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TW201614373A - Photosensitive resin composition, manufacturing method for color filter, color filter and liquid crystal display element using the same - Google Patents

Photosensitive resin composition, manufacturing method for color filter, color filter and liquid crystal display element using the same

Info

Publication number
TW201614373A
TW201614373A TW104133861A TW104133861A TW201614373A TW 201614373 A TW201614373 A TW 201614373A TW 104133861 A TW104133861 A TW 104133861A TW 104133861 A TW104133861 A TW 104133861A TW 201614373 A TW201614373 A TW 201614373A
Authority
TW
Taiwan
Prior art keywords
color filter
alkali
resin composition
photosensitive resin
soluble resin
Prior art date
Application number
TW104133861A
Other languages
Chinese (zh)
Other versions
TWI620011B (en
Inventor
Duan-Chih Wang
Bar-Yuan Hsieh
Jung-Pin Hsu
Cheng-Chang Hsu
Wei-Kai Ho
Yi-Chia Kuo
Original Assignee
Chi Mei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chi Mei Corp filed Critical Chi Mei Corp
Publication of TW201614373A publication Critical patent/TW201614373A/en
Application granted granted Critical
Publication of TWI620011B publication Critical patent/TWI620011B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/12—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/06—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/12—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

A photosensitive resin composition including an alkali-soluble resin (A), a compound having an ethylenically unsaturated group (B), a photoinitiator (C), a solvent (D) and a pigment (E). The alkali-soluble resin (A) includes alkali-soluble resin (A-1) and alkali-soluble resin (A-2). The alkali-soluble resin (A-1) is obtained by reacting a mixture, wherein the mixture includes an epoxy compound having at least two epoxy groups (a-1-1), a compound having at least one carboxylic acid group and at least one ethylenically unsaturated group (a-1-2), tetracarboxylic acid or its dianhydride (a-1-3) and dicarboxylic acid or its anhydride (a-1-4). The epoxy compound having at least two epoxy groups (a-1-1) has a structure represented by formula (aI-1) or formula (aI-2). The photoinitiator (C) includes a photoinitiator (C-1) represented by formula (1).
TW104133861A 2014-10-15 2015-10-15 Photosensitive resin composition, manufacturing method for color filter, color filter and liquid crystal display element using the same TWI620011B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201462063969P 2014-10-15 2014-10-15
US62/063,969 2014-10-15

Publications (2)

Publication Number Publication Date
TW201614373A true TW201614373A (en) 2016-04-16
TWI620011B TWI620011B (en) 2018-04-01

Family

ID=55746149

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104133861A TWI620011B (en) 2014-10-15 2015-10-15 Photosensitive resin composition, manufacturing method for color filter, color filter and liquid crystal display element using the same

Country Status (3)

Country Link
CN (1) CN107003604B (en)
TW (1) TWI620011B (en)
WO (1) WO2016058551A1 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI665523B (en) * 2016-05-20 2019-07-11 奇美實業股份有限公司 Photosensitive resin composition for black matrix, black matrix, color filter, and liquid crystal display device
TWI666518B (en) * 2016-12-30 2019-07-21 奇美實業股份有限公司 Photosensitive resin composition and uses thereof
TWI669573B (en) * 2016-10-21 2019-08-21 奇美實業股份有限公司 Photosensitive resin composition and uses thereof
TWI683181B (en) * 2016-10-03 2020-01-21 奇美實業股份有限公司 Photosensitive resin composition and uses thereof
TWI705299B (en) * 2016-08-01 2020-09-21 南韓商東友精細化工有限公司 Colored photosensitive resin composition, color filter, and image display apparatus comprising the same
TWI716262B (en) * 2020-01-16 2021-01-11 新應材股份有限公司 Resin composition, cured film and black matrix

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9939568B2 (en) * 2015-05-06 2018-04-10 Chi Mei Corporation Photosensitive resin composition for color filter and application of the same

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1566128A (en) * 2003-07-03 2005-01-19 中国人民解放军军事医学科学院放射医学研究所 Sugar charcoal glycoside isoflavone compound containing alkane amine group and alkoxy substitution, process and uses thereof
AU2008264520A1 (en) * 2007-06-18 2008-12-24 Asahi Kasei E-Materials Corporation Photosensitive resin composition, flexographic printing plate, and method for producing flexographic printing plate
JP6038033B2 (en) * 2010-10-05 2016-12-07 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions
TWI420244B (en) * 2011-04-08 2013-12-21 Chi Mei Corp Photosensitive resin composition, and color filter and liquid crystal display device made by using the composition
JP5482878B2 (en) * 2012-01-30 2014-05-07 Ｊｓｒ株式会社 Colorant, coloring composition, color filter and display element
JP2014005466A (en) * 2012-06-25 2014-01-16 Dongwoo Fine-Chem Co Ltd Alkali-soluble resin, photosensitive resin composition containing the same, and color filter using the same
TWI474112B (en) * 2012-09-27 2015-02-21 Chi Mei Corp Photosensitive resin composition, protecting film, and a device containing the protecting film
TWI479264B (en) * 2012-12-20 2015-04-01 Chi Mei Corp Photosensitive resin composition, color filter and liquid crystal display device
CN103969947B (en) * 2013-01-31 2016-05-04 太阳油墨（苏州）有限公司 Alkali development-type photosensitive resin composition, its dry film and solidfied material thereof and use it and the printed circuit board (PCB) that forms

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI665523B (en) * 2016-05-20 2019-07-11 奇美實業股份有限公司 Photosensitive resin composition for black matrix, black matrix, color filter, and liquid crystal display device
TWI705299B (en) * 2016-08-01 2020-09-21 南韓商東友精細化工有限公司 Colored photosensitive resin composition, color filter, and image display apparatus comprising the same
TWI683181B (en) * 2016-10-03 2020-01-21 奇美實業股份有限公司 Photosensitive resin composition and uses thereof
TWI669573B (en) * 2016-10-21 2019-08-21 奇美實業股份有限公司 Photosensitive resin composition and uses thereof
TWI666518B (en) * 2016-12-30 2019-07-21 奇美實業股份有限公司 Photosensitive resin composition and uses thereof
TWI716262B (en) * 2020-01-16 2021-01-11 新應材股份有限公司 Resin composition, cured film and black matrix

Also Published As

Publication number Publication date
WO2016058551A1 (en) 2016-04-21
CN107003604B (en) 2020-08-11
WO2016058551A9 (en) 2017-05-18
TWI620011B (en) 2018-04-01
CN107003604A (en) 2017-08-01

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