical compound CCC(=C)C(O)=O WROUWQQRXUBECT-UHFFFAOYSA-N 0.000 description 1
- YDVIGZXRWWELOG-UHFFFAOYSA-N 2-ethylperoxycarbonylcyclohexane-1-carboxylic acid Chemical compound CCOOC(=O)C1CCCCC1C(=O)O YDVIGZXRWWELOG-UHFFFAOYSA-N 0.000 description 1
- ICPWFHKNYYRBSZ-UHFFFAOYSA-M 2-methoxypropanoate Chemical compound COC(C)C([O-])=O ICPWFHKNYYRBSZ-UHFFFAOYSA-M 0.000 description 1
- SSVKYZDOIWXDIO-UHFFFAOYSA-N 2-methylbicyclo[2.2.1]hept-5-ene-3-carboxylic acid Chemical compound C1C2C=CC1C(C)C2C(O)=O SSVKYZDOIWXDIO-UHFFFAOYSA-N 0.000 description 1
- BFBZWJGZNJBOTP-UHFFFAOYSA-N 2-methylprop-1-enyl 4-ethylperoxy-4-oxobutanoate Chemical compound C(CCC(=O)OOCC)(=O)OC=C(C)C BFBZWJGZNJBOTP-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- HDDGHHVNVQKFIB-UHFFFAOYSA-N 2-naphthalen-2-yl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=2C=C3C=CC=CC3=CC=2)=N1 HDDGHHVNVQKFIB-UHFFFAOYSA-N 0.000 description 1
- HAZQZUFYRLFOLC-UHFFFAOYSA-N 2-phenyl-4,6-bis(trichloromethyl)-1,3,5-triazine Chemical compound ClC(Cl)(Cl)C1=NC(C(Cl)(Cl)Cl)=NC(C=2C=CC=CC=2)=N1 HAZQZUFYRLFOLC-UHFFFAOYSA-N 0.000 description 1
- WRMNZCZEMHIOCP-UHFFFAOYSA-N 2-phenylethanol Chemical compound OCCC1=CC=CC=C1 WRMNZCZEMHIOCP-UHFFFAOYSA-N 0.000 description 1
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 1
- HPJFXFRNEJHDFR-UHFFFAOYSA-N 22291-04-9 Chemical compound C1=CC(C(N(CCN(C)C)C2=O)=O)=C3C2=CC=C2C(=O)N(CCN(C)C)C(=O)C1=C32 HPJFXFRNEJHDFR-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- FDIFGEXETPKVSW-UHFFFAOYSA-N 3-(3-triethoxysilylpropyl)oxane-2,6-dione Chemical compound CCO[Si](OCC)(OCC)CCCC1CCC(=O)OC1=O FDIFGEXETPKVSW-UHFFFAOYSA-N 0.000 description 1
- ADXRZEBGDJHQDY-UHFFFAOYSA-N 3-(3-trimethoxysilylpropyl)oxane-2,6-dione Chemical compound CO[Si](OC)(OC)CCCC1CCC(=O)OC1=O ADXRZEBGDJHQDY-UHFFFAOYSA-N 0.000 description 1
- OMASDBUJEZKWEH-UHFFFAOYSA-N 3-(3-triphenoxysilylpropyl)oxane-2,6-dione Chemical compound O=C1OC(=O)CCC1CCC[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC1=CC=CC=C1 OMASDBUJEZKWEH-UHFFFAOYSA-N 0.000 description 1
- NGWKUHMGVOBTBY-UHFFFAOYSA-N 3-(3-triphenoxysilylpropyl)oxolane-2,5-dione Chemical compound O=C1OC(=O)CC1CCC[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC1=CC=CC=C1 NGWKUHMGVOBTBY-UHFFFAOYSA-N 0.000 description 1
- LBIHNTAFJVHBLJ-UHFFFAOYSA-N 3-(triethoxymethyl)undec-1-ene Chemical compound C(=C)C(C(OCC)(OCC)OCC)CCCCCCCC LBIHNTAFJVHBLJ-UHFFFAOYSA-N 0.000 description 1
- PSJMFFPLCUMKBA-UHFFFAOYSA-N 3-[2-(oxetan-2-yl)butoxy]propyl-triphenoxysilane Chemical compound C1COC1C(CC)COCCC[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC1=CC=CC=C1 PSJMFFPLCUMKBA-UHFFFAOYSA-N 0.000 description 1
- DOYKFSOCSXVQAN-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C(C)=C DOYKFSOCSXVQAN-UHFFFAOYSA-N 0.000 description 1
- CWZVVLPLAZMUDE-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate;3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C.CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C CWZVVLPLAZMUDE-UHFFFAOYSA-N 0.000 description 1
- NTKBNCABAMQDIG-UHFFFAOYSA-N 3-butoxypropan-1-ol Chemical compound CCCCOCCCO NTKBNCABAMQDIG-UHFFFAOYSA-N 0.000 description 1
- MPOALQKBTBMQBP-UHFFFAOYSA-N 3-ethyl-1-methylpyrrolidin-2-one Chemical compound CCC1CCN(C)C1=O MPOALQKBTBMQBP-UHFFFAOYSA-N 0.000 description 1
- YRTGWRSQRUHPKX-UHFFFAOYSA-N 3-ethyloxolane-2,5-dione Chemical compound CCC1CC(=O)OC1=O YRTGWRSQRUHPKX-UHFFFAOYSA-N 0.000 description 1
- BIGOJJYDFLNSGB-UHFFFAOYSA-N 3-isocyanopropyl(trimethoxy)silane Chemical group CO[Si](OC)(OC)CCC[N+]#[C-] BIGOJJYDFLNSGB-UHFFFAOYSA-N 0.000 description 1
- JSGVZVOGOQILFM-UHFFFAOYSA-N 3-methoxy-1-butanol Chemical compound COC(C)CCO JSGVZVOGOQILFM-UHFFFAOYSA-N 0.000 description 1
- MFKRHJVUCZRDTF-UHFFFAOYSA-N 3-methoxy-3-methylbutan-1-ol Chemical compound COC(C)(C)CCO MFKRHJVUCZRDTF-UHFFFAOYSA-N 0.000 description 1
- VATRWWPJWVCZTA-UHFFFAOYSA-N 3-oxo-n-[2-(trifluoromethyl)phenyl]butanamide Chemical compound CC(=O)CC(=O)NC1=CC=CC=C1C(F)(F)F VATRWWPJWVCZTA-UHFFFAOYSA-N 0.000 description 1
- GDYHZWACXKRPOI-UHFFFAOYSA-N 3-phenoxysilyl-3,4,4-tripropyloxolane-2,5-dione Chemical compound CCCC1(CCC)C(=O)OC(=O)C1(CCC)[SiH2]Oc1ccccc1 GDYHZWACXKRPOI-UHFFFAOYSA-N 0.000 description 1
- LDMRLRNXHLPZJN-UHFFFAOYSA-N 3-propoxypropan-1-ol Chemical compound CCCOCCCO LDMRLRNXHLPZJN-UHFFFAOYSA-N 0.000 description 1
- JIUWLLYCZJHZCZ-UHFFFAOYSA-N 3-propyloxolane-2,5-dione Chemical compound CCCC1CC(=O)OC1=O JIUWLLYCZJHZCZ-UHFFFAOYSA-N 0.000 description 1
- VLDGDHUUVXSDKE-UHFFFAOYSA-N 3-triethoxysilylpropyl but-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C=CC VLDGDHUUVXSDKE-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- PBYDIWCXDGMNRO-UHFFFAOYSA-N 3-trimethoxysilylpropyl but-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=CC PBYDIWCXDGMNRO-UHFFFAOYSA-N 0.000 description 1
- VFXXTYGQYWRHJP-UHFFFAOYSA-N 4,4'-azobis(4-cyanopentanoic acid) Chemical compound OC(=O)CCC(C)(C#N)N=NC(C)(CCC(O)=O)C#N VFXXTYGQYWRHJP-UHFFFAOYSA-N 0.000 description 1
- XXKJURMSOICRCK-UHFFFAOYSA-N 4-(2-trimethoxysilylethyl)phenol Chemical compound CO[Si](OC)(OC)CCC1=CC=C(O)C=C1 XXKJURMSOICRCK-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- DFYGYTNMHPUJBY-UHFFFAOYSA-N 4-(trimethoxymethyl)dodecane-1-thiol Chemical compound SCCCC(C(OC)(OC)OC)CCCCCCCC DFYGYTNMHPUJBY-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- SYSAMKJRACWTNY-UHFFFAOYSA-N 4-[(2-hydroxyphenyl)methyl]-2,5-dimethylphenol Chemical compound C1=C(O)C(C)=CC(CC=2C(=CC=CC=2)O)=C1C SYSAMKJRACWTNY-UHFFFAOYSA-N 0.000 description 1
- YNICUQBUXHBYCH-UHFFFAOYSA-N 4-[(4-hydroxy-2,5-dimethylphenyl)-(2-hydroxyphenyl)methyl]-2,5-dimethylphenol Chemical compound C1=C(O)C(C)=CC(C(C=2C(=CC=CC=2)O)C=2C(=CC(O)=C(C)C=2)C)=C1C YNICUQBUXHBYCH-UHFFFAOYSA-N 0.000 description 1
- BMCUJWGUNKCREZ-UHFFFAOYSA-N 4-[(4-hydroxy-3,5-dimethylphenyl)-(2-hydroxyphenyl)methyl]-2,6-dimethylphenol Chemical compound CC1=C(O)C(C)=CC(C(C=2C=C(C)C(O)=C(C)C=2)C=2C(=CC=CC=2)O)=C1 BMCUJWGUNKCREZ-UHFFFAOYSA-N 0.000 description 1
- OHKTUDSKDILFJC-UHFFFAOYSA-N 4-[(4-hydroxy-3,5-dimethylphenyl)-(4-hydroxyphenyl)methyl]-2,6-dimethylphenol Chemical compound CC1=C(O)C(C)=CC(C(C=2C=CC(O)=CC=2)C=2C=C(C)C(O)=C(C)C=2)=C1 OHKTUDSKDILFJC-UHFFFAOYSA-N 0.000 description 1
- LCJZSIQEJPHPMR-UHFFFAOYSA-N 4-[(4-hydroxy-3-methylphenyl)-(2-hydroxyphenyl)methyl]-2-methylphenol Chemical compound C1=C(O)C(C)=CC(C(C=2C=C(C)C(O)=CC=2)C=2C(=CC=CC=2)O)=C1 LCJZSIQEJPHPMR-UHFFFAOYSA-N 0.000 description 1
- NYIWTDSCYULDTJ-UHFFFAOYSA-N 4-[2-(2,3,4-trihydroxyphenyl)propan-2-yl]benzene-1,2,3-triol Chemical compound C=1C=C(O)C(O)=C(O)C=1C(C)(C)C1=CC=C(O)C(O)=C1O NYIWTDSCYULDTJ-UHFFFAOYSA-N 0.000 description 1
- CYTKVAARVZTBKG-UHFFFAOYSA-N 4-[2-(4-hydroxy-3,5-dimethylphenyl)propan-2-yl]benzene-1,2,3-triol Chemical compound CC1=C(O)C(C)=CC(C(C)(C)C=2C(=C(O)C(O)=CC=2)O)=C1 CYTKVAARVZTBKG-UHFFFAOYSA-N 0.000 description 1
- DUDHQMBWDYUTSK-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)propan-2-yl]benzene-1,2,3-triol Chemical compound C=1C=C(O)C(O)=C(O)C=1C(C)(C)C1=CC=C(O)C=C1 DUDHQMBWDYUTSK-UHFFFAOYSA-N 0.000 description 1
- XJGTVJRTDRARGO-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)propan-2-yl]benzene-1,3-diol Chemical compound C=1C=C(O)C=C(O)C=1C(C)(C)C1=CC=C(O)C=C1 XJGTVJRTDRARGO-UHFFFAOYSA-N 0.000 description 1
- CPNDDTGXIGEDHJ-UHFFFAOYSA-N 4-[[amino(benzyl)amino]methyl]phenol Chemical compound OC1=CC=C(CN(N)CC2=CC=CC=C2)C=C1 CPNDDTGXIGEDHJ-UHFFFAOYSA-N 0.000 description 1
- XQWPOIDZTHNQOL-UHFFFAOYSA-N 4-[[amino-[(2-methylphenyl)methyl]amino]methyl]phenol Chemical compound CC1=C(CN(N)CC2=CC=C(C=C2)O)C=CC=C1 XQWPOIDZTHNQOL-UHFFFAOYSA-N 0.000 description 1
- DWYYDVQFWKOWDD-UHFFFAOYSA-N 4-[bis(4-hydroxy-3,5-dimethylphenyl)methyl]benzene-1,3-diol Chemical compound CC1=C(O)C(C)=CC(C(C=2C=C(C)C(O)=C(C)C=2)C=2C(=CC(O)=CC=2)O)=C1 DWYYDVQFWKOWDD-UHFFFAOYSA-N 0.000 description 1
- TYHOGIGLTWTDIM-UHFFFAOYSA-N 4-[bis(4-hydroxyphenyl)methyl]-2-methoxyphenol Chemical compound C1=C(O)C(OC)=CC(C(C=2C=CC(O)=CC=2)C=2C=CC(O)=CC=2)=C1 TYHOGIGLTWTDIM-UHFFFAOYSA-N 0.000 description 1
- LFQIRNCDYOTISD-UHFFFAOYSA-N 4-[bis(5-cyclohexyl-2-hydroxy-4-methylphenyl)methyl]benzene-1,2-diol Chemical compound CC1=CC(O)=C(C(C=2C=C(O)C(O)=CC=2)C=2C(=CC(C)=C(C3CCCCC3)C=2)O)C=C1C1CCCCC1 LFQIRNCDYOTISD-UHFFFAOYSA-N 0.000 description 1
- XHHCPUPIFYYPCN-UHFFFAOYSA-N 4-[bis(5-cyclohexyl-4-hydroxy-2-methylphenyl)methyl]benzene-1,2-diol Chemical compound CC1=CC(O)=C(C2CCCCC2)C=C1C(C=1C(=CC(O)=C(C2CCCCC2)C=1)C)C1=CC=C(O)C(O)=C1 XHHCPUPIFYYPCN-UHFFFAOYSA-N 0.000 description 1
- IAQZPACMPXWRRY-UHFFFAOYSA-N 4-[methyl(methylamino)amino]phenol Chemical compound OC1=CC=C(C=C1)N(NC)C IAQZPACMPXWRRY-UHFFFAOYSA-N 0.000 description 1
- VHCLPTYUMDNFFR-UHFFFAOYSA-N 4-cyclohexyl-2-[(5-cyclohexyl-2-hydroxy-4-methylphenyl)-(2-hydroxyphenyl)methyl]-5-methylphenol Chemical compound CC1=CC(O)=C(C(C=2C(=CC=CC=2)O)C=2C(=CC(C)=C(C3CCCCC3)C=2)O)C=C1C1CCCCC1 VHCLPTYUMDNFFR-UHFFFAOYSA-N 0.000 description 1
- NRQDOYYENOERHE-UHFFFAOYSA-N 4-cyclohexyl-2-[(5-cyclohexyl-2-hydroxy-4-methylphenyl)-(4-hydroxyphenyl)methyl]-5-methylphenol Chemical compound CC1=CC(O)=C(C(C=2C=CC(O)=CC=2)C=2C(=CC(C)=C(C3CCCCC3)C=2)O)C=C1C1CCCCC1 NRQDOYYENOERHE-UHFFFAOYSA-N 0.000 description 1
- NPGHHGIIIQDQLH-UHFFFAOYSA-N 4-cyclohexyl-2-[(5-cyclohexyl-2-hydroxyphenyl)-(2-hydroxyphenyl)methyl]phenol Chemical compound OC1=CC=CC=C1C(C=1C(=CC=C(C=1)C1CCCCC1)O)C1=CC(C2CCCCC2)=CC=C1O NPGHHGIIIQDQLH-UHFFFAOYSA-N 0.000 description 1
- IHIKLTSNEOCLBV-UHFFFAOYSA-N 4-cyclohexyl-2-[(5-cyclohexyl-2-hydroxyphenyl)-(3-hydroxyphenyl)methyl]phenol Chemical compound OC1=CC=CC(C(C=2C(=CC=C(C=2)C2CCCCC2)O)C=2C(=CC=C(C=2)C2CCCCC2)O)=C1 IHIKLTSNEOCLBV-UHFFFAOYSA-N 0.000 description 1
- ZPGQVTCIYHUNFF-UHFFFAOYSA-N 4-cyclohexyl-2-[(5-cyclohexyl-2-hydroxyphenyl)-(4-hydroxyphenyl)methyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C(=CC=C(C=1)C1CCCCC1)O)C1=CC(C2CCCCC2)=CC=C1O ZPGQVTCIYHUNFF-UHFFFAOYSA-N 0.000 description 1
- HLRIPFBLDKQDJL-UHFFFAOYSA-N 4-trimethoxysilylphenol Chemical compound CO[Si](OC)(OC)C1=CC=C(O)C=C1 HLRIPFBLDKQDJL-UHFFFAOYSA-N 0.000 description 1
- JSHPTIGHEWEXRW-UHFFFAOYSA-N 5-hydroxypentan-2-one Chemical compound CC(=O)CCCO JSHPTIGHEWEXRW-UHFFFAOYSA-N 0.000 description 1
- JIHFJSOMLKXSSQ-UHFFFAOYSA-N 5-methylbicyclo[2.2.1]hept-2-ene-5-carboxylic acid Chemical compound C1C2C(C)(C(O)=O)CC1C=C2 JIHFJSOMLKXSSQ-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- JAJIPIAHCFBEPI-UHFFFAOYSA-M 9,10-dioxoanthracene-1-sulfonate Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2S(=O)(=O)[O-] JAJIPIAHCFBEPI-UHFFFAOYSA-M 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- SDDLEVPIDBLVHC-UHFFFAOYSA-N Bisphenol Z Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)CCCCC1 SDDLEVPIDBLVHC-UHFFFAOYSA-N 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-M Butyrate Chemical compound CCCC([O-])=O FERIUCNNQQJTOY-UHFFFAOYSA-M 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Natural products CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 1
- JZHKIUBMQMDQRG-UHFFFAOYSA-N C(=C)C(C(OC)(OC)OC)CCCCCCCC Chemical compound C(=C)C(C(OC)(OC)OC)CCCCCCCC JZHKIUBMQMDQRG-UHFFFAOYSA-N 0.000 description 1
- UCMUEHUSODZYBG-UHFFFAOYSA-N C(=C)C(C(OCCOC)(OCCOC)OCCOC)CCCCCCCC Chemical compound C(=C)C(C(OCCOC)(OCCOC)OCCOC)CCCCCCCC UCMUEHUSODZYBG-UHFFFAOYSA-N 0.000 description 1
- XJMIZBFLMQADEF-UHFFFAOYSA-N C(C)(=O)C1=CC=CC=C1.C(C)(C1=CC=CC=C1)=NO Chemical compound C(C)(=O)C1=CC=CC=C1.C(C)(C1=CC=CC=C1)=NO XJMIZBFLMQADEF-UHFFFAOYSA-N 0.000 description 1
- UIUZVMIUVVFLJH-UHFFFAOYSA-N C(C)(=O)C1=CC=CC=C1.[CH2-]C(=O)C Chemical compound C(C)(=O)C1=CC=CC=C1.[CH2-]C(=O)C UIUZVMIUVVFLJH-UHFFFAOYSA-N 0.000 description 1
- FLOAEDURUMOYHZ-UHFFFAOYSA-N C(C)(=O)O[Si](OC(C)=O)(OC(C)=O)OC(C)=O.C(C)O[Si](OCC)(OCC)OCC Chemical compound C(C)(=O)O[Si](OC(C)=O)(OC(C)=O)OC(C)=O.C(C)O[Si](OCC)(OCC)OCC FLOAEDURUMOYHZ-UHFFFAOYSA-N 0.000 description 1
- CHAOVOMLUOEYIJ-UHFFFAOYSA-N C(C)(C1=CC=CC=C1)=NO.C=CC Chemical compound C(C)(C1=CC=CC=C1)=NO.C=CC CHAOVOMLUOEYIJ-UHFFFAOYSA-N 0.000 description 1
- QLJNAALUCRKUHS-UHFFFAOYSA-N C(C1=CC=CC=C1)(C1=CC=CC=C1)=NO.C(C)(=O)C1=CC=CC=C1 Chemical compound C(C1=CC=CC=C1)(C1=CC=CC=C1)=NO.C(C)(=O)C1=CC=CC=C1 QLJNAALUCRKUHS-UHFFFAOYSA-N 0.000 description 1
- LTDMZBZJWTYPMP-UHFFFAOYSA-N C(C1=CC=CC=C1)(C1=CC=CC=C1)C(=[N+]=[N-])S(=O)(=O)C1=CC=CC=C1 Chemical compound C(C1=CC=CC=C1)(C1=CC=CC=C1)C(=[N+]=[N-])S(=O)(=O)C1=CC=CC=C1 LTDMZBZJWTYPMP-UHFFFAOYSA-N 0.000 description 1
- VEGSLYYEPIBFKB-UHFFFAOYSA-N C(C1CO1)OCCCC(C(OC)(C)C)CCCCCCCC Chemical compound C(C1CO1)OCCCC(C(OC)(C)C)CCCCCCCC VEGSLYYEPIBFKB-UHFFFAOYSA-N 0.000 description 1
- XRNDMACZMJPCRX-UHFFFAOYSA-N C(CC)C(C(OCC)(OCC)OCC)CCCCCCCC Chemical compound C(CC)C(C(OCC)(OCC)OCC)CCCCCCCC XRNDMACZMJPCRX-UHFFFAOYSA-N 0.000 description 1
- BTRRTSMCAJFIEK-UHFFFAOYSA-N C(CC)C(CCC)OC(=O)N(C(C)C)C(C)C Chemical compound C(CC)C(CCC)OC(=O)N(C(C)C)C(C)C BTRRTSMCAJFIEK-UHFFFAOYSA-N 0.000 description 1
- WKRYBUZHBDROGT-UHFFFAOYSA-N C(CC)C(CCC)OC(=O)N1C(CCCC1(C)C)(C)C Chemical compound C(CC)C(CCC)OC(=O)N1C(CCCC1(C)C)(C)C WKRYBUZHBDROGT-UHFFFAOYSA-N 0.000 description 1
- FGMUDAYLPHZIIE-UHFFFAOYSA-N C(CC)C(CCC)OC(=O)N1CCCC1 Chemical compound C(CC)C(CCC)OC(=O)N1CCCC1 FGMUDAYLPHZIIE-UHFFFAOYSA-N 0.000 description 1
- IMJXCHOAXDBLHN-UHFFFAOYSA-N C(CCC)C1=C(C(C2=CC=CC=C2)=NO)C=CC=C1 Chemical compound C(CCC)C1=C(C(C2=CC=CC=C2)=NO)C=CC=C1 IMJXCHOAXDBLHN-UHFFFAOYSA-N 0.000 description 1
- ASDXSVGAVHCVNA-UHFFFAOYSA-N C(CCC)CC([CH2-])=NO Chemical compound C(CCC)CC([CH2-])=NO ASDXSVGAVHCVNA-UHFFFAOYSA-N 0.000 description 1
- CWJVNUCVFCSSRV-UHFFFAOYSA-N C.C1(CCCCC1)C=1C=C(C(=CC1O)C)C1=C(C=CC(=C1O)O)C1=CC(=C(C=C1C)O)C1CCCCC1 Chemical compound C.C1(CCCCC1)C=1C=C(C(=CC1O)C)C1=C(C=CC(=C1O)O)C1=CC(=C(C=C1C)O)C1CCCCC1 CWJVNUCVFCSSRV-UHFFFAOYSA-N 0.000 description 1
- WJUIEHZVIXRECH-UHFFFAOYSA-N C.OC1=CC=C(C=C1)C1=C(C=CC(=C1OC)O)C1=CC=C(C=C1)O Chemical compound C.OC1=CC=C(C=C1)C1=C(C=CC(=C1OC)O)C1=CC=C(C=C1)O WJUIEHZVIXRECH-UHFFFAOYSA-N 0.000 description 1
- AWJBUXALZXGQTN-UHFFFAOYSA-N C1(=CC=CC=2C3=CC=CC=C3CC12)C1=C(C(C2=CC=CC=C2)=NO)C=CC=C1.C=CC Chemical compound C1(=CC=CC=2C3=CC=CC=C3CC12)C1=C(C(C2=CC=CC=C2)=NO)C=CC=C1.C=CC AWJBUXALZXGQTN-UHFFFAOYSA-N 0.000 description 1
- APEKISCRKNUMCY-UHFFFAOYSA-N C1(=CC=CC=2C3=CC=CC=C3CC12)CC([CH2-])=NO.C=CC Chemical compound C1(=CC=CC=2C3=CC=CC=C3CC12)CC([CH2-])=NO.C=CC APEKISCRKNUMCY-UHFFFAOYSA-N 0.000 description 1
- FQVQSHVOUVJVJB-UHFFFAOYSA-N C1(CCCC1)OC(=O)N(C(C)C)C(C)C Chemical compound C1(CCCC1)OC(=O)N(C(C)C)C(C)C FQVQSHVOUVJVJB-UHFFFAOYSA-N 0.000 description 1
- MPTJBZVABHTJKE-UHFFFAOYSA-N C1=CC=C(C=C1)S(=O)(=O)ON=C=NC2=CC=CC3=CC=CC=C32 Chemical compound C1=CC=C(C=C1)S(=O)(=O)ON=C=NC2=CC=CC3=CC=CC=C32 MPTJBZVABHTJKE-UHFFFAOYSA-N 0.000 description 1
- NMROMTRIUUBKLA-UHFFFAOYSA-N C1C2C=CC1C(=NOS(=O)(=O)C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)C2=N Chemical compound C1C2C=CC1C(=NOS(=O)(=O)C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)C2=N NMROMTRIUUBKLA-UHFFFAOYSA-N 0.000 description 1
- HMRNXPXFOCIEQS-UHFFFAOYSA-N C1CCN1C(=O)OC1CCCC1 Chemical compound C1CCN1C(=O)OC1CCCC1 HMRNXPXFOCIEQS-UHFFFAOYSA-N 0.000 description 1
- OSHFBWRVSLYLNI-UHFFFAOYSA-N CC(C)(C)S(C=[N+]=[N-])(=O)=O.SC1CCCCC1 Chemical compound CC(C)(C)S(C=[N+]=[N-])(=O)=O.SC1CCCCC1 OSHFBWRVSLYLNI-UHFFFAOYSA-N 0.000 description 1
- OPDFKLCHZFJJDU-UHFFFAOYSA-N CC(C)OC(=O)N1C(C)CCC1C Chemical compound CC(C)OC(=O)N1C(C)CCC1C OPDFKLCHZFJJDU-UHFFFAOYSA-N 0.000 description 1
- XAEZQCFNRVXCJT-UHFFFAOYSA-N CC(N(NC1=CC=CC=C1)C(C1=CC=CC=C1)C1=CC=CC=C1)(C)C Chemical compound CC(N(NC1=CC=CC=C1)C(C1=CC=CC=C1)C1=CC=CC=C1)(C)C XAEZQCFNRVXCJT-UHFFFAOYSA-N 0.000 description 1
- XUAWJRIXIHLNQT-UHFFFAOYSA-N CC1(C)CCCC(C)(C)N1C(=O)OC1CCCC1 Chemical compound CC1(C)CCCC(C)(C)N1C(=O)OC1CCCC1 XUAWJRIXIHLNQT-UHFFFAOYSA-N 0.000 description 1
- DLNAWFDVTMTWBW-UHFFFAOYSA-N CC1=C(CN(N)CC2=CCC(C=C2)=CC2=CC=CC=C2)C=CC=C1 Chemical compound CC1=C(CN(N)CC2=CCC(C=C2)=CC2=CC=CC=C2)C=CC=C1 DLNAWFDVTMTWBW-UHFFFAOYSA-N 0.000 description 1
- KRCPTHVSJQAEDJ-UHFFFAOYSA-N CC1CCC(C)N1C(=O)C1CCCCC1 Chemical compound CC1CCC(C)N1C(=O)C1CCCCC1 KRCPTHVSJQAEDJ-UHFFFAOYSA-N 0.000 description 1
- CQGOZVAXDYBTSK-UHFFFAOYSA-N CC1CCC(C)N1C(=O)OC1CCCC1 Chemical compound CC1CCC(C)N1C(=O)OC1CCCC1 CQGOZVAXDYBTSK-UHFFFAOYSA-N 0.000 description 1
- CDPMOYBSDZYMPY-UHFFFAOYSA-N CCC(CC)OC(=O)N1C(C)(C)CCCC1(C)C Chemical compound CCC(CC)OC(=O)N1C(C)(C)CCCC1(C)C CDPMOYBSDZYMPY-UHFFFAOYSA-N 0.000 description 1
- DVYVJGLTJOHGOI-UHFFFAOYSA-N CCC(CC)OC(=O)N1C(C)CCC1C Chemical compound CCC(CC)OC(=O)N1C(C)CCC1C DVYVJGLTJOHGOI-UHFFFAOYSA-N 0.000 description 1
- ZBVFCCZSSHLOLY-UHFFFAOYSA-N CCC(CC)OC(=O)N1C(C)CCCC1C Chemical compound CCC(CC)OC(=O)N1C(C)CCCC1C ZBVFCCZSSHLOLY-UHFFFAOYSA-N 0.000 description 1
- QPFFSJYUTLRZOQ-UHFFFAOYSA-N CCC(CC)OC(=O)N1CCC1 Chemical compound CCC(CC)OC(=O)N1CCC1 QPFFSJYUTLRZOQ-UHFFFAOYSA-N 0.000 description 1
- UWYPJJGTXLDLDD-UHFFFAOYSA-N CCC(CC)OC(=O)N1CCCC1 Chemical compound CCC(CC)OC(=O)N1CCCC1 UWYPJJGTXLDLDD-UHFFFAOYSA-N 0.000 description 1
- ADUIGINVBZIKCJ-UHFFFAOYSA-N CCCC(CCC)OC(=O)N1C(C)CCCC1C Chemical compound CCCC(CCC)OC(=O)N1C(C)CCCC1C ADUIGINVBZIKCJ-UHFFFAOYSA-N 0.000 description 1
- PWIGEDNREOQCEZ-UHFFFAOYSA-N CCCC(CCC)OC(=O)N1CCC1 Chemical compound CCCC(CCC)OC(=O)N1CCC1 PWIGEDNREOQCEZ-UHFFFAOYSA-N 0.000 description 1
- ZWEWWBRJDALMSW-UHFFFAOYSA-N CCCCN(CCCC)C1CCCN2CCCN=C2C1 Chemical compound CCCCN(CCCC)C1CCCN2CCCN=C2C1 ZWEWWBRJDALMSW-UHFFFAOYSA-N 0.000 description 1
- GGXWDWNWNOINTP-UHFFFAOYSA-N CCCCOCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound CCCCOCCCC(C(OC)(OC)OC)CCCCCCCC GGXWDWNWNOINTP-UHFFFAOYSA-N 0.000 description 1
- KMLTUQLZFGALMK-UHFFFAOYSA-N CCO[SiH2]CCCOC(=O)C(C)=C Chemical compound CCO[SiH2]CCCOC(=O)C(C)=C KMLTUQLZFGALMK-UHFFFAOYSA-N 0.000 description 1
- OTYYBJNSLLBAGE-UHFFFAOYSA-N CN1C(CCC1)=O.[N] Chemical compound CN1C(CCC1)=O.[N] OTYYBJNSLLBAGE-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- QLLMKKDFBDHCRO-UHFFFAOYSA-N Cl(=O)(=O)(=O)O.C(CC)N.BrCCCCCCCCCCCCCCC Chemical compound Cl(=O)(=O)(=O)O.C(CC)N.BrCCCCCCCCCCCCCCC QLLMKKDFBDHCRO-UHFFFAOYSA-N 0.000 description 1
- PUBFWFUBBGVWKV-UHFFFAOYSA-L Cl(=O)(=O)(=O)[O-].[Co+2].BrC(C(Br)(Br)N)C(Br)(Br)Br.Cl(=O)(=O)(=O)[O-] Chemical compound Cl(=O)(=O)(=O)[O-].[Co+2].BrC(C(Br)(Br)N)C(Br)(Br)Br.Cl(=O)(=O)(=O)[O-] PUBFWFUBBGVWKV-UHFFFAOYSA-L 0.000 description 1
- IOECGGGUTYXUQS-UHFFFAOYSA-L Cl(=O)(=O)(=O)[O-].[Co+2].CN.BrCCCCCCCCCCCCCCC.Cl(=O)(=O)(=O)[O-] Chemical compound Cl(=O)(=O)(=O)[O-].[Co+2].CN.BrCCCCCCCCCCCCCCC.Cl(=O)(=O)(=O)[O-] IOECGGGUTYXUQS-UHFFFAOYSA-L 0.000 description 1
- KPLNDPNLCZNEFH-UHFFFAOYSA-N Cl(=O)(=O)(=O)[O-].[Co].BrCCCCCCCCCCCCCCC[NH3+] Chemical compound Cl(=O)(=O)(=O)[O-].[Co].BrCCCCCCCCCCCCCCC[NH3+] KPLNDPNLCZNEFH-UHFFFAOYSA-N 0.000 description 1
- BWRGQPFFIVHPSS-UHFFFAOYSA-N ClC1=CC=C(C=C1)N(N)C1=CC=C(C=C1)C Chemical compound ClC1=CC=C(C=C1)N(N)C1=CC=C(C=C1)C BWRGQPFFIVHPSS-UHFFFAOYSA-N 0.000 description 1
- BGPRILKWLAIMJP-UHFFFAOYSA-N ClCCCC(C(OC)(OC)C)CCCCCCCC Chemical compound ClCCCC(C(OC)(OC)C)CCCCCCCC BGPRILKWLAIMJP-UHFFFAOYSA-N 0.000 description 1
- PAFZNILMFXTMIY-UHFFFAOYSA-N Cyclohexylamine Natural products NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 1
- YVGGHNCTFXOJCH-UHFFFAOYSA-N DDT Chemical compound C1=CC(Cl)=CC=C1C(C(Cl)(Cl)Cl)C1=CC=C(Cl)C=C1 YVGGHNCTFXOJCH-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-UHFFFAOYSA-N Di-Et ester-Fumaric acid Natural products CCOC(=O)C=CC(=O)OCC IEPRKVQEAMIZSS-UHFFFAOYSA-N 0.000 description 1
- YXHKONLOYHBTNS-UHFFFAOYSA-N Diazomethane Chemical compound C=[N+]=[N-] YXHKONLOYHBTNS-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-WAYWQWQTSA-N Diethyl maleate Chemical compound CCOC(=O)\C=C/C(=O)OCC IEPRKVQEAMIZSS-WAYWQWQTSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- FPVVYTCTZKCSOJ-UHFFFAOYSA-N Ethylene glycol distearate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCCOC(=O)CCCCCCCCCCCCCCCCC FPVVYTCTZKCSOJ-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229920001301 Hexahydroxydiphenic acid Polymers 0.000 description 1
- 101001024616 Homo sapiens Neuroblastoma breakpoint family member 9 Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Natural products CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical class CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 1
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- XYVQFUJDGOBPQI-UHFFFAOYSA-N Methyl-2-hydoxyisobutyric acid Chemical compound COC(=O)C(C)(C)O XYVQFUJDGOBPQI-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N N-phenyl amine Natural products NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 1
- AKGLMZVUFXOXMU-UHFFFAOYSA-N NCCC(C(OC)(OC)C)(CCCCCCCC)CCCN.[N] Chemical compound NCCC(C(OC)(OC)C)(CCCCCCCC)CCCN.[N] AKGLMZVUFXOXMU-UHFFFAOYSA-N 0.000 description 1
- ZSASHIJYBUQVAT-UHFFFAOYSA-N NCCC(C(OC)(OC)OC)(CCCCCCCC)CCCN.[N] Chemical compound NCCC(C(OC)(OC)OC)(CCCCCCCC)CCCN.[N] ZSASHIJYBUQVAT-UHFFFAOYSA-N 0.000 description 1
- MQDOVRNZCRBZJT-UHFFFAOYSA-N NCCC[Si](OC)(OC)OC.NCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound NCCC[Si](OC)(OC)OC.NCCCC(C(OC)(OC)OC)CCCCCCCC MQDOVRNZCRBZJT-UHFFFAOYSA-N 0.000 description 1
- 102100037013 Neuroblastoma breakpoint family member 9 Human genes 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- IFKIMYHWYMDOGK-UHFFFAOYSA-N O=C(OC1CCCC1)N1CCCC1 Chemical compound O=C(OC1CCCC1)N1CCCC1 IFKIMYHWYMDOGK-UHFFFAOYSA-N 0.000 description 1
- CQMGXNVZVLUWNJ-UHFFFAOYSA-N OC(C(C(C)=O)(C)C)O Chemical compound OC(C(C(C)=O)(C)C)O CQMGXNVZVLUWNJ-UHFFFAOYSA-N 0.000 description 1
- QHFCLPPRVMPKFW-UHFFFAOYSA-N OC1=C(C=C(C=C1C)C1=C(C=CC(=C1)O)C1=CC(=C(C(=C1)C)O)C)C Chemical compound OC1=C(C=C(C=C1C)C1=C(C=CC(=C1)O)C1=CC(=C(C(=C1)C)O)C)C QHFCLPPRVMPKFW-UHFFFAOYSA-N 0.000 description 1
- NBGYNLMRNXODNK-UHFFFAOYSA-N OC1=CC=C(C=C1)C(C)(C1=CC=C(C=C1)O)[Si](OC)(OC)OC Chemical compound OC1=CC=C(C=C1)C(C)(C1=CC=C(C=C1)O)[Si](OC)(OC)OC NBGYNLMRNXODNK-UHFFFAOYSA-N 0.000 description 1
- BFHMKAIGUCWMEF-UHFFFAOYSA-N OC=1C=C(C=CC1)C.C1(CCCCC1)C=1C(=CC(=CC1)C)O Chemical compound OC=1C=C(C=CC1)C.C1(CCCCC1)C=1C(=CC(=CC1)C)O BFHMKAIGUCWMEF-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 229920004482 WACKER® Polymers 0.000 description 1
- FTWFOJTYKZMEIY-UHFFFAOYSA-N [CH2-]C(CCCCCCC)=NO Chemical compound [CH2-]C(CCCCCCC)=NO FTWFOJTYKZMEIY-UHFFFAOYSA-N 0.000 description 1
- XPQHNAJEZJKGFQ-UHFFFAOYSA-N [N+](=O)([O-])C1=C(COC(=O)C2=C(C=CC=C2)C(C2=CC=CC=C2)(N)N)C=CC=C1 Chemical compound [N+](=O)([O-])C1=C(COC(=O)C2=C(C=CC=C2)C(C2=CC=CC=C2)(N)N)C=CC=C1 XPQHNAJEZJKGFQ-UHFFFAOYSA-N 0.000 description 1
- MSKQVJYQEKETIC-UHFFFAOYSA-L [NH4+].[NH4+].[NH4+].[NH4+].[NH4+].[NH4+].[Co++].[O-][Cl](=O)(=O)=O.[O-][Cl](=O)(=O)=O.[O-][Cl](=O)(=O)=O.[O-][Cl](=O)(=O)=O.[O-][Cl](=O)(=O)=O.[O-][Cl](=O)(=O)=O.[O-][Cl](=O)(=O)=O.[O-][Cl](=O)(=O)=O Chemical compound [NH4+].[NH4+].[NH4+].[NH4+].[NH4+].[NH4+].[Co++].[O-][Cl](=O)(=O)=O.[O-][Cl](=O)(=O)=O.[O-][Cl](=O)(=O)=O.[O-][Cl](=O)(=O)=O.[O-][Cl](=O)(=O)=O.[O-][Cl](=O)(=O)=O.[O-][Cl](=O)(=O)=O.[O-][Cl](=O)(=O)=O MSKQVJYQEKETIC-UHFFFAOYSA-L 0.000 description 1
- RQVFGTYFBUVGOP-UHFFFAOYSA-N [acetyloxy(dimethyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(C)OC(C)=O RQVFGTYFBUVGOP-UHFFFAOYSA-N 0.000 description 1
- QFKJMDYQKVPGNM-UHFFFAOYSA-N [benzenesulfonyl(diazo)methyl]sulfonylbenzene Chemical compound C=1C=CC=CC=1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC=CC=C1 QFKJMDYQKVPGNM-UHFFFAOYSA-N 0.000 description 1
- GLGXSTXZLFQYKJ-UHFFFAOYSA-N [cyclohexylsulfonyl(diazo)methyl]sulfonylcyclohexane Chemical compound C1CCCCC1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1CCCCC1 GLGXSTXZLFQYKJ-UHFFFAOYSA-N 0.000 description 1
- FDTRPMUFAMGRNM-UHFFFAOYSA-N [diazo(trifluoromethylsulfonyl)methyl]sulfonyl-trifluoromethane Chemical compound FC(F)(F)S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C(F)(F)F FDTRPMUFAMGRNM-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical group 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 125000005577 anthracene group Chemical group 0.000 description 1
- RGHILYZRVFRRNK-UHFFFAOYSA-N anthracene-1,2-dione Chemical compound C1=CC=C2C=C(C(C(=O)C=C3)=O)C3=CC2=C1 RGHILYZRVFRRNK-UHFFFAOYSA-N 0.000 description 1
- 125000005228 aryl sulfonate group Chemical group 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 239000012752 auxiliary agent Substances 0.000 description 1
- MEVOSRUOTVUHJZ-UHFFFAOYSA-N azetidin-1-yl(cyclohexyl)methanone Chemical compound C1CCN1C(=O)C1CCCCC1 MEVOSRUOTVUHJZ-UHFFFAOYSA-N 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- XAVWPKXXQDEOCM-UHFFFAOYSA-N benzyl 2,2,6,6-tetramethylpiperidine-1-carboxylate Chemical compound CC1(C)CCCC(C)(C)N1C(=O)OCC1=CC=CC=C1 XAVWPKXXQDEOCM-UHFFFAOYSA-N 0.000 description 1
- XHPSJOZMYXPKAB-UHFFFAOYSA-N benzyl 2,5-dimethylpyrrolidine-1-carboxylate Chemical compound CC1CCC(C)N1C(=O)OCC1=CC=CC=C1 XHPSJOZMYXPKAB-UHFFFAOYSA-N 0.000 description 1
- OWDOUERXHFTHJS-UHFFFAOYSA-N benzyl 2,6-dimethylpiperidine-1-carboxylate Chemical compound CC1CCCC(C)N1C(=O)OCC1=CC=CC=C1 OWDOUERXHFTHJS-UHFFFAOYSA-N 0.000 description 1
- WXOQIRHYGZFGBS-UHFFFAOYSA-N benzyl azetidine-1-carboxylate Chemical compound C1CCN1C(=O)OCC1=CC=CC=C1 WXOQIRHYGZFGBS-UHFFFAOYSA-N 0.000 description 1
- GHBMUBIHOWBFIQ-UHFFFAOYSA-N benzyl n-propan-2-ylcarbamate Chemical compound CC(C)NC(=O)OCC1=CC=CC=C1 GHBMUBIHOWBFIQ-UHFFFAOYSA-N 0.000 description 1
- UENWRTRMUIOCKN-UHFFFAOYSA-N benzyl thiol Chemical class SCC1=CC=CC=C1 UENWRTRMUIOCKN-UHFFFAOYSA-N 0.000 description 1
- FYGUSUBEMUKACF-UHFFFAOYSA-N bicyclo[2.2.1]hept-2-ene-5-carboxylic acid Chemical compound C1C2C(C(=O)O)CC1C=C2 FYGUSUBEMUKACF-UHFFFAOYSA-N 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 229950003621 butoxylate Drugs 0.000 description 1
- URBZEXMYYYABCQ-UHFFFAOYSA-N butyl 2-butoxyacetate Chemical compound CCCCOCC(=O)OCCCC URBZEXMYYYABCQ-UHFFFAOYSA-N 0.000 description 1
- IKRARXXOLDCMCX-UHFFFAOYSA-N butyl 2-butoxypropanoate Chemical compound CCCCOC(C)C(=O)OCCCC IKRARXXOLDCMCX-UHFFFAOYSA-N 0.000 description 1
- VUEYQLJAKGLDNR-UHFFFAOYSA-N butyl 2-ethoxyacetate Chemical compound CCCCOC(=O)COCC VUEYQLJAKGLDNR-UHFFFAOYSA-N 0.000 description 1
- FYRUCHOYGVFKLZ-UHFFFAOYSA-N butyl 2-ethoxypropanoate Chemical compound CCCCOC(=O)C(C)OCC FYRUCHOYGVFKLZ-UHFFFAOYSA-N 0.000 description 1
- VFGRALUHHHDIQI-UHFFFAOYSA-N butyl 2-hydroxyacetate Chemical compound CCCCOC(=O)CO VFGRALUHHHDIQI-UHFFFAOYSA-N 0.000 description 1
- IWPATTDMSUYMJV-UHFFFAOYSA-N butyl 2-methoxyacetate Chemical compound CCCCOC(=O)COC IWPATTDMSUYMJV-UHFFFAOYSA-N 0.000 description 1
- JDJWQETUMXXWPD-UHFFFAOYSA-N butyl 2-methoxypropanoate Chemical compound CCCCOC(=O)C(C)OC JDJWQETUMXXWPD-UHFFFAOYSA-N 0.000 description 1
- MVWVAXBILFBQIZ-UHFFFAOYSA-N butyl 3-ethoxypropanoate Chemical compound CCCCOC(=O)CCOCC MVWVAXBILFBQIZ-UHFFFAOYSA-N 0.000 description 1
- MENWVOUYOZQBDM-UHFFFAOYSA-N butyl 3-hydroxypropanoate Chemical compound CCCCOC(=O)CCO MENWVOUYOZQBDM-UHFFFAOYSA-N 0.000 description 1
- RRIRSNXZGJWTQM-UHFFFAOYSA-N butyl 3-methoxypropanoate Chemical compound CCCCOC(=O)CCOC RRIRSNXZGJWTQM-UHFFFAOYSA-N 0.000 description 1
- NPCIWFUNUUCNOM-UHFFFAOYSA-N butyl 3-propoxypropanoate Chemical compound CCCCOC(=O)CCOCCC NPCIWFUNUUCNOM-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- XGZGKDQVCBHSGI-UHFFFAOYSA-N butyl(triethoxy)silane Chemical compound CCCC[Si](OCC)(OCC)OCC XGZGKDQVCBHSGI-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 1
- 229960001231 choline Drugs 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- CGZZMOTZOONQIA-UHFFFAOYSA-N cycloheptanone Chemical compound O=C1CCCCCC1 CGZZMOTZOONQIA-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- KDKGYXLLJLLXLN-UHFFFAOYSA-N cyclohexyl(pyrrolidin-1-yl)methanone Chemical compound C1CCCN1C(=O)C1CCCCC1 KDKGYXLLJLLXLN-UHFFFAOYSA-N 0.000 description 1
- CFSVDFDJZBYXIZ-UHFFFAOYSA-N cyclohexyl-(2,6-dimethylpiperidin-1-yl)methanone Chemical compound CC1CCCC(C)N1C(=O)C1CCCCC1 CFSVDFDJZBYXIZ-UHFFFAOYSA-N 0.000 description 1
- BOTLEXFFFSMRLQ-UHFFFAOYSA-N cyclopentyloxycyclopentane Chemical group C1CCCC1OC1CCCC1 BOTLEXFFFSMRLQ-UHFFFAOYSA-N 0.000 description 1
- 229960002887 deanol Drugs 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- KQAHMVLQCSALSX-UHFFFAOYSA-N decyl(trimethoxy)silane Chemical compound CCCCCCCCCC[Si](OC)(OC)OC KQAHMVLQCSALSX-UHFFFAOYSA-N 0.000 description 1
- 239000013530 defoamer Substances 0.000 description 1
- RAABOESOVLLHRU-UHFFFAOYSA-N diazene Chemical compound N=N RAABOESOVLLHRU-UHFFFAOYSA-N 0.000 description 1
- FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 description 1
- YPENMAABQGWRBR-UHFFFAOYSA-N dibutyl(dimethoxy)silane Chemical compound CCCC[Si](OC)(OC)CCCC YPENMAABQGWRBR-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- ZEFVHSWKYCYFFL-UHFFFAOYSA-N diethyl 2-methylidenebutanedioate Chemical compound CCOC(=O)CC(=C)C(=O)OCC ZEFVHSWKYCYFFL-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-AATRIKPKSA-N diethyl fumarate Chemical compound CCOC(=O)\C=C\C(=O)OCC IEPRKVQEAMIZSS-AATRIKPKSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- UBFJZOKXTMYXIS-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C1(=CC=CC=C1)[Si](OC)(OC)C1=CC=CC=C1.C1(=CC=CC=C1)[Si](OC)(OC)C1=CC=CC=C1 UBFJZOKXTMYXIS-UHFFFAOYSA-N 0.000 description 1
- LGNPWEKFMNGWNJ-UHFFFAOYSA-N dimethoxy-bis[3-(oxetan-2-yl)pentyl]silane Chemical compound C1COC1C(CC)CC[Si](OC)(OC)CCC(CC)C1CCO1 LGNPWEKFMNGWNJ-UHFFFAOYSA-N 0.000 description 1
- CYNHAHHCTBMXCF-UHFFFAOYSA-N dimethoxy-phenyl-phenylmethoxysilane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)OCC1=CC=CC=C1 CYNHAHHCTBMXCF-UHFFFAOYSA-N 0.000 description 1
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 239000012972 dimethylethanolamine Substances 0.000 description 1
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- BSFKDNAESUPZAP-UHFFFAOYSA-N ethoxy-bis[5-[2-(oxetan-2-yl)butoxy]pentyl]-[2-(oxetan-2-yl)pentyl]silane Chemical compound O1C(CC1)C(COCCCCC[Si](OCC)(CC(CCC)C1OCC1)CCCCCOCC(CC)C1OCC1)CC BSFKDNAESUPZAP-UHFFFAOYSA-N 0.000 description 1
- HHBOIIOOTUCYQD-UHFFFAOYSA-N ethoxy-dimethyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(C)CCCOCC1CO1 HHBOIIOOTUCYQD-UHFFFAOYSA-N 0.000 description 1
- HMONIZCCNGYDDJ-UHFFFAOYSA-N ethyl 2-butoxypropanoate Chemical compound CCCCOC(C)C(=O)OCC HMONIZCCNGYDDJ-UHFFFAOYSA-N 0.000 description 1
- CKSRFHWWBKRUKA-UHFFFAOYSA-N ethyl 2-ethoxyacetate Chemical compound CCOCC(=O)OCC CKSRFHWWBKRUKA-UHFFFAOYSA-N 0.000 description 1
- ZANNOFHADGWOLI-UHFFFAOYSA-N ethyl 2-hydroxyacetate Chemical compound CCOC(=O)CO ZANNOFHADGWOLI-UHFFFAOYSA-N 0.000 description 1
- JLEKJZUYWFJPMB-UHFFFAOYSA-N ethyl 2-methoxyacetate Chemical compound CCOC(=O)COC JLEKJZUYWFJPMB-UHFFFAOYSA-N 0.000 description 1
- WHRLOJCOIKOQGL-UHFFFAOYSA-N ethyl 2-methoxypropanoate Chemical compound CCOC(=O)C(C)OC WHRLOJCOIKOQGL-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- ZXONMBCEAFIRDT-UHFFFAOYSA-N ethyl 2-propoxyacetate Chemical compound CCCOCC(=O)OCC ZXONMBCEAFIRDT-UHFFFAOYSA-N 0.000 description 1
- GIRSHSVIZQASRJ-UHFFFAOYSA-N ethyl 3-butoxypropanoate Chemical compound CCCCOCCC(=O)OCC GIRSHSVIZQASRJ-UHFFFAOYSA-N 0.000 description 1
- UKDLORMZNPQILV-UHFFFAOYSA-N ethyl 3-hydroxypropanoate Chemical compound CCOC(=O)CCO UKDLORMZNPQILV-UHFFFAOYSA-N 0.000 description 1
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 1
- LLACVNYOVGHAKH-UHFFFAOYSA-N ethyl 3-propoxypropanoate Chemical compound CCCOCCC(=O)OCC LLACVNYOVGHAKH-UHFFFAOYSA-N 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- MYEJNNDSIXAGNK-UHFFFAOYSA-N ethyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CC)(OC(C)C)OC(C)C MYEJNNDSIXAGNK-UHFFFAOYSA-N 0.000 description 1
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- GAEKPEKOJKCEMS-UHFFFAOYSA-N gamma-valerolactone Chemical compound CC1CCC(=O)O1 GAEKPEKOJKCEMS-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 229940100608 glycol distearate Drugs 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000002391 heterocyclic compounds Chemical class 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- 150000002429 hydrazines Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- XLSMFKSTNGKWQX-UHFFFAOYSA-N hydroxyacetone Chemical compound CC(=O)CO XLSMFKSTNGKWQX-UHFFFAOYSA-N 0.000 description 1
- 125000005027 hydroxyaryl group Chemical group 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-M isovalerate Chemical compound CC(C)CC([O-])=O GWYFCOCPABKNJV-UHFFFAOYSA-M 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- HNEGQIOMVPPMNR-NSCUHMNNSA-N mesaconic acid Chemical compound OC(=O)C(/C)=C/C(O)=O HNEGQIOMVPPMNR-NSCUHMNNSA-N 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- FBNXYLDLGARYKQ-UHFFFAOYSA-N methoxy-dimethyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(C)CCCOCC1CO1 FBNXYLDLGARYKQ-UHFFFAOYSA-N 0.000 description 1
- WOXAFPUKQNGIRH-UHFFFAOYSA-N methoxy-tris[2-(oxetan-2-yl)pentyl]silane Chemical compound C1COC1C(CCC)C[Si](OC)(CC(CCC)C1OCC1)CC(CCC)C1CCO1 WOXAFPUKQNGIRH-UHFFFAOYSA-N 0.000 description 1
- BKFQHFFZHGUTEZ-UHFFFAOYSA-N methyl 2-butoxyacetate Chemical compound CCCCOCC(=O)OC BKFQHFFZHGUTEZ-UHFFFAOYSA-N 0.000 description 1
- QBVBLLGAMALJGB-UHFFFAOYSA-N methyl 2-butoxypropanoate Chemical compound CCCCOC(C)C(=O)OC QBVBLLGAMALJGB-UHFFFAOYSA-N 0.000 description 1
- YVWPDYFVVMNWDT-UHFFFAOYSA-N methyl 2-ethoxypropanoate Chemical compound CCOC(C)C(=O)OC YVWPDYFVVMNWDT-UHFFFAOYSA-N 0.000 description 1
- YSGBMDFJWFIEDF-UHFFFAOYSA-N methyl 2-hydroxy-3-methylbutanoate Chemical compound COC(=O)C(O)C(C)C YSGBMDFJWFIEDF-UHFFFAOYSA-N 0.000 description 1
- GSJFXBNYJCXDGI-UHFFFAOYSA-N methyl 2-hydroxyacetate Chemical compound COC(=O)CO GSJFXBNYJCXDGI-UHFFFAOYSA-N 0.000 description 1
- AVVSSORVCLNBOS-UHFFFAOYSA-N methyl 2-propoxyacetate Chemical compound CCCOCC(=O)OC AVVSSORVCLNBOS-UHFFFAOYSA-N 0.000 description 1
- VBCSBEIIIFLVQV-UHFFFAOYSA-N methyl 3-butoxypropanoate Chemical compound CCCCOCCC(=O)OC VBCSBEIIIFLVQV-UHFFFAOYSA-N 0.000 description 1
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 1
- DMHHINXESLPPMV-UHFFFAOYSA-N methyl 3-propoxypropanoate Chemical compound CCCOCCC(=O)OC DMHHINXESLPPMV-UHFFFAOYSA-N 0.000 description 1
- 150000004702 methyl esters Chemical class 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- POULHZVOKOAJMA-UHFFFAOYSA-N methyl undecanoic acid Natural products CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 1
- HLXDKGBELJJMHR-UHFFFAOYSA-N methyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](C)(OC(C)C)OC(C)C HLXDKGBELJJMHR-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 description 1
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- BAVYZALUXZFZLV-UHFFFAOYSA-N mono-methylamine Natural products NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 1
- WGYKZJWCGVVSQN-UHFFFAOYSA-N mono-n-propyl amine Natural products CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 1
- KPPTXUHFJMLSFV-UHFFFAOYSA-N n,n-di(propan-2-yl)cyclohexanecarboxamide Chemical compound CC(C)N(C(C)C)C(=O)C1CCCCC1 KPPTXUHFJMLSFV-UHFFFAOYSA-N 0.000 description 1
- CLZGJKHEVKJLLS-UHFFFAOYSA-N n,n-diheptylheptan-1-amine Chemical compound CCCCCCCN(CCCCCCC)CCCCCCC CLZGJKHEVKJLLS-UHFFFAOYSA-N 0.000 description 1
- DIAIBWNEUYXDNL-UHFFFAOYSA-N n,n-dihexylhexan-1-amine Chemical compound CCCCCCN(CCCCCC)CCCCCC DIAIBWNEUYXDNL-UHFFFAOYSA-N 0.000 description 1
- XTAZYLNFDRKIHJ-UHFFFAOYSA-N n,n-dioctyloctan-1-amine Chemical compound CCCCCCCCN(CCCCCCCC)CCCCCCCC XTAZYLNFDRKIHJ-UHFFFAOYSA-N 0.000 description 1
- OOHAUGDGCWURIT-UHFFFAOYSA-N n,n-dipentylpentan-1-amine Chemical compound CCCCCN(CCCCC)CCCCC OOHAUGDGCWURIT-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- KPADFPAILITQBG-UHFFFAOYSA-N non-4-ene Chemical compound CCCCC=CCCC KPADFPAILITQBG-UHFFFAOYSA-N 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- GSGDTSDELPUTKU-UHFFFAOYSA-N nonoxybenzene Chemical compound CCCCCCCCCOC1=CC=CC=C1 GSGDTSDELPUTKU-UHFFFAOYSA-N 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-N o-dicarboxybenzene Natural products OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 1
- ZPIRTVJRHUMMOI-UHFFFAOYSA-N octoxybenzene Chemical compound CCCCCCCCOC1=CC=CC=C1 ZPIRTVJRHUMMOI-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 125000000466 oxiranyl group Chemical group 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- 125000005429 oxyalkyl group Chemical group 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N para-benzoquinone Natural products O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 229920001610 polycaprolactone Polymers 0.000 description 1
- 239000004632 polycaprolactone Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- DNAJDTIOMGISDS-UHFFFAOYSA-N prop-2-enylsilane Chemical compound [SiH3]CC=C DNAJDTIOMGISDS-UHFFFAOYSA-N 0.000 description 1
- QQSNJOKPTVLTKK-UHFFFAOYSA-N propan-2-yl 2,2,6,6-tetramethylpiperidine-1-carboxylate Chemical compound CC(C)OC(=O)N1C(C)(C)CCCC1(C)C QQSNJOKPTVLTKK-UHFFFAOYSA-N 0.000 description 1
- YNHVYQBXAFEGAV-UHFFFAOYSA-N propan-2-yl azetidine-1-carboxylate Chemical compound CC(C)OC(=O)N1CCC1 YNHVYQBXAFEGAV-UHFFFAOYSA-N 0.000 description 1
- VNNCLWNAWKLJRZ-UHFFFAOYSA-N propan-2-yl n,n-di(propan-2-yl)carbamate Chemical compound CC(C)OC(=O)N(C(C)C)C(C)C VNNCLWNAWKLJRZ-UHFFFAOYSA-N 0.000 description 1
- XQEPLYLEYBCDLB-UHFFFAOYSA-N propan-2-yl pyrrolidine-1-carboxylate Chemical compound CC(C)OC(=O)N1CCCC1 XQEPLYLEYBCDLB-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- LVDAGIFABMFXSJ-UHFFFAOYSA-N propyl 2-butoxyacetate Chemical compound CCCCOCC(=O)OCCC LVDAGIFABMFXSJ-UHFFFAOYSA-N 0.000 description 1
- GYOCIFXDRJJHPF-UHFFFAOYSA-N propyl 2-butoxypropanoate Chemical compound CCCCOC(C)C(=O)OCCC GYOCIFXDRJJHPF-UHFFFAOYSA-N 0.000 description 1
- ADOFEJQZDCWAIL-UHFFFAOYSA-N propyl 2-ethoxyacetate Chemical compound CCCOC(=O)COCC ADOFEJQZDCWAIL-UHFFFAOYSA-N 0.000 description 1
- GXKPKHWZTLSCIB-UHFFFAOYSA-N propyl 2-ethoxypropanoate Chemical compound CCCOC(=O)C(C)OCC GXKPKHWZTLSCIB-UHFFFAOYSA-N 0.000 description 1
- CYIRLFJPTCUCJB-UHFFFAOYSA-N propyl 2-methoxypropanoate Chemical compound CCCOC(=O)C(C)OC CYIRLFJPTCUCJB-UHFFFAOYSA-N 0.000 description 1
- BMVTVMIDGMNRRR-UHFFFAOYSA-N propyl 2-propoxyacetate Chemical compound CCCOCC(=O)OCCC BMVTVMIDGMNRRR-UHFFFAOYSA-N 0.000 description 1
- HJIYVZIALQOKQI-UHFFFAOYSA-N propyl 3-butoxypropanoate Chemical compound CCCCOCCC(=O)OCCC HJIYVZIALQOKQI-UHFFFAOYSA-N 0.000 description 1
- IYVPXMGWHZBPIR-UHFFFAOYSA-N propyl 3-ethoxypropanoate Chemical compound CCCOC(=O)CCOCC IYVPXMGWHZBPIR-UHFFFAOYSA-N 0.000 description 1
- JCMFJIHDWDKYIL-UHFFFAOYSA-N propyl 3-methoxypropanoate Chemical compound CCCOC(=O)CCOC JCMFJIHDWDKYIL-UHFFFAOYSA-N 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 229940030966 pyrrole Drugs 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- MWAXHIPWROXWJL-UHFFFAOYSA-M sodium 2,6-dinitrobenzenesulfonate Chemical compound [N+](=O)([O-])C1=C(C(=CC=C1)[N+](=O)[O-])S(=O)(=O)[O-].[Na+] MWAXHIPWROXWJL-UHFFFAOYSA-M 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical group C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- RINCXYDBBGOEEQ-UHFFFAOYSA-N succinic anhydride Chemical group O=C1CCC(=O)O1 RINCXYDBBGOEEQ-UHFFFAOYSA-N 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 229960002317 succinimide Drugs 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- FZSBLLYQAULJDU-UHFFFAOYSA-N tert-butyl 2,5-dimethylpyrrolidine-1-carboxylate Chemical compound CC1CCC(C)N1C(=O)OC(C)(C)C FZSBLLYQAULJDU-UHFFFAOYSA-N 0.000 description 1
- XFHDOSGLKQJYLP-UHFFFAOYSA-N tert-butyl 2,6-dimethylpiperidine-1-carboxylate Chemical compound CC1CCCC(C)N1C(=O)OC(C)(C)C XFHDOSGLKQJYLP-UHFFFAOYSA-N 0.000 description 1
- QUERMGFVJPRMJL-UHFFFAOYSA-N tert-butyl azetidine-1-carboxylate Chemical compound CC(C)(C)OC(=O)N1CCC1 QUERMGFVJPRMJL-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- HNURUDICJPOGGD-UHFFFAOYSA-N tert-butyl n,n-di(propan-2-yl)carbamate Chemical compound CC(C)N(C(C)C)C(=O)OC(C)(C)C HNURUDICJPOGGD-UHFFFAOYSA-N 0.000 description 1
- LPQZERIRKRYGGM-UHFFFAOYSA-N tert-butyl pyrrolidine-1-carboxylate Chemical compound CC(C)(C)OC(=O)N1CCCC1 LPQZERIRKRYGGM-UHFFFAOYSA-N 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- NQRYJNQNLNOLGT-UHFFFAOYSA-N tetrahydropyridine hydrochloride Natural products C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ADLSSRLDGACTEX-UHFFFAOYSA-N tetraphenyl silicate Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC1=CC=CC=C1 ADLSSRLDGACTEX-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 150000003572 thiolanes Chemical class 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- GIHPVQDFBJMUAO-UHFFFAOYSA-N tributoxy(ethyl)silane Chemical compound CCCCO[Si](CC)(OCCCC)OCCCC GIHPVQDFBJMUAO-UHFFFAOYSA-N 0.000 description 1
- GYZQBXUDWTVJDF-UHFFFAOYSA-N tributoxy(methyl)silane Chemical compound CCCCO[Si](C)(OCCCC)OCCCC GYZQBXUDWTVJDF-UHFFFAOYSA-N 0.000 description 1
- ZQJYXISBATZORI-UHFFFAOYSA-N tributyl(ethoxy)silane Chemical compound CCCC[Si](CCCC)(CCCC)OCC ZQJYXISBATZORI-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- WUMSTCDLAYQDNO-UHFFFAOYSA-N triethoxy(hexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)OCC WUMSTCDLAYQDNO-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- BOVWGKNFLVZRDU-UHFFFAOYSA-N triethoxy(trifluoromethyl)silane Chemical compound CCO[Si](OCC)(OCC)C(F)(F)F BOVWGKNFLVZRDU-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- XOWPJAUIFINUMO-UHFFFAOYSA-N triethoxy-[3-[2-(oxetan-2-yl)butoxy]propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC(CC)C1CCO1 XOWPJAUIFINUMO-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- WQGWDDDVZFFDIG-UHFFFAOYSA-N trihydroxybenzene Natural products OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- ORVBHOQTQDOUIW-UHFFFAOYSA-N trimethoxy(trifluoromethyl)silane Chemical compound CO[Si](OC)(OC)C(F)(F)F ORVBHOQTQDOUIW-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 1
- 239000012953 triphenylsulfonium Substances 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- XYRAEZLPSATLHH-UHFFFAOYSA-N trisodium methoxy(trioxido)silane Chemical compound [Na+].[Na+].[Na+].CO[Si]([O-])([O-])[O-] XYRAEZLPSATLHH-UHFFFAOYSA-N 0.000 description 1
- JABYJIQOLGWMQW-UHFFFAOYSA-N undec-4-ene Chemical compound CCCCCCC=CCCC JABYJIQOLGWMQW-UHFFFAOYSA-N 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
- C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
- C08F220/283—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing one or more carboxylic moiety in the chain, e.g. acetoacetoxyethyl(meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
- C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
- C08F230/085—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon the monomer being a polymerisable silane, e.g. (meth)acryloyloxy trialkoxy silanes or vinyl trialkoxysilanes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
- G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
- G03F7/327—Non-aqueous alkaline compositions, e.g. anhydrous quaternary ammonium salts
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
- C08F220/282—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing two or more oxygen atoms
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/50—Protective arrangements
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- Physics & Mathematics (AREA)
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- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
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- Materials For Photolithography (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Silicon Polymers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
本發明提供一種可應用於保護膜以及液晶顯示元件的感光性樹脂組成物,其能夠提供良好的透明性與耐化學性。所述組成物包括:複合樹脂(A)、鄰萘醌二疊氮磺酸酯(B)以及溶劑(C),其中複合樹脂(A)包括主鏈及側鏈,主鏈包括(甲基)丙烯酸矽氧烷酯系單體(a1-2)之衍生重複單元;側鏈包括矽氧烷系單體(a2)之衍生重複單元,且鍵結於(甲基)丙烯酸矽氧烷酯系單體(a1-2)之衍生重複單元;且複合樹脂(A)符合下述條件(I)及(II)中的至少一者: 條件(I):主鏈更包括含羧酸或羧酸酐之不飽和單體(a1-1)之衍生重複單元。 條件(II):矽氧烷系單體(a2)包括以通式(A-4)所示的單體(a2-1)。
Description
本發明是有關於一種感光性樹脂組成物、保護膜及具有保護膜的元件,且特別是有關於一種可形成透明性佳與耐化學性佳的保護膜的感光性樹脂組成物、由該感光性樹脂組成物所形成的保護膜、以及包括上述保護膜的液晶顯示元件。
近年來,在半導體工業、液晶顯示器或有機電激發光顯示器等領域中,隨著尺寸的日益縮小化,對於微影製程中所需之圖案的微細化亦要求日高。為了達到微細化的圖案,一般係透過具有高解析及高感度之正型感光性材料經曝光及顯影而形成,其中,以聚矽氧烷聚合物為成分的正型感光性材料漸成為業界使用之主流。
日本特開2008-107529號揭示一種可形成高透明度之硬化膜的感光性樹脂組成物。該組成物中使用含環氧丙烷基或丁二酸酐基之聚矽氧烷聚合物,其於共聚合時經開環反應形成親水性的結構,雖可於稀薄鹼性顯影液下得到高溶解性,然而,該感光性樹脂組成物之耐化學性不佳,因此仍無法令業界所接受。
因此,業界亟待尋求一種能兼顧高透明性及耐化學性優異之感光性樹脂組成物。
有鑑於此,本發明提供一種用於液晶顯示元件的感光性樹脂組成物,其能夠改善習知保護膜的透明性與耐化學性不佳的問題。
本發明提供一種感光性樹脂組成物,其包括複合樹脂(A)、鄰萘醌二疊氮磺酸酯(B)以及溶劑(C),其中複合樹脂(A)包括主鏈及側鏈,主鏈包括(甲基)丙烯酸矽氧烷酯系單體(a1-2)之衍生重複單元;側鏈包括矽氧烷系單體(a2)之衍生重複單元,且鍵結於(甲基)丙烯酸矽氧烷酯系單體(a1-2)之衍生重複單元;且複合樹脂(A)符合下述條件(I)及條件(II)中的至少一者: 條件(I):主鏈更包括含羧酸或羧酸酐之不飽和單體(a1-1)之衍生重複單元,含羧酸或羧酸酐之不飽和單體(a1-1)包含羧酸基結構及不飽和鍵,或者包含羧酸酐結構及不飽和鍵; 條件(II):矽氧烷系單體(a2)包括以下述通式(A-4)所示的單體(a2-1)。 Si(R7
)w
(OR8
)4-w
通式(A-4) 通式(A-4)中,R7
表示以下述通式(A-5)、通式(A-6)或通式(A-7)所示的結構、或碳數1~10的烴基、未經取代或部分氫原子以鹵素或碳數1~10的烴基取代的苯基,但至少一個R7
表示以下述通式(A-5)、通式(A-6)或通式(A-7)所示的結構。R8
表示氫原子、碳數1~6的烴基、碳數1~6的醯基、或碳數6~15的芳香基。當通式(A-4)中具有2個以上的R7
或R8
時,各個R7
或R8
可彼此相同或不同。w表示1~3的整數。通式(A-5) 通式(A-5)中,R9
表示碳數1~10的烴基;m為0或1;*表示鍵結處。通式(A-6) 通式(A-6)中,R10
表示單鍵、碳數1~10的烷基或碳數1~10的烷氧基;R11
表示氫原子或碳數1~10的烴基;n為0或1;*表示鍵結處。通式(A-7) 通式(A-7)中,R12
表示單鍵或碳數1~6的伸烷基;*表示鍵結處。
在本發明的一實施例中,上述的主鏈更包括其他不飽和單體(a1-3)之衍生重複單元。
在本發明的一實施例中,上述的(甲基)丙烯酸矽氧烷酯系單體(a1-2)具有下述通式(A-1)之結構,通式(A-1) 通式(A-1)中,R1
表示氫原子或甲基;a表示1至6的整數;R2
各自獨立表示碳數1~12的烷基、苯基、碳數1~6的烷氧基或以下述通式(A-2)所示的結構。b表示1至150之整數;R3
表示碳數1~6的烷基或以下述通式(A-3)所示的結構。當主鏈中具有多個由通式(A-1)表示之衍生重複單元時,各個由通式(A-1)表示之衍生重複單元可彼此相同或不同。通式(A-2) 通式(A-2)中,R4
、R5
各自獨立表示碳數1~12的烷基或苯基;c表示2至13之整數。通式(A-3) 通式(A-3)中,R6
各自獨立表示碳數1~12的烷基或苯基。
在本發明的一實施例中,上述的矽氧烷系單體(a2)更包括以下述通式(A-8)所示的單體(a2-2), Si(R13
)x
(OR14
)4-x
通式(A-8) 通式(A-8)中,R13
表示碳數1~10的烴基、未經取代或部分氫原子以鹵素或碳數1~10的烴基取代的苯基。R14
表示氫原子、碳數1~6的烴基、碳數1~6的醯基、或碳數6~15的芳香基。當通式(A-8)中具有2個以上的R13
或R14
時,各個R13
或R14
可彼此相同或不同;x表示0~3的整數。
在本發明的一實施例中,基於複合樹脂(A)的使用量為100重量份,鄰萘醌二疊氮磺酸酯(B)的使用量為1~30重量份,溶劑(C)的使用量為100~1600重量份。
在本發明的一實施例中,上述的感光性樹脂組成物更包括熱發生劑(D)。
在本發明的一實施例中,基於複合樹脂(A)的使用量為100重量份,熱發生劑(D)的使用量為0.5~6重量份。
本發明另提供一種保護膜,由上述的感光性樹脂組成物製成。
本發明另提供一種液晶顯示元件,包括上述的保護膜。
基於上述,本發明的感光性樹脂組成物由於含有具有聚(甲基)丙烯酸結構的主鏈及聚矽氧烷結構的側鏈的複合樹脂(A),而兼具高透明性及耐化學性優異的特性,故可以改善保護膜的透明性與耐化學性不佳的問題,進而適用於液晶顯示元件。
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。
在下文中,是以(甲基)丙烯酸表示丙烯酸及/或甲基丙烯酸,並以(甲基)丙烯酸酯表示丙烯酸酯及/或甲基丙烯酸酯;同樣地,以(甲基)丙烯醯基表示丙烯醯基及/或甲基丙烯醯基。
此外,在下文中,是以「~系」來作為具有類似官能基的化合物或重複單元的總括性代稱。< 感光性樹脂組成物 >
本發明提供一種感光性樹脂組成物,其包括複合樹脂(A)、鄰萘醌二疊氮磺酸酯(B)以及溶劑(C)。此外,若需要,感光性樹脂組成物可更包括熱發生劑(D)以及添加劑(E)。以下將詳細說明用於本發明的感光性樹脂組成物的各個成分。複合樹脂 (A)
複合樹脂(A)包括主鏈及側鏈,主鏈包括(甲基)丙烯酸矽氧烷酯系單體(a1-2)之衍生重複單元;側鏈包括矽氧烷系單體(a2)之衍生重複單元,且鍵結於甲基丙烯酸矽氧烷酯系單體(a1-2)之衍生重複單元。
更具體而言,複合樹脂(A)符合下述條件(I)及條件(II)中的至少一者: 條件(I):主鏈更包括含羧酸或羧酸酐之不飽和單體(a1-1)之衍生重複單元,含羧酸或羧酸酐之不飽和單體(a1-1)包含羧酸基結構及不飽和鍵,或者包含羧酸酐結構及不飽和鍵。 條件(II):矽氧烷系單體(a2)包括以下述通式(A-4)所示的單體(a2-1)。
另外,在本發明之一實施例中,主鏈亦可更包括其他不飽和單體(a1-3)之衍生重複單元。以下針對本發明之複合樹脂(A)的各構成分別進行說明。含羧酸或羧酸酐之不飽和單體 (a1-1)
含羧酸或羧酸酐之不飽和單體(a1-1)包含羧酸基結構及不飽和鍵之官能基,或者包含羧酸酐結構及不飽和鍵之官能基。舉例而言,可以是包括不飽和單羧酸化合物、不飽和二羧酸化合物、不飽和酸酐化合物、多環型不飽和羧酸化合物、多環型不飽和二羧酸化合物、多環型不飽和酸酐化合物,但不限於此。
不飽和單羧酸化合物之具體例如:(甲基)丙烯酸、丁烯酸、α-氯丙烯酸、乙基丙烯酸、肉桂酸、2-(甲基)丙烯醯乙氧基丁二酸酯、2-(甲基)丙烯醯乙氧基六氫化苯二甲酸酯、2-(甲基)丙烯醯乙氧基苯二甲酸酯、omega-羧基聚己內酯多元醇單丙烯酸酯(商品名為ARONIX M-5300,東亞合成製)。
不飽和二羧酸化合物之具體例如:馬來酸、富馬酸、甲基富馬酸、衣康酸、檸康酸等。於本發明之具體例中,不飽和二羧酸酐化合物為前述不飽和二羧酸化合物之酸酐化合物。
多環型不飽和羧酸化合物之具體例如:5-羧基雙環[2.2.1]庚-2-烯、5-羧基-5-甲基雙環[2.2.1]庚-2-烯、5-羧基-5-乙基雙環[2.2.1]庚-2-烯、5-羧基-6-甲基雙環[2.2.1]庚-2-烯、5-羧基-6-乙基雙環[2.2.1]庚-2-烯。
多環型不飽和二羧酸化合物之具體例如:5,6-二羧酸二環[2.2.1]庚-2-烯。
多環型不飽和二羧酸酐化合物例如為多環型不飽和二羧酸化合物之酸酐化合物。
含羧酸或羧酸酐之不飽和單體(a1-1)之較佳具體例為丙烯酸、甲基丙烯酸、馬來酸酐、2-甲基丙烯醯乙氧基丁二酸酯及2-甲基丙烯醯基乙氧基六氫化苯二甲酸。
含羧酸或羧酸酐之不飽和單體(a1-1)可單獨或混合複數種使用。( 甲基 ) 丙烯酸矽氧烷酯系單體 (a1-2)
(甲基)丙烯酸矽氧烷酯系單體(a1-2)例如是具有下述通式(A-1)之結構:通式(A-1) 通式(A-1)中,R1
表示氫原子或甲基;a表示1至6的整數;R2
各自獨立表示碳數1~12的烷基、苯基、碳數1~6的烷氧基或以下述通式(A-2)所示的結構。b表示1至150之整數;R3
表示碳數1~6的烷基或以下述通式(A-3)所示的結構。當主鏈中具有多個由通式(A-1)表示之衍生重複單元時,各個由通式(A-1)表示之衍生重複單元可彼此相同或不同。通式(A-2) 通式(A-2)中,R4
、R5
各自獨立表示碳數1~12的烷基或苯基;c表示2至13之整數。通式(A-3) 通式(A-3)中,R6
各自獨立表示碳數1~12的烷基或苯基。
所述碳數1~12的烷基之具體例可列舉甲基、乙基、丙基、丁基、戊基、己基、庚基、辛基、壬基或癸基。
所述碳數1~6的烷氧基之具體例可列舉甲氧基、乙氧基、丙氧基或丁氧基。
由通式(A-1)所示之(甲基)丙烯酸矽氧烷酯系單體(a1-2)包括烯丙基矽烷類(allylsilane)和甲基丙烯酸矽烷類(methacrylic silanes),其具體例為3-甲基丙烯醯氧基丙基三甲氧基矽烷(3-methacryloxypropyltrimethoxysilane)、3-甲基丙烯醯氧基丙基三乙氧基矽烷(3-methacryloxypropyltriethoxysilane)、3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷(3-methacryloxypropylmethyl- dimethoxysilane)、3-甲基丙烯醯氧基丙基甲基二乙氧基矽烷(3-methacryloxypropylmethyldiethoxysilane)、由下述結構式(1-1)至(1-6)所示之化合物或FM-0711、FM-0721、FM-0725(Chisso Corporation製造)。結構式(1-1) 結構式(1-2) 結構式(1-3)結構式(1-4) 結構式(1-5) 結構式(1-6)
由通式(A-1)所示之(甲基)丙烯酸矽氧烷酯系單體(a1-2)可單獨或混合複數種使用。其他不飽和單體 (a1-3)
其他不飽和單體(a1-3)可以是包括含環氧基之(甲基)丙烯酸酯化合物、含環氧基之α-烷基丙烯酸酯化合物、環氧丙醚化合物、(甲基)丙烯酸烷基酯、(甲基)丙烯酸脂環族酯、(甲基)丙烯酸芳基酯、不飽和二羧酸二酯、(甲基)丙烯酸羥烷酯、(甲基)丙烯酸酯之聚醚、芳香乙烯化合物及前述以外之其他不飽和化合物,但不限於此。
含環氧基之(甲基)丙烯酸酯化合物之具體例如:(甲基)丙烯酸環氧丙酯、(甲基)丙烯酸-2-甲基環氧丙酯、(甲基)丙烯酸3,4-環氧丁酯、(甲基)丙烯酸-6,7-環氧庚酯、(甲基)丙烯酸-3,4-環氧環己酯、(甲基)丙烯酸-3,4-環氧環己基甲酯。
含環氧基之α-烷基丙烯酸酯化合物之具體例如:α-乙基丙烯酸環氧丙酯、α-正丙基丙烯酸環氧丙酯、α-正丁基丙烯酸環氧丙酯、α-乙基丙烯酸6,7-環氧庚酯。
環氧丙醚化合物之具體例如:鄰-乙烯基苯甲基環氧丙醚(o-vinylbenzylglycidylether)、間-乙烯基苯甲基環氧丙醚(m-vinylbenzylglycidylether)、對-乙烯基苯甲基環氧丙醚(p-vinylbenzylglycidylether)。
(甲基)丙烯酸烷基酯之具體例如:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸二級丁酯、(甲基)丙烯酸三級丁酯。
(甲基)丙烯酸脂環族酯之具體例如:(甲基)丙烯酸環己酯、(甲基)丙烯酸-2-甲基環己酯、三環[5.2.1.02.6
]癸-8-基(甲基)丙烯酸酯(或稱為(甲基)丙烯酸雙環戊酯)、(甲基)丙烯酸二環戊氧基乙酯、(甲基)丙烯酸異冰片酯、(甲基)丙烯酸四氫呋喃酯。
(甲基)丙烯酸芳基酯之具體例如:(甲基)丙烯酸苯基酯、(甲基)丙烯酸苯甲酯。不飽和二羧酸二酯之具體例如馬來酸二乙酯、富馬酸二乙酯、衣康酸二乙酯。
(甲基)丙烯酸羥烷酯之具體例如:(甲基)丙烯酸-2-羥基乙酯、(甲基)丙烯酸-2-羥基丙酯。
(甲基)丙烯酸酯之聚醚之具體例如:聚乙二醇單(甲基)丙烯酸酯、聚丙二醇單(甲基)丙烯酸酯。
芳香乙烯化合物之具體例如:苯乙烯、α-甲基苯乙烯、間-甲基苯乙烯,對-甲基苯乙烯、對-甲氧基苯乙烯。
以外之其他不飽和化合物之具體例如:丙烯腈、甲基丙烯腈、氯乙烯、偏二氯乙烯、丙烯醯胺、甲基丙烯醯胺、乙烯乙酯、1,3-丁二烯、異戊二烯、2,3-二甲基1,3-丁二烯、N-環己基馬來醯亞胺、N-苯基馬來醯亞胺、N-芐基馬來醯亞胺, N-丁二醯亞胺基-3-馬來醯亞胺苯甲酸酯、N-丁二醯亞胺基-4-馬來醯亞胺丁酸酯、N-丁二醯亞胺基-6-馬來醯亞胺己酸酯、N-丁二醯亞胺基-3-馬來醯亞胺丙酸酯、N-(9-吖啶基)馬來醯亞胺。
其他不飽和單體(a1-3)之較佳具體例為甲基丙烯酸環氧丙酯、(甲基)丙烯酸-3,4-環氧環己基甲酯、甲基丙烯酸-6,7-環氧庚酯、鄰-乙烯基苯甲基環氧丙醚、間-乙烯基苯甲基環氧丙醚、對-乙烯基苯甲基環氧丙醚、(甲基)丙烯酸甲酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸-2-羥基乙酯、(甲基)丙烯酸三級丁酯、(甲基)丙烯酸苯甲酯、(甲基)丙烯酸雙環戊酯、(甲基)丙烯酸二環戊氧基乙酯、苯乙烯、對-甲氧基苯乙烯、(甲基)丙烯酸異冰片酯。
其他不飽和單體(a1-3)可單獨或混合複數種使用。矽氧烷系單體 (a2)
矽氧烷系單體(a2)包括以下述通式(A-4)所示的單體(a2-1): Si(R7
)w
(OR8
)4-w
通式(A-4) 通式(A-4)中,R7
表示以下述通式(A-5)、通式(A-6)或通式(A-7)所示的結構、或碳數1~10的烴基、未經取代或部分氫原子以鹵素或碳數1~10的烴基取代的苯基,但至少一個R7
表示以下述通式(A-5)、通式(A-6)或通式(A-7)所示的結構。R8
表示氫原子、碳數1~6的烴基、碳數1~6的醯基、或碳數6~15的芳香基。當通式(A-4)中具有2個以上的R7
或R8
時,各個R7
或R8
可彼此相同或不同。w表示1~3的整數。通式(A-5) 通式(A-5)中,R9
表示碳數1~10的烴基;m為0或1;*表示鍵結處。通式(A-6) 通式(A-6)中,R10
表示單鍵、碳數1~10的烷基或碳數1~10的烷氧基;R11
表示氫原子或碳數1~10的烴基;n為0或1;*表示鍵結處。通式(A-7) 通式(A-7)中,R12
表示單鍵或碳數1~6的伸烷基;*表示鍵結處。
此外,矽氧烷系單體(a2)更包括以下述通式(A-8)所示的單體(a2-2): Si(R13
)x
(OR14
)4-x
通式(A-8) 通式(A-8)中,R13
表示碳數1~10的烴基、未經取代或部分氫原子以鹵素或碳數1~10的烴基取代的苯基。R14
表示氫原子、碳數1~6的烴基、碳數1~6的醯基、或碳數6~15的芳香基。當通式(A-8)中具有2個以上的R13
或R14
時,各個R13
或R14
可彼此相同或不同;x表示0~3的整數。
更詳細而言,當R7
或R13
代表碳數1~10的烷基時,R7
或R13
之具體例為甲基、乙基、正丙基、異丙基、正丁基、第三丁基、正己基或正癸基。此外,R7
或R13
亦可為烷基上具有其他取代基之烷基,此R7
或R13
之具體例為三氟甲基、3,3,3-三氟丙基、3-胺丙基、3-巰丙基或3-異氰酸丙基。
當R7
或R13
代表碳數2~10的烯基時,R7
或R13
之具體例為乙烯基。此外,R7
或R13
亦可為烯基上具有其他取代基之烯基,此R7
或R13
之具體例為3-丙烯醯氧基丙基或3-甲基丙烯醯氧基丙基。
當R7
或R13
代表碳數2~10的炔基時,R7
或R13
之具體例為乙炔基。此外,R7
或R13
亦可為炔基上具有其他取代基之炔基。
當R7
或R13
代表未經取代或部分氫原子以鹵素或碳數1~10的烴基取代的苯基,R7
或R13
之具體例為苯基、甲苯基(tolyl)或萘基(naphthyl)。此外,R7
或R13
亦可為芳香基上具有其他取代基的芳香基,此R7
或R13
之具體例為對-羥基苯基(o-hydroxy phenyl)、1-(對-羥基苯基)乙基(1-(o-hydroxyphenyl)ethyl)、2-(對-羥基苯基)乙基(2-(o-hydroxyphenyl)ethyl)或4-羥基-5-(對-羥基苯基羰氧基)戊基(4-hydroxy-5-(p-hydroxyphenylcarbonyloxy)pentyl)。
當R7
代表以通式(A-5)所示的結構時,R9
較佳為碳數1~10的烷基。通式(A-5)所示的結構之具體例為式(A-5-1)至式(A-5-3)所示的基團。特別地,以通式(A-5)所示的結構係由二羧酸(dicarboxylic acid)經分子內脫水(intramolecular dehydration)所形成之基團,其中該二羧酸之具體例為丁二酸或戊二酸。式(A-5-1)式(A-5-2)式(A-5-3)
當R7
代表以通式(A-6)所示的結構時,R10
較佳為碳數1~10的烷基或碳數1~10的烷氧基,R11
較佳為氫原子。以通式(A-6)所示的結構之具體例為環氧丙烷基戊基(oxetanylpentyl)、環氧丙氧基丙基(glycidoxypropyl)或2-環氧丙烷基丁氧基(2-oxetanyl butoxyl)。特別地,以通式(A-6)所示的結構係由二元醇(diol)經分子內脫水所形成的基團,其中該二元醇之具體例為丙二醇、丁二醇或戊二醇。
當R7
代表以通式(A-7)所示的結構時,R12
較佳為碳數1~6的伸烷基。以通式(A-7)所示的結構之具體例為2-(3,4-環氧環己基)乙基(2-(3,4-epoxycyclohexyl)ethyl)。
另一方面,當R8
或R14
代表碳數1~6的烷基時,R8
或R14
之具體例為甲基、乙基、正丙基、異丙基或正丁基。當R8
或R14
代表具有碳數1~6的醯基時,R8
或R14
之具體例為乙醯基。當R8
或R14
代表碳數6~15的芳香基時,R8
或R14
之具體例為苯基。
w表示1~3的整數,x表示0~3的整數。當w或x表示2或3時,多個R7
或R13
可為相同或不同;當w或x表示1或2時,多個R8
或R14
可為相同或不同。
在通式(A-4)中,矽氧烷系(a2-1)的具體例例如:3-環氧丙氧基丙基三甲氧基矽烷(3-glycidoxypropyltrimethoxysilane)、3-環氧丙氧基丙基三乙氧基矽烷(3-glycidoxypropyltriethoxysilane)、2-(3,4-環氧環己基)乙基三甲氧基矽烷(2-(3,4-epoxycyclohexyl) ethyltrimethoxysilane)、2-(3,4-環氧環己基)乙基三甲氧基矽烷(2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane)、2-環氧丙烷基丁氧基丙基三苯氧基矽烷(2-oxetanylbutoxypropyltriphenoxy silane),以及由東亞合成所製造的市售品:2-環氧丙烷基丁氧基丙基三甲氧基矽烷(2-oxetanylbutoxypropyltrimethoxysilane(商品名TMSOX-D)、2-環氧丙烷基丁氧基丙基三乙氧基矽烷(2-oxetanyl butoxypropyltriethoxysilane(商品名TESOX-D)、3-(三苯氧基矽基)丙基丁二酸(3-triphenoxysilyl propyl succinic anhydride)、由信越化學所製造之市售品:3-(三甲氧基矽基)丙基丁二酸酐(3-trimethoxysilyl propyl succinic anhydride)(商品名X-12-967)、由WACKER公司所製造之市售品:3-(三乙氧基矽基)丙基丁二酸酐(3-(triethoxysilyl) propyl succinic anhydride)(商品名GF-20)、3-(三甲氧基矽基)丙基戊二酸酐(3-(trimethoxysilyl) propyl glutaric anhydride,簡稱TMSG)、3-(三乙氧基矽基)丙基戊二酸酐(3-(triethoxysilyl) propyl glutaric anhydride)、3-(三苯氧基矽基)丙基戊二酸酐(3-(triphenoxysilyl) propyl glutaric anhydride)、二異丙氧基-二(2-環氧丙烷基丁氧基丙基)矽烷(diisopropoxy- di(2-oxetanylbutoxypropyl)silane,簡稱DIDOS)、二(3-環氧丙烷基戊基)二甲氧基矽烷(di(3-oxetanylpentyl) dimethoxy silane)、(二正丁氧基矽基)二(丙基丁二酸酐)((di-n- butoxysilyl) di(propyl succinic anhydride))、(二甲氧基矽基)二(乙基丁二酸酐) ((dimethoxysilyl) di(ethyl succinic anhydride))、3-環氧丙氧基丙基二甲基甲氧基矽烷(3-glycidoxypropyldimethylmethoxysilane)、3-環氧丙氧基丙基二甲基乙氧基矽烷(3-glycidoxypropyl dimethylethoxysilane)、二(2-環氧丙烷基丁氧基戊基)-2-環氧丙烷基戊基乙氧基矽烷(di(2-oxetanylbutoxypentyl)-2-oxetanylpentyl ethoxysilane)、三(2-環氧丙烷基戊基)甲氧基矽烷(tri(2-oxetanyl pentyl)methoxy silane)、苯氧基矽基三丙基丁二酸酐(phenoxysilyl tripropyl succinic anhydride )、或甲基甲氧基矽基二乙基丁二酸酐(methoxysilyl diethyl succinic anhydride)等。
在通式(A-8)中,矽氧烷系單體(a2-2)的具體例如:四甲氧基矽烷(tetramethoxysilane)、四乙氧基矽烷(tetraethoxysilane)、四乙醯氧基矽烷(tetraacetoxysilane)、或四苯氧基矽烷等(tetraphenoxy silane)、甲基三甲氧基矽烷(methyltrimethoxy silane,簡稱MTMS)、甲基三乙氧基矽烷(methyltriethoxysilane)、甲基三異丙氧基矽烷(methyltriisopropoxysilane)、甲基三正丁氧基矽烷(methyltri-n-butoxysilane)、乙基三甲氧基矽烷(ethyltrimethoxy silane)、乙基三乙氧基矽烷(ethyltriethoxysilane)、乙基三異丙氧基矽烷(ethyltriisopropoxysilane)、乙基三正丁氧基矽烷(ethyltri- n-butoxysilane)、正丙基三甲氧基矽烷(n-propyltrimethoxysilane)、正丙基三乙氧基矽烷(n-propyltriethoxysilane)、正丁基三甲氧基矽烷(n-butyltrimethoxysilane)、正丁基三乙氧基矽烷(n-butyltriethoxy silane)、正己基三甲氧基矽烷(n-hexyltrimethoxysilane)、正己基三乙氧基矽烷(n-hexyltriethoxysilane)、癸基三甲氧基矽烷(decyltrimethoxysilane)、乙烯基三甲氧基矽烷(vinyltrimethoxy silane)、乙烯基三乙氧基矽烷(vinyltriethoxysilane)、3-丙烯醯氧基丙基三甲氧基矽烷(3-acryoyloxypropyltrimethoxysilane)、3-甲基丙烯醯氧基丙基三甲氧基矽烷(3-methylacryloyloxypropyltrimethoxy silane,簡稱MPTMS)、3-甲基丙烯醯氧基丙基三乙氧基矽烷(3-methylacryloyloxypropyltriethoxysilane)、苯基三甲氧基矽烷 (phenyltrimethoxysilane,簡稱PTMS)、苯基三乙氧基矽烷(phenyltriethoxysilane,簡稱PTES)、對-羥基苯基三甲氧基矽烷(p-hydroxyphenyltrimethoxysilane)、1-(對-羥基苯基)乙基三甲氧基矽烷(1-(p-hydroxyphenyl)ethyltrimethoxysilane)、2-(對-羥基苯基)乙基三甲氧基矽烷(2-(p-hydroxyphenyl)ethyltrimethoxysilane)、4-羥基-5-(對-羥基苯基羰氧基)戊基三甲氧基矽烷(4-hydroxy-5 -(p-hydroxyphenylcarbonyloxy)pentyltrimethoxysilane)、三氟甲基三甲氧基矽烷(trifluoromethyltrimethoxysilane)、三氟甲基三乙氧基矽烷(trifluoromethyltriethoxysilane)、3,3,3-三氟丙基三甲氧基矽烷(3,3,3-trifluoropropyltrimethoxysilane)、3-胺丙基三甲氧基矽烷(3-aminopropyltrimethoxysilane)、3-胺丙基三乙氧基矽烷(3-aminopropyltriethoxysilane)、3-巰丙基三甲氧基矽烷(3-mercaptopropyltrimethoxysilane)、二甲基二甲氧基矽烷(dimethyldimethoxysilane,簡稱DMDMS)、二甲基二乙氧基矽烷(dimethyldiethoxysilane)、二甲基二乙醯氧基矽烷(dimethyldiacetyl oxysilane)、二正丁基二甲氧基矽烷(di-n-butyldimethoxysilane)、二苯基二甲氧基矽烷(diphenyldimethoxysilane)、三甲基甲氧基矽烷(trimethylmethoxysilane)、三正丁基乙氧基矽烷(tri-n-butyl ethoxysilane)等。
矽氧烷系單體(a2-2)可單獨使用或組合多種來使用。複合樹脂 (A) 的製備方法
複合樹脂(A)的製備方法例如可使用但不限於下列方法(1)~方法(3)中的任一者。
方法(1)
首先,將含羧酸或羧酸酐之不飽和單體(a1-1)、(甲基)丙烯酸矽氧烷酯系單體(a1-2)以及其他不飽和單體(a1-3)進行共聚合反應,較佳地,係採用自由基聚合反應,得到含有矽氧烷基團的主鏈共聚物,接著在含有矽氧烷基團的主鏈共聚物中加入矽氧烷系單體(a2)之後,進行水解聚縮合反應以形成側鏈聚縮合物,進而製得複合樹脂(A)。
方法(2)
首先,將含羧酸或羧酸酐之不飽和單體(a1-1)、(甲基)丙烯酸矽氧烷酯系單體(a1-2)以及其他不飽和單體(a1-3)進行共聚合反應,較佳地,係採用自由基聚合反應,先製得含有矽氧烷基團的主鏈共聚物,另一方面,先對矽氧烷系單體(a2)進行水解聚縮合反應,以製得側鏈聚縮合物。最後,將含有矽氧烷基團的主鏈共聚物以及側鏈聚縮合物進行水解聚縮合反應,進而製得複合樹脂(A)。
方法(3)
與上述方法(2)相同,先製得含有矽氧烷基團的主鏈共聚物以及側鏈聚縮合物。惟,差異在於,方法(3)在製備含有矽氧烷基團的主鏈共聚物時,亦加入部分矽氧烷系單體(a2),使主鏈共聚物上的矽氧烷基團上也生成側鏈之聚縮合物(也就是說,在主鏈生成時,也同步產生部分側鏈)。之後,再進行最後的水解聚縮合反應,以製得複合樹脂(A)時。
本發明的主鏈共聚物之共聚合反應並無特別限制,較佳地,係採用自由基聚合反應,其是由含羧酸或羧酸酐之不飽和單體(a1-1)、(甲基)丙烯酸矽氧烷酯系單體(a1-2)、其他不飽和單體(a1-3)在適當之聚合起始劑存在下於溶劑中所共聚合而得。
共聚合反應過程中,基於聚合用單體(a1-1)、(a1-2)及(a1-3)之合計使用量為100重量份,含羧酸或羧酸酐之不飽和單體(a1-1)的使用量為0~40重量份,較佳為5~35重量份,更佳為10~30重量份;(甲基)丙烯酸矽氧烷酯系單體(a1-2)的使用量為5~50重量份,較佳為10~45重量份,更佳為15~40重量份;其他不飽和單體(a1-3)的使用量為10~95重量份,較佳為20~85重量份,更佳為30~75重量份。
本發明之主鏈共聚物在製造時所使用之聚合起始劑,其具體例為偶氮化合物或過氧化物。前述偶氮化合物之具體例如:2,2'-偶氮二異丁腈、2,2'-偶氮二(2,4-二甲基戊腈)、2,2'-偶氮二(4-甲氧基-2,4-二甲基戊腈)、2,2'-偶氮二(2-甲基丁腈)、4,4'-偶氮二(4-氰基戊酸)、2,2'-偶氮二(二甲基-2-甲基丙酸酯)。前述過氧化物之具體例如:過氧化二苯甲醯、過氧化二月桂醯(dilauroyl peroxide)、第三丁基過氧化新戊酸酯(tert-butyl peroxypivalate)、1,1-二(第三丁基過氧化)環己烷(1,1-di(tert-butylperoxy)cyclohexane)、過氧化氫。上述聚合起始劑可單獨或混合複數種使用。
本發明之主鏈共聚物在製造時所使用溶劑可包括但不限於醇、醚、二醇醚、乙二醇烷基醚乙酸醋酸酯、二乙二醇、二丙二醇、丙二醇單烷基醚、丙二醇烷基醚乙酸醋酸酯、丙二醇烷基醚丙酸酯、芳香烴、酮、酯。
前述醇之具體例如:甲醇、乙醇、苯甲醇、2-苯乙醇、3-苯基-1-丙醇。前述醚之具體例如:四氫呋喃。前述二醇醚之具體例如:乙二醇單丙醚、乙二醇單甲醚、乙二醇單乙醚。前述乙二醇烷基醚醋酸酯之具體例如:乙二醇丁醚醋酸酯、乙二醇乙醚醋酸酯、乙二醇甲醚醋酸酯。前述二乙二醇之具體例如:二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單丁醚、二乙二醇二甲醚、二乙二醇二乙醚、二乙二醇甲乙醚。前述二丙二醇之具體例如:二丙二醇單甲醚、二丙二醇單乙醚、二丙二醇二甲醚、二丙二醇二乙醚、二丙二醇甲乙醚。前述丙二醇單烷基醚之具體例如:丙二醇單甲醚、丙二醇單乙醚、丙二醇單丙醚、丙二醇單丁醚。前述丙二醇烷基醚醋酸酯之具體例如:丙二醇甲醚醋酸酯、丙二醇乙醚醋酸酯、丙二醇丙醚醋酸酯、丙二醇丁醚醋酸酯。前述丙二醇烷基醚丙酸酯之具體例如:丙二醇甲醚丙酸酯、丙二醇乙醚丙酸酯、丙二醇丙醚丙酸酯、丙二醇丁醚丙酸酯。前述芳香烴之具體例如:甲苯、二甲苯。前述酮之具體例如:甲乙酮、環己酮、二丙酮醇。前述酯之具體例如:乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸丁酯、2-羥基丙酸乙酯、2-羥基-2-甲基丙酸甲酯、2-羥基-2-甲基丙酸乙酯、羥乙酸甲酯、羥乙酸乙酯、羥乙酸丁酯、乳酸甲酯、乳酸丙酯、乳酸丁酯、3-羥基丙酸甲酯、3-羥基丙酸乙酯、3-羥基丙酸丙酯、3-羥基丙酸丁酯、2-羥基-3-甲基丁酸甲酯、甲氧基乙酸甲酯、甲氧基乙酸乙酯、甲氧基乙酸丁酯、乙氧基乙酸甲酯、乙氧基乙酸乙酯、乙氧基乙酸丙酯、乙氧基乙酸丁酯、丙氧基乙酸甲酯、丙氧基乙酸乙酯、丙氧基乙酸丙酯、丙氧基乙酸丁酯、丁氧基乙酸甲酯、丁氧基乙酸乙酯、丁氧基乙酸丙酯、丁氧基乙酸丁酯、3-甲氧基丁基乙酸酯、2-甲氧基丙酸甲酯、2-甲氧基丙酸乙酯、2-甲氧基丙酸丙酯、2-甲氧基丙酸丁酯、2-乙氧基丙酸甲酯、2-乙氧基丙酸乙酯、2-乙氧基丙酸丙酯、2-乙氧基丙酸丁酯、2-丁氧基丙酸甲酯、2-丁氧基丙酸甲酯、2-丁氧基丙酸乙酯、2-丁氧基丙酸丙酯、2-丁氧基丙酸丁酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-甲氧基丙酸丙酯、3-甲氧基丙酸丁酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、3-乙氧基丙酸丙酯、3-乙氧基丙酸丁酯、3-丙氧基丙酸甲酯、3-丙氧基丙酸乙酯、3-丙氧基丙酸丙酯、3-丙氧基丙酸丁酯、3-丁氧基丙酸甲酯、3-丁氧基丙酸乙酯、3-丁氧基丙酸丙酯、3-丁氧基丙酸丁酯。
本發明的聚縮合反應並無特別限制,以前述方法(1)為例,較佳地,係將在矽烷單體(a2)、含有矽氧烷基團主鏈共聚物的混合物中添加溶劑、水,或選擇性地可進一步添加觸媒,接著於50°C至150°C下加熱攪拌0.5小時至120小時。攪拌時,進一步地可藉由蒸餾除去副產物(醇類、水等)。
聚縮合反應過程中,基於矽氧烷系單體(a2)的總使用量為100重量份,以通式(A-4)所示的單體(a2-1)為5~40重量份,較佳為7~35重量份,更佳為10~30重量份;以通式(A-8)所示的單體(a2-2)的使用量為60~95重量份,較佳為75~93重量份,更佳為75~93重量份。
上述溶劑並沒有特別限制,可與本發明感光性樹脂組成物中所包含的溶劑(C)為相同或不同。
上述觸媒沒有特別的限制,較佳地,該觸媒是選自於酸觸媒或鹼觸媒。該酸觸媒包含但不限於鹽酸、硝酸、硫酸、氟酸、草酸、磷酸、醋酸、三氟醋酸、蟻酸、多元羧酸或其酐、離子交換樹脂等。該鹼觸媒包含但不限於二乙胺、三乙胺、三丙胺、三丁胺、三戊胺、三己胺、三庚胺、三辛胺、二乙醇胺、三乙醇胺、氫氧化鈉、氫氧化鉀、含有胺基的烷氧基矽烷、離子交換樹脂等。
基於安定性的觀點,經縮合反應後所製得的複合樹脂(A)以不含副產物(如醇類或水)、觸媒為佳,因此所製得的聚矽氧烷聚合物(A)可選擇性地進行純化。純化方法並無特別限制,較佳地,可使用疏水性溶劑稀釋該複合樹脂(A),接著以蒸發器濃縮經水洗滌數回的有機層,以除去醇類或水。另外,可使用離子交換樹脂除去觸媒。
複合樹脂(A)之重量平均分子量為3000~30000,更佳為4000~25000,最佳為5000~20000。
當感光性樹脂組成物中不包括具有特定結構作為主鏈及側鏈的複合樹脂(A)時,存在透明性與耐化學性不佳的問題。鄰萘醌二疊氮磺酸酯 (B)
鄰萘醌二疊氮磺酸酯(B)的種類沒有特別的限制,可使用一般所使用的鄰萘醌二疊氮磺酸酯。鄰萘醌二疊氮磺酸酯(B)可為完全酯化(completely esterify)或部分酯化(partially esterify)的酯類化合物(ester-based compound)。
鄰萘醌二疊氮磺酸酯(B)較佳為由鄰萘醌二疊氮磺酸(o-naphthoquinonediazidesulfonic acid)或其鹽類與羥基化合物反應來製備。鄰萘醌二疊氮磺酸酯(B)更佳為由鄰萘醌二疊氮磺酸或其鹽類與多元羥基化合物(polyhydroxy compound)反應來製備。
鄰萘醌二疊氮磺酸之具體例為鄰萘醌二疊氮-4-磺酸、鄰萘醌二疊氮-5-磺酸或鄰萘醌二疊氮-6-磺酸等。此外,鄰萘醌二疊氮磺酸的鹽類之具體例為鄰萘醌二疊氮磺醯基鹵化物(diazonaphthoquinone sulfonyl halide)。
多元羥基化合物例如是羥基二苯甲酮類化合物(hydroxy benzophenone-based compound)、羥基芳基類化合物(hydroxy aryl-based compound)、(羥基苯基)烴類化合物((hydroxyphenyl) hydrocarbon compound)、或者其他芳香族羥基類化合物。
羥基二苯甲酮類化合物例如是2,3,4-三羥基二苯甲酮、2,4,4'-三羥基二苯甲酮、2,4,6-三羥基二苯甲酮、2,3,4,4'-四羥基二苯甲酮、2,4,2',4'-四羥基二苯甲酮、2,4,6,3',4'-五羥基二苯甲酮、2,3,4,2',4'-五羥基二苯甲酮、2,3,4,2',5'-五羥基二苯甲酮、2,4,5,3',5'-五羥基二苯甲酮或2,3,4,3',4',5'-六羥基二苯甲酮等。
羥基芳基類化合物例如是通式(B-1)所示的羥基芳基類化合物:通式(B-1) 在通式(B-1)中,R21
及R22
各自獨立表示氫原子、鹵素原子或碳數1~6的烷基;R23
、R24
、R27
各自獨立表示氫原子或碳數1~6的烷基;R25
、R26
、R28
、R29
、R30
、R31
各自獨立表示氫原子、鹵素原子、碳數1~6的烷基、碳數1~6的烷氧基、碳數1~6的烯基或環烷基(cycloalkyl);d、e及f各自獨立表示1~3的整數;z代表0或1。
結構式(B-1)所示的羥基芳基類化合物之具體例為三(4-羥基苯基)甲烷、雙(4-羥基-3,5-二甲基苯基)-4-羥基苯基甲烷、雙(4-羥基-3,5-二甲基苯基)-3-羥基苯基甲烷、雙(4-羥基-3,5-二甲基苯基)-2-羥基苯基甲烷、雙(4-羥基-2,5-二甲基苯基)-4-羥基苯基甲烷、雙(4-羥基-2,5-二甲基苯基)-3-羥基苯基甲烷、雙(4-羥基-2,5-二甲基苯基)-2-羥基苯基甲烷、雙(4-羥基-3,5-二甲基苯基)-3,4-二羥基苯基甲烷、雙(4-羥基-2,5-二甲基苯基)-3,4-二羥基苯基甲烷、雙(4-羥基-3,5-二甲基苯基)-2,4-二羥基苯基甲烷、雙(4-羥基-2,5-二甲基苯基)-2,4-二羥基苯基甲烷、雙(4-羥基苯基)-3-甲氧基-4-羥基苯基甲烷、雙(3-環己基-4-羥基苯基)-3-羥基苯基甲烷、雙(3-環己基-4-羥基苯基)-2-羥基苯基甲烷、雙(3-環己基-4-羥基苯基)-4-羥基苯基甲烷、雙(3-環己基-4-羥基-6-甲基苯基)-2-羥基苯基甲烷、雙(3-環己基-4-羥基-6-甲基苯基)-3-羥基苯基甲烷、雙(3-環己基-4-羥基-6-甲基苯基)-4-羥基苯基甲烷、雙(3-環己基-4-羥基-6-甲基苯基)-3,4-二羥基苯基甲烷、雙(3-環己基-6-羥基苯基)-3-羥基苯基甲烷、雙(3-環己基-6-羥基苯基)-4-羥基苯基甲烷、雙(3-環己基-6-羥基苯基)-2-羥基苯基甲烷、雙(3-環己基-6-羥基-4-甲基苯基)-2-羥基苯基甲烷、雙(3-環己基-6-羥基-4-甲基苯基)-4-羥基苯基甲烷、雙(3-環己基-6-羥基-4-甲基苯基)-3,4-二羥基苯基甲烷、1-[1-(4-羥基苯基)異丙基]-4-[1,1-雙(4-羥基苯基)乙基]苯或1-[1-(3-甲基-4-羥基苯基)異丙基]-4-[1,1-雙(3-甲基-4-羥基苯基)乙基]苯。
(羥基苯基)烴類化合物例如是通式(B-2)所示的(羥基苯基)烴類化合物:通式(B-2) 在通式(B-2)中,R32
及R33
各自獨立表示氫原子或碳數1~6的烷基;g及h各自獨立表示1~3的整數。
通式(B-2)所示的(羥基苯基)烴類化合物之具體例為2-(2,3,4-三羥基苯基)-2-(2',3',4'-三羥基苯基)丙烷、2-(2,4-二羥基苯基)-2-(2',4'-二羥基苯基)丙烷、2-(4-羥基苯基)-2-(4'-羥基苯基)丙烷、雙(2,3,4-三羥基苯基)甲烷或雙(2,4-二羥基苯基)甲烷等。
其他芳香族羥基類化合物之具體例為苯酚(phenol)、對-甲氧基苯酚、二甲基苯酚、對苯二酚、雙酚A、萘酚、鄰苯二酚、1,2,3-苯三酚甲醚、1,2,3-苯三酚-1,3-二甲基醚、3,4,5-三羥基苯甲酸、或者部分酯化或部分醚化(etherify)的3,4,5-三羥基苯甲酸等。
多元羥基化合物較佳為1-[1-(4-羥基苯基)異丙基]-4-[1,1-雙(4-羥基苯基)乙基]苯、2,3,4-三羥基二苯甲酮、2,3,4,4'-四羥基二苯甲酮或其組合。多元羥基化合物可單獨使用或組合多種來使用。
鄰萘醌二疊氮磺酸或其鹽類與多元羥基化合物的反應通常在二氧雜環己烷(dioxane)、氮-吡咯烷酮(N-pyrrolidone)或乙醯胺(acetamide)等有機溶劑中進行。此外,上述反應較佳為在三乙醇胺、鹼金屬碳酸鹽或鹼金屬碳酸氫鹽等鹼性縮合劑(condensing agent)進行。
鄰萘醌二疊氮磺酸酯(B)的酯化度(degree of esterification)較佳為50%以上,亦即以羥基化合物中的羥基總量為100 mol%計,羥基化合物中有50 mol%以上的羥基與鄰萘醌二疊氮磺酸或其鹽類進行酯化反應。鄰萘醌二疊氮磺酸酯(B)的酯化度更佳為60%以上。
基於複合樹脂(A)的使用量為100重量份,鄰萘醌二疊氮磺酸酯(B)的使用量為1~30重量份;較佳為3~25重量份;更佳為5~20重量份。溶劑 (C)
溶劑(C)的種類沒有特別的限制。溶劑(C)之具體例為含醇式羥基(alcoholic hydroxy)的化合物或含羰基(carbonyl group)的環狀化合物等。
含醇式羥基的化合物之具體例為丙酮醇(acetol)、3-羥基-3-甲基-2-丁酮(3-hydroxy-3-methyl-2-butanone)、4-羥基-3-甲基-2-丁酮(4-hydroxy-3-methyl-2-butanone)、5-羥基-2-戊酮(5-hydroxy -2-pentanone)、4-羥基-4-甲基-2-戊酮(4-hydroxy-4-methyl-2 -pentanone)(亦稱為二丙酮醇(diacetone alcohol,簡稱DAA))、乳酸乙酯(ethyl lactate)、乳酸丁酯(butyl lactate)、丙二醇單甲醚propylene glycol monomethyl ether)、丙二醇單乙醚(propylene glycol monoethyl ether,簡稱PGEE)、丙二醇甲醚醋酸酯(propylene glycol monomethyl ether acetate,簡稱PGMEA)、丙二醇單正丙醚(propylene glycol mono-n-propyl ether)、丙二醇單正丁醚(propylene glycol mono-n-butyl ether)、丙二醇單第三丁醚(propylene glycol mono-t-butyl ether)、3-甲氧基-1-丁醇(3-methoxy-1-butanol)、3-甲基-3-甲氧基-1-丁醇(3-methyl-3-methoxy-1-butanol)或其組合。值得注意的是,含醇式羥基的化合物較佳為二丙酮醇、乳酸乙酯、丙二醇單乙醚、丙二醇甲醚醋酸酯或其組合。該含醇式羥基的化合物可單獨使用或組合多種來使用。
含羰基的環狀化合物之具體例為γ-丁內酯(γ-butyro lactone)、γ-戊內酯(γ-valerolactone)、δ-戊內酯(δ-valerolactone)、碳酸丙烯酯(propylene carbonate)、氮-甲基吡咯烷酮(N-methyl pyrrolidone)、環己酮(cyclohexanone)或環庚酮(cycloheptanone)等。值得注意的是,含羰基的環狀化合物較佳為γ-丁內酯、氮-甲基吡咯烷酮、環己酮或其組合。含羰基的環狀化合物可單獨使用或組合多種來使用。
含醇式羥基的化合物可與含羰基的環狀化合物組合使用,且其重量比率沒有特別限制。含醇式羥基的化合物與含羰基的環狀化合物的重量比值較佳為99/1至50/50;更佳為95/5至60/40。值得一提的是,當在溶劑(C)中,含醇式羥基的化合物與含羰基的環狀化合物的重量比值為99/1至50/50時,複合樹脂(A)中未反應的矽烷醇(silanol,Si-OH)基不易產生縮合反應而降低貯藏安定性(storage stability)。此外,由於含醇式羥基的化合物以及含羰基的環狀化合物與鄰萘醌二疊氮磺酸酯(B)的相容性佳,因此於塗佈成膜時不易有白化的現象,可維持薄膜的透明性。
在不損及本發明的效果的範圍內,亦可以含有其他溶劑。該其他溶劑之具體例為:(1)酯類:醋酸乙酯、醋酸正丙酯、醋酸異丙酯、醋酸正丁酯、醋酸異丁酯、丙二醇甲醚醋酸酯、3-甲氧基-1-醋酸丁酯或3-甲基-3-甲氧基-1-醋酸丁酯等;(2)酮類:甲基異丁酮、二異丙酮或二異丁酮等;或者(3)醚類:二乙醚、二異丙醚、二正丁醚或二苯醚等。
基於複合樹脂(A)的使用量為100重量份,溶劑(C)的使用量為100~1600重量份;較佳為150~1300重量份;更佳為200~1000重量份。熱發生劑 (D)
本發明的感光性樹脂組成物可進一步包含熱發生劑(D)。熱發生劑(D)例如是熱酸發生劑或熱鹼發生劑,且熱酸產生劑或熱鹼發生劑可單獨使用或混合多種而使用。熱酸發生劑
熱酸發生劑包含離子性熱酸發生劑及非離子性熱酸發生劑。
離子性熱酸發生劑較佳係不含有重金屬或鹵素離子。
離子性熱酸發生劑之具體例為鋶鹽:如三苯基鋶、1-二甲硫基萘、1-二甲硫基-4-羥基萘、1-二甲硫基-4,7-二羥基萘、4-羥基苯基二甲基鋶、芐基-4-羥基苯基甲基鋶、2-甲基芐基-4-羥基苯基甲基鋶、2-甲基芐基-4-乙醯基苯基甲基鋶、2-甲基芐基-4-苯甲醯基苯基甲基鋶等之甲磺酸鹽、三氟甲磺酸、樟腦磺酸、對甲苯磺酸、六氟膦酸鹽、市售之芐基鋶鹽如SI-60、SI-80、SI-100、SI-110、SI-145、SI-150、SI-80L、SI-100L、SI-110L、SI-145L、SI-150L、SI-160L、SI-180L(均為三新化學工業(股)製)。
非離子型熱酸產生劑例如是含鹵素化合物、重氮甲烷化合物、碸化合物、磺酸酯化合物、羧酸酯化合物、磷酸酯化合物、磺醯亞胺化合物、或磺化苯並三唑類化合物等。
含鹵素化合物例如是鹵代基團的烴化合物、鹵代基的雜環化合物及其類似物,較佳為1,1-雙(4-氯苯基)-2,2,2-三氯乙烷、2-苯基-4,6-雙(三氯甲基)-s-三嗪、2-萘基-4,6-雙(三氯甲基)-s-三嗪。
重氮甲烷化合物例如是雙(三氟甲基磺醯基)重氮甲烷、雙(環己基磺醯基)重氮甲烷、雙(苯基磺醯基)重氮甲烷、雙(對甲苯基)重氮甲烷、雙(2,4–二甲苯磺醯基)重氮甲烷、雙(對氯苯基)重氮甲烷、甲基磺醯基-對甲苯磺醯基重氮甲烷、環己基磺醯基(1,1-二甲基乙基磺醯)重氮甲烷、雙(1,1-二甲基乙基磺醯)重氮甲烷、苯基磺醯基(苯甲醯基)重氮甲烷。
碸化合物例如是β-酮碸化合物、β-磺醯基化合物、二芳基碸化合物等;較佳為4-三苯甲醯甲基碸、三甲苯基苯甲醯甲基碸、雙(苯基磺醯基)甲烷、4-氯苯基-4-甲基苯基碸。
磺酸酯化合物例如是烷基磺酸酯、鹵代烷基磺酸酯、芳基磺酸酯、亞胺基磺酸酯;較佳為苯偶姻甲苯磺酸酯(benzoin tosylate)、焦棓酚甲磺酸酯、硝基芐基-9,10-二乙氧基蒽-2-磺酸酯、2,6-二硝基苯磺酸鈉及市售亞胺基磺酸酯,例如PAI-101、PAI-106(綠化學株式會社製造)、CGI-1311(Ciba Specialty Chemicals公司製造)。
羧酸酯化合物例如是羧酸鄰硝基芐基酯及其類似物。
磺醯亞胺化合物例如是N-(三氟甲基磺醯氧基)琥珀醯亞胺(商品名SI-105,綠化學株式會社製造)、N-(樟腦磺醯氧基)琥珀醯亞胺(商品名SI-106,綠化學株式會社製造)、N-(4-甲基苯磺醯氧基)琥珀醯亞胺(商品名SI-101,綠化學株式會社製造)、N-(2-三氟甲基苯磺醯氧基)琥珀醯亞胺、N-(4-氟苯基磺醯氧基)琥珀醯亞胺、N-(三氟甲基磺醯氧基)鄰苯二甲醯亞胺、N-(樟腦磺醯基)鄰苯二甲醯亞胺、N-(2-三氟甲基苯磺醯氧基)鄰苯二甲醯亞胺、N-(2-氟苯基磺醯氧基)鄰苯二甲醯亞胺、N-(三氟甲基磺醯氧基)二苯基馬來醯亞胺(商品名PI-105,綠化學株式會社製造)、N-(樟腦磺醯氧基)二苯基馬來醯亞胺、4-(甲基苯磺醯氧基)二苯基馬來醯亞胺、N-(2-三氟甲基苯磺醯氧基)二苯基馬來醯亞胺、N-(4-氟苯基磺醯氧基)二苯基馬來醯亞胺、N-(4-氟苯基磺醯氧基)二苯基馬來醯亞胺、N-(苯基磺醯氧基)雙環[2.2.2.1]庚-5-烯-2,3-二羧醯亞胺(商品名NDI-100,綠化學株式會社製造)、N-(4-甲基苯磺醯氧基)雙環[2.2.1]庚-5-烯-2,3-二羧醯亞胺(商品名NDI-101,綠化學株式會社製造)、N-(三氟甲磺醯氧基)雙環[2.2.1]庚-5-烯-2,3-二羧醯亞胺(商品名NDI-105,綠化學株式會社製造)、N-(九氟丁磺醯氧基)雙環[2.2.1]庚-5-烯-二醯亞胺(商品名NDI-109,綠化學株式會社製造)、N-(樟腦磺醯氧基)雙環[2.2.1]庚-5-烯-二醯亞胺(商品名NDI-106,綠化學株式會社製造)、N-(樟腦磺醯基)-7-氧雜二環[2.2.1]庚-5-烯-2,3-二羧醯亞胺、N-(三氟甲基磺醯氧基)-7-氧雜二環[2.2.1]庚-5-烯-2,3-二羧醯亞胺、N-(4-甲基苯磺醯氧基)雙環[2.2.1]庚-5-烯-2,3-二羧醯亞胺、N-(4-甲基苯磺醯氧基)-7-氧雜二環[2.2.1]庚-5-烯-2,3-二羧醯亞胺、N-(2-三氟甲基苯磺醯氧基)雙環[2.2.1]庚-5-烯-2,3-二羧醯亞胺、N-(2-三氟甲基苯磺醯氧基)-7-氧雜雙環[2.2.2.1]庚-5-烯-2,3-二羧醯亞胺、N-(4-氟苯基磺醯氧基)雙環[2.2.1]庚-5-烯-2,3-二羧醯亞胺、N-(4-氟苯基磺醯基)-7-氧雜二環[2.2.1]庚-5-烯-2,3-二羧醯亞胺、N-(三氟甲基磺醯氧基)雙環[2.2.1 ]庚烷-5,6-氧基-2,3-二羧醯亞胺、N-(樟腦磺醯氧基)雙環[2.2.1]庚烷-5,6-氧基-2,3-二羧醯亞胺N-(4-甲基苯磺醯氧基)雙環[2.2.1]庚烷-5,6-氧基-2,3-二羧醯亞胺、N-(2-三氟甲基苯磺醯氧基)二環[2.2.2.1]庚烷-5,6-氧基-2,3-二羧醯亞胺、N-(4-氟苯基磺醯氧基)雙環[2.2.1]庚烷-5,6-氧基-2,3-二羧酸醯亞胺、N-(三氟甲基磺醯氧基)萘基二羧醯亞胺(商品名NAI-105,綠化學株式會社製造)、N-(樟腦磺醯氧基)萘二醯亞胺(商品名NAI-106,綠化學株式會社製造)、N-(4-甲基苯磺醯氧基)萘基二羧醯亞胺(商品名NAI-101,綠化學株式會社製造)、N-(苯基磺醯氧基)萘基二羧醯亞胺(商品名NAI-100,綠化學株式會社製造)、N-(2-三氟甲基苯磺醯氧基)萘基二羧醯亞胺、N-(4-氟苯基磺醯氧基)萘基二羧醯亞胺、N-(五氟乙基磺醯氧基)萘基二羧醯亞胺、N-(七氟丙基磺醯氧基)萘基二羧醯亞胺、N-(九氟丁基磺醯氧基)萘基二羧醯亞胺(商品名NAI-109,綠化學株式會社製造)、N-(乙基磺醯氧基)萘基二羧醯亞胺、N-(丙基磺醯氧基)萘基二羧醯亞胺、N-(丁基磺醯氧基)萘基二羧醯亞胺(商品名NAI-1004,綠化學株式會社製造)、N-(戊基磺醯氧基)萘基二羧醯亞胺、N-(己基磺醯氧基)萘基二羧醯亞胺、N-(庚基磺醯氧基)萘基二羧醯亞胺、N-(辛基磺醯氧基)萘基二羧醯亞胺、N-(壬基磺醯氧基)萘二醯亞胺。
其他熱酸發生劑如1-(4-正丁氧基-1-萘基)四氫噻吩鎓三氟甲烷磺酸酯(1-(4-n-butoxy-1-naphthalenyl)tetrahydro thiophenium trifluoromethanesulfonate)、1-(4,7-二正丁氧基-1-萘基)四氫噻吩鎓三氟甲烷磺酸酯(1-(4,7-dibutoxy-1-naphthalenyl) tetrahydrothiophenium trifluoromethanesulfonate)之四氫噻吩鹽。熱鹼發生劑
熱鹼發生劑包含過渡金屬錯合物類、醯基肟類。
過渡金屬錯合物類例如是溴基十五烷銨高氯酸鈷、溴基十五烷甲胺高氯酸鈷、溴基十五烷丙胺高氯酸鈷、六銨高氯酸鈷、六甲胺高氯酸鈷、六溴丙胺高氯酸鈷及其類似物。
醯基肟類例如是丙醯乙醯氧丁基肟、丙醯二苯甲酮肟、丙醯丙酮肟、丁醯苯乙酮肟、丁醯二苯甲酮肟、丁醯丙酮肟、己二醯苯乙酮肟、己二醯二苯甲酮肟、己二醯丙酮肟、丙烯醯苯乙酮肟、丙烯醯基二苯甲酮肟、丙烯醯基丙酮肟等。
另一方面,熱鹼產生劑較佳係包含下列通式(D-1)所示之化合物或其鹽類衍生物及/或下列通式(D-2)所示之化合物及/或下列通式(D-3)所示之化合物。
通式(D-1)如下所示:通式(D-1) 通式(D-1)中,k表示2~6的整數。R41
、R42
各自獨立表示氫原子、碳數1~8的烷基、碳數1~6之可具有取代基的羥烷基、或碳數2~12的二烷基胺基。
較佳地,k表示3至5之整數。
於本發明之具體例中,R41
、R42
為各自獨立表示的氫原子;碳數1~8的烷基,可例如但不限於:甲基、乙基、異丙基、正丁基、第三丁基或正己基等;碳數1至6之可具有取代基之羥烷基,可例如但不限於:烴甲基、2-羥乙基、2-羥丙基、2-羥基異丙基、3-羥基-第三丁基或6-羥基己基等;或碳數2~12的二烷基胺基,可例如但不限於:二甲基胺基、甲基乙基胺基、二乙基胺基、二異丙基胺基、第三丁基甲基胺基或二正己基胺基等。
通式(D-1)所示之化合物或其鹽類衍生物之較佳具體例為1,5-二氮雜雙環[4.3.0]壬-5-烯(DBN)、1,5-二氮雜雙環[4.4.0]癸-5-烯、1,8-二氮雜雙環[5.4.0]十一碳-7-烯(DBU)、5-羥基丙基-1,8-二氮雜雙環[5.4.0]十一碳-7-烯或5-二丁基胺基-1,8-二氮雜雙環[5.4.0]十一碳-7-烯、或Aporo公司之製品:U-CAT® SA810、U-CAT® SA831、U-CAT® SA841、U-CAT® SA851、U-CAT® 5002;更佳為DBN、U-CAT® SA851或U-CAT® 5002。
通式(D-2)如下所示:通式(D-2) 通式(D-2)中,R43
、R44
、R45
及R46
各自獨立表示氫原子、碳數1~8之可具有取代基的烷基、碳數3~8之可具有取代基的環烷基、碳數1~8之可具有取代基的烷氧基、碳數2~8之可具有取代基的烯基、碳數2~8之可具有取代基的炔基、可具有取代基之芳基或可具有取代基之雜環基;R47
及R48
各自獨立表示氫原子、碳數1~8之可具有取代基的烷基、碳數3~8之可具有取代基的環烷基、碳數1~8之可具有取代基的烷氧基、碳數2~8之可具有取代基的烯基、碳數2~8之可具有取代基的炔基、可具有取代基之芳基或可具有取代基之雜環基、或彼此結合形成可具有取代基之單環、或彼此結合形成可具有取代基之多環;R49
表示碳數1~12之可具有取代基的烷基、碳數3~12之可具有取代基的環烷基、碳數2~12之可具有取代基的烯基、碳數2~12之可具有取代基的炔基、可具有碳數1~3之烷基取代基的芳基、可具有碳數1~3之烷基取代基的芳烷基或可具有取代基之雜環基,但R49
之碳原子總數為12以下。
通式(D-3)如下所示:通式(D-3) 通式(D-3)中,R43
~R48
之定義如通式(D-2)所示;R50
表示碳數1~12之可具有取代基的伸烷基、碳數3~12之可具有取代基的伸環烷基、碳數2~12之可具有取代基的伸烯基、碳數2~12之可具有取代基的伸炔基、可具有碳數1~3之烷基取代基的亞芳基、可具有碳數1~3之烷基取代基的亞芳烷基或可具有取代基之雜環基,但R50
之碳原子總數為12以下。
通式(D-2)及通式(D-3)所示之化合物之較佳具體例例如是{[(2-硝基芐基)氧基]羰基}甲基胺、{[(2-硝基芐基)氧基]羰基}丙基胺、{[(2-硝基芐基)氧基]羰基}己基胺、{[(2-硝基芐基)氧基]羰基}環己胺、{[(2-硝基芐基)氧基]羰基}苯胺、{[(2-硝基芐基)氧基]羰基}哌啶、雙{[(2-硝基芐基)氧基]羰基}己二胺、雙{[(2-硝基芐基)氧基]羰基}苯二胺、雙{[(2-硝基芐基)氧基]羰基}甲苯二胺、雙{[(2-硝基芐基)氧基]羰基}-二胺基二苯基甲烷、雙{[(2-硝基芐基)氧基]羰基}哌嗪、{[(2,6-二硝基芐基)氧基]羰基}-甲胺、{[(2、6-二硝基芐基)氧基]羰基}丙基胺、{[(2,6-二硝基芐基)氧基]羰基}己基胺、{[(2,6-二硝基芐基)氧基]羰基}環己胺、{[(2、6-二硝基芐基)氧基]羰基}苯胺、{[(2,6-二硝基芐基)氧基]羰基}哌啶、雙{[(2,6-二硝基芐基)氧基]羰基}己二胺、雙{[(2,6-二硝基芐基)氧基]羰基}苯二胺、雙{[(2,6-二硝基芐基)氧基]羰基}甲苯二胺、雙{[(2,6-二硝基芐基)氧基]羰基}二胺基二苯基甲烷、雙-{[(2,6-二硝基芐基)氧基]羰基}哌嗪等之鄰硝基芐基胺基甲酸酯類;如{[(α,α-二甲基-3,5-二甲氧基芐基)氧基]羰基}甲基胺、{[(α,α-二甲基-3,5-二甲氧基芐基)氧基]羰基}丙基胺、{[(α,α-二甲基-3,5-二甲氧基芐基)氧基]羰基}己基胺、{[(α,α-二甲基-3,5-二甲氧基芐基)氧基]羰基}環己基胺、{[(α,α-二甲基-3,5-二甲氧基芐基)氧基]羰基}苯胺、{[(α,α-二甲基-3,5-二甲氧基芐基)氧基]羰基}哌啶、雙{[(α,α-二甲基-3,5-二甲氧基芐基)氧基]羰基}己二胺、雙{[(α,α-二甲基-3,5-二甲氧基芐基)氧基]羰基}苯二胺、雙{[(α,α-二甲基-3,5-二甲氧基芐基)氧基]羰基}甲苯二胺、雙{[(α,α-二甲基-3,5-二甲氧基芐基)氧基]羰基}二胺基二苯基甲烷、雙{[(α,α-二甲基-3,5-二甲氧基芐基)氧基]羰基}哌嗪等之α,α-二甲基-3,5-二甲氧基芐基胺基甲酸酯類;及如N-(異丙氧基羰基)-2,6-二甲基哌啶、N-(異丙氧基羰基)-2,2,6,6-四甲基哌啶、N-(異丙氧基羰基)二異丙基胺、N-(異丙氧基羰基)吡咯烷、N-(異丙氧基羰基)-2,5-二甲基吡咯烷、N-(異丙氧基羰基)氮雜環丁烷、N-(1-乙基丙氧基羰基)-2,6-二甲基哌啶、N-(1-乙基丙氧基羰基)-2,2,6,6-四甲基哌啶、N-(1-乙基丙氧基羰基)二異丙胺、N-(1-乙基丙氧基羰基)吡咯烷、N-(1-乙基丙氧基羰基)-2,5-二甲基吡咯烷、N-(1-乙基丙氧基羰基)-氮雜環丁烷、N-(1-丙基丁氧基羰基)-2,6-二甲基哌啶、N-(1-丙基丁氧基羰基)-2,2,6,6-四甲基哌啶、N-(1-丙基丁氧基羰基)二異丙基胺、N-(1-丙基丁氧基羰基)吡咯烷、N-(1-丙基丁氧基羰基)-2,5-二甲基吡咯烷、N-(1-丙基丁氧基羰基)-氮雜環丁烷、N-(環戊氧基羰基)-2,6-二甲基哌啶、N-(環戊氧基羰基)-2,2,6,6-四甲基哌啶、N-(環戊氧基羰基)二異丙胺、N-(環戊氧基羰基)吡咯烷、N-(環戊氧基羰基)-2,5-二甲基吡咯烷、N-(環戊氧基羰基)-氮雜環丁烷、N-(環己基羰基)-2,6-二甲基哌啶、N-(環己基羰基)-2,2,6,6-四甲基哌啶、N-(環己基羰基)二異丙胺、N-(環己基羰基)吡咯烷、N-(環己基羰基)-2,5-二甲基吡咯烷、N-(環己基羰基)-氮雜環丁烷、N-(叔丁氧基羰基)- 2,6-二甲基哌啶、N-(叔丁氧基羰基)-2,2,6,6-四甲基哌啶、N-(叔丁氧基羰基)二異丙胺、N-(叔丁氧基羰基)吡咯烷、N-(叔丁氧基羰基)-2,5-二甲基吡咯烷、N-(叔丁氧基羰基)-氮雜環丁烷、N-(芐氧基羰基)-2,6-二甲基哌啶、N-(芐氧基羰基)-2,2,6,6-四甲基哌啶、N-(芐氧基羰基)二異丙胺、N-(芐氧基羰基)吡咯烷、N-(芐氧基羰基)-2,5-二甲基吡咯烷、N-(芐氧基羰基)-氮雜環丁烷或1,4-雙(N,N'-二異丙基胺基羰基氧基)環己烷;更佳為N-(異丙氧基羰基)-2,6-二甲基哌啶、N-(1-乙基丙氧基羰基)二異丙胺、N-(環戊氧基羰基)-2,6-二甲基哌啶、N-(芐氧基羰基)吡咯烷或1,4-雙(N,N'-二異丙基胺基羰基氧基)環己烷等之其他化合物。
其他熱鹼發生劑如2-硝基芐基環己基胺基甲酸酯(2-nitrobenzyl cyclohexylcarbamate)或O-胺基甲醯基羥胺醯胺(O-carbamoylhydroxyamines amide)。
基於複合樹脂(A)的使用量為100重量份,熱發生劑(D)的使用量為0.5~6重量份;較佳為0.7~4.5重量份;更佳為1~3重量份。
當感光性樹脂組成物中包括熱發生劑(D)時,可進一步改善耐化學性。添加劑 (E)
本發明的感光性樹脂組成物可進一步包含添加劑(E)。添加劑(E)例如是增感劑(sensitizer)、密著助劑(adhesion auxiliary agent)、界面活性劑(surfactant)、溶解促進劑(solubility promoter)、消泡劑(defoamer)或其組合。
增感劑的種類並無特別的限制。增感劑較佳為使用含有酚式羥基(phenolic hydroxy)的化合物,包括:三苯酚型化合物(trisphenol type compound)、雙苯酚型化合物(bisphenol type compound)、多核分枝型化合物(polynuclear branched compound)、縮合型苯酚化合物(condensation type phenol compound)、多羥基二苯甲酮類(polyhydroxy benzophenone)或上述化合物的組合。
三苯酚型化合物例如是三(4-羥基苯基)甲烷、雙(4-羥基-3-甲基苯基)-2-羥基苯基甲烷、雙(4-羥基-2,3,5-三甲基苯基)-2-羥基苯基甲烷、雙(4-羥基-3,5-二甲基苯基)-4-羥基苯基甲烷、雙(4-羥基-3,5-二甲基苯基)-3-羥基苯基甲烷、雙(4-羥基-3,5-甲基苯基)-2-羥基苯基甲烷、雙(4-羥基-2,5-二甲基苯基)-4-羥基苯基甲烷、雙(4-羥基-2,5-二甲基苯基)-3-羥基苯基甲烷、雙(4-羥基-2,5-二甲基苯基)-2-羥基苯基甲烷、雙(4-羥基-3,5-二甲基苯基)-3,4-二羥基苯基甲烷、雙(4-羥基-2,5-二甲基苯基)-3,4-二羥基苯基甲烷、雙(4-羥基-2,5-二甲基苯基)-2,4-二羥基苯基甲烷、雙(4-羥基苯基)-3-甲氧基-4-羥基苯基甲烷、雙(5-環己基-4-羥基-2-甲基苯基)-4-羥基苯基甲烷、雙(5-環己基-4-羥基-2-甲基苯基)-3-羥基苯基甲烷、雙(5-環己基-4-羥基-2-甲基苯基)-2-羥基苯基甲烷或雙(5-環己基-4-羥基-2-甲基苯基)-3,4-二羥基苯基甲烷等。
雙苯酚型化合物例如是雙(2,3,4-三羥基苯基)甲烷、雙(2,4-二羥基苯基)甲烷、2,3,4-三羥基苯基-4'-羥基苯基甲烷、2-(2,3,4-三羥基苯基)-2-(2',3',4'-三羥基苯基)丙烷、2-(2,4-二羥基苯基)-2-(2',4'-二羥基苯基)丙烷、2-(4-羥基苯基)-2-(4'-羥基苯基)丙烷、2-(3-氟基-4-羥基苯基)-2-(3'-氟基-4'-羥基苯基)丙烷、2-(2,4-二羥基苯基)-2-(4'-羥基苯基)丙烷、2-(2,3,4-三羥基苯基)-2-(4'-羥基苯基)丙烷或2-(2,3,4-三羥基苯基)-2-(4'-羥基-3',5'-二甲基苯基)丙烷等。
多核分枝型化合物例如是1-[1-(4-羥基苯基)異丙基]-4- [1,1-雙(4-羥基苯基)乙基]苯或1-[1-(3-甲基-4-羥基苯基)異丙基]-4-[1,1-雙(3-甲基-4-羥基苯基)乙基]苯等。
縮合型苯酚化合物例如是1,1-雙(4-羥基苯基)環己烷等。
多羥基二苯甲酮類例如是2,3,4-三羥基二苯甲酮、2,4,4'-三羥基二苯甲酮、2,4,6-三羥基二苯甲酮、2,3,4-三羥基-2'-甲基二苯甲酮、2,3,4,4'-四羥基二苯甲酮、2,4,2',4'-四羥基二苯甲酮、2,4,6,3',4'-五羥基二苯甲酮、2,3,4,2',4'-五羥基二苯甲酮、2,3,4,2',5'-五羥基二苯甲酮、2,4,6,3',4',5'-六羥基二苯甲酮或2,3,4,3',4',5'-六羥基二苯甲酮等。
基於複合樹脂(A)的使用量為100重量份,增感劑的使用量為5~50重量份;較佳為8~40重量份;更佳為10~35重量份。
密著助劑之具體例為三聚氰胺(melamine)化合物及矽烷系化合物等。密著助劑的作用在於增加由感光性樹脂組成物所形成的薄膜與元件或基板之間的密著性。
三聚氰胺的市售品之具體例為由三井化學製造的商品名為Cymel-300或Cymel-303等;或者由三和化學製造的商品名為MW-30MH、MW-30、MS-11、MS-001、MX-750或MX-706等。
當使用三聚氰胺化合物做為密著助劑時,基於複合樹脂(A)的使用量為100重量份,三聚氰胺化合物的使用量為0~20重量份;較佳為0.5~18重量份;更佳為1~15重量份。
矽烷系化合物之具體例為乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷、乙烯基三(2-甲氧基乙氧基)矽烷、氮-(2-胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、氮-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷、3-胺丙基三乙氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基二甲基甲氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-氯丙基甲基二甲氧基矽烷、3-氯丙基三甲氧基矽烷、3-甲基丙烯氧基丙基三甲氧基矽烷、3-巰丙基三甲氧基矽烷或由信越化學公司製造的市售品(商品名如KBM403)等。
當使用矽烷系化合物作為密著助劑時,基於複合樹脂(A)的使用量為100重量份,矽烷系化合物的使用量為0~2重量份;較佳為0.05~1重量份;更佳為0.1~0.8重量份。
界面活性劑之具體例為陰離子系界面活性劑、陽離子系界面活性劑、非離子系界面活性劑、兩性界面活性劑、聚矽氧烷系界面活性劑、氟系界面活性劑或其組合。
界面活性劑的實例包括(1)聚環氧乙烷烷基醚類(polyoxyethylene alkyl ethers):聚環氧乙烷十二烷基醚等;(2)聚環氧乙烷烷基苯基醚類(polyoxyethylene phenyl ethers):聚環氧乙烷辛基苯基醚、聚環氧乙烷壬基苯基醚等;(3)聚乙二醇二酯類(polyethylene glycol diesters):聚乙二醇二月桂酸酯、聚乙二醇二硬酸酯等;(4)山梨糖醇酐脂肪酸酯類(sorbitan fatty acid esters);以及(5)經脂肪酸改質的聚酯類(fatty acid modified poly esters);及(6)經三級胺改質的聚胺基甲酸酯類(tertiary amine modified polyurethanes)等。界面活性劑的市售商品之具體例為KP(由信越化學工業製造)、SF-8427 (由道康寧東麗聚矽氧股份有限公司(Dow Corning Toray Silicone Co., Ltd.)製造)、Polyflow(由共榮社油脂化學工業製造)、F-Top(由得克姆股份有限公司製造(Tochem Products Co., Ltd.)製造)、Megaface(由大日本印墨化學工業(DIC)製造)、Fluorade(由住友3M股份有限公司(Sumitomo 3M Ltd.)製造)、Surflon(由旭硝子製造)、SINOPOL E8008(由中日合成化學製造)、F-475(由大日本印墨化學工業製造)或其組合。
基於複合樹脂(A)的使用量為100重量份,界面活性劑的使用量為0.5~50重量份;較佳為1~40重量份;且更佳為3~30重量份。
消泡劑的實例包括Surfynol MD-20、Surfynol MD-30、EnviroGem AD01、EnviroGem AE01、EnviroGem AE02、Surfynol DF110D、Surfynol 104E、Surfynol 420、Surfynol DF37、Surfynol DF58、Surfynol DF66、Surfynol DF70以及Surfynol DF210(由氣體產品(Air products)製造)等。
基於複合樹脂(A)的使用量為100重量份,消泡劑的使用量為1~10重量份;較佳為2~9重量份;且更佳為3~8重量份。
溶解促進劑的實例包括氮-羥基二羧基醯亞胺化合物(N-hydroxydicarboxylic imide)以及含酚式羥基的化合物。溶解促進劑之具體例為鄰萘醌二疊氮磺酸酯(B)中所使用的含酚式羥基的化合物。
基於複合樹脂(A)的使用量為100重量份,溶解促進劑的使用量為1~20重量份;較佳為2~15重量份;且更佳為3~10重量份。
本發明的感光性樹脂組成物以下列方式來製備:將複合樹脂(A)、鄰萘醌二疊氮磺酸酯(B)以及溶劑(C)放置於攪拌器中攪拌,使其均勻混合成溶液狀態,必要時,可添加熱發生劑(D)以及添加劑(E)。< 保護膜的製造方法 >
本發明提供一種保護膜,由上述的感光性樹脂組成物製成。以下詳細說明其製造方法。
保護膜的製造方法,其依序包括:使用感光性樹脂組成物來形成預烤塗膜、對預烤塗膜進行圖案化曝光、藉由鹼顯影移除未曝光區域以形成圖案;以及進行後烤處理以形成保護膜。
-形成預烤塗膜- 藉由迴轉塗布、流延塗布或輥式塗布等塗布方式,在被保護的元件(以下稱為基材)上塗佈上述溶液狀態的感光性樹脂組成物,以形成塗膜。
上述基材可以是用於液晶顯示裝置的無鹼玻璃、鈉鈣玻璃、硬質玻璃(派勒斯玻璃)、石英玻璃,以及附著有透明導電膜的此等玻璃者,或是用於光電變換裝置(如固體攝影裝置)的基材(如:矽基材)。
形成塗膜之後,以減壓乾燥方式去除感光性樹脂組成物的大部分有機溶劑,然後以預烤(pre-bake)方式將殘餘的有機溶劑完全去除,使其形成預烤塗膜。
上述減壓乾燥及預烤的操作條件可依各成份的種類、配合比率而異。一般而言,減壓乾燥乃在0托至200托的壓力下進行1秒鐘至60秒鐘,並且預烤乃在70°C至110°C溫度下進行1分鐘至15分鐘。
-圖案化曝光- 以具有特定圖案的光罩對上述預烤塗膜進行曝光。在曝光過程中所使用的光線,以g線、h線、i線等紫外線為佳,並且用來提供紫外線的設備可為(超)高壓水銀燈及金屬鹵素燈。
-顯影- 將上述經曝光的預烤塗膜浸漬於溫度介於23±2°C的顯影液中,進行約15秒至5分鐘的顯影,以去除上述經曝光的預烤塗膜的不需要的部分,藉此可在基材上形成具有預定圖案的薄膜的半成品。上述顯影液之具體例為氫氧化鈉、氫氧化鉀、碳酸鈉、碳酸氫鈉、碳酸鉀、碳酸氫鉀、矽酸鈉、甲基矽酸鈉(sodium methylsilicate)、氨水、乙胺、二乙胺、二甲基乙醇胺、氫氧化四甲銨(THAM)、氫氧化四乙銨、膽鹼、吡咯、呱啶,或1,8-二氮雜二環-(5,4,0)-7-十一烯等鹼性化合物。
值得一提的是,顯影液的濃度太高會使得特定圖案損毀或造成特定圖案的解析度變差;濃度太低會造成顯影不良,導致特定圖案無法成型或者曝光部分的組成物殘留。因此,濃度的多寡會影響後續光硬化性聚矽氧烷組成物經曝光後的特定圖案的形成。顯影液的濃度範圍較佳為0.001 wt%至10 wt%;更佳為0.005 wt%至5 wt%;再更佳為0.01 wt%至1 wt%。本發明的實施例是使用2.38 wt%的氫氧化四甲銨的顯影液。值得一提的是,即使使用濃度更低的顯影液,本發明的感光性樹脂組成物也能形成良好的微細化圖案。
-後烤處理- 用水清洗基材(其中基材上有預定圖案的薄膜的半成品),以清除上述經曝光的預烤塗膜的不需要的部分。然後,用壓縮空氣或壓縮氮氣乾燥上述具有預定圖案的保護膜的半成品。最後以加熱板或烘箱等加熱裝置對上述具有預定圖案的保護膜的半成品進行後烤(post-bake)處理。加熱溫度設定在100°C至250°C之間,使用加熱板時的加熱時間為1分鐘至60分鐘,使用烘箱時的加熱時間則為5分鐘至90分鐘。藉此,可使上述具有預定圖案的保護膜的半成品的圖案固定,以形成保護膜。< 液晶顯示元件的製造方法 >
本發明提供一種液晶顯示元件,包括上述的保護膜。以下詳細說明其製造方法。
首先,將包括藉由上述保護膜的製造方法所形成的保護膜的元件(如彩色濾光片)以及設置有薄膜電晶體(thin film transistor;TFT)的基板作對向配置,並且在上述兩者之間設置間隙(晶胞間隔,cell gap)。接著,以黏著劑貼合元件與上述基板的周圍部分並且留下注入孔。然後,在基板表面以及黏著劑所分隔出的間隙內由注入孔注入液晶,最後封住注入孔來形成液晶層。隨後,藉由在元件中接觸液晶層的另一側與基板中接觸液晶層的另一側提供偏光板來製作液晶顯示元件。上述所使用的液晶,亦即液晶化合物或液晶組成物,此處並未特別限定。惟,可使用任何一種液晶化合物及液晶組成物。
此外,於製作彩色濾光片中所使用的液晶配向膜是用來限制液晶分子的配向,並且沒有特別的限制,舉凡無機物或有機物任一者均可,並且本發明並不限於此。
以下將列舉實施例詳細說明本發明,但本發明並不侷限於這些實施例所揭露的內容。< 實施例 > 複合樹脂 (A) 的合成例
以下說明複合樹脂(A)的合成例A1~A13以及比較合成例A'1~A'3:
另外,以下合成例中的簡稱所對應的化合物如下所示。
合成例A1
步驟1:如表1之合成例A-1-1所示,在一容積1000毫升之四頸錐瓶上設置氮氣入口、攪拌器、加熱器、冷凝管及溫度計。導入氮氣後,添加10重量份的MPTMS(相當於(甲基)丙烯酸矽氧烷酯系單體(a1-2))、90重量份的MMA(相當於其他不飽和單體(a1-3))、2.4重量份的ADVN及290重量份的PGMEA至反應瓶中。接著,緩慢攪拌上述成份,並將溶液加熱至80℃,進行聚合反應3小時後,將溶劑脫揮,即可得到主鏈共聚物(A-1-1)。
步驟2:如表2之合成例A-2-1所示,在一容積500毫升的三頸燒瓶中,加入10重量份的GF-20(相當於單體(a2-1))、50重量份的MTMS(相當於單體(a2-2))、40重量份的PTMS(相當於單體(a2-2))以及80重量份的DAA,並於室溫下一邊攪拌一邊於30分鐘內添加磷酸水溶液(0.1重量份磷酸/30重量份去離子水)。接著,將燒瓶浸漬於油浴中,於60分鐘內升溫至40°C,並於40°C下攪拌30分鐘。然後,再於90分鐘內升溫至105°C,持續加熱攪拌進行聚縮合80分鐘後,利用蒸餾方式將溶劑移除,即可獲得側鏈聚縮合物(A-2-1)。
步驟3:如表3之合成例A1所示,在一容積1000毫升的三頸燒瓶中,將上述合成所得之固形份20重量份的主鏈共聚物(A-1-1)及固形份80重量份的側鏈聚縮合物(A-2-1)在60重量份的PGMEA以及65重量份的DAA的混合溶劑中進行混合,並於室溫下一邊攪拌一邊於30分鐘內添加磷酸水溶液(0.05重量份磷酸/4重量份去離子水)。接著,將燒瓶浸漬於油浴中,於80°C下攪拌120分鐘。然後,升溫至105°C,持續攪拌進行聚合120分鐘後,利用蒸餾方式將溶劑移除,即可獲得複合樹脂(A1)。
合成例A2~A7
如表1~表3所示,合成例A2~A7的複合樹脂是以與合成例A1相同的步驟來製備,並且其不同處在於:改變複合樹脂的成分種類及其使用量。
表1
表2
表3
合成例A8
步驟1:在一容積1000毫升之四頸錐瓶上設置氮氣入口、攪拌器、加熱器、冷凝管及溫度計。導入氮氣後,添加95重量份的MMA(相當於其他不飽和單體(a1-3))、5重量份的MPTMS(相當於(甲基)丙烯酸矽氧烷酯系單體(a1-2))、15重量份的MTMS(相當於單體(a2-2))、11重量份的ADVN及120重量份的PGMEA至反應瓶中。接著,緩慢攪拌上述成份,並將溶液加熱至80℃,進行聚合反應3小時。接著,添加磷酸水溶液(0.2重量份磷酸/4.2重量份去離子水)並攪拌1小時後,升溫至105°C,持續加熱攪拌進行聚縮合60分鐘。最後,將溶劑脫揮,即可得到生成具有部分聚矽氧烷側鏈的主鏈共聚物(A-1-8)。
步驟2:在一容積500毫升的三頸燒瓶中,加入10重量份的GF-20(相當於單體(a2-1))、40重量份的PTMS(相當於單體(a2-2))、35重量份的MTMS(相當於單體(a2-2))以及80重量份的DAA,並於室溫下一邊攪拌一邊於30分鐘內添加磷酸水溶液(0.1重量份磷酸/32.6重量份去離子水)。接著,將燒瓶浸漬於油浴中,於60分鐘內升溫至40°C,並於40°C下攪拌30分鐘。然後,再於90分鐘內升溫至105°C,持續加熱攪拌進行聚縮合80分鐘後,利用蒸餾方式將溶劑移除,即可獲得側鏈聚縮合物(A-2-8)。
步驟3:在一容積1000毫升的三頸燒瓶中,將上述合成所得之固形份20重量份的具有部分聚矽氧烷側鏈的主鏈共聚物(A-1-8)及固形份80重量份的側鏈聚縮合物(A-2-8)在60重量份的PGMEA以及65重量份的DAA的混合溶劑中進行混合,並於室溫下一邊攪拌一邊於30分鐘內添加磷酸水溶液(0.05重量份磷酸/4重量份去離子水)。接著,將燒瓶浸漬於油浴中,於80°C下攪拌120分鐘。然後,升溫至105°C,持續攪拌進行聚合120分鐘後,利用蒸餾方式將溶劑移除,即可獲得複合樹脂(A8)。
合成例A9
步驟1:在一容積1000毫升之四頸錐瓶上設置氮氣入口、攪拌器、加熱器、冷凝管及溫度計。導入氮氣後,添加10重量份的MAA(相當於含羧酸或羧酸酐之不飽和單體(a1-1))、10重量份的MPTMS(相當於(甲基)丙烯酸矽氧烷酯系單體(a1-2))、50重量份的MMA(相當於其他不飽和單體(a1-3))、30重量份的BzMA(相當於其他不飽和單體(a1-3))、12重量份的DMDMS(相當於單體(a2-2))、11重量份的ADVN及120重量份的PGMEA至反應瓶中。接著,緩慢攪拌上述成份,並將溶液加熱至80℃,進行聚合反應3小時。接著,添加磷酸水溶液(0.2重量份磷酸/4.0重量份去離子水)並攪拌1小時後,升溫至105°C,持續加熱攪拌進行聚縮合60分鐘。最後,將溶劑脫揮,即可得到生成具有部分聚矽氧烷側鏈的主鏈共聚物(A-1-9)。
步驟2:在一容積500毫升的三頸燒瓶中,加入40重量份的PTMS(相當於單體(a2-2))、38重量份的MTMS(相當於單體(a2-2))、10重量份的PTES(相當於單體(a2-2))以及80重量份的DAA,並於室溫下一邊攪拌一邊於30分鐘內添加磷酸水溶液(0.1重量份磷酸/32.6重量份去離子水)。接著,將燒瓶浸漬於油浴中,於60分鐘內升溫至40°C,並於40°C下攪拌30分鐘。然後,再於90分鐘內升溫至105°C,持續加熱攪拌進行聚縮合80分鐘後,利用蒸餾方式將溶劑移除,即可獲得側鏈聚縮合物(A-2-9)。
步驟3:在一容積1000毫升的三頸燒瓶中,將上述合成所得之固形份25重量份的具有部分聚矽氧烷側鏈的主鏈共聚物(A-1-9)及固形份75重量份的側鏈聚縮合物(A-2-9)在60重量份的PGMEA以及65重量份的DAA的混合溶劑中進行混合,並於室溫下一邊攪拌一邊於30分鐘內添加磷酸水溶液(0.05重量份磷酸/4重量份去離子水)。接著,將燒瓶浸漬於油浴中,於80°C下攪拌120分鐘。然後,升溫至105°C,持續攪拌進行聚合120分鐘後,利用蒸餾方式將溶劑移除,即可獲得複合樹脂(A9)。
合成例A10
步驟1:在一容積1000毫升之四頸錐瓶上設置氮氣入口、攪拌器、加熱器、冷凝管及溫度計。導入氮氣後,添加10重量份的MAA(相當於含羧酸或羧酸酐之不飽和單體(a1-1))、15重量份的MPTMS(相當於(甲基)丙烯酸矽氧烷酯系單體(a1-2))、45重量份的MMA(相當於其他不飽和單體(a1-3))、20重量份的BzMA(相當於其他不飽和單體(a1-3))、10重量份的SM(相當於其他不飽和單體(a1-3))、15重量份的DMDMS(相當於單體(a2-2))、12重量份的ADVN及130重量份的PGMEA至反應瓶中。接著,緩慢攪拌上述成份,並將溶液加熱至80℃,進行聚合反應3小時後,接著,添加磷酸水溶液(0.2重量份磷酸/4.5重量份去離子水)並攪拌1小時後,升溫至105°C,持續加熱攪拌進行聚縮合60分鐘。最後,將溶劑脫揮,即可得到生成具有部分聚矽氧烷側鏈的主鏈共聚物(A-1-10)。
步驟2:在一容積500毫升的三頸燒瓶中,加入10重量份的TMSG(相當於單體(a2-1))、30重量份的PTMS(相當於單體(a2-2))、35重量份的MTMS(相當於單體(a2-2))、10重量份的PTES(相當於單體(a2-2))以及85重量份的DAA,並於室溫下一邊攪拌一邊於30分鐘內添加磷酸水溶液(0.1重量份磷酸/32.6重量份去離子水)。接著,將燒瓶浸漬於油浴中,於60分鐘內升溫至40°C,並於40°C下攪拌30分鐘。然後,再於90分鐘內升溫至105°C,持續加熱攪拌進行聚縮合80分鐘後,利用蒸餾方式將溶劑移除,即可獲得側鏈聚縮合物(A-2-10)。
步驟3:在一容積1000毫升的三頸燒瓶中,將上述合成所得之固形份15重量份的具有部分聚矽氧烷側鏈的主鏈共聚物(A-1-10)及固形份85重量份的側鏈聚縮合物(A-2-10)在60重量份的PGMEA以及65重量份的DAA的混合溶劑進行混合,並於室溫下一邊攪拌一邊於30分鐘內添加磷酸水溶液(0.05重量份磷酸/4重量份去離子水)。接著,將燒瓶浸漬於油浴中,於80°C下攪拌120分鐘。然後,升溫至105°C,持續攪拌進行聚合120分鐘後,利用蒸餾方式將溶劑移除,即可獲得複合樹脂(A10)。
合成例A11
在一容積1000毫升之四頸錐瓶上設置氮氣入口、攪拌器、加熱器、冷凝管及溫度計。導入氮氣後,添加12重量份的MPTMS(相當於(甲基)丙烯酸矽氧烷酯系單體(a1-2))、88重量份的MMA(相當於其他不飽和單體(a1-3))、2.4重量份的ADVN及290重量份的PGMEA至反應瓶中。接著,緩慢攪拌上述成份,並將溶液加熱至80℃後,進行聚合反應3小時,然後,加入10重量份的GF-20(相當於單體(a2-1))、40重量份的PTMS(相當於單體(a2-2))、50重量份的MTMS(相當於單體(a2-2))以及80重量份的DAA,並於室溫下一邊攪拌一邊於30分鐘內添加磷酸水溶液(0.1重量份磷酸/32.6重量份去離子水)。接著,將燒瓶浸漬於油浴中,於60分鐘內升溫至40°C,並於40°C下攪拌30分鐘。然後,再於90分鐘內升溫至105°C,持續加熱攪拌進行聚縮合80分鐘後,利用蒸餾方式將溶劑移除,即可獲得複合樹脂(A11)。
合成例A12
在一容積1000毫升之四頸錐瓶上設置氮氣入口、攪拌器、加熱器、冷凝管及溫度計。導入氮氣後,添加20重量份的MAA(相當於含羧酸或羧酸酐之不飽和單體(a1-1))、15重量份的MPTES(相當於(甲基)丙烯酸矽氧烷酯系單體(a1-2))、40重量份的MMA(相當於其他不飽和單體(a1-3))、25重量份的FA513M(相當於其他不飽和單體(a1-3))、2.5重量份的ADVN及300重量份的PGMEA至反應瓶中。接著,緩慢攪拌上述成份,並將溶液加熱至80℃,進行聚合反應3小時,然後,加入40重量份的PTMS(相當於單體(a2-2))、50重量份的MTMS(相當於單體(a2-2))、10重量份的DMDMS(相當於單體(a2-2))以及80重量份的DAA,並於室溫下一邊攪拌一邊於30分鐘內添加磷酸水溶液(0.1重量份磷酸/32.6重量份去離子水)。接著,將燒瓶浸漬於油浴中,於60分鐘內升溫至40°C,並於40°C時攪拌30分鐘。然後,再於90分鐘內升溫至105°C,持續加熱攪拌進行聚縮合80分鐘後,利用蒸餾方式將溶劑移除,即可獲得複合樹脂(A12)。
合成例A13
在一容積1000毫升之四頸錐瓶上設置氮氣入口、攪拌器、加熱器、冷凝管及溫度計。導入氮氣後,添加10重量份的MAA(相當於含羧酸或羧酸酐之不飽和單體(a1-1))、15重量份的MPTES(相當於(甲基)丙烯酸矽氧烷酯系單體(a1-2))、40重量份的MMA(相當於其他不飽和單體(a1-3))、25重量份的FA513M(相當於其他不飽和單體(a1-3))、10重量份的SM、2.5重量份的ADVN及300重量份的PGMEA至反應瓶中。接著,緩慢攪拌上述成份,並將溶液加熱至80℃,進行聚合反應3小時,然後,加入10重量份的TMSG(相當於單體(a2-1))、50重量份的PTMS(相當於單體(a2-2))、40重量份的MTMS(相當於單體(a2-2))以及80重量份的DAA,並於室溫下一邊攪拌一邊於30分鐘內添加磷酸水溶液(0.1重量份磷酸/32.6重量份去離子水)。接著,將燒瓶浸漬於油浴中,於60分鐘內升溫至40°C,並於40°C時攪拌30分鐘。然後,再於90分鐘內升溫至105°C,持續加熱攪拌進行聚縮合80分鐘後,利用蒸餾方式將溶劑移除,即可獲得複合樹脂(A13)。
比較合成例A'1
在一容積1000毫升之四頸錐瓶上設置氮氣入口、攪拌器、加熱器、冷凝管及溫度計。導入氮氣後,添加10重量份的MAA(相當於含羧酸或羧酸酐之不飽和單體(a1-1))、10重量份的MPTMS(相當於(甲基)丙烯酸矽氧烷酯系單體(a1-2))、30重量份的甲基丙烯酸甲酯MMA(相當於其他不飽和單體(a1-3))、50重量份的BzMA(相當於其他不飽和單體(a1-3))、2.4重量份的ADVN及290重量份的PGMEA至反應瓶中。接著,緩慢攪拌上述成份,並將溶液加熱至80℃,進行聚合反應3小時後,然後,將溶劑脫揮後,即可得到(甲基)丙烯酸系聚合物(A’1)。
比較合成例A'2
在一容積500毫升的三頸燒瓶中,加入10重量份的GF-20(相當於單體(a2-1))、40重量份的PTMS(相當於單體(a2-2))、50重量份的MTMS(相當於單體(a2-2))以及80重量份的DAA,並於室溫下一邊攪拌一邊於30分鐘內添加磷酸水溶液(0.1重量份磷酸/32.6重量份去離子水)。接著,將燒瓶浸漬於油浴中,於60分鐘內升溫至40°C,並於40°C下攪拌30分鐘。然後,再於90分鐘內升溫至105°C,持續加熱攪拌進行聚縮合80分鐘後,利用蒸餾方式將溶劑移除,即可獲得聚矽氧烷(A’2)。感光性樹脂組成物的實施例
以下說明感光性樹脂組成物的實施例1至實施例14及比較例1至比較例5:實施例 1
將100重量份的複合樹脂(A1)(以下簡稱為A1)、4重量份的1-[1-(4-羥基苯基)異丙基]-4-[1,1-雙(4-羥基苯基)乙基]苯與鄰萘醌二疊氮-5-磺酸所形成之鄰萘醌二疊氮磺酸酯(以下簡稱為B-1)、0.5重量份的N-(三氟甲磺醯氧基)雙環[2.2.1]庚-5-烯-2,3-二羧醯亞胺(以下簡稱為D-1)加入200重量份的丙二醇甲醚醋酸酯(以下簡稱為C-1)中,並且以搖動式攪拌器(shaking type stirrer)攪拌均勻後,即可製造得實施例1的感光性樹脂組成物。將所製得的感光性樹脂組成物以後述各評價方式進行評價,其結果如表4所示。實施例 2 至實施例 14
實施例2至實施例14的感光性樹脂組成物是以與實施例1相同的步驟來製備,並且其不同處在於:改變感光性樹脂組成物的成分種類及其使用量(如表4所示)。將所製得的感光性樹脂組成物以後述各評價方式進行評價,其結果如表4所示。比較例 1 至 比較例 5
比較例1至比較例5的感光性樹脂組成物是以與實施例1相同的步驟來製備,並且其不同處在於:改變感光性樹脂組成物的成分種類及其使用量(如表4所示)。將所製得的感光性樹脂組成物以後述各評價方式進行評價,其結果如表4所示。
表4中的簡稱所對應的化合物如下所示。
表4 評價方式 (a) 透光率
將感光性樹脂組成物以旋轉塗佈的方式,塗佈在100*100*0.7 mm大小的素玻璃基板上,得到厚度約3 μm之預塗膜,接續以90℃預烤2分鐘後,浸漬於2.38 wt%的氫氧化四甲銨的顯影液中60秒。以清水清洗後,再以曝光機直接照射顯影後之塗膜,其能量為200 mJ/cm2
。接著進行後烤,後烤溫度為230℃/1hr,將後烤完之薄膜以穿透吸收光譜分析儀(MCPD-Series,大塚科技)測量400 nm至800 nm波長透過烘烤後保護膜的透光率,量測點為至少五點,將測得之數據平均後取400 nm波長對應之透光率數值,此即為透光率之數據,並根據以下標準評價: ◎:95%≦透光率 ○:90%≦透光率<95% △:85%≦透光率<90% ╳:透光率<85%(b) 耐化學性
將感光性樹脂組成物以旋轉塗佈的方式,塗佈在100*100*0.7 mm大小的素玻璃基板上,得到厚度約3 μm之預塗膜,接續以90℃預烤2分鐘後,浸漬於2.38 wt%的氫氧化四甲銨的顯影液中60秒。以清水清洗後,再以曝光機直接照射顯影後之塗膜,其能量為200 mJ/cm2
。接著進行後烤,後烤溫度為230℃/1hr,將後烤完之薄膜浸泡於80℃之N-甲基吡咯烷酮(N-Methyl-2-pyrrolidone,NMP)溶劑中10分鐘,依如下公式計算膜厚變化率: 膜厚變化率=〔(浸泡前膜厚-浸泡後膜厚)/浸泡前膜厚〕×100% 得到的膜厚變化率數值即為耐化學性之數據,並根據以下標準評價: ◎:膜厚變化率≦3% ○:3%<膜厚變化率≦5% △:5%<膜厚變化率≦6% ╳:6%<膜厚變化率評價結果
由表4得知,與含有複合樹脂(A)的感光性樹脂組成物(實施例1至實施例14)相比,僅含有(甲基)丙烯酸系聚合物(A’1)的感光性樹脂組成物(比較例1)的透明性較差;僅含有聚矽氧烷(A’2)的感光性樹脂組成物(比較例2)的耐化學性較差;同時含有含有(甲基)丙烯酸系聚合物(A’1)以及聚矽氧烷(A’2)的感光性樹脂組成物(比較例3~5)的透明性表現隨(甲基)丙烯酸系聚合物(A’1)的含量增加而逐漸變差,而耐化學性表現則隨聚矽氧烷(A’2)的含量增加而逐漸變差。由此可知,當感光性樹脂組成物中,未包括複合樹脂(A)時,感光性樹脂組成物的透明性及耐化學性較差。本發明之感光性樹脂組成物因含有複合樹脂(A),故兼具高透明性及耐化學性優異的特性。
另外,當感光性樹脂組成物中包括熱發生劑(D)時(實施例1、3、4、6、12、13),感光性樹脂組成物的耐化學性表現更佳。由此可知,當感光性樹脂組成物中包括熱發生劑(D)時,可進一步改善其耐化學性。
綜上所述,本發明的感光性樹脂組成物由於含有具有聚(甲基)丙烯酸結構的主鏈及聚矽氧烷結構的側鏈的複合樹脂(A),而可以改善保護膜的透明性與耐化學性不佳的問題,進而適用於液晶顯示元件。
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。
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Claims (9)
- 一種感光性樹脂組成物,包括: 複合樹脂(A); 鄰萘醌二疊氮磺酸酯(B);以及 溶劑(C),其中 所述複合樹脂(A)包括主鏈及側鏈,所述主鏈包括(甲基)丙烯酸矽氧烷酯系單體(a1-2)之衍生重複單元;所述側鏈包括矽氧烷系單體(a2)之衍生重複單元,且鍵結於所述(甲基)丙烯酸矽氧烷酯系單體(a1-2)之衍生重複單元;且所述複合樹脂(A)符合下述條件(I)及條件(II)中的至少一者: 條件(I):所述主鏈更包括含羧酸或羧酸酐之不飽和單體(a1-1)之衍生重複單元,所述含羧酸或羧酸酐之不飽和單體(a1-1)包含羧酸基結構及不飽和鍵,或者包含羧酸酐結構及不飽和鍵; 條件(II):所述矽氧烷系單體(a2)包括以下述通式(A-4)所示的單體(a2-1), Si(R7 )w (OR8 )4-w 通式(A-4) 通式(A-4)中,R7 表示以下述通式(A-5)、通式(A-6)或通式(A-7)所示的結構、或碳數1~10的烴基、未經取代或部分氫原子以鹵素或碳數1~10的烴基取代的苯基,但至少一個R7 表示以下述通式(A-5)、通式(A-6)或通式(A-7)所示的結構;R8 表示氫原子、碳數1~6的烴基、碳數1~6的醯基、或碳數6~15的芳香基;當所述通式(A-4)中具有2個以上的R7 或R8 時,各個R7 或R8 可彼此相同或不同;w表示1~3的整數;通式(A-5) 通式(A-5)中,R9 表示碳數1~10的烴基;m為0或1;*表示鍵結處;通式(A-6) 通式(A-6)中,R10 表示單鍵、碳數1~10的烷基或碳數1~10的烷氧基;R11 表示氫原子或碳數1~10的烴基;n為0或1;*表示鍵結處;通式(A-7) 通式(A-7)中,R12 表示單鍵或碳數1~6的伸烷基;*表示鍵結處。
- 如申請專利範圍第1項所述的感光性樹脂組成物,其中所述主鏈更包括其他不飽和單體(a1-3)之衍生重複單元。
- 如申請專利範圍第1項所述的感光性樹脂組成物,其中所述(甲基)丙烯酸矽氧烷酯系單體(a1-2)具有下述通式(A-1)之結構,通式(A-1) 通式(A-1)中,R1 表示氫原子或甲基;a表示1至6的整數;R2 各自獨立表示碳數1~12的烷基、苯基、碳數1~6的烷氧基或以下述通式(A-2)所示的結構;b表示1至150之整數;R3 表示碳數1~6的烷基或以下述通式(A-3)所示的結構;當所述主鏈中具有多個由所述通式(A-1)表示之衍生重複單元時,各個由所述通式(A-1) 表示之衍生重複單元可彼此相同或不同;通式(A-2) 通式(A-2)中,R4 、R5 各自獨立表示碳數1~12的烷基或苯基;c表示2至13之整數;通式(A-3) 通式(A-3)中,R6 各自獨立表示碳數1~12的烷基或苯基。
- 如申請專利範圍第1項所述的感光性樹脂組成物,其中所述矽氧烷系單體(a2)更包括以下述通式(A-8)所示的單體(a2-2), Si(R13 )x (OR14 )4-x 通式(A-8) 通式(A-8)中,R13 表示碳數1~10的烴基、未經取代或部分氫原子以鹵素或碳數1~10的烴基取代的苯基;R14 表示氫原子、碳數1~6的烴基、碳數1~6的醯基、或碳數6~15的芳香基;當所述通式(A-8)中具有2個以上的R13 或R14 時,各個R13 或R14 可彼此相同或不同;x表示0~3的整數。
- 如申請專利範圍第1項所述的感光性樹脂組成物,其中,基於所述複合樹脂(A)的使用量為100重量份,所述鄰萘醌二疊氮磺酸酯(B)的使用量為1~30重量份,所述溶劑(C)的使用量為100~1600重量份。
- 如申請專利範圍第1項所述的感光性樹脂組成物,其中更包括熱發生劑(D)。
- 如申請專利範圍第6項所述的感光性樹脂組成物,其中,基於所述複合樹脂(A)的使用量為100重量份,所述熱發生劑(D)的使用量為0.5~6重量份。
- 一種保護膜,由如申請專利範圍第1項至第7項中任一項所述的感光性樹脂組成物製成。
- 一種液晶顯示元件,包括如申請專利範圍第8項所述的保護膜。
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