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TW201625358A - Crucible, a evaporation assembly having the same and a method using the same for evaporation purposes - Google Patents

Crucible, a evaporation assembly having the same and a method using the same for evaporation purposes Download PDF

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Publication number
TW201625358A
TW201625358A TW104138688A TW104138688A TW201625358A TW 201625358 A TW201625358 A TW 201625358A TW 104138688 A TW104138688 A TW 104138688A TW 104138688 A TW104138688 A TW 104138688A TW 201625358 A TW201625358 A TW 201625358A
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crucible
heat transport
wall
heat
source material
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TW104138688A
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Chinese (zh)
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佑維 史奇伯勒
史丹分 班格特
喬斯曼紐 地古坎柏
安德率斯 露博
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應用材料股份有限公司
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Publication of TW201625358A publication Critical patent/TW201625358A/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27FURNACES; KILNS; OVENS; RETORTS
    • F27DDETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D5/00Supports, screens or the like for the charge within the furnace
    • F27D5/0037Supports specially adapted for semi-conductors

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

In general, the present disclosure relates to systems, apparatuses and methods for depositing materials. In particular, the present disclosure relates to a crucible for evaporating a source material. The crucible has a wall with an inner surface surrounding an inner volume for receiving the source material and one or more heat transfer elements arranged within the inner volume of the crucible.

Description

用於蒸發目的之坩鍋、具有其之蒸發組件及使用其之方法Crucible pan for evaporation purposes, evaporation assembly therewith and method of using same

本揭露一般是有關於蒸發器、坩鍋、源材料之沈積及用於沈積材料之系統、設備及方法,材料舉例為有機材料。特別是,本揭露係有關於用於有機材料之蒸發坩鍋,舉例為在沈積系統中藉由使用蒸發組件來製造裝置,特別是包括有機材料於其中之裝置。The present disclosure generally relates to evaporators, crucibles, deposition of source materials, and systems, apparatus, and methods for depositing materials, such as organic materials. In particular, the present disclosure relates to an evaporation crucible for an organic material, for example, by using an evaporation assembly in a deposition system, particularly a device comprising an organic material therein.

有機蒸發器係舉例為用於生產有機發光二極體(organic light-emitting diodes,OLED)之器械。OLEDs係為發光二極體之一種特別形式,在OLEDs中,發光層包括特定之有機化合物之薄膜。OLEDs係使用於製造用於顯示資訊之電視螢幕、電腦螢幕、手機、其他手持裝置等中。OLEDs可亦使用來做為一般空間的照明。OLED顯示器可能的顏色、亮度、及視角之範圍係較傳統之液晶顯示器(LCD)大,因為OLED像素係直接地發出光線而不使用背光。因此,OLED顯示器之能量損耗係少於傳統之液晶顯示器的能量損耗。再者,可更簡單地製造於撓性基板上的OLEDs係產生更多之應用。典型之OLED顯示器舉例可包括位於兩個電極之間的數個有機材料層,此些有機材料層係沈積於一基板上,以形成具有個別可供能像素之一矩陣顯示面板。OLED一般係置於兩個玻璃面板之間,且玻璃面板之邊緣係密封以封裝OLED於其中。The organic vaporizer is exemplified by an apparatus for producing organic light-emitting diodes (OLEDs). OLEDs are a special form of light-emitting diodes in which the light-emitting layer comprises a film of a specific organic compound. OLEDs are used in the manufacture of television screens, computer screens, cell phones, other handheld devices, etc. for displaying information. OLEDs can also be used as general space lighting. OLED displays may have a larger range of colors, brightness, and viewing angles than conventional liquid crystal displays (LCDs) because OLED pixels emit light directly without the use of backlights. Therefore, the energy loss of an OLED display is less than that of a conventional liquid crystal display. Furthermore, OLEDs that can be more easily fabricated on flexible substrates produce more applications. A typical OLED display example can include a plurality of layers of organic material between two electrodes deposited on a substrate to form a matrix display panel having individual energized pixels. The OLED is typically placed between two glass panels, and the edges of the glass panel are sealed to encapsulate the OLED therein.

帶來多種相關挑戰之製造OLED顯示器或OLED發光應用中的一階段係為沈積有機材料之製程,以在基板上達到高程度之層均勻。再者,蒸發例如是靈敏之有機材料的數個特定情況必須考慮,舉例為在真空中蒸發及沈積於基板上。One stage in the fabrication of OLED displays or OLED luminescent applications that present a variety of related challenges is the process of depositing organic materials to achieve a high degree of layer uniformity on the substrate. Furthermore, several specific cases of evaporating, for example, sensitive organic materials must be considered, for example by evaporation and deposition on a substrate in a vacuum.

因此,對於用於形成數個裝置之新的及改善之系統、設備及方法係有持續的需求,此些裝置例如是高品質OLED顯示裝置。Accordingly, there is a continuing need for new and improved systems, devices, and methods for forming a plurality of devices, such as high quality OLED display devices.

有鑑於上述,根據一方面,一種坩鍋係提供。此坩鍋係包括:一牆,具有一內表面,內表面係圍繞一內空間,內空間用以容納源材料及一或多個熱傳輸元件,此一或多個熱傳輸元件係排列在坩鍋之內空間中。In view of the above, according to one aspect, a crucible is provided. The crucible comprises: a wall having an inner surface, the inner surface surrounding an inner space, the inner space for accommodating the source material and one or more heat transport elements, the one or more heat transport elements being arranged in the crucible In the space inside the pot.

再者,一種用以蒸發一源材料之蒸發組件係提供。蒸發組件包括:如上所述之一坩鍋及至少一分佈組件,此至少一分佈組件係適用於從坩鍋導引已蒸發之源材料至將塗佈之一基板。Furthermore, an evaporation assembly for evaporating a source material is provided. The evaporation assembly includes one of the crucibles and at least one distribution assembly as described above, the at least one distribution assembly being adapted to direct the evaporated source material from the crucible to one of the substrates to be coated.

再者,一種用以利用從一坩鍋蒸發之一源材料塗佈一基板的方法係提供,坩鍋具有一牆,牆具有一內表面,內表面圍繞一內空間,內空間用以容納源材料且包括至少一熱傳輸元件於坩鍋之內空間中。此方法包括:提供源材料於坩鍋中;藉由提供坩鍋之內空間的一間接加熱來加熱源材料,提供坩鍋之內空間的間接加熱係利用此至少一熱傳輸元件;以及導引已蒸發之源材料至基板之一表面。Furthermore, a method for coating a substrate with a source material evaporating from a crucible is provided, the crucible having a wall having an inner surface, the inner surface surrounding an inner space, and the inner space for accommodating the source The material includes at least one heat transport element in the inner space of the crucible. The method includes: providing a source material in a crucible; heating the source material by providing an indirect heating of the space inside the crucible, providing an indirect heating system for the space inside the crucible using the at least one heat transfer element; The source material has evaporated to one of the surfaces of the substrate.

本揭露之其他方面、優點及特性係藉由附屬申請專利範圍、說明及所附之圖式更為清楚。為了對本揭露之上述及其他方面有更佳的瞭解,下文特舉較佳實施例,並配合所附圖式,作詳細說明如下:Other aspects, advantages and features of the present disclosure will become apparent from the appended claims. In order to better understand the above and other aspects of the present disclosure, the preferred embodiments are described below in detail with reference to the accompanying drawings.

詳細的參照將以本揭露之各種實施例來達成,實施例的一或多個例子係繪示在圖式中。在下方圖式之說明中,相同參考編號係意指相同元件。一般來說,僅有有關於個別實施例之相異處係進行說明。各例子係藉由說明本揭露的方式提供且不意味為本揭露之一限制。再者,所說明或敘述而做為一實施例之部分之特徵可用於其他實施例或與其他實施例結合,以取得再其他實施例。此意指本說明包括此些調整及變化。The detailed description is achieved by the various embodiments of the present disclosure, and one or more examples of the embodiments are illustrated in the drawings. In the description of the following figures, the same reference numerals are intended to refer to the same elements. In general, only the differences between the individual embodiments are described. The examples are provided by way of illustration of the disclosure and are not intended to be limiting. Furthermore, the features illustrated or described as part of one embodiment can be used in other embodiments or in combination with other embodiments to achieve further embodiments. This means that the description includes such adjustments and changes.

根據此處之實施例,OLED製造的技術包括於基板上沈積源材料,源材料例如是有機材料。沈積製程係在高中空狀態下執行。包含有機材料之坩鍋係加熱至蒸發有機材料且產生之蒸汽係沈積於基板上。既然非均勻蒸發可能導致沈積已蒸發粒子而對沈積於基板上之薄膜有害,較近地監控及控制蒸發製程係有利的。為了較佳的調整沈積率,透過緩慢地增加溫度到在蒸發坩鍋中之有機材料之蒸發溫度來順利地蒸發有機材料可能係有利的。According to embodiments herein, the technique of OLED fabrication includes depositing a source material on a substrate, such as an organic material. The deposition process is performed in a high hollow state. A crucible containing an organic material is heated to evaporate the organic material and the resulting vapor is deposited on the substrate. Since non-uniform evaporation may result in deposition of evaporated particles and is detrimental to the film deposited on the substrate, it is advantageous to monitor and control the evaporation process more closely. In order to better adjust the deposition rate, it may be advantageous to smoothly evaporate the organic material by slowly increasing the temperature to the evaporation temperature of the organic material in the evaporation crucible.

在此處所述實施例中,於此使用的名稱「蒸發(evaporation)」應意指從液態蒸發成蒸汽以及從固態昇華成蒸汽之兩種製程。In the embodiments described herein, the term "evaporation" as used herein shall mean both processes of evaporating from a liquid to steam and subliming from a solid to steam.

本揭露之發明者係已經發現,不均勻的熱輸入到源材料可能發生在傳統的坩鍋中,而導致在坩鍋之內側的源材料不均勻的大量蒸發。不均勻的大量蒸發可能對沈積於基板上之薄膜的均勻有負面的影響且可能降低已生產之裝置的整體品質。The inventors of the present disclosure have discovered that uneven heat input to the source material can occur in conventional crucibles, resulting in uneven evaporation of the source material on the inside of the crucible. Unevenly large amounts of evaporation may have a negative impact on the uniformity of the film deposited on the substrate and may reduce the overall quality of the device that has been produced.

本揭露係藉由提供用以均勻地沈積源材料之改善的系統、設備及方法於基板上且改善源材料之損耗率來考量和處理(address)此些議題,此些源材料例如是有機材料。特別是,本揭露係提供改善之坩鍋,用以在沈積系統中藉由使用蒸發組件來製造裝置。舉例來說,根據此處之實施例,包含源材料之坩鍋可包括一或多個熱傳輸元件,裝配以均勻地重新分佈供應至坩鍋之內空間中的熱。坩鍋之內空間的均勻加熱係改善在坩鍋中之源材料的均勻蒸發且對在塗佈或裝置製造製程期間沈積之層的整體均勻有貢獻。The present disclosure addresses and addresses such issues by providing improved systems, devices, and methods for uniformly depositing source materials on a substrate that improves the loss rate of the source material, such as organic materials. . In particular, the present disclosure provides an improved crucible for manufacturing a device in a deposition system by using an evaporation assembly. For example, in accordance with embodiments herein, a crucible comprising a source material can include one or more heat transport elements assembled to evenly redistribute heat supplied to the space within the crucible. Uniform heating of the space within the crucible improves uniform evaporation of the source material in the crucible and contributes to the overall uniformity of the layers deposited during the coating or device manufacturing process.

第1圖繪示根據此處實施例之坩鍋100之一實施例的示意圖,坩鍋100包括牆,牆具有內表面,內表面係圍繞內空間150,內空間150用以容納源材料。如第1圖中所示之坩鍋係繪示成兩個半部,此兩個半部係相對於對稱平面101鏡像對稱。根據此處所述實施例,坩鍋可為蒸發組件之部分,蒸發組件可更包括一或多個分佈組件。此一或多個分佈組件可例如是包括一或多個分佈管,具有出口(舉例為噴嘴),出口從坩鍋導引已蒸發之源材料至基板。根據如第1圖中所示之實施例,坩鍋100及分佈管可經由連接件103彼此連接,連接件103舉例是提供型式適配(form-fit)連接。在此處之實施例中,在坩鍋及分佈管之間的連接可額外或選擇性包括凸緣單元。根據此處之實施例,坩鍋及分佈管可提供成分離的單元,而可分離且連接或在凸緣單元組設,舉例為用於蒸發組件之操作。1 is a schematic diagram showing an embodiment of a crucible 100 according to an embodiment of the present invention. The crucible 100 includes a wall having an inner surface, the inner surface surrounding the inner space 150, and the inner space 150 for containing the source material. The crucible as shown in Fig. 1 is depicted as two halves which are mirror symmetrical with respect to the plane of symmetry 101. According to embodiments described herein, the crucible may be part of an evaporation assembly, which may further include one or more distribution components. The one or more distribution components may, for example, comprise one or more distribution tubes having an outlet (for example a nozzle) that directs the evaporated source material from the crucible to the substrate. According to the embodiment as shown in Fig. 1, the crucible 100 and the distribution tube can be connected to each other via a connector 103, for example, providing a form-fit connection. In the embodiments herein, the connection between the crucible and the distribution tube may additionally or alternatively include a flange unit. According to embodiments herein, the crucible and the distribution tube can be provided as separate units that can be separated and connected or assembled in a flange unit, for example for operation of the evaporation assembly.

根據此處之實施例,坩鍋100之牆可包括底部牆167及頂部牆168。底部牆167及頂部牆168可經由側壁161-166彼此連接。坩鍋100之內空間150可分別由底部牆167、頂部牆168及側壁161-166或側壁之對應部分包圍。根據此處之實施例,至少頂部牆168可包括開孔104,以讓已蒸發源材料從坩鍋離開且例如是進入分佈組件。特別是,坩鍋之開孔可連接於分佈管,分佈管係導引已蒸發源材料至基板。According to embodiments herein, the wall of the crucible 100 can include a bottom wall 167 and a top wall 168. Bottom wall 167 and top wall 168 may be connected to each other via side walls 161-166. The space 150 within the crucible 100 may be surrounded by a bottom wall 167, a top wall 168, and side walls 161-166, respectively, or a corresponding portion of the side walls. According to embodiments herein, at least the top wall 168 can include an opening 104 to allow the evaporated source material to exit the crucible and, for example, into the distribution assembly. In particular, the opening of the crucible can be connected to a distribution tube that directs the evaporated source material to the substrate.

根據如第1圖中所示之實施例,外部加熱單元125可提供於坩鍋100之牆或牆中。於此處所述之實施例中,加熱單元可舉例為一或多個加熱器。外部加熱單元可至少沿著坩鍋100之牆的一部分延伸。根據此處之一些應用,坩鍋100可更包括遮罩物127。遮罩物127可裝配以反射熱能回到坩鍋100之內部空間(enclosure),熱能係由外部加熱單元125提供。根據此處之實施例,遮罩物可支援在坩鍋100之內空間150中的有機材料有效率加熱。According to the embodiment as shown in Fig. 1, the external heating unit 125 can be provided in a wall or wall of the crucible 100. In the embodiments described herein, the heating unit can be exemplified by one or more heaters. The external heating unit can extend at least along a portion of the wall of the crucible 100. According to some applications herein, the crucible 100 may further include a cover 127. The cover 127 can be assembled to reflect thermal energy back to the interior of the crucible 100, which is provided by the external heating unit 125. According to embodiments herein, the mask can support efficient heating of the organic material in the space 150 within the crucible 100.

根據此處所述之一些實施例,圍繞坩鍋之至少一部分的此一或多個加熱單元係不延伸至坩鍋之內空間中。根據此處所述之實施例,提供以蒸發源材料之總加熱功率的最大值之3%至10%係在坩鍋之內空間中產生,最大值之3%至10%例如是5%,源材料係包含於坩鍋中。提供加熱單元於坩鍋之內空間中可能干擾提供在坩鍋之外側上、繞著坩鍋之至少一部分的加熱單元的溫度調整。According to some embodiments described herein, the one or more heating units surrounding at least a portion of the crucible do not extend into the space within the crucible. According to embodiments described herein, providing 3% to 10% of the maximum value of the total heating power of the evaporation source material is produced in the space within the crucible, and 3% to 10% of the maximum value is, for example, 5%. The source material is contained in the crucible. Providing the heating unit in the space within the crucible may interfere with the temperature adjustment of the heating unit provided on the outer side of the crucible, around at least a portion of the crucible.

根據此處所述一些實施例,分佈管可亦包括加熱單元,加熱單元有助於已蒸發材料之準確的溫度控制,已蒸發材料係從坩鍋導引至基板。一或多個熱遮罩物可亦提供在分佈管周圍。此一或多個熱遮罩物可減少來自蒸發組件之能量損耗,而在塗佈/製造製程期間可減少整體之能量損耗。作為另一方面來說,特別是用於沈積有機材料,源自蒸發組件之熱輻射可減少,特別是在沈積期間朝向基板之熱輻射。對於顯示器製造來說,基板與遮罩之溫度的準確控制係特別有利的。藉由應用一或多個熱遮罩物,源自蒸發組件之熱輻射可減少或避免。因此,此處所述之一些實施例係包括一或多個熱遮罩物。According to some embodiments described herein, the distribution tube may also include a heating unit that facilitates accurate temperature control of the vaporized material from which the evaporated material is directed to the substrate. One or more thermal masks may also be provided around the distribution tube. The one or more thermal shields can reduce energy loss from the evaporation assembly while reducing overall energy loss during the coating/manufacturing process. In another aspect, particularly for depositing organic materials, thermal radiation from the evaporation component can be reduced, particularly during deposition. Accurate control of the temperature of the substrate and the mask is particularly advantageous for display manufacture. Thermal radiation from the evaporation component can be reduced or avoided by applying one or more thermal masks. Accordingly, some embodiments described herein include one or more thermal shields.

根據此處之實施例,熱遮罩物可包括數個遮蔽層,以減少熱輻射至坩鍋及分佈組件之外側。作為一其他選擇來說,(此些)熱遮罩物可包括遮蔽層,遮蔽層藉由流體積極地降溫,流體例如是空氣、氮、水或其他適合的冷卻流體。根據可與此處所述其他實施例結合之再其他實施例,提供而用於蒸發組件之此一或多個熱遮罩物可包括片金屬,圍繞蒸發組件之對應部分,例如是分佈管及/或坩鍋100。舉例來說,片金屬可具有0.1 mm至3 mm之厚度,可選自至少一材料,此材料係選自包括鐵金屬(ferrous metals)(SS)及非鐵金屬(non-ferrous metals)(Cu、Ti、Al)之群組,及/或可舉例透過0.1 mm或更多的一縫隙彼此分隔。According to embodiments herein, the thermal shield may include a plurality of shielding layers to reduce heat radiation to the outer side of the crucible and distribution assembly. As a further alternative, the (such) thermal mask may comprise a masking layer that is actively cooled by a fluid such as air, nitrogen, water or other suitable cooling fluid. According to still other embodiments, which may be combined with other embodiments described herein, the one or more thermal shields provided for the evaporation assembly may comprise sheet metal surrounding a corresponding portion of the evaporation assembly, such as a distribution tube and / or shabu-shabu 100. For example, the sheet metal may have a thickness of 0.1 mm to 3 mm, and may be selected from at least one material selected from the group consisting of ferrous metals (SS) and non-ferrous metals (Cu). Groups of, Ti, Al), and/or may be separated from each other by a slit of 0.1 mm or more.

根據此處之實施例,如第1圖中所示之坩鍋100可包括一或多個熱傳輸元件170,排列於坩鍋100之內空間150中。熱傳輸元件170係裝配以提供坩鍋之內空間的間接加熱。於此處所述之實施例中,來自此一或多個熱傳輸元件170的熱係直接地提供於至在坩鍋100之內空間150中的源材料,源材料可為粉末、液體及/或小球(pellets)之形式。於此處所述之實施例中,熱傳輸元件係裝配以被動地接收熱且可不需直接連接至例如是加熱單元及/或電源供應器。According to embodiments herein, the crucible 100 as shown in FIG. 1 may include one or more heat transport elements 170 disposed in the interior space 150 of the crucible 100. The heat transport element 170 is assembled to provide indirect heating of the space within the crucible. In the embodiments described herein, the heat from the one or more heat transport elements 170 is provided directly to the source material in the space 150 within the crucible 100, which may be powder, liquid, and/or Or in the form of pellets. In the embodiments described herein, the heat transport element is assembled to passively receive heat and may not need to be directly connected to, for example, a heating unit and/or a power supply.

根據此處之實施例,熱傳輸元件170可例如是接收來自牆及/或來自坩鍋之外側的熱。在OLED沈積製程期間,藉由熱傳輸元件170,來自牆及/或來自坩鍋之外側的熱係在坩鍋之內空間中為分散式的,以確保更均勻的加熱與後續源材料之蒸發。根據此處所述之一些實施例,熱傳輸元件係排列在坩鍋之內空間中,使得相較於預定之溫度及/或相較於在坩鍋之內空間中的另一特定位置之溫度,在坩鍋之內空間中的任何特定位置所量測的溫度係相差最大溫度差異10 °C或更少,舉例來說為5 °C或更少,例如是0.5 °C至3 °C。再者,最大溫度差異可額外或選擇性為4%或更少,舉例來說為2%或更少,例如是0.2%至1.1%。According to embodiments herein, the heat transport element 170 can, for example, receive heat from the wall and/or from the outside of the crucible. During the OLED deposition process, the heat from the wall and/or from the outside of the crucible is dispersed in the space inside the crucible by the heat transport element 170 to ensure more uniform heating and evaporation of subsequent source materials. . According to some embodiments described herein, the heat transport element is arranged in the space within the crucible such that the temperature is compared to a predetermined temperature and/or to another particular location in the space within the crucible The temperature measured at any particular location in the space within the crucible differs by a maximum temperature difference of 10 ° C or less, for example 5 ° C or less, for example 0.5 ° C to 3 ° C. Further, the maximum temperature difference may be additionally or selectively 4% or less, for example, 2% or less, for example, 0.2% to 1.1%.

於如第1圖中所示之實施例中,熱傳輸元件170從牆突出至坩鍋100之內空間150中。特別是,如第1圖中所示之實施例包括第一熱傳輸元件171及第二熱傳輸元件172。第一熱傳輸元件171及第二熱傳輸元件172係類似杯狀,用以容納液體在各自之第一及第二熱傳輸元件中。根據此處之實施例,此液體可為源材料。根據此處之實施例,第一熱傳輸元件171及第二熱傳輸元件172係連接於坩鍋100之任何一或多個側壁161-166之至少一部分。In the embodiment as shown in FIG. 1, heat transfer element 170 projects from the wall into space 150 within crucible 100. In particular, the embodiment as shown in FIG. 1 includes a first heat transport element 171 and a second heat transport element 172. The first heat transport element 171 and the second heat transport element 172 are cup-like for containing liquid in the respective first and second heat transport elements. According to embodiments herein, the liquid can be a source material. According to embodiments herein, the first heat transport element 171 and the second heat transport element 172 are coupled to at least a portion of any one or more of the side walls 161-166 of the crucible 100.

第一熱傳輸元件171及第二熱傳輸元件172可提供於坩鍋100之內空間150中,使得第一熱傳輸元件171係排列於第二熱傳輸元件172之上方。在此特別之實施例中,名稱「上方(above)」係欲說明第一熱傳輸元件171係排列而較第二熱傳輸元件172靠近坩鍋之開孔104。The first heat transport element 171 and the second heat transport element 172 may be provided in the inner space 150 of the crucible 100 such that the first heat transport element 171 is arranged above the second heat transport element 172. In this particular embodiment, the designation "above" is intended to indicate that the first heat transport element 171 is arranged closer to the opening 104 of the crucible than the second heat transport element 172.

第一熱傳輸元件171及第二熱傳輸元件172可具有相同之形狀或第一及第二熱傳輸元件可在幾何形狀及/或尺寸的相關特性上不同。特別是,根據此處之實施例,熱傳輸元件170具有類板材部分171a、172a及類管部分171b、172b。類板材部分171a、172a可至少沿著坩鍋100之內表面的一部分連接於側壁161-166。類管部分171b、172b可排列於類板材部分171a、172a的中心。類管部分171b、172b可朝向坩鍋100之開孔104延伸,而提供在坩鍋和分佈組件之間流體交換的連接件,特別是在坩鍋100及分佈管之間。於此處之實施例中,第一熱傳輸元件171及第二熱傳輸元件172之類管部分171b、172b之開孔的中心與開孔104之中心可排列以沿著坩鍋100之中心軸105對準。The first heat transport element 171 and the second heat transport element 172 may have the same shape or the first and second heat transport elements may differ in geometric and/or dimensionally related characteristics. In particular, according to embodiments herein, the heat transport element 170 has sheet-like portions 171a, 172a and tube-like portions 171b, 172b. The sheet-like portion 171a, 172a can be joined to the sidewalls 161-166 at least along a portion of the inner surface of the crucible 100. The tube-like portions 171b, 172b may be arranged at the center of the sheet-like portions 171a, 172a. The tube-like portions 171b, 172b can extend toward the opening 104 of the crucible 100 to provide a fluid exchange between the crucible and the distribution assembly, particularly between the crucible 100 and the distribution tube. In the embodiment herein, the centers of the openings of the tube portions 171b, 172b of the first heat transfer element 171 and the second heat transfer element 172 and the center of the opening 104 may be arranged along the central axis of the crucible 100. 105 alignment.

根據此處之實施例,源材料,特別是液態源材料可提供在牆之內表面、類板材部分171a、172a及類管部分171b、172b之間的空間中。According to embodiments herein, source material, particularly liquid source material, may be provided in the space between the inner surface of the wall, the sheet-like portions 171a, 172a, and the tube-like portions 171b, 172b.

在第1圖中所示之實施例中,第一熱傳輸元件171及第二熱傳輸元件172係分隔坩鍋100之內空間150成內空間150之三個不同之子空間,三個不同之子空間係經由各自之第一熱傳輸元件171及第二熱傳輸元件172的類管部分171b、172b互連。根據此處之一些實施例,坩鍋100可只包括單一個熱傳輸元件,配置在坩鍋之內空間中,分隔內空間成兩個不同之子空間,兩個不同之子空間係藉由熱傳輸元件之類管部分互連。類似地,根據此處其他實施例,坩鍋可包括三個、四個或多個熱傳輸元件,分離坩鍋之內空間成四個、五個或多個不同之子空間。In the embodiment shown in FIG. 1, the first heat transporting element 171 and the second heat transporting element 172 are three different subspaces separating the inner space 150 of the crucible 100 into the inner space 150, three different subspaces. They are interconnected via respective tube-like portions 171b, 172b of the first heat transport element 171 and the second heat transport element 172. According to some embodiments herein, the crucible 100 may include only a single heat transport element disposed in the space within the crucible, dividing the inner space into two different subspaces, and the two different subspaces are by heat transport elements. Some of these tubes are interconnected. Similarly, according to other embodiments herein, the crucible may include three, four or more heat transport elements separating the space within the crucible into four, five or more different subspaces.

根據此處所述之一些實施例,坩鍋100之牆的內表面可具有第一尺寸之第一面積且此一或多個熱傳輸元件170可在第二尺寸之內空間150中提供第二面積。根據此處之實施例,第二面積可具有相同於第一面積之尺寸。根據此處所述之再其他實施例,第一及第二面積之結合尺寸係為第一尺寸的至少兩倍。According to some embodiments described herein, the inner surface of the wall of the crucible 100 can have a first area of a first size and the one or more heat transport elements 170 can provide a second in the inner space 150 of the second size area. According to embodiments herein, the second area may have the same size as the first area. According to still other embodiments described herein, the combined dimensions of the first and second areas are at least twice the first size.

根據此處之一些實施例,此一或多個熱傳輸元件可以具有高熱傳導性之金屬或合金之材料製成。舉例來說,熱傳輸元件可包括任何一或多個元件,從下所列舉者選出:鈦、不鏽鋼及類鑽塗層(diamond-like carbon,DLC)。於此處之實施例中,此一或多個熱傳輸元件之材料可對源材料為惰性,使得熱傳輸元件在蒸發製程期間不與源材料反應。根據使用之源材料的蒸發溫度,此一或多個熱傳輸元件之材料應該穩定且至少對高達源材料之蒸發溫度係為惰性,源材料之蒸發溫度可例如是150°C及650°C或更多之間。According to some embodiments herein, the one or more heat transport elements may be made of a material having a high thermal conductivity metal or alloy. For example, the heat transport element can include any one or more of the elements selected from the following: titanium, stainless steel, and diamond-like carbon (DLC). In embodiments herein, the material of the one or more heat transport elements may be inert to the source material such that the heat transport element does not react with the source material during the evaporation process. Depending on the evaporation temperature of the source material used, the material of the one or more heat transport elements should be stable and at least inert to the evaporation temperature of the source material, and the evaporation temperature of the source material can be, for example, 150 ° C and 650 ° C or More between.

第2圖繪示根據此處所述實施例之其他坩鍋之示意圖。如第2圖中所示之坩鍋係繪示成兩個半部,此兩個半部係相對於對稱平面201為鏡像對稱。坩鍋200可包括從牆突出至坩鍋200之內空間250中的一或多個熱傳輸元件270。特別是,此一或多個熱傳輸元件可從側壁突出至坩鍋之內空間中。類似於如第1圖中所示之坩鍋的幾何形狀,如第2圖中所示之坩鍋200可包括經由側壁261-266彼此連接之底部牆267和頂部牆268。坩鍋200可包括開孔204,以讓已蒸發源材料從坩鍋離開且進入分佈組件。Figure 2 is a schematic illustration of other crucibles in accordance with embodiments described herein. The crucible is shown in Fig. 2 as two halves which are mirror symmetrical with respect to the plane of symmetry 201. The crucible 200 can include one or more heat transport elements 270 that protrude from the wall into the space 250 within the crucible 200. In particular, the one or more heat transport elements can protrude from the side wall into the space within the crucible. Similar to the geometry of the crucible as shown in FIG. 1, the crucible 200 as shown in FIG. 2 may include a bottom wall 267 and a top wall 268 that are connected to each other via the side walls 261-266. The crucible 200 can include an opening 204 to allow the evaporated source material to exit the crucible and into the distribution assembly.

類似於第1圖中所示之實施例,分佈組件可例如是包括一或多個分佈管(未繪示於第2圖中),此一或多個分佈管具有出口(舉例為噴嘴),從坩鍋導引已蒸發源材料至基板。坩鍋200及分佈管可經由型式適配(form-fit)連接件203彼此連接。根據此處之實施例,在坩鍋和分佈管之間的連接可額外或選擇性包括凸緣單元。類似於第1圖中所示之實施例,坩鍋200及分佈管係提供成分離的單元,而可分離及連接或於凸緣單元組設,舉例為用以蒸發源之操作。Similar to the embodiment shown in Figure 1, the distribution assembly can, for example, comprise one or more distribution tubes (not shown in Figure 2) having an outlet (e.g., a nozzle), The evaporated source material is directed from the crucible to the substrate. The crucible 200 and the distribution tube can be connected to each other via a form-fit connector 203. According to embodiments herein, the connection between the crucible and the distribution tube may additionally or alternatively comprise a flange unit. Similar to the embodiment shown in Figure 1, the crucible 200 and the distribution tube are provided as separate units that can be separated and connected or assembled to the flange unit, for example for operation of the evaporation source.

根據此處實施例之坩鍋200可包括一或多個熱傳輸元件270,排列在坩鍋之內空間250中。在如第2圖中所示之實施例中,此一或多個熱傳輸元件270係提供成六個板271-276。一般來說,此六個板係排列在坩鍋之內空間250中,以導引已蒸發源材料朝向分佈組件。六個板271-276之各者係從牆朝向坩鍋200之內空間250的中心突出。根據此處之實施例且如第4圖更詳細的繪示,六個板271-276之各者可排列以垂直於坩鍋200的各自側壁261-266,第4圖係繪示不同於第2圖中所示之坩鍋的示意圖。於此處之實施例中,坩鍋200可具有六角形之幾何形狀。然而,根據此處之其他實施例,坩鍋係不限於六角形之幾何形狀,但可包括其他的幾何形狀,例如是矩形、圓形、橢圓形或三角形。The crucible 200 according to embodiments herein may include one or more heat transport elements 270 arranged in the space 250 within the crucible. In the embodiment as shown in Figure 2, the one or more heat transport elements 270 are provided in six plates 271-276. Typically, the six panels are arranged in a space 250 within the crucible to direct the evaporated source material toward the distribution assembly. Each of the six plates 271-276 protrudes from the wall toward the center of the space 250 within the crucible 200. According to embodiments herein and as shown in more detail in FIG. 4, each of the six plates 271-276 can be arranged to be perpendicular to the respective side walls 261-266 of the crucible 200, and FIG. 4 is different from the first 2 Schematic diagram of the crucible shown in the figure. In the embodiments herein, the crucible 200 can have a hexagonal geometry. However, according to other embodiments herein, the crucible is not limited to a hexagonal geometry, but may include other geometric shapes such as rectangular, circular, elliptical or triangular.

六個板271-276之任一者或全部可延伸進入或穿過坩鍋200之牆。根據如第2圖中所示之實施例,六個板271-276之任意一或多者可延伸穿過坩鍋200之各對應側壁261-266。然而,在此處所述之實施例中,六個板271-276之任意一或多者可完全地穿過底部牆267、側壁261-266及頂部牆268之至少一者。Either or all of the six plates 271-276 can extend into or through the wall of the crucible 200. According to the embodiment as shown in FIG. 2, any one or more of the six plates 271-276 can extend through respective corresponding side walls 261-266 of the crucible 200. However, in the embodiments described herein, any one or more of the six plates 271-276 may pass completely through at least one of the bottom wall 267, the side walls 261-266, and the top wall 268.

根據此處所述之實施例,坩鍋200之牆可包括數個狹縫,以容納六個板271-276。狹縫可完全地延伸穿過坩鍋200的牆。在此處之實施例中,狹縫可簡化組設程序且確保熱從坩鍋之外側有效地傳導至內空間。舉例來說,在坩鍋之組設期間,此些板可插入狹縫中且亦從外側焊接至坩鍋。In accordance with embodiments described herein, the wall of crucible 200 can include a plurality of slits to accommodate six plates 271-276. The slit can extend completely through the wall of the crucible 200. In the embodiments herein, the slits simplify the assembly procedure and ensure that heat is effectively conducted from the outside of the crucible to the inner space. For example, during the assembly of the crucible, the panels can be inserted into the slit and also welded from the outside to the crucible.

根據此處之實施例,此六個板271-276之任一或多者可在一縱向方向中延伸坩鍋200之內空間250的總長度269之從約0%至約100%,此縱向方向平行於坩鍋200之中心軸205。舉例來說,此六個板271-276之任一或多者可延伸坩鍋之內空間的總長度的至少約90%。According to embodiments herein, any one or more of the six plates 271-276 may extend from about 0% to about 100% of the total length 269 of the space 250 within the crucible 200 in a longitudinal direction, this longitudinal The direction is parallel to the central axis 205 of the crucible 200. For example, any one or more of the six plates 271-276 can extend at least about 90% of the total length of the space within the crucible.

在此處所述之實施例中,此些板可排列在坩鍋中,使得在兩個相鄰平面之間相交點之最小絕對角度係約5°及約175°之間,例如是約30°、約45°或約60°,此兩個相鄰平面之各平面係平行於板271-276之一者延伸。In the embodiments described herein, the plates may be arranged in a crucible such that the minimum absolute angle of intersection between two adjacent planes is between about 5° and about 175°, for example about 30. °, about 45° or about 60°, the planes of the two adjacent planes extend parallel to one of the plates 271-276.

第3圖繪示根據此處其他實施例之坩鍋的示意圖。坩鍋300包括有關於第2圖中所示之實施例說明的所有特徵。然而,相較於第2圖中所示之實施例,如第3圖中所示之實施例的此一或多個熱傳輸元件370包括數個板371-388,於此特別之例子中係排列在坩鍋300之內空間350中的十八個板。類似於第2圖中所示之實施例,板371-388之各者係延伸穿過坩鍋300之牆。根據此處之實施例,增加板之數量可增加在坩鍋之內空間中的此一或多個熱傳輸元件的表面積。根據此處之實施例,具有數個熱傳輸元件可選擇性提供坩鍋成為模組化(modular),意義在於根據考慮坩鍋之內空間中的熱分佈及空間的特別有利之應用,熱傳輸元件可加入及/或從坩鍋之內空間取出。Figure 3 is a schematic view of a crucible according to other embodiments herein. The crucible 300 includes all of the features described with respect to the embodiment shown in FIG. 2. However, compared to the embodiment shown in FIG. 2, the one or more heat transport elements 370 of the embodiment as shown in FIG. 3 includes a plurality of plates 371-388, in this particular example Eighteen plates arranged in the space 350 within the crucible 300. Similar to the embodiment shown in Figure 2, each of the plates 371-388 extends through the wall of the crucible 300. According to embodiments herein, increasing the number of plates may increase the surface area of the one or more heat transport elements in the space within the crucible. According to embodiments herein, having a plurality of heat transport elements selectively provides a crucible to be modular, meaning that heat transfer is based on a particularly advantageous application that considers heat distribution and space in the space within the crucible. The components can be added to and/or removed from the space inside the crucible.

第4圖繪示沿著如第2圖中所示之接線A-A之坩鍋200之剖面透視圖。第4圖繪示六個熱傳輸元件,例如是板271-276,各相對於對應之側壁261-266在約90°之角度突出。此一或多個熱傳輸元件之各者可完全地延伸穿過坩鍋之牆。如第4圖中所示,此六個板271-276之各者係延伸至坩鍋之外邊緣290。在第4圖中所示之實施例中,六個板之至少四個板272-273、275-276可在突出相同距離至坩鍋之內空間中。根據此處所述之一些實施例,全部六個或多個板可突出相同距離或各突出不同距離至坩鍋之內空間中。在此處所述之實施例中,此一或多個熱傳輸元件之特定配置可適用於特定用途且特別是在坩鍋之內空間中的熱係有利地分佈。Fig. 4 is a cross-sectional perspective view of the crucible 200 along the wiring A-A as shown in Fig. 2. Figure 4 illustrates six heat transport elements, such as plates 271-276, each protruding at an angle of about 90 relative to the corresponding side walls 261-266. Each of the one or more heat transport elements can extend completely through the wall of the crucible. As shown in Figure 4, each of the six plates 271-276 extends to the outer edge 290 of the crucible. In the embodiment shown in Figure 4, at least four of the six plates 272-273, 275-276 may protrude the same distance into the space within the crucible. According to some embodiments described herein, all six or more panels may protrude the same distance or each protrude a different distance into the space within the crucible. In the embodiments described herein, the particular configuration of the one or more heat transport elements can be adapted for a particular use and in particular the heat system in the space within the crucible is advantageously distributed.

根據此處所述之實施例,一或多個加熱器可圍繞牆之至少一部分排列。反射來自此一或多個加熱器之熱而朝向坩鍋之內空間的遮罩物可圍繞此一或多個加熱器排列。In accordance with embodiments described herein, one or more heaters may be arranged around at least a portion of the wall. A mask reflecting the heat from the one or more heaters toward the interior of the crucible may be arranged around the one or more heaters.

第5圖繪示根據此處所述其他實施例之坩鍋的示意圖。坩鍋500具有圓形幾何形狀,由坩鍋500之牆560所定義。坩鍋500可包括可以排列在坩鍋500之內空間中的數個熱傳輸元件,舉例為板571-578。根據如第5圖中所示之實施例可為八個板之形式的熱傳輸元件係排列在坩鍋500之內空間550中,使得在兩個相鄰平面之間相交點的最小絕對角度係約45°,兩個相鄰平面之各平面係平行於板571-578之一者延伸。此些熱傳輸元件之對稱配置可確保在坩鍋之內空間中的熱分佈均勻。根據如第5圖中所示之實施例,八個板571-578係完全地延伸穿過坩鍋500之牆560。根據此處之其他實施例,一或多個板可連接於坩鍋500之牆560的內表面。根據此處之一些實施例,坩鍋之內表面可包括凹部,此一或多個熱傳輸元件係連接於凹部。凹部可不完全地延伸穿過坩鍋之牆。舉例來說,在坩鍋組設的期間,此一或多個熱傳輸元件可從坩鍋之頂部及/或底部配置在凹部中。Figure 5 is a schematic illustration of a crucible according to other embodiments described herein. The crucible 500 has a circular geometry defined by the wall 560 of the crucible 500. The crucible 500 can include a plurality of heat transport elements that can be arranged in the space within the crucible 500, such as plates 571-578. According to the embodiment as shown in Fig. 5, the heat transport elements in the form of eight plates are arranged in the inner space 550 of the crucible 500 such that the minimum absolute angle of intersection between two adjacent planes is At about 45°, the planes of the two adjacent planes extend parallel to one of the plates 571-578. The symmetrical configuration of these heat transport elements ensures uniform heat distribution in the space within the crucible. According to the embodiment as shown in Fig. 5, the eight plates 571-578 extend completely through the wall 560 of the crucible 500. According to other embodiments herein, one or more panels may be attached to the inner surface of the wall 560 of the crucible 500. According to some embodiments herein, the inner surface of the crucible may include a recess, the one or more heat transport elements being coupled to the recess. The recess may not extend completely through the wall of the crucible. For example, during the crucible assembly, the one or more heat transport elements can be disposed in the recess from the top and/or bottom of the crucible.

根據此處所述之一些實施例,此一或多個熱傳輸元件可配置在坩鍋之內空間中,使得在直徑580量測為至少10 mm的內空間之中心內的空間不包括此一或多個熱傳輸元件之任何部分。根據此處之實施例,不包括熱傳輸元件之任何部分的坩鍋之中心內的空間可例如是球體的形狀,此球體具有從10 mm至35 mm之直徑。According to some embodiments described herein, the one or more heat transport elements may be disposed in the space within the crucible such that the space within the center of the inner space measured at diameter 580 of at least 10 mm does not include this Or any part of multiple heat transfer elements. According to embodiments herein, the space within the center of the crucible that does not include any portion of the heat transport element can be, for example, the shape of a sphere having a diameter from 10 mm to 35 mm.

第6圖繪示根據此處所述其他實施例之坩鍋的示意圖。坩鍋600可包括一或多個熱傳輸元件670,此一或多個熱傳輸元件670從牆突出至坩鍋600之內空間650中。根據如第6圖中所示之實施例,此一或多個熱傳輸元件670係提供成一或多個棒(rods)671-675。棒671-675之各者可排列成相對於坩鍋600之側壁661-666之至少一者垂直。坩鍋600具有六角形之幾何形狀。然而,類似於任何前述之實施例,坩鍋係不限於六角形之幾何形狀,但可包括其他幾何形狀,例如是正方形、矩形、三角形、圓形或橢圓形。Figure 6 is a schematic illustration of a crucible in accordance with other embodiments described herein. The crucible 600 can include one or more heat transport elements 670 that protrude from the wall into the space 650 within the crucible 600. According to the embodiment as shown in Figure 6, the one or more heat transport elements 670 are provided as one or more rods 671-675. Each of the bars 671-675 can be arranged to be perpendicular to at least one of the side walls 661-666 of the crucible 600. The crucible 600 has a hexagonal geometry. However, similar to any of the foregoing embodiments, the crucible is not limited to a hexagonal geometry, but may include other geometric shapes such as square, rectangular, triangular, circular, or elliptical.

根據如第6圖中所示之實施例,此一或多個棒671-675之各者可完全地延伸穿過坩鍋600之內空間650。各棒可例如是互連坩鍋600之兩個相對之側壁661-664、662-665、及663-666。於此處之實施例中,棒係繪示成直形棒,延伸穿過坩鍋之至少兩個側壁。根據此處之一些實施例,可提供為棒、板之形狀或任何其他形狀之此一或多個熱傳輸元件可不為直形,但可為曲狀,以進一步增加在坩鍋之內空間中的此一或多個熱傳輸元件的表面積。According to the embodiment as shown in FIG. 6, each of the one or more rods 671-675 can extend completely through the interior space 650 of the crucible 600. Each rod can be, for example, two opposing side walls 661-664, 662-665, and 663-666 of interconnected crucible 600. In the embodiment herein, the rods are depicted as straight rods that extend through at least two side walls of the crucible. According to some embodiments herein, the one or more heat transport elements that may be provided in the shape of a rod, a plate, or any other shape may not be straight, but may be curved to further increase the space within the crucible. The surface area of the one or more heat transport elements.

坩鍋600之側壁661-666之各者可包括數個孔洞669,以容納五個棒671-675。孔洞669係完全地延伸貫穿坩鍋600之牆。此些孔洞可簡化組設程序且確保熱係有效地從外側傳輸到坩鍋之內空間。舉例來說,在組設坩鍋期間,棒可從坩鍋之外側插入孔洞669且亦從坩鍋之外側焊接。Each of the side walls 661-666 of the crucible 600 can include a plurality of holes 669 to accommodate the five bars 671-675. The hole 669 extends completely through the wall of the crucible 600. These holes simplify the assembly process and ensure that the heat system is effectively transferred from the outside to the space inside the crucible. For example, during the setting of the crucible, the rod can be inserted into the hole 669 from the outside of the crucible and also welded from the outside of the crucible.

根據此處之實施例,坩鍋可包括多於五個棒,在坩鍋之內空間中為分散式的。特別是,根據此處之實施例,棒可沿著坩鍋之牆的內表面一個於另一個之上方的逆時針方向排列。在坩鍋之內空間中的棒的特定排列可變化,以用於相同或不同坩鍋來達到熱在坩鍋之內空間中的有利分佈。According to embodiments herein, the crucible may include more than five rods that are discrete in the space within the crucible. In particular, according to embodiments herein, the rods may be arranged counterclockwise along the inner surface of the wall of the crucible one above the other. The particular arrangement of the bars in the space within the crucible can be varied for the same or different crucibles to achieve an advantageous distribution of heat in the space within the crucible.

第7圖繪示根據此處實施例之蒸發組件之示意圖。蒸發組件可包括一或多個分佈組件及一或多個蒸發坩鍋,此一或多個分佈組件例如是一或多個分佈管。一般來說,根據此處所述之實施例,分佈管可包括內空間,以容納且導引來自坩鍋之已蒸發源材料。特別是,如第7圖中所示之蒸發組件700包括至少一分佈管706及至少一坩鍋100,坩鍋100例如是如第1圖中所示。然而,根據此處之其他實施例,蒸發組件可包括任何一或多個坩鍋,此任何一或多個坩鍋包括此處所述之任何一或多個熱傳輸元件。Figure 7 is a schematic illustration of an evaporation assembly in accordance with an embodiment herein. The evaporation assembly can include one or more distribution components and one or more evaporation crucibles, such as one or more distribution tubes. Generally, in accordance with embodiments described herein, the distribution tube can include an interior space to receive and direct the vaporized source material from the crucible. In particular, the evaporation assembly 700 as shown in Fig. 7 includes at least one distribution tube 706 and at least one crucible 100, such as shown in Fig. 1. However, in accordance with other embodiments herein, the evaporation assembly can include any one or more crucibles, including any one or more of the heat transfer elements described herein.

分佈管706可為具有加熱單元715之延長立方體。如有關於第1圖中所示之坩鍋的說明,坩鍋100可為將藉由熱來蒸發之有機材料的儲存器(reservoir),此熱係經由此一或多個熱傳輸元件170從外部加熱單元125提供。根據此處所述之實施例,分佈管之加熱單元可加熱分佈管且避免有機材料之蒸汽凝結於分佈管706之牆的內部分,有機材料之蒸汽係由坩鍋100所提供。The distribution tube 706 can be an elongated cube with a heating unit 715. As with the description of the crucible shown in Figure 1, the crucible 100 can be a reservoir of organic material to be evaporated by heat, via which the heat is passed from the one or more heat transport elements 170. The external heating unit 125 is provided. According to embodiments described herein, the heating unit of the distribution tube can heat the distribution tube and prevent vapors of organic material from condensing into the inner portion of the wall of the distribution tube 706, which is provided by the crucible 100.

根據此處所述之實施例,分佈管可為中空圓柱。名稱圓柱可理解為一般接受之具有圓形底部形狀及圓形頂部形狀,以及連接頂部圓形和底部圓形之曲面區域或殼。根據此處所述之實施例,一或多個熱遮罩物及/或冷卻遮罩物配置可提供而用於減少熱傳輸到將塗佈基板及/或在塗佈製程期間使用之遮罩。舉例來說,藉由具有貫穿熱遮罩物及冷卻遮罩物配置,從蒸發源傳輸到基板及/或遮罩之熱可減少,熱遮罩物及冷卻遮罩物配置係圍繞分佈組件。根據可與此處所述其他實施例結合之額外或選擇性實施例,名稱圓柱可在數學意義(mathematical sense)上更理解為具有任意底部形狀、相同之頂部形狀、以及連接頂部形狀和底部形狀之曲面區域或殼。圓柱不一定必須具有圓形剖面。取而代之,底部表面和頂部表面可具有不同於圓形之形狀。According to embodiments described herein, the distribution tube can be a hollow cylinder. The name cylinder is understood to generally accept a circular bottom shape and a circular top shape, as well as a curved surface region or shell connecting the top circular and bottom circular shapes. In accordance with embodiments described herein, one or more thermal masks and/or cooling mask configurations may be provided for reducing heat transfer to the mask used to coat the substrate and/or during the coating process . For example, by having a through-thermal mask and a cooling mask configuration, heat transfer from the evaporation source to the substrate and/or the mask can be reduced, and the thermal mask and cooling mask configuration surrounds the distribution assembly. According to additional or alternative embodiments that may be combined with other embodiments described herein, the name cylinder may be more understood in the mathematical sense as having any bottom shape, the same top shape, and joining the top and bottom shapes. The curved area or shell. The cylinder does not necessarily have to have a circular cross section. Instead, the bottom and top surfaces may have a different shape than a circle.

根據可與此處所述其他實施例結合之此處之實施例,分佈管706係提供線性蒸發組件。分佈管706包括數個開孔712,此些開孔712沿著分佈管706之長度方向排列。根據選擇之實施例,可提供沿著分佈管之長度方向延伸之一個延長開孔。舉例來說,延長開孔可為狹縫。根據可與此處所述其他實施例結合之一些實施例,分佈管係本質上垂直地延伸。舉例來說,分佈管706之長度可至少對應於利用蒸發組件將沈積之基板的高度。於許多情況中,分佈管706之長度將較將沈積基板之高度長至少10%或甚至20%,而有助於在基板之頂端及/或基板之底端均勻沈積。According to embodiments herein, which may be combined with other embodiments described herein, the distribution tube 706 provides a linear evaporation assembly. The distribution tube 706 includes a plurality of openings 712 that are aligned along the length of the distribution tube 706. According to selected embodiments, an elongated opening extending along the length of the distribution tube can be provided. For example, the elongated opening can be a slit. According to some embodiments, which can be combined with other embodiments described herein, the distribution tube extends substantially perpendicularly. For example, the length of the distribution tube 706 can correspond at least to the height of the substrate to be deposited using the evaporation assembly. In many cases, the length of the distribution tube 706 will be at least 10% or even 20% longer than the height of the deposition substrate to facilitate uniform deposition at the top end of the substrate and/or at the bottom end of the substrate.

根據可與此處所述其他實施例結合之一些實施例,分佈管之長度可為1.3 m或以上,例如是2.5 m或以上。根據一裝配,如第7圖中所示,坩鍋100係提供於分佈管706之底端。有機材料係在坩鍋100中蒸發。有機材料之蒸汽係在分佈管之底部進入分佈管706且本質上向上導引並接著本質偏側邊地(sideways)通過在分佈管706中之此些開孔712,而例如是朝向本質上垂直之基板。According to some embodiments, which may be combined with other embodiments described herein, the distribution tube may have a length of 1.3 m or more, such as 2.5 m or more. According to an assembly, as shown in FIG. 7, the crucible 100 is provided at the bottom end of the distribution tube 706. The organic material is evaporated in the crucible 100. The vapor of the organic material enters the distribution tube 706 at the bottom of the distribution tube and is directed upwardly and then substantially laterally through the apertures 712 in the distribution tube 706, for example, oriented substantially perpendicularly The substrate.

根據可與此處所述其他實施例結合之一些實施例,出口(舉例為噴嘴)係排列以具有略微地向上定向之主要蒸發方向,略微地向上定向之主要蒸發方向舉例為從水平向上15°之範圍中,例如是向上3°至7°。基板可稍微傾斜,以實質上(舉例為± 10°)垂直於蒸發方向,而可減少產生不需要的粒子。為了說明之目的之故,在第7圖中之坩鍋100及分佈管706係繪示而不具有熱遮罩物。加熱單元715和外部加熱單元125可見於第7圖中所示之示意圖中。然而,根據此處之實施例,坩鍋及分佈管兩者可包括一或多個熱遮蔽層,以反射熱能至坩鍋之內空間及/或分佈管,此熱能係由一或多個加熱單元提供。According to some embodiments, which may be combined with other embodiments described herein, the outlets (for example nozzles) are arranged to have a predominantly upwardly directed main evaporation direction, with the main evaporation direction being slightly upwardly oriented as 15° from the horizontal. In the range, for example, it is 3° to 7° upward. The substrate can be slightly tilted to be substantially perpendicular to the evaporation direction (for example, ± 10°), and the generation of unwanted particles can be reduced. For purposes of illustration, the crucible 100 and the distribution tube 706 in Figure 7 are shown without a thermal mask. Heating unit 715 and external heating unit 125 can be found in the schematic shown in FIG. However, according to embodiments herein, both the crucible and the distribution tube may include one or more heat shielding layers to reflect thermal energy to the space within the crucible and/or the distribution tube, the thermal energy being heated by one or more Unit provided.

在此處所述之實施例中,熱遮罩物可減少來自蒸發組件之能量損耗且減少整個能量消耗。然而,就其他方面而言,特別是對於沈積有機材料而言,源自於蒸發組件之熱輻射可減少,特別是朝向例如是在沈積/塗佈製程期間使用之遮罩的熱輻射。特別是對於沈積有機材料於已遮蔽之基板上,且甚至更對於製造顯示器來說,基板及遮罩之溫度需要精準地控制。因此,源自於蒸發組件之熱輻射可減少或避免。In the embodiments described herein, the thermal mask can reduce energy losses from the evaporation assembly and reduce overall energy consumption. However, in other respects, particularly for depositing organic materials, the thermal radiation originating from the evaporation component can be reduced, particularly toward the thermal radiation of, for example, a mask used during the deposition/coating process. Especially for depositing organic materials on the shielded substrate, and even more for the manufacture of displays, the temperature of the substrate and the mask needs to be precisely controlled. Therefore, heat radiation originating from the evaporation component can be reduced or avoided.

第8圖及第9圖繪示根據此處之實施例的不同蒸發組件的上視圖。舉例來說,第8圖繪示蒸發組件800之一部分,包括至少三個坩鍋100。此些坩鍋具有六角形之幾何形狀。如第9圖中所示之蒸發組件900之部分舉例為具有至少兩個三角形之坩鍋901。根據此處之一些實施例,蒸發組件可包括根據此處所述任何實施例之數個坩鍋。舉例來說,蒸發組件可包括兩個、三個、四個或更多個坩鍋,此些坩鍋可連接於至少一或多個分佈組件。8 and 9 illustrate top views of different evaporation assemblies in accordance with embodiments herein. For example, Figure 8 illustrates a portion of the evaporation assembly 800, including at least three crucibles 100. These crucibles have a hexagonal geometry. A portion of the evaporation assembly 900 as shown in Fig. 9 is exemplified by a crucible 901 having at least two triangles. According to some embodiments herein, the evaporation assembly can include a plurality of crucibles according to any of the embodiments described herein. For example, the evaporation assembly can include two, three, four or more crucibles that can be coupled to at least one or more distribution components.

第10圖繪示根據此處實施例之用於沈積源材料於基板上之沈積系統的示意圖。沈積系統1000可例如是包括蒸發組件700,類似有關於第7圖所說明之蒸發組件。蒸發組件700包括例如是有關於第1圖所說明之坩鍋100及例如是有關於第7圖所說明之分佈管706。如第10圖中所示之分佈管706係由支座1020所支撐。再者,根據一些實施例,坩鍋100可亦由支座1020支撐。根據如第10圖中所示之實施例,兩個基板1010係提供於真空腔室1050中。一般來說,用於遮蔽在基板上之層沈積的遮罩1030可提供在基板1010和蒸發組件700之間。有機材料係從坩鍋100蒸發且經由分佈管706導引至基板1010。Figure 10 is a schematic illustration of a deposition system for depositing source material on a substrate in accordance with embodiments herein. The deposition system 1000 can, for example, include an evaporation assembly 700, similar to the evaporation assembly illustrated with respect to FIG. Evaporation assembly 700 includes, for example, crucible 100 as described with respect to Figure 1 and distribution tube 706, such as illustrated with respect to Figure 7. The distribution tube 706 as shown in Fig. 10 is supported by the support 1020. Again, according to some embodiments, the crucible 100 can also be supported by the support 1020. According to the embodiment as shown in FIG. 10, two substrates 1010 are provided in the vacuum chamber 1050. In general, a mask 1030 for masking layer deposition on a substrate can be provided between the substrate 1010 and the evaporation assembly 700. The organic material is evaporated from the crucible 100 and directed to the substrate 1010 via the distribution tube 706.

根據此處所述之實施例,蒸發組件可包括一或多個坩鍋及一或多個分佈管,其中此一或多個分佈管的對應者可流體流通於此一或多個坩鍋之對應者。用於OLED裝置製造的多種應用包括數個處理階段,其中二或多個有機材料係同時蒸發。因此,兩個分佈管及對應之蒸發坩鍋可相鄰於彼此提供。在此種實施例中,多於一種有機材料可例如是同時蒸發。According to embodiments described herein, the evaporation assembly can include one or more crucibles and one or more distribution tubes, wherein the counterpart of the one or more distribution tubes can be fluidly circulated to the one or more crucibles Corresponding. A variety of applications for OLED device fabrication include several processing stages in which two or more organic materials are simultaneously vaporized. Thus, the two distribution tubes and the corresponding evaporation crucibles can be provided adjacent to each other. In such an embodiment, more than one organic material may, for example, be simultaneously evaporated.

根據此處所述之實施例,以有機材料塗佈之基板係在本質上垂直的位置。也就是說,如第10圖中所示之視角係為包括蒸發組件700之沈積設備的上視圖。分佈管706係提供本質上垂直延伸之線性蒸發組件。根據可與此處所述其他實施例結合之此處所述之實施例,本質上垂直在意指基板方向時特別是理解為允許從垂直方向偏差20°或以下,舉例為10°或以下。舉例來說,此偏差可因基板支座具有從垂直方向之一些偏差而可能產生更穩定之基板位置來提供。然而,在沈積源材料期間之基板方向係認定為本質上垂直,而不同於水平基板方向。根據此處之實施例,基板的表面係藉由蒸發組件塗佈,蒸發組件係在對應於一基板維度和平移運動之方向中延伸,平移運動係沿著對應於其他基板維度之其他方向。According to embodiments described herein, the substrate coated with the organic material is in a substantially vertical position. That is, the viewing angle as shown in FIG. 10 is a top view of the deposition apparatus including the evaporation assembly 700. Distribution tube 706 provides a linear evaporation assembly that extends substantially vertically. According to embodiments described herein which can be combined with other embodiments described herein, it is understood in particular to mean that the direction of the substrate is substantially perpendicular to a deviation of 20° or below from the vertical, for example 10° or less. For example, this deviation may be provided by the substrate support having some deviation from the vertical direction that may result in a more stable substrate position. However, the substrate orientation during deposition of the source material is considered to be substantially vertical, unlike the horizontal substrate orientation. According to embodiments herein, the surface of the substrate is coated by an evaporation assembly that extends in a direction corresponding to a substrate dimension and translational motion along other directions corresponding to other substrate dimensions.

如第10圖中所示之沈積系統1000特別是說明用於在真空腔室1050中沈積有機材料之沈積系統的實施例。蒸發組件700係提供在真空腔室1050中之一軌道上,此軌道例如是環狀軌道或線性導件1025。軌道或線性導件1025係裝配以用於蒸發組件700之平移運動。根據可與此處所述其他實施例結合之不同實施例,用於平移運動之驅動器可提供於蒸發組件700中、提供於軌道或線性導件1025、提供於真空腔室1050中或其組合。再者,第10圖繪示閥1060,閥1060舉例為閘閥。閥1060可例如是提供至相鄰之真空腔室(未繪示於第10圖中)之真空密封。閥可開啟以傳送基板1010或遮罩1030分別進入真空腔室1050中或離開真空腔室1050。The deposition system 1000 as shown in FIG. 10 is particularly illustrative of an embodiment of a deposition system for depositing organic materials in a vacuum chamber 1050. The evaporation assembly 700 is provided on one of the tracks in the vacuum chamber 1050, such as an annular track or linear guide 1025. Track or linear guides 1025 are assembled for translational movement of the evaporation assembly 700. According to different embodiments, which may be combined with other embodiments described herein, a driver for translational motion may be provided in the evaporation assembly 700, provided in a track or linear guide 1025, provided in a vacuum chamber 1050, or a combination thereof. Furthermore, Fig. 10 shows a valve 1060, which is exemplified by a gate valve. Valve 1060 can be, for example, a vacuum seal that is provided to an adjacent vacuum chamber (not shown in Figure 10). The valve can be opened to transfer the substrate 1010 or the mask 1030 into or out of the vacuum chamber 1050, respectively.

根據可與此處所述其他實施例結合之一些實施例,例如是維護真空腔室1070之其他真空腔室係提供而相鄰於真空腔室1050。真空腔室1050及維護真空腔室1070係以閥1080連接。閥1080係裝配以開啟及關閉在真空腔室1050及維護真空腔室1070之間的真空密封。當閥1080係為開啟狀態中時,蒸發組件700可傳送至維護真空腔室1070。之後,閥可關閉以提供在真空腔室1050和維護真空腔室1070之間的真空密封。如果閥1080係關閉時,維護真空腔室1070可排氣且開啟,以用以維護蒸發組件700而無需破壞真空腔室1050中之真空。According to some embodiments, which may be combined with other embodiments described herein, other vacuum chambers, such as maintenance vacuum chamber 1070, are provided adjacent to vacuum chamber 1050. The vacuum chamber 1050 and the maintenance vacuum chamber 1070 are connected by a valve 1080. Valve 1080 is assembled to open and close the vacuum seal between vacuum chamber 1050 and maintenance vacuum chamber 1070. When the valve 1080 is in the open state, the evaporation assembly 700 can be transferred to the maintenance vacuum chamber 1070. Thereafter, the valve can be closed to provide a vacuum seal between the vacuum chamber 1050 and the maintenance vacuum chamber 1070. If the valve 1080 is closed, the maintenance vacuum chamber 1070 can be vented and opened to maintain the evaporation assembly 700 without damaging the vacuum in the vacuum chamber 1050.

根據此處之實施例,兩個基板1010係支撐於在真空腔室1050中之各自的傳送軌道上。再者,兩個軌道係提供,用於設置遮罩1030於其上。在塗佈製程期間,基板1010可由各自的遮罩1030所遮蔽。根據典型實施例,此些遮罩1030可提供於遮罩框架1031中,以支承遮罩1030於預定位置中。According to embodiments herein, the two substrates 1010 are supported on respective transport tracks in the vacuum chamber 1050. Furthermore, two rails are provided for setting the mask 1030 thereon. The substrate 1010 may be obscured by a respective mask 1030 during the coating process. According to an exemplary embodiment, such masks 1030 may be provided in the mask frame 1031 to support the mask 1030 in a predetermined position.

根據可與此處所述其他實施例結合之一些實施例,基板1010可由基板支座1026支撐,基板支座1026係連接於對準單元1012。對準單元1012可調整基板1010相對於遮罩1030之位置。第10圖繪示基板支座1026連接於對準單元1012之實施例的示意圖。因此,基板係相對於遮罩1030移動,以提供在有機材料沈積期間基板及遮罩之間恰當的對準。根據可與此處所述其他實施例結合之進一步的實施例,遮罩1030及/或支承遮罩1030之遮罩框架1031可選擇性或額外地連接於對準單元1012。遮罩可相對於基板1010定位或遮罩1030和基板1010兩者可相對於彼此定位。裝配以用以調整在基板1010和遮罩1030相對於彼此之間的位置的對準單元1012係在沈積期間提供恰當對準的遮蔽,而有利於高品質或OLED顯示器製造。According to some embodiments, which may be combined with other embodiments described herein, the substrate 1010 may be supported by a substrate support 1026 that is coupled to the alignment unit 1012. The alignment unit 1012 can adjust the position of the substrate 1010 relative to the mask 1030. FIG. 10 is a schematic diagram showing an embodiment in which the substrate holder 1026 is coupled to the alignment unit 1012. Thus, the substrate is moved relative to the mask 1030 to provide proper alignment between the substrate and the mask during deposition of the organic material. The mask frame 1031 of the mask 1030 and/or the support mask 1030 can be selectively or additionally coupled to the alignment unit 1012 in accordance with further embodiments that can be combined with other embodiments described herein. The mask can be positioned relative to the substrate 1010 or both the mask 1030 and the substrate 1010 can be positioned relative to each other. The alignment unit 1012, which is assembled to adjust the position between the substrate 1010 and the mask 1030 relative to each other, provides proper alignment of the shadow during deposition, facilitating high quality or OLED display fabrication.

遮罩及基板相對於彼此對準之例子包括對準單元,對準單元係提供在定義一平面之至少兩個方向中的相對對準,此平面係本質上平行於基板之平面和遮罩之平面。舉例來說,對準可至少在x方向和y方向中進行,也就是定義上述平行之平面的兩個直角座標(Cartesian)方向。一般來說,遮罩及基板可本質上彼此平行。特別是,對準可進一步在本質上垂直於基板之平面和遮罩之平面的一方向中進行。因此,對準單元係裝配以至少用於遮罩和基板相對於彼此之X-Y對準,且特別是X-Y-Z對準。可與此處所述其他實施例結合之一特定的例子係在x方向、y方向和z方向中對準基板於遮罩,遮罩可於真空腔室1050中靜態的支承。An example of the alignment of the mask and the substrate relative to each other includes an alignment unit that provides relative alignment in at least two directions defining a plane that is substantially parallel to the plane of the substrate and the mask flat. For example, the alignment can be performed at least in the x-direction and the y-direction, that is, two Cartesian directions defining the parallel planes described above. Generally, the mask and substrate can be substantially parallel to each other. In particular, the alignment can be further performed in a direction substantially perpendicular to the plane of the substrate and the plane of the mask. Thus, the alignment unit is assembled for at least X-Y alignment of the mask and substrate relative to each other, and in particular X-Y-Z alignment. A particular example that may be combined with other embodiments described herein is to align the substrate to the mask in the x-direction, the y-direction, and the z-direction, the mask being statically supported in the vacuum chamber 1050.

如第10圖中所示,線性導件1025係提供蒸發組件700之平移運動的一個方向。遮罩1030可提供在蒸發組件700之任一側上。根據此處所述之實施例,遮罩1030可本質上平行於平移運動延伸。再者,排列在蒸發源相對側之基板1010可亦本質上平行於平移運動之方向延伸,蒸發源舉例為蒸發組件700。根據典型之實施例,基板1010可經由閥1060移動至真空腔室1050中且離開真空腔室1050。沈積系統1000可包括用於傳送各個基板1010之對應的傳送軌道。舉例來說,傳送軌道可平行於如第10圖中所示之基板位置延伸且進入及離開真空腔室1050。As shown in FIG. 10, the linear guide 1025 provides one direction of the translational movement of the evaporation assembly 700. A mask 1030 can be provided on either side of the evaporation assembly 700. According to embodiments described herein, the mask 1030 can extend substantially parallel to the translational motion. Furthermore, the substrate 1010 arranged on the opposite side of the evaporation source may also extend substantially parallel to the direction of the translational motion, and the evaporation source is exemplified by the evaporation assembly 700. According to a typical embodiment, the substrate 1010 can be moved into the vacuum chamber 1050 via the valve 1060 and exit the vacuum chamber 1050. The deposition system 1000 can include corresponding transfer tracks for transporting the respective substrates 1010. For example, the transfer track can extend parallel to the substrate position as shown in FIG. 10 and enter and exit the vacuum chamber 1050.

一般來說,其他軌道係提供而用於支撐遮罩框架1031及遮罩1030。可與此處所述其他實施例結合之一些實施例可包括在真空腔室1050中的四個軌道。為了移動其中一個遮罩1030離開腔室而例如是清洗遮罩,包括遮罩之遮罩框架1031可移動至基板1010之傳送軌道上。各自之遮罩框架可在基板之傳送軌道上接著離開或進入真空腔室1050。雖然提供用以遮罩框架1031的分離之傳送軌道來進入及離開真空腔室1050係有可能的,但如果只有兩個軌道係延伸進入及離開真空腔室1050,且此外遮罩框架與例如是各自之遮罩1030可一起藉由適合之致動器或機器人移動到用於基板之傳送軌道之各自一者上,沈積系統1000之擁有成本(cost of ownership)可減少,此兩個軌道也就是基板之傳送軌道。In general, other rails are provided for supporting the mask frame 1031 and the mask 1030. Some embodiments that may be combined with other embodiments described herein may include four tracks in the vacuum chamber 1050. To move one of the masks 1030 away from the chamber, such as a cleaning mask, the mask frame 1031 including the mask can be moved onto the transport track of the substrate 1010. The respective mask frames can then exit or enter the vacuum chamber 1050 on the transfer track of the substrate. While it is possible to provide separate transport tracks for masking the frame 1031 to enter and exit the vacuum chamber 1050, if only two track systems extend into and out of the vacuum chamber 1050, and in addition the mask frame is, for example, The respective masks 1030 can be moved together by a suitable actuator or robot to each of the transfer tracks for the substrate, and the cost of ownership of the deposition system 1000 can be reduced. The transfer track of the substrate.

根據此處之實施例,用於利用從坩鍋蒸發之源材料塗佈基板的方法1100係提供。坩鍋可為上述之任何一個或多個坩鍋且一般包括牆,牆具有內表面,內表面圍繞內空間,用以容納源材料及至少一熱傳輸元件,此至少一熱傳輸元件係排列於坩鍋之內空間中。此方法包括提供1110源材料於坩鍋中,特別是在坩鍋之內空間中。根據此處之實施例,源材料可為粉末、液態及/或小球(pellets)之形式。此方法更包括藉由提供坩鍋之內空間的間接加熱來加熱1120源材料至蒸發溫度。特別是,電力可提供至加熱器,加熱器係至少沿著坩鍋之牆的外部排列。此處使用之名稱「外部(outer portion)」應意指不在坩鍋之內空間中的坩鍋之任何部分。舉例來說,牆之外部可例如是由遮罩物所覆蓋,使得加熱器排列在牆之外部與遮罩物之間。In accordance with embodiments herein, a method 1100 for coating a substrate with a source material evaporated from a crucible is provided. The crucible may be any one or more crucibles described above and generally includes a wall having an inner surface surrounding the inner space for receiving the source material and at least one heat transport element, the at least one heat transport element being arranged In the space inside the shabu-shabu. The method includes providing 1110 source material in a crucible, particularly in a space within the crucible. According to embodiments herein, the source material can be in the form of a powder, a liquid, and/or pellets. The method further includes heating the 1120 source material to an evaporation temperature by providing indirect heating of the space within the crucible. In particular, power can be supplied to the heater, which is arranged at least along the exterior of the wall of the crucible. The term "outer portion" as used herein shall mean any part of the crucible that is not in the space inside the crucible. For example, the exterior of the wall may for example be covered by a covering such that the heater is arranged between the exterior of the wall and the covering.

加熱源材料可在真空下完成,而有助於從粉末進行任何濕度之吸濕(desorption)且溫度可逐漸地增加。根據此處所述之實施例,溫度可提升至待用(stand-by)溫度,源材料之蒸發係在接近待用溫度時發生。待用溫度可為例如是為從90%至95%之蒸發溫度。根據此處之實施例,溫度可藉由一或多個感測器及溫度控制器控制,溫度控制器係作用於電源供應器,電源供應器係連接於加熱器。The heat source material can be completed under vacuum to aid in the desorption of any humidity from the powder and the temperature can be gradually increased. According to embodiments described herein, the temperature can be raised to a stand-by temperature, and evaporation of the source material occurs near the temperature at which it is to be used. The temperature to be used may be, for example, an evaporation temperature of from 90% to 95%. According to embodiments herein, the temperature may be controlled by one or more sensors and a temperature controller that acts on the power supply and the power supply is coupled to the heater.

在此處所述之實施例中,溫度可逐漸地從待用溫度增加至蒸發溫度,以較佳地調整沈積率。In the embodiments described herein, the temperature can be gradually increased from the temperature to be used to the evaporation temperature to preferably adjust the deposition rate.

根據此處之實施例,提供坩鍋之內空間的間接加熱可更包括產生1130總加熱功率之最大值的5%在坩鍋之內空間中。於此處所述之實施例中,大部分之加熱功率係在坩鍋之外側產生且間接地提供至坩鍋之內空間,以蒸發源材料。藉由此一或多個熱傳輸元件,熱可被動地提供坩鍋之內空間中。特別是,來自加熱器之熱可經由坩鍋牆及/或此一或多個熱傳輸元件傳輸到坩鍋之內空間。According to embodiments herein, providing indirect heating of the space within the crucible may further comprise generating 5% of the maximum of 1130 total heating power in the space within the crucible. In the embodiments described herein, most of the heating power is generated on the outside of the crucible and indirectly provided to the space inside the crucible to evaporate the source material. With the one or more heat transport elements, heat can be passively provided in the space within the crucible. In particular, heat from the heater can be transferred to the interior of the crucible via the crucible wall and/or the one or more heat transfer elements.

於此處之實施例中,來自加熱器之熱係經由牆及/或此一或多個熱傳輸元件在坩鍋之內空間中為均勻分散式的。一般來說,沒有加熱器係直接地提供在坩鍋之內空間中係因為此舉可能會對坩鍋之外側上的加熱器控制有所干擾。根據此處之實施例,大部分之加熱功率係提供至在坩鍋之外側上的加熱器,且由加熱器產生之熱能係藉由牆及/或此一或多個熱傳輸元件傳導至坩鍋之內空間中。In the embodiments herein, the heat from the heater is uniformly dispersed in the space within the crucible via the wall and/or the one or more heat transport elements. In general, no heater is provided directly in the space inside the crucible because it may interfere with heater control on the outside of the crucible. According to embodiments herein, most of the heating power is provided to the heater on the outside of the crucible, and the thermal energy generated by the heater is conducted to the crucible by the wall and/or the one or more heat transport elements. In the space inside the pot.

根據此處之實施例,源材料之加熱可更包括從第一位置移動此一或多個熱傳輸元件至第二位置,以更均勻地分佈在坩鍋之內空間中的熱。According to embodiments herein, heating of the source material may further comprise moving the one or more heat transport elements from the first position to the second position to more evenly distribute heat in the space within the crucible.

用於利用源材料塗佈基板之方法更包括導引1140已蒸發及/或已昇華源材料至基板而產生源材料之薄膜於基板的表面上。根據此處之實施例,導引已蒸發源材料可包括提供1150熱能至已蒸發源材料。再者,在此處之實施例中,導引源材料可更包括在接近基板處冷卻1160已蒸發材料,以有助於源材料沈積於基板之表面上。The method for coating a substrate with a source material further includes guiding 1140 a film that has evaporated and/or sublimated the source material to the substrate to produce a film of the source material on the surface of the substrate. According to embodiments herein, directing the evaporated source material can include providing 1150 thermal energy to the evaporated source material. Still further, in embodiments herein, the source material may further include cooling 1160 vaporized material proximate the substrate to facilitate deposition of the source material on the surface of the substrate.

綜上所述,雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明。本發明所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾。因此,本發明之保護範圍當視後附之申請專利範圍所界定者為準。In conclusion, the present invention has been disclosed in the above preferred embodiments, and is not intended to limit the present invention. A person skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.

100、200、300、500、600、901‧‧‧坩鍋
101、201‧‧‧對稱平面
103、203‧‧‧連接件
104、204、712‧‧‧開孔
105、205‧‧‧中心軸
125‧‧‧外部加熱單元
127‧‧‧遮罩物
150、250、350、550、650‧‧‧內空間
161-166、261-266、661-666‧‧‧側壁
167、267‧‧‧底部牆
168、268‧‧‧頂部牆
170、270、370、670‧‧‧熱傳輸元件
171‧‧‧第一熱傳輸元件
171a、172a‧‧‧類板材部分
171b、172b‧‧‧類管部分
172‧‧‧第二熱傳輸元件
269‧‧‧總長度
271-276、371-388、571-578‧‧‧板
560‧‧‧牆
580‧‧‧直徑
669‧‧‧孔洞
671-675‧‧‧棒
700、800、900‧‧‧蒸發組件
706‧‧‧分佈管
715‧‧‧加熱單元
1000‧‧‧沈積系統
1010‧‧‧基板
1012‧‧‧對準單元
1020‧‧‧支座
1025‧‧‧線性導件
1026‧‧‧基板支座
1030‧‧‧遮罩
1031‧‧‧遮罩框架
1050‧‧‧真空腔室
1060、1080‧‧‧閥
1070‧‧‧維護真空腔室
1100‧‧‧方法
1110-1160‧‧‧流程步驟
100, 200, 300, 500, 600, 901 ‧ ‧ 坩 pot
101, 201‧‧‧symmetric plane
103, 203‧‧‧Connecting parts
104, 204, 712‧‧‧ openings
105, 205‧‧‧ central axis
125‧‧‧External heating unit
127‧‧‧ hood
150, 250, 350, 550, 650 ‧ ‧ inner space
161-166, 261-266, 661-666‧‧‧ side wall
167, 267‧‧‧ bottom wall
168, 268‧‧‧ top wall
170, 270, 370, 670‧‧‧ heat transfer components
171‧‧‧First heat transfer element
171a, 172a‧‧‧ class plate parts
Section 171b, 172b‧‧‧
172‧‧‧Second heat transfer element
269‧‧‧ total length
271-276, 371-388, 571-578‧‧‧ boards
560‧‧‧ wall
580‧‧‧diameter
669‧‧‧ hole
671-675‧‧‧ stick
700, 800, 900‧‧‧ evaporation components
706‧‧‧Distribution tube
715‧‧‧heating unit
1000‧‧‧Deposition system
1010‧‧‧Substrate
1012‧‧‧Alignment unit
1020‧‧‧Support
1025‧‧‧Linear guides
1026‧‧‧Substrate support
1030‧‧‧ mask
1031‧‧‧mask frame
1050‧‧‧vacuum chamber
1060, 1080‧‧‧ valve
1070‧‧‧Maintenance vacuum chamber
1100‧‧‧ method
1110-1160‧‧‧ Process steps

部分之上述實施例將參照下方圖式更詳細地說明於下方典型實施例之說明中: 第1圖繪示根據此處所述實施例之坩鍋之示意圖; 第2圖繪示根據此處所述實施例之其他坩鍋之示意圖; 第3圖繪示根據此處所述實施例之再其他坩鍋之示意圖; 第4圖繪示根據此處所述實施例之如第2圖中所示之坩鍋的剖面圖; 第5圖繪示根據此處實施例之另一坩鍋的示意圖; 第6圖繪示根據此處實施例之另一坩鍋的示意圖; 第7圖繪示根據此處實施例之蒸發組件的示意圖; 第8圖及第9圖繪示根據此處實施例之蒸發組件的數個部分的示意圖; 第10圖繪示根據此處實施例之用於沈積源材料之沈積系統的示意圖;以及 第11圖繪示根據此處實施例之用以利用從坩鍋蒸發之源材料塗佈基板的方法的示意圖。The above-mentioned embodiments will be explained in more detail in the following description of the exemplary embodiments with reference to the following figures: FIG. 1 is a schematic view showing a crucible according to the embodiment described herein; FIG. 2 is a diagram showing Schematic diagram of another crucible of the embodiment; FIG. 3 is a schematic view of still another crucible according to the embodiment described herein; FIG. 4 is a diagram of the embodiment according to the embodiment shown in FIG. FIG. 5 is a schematic view showing another crucible according to the embodiment of the present invention; FIG. 6 is a schematic view showing another crucible according to the embodiment of the present invention; A schematic view of an evaporation assembly of an embodiment; FIGS. 8 and 9 illustrate schematic views of portions of an evaporation assembly according to embodiments herein; and FIG. 10 illustrates a deposition source material according to embodiments herein. A schematic diagram of a deposition system; and FIG. 11 is a schematic diagram of a method for coating a substrate with a source material evaporated from a crucible according to embodiments herein.

100‧‧‧坩鍋 100‧‧‧ 坩 pot

101‧‧‧對稱平面 101‧‧‧symmetric plane

103‧‧‧連接件 103‧‧‧Connecting parts

104‧‧‧開孔 104‧‧‧Opening

105‧‧‧中心軸 105‧‧‧Center axis

125‧‧‧外部加熱單元 125‧‧‧External heating unit

127‧‧‧遮罩物 127‧‧‧ hood

150‧‧‧內空間 150‧‧‧ inner space

161-166‧‧‧側壁 161-166‧‧‧ Sidewall

167‧‧‧底部牆 167‧‧‧Bottom wall

168‧‧‧頂部牆 168‧‧‧ top wall

170‧‧‧熱傳輸元件 170‧‧‧ Heat Transfer Element

171‧‧‧第一熱傳輸元件 171‧‧‧First heat transfer element

171a、172a‧‧‧類板材部分 171a, 172a‧‧‧ class plate parts

171b、172b‧‧‧類管部分 Section 171b, 172b‧‧‧

172‧‧‧第二熱傳輸元件 172‧‧‧Second heat transfer element

Claims (20)

一種坩鍋,用以蒸發一源材料,其中該坩鍋具有一牆,該牆具有一內表面,該內表面係圍繞一內空間,該內空間用以容納該材料源及一或多個熱傳輸元件,該一或多個熱傳輸元件係排列在該坩鍋之該內空間中。A crucible for evaporating a source material, wherein the crucible has a wall having an inner surface surrounding an inner space for containing the source of material and one or more heats A transmission element, the one or more heat transport elements being arranged in the inner space of the crucible. 如申請專利範圍第1項所述之坩鍋,其中該一或多個熱傳輸元件係裝配以提供該坩鍋之該內空間之一間接加熱。The crucible of claim 1, wherein the one or more heat transport elements are assembled to provide indirect heating of one of the inner spaces of the crucible. 如申請專利範圍第1項所述之坩鍋,其中該一或多個熱傳輸元件係裝配以被動地接收來自該牆及/或來自該坩鍋之一外側的熱,且係排列以於該坩鍋之該內空間中重新分佈已接收之該熱。The crucible of claim 1, wherein the one or more heat transport elements are configured to passively receive heat from the wall and/or from an outside of the crucible, and are arranged to The heat that has been received is redistributed in the inner space of the crucible. 如申請專利範圍第2項所述之坩鍋,其中該一或多個熱傳輸元件係裝配以被動地接收來自該牆及/或來自該坩鍋之一外側之熱,且係排列以於該坩鍋之該內空間中重新分佈已接收之該熱。The crucible of claim 2, wherein the one or more heat transport elements are assembled to passively receive heat from the wall and/or from one of the sides of the crucible, and are arranged to The heat that has been received is redistributed in the inner space of the crucible. 如申請專利範圍第1至4項之任一項所述之坩鍋,更包括: 一或多個加熱器,具有一總加熱功率,其中該一或多個加熱器係不提供於該內空間中或其中該總加熱功率之最大值的5%係產生在該內空間中。The crucible according to any one of claims 1 to 4, further comprising: one or more heaters having a total heating power, wherein the one or more heaters are not provided in the inner space 5% of the maximum value of the total heating power in or in which is generated in the inner space. 如申請專利範圍第1至4項之任一項所述之坩鍋,其中該一或多個熱傳輸元件之至少一者係排列,以從該坩鍋之該牆突出至該坩鍋之該內空間中。The crucible of any one of claims 1 to 4, wherein at least one of the one or more heat transport elements is arranged to protrude from the wall of the crucible to the crucible Inside the space. 如申請專利範圍第6項所述之坩鍋,其中排列以從該坩鍋之該牆突出至該坩鍋之該內空間中之該一或多個熱傳輸元件之該至少一者係排列,使得在直徑量測為至少10 mm的該內空間的一中心內的一空間係不包括該一或多個熱傳導元件之任何部分。The crucible of claim 6, wherein the at least one of the one or more heat transport elements arranged to protrude from the wall of the crucible into the inner space of the crucible is arranged, A space within a center of the interior space having a diameter measured at least 10 mm does not include any portion of the one or more heat conducting elements. 如申請專利範圍第1至4項之任一項所述之坩鍋,其中該一或多個熱傳輸元件係突出穿過該坩鍋之該牆。The crucible of any one of claims 1 to 4, wherein the one or more heat transport elements protrude through the wall of the crucible. 如申請專利範圍第8項所述之坩鍋,其中該一或多個熱傳輸元件係從該牆之一外側焊接於該坩鍋之該牆。The crucible of claim 8, wherein the one or more heat transport elements are welded to the wall of the crucible from one of the sides of the wall. 如申請專利範圍第1至4項之任一項所述之坩鍋,其中該坩鍋之該牆包括一或多個狹縫,用以插入該一或多個熱傳輸元件。The crucible of any one of claims 1 to 4, wherein the wall of the crucible includes one or more slits for inserting the one or more heat transport elements. 如申請專利範圍第10項所述之坩鍋,其中該一或多個熱傳輸元件係藉由組設該坩鍋之一底部於該坩鍋之該牆來插入。The crucible of claim 10, wherein the one or more heat transporting elements are inserted by arranging one of the crucibles at the bottom of the crucible. 如申請專利範圍第1至4項之任一項所述之坩鍋,其中該坩鍋之該牆包括一或多個開孔,用以插入該一或多個熱傳輸元件。The crucible of any one of claims 1 to 4, wherein the wall of the crucible includes one or more openings for inserting the one or more heat transport elements. 如申請專利範圍第12項所述之坩鍋,其中該一或多個開孔係為複數個圓形開孔。The crucible of claim 12, wherein the one or more openings are a plurality of circular openings. 如申請專利範圍第1至4項之任一項所述之坩鍋,其中該一或多個熱傳輸元件係提供成一類似杯狀,裝配以用以具有液體於其中。The crucible of any one of claims 1 to 4, wherein the one or more heat transport elements are provided in a cup-like shape for assembly with a liquid therein. 如申請專利範圍第1至4項之任一項所述之坩鍋,其中該牆之該內表面具有一第一尺寸之一第一面積,且其中該一或多個熱傳輸元件係提供一第二面積,該第二面積係在至少該第一尺寸或至少該第一尺寸之兩倍的該內空間之一第二尺寸中。The crucible according to any one of claims 1 to 4, wherein the inner surface of the wall has a first area of a first size, and wherein the one or more heat transport elements provide a a second area, the second area being in at least one of the first size or at least twice the first size. 一種蒸發組件,用以蒸發一源材料,特別是一有機材料,其中該蒸發組件包括如申請專利範圍第1至4項之任一項所述之一坩鍋及至少一分佈組件,該至少一分佈組件係適用於從該坩鍋導引已蒸發之該源材料至將塗佈之一基板。An evaporation assembly for evaporating a source material, in particular an organic material, wherein the evaporation assembly comprises one of the crucibles and at least one distribution component according to any one of claims 1 to 4, the at least one The distribution component is adapted to direct the source material that has evaporated from the crucible to one of the substrates to be coated. 如申請專利範圍第16項所述之蒸發組件,更包括如申請專利範圍第1至4項之任一項所述之二或三個坩鍋,其中該些坩鍋具有三角形或六角形。The evaporating unit of claim 16, further comprising two or three crucibles according to any one of claims 1 to 4, wherein the crucibles have a triangular shape or a hexagonal shape. 一種方法,用以利用從一坩鍋蒸發之源材料塗佈一基板,該坩鍋具有一牆,該牆具有一內表面,該內表面圍繞一內空間,該內空間用以容納該源材料且包括至少一熱傳輸元件於該坩鍋之該內空間中,其中該方法包括: 提供源材料於該坩鍋中; 藉由以該至少一熱傳輸元件提供該坩鍋之該內空間的間接加熱來加熱該源材料;以及 導引已蒸發之該源材料至該基板之一表面。A method for coating a substrate with a source material evaporated from a crucible, the crucible having a wall having an inner surface surrounding an inner space for containing the source material And including at least one heat transport element in the inner space of the crucible, wherein the method comprises: providing a source material in the crucible; and providing the inner space of the crucible by the at least one heat transport element Heating to heat the source material; and directing the evaporated source material to a surface of the substrate. 如申請專利範圍第18項所述之方法,其中提供該坩鍋之該內空間之間接加熱包括產生一總加熱功率之一最大值的5%於該內空間中。The method of claim 18, wherein providing the inner space of the crucible for indirect heating comprises generating 5% of a maximum of one of the total heating powers in the inner space. 一種坩鍋,用以蒸發一源材料,其中該坩鍋具有一牆,該牆具有一內表面,該內表面圍繞一內空間,該內空間用以容納該源材料及一或多個熱傳輸元件,該一或多個熱傳輸元件係排列於該坩鍋之該內空間中且係裝配以提供該坩鍋之該內空間的一間接加熱。A crucible for evaporating a source material, wherein the crucible has a wall having an inner surface surrounding an inner space for containing the source material and one or more heat transports An element, the one or more heat transport elements are arranged in the inner space of the crucible and are assembled to provide an indirect heating of the inner space of the crucible.
TW104138688A 2014-11-26 2015-11-23 Crucible, a evaporation assembly having the same and a method using the same for evaporation purposes TW201625358A (en)

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